JP2007175629A - Apparatus for cleaning liquid - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an apparatus for cleaning a liquid, in which the time to bring a gas into contact with the liquid which is to be treated and is supplied into a pressure-resistant vessel, is prolonged to dissolve the gas excellently in the liquid to be treated and clean efficiently the liquid to be treated, which is manufactured easily and the inside of which is maintained easily. <P>SOLUTION: The apparatus for cleaning the liquid is provided with: the pressure-resistant vessel having a vessel main body, a cover to be attached to/detached from the vessel main body, a liquid supply port and a gas supply port on the cover and a liquid discharge port in the lower part of the vessel main body; and three baffle plates the outside diameter of each of which is almost the same as the inside diameter of the vessel main body and which are fit to a fitting member and arranged in a stacked state at predetermined intervals on the inside of the cover of the pressure-resistant vessel. When the cover is attached to the vessel main body, each of baffle plates is set to have a place in a predetermined position in the upper part of the pressure-resistant vessel. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a liquid purification apparatus for purifying treatment liquid such as industrial wastewater, domestic wastewater, and water in various water tanks.

  Conventionally, as this type of purification device, for example, a large number of sheet-like synthetic resin films are suspended in a septic tank, and bacteria or the like for removing contaminants are attached to the septic tank so as to make contact with contaminated water over a wide area. Various devices are known for purifying and purifying. However, these devices require a large sedimentation basin and large facilities, and have the disadvantage that they are inferior in terms of capital investment and operational efficiency. Proposed.

This purification apparatus includes a pressure vessel in which a diffusion plate having a large number of dropping holes is disposed in the upper part of the inside, and an oxygen supply source that supplies oxygen to the pressure vessel, and is supplied from a water supply pipe into the pressure vessel. By supplying oxygen from the oxygen supply source to the treated water and applying a pressure of an oxygen atmosphere to the surface of the treated water, the treated water is purified and drained to the outside.
Japanese Patent No. 3375348

  However, in this purification device, only two flat circular diffusion plates with different outer diameters are provided above and below the upper part of the pressure vessel, so that the diffusion from the discharge port of the water supply pipe The treated water that has fallen on the plate falls from the outer perimeter of each diffusion plate in addition to falling from each drop hole of the diffusion plate, and the treated water passes through the diffusion plate and is stored in the lower part of the pressure vessel. Time, that is, the contact time of oxygen with treated water becomes relatively short, and oxygen may not be sufficiently dissolved in treated water. Has the problem of being difficult.

  Moreover, since the pressure vessel is formed of a hermetically sealed container, the manufacturing process of the device itself becomes complicated, such as the installation of the diffusion plate disposed in the upper part of the pressure vessel is complicated, and the pressure vessel There is also a problem that maintenance work such as internal cleaning is troublesome.

  The present invention has been made in view of such circumstances, and the object thereof is to lengthen the contact time of the gas to the processing liquid supplied into the pressure-resistant container and to satisfactorily dissolve the gas in the processing liquid. Therefore, it is an object of the present invention to provide a liquid purification apparatus that can efficiently perform the purification operation of the processing liquid and that can easily perform the manufacture of the apparatus and the internal maintenance operation.

  In order to achieve this object, the invention according to claim 1 of the present invention has a container main body and a lid attached to and detached from the container main body, and the lid is provided with a liquid supply port and a gas supply port. A liquid processing apparatus comprising: a pressure vessel provided with a liquid drain port at a lower portion of a main body; and a gas supply source for supplying gas from the gas supply port of the lid body into the pressure vessel, wherein the pressure vessel Three baffle plates having an outer diameter shape substantially the same as the inner diameter shape of the container body are arranged in a laminated state with a predetermined interval on the inner surface side of the lid body through an attachment member, and the lid body is disposed in a container. It is characterized in that each baffle plate is set so as to be positioned at a predetermined upper position in the pressure vessel when attached to the main body.

  Each of the baffle plates has a plurality of drop holes drilled at different positions in the vertical direction as in the invention described in claim 2, and a band plate protruding upward is provided on the outer peripheral edge thereof. The container main body and the lid body are preferably coated on the inner surfaces thereof as in the invention described in claim 3.

  According to the first aspect of the present invention, the three baffle plates whose outer diameter shape is substantially the same as the inner diameter shape of the container body are provided at predetermined intervals on the inner surface side of the lid body of the pressure resistant container via the mounting member. When the lid is attached to the container body, each baffle plate is inevitably positioned at the upper part in the pressure resistant container, so that the liquid supply of the lid The falling speed of the processing liquid supplied from the mouth can be slowed by each baffle plate, and the contact time with the gas can be lengthened, so that the processing liquid can be purified efficiently. Also, by removing the lid from the container body, each baffle plate can also be removed from the container body at the same time, so that each baffle plate can be easily cleaned and maintained, and each baffle plate is attached to the container body. On the other hand, since it is fixed to the detachable lid, the device itself can be easily manufactured, and a liquid purification device advantageous in cost can be obtained.

  Further, according to the invention described in claim 2, in addition to the effect of the invention described in claim 1, each baffle plate has a number of dropping holes formed at different positions in the vertical direction, and Since the band plate protruding upward is provided at the peripheral edge, the dropping speed of the processing liquid can be further delayed by the baffle hole and the band plate of each baffle plate, and the purification operation of the processing liquid can be further improved in efficiency. be able to.

  Further, according to the invention described in claim 3, in addition to the effect of the invention described in claim 1 or 2, since the inner surface of the container body and the lid is coated, for example, the inner surface of the pressure vessel is extended over a long period of time. It can be kept clean and the maintenance operation can be performed more easily, and the coating operation itself can be easily performed by the removable lid.

The best mode for carrying out the present invention will be described below in detail with reference to the drawings.
1 to 10 show an embodiment of a liquid purification apparatus according to the present invention. FIG. 1 is a configuration diagram thereof, FIG. 2 is a plan view thereof, FIG. 3 is a front view of a lid, and FIG. FIG. 5 and FIG. 6 are diagrams showing each baffle plate, FIG. 7 and FIG. 8 are diagrams showing modifications of each baffle plate, and FIG. 9 and FIG. FIG.

  1 to 3, the liquid purification apparatus 1 is detachably attached to a bottomed cylindrical container body 2a having a leg 3 and a drain valve 4 provided at the bottom and having an upper surface opened, and an upper surface opening of the container body 2a. It has a pressure-resistant container 2 composed of a lid 2b provided. The lid 2b of the pressure vessel 2 is fixed with a liquid supply pipe 5 having a liquid supply port 5a at the lower end and a flange 5b at the upper end at the center, and one end in the diameter direction thereof. Further, the upper portion of the discharge pipe 6 having the liquid discharge port 6a at the lower end and the flange 6b at the upper end is fixed. At this time, the liquid supply port 5a is set to a position immediately below the inner surface of the lid 2a (that is, the uppermost portion of the pressure vessel 2), and the liquid discharge port 6a is set to be positioned near the bottom, which is the lower portion of the container body 2a. .

  A pump 5 is connected to the flange 5b of the liquid supply pipe 5 through an external supply pipe 7. A check valve 9 and a liquid supply adjustment valve are provided at predetermined positions in the middle of the external supply pipe 7. 10 is connected. The check valve 9 is preferably disposed as close as possible to the liquid supply port 5a from the viewpoint of preventing a backflow of gas when the liquid purification apparatus 1 is stopped. The flange 6b of the discharge pipe 6 is connected to an external discharge pipe 11 to which a pressure / discharge amount adjusting valve 12 is connected.

  As a result, the pumping pump 8 is operated with the liquid supply adjustment valve 10 in the open state, whereby the processing liquid is discharged into the container body 2a from the liquid supply port 5a at the top of the pressure vessel 2 via the external supply pipe 7. The clean liquid purified in the pressure vessel 2 is discharged to the outside from the liquid discharge port 6a through the discharge pipe 6 and the external discharge pipe 11 by opening the pressure / discharge amount adjusting valve 12. It has become.

  A gas supply port 13 (gas supply port) is provided at the other end in the diameter direction of the lid 2b. The gas supply port 13 is connected to a gas supply source 15 (gas supply) via a gas flow rate adjusting valve 14. And a gas supply pipe 18 to which a pressure gauge 16 and an air vent valve 17 are connected. The gas supply pipe 18 is connected to a transparent monitor pipe 19 having valves 19a and 19b above and below.

Thus, by manually opening the gas flow rate adjusting valve 14, a predetermined amount of gas is supplied from the gas supply source 15 through the gas supply pipe 18 into the pressure-resistant vessel 2. It has become. At this time, as described later, the pressure of the gas supplied into the pressure-resistant container 2, the gas flow rate adjusting valve 14 is adjusted so as for example a ^{1kg / cm 2 ~3kg / cm 2} .

  In addition, as gas (gas) used with the liquid purification apparatus 1 of this invention, there exist nitrogen gas, carbon dioxide gas, oxygen gas, ozone gas etc., for example, nitrogen gas raises the saturation dissolved nitrogen concentration of deoxygenated water. Is used to maintain this solution for a long time and suppress oxidation by oxygen. Carbon dioxide gas is used for neutralization of alkaline water and carbon dioxide with a high concentration in an extremely short time. Used when obtaining water. In addition, ozone gas is used as an extremely small ozone generator that generates ozone gas having only the concentration of ozone to be dissolved. Oxygen gas is used for various treatment waters to further increase oxygen dissolution efficiency. .

  Further, the liquid purification apparatus 1 of the present invention has, for example, a water level sensor and a gas amount sensor arranged at two places above and below the transparent monitor pipe 19 but an electromagnetic valve in the gas supply pipe 18 (not shown), When the upper sensor detects a predetermined signal, the solenoid valve is opened to supply gas into the pressure vessel 2 and when the lower sensor detects a predetermined signal, the solenoid valve is closed to supply gas. It can also be configured to automatically supply the gas into the pressure-resistant container 2 such as by stopping.

  Three baffle plates 21 a to 21 c are arranged in a stacked state in the vertical direction at the upper part inside the pressure vessel 2. As shown in FIGS. 3 and 4, the baffle plates 21 a to 21 c are formed in substantially the same circular shape whose outer shape is a shape having a slight gap with the inner surface of the pressure-resistant container 2, and the inner surface of the lid 2 b. It is attached to the lid 2b by welding to a plurality of support rods 22 as attachment members whose upper ends are fixed by welding.

  When the outer peripheral flange 23 of the detachable lid 2b is put on the upper end flange 24 of the container body 2a and fixed with a large number of screws 25 (see FIG. 2), the arrangement positions of the baffle plates 21a to 21c are pressure resistant. It is set to be a height position of ¼ to １ ／ from the upper part of the total height of the container 2. Further, the upper baffle plate 21a is positioned 50 to 150 mm from the upper end flange 24 of the container body 2a, and the distance between the baffle plates 21a to 21c is set to 100 to 300 mm.

  Furthermore, each baffle plate 21a-21c is formed in disk shape as shown in FIG.5 and FIG.6 by the press work of a stainless steel plate, for example. That is, the upper baffle plate 21a, the middle baffle plate 21b, and the lower baffle plate 21c are shown in FIG. 5B (in the figure, the upper baffle plate 21a is shown, but the middle baffle plate 21b and the lower baffle plate 21c are formed in the same manner. As shown in the figure, a dam-like band plate 26 is integrally formed on the outer peripheral edge of the disc so as to stand upward at a predetermined height. A large number of circular drop holes 27 having a predetermined diameter are formed at predetermined positions of the baffle plates 21a to 21c.

  At this time, the drop holes 27 of the respective baffle plates 21a to 21c are formed at equal intervals along the circumferential direction on a plurality of circumferential lines having a predetermined radius from the center, that is, in a row state, and the drop holes 27 of the upper baffle plate 21a. As shown in FIG. 5 (a), the drop holes 27 of the middle baffle plate 21b and the lower baffle plate 21c are formed in three rows as shown in FIGS. 6 (a) and 6 (b). ing. In addition, by setting different intervals between the drop holes 27 in the respective rows that coincide with each other in the vertical direction of the baffle plates 21a to 21c, the fall holes 27 are set so as not to coincide with each other in the vertical direction and enter the through state. A pipe insertion hole 28 through which the discharge pipe 6 is inserted is formed at one end of each baffle plate 21a to 21c in the diameter direction.

  As shown in FIG. 4, the baffle plates 21 a to 21 c configured in this way are provided with fixing holes 22 provided in the upper baffle plate 21 a and the middle baffle plate 21 b with the support rod 22 fixed to the inner surface of the lid 2 b by welding. 20 and the lower end baffle plate 21c is brought into contact with the lower end baffle plate 21c and welded to the lid 2b. Then, the outer peripheral flange 23 of the lid 2b is placed on the upper end flange 24 of the container body 2a, and both the flanges 23, 24 are fixed with screws 25, so that the lid 2b is attached to the container body 2a and sealed. Thus, the three baffle plates 21a to 21c are located at the height position above the container body 2a of the pressure vessel 2.

  Note that the configuration of the three baffle plates 21a to 21c is not limited to the configuration illustrated in FIGS. 5 and 6, and may be configured as illustrated in FIGS. 7 and 8, for example. That is, the band plate 26 is integrally formed on the outer peripheral edges of the baffle plates 21a to 21c, and a large number of drop holes 27 in a row are formed at predetermined positions so that their positions do not coincide with each other in the vertical direction. A predetermined number of shielding plates 29 as protrusions protruding upward by a predetermined height are integrally provided at appropriate positions between the drop holes 27. At this time, the height dimension of the shielding plate 29 is set lower than the height dimension of the band plate 26 and is fixed to the upper surfaces of the baffle plates 21a to 21c by welding or the like.

  According to the baffle plates 21a to 21c, the flow of the treated water in the direction of the drop port 27 is regulated on the baffle plates 21a to 21c by the shielding plate 29, and flows on the baffle plates 21a to 21c over a long time. It will be in a state, and the fall time of the treated water which falls via each baffle plate 21a-21c can be set still longer. In the case of the baffle plates 21a to 21c, the length of the shield plate 29 can be adjusted according to the length and height of the shield plate 29, but the time for the treated water to flow on the baffle plates 21a to 21c can be adjusted. Thus, it is possible to finely adjust the flowing time.

  In the above embodiment, the number of baffle plates 21a to 21c laminated on the upper part of the inside of the pressure vessel 2 is set to three. It is difficult to ensure the optimum degree of dissolution of oxygen gas in the treated water with a stack of layers, and the number of sheets set based on the experimental results indicates that the volume within the container body 2a will be small with four or more layers. It is.

  Next, an example of the operation of the liquid purification apparatus 1 will be described by taking as an example the case where the treatment liquid is the treatment water of the settling basin and the gas is oxygen gas. First, when the liquid purification apparatus 1 is installed at a predetermined position and the pumping pump 8 is operated to open the supply adjustment valve 10, the treated water is drawn up from the settling basin and is supplied from the external supply pipe 7 to the lid 2 b. From the liquid supply port 5 b of the liquid supply pipe 5. When the supply of the treated water is started, the gas flow rate adjustment valve 14 is opened to supply oxygen gas into the pressure vessel 2, and at this time, the pressure in the pressure vessel 2 is checked with the pressure gauge 16 while the pressure in the pressure vessel 2 is as described above. The predetermined value is set.

  Then, as shown in FIG. 9, the treated water discharged from the liquid supply port 5b into the pressure vessel 2 is diffused from the top of the pressure vessel 2 as indicated by the arrow a. It falls on 21c. The treated water dropped on the baffle plates 21a to 21c first falls on the upper baffle plate 21a and falls on the middle baffle plate 21b as indicated by an arrow B from the drop hole 27 of the upper baffle plate 21a. From the drop hole 27 of the baffle plate 21b, it falls onto the lower baffle plate 21c as indicated by an arrow C, and further falls from the drop hole 27 of the lower baffle plate 21c to the lower side of the container body 2a as indicated by an arrow D.

  Since the baffle holes 27 of the baffle plates 21a to 21c are formed at different positions in the vertical direction when the baffle plates 21a to 21c are dropped due to the passage of the drop holes 27, the baffle plates 21a to 21c. The treated water that has dropped down does not fall directly downward, and the baffle plates 26 of the baffle plates 21a to 21c reliably prevent the treated water from falling from the outer periphery of the baffle plate 21a. It will be in the state which falls below from the fall hole 27, after flowing on 21c in a predetermined direction. Thereby, the time for passing through the baffle plates 21a to 21c dropped on the upper baffle plate 21a and dropping is long, that is, the contact time of oxygen gas to the treated water on the baffle plates 21a to 21c. The (pressure action time) becomes longer, and the oxygen gas is well dissolved in the treated water.

  The treated water in which the oxygen gas is dissolved by dropping through the baffle plates 21a to 21c also falls into the container main body 2a as shown by the arrow H from below the lower baffle plate 21c. The pressure of the oxygen gas acts on the surface of the polka dots WS to which the water adheres, and the oxygen gas falls while dissolving in the treated water W (polka dots WS), and this is stored in the lower part of the container body 2a. As shown in FIG. 10, the oxygen dissolved in the treated water W stored in the container body 2 a becomes a bubble K in the treated water W and is in a state where dust S adheres, and the dust S adheres. The bubbles K float in the treated water W as indicated by arrows and float on the surface of the treated water W. For example, during maintenance (cleaning) of the liquid purification apparatus 1, the dust S is removed from the pressure-resistant container 2 by removing the lid 2b from the container main body 2a and scooping up the bubbles K as indicated by arrows.

  That is, the three baffle plates 21a to 21c increase the contact time between the treated water W and the oxygen gas, and the oxygen gas falls down while being well dissolved in the treated water W, and is stored in the lower portion of the container body 2a. Until it reaches the water surface of the treated water W, it continues to come into contact with the oxygen gas and falls while maintaining a state close to the spherical polka dots WS due to its surface tension. At this time, since the inside of the pressure vessel 2 is pressurized and compressed at the predetermined pressure, the concentration of the polka dots WS is increased, and the dissolution efficiency of the oxygen gas into the treated water W is further enhanced.

  Then, by storing the treated water W in the pressure-resistant vessel 2 for a certain amount of time, the oxygen gas can be separated from the treated water W as bubbles K from the state where the oxygen gas and the treated water W are mixed, Only the liquid in which the gas is dissolved in the treated water W, that is, only clean water is discharged from the liquid discharge port 6a. At this time, the supply time and the discharge control of the treated water W and the supply control of the oxygen gas are automatically performed by sensing with a flow meter or a liquid level sensor (not shown), so that the residence time of the treated water W in the pressure vessel 2 is And the amount of staying liquid is kept constant.

In addition, while using the contaminated treated water as the treatment liquid and using oxygen gas as the gas, the pressure vessel 2 has a total height = 1000 mm, an outer diameter φ = 270 mm, and a baffle plate 21a shown in FIGS. When the diameter of the fall hole 27 of ˜21c = 30 mm was used and the state of the discharged water when the pressure in the pressure vessel 2 was changed was confirmed, the pressure in the pressure vessel 2 was 1 kg / cm ^2. A range of ˜3 kg / cm ² has been found to be optimal.

The reason for this is that if the pressure is a low pressure below 1 kg / cm ² , the oxygen gas is not sufficiently dissolved in the treated water, and conversely the pressure is a high pressure exceeding 3 kg / cm ² . It is considered that the difference from the atmospheric pressure becomes too large, so that the treated water becomes almost foamy and a sufficient purification effect cannot be obtained.

  As described above, in the liquid purification apparatus 1 of the above embodiment, the outer diameter shape of the inner surface of the lid body 2b of the pressure resistant container 2 is substantially the same as the inner diameter shape of the container body 2a via the support rod 22. Since the baffle plates 21a to 21c are arranged in a laminated state with a predetermined interval, when the lid body 2b is attached to the container body 2a, the baffle plates 21a to 21c are the upper parts in the pressure vessel 2 It becomes a state that is necessarily located at a predetermined position, and the falling speed of the treated water supplied from the liquid supply port 5a of the lid 2b is slowed by the baffle plates 21a to 21c to increase the contact time with oxygen gas. be able to.

  In particular, the number of the baffle plates 21a to 21c is set to the optimum three or the interval is set to the optimum value, and a number of drops in which the baffle plates 21a to 21c are drilled at different positions in the vertical direction. Since the strips 26 each having the holes 27 and projecting upward at the outer peripheral edge thereof are provided, the dropping speed 27 of the baffle plates 21a to 21c and the strips 26 are used to set the falling speed of the treated water to the optimum speed. It can be. For these reasons, it is possible to effectively purify the treated water such that the oxygen gas having a predetermined pressure supplied into the pressure vessel 2 is effectively dissolved in the treated water, and the treatment time of the treated water is greatly reduced. It becomes possible to carry out efficiently.

  Further, since the lid body 2b in which the baffle plates 21a to 21c are integrated is detachably attached to the container body 2a, the baffle plates 21a to 21c can be removed at the same time by removing the lid body 2b. The baffle plates 21a to 21c can be easily cleaned and the liquid purification device 1 can be easily inspected and maintained, and the arrangement structure of the baffle plates 21a to 21c with respect to the container body 2a is simplified, so that the liquid purification device 1 itself is obtained. Can be easily manufactured.

  In particular, the lid body 2b to which the removable baffle plates 21a to 21c are fixed improves the corrosion resistance of the inner surface of the container body 2a and the inner surface of the lid body 2b in the manufacturing stage of the liquid purification device 1, and improves hygiene. Coating operations such as various resins and paints for improvement can be easily performed. At the same time, at the time of maintenance of the liquid purification apparatus 1, it is possible to easily apply a sterilizing agent or resin, and to maintain the inner surface of the pressure vessel 2 clean for a long period of time. The inspection / maintenance work 1 can be performed more easily. Accordingly, it is possible to reduce the manufacturing cost and the maintenance cost, and it is possible to provide the liquid purification apparatus 1 that is advantageous in terms of cost.

  Further, for example, oxygen gas, nitrogen gas, carbon dioxide gas, ozone gas or the like according to the application can be supplied into the pressure resistant container 2, so that the liquid purification apparatus 1 can be used for various purposes according to the liquid purification apparatus. 1 can be improved, and in particular, the versatility of the liquid purification apparatus 1 can be further enhanced by setting the position and form of the drop holes 27 of the baffle plates 21a to 21c according to the type of the processing liquid. It becomes possible.

  In addition, the fall holes 27 of the baffle plates 21a to 21c in the above-described embodiment are not limited to circular holes having the same diameter, but fall holes having different diameters, oval shapes, rectangular shapes, or the like for the baffle plates 21a to 21c. 27 may be used. Further, the liquid purification such as increasing the diameter of the drop hole 27 of each baffle plate 21a to 21c, for example, in the case of a processing liquid having a high viscosity or a processing liquid with a lot of suspended matters or a large amount of processing liquid supplied. The versatility of the purification device 1 can be further enhanced by appropriately setting the shape such as the hole diameter according to the use of the device 1. Furthermore, the size of the pressure vessel 2 and the form of the piping structure and the like in the above embodiment are examples, and can be appropriately changed without departing from the gist of each invention according to the present invention.

  The present invention is not limited to the configuration in which the treated liquid is supplied into the pressure vessel and the treated clean liquid is discharged to the outside. For example, the present invention is also applied as a pressurized levitation device that floats and removes dust contained in wastewater. it can.

The block diagram which looked at one Embodiment of the liquid purification apparatus concerning this invention from the front side The plan view Front view of the lid Sectional view of the baffle plate attached to the lid (A) is a plan view showing the same baffle plate (b) is a sectional view A plan view showing the middle baffle plate and the lower baffle plate (A) is a plan view showing a modified example of the same baffle plate (b) is a sectional view The top view which shows the modification of the middle baffle plate and the lower baffle plate Operation explanation diagram of the device Other operation explanation diagram

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Liquid purification apparatus, 2 ... Pressure-resistant container, 2a ... Container main body, 2b ... Lid body, 5 ... Liquid supply pipe, 5a ... Liquid supply port, 6 ... Discharge Pipe, 6a ... liquid discharge port, 7 ... external supply pipe, 8 ... pumping pump, 9 ... check valve, 10 ... liquid supply adjustment valve, 11 ... external discharge pipe, DESCRIPTION OF SYMBOLS 12 ... Pressure / discharge amount adjustment valve, 13 ... Gas supply port (gas supply port), 14 ... Gas flow rate adjustment valve, 15 ... Gas supply source (gas supply source), 18 ... Gas supply pipe, 19 ... monitor pipe, 20 ... fixing hole, 21a ... upper baffle plate, 21b ... middle baffle plate, 21c ... lower baffle plate, 26 ... band plate, 27 ... Fall holes, 29, shielding plates, W ... treated water, WS ... polka dots, S ... dust, K ... bubbles.

Claims (3)

A pressure-resistant container having a container body and a lid attached to and detached from the container body, wherein the lid body is provided with a liquid supply port and a gas supply port, and a liquid discharge port is provided at a lower portion of the container body; A gas supply source for supplying gas from the gas supply port of the lid, and a liquid processing apparatus comprising:
Three baffle plates having an outer diameter shape substantially the same as the inner diameter shape of the container main body are disposed in a laminated state on the inner surface side of the lid body of the pressure-resistant container with a predetermined interval through an attachment member, and the lid A liquid purification apparatus, wherein each baffle plate is set to be positioned at a predetermined upper position in a pressure resistant container when the body is attached to the container body.   2. The baffle plate according to claim 1, wherein each baffle plate has a plurality of drop holes formed at different positions in the vertical direction, and a band plate protruding upward is provided on an outer peripheral edge thereof. Liquid purification equipment.   The liquid purifier according to claim 1 or 2, wherein the container main body and the lid are coated on the inner surfaces thereof.

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