JP2007241923A - Reader/writer having insulating metal luster layer - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an information distribution system utilizing an electric wave poster, having a display body of metallic luster, without impeding contactless communication function, on the scanner portion of a contactless IC. <P>SOLUTION: In the information distribution system, utilizing the electric wave poster for reading user ID information from the contactless IC of the user, a reader/writer 1 having an insulating metal luster layer includes a pasted display body 11, having an insulating metal luster layer 111 evaporated on the surface of the reader/writer mounting position of the system. The insulating metal luster layer 111 preferably has a sea-island structure formed of tin (Sn) or a tin alloy, such as tin-silicon (Sn-Si). Furthermore, on the surface of the insulating metal luster layer formed by evaporation, a hard coating layer 112 cured by ionization radiation or ultraviolet can be formed. A concealment layer may also be formed on the back face of a base material 110. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

The present invention relates to a reader / writer with an insulating metallic gloss layer. Specifically, a display body having an insulating metallic gloss layer by vapor deposition is attached to the surface portion of the reader / writer mounting position of the radio wave poster utilization information distribution system (hereinafter sometimes referred to simply as “radio wave poster system”), The present invention relates to a radio wave poster system that can clearly indicate the position of a reader / writer from the front side.
In addition, the insulating metal gloss layer by vapor deposition means an insulating and glossy layer while being a metal vapor deposition layer. Therefore, the technical field of the present invention relates to the field of manufacture and utilization of a reader / writer with an insulating metallic gloss layer.

In recent years, a radio wave poster system has been adopted as a system for providing information without contact. The radio wave poster utilization information distribution system is a ubiquitous communication system using a non-contact IC and a mobile phone. As the name “Radio Poster Use Information Distribution System” indicates, it is a system that aims to “distribute information about posters to users”. Specifically, a user can connect a non-contact IC tag to a reader of a radio poster system. The system is characterized in that content supported by the radio wave poster use information distribution system is distributed to a user's mobile terminal by being held over a writer.
The radio wave poster itself is not an established technical term, but may be referred to as an electronic poster, and may be referred to as other names. In this application, this term is used to conceptualize a device having a reader / writer that has a poster on its surface and can communicate with a wireless contactless IC, mobile phone, or contactless IC card.

  As shown in FIG. 5, the radio wave poster utilization information distribution system 10 includes four elements: a mobile phone 2, a non-contact IC 3, a radio wave poster 5, and an information distribution server 4. The mobile phone 2 includes a non-contact IC (non-contact IC tag or non-contact IC card) 3, but may be built in or may be a mobile terminal such as a mobile. The radio wave poster 5 usually has a thin box or a frame-like appearance in which the poster 12 is housed, but is provided with a reader / writer as a non-contact IC reader / writer and a personal computer (PC) on the back surface. In recent reader / writers, a non-contact IC reader / writer integrated with a PC is used.

  When the non-contact IC 3 approaches the display body 11 of the radio wave poster 5, the reader / writer on the back surface of the display body 11 reads the ID information held by the non-contact IC 3 and confirms the format or the like. The ID information is transmitted to the information distribution server 4 by wireless communication. Information related to the radio wave poster 5 is transmitted from the information distribution server 4 to the mobile phone 2 in a mail format.

By the way, in order to receive distribution of related information from the radio wave poster system, it is necessary to hold the non-contact IC 3 over the display body 11 on the surface of the reader / writer unit of the radio wave poster 10.
The surface side portion corresponding to the reader / writer position of the radio wave poster 5 is displayed as a circular circle or the like as shown in FIG. Usually it is. Originally, the display body 11 is more conspicuously effective by attaching a metal foil or vapor-depositing a metal to form a glossy light reflective medium. However, since metal foil, normal metal vapor deposition layers, or silk screen printing of ink in which aluminum powder is dispersed, shields electromagnetic waves and makes non-contact IC3 reading impossible, such a display should be made on the relevant part. There was a problem that could not be.

  This is because an eddy current is generated in a metal layer such as a metal deposition layer from an AC magnetic field generated by an electromagnetic wave for non-contact IC transmission / reception, and a magnetic flux repelling the transmission / reception magnetic flux is generated by this eddy current. This is considered to be because the magnetic flux passing through the antenna is attenuated and transmission / reception becomes difficult.

  The metal vapor deposition layer has a metallic luster that cannot be expressed by printing and is excellent in design, and when used in radio wave posters, the reader / writer part can be clearly indicated, so there has been a demand to adopt it and it will remain strong in the future. It is done. Therefore, there is a demand for a measure that does not hinder communication between the non-contact IC 3 and the reader / writer while using a metal vapor deposition layer.

By the way, the prior art which utilized the sea and island structure for metal vapor deposition conventionally exists like patent document 1-patent document 4. Sea / island structure (also referred to as island structure, island shape, or island shape) is a vapor deposition method in which the deposited metal is a small isolated island, and it is known that the deposited surface is insulative. . However, none of these prior documents proposes to use a sea-island-structured vapor deposition layer for a display such as a poster.
Patent Document 5 relates to a “poster with RF-ID” and Patent Document 6 relates to an “information distribution system”, but does not describe insulating metal deposition.

JP-A-62-174189 JP-A 63-157858 JP 63-249688 A Japanese Patent No. 2703370 JP 2002-162918 A JP 2003-023666 A

In the prior art, when a metal vapor-deposited layer or a metallic print layer is formed between the non-contact IC and the reader / writer, the communication characteristics are deteriorated. Could not be used. The same applies to the radio wave poster utilization information distribution system, in which a display body having a metallic print or the like cannot be attached to the reader / writer mounting position, and the radio wave poster system may not be used effectively.
Therefore, in the present invention, it was conceived that the above problem can be solved by adopting an insulating metal gloss layer having a sea / island structure for metal deposition, and as a result of intensive studies, the reader with an insulating metal gloss layer of the present invention was developed. The writer was completed.

  The gist of the present invention that solves the above problems is a radio wave poster use information distribution system that reads the user's ID information from a non-contact IC of the user, and vapor deposition is performed on the reader / writer mounting position surface of the radio wave poster use information distribution system. A reader / writer with an insulating metallic gloss layer, wherein a display body having an insulating metallic gloss layer is attached.

  In the above, the hard coat layer can be formed on the outermost surface of the display body having the insulating metallic gloss layer by vapor deposition. In this case, the surface can be protected and the water resistance can be improved. In addition, the display body is provided with an insulating metallic gloss layer by vapor deposition on a base material, and a concealing layer is formed on the opposite side of the insulating metallic gloss layer of the base material, so that the design is high. This also prevents the inside of the device from being seen through.

  Further, in the above, the insulating metallic luster layer by vapor deposition is composed of a single metal of tin (Sn), zinc (Zn), lead (Pb), bismuth (Bi) or two or more metals selected from the group thereof. An alloy or a deposited layer of tin-aluminum (Sn-Al) or tin-silicon (Sn-Si) is preferable as a material for easily forming the insulating deposited layer. Furthermore, when the insulating metallic luster layer by vapor deposition is a vapor deposition layer of tin-silicon (Sn—Si), the atomic ratio of aluminum to tin is in the range of 100: 1 to 50. It is particularly preferable for obtaining a metallic vapor deposition layer and obtaining a metallic luster.

In the above, it is preferable that the surface resistivity of the insulating metallic luster layer by vapor deposition is in the range of 10 ¹⁰ to 10 ²⁵ Ω / □. This is because when the surface resistivity is lower than 10 ¹⁰ Ω / □, communication hindrance occurs, and when it exceeds 10 ²⁵ Ω / □, the metallic luster is lost and the design is impaired.

  Further, in the above, it is preferable that the insulating metallic luster layer formed by vapor deposition has a sea / island structure, and the island size of the sea / island structure is in the range of 20 nm to 1 μm and the distance between the islands is 10 nm to 500 nm. If the island size is larger than 1 μm and the distance between the islands is smaller than 10 nm, communication is likely to be disturbed. Conversely, if the island size is smaller than 20 nm and the distance between the islands is larger than 500 nm, the metallic luster is lost and the design is impaired. Because.

The reader / writer with an insulating metal gloss layer of the present invention has a display body using an insulating metal vapor deposition layer attached to a portion where a non-contact IC is held, so that communication is performed like conventional metal vapor deposition or metal tone printing. There is no performance hindrance or degradation.
The reader / writer with an insulating metallic luster layer of the present invention has a light-reflective metal vapor deposition layer of the display body, and is easily visible to the user and can clearly indicate the position of the reader / writer, and the design of the radio wave poster. Can be increased.

  The reader / writer with an insulating metallic gloss layer of the present invention will be described below with reference to the drawings. 1 is a cross-sectional view of a reader / writer with an insulating metal gloss layer, FIG. 2 is a diagram showing a form of a radio wave poster, FIG. 3 is a schematic plan view of an insulating metal vapor deposition layer, and FIG. 4 is an insulating metal vapor deposition. FIG. 5 is an explanatory diagram of a radio wave poster utilization information distribution system, and FIG. 6 is a conceptual configuration diagram showing an example of a winding-type vacuum vapor deposition apparatus.

FIG. 2 is a diagram showing a form of a radio wave poster. As shown in FIG. 2A, the radio wave poster 5 is usually used in both a frame shape (wall-hanging type) containing the poster 12 and a box-like appearance (stand type) as shown in FIG. 2B. It is in a form that is used interchangeably with the method.
A reader / writer (not shown) is attached to the back of the radio wave poster 5. The number of reader / writers is not limited to one, and two devices with the same standard or two devices with different standards can be mounted. In the latter case, for example, a Felica (trademark) reader and an IC tag reader can be mounted.

In the case of FIG. 2 (B), it is a form of a radio wave poster with a thin box-like appearance, and a metal stand 16 is attached to the legs so as not to easily fall over. On the lower side of the poster 12 (on the stand 16 side), there is a portion over which the non-contact IC 3 is held, and a reader / writer is mounted on the back side (FIG. 2C). A display for displaying a non-contact IC and a display body 11 are attached to the surface side. The display body 11 may be a simple print display body having a circular or square shape, but blue and red LEDs 15 may be arranged in a circle or the like around the display body 11.
The LED 15 can distinguish between waiting time and reading time, and if the light emission pattern is changed, the user can be notified of successful reading.

FIG. 1 is a cross-sectional view taken along the line AA in FIG. 2B and shows a reader / writer 14 part.
A reader / writer 14 is attached to the back of the radio wave poster 5. The reader / writer 14 has the functions of a non-contact IC reader / writer and a PC as described above. Recently, a reader / writer 14 in which a non-contact IC reader / writer and a PC are modularized is often used. Basically, the reader / writer 14 reads the ID information from the contactless IC 3 held over, confirms whether or not the read ID information is in the format specified by the service, and then distributes the data by wireless communication. It transmits to the server 4.

On the front side of the radio wave poster 5, a display body 11 indicating a non-contact IC reading unit is attached. It is a feature of the reader / writer 1 with the insulating metallic gloss layer of the present invention that the insulating metallic gloss layer 111 by vapor deposition is used in the layer structure of the display body 11.
The display body 11 is provided with an undercoat layer 112 on the surface of the substrate 110 as necessary, and an insulating metallic luster layer 111 is formed on the surface of the undercoat layer 112 by vapor deposition (FIG. 1A). The substrate 110 usually has an adhesive layer 109. FIG. 1B shows a form in which a hard coat layer 113 is further formed on the surface of the insulating metallic gloss layer 111 by vapor deposition to enhance protection of the metal vapor deposition layer 111.

In order to improve the concealing property of the edged metallic luster layer 111, although not shown, it is preferable to provide a concealing layer on the side surface of the adhesive layer 109 of the substrate 110. The concealing layer can be formed by laminating a white film or paper base material or providing a concealing printing layer of white or the like. Moreover, in order to improve the designability of the display body 11, a pattern or the like may be printed on the surface of the edged metallic gloss layer 111.
Insulating metal vapor deposition may be applied to the box 13 made of a plastic molded body or paper material, but the display body 11 is usually manufactured as a label.

  FIG. 3 is a schematic plan view for explaining the structure of the insulating metal deposition layer, and FIG. 4 is a schematic sectional view thereof. The insulating metal vapor deposition layer 111 is generally said to be composed of a metal vapor deposition layer having a sea / island structure. This conventionally known sea / island structure can be formed by selecting a vapor deposition material, vapor deposition conditions, and the like. The metal vapor deposition layer 111 includes a minute island 111a and a vapor deposition layer having a gap 111b that defines the island and the island. Is formed. Vapor deposition layer consisting of sea / island structure can be formed on plastic or paper substrate via undercoat layer or by direct vapor deposition, or once deposited on transfer film and then transferred to the required substrate it can. In either case, the island size and shape are within a certain range, but are not exactly constant.

The size (average passing diameter) of such an island 111a is preferably in the range of 20 nm to 1 μm, and the interval (average interval) 111b between the islands is preferably in the range of 10 nm to 500 nm. If the island size is smaller than 20 nm, the metallic luster is lost and a sufficient decoration effect cannot be obtained. Further, if the thickness is 1 μm or more, it becomes conductive and communication is hindered. However, the island size and the distance between the islands are not correctly formed with a groove between the islands and may not be clearly identified with the naked eye or a microscope. In that case, as shown in the cross-sectional view of FIG. 4, the island 111a is thickly laminated with a dense metal, and the inter-island 111b is also laminated with a rough metal. The rough structure portion between the islands is a portion that becomes a grain boundary, and the resistance value is electrically large. In some cases, the islands 111a themselves are dense and have variable resistance values and are not conductive.
Therefore, when the interval between islands is not clear, it is appropriate to interpret the interval 111b between islands as a rough structure portion (crystal grain boundary or grain boundary) between islands.

In general, a metal or a noble metal having a low melting point is relatively easy to control during vapor deposition, and is selected from a single metal of tin (Sn), zinc (Zn), lead (Pb), bismuth (Bi), or a group thereof. More than one kind of metal, or an alloy of tin-aluminum (Sn-Al) or tin-silicon (Sn-Si) is used, but tin (Sn) is particularly easy. Tin-aluminum deposition can be accomplished by vaporizing tin and aluminum single metals in separate crucibles and depositing them as an alloy on the substrate. The same applies to the case of tin-silicon.
Aluminum is excellent in metallic luster, but the single metal of aluminum itself has a high surface energy and is likely to migrate on the substrate, and becomes a metal material that is unlikely to form island-like deposition.

The surface resistivity of the insulating metallic gloss layer by vapor deposition is preferably in the range of 10 ¹⁰ to 10 ²⁵ Ω / □. If it is less than 10 ¹⁰ Ω / □, it becomes close to a conductor and communication hindrance occurs, and if it is greater than 10 ²⁵ Ω / □, the metallic luster is lost and the design is impaired.
In the case of direct vapor deposition, the surface resistivity is adjusted by the film thickness depending on the vapor deposition rate and the vapor deposition time.

  The surface roughness of the surface of the insulating metallic luster layer is preferably within a certain range. Specifically, the center line average roughness Ra as measured with an atomic force microscope is in the range of 10 nm to 100 nm, preferably in the range of 10 nm to 70 nm. This is to make the smoothness of the insulating metallic luster layer 111 within a certain range. When the thickness exceeds 100 nm, the metallic luster is lost and the design property is lowered. This is because of a decrease. In this application, it is an insulating metal vapor deposition layer, Comprising: When the surface roughness exists in said fixed range, and it has glossiness, it shall express with an insulating metal glossy layer.

The radio poster 5 is used as follows (see FIGS. 2 and 5).
The radio wave poster 5 is displayed at the product sales corner, event venue, play guide, or the like for a target product or event guide. When the user brings the non-contact IC 3 close to the reader / writer 14 of the radio wave poster 5 using the display body 11 as a mark, the reader / writer 14 reads the ID information of the non-contact IC 3 and confirms the format and the like. Then, the ID information and the ID of the reader / writer are transmitted to the information distribution server 4 through the Internet or wireless communication.

In the information distribution server 4, the mail address of the user's cellular phone 2 corresponding to the unique ID information of the non-contact IC 3 and the information corresponding to the ID of the reader / writer 14 are registered. When the information distribution server 4 receives the ID information of the non-contact IC 3 and the ID information of the reader / writer 14, information related to the radio wave poster 5 is transmitted from the information distribution server 4 to the mobile phone 2 in a mail format. It is a mechanism.
Note that the non-contact IC 3 includes a card-like non-contact IC card, an Osaifu-Keitai (mobile phone equipped with Felica (trademark) function), etc., in addition to the original label-like non-contact IC tag. In the case of Osaifu-Keitai (trademark), it can be said that the mobile phone 2 and the non-contact IC 3 are integrated.

Next, manufacture of the display body used for this invention is demonstrated.
As described above, the display body 11 has the insulating metallic luster layer 111 formed on the surface of the substrate 110. A hard coat layer 113 can be formed on the surface of the insulating metallic gloss layer 111 to protect the insulating metallic gloss layer 111. In the following, a case where a plastic film is used as the substrate 110 will be described, but a clay-coated paper can be manufactured in substantially the same manner. However, since paper substrates generally contain moisture, it is often difficult to achieve vacuum conditions.

  Various plastic films are also preferably provided with a desired surface treatment layer on the vapor deposition surface in advance in order to improve adhesion to the vapor deposition film. As the surface treatment layer, for example, a corona discharge treatment, an ozone treatment, a low temperature plasma treatment using oxygen gas or nitrogen gas, a glow discharge treatment, or an oxidation treatment using chemicals can be applied. The surface pretreatment may be performed in a separate process. For example, in the case of surface pretreatment such as low-temperature plasma treatment or glow discharge treatment, the surface pretreatment may be performed by inline treatment as a pretreatment for forming a deposited film. it can.

As a method for improving the above-mentioned adhesion, for example, a surface treatment is performed by arbitrarily forming a primer coat agent layer, an undercoat agent layer, an anchor coat agent layer, an adhesive layer in advance on the surface of various resin films. It can also be a layer.
Examples of the pretreatment coating agent layer include polyester resins, polyamide resins, polyurethane resins, epoxy resins, phenol resins, (meth) acrylic resins, polyvinyl acetate resins, polyethylene, and polypropylene. A resin composition having a main component of a vehicle such as a polyolefin resin such as the above or a copolymer or modified resin thereof, a cellulose resin, or the like can be used.

  The thickness of the insulating metallic gloss layer 111 is about 10 nm to 50 nm. When it is 50 nm or more, it often becomes conductive. The vapor deposition method includes a physical vapor deposition method (PVD method) such as a vacuum vapor deposition method, a sputtering method, and an ion plating method which are generally employed, a thermal chemical vapor deposition method, and a photochemical vapor phase method. A chemical vapor deposition method (Chemical Vapor Deposition method; CVD method) such as a growth method, an atmospheric pressure plasma method, or the like can be used.

In the following, a generally performed vacuum deposition method will be described.
FIG. 6 is a conceptual configuration diagram illustrating an example of a winding-type vacuum vapor deposition apparatus. In FIG. 6, the vacuum deposition apparatus 20 includes a vacuum chamber 22, a supply roll 23 a disposed in the chamber, a take-up roll 23 b, a coating drum 24, and vapor deposition partitioned from the vacuum chamber 22 by partition plates 29 and 29. A chamber 25, a crucible 26 disposed in the vapor deposition chamber 25, a vapor deposition source 30, and masks 28 and 28 are provided. In this vacuum evaporation apparatus 20, the base film 21 fed out from the supply roll 23a in the vacuum chamber 22 is wound around the winding roll 23b through the peripheral surface of the coating drum 24 via the guide roll 32a. In the vapor deposition chamber 25, metal atoms are scattered from the vapor deposition source 30 heated by the crucible 26. The evaporated and scattered metal atoms adhere onto the substrate film 21 located between the masks 28 and 28 on the cooled coating drum 24 to form a metal vapor deposition layer. Since the coating drum 24 is cooled, the metal vapor is rapidly cooled to form a film. The base film 21 on which the metal vapor-deposited layer is formed is wound around the winding roll 23b through the guide roll 32b.

In the above, the partition plates 29 and 29 separate the vacuum chamber 22 from which the degree of vacuum is likely to be lowered by the base film 21 supplied from the supply roll 23a in order to increase the degree of vacuum in the vapor deposition chamber 25 where the vapor deposition source 30 is located. It becomes a partition.
The evaporation source 30 in the crucible 26 is heated and vaporized by a high frequency induction heating method, a resistance heating method, or an electron beam (EB) heating method, and the vapor is deposited on the base film 21. When performing vapor deposition with a single metal, the crucible 26 may be filled with a vapor deposition source 30 made of a single metal. The vapor deposition of simple metals such as tin (Sn), zinc (Zn), lead (Pb), and bismuth (Bi) can form a sea / island structure by the vapor deposition method.

The higher the degree of vacuum in the deposition chamber 25, the denser the metal film to be deposited and the lower the resistivity. In general, the inside of the vapor deposition chamber 25 is required to have a vacuum degree of 10 ⁻² Pa or less. However, vapor deposition for forming an insulating layer having a sea / island structure does not necessarily satisfy the condition. The deposition film thickness is controlled by the conveyance speed of the base film 21, the heating conditions of the deposition source, the interval between the masks 28 and 28, and the like.

  The evaporation source 30 in the crucible 26 is heated and vaporized by a high frequency induction heating method, a resistance heating method, or an electron beam (EB) heating method, and the vapor is deposited on the base film 21. When performing vapor deposition with a single metal, the crucible 26 may be filled with a vapor deposition source 30 made of a single metal. The vapor deposition of simple metals such as tin (Sn), zinc (Zn), lead (Pb), and bismuth (Bi) can form a sea / island structure by the vapor deposition method.

When forming an alloy composed of two or more kinds of metals on the base film 21, use crucibles in which two crucibles 27a and 27b are arranged in parallel as shown in the lower ellipse of FIG. What is necessary is just to fill with different types of metal materials 31 and 32, and to perform vapor deposition by multi-source vapor deposition. It is preferable that the different types of metal materials 31 and 32 usually have different heating conditions.
This is because when the same crucible or different crucibles are heated under the same conditions, only one of the metals evaporates first, and an alloy film having a desired atomic ratio is not formed. The metal atoms evaporated from the crucibles 27a and 27b form an alloy of the two kinds of metals on the base film 21. A vapor deposition film made of tin-lead (Sn—Pb), tin-aluminum (Sn—Al), tin-silicon (Sn—Si) alloy, or the like is formed by such a vapor deposition method.

  When the deposited film is made of a tin-aluminum (Sn-Al) alloy, the metal composition in the deposited film is such that the number of atoms of aluminum (Al) is about 1 to 50 with respect to the number of atoms of tin (Sn) 100. It is preferable that This is because when the aluminum atomic ratio exceeds 50, it is difficult to form an insulating film having a sea / island structure, and when it is less than 1, the metallic luster unique to aluminum cannot be provided.

When applying a hard-coat layer to the insulating metallic luster layer by vapor deposition, it carries out as follows. The hard coat layer 113 is formed from an ionizing radiation curable paint. Particularly preferred ionizing radiation curable paints are electron beam curable paints and ultraviolet curable paints.
The electron beam curable paint and the UV curable paint are similar in composition except that the latter contains a photopolymerization initiator and a sensitizer, and generally has a structure as a film forming component. The main component is a polymer having a radically polymerizable double bond or epoxy group, an oligomer, a monomer, and the like, and if necessary, a non-reactive polymer, an organic solvent, a wax, and other additives. .

  Particularly preferred for the purposes of the present invention are those in which the film-forming component has an acrylate functional group, more preferably a polyester acrylate or a urethane acrylate. For example, relatively low molecular weight polyester resins, polyether resins, acrylic resins, epoxy resins, urethane resins, alkyd resins, spiroacetal resins, polybutadiene resins, polythiol polyene resins, (meth) acrylates of polyfunctional compounds such as polyhydric alcohols Monofunctional monomers such as ethyl (meth) acrylate, ethylhexyl (meth) acrylate, styrene, methylstyrene, N-vinyl pyrrolidone as a reactive diluent and polyfunctional monomers such as trimethylolpropane tri (Meth) acrylate, hexanediol (meth) acrylate, tripropylene glycol (meth) acrylate, diethylene glycol (meth) acrylate, pentaerythritol (meth) acrylate, Dipentaerythritol hexa (meth) acrylate, 1,6-hexanediol di (meth) acrylate, in which a relatively high content of neopentyl glycol (meth) acrylate.

By using such a polyfunctional (meth) acrylate-based ionizing radiation curable coating, a hard coat layer excellent in surface hardness, transparency, scratch resistance, etc. can be formed.
Further, when such a hard coat layer 113 is required to have high flexibility, an appropriate amount of a thermoplastic resin such as a non-reactive acrylic resin or various waxes is added to the curable coating material. Can meet these requirements.

  In addition, in order to convert the curable coating material into an ultraviolet curable coating material, acetophenones, benzophenone, Michler benzoylbenzoate, α-amyloxime ester, tetramethylthiuram monosulfide, thioxanthones are used as photopolymerization initiators. In addition, n-butylamine, triethylamine, tri-n-butylphosphine, or the like can be mixed and used as a photosensitizer. Various grades of ionizing radiation curable coatings such as the above electron beam or ultraviolet curable coatings are known, and all are readily available from the market and can be used in the present invention.

  In addition, those curing methods can be used as they are in the prior art. For example, in the case of electron beam curing, Cockloft Walton type, bandegraph type, resonant transformer type, insulated core transformer type, linear type, dynamitron type, high frequency An electron beam having an energy of 50 to 1000 KeV, preferably 100 to 300 KeV emitted from various electron beam accelerators such as a mold is used. In the case of ultraviolet curing, an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a low pressure mercury lamp, a xenon arc, Ultraviolet rays emitted from a light source such as a metal halide lamp are used.

The curable paint as described above can be suitably applied by a gravure coating method, a gravure reverse coating method, a reverse roll coating method, or the like.
The coating amount of the curable coating is preferably 1.5 μm to 20 μm in thickness (when dry). If the coating amount is too small, sufficient scratch resistance cannot be obtained, and if it is too large, there is a problem that the curing rate is lowered.

  Hereinafter, an embodiment of the present invention will be specifically described with a focus on manufacturing a display body (label). In addition, the code | symbol used in an Example shall be the same as the code | symbol used in each drawing mentioned above.

<Formation of insulating metallic luster layer by vapor deposition>
As the substrate 110, a white polyethylene terephthalate (PET) film having a thickness of 50 μm previously subjected to corona discharge treatment was used. First, the white PET film is mounted on the feed roll of the PVD vacuum deposition apparatus 20, and then this is fed out, and tin (Sn) is deposited on the corona discharge treatment surface of the white PET film according to the following deposition conditions. An insulating metallic luster layer 111 was formed by vapor deposition with a thickness of 20 nm so as to have a sea / island structure.
Argon (Ar) gas was introduced into the deposition chamber in order to set the degree of vacuum in the deposition chamber 25 to the target degree of vacuum.

(Deposition conditions)
Degree of vacuum in the deposition chamber: 7.2 × 10 ⁻⁴ torr (9.6 × 10 ⁻² Pa)
Cooling drum temperature: 0 ° C
Vapor deposition rate: 7 nm / sec.
Deposition surface: Corona-treated surface (the cooling drum is the coating drum 24. The same applies hereinafter).

The island size of the insulating metallic gloss layer 111 obtained by the above deposition is 980 nm, the island spacing is 80 nm, the surface resistivity is 4.3 × 10 ¹⁸ Ω / □, and the center line when measured by an atomic force microscope. The average roughness Ra was 52 nm.
<Label processing>
After the pressure-sensitive adhesive processing was performed on the back surface of the PET film on which the insulating metallic gloss layer 111 was formed by vapor deposition as described above, the label 11 was completed by punching out into a circle having a diameter of 100 mm.

<Formation of insulating metallic luster layer by vapor deposition>
The same substrate 110 as in Example 1 and a white PET film having a thickness of 50 μm subjected to corona discharge treatment under the same conditions was mounted on the feed roll of the PVD vacuum deposition apparatus 20, and then this was fed out. On the corona-treated surface of the white PET film, an insulating metallic luster layer 111 having a thickness of 10 nm was formed under the following vapor deposition conditions so that tin (Sn) had a sea / island structure. Argon (Ar) gas was introduced into the deposition chamber in order to set the degree of vacuum in the deposition chamber 25 to the target degree of vacuum.

(Deposition conditions)
Degree of vacuum in the deposition chamber: 7.4 × 10 ⁻⁴ torr (9.9 × 10 ⁻² Pa)
Cooling drum temperature: 0 ° C
Vapor deposition rate: 7 nm / sec.
Deposition surface: Corona-treated surface

The island size of the insulating metallic gloss layer 111 obtained by the above deposition is 850 nm, the island spacing is 120 nm, the surface resistivity is 6.9 × 10 ²⁰ Ω / □, and the center line when measured with an atomic force microscope The average roughness Ra was 36 nm.
An ionizing radiation curable resin (PETD-31, manufactured by Dainichi Seika Kogyo Co., Ltd.) is applied to the surface of the vapor deposition layer of the PET film on which the insulating metallic luster layer 111 is formed by vapor deposition as described above so that the dry thickness is about 6 μm. And hardened with an electron beam with an acceleration voltage of 175 KV and an irradiation dose of 10 Mrad to obtain a hard coat layer 113.
<Label processing>
After the pressure-sensitive adhesive processing was performed on the back surface of the PET film on which the insulating metallic gloss layer 111 was formed by vapor deposition as described above, the label 11 was completed by punching out into a circle having a diameter of 100 mm.

<Formation of insulating metallic luster layer by vapor deposition>
The same substrate 110 as in Example 1 and a white PET film having a thickness of 50 μm subjected to corona discharge treatment under the same conditions was mounted on the feed roll of the PVD vacuum deposition apparatus 20, and then this was fed out. On the corona-treated surface of the white PET film, the insulating metal luster layer 111 having a thickness of 20 nm is formed so that tin (Sn) and aluminum (Al) have a sea / island structure by the following vapor deposition conditions (multi-source vapor deposition). Formed.

(Deposition conditions)
Degree of vacuum in the deposition chamber: 6.7 × 10 ⁻⁴ torr (8.9 × 10 ⁻² Pa)
Cooling drum temperature: 0 ° C
Vapor deposition rate: 15 nm / sec.
Deposition surface: Corona-treated surface

The insulating metallic luster layer 111 by vapor deposition obtained above is made of a tin-aluminum alloy, the island size is 1500 nm, the island spacing is 20 nm, the surface resistivity is 2.2 × 10 ¹⁰ Ω / □, atoms The center line average roughness Ra when measured with an atomic force microscope was 42 nm. When the produced Sn—Al alloy was analyzed with an X-ray photoelectron spectrometer (“ESCA” (Electron Specstrocopy Chemical Analyzer): VG Scientific, UK), the ratio of Sn to Al was 100: It was in the range of 1-10.
<Label processing>
After the pressure-sensitive adhesive processing was performed on the back surface of the PET film on which the insulating metallic gloss layer 111 was formed by vapor deposition as described above, the label 11 was completed by punching out into a circle having a diameter of 100 mm.

<Formation of insulating metallic luster layer by vapor deposition>
The same substrate 110 as in Example 1 and a white PET film having a thickness of 50 μm subjected to corona discharge treatment under the same conditions was mounted on the feed roll of the PVD vacuum deposition apparatus 20, and then this was fed out. On the corona-treated surface of the white PET film, an insulating metallic luster layer 111 having a thickness of 10 nm was formed under the following vapor deposition conditions so that tin (Sn) had a sea / island structure.

(Deposition conditions)
Degree of vacuum in the deposition chamber: 2.6 × 10 ⁻⁴ torr (3.5 × 10 ⁻² Pa)
Cooling drum temperature: 0 ° C
Deposition rate: 1 nm / sec.
Deposition surface: Corona-treated surface

The island size of the insulating metallic luster layer 111 obtained by vapor deposition as described above is 780 nm, the island spacing is 170 nm, the surface resistivity is 1.2 × 10 ¹⁸ Ω / □, and the center line when measured with an atomic force microscope The average roughness Ra was 14 nm.
<Label processing>
A white concealing layer was printed on the surface opposite to the insulating metallic luster layer 111 surface of the base material 110 having the metal vapor deposition layer prepared as described above, using white ink containing a titanium oxide pigment by gravure printing. The surface of the white hiding layer was processed with an adhesive and then punched into a circle with a diameter of 100 mm to complete the label 11.

(Comparative example)
<Formation of metal deposition layer>
The same substrate 110 as in Example 1 and a white PET film having a thickness of 50 μm subjected to corona discharge treatment under the same conditions was mounted on the feed roll of the PVD vacuum deposition apparatus 20, and then this was fed out. On the corona-treated surface of the white PET film, aluminum (Al) was formed into a normal continuous vapor deposition film having a film thickness of 40 nm under the following vapor deposition conditions.

(Deposition conditions)
Degree of vacuum in the deposition chamber: 3.7 × 10 ⁻⁴ torr (4.9 × 10 ⁻² Pa)
Cooling drum temperature: 0 ° C
Vapor deposition rate: 25 nm / sec.
Deposition surface: Corona-treated surface

The metal vapor-deposited layer obtained above is a continuous vapor-deposited film, the surface resistivity is 9.7 × 10 ⁻² Ω / □, and the center line average roughness Ra when measured with an atomic force microscope is 2 nm. Met.
<Label processing>
After the adhesive film was processed on the back surface of the PET film on which the metal vapor-deposited layer was formed as described above, the label 11 was completed by punching out into a circle having a diameter of 100 mm.

The labels 11 of Example 1, Example 2, Example 3, Example 4, and Comparative Example obtained as described above are attached to the surface of the reader / writer mounting portion of the radio wave poster, and the non-contact IC tag 3 is read. A test was conducted. As the reader / writer, a 13.56 MHz non-contact IC tag reader / writer (manufactured by Weltcat) was used.
As a result, it was possible to read the ID information without any trouble in the labels of Example 1, Example 2, Example 3, and Example 4, but in the case of the comparative example, reading was impossible.
The display body (label) 11 of Example 2 had high scratch resistance because the hard coat layer was formed on the surface of the insulating metallic luster layer 111 by vapor deposition.

It is sectional drawing of the reader / writer with an insulating metal glossy layer. It is a figure which shows the form of an electromagnetic wave poster. It is a model top view of an insulating metal vapor deposition layer. It is a schematic cross section of an insulating metal vapor deposition layer. It is explanatory drawing of an electromagnetic wave poster utilization information delivery system. It is a notional block diagram which shows an example of a winding-type vacuum deposition apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Reader / writer with insulating metallic luster layer 2 Mobile phone 3 Non-contact IC, non-contact IC tag 4 Information distribution server 5 Electric wave poster 10 Electric wave poster use information distribution system 11 Display body, label 110 Base material 111 Insulating metallic luster by vapor deposition Layer 112 Undercoat layer 113 Hard coat layer 12 Poster 13 Box 14 Reader / writer 15 LED
16 Stand 20 Vacuum evaporation apparatus 21 Base film 22 Vacuum chamber 24 Coating drum, cooling drum 25 Deposition chamber

Claims (7)

In a radio wave poster use information distribution system for reading the user's ID information from a user's non-contact IC, a display body having an insulating metallic gloss layer formed by vapor deposition on the reader / writer mounting position surface of the radio wave poster use information distribution system A reader / writer with an insulating metallic luster layer, which is affixed. 2. The reader / writer with an insulating metallic gloss layer according to claim 1, wherein a hard coat layer is formed on the outermost surface of the display body having the insulating metallic gloss layer by vapor deposition. 2. The display body according to claim 1, wherein an insulating metal gloss layer is provided on the base material by vapor deposition, and a concealing layer is formed on the side surface of the base material opposite to the insulating metal gloss layer. 2. A reader / writer with an insulating metallic luster layer. An insulating metal luster layer formed by vapor deposition is an alloy composed of a single metal of tin (Sn), zinc (Zn), lead (Pb), bismuth (Bi) or two or more metals selected from the group, or tin The reader / writer with an insulating metallic luster layer according to claim 1, wherein the reader / writer is an evaporated layer of aluminum (Sn-Al) or tin-silicon (Sn-Si). The insulating metallic luster layer by vapor deposition is a vapor deposition layer of tin-silicon (Sn-Si), wherein the atomic ratio of aluminum to tin is in the range of 100 to 1-50. The reader / writer with an insulating metallic luster layer according to claim 4. 6. The insulating metallic luster according to claim 1, wherein the surface resistivity of the insulating metallic luster layer by vapor deposition is in the range of ¹⁰ <10> to ¹⁰ < ²⁵ > [Omega] / □. Reader / writer with layer. The insulating metallic luster layer formed by vapor deposition is composed of a sea / island structure, and the island size of the sea / island structure is in the range of 20 nm to 1 μm and the distance between the islands is in the range of 10 nm to 500 nm. The reader / writer with an insulating metallic luster layer according to claim 6.