JP2007219362A - Polymerizable composition, negative resist using the same, and image pattern forming method using the same - Google Patents

Abstract

（式中、Ｒ₁およびＲ₂はそれぞれ独立に、１価の有機残基を表す。Ｒ₃は水素原子もしくは１価の有機残基を表す。）
【選択図】なしThe present invention relates to a negative resist material having a high curing speed and capable of being suitably used for very clear pattern exposure or direct drawing, and having excellent adhesion to a substrate and having alkali developability, and the negative type Provision of an image pattern forming method using a resist.
A photo radical polymerization initiator (A), a carbazole sensitizer (B), a radical polymerizable compound (C), an alkali-soluble resin (D), and a thiol compound represented by the following general formula (1) A polymerizable composition comprising (E). General formula (1)

(In the formula, R ₁ and R ₂ each independently represents a monovalent organic residue. R ₃ represents a hydrogen atom or a monovalent organic residue.)
[Selection figure] None

Description

  The present invention relates to a polymerizable composition, a negative resist using the same, and an image pattern forming method using the same. More specifically, active radicals are efficiently generated by irradiation of energy rays, particularly light, radically polymerizable compounds are polymerized in a short time, and exposure is performed through a mask film in which a pattern is recorded in advance or direct drawing by a laser light source. For example, spacers for liquid crystal displays, solder resists, resists for circuit board creation, photoresists for semiconductors, resists for microelectronics, hologram materials, rib materials for plasma displays, resists for manufacturing micromachine parts, etching resists, waveguide materials , A composition for an image recording material using microcapsules, a polymerizable composition for obtaining a cured product having good physical properties in the field of various devices and the like, and a negative resist using the composition and the same Image pattern formation Law on.

  In recent years, a photoresist method using a photosensitive resin has been used in various fields. In this photoresist method, for example, a photosensitive resin layer is formed on a substrate surface on which a desired image is to be provided by coating or transfer from another base material, and then an original image is formed on the photosensitive resin layer. A method is generally employed in which after irradiation with an energy ray, an unirradiated portion is removed by a development treatment with a solvent or an aqueous alkali solution to form an image corresponding to the original image. As an example using such a photoresist method, for example, a certain type of negative resist is disclosed as a material for forming a display panel spacer (see Patent Documents 1 to 4). Also, certain types of negative resists have been disclosed as materials for manufacturing electrical / electronic components and printed circuit boards (see Patent Documents 5 to 8). Any of these can function as a resist composition, but in recent years, in order to improve productivity and respond to various newly proposed processes, the resist composition is added with higher and new functions, especially higher The development of various resist compositions has been actively promoted as a sensitive resist composition has been required.

In addition, for the realization of higher-definition patterns, the linearity of the pattern and the cross-sectional shape of the resist pattern after development, as well as the adhesion of the pattern to the substrate, are important factors that show resist performance. ing.
JP-A-11-174464 JP 2001-226449 A JP 2002-341931 A JP 2001-261761 A Japanese Patent Laid-Open No. 10-198033 JP 2002-236362 A JP 2002-249644 A JP 2001-302871 A

  An object of the present invention is to provide a highly sensitive polymerizable composition capable of efficiently generating active radicals upon irradiation with energy rays, particularly light, and capable of polymerizing a radical polymerizable compound in an extremely short time. A further object of the present invention is that the curing speed is extremely high, and it can be suitably used for very clear pattern exposure or direct drawing by an energy beam, and has excellent adhesion to a substrate, in particular. An object of the present invention is to provide a negative resist material having alkali developability suitably used for a photoresist material and an image pattern forming method using the negative resist.

As a result of intensive studies to solve the above problems, the present inventors have reached the present invention. That is, the present invention relates to a photo radical polymerization initiator (A) represented by the following general formula (1), a sensitizer (B) represented by the following general formula (2), a radical polymerizable compound (C), an alkali The present invention relates to a polymerizable composition comprising a soluble resin (D) and a thiol compound (E).
General formula (1)

(Wherein R ₁ and R ₂ each independently represents a monovalent organic residue. R ₁ and R ₂ may be a cyclic structure in which R ₁ and R ₂ are bonded together.
R ₃ represents a hydrogen atom or a monovalent organic residue. )
General formula (2)

(In the formula, R _{4 to} R ₁₂ each independently represents a hydrogen atom or a monovalent organic residue. However, 1 to 4 of R _{5 to} R ₁₂ are organic compounds represented by the following general formula (3). Including residues.)
General formula (3)

(In the formula, R ₁₃ represents a hydrogen atom or a monovalent organic residue.)
The present invention also relates to a negative resist comprising the polymerizable composition.

  The present invention also provides a method for forming an image pattern, comprising: laminating the negative resist on a substrate, partially irradiating and curing an energy ray, and removing an unirradiated portion with an alkali developer. About.

  The present invention also relates to an image pattern formed by the above image pattern forming method.

  The polymerizable composition of the present invention efficiently generates active radicals when irradiated with energy rays, particularly light, and is highly sensitive and capable of polymerizing radically polymerizable compounds in a short time. It is a polymerizable composition that can be suitably used for pattern exposure or direct drawing, and has very good adhesion to a substrate. Therefore, it was possible to provide a highly sensitive negative resist suitably used for a photoresist material and an image pattern forming method using the negative resist.

First, the radical photopolymerization initiator (A) of the present invention will be described. The radical photopolymerization initiator of the present invention is characterized by comprising an oxime derivative represented by the general formula (1). In the general formula (1), the substituents R ₁ and R ₂ each independently represent a monovalent organic residue. Also, R ₁ and R ₂ may be an annular structure that is integrally bonded to each other. R ₃ represents a hydrogen atom or a monovalent organic residue.

  In the present invention, the monovalent organic residue includes an alkyl group which may have a substituent, an aryl group which may have a substituent, an alkenyl group which may have a substituent, and a substituent. An alkynyl group which may have a substituent, an alkoxy group which may have a substituent, an aryloxy group which may have a substituent, an acyloxy group which may have a substituent, an alkyl which may have a substituent Sulfanyl group, arylsulfanyl group which may have a substituent, alkylsulfinyl group which may have a substituent, arylsulfinyl group which may have a substituent, alkylsulfonyl group which may have a substituent An arylsulfonyl group which may have a substituent, an acyl group which may have a substituent, an alkoxycarbonyl group which may have a substituent, a carbamoyl group which may have a substituent, Have There sulfamoyl group, an amino group which may have a substituent, a substituent having optionally phosphinoyl group, substituent a heterocyclic group which may have, a halogen group.

  As the alkyl group which may have a substituent, an alkyl group having 1 to 30 carbon atoms is preferable, for example, methyl group, ethyl group, propyl group, butyl group, hexyl group, octyl group, decyl group, dodecyl group, Okudadecyl group, isopropyl group, isobutyl group, sec-butyl group, tert-butyl group, 1-ethylpentyl group, cyclopentyl group, cyclohexyl group, trifluoromethyl group, 2-ethylhexyl group, phenacyl group, 1-naphthoylmethyl group 2-naphthoylmethyl group, 4-methylsulfanylphenacyl group, 4-phenylsulfanylphenacyl group, 4-dimethylaminophenacyl group, 4-cyanophenacyl group 4-methylphenacyl group, 2-methylphenacyl group, 3-fluorophenacyl group, 3-trifluoromethylphenacyl group, 3-nitrophena Examples include a syl group.

  The aryl group which may have a substituent is preferably an aryl group having 6 to 30 carbon atoms, such as a phenyl group, a biphenyl group, a 1-naphthyl group, a 2-naphthyl group, a 9-anthryl group, and a 9-phenanthryl. Group, 1-pyrenyl group, 5-naphthacenyl group, 1-indenyl group, 2-azurenyl group, 9-fluorenyl group, terphenyl group, quarterphenyl group, o-, m-, and p-tolyl group, xylyl group, o-, m-, and p-cumenyl, mesityl, pentalenyl, binaphthalenyl, tarnaphthalenyl, quarternaphthalenyl, heptaenyl, biphenylenyl, indacenyl, fluoranthenyl, acenaphthylenyl, aceanthrylenyl Group, phenalenyl group, fluorenyl group, anthryl group, bianthracenyl group, ter Nthracenyl group, quarteranthracenyl group, anthraquinolyl group, phenanthryl group, triphenylenyl group, pyrenyl group, chrysenyl group, naphthacenyl group, preadenyl group, picenyl group, perylenyl group, pentaphenyl group, pentacenyl group, tetraphenylenyl group, Examples include a hexaphenyl group, a hexacenyl group, a rubicenyl group, a coronenyl group, a trinaphthylenyl group, a heptaphenyl group, a heptacenyl group, a pyranthrenyl group, and an ovalenyl group.

  As an alkenyl group which may have a substituent, a C2-C10 alkenyl group is preferable, for example, a vinyl group, an allyl group, a styryl group etc. are mentioned.

  The alkynyl group which may have a substituent is preferably an alkynyl group having 2 to 10 carbon atoms, and examples thereof include an ethynyl group, a propynyl group, and a propargyl group.

  The alkoxy group which may have a substituent is preferably an alkoxy group having 1 to 30 carbon atoms, for example, methoxy group, ethoxy group, propyloxy group, isopropyloxy group, butoxy group, isobutoxy group, sec-butoxy group. Tert-butoxy group, pentyloxy group, isopentyloxy group, hexyloxy group, heptyloxy group, octyloxy group, 2-ethylhexyloxy group, decyloxy group, dodecyloxy group, octadecyloxy group, ethoxycarbonylmethyl group, 2 -Ethylhexyloxycarbonylmethyloxy group, aminocarbonylmethyloxy group, N, N-dibutylaminocarbonylmethyloxy group, N-methylaminocarbonylmethyloxy group, N-ethylaminocarbonylmethyloxy group, N-octylaminocarbonylmethyl A ruoxy group, an N-methyl-N-benzylaminocarbonylmethyloxy group, a benzyloxy group, a cyanomethyloxy group, and the like.

  The aryloxy group which may have a substituent is preferably an aryloxy group having 6 to 30 carbon atoms, such as a phenyloxy group, a 1-naphthyloxy group, a 2-naphthyloxy group, a 2-chlorophenyloxy group, 2-methylphenyloxy group, 2-methoxyphenyloxy group, 2-butoxyphenyloxy group, 3-chlorophenyloxy group, 3-trifluoromethylphenyloxy group, 3-cyanophenyloxy group, 3-nitrophenyloxy group, Examples include 4-fluorophenyloxy group, 4-cyanophenyloxy group, 4-methoxyphenyloxy group, 4-dimethylaminophenyloxy group, 4-methylsulfanylphenyloxy group, 4-phenylsulfanylphenyloxy group, and the like.

  The acyloxy group which may have a substituent is preferably an acyloxy group having 2 to 20 carbon atoms, such as an acetyloxy group, a propanoyloxy group, a butanoyloxy group, a pentanoyloxy group, or trifluoromethylcarbonyloxy. Group, benzoyloxy group, 1-naphthylcarbonyloxy group, 2-naphthylcarbonyloxy group and the like.

  The alkylsulfanyl group which may have a substituent is preferably an alkylsulfanyl group having 1 to 20 carbon atoms. For example, a methylsulfanyl group, an ethylsulfanyl group, a propylsulfanyl group, an isopropylsulfanyl group, a butylsulfanyl group, or a hexylsulfanyl group. Group, cyclohexylsulfanyl group, octylsulfanyl group, 2-ethylhexylsulfanyl group, decanoylsulfanyl group, dodecanoylsulfanyl group, octadecanoylsulfanyl group, cyanomethylsulfanyl group, methoxymethylsulfanyl group and the like.

  The arylsulfanyl group which may have a substituent is preferably an arylsulfanyl group having 6 to 30 carbon atoms, such as a phenylsulfanyl group, 1-naphthylsulfanyl group, 2-naphthylsulfanyl group, 2-chlorophenylsulfanyl group, 2-methylphenylsulfanyl group, 2-methoxyphenylsulfanyl group, 2-butoxyphenylsulfanyl group, 3-chlorophenylsulfanyl group, 3-trifluoromethylphenylsulfanyl group, 3-cyanophenylsulfanyl group, 3-nitrophenylsulfanyl group, 4-fluorophenylsulfanyl group, 4-cyanophenylsulfanyl group, 4-methoxyphenylsulfanyl group, 4-methylsulfanylphenylsulfanyl group, 4-phenylsulfanylphenylsulfuric group Aniru group, 4-dimethylamino-phenylsulfanyl group and the like.

  The alkylsulfinyl group which may have a substituent is preferably an alkylsulfinyl group having 1 to 20 carbon atoms. For example, a methylsulfinyl group, an ethylsulfinyl group, a propylsulfinyl group, an isopropylsulfinyl group, a butylsulfinyl group, and a hexylsulfinyl group. Group, cyclohexylsulfinyl group, octylsulfinyl group, 2-ethylhexylsulfinyl group, decanoylsulfinyl group, dodecanoylsulfinyl group, octadecanoylsulfinyl group, cyanomethylsulfinyl group, methoxymethylsulfinyl group and the like.

  The arylsulfinyl group which may have a substituent is preferably an arylsulfinyl group having 6 to 30 carbon atoms, such as a phenylsulfinyl group, 1-naphthylsulfinyl group, 2-naphthylsulfinyl group, 2-chlorophenylsulfinyl group, 2-methylphenylsulfinyl group, 2-methoxyphenylsulfinyl group, 2-butoxyphenylsulfinyl group, 3-chlorophenylsulfinyl group, 3-trifluoromethylphenylsulfinyl group, 3-cyanophenylsulfinyl group, 3-nitrophenylsulfinyl group, 4-fluorophenylsulfinyl group, 4-cyanophenylsulfinyl group, 4-methoxyphenylsulfinyl group, 4-methylsulfanylphenylsulfinyl group, 4-phenylsulfanylphenylsulfuric group Iniru group, 4-dimethylaminophenyl sulfinyl group and the like.

  The alkylsulfonyl group which may have a substituent is preferably an alkylsulfonyl group having 1 to 20 carbon atoms. For example, a methylsulfonyl group, an ethylsulfonyl group, a propylsulfonyl group, an isopropylsulfonyl group, a butylsulfonyl group, a hexylsulfonyl group. Group, cyclohexylsulfonyl group, octylsulfonyl group, 2-ethylhexylsulfonyl group, decanoylsulfonyl group, dodecanoylsulfonyl group, octadecanoylsulfonyl group, cyanomethylsulfonyl group, methoxymethylsulfonyl group and the like.

  The arylsulfonyl group which may have a substituent is preferably an arylsulfonyl group having 6 to 30 carbon atoms, such as a phenylsulfonyl group, a 1-naphthylsulfonyl group, a 2-naphthylsulfonyl group, a 2-chlorophenylsulfonyl group, 2-methylphenylsulfonyl group, 2-methoxyphenylsulfonyl group, 2-butoxyphenylsulfonyl group, 3-chlorophenylsulfonyl group, 3-trifluoromethylphenylsulfonyl group, 3-cyanophenylsulfonyl group, 3-nitrophenylsulfonyl group, 4-fluorophenylsulfonyl group, 4-cyanophenylsulfonyl group, 4-methoxyphenylsulfonyl group, 4-methylsulfanylphenylsulfonyl group, 4-phenylsulfanylphenylsulfonyl group, 4-dimethylaminopheny Sulfonyl group, and the like.

  The acyl group which may have a substituent is preferably an acyl group having 2 to 20 carbon atoms, for example, acetyl group, propanoyl group, butanoyl group, trifluoromethylcarbonyl group, pentanoyl group, benzoyl group, 1-naphthoyl. Group, 2-naphthoyl group, 4-methylsulfanylbenzoyl group, 4-phenylsulfanylbenzoyl group, 4-dimethylaminobenzoyl group, 4-diethylaminobenzoyl group, 2-chlorobenzoyl group, 2-methylbenzoyl group, 2-methoxybenzoyl Group, 2-butoxybenzoyl group, 3-chlorobenzoyl group, 3-trifluoromethylbenzoyl group, 3-cyanobenzoyl group, 3-nitrobenzoyl group, 4-fluorobenzoyl group, 4-cyanobenzoyl group, 4-methoxybenzoyl Groups and the like.

  The alkoxycarbonyl group which may have a substituent is preferably an alkoxycarbonyl group having 2 to 20 carbon atoms, such as a methoxycarbonyl group, ethoxycarbonyl group, propoxycarbonyl group, butoxycarbonyl group, hexyloxycarbonyl group, octyl. Oxycarbonyl group, decyloxycarbonyl group, octadecyloxycarbonyl group, phenoxycarbonyl group, trifluoromethyloxycarbonyl group, 1-naphthyloxycarbonyl group, 2-naphthyloxycarbonyl group, 4-methylsulfanylphenyloxycarbonyl group, 4- Phenylsulfanylphenyloxycarbonyl group, 4-dimethylaminophenyloxycarbonyl group, 4-diethylaminophenyloxycarbonyl group, 2-chlorophenyloxycarbonyl group Group, 2-methylphenyloxycarbonyl group, 2-methoxyphenyloxycarbonyl group, 2-butoxyphenyloxycarbonyl group, 3-chlorophenyloxycarbonyl group, 3-trifluoromethylphenyloxycarbonyl group, 3-cyanophenyloxycarbonyl group , 3-nitrophenyloxycarbonyl group, 4-fluorophenyloxycarbonyl group, 4-cyanophenyloxycarbonyl group, 4-methoxyphenyloxycarbonyl group and the like.

  The carbamoyl group which may have a substituent is preferably a carbamoyl group having 1 to 30 carbon atoms, for example, an N-methylcarbamoyl group, an N-ethylcarbamoyl group, an N-propylcarbamoyl group, or an N-butylcarbamoyl group. N-hexylcarbamoyl group, N-cyclohexylcarbamoyl group, N-octylcarbamoyl group, N-decylcarbamoyl group, N-octadecylcarbamoyl group, N-phenylcarbamoyl group, N-2-methylphenylcarbamoyl group, N-2- Chlorophenylcarbamoyl group, N-2-isopropoxyphenylcarbamoyl group, N-2- (2-ethylhexyl) phenylcarbamoyl group, N-3-chlorophenylcarbamoyl group, N-3-nitrophenylcarbamoyl group, N-3-cyanophenyl A carbamoyl group, -4-methoxyphenylcarbamoyl group, N-4-cyanophenylcarbamoyl group, N-4-methylsulfanylphenylcarbamoyl group, N-4-phenylsulfanylphenylcarbamoyl group, N-methyl-N-phenylcarbamoyl group, N, N -Dimethylcarbamoyl group, N, N-dibutylcarbamoyl group, N, N-diphenylcarbamoyl group and the like.

  The sulfamoyl group which may have a substituent is preferably a sulfamoyl group having 0 to 30 carbon atoms, for example, a sulfamoyl group, an N-alkylsulfamoyl group, an N-arylsulfamoyl group, N, N- Examples thereof include a dialkylsulfamoyl group, an N, N-diarylsulfamoyl group, and an N-alkyl-N-arylsulfamoyl group. More specifically, N-methylsulfamoyl group, N-ethylsulfamoyl group, N-propylsulfamoyl group, N-butylsulfamoyl group, N-hexylsulfamoyl group, N-cyclohexylsulfur group. Famoyl group, N-octylsulfamoyl group, N-2-ethylhexylsulfamoyl group, N-decylsulfamoyl group, N-octadecylsulfamoyl group, N-phenylsulfamoyl group, N-2- Methylphenylsulfamoyl group, N-2-chlorophenylsulfamoyl group, N-2-methoxyphenylsulfamoyl group, N-2-isopropoxyphenylsulfamoyl group, N-3-chlorophenylsulfamoyl group, N-3-nitrophenylsulfamoyl group, N-3-cyanophenylsulfamoyl group, N-4-methoxyphenyl Nylsulfamoyl group, N-4-cyanophenylsulfamoyl group, N-4-dimethylaminophenylsulfamoyl group, N-4-methylsulfanylphenylsulfamoyl group, N-4-phenylsulfanylphenylsulfamoyl Group, N-methyl-N-phenylsulfamoyl group, N, N-dimethylsulfamoyl group, N, N-dibutylsulfamoyl group, N, N-diphenylsulfamoyl group and the like.

  The amino group which may have a substituent is preferably an amino group having 0 to 50 carbon atoms in total, for example, —NH2, N-alkylamino group, N-arylamino group, N-acylamino group, N-sulfonyl. Examples include an amino group, an N, N-dialkylamino group, an N, N-diarylamino group, an N-alkyl-N-arylamino group, and an N, N-disulfonylamino group. More specifically, N-methylamino group, N-ethylamino group, N-propylamino group, N-isopropylamino group, N-butylamino group, N-tert-butylamino group, N-hexylamino group, N-cyclohexylamino group, N-octylamino group, N-2-ethylhexylamino group, N-decylamino group, N-octadecylamino group, N-benzylamino group, N-phenylamino group, N-2-methylphenylamino Group, N-2-chlorophenylamino group, N-2-methoxyphenylamino group, N-2-isopropoxyphenylamino group, N-2- (2-ethylhexyl) phenylamino group, N-3-chlorophenylamino group, N-3-nitrophenylamino group, N-3-cyanophenylamino group, N-3-trifluoromethylphenylamino group, -4-methoxyphenylamino group, N-4-cyanophenylamino group, N-4-trifluoromethylphenylamino group, N-4-methylsulfanylphenylamino group, N-4-phenylsulfanylphenylamino group, N- 4-dimethylaminophenylamino group, N-methyl-N-phenylamino group, N, N-dimethylamino group, N, N-diethylamino group, N, N-dibutylamino group, N, N-diphenylamino group, N N-diacetylamino group, N, N-dibenzoylamino group, N, N- (dibutylcarbonyl) amino group, N, N- (dimethylsulfonyl) amino group, N, N- (diethylsulfonyl) amino group, N N- (dibutylsulfonyl) amino group, N, N- (diphenylsulfonyl) amino group and the like.

  The phosphinoyl group which may have a substituent is preferably a phosphinoyl group having 2 to 50 carbon atoms, for example, dimethylphosphinoyl group, diethylphosphinoyl group, dipropylphosphinoyl group, diphenylphosphinoyl group. Group, dimethoxyphosphinoyl group, diethoxyphosphinoyl group, dibenzoylphosphinoyl group, bis (2,4,6-trimethylphenyl) phosphinoyl group and the like.

The heterocyclic group that may have a substituent is preferably an aromatic or aliphatic heterocyclic group containing a nitrogen atom, an oxygen atom, a sulfur atom, or a phosphorus atom. For example, thienyl group, benzo [b] thienyl group, naphtho [2,3-b] thienyl group, thiantenyl group, furyl group, pyranyl group, isobenzofuranyl group, chromenyl group, xanthenyl group, phenoxathinyl group, 2H-pyrrolyl group, pyrrolyl group, imidazolyl group, pyrazolyl group, pyridyl group, pyrazinyl group, pyrimidinyl group, pyridazinyl group, indolizinyl group, isoindolyl group, 3H-indolyl group, indolyl group, 1H-indazolyl group, purinyl group, 4H- Quinolidinyl group, isoquinolyl group, quinolyl group, phthalazinyl group, naphthyridinyl group, quinoxanilyl group, quinazolinyl group, cinnolinyl group, pteridinyl group, 4aH-carbazolyl group, carbazolyl group, β-carbolinyl group, phenanthridinyl group, acridinyl group Group, phenanthrolinyl group, phenazinyl group, phenalsadinyl group, isothiazolyl group, phenothiazinyl group, isoxazolyl group, furazanyl group, phenoxazinyl group, isochromanyl group, chromanyl group, pyrrolidinyl group, pyrrolinyl group, imidazolidinyl group, imidazolinyl group, pyrazolidinyl group Group, pyrazolinyl group, piperidyl group, piperazinyl group, indolinyl group, isoindolinyl group, quinuclidinyl group, morpholinyl group, thioxanthryl group and the like.
Examples of the halogen group include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

  Furthermore, the alkyl group which may have a substituent mentioned above, the aryl group which may have a substituent, the alkenyl group which may have a substituent, the alkynyl group which may have a substituent, a substituent An alkoxy group which may have a substituent, an aryloxy group which may have a substituent, an acyloxy group which may have a substituent, an alkylsulfanyl group which may have a substituent, and a substituent An arylsulfanyl group which may have a substituent, an alkylsulfinyl group which may have a substituent, an arylsulfinyl group which may have a substituent, an alkylsulfonyl group which may have a substituent, and a substituent. An arylsulfonyl group, an optionally substituted acyl group, an optionally substituted alkoxycarbonyl group, an optionally substituted carbamoyl group, an optionally substituted sulfamoyl group, Amino group which may have a group, hydrogen atom of the heterocyclic group which may have a even better phosphinoyl groups and substituents have a substituent may be further substituted with other substituents.

  Examples of such substituents include halogen groups such as fluorine atom, chlorine atom, bromine atom and iodine atom, alkoxy groups such as methoxy group, ethoxy group and tert-butoxy group, aryl groups such as phenoxy group and p-tolyloxy group. Oxy group, methoxycarbonyl group, butoxycarbonyl group, alkoxycarbonyl group such as phenoxycarbonyl group, acetoxy group, propionyloxy group, acyloxy group such as benzoyloxy group, acetyl group, benzoyl group, isobutyryl group, acryloyl group, methacryloyl group, An acyl group such as a methoxalyl group, an alkylsulfanyl group such as a methylsulfanyl group or a tert-butylsulfanyl group, an arylsulfanyl group such as a phenylsulfanyl group or a p-tolylsulfanyl group, an alkylsulfuryl group such as a methylamino group or a cyclohexylamino group; Killamino, dimethylamino, diethylamino, morpholino, piperidino and other dialkylamino groups, phenylamino, p-tolylamino and other arylamino groups, methyl, ethyl, tert-butyl and dodecyl In addition to aryl groups such as alkyl groups, phenyl groups, p-tolyl groups, xylyl groups, cumenyl groups, naphthyl groups, anthryl groups, phenanthryl groups, heterocyclic groups such as furyl groups, thienyl groups, hydroxy groups, carboxy groups, Formyl group, mercapto group, sulfo group, mesyl group, p-toluenesulfonyl group, amino group, nitro group, cyano group, trifluoromethyl group, trichloromethyl group, trimethylsilyl group, phosphinico group, phosphono group, trimethylammonium group, Dimethylsulfoniumyl group, triphenylphenacylphosphoni Umil group etc. are mentioned.

Furthermore, R ₁ and R ₂ may be a ring structure that is integrally bonded to each other.

  Specific examples of the photopolymerization initiator of the present invention described above include the following compounds (where Me is a methyl group, Et is an ethyl group, Bu is a butyl group, Hex is a hexyl group, Tol represents a paratolyl group, Ac represents an acetyl group, and Bz represents a benzoyl group).

Specific examples of compounds that can be represented by the general formula (1) are shown in Table 1.

  All oxime groups exist in two configurations, (Z) or (E). The isomers can be separated by conventional methods, but mixtures of isomers can also be used as photoinitiating species. Therefore, the compound of the general formula (1) of the present invention includes a component of a mixture of configurational isomers.

Next, the sensitizer (B) of the present invention will be described. The sensitizer of the present invention is characterized by comprising a carbazole derivative represented by the general formula (2). In the general formula (2), the substituents R _{4 to} R ₁₂ each independently represent a hydrogen atom or a monovalent organic residue, and 1 to 4 of the substituents R _{5 to} R ₁₂ are represented by the general formula (3). ) Is included. In the general formula (3), the substituent R ₁₃ represents a hydrogen atom or a monovalent organic residue.

  The monovalent organic residue in general formula (2) and general formula (3) is synonymous with the monovalent organic residue mentioned in general formula (1).

The substituent R ₁₃ in the general formula (3) is preferably a thienyl group, a benzo [b] thienyl group, a furyl group, a pyrrolyl group, a carbazolyl group, or a pyridyl group, and more preferably a methyl group or a propyl group. Group, butyl group, phenyl group, o-, m-, and p-tolyl group, 1-naphthyl group, 2-naphthyl group, 9-anthryl group and the like, but the present invention is limited to these examples. Do not mean.

Specific examples of compounds that can be represented by the general formula (2) are shown in Table 2.

  The sensitizer (B) of the present invention is preferably used in the range of 0.01 to 5 parts by weight with respect to 100 parts by weight of the radical polymerization initiator (A). When the amount is less than 0.01 parts by weight, the effect of the sensitizer is hardly recognized, and when the amount is more than 5 parts by weight, coloring or yellowing may be observed.

  Next, the radically polymerizable compound (C) of the present invention will be described. The radical polymerizable compound (C) of the present invention is a compound having an ethylenically unsaturated bond capable of radical polymerization, and the compound having an ethylenically unsaturated bond capable of radical polymerization is an ethylene capable of radical polymerization in the molecule. Any compound having at least one ionic unsaturated bond may be used, and it may have a chemical form such as a monomer, an oligomer or a polymer.

Examples of such a compound having an ethylenically unsaturated bond capable of radical polymerization include unsaturated carboxylic acids such as acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid and their salts, esters, Examples include urethane, amides and anhydrides, acrylonitrile, styrene, various unsaturated polyesters, unsaturated polyethers, unsaturated polyamides, unsaturated polyurethanes, and other radical polymerizable compounds, but the present invention is not limited thereto. It is not something. Below, the specific example of the radically polymerizable compound (C) in this invention is given.
Examples of acrylates:
Examples of monofunctional alkyl acrylates:
Methyl acrylate, ethyl acrylate, propyl acrylate, isopropyl acrylate, butyl acrylate, isoamyl acrylate, hexyl acrylate, 2-ethylhexyl acrylate, octyl acrylate, decyl acrylate, lauryl acrylate, stearyl acrylate, isobornyl acrylate, cyclohexyl acrylate, dicyclopentenyl acrylate Dicyclopentenyloxyethyl acrylate, benzyl acrylate and the like.
Examples of monofunctional hydroxy acrylates:
2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 2-hydroxy-3-chloropropyl acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-hydroxy-3-allyloxypropyl acrylate, 2-acryloyloxyethyl-2 -Hydroxypropyl phthalate and the like.
Examples of monofunctional halogenated acrylates:
2,2,2-trifluoroethyl acrylate, 2,2,3,3-tetrafluoropropyl acrylate, 1H-hexafluoroisopropyl acrylate, 1H, 1H, 5H-octafluoropentyl acrylate, 1H, 1H, 2H, 2H- Heptadecafluorodecyl acrylate, 2,6-dibromo-4-butylphenyl acrylate, 2,4,6-tribromophenoxyethyl acrylate, 2,4,6-tribromophenol 3EO addition acrylate and the like.
Examples of monofunctional ether-containing acrylates:
2-methoxyethyl acrylate, 1,3-butylene glycol methyl ether acrylate, butoxyethyl acrylate, methoxytriethylene glycol acrylate, methoxypolyethylene glycol # 400 acrylate, methoxydipropylene glycol acrylate, methoxytripropylene glycol acrylate, methoxypolypropylene glycol acrylate, Ethoxydiethylene glycol acrylate, ethyl carbitol acrylate, 2-ethylhexyl carbitol acrylate, tetrahydrofurfuryl acrylate, phenoxyethyl acrylate, phenoxydiethylene glycol acrylate, phenoxy polyethylene glycol acrylate, cresyl polyethylene glycol acrylate, p Nonyl phenoxyethyl acrylate, p- nonylphenoxy polyethylene glycol acrylate, such as glycidyl acrylate.
Examples of monofunctional carboxyl acrylates:
β-carboxyethyl acrylate, succinic acid monoacryloyloxyethyl ester, ω-carboxypolycaprolactone monoacrylate, 2-acryloyloxyethyl hydrogen phthalate, 2-acryloyloxypropyl hydrogen phthalate, 2-acryloyloxypropyl hexahydrohydrogen phthalate, 2- Acryloyloxypropyltetrahydrophthalate, etc.
Examples of other monofunctional acrylates:
N, N-dimethylaminoethyl acrylate, N, N-dimethylaminopropyl acrylate, morpholinoethyl acrylate, trimethylsiloxyethyl acrylate, diphenyl-2-acryloyloxyethyl phosphate, 2-acryloyloxyethyl acid phosphate, caprolactone-modified-2-acryloyl Oxyethyl acid phosphate, etc.
Examples of bifunctional acrylates:
1,4-butanediol diacrylate, 1,6-hexanediol diacrylate, ethylene glycol diacrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, tetraethylene glycol diacrylate, polyethylene glycol # 200 diacrylate, polyethylene glycol # 300 Diacrylate, polyethylene glycol # 400 diacrylate, polyethylene glycol # 600 diacrylate, dipropylene glycol diacrylate, tripropylene glycol diacrylate, tetrapropylene glycol diacrylate, polypropylene glycol # 400 diacrylate, polypropylene glycol # 700 diacrylate, neo Pentyl glycol diacrylate, ne Pentyl glycol PO modified diacrylate, hydroxypivalic acid neopentyl glycol ester diacrylate, caprolactone adduct diacrylate of hydroxypivalic acid neopentyl glycol ester, 1,6-hexanediol bis (2-hydroxy-3-acryloyloxypropyl) ether Bis (4-acryloxypolyethoxyphenyl) propane, 1,9-nonanediol diacrylate, pentaerythritol diacrylate, pentaerythritol diacrylate monostearate, pentaerythritol diacrylate monobenzoate, bisphenol A diacrylate, EO-modified bisphenol A diacrylate, PO-modified bisphenol A diacrylate, hydrogenated bisphenol A diacrylate EO modified hydrogenated bisphenol A diacrylate, PO modified hydrogenated bisphenol A diacrylate, bisphenol F diacrylate, EO modified bisphenol F diacrylate, PO modified bisphenol F diacrylate, EO modified tetrabromobisphenol A diacrylate, tricyclodecandi Methylol diacrylate, isocyanuric acid EO-modified diacrylate, and the like.
Examples of trifunctional acrylates:
Glycerin PO modified triacrylate, trimethylolpropane triacrylate, trimethylolpropane EO modified triacrylate, trimethylolpropane PO modified triacrylate, isocyanuric acid EO modified triacrylate, isocyanuric acid EO modified ε-caprolactone modified triacrylate, 1,3 5-triacryloyl hexahydro-s-triazine, pentaerythritol triacrylate, dipentaerythritol triacrylate tripropionate, and the like.
Examples of tetra- or higher functional acrylates:
Pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate monopropionate, dipentaerythritol hexaacrylate, tetramethylolmethane tetraacrylate, oligoester tetraacrylate, tris (acryloyloxy) phosphate, and the like.
Examples of methacrylates:
Examples of monofunctional alkyl methacrylates:
Methyl methacrylate, ethyl methacrylate, propyl methacrylate, isopropyl methacrylate, butyl methacrylate, isoamyl methacrylate, hexyl methacrylate, 2-hexyl methacrylate, 2-ethylhexyl methacrylate, octyl methacrylate, decyl methacrylate, lauryl methacrylate, stearyl methacrylate, isobornyl methacrylate, cyclohexyl methacrylate Dicyclopentenyl methacrylate, dicyclopentenyloxyethyl methacrylate, benzyl methacrylate and the like.
Examples of monofunctional hydroxymethacrylates:
2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 2-hydroxy-3-chloropropyl methacrylate, 2-hydroxy-3-phenoxypropyl methacrylate, 2-hydroxy-3-allyloxypropyl methacrylate, 2-methacryloyloxyethyl-2 -Hydroxypropyl phthalate and the like.
Examples of monofunctional halogenated methacrylates:
2,2,2-trifluoroethyl methacrylate, 2,2,3,3-tetrafluoropropyl methacrylate, 1H-hexafluoroisopropyl methacrylate, 1H, 1H, 5H-octafluoropentyl methacrylate, 1H, 1H, 2H, 2H- Heptadecafluorodecyl methacrylate, 2,6-dibromo-4-butylphenyl methacrylate, 2,4,6-tribromophenoxyethyl methacrylate, 2,4,6-tribromophenol 3EO addition methacrylate and the like.
Examples of monofunctional ether-containing methacrylates:
2-methoxyethyl methacrylate, 1,3-butylene glycol methyl ether methacrylate, butoxyethyl methacrylate, methoxytriethylene glycol methacrylate, methoxypolyethylene glycol # 400 methacrylate, methoxydipropylene glycol methacrylate, methoxytripropylene glycol methacrylate, methoxypolypropylene glycol methacrylate, Ethoxydiethylene glycol methacrylate, 2-ethylhexyl carbitol methacrylate, tetrahydrofurfuryl methacrylate, phenoxyethyl methacrylate, phenoxydiethylene glycol methacrylate, phenoxy polyethylene glycol methacrylate, cresyl polyethylene glycol methacrylate, p- Cycloalkenyl phenoxyethyl methacrylate, p- nonylphenoxy polyethylene glycol methacrylate, and the like glycidyl methacrylate.
Examples of monofunctional carboxyl-containing methacrylates:
β-carboxyethyl methacrylate, succinic acid monomethacryloyloxyethyl ester, ω-carboxypolycaprolactone monomethacrylate, 2-methacryloyloxyethyl hydrogen phthalate, 2-methacryloyloxypropyl hydrogen phthalate, 2-methacryloyloxypropyl hexahydrohydrogen phthalate, 2- Methacryloyloxypropyltetrahydrophthalate, etc.
Examples of other monofunctional methacrylates:
Dimethylaminomethyl methacrylate, N, N-dimethylaminoethyl methacrylate, N, N-dimethylaminopropyl methacrylate, morpholinoethyl methacrylate, trimethylsiloxyethyl methacrylate, diphenyl-2-methacryloyloxyethyl phosphate, 2-methacryloyloxyethyl acid phosphate, caprolactone Modified-2-methacryloyloxyethyl acid phosphate and the like.
Examples of bifunctional methacrylates:
1,4-butanediol dimethacrylate, 1,6-hexanediol dimethacrylate, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, tetraethylene glycol dimethacrylate, polyethylene glycol # 200 dimethacrylate, polyethylene glycol # 300 Dimethacrylate, polyethylene glycol # 400 dimethacrylate, polyethylene glycol # 600 dimethacrylate, dipropylene glycol dimethacrylate, tripropylene glycol dimethacrylate, tetrapropylene glycol dimethacrylate, polypropylene glycol # 400 dimethacrylate, polypropylene glycol # 700 dimethacrylate, neopenty Glycol dimethacrylate, neopentyl glycol PO modified dimethacrylate, hydroxypivalic acid neopentyl glycol ester dimethacrylate, caprolactone adduct dimethacrylate of hydroxypivalic acid neopentyl glycol ester, 1,6-hexanediol bis (2-hydroxy-3- (Methacryloyloxypropyl) ether, 1,9-nonanediol dimethacrylate, pentaerythritol dimethacrylate, pentaerythritol dimethacrylate monostearate, pentaerythritol dimethacrylate monobenzoate, 2,2-bis (4-methacryloxypolyethoxyphenyl) propane Bisphenol A dimethacrylate, EO modified bisphenol A dimethacrylate, PO modified bisphenol A-dimethacrylate, hydrogenated bisphenol A dimethacrylate, EO-modified hydrogenated bisphenol A dimethacrylate, PO-modified hydrogenated bisphenol A dimethacrylate, bisphenol F dimethacrylate, EO-modified bisphenol F dimethacrylate, PO-modified bisphenol F dimethacrylate, EO-modified tetrabromobisphenol A dimethacrylate, tricyclodecane dimethylol dimethacrylate, isocyanuric acid EO-modified dimethacrylate, and the like.
Examples of trifunctional methacrylates:
Glycerin PO modified trimethacrylate, trimethylolethane trimethacrylate, trimethylolpropane trimethacrylate, trimethylolpropane EO modified trimethacrylate, trimethylolpropane PO modified trimethacrylate, isocyanuric acid EO modified trimethacrylate, isocyanuric acid EO modified ε-caprolactone modified tri Methacrylate, 1,3,5-trimethacryloyl hexahydro-s-triazine, pentaerythritol trimethacrylate, dipentaerythritol trimethacrylate tripropionate and the like.
Examples of tetrafunctional or higher methacrylates:
Pentaerythritol tetramethacrylate, dipentaerythritol pentamethacrylate monopropionate, dipentaerythritol hexamethacrylate, tetramethylolmethane tetramethacrylate, oligoester tetramethacrylate, tris (methacryloyloxy) phosphate, and the like.
Examples of arylates:
Allyl glycidyl ether, diallyl phthalate, triallyl trimellitate, isocyanuric acid triarylate and the like.
Examples of acid amides:
Acrylamide, N-methylolacrylamide, diacetoneacrylamide, N, N-dimethylacrylamide, N, N-diethylacrylamide, N-isopropylacrylamide, acryloylmorpholine, methacrylamide, N-methylolmethacrylamide, diacetone methacrylamide, N, N -Dimethylmethacrylamide, N, N-diethylmethacrylamide, N-isopropylmethacrylamide, methacryloylmorpholine and the like.
Examples of styrenes:
Styrene, p-hydroxystyrene, p-chlorostyrene, p-bromostyrene, p-methylstyrene, p-methoxystyrene, pt-butoxystyrene, pt-butoxycarbonylstyrene, pt-butoxycarbonyloxystyrene 2,4-diphenyl-4-methyl-1-pentene and the like.
Examples of other vinyl compounds:
Vinyl acetate, vinyl monochloroacetate, vinyl benzoate, vinyl pivalate, vinyl butyrate, vinyl laurate, divinyl adipate, vinyl methacrylate, vinyl crotonate, vinyl 2-ethylhexanoate, N-vinylcarbazole, N-vinylpyrrolidone etc.

  Said radically polymerizable compound (C) can be easily obtained as a commercial item of the manufacturer shown below. For example, “Light acrylate”, “Light ester”, “Epoxy ester”, “Urethane acrylate” and “Highly functional oligomer” series manufactured by Kyoeisha Yushi Chemical Co., Ltd., Shin Nakamura Chemical Co., Ltd. "NK Ester" and "NK Oligo" series, "Funkril" series manufactured by Hitachi Chemical Co., Ltd., "Aronix M" series manufactured by Toagosei Co., Ltd., manufactured by Daihachi Chemical Industry Co., Ltd. "Functional monomer" series, "Special acrylic monomer" series manufactured by Osaka Organic Chemical Industry Co., Ltd., "Acryester" and "Diabeam oligomer" series manufactured by Mitsubishi Rayon Co., Ltd., Nippon Kayaku Co., Ltd. "Kayarad" and "Kayamar" series manufactured by KK, "Acrylic acid / methacrylic acid ester monomer" series manufactured by Nippon Shokubai Co., Ltd. "NICHIGO-UV purple light urethane acrylate oligomer" series manufactured by Nippon Synthetic Chemical Industry Co., Ltd. "Carboxylic acid vinyl ester monomer" series manufactured by Shin-Etsu Vinyl Acetate Co., Ltd. "Function" manufactured by Kojin Co., Ltd. Monomer "series and the like.

  Furthermore, examples of the radical polymerizable compound (C) include those described in the following literature. For example, edited by Shinzo Yamashita et al., “Cross-linking agent handbook” (1981, Taiseisha), Kiyoto Kato edition, “UV / EB curing handbook (raw material edition)”, (1985, Polymer publication society), Radtech Research Meeting, Kiyoshi Akamatsu, “New Technology for Photosensitive Resins” (1987, CMC), Takeshi Endo, “Refinement of Thermosetting Polymers” (1986, CMC), Takiyama Soichiro, “Polyester Resin Handbook” (1988, Nikkan Kogyo Shimbun), edited by Radtech Study Group, “Application and Market of UV / EB Curing Technology” (2002, CMC).

  The radically polymerizable compound (C) of the present invention may be used alone or in a mixture of two or more at any ratio in order to improve desired properties.

  The amount of the radical polymerization initiator (A) used in the present invention is usually 0.1 to 100 parts by weight, preferably 3 to 60 parts by weight with respect to 100 parts by weight of the radical polymerizable compound (C). .

  Furthermore, the alkali-soluble resin (D) of the present invention will be described. The alkali-soluble resin of the present invention acts as a binder, and when forming an image pattern, the developer used in the development processing step, particularly preferably, it is soluble in an alkali developer. It is not particularly limited. Among these, an alkali-soluble resin which is a carboxyl group-containing copolymer is preferable, and an ethylenically unsaturated monomer having at least one carboxyl group (hereinafter simply referred to as “carboxyl group-containing unsaturated monomer”). ) And other copolymerizable ethylenically unsaturated monomers (hereinafter simply referred to as “copolymerizable unsaturated monomers”) (hereinafter simply referred to as “carboxyl group-containing copolymers”). Is preferred).

  Examples of the carboxyl group-containing unsaturated monomer include unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, α-chloroacrylic acid, cinnamic acid; maleic acid, maleic anhydride, fumaric acid, itacone Unsaturated dicarboxylic acids such as acid, itaconic anhydride, citraconic acid, citraconic anhydride, and mesaconic acid or their anhydrides; trivalent or higher unsaturated polycarboxylic acids or their anhydrides; succinic acid mono (2-acrylic acid) Divalent or higher polyvalent carboxylic acids such as leuoxyethyl), succinic acid mono (2-methacryloyloxyethyl), phthalic acid mono (2-acryloyloxyethyl), phthalic acid mono (2-methacryloyloxyethyl) Mono [(meth) acryloyloxyalkyl] esters; ω-carboxypolycaprolactone monoacrylate, ω-carboxypoly It can be mentioned mono (meth) acrylates of polymers having a carboxyl group and a hydroxyl group at both terminals such as caprolactone monomethacrylate. Among these carboxyl group-containing unsaturated monomers, succinic acid mono (2-acryloyloxyethyl) and phthalic acid mono (2-acryloyloxyethyl) are respectively M-5300 and M-5400 (Toagosei ( (Commercially available) under the trade name. The said carboxyl group-containing unsaturated monomer can be used individually or in mixture of 2 or more types.

Examples of the copolymerizable unsaturated monomer include styrene, α-methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, o-methoxystyrene, and m-methoxy. Styrene, p-methoxystyrene, o-vinyl benzyl methyl ether, m-vinyl benzyl methyl ether, p-vinyl benzyl methyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p-vinyl benzyl glycidyl ether, etc. Aromatic vinyl compounds, indenes such as indene and 1-methylindene,
Methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, n-propyl acrylate, n-propyl methacrylate, i-propyl acrylate, i-propyl methacrylate, n-butyl acrylate, n-butyl methacrylate, i-butyl acrylate, i-butyl Methacrylate, sec-butyl acrylate, sec-butyl methacrylate, t-butyl acrylate, t-butyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 3-hydroxypropyl Acrylate, 3-hydroxypropyl methacrylate, 2-hydroxybutyl acrylate, 2-hydroxy Tyl methacrylate, 3-hydroxybutyl acrylate, 3-hydroxybutyl methacrylate, 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate, allyl acrylate, allyl methacrylate, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, phenyl acrylate, phenyl methacrylate , 2-methoxyethyl acrylate, 2-methoxyethyl methacrylate, 2-phenoxyethyl acrylate, 2-phenoxyethyl methacrylate, methoxydiethylene glycol acrylate, methoxydiethylene glycol methacrylate, methoxytriethylene glycol acrylate, methoxytriethylene glycol methacrylate , Toxipropylene glycol acrylate, methoxypropylene glycol methacrylate, methoxydipropylene glycol acrylate, methoxydipropylene glycol methacrylate, isobornyl acrylate, isobornyl methacrylate, dicyclopentadienyl acrylate, dicyclopentadienyl methacrylate, Unsaturated carboxylic acid esters such as 2-hydroxy-3-phenoxypropyl acrylate, 2-hydroxy-3-phenoxypropyl methacrylate, glycerol monoacrylate, glycerol monomethacrylate,
2-aminoethyl acrylate, 2-aminoethyl methacrylate, 2-dimethylaminoethyl acrylate, 2-dimethylaminoethyl methacrylate, 2-aminopropyl acrylate, 2-aminopropyl methacrylate, 2-dimethylaminopropyl acrylate, 2-dimethylaminopropyl Unsaturated carboxylic acid aminoalkyl esters such as methacrylate, 3-aminopropyl acrylate, 3-aminopropyl methacrylate, 3-dimethylaminopropyl acrylate, 3-dimethylaminopropyl methacrylate,
Unsaturated glycidyl esters such as glycidyl acrylate and glycidyl methacrylate, vinyl carboxylic acid esters such as vinyl acetate, vinyl propionate, vinyl butyrate and vinyl benzoate, vinyl methyl ether, vinyl ethyl ether and allyl glycidyl ether Saturated ethers, vinyl cyanide compounds such as acrylonitrile, methacrylonitrile, α-chloroacrylonitrile, vinylidene cyanide, acrylamide, methacrylamide, α-chloroacrylamide, N-2-hydroxyethyl acrylamide, N-2-hydroxyethyl methacryl Unsaturated amides such as amide, unsaturated imides such as maleimide, N-phenylmaleimide, N-cyclohexylmaleimide, 1,3-butadiene, isoprene, chloroprene Aliphatic conjugated dienes such as polystyrene, polymethyl acrylate, polymethyl methacrylate, poly-n-butyl acrylate, poly-n-butyl methacrylate, polysiloxane, etc., at the end of the polymer molecular chain, a monoacryloyl group or a monomethacryloyl group And macromonomers having These copolymerizable unsaturated monomers can be used alone or in admixture of two or more.

  The carboxyl group-containing copolymer in the present invention includes (a) acrylic acid and / or methacrylic acid as an essential component, and in some cases, succinic acid mono (2-acryloyloxyethyl) and succinic acid mono (2-methacryloyl). A carboxyl group-containing unsaturated monomer component further containing at least one compound selected from the group of (Roxyethyl), ω-carboxypolycaprolactone monoacrylate and ω-carboxypolycaprolactone monomethacrylate, and (b) styrene, methyl Acrylate, methyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, allyl acrylate, allyl methacrylate, benzyl acrylate, benzyl methacrylate, glycerol monoacrylate, glycerol mono A copolymer with at least one selected from the group of methacrylate, N-phenylmaleimide, polystyrene macromonomer and polymethylmethacrylate macromonomer (hereinafter referred to as “carboxyl group-containing copolymer (1)”) is preferred.

Specific examples of the carboxyl group-containing copolymer (1) include (meth) acrylic acid / methyl (meth) acrylate copolymer, (meth) acrylic acid / benzyl (meth) acrylate copolymer, (meth) acrylic acid. / 2-hydroxyethyl (meth) acrylate / benzyl (meth) acrylate copolymer, (meth) acrylic acid / methyl (meth) acrylate / polystyrene macromonomer copolymer, (meth) acrylic acid / methyl (meth) acrylate / Polymethyl methacrylate macromonomer copolymer, (meth) acrylic acid / benzyl (meth) acrylate / polystyrene macromonomer copolymer, (meth) acrylic acid / benzyl (meth) acrylate / polymethyl methacrylate macromonomer copolymer, ( (Meth) acrylic acid / 2-hydroxyethyl (Meth) acrylate / benzyl (meth) acrylate / polystyrene macromonomer copolymer, (meth) acrylic acid / 2-hydroxyethyl (meth) acrylate / benzyl (meth) acrylate / polymethyl methacrylate macromonomer copolymer, methacrylic acid / Styrene / benzyl (meth) acrylate / N-phenylmaleimide copolymer,
(Meth) acrylic acid / succinic acid mono [2- (meth) acryloyloxyethyl] / styrene / benzyl (meth) acrylate / N-phenylmaleimide copolymer, (meth) acrylic acid / succinic acid mono [2- ( (Meth) acryloyloxyethyl] / styrene / allyl (meth) acrylate / N-phenylmaleimide copolymer (meth) acrylic acid / styrene / benzyl (meth) acrylate / glycerol mono (meth) acrylate / N-phenylmaleimide copolymer And (meth) acrylic acid / ω-carboxypolycacrolactone mono (meth) acrylate / styrene / benzyl (meth) acrylate / glycerol mono (meth) acrylate / N-phenylmaleimide copolymer.

  In the carboxyl group-containing copolymer, a substituent present in the molecule may be further modified. For example, a part of the carboxyl group present in the polymer is modified by reacting with a monomer having a functional group reactive with a carboxyl group, such as a known glycidyl group, and crosslinking that can participate in radical polymerization in the molecule. It is also possible to provide points. As such a monomer, glycidyl (meth) acrylic acid alkyl ester can be used, for example, glycidyl (meth) acrylic acid, glycidyl (meth) methyl acrylate, glycidyl (meth) ethyl acrylate, glycidyl (meth). Examples thereof include butyl acrylate and 2-ethylhexyl glycidyl (meth) acrylate. In addition, a hydroxyl group present in the polymer is condensed with 2-acryloyloxyethyl isocyanate, 2-methacryloylethyl isocyanate (“Karenz MOI” manufactured by Showa Denko KK), etc., to provide a similar polymerization crosslinking point. Is also possible.

  The copolymerization ratio of the carboxyl group-containing unsaturated monomer in the carboxyl group-containing copolymer is usually 5 to 50% by weight. In this case, if the copolymerization ratio is less than 5% by weight, the solubility of the resulting resist composition in an alkaline developer tends to decrease, whereas if it exceeds 50% by weight, the solubility in an alkaline developer becomes excessive. When developing with an alkali developer, the resist film tends to drop off from the substrate and the image surface tends to become rough. The weight average molecular weight in terms of polystyrene (hereinafter referred to as “Mw”) measured by gel permeation chromatography (GPC, elution solvent: tetrahydrofuran) of the alkali-soluble resin in the present invention is usually 3,000 to 300,000, Preferably it is 5,000-100,000. Further, the number average molecular weight in terms of polystyrene (hereinafter referred to as “Mn”) measured by gel permeation chromatography (GPC, elution solvent: tetrahydrofuran) of the alkali-soluble resin in the present invention is usually 3,000-60, 000, preferably 5,000 to 25,000. In the present invention, by using such an alkali-soluble resin having specific Mw and Mn, a radiation-sensitive composition having excellent developability can be obtained, whereby an image pattern having sharp pattern edges can be obtained. In addition to being able to be formed, residues, background stains, film residues and the like are less likely to occur on the unirradiated substrate and the light shielding layer during development. Moreover, the ratio (Mw / Mn) of Mw and Mn of the alkali-soluble resin in the present invention is preferably 1 to 5, particularly preferably 1 to 4.

  Examples of the alkali-soluble resin (D) other than the carboxyl group-containing copolymer include novolac resins and resins having a phenolic hydroxyl group such as polyhydroxystyrene. D).

  In this invention, alkali-soluble resin can be used individually or in mixture of 2 or more types. The usage-amount of the alkali-soluble resin in this invention is 10-500 weight part normally with respect to 100 weight part of radically polymerizable compounds (C).

  Furthermore, the thiol compound (E) of the present invention will be described. Addition of a thiol compound suppresses polymerization inhibition by oxygen and promotes a uniform photocuring reaction even under high light shielding. The thiol compound is not particularly limited as long as it has such a function, but a polyfunctional thiol compound is particularly preferable.

  The thiol compound (E) used in the present invention is not particularly limited as long as it has at least one thiol group in the molecule, and is arbitrarily selected from those conventionally used for polymerizable compositions. It can be selected and used. Examples of the compound having such a thiol group include 2-mercaptobenzothiazole, 2-mercaptobenzoimidazole, 2-mercaptobenzoxazole, 5-chloro-2-mercaptobenzothiazole, 2-mercapto-5-methoxybenzothiazole, 5-methyl-1,3,4-thiadiazole-2-thiol, 5-mercapto-1-methyltetrazole, 3-mercapto-4-methyl-4H-1,2,4-triazole, 2-mercapto-1-methyl Examples thereof include, but are not limited to, imidazole, 2-mercaptothiazoline, and octanethiol.

  Particularly preferred polyfunctional thiol compounds include compounds having two or more thiol groups. For example, hexanedithiol, decanedithiol, 1,4-dimethylmercaptobenzene, 1,4-butanediolbis (3-mercaptopropio 1, 4-butanediol bis (mercaptoacetate), ethylene glycol bis (3-mercaptopropionate), ethylene glycol bis (mercaptoacetate), trimethylolpropane tris (3-mercaptopropionate), trimethylol Propanetris (mercaptoacetate), pentaerythritol tetrakis (3-mercaptopropionate), pentaerythritol tetrakis (mercaptoacetate), 2,5-hexanedithiol, 2,9-decandithio 1,4-bis (1-mercaptoethylbenzene), phthalic acid bis (1-mercaptoethyl ester), phthalic acid bis (2-mercaptopropyl ester), phthalic acid bis (3-mercaptobutyl ester), phthalic acid bis (3-mercaptoisobutyl ester), ethylene glycol bis (3-mercaptobutyrate), diethylene glycol bis (3-mercaptobutyrate), propylene glycol bis (3-mercaptobutyrate), 1,4-butanediol bis (3- Mercaptobutyrate), 1,3-butanediol bis (3-mercaptobutyrate), 1,2-butanediol bis (3-mercaptobutyrate), trimethylolpropane tris (3-mercaptobutyrate), pentaerythritol tetrakis (3-Mel Captobutyrate), dipentaerythritol hexakis (3-mercaptobutyrate), ethylene glycol bis (2-mercaptoisobutyrate), diethylene glycol bis (2-mercaptoisobutyrate), propylene glycol bis (2-mercaptoisobutyrate) Rate), 1,4-butanediol bis (2-mercaptoisobutyrate), trimethylolpropane tris (2-mercaptoisobutyrate), pentaerythritol tetrakis (2-mercaptoisobutyrate), dipentaerythritol tetrakis (2 -Mercaptoisobutyrate), ethylene glycol bis (3-mercaptoisobutyrate), diethylene glycol bis (3-mercaptoisobutyrate), propylene glycol bis (3-mercaptoisobutyrate) Rate), 1,4-butanediol bis (3-mercaptoisobutyrate), trimethylolpropane tris (3-mercaptoisobutyrate), pentaerythritol tetrakis (3-mercaptoisobutyrate), dipentaerythritol hexakis ( 3-mercaptoisobutyrate), 1,8-octanediol bis (3-mercaptobutyrate), 1,8-octanediol bis (2-mercaptopropionate), 1,8-octanediol bis (3-mercapto) Isobutyrate), 2,4,6-trimercapto-S-triazine, 2- (N, N-dibutylamino) -4,6-dimercapto-S-triazine, and the like. is not.

  In the present invention, these thiol compounds (E) can be used alone or in combination of two or more.

  The amount of the thiol compound (E) used is usually 5 to 3000 parts by weight, preferably 20 to 1000 parts by weight with respect to 100 parts by weight of the radical polymerization initiator (A) of the present invention.

  In the polymerizable composition of the present invention, a sensitizer different from the sensitizer (B) can be added for the purpose of further promoting the polymerization. A sensitizer increases the activity with respect to light from the ultraviolet to the near infrared region, and therefore it is preferable to add a sensitizer when it is necessary to promote polymerization.

  Specific examples of such sensitizers include unsaturated ketones typified by chalcone derivatives and dibenzalacetone, 1,2-diketone derivatives typified by benzyl and camphorquinone, benzoin derivatives, and fluorene derivatives. , Naphthoquinone derivatives, anthraquinone derivatives, xanthene derivatives, thioxanthene derivatives, xanthone derivatives, thioxanthone derivatives, coumarin derivatives, ketocoumarin derivatives, cyanine derivatives, merocyanine derivatives, oxonol derivatives and other polymethine dyes, acridine derivatives, azine derivatives, thiazine derivatives, Oxazine derivatives, indoline derivatives, azulene derivatives, azurenium derivatives, squarylium derivatives, porphyrin derivatives, tetraphenylporphyrin derivatives, triarylmethane derivatives, tetrabenzopo Filin derivatives, tetrapyrazinoporphyrazine derivatives, phthalocyanine derivatives, tetraazaporphyrazine derivatives, tetraquinoxalyloporphyrazine derivatives, naphthalocyanine derivatives, subphthalocyanine derivatives, pyrylium derivatives, thiopyrylium derivatives, tetraphyrin derivatives, annulene derivatives, spiropyran derivatives , Spirooxazine derivatives, thiospiropyran derivatives, carbazole derivatives, metal arene complexes, organoruthenium complexes, Michler's ketone derivatives, etc. Other specific examples include Ogahara Shin et al., “Dye Handbook” (1986, Kodansha), Okawara Sensitizers described in Shin et al., "Chemicals of Functional Dyes" (1981, CMC), edited by Tadasaburo Ikemori et al., "Special Functional Materials" (1986, CMC) However, the present invention is not limited to these, and other sensitizers that absorb light from the ultraviolet to the near-infrared region can be used, and these may be used in an arbitrary ratio as needed. . Among the sensitizers, examples of the sensitizer that can particularly preferably sensitize the radical polymerization initiator of the present invention include thioxanthone derivatives, Michler ketone derivatives, and carbazole derivatives. More specifically, 2,4-diethylthioxanthone, 2-chlorothioxanthone, 2,4-dichlorothioxanthone, 2-isopropylthioxanthone, 4-isopropylthioxanthone, 1-chloro-4-propoxythioxanthone, 4,4′-bis (Dimethylamino) benzophenone, 4,4′-bis (diethylamino) benzophenone, N-ethylcarbazole, 3-benzoyl-N-ethylcarbazole, 3,6-dibenzoyl-N-ethylcarbazole, and the like. It is not limited to.

  These sensitizers are preferably contained in 50 parts by weight or less with respect to 100 parts by weight of the sensitizer (B) of the present invention.

  The polymerizable composition of the present invention is sufficiently sensitive only with the radical polymerization initiator (A), but for other purposes such as improving the surface curability of the polymerizable composition and improving the adhesion to the substrate, etc. The polymerization initiator can be used in combination.

  Examples of other polymerization initiators that can be used in combination with the polymerizable composition of the present invention include triazine derivatives described in JP-B-59-1281, JP-B-61-9621, and JP-A-60-60104. Organic peroxides described in JP-A-59-1504 and JP-A-61-243807, JP-B-43-23684, JP-B-44-6413, JP-B-47-1604 and USP No. 3567453, diazonium compound publication, USP 2,848,328, USP 2,852,379 and USP 2,940,853, organic azide compounds, Japanese Patent Publication No. 36-22062, Japanese Patent Publication No. 37-13109 Disclosed in Japanese Patent Publication No. SHO 38-30015 and SHO 45-9610. Luto-quinonediazides, including iodonium compounds described in JP-B-55-39162, JP-A-59-140203 and “MACROMOLECULES”, Vol. 10, page 1307 (1977) Various onium compounds, azo compounds described in JP-A-59-142205, JP-A-1-54440, European Patent No. 109851, European Patent No. 126712, “Journal of Imaging Science” (J.IMAG.SCI.), Vol. 30, page 174 (1986), titanocenes described in JP-A No. 61-151197, “COORDINATION CHEMISTRY REVIEW 84), 85-277 (1988) and JP-A-2- Transition metal complexes containing a transition metal such as ruthenium described in Japanese Patent No. 02701, aluminate complexes described in Japanese Patent Application Laid-Open No. 3-209477, borate compounds described in Japanese Patent Application Laid-Open No. 2-157760, Japanese Patent Application Laid-Open No. 55-127550 2,4,5-triarylimidazole dimer described in JP-A-60-202437, carbon tetrabromide, organic halogen compounds described in JP-A-59-107344, JP-A-5-213861 JP, JP-A-5-255347, JP-A-5-255421, JP-A-6-157623, JP-A-2000-344812, JP-A-2002-265512, and Japanese Patent Application No. 2004-053009. And sulfonium complexes or oxosulfonium complexes described in Japanese Patent Application No. 2004-263413 No. 2001-264530, JP-A 2001-261661, JP-A 2000-80068, JP-A 2001-233842, USP 3558309 (1971), USP4202697 (1980) ), Oxime ester compounds described in JP-A Nos. 61-24558, 2004-534797, and 2004-359639, bifunctional photoinitiators described in JP-A-2002-530372, and the like. Although it is mentioned, it is not limited to these.

  These polymerization initiators are preferably contained in an amount of 10 parts by weight or less based on 100 parts by weight of the radical polymerization initiator (A) of the present invention.

  The polymerizable composition of the present invention can be used by mixing with a binder such as an organic polymer and applying it to a polymer film such as a glass plate, an aluminum plate, another metal plate, or polyethylene terephthalate.

  Examples of binders that can be used by mixing with the polymerizable composition of the present invention include polyacrylates, poly-α-alkyl acrylates, polyamides, polyvinyl acetals, polyformaldehydes, polyurethanes, polycarbonates, polystyrenes, Examples thereof include polymers and copolymers such as polyvinyl esters, and more specifically, polymethacrylate, polymethyl methacrylate, polyethyl methacrylate, polyvinyl carbazole, polyvinyl pyrrolidone, polyvinyl butyral, polyvinyl acetate, novolac resin, phenol resin, Epoxy resins, alkyd resins, etc., supervised by Kiyoshi Akamatsu, “New Photosensitive Resin Technology” (1987, CMC) and “10308 Chemical Products”, pages 657-767 (1988, Chemical Industries Day) Company) industry known organic polymer described, and the like.

  In addition, the polymerizable composition of the present invention further comprises an oxygen scavenger such as phosphine, phosphonate, phosphite, a reducing agent, a polymerization accelerator, an antifoggant, an antifading agent, an antihalation agent, a fluorescent whitening, depending on the purpose. Agents, surfactants, colorants, extenders, plasticizers, flame retardants, antioxidants, UV absorbers, foaming agents, fungicides, thermal polymerization inhibitors, antistatic agents, magnetic substances and other various properties You may mix and use the additive to provide.

The polymerizable composition of the present invention can be used by adding a solvent for the purpose of improving workability during coating and film formation. The added solvent can be substantially removed by heat drying or vacuum drying after coating. Specific examples of the solvent that can be added to the polymerizable composition of the present invention include, for example, ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone, and 3-heptanone; ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol (Poly) alkylene glycol monoalkyl ether acetates such as monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate;
Ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, ethylene glycol mono-n -Butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, Dipropylene glycol monoe Ether, dipropylene glycol mono -n- propyl ether, dipropylene glycol mono -n- butyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monoethyl (poly) alkylene glycol monoalkyl ethers such as ether;
Ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, butyl propionate, ethyl butyrate, isopropyl butyrate, butyl butyrate, methyl lactate, ethyl lactate, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate, methoxy Esters such as methyl acetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, methyl 3-oxypropionate, ethyl 3-oxypropionate, methyl 3-methoxypropionate, 3-methoxypropionic acid Ethyl, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 2-oxypropionate, ethyl 2-oxypropionate, propyl 2-oxypropionate, methyl 2-methoxypropionate, 2-methoxypropionic acid Til, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, methyl 2-oxy-2-methylpropionate, ethyl 2-oxy-2-methylpropionate, 2-methoxy-2 -Methyl methyl propionate, ethyl 2-methoxy-2-methylpropionate, methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl 2-oxobutanoate, ethyl 2-oxobutanoate, etc. Esters;
Aromatic hydrocarbons such as toluene and xylene, and amides such as N-methylpyrrolidone and N, N-dimethylacetamide can be exemplified.

  These solvents can be used alone or in admixture of two or more.

  The polymerizable composition of the present invention is applied on a substrate, partially exposed to an energy ray and cured, and used to form an image pattern in which an unexposed portion is removed with an alkaline developer. It can be used as a resist. An image pattern forming method using the polymerizable composition of the present invention will be described. First, after apply | coating the liquid composition of a polymeric composition on the surface of a base material, prebaking is performed and a solvent is evaporated and a coating film is formed. Next, this coating film is partially exposed in a pattern according to the mask through a photomask, then developed using an alkali developer, and the unexposed part of the coating film is dissolved and removed, and then as necessary. The target image pattern can be formed by post baking.

  When the liquid composition of the polymerizable composition is applied to the substrate, a known application method such as spray coating, spin coating, slit coating, roll coating or the like can be employed. The coating thickness can be appropriately changed depending on the application, but is usually 0.1 to 200 μm, preferably 0.2 to 100 μm, as the film thickness after drying.

  Also, a polymerizable composition layer of the present invention is provided on a base film mainly composed of polyester typified by polyethylene terephthalate, polypropylene, polyethylene, etc., and the polymerizable composition layer is sandwiched between protective films as necessary, so-called It is also possible to use the polymerizable composition of the present invention in a form known as a dry film known in the industry. The dry film is usually used by laminating the protective film and adhering it to a substrate on which a resist pattern is to be formed, and laminating the substrate on a substrate under heating and pressure conditions as necessary. To do. When the polymerizable composition of the present invention is used in the form of a dry film, pattern exposure may be carried out without peeling off the base film. In that case, the base film is removed after the exposure to perform alkali development. To implement.

  In the polymerization reaction, the polymerizable composition of the present invention can be polymerized by application of energy such as ultraviolet rays, visible rays, near infrared rays, electron beams, etc. to obtain a desired polymer. The definitions of ultraviolet rays, near-ultraviolet rays, visible light, near-infrared rays, infrared rays, and the like referred to in this specification are based on “Iwanami Rikagaku Dictionary 4th Edition” (1987, Iwanami) edited by Ryogo Kubo et al.

  Therefore, the polymerizable composition of the present invention includes a low pressure mercury lamp, a medium pressure mercury lamp, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a xenon lamp, a pulsed emission xenon lamp, a carbon arc lamp, a metal halide lamp, a fluorescent lamp, a tungsten lamp, an argon ion laser, Energy from various light sources such as helium cadmium laser, helium neon laser, krypton ion laser, various semiconductor lasers, YAG laser, light emitting diode, CRT light source, plasma light source, electron beam, gamma ray, ArF excimer laser, KrF excimer laser, F2 laser The objective polymer and hardened | cured material can be obtained by provision of this.

Therefore, in the image pattern forming method of the present invention, it is possible to use energy rays from the light source during exposure. In particular, energy rays having a wavelength in the range of 190 to 450 nm are preferable. The amount of exposure depends on the film thickness and cannot be determined uniquely, but is usually 0.5 to 100,000 J / m ² .

  Examples of the base material used in the image pattern forming method of the present invention include glass, silicon, polycarbonate, polyester, aromatic polyamide, polyamideimide, polyimide, glass epoxy film or substrate, but are not limited thereto. Is not to be done. In addition, these base materials may be subjected to appropriate pretreatment such as chemical treatment with a silane coupling agent or the like, plasma treatment, ion plating, sputtering, gas phase reaction method, vacuum deposition, etc., if desired.

  As a developing method used in the image pattern forming method of the present invention, for example, any of a liquid filling method, a dipping method, a shower method, a spray method and the like may be used, and the developing time is 20 to 30 ° C., preferably 5 to 300 seconds. Examples of the alkali developer include inorganic alkalis such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium silicate, sodium metasilicate, and ammonia, primary amines such as ethylamine and n-propylamine, diethylamine, and the like. Secondary amines such as di-n-propylamine, tertiary amines such as trimethylamine, methyldiethylamine, ethyldimethylamine and triethylamine, tertiary alkanolamines such as dimethylethanolamine, methyldiethanolamine and triethanolamine, pyrrole , Piperidine, N-methylpiperidine, N-methylpyrrolidine, tertiary amines such as 30-diazabicyclo [5.4.0] -7-undecene, 1,5-diazabicyclo [4.3.0] -5-nonene Tetramethylammonium Rokishido, aqueous solution of an alkaline compound such as quaternary ammonium salts such as tetraethylammonium hydroxide can be used. In addition, an appropriate amount of a water-soluble organic solvent such as methanol or ethanol and / or a surfactant can be added to the aqueous solution of the alkaline compound.

  The polymerizable composition of the present invention is a highly sensitive polymerizable composition capable of efficiently generating active radicals upon irradiation with energy rays, particularly light, and capable of polymerizing a radical polymerizable compound in a short time. Therefore, by using the polymerizable composition of the present invention, it is possible to provide a negative resist having alkali developability suitably used for a photoresist material and an image pattern forming method using the negative resist. Furthermore, a suitable image pattern can be provided by using this image pattern forming method.

EXAMPLES Hereinafter, although a synthesis example, an Example, and a comparative example are shown and this invention is demonstrated in detail, this invention is not limited only to the following. Unless otherwise indicated, “%” indicates “% by weight”.
Synthesis example 1
Synthesis of Compound (1) When benzophenone oxime (50.1 mmol) and sodium acetate (104.3 mmol) were stirred in 150 mL of tetrahydrofuran, acetic anhydride (80.2 mmol) was added and stirred for 15 hours. Thereafter, the reaction solution was poured into 200 g of ice water, and the crude product was extracted with ethyl acetate, dried over anhydrous magnesium sulfate, and concentrated to obtain compound (1) (yield 95%).
Synthesis Examples 2 to 42
Compounds (2) to (42) shown in Table 1 were produced from the corresponding oxime using the corresponding acid anhydride or acid chloride.
Synthesis Example 43
Synthesis of Np-tolyl-3,6-di- (p-toluoyl) carbazole (Compound (46)) 5.00 g (19.4 mmol) of Np-tolylcarbazole and 5.70 g (42.7 mmol) of aluminum chloride ) Was stirred in 100 ml of carbon disulfide, and a mixture of 6.61 g (42.7 mmol) of p-toluoyl chloride and 20 ml of carbon disulfide was added dropwise over 30 minutes under ice-cooling, followed by 13 hours at room temperature. And stirred. Thereafter, the reaction solution was poured into 100 g of ice water, and the crude product was extracted with chloroform, dried over anhydrous magnesium sulfate and concentrated. The residue was reprecipitated with chloroform / methanol to obtain 8.88 g as white crystals. The structure was identified by 1H-NMR.
1H-NMR spectrum (CDCl3) δ [ppm]: 2.48 (s, 6H), 2.52 (s, 3H), 7.32 (d, 4H), 7.42 (d, 2H), 7. 45 (s, 4H), 7.76 (d, 4H), 7.98 (dd, 2H), 8.60 (d, 2H).
Synthesis Examples 44-66
The compounds (43) to (45) and the compounds (47) to (66) described in Table 1 were prepared using the corresponding acid anhydride or acid chloride according to the method described in the corresponding carbazole derivative synthesis example 22. .

Next, the acrylic resin solution used for the Example and the comparative example is demonstrated. This acrylic resin solution is a solution containing the alkali-soluble resin (D) of the present invention.
Preparation of Acrylic Resin Solution (1) Add 800 parts by weight of cyclohexanone to the reaction solution, heat to 100 ° C. while injecting nitrogen gas into the container, and mix the following monomer and thermal polymerization initiator at the same temperature for 1 hour. The polymerization reaction was carried out dropwise.
Styrene 60.0 parts by weight Methacrylic acid 60.0 parts by weight Methyl methacrylate 65.0 parts by weight Butyl methacrylate 65.0 parts by weight Azobisisobutyronitrile 10.0 parts by weight After dropping, the reaction was further carried out at 100 ° C. for 3 hours. Then, 2.0 parts by weight of azobisisobutyronitrile dissolved in 50.0 parts by weight of cyclohexanone was added, and the reaction was further continued at 100 ° C. for 1 hour, so that the weight average molecular weight was about 40,000. An acrylic resin solution was obtained. After cooling to room temperature, sample about 2 g of the resin solution, heat dry at 300 ° C. for 20 minutes, measure the nonvolatile content, and add cyclohexanone to the previously synthesized resin solution so that the nonvolatile content is 20%. Thus, an acrylic resin solution (1) was prepared.
Preparation of Acrylic Resin Solution (2) The following solvent, monomer and thermal polymerization initiator were added to the reaction vessel, and after nitrogen substitution, the temperature of the solution was raised to about 70 ° C. while gently stirring, and 5 The polymerization reaction was carried out while maintaining the temperature and time.
2,2'-azobis (2,4-dimethylvaleronitrile) 5 parts by weight diethylene glycol methyl ethyl ether 200 parts by weight Methacrylic acid 20 parts by weight Glycidyl methacrylate 45 parts by weight Styrene 10 parts by weight cyclohexyl methacrylate 25 parts by weight An acrylic resin solution having a weight average molecular weight of about 22,000 was obtained. After cooling to room temperature, sample about 2 g of the resin solution, dry under reduced pressure at 70 ° C., measure the nonvolatile content, and add cyclohexanone to the previously synthesized resin solution so that the nonvolatile content is 20%. An acrylic resin solution (2) was prepared.

  Table 3 below shows radical polymerization initiators and sensitizers used in Examples and Comparative Examples of the present invention which are not exemplified in Table 1.

Examples 1-10 and Comparative Examples 1-10
100 parts by weight of dipentaerythritol pentaacrylate (Sartomer, SR399) as the radical polymerizable compound (C), 500 parts by weight of the acrylic resin solution (1) as a solution containing the alkali-soluble resin (D), and 400 of cyclohexanone as the solvent 5 parts by weight, 5 parts by weight of the radical polymerization initiator (A) shown in Table 4, 3 parts by weight of the sensitizer (B) shown in Table 4, and 0 trimethylolpropane tristhiopropionate as the thiol compound (E) Part by weight or 7 parts by weight was added and mixed to prepare a uniform polymerizable composition solution.

The polymerizable composition solution is filtered through a 0.2 μm pore size disk filter, coated on a stainless steel plate (# 600 polishing) using a spin coater, and heated and dried in an oven at 80 ° C. for 3 minutes. The solvent was removed. After drying, the film thickness of the polymerizable composition formed on the stainless steel plate was 2 μm. The polymerizable composition film is irradiated with light (9 mW / cm ² ) of a high-pressure mercury lamp through a bandpass filter that selectively transmits light of 350 to 380 nm, and the IR spectrum of the polymerizable composition film From the change in absorption intensity at 810 cm ⁻¹ , which is the characteristic absorption of the acrylic group, the consumption rate of the acrylic group was calculated 30 seconds after light irradiation and 60 seconds after light irradiation. The results are shown in Table 4.

  Comparison between Examples 1 to 10 of the present invention and Comparative Examples 1 to 10 shows that the monomer consumption rate is remarkably increased by using the polymerizable composition of the present invention.

Moreover, when the polymerizable composition before light irradiation formed on the stainless steel plates of Examples 1 to 10 was immersed in an aqueous solution of tetramethylammonium hydroxide having a concentration of 0.2% by weight at 20 ° C. for about 1 minute, an appropriate rate was obtained. It was confirmed that the polymerizable composition of the present invention was developed with an alkaline developer.
Examples 11 to 24 and Comparative Examples 11 to 24
100 parts by weight of dipentaerythritol pentaacrylate (Sartomer, SR399) as the radical polymerizable compound (C), 500 parts by weight of the acrylic resin solution (1) as a solution containing the alkali-soluble resin (D), and 400 of cyclohexanone as the solvent 5 parts by weight, 5 parts by weight of the radical polymerization initiator (A) shown in Table 5, 3 parts by weight of the sensitizer (B) shown in Table 5, and 0 trimethylolpropane tristhiopropionate as the thiol compound (E) Part by weight or 7 parts by weight was added and mixed to prepare a uniform polymerizable composition solution.

The polymerizable composition solution is filtered through a 0.2 μm pore size disk filter, coated on a 1 mm thick glass plate using a spin coater, and heated and dried in an oven at 80 ° C. for 3 minutes to remove the solvent. Removed. After drying, the film thickness of the polymerizable composition formed on the glass plate was 5 μm. This polymerizable composition film was exposed using a JA-25 SS-25CP type spectral irradiator by changing the irradiation energy amount of the high-pressure mercury lamp, that is, the irradiation time in 13 stages, and then 20 Development was carried out with a 1% aqueous sodium carbonate solution at 1 ° C. for 1 minute, and the minimum amount of energy required for insolubilization of the polymerizable composition at an irradiation wavelength of 365 nm was defined as sensitivity, and the results are shown in Table 5.

Examples 25-38 and Comparative Examples 25-38
The polymerizable composition film on the glass substrate prepared in Examples 11 to 24 and Comparative Examples 11 to 24 is exposed to 365 nm with an exposure gap of about 100 μm using a predetermined pattern mask (20 μm × 20 μm resolution). Light from a high-pressure mercury lamp with an energy of 10 mW / cm ² was irradiated for 15 seconds. Thereafter, development was performed at room temperature for 60 seconds with a 0.2% by weight tetramethylammonium hydroxide aqueous solution to remove unexposed portions, and after washing with pure water, the resulting cured product was placed in an oven at 230 ° C. Heated for 30 minutes. The pattern shape obtained on the glass substrate was evaluated by the following method. The results are shown in Table 6.
(Pattern shape)
The pattern shape obtained on the glass substrate was evaluated by a) the linearity of the pattern and b) the cross-sectional shape of the pattern.
About a), it observed and evaluated with the optical microscope. The rank of evaluation is as follows.
○: Good linearity Δ: Partially good linearity ×: Poor linearity b) was evaluated by observing with a scanning electron microscope (SEM). The rank of evaluation is as follows.
○: Forward tapered shape △: Non-tapered shape ×: Reverse tapered shape

It can be seen from Examples 25 to 38 that a pattern having excellent linearity and cross-sectional shape can be formed by using the polymerizable composition of the present invention. When a polymerizable composition other than the present invention was used, good results were not obtained for the linearity and cross-sectional shape of the pattern shape obtained on the glass substrate (Comparative Examples 25 to 38). Further, in Comparative Examples 35 to 38, the cross-sectional shape could not be accurately evaluated because of insufficient curing.
Examples 39-52 and Comparative Examples 39-48
After performing the PCT (pressure cooker) test on the pattern-formed substrates prepared in Example 25 to Example 38 and Comparative Example 25 to Comparative Example 34 under the conditions of 121 ° C., 100% RH, 2 atm, 24 hours, A cellophane tape was affixed to the 20 μm pattern portion and a peeling test was performed to evaluate pattern adhesion. The results are shown in Table 7.
The rank of evaluation is as follows.
○: No peeling of 20 μm pattern is observed X: Peeling of 20 μm pattern is recognized

When the polymerizable composition of the present invention was used, the adhesion of the pattern obtained on the glass substrate to the substrate was good (Examples 39 to 52), whereas the polymerizable composition other than the present invention was used. When used, sufficient adhesion of the pattern to the substrate was not obtained (Comparative Examples 39 to 48).

The present invention relates to a high-sensitivity polymerizable composition, a negative resist using the same, and an image pattern forming method using the same, for example, a spacer for liquid crystal display, MVA (multiple divided vertical alignment) system Ribs, solder resists, resists for circuit board creation, resists for semiconductors, resists for microelectronics, hologram materials, rib materials for plasma displays, resists for manufacturing parts for micromachines, etching resists, waveguide materials, micro It can be a material and method for quickly and reliably obtaining a patterned cured product having good physical properties in the field of compositions for image recording materials using capsules, various devices and the like.

Claims (4)

Photoradical polymerization initiator (A) represented by the following general formula (1), sensitizer (B) represented by the following general formula (2), radical polymerizable compound (C), alkali-soluble resin (D) And a polymerizable composition comprising the thiol compound (E).
General formula (1)

(Wherein R ₁ and R ₂ each independently represents a monovalent organic residue. R ₁ and R ₂ may be a cyclic structure in which R ₁ and R ₂ are bonded together.
R ₃ represents a hydrogen atom or a monovalent organic residue. )
General formula (2)

(In the formula, R _{4 to} R ₁₂ each independently represents a hydrogen atom or a monovalent organic residue. However, 1 to 4 of R _{5 to} R ₁₂ are represented by the following general formula (3). Including organic residues.)
General formula (3)

(In the formula, R ₁₃ represents a hydrogen atom or a monovalent organic residue.)   A negative resist comprising the polymerizable composition according to claim 1.   A method of forming an image pattern, comprising: laminating the negative resist according to claim 2 on a substrate, partially irradiating and curing an energy ray, and removing an unirradiated portion with an alkali developer. An image pattern formed by the image pattern forming method according to claim 3.