JP2007191525A - Detergent composition - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a detergent exhibiting high cleaning effect by a small amount, for cleaning a substrate, an apparatus, or the like to which a pigment-dispersed composition is adhered. <P>SOLUTION: A detergent composition for cleansing a pigment-dispersed composition comprises a solvent containing an aromatic hydrocarbon and an Si-based surfactant. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a cleaning agent for cleaning and removing a pigment-dispersed composition.

Photolithographic techniques are used in the manufacture of semiconductor elements and liquid crystal display elements, and positive and negative photosensitive resin compositions are used for them.
The said photosensitive resin composition is apply | coated on substrates, such as a semiconductor substrate and a glass substrate, in the form of a coating liquid, performs a drying process suitably, and forms a film. Further, this is subjected to selective exposure, followed by development processing, whereby a patterned photosensitive resin film is formed.

  As a method for applying the photosensitive resin composition to the substrate, a rotary coating method is generally used, but particularly in the field of liquid crystal display element manufacturing, which is becoming increasingly large, a coating means such as a coat-and-spin method or a non-spin method. Has been proposed.

  In the coating step, the nozzle for discharging the photosensitive resin composition, the inner wall of the coating apparatus, the peripheral edge of the substrate, the back surface of the substrate, and other piping systems are contaminated with the photosensitive resin composition, and therefore, a cleaning process is performed periodically or as needed. There is a need.

  In particular, a material in which a pigment is dispersed, for example, a pigment-dispersed photosensitive resin composition for forming a color filter or a black matrix pattern, is difficult to remove by washing. Therefore, the realization of a cleaning removal liquid excellent in cleaning properties has been demanded.

In addition, as a document relevant to this invention, there exist patent document 1 and patent document 2, for example.
JP 2000-273370 A JP 2005-202363 A

  As a conventional semiconductor cleaning agent, for example, a solution in which propylene glycol monomethyl ether acetate (PGMEA) and propylene glycol monomethyl ether (PGME) are mixed at a ratio of 3: 7 has been used. However, when a pigment-dispersed composition (for example, a pigment-dispersed photoresist such as carbon black or a pigment-dispersed paint) is washed with such a cleaning agent, pigment aggregation and sedimentation occur in the washing liquid. It was stuck to the wall with a thin part such as piping, causing clogging. As a result, a decrease in work efficiency or clogging of nozzles has been a problem.

  In addition, N, N-dimethylacetamide, a high-boiling aprotic polar solvent, was so polar that carbon aggregated and settled. As a result, problems such as clogging of piping occurred.

Further, when using a single component alkyl aromatic compound, the effect could not be obtained unless the blending amount was increased as compared with the case of using a mixed alkyl aromatic compound.
In view of the above problems, the present invention provides a cleaning agent that exhibits a high cleaning effect in a small amount for cleaning a pigment-dispersed composition.

A cleaning composition according to the present invention is a cleaning composition for cleaning and removing a pigment-dispersed composition, and includes a solvent containing an aromatic hydrocarbon and a Si-based surfactant. And
In the cleaning composition, the Si-based surfactant contains at least one of a polymer, copolymer, or oligomer having a weight average molecular weight of 8000 to 100,000 in terms of polystyrene by gel permeation chromatography. It is characterized by.

In addition, the above-mentioned cleaning composition is characterized in that the Si-based surfactant contains an ether bond.
In addition, the above-described cleaning composition is characterized in that the Si-based surfactant has an ester structure at at least one molecular end.

Further, the cleaning composition is characterized in that the Si-based surfactant is a compound derived from glycol.
In addition, the above-described cleaning composition is characterized in that the Si-based surfactant includes a group derived from ethylene glycol and a group derived from propanediol.

  Further, the cleaning composition is characterized in that the group derived from the propanediol is selected from the groups represented by the following structural formulas.

また、上記の洗浄剤組成物は、前記Si系界面活性剤が、アニオン性、カチオン性、両性、もしくはノニオン性の界面活性剤を含むことを特徴とする。

In the above-described cleaning composition, the Si surfactant includes an anionic, cationic, amphoteric, or nonionic surfactant.

  Further, in the above-described cleaning composition, the Si surfactant is a fatty acid, linear alkylbenzene, higher alcohol, alpha olefin, normal paraffin, alkylphenol, amino acid, betaine, amine oxide. Or a quaternary ammonium salt surfactant.

  In the cleaning composition, the solvent may be propylbenzene, cumene, ethylmethylbenzene, trimethylbenzene, ethyldimethylbenzene, tetramethylbenzene, methylpropylbenzene, diethylbenzene, ethyltrimethylbenzene, dimethylpropylbenzene, and diethyl It contains an aromatic compound selected from methylbenzene.

  In the cleaning composition, the solvent includes a mixture of a polar hydrocarbon solvent and a nonpolar hydrocarbon solvent.

  By using the cleaning agent according to the present invention, a cleaning effect equivalent to or higher than that of the conventional product can be obtained with a small amount of cleaning agent. In addition, the cleaning agent according to the present invention is excellent in terms of work efficiency because it has a low environmental load and is less likely to cause aggregation and sedimentation of the pigment.

Further, by containing the Si-based surfactant, the cleaning agent according to the present invention can obtain a cleaning effect equal to or higher than that of the conventional product even if the amount is small.
Furthermore, as the number of carbon atoms of the alkyl group is higher, the amount of the compound added can be reduced as the number of carbon atoms increases (that is, the addition efficiency is better), so the cleaning agent according to the present invention is used. Thus, a cleaning effect equivalent to or higher than that of the conventional product can be obtained with a small amount of the aromatic compound added.

EXAMPLES Hereinafter, although this invention is demonstrated in detail based on an Example and a comparative example, this does not limit this invention at all.
[Composition of cleaning agent]
The cleaning agent according to the present invention includes, for example, at least one solvent that can be removed by dissolving the pigment-dispersed composition attached to a base material that is a semiconductor substrate, and a Si-based surfactant. Furthermore, the solvent has an aromatic hydrocarbon.

  The solvent contained in the cleaning agent according to the present invention may be composed of only one kind of solvent, but in order to satisfy various characteristics such as detergency, drying property, and prevention of sedimentation of the washed pigment. It is preferable to use a mixed solvent using a seed solvent from the viewpoint that a balanced cleaning solution can be easily designed.

〔solvent〕
The solvent contained in the cleaning agent according to the present invention is a hydrocarbon solvent, and is a structural skeleton selected from aryl, allyl, alkane, alkene, alkyne, alkenyl, alcohol, ether, ester, ketone, aldehyde, and carboxylic acid Including at least one compound having

  For example, the solvent of the present invention includes cyclohexanone, propylene glycol monomethyl ether acetate (hereinafter also referred to as PGMEA), propylene glycol monomethyl ether (hereinafter also referred to as PGME), 1- (3-methoxy) -butyl acetate , Methoxypropyl acetate, acetone, ethyl methyl ketone, diethyl ketone, 4-methyl-2-pentanone, 2-butanone, 2-heptanone, methanol, ethanol, propanol, butanol, pentanol, hexanol, heptanol, octanol, ethylene glycol , Propanediol, ethylene glycol ether, ethylene glycol ester, formaldehyde, acetaldehyde, propionaldehyde, formic acid, acetic acid, propionic acid, ethyl 3-ethoxypropionate, ethyl formate, ants Butyl, propyl formate, pentyl formate, hexyl formate, heptyl formate, octyl formate, ethyl acetate, butyl acetate, propyl acetate, pentyl acetate, hexyl acetate, heptyl acetate, octyl acetate, ethyl lactate, butyl lactate, pentyl lactate, hexyl lactate, Select from heptyl lactate, octyl lactate, hexane, heptane, octane, nonane, decane, diethyl ether, cyclohexane, cyclohexanol, dioxane, oxetane, adipic acid dimethyl ester, adipic acid diethyl ester, succinic acid dimethyl ester, and succinic acid diethyl ester Contain more than one kind. In particular, it is preferable to use propylene glycol monomethyl ether acetate (PGMEA) or propylene glycol monomethyl ether (PGME).

In addition, the solvent is preferably used by mixing a polar hydrocarbon solvent and a nonpolar hydrocarbon solvent.
In view of suppressing the aggregation phenomenon of carbon particles of carbon black, the solvent preferably contains an aromatic hydrocarbon, and more preferably contains an alkylbenzene as the aromatic hydrocarbon.

The total number of carbon atoms of all alkyl groups of alkylbenzene is preferably 3 to 5, and more preferably 4 carbon atoms of all alkyl groups of the aromatic compound.
The content of the aromatic compound in the cleaning agent according to the present invention is preferably 5 wt% to 50 wt%, and more preferably 10 wt% to 30 wt%. In the aromatic compound, the content of the aromatic compound in which all the alkyl groups have 4 carbon atoms is preferably 20 wt% to 90 wt%.

  The alkylbenzene contained in the aromatic compound is from propylbenzene, cumene, ethylmethylbenzene, trimethylbenzene, ethyldimethylbenzene, tetramethylbenzene, methylpropylbenzene, diethylbenzene, ethyltrimethylbenzene, dimethylpropylbenzene, diethylmethylbenzene, It is preferable to select.

  In addition to these alkylbenzenes, at least one of phenol, cresol, anisole, xylenol, benzyl alcohol, diphenyl ether, indane, tetramethylcyclopentadiene, and dihydromethyl-1H-indene may be mixed.

  As the solvent containing these alkylbenzenes, for example, commercially available Solvesso 100, Solvesso 150, Solvesso 200 (trade name; manufactured by Exxon Chemical Co., Ltd.) can be used.

[Surfactant]
The cleaning agent according to the present invention contains a Si-based surfactant.
Examples of Si-based surfactants include Additol XL-121 (trade name; manufactured by Solusia), MegaFac R-08, MegaFac R-60 (all trade names; manufactured by Dainippon Ink and Chemicals), X -70-090, X-70-091, X-70-092, X-70-093 (all trade names; manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-310, BYK-315 (all trade names; Big Chemie) At least one of them can be used. In particular, Additol XL-121, a silicon-containing glycol condensate, has an ether bond and a molecular terminal ester bond, a polystyrene-reduced weight average molecular weight Mw of 11000 by gel permeation chromatography, and polyethylene in the molecule. It has the characteristic of having a glycol block and polypropylene glycol. For this reason, it is preferable to use Additol XL-121 as the cleaning agent according to the present invention.

  In addition to these Si-based surfactants, various anionic surfactants, cationic surfactants, amphoteric surfactants, and nonionic surfactants can be mixed and used.

  As the anionic surfactant, fatty acid type (anion), linear alkylbenzene type, higher alcohol type (anion), alpha olefin type, or normal paraffin type can be used. Examples of the cleaning agent according to the present invention include higher fatty acid salts such as soap, secondary higher fatty acid salts, higher alkyl sulfates, higher alkyl ether sulfates, higher alkyl ester sulfates, higher aryl ether sulfates, higher alcohols. Sulfate ester, secondary higher alcohol sulfate ester, primary higher alkyl sulfonate, secondary higher alkyl sulfonic acid, higher alkyl aryl sulfonate, higher alkyl disulfonate, sulfonated higher fatty acid salt, Sulfated fats and fatty acid salts, higher alkyl phosphoric acid ester salts, higher fatty acid ester sulfuric acid ester salts, higher fatty acid ester sulfonates, higher alcohol ether sulfonates, higher fatty acid salt amide alkylated sulfonates and sulfosuccinates Acid ester salts, alkylbenzenes Phonates, alkylphenol sulfonates, alkylnaphthalene sulfonates, naphthenates, resinates, resin acid alcohol sulfates, alkyl phosphates, polyoxyethylene alkyl ether phosphates, alkyl aryl ether phosphates Alternatively, sulfosuccinate can be used.

  As the cationic surfactant, a quaternary ammonium salt system can be used. For the cleaning agent according to the present invention, for example, alkyl quaternary ammonium salts, alkylbenzyl quaternary ammonium salts, and quaternary ammonium salts having a nitrogen ring can be used. Also, for example, organosiloxane polymer KP341 (trade name; manufactured by Shin-Etsu Chemical Co., Ltd.), (meth) acrylic acid (co) polymer polyflow No. 75, No. 90, No. 95 (all trade names; Kyoeisha Yushi Chemical Industry) And commercial products such as W001 (trade name; manufactured by Yusho) can also be used.

  As the amphoteric surfactant, an amino acid type, a betaine type, or an amine oxide type can be used. For the cleaning agent according to the present invention, for example, alkylamino fatty acid salts, alkylbetaines, and alkylamine oxides can be used.

  As the nonionic surfactant, fatty acid type (nonionic), higher alcohol type (nonionic), or alkylphenol type can be used. Examples of the detergent according to the present invention include sucrose fatty acid ester, sorbitan fatty acid ester, polyoxyethylene sorbitan fatty acid ester, fatty acid alkanolamide, polyoxyethylene alkyl ether, glycerin ester of higher fatty acid, glycol ester of higher fatty acid, higher Fatty acid pentaerythritol esters, higher fatty acid sorbitans and mannitan esters, higher alcohol condensates, higher fatty acid condensates, and polypropylene oxide condensates can be used.

The content of the Si-based surfactant in the cleaning agent according to the present invention is preferably 0.001 wt% to 1 wt%, more preferably 0.01 wt% to 0.1 wt%.
[Cleaning agents for cleaning agents]
As a pigment dispersion type composition suitable as a cleaning object to which the cleaning agent according to the present invention can be applied, positive type, negative type, chemical amplification type, non-chemical amplification conventionally used for semiconductors, liquid crystals, color filters, etc. Type pigment dispersion type photosensitive resin composition. The photosensitive resin composition basically contains a photosensitive component such as a resin component and a photopolymerization initiator as essential components, in addition to various monomer components, surfactants, acid components, nitrogen-containing organic compounds, pigments, It may contain a solvent.

  The photosensitive resin composition in which the cleaning agent according to the present invention exhibits a cleaning effect is a photosensitive resin composition in which a pigment is dispersed, and more preferably red (R), green (G), blue (B ) Color filter forming photosensitive resin composition and black matrix pattern forming photosensitive resin composition.

  Examples of the resin component include one or more selected from monomers having a carboxy group such as acrylic acid and methacrylic acid, methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, 2-hydroxyethyl acrylate, 2 -Hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, N-butyl acrylate, N-butyl methacrylate, isobutyl acrylate, isobutyl methacrylate, benzyl acrylate, benzyl methacrylate, phenoxy acrylate, phenoxy methacrylate, isobornyl acrylate, isobornyl methacrylate, glycidyl Copolymer with one or more selected from methacrylate, styrene, acrylamide, acrylonitrile, etc., phenol novolac type epoxy Resins such as shearate polymer, phenol novolac type epoxy methacrylate polymer, cresol novolac type epoxy acrylate polymer, cresol nopolac type epoxy methacrylate polymer, bisphenol A type epoxy acrylate polymer, bisphenol S type epoxy acrylate polymer It is done.

  Examples of the photopolymerization initiator include 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1- [4- (2-hydroxyquinethoxy) phenyl] -2 -Hydroxy-2-methyl-1-propan-1-one, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 1- (4-dodecylphenyl) -2-hydroxy- 2-methylpropan-1-one, 2,2-dimethoxy-1,2-diphenylethane-1-one, bis (4-dimethylaminophenyl) ketone, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 4- Benzoyl-4'-methyldimethylsulfide, 4-dimethylaminobenzoic acid, methyl 4-dimethylaminobenzoate, 4-dimethyl Ethyl tilaminobenzoate, butyl 4-dimethylaminobenzoate, 4-dimethylamino-2-ethylhexylbenzoic acid, 4-dimethylamino-2-isoamylbenzoic acid, benzyl-β-methoxyethyl acetal, benzyldimethyl ketal, 1-phenyl -1,2-propanedione-2- (o-ethoxycarbonyl) oxime, methyl o-benzoylbenzoate, 2,4-diethylthioxanthone, 2-chlorothioxanthone, 2,4-dimethylthioxanthone, 1-chloro-4- Propoxythioxanthone, thioxanthene, 2-chlorothioxanthene, 2,4-diethylthioxanthene, 2-methylthioxanthene, 2-isopropylthioxanthene, 2-ethylanthraquinone, octamethylanthraquinone, 1,2-benzanthraquinone, 2,3 -Diphenylanthraquinone, azobis (isoptilo) nitrile, benzo Ruperoxide, cumene peroxide, 2-mercaptobenzimidazole, 2-mercaptobenzoxazole, 2-mercaptobenzothiazole, 2- (o-chlorophenyl) -4,5-bis (m-methoxyphenyl) -imidazolyl dimer, benzophenone 2-chlorobenzophenone, p, p'-bis (dimethylamino) benzophenone, 4,4'-bis (diethylamino) benzophenone, 4,4'-dichlorobenzophenone, 3,3-dimethyl-4-methoxybenzophenone, benzyl, Benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzoin butyl ether, acetophenone, 2,2-diethoxyacetophenone, p-dimethylacetophenone, p-dimethylaminopropiophenone, dichloroacetophene , Trichloroacetophenone, p-tert-butylacetophenone, p-dimethylaminoacetophenone, p-tert-butyltrichloroacetophenone, p-tert-butyldichloroacetophenone, α, α-dichloro-4-phenoxyacetophenone, thioxanthone, 2-methyl Thioxanthone, 2-inoprovir thioxanthone, dibenzosuberone, pentyl-4-dimethylaminobenzoate, 9-phenylacridine, 1,7-bis- (9-acridinyl) heptane, 1,5-bis- (9-acridinyl ) Pentane, 1,3-bis (9-acridinyl) propane, p-methoxytriazine, 2,4,6-tris (trichloromethyl) -s-triazine, 2-methyl-4,6-bis (trichloromethyl)- s-triazine, 2- [2- (5-methylfuran-2-yl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (furan-2-yl) ethenyl] -4,6-bis (g Chloromethyl) -s-triazine, 2- [2- (4-diethylamino-2-methylphenyl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (3,4- Dimethoxyphenyl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- (4-methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-ethoxystyryl) ) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-n-butoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2,4-bis (trichloromethyl) -6- (3-bromo-4-methoxy) phenyl-s-triazine, 2,4-bis (trichloromethyl) -6- (2-bromo-4-methoxy) phenyl-s-triazine, 2,4-bis (Trichloromethyl) -6- (3-bromo-4-methoxy) styrylphenyl-s-triazine, 2,4-bis (trichloromethyl) -6- (2-bromo-4-methoxy) styrylphenyl-s-triazine , Etc. Can do.

As the pigment, for example,
CIPigment Yellow 11,24,31,53,83,99,108,109,139,150,151,154,167,180,185,193;
CIPigment Orange 36,38,43;
CIPigment Red 105,122,149,150,155,171,175,176,177,209,224,254,264;
CIPigment Violet 19,23,32,39;
CIPigment Blue 1,2,15: 1,15: 2,15: 3,16,22,60,66;
CIPigment Green 7,36,37;
CIPigment Brown 25,28;
CIPigment Black 1,7;
Carbon black; and the like.

  Many proposals have been made on such photosensitive resin compositions for forming color filters or black matrix patterns. For example, JP 2004-69754 A, JP 11-231523 A, The photosensitive materials described in JP-A-84125, JP-A-10-221843, JP-A-9-269410, JP-A-10-90516 and the like are preferably used.

  The cleaning agent is, for example, the photosensitive resin composition applied to at least one of a nozzle, a priming roller (rotating roller), or a nozzle cleaning device of a coating device that applies a photosensitive resin composition to a semiconductor substrate or the like. Can be used to remove objects.

  In addition, since the azeotropic point of the cleaning agent varies by adjusting the composition of the cleaning agent, the dryness is adjusted by mixing in consideration of the high boiling point or low boiling point compound when selecting the aromatic compound or solvent. You can also.

  Other pigment-dispersed compositions include pigment-dispersed paints and pigment-dispersed colorants.

Examples of the present invention will be described below, but the scope of the present invention is not limited to these examples.
In the examples below, CFPR GH-1004 (green) and CFPR BK-5005SL (black), which are pigment-dispersed photoresists for color filters, are made of glass tubes with an inner diameter of 10 mm (both trade names; manufactured by Tokyo Ohka Kogyo Co., Ltd.) Ink-jet inks for color filters (manufactured by Epson Corporation) were respectively fed. Thereafter, the glass tube was filled with the cleaning composition, and aggregation and sedimentation of the pigment were observed.
[Example 1]
20 parts by mass of PGME, 60 parts by mass of PGMEA, and 20 parts by mass of Solvesso 100 (trade name; manufactured by Exxon Chemical Co., Ltd.) are mixed. 0.005 parts by mass of Additol XL-121 (trade name; Solusia) The detergent composition (A) was prepared by mixing with stirring.

When the glass tube fed with CFPR GH-1004 was filled with the detergent composition (A), no aggregation or sedimentation of the pigment was observed.
When the glass tube fed with CFPR BK-5005SL was filled with the cleaning composition (A), no aggregation or sedimentation of the pigment was observed.

When the glass tube into which the ink for color filter ink was fed was filled with the cleaning composition (A), no aggregation or sedimentation of the pigment was observed.
[Comparative Example 1]
20 parts by mass of PGME, 60 parts by mass of PGMEA, and 20 parts by mass of Solvesso 100 (trade name; manufactured by Exxon Chemical Co., Ltd.) were mixed to prepare a detergent composition (B).

When a glass tube into which CFPR GH-1004 was fed was filled with the cleaning composition (B), pigment aggregation and sedimentation were observed.
When the glass tube fed with CFPR BK-5005SL was filled with the detergent composition (B), aggregation and sedimentation of the pigment were observed.

When the glass tube into which the ink for color filter ink was fed was filled with the cleaning composition (B), aggregation and sedimentation of the pigment were observed.
[Comparative Example 2]
70 parts by mass of PGME and 30 parts by mass of PGMEA were mixed to prepare a cleaning composition (C).

When the glass tube into which CFPR GH-1004 was fed was filled with the cleaning composition (C), aggregation and sedimentation of the pigment were observed.
When the glass tube fed with CFPR BK-5005SL was filled with the cleaning composition (C), aggregation and sedimentation of the pigment were observed.

When the glass tube into which the inkjet ink for color filter was fed was filled with the cleaning composition (C), aggregation and sedimentation of the pigment were observed.
[Comparative Example 3]
20 parts by mass of PGME, 60 parts by mass of PGMEA, and 20 parts by mass of Solvesso 100 (trade name; manufactured by Exxon Chemical) 10 parts by mass of Additol XL-121 (trade name; Solusia) The detergent composition (D) was prepared by mixing with stirring.

When the glass tube fed with CFPR GH-1004 was filled with the cleaning composition (D), aggregation and sedimentation of the pigment were observed.
When the glass tube into which CFPR BK-5005SL was fed was filled with the cleaning composition (D), pigment aggregation and sedimentation were observed.

When the glass tube into which the inkjet ink for color filter was fed was filled with the cleaning composition (D), aggregation and sedimentation of the pigment were observed.
Table 1 shows the component ratio of the cleaning composition used in each example.

  Table 2 summarizes the above observation results.

本発明に係る洗浄剤の実施例では顔料の沈降・凝集は観測されず、一方、比較例では顔料の沈降・凝集が観測されるという結果が示された。

In the example of the cleaning agent according to the present invention, no precipitation / aggregation of the pigment was observed, whereas in the comparative example, precipitation / aggregation of the pigment was observed.

Claims (11)

A cleaning composition for cleaning and removing a pigment-dispersed composition,
A solvent containing an aromatic hydrocarbon;
A cleaning composition comprising a Si-based surfactant.   The Si-based surfactant contains at least one of a polymer, copolymer, or oligomer having a weight average molecular weight of 8000 to 100,000 in terms of polystyrene by gel permeation chromatography. Cleaning composition.   The cleaning composition according to claim 1 or 2, wherein the Si-based surfactant contains an ether bond.   The cleaning composition according to any one of claims 1 to 3, wherein the Si-based surfactant has an ester structure at at least one molecular terminal.   The cleaning composition according to any one of claims 1 to 4, wherein the Si-based surfactant is a compound derived from glycol.   The cleaning composition according to claim 1, wherein the Si-based surfactant includes a group derived from ethylene glycol and a group derived from propanediol. object. The detergent composition according to claim 6, wherein the group derived from propanediol is selected from groups represented by the following structural formulas.

  The detergent composition according to any one of claims 1 to 7, wherein the Si-based surfactant contains an anionic, cationic, amphoteric or nonionic surfactant.   The Si surfactant is a fatty acid, linear alkylbenzene, higher alcohol, alpha olefin, normal paraffin, alkylphenol, amino acid, betaine, amine oxide, or quaternary ammonium salt interface. The cleaning composition according to claim 1, comprising an active agent.   Aromatic compounds wherein the solvent is selected from propylbenzene, cumene, ethylmethylbenzene, trimethylbenzene, ethyldimethylbenzene, tetramethylbenzene, methylpropylbenzene, diethylbenzene, ethyltrimethylbenzene, dimethylpropylbenzene, and diethylmethylbenzene The cleaning composition according to claim 1, comprising:   The said solvent contains the mixture of a polar hydrocarbon solvent and a nonpolar hydrocarbon solvent, The cleaning composition as described in any one of Claims 1-10 characterized by the above-mentioned.