JP2007205858A - Capacitive pressure sensor - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a capacitive pressure sensor capable of performing pressure detection without affecting the inside pressure of a cavity in a manufacturing process, without being damaged, and moreover with high sensitivity. <P>SOLUTION: In a glass substrate 11, a first and a second conductive member 12, 13 are buried. On the principal plane 11b of the glass substrate 11, extracting electrodes 14a, 14b are formed in order to perform electrical connection with the first and second members 12, 13 respectively. On the first member 12 being exposed on the principal plane 11a side of the glass substrate 11, a fixed electrode 15 is formed. Onto the principal plane 11a of the glass substrate 11, a silicon substrate 18 having a pressure-sensitive diaphragm 18a being a movable electrode of the pressure sensor is eutectically bonded through a bonding member 17. Outside the fixed electrode 15, an annular spacer 16 is formed, and the spacer 16 has beams 16a extending to a junction region. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a capacitance-type pressure sensor that detects pressure using capacitance.

  The capacitive pressure sensor joins a substrate having a pressure-sensitive diaphragm, which is a movable electrode, and a substrate having a fixed electrode so as to have a predetermined interval (cavity) between the pressure-sensitive diaphragm and the fixed electrode. It is constituted by. In this capacitance-type pressure sensor, when pressure is applied to the pressure-sensitive diaphragm, the pressure-sensitive diaphragm is deformed, thereby changing the distance between the pressure-sensitive diaphragm and the fixed electrode. The capacitance between the pressure-sensitive diaphragm and the fixed electrode changes due to the change in the interval, and the change in pressure is detected using the change in capacitance.

In such a capacitance type pressure sensor, it is necessary to provide a cavity in a highly sealed state. As described above, as a technique for providing a cavity in a highly airtight state, there is a technique for anodically bonding a silicon substrate and a glass substrate (Patent Document 1).
JP 2000-28463 A

  When anodic bonding as disclosed in Patent Document 1 is used for a capacitance type pressure sensor having a narrow cavity, gas is generated during anodic bonding of a silicon substrate and a glass substrate, and this gas enters the cavity. If it enters, there is a problem that the pressure in the cavity is affected and pressure detection cannot be performed with high sensitivity. In addition, the applied voltage at the time of anodic bonding may cause discharge in the cavity and damage the sensor.

  The present invention has been made in view of the above points, and a capacitive pressure sensor that does not affect the pressure in the cavity in the manufacturing process, is not damaged, and can perform pressure detection with high sensitivity. The purpose is to provide.

  The capacitance type pressure sensor of the present invention has a pair of main surfaces, and is exposed on both main surfaces of the fixed electrode provided on one main surface side of the pair of main surfaces and the pair of main surfaces. And a glass substrate having a conductive member made of silicon embedded therein, and a gold-silicon eutectic bond on one main surface of the glass substrate, and disposed opposite to the fixed electrode at a predetermined interval. A silicon substrate having a movable electrode, and a spacer for partitioning a bonding region of the gold-silicon eutectic bonding and controlling a distance between the glass substrate and the silicon substrate. It has the beam part extended to the said joining area | region in planar view, It is characterized by the above-mentioned.

  According to this configuration, the bonding between the silicon substrate and the glass substrate is performed not by anodic bonding but by gold-silicon eutectic bonding. Unlike the anodic bonding, the gold-silicon eutectic bonding does not generate gas in the bonding reaction. For this reason, the pressure in the cavity is not affected in the manufacturing process. For this reason, the inside of a cavity can be made into the target pressure, and, thereby, pressure detection can be performed with high sensitivity. In addition, since the spacer has a beam portion extending to the joining region in a plan view, it is possible to realize reliable joining in the joining region and realize ideal deformation of the diaphragm.

  In the capacitive pressure sensor of the present invention, a region in which the silicon substrate and the silicon conductive member are electrically connected via a gold-silicon eutectic is provided in the bonding region. preferable.

  In the capacitive pressure sensor of the present invention, it is preferable that a lead electrode is formed on the silicon conductive member on the other main surface of the glass substrate. According to this configuration, since the external extraction electrode can be formed on one surface, a device suitable for surface mounting can be obtained.

  In the capacitance-type pressure sensor of this invention, it is preferable to have a Si-Si bond or a Si-O bond at the interface between the glass substrate and the silicon conductive member. According to this configuration, since the Si-Si bond or the Si-O bond is present at the interface between the glass substrate and silicon, the glass and silicon are firmly bonded, the adhesion between them is improved, and the cavity is hermetically sealed. Improves.

  According to the capacitance type pressure sensor of the present invention, it has a pair of main surfaces, the fixed electrode provided on one main surface side of the pair of main surfaces, and both main surfaces of the pair of main surfaces. A glass substrate having a silicon conductive member embedded so as to be exposed, and a gold-silicon eutectic bond on one main surface of the glass substrate, facing the fixed electrode at a predetermined interval A silicon substrate having a movable electrode disposed; and a spacer for partitioning a bonding region of the gold-silicon eutectic bonding and controlling a distance between the glass substrate and the silicon substrate. Has a beam portion extending to the joining region in a plan view, so that it does not affect the pressure in the cavity in the manufacturing process, is not damaged, and can perform pressure detection with high sensitivity.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
1A and 1B are diagrams of a capacitive pressure sensor according to an embodiment of the present invention, in which FIG. 1A is a plan view and FIG. 1B is a cross-sectional view taken along line 1b-1b in FIG. (C) is sectional drawing which follows the 1c-1c line of (a). In the figure, 11 indicates a glass substrate. The glass substrate 11 has a pair of main surfaces 11a and 11b facing each other. A first conductive member 12 that is a connection electrode for a fixed electrode is embedded in a cavity 19 described later of the glass substrate 11. A second conductive member 13 that is a connection electrode for a movable electrode, which will be described later, is embedded in a region other than the cavity 19 of the glass substrate 11. The first and second conductive members 12 and 13 are exposed at the main surfaces 11a and 11b, respectively.

  On the main surface 11b of the glass substrate 11, a lead electrode 14a is formed so as to be electrically connected to the exposed portion of the first conductive member 12, and is electrically connected to the exposed portion of the second conductive member 13. Thus, the extraction electrode 14b is formed. Since the lead electrodes 14a and 14b are provided on the main surface 11b as described above, the lead-out electrode to the outside can be formed on one surface, so that a device suitable for surface mounting can be obtained.

  As a material constituting the first and second conductive members 12 and 13, a conductive material such as silicon or metal can be used. As for the second conductive member 13, a gold-silicon eutectic as will be described later. In consideration of bonding, it is preferable to use silicon.

  A fixed electrode 15 is formed on the first conductive member 12 exposed on the main surface 11 a side of the glass substrate 11. The fixed electrode 15 is located inside the cavity 19 and inside a spacer 16 described later. Examples of the material constituting the fixed electrode 15 include a conductive material. However, when the first conductive member 12 is made of silicon, a material other than a simple substance of Au is used as the material constituting the fixed electrode 15. It is preferable to select. Thereby, it is possible to prevent the fixed electrode from undergoing a eutectic reaction with the first conductive member when the glass substrate and the silicon substrate are eutectic bonded. For example, as materials other than Au alone, Ti / Ta / Au / Ta, Ti / Ta / Au, Ta / Au / Ta, Ta / Au, Cr / Au / Ta, Cr / Au, Cr / Ta / Au / Ta, Cr / Ta / Au, etc. can be mentioned.

  On the main surface 11 a of the glass substrate 11, a silicon substrate 18 having a pressure-sensitive diaphragm 18 a that is a movable electrode of a pressure sensor is eutectic bonded via a bonding member 17. Thereby, a cavity 19 is formed between the glass substrate 11 and the silicon substrate 18. The pressure sensitive diaphragm 18 a is aligned so as to be positioned above the fixed electrode 15. As a result, a capacitance is generated between the pressure sensitive diaphragm 18 a (movable electrode) and the fixed electrode 15.

  As can be seen from FIGS. 1B and 1C, the joining member 17 is located outside the cavity 19. The joining member 17 is made of a gold-silicon eutectic obtained by a eutectic reaction between gold and silicon. In the bonding region by the bonding member 17, a gold-silicon eutectic bond is formed between the bonding member 17 and the silicon substrate 18. Further, as shown in FIG. 1C, a region where the second conductive member 13 and the silicon substrate 18 are electrically connected via the bonding member 17 is formed in the bonding region. When the second conductive member 13 is made of silicon, this region has a gold-silicon eutectic bond between the bonding member 17 and the silicon substrate 18, and the bonding member 17 and the second conductive member. 13 has a gold-silicon eutectic bond. This eutectic bonding is performed under vacuum under heating and pressure conditions. The second conductive member 13 can be formed in any location as long as it is a region where the bonding member 17 is formed. Accordingly, the location where the second conductive member 13 is formed is appropriately changed according to the conductive pattern of the mounting substrate. It becomes possible.

  Outside the fixed electrode 15, a spacer 16 is formed that partitions a bonding region of gold-silicon eutectic bonding and controls a distance between the glass substrate 11 and the silicon substrate 18. As shown in FIG. 1A, the spacer 16 has a beam portion 16a extending to the joining region in plan view. The beam portion 16a extends to the joining region so as to partition the joining region constituted by the joining member 17 into small regions.

  When the gold-silicon eutectic reaction occurs in the bonding region, the silicon substrate 18 is pulled toward the bonding member 17 side. That is, in the joining region, a force in the direction of arrow A is applied as shown in FIG. At this time, a force in the direction of arrow B, which is the direction opposite to the direction of arrow A, is applied to the spacer 16 region around the bonding region due to the reaction. If the spacer 16 is not provided with the beam portion 16a as in the capacitance type pressure sensor according to the present embodiment, the force in the arrow A direction in the joining region and the force in the arrow B direction in the spacer region are thus biased. In addition, the spacer 16 is lifted and the entire silicon substrate 18 is deformed, so that an ideal deformation as a diaphragm cannot be obtained. In other words, by providing the beam portion 16a in the spacer 16, a gold-silicon eutectic reaction occurs, a force in the direction of arrow A is applied in the bonding region, and a force in the direction of arrow B is applied in the spacer region. The force in the direction of arrow A and the force in the direction of arrow B are made uniform for the entire sensor. That is, as can be seen from FIG. 1B and FIG. 1C, the occupation ratios of the bonding region and the spacer region are different in a specific cross section. Specifically, in the cross section shown in FIG. 1B, the spacer region is wider than the bonding region, and in the cross section shown in FIG. 1C, the bonding region is wider than the spacer region. By providing the beam portion 16a in the spacer 16 and partitioning the joining region into small regions, the portion where the occupation ratio is changed increases, and as a result, the force in the direction of the arrow A and the force in the direction of the arrow B are uniformized as a whole sensor The Rukoto. As a result, the influence of the force in the direction of arrow A and the force in the direction of arrow B is reduced on the diaphragm 18a. As a result, it is possible to realize reliable bonding in the bonding region and to realize ideal deformation of the diaphragm. In addition, it is preferable to provide the beam portion 16a of the spacer 16 so as not to divide the joining region as much as possible.

  Further, the spacer 16 plays a role of preventing flow of the material melted during the gold-silicon eutectic reaction. Thus, by providing the spacer 16 in a substantially annular shape, it is possible to prevent the molten material from entering the fixed electrode side. Examples of the material of the spacer 16 include insulating materials such as silicon oxide and alumina.

  When the first and / or second conductive members 12 and 13 are made of silicon, the interface between the glass substrate 11 and the first and / or second conductive members 12 and 13 is anodically bonded. It is preferable. As will be described later, these interfaces are formed by pressing the first and / or second conductive members 12 and 13 into the glass substrate 11 under heating. Although high adhesion can be exhibited even at the interface obtained by such a method, the adhesion is improved by applying anodic bonding treatment after the first and / or second conductive members 12 and 13 are pushed into the glass substrate 11. Can be higher. Thus, by exhibiting high adhesion at the interface between the glass substrate 11 and the silicon conductive members 12 and 13, the airtightness in the cavity 19 formed between the pressure-sensitive diaphragm 18 a and the glass substrate 11 is kept high. be able to.

  Here, the anodic bonding treatment is performed by applying a predetermined voltage (for example, 300 V to 1 kV) at a predetermined temperature (for example, 400 ° C. or lower), thereby generating a large electrostatic attraction between silicon and glass, This refers to a process of forming a chemical bond via oxygen at the glass-silicon interface in contact or forming a covalent bond by releasing oxygen. The covalent bond at this interface is a Si—Si bond or a Si—O bond between the Si atom of silicon and the Si atom contained in the glass. Therefore, silicon and glass are firmly bonded by this Si—Si bond or Si—O bond, and very high adhesion is exhibited at the interface between the two. In order to perform such anodic bonding efficiently, the glass material of the glass substrate 11 is preferably a glass material containing an alkali metal such as sodium (for example, Pyrex (registered trademark) glass).

  In the capacitance type pressure sensor having such a configuration, a predetermined capacitance is provided between the pressure sensitive diaphragm 18 a and the fixed electrode 15 in the glass substrate 11. When pressure is applied to the pressure sensor, the pressure-sensitive diaphragm 18a moves according to the pressure. Thereby, the pressure sensitive diaphragm 18a is displaced. At this time, the capacitance between the pressure sensitive diaphragm 18a and the fixed electrode 15 changes. Therefore, the change can be a pressure change using the capacitance as a parameter.

  In this capacitance type pressure sensor, bonding between a silicon substrate and a glass substrate is performed by gold-silicon eutectic bonding instead of anodic bonding. Unlike the anodic bonding, the gold-silicon eutectic bonding does not generate gas in the bonding reaction. For this reason, the pressure in the cavity is not affected in the manufacturing process. For this reason, the inside of a cavity can be made into the target pressure, and, thereby, pressure detection can be performed with high sensitivity. In addition, since the spacer has a beam portion extending to the joining region in a plan view, it is possible to realize reliable joining in the joining region and realize ideal deformation of the diaphragm.

  Next, a method for manufacturing the capacitive pressure sensor of the present embodiment will be described. 2 (a) to 2 (g) are cross-sectional views for explaining a method for manufacturing a capacitive pressure sensor according to an embodiment of the present invention.

  First, a silicon substrate 20 having a low resistance by doping impurities is prepared. The impurity may be an n-type impurity or a p-type impurity. The resistivity is, for example, about 0.01 Ω · cm. Then, as shown in FIG. 2A, one main surface of the silicon substrate 20 is etched to form protrusions 20 a and 20 b corresponding to the first and second conductive members 12 and 13. That is, the protrusion 20 a corresponds to the first conductive member 12, and the protrusion 20 b corresponds to the second conductive member 13.

  Next, the glass substrate 11 is placed on the silicon substrate 20 on which the protruding portions 20a and 20b are formed. Further, the silicon substrate 20 and the glass substrate 11 are heated under vacuum, the silicon substrate 20 is pressed against the glass substrate 11, and the protrusions 20a and 20b are pushed into the main surface 11b of the glass substrate 11, and FIG. ), The silicon substrate 20 and the glass substrate 11 are bonded to each other. The temperature at this time is not higher than the melting point of silicon and is preferably a temperature at which the glass can be deformed (for example, not higher than the softening point temperature of the glass). For example, the heating temperature is about 800 ° C.

  Furthermore, in order to further improve the adhesion at the interface 11e between the protruding portions 20a and 20b of the silicon substrate 20 and the glass substrate 11, it is preferable to perform an anodic bonding treatment. In this case, an electrode is attached to each of the silicon substrate 20 and the glass substrate 11 and a voltage of about 300 V to 1 kV is applied under heating at about 400 ° C. or lower. Thereby, the adhesiveness at the interface between the two becomes higher, and the airtightness of the cavity 19 of the capacitive pressure sensor can be improved.

  Next, the main surface 11a side of the glass substrate 11 is polished to expose the protruding portions 20a and 20b of the silicon substrate 20 on the main surface 11a. Next, the back surface (surface on which the protrusions 20a and 20b are not provided) side of the silicon substrate 20 is etched to expose the main surface 11b of the glass substrate 11. Etching may be dry etching or wet etching. The silicon on the back surface may be removed by polishing. In this way, a substrate in which the first conductive member 12 and the second conductive member 13 are embedded in the glass substrate 11 as shown in FIG.

  Next, as shown in FIG. 2D, lead electrodes 14 a and 14 b are formed on the main surface 11 b side of the glass substrate 11 so as to be electrically connected to the exposed portions of the first and second conductive members 12 and 13. To do. In this case, first, an electrode material is deposited on the first and second conductive members 12 and 13 of the main surface 11b of the glass substrate 11, a resist film is formed thereon, and the resist film remains in the extraction electrode formation region. As described above, the resist film is patterned (photolithography), the electrode material is etched using the resist film as a mask, and then the remaining resist film is removed.

  Further, as shown in FIG. 2D, the fixed electrode 15 is formed on the main surface 11 a side of the glass substrate 11 so as to be electrically connected to the exposed portion of the first conductive member 12. In this case, first, an electrode material is deposited on the first conductive member 12 of the main surface 11a of the glass substrate 11, a resist film is formed thereon, and the resist film is left so that the resist film remains in the electrode formation region. Is patterned (photolithography), the electrode material is etched using the resist film as a mask, and then the remaining resist film is removed.

  Next, as shown in FIG. 2E, an annular spacer 16 is formed outside the fixed electrode 15. At this time, as shown in FIG. 1A, the spacer 16 is formed so as to have a beam portion 16a extending to the joining region in a plan view. In this case, a spacer material is deposited on the main surface 11a of the glass substrate 11, a resist film is formed thereon, and the resist film is patterned (photolithography) so that the resist film remains in the spacer formation region. The spacer material is etched using the resist film as a mask, and then the remaining resist film is removed.

  Next, as shown in FIG. 2 (f), a gold pillar 21 for the joining member 17 is formed outside the spacer 16. The gold pillar 21 is formed by first forming a thin gold layer by sputtering on the entire surface, then forming a resist film, and patterning the resist film so as to have an opening in a region corresponding to the bonding member 17. Then, gold plating is performed, and finally an unnecessary gold layer is removed by milling.

  The height and width of the gold pillar 21 are set so that no gap is generated between the gold pillar 21 and a sufficient bonding strength by gold-silicon eutectic bonding. Therefore, it is preferable to set the height of the gold pillar 21 higher than the thickness of the spacer 16 so that the gold-silicon eutectic reaction is caused in a state where the silicon substrate 18 and the gold pillar 21 are in contact with each other. Further, since the gold column 21 melts during the eutectic reaction, it is preferable to secure a predetermined flow space around the gold column 21 so that the melt does not enter an undesired region. For example, the gold pillar 21 is preferably provided with a height that is approximately twice the thickness of the bonding member 17 and an area that is approximately half the area of the bonding member 17.

  Next, as shown in FIG. 2G, a pressure sensitive diaphragm 18a is positioned at a predetermined distance from the fixed electrode 15 on a silicon substrate 18 that has been previously formed to have a predetermined thickness of about several tens of μm by etching or the like. In this manner, the eutectic bonding is performed between the gold pillar 21 and the silicon substrate 18 by being placed on the main surface 11 a side of the glass substrate 11. That is, the upper surface of the gold pillar 21 and the silicon substrate 18 are brought into contact with each other and heated at about 370 ° C. while applying a predetermined pressure to the silicon substrate 18 under vacuum. As a result, a eutectic reaction occurs between gold and silicon, and the gold column 21 is changed to a gold-silicon eutectic to form the bonding member 17. In this way, strong bonding is performed between the bonding member 17 and the silicon substrate 18. At this time, the gold pillar 21 melts and flows out, but since the spacer 16 is provided, entry into the fixed electrode 15 in the cavity 19 is prevented. In addition, when the second conductive member 13 is made of silicon, a gold-silicon eutectic reaction similarly occurs between the gold column 21 provided on the second conductive member 13 and the second conductive member 13. The second conductive member 13 and the joining member 17 are firmly joined. Thereby, the silicon substrate 18 is electrically connected to the second conductive member 13 that is the connection electrode via the bonding member 17.

  In such a method, the bonding between the silicon substrate and the glass substrate is performed by gold-silicon eutectic bonding instead of anodic bonding. Unlike the anodic bonding, the gold-silicon eutectic bonding does not generate gas in the bonding reaction. For this reason, the pressure in the cavity is not affected in the manufacturing process. For this reason, the inside of a cavity can be made into the target pressure, and the electrostatic capacitance type pressure sensor which can perform pressure detection with high sensitivity by this can be obtained. Further, according to this method, since no voltage is applied in the joining process, discharge occurs in the cavity and the sensor is not damaged. Further, since the spacer has a beam portion extending to the joining region, it is possible to realize reliable joining in the joining region and realize ideal deformation of the diaphragm.

  Next, examples performed for clarifying the effects of the present invention will be described. As shown in FIG. 3A, the width of the spacer 16 is about 50 μm, the width of the gold column 21 is about 40 μm (the width of the joining region is about 80 μm), the length L of the beam portion 16a is 100 μm, Four capacitance-type pressure sensors were produced by the above-mentioned method with the width D of 16a being 20 μm, 50 μm, 80 μm, and 100 μm, respectively. Moreover, the thing without the beam part 16a was produced together. About these electrostatic capacitance type pressure sensors, the sealing performance and the amount of diaphragm deformation were examined. The results are shown in Table 1 below. The sealing property and the amount of diaphragm deformation were determined with a non-contact type three-dimensional optical interference type surface roughness meter HD-8000 (manufactured by VEECO). Here, regarding the sealing performance, when the sealing is broken and the inside of the cavity 19 becomes the same pressure as the atmospheric pressure, the diaphragm will not be deformed in the cavity 19, so that the non-contact type three-dimensional optical interference surface roughness meter is used. When no interference fringes appear, it is determined that sealing is not completed. Moreover, the diaphragm deformation amount was set in the range shown in FIG.

  As can be seen from Table 1, when the beam portion 16a has a width of 20 μm, 50 μm, and 80 μm, the amount of deformation of the diaphragm in the joint region is smaller than that in the case where the beam portion 16a is not provided. The deformation of the diaphragm can reduce the influence of the diaphragm 19 on the deformation of the diaphragm. Thereby, the deformation of the diaphragm in the cavity 19 can be made closer to an ideal one. Therefore, the sensitivity of the pressure sensor can be improved. Moreover, the sealing property was also good. On the other hand, the beam portion 16a having a width of 100 μm could not be sealed. Therefore, in the pattern in FIG. 3A, the ratio of the area of the beam to the area of the bonding region is desirably about 42% to about 167%, the diaphragm deformation amount is less than 40 nm, and the sealing property is maintained. Therefore, it is preferably about 104% to about 167%.

  The present invention is not limited to the embodiment described above, and can be implemented with various modifications. For example, the numerical values and materials described in the above embodiments are not particularly limited. Further, the process described in the above embodiment is not limited to this, and the process may be performed by changing the order as appropriate. Other modifications may be made as appropriate without departing from the scope of the object of the present invention.

  The present invention can be applied to, for example, a barometer that monitors atmospheric pressure or a capacitance-type pressure sensor that monitors gas pressure.

It is a figure of the capacitive pressure sensor which concerns on embodiment of this invention, (a) is a top view, (b) is sectional drawing which follows the 1b-1b line of (a), (c) These are sectional drawings which follow the 1c-1c line of (a). (A)-(g) is sectional drawing for demonstrating the manufacturing method of the electrostatic capacitance type pressure sensor which concerns on embodiment of this invention. (A) is a top view which shows the capacitive pressure sensor which concerns on an Example, (b) is a figure which shows the deformation | transformation of the diaphragm of the capacitive pressure sensor shown to (a).

Explanation of symbols

DESCRIPTION OF SYMBOLS 11 Glass substrate 11a, 11b Main surface 12, 12a 1st conductive member 13 2nd conductive member 14a, 14b Lead electrode 15 Fixed electrode 16 Spacer 16a Beam part 17 Joining member 18, 20 Silicon substrate 18a Pressure sensitive diaphragm 19 Cavity 21 Gold pillar

Claims (4)

  A pair of principal surfaces, a fixed electrode provided on one principal surface side of the pair of principal surfaces, and a silicon conductive member embedded so as to be exposed on both principal surfaces of the pair of principal surfaces A glass substrate, a silicon substrate having a gold-silicon eutectic bond on one main surface of the glass substrate, and having a movable electrode disposed to face the fixed electrode at a predetermined interval; and the gold substrate A spacer that divides a bonding region of the silicon eutectic bonding and controls a distance between the glass substrate and the silicon substrate, and the spacer extends to the bonding region in a plan view. A capacitive pressure sensor having a portion.   The capacitance type according to claim 1, wherein a region where the silicon substrate and the silicon conductive member are electrically connected via a gold-silicon eutectic is provided in the junction region. Pressure sensor.   3. The capacitive pressure sensor according to claim 1, wherein a lead electrode is formed on the silicon conductive member on the other main surface of the glass substrate.   The capacitive pressure sensor according to any one of claims 1 to 3, further comprising a Si-Si bond or a Si-O bond at an interface between the glass substrate and the silicon conductive member.

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