JP2007245064A - Washing apparatus for filtration membrane - Google Patents

Washing apparatus for filtration membrane Download PDF

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JP2007245064A
JP2007245064A JP2006074486A JP2006074486A JP2007245064A JP 2007245064 A JP2007245064 A JP 2007245064A JP 2006074486 A JP2006074486 A JP 2006074486A JP 2006074486 A JP2006074486 A JP 2006074486A JP 2007245064 A JP2007245064 A JP 2007245064A
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filtration membrane
water
line
backwash
valve
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JP5230076B2 (en
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Yasushi Mitsuzuka
康史 三塚
Masaaki Fujisaki
正晃 藤崎
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Fuji Electric Co Ltd
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Fuji Electric Systems Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a washing apparatus for a filtration membrane by a chemical addition reverse washing system capable of performing a desired flow rate control by a simple constitution without performing PID control of a flow rate of reverse washing water by an inverter for a reverse washing pump. <P>SOLUTION: The washing apparatus for the filtration membrane of the chemical addition reverse washing system is provided with the filtration membrane for cleaning raw water to obtain treatment water; a reverse washing line 30 for performing reverse washing of the filtration membrane using a part of the treatment water as reverse washing water of the filtration membrane; and a chemical injection line 24 for adding the chemical to the reverse washing line 30 to perform reverse washing. The reverse washing line 30 is provided with a by-pass line 31 for the reverse washing water on a part, and an opening/closing valve 33 is provided on one of the reverse washing line 30 and the by-pass line 31 and a constant flow rate valve 32 is provided on the other. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

この発明は、上水道、下水道、工業用水または廃水処理水など、原水中に含まれる汚濁物質をろ過膜により分離除去して浄化処理する、膜ろ過による水処理装置に関わり、特に、薬品添加逆洗方式のろ過膜の洗浄装置に関する。   The present invention relates to a water treatment apparatus using membrane filtration that separates and removes contaminants contained in raw water, such as waterworks, sewerage, industrial water, or wastewater treated water, using a filtration membrane, and in particular, backwashing with added chemicals. The present invention relates to a filter membrane cleaning apparatus.

被処理水中の汚濁物質を除去する方法として、膜ろ過を利用した水処理方法がよく知られている。この膜ろ過を用いた水処理においては、運転の継続に伴い、ろ過膜の表面に汚濁物質の付着層が生じ、目詰まり、固形物による流路閉塞などのファウリングが起こり、ろ過性能が低下する問題がある。   As a method for removing pollutants in the water to be treated, a water treatment method using membrane filtration is well known. In this water treatment using membrane filtration, as the operation continues, an adhering layer of pollutants is formed on the surface of the filtration membrane, clogging, fouling such as blockage of the flow path due to solid matter, and filtration performance decreases. There is a problem to do.

そのため運転サイクルにおいて、所定時間のろ過工程後に、物理洗浄または薬品洗浄を実施し、ファウリングを低減するようにしている。物理洗浄には、膜ろ過後の処理水を逆流させる逆流洗浄(逆洗)、膜の一次側での水流によるフラッシング、空気により膜を振動させるエアースクラビングなどがあり、物理的な作用によって付着物質を取り除いている。一方、薬品洗浄は、物理洗浄では除去しきれない物質を薬品によって分解または溶解させて除去する方法で、例えば次亜塩素酸ナトリウム、硫酸、塩酸などの薬品を添加した逆洗を用いた水処理方法が提案されている(特許文献1参照)。   Therefore, in the operation cycle, physical cleaning or chemical cleaning is performed after the filtration process for a predetermined time to reduce fouling. Physical cleaning includes backflow cleaning (backwashing) that reverses the treated water after membrane filtration, flushing by water flow on the primary side of the membrane, and air scrubbing that vibrates the membrane with air. Has been removed. On the other hand, chemical cleaning is a method of removing substances that cannot be removed by physical cleaning by decomposing or dissolving them with chemicals. For example, water treatment using backwashing with chemicals such as sodium hypochlorite, sulfuric acid and hydrochloric acid added. A method has been proposed (see Patent Document 1).

図3は、本発明の対象とする従来の薬品添加逆洗(CEB:Chemical Enhanced Back Wash)方式による一般的なろ過膜の洗浄方法の一例の概略システム系統図を示し、次亜塩素酸ナトリウム添加逆洗を行なう洗浄方法の一例を示す。   FIG. 3 shows a schematic system diagram of an example of a general filtration membrane cleaning method using a conventional chemical enhanced back wash (CEB) method, which is a subject of the present invention, in which sodium hypochlorite is added. An example of the washing | cleaning method which performs backwashing is shown.

図3において、1は原水、2は原水タンク、3は主ポンプ、4は原水供給弁、5は膜入口圧力計、6は水温計、7は膜モジュール(又は膜ろ過ユニット)、8は膜出口圧力計、9は流量センサー、10はろ過水出口弁、11はろ過水タンク入口弁、12はろ過水タンク、13は処理水、14は逆洗ポンプ、15は逆洗水供給弁、16は排水弁、17は次亜塩素酸ナトリウムタンク、18は次亜塩素酸ナトリウム添加ポンプ、19は次亜塩素酸ナトリウム添加バルブである。なお、図3においては、次亜塩素酸ナトリウム添加量制御装置の図示を省略している。   In FIG. 3, 1 is raw water, 2 is a raw water tank, 3 is a main pump, 4 is a raw water supply valve, 5 is a membrane inlet pressure gauge, 6 is a thermometer, 7 is a membrane module (or membrane filtration unit), and 8 is a membrane. Outlet pressure gauge, 9 is a flow sensor, 10 is a filtrate outlet valve, 11 is a filtrate tank inlet valve, 12 is a filtrate tank, 13 is treated water, 14 is a backwash pump, 15 is a backwash water supply valve, 16 Is a drain valve, 17 is a sodium hypochlorite tank, 18 is a sodium hypochlorite addition pump, and 19 is a sodium hypochlorite addition valve. In addition, in FIG. 3, illustration of the sodium hypochlorite addition amount control device is omitted.

次に、図3に示すろ過膜の水処理方法および洗浄方法等について説明する。原水タンク2に流入した原水1は、主ポンプ3により原水供給弁4を介して、膜モジュール7へ供給され、ろ過される(ろ過工程)。ここで、ろ過流量は、流量センサー9の値が一定となるように主ポンプ3をインバータ制御することにより行われる。ろ過された水は流量センサー9、ろ過水出口弁10、ろ過水タンク入口弁11を介して、ろ過水タンク12へ流入される。ろ過水タンク12で容量を越えたろ過水が処理水13として次工程へと通水される。所定時間のろ過が行われたところで、逆洗が実施される(逆洗工程)。逆洗工程は、ろ過水タンク12の水(もしくはろ過水タンクとは別に設けた図示しない逆洗水槽の水)を、逆洗ポンプ14により逆洗水供給弁15を介して、膜モジュール7の二次側から一次側へ流すことによりなされ、逆洗後の水は、排水弁16を介して排水される。   Next, a water treatment method and a cleaning method for the filtration membrane shown in FIG. 3 will be described. The raw water 1 flowing into the raw water tank 2 is supplied to the membrane module 7 by the main pump 3 via the raw water supply valve 4 and filtered (filtering step). Here, the filtration flow rate is performed by inverter-controlling the main pump 3 so that the value of the flow rate sensor 9 becomes constant. The filtered water flows into the filtrate water tank 12 through the flow rate sensor 9, the filtrate water outlet valve 10, and the filtrate water tank inlet valve 11. The filtered water exceeding the capacity in the filtered water tank 12 is passed to the next process as treated water 13. When filtration is performed for a predetermined time, backwashing is performed (backwashing step). In the backwashing process, the water in the filtrate water tank 12 (or the water in a backwash water tank (not shown) provided separately from the filtrate water tank) is supplied to the membrane module 7 by the backwash pump 14 via the backwash water supply valve 15. It is made by flowing from the secondary side to the primary side, and the water after backwashing is drained through the drain valve 16.

ろ過工程および逆洗工程の所定回数が終了した後に、薬品を添加して逆洗を実施する(薬品添加逆洗工程)。図3の場合、次亜塩素酸ナトリウム添加逆洗として、前記ろ過水による逆洗に続けて、次亜塩素酸ナトリウムタンク17に貯留された次亜塩素酸ナトリウムを、次亜塩素酸ナトリウム添加ポンプ18を用いて次亜塩素酸ナトリウム添加バルブ19を介して逆洗水に添加し、所定濃度の残留塩素濃度とした水を膜モジュールに注入する。膜モジュール7内が所定濃度の残留塩素水で満たされたところで一旦逆洗ポンプ14を停止し、各バルブを閉じて、所定時間膜モジュール7を残留塩素水に浸漬する(薬液浸漬工程)。所定時間浸漬後に再度逆洗ポンプを起動してろ過水にて逆洗を実施することにより膜モジュール内の塩素水を洗い流すリンスが実施される(リンス工程)。   After a predetermined number of times of the filtration step and the backwashing step are completed, the chemical is added to perform the backwashing (chemical addition backwashing step). In the case of FIG. 3, as sodium hypochlorite addition backwashing, sodium hypochlorite stored in the sodium hypochlorite tank 17 is replaced with sodium hypochlorite addition pump following backwashing with the filtered water. 18 is added to the backwash water through a sodium hypochlorite addition valve 19 and water having a predetermined residual chlorine concentration is injected into the membrane module. When the inside of the membrane module 7 is filled with residual chlorine water of a predetermined concentration, the backwash pump 14 is temporarily stopped, each valve is closed, and the membrane module 7 is immersed in the residual chlorine water for a predetermined time (chemical solution immersion step). After immersing for a predetermined time, the backwash pump is started again, and backwashing is performed with filtered water, thereby rinsing off the chlorine water in the membrane module (rinsing step).

上記のように、逆洗工程、薬品添加逆洗工程、薬液浸漬工程およびリンス工程を含むろ過膜の洗浄方式を、薬品添加逆洗方式と称する。なお、膜面へのファウリング物質の洗浄薬品としては、上記の次亜塩素酸ナトリウム以外に、硫酸、塩酸、その他の薬品が使われる場合もある。さらに、前記特許文献1に開示されたように複数の薬品が使われる場合もある。   As described above, a cleaning method for a filtration membrane including a backwashing step, a chemical addition backwashing step, a chemical solution immersion step, and a rinsing step is referred to as a chemical addition backwashing method. In addition to the above sodium hypochlorite, sulfuric acid, hydrochloric acid, and other chemicals may be used as cleaning chemicals for fouling substances on the membrane surface. Further, as disclosed in Patent Document 1, a plurality of chemicals may be used.

ところで、前記通常の逆洗工程や薬品添加逆洗工程における逆洗水の流量制御方法としては、従来、インバータを用いたPID制御により定流量制御が行われている。上記従来の制御方法及び装置について図2に基づいて述べる。図2は、ろ過水タンクとは別に設けた逆洗水槽22の水を、逆洗ポンプ22を有する逆洗ライン30を介して膜ろ過ユニット21に通流し、逆洗ライン30の途中に、薬液注入ライン24を設けた例を示す。図2において、25は流量計(伝送器)、26は流量制御器(PID調節計)、27はインバータ、28は制御コントローラ(PLC)、29はプログラマブル操作表示器(POD)である。   By the way, as a flow control method of the backwash water in the normal backwash process or the chemical addition backwash process, the constant flow control is conventionally performed by PID control using an inverter. The conventional control method and apparatus will be described with reference to FIG. In FIG. 2, water in a backwash water tank 22 provided separately from the filtrate water tank is passed through a membrane filtration unit 21 via a backwash line 30 having a backwash pump 22. An example in which an injection line 24 is provided is shown. In FIG. 2, 25 is a flow meter (transmitter), 26 is a flow controller (PID controller), 27 is an inverter, 28 is a controller (PLC), and 29 is a programmable operation display (POD).

図2により、以下に述べるような流量制御を行うとともに流量監視を行う。流量計25の出力は、流量制御器(PID調節計)26→インバータ27→逆洗ポンプ23用モータのフィードバックループでポンプモータの制御を行う。また、流量計25の伝送出力を分岐して制御コントローラ28に直接入力し、指令流量に対して異常な偏差が生じていないか監視を行なう。さらに、制御コントローラ(通常PLC:プログラマブルコントローラ) 28から流量制御器26へ流量指令値や設定パラメータを伝送し、流量制御器26はこの指令値に従って制御を行う。   According to FIG. 2, flow control as described below is performed and flow monitoring is performed. The output of the flow meter 25 controls the pump motor in the feedback loop of the flow controller (PID controller) 26 → inverter 27 → backwash pump 23 motor. Further, the transmission output of the flow meter 25 is branched and directly input to the controller 28 to monitor whether or not an abnormal deviation has occurred with respect to the command flow rate. Further, a flow rate command value and setting parameters are transmitted from the control controller (normal PLC: programmable controller) 28 to the flow rate controller 26, and the flow rate controller 26 performs control according to this command value.

また、流量制御器26から制御コントローラ28へ現状運転値、異常情報を伝送する。流量制御器26で、設定流量に対する上下偏差を監視させ、偏差を超えた場合には制御コントローラ28に警報を伝え、制御コントローラ28は偏差異常通知を行う。さらに、各設定流量において想定される周波数範囲を設定し、その周波数範囲より外れる場合には、制御コントローラ28は警報を伝える機能(周波数監視機能)を備える。
特開2004−41935号公報
Further, the current operation value and abnormality information are transmitted from the flow rate controller 26 to the control controller 28. The flow rate controller 26 monitors the vertical deviation with respect to the set flow rate. If the deviation is exceeded, an alarm is transmitted to the controller 28, and the controller 28 notifies the deviation abnormality. Furthermore, the frequency range assumed in each set flow rate is set, and when the frequency range is out of the frequency range, the controller 28 has a function of transmitting an alarm (frequency monitoring function).
JP 2004-41935 A

ところで、上記図2のように、逆洗水の流量を逆洗ポンプ用インバータによりPID制御する方法および装置は、比較的、装置規模が大きい場合には有効かつ必要性が高いが、比較的小規模な装置の場合には、装置構成上も制御方法上も、比較的シンプルなものが望まれる。   By the way, as shown in FIG. 2, the method and device for controlling the flow rate of backwash water by the inverter for backwash pump is effective and necessary when the device scale is relatively large. In the case of a large-scale device, a relatively simple device is desired in terms of the device configuration and the control method.

薬品添加逆洗(CEB)工程においては、薬品による効率的かつ安全性を重視した洗浄の観点から、通常の逆洗工程に比較して逆洗流量が低く(例えば、約1/2程度が望ましい)、定流量の制御が要求される。一方、通常逆洗は、複数回の通常逆洗が行なわれた毎に薬品添加逆洗(CEB)を決められた周期で行っていれば、長期運用でのろ過膜の差圧上昇が小さいため、厳密な流量制御または調整の必要性は、薬品添加逆洗(CEB)工程の時よりも低くて良い。従って、特に、薬品添加逆洗方式のろ過膜の洗浄装置においては、上記を考慮した上で、PID制御を行わない方法で制御が簡単な構成が望まれる。   In the chemical addition backwash (CEB) process, the backwash flow rate is lower than the normal backwash process (for example, about 1/2 is desirable from the viewpoint of washing with emphasis on the efficiency and safety by chemicals. ), Constant flow control is required. On the other hand, in normal backwashing, if the chemical addition backwashing (CEB) is performed at a fixed cycle each time multiple normal backwashing is performed, the increase in the differential pressure of the filtration membrane in a long-term operation is small. The need for strict flow control or adjustment may be lower than during the chemical backwash (CEB) process. Therefore, in particular, in a chemical addition backwashing filter membrane cleaning apparatus, a configuration that is easy to control by a method that does not perform PID control is desired in consideration of the above.

この発明は、上記のような点に鑑みてなされたもので、この発明の課題は、逆洗水の流量を逆洗ポンプ用インバータによりPID制御を行うことなく、単純な構成で所望の流量制御が実施可能な薬品添加逆洗方式によるろ過膜の洗浄装置を提供することにある。   The present invention has been made in view of the above points, and an object of the present invention is to achieve a desired flow rate control with a simple configuration without performing PID control on the flow rate of backwash water by an inverter for backwash pumps. Is to provide a filtration membrane cleaning apparatus by a chemical addition back-cleaning method.

前述の課題を解決するため、この発明は、原水を浄化処理して処理水を得るろ過膜と、前記処理水の一部を前記ろ過膜の逆洗水として用いてろ過膜の逆洗を行う逆洗ラインと、この逆洗ラインに薬品を添加して逆洗を行う薬品注入ラインとを備えた薬品添加逆洗方式のろ過膜の洗浄装置において、前記逆洗ラインは、その一部に前記逆洗水のバイパスラインを備え、かつ前記逆洗ライン及びバイパスラインの内、一方に開閉弁を他方に定流量弁を備えたことを特徴とする(請求項1)。   In order to solve the above-mentioned problems, the present invention performs a backwashing of a filtration membrane using a filtration membrane that purifies raw water to obtain treated water, and a part of the treated water as backwash water for the filtration membrane. In a washing apparatus for a filtration membrane of a chemical addition backwashing method comprising a backwashing line and a chemical injection line for performing chemical backwashing by adding a chemical to the backwashing line, the backwashing line includes a part of the backwashing line. A backwash water bypass line is provided, and one of the backwash line and the bypass line is provided with an on-off valve and the other is a constant flow valve.

また、上記請求項1の発明の実施態様としては、下記請求項2ないし4の発明が好ましい。即ち、前記請求項1に記載のろ過膜の洗浄装置において、前記開閉弁を備えた逆洗ライン又はバイパスラインは、開閉弁と直列に絞り部材を備えたものとする(請求項2)。さらに、前記請求項2に記載のろ過膜の洗浄装置において、前記絞り部材はオリフィスあるいは流量調節機能付弁とする(請求項3)。   As an embodiment of the invention of claim 1, the inventions of claims 2 to 4 below are preferable. That is, in the filtration membrane cleaning apparatus according to claim 1, the backwash line or bypass line provided with the on-off valve is provided with a throttle member in series with the on-off valve (claim 2). Furthermore, in the filtration membrane cleaning apparatus according to claim 2, the throttle member is an orifice or a valve with a flow rate adjusting function (claim 3).

なお、前記絞り部材は、流量が増大した際に、流速の自乗に比例して流体抵抗を増大させ、流量を絞って流量が過大になるのを抑制する目的で設けるものであるが、前記逆洗ライン又はバイパスラインの配管自体が流体抵抗が大きく、実質的に絞り部材を設けた場合と同等の機能を有する場合には、オリフィスなどの絞り部材を特別に設ける必要はない。   The throttle member is provided for the purpose of increasing the fluid resistance in proportion to the square of the flow velocity when the flow rate increases, and suppressing the flow rate from becoming excessive by reducing the flow rate. When the pipe of the washing line or the bypass line itself has a large fluid resistance and has substantially the same function as the case where the throttle member is provided, it is not necessary to provide a special throttle member such as an orifice.

また、前記請求項1ないし3のいずれか1項に記載のろ過膜の洗浄装置において、前記開閉弁と共に流量制御弁を設けたものとする(請求項4)。通常の逆洗工程において、インバータによるPID制御を行うまでもないものの、ある程度の自動の流量制御が必要な場合には、前記流量制御弁によりろ過膜の差圧の程度に応じて流量制御することができる。   Further, in the filtration membrane cleaning device according to any one of claims 1 to 3, a flow rate control valve is provided together with the on-off valve (claim 4). In the normal backwashing process, PID control by an inverter is not necessary, but when a certain amount of automatic flow control is required, the flow control valve controls the flow according to the degree of the differential pressure of the filtration membrane. Can do.

この発明によれば、薬品添加逆洗方式によるろ過膜の洗浄装置において、逆洗水の流量を逆洗ポンプ用インバータによりPID制御を行うことなく、単純な構成で所望の流量制御が実施可能となる。   According to the present invention, in a filtration membrane cleaning apparatus using a chemical addition backwashing method, a desired flow rate control can be performed with a simple configuration without performing PID control on the flow rate of backwashing water by an inverter for backwashing pumps. Become.

本発明の実施例について、図1に基づき、以下に述べる。なお、本発明はこの実施例によって限定されるものではない。   An embodiment of the present invention will be described below with reference to FIG. In addition, this invention is not limited by this Example.

図1は、本発明のろ過膜の洗浄装置の実施例に係る要部系統図である。図1において、図2に示した部材と機能が同一の部材には同一番号を付して示す。図1と図2との相違点は、図1における逆洗ライン30は、その一部に逆洗水のバイパスライン31を備え、かつ逆洗ライン30に定流量弁32を設け、バイパスライン31に開閉弁33を設けることにより、薬品添加逆洗(CEB)工程においては、開閉弁33を閉としてバイパスライン31への通流を止め、逆洗ライン30のみに逆洗水を通流し、CEBに必要な定流量を通流できるようした点である。   FIG. 1 is a system diagram of a principal part according to an embodiment of the filtration membrane cleaning apparatus of the present invention. In FIG. 1, members having the same functions as those shown in FIG. The difference between FIG. 1 and FIG. 2 is that the backwash line 30 in FIG. 1 includes a bypass line 31 of backwash water in a part thereof, and a constant flow valve 32 is provided in the backwash line 30. In the chemical addition backwash (CEB) process, the on / off valve 33 is closed to stop the flow to the bypass line 31, and the backwash water is passed only to the backwash line 30. It is the point that it was able to pass the constant flow rate required for the.

さらに、図1においては、より好ましい実施態様として、前記バイパスライン31に、開閉弁33と直列に絞り部材としてのオリフィス34を設けてある。   Further, in FIG. 1, as a more preferred embodiment, an orifice 34 as a throttle member is provided in the bypass line 31 in series with the on-off valve 33.

なお、図1において、定流量弁32をバイパスライン31側に設け、開閉弁33とオリフィス34とを逆洗ライン30側に設けてもよい。また、開閉弁33と共に必要に応じて図示しない流量制御弁を設けることもできる。さらに、別途、流量調節手動弁35を設けて流量調節を手動で行うようにすることもできる。   In FIG. 1, the constant flow valve 32 may be provided on the bypass line 31 side, and the on-off valve 33 and the orifice 34 may be provided on the backwash line 30 side. A flow rate control valve (not shown) can be provided together with the on-off valve 33 as necessary. Further, a flow rate adjustment manual valve 35 may be provided separately to adjust the flow rate manually.

上記図1の構成における逆洗流量の制御について以下に述べる。通常の逆洗においては、開閉弁33を開として、逆洗ライン30およびバイパスライン31の両管路に並列に逆洗水を通流し、ろ過膜処理システム毎に予測される好適な逆洗流量(CEB時の約2倍の流量)を通流する。好適流量に変動が予測される場合には、必要に応じて流量調節手動弁35により調節し、あるいは流量制御弁を設けて自動調節する。薬品添加逆洗(CEB)工程においては、開閉弁33を閉としてバイパスライン31への通流を止め、逆洗ライン30のみに逆洗水を通流し、定流量弁32を介してCEBに必要な定流量を通流する。   The control of the backwash flow rate in the configuration of FIG. 1 will be described below. In normal backwashing, the on-off valve 33 is opened and backwashing water is passed through both the backwashing line 30 and the bypass line 31 in parallel, and a suitable backwashing flow rate predicted for each filtration membrane treatment system. (The flow rate is about twice that of CEB). When fluctuations are expected in the preferred flow rate, the flow rate is adjusted by the flow rate adjustment manual valve 35 as necessary, or is automatically adjusted by providing a flow rate control valve. In the chemical addition backwash (CEB) process, the on-off valve 33 is closed to stop the flow to the bypass line 31, the backwash water is passed only to the backwash line 30, and the CEB is required via the constant flow valve 32. A constant flow rate.

上記によれば、単純な構成で所望の流量制御が実施可能となる。   According to the above, desired flow rate control can be performed with a simple configuration.

本発明のろ過膜の洗浄装置の実施例に係る要部系統図。The principal part systematic figure which concerns on the Example of the washing | cleaning apparatus of the filtration membrane of this invention. 逆洗水の流量を逆洗ポンプ用インバータによりPID制御する従来の制御方法及び装置の系統図。The system diagram of the conventional control method and apparatus which perform PID control of the flow volume of backwash water with the inverter for backwash pumps. 従来の薬品添加逆洗方式による一般的なろ過膜の洗浄方法の一例の概略システム系統図。Schematic system diagram of an example of a general filtration membrane cleaning method by a conventional chemical addition backwashing system.

符号の説明Explanation of symbols

21:膜ろ過ユニット、22:逆洗水槽、23:逆洗ポンプ、24:薬液注入ライン、30:逆洗ライン、31:バイパスライン、32:定流量弁、33:開閉弁、34:オリフィス、35:流量調節手動弁。   21: Membrane filtration unit, 22: Backwash water tank, 23: Backwash pump, 24: Chemical solution injection line, 30: Backwash line, 31: Bypass line, 32: Constant flow valve, 33: Open / close valve, 34: Orifice, 35: Flow control manual valve.

Claims (4)

原水を浄化処理して処理水を得るろ過膜と、前記処理水の一部を前記ろ過膜の逆洗水として用いてろ過膜の逆洗を行う逆洗ラインと、この逆洗ラインに薬品を添加して逆洗を行う薬品注入ラインとを備えた薬品添加逆洗方式のろ過膜の洗浄装置において、
前記逆洗ラインは、その一部に前記逆洗水のバイパスラインを備え、かつ前記逆洗ライン及びバイパスラインの内、一方に開閉弁を他方に定流量弁を備えたことを特徴とするろ過膜の洗浄装置。
A filtration membrane for purifying raw water to obtain treated water, a backwash line for backwashing the filtration membrane using a part of the treated water as backwash water for the filtration membrane, and chemicals in this backwash line In addition to the chemical addition backwashing type filtration membrane cleaning device equipped with a chemical injection line for backwashing by addition,
The backwash line is provided with a bypass line for the backwash water in a part thereof, and one of the backwash line and the bypass line is provided with an opening / closing valve and the other is a constant flow valve for filtration. Membrane cleaning device.
請求項1に記載のろ過膜の洗浄装置において、前記開閉弁を備えた逆洗ライン又はバイパスラインは、開閉弁と直列に絞り部材を備えたことを特徴とするろ過膜の洗浄装置。 The filtration membrane cleaning apparatus according to claim 1, wherein the backwash line or the bypass line provided with the on-off valve includes a throttle member in series with the on-off valve. 請求項2に記載のろ過膜の洗浄装置において、前記絞り部材はオリフィスあるいは流量調節機能付弁としたことを特徴とするろ過膜の洗浄装置。 3. The filtration membrane cleaning apparatus according to claim 2, wherein the throttle member is an orifice or a valve with a flow rate adjusting function. 請求項1ないし3のいずれか1項に記載のろ過膜の洗浄装置において、前記開閉弁と共に流量制御弁を設けたことを特徴とするろ過膜の洗浄装置。 The filtration membrane cleaning apparatus according to any one of claims 1 to 3, wherein a flow rate control valve is provided together with the on-off valve.
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Publication number Priority date Publication date Assignee Title
JP2013509298A (en) * 2009-10-30 2013-03-14 オアシス ウォーター,インコーポレーテッド Osmotic separation system and method

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JPH07204476A (en) * 1994-01-20 1995-08-08 Daicel Chem Ind Ltd Water purifying apparatus and operation thereof
JPH10192665A (en) * 1997-01-09 1998-07-28 Maezawa Ind Inc Backward washing of membrane
JP2005087887A (en) * 2003-09-17 2005-04-07 Fuji Electric Systems Co Ltd Membrane washing method

Patent Citations (3)

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JPH07204476A (en) * 1994-01-20 1995-08-08 Daicel Chem Ind Ltd Water purifying apparatus and operation thereof
JPH10192665A (en) * 1997-01-09 1998-07-28 Maezawa Ind Inc Backward washing of membrane
JP2005087887A (en) * 2003-09-17 2005-04-07 Fuji Electric Systems Co Ltd Membrane washing method

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013509298A (en) * 2009-10-30 2013-03-14 オアシス ウォーター,インコーポレーテッド Osmotic separation system and method
US9266065B2 (en) 2009-10-30 2016-02-23 Oasys Water, Inc. Osmotic separation systems and methods
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