JP2007248743A - Liquid crystal device and its manufacturing method, and electronic equipment - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To reduce water etc., entering a liquid crystal device. <P>SOLUTION: A first extension part 16A is in contact with a substrate surface of a TFT array substrate 10 of a seal material 52, i.e. a portion of a surface of a BSG film etc., constituting the top layer of a laminate structure 90 in a seal area 110a, which faces an insulating film. The first extension part 16A is in contact with the seal material 52 and laminate structure 90 while sandwiched between the seal material 52 and laminate structure 90 in an area of the seal area 110a which is close to an image display area 10a. The first extension part 16A as a portion of an inorganic alignment film 16 contacts the seal material 52 with contacting force larger than the contacting force with which the laminate structure 90 formed of the insulating film such as the BSG film in the seal area 110A contacts the seal material 52, so a counter substrate 20 and the TFT array substrate 10 can be bonded more strongly and entry of water etc., is reduced. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a liquid crystal device such as a liquid crystal panel used as a light valve of a liquid crystal projector, a manufacturing method thereof, and a technical field of an electronic apparatus such as a liquid crystal projector including such a liquid crystal device.

  In a liquid crystal panel which is an example of this type of liquid crystal device, a pair of substrates arranged so as to oppose each other are bonded to each other via a sealing material. The liquid crystal layer interposed between the substrates is sealed between the substrates by a sealing material, and a display region in which image display is performed is configured by driving the liquid crystal layer.

  On the other hand, in this type of liquid crystal device, the alignment mode of the liquid crystal molecules for regulating the alignment of the liquid crystal molecules is an alignment in which the liquid crystal molecules are twisted in a direction substantially parallel to the substrate surface and perpendicular to the substrate when no voltage is applied. A twisted nematic mode and a vertical alignment mode in which liquid crystal molecules are vertically aligned are known. Conventionally, the TN mode has been the mainstream from the viewpoint of reliability and the like, but since the vertical alignment mode has some excellent characteristics, the liquid crystal device of the vertical alignment mode has attracted attention.

In this type of liquid crystal device, when controlling the alignment of liquid crystal molecules in the vertical alignment mode, not only an organic vertical alignment film formed of an organic material such as polyimide but also an inorganic material such as SiO or SiO ₂ is obliquely deposited on the substrate. Inorganic vertical alignment films are used, and various technical developments for improving display performance have been carried out. For example, a technique is disclosed in which display defects such as uneven alignment that occur near the boundary of the outer peripheral edge of an inorganic vapor deposition film are reduced and display performance is improved (see, for example, Patent Document 1).
JP-A-2005-107408

  In a liquid crystal panel having an inorganic vertical alignment film which is an example of this type of liquid crystal device, an insulating film such as a pixel electrode made of ITO or the like formed on each uppermost layer of a pair of substrates or a boron-doped oxide film (BSG film) and the like When the sealing material is directly adhered, sufficient adhesion cannot be obtained, and foreign matter such as moisture enters the liquid crystal panel from the outside through the interface between the sealing material, the pixel electrode and the insulating film. Therefore, there is a problem in that each component such as a liquid crystal layer and an inorganic vertical alignment film formed inside the liquid crystal panel is deteriorated.

  On the other hand, since the adhesive force between the inorganic vertical alignment film and the sealing material is higher than the adhesive force between the sealing material, the pixel electrode, and the insulating film, an inorganic vertical alignment film is formed over the entire region where the sealing material is formed, and the seal It is also conceivable to directly bond the inorganic vertical alignment film formed on the entire region and the sealing material.

  However, the sealing property at the interface between the inorganic vertical alignment film and the sealing material is relatively lower than the interface with the sealing material and the pixel electrode, and foreign substances such as moisture are likely to enter the liquid crystal panel. Accordingly, there is a problem that it is difficult to suppress the deterioration of the display performance of the liquid crystal panel and increase the reliability of the liquid crystal panel simply by forming the inorganic vertical alignment film in the seal region in order to increase the adhesive force.

  Therefore, the present invention has been made in view of the above-described problems. For example, a liquid crystal device capable of increasing the adhesive force between substrates and suppressing the deterioration in display performance caused by the intrusion of foreign matters such as moisture, and the manufacture thereof. It is an object of the present invention to provide a method and an electronic device including such a liquid crystal device.

  In order to solve the above problems, a liquid crystal device according to a first aspect of the present invention includes a first substrate, a second substrate disposed so as to face the first substrate, the first substrate, and the second substrate. A liquid crystal layer sandwiched therebetween, a seal portion provided in a seal region located around a display region on the first substrate, and the first portion so as to partially overlap the seal portion in the seal region. A surface of at least one of the substrate and the second substrate that extends from the display region to the seal region on the substrate surface facing the liquid crystal layer, and that faces the substrate surface side of the seal portion. And an inorganic alignment film formed by depositing an inorganic material on the substrate surface by using oblique deposition.

  In the liquid crystal device according to the first aspect of the present invention, the first substrate and the second substrate sandwich a liquid crystal layer such as liquid crystal, for example, and are bonded to each other by the seal portion. A pixel region in which a plurality of pixels are arranged, that is, a display region in which an image is displayed is provided in a region inside the seal portion on the substrate surface of the first substrate. Here, it should be noted that the “substrate surface” of the present invention is a broad concept including both the surface of the substrate and the surface of the laminated structure formed on the substrate.

One of the first substrate and the second substrate has a drive circuit for driving a liquid crystal layer such as a liquid crystal molecule. Each of the first substrate and the second substrate has a pixel electrode and a counter electrode facing the pixel electrode, and applies a voltage to a liquid crystal layer such as liquid crystal molecules to display an image in the display region. A pixel electrode is formed on the substrate surface of the first substrate facing the liquid crystal layer, and a counter electrode is formed on the substrate surface of the second substrate facing the layer. In addition, on each of the substrate surfaces of the first substrate and the second substrate, a pixel electrode is formed of a material that is widely used as an inorganic material for forming an inorganic vertical alignment film such as SiO or SiO ₂ so as to cover these electrodes. And an inorganic alignment film formed by oblique deposition so as to cover the counter electrode. In the liquid crystal device according to the first aspect of the present invention, it is sufficient that at least one of the inorganic alignment films formed on each of the first substrate and the second substrate has an extending portion, as will be described later.

  Among these inorganic alignment films, at least one inorganic alignment film has an extending portion. The extending portion extends from the display region to the sealing region on the substrate surface facing the liquid crystal layer in the TFT array substrate that is the first substrate, for example, so as to partially overlap the sealing portion in the sealing region. And in contact with the surface of the seal portion facing the substrate surface. More specifically, the extending portion is partially formed in the sealing region by, for example, the surface of the insulating film that is the substrate surface of the first substrate and the surface that faces the surface of the insulating film in the sealing portion, that is, the lower surface. It will be sandwiched between. Here, “partially” means that the extending portion is in contact with a part of the lower surface of the sealing portion by extending the extending portion to the middle of the sealing region of the sealing portion. Therefore, the adhesive force in the region bonded to the inorganic alignment film on the lower surface of the seal portion becomes higher than the adhesive force in the region bonded to the insulating film, and the first substrate and the second substrate are connected via the seal portion. Can adhere firmly.

  Further, in order to further increase the adhesive force between the first substrate and the second substrate through the seal portion, the extending portion is formed of the inorganic alignment film formed on the respective substrate surfaces of the first substrate and the second substrate. It is preferable to be provided in both. More specifically, for example, on the substrate surface on the side facing the liquid crystal layer in the second substrate that is the counter substrate, the counter electrode is formed on the first substrate such as a TFT array substrate and is opposed to the pixel electrode. The electrode extends to the seal area. Such a counter electrode is made of a transparent material such as ITO, and an inorganic alignment film is formed so as to partially cover the counter electrode in the seal region. That is, the portion of the inorganic alignment film that partially covers the counter electrode in the seal region corresponds to the extending portion. Since the adhesive force between the counter electrode and the seal portion is low, the entire upper surface of the seal portion is bonded to the counter electrode by bonding a part of the upper surface that is the surface facing the liquid crystal layer in the extension portion and the seal portion. Compared to the case, it is possible to further strengthen the adhesion between the first substrate and the second substrate via the seal portion.

  Here, in order to bond the first substrate and the second substrate more firmly, the extending portion is preferably in contact with the entire seal region, that is, the entire lower surface of the seal portion. On the other hand, the adhesive force between the parts increases, but foreign substances such as moisture are likely to enter from the interface between the inorganic alignment film and the seal part. Therefore, in the liquid crystal device according to the first aspect of the present invention, by extending the extending portion to the middle of the sealing region, moisture or the like entering the inside of the device through the interface between the sealing portion and the substrate surface can be obtained. Reduce foreign matter. More specifically, since the extending portion extends, for example, to the middle of the sealing region on the first substrate, the extending portion is provided between the sealing portion and the surface of the insulating film constituting the substrate surface of the first substrate. Corresponding steps will be provided.

  According to such a step, it is possible to complicate the intrusion path through which foreign matters such as moisture enter, compared to the case where the entire lower surface of the seal portion is in contact with the extending portion. Foreign matter is less likely to enter the device. Thereby, it can suppress that the display performance of a liquid crystal device falls by foreign materials, such as a water | moisture content. Similarly, in the seal region, similarly to the inorganic alignment film formed on the first substrate, for example, if the inorganic alignment film formed on the second substrate is extended to the middle of the seal region, Compared with the case where the entire portion extending to the seal region is in contact with the entire top surface of the seal portion, foreign substances such as moisture entering the apparatus can be reduced.

  Therefore, according to the liquid crystal device according to the first aspect of the present invention, the first substrate such as the TFT array substrate and the second substrate such as the counter substrate can be firmly bonded to each other through the seal portion. Foreign matter such as moisture entering the water can be reduced. Therefore, according to the liquid crystal device according to the first aspect of the present invention, it is possible to reduce the deterioration of the liquid crystal and the like due to the intrusion of moisture and the like, and it is possible to suppress the deterioration of the display performance. Thereby, the display quality of the liquid crystal device can be maintained for a long time, and a highly reliable liquid crystal device can be provided.

  In order to solve the above problems, a liquid crystal device according to a second aspect of the present invention includes a first substrate, a second substrate disposed so as to face the first substrate, and the first substrate and the second substrate. A liquid crystal layer sandwiched therebetween, a seal portion provided in a seal region located around a display region on the first substrate, and the first portion so as to partially overlap the seal portion in the seal region. The substrate surface on the side facing the liquid crystal layer of at least one of the substrate and the second substrate extends from the seal region to a region outside the seal region, and the substrate surface side of the seal portion And an inorganic film that is the same film as the inorganic alignment film formed by vapor-depositing an inorganic material on the substrate surface using an oblique vapor deposition method.

In the liquid crystal device according to the second aspect of the present invention, an inorganic film that is the same film as the inorganic alignment film is provided on the surface of at least one of the first substrate and the second substrate separately from the inorganic alignment film. It is characterized in that The inorganic film extends from the seal region to the region outside the seal region, for example, on the substrate surface of the first substrate facing the liquid crystal layer so as to partially overlap the seal portion in the seal region, and the seal In contact with the surface facing the substrate surface side. More specifically, since the inorganic film partially overlaps the seal portion in the seal region, the inorganic film is in contact with a part of the surface facing the substrate surface side in the seal portion in the seal region. According to such an inorganic film, similarly to the above-described liquid crystal device, a step is provided between the seal portion and the substrate surface according to the thickness of the inorganic film. Therefore, compared with the case where the surface facing the substrate surface side in the seal portion, that is, the entire lower surface that is the surface facing the first substrate in the seal portion is in contact with the inorganic film, the intrusion path of foreign matters such as moisture is complicated. And intrusion of moisture and the like can be reduced. In addition, the adhesion strength between the inorganic film and the seal portion, which is the same as the inorganic alignment film formed by oblique deposition of an inorganic material such as SiO or SiO _{2, is} such as an insulating film constituting the substrate surface of the first substrate. Since the adhesion strength between the surface and the seal portion is higher, it is possible to bond the first substrate and the second substrate more firmly through the seal portion.

  The inorganic film is formed, for example, by removing a portion extending to the seal region from a deposited film formed by depositing an inorganic material on the substrate surface. At this time, a portion extending to the seal region in the deposited film is an inorganic alignment film. Therefore, the inorganic film is formed as the same film as the inorganic alignment film.

  In the liquid crystal device according to the second aspect of the present invention, an inorganic film may be formed on each of the substrate surfaces of the first substrate and the second substrate. By forming the inorganic film on both the first substrate and the second substrate, the adhesive force between the substrates can be further enhanced as compared with the case where the inorganic film is formed on one of the first substrate and the second substrate. In addition, foreign matters such as moisture entering the apparatus can be reduced.

  As described above, according to the liquid crystal device according to the second aspect of the present invention, the display quality can be maintained over a long period of time as in the case of the liquid crystal device according to the first aspect of the present invention. A high liquid crystal device can be provided.

  In one aspect of the liquid crystal device according to the second aspect of the present invention, the seal region is interposed between the seal portion and the substrate surface, and is along the direction from the display region toward the outer region. The inorganic alignment film and the inorganic film are arranged with an interval between the inorganic alignment film and the inorganic film, and include an auxiliary inorganic film that is the same film as the inorganic alignment film and the inorganic film. Also good.

  According to this aspect, since the seal portion and the auxiliary inorganic film are in contact with each other, it is possible to increase the adhesive force between the first substrate and the second substrate via the seal portion. More specifically, since the auxiliary inorganic film is the same film as the inorganic film and the inorganic alignment film, the adhesion strength with the seal portion is higher than the surface of the insulating film or the like constituting the substrate surface of the first substrate in the seal region. . Therefore, the adhesive force between the first substrate and the second substrate through the seal portion is increased by increasing the number of portions with relatively high adhesion. In addition, since the number of steps in the sealing area is increased by providing the auxiliary inorganic film, the intrusion path of foreign matters such as moisture becomes more complicated, and it is possible to further reduce the moisture entering the apparatus. is there.

  In this aspect, the auxiliary inorganic film may be a plurality of first auxiliary inorganic films arranged at intervals from each other along the direction.

  According to this aspect, the intrusion path of foreign matter such as moisture becomes more complicated, and foreign matter such as moisture entering the apparatus can be reduced.

  In another aspect of the liquid crystal device according to the second aspect of the present invention, the inorganic alignment film is formed on the at least one of the first substrate and the second substrate so as to overlap the seal portion in the seal region. The substrate surface on the side facing the liquid crystal layer may extend from the display region to the seal region, and may have an extending portion in contact with the surface facing the substrate surface side of the seal portion.

  According to this aspect, since the extended portion extends to the seal region, the step formed between the one substrate and the seal portion is increased, and the intrusion path for foreign matters such as moisture entering the inside of the apparatus is provided. It can be even more complex. Thereby, infiltration of moisture or the like can be reduced.

  In another aspect of the liquid crystal device according to the first and second aspects of the present invention, the extending portion may extend to the middle of the seal area along a direction from the display area toward the seal area. Good.

  According to this aspect, the improvement in the adhesive force for bonding the first substrate and the second substrate to each other via the seal portion and the improvement in the sealing performance for sealing moisture entering the inside of the apparatus are not a problem in practical use. Can be compatible in the range. Here, “the middle of the seal area” means the vicinity of the middle of the width of the seal area along the direction from the display area toward the seal area. More specifically, the “intermediate” is a range having a certain width from the center of the width of the seal region, and the extension portion along the width of the seal region is theoretically, experimentally, or simulated. What is necessary is just to set an edge to an appropriate position.

  In another aspect of the liquid crystal device according to the first and second inventions of the present invention, a surface of at least one of the inorganic alignment film, the inorganic film, and the auxiliary inorganic film uses a silane coupling agent. And may be surface-treated.

According to this aspect, the adhesion force between the surface of at least one of the inorganic alignment film, the inorganic film, and the auxiliary inorganic film and the seal portion can be increased as compared with the case where the film is not treated. The adhesion between the first substrate and the second substrate via the seal portion can be made stronger.
A removal process and method for forming the inorganic alignment film by partially removing the inorganic material, and depositing the inorganic material on the substrate surface using an oblique deposition method over the display region and the seal region. A vapor deposition step of forming a vapor deposition film, and a removal step of forming the inorganic alignment film by partially removing the vapor deposition film in the seal region such that the extension portion remains in the seal region. A vapor deposition step of forming a vapor deposition film by vapor-depositing the inorganic material on the substrate surface using an oblique vapor deposition method over the display area and the seal area; and the extension portion in the seal area. By partially removing the vapor deposition film in the seal region so as to remain, by removing the inorganic alignment film on the surface and the removing step of forming the inorganic alignment film. A vapor deposition step of forming a vapor deposition film, and a removal step of forming the inorganic alignment film and a seal by partially removing the vapor deposition film in the seal region so that the extension portion remains in the seal region The region includes the extending portion.

  According to the method for manufacturing a liquid crystal device according to the third aspect of the present invention, in the vapor deposition step, for example, an inorganic material such as SiO2 is vapor-deposited on the substrate surface of the first substrate, which is a TFT array substrate, using oblique vapor deposition. By doing so, a vapor deposition film is formed on the entire substrate surface. In addition, you may form a vapor deposition film not only on a 1st board | substrate but on the board | substrate surface of a 2nd board | substrate using the same vapor deposition method. In the case where the vapor deposition films on both the first substrate and the second substrate are formed, each of the inorganic alignment films formed on both of the substrates through a removing process described later has an extending portion.

  In the removing step, the inorganic alignment film is formed by partially removing, for example, a portion of the deposited film extending to the seal region so that the extension portion remains in the seal region. More specifically, for example, after the vapor deposition film is formed on the entire substrate surface, the vapor deposition film extending to the seal region is removed by using a general-purpose removal method such as plasma irradiation, dry etching, or photo etching. An inorganic alignment film having an existing portion is formed.

  Similarly to the liquid crystal device according to the first aspect of the present invention, it is possible to manufacture a liquid crystal device that can reduce deterioration of the liquid crystal and the like due to intrusion of moisture and the like, and can suppress a decrease in display performance. The display quality can be maintained for a long time, and a highly reliable liquid crystal device can be manufactured.

  In order to solve the above problems, a method of manufacturing a liquid crystal device according to a fourth aspect of the present invention includes a first substrate, a second substrate disposed to face the first substrate, a first substrate, and a first substrate. A liquid crystal layer sandwiched between two substrates, a seal portion provided in a seal region located around a display region on the first substrate, and the seal region so as to partially overlap the seal portion. The substrate extending from the seal region to the region outside the seal region on the substrate surface facing the liquid crystal layer in at least one of the first substrate and the second substrate, and the substrate in the seal portion A method of manufacturing a liquid crystal device for manufacturing a liquid crystal device that is in contact with a surface facing a surface side and includes an inorganic film that is the same film as the inorganic alignment film formed in the display region, The outer region from the region A vapor deposition process for forming a vapor deposition film by depositing an inorganic material on the substrate surface using an oblique vapor deposition method, and the vapor deposition film is partially formed in the seal region so that the inorganic film remains in the seal region. And a removing step for removing the target.

  According to the method for manufacturing a liquid crystal device according to the fourth aspect of the present invention, in the vapor deposition step, as in the method for manufacturing the liquid crystal device according to the third aspect of the present invention, the entire substrate surface, that is, on the substrate surface. A vapor deposition film is formed over the area from the display area to the outside of the seal area.

  In the removing step, the deposited film is partially removed in the seal region so that the inorganic film remains in the seal region. Thereby, the inorganic alignment film and the inorganic film which are separated from each other in the seal region are formed. Note that when a deposited film is formed in the seal region, a general-purpose removal method such as plasma irradiation, dry etching, or photoetching may be used.

  According to the liquid crystal device according to the fourth aspect of the present invention, similarly to the liquid crystal device according to the second aspect of the present invention, the first substrate and the second substrate can be firmly bonded via the seal portion, and moisture can be obtained. It is possible to reduce the deterioration of the liquid crystal layer due to the intrusion or the like. As a result, it is possible to suppress a decrease in display performance of the liquid crystal device.

  In order to solve the above problems, an electronic device according to the present invention includes the above-described liquid crystal device of the present invention.

  According to the electronic apparatus according to the present invention, since the above-described liquid crystal device according to the present invention is provided, a high-quality display is possible, and the projection display device, the mobile phone, and the electronic notebook that are excellent in reliability. Various electronic devices such as a word processor, a viewfinder type or a monitor direct-view type video tape recorder, a workstation, a videophone, a POS terminal, and a touch panel can be realized. In addition, as an electronic apparatus according to the present invention, for example, an electrophoretic device such as electronic paper can be realized.

  Such an operation and other advantages of the present invention will become apparent from the embodiments described below.

  Hereinafter, each of the liquid crystal device according to the first and second inventions of the present invention, the method for manufacturing the liquid crystal device according to the third and fourth inventions of the present invention, and the electronic device according to the present invention will be described with reference to the drawings. An embodiment will be described.

(First embodiment)
First, an embodiment of a liquid crystal device according to the first invention of the present invention will be described with reference to FIGS.

<1-1: Configuration of Liquid Crystal Device>
First, the overall configuration of the liquid crystal device according to the present embodiment will be described with reference to FIGS. 1 and 2. FIG. 1 is a plan view of the TFT array substrate as viewed from the side of the counter substrate together with the components formed thereon, and FIG. 2 is a cross-sectional view taken along the line H-H ′ of FIG. 1. In each of the drawings referred to below, the scale of each layer and each member is different in order to make each layer and each member recognizable on the drawing. In the present embodiment, as an example of a liquid crystal device, a TFT active matrix driving type liquid crystal device 1 with a built-in driving circuit is taken as an example.

  1 and 2, in the liquid crystal device 1 of the present embodiment, the TFT array substrate 10 as an example of the “first substrate” of the present invention, and the “first substrate” of the present invention disposed opposite to the TFT array substrate 10. The counter substrate 20 which is an example of “two substrates” is provided. A liquid crystal layer 50 is sealed between the TFT array substrate 10 and the counter substrate 20, and the TFT array substrate 10 and the counter substrate 20 are typical image display regions in which a plurality of pixel portions are arranged. They are bonded to each other by a sealing material 52 provided in a sealing region located around 10a.

  The sealing material 52 is an example of the “sealing part” of the present invention, and is made of, for example, an ultraviolet curable resin, a thermosetting resin, or an ultraviolet / heat combined type curable resin for bonding the two substrates. After being applied on the array substrate 10, it is cured by ultraviolet irradiation, heating, or the like. In the sealing material 52, a gap material such as glass fiber or glass beads for spreading the gap (gap) between the TFT array substrate 10 and the counter substrate 20 to a predetermined value is dispersed.

  A light-shielding frame light-shielding film 53 that defines the frame area of the image display area 10a is provided on the counter substrate 20 side in parallel with the inside of the seal area where the sealing material 52 is disposed. However, part or all of the frame light shielding film 53 may be provided as a built-in light shielding film on the TFT array substrate 10 side.

  A data line driving circuit 101 and an external circuit connection terminal 102 are provided along one side of the TFT array substrate 10 in a region located outside the sealing region in which the sealing material 52 is disposed in the peripheral region. The sampling circuit 7 is provided so as to be covered with the frame light shielding film 53 on the inner side of the seal region along the one side. Further, the scanning line driving circuit 104 is provided so as to be covered with the frame light-shielding film 53 inside the seal region along two sides adjacent to the one side.

  On the TFT array substrate 10, vertical conduction terminals 106 for connecting the two substrates with the vertical conduction material 107 are arranged in regions facing the four corner portions of the counter substrate 20. Thus, electrical conduction can be established between the TFT array substrate 10 and the counter substrate 20.

In FIG. 2, on the TFT array substrate 10, a laminated structure in which wiring such as a pixel switching TFT (Thin Film Transistor) as a driving element, a scanning line, and a data line is formed. Although the detailed configuration of the laminated structure is not shown in FIG. 2, in the image display region 10a, the pixel electrode 9a made of a transparent material such as ITO (Indium Tin Oxide) is formed on the uppermost layer of the laminated structure. Are formed in an island shape in a predetermined pattern for each pixel. The pixel electrode 9a is formed in the image display region 10a on the TFT array substrate 10 so as to face a counter electrode 21 described later. Outside the image display region 10a, other portions than the pixel electrode such as an insulating film constitute the uppermost layer of the laminated structure. On the surface of the TFT array substrate 10 facing the liquid crystal layer 50, that is, on the pixel electrode 9a, an inorganic alignment film 16 is formed so as to cover the pixel electrode 9a. The inorganic alignment film 16 is formed by vapor-depositing an inorganic material such as silica (SiO ₂ ) on the TFT array substrate 10 using an oblique vapor deposition method. The alignment film 16 and the alignment film 22 described later control the alignment of liquid crystal molecules constituting the liquid crystal layer 50 in the vertical alignment mode when the liquid crystal device 1 operates. In the present embodiment, each of the inorganic alignment films 16 and 22 is an example of the “inorganic alignment film” according to the first invention of the present invention.

  A light shielding film may be formed on the surface of the counter substrate 20 facing the TFT array substrate 10. For example, the light shielding film is formed in a lattice shape when viewed in plan on the facing surface of the facing substrate 20. In the counter substrate 20, a non-opening area is defined by the light shielding film, and an area partitioned by the light shielding film is an opening area through which light emitted from the backlight is transmitted. The light shielding film may be formed in a stripe shape, and the non-opening region may be defined by the light shielding film and various components such as data lines provided on the TFT array substrate 10 side.

  On the side of the counter substrate 20 facing the liquid crystal layer 50, a counter electrode 21 made of a transparent material such as ITO is formed so as to face the plurality of pixel electrodes 9a. Since the counter electrode 21 is formed using a general-purpose thin film forming method such as a sputtering method in the same manner as the pixel electrode, the same film as the counter electrode 21 is formed in the seal region 110a located around the image display region 10a. A thin film is formed. In the following, for convenience of explanation, a thin film formed in the seal region 110a as the same film as the counter electrode 21 is also referred to as a counter electrode.

An inorganic alignment film 22 made of an inorganic material such as silica (SiO ₂ ) is formed on the laminated structure in which these various components are formed on the opposing surface of the opposing substrate 20. The counter electrode 21 is disposed on the uppermost layer of the stacked structure on the counter substrate 20. The inorganic alignment film 22 is formed on the counter electrode 21.

  In addition to the data line driving circuit 101, the scanning line driving circuit 104, and the like, the image signal on the image signal line is sampled and supplied to the data line on the TFT array substrate 10 shown in FIGS. Sampling circuit, precharge circuit for supplying a precharge signal of a predetermined voltage level to a plurality of data lines in advance of an image signal, inspection for inspecting the quality, defects, etc. of the liquid crystal device during manufacture or at the time of shipment A circuit or the like may be formed.

  Next, the configuration of the alignment film 16 will be described in detail with reference to FIG. FIG. 3 is a diagram schematically showing the configuration of the cross section corresponding to FIG. 2, in particular, the alignment of the liquid crystal by the alignment film 16 formed on the TFT array substrate 10.

  In FIG. 3, a laminated structure 90 including various components such as TFTs is formed on the substrate surface on the side facing the liquid crystal layer 50 in the TFT array substrate 10, and the pixel electrode 9 a is formed on the uppermost layer of the laminated structure 90. Is formed for each pixel. More specifically, the uppermost layer of the laminated structure 90 is an insulating film composed of a boron-doped oxide film (BSG film) or the like. A columnar structure 16a made of an inorganic material such as SiO or SiO2 is arranged on the pixel electrode 9a at a predetermined angle with respect to the substrate surface of the TFT array substrate 10, thereby controlling the alignment of liquid crystal molecules in the vertical alignment mode. An alignment film 16 is formed as an inorganic vertical alignment film. The alignment film 16 thus formed can regulate the alignment state of the liquid crystal molecules 50a by the vertical alignment mode due to the surface shape effect.

  The inorganic alignment film 22 basically has the same configuration as that of the inorganic alignment film 16, but the columnar structure made of an inorganic material constituting the inorganic alignment film 22 is formed on the substrate surface of the counter substrate 20 and The angle formed with the counter electrode 21 may be different from a predetermined angle formed by the columnar structure 16 a made of an inorganic material with respect to the substrate surface of the TFT array substrate 10.

  The liquid crystal layer 50 is made of, for example, liquid crystal molecules 50a having a negative dielectric anisotropy made of liquid crystal mixed with one or several types of nematic liquid crystals. The liquid crystal layer 50 has different pretilt angles on the surfaces of the alignment films 16 and 22 in the state where the electric field from the pixel electrode 9a is not applied, and the alignment is controlled in the vertical alignment mode when the liquid crystal device 1 is operated. .

<1-2: Circuit Configuration in Image Display Area of Liquid Crystal Device>
Next, a circuit configuration and operation in the image display region 10a of the liquid crystal device 1 will be described with reference to FIG. FIG. 4 is an equivalent circuit of various elements, wirings, and the like in a plurality of pixels formed in a matrix that forms the image display area of the liquid crystal device 1.

  In FIG. 4, each of a plurality of pixels formed in a matrix that forms the image display area 10 a of the liquid crystal device 1 is formed with a pixel electrode 9 a and a TFT 30 for controlling the switching of the pixel electrode 9 a. The data line 6 a to which the image signal VIDi (i = 1, 2,..., N) is supplied via the sampling circuit 7 is electrically connected to the source of the TFT 30. The image signal VIDi written to the data line 6a may be supplied line-sequentially in this order, or may be supplied for each group of a plurality of adjacent data lines 6a.

  The gate electrode 3a is electrically connected to the gate of the TFT 30, and the scanning signals G1, G2,..., Gm are pulse-sequentially applied in this order to the scanning line 11a and the gate electrode 3a at a predetermined timing. It is comprised so that it may apply. The pixel electrode 9 a is electrically connected to the drain of the TFT 30. The TFT 30 serving as a switching element closes its switch for a certain period, so that the pixel potential corresponding to the image signals S1, S2,..., Sn supplied from the data line 6a is written to the pixel electrode 9a at a predetermined timing. The capacitor electrode 300 is electrically connected directly or indirectly to the vertical conduction terminal 106. The counter electrode 21 is electrically connected to the capacitor electrode 300 and is supplied with a common potential LCCOM that is a fixed potential.

  Image signals VID1, VID2,..., VIDn of a predetermined level written in the liquid crystal layer through the pixel electrode 9a are held for a certain period with the counter electrode 21 formed on the counter substrate 20. The liquid crystal layer 50 modulates light and enables gradation display by changing the orientation and order of the molecular assembly of liquid crystal molecules according to the applied voltage level.

  Note that a storage capacitor 70 is added in parallel with the liquid crystal layer capacitor formed between the pixel electrode 9a and the counter electrode 21 in order to prevent the image signal held here from leaking. The storage capacitor 70 is provided side by side along the scanning line 11a, and includes a capacitor electrode 300 that includes a fixed potential side capacitor electrode and is fixed at a constant potential.

  An image is displayed during the operation of the liquid crystal device 1 by the operation of each of the circuit units described above.

<1-3: Detailed Configuration of Liquid Crystal Device>
Next, a detailed configuration of the liquid crystal device 1 will be described with reference to FIG. FIG. 5 is an enlarged view showing the region C1 on the cross section of the liquid crystal device 1 shown in FIG. 2 in an enlarged manner.

  In FIG. 5, each of the inorganic alignment films 16 and 22 included in the liquid crystal device 1 is an example of an “extending portion” according to the first invention of the present invention, extending from the image display region 10a to the seal region 110a. Each has a first extending portion 16A and a second extending portion 22A.

  The first extending portion 16A extends from the image display region 10a to the sealing region 110a on the substrate surface facing the liquid crystal layer 50 in the TFT array substrate 10 so as to partially overlap the sealing material 52 in the sealing region 110a. It extends. Therefore, the first extending portion 16A partially overlaps with the sealing material 52 in a region near the image display region 10a in the seal region 110a. More specifically, the first extending portion 16A has a surface facing the insulating film such as a BSG film constituting the uppermost layer of the stacked structure 90 in the sealing region 110a, that is, the substrate surface of the TFT array substrate 10 in the sealing material 52. It touches a part. 16 A of 1st extension parts are contact | adhered to the sealing material 52 and the laminated structure 90 so that it may be pinched | interposed into the sealing material 52 and the laminated structure 90 in the area | region near the image display area 10a among the sealing areas 110a.

  According to such a first extending portion 16A, the adhesion force that the first extending portion 16A, which is a part of the inorganic alignment film 16, is in close contact with the sealing material 52 is reduced from an insulating film such as a BSG film in the sealing region 110A. It is higher than the adhesion force that the laminated structure 90 and the sealing material 52 are in close contact with each other, and the TFT array substrate 10 and the counter substrate 20 can be bonded more firmly.

  From the viewpoint of increasing the adhesion between the sealing material 52 and the laminated structure 90 on the TFT array substrate 10, the first extending portion 16A extends to the entire sealing region 110a, and the entire lower surface of the sealing material 52 is the first. It is also considered that it is preferable to make it closely contact with the extending portion 16A. However, on the other hand, the adhesion between the first extending portion 16A, which is a part of the inorganic alignment film 16, and the sealing material 52 is increased, but foreign matters such as moisture enter from the interface between the first extending portion 16A and the sealing material 52. The inventors of the present application have confirmed that it tends to be easy. Therefore, in the liquid crystal device 1 according to the present embodiment, the first extending portion 16A extends to the middle of the seal region 110a, thereby entering the inside of the device through the interface between the sealing material 52 and the laminated structure 90. Reduce foreign matter such as moisture. More specifically, since the first extending portion 16A extends to the middle of the seal region 110a on the TFT array substrate 10, the first extending portion 16A is formed between the sealing material 52 and the surface of the laminated structure 90. Corresponding steps will be formed. According to such a step, it is possible to complicate the intrusion path through which foreign substances such as moisture enter, compared to the case where the entire lower surface of the sealing material 52 is in contact with the first extending portion 16A. It is difficult for foreign matter such as moisture to enter the device. Therefore, foreign matter such as moisture entering the device can be reduced by the step formed according to the first extending portion 16A, and the display performance of the liquid crystal device 1 can be prevented from being deteriorated by moisture or the like. is there.

  In consideration of the trade-off between the effect of reducing or preventing foreign matters such as moisture entering the inside of the apparatus and the effect of increasing the adhesion between the TFT array substrate 10 and the sealing material 52, the first extending portion 16A is a sealing region. It is preferable to extend to the center of 110a.

  Similar to the inorganic alignment film 16 having the first extension portion 16A, the inorganic alignment film 22 has a second extension portion 22A extending to the seal region 110a. The second extending portion 22A, which is a part of the inorganic alignment film 22 formed on the counter substrate 20 side and extends to the seal region 110a, is related to the relationship between the first extending portion 16A and the lower surface of the sealing material 52. Similarly, by partially contacting the counter electrode 21 extending in the seal region 110a, the apparatus is interposed between the counter electrode 21 and the seal material 52 as compared with the case where the entire upper surface of the seal material 52 is in contact with the second extending portion 22A. Foreign substances such as moisture entering the inside can be reduced, and the adhesion between the sealing material 52 and the counter substrate 20 can be increased.

  In addition, if the surface of at least one of the inorganic alignment films 16 and 22 is surface-treated using a silane coupling agent, the adhesion between these films and the sealing material 52 can be improved as compared with the case of no treatment. The adhesion between the TFT array substrate 10 and the counter substrate 20 through the sealing material 52 can be further strengthened.

  As described above, according to the liquid crystal device 1 according to the present embodiment, each of the inorganic alignment films 16 and 22 has the first extension portion 16A and the second extension portion 22A extending to the seal region 110a. The adhesion between the TFT array substrate 10 and the counter substrate 20 and the sealing material 52 is enhanced on the upper surface and the lower surface of the material 52, respectively, and foreign matters such as moisture entering the device are reduced. Therefore, it is possible to suppress a decrease in display performance of the liquid crystal device 1 and to improve the reliability of the liquid crystal device 1.

In the liquid crystal device 1 according to the present embodiment, the case where each of the inorganic alignment films 16 and 22 has the first extending portion 16A and the second extending portion 22A has been described. Only when the extending portion 16A is provided on the inorganic alignment film 16 or only when the second extending portion 22A is provided on the inorganic alignment film 22, at least one of the inorganic alignment films 16 and 22 may be used. If the inorganic alignment film has an extending portion that partially overlaps the sealing material 52 in the sealing region 110a, the effect of reducing or preventing foreign substances such as moisture can be obtained accordingly.
<1-4: Manufacturing Method of Liquid Crystal Device>
Next, an embodiment of a method for manufacturing a liquid crystal device according to the third aspect of the present invention will be described with reference to FIGS. In addition, in the manufacturing method of the liquid crystal device according to the present embodiment, a case where the above-described liquid crystal device 1 is manufactured will be described as an example. FIG. 6 is a flowchart for explaining each step of the manufacturing process of the liquid crystal device 1. FIG. 7 is a schematic view schematically showing the configuration of a vapor deposition apparatus used for forming a vapor deposition film by the oblique vapor deposition method. FIG. 8 is a process cross-sectional view illustrating a part of the process of the manufacturing method of the liquid crystal device according to the present embodiment. In the following description, common reference numerals common to the above-described liquid crystal device 1 are given, and detailed description thereof is omitted.

  In FIG. 6, a stacked structure in which data lines 6a, scanning lines 11a, TFTs 30 and the like are formed on the TFT array substrate 10 by, for example, film formation by vapor deposition or sputtering, patterning by etching or photography, heat treatment, and the like. A pixel electrode 9a made of a transparent conductive material such as ITO is formed on the uppermost layer of 90 (see FIG. 3), for example, by sputtering (step S11).

Subsequently, by depositing silica inorganic material (SiO ₂₎ or the like in the TFT array substrate 10 using the oblique deposition method, silica TFT array substrate on the substrate surface where the pixel electrodes 9a are formed in 10 (SiO ₂ ) Is formed with a film thickness of about 40 nm, for example (step S12). At this time, the vapor flow of an inorganic material such as silica (SiO ₂ ) generated from the vapor deposition source comes into contact with the outermost surface of the laminated structure 90 on the substrate surface of the TFT array substrate 10, so that the inorganic structure is formed on the laminated structure 90. Material is deposited. The inorganic material columnar structures 16a deposited on the substrate surface are arranged at a predetermined angle with respect to the substrate surface, so that the inorganic material is deposited on the substrate surface so as to cover the pixel electrodes.

  Here, the process of forming a vapor deposition film on the TFT array substrate 10 will be described in detail with reference to FIG. In the following, a case where a vapor deposition film is formed on the TFT array substrate 10 will be described as an example, but the vapor deposition film formed on the counter substrate 20 is also formed using the same method.

  In FIG. 7, the vapor deposition apparatus 300 includes a vapor deposition source 302 and a chamber 301 that accommodates the vapor deposition source 302 and the TFT array substrate 10 that is an inorganic material deposition target.

  Of the deposited film formed on the TFT array substrate 10, the part extending to the image display region 10 a is a part that becomes the alignment film 16 through a process described later. The columnar structure 16a constituting such a vapor deposition film adjusts the angle (θa) formed between the normal NL to the substrate surface of the TFT array substrate 10 and the first vapor deposition direction in which the inorganic material is deposited from the vapor deposition source 302. Thus, an angle extending with respect to the substrate surface is set. Moreover, when forming a vapor deposition film on the opposing substrate 20, the columnar structure which comprises the inorganic alignment film 22 is adjusted by adjusting the angle ((theta) b) which a 1st vapor deposition direction and the substrate surface of the opposing substrate 20 make. The angle formed with the substrate surface of the counter substrate 20 can be adjusted.

  Referring again to FIG. 6, by removing a part of the portion of the inorganic oblique vapor deposition film obtained as described above that extends to the seal region, the first extension extends from the image display region 10a to the middle of the seal region 110a. The inorganic alignment film 16 having the portion 16A is formed.

  Here, with reference to FIG. 8, the removal process (S13) which removes the part extended to a seal | sticker area | region among the said vapor deposition film formation process (S12) is demonstrated in detail.

  In FIG. 8A, a vapor deposition film 216 is formed on the surface of the laminated structure 90 on the TFT array substrate 10 by using an oblique vapor deposition method. Next, in FIG. 8B, a resist 200 is formed from the region near the image display region 10a in the seal region 110a to the image display region 10a, and the vapor deposition film 216 exposed outside the resist 200 is dry-etched. It removes using general-purpose etching methods, such as. Thereafter, by removing the resist 200, the inorganic alignment film 16 extending from the image display region 10a on the TFT array substrate 10 to the middle of the seal region 110a is formed. When removing the vapor deposition film 216, a general-purpose removal method such as plasma irradiation or photoetching may be used.

  The inorganic alignment film 16 thus formed can align the liquid crystal molecules of the liquid crystal layer 50 by the surface shape effect. In addition, since the inorganic alignment films 16 and 22 are made of an inorganic material, the inorganic alignment films 16 and 22 are excellent in light resistance and heat resistance, and contribute to improving the durability of the liquid crystal device as a light valve.

  In FIG. 6 again, the surface of each of the inorganic alignment films 16 and 22 is surface-treated using a silane compound (S14). More specifically, the surface on the side facing the liquid crystal layer 50 of the alignment film 16 included in the TFT array substrate 10 is treated using, for example, a silane compound solution in which a silane compound is dissolved in a solvent. By this surface treatment, the light resistance of the alignment film 16 can be improved. At this time, if the surface of the first extension portion 16A is also treated with a silane compound, the adhesion between the first extension portion 16A and the sealing material 52 can be increased.

  Next, the surface-treated inorganic alignment film 16 is cleaned using a cleaning liquid such as a solvent (step 15), and the inorganic alignment film 16 is dried (step 15). The counter substrate 20 is formed with the light shielding film 53 and the counter electrode 21 in parallel with or before or after Steps 11 to 16 (Step 21) and the inorganic alignment film 22 (Step 22). ). As in the case of the TFT array substrate 10, the inorganic alignment film 22 formed on the counter substrate 20 also removes a portion of the vapor deposition film formed on the counter substrate 20 extending to the seal region 110 a in the seal region 110 a. As a result, the second extending portion 22A is formed and surface-treated in the same manner as the inorganic alignment film 16 (step 24). The surface-treated inorganic alignment film 22 is washed (step 25) and dried (S26).

  Thereafter, the TFT array substrate 10 and the counter substrate 20 that have been finished up to the drying step are sealed between the side on which the inorganic alignment film 16 is formed on the TFT array substrate 10 and the side on which the inorganic alignment film 22 is formed on the counter substrate 20. Bonding is performed via the material 52 (step S31).

  Subsequently, liquid crystal is injected between the TFT array substrate 10 and the counter substrate 20 bonded to each other (step S32), and the liquid crystal device 1 is formed.

As described above, according to the method for manufacturing a liquid crystal device of the present embodiment, the above-described liquid crystal device 1 can be manufactured.
(Second Embodiment)
<2-1: Configuration of liquid crystal device>
Next, embodiments of the liquid crystal device according to the second invention of the present invention and the method for manufacturing the liquid crystal device according to the fourth invention of the present invention will be described with reference to FIGS. The liquid crystal device according to the present embodiment and the method for manufacturing the liquid crystal device are different from the liquid crystal device according to the first embodiment and the method for manufacturing the liquid crystal device in the structure in the seal region 110a. Therefore, hereinafter, the structure in the seal region 110a will be described in detail, and detailed description of other parts common to the liquid crystal device according to the first embodiment will be omitted.

  In FIG. 9, the liquid crystal device according to the present embodiment is different from the liquid crystal device 1 according to the first embodiment in that inorganic films 117 and 123 are provided. The inorganic film 117 partially overlaps with the seal material 52 in the seal region 110a. The inorganic film 117 is the same film as the inorganic alignment film 16, and is formed by partially removing a portion extending to the seal region 110 a from one vapor deposition film once formed on the TFT array substrate 10. . The inorganic film 117 extends from the seal region 110 a to the region outside the seal region 110 a on the substrate surface facing the liquid crystal layer 50 in the TFT array substrate 10, and the substrate of the TFT array substrate 10 in the seal material 52. It is in contact with the surface facing the surface. More specifically, since the inorganic film 117 partially overlaps the sealing material 52 in the sealing region 110a, a part of the surface of the sealing material 52 facing the substrate surface side of the TFT array substrate 10 in the sealing region 110a. It will be in contact with.

According to such an inorganic film 117, similarly to the first extending portion 16A described in the first embodiment, a step is formed between the lower surface of the sealing material 52 and the surface of the laminated structure 90 according to the thickness of the inorganic film 117. Will be formed. Therefore, the surface of the sealing material 52 that faces the front surface of the laminated structure 90, that is, the entire lower surface that is the surface of the sealing material 52 that faces the TFT array substrate 10 is in contact with the inorganic film 117. It is possible to complicate the intrusion route of water and to reduce intrusion of moisture and the like. In addition, the adhesion between the inorganic film 117 and the sealing material 52 that are the same as the inorganic alignment film 16 formed by oblique deposition of an inorganic material such as SiO or SiO ₂ is the surface of the laminated structure 90. For example, since the adhesion between the surface of the insulating film such as the BSG film and the sealing material is higher, the TFT array substrate 10 and the counter substrate 20 can be more strongly bonded to each other via the sealing material 52.

  In addition, since a part of the inorganic alignment film 16 is interposed between the sealing material 52 and the laminated structure 90 in the sealing region 110a, the adhesion between the sealing material 52 and the laminated structure 90 is improved, and moisture entering the apparatus Reduction of foreign matters is realized even more effectively.

  In addition, the inorganic film 123 is also formed as the same film as the inorganic alignment film 22, similarly to the inorganic film 117, and improves the adhesion between the upper surface of the sealing material 52 and the counter electrode 21, and foreign substances such as moisture are removed from the device. By complicating the intrusion route for entering the interior, it is difficult for moisture or the like to enter the apparatus. In addition, since a part of the inorganic alignment film 22 is interposed between the upper surface of the sealing material 52 and the counter electrode 21 in the seal region 110a, the adhesion between the sealing material 52 and the counter electrode 21 is improved.

  Therefore, according to the liquid crystal device according to the present embodiment, as in the liquid crystal device according to the first embodiment, the TFT array substrate 10 and the counter substrate 20 can be firmly bonded via the sealing material 52 and intrusion of moisture and the like. Deterioration of the liquid crystal layer and the like due to the can be reduced. Accordingly, it is possible to suppress a decrease in display performance of the liquid crystal device, and it is possible to improve the reliability of the liquid crystal device.

  In the liquid crystal device according to the present embodiment, the inorganic films 117 and 123 are respectively formed on the TFT array substrate 10 and the counter substrate 20, but the inorganic film is formed on at least one of the TFT array substrate 10 and the counter substrate 20. If the film is formed, the effect of improving the adhesion between the TFT array substrate 10 and the counter substrate can be obtained accordingly. In this embodiment, part of the inorganic alignment films 16 and 22 extends to the seal region 110a, thereby reducing foreign matters such as moisture entering the inside of the device and bonding the TFT array substrate 10 and the counter substrate. However, even if each of the inorganic alignment films 16 and 22 does not extend to the seal region 110a, at least one of the inorganic films 117 and 123 is provided. Needless to say.

  In addition, since the inorganic alignment films 16 and 22 have the first extending portion 16A and the second extending portion 22A extending to the seal region 110a, the inorganic alignment films 16 and 22 are only in the image display region 10a. Compared with the case where the substrate is formed, the adhesion between the substrates and the intrusion of foreign matter such as moisture into the apparatus are further reduced.

  Further, if the surface of at least one of the inorganic alignment films 16 and 22 and the inorganic films 117 and 123 is subjected to a surface treatment using a silane coupling agent, these films and the seals are compared with the case of no treatment. Adhesive strength with the material 52 can be increased, and adhesion between the TFT array substrate 10 and the counter substrate 20 through the sealing material 52 can be further strengthened.

  Thus, according to the liquid crystal device according to the present embodiment, as with the liquid crystal device 1 according to the first embodiment, the display quality can be maintained for a long period of time, and a highly reliable liquid crystal device can be provided.

(Modification)
Next, a modification of the liquid crystal device according to the present embodiment will be described with reference to FIG. The liquid crystal device according to this example is different from the above-described liquid crystal device in that an auxiliary inorganic film is provided between the inorganic alignment film and the inorganic film.

  10, the liquid crystal device according to this example includes an auxiliary inorganic film 118 formed on the surface of the laminated structure 90 on the TFT array substrate 10 and an auxiliary inorganic film formed on the surface of the counter electrode 21 on the counter substrate 20. 124 is provided. The auxiliary inorganic films 118 and 124 are formed as the same film as the inorganic alignment films 16 and 22, and the vapor deposition film formed by vapor-depositing an inorganic material using the oblique vapor deposition method is partially removed in the seal region 110a. Is formed by.

  The auxiliary inorganic film 118 is interposed between the surfaces of the sealing material 52 and the laminated structure 90 in the seal region 110a, and extends along the direction from the image display region 10a to the outside of the seal region 110a. They are arranged at intervals from each other, and are in close contact with the lower surface of the sealing material 52. In addition, since the auxiliary inorganic film 118 is the same film as the inorganic alignment film 16 and the inorganic film 117, the adhesion strength with the sealing material 52 is higher in the seal region 110a than the surface of the laminated structure 90. Therefore, by increasing the area where the adhesive force with the laminated structure 90 is relatively high, it is possible to increase the adhesive force between the TFT array substrate 10 and the counter substrate 20 via the sealing material 52. In addition, since the number of steps in the seal region 110a increases according to the thickness of the auxiliary inorganic film 118, the intrusion path through which foreign substances such as moisture enter the apparatus becomes more complicated, and foreign substances such as moisture that enter the apparatus are reduced. It can be remarkably reduced.

  The auxiliary inorganic film 124 is interposed between the surfaces of the sealing material 52 and the counter electrode 21 in the seal region 110a, and extends along the direction from the image display region 10a toward the outside of the seal region 110a. They are arranged at intervals from each other, and are in close contact with the upper surface of the sealing material 52. Therefore, similarly to the inorganic auxiliary film 118, the inorganic auxiliary film 124 increases the adhesive force between the TFT array substrate 10 and the counter substrate 20 via the sealing material 52, and reduces foreign matters such as moisture entering the device. it can.

  In this example, the inorganic auxiliary films 118 and 124 are formed on the respective sides of the TFT array substrate 10 and the counter substrate 20 as viewed from the sealing material 52, but at least one of the inorganic auxiliary films 118 and 124 is formed. If so, the effects of improving the adhesion between the TFT array substrate 10 and the counter substrate 20 and reducing the intrusion of moisture and the like can be obtained accordingly.

  In addition, if the surface of at least one of the inorganic alignment films 16 and 22, the inorganic films 117 and 123, and the auxiliary inorganic film 118 is surface-treated using a silane coupling agent, compared to the case of no treatment. The adhesion between these films and the sealing material 52 can be increased, and the adhesion between the TFT array substrate 10 and the counter substrate 20 via the sealing material 52 can be further strengthened.

  Next, another modification of the liquid crystal device according to the present embodiment will be described with reference to FIG.

  In FIG. 11, the liquid crystal device according to this example is characterized in that it includes an auxiliary inorganic film 18 made of a plurality of first auxiliary inorganic films 18A and an auxiliary inorganic film 124 made of a plurality of first auxiliary inorganic films 124A. Have.

  The first auxiliary inorganic films 18A are arranged at intervals from each other along the direction from the image display region 10a toward the outside of the seal region 110a. Therefore, compared with the case where one auxiliary inorganic film 18 is provided, the number of steps formed by the surfaces of the first auxiliary inorganic film 18A and the laminated structure 90 is increased, and there is an entry path for foreign matters such as moisture entering the apparatus. It becomes even more complex. By increasing such a level difference, it is possible to reduce foreign matters such as moisture entering the inside of the apparatus.

  According to the first auxiliary inorganic film 124A, similarly to the first auxiliary inorganic film 118A, the number of steps formed by the surfaces of the first auxiliary inorganic film 124A and the counter electrode can be increased, and moisture entering the inside of the apparatus. It is possible to reduce foreign substances such as.

  Thus, according to the liquid crystal device according to the present example, it is possible to further improve the sealing performance to reduce the intrusion of moisture and the like as compared with the case where one auxiliary inorganic film is formed between the inorganic alignment film and the inorganic film. It is.

<2-2: Manufacturing method of liquid crystal device>
Next, an embodiment of a method for manufacturing a liquid crystal device according to the present invention will be described with reference to FIG. FIG. 12 is a process cross-sectional view illustrating a part of the process of the manufacturing method of the liquid crystal device according to the present embodiment. The liquid crystal device manufacturing method according to the present embodiment is different from the liquid crystal device manufacturing method according to the first embodiment only in the step of removing the vapor deposition film to be the inorganic alignment film, and the other steps are the first steps. This is common to the method for manufacturing the liquid crystal device according to the embodiment. Therefore, in the following, the vapor deposition process for forming the vapor deposition film and the removal process for partially removing the vapor deposition film will be described in detail, and detailed description of the other processes will be omitted.

  In FIG. 12A, an inorganic material such as SiO 2 is vapor-deposited on the laminated structure 90 using an oblique vapor deposition method to form a vapor deposition film 216. Next, in FIG. 12B, a resist 200 having an opening 200a partially opened in a region to be the seal region 110a on the TFT array substrate 10 is formed, and a vapor deposition film 216 exposed from the opening 200a. Is removed using a removal method such as dry etching. Then, the inorganic alignment film 16 and the inorganic film 117 are formed by removing the resist 200.

  In the case of forming the auxiliary inorganic film 118 or the auxiliary inorganic film 118 composed of the plurality of first auxiliary inorganic films 118A, the opening portion is formed according to the size and position of the auxiliary inorganic film or the first auxiliary inorganic film. What is necessary is just to set the size and numerical aperture of 200a. Note that the inorganic film 123, the auxiliary inorganic film 124, and the first auxiliary inorganic film 124A formed on the counter substrate 20 side can be formed in the same process.

  As described above, according to the method for manufacturing the liquid crystal device according to the present embodiment, as described above, the adhesion between the substrates is increased, and the penetration of moisture and the like into the device is suppressed, thereby increasing the reliability. The manufactured liquid crystal device can be manufactured.

<Electronic equipment>
Next, the case where the liquid crystal device described above is applied to various electronic devices will be described with reference to FIG. The electronic apparatus according to the present embodiment is a projector that uses the liquid crystal device described above as a light valve. FIG. 13 is a plan view illustrating a configuration example of a projector that is an example of an electronic apparatus including the above-described liquid crystal device. As shown in FIG. 13, a projector 1100 includes a lamp unit 1102 made up of a white light source such as a halogen lamp. The projection light emitted from the lamp unit 1102 is separated into three primary colors of RGB by four mirrors 1106 and two dichroic mirrors 1108 arranged in the light guide 1104, and serves as a light valve corresponding to each primary color. The light enters the liquid crystal panels 1110R, 1110B, and 1110G.

  The configurations of the liquid crystal panels 1110R, 1110B, and 1110G are the same as those of the liquid crystal device described above, and are driven by R, G, and B primary color signals supplied from the image signal processing circuit. The light modulated by these liquid crystal panels enters the dichroic prism 1112 from three directions. In this dichroic prism 1112, R and B light is refracted at 90 degrees, while G light travels straight. Accordingly, as a result of the synthesis of the images of the respective colors, a color image is projected onto the screen or the like via the projection lens 1114.

  Here, paying attention to the display images by the liquid crystal panels 1110R, 1110B, and 1110G, the display image by the liquid crystal panel 1110G is horizontally reversed with respect to the display images by the liquid crystal panels 1110R and 1110B. Since light corresponding to the primary colors R, G, and B is incident on the liquid crystal panels 1110R, 1110B, and 1110G by the dichroic mirror 1108, it is not necessary to provide a color filter.

  In addition, according to the electronic apparatus according to the present embodiment, since the above-described liquid crystal device is included, the projection display device, the mobile phone, the electronic notebook, the word processor, the viewfinder type, or the monitor direct view type with excellent reliability. Various electronic devices such as a video tape recorder, a workstation, a videophone, a POS terminal, and a touch panel can be realized.

1 is a plan view of a liquid crystal device according to a first embodiment. It is the HH 'sectional view taken on the line of FIG. FIG. 3 is a diagram schematically showing an alignment state of liquid crystal by an inorganic alignment film 16 with respect to a cross-sectional configuration corresponding to FIG. 2. 3 is an equivalent circuit of various elements, wirings, and the like in a plurality of pixels constituting an image display area of the liquid crystal device according to the first embodiment. It is the enlarged view which expanded and showed the area | region C1 shown in FIG. 4 is a flowchart of a method for manufacturing the liquid crystal device according to the first embodiment. It is the schematic diagram which showed typically the structure of the vapor deposition apparatus for forming a vapor deposition film. It is process sectional drawing which showed a part of process of the manufacturing method of the liquid crystal device which concerns on 1st Embodiment. FIG. 6 is an enlarged view showing an area corresponding to the area C1 of FIG. 2 in an enlarged manner in the liquid crystal device according to the second embodiment. It is the enlarged view which expanded and showed the area | region corresponding to the area | region C1 of FIG. 2 in the modification of the liquid crystal device which concerns on 2nd Embodiment. It is the enlarged view which expanded and showed the area | region corresponding to the area | region C1 of FIG. 2 in the other example of the modification of the liquid crystal device which concerns on 2nd Embodiment. It is process sectional drawing which showed a part of process of the manufacturing method of the liquid crystal device which concerns on 2nd Embodiment. It is the top view which showed the structure of an example of the electronic device which concerns on this embodiment.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Liquid crystal device, 10 ... TFT array substrate, 10a ... Image display area, 16, 22 ... Inorganic alignment film, 16A ... 1st extension part, 22A ... 2nd extension Existing part, 20 ... counter substrate, 52 ... sealing material, 110a ... sealing region

Claims (10)

A first substrate;
A second substrate disposed to face the first substrate;
A liquid crystal layer sandwiched between the first substrate and the second substrate;
A seal portion provided in a seal area located around a display area on the first substrate;
The substrate surface on the side facing the liquid crystal layer in at least one of the first substrate and the second substrate extends from the display region to the seal region so as to partially overlap the seal portion in the seal region. And an extended portion that is in contact with a surface facing the substrate surface side of the seal portion, and is formed by depositing an inorganic material on the substrate surface using an oblique evaporation method. A liquid crystal device comprising: an alignment film. A first substrate;
A second substrate disposed to face the first substrate;
A liquid crystal layer sandwiched between the first substrate and the second substrate;
A seal portion provided in a seal area located around a display area on the first substrate;
The substrate surface on the side facing the liquid crystal layer in at least one of the first substrate and the second substrate so as to partially overlap the seal portion in the seal region, from the seal region to the outside of the seal region. An inorganic alignment film formed by depositing an inorganic material on the substrate surface by using an oblique deposition method, extending over the region of the sealing member and contacting the surface of the seal portion facing the substrate surface side. And an inorganic film that is the same film as the liquid crystal device. The inorganic alignment film and the inorganic film are interposed between the inorganic alignment film and the inorganic film along a direction from the display area toward the outer region, interposed between the seal portion and the substrate surface in the seal region. 3. The liquid crystal device according to claim 2, further comprising: an auxiliary inorganic film that is disposed at a distance from each other and that is the same film as the inorganic alignment film and the inorganic film. 4. The liquid crystal device according to claim 3, wherein the auxiliary inorganic film is a plurality of first auxiliary inorganic films arranged at intervals along the direction. The inorganic alignment film extends from the display region to the seal region on a substrate surface facing the liquid crystal layer in at least one of the first substrate and the second substrate so that the seal portion overlaps the seal region. 5. The liquid crystal device according to claim 2, wherein the liquid crystal device has an extending portion that extends over the surface of the sealing portion and contacts a surface of the seal portion facing the substrate surface. 6. The liquid crystal device according to claim 1, wherein the extending portion extends to the middle of the seal area along a direction from the display area toward the seal area. The surface of at least one of the inorganic alignment film, the inorganic film, and the auxiliary inorganic film is surface-treated using a silane coupling agent. The liquid crystal device according to item. A first substrate; a second substrate disposed to face the first substrate; a liquid crystal layer sandwiched between the first substrate and the second substrate; and a periphery of a display region on the first substrate And a side facing the liquid crystal layer in at least one of the first substrate and the second substrate so as to partially overlap the seal portion in the seal region. A liquid crystal device comprising: an inorganic alignment film having an extension portion extending from the display area to the seal area on the substrate surface and having an extension portion in contact with a surface of the seal portion facing the substrate surface side; A method for manufacturing a liquid crystal device, comprising:
A vapor deposition step of forming a vapor deposition film by vapor-depositing the inorganic material on the substrate surface using oblique vapor deposition over the display area and the seal area;
A removal step of forming the inorganic alignment film by partially removing the deposited film in the seal region so that the extension portion remains in the seal region. Production method. A first substrate, a second substrate disposed to face the first substrate, a liquid crystal layer sandwiched between the first substrate and the second substrate, and a display area on the first substrate. A sealing portion provided in the sealing region, and a substrate facing the liquid crystal layer in at least one of the first substrate and the second substrate so as to partially overlap the sealing portion in the sealing region The surface extends from the seal region to the region outside the seal region and is in contact with the surface of the seal portion facing the substrate surface, and is the same film as the inorganic alignment film formed in the display region A liquid crystal device manufacturing method for manufacturing a liquid crystal device including an inorganic film,
A vapor deposition step of forming a vapor deposition film by vapor-depositing an inorganic material on the substrate surface from the display area over the outer area using oblique vapor deposition;
And a removing step of partially removing the deposited film in the seal region so that the inorganic film remains in the seal region. An electronic apparatus comprising the liquid crystal device according to any one of claims 1 to 7.

Images