JP2007256420A - Manufacturing apparatus and manufacturing method of anti-reflection film - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing apparatus of an anti-reflection film for allowing continuous formation with a simple structure. <P>SOLUTION: The manufacturing apparatus of an anti-reflection film is provided with a hard coat forming mechanism 10 and an anti-reflection layer forming mechanism 20. The hard coat forming mechanism 10 has a first annular body 111 disposed opposite to a base material sheet 1, a first supplying part 12 supplying a hard coat forming resin to a peripheral surface of the first annular body 111, a first baking part 13 baking the hard coat forming resin and a first cooling part 14 cooling the hard coat forming resin. The anti-reflection layer forming mechanism 20 has a second annular body 211 disposed opposite to the base material sheet 1, a second supplying part 22 supplying an anti-reflection layer forming resin to a peripheral surface of the second annular body 211, a second baking part 23 baking the anti-reflection layer forming resin and a second cooling part 24 cooling the anti-reflection layer forming resin. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

The present invention relates to an apparatus and a method for manufacturing an antireflection film provided on the surface of a display or the like.

Transparent substrates such as glass and plastic are used for touch panels and other displays. When observing visual information such as objects, characters, figures, etc. through these transparent substrates, or when observing images from the reflective layer through the transparent substrate, the surface of these transparent substrates is reflected by external light and the internal There was a problem that visual information was difficult to see.
In order to prevent reflection of the transparent substrate, an antireflection film is provided on the transparent substrate.

Conventionally, as a technique for producing this antireflection film, a hard coat composition is dissolved in an appropriate solvent, applied to a base film and cured, and then the antireflection layer composition is dipped on the hard coat. There exists a method of apply | coating by the method etc. and performing the active energy ray irradiation process etc. of a coated material (patent document 1).
Conventionally, there is a method in which a metal compound for forming an antireflection layer is applied to a cellulose ester film, and a thin film is formed by plasma treatment (Patent Document 2).

JP-A-10-726 JP 2003-53882 A

Patent Document 1 has a configuration in which a hard coat is formed on a base film and an antireflection layer is formed on the hard coat. However, these steps are performed separately, so that workability is not good.
Therefore, it is conceivable that the base film is formed into a sheet shape, and the hard coat composition is applied to the surface of the sheet while feeding the sheet, and the antireflection layer composition is applied thereon to form a series of operations. However, the hard coat composition must be cured after the hard coat composition is applied, and the antireflective layer composition must be cured after the antireflective layer composition is applied on the hard coat, Time for curing these compositions is required, and as a result, the line itself becomes long and the entire apparatus becomes large. Furthermore, the hard coat composition must be fired. However, if the hard coat composition is applied directly to the base film and fired, the base film may be subjected to thermal stress and deteriorate quality.
In Patent Document 2, a large-scale plasma processing apparatus is required to form an antireflection layer on a sheet.

The objective of this invention is providing the manufacturing apparatus and manufacturing method of an antireflection film which can be continuously formed with a simple structure.

The apparatus for producing an antireflection film of the present invention is disposed on the base coat sheet feeding direction side of the base coat sheet which forms a hard coat on the base sheet fed in one direction, and the hard coat formation mechanism. An antireflection layer forming mechanism for forming an antireflection layer on the hard coat, wherein the hard coat forming mechanism includes a first rotating body disposed opposite to the base sheet, and a periphery of the first rotating body. A first supply unit for supplying a hard coat forming resin for forming the hard coat on the surface; a first baking unit for baking the hard coat forming resin supplied by the first supply unit; A first cooling part for cooling the hard coat forming resin fired in the firing part, and the hard coat forming resin cooled in the first cooling part is transferred to the surface of the base sheet and hard coated. Shape The antireflection layer forming mechanism includes: a second rotating body disposed opposite to the base sheet; and an organic antireflection layer for forming the antireflection layer on a peripheral surface of the second rotating body. The second supply part for supplying the resin for use, the second firing part for firing the antireflection layer forming resin supplied by the second supply part, and the antireflection layer forming resin fired by the second firing part And a second cooling part for cooling the anti-reflection layer forming resin, which is cooled by the second cooling part, is transferred to the surface of the hard coat to form an anti-reflection layer.

The method for producing an antireflection film of the present invention includes a hard coat forming step of forming a hard coat on a substrate sheet fed in one direction, and an antireflection on the hard coat formed in the hard coat formation step. An antireflection layer forming step for forming a layer, wherein the hard coat forming step is arranged to face the base sheet and to form the hard coat on a peripheral surface of a rotating first rotating body. Supplying the hard coat forming resin, firing the hard coat forming resin, cooling the fired hard coat forming resin, and transferring the cooled hard coat forming resin to the surface of the substrate sheet The antireflection layer forming step includes forming the antireflection layer on a peripheral surface of a second rotating body that is disposed opposite to the base sheet and is rotating. An organic antireflection layer forming resin is supplied, the antireflection layer forming resin is baked, the fired antireflection layer forming resin is cooled, and the cooled antireflection layer forming resin is It includes a step of forming an antireflection layer by transferring to the surface of the hard coat.

In the present invention configured as described above, the hard coat forming process is executed by the hard coat forming mechanism, and the antireflection layer forming process is executed by the antireflection layer forming mechanism.
First, in the hard coat forming step, when the hard coat forming resin is supplied from the first supply unit to the peripheral surface of the rotating first rotating body, the first rotating body supplied with the hard coat forming resin is supplied. The hard coat forming resin is fired by the first fired part, and then the hard coat forming resin heated to a high temperature by the fire is brought close to the first cooling part. Then, it is cooled to a predetermined temperature. The hard coat forming resin cooled to a predetermined temperature is transferred to the surface of the base sheet and peeled off from the peripheral surface of the first rotating body, whereby a hard coat is formed on the base sheet.
Next, in the antireflection layer forming step, when the antireflection layer forming resin is supplied from the second supply unit to the peripheral surface of the rotating second rotating body, the antireflection layer forming resin is supplied. The peripheral surface of the second rotating body is close to the second firing portion, and the antireflection layer forming resin is fired by the second firing portion,
Subsequently, the antireflective layer forming resin that has been heated to a high temperature is brought close to the second cooling section, thereby being cooled to a predetermined temperature. The antireflection layer forming resin cooled to a predetermined temperature is transferred to the surface of the hard coat and peeled off from the peripheral surface of the second rotating body, whereby an antireflection layer is formed on the hard coat. Thereby, the anti-reflection film in which the hard coat and the anti-reflection layer are formed on the base sheet will be continuously formed.
The final product is completed by cutting the film into a predetermined shape.

In the hard coat forming step, the hard coat forming resin sufficiently heated by the first baking section is transferred to the base sheet after being cooled to a predetermined temperature by the first cooling section, so that the high temperature hard coat is formed. The resin does not touch the base sheet directly. Moreover,
In the antireflection layer forming step, the antireflection layer forming resin sufficiently heated by the second baking part is transferred to the hard coat after being cooled to a predetermined temperature by the second cooling part,
The high temperature of the resin for forming the antireflection layer is not transmitted to the base sheet through the hard coat. Therefore, the base sheet is not overheated due to the high temperature of the resin baked in each baking section, no thermal stress is generated on the base sheet itself, and distortion and other problems are prevented from being reflected. It does not occur in the film.
Therefore, in the present invention, the hard coat forming mechanism and the antireflection layer forming mechanism are arranged along the flow direction of the base sheet fed in one direction, and the rotating body constituting these forming mechanisms is used. Since the hard coat and antireflection layer are formed, the antireflection film having the hard coat and the antireflection layer is continuously formed on the base sheet without interrupting the flow of the base sheet. Can do. Moreover, what is required for each forming mechanism is a rotating body, a firing part, and a cooling part, and these structures have a simpler structure than a conventional example of a plasma processing apparatus.

Here, in the present invention according to the antireflection film manufacturing apparatus, a first plasma irradiation mechanism for plasma-treating the surface of the base sheet is disposed on the upstream side of the first rotating body, and the first
It is preferable that a second plasma irradiation mechanism for plasma-treating the surface of the hard coat is disposed between the rotating body and the second rotating body.
In this invention concerning the manufacturing method of an antireflection film, before the hard coat formation step, a first plasma treatment step for plasma treatment is provided on the surface of the base sheet, and the hard coat formation step and the antireflection layer are provided. A configuration in which a second plasma processing step of performing plasma processing on the surface of the hard coat is provided between the forming step and the forming step.
In the invention of this configuration, since the surface of the base sheet is subjected to plasma treatment using the first plasma irradiation mechanism, the adhesion between the hard coat forming resin and the base sheet becomes strong, and the hard coat is applied to the surface of the base sheet. It becomes easy to form. Similarly, since the plasma treatment is performed on the surface of the hard coat using the second plasma irradiation mechanism, the adhesion between the hard coat and the resin for forming the antireflection layer becomes strong, and it is easy to form the antireflection layer on the surface of the hard coat. Become.

In this invention concerning the manufacturing apparatus of an anti-reflective film, the said 1st rotary body is provided with the 1st annular body by which the said resin for hard-coat formation is supplied to a surrounding surface, The said 2nd rotary body is the said anti-reflective layer. The structure provided with the 2nd annular body by which resin for formation is supplied to a surrounding surface is preferable.
In the invention of this configuration, each of the first rotating body and the second rotating body is an annular body,
The internal space of these rotating bodies can be used effectively. For this reason, by storing the components indispensable to the antireflection film manufacturing apparatus in the internal space of the rotating body, it is possible to save the space of the manufacturing apparatus itself.

The first firing part and the first cooling part are respectively disposed in the first annular body, and the second firing part and the second cooling part are respectively disposed in the second annular body. The configuration is preferable.
In the invention of this configuration, by storing the firing part and the cooling part in the internal space of the annular body, it is possible to save the space of the manufacturing apparatus, and is supplied from the inside of the annular body to the peripheral surface of the annular body. Hard coat forming resin and anti-reflective layer forming resin can be fired and cooled,
A baking process and a cooling process can be performed efficiently.

The first annular body and the second annular body preferably have a drum shape.
In the invention of this configuration, the structure of the ring body itself and the mechanism for rotating the ring body can be simplified.

A first pressing roller that presses the base sheet toward the first rotating body is provided on the opposite side of the first rotating body with the base sheet interposed therebetween, and the base sheet of the second rotating body is sandwiched between the first rotating body and the first rotating body. However, it is preferable that the opposite side is provided with a second pressing roller that presses the base sheet toward the second rotating body.
In the invention of this configuration, since the base sheet is sandwiched between the first rotating body and the first pressing roller, the hard coat can be sufficiently adhered to the base sheet. Moreover, since the base sheet having the hard coat formed on the surface is sandwiched between the second rotating body and the second pressing roller, the antireflection layer can be sufficiently adhered on the hard coat.

It is preferable that at least one of the first supply unit and the second supply unit is an ink jet type.
In the invention of this configuration, the coating amount of the hard coat forming resin and the antireflection layer forming resin supplied to the peripheral surface of the rotating body can be precisely controlled. It can be managed well. Therefore, it is more preferable that both the first supply unit and the second supply unit be an ink jet system.

In the invention relating to the method for producing an antireflection film, the hard coat forming resin preferably includes a coating composition containing at least the following “component A” and “component B”. Here, “component A” is a metal oxide fine particle containing titanium oxide having a rutile crystal structure, and “component B” is an organic silicon compound represented by the general formula, R ¹ SiX ¹ ₃ [wherein ,
R ¹ represents an organic group having 2 or more carbon atoms having a polymerizable reactive group, and X ¹ represents a hydrolyzable group. ]
It is.
The antireflection layer molding resin includes a coating composition containing at least the following “C component”, “D component”, and “E component”, and is 0.10 or more lower than the refractive index of the hard coat. It preferably has a refractive index. Here, “C component” is a general formula, X _m R ² _3-m S
_{^{i-Y-SiR 2 3-}} m X organosilicon compound represented by _m [R ² is a monovalent hydrocarbon group having 1 to 6 carbon atoms. Y is a divalent organic group containing one or more fluorine atoms. X is a hydrolyzable group. m is 1-3
Is an integer. The “D component” is an epoxy group-containing organic compound containing one or more epoxy groups in the molecule, and the “E component” is silica-based fine particles having an average particle diameter of 1 to 150 nm.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.
A first embodiment of the present invention is shown in FIGS. FIG. 1 is a front view showing an outline of a production apparatus for an antireflection film according to the first embodiment, and FIG. 2 is a plan view showing an outline of the production apparatus for a reflection film.
1 and 2, the antireflection film manufacturing apparatus includes a hard coat forming mechanism 10 that forms a hard coat 2 on a base sheet 1 that is fed in one direction, and a base sheet of the hard coat forming mechanism 10. This is a configuration provided with an antireflection layer forming mechanism 20 that is arranged on the hard coat forming mechanism 10 on the downstream side in the feed direction and that forms the antireflection layer 3 on the hard coat 2.

The base sheet 1 has a predetermined belt shape, and is configured to be fed from a supply roll (not shown) and transferred in the longitudinal direction (right side in FIG. 1).
The substrate sheet 1 in this embodiment may be a transparent sheet, and the material is
For example, triacetyl cellulose, diacetyl cellulose, acetate butyrate cellulose, polyether sulfone, polyacrylic resin, polyurethane resin, polyester, polycarbonate, polysulfone, polyether, trimethylpentene, polyetherketone, (meth) acrylonitrile, etc. Among these, uniaxial or biaxially stretched polyester, particularly polyethylene terephthalate (PET), is preferable because it is excellent in transparency and heat resistance and has no optical anisotropy.

The hard coat forming mechanism 10 includes a first rotating body 11 disposed to face the base sheet 1, a first supply unit 12 that supplies a hard coat forming resin to the peripheral surface of the first rotating body 11, 1
A first baking unit 13 for baking the hard coat forming resin supplied by the supply unit 12;
A first cooling unit 14 that cools the hard coat forming resin baked by the baking unit 13, and the hard coat forming resin cooled by the first cooling unit 14 is transferred to the surface of the base sheet 1. A hard coat 2 is formed.
The first rotating body 11 includes a first annular body 111 to which a hard coat forming resin is supplied to the peripheral surface,
The rotary drive mechanism 112 is configured to rotate the first annular body 111.

The first annular body 111 has a drum shape and is made of a metal having high thermal conductivity, for example, titanium. The peripheral surface of the first annular body 111 is mirror-finished or the like.
The dimension between the circumferential surface of the first annular body 111 and the upper surface of the base sheet 1 is equivalent to the thickness dimension of the hard coat 2.
The rotation drive mechanism 112 is disposed on the inner periphery of the first annular body 111 and is formed on a plurality of guide rolls 1111 that rotatably support the first annular body 111, and on one end surface of the first annular body 111. A gear mechanism 1112 meshed with the gear portion 111A and a motor 1113 coupled to the gear mechanism 1112 are provided, and the first annular body 111 is shown in FIG. 1 via the gear mechanism 1112 as the motor 1113 rotates. It is rotated counterclockwise.
Both ends of the guide roll 1111 protrude from the end face of the first annular body 111, and these protruding portions are rotatably supported by a frame (not shown).
The gear mechanism 1112 includes a plurality of gears.

The first supply unit 12 is disposed above the first annular body 111, and includes a nozzle 121 in which a hard coat forming resin is housed and a drive unit (not shown) that controls the discharge operation of the nozzle 121. ing. This drive unit is of an ink jet type, and for example, a hard coat forming resin is ejected from the nozzle 121 using a heating element or a piezoelectric element. The nozzle 121 is formed in a substantially long shape along the axial direction of the first annular body 111.
The first firing unit 13 heats a substantially right-angled range extending from the upper part of the first annular body 111 to the horizontal part, and is disposed on the upper side inside the first annular body 111. This 1st baking part 13 is comprised from the nichrome wire heater, the planar heater, and another heating apparatus.
The temperature of the first firing section 13 is set so that the firing temperature of the hard coat forming resin is 50 to 250 ° C., preferably 80 to 150 ° C.
The first cooling unit 14 cools a substantially right angle range extending from the horizontal part to the lower part of the first annular body 111, and is disposed inside the first annular body 111 and below the first firing part 13. . First
The cooling unit 14 has a configuration in which a coolant such as cold water is circulated in the casing and the cooling air as the first.
It is possible to employ a configuration in which the inside of the annular body 111 is sprayed.
The cooling temperature of the first cooling unit 14 is set so that the hard coat forming resin is lowered to 50 to 20 ° C.

The hard coat forming resin used in this embodiment is at least the following “component A” and “B
A coating composition containing "component" is included.
"A component"; metal oxide fine particles "B component" containing titanium oxide having a rutile crystal structure; general formula, an organic silicon compound represented by R ¹ SiX ¹ ₃ wherein, R ¹ is polymerizable An organic group having 2 or more carbon atoms having a reactive group, and X ¹ represents a hydrolyzable group. ]
Examples of the “component A” include, for example, an average particle diameter of 1 to 200 including a composite oxide having a rutile crystal structure composed of titanium oxide and tin oxide, or titanium oxide, tin oxide and silicon oxide.
nm of can be mentioned inorganic oxide particles, "B component", the general formula: R ¹ SiX ¹ ₃ with an organic silicon compound represented by (wherein the number of carbon atoms R ¹ is having a polymerizable reactive group 2 or more organic groups, and X ¹ represents a hydrolyzable group).
The hard coat 2 is required to have a high refractive index comparable to that of a high refractive index substrate sheet for the purpose of suppressing interference fringes. In order to cope with the increase in the refractive index of the hard coat 2, a method using inorganic oxide fine particles having a high refractive index is generally used. Specifically, Al, Sn, Sb, Ta, CE,
It is composed of an oxide of one or more metals selected from La, FE, Zn, W, Zr, In, and Ti (including a mixture thereof) and / or a composite oxide containing two or more metals. Colorless and transparent inorganic oxide fine particles are used. Of these, inorganic oxide fine particles containing titanium oxide are generally used from the viewpoints of refractive index, transparency, dispersion stability, and the like.

In this embodiment, it is preferable to use a metal oxide containing titanium oxide having a rutile-type crystal structure. By using metal oxide fine particles containing titanium oxide having a rutile-type crystal structure, various problems caused by the photoactivity of titanium oxide can be improved. It is possible to improve the weather resistance and light resistance by replacing the crystal structure of the metal oxide containing titanium oxide with the rutile type instead of the anatase type, and the refractive index of the rutile type crystal is higher than that of the anatase type crystal. Therefore, inorganic oxide fine particles having a relatively high refractive index can be obtained.

Titanium oxide with rutile crystal structure is anatase-type titanium oxide.
Unlike photocatalytic activity, it is active when it receives energy, and has the property of decomposing organic matter due to its strong oxidative degradation power. Such photoactivity is low. This is because, when irradiated with light (ultraviolet rays), electrons in the valence band of titanium oxide are excited to form OH free radicals and HO ₂ free radicals, which decompose organic substances by this strong oxidizing power. This is because rutile type titanium oxide is more stable in terms of thermal energy, and the amount of free radicals produced is extremely small. Therefore, since the hard coat containing titanium oxide having a rutile crystal structure is excellent in weather resistance and light resistance, there is no possibility that the antireflection layer composed of the organic thin film is altered by the hard coat, and the weather resistance and A plastic lens with excellent light resistance can be obtained.

Although several methods for obtaining titanium oxide having a rutile-type crystal structure are conceivable, it is preferable to use a composite oxide with tin oxide and a composite oxide with addition of silicon oxide. If you make a composite oxide of tin oxide, the amount of titanium oxide and tin oxide contained in the inorganic oxide fine particles, in terms of titanium oxide TiO _2, when converted to tin oxide SnO _2, TiO ₂ / S
It is desirable that the weight ratio of nO _{2 is in} the range of 1/3 to 20/1, preferably 1.5 / 1 to 13/1.
When the amount of SnO ₂ is made smaller than the range of the above weight ratio, the crystal structure shifts from the rutile type to the anatase type, resulting in a mixed crystal containing the rutile type crystal and the anatase type crystal.
Or it becomes an anatase type crystal. Further, when the amount of SnO ₂ is made larger than the above range of the weight ratio, a rutile crystal structure that is intermediate between a rutile crystal of titanium oxide and a rutile crystal of tin oxide is formed, so-called a rutile type of titanium oxide. A crystal structure different from that of the crystal is exhibited, and the refractive index of the obtained inorganic oxide fine particles is also lowered.

In addition, when adding a composite oxide with tin oxide and further adding a silicon oxide,
The amount of titanium oxide, tin oxide, and silicon oxide contained in the inorganic oxide fine particles is TiO ₂ when titanium oxide is converted to TiO ₂ , tin oxide is converted to SnO ₂ , and silicon oxide is converted to SiO _2. The weight ratio of ₂ / SnO _{2 is in} the range of 1/3 to 20/1, preferably 1.5 / 1 to 13/1, and the weight ratio of (TiO ₂ + SnO ₂ ) / SiO ₂ is 55/45. It is desirable that it is in the range of 99/1, preferably 70/30 to 98/2.
The content of SnO ₂ is the same as that when adding a composite oxide with tin oxide,
By containing silicon oxide, the stability and dispersibility of the resulting inorganic oxide fine particles can be improved. Here, if the amount of SiO ₂ is made smaller than the range of the above weight ratio, the stability and dispersibility deteriorate. Further, when the amount of SiO ₂ is increased from the above weight ratio range, the stability and dispersibility are further improved, but the refractive index of the resulting inorganic oxide fine particles is lowered, which is not preferable. However, free radicals are also generated in this rutile titanium oxide. The same applies to the case where inorganic oxide fine particles containing two or more composite oxides containing titanium oxide are used as the inorganic oxide fine particles containing titanium oxide.

In FIG. 1, the antireflection layer forming mechanism 20 includes a second rotating body 21 disposed to face the base sheet 1 and a second supply for supplying an antireflection layer forming resin to the peripheral surface of the second rotating body 21. Part 22, and a second baking part 23 for baking the antireflection layer forming resin supplied by the second supply part 22,
A second cooling unit 24 that cools the anti-reflective layer forming resin baked by the second baking unit 23, and the anti-reflection layer forming resin cooled by the second cooling unit 24 is the hard coat 2. The antireflection layer 3 is formed by transferring to the surface.
The second rotating body 21 includes a second annular body 211 to which the antireflection layer forming resin is supplied to the peripheral surface, and a rotation driving mechanism 112 that rotationally drives the second annular body 211.

The second annular body 211 has the same shape and structure as the first annular body 111, and its peripheral surface is mirror-finished or the like.
The dimension between the peripheral surface of the second annular body 211 and the upper surface of the hard coat 2 is equivalent to the thickness dimension of the antireflection layer 3.

The second supply unit 22 is disposed above the first annular body 211, and includes a nozzle 221 in which an antireflection layer forming resin is housed, and a drive unit (not shown) that controls the discharge operation of the nozzle 221. I have. This drive unit employs an inkjet method. The nozzle 221 is formed in a substantially long shape along the axial direction of the second annular body 211.
The second firing part 23 heats a substantially right-angled range extending from the upper part of the second annular body 211 to the horizontal part, and is disposed on the upper side inside the second annular body 211. The second firing part 23 has the same structure as the first firing part 13.
The second cooling unit 24 cools a substantially right angle range extending from the horizontal part to the lower part of the second annular body 211, and is disposed inside the second annular body 111 and below the second firing part 13. . Second
The cooling unit 24 has the same structure as the first cooling unit 14.

The antireflection layer forming resin used in this embodiment is at least the following “C component” and “D component”.
And a coating composition containing the “E component”, and has a refractive index lower by 0.10 or more than the refractive index of the hard coat.
“Component C”; an organosilicon compound represented by the general formula, X _m R ² _3-m Si—Y—SiR ² _3-m X _m [R ² is a monovalent hydrocarbon group having 1 to 6 carbon atoms. Y is a divalent organic group containing one or more fluorine atoms. X is a hydrolyzable group. m is an integer of 1-3. ]
“D component”; an epoxy group-containing organic compound containing at least one epoxy group in the molecule “E component”; silica-based fine particles having an average particle diameter of 1 to 150 nm The “D component” is represented by the general formula R ³ nR ⁴ pSiZ. _{4- [n + p]} [R ³ and R ⁴ have 1 to 16 carbon atoms _]
At least one of which contains an epoxy group. Z is a hydrolyzable group. n and p are 0 to 0
An integer of 2 and 1 ≦ n + p ≦ 3. And at least one compound selected from the compounds represented by the following general formula (1).

  Specific examples of “C component” include the following.

The “C component” is contained in the range of 60 to 99% by weight, preferably in the range of 60 to 90% by weight, based on the total amount of the resin component in the coating material composition forming the antireflection layer. For this reason, the chemical resistance of the film by the organosilicon compound of “C component” can be improved.
Moreover, an appropriate thing can be used as an epoxy group containing organic compound which contains one or more epoxy groups in the molecule | numerator which is a "D component." In the composition, it is preferably contained in the range of 5 to 20% by weight based on the total amount of the resin component, and if it is less than this range, the crack resistance of the coating and the adhesion to the hard coat can be sufficiently improved. In addition, if the amount is larger than this range, the wear resistance of the coating may be lowered.
The epoxy group-containing organic compound is preferably a general formula R ³ nR ⁴ pSiZ <sub>4- [n
+ P]</sub> [R ³ and R ⁴ are each an organic group having 1 to 16 carbon atoms, and at least one of them includes an epoxy group. Z is a hydrolyzable group. n and p are integers of 0 to 2, and 1 ≦ n + p ≦ 3. ] And a compound selected from compounds represented by the following general formula (1) are used, and one or more of these compounds can be used. In this case, the crack resistance can be further improved without reducing the chemical resistance and wear resistance of the coating. The total content of these compounds is preferably in the range of 1 to 20% by weight with respect to the total amount of the resin components, and if this content is too small, the crack resistance may not be sufficiently improved. If this content is excessive, chemical resistance and wear resistance may be reduced.

The compound represented by the general formula R ³ nR ⁴ pSiZ _{4- [n + p]} is appropriately selected according to the purpose such as adhesion to the substrate, hardness and low reflectivity of the resulting coating film, and the life of the composition. For example, glycidoxymethyltrimethoxysilane, glycidoxymethyltriethoxysilane, α-glycidoxyethyltrimethoxysilane, α-glycidoxyethyltriethoxysilane, β-glycidoxyethyltri Ethoxysilane, β-glycidoxypropyltrimethoxysilane, α-glycidoxypropyltrimethoxysilane, α-glycidoxypropyltriethoxysilane, β-glycidoxypropyltriethoxysilane, γ-glycidoxypropyltri Methoxysilane, (3,4-epoxycyclohexyl) methyltrimethoxysilane, γ-glycidoxypropi Examples include ruvinyldiethoxysilane, γ-glycidoxypropylphenyldiethoxysilane, and δ- (3,4-epoxycyclohexyl) butyltriethoxysilane.
In the compound represented by the general formula (1), R ^{5 to} R ¹⁶ in the formula can include an organic group such as an appropriate hydrocarbon group such as a methyl group. In addition, at least one of R ^{5 to} R ¹⁶ includes an epoxy group, and examples thereof include those having the following structure.

Specific examples of the compound represented by the general formula (1) include those shown below, for example.

Further, as the epoxy group-containing organic compound of the general formula R ³ nR ⁴ pSiZ _{4- [n + p],}
In addition to those represented by the general formula (1), an appropriate epoxy compound can also be used. Examples of such epoxy compounds include those shown below.

Examples of the silica-based fine particles of “E component” include silica sol in which silica-based fine particles having an average particle diameter of 1 to 150 nm are colloidally dispersed in a dispersion medium composed of water, alcohol or other organic solvent. Can do. In order to reduce the refractive index, for example, it is preferable to use a silica sol made of silica-based fine particles in which cavities or voids are formed. By including a gas or solvent having a refractive index lower than that of silica in the internal cavity of the silica-based fine particle, the refractive index is further reduced as compared with the silica-based fine particle having no cavity, and the refractive index of the antireflection layer is lowered. Achieved.

Silica-based fine particles having cavities therein can be produced by the method described in JP-A-2001-233611. However, in the present invention, the average particle diameter is in the range of 20 to 150 nm and the refractive It is desirable to use one having a rate in the range of 1.16 to 1.39. When the average particle diameter of the particles is less than 20 nm, the porosity inside the particles becomes small, and a desired low refractive index cannot be obtained. On the other hand, if the average particle diameter exceeds 150 nm, the haze of the organic thin film increases, which is not preferable. As the silica-based fine particles having internal cavities as described above, a dispersion sol containing hollow silica fine particles having an average particle diameter of 20 to 150 nm and a refractive index of 1.16 to 1.39 (
Catalyst Chemical Industry Co., Ltd., through rear, and recum)).

Further, in the coating material composition of the antireflection layer 3, it is possible to use other fine particles in addition to the “E component” as fine particles. The total amount of the fine particles added is not particularly limited in the weight ratio with the other resin components, but the fine particles / other components (solid content) = 80/20 to 10/90. It is preferable to set, more preferably 50/50 to 15/85. If there are more fine particles than 80, the mechanical strength of the cured film obtained by the coating material composition may be reduced. Conversely, if the number of hollow fine particles is less than 10, the effect of developing the low refractive index of the cured film is reduced. There is a fear.

In addition to the above components, organosilicon compounds that can be used in the coating composition of the antireflection layer include silicates such as tetraethoxysilane, methyltrimethoxysilane,
Alkylsilanes such as hexyltrimethoxysilane, decyltrimethoxysilane, phenylsilanes such as phenyltrimethoxysilane, γ-aminopropyltriethoxysilane,
Examples thereof include various compounds such as silane coupling agents such as γ-mercaptopropyltrimethoxysilane.
These organosilicon compounds are preferably 20% by weight or less based on the total amount of the resin components. If this content is excessive, the crack resistance of the film may be reduced, or the hydrophilicity may be increased and the chemical resistance may be reduced.

As other organosilicon compounds, a general formula RF-SiX ₃ [RF is a monovalent organic group containing one or more fluorine atoms. X is a hydrolyzable group. It is also possible to contain a fluorinated alkyl group-containing alkoxysilane represented by the formula: When such a thing is contained, the refractive index of the film formed can be further reduced.
In the general formula RF-SiX ₃ , the number of fluorine atoms in RF is 3 to 25, especially 3
17 is preferable. Of these, the following structural units are particularly preferred because they do not contain a polar moiety.
CF ₃ C ₂ H ₄ −
CF ₃ (CF ₂ ) ₃ C ₂ H ₄ −
CF ₃ (CF ₂ ) ₇ C ₂ H ₄ −

Moreover, X which is a hydrolyzable group can be made the same as that in the above “C component”.
Examples of such fluorinated alkyl group-containing alkoxysilanes represented by the general formula RF-SiX ₃ include those shown below.
_{CF 3 C 2 H 4 -Si (} OCH 3) 3
_{CF 3 (CF 2) 3 C} 2 H 4 -Si (OCH 3) 3
_{CF 3 (CF 2) 7 C} 2 H 4 -Si (OCH 3) 3
The content of the fluorinated alkyl group-containing alkoxysilane represented by the general formula RF-SiX ₃ and its hydrolyzate (partially hydrolyzed product) is adjusted as appropriate, but as the added amount increases, the scratch resistance of the coating decreases. Therefore, the content is preferably in the range of 1 to 30% by weight, particularly preferably 10% by weight or less, based on the total amount of the resin components in the composition.
Other organosilicon compounds include dialkylsiloxy hydrolyzable organosilanes represented by the following general formula.

Examples of such dialkylsiloxy hydrolyzable organosilanes include those having the structures shown below.

Furthermore, the coating composition constituting the antireflection layer may contain a small amount of the above-mentioned curing catalyst, photopolymerization initiator, acid generator, surfactant, antistatic agent, ultraviolet absorber, antioxidant as necessary. Addition of light stabilizers such as hindered amines and hindered phenols, disperse dyes, oil-soluble dyes, fluorescent dyes, pigments, etc., can improve the coating properties of coating liquids and improve the film performance after curing .

In FIG. 1, a first plasma irradiation mechanism 15 that performs plasma processing on the surface of the base sheet 1 is disposed on the upstream side of the first rotating body 11, and between the first rotating body 11 and the second rotating body 21. A second plasma irradiation mechanism 25 that plasma-treats the surface of the hard coat 2 is disposed.
These plasma irradiation mechanisms 15 and 25 are each composed of an atmospheric pressure plasma processing apparatus. In this embodiment, an ultraviolet irradiation mechanism such as a low-pressure mercury lamp or an excimer lamp may be used instead of the plasma irradiation mechanism.
A first pressing roller 16 that presses the base sheet 1 toward the first rotating body 11 is provided on the opposite side of the first rotating body 11 across the base sheet 1.
The first pressing roller 16 includes a support shaft 161 fixed to a frame (not shown), and a roll body 162 that is rotatably provided on the support shaft 161.
The roll main body 162 is formed in a substantially cylindrical shape from an appropriate material such as rubber or metal.
On the opposite side of the second rotating body 211 across the base sheet 1, the base sheet 1 is placed on the second rotating body 211.
A second pressing roller 26 that presses to the side is provided.
The second pressing roller 26 includes a support shaft 261 fixed to a frame (not shown), and a roll body 262 that is rotatably provided on the support shaft 261. Roll body 262
Is formed from the same material and the same shape as the roll body 162.

Next, the manufacturing method of the antireflection film of the first embodiment will be described.
[First plasma treatment step]
Plasma treatment is performed on the surface of the base sheet 1 fed in one direction by the first plasma irradiation mechanism 15. Thereby, the adhesiveness of the surface of the base material sheet 1 becomes favorable.
[Hard coat forming process]
The first annular body 111 rotates in correspondence with the base sheet 1, and the hard coat forming resin is supplied from the first supply unit 12 to the peripheral surface of the first annular body 111. The hard coat forming resin adheres to the peripheral surface of the first annular body 111 with a predetermined thickness, and this resin flows down from the first annular body 111 even if the first annular body 111 rotates due to its viscosity. It will not peel off.
When the hard coat forming resin attached to the peripheral surface of the first annular body 111 comes close to the first firing part 13, heat generated from the first firing part 13 is transmitted through the first annular body 111. Baked. Thereafter, when the first annular body 111 continues to rotate, the hard coat forming resin comes close to the first cooling section 14, and the cold air emitted from the first cooling section 14 is transmitted through the first annular body 111. As a result, the resin itself is cooled.
The cooled hard coat forming resin is transferred to the surface of the substrate sheet 1. At this time, the first
Since the back surface side of the base sheet 1 is pressed by the pressing roller 16, the hard coat forming resin is reliably transferred to the surface of the base sheet 1.

[Second plasma treatment step]
The hard coat forming resin is transferred to the base sheet 1 to form the hard coat 2, and the surface of the hard coat 2 is subjected to plasma treatment by the second plasma irradiation mechanism 25. Thereby, the adhesiveness of the surface of the hard coat 2 becomes good.
[Antireflection layer forming step]
The second annular body 211 is rotated corresponding to the base sheet 1, and the antireflection layer forming resin is supplied from the second supply unit 22 to the peripheral surface of the second annular body 211. The antireflection layer-forming resin adheres to the peripheral surface of the second annular body 211 with a predetermined thickness, and this resin flows down from the second annular body 211 even if the second annular body 211 rotates due to its viscosity. And will not peel off.
When the hard coat forming resin attached to the peripheral surface of the second annular body 211 comes close to the second firing part 23, heat generated from the second firing part 23 is transmitted through the second annular body 211. Baked. Thereafter, when the second annular body 211 continues to rotate, the antireflection layer forming resin comes close to the second cooling unit 24, and the cold air emitted from the second cooling unit 24 is the second.
The resin itself is cooled by being transmitted through the annular body 211.
The cooled antireflection layer forming resin is transferred to the surface of the hard coat 2. At this time, the second
Since the back surface side of the base sheet 1 is pressed by the pressing roller 26, the antireflection layer forming resin is reliably transferred to the surface of the hard coat 2.
[Cutting process]
The base sheet 1 on which the hard coat 2 and the antireflection layer 3 are formed is cut with a cutter in accordance with the shape of the final product to obtain an antireflection film.

Therefore, in the first embodiment, the following operational effects can be achieved.
(1) An antireflection film manufacturing apparatus was configured including the hard coat forming mechanism 10 for executing the hard coat forming step and the antireflection layer forming mechanism 20 for executing the antireflection layer forming step. Then, the hard coat forming mechanism 10 is provided with a first rotating body 11 disposed to face the base sheet 1 fed in one direction, and a first hard coat forming resin is supplied to the peripheral surface of the first rotating body 11. Supply section 12, first firing section 13 that fires the hard coat forming resin supplied by first supply section 12, and first cooling the hard coat forming resin that is fired by first firing section 13 The hard coat forming resin cooled by the first cooling unit is transferred to the surface of the base sheet 1 to form the hard coat 2. Similarly, the antireflection layer forming mechanism 20 includes a second rotating body 21 disposed opposite to the base sheet 1, and a second supply unit that supplies the antireflection layer forming resin to the circumferential surface of the second rotating body 21. 22, a second baking unit 23 for baking the antireflection layer forming resin supplied by the second supply unit 22, and a second cooling unit for cooling the antireflection layer forming resin baked by the second baking unit 23. The antireflection layer forming resin cooled by the second cooling unit 24 is transferred to the surface of the hard coat 2 to form the antireflection layer 3.
Accordingly, the fired hard coat composition is once cooled and then laminated on the base sheet 1. Similarly, the fired antireflection layer composition is once cooled and then laminated on the hard coat 2. Therefore, heat stress does not occur in the base sheet 1 and the quality of the product does not deteriorate. In addition, the first rotating body 1 rotating the firing and cooling of the hard coat composition
1 and the second anti-reflection layer composition is baked and cooled by the rotating second rotating body 21, so that it is not necessary to lengthen the production line and is a conventional plasma processing apparatus. Large equipment is also unnecessary.

(2) Since the first plasma irradiation mechanism 15 that plasma-treats the surface of the base sheet 1 is disposed on the upstream side of the first rotating body 11, the adhesion between the hard coat forming resin and the base sheet 1 is increased. It becomes strong and it becomes easy to form the hard coat 2 on the surface of the base sheet 1.
(3) Since the second plasma irradiation mechanism 25 for plasma-treating the surface of the hard coat 2 is disposed between the first rotary body 11 and the second rotary body 21, the hard coat 2 and the anti-reflection antifouling layer are formed. Adhesive strength with resin becomes strong and it becomes easy to form the antireflection layer 3 on the surface of the hard coat 2.

(4) The first rotating body 11 and the second rotating body 21 are respectively connected to the first annular body 111 and the second annular body 2.
Therefore, the space of the manufacturing apparatus itself can be saved by effectively using the internal space of these rotating bodies 11 and 21.
(5) The 1st baking part 13 and the 1st cooling part 14 are each accommodated in the inside of the 1st annular body 111,
Since the 2nd baking part 23 and the 2nd cooling part 24 are each accommodated in the inside of the 2nd annular body 211, resin for hard-coat formation and anti-reflective layer formation from these annular bodies 111,211 Can be fired and cooled, so that the firing process and the cooling process can be performed efficiently.

(6) Since the first annular body 111 and the second annular body 211 are each in the form of a drum, it is easy to manufacture the annular bodies 111 and 211 themselves, and the annular bodies 111 and 211 are driven to rotate. The rotation drive mechanism 112 can also adopt a simple structure.
(7) The base material sheet 1 is placed on the opposite side of the first annular body 111 across the base material sheet 1.
Since the 1st press roller 16 which presses to 11 side is provided, it becomes the structure by which the base material sheet 1 is clamped by the 1st annular body 111 and the 1st press roller 16, and the hard-coat 2 is made into the base material sheet 1
Can be sufficiently adhered to.
(8) On the opposite side of the second annular body 211 across the base sheet 1, the base sheet 1 is placed on the second annular body 2.
Since the second pressing roller 26 that presses toward the 11th side is provided, the base sheet 1 on which the hard coat 2 is formed is sandwiched between the second annular body 211 and the second pressing roller 26, and the hard sheet 2 is hardened. The antireflection layer 3 can be sufficiently adhered on the coat 2.

(9) Since the 1st supply part 12 and the 2nd supply part 22 are ink jet types, respectively, application | coating of the resin for hard coat formation and the resin for antireflection layer supply supplied to the surrounding surface of the annular bodies 111 and 211 It is possible to accurately control the film thickness of the hard coat 2 and the antireflection layer 3 by precisely controlling the amount. In particular, since the ink jet method is excellent in controlling a small amount of discharge, it is suitable for reducing the thickness of the hard coat 2 and the antireflection layer 3.

Next, a second embodiment of the present invention will be described with reference to FIGS.
The second embodiment is different from the first embodiment in the configuration of the driving mechanism of the annular bodies 111 and 211, and the other configurations are the same as those in the first embodiment. Here, in the description of the second embodiment, the same components as those of the first embodiment are denoted by the same reference numerals, and description thereof is omitted.
FIG. 3 is a cross-sectional view schematically illustrating an apparatus for producing an antireflection film according to a second embodiment of the present invention, and FIG. 4 is a plan view schematically illustrating an apparatus for producing a reflective film.
3 and 4, the first annular body 111 and the second annular body 211 are connected to the rotation drive mechanism 212, respectively.

The rotational drive mechanism 212 of the second embodiment includes a disk-shaped end plate 2121 provided at one end of the first annular body 111, and the center of the end plate 2121 is penetrated and fixed, and is rotatable on a frame (not shown). A rotation shaft 2122 provided; a gear mechanism 1112 connected to one end of the rotation shaft 2122; and a motor 1113 connected to the gear mechanism 1112.
As the motor 1113 rotates, the first annular body 111 is rotated counterclockwise in FIG. 3 via the gear mechanism 1112.
The manufacturing method of the antireflection film in the second embodiment is the same as the manufacturing method of the first embodiment.
Therefore, in the second embodiment, the same effects (1) to (9) can be achieved as in the first embodiment.

Next, a third embodiment of the present invention will be described with reference to FIGS.
The second embodiment is different from the first embodiment in the configuration of the rotating body, and the other configurations are the same as those in the first embodiment. Here, in the description of the third embodiment, the same components as those of the first embodiment are denoted by the same reference numerals, and description thereof is omitted.
FIG. 5 is a front view showing an outline of a production apparatus for an antireflection film according to a third embodiment of the present invention, and FIG. 6 is a plan view showing an outline of the production apparatus for a reflection film.
5 and 6, the first rotating body 31 of the third embodiment includes a first belt 311 to which the hard coat forming resin is supplied to the peripheral surface, and a rotational drive that rotationally drives the first belt 311. Mechanism 3
12.

The first belt 311 is made of a metal having high thermal conductivity, for example, titanium, and its peripheral surface is mirror-finished.
The rotation drive mechanism 312 is disposed opposite to each other on both sides of the inner periphery of the first belt 311 and is driven by the drive shaft 31.
3 and a driven shaft 314, and a belt mechanism 315 that rotationally drives the drive shaft 313. The peripheral surfaces of the drive shaft 313 and the driven shaft 314 are meshed with the inner peripheral surface of the first band 311.

The driven shaft 314 is disposed on the upstream side of the moving shaft 313 in the flow direction of the base sheet 1, and the driven shaft 314 has a larger diameter than the drive shaft 313. In the first band 311 meshed with the driven shaft 314 and the drive shaft 313, the portion facing the first supply unit 12 is substantially horizontal, and the portion facing the base sheet 1 is the longitudinal length of the base sheet 1. Base sheet 1 according to direction
It is supposed to be separated from.
A first firing unit 13 and a first cooling unit 14 are housed inside the first belt 311, respectively. The first firing unit 13 is located directly below the first supply unit 12, and the first cooling unit 14. Is the first firing section 13.
The base sheet 1 is located upstream in the flow direction.

The second rotating body 32 includes a second belt body 321 to which the antireflection layer forming resin is supplied to the peripheral surface, and a rotation driving mechanism 312 that rotationally drives the second belt body 321.
The second band 321 is made of the same material as the first band 311, and the second firing part 23 and the second cooling part 24 are accommodated therein. The second firing unit 23 is located immediately below the second supply unit 23, and the second cooling unit 24 is located upstream of the second firing unit 23 in the flow direction of the base sheet 1.
The manufacturing method of the antireflection film in the third embodiment is the same as the manufacturing method of the first embodiment.

Therefore, in 3rd Embodiment, there can exist the following effect besides the effect similar to (1)-(5) (7)-(9) of 1st Embodiment.
(10) The first rotating body 31 includes a first belt 311 in which a hard coat forming resin is supplied to the peripheral surface.
And a rotation drive mechanism 312 that rotationally drives the first belt body 311.
By setting the length in the horizontal direction of the upper surface of the band 311 to be long, the hard coat forming resin can be placed on the first band 311 in a stable posture, and the firing and cooling time is sufficient. Can be taken. Moreover, since the first belt 311 is flattened along the horizontal direction, the height of the first rotating body 31 can be reduced, and the maintenance work of the apparatus is easy.
(11) Since the second rotating body 32 adopts the same configuration as that of the first rotating body 31, the antireflection forming resin can be placed on the second band 321 in a stable posture and fired and cooled. Can take enough time.

It should be noted that the present invention is not limited to the above-described embodiments, and modifications, improvements, and the like within the scope that can achieve the object of the present invention are included in the present invention.
For example, in the above-described embodiment, the first supply unit 12 and the second supply unit 22 employ the inkjet method, but in the present invention, either the first supply unit 12 or the second supply unit 22 is inkjet. Alternatively, a system that pressurizes the inside of the nozzles 131 and 231 with a rotary pump may be used instead of the ink jet system.
Furthermore, in the embodiment, the antireflection layer 3 is formed as a single layer. However, in the present invention, a multilayer structure having a low refractive index and a high refractive index may be used. In this case, a plurality of second rotating bodies 21 and 32 are prepared, and different antireflection layers are alternately formed from these second rotating bodies 21 and 32.

The present invention can be used for an antireflection film provided on a display such as a touch panel, a television, and a personal computer.

The front view which shows the outline of the manufacturing apparatus of the antireflection film concerning 1st Embodiment of this invention. The top view which shows the outline of the manufacturing apparatus of the reflective film concerning 1st Embodiment. Sectional drawing which shows the outline of the manufacturing apparatus of the antireflection film concerning 2nd Embodiment of this invention. The top view which shows the outline of the manufacturing apparatus of the reflective film concerning 2nd Embodiment. The front view which shows the outline of the manufacturing apparatus of the antireflection film concerning 3rd Embodiment of this invention. The top view which shows the outline of the manufacturing apparatus of the reflective film concerning 3rd Embodiment.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Base material sheet, 2 ... Hard coat, 3 ... Antireflection layer, 10 ... Hard coat formation mechanism,
DESCRIPTION OF SYMBOLS 11 ... 1st rotary body, 12 ... 1st supply part, 13 ... 1st baking part, 14 ... 1st cooling part, 15 ... 1st plasma irradiation mechanism, 16 ... 1st press roller, 20 ... Antireflection layer formation mechanism , 21 ... second rotating body, 22 ... second supply section, 23 ... second firing section, 24 ... second cooling section, 25 ... second plasma irradiation mechanism, 26 ... second pressing roller, 31 ... first rotating body 32 ... second rotating body, 111 ... first
Annular body, 112 ... Rotation drive mechanism, 211 ... Second annular body, 212 ... Rotation drive mechanism, 312 ...
Rotation drive mechanism

Claims (11)

A hard coat forming mechanism for forming a hard coat on a base sheet fed in one direction;
An antireflection layer forming mechanism that is disposed on the feeding direction side of the base sheet of the hard coat forming mechanism and forms an antireflection layer on the hard coat;
The hard coat forming mechanism is configured to supply a first rotating body disposed opposite to the base sheet, and a first supply for supplying a hard coat forming resin for forming the hard coat on a peripheral surface of the first rotating body. A first baking unit for baking the hard coat forming resin supplied by the first supply unit, and a first cooling unit for cooling the hard coat forming resin fired by the first baking unit. The hard coat forming resin cooled in the first cooling section is transferred to the surface of the base sheet to form a hard coat,
The antireflection layer forming mechanism includes a second rotating body arranged to face the base sheet, and the second rotating body.
A second supply part for supplying an organic antireflection layer forming resin for forming the antireflection layer on the peripheral surface of the rotating body, and firing the antireflection layer forming resin supplied by the second supply part And a second cooling part that cools the antireflection layer forming resin fired in the second baking part, and the antireflection layer forming resin cooled in the second cooling part includes An apparatus for producing an antireflection film, wherein an antireflection layer is formed by transfer onto the surface of the hard coat. In the manufacturing apparatus of the antireflection film according to claim 1,
A first plasma irradiation mechanism for plasma-treating the surface of the base sheet is disposed upstream of the first rotating body, and the surface of the hard coat is between the first rotating body and the second rotating body. An apparatus for producing an antireflection film, wherein a second plasma irradiation mechanism for plasma-treating is disposed. In the manufacturing apparatus of the antireflection film according to claim 1 or 2,
The first rotating body includes a first annular body in which the hard coat forming resin is supplied to a peripheral surface, and the second rotating body is a second in which the antireflection layer forming resin is supplied to the peripheral surface. An antireflection film manufacturing apparatus comprising an annular body. In the manufacturing apparatus of the antireflection film according to claim 3,
The first firing part and the first cooling part are respectively disposed in the first annular body, and the second firing part and the second cooling part are respectively disposed in the second annular body. An apparatus for producing an antireflection film, comprising: In the manufacturing apparatus of the antireflection film according to claim 4,
The said 1st annular body and the said 2nd annular body are drum shapes, respectively, The manufacturing apparatus of the antireflection film characterized by the above-mentioned. In the manufacturing apparatus of the antireflection film according to any one of claims 1 to 5,
A first pressing roller that presses the base sheet toward the first rotating body is provided on the opposite side of the first rotating body with the base sheet interposed therebetween, and the base sheet of the second rotating body is sandwiched between the first rotating body and the first rotating body. On the other side, a second anti-reflection film manufacturing apparatus is provided, wherein a second pressing roller for pressing the base sheet toward the second rotating body is provided. In the antireflection film manufacturing apparatus according to any one of claims 1 to 6,
At least one of said 1st supply part and said 2nd supply part is an inkjet type, The manufacturing apparatus of the antireflection film characterized by the above-mentioned. A hard coat forming step of forming a hard coat on a base sheet fed in one direction;
An antireflection layer forming step of forming an antireflection layer on the hard coat formed in the hard coat forming step,
The hard coat forming step supplies hard coat forming resin for forming the hard coat on the peripheral surface of the rotating first rotating body that is disposed opposite to the base sheet and rotates. Firing the resin for cooling, cooling the fired hard coat forming resin, and transferring the cooled hard coat forming resin to the surface of the base sheet,
The antireflection layer forming step supplies an organic antireflection layer forming resin for forming the antireflection layer on the peripheral surface of the rotating second rotating body that is disposed opposite to the base sheet. The antireflection layer forming resin is baked, the fired antireflection layer forming resin is cooled, and the cooled antireflection layer forming resin is transferred to the surface of the hard coat. The manufacturing method of the antireflection film characterized by including the process of forming. In the manufacturing method of the antireflection film according to claim 8,
Before the hard coat formation step, a first plasma treatment step is performed for performing plasma treatment on the surface of the base sheet, and the surface of the hard coat is provided between the hard coat formation step and the antireflection layer formation step. A method for producing an antireflection film, wherein a second plasma treatment step for plasma treatment is provided. In the manufacturing method of the antireflection film according to claim 8 or 9,
The method for producing an antireflection film, wherein the hard coat-forming resin includes a coating composition containing at least the following “component A” and “component B”.
"A component"; metal oxide fine particles "B component" containing titanium oxide having a rutile crystal structure; general formula, an organic silicon compound represented by R ¹ SiX ¹ ₃ wherein, R ¹ is polymerizable An organic group having 2 or more carbon atoms having a reactive group, and X ¹ represents a hydrolyzable group. ] In the manufacturing method of the anti-reflective film in any one of Claims 8-10,
The antireflection layer molding resin includes a coating composition containing at least the following “C component”, “D component”, and “E component”, and is 0.10 or more lower than the refractive index of the hard coat. A method for producing an antireflection film having a refractive index.
“Component C”; an organosilicon compound represented by the general formula, X _m R ² _3-m Si—Y—SiR ² _3-m X _m [R ² is a monovalent hydrocarbon group having 1 to 6 carbon atoms. Y is a divalent organic group containing one or more fluorine atoms. X is a hydrolyzable group. m is an integer of 1-3. ]
“D component”; an epoxy group-containing organic compound containing at least one epoxy group in the molecule “E component”; silica-based fine particles having an average particle diameter of 1 to 150 nm

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