JP2007157169A - Flow control system of cooling water supply device in semiconductor manufacturing device - Google Patents

Flow control system of cooling water supply device in semiconductor manufacturing device Download PDF

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JP2007157169A
JP2007157169A JP2007004811A JP2007004811A JP2007157169A JP 2007157169 A JP2007157169 A JP 2007157169A JP 2007004811 A JP2007004811 A JP 2007004811A JP 2007004811 A JP2007004811 A JP 2007004811A JP 2007157169 A JP2007157169 A JP 2007157169A
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flow rate
cooling water
semiconductor manufacturing
branch pipe
manufacturing apparatus
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Yoshio Nakamura
由夫 中村
Takeshi Hasegawa
毅 長谷川
Toshiaki Seki
敏明 関
Mitsue Ogawa
みつ江 小川
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Fujikoshi Machinery Corp
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Fujikoshi Machinery Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a flow control system capable of automatically adjusting flow rate. <P>SOLUTION: This system comprises a branch conduit for supplying cooling water to each semiconductor manufacturing device 51-53; a branch pipe flow control valve; a semiconductor manufacturing device operation part for inputting a setting condition of flow rate of cooling water; a branch pipe flow sensor; a semiconductor manufacturing device instruction processing part including a flow control comparator outputting a signal related to control of the branch pipe flow control valve; an automatic input means 50 automatically inputting a setting condition that is the total sum of supply quantity of cooling water to each semiconductor device; an operation part 32 receiving the setting condition input by the automatic input means 50; a flow control valve 34 provided in a common conduit 16; a flow sensor 26 for detecting the flow rate of cooling water within the common conduit 16; and an instruction processing part 40 including a flow control comparator 36 for comparing a set signal inputted from the operation part 32 with a detection signal by the flow sensor 26 and outputting a signal related to control of the flow control valve 34. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、半導体製造装置における冷却水供給装置の流量制御システムに関し、さらに詳細には、所定の系を構成する複数の半導体製造装置の一部又は全部に選択的に冷却水を循環して供給する半導体製造装置における冷却水供給装置の流量制御システムに関する。   The present invention relates to a flow rate control system for a cooling water supply apparatus in a semiconductor manufacturing apparatus, and more specifically, selectively supplies a circulating water to a part or all of a plurality of semiconductor manufacturing apparatuses constituting a predetermined system. The present invention relates to a flow rate control system for a cooling water supply device in a semiconductor manufacturing apparatus.

通常、冷却水供給装置において、設定流量の冷却水を供給するには、流量計によって冷却水の流量を計測し、作業者がニードル弁を開閉することで調整していた。なお、ニードル弁の開閉自体については、作業者が自らノブ又はハンドルを回して操作する他、サーボモータ等の動力を利用して遠隔操作で開閉できるものがある。   Usually, in a cooling water supply device, in order to supply a predetermined amount of cooling water, the flow rate of the cooling water is measured by a flow meter, and an operator opens and closes the needle valve. As for the opening and closing of the needle valve itself, there are those that can be opened and closed by a remote operation using the power of a servo motor or the like, in addition to the operator turning the knob or the handle.

また、所定の系を構成する複数の半導体製造装置の一部又は全部に選択的に冷却水を供給する半導体製造装置における冷却水供給装置においても、一般的に上記のように各半導体製造装置にかかる流量の調整をしている。この冷却水供給装置には、例えば、半導体装置の製造工場において、所定の系を構成する複数の半導体製造装置の一部又は全部に選択的に冷却水を供給する冷却水供給装置がある。この冷却水供給装置は、一つの冷却水供給源から、複数の半導体製造装置に冷却水を供給するものであり、ライン配管によって、工場内のどこの場所でも容易に一定品質(例えば、20°Cの一定温度)の冷却水を得ることができる。   In addition, in a cooling water supply apparatus in a semiconductor manufacturing apparatus that selectively supplies cooling water to a part or all of a plurality of semiconductor manufacturing apparatuses constituting a predetermined system, each semiconductor manufacturing apparatus is generally configured as described above. The flow rate is adjusted. This cooling water supply device includes, for example, a cooling water supply device that selectively supplies cooling water to some or all of a plurality of semiconductor manufacturing devices constituting a predetermined system in a semiconductor device manufacturing factory. This cooling water supply apparatus supplies cooling water from a single cooling water supply source to a plurality of semiconductor manufacturing apparatuses, and can easily be provided with a constant quality (for example, 20 °) anywhere in the factory by line piping. C constant temperature) cooling water can be obtained.

しかしながら、上記従来の半導体製造装置における冷却水供給装置では、作業者による操作によって流量を調整することになり、手間がかかると共に、変動する冷却水の必要量に逐一対応することが困難であるという課題があった。また、半導体装置の製造工場では、各加工装置の厳しい温度管理条件に対応し、非常に高精度の冷却水にかかる流量管理が要求されてきている。特に所定の系を構成する複数の半導体製造装置の一部又は全部が選択的に稼働され、冷却水の必要量が連続的に変化するような場合、その変動する条件に好適に即応することが必要である。例えば、一度に多くの加工装置が稼働した際には、冷却水の供給圧が低下するため、所定の流量を流すことができず、逆に複数の加工装置のうち一つのみが稼働した際には、冷却水の供給圧が上昇するため、所定の流量以上の冷却水が流れて過度に冷却をすることになる。   However, in the cooling water supply apparatus in the conventional semiconductor manufacturing apparatus, the flow rate is adjusted by an operation by an operator, which is troublesome and difficult to cope with the fluctuating required amount of cooling water. There was a problem. In addition, in a semiconductor device manufacturing factory, it has been required to control the flow rate of cooling water with very high accuracy in response to severe temperature control conditions of each processing apparatus. In particular, when some or all of a plurality of semiconductor manufacturing apparatuses constituting a predetermined system are selectively operated and the required amount of cooling water continuously changes, it is possible to respond promptly to the changing conditions. is necessary. For example, when many processing devices are operated at a time, the supply pressure of the cooling water decreases, so that a predetermined flow rate cannot be flowed. Conversely, when only one of a plurality of processing devices is operated. In this case, since the supply pressure of the cooling water rises, cooling water of a predetermined flow rate or more flows and cools excessively.

そこで、本発明の目的は、変動する冷却水の必要量に好適に対応し、自動的に流量を調整することができる応答性のよい半導体製造装置における冷却水供給装置の流量制御システムを提供することにある。   SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a flow rate control system for a cooling water supply apparatus in a semiconductor manufacturing apparatus with good responsiveness, which can appropriately adjust the flow rate, and can cope with the fluctuating required amount of cooling water. There is.

上記の目的を達成するため、本発明は次の構成を備える。
すなわち、本発明は、所定の系を構成する複数の半導体製造装置の一部又は全部に選択的に冷却水を循環させて供給する半導体製造装置における冷却水供給装置の流量制御システムにおいて、前記複数の半導体製造装置へ冷却水を供給する共通管路と、該共通管路から分岐され、前記各半導体製造装置へ冷却水を供給する分岐管路と、該分岐管路のそれぞれに設けられ、外部からの信号によって開度を自動的に変える分岐管用流量調整弁と、前記各半導体製造装置へ供給する冷却水の流量の設定条件を入力する半導体製造装置用操作部と、前記分岐管用流量調整弁から各半導体製造装置へ供給されている冷却水の流量を検出する分岐管用流量センサと、前記半導体製造装置用操作部から出力される設定信号と前記分岐管用流量センサによる検出信号とを比較し、前記分岐管用流量調整弁の制御にかかる信号を出力する流量調整用の比較器を備えた半導体製造装置用命令処理部と、前記分岐管用流量調整弁により供給される各半導体製造装置への冷却水の供給量の総和となる設定条件を自動的に入力する自動入力手段と、該自動入力手段から前記設定条件が入力される操作部と、前記共通管路に設けられ、外部からの信号によって開度を自動的に変える流量調整弁と、該流量調整弁により供給される共通管路内における冷却水の流量を検出する流量センサと、前記操作部から入力される設定信号と前記流量センサによる検出信号とを比較し、前記流量調整弁の制御にかかる信号を出力する流量調整用の比較器を備えた命令処理部とを具備することを特徴とする。
In order to achieve the above object, the present invention comprises the following arrangement.
That is, the present invention relates to a flow rate control system for a cooling water supply apparatus in a semiconductor manufacturing apparatus that selectively supplies circulating water to a part or all of a plurality of semiconductor manufacturing apparatuses constituting a predetermined system. A common pipe for supplying cooling water to the semiconductor manufacturing apparatus, a branch pipe branched from the common pipe and supplying cooling water to each of the semiconductor manufacturing apparatuses, and provided in each of the branch pipes. A branch pipe flow rate adjusting valve that automatically changes the opening degree in response to a signal from the semiconductor manufacturing apparatus, an operation unit for inputting a flow rate of cooling water supplied to each semiconductor manufacturing apparatus, and the branch pipe flow rate adjusting valve From the branch pipe flow sensor for detecting the flow rate of the cooling water supplied to each semiconductor manufacturing apparatus, the setting signal output from the semiconductor manufacturing apparatus operation unit, and the detection by the branch pipe flow sensor. A command processing unit for a semiconductor manufacturing apparatus provided with a comparator for flow rate adjustment that compares a signal and outputs a signal related to control of the flow rate adjustment valve for the branch pipe, and each semiconductor supplied by the flow rate adjustment valve for the branch pipe An automatic input means for automatically inputting setting conditions that are the total amount of cooling water supplied to the manufacturing apparatus, an operation unit for inputting the setting conditions from the automatic input means, and the common pipe are provided, A flow rate adjusting valve that automatically changes the opening degree according to a signal from the outside, a flow rate sensor that detects the flow rate of cooling water in a common pipe supplied by the flow rate adjusting valve, and a setting signal that is input from the operation unit And a command processing unit including a comparator for flow rate adjustment that outputs a signal related to control of the flow rate adjustment valve.

本発明によれば、半導体製造装置における冷却水供給装置において、流量調整用の比較器によって、操作部から出力される設定信号と流量センサによる検出信号とを比較し、流量調整弁の制御にかかる信号を出力して、冷却水の流量を逐一自動的に調整できる。従って、本発明によれば、変動する冷却水の必要量に好適に対応し、冷却水の流量を応答性よく好適に制御できるという著効を奏する。   According to the present invention, in the cooling water supply apparatus in the semiconductor manufacturing apparatus, the setting signal output from the operation unit is compared with the detection signal from the flow sensor by the flow rate adjustment comparator, and the flow rate adjustment valve is controlled. A signal can be output to automatically adjust the flow rate of the cooling water one by one. Therefore, according to the present invention, it is possible to suitably cope with the fluctuating required amount of cooling water and to effectively control the flow rate of the cooling water with good responsiveness.

以下、本発明の好適な実施の形態を添付図面に基づいて詳細に説明する。
(基本形態)
図1は冷却水供給装置の流量制御システムの基本形態を模式的に示す説明図である。32は操作部であり、供給する冷却水の流量の設定条件を入力することができる。ここで入力された設定条件は、電気的な信号(設定信号)に変換されて、後述する比較器36へ出力される。
DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, preferred embodiments of the invention will be described in detail with reference to the accompanying drawings.
(Basic form)
FIG. 1 is an explanatory view schematically showing a basic form of a flow rate control system of a cooling water supply device. Reference numeral 32 denotes an operation unit, which can input setting conditions for the flow rate of the cooling water to be supplied. The setting conditions input here are converted into electrical signals (setting signals) and output to the comparator 36 described later.

26は流量センサであり、冷却水の管路(共通管路)16中に設けられ、その管路16に供給されて流れる冷却水の流量を計測し、その計測(検出)結果を出力する。その検出信号は、例えば、所定の範囲の電流値等の電気信号として好適に得ることができる。   A flow sensor 26 is provided in the cooling water pipe (common pipe) 16, measures the flow rate of the cooling water supplied to the pipe 16 and flows, and outputs the measurement (detection) result. The detection signal can be suitably obtained as an electric signal such as a current value in a predetermined range, for example.

34はモータバルブであり、外部からの信号によって開度を自動的に変える流量調整弁の一例である。このモータバルブ34は、サーボモータ33の動力によって開閉する機能を備えるもので、例えば、サーボモータ33による回転動力を減速機を介してバルブのハンドルに伝え、自動的に開度を変えることのできる流量調整弁である。なお、冷却水の管路16の開度を制御信号によって自動的に調整する流量調整弁としては、上記のモータバルブ34に限らず、電磁バルブ(比例電磁弁)等の他の手段を用いることも可能である。   Reference numeral 34 denotes a motor valve, which is an example of a flow rate adjusting valve that automatically changes the opening degree according to an external signal. The motor valve 34 has a function of opening and closing by the power of the servo motor 33. For example, the rotational power of the servo motor 33 can be transmitted to the handle of the valve via a speed reducer, and the opening degree can be automatically changed. This is a flow control valve. The flow rate adjusting valve that automatically adjusts the opening degree of the cooling water pipe 16 using a control signal is not limited to the motor valve 34 described above, and other means such as an electromagnetic valve (proportional electromagnetic valve) may be used. Is also possible.

40は命令処理部であり、操作部32から出力される設定信号と流量センサ26による検出信号とを比較し、モータバルブ34の制御にかかる信号を出力する流量調整用の比較器36を備え、モータバルブ34の開度を調整する。   Reference numeral 40 denotes a command processing unit, which includes a flow rate adjustment comparator 36 that compares a setting signal output from the operation unit 32 with a detection signal from the flow sensor 26 and outputs a signal related to control of the motor valve 34. The opening degree of the motor valve 34 is adjusted.

このように命令処理部40によってモータバルブ34を制御することで、流量計(流量センサ26)から出力された電気的な信号に基づいて好適にフィードバック制御が行なわれる。供給される冷却水の圧力が上昇して流量が所定の設定値よりも増加した場合はモータバルブ34の開度を下げ、供給される冷却水の圧力が低減して流量が所定の設定値よりも低下した場合はモータバルブ34の開度を上げて、所定の流量が持続的に流れるように制御する。これにより、冷却水の供給源の圧力が変動した場合でも、所定の流量を好適に供給できる。すなわち、完全自動の遠隔操作が可能であり、応答性のよい流量制御が可能になる。   By controlling the motor valve 34 by the command processing unit 40 in this way, feedback control is suitably performed based on the electrical signal output from the flow meter (flow sensor 26). When the pressure of the supplied cooling water rises and the flow rate increases from a predetermined set value, the opening degree of the motor valve 34 is lowered, the pressure of the supplied cooling water decreases and the flow rate becomes higher than the predetermined set value. If it also decreases, the opening degree of the motor valve 34 is increased and control is performed so that a predetermined flow rate flows continuously. Thereby, even when the pressure of the cooling water supply source fluctuates, a predetermined flow rate can be suitably supplied. That is, fully automatic remote control is possible, and responsive flow rate control is possible.

(実施例)
また、図2は半導体装置の製造工場における冷却水供給装置の流量制御システム(実施例)を模式的に示す説明図である。この実施例の流量制御システムは、所定の系を構成する複数の半導体製造装置の一部又は全部に選択的に冷却水を供給する冷却水供給装置にかかる一実施例であり、その冷却水供給装置が、冷却水を循環させて半導体装置の製造装置を冷却するように供給する循環型の冷却水供給装置になっている。
(Example)
FIG. 2 is an explanatory view schematically showing a flow rate control system (Example) of a cooling water supply device in a semiconductor device manufacturing factory. The flow rate control system of this embodiment is an embodiment relating to a cooling water supply apparatus that selectively supplies cooling water to a part or all of a plurality of semiconductor manufacturing apparatuses constituting a predetermined system. The apparatus is a circulation type cooling water supply apparatus that supplies cooling water to circulate and cool the semiconductor device manufacturing apparatus.

32は操作部であり、所定の系へ供給する冷却水の総流量の設定条件を入力できる。26は流量センサであり、所定の系へ供給されている冷却水の総流量を検出する。34はモータバルブであり、外部からの信号によって開度を自動的に変える流量調整弁の一例である。また、40は命令処理部であり、操作部32から出力される設定信号と流量センサ26による検出信号とを比較し、モータバルブ34の制御にかかる信号を出力する流量調整用の比較器36を備えている。   Reference numeral 32 denotes an operation unit which can input setting conditions for the total flow rate of cooling water supplied to a predetermined system. A flow sensor 26 detects a total flow rate of the cooling water supplied to a predetermined system. Reference numeral 34 denotes a motor valve, which is an example of a flow rate adjusting valve that automatically changes the opening degree according to an external signal. Reference numeral 40 denotes a command processing unit, which compares a setting signal output from the operation unit 32 with a detection signal from the flow sensor 26 and outputs a flow rate adjusting comparator 36 that outputs a signal related to control of the motor valve 34. I have.

また、50は自動入力手段であり、操作部32へ設定条件を自動的に入力する。本実施例では、所定の系を構成する複数の半導体装置の製造装置51、52、53の一部又は全部に冷却水を供給するか否かについて、各製造装置に対応する開閉バルブ51a、52a、53aの開閉状態について検出し、操作部32へ設定条件を自動的に入力する。この自動入力手段50によって所定の系を構成する複数の半導体製造装置51、52、53へ供給する冷却水の総流量を、自動的に応答性よく好適に管理できる。   Reference numeral 50 denotes an automatic input unit that automatically inputs setting conditions to the operation unit 32. In this embodiment, whether or not the cooling water is supplied to some or all of the plurality of semiconductor device manufacturing apparatuses 51, 52, and 53 constituting a predetermined system is determined according to the on-off valves 51a and 52a corresponding to the respective manufacturing apparatuses. , 53a is detected, and the setting condition is automatically input to the operation unit 32. With this automatic input means 50, the total flow rate of the cooling water supplied to the plurality of semiconductor manufacturing apparatuses 51, 52, 53 constituting the predetermined system can be automatically and suitably managed with good responsiveness.

また、本実施例の管路16は、ポンプ(図示せず)に連なり、複数の半導体装置の製造装置51、52、53を流れ出た冷却水を回収して循環させるよう、循環流路に形成されている。 さらに、冷却水は、温度調整手段(図示せず)によって、温度が一定に保たれている。温度調整手段は、公知の冷却装置及び/又は加熱装置から構成できる。冷却水は循環されるため、熱効率よく用いることができる。このように、実施例の半導体装置の製造工場における冷却水を供給する系では、循環系であり、ポンプの容量は限定的なものであるため、水道水のような供給圧の安定した水源の場合と異なり、供給水源の圧力変動が大きい。これに対して、本発明の流量制御システムによれば、供給水源の圧力の変動にかかわらず、所定の流量を流すことができ、その問題を好適に解消することができるのである。   Further, the pipe line 16 of this embodiment is connected to a pump (not shown), and is formed in a circulation flow path so as to collect and circulate the cooling water flowing out from the plurality of semiconductor device manufacturing apparatuses 51, 52, 53. Has been. Further, the temperature of the cooling water is kept constant by temperature adjusting means (not shown). The temperature adjusting means can be composed of a known cooling device and / or heating device. Since the cooling water is circulated, it can be used efficiently. Thus, in the system for supplying cooling water in the semiconductor device manufacturing factory of the embodiment, since it is a circulation system and the capacity of the pump is limited, a water source with a stable supply pressure such as tap water is used. Unlike the case, the pressure fluctuation of the supply water source is large. On the other hand, according to the flow rate control system of the present invention, it is possible to flow a predetermined flow rate regardless of fluctuations in the pressure of the supply water source, and the problem can be solved preferably.

また、30は流量制御手段であり、冷却水の流量の設定条件を入力する操作部32と、モータ33の動力によって開閉するモータバルブ34と、操作部32へ設定条件を自動的に入力する自動入力手段50と、操作部32による設定信号と流量センサ26による検出信号とを比較して流量パラメータにかかる信号(モータバルブ34の制御にかかる信号)を出力する流量調整用の比較器36とを具備する。   Reference numeral 30 denotes a flow rate control means, which includes an operation unit 32 for inputting setting conditions for the flow rate of the cooling water, a motor valve 34 that opens and closes by the power of the motor 33, and an automatic operation for automatically inputting setting conditions to the operation unit 32 An input unit 50 and a flow rate adjustment comparator 36 that compares a setting signal from the operation unit 32 with a detection signal from the flow rate sensor 26 and outputs a signal relating to a flow rate parameter (a signal relating to control of the motor valve 34). It has.

また、流量調整用の比較器36を含む構成によってフィードバック制御系である命令処理部40が構成されている。流量センサ26及び自動入力手段50からの検出又は入力信号は、例えば、適宜所定の範囲の電流値に変換され、演算装置等(図示せず)によって処理されることにより、モータバルブ34を制御する所定の範囲の電流値の制御信号として出力される。上記の命令処理部40は、公知の回路によって構成でき、シーケンス制御を行う。なお、流量制御手段30は、単なるシーケンス制御の他に、プログラムによって作動する命令処理部40によって、経験的に設定される条件付けで制御してもよいのは勿論である。その条件付けには、例えば、流量と温度差の積によって算出される熱容量の値、或いは経時的な要素等があり、これらの要素に基づいて演算処理を行い制御することでより正確な温度管理が可能となる。すなわち、いわゆるPID制御(比例、積分、微分の動作の組み合わせが可能)、ファジー制御等を行うように構成してもよい。   In addition, a command processing unit 40 that is a feedback control system is configured by the configuration including the comparator 36 for flow rate adjustment. The detection or input signal from the flow sensor 26 and the automatic input means 50 is, for example, appropriately converted into a current value within a predetermined range and processed by an arithmetic device or the like (not shown) to control the motor valve 34. It is output as a control signal having a current value in a predetermined range. The instruction processing unit 40 can be configured by a known circuit and performs sequence control. In addition to the simple sequence control, the flow rate control means 30 may of course be controlled with the condition set empirically by the command processing unit 40 operated by a program. The conditioning includes, for example, the value of heat capacity calculated by the product of the flow rate and the temperature difference, or factors over time, and more accurate temperature management can be performed by performing arithmetic processing based on these factors and controlling them. It becomes possible. In other words, so-called PID control (proportional, integral, and differential operations can be combined), fuzzy control, and the like may be performed.

本実施例によれば、流量センサ26によって流量パラメータについて連続的にモニタしており、その検出データに基づいて、前述したように冷却水の流量制御を行っている。これにより、タイムリー且つ応答性よく半導体装置の製造装置の温度制御ができ、例えば、その温度を一定に維持して均一な条件で半導体装置を加工・製造できる。すなわち、各半導体装置の製造装置の温度管理を高精度に行うことができ、ひいては半導体装置を製造する際の加工精度を向上させることができる。   According to the present embodiment, the flow rate parameter is continuously monitored by the flow rate sensor 26, and the flow rate control of the cooling water is performed based on the detection data as described above. Accordingly, the temperature of the semiconductor device manufacturing apparatus can be controlled in a timely and responsive manner. For example, the semiconductor device can be processed and manufactured under uniform conditions while maintaining the temperature constant. That is, the temperature control of the manufacturing apparatus of each semiconductor device can be performed with high accuracy, and as a result, the processing accuracy when manufacturing the semiconductor device can be improved.

本発明にかかる半導体製造装置における冷却水供給装置の流量制御システムは、基本形態と実施例にかかる流量制御システムを併用してもよいのは勿論である。例えば、実施例の開閉バルブ51a、52a、53aの各開閉の制御について、基本形態にかかる冷却水供給装置の流量制御システムを用いることができるのは勿論である。以上、本発明の好適な実施例について種々述べてきたが、本発明はこの実施例に限定されるものではなく、発明の精神を逸脱しない範囲内でさらに多くの改変を施し得るのは勿論のことである。
本発明によれば、半導体製造装置における冷却水供給装置において、流量調整用の比較器によって、操作部から出力される設定信号と流量センサによる検出信号とを比較し、流量調整弁の制御にかかる信号を出力して、冷却水の流量を逐一自動的に調整できる。従って、本発明によれば、変動する冷却水の必要量に好適に対応し、冷却水の流量を応答性よく好適に制御できるという著効を奏する。
It goes without saying that the flow rate control system of the cooling water supply device in the semiconductor manufacturing apparatus according to the present invention may use both the basic mode and the flow rate control system according to the embodiment. For example, it is needless to say that the flow rate control system of the cooling water supply device according to the basic mode can be used for the control of each opening / closing of the opening / closing valves 51a, 52a, 53a of the embodiment. The preferred embodiments of the present invention have been described above in various ways. However, the present invention is not limited to these embodiments, and it goes without saying that more modifications can be made without departing from the spirit of the invention. That is.
According to the present invention, in the cooling water supply apparatus in the semiconductor manufacturing apparatus, the setting signal output from the operation unit is compared with the detection signal from the flow sensor by the flow rate adjustment comparator, and the flow rate adjustment valve is controlled. A signal can be output to automatically adjust the flow rate of the cooling water one by one. Therefore, according to the present invention, it is possible to suitably cope with the fluctuating required amount of cooling water and to effectively control the flow rate of the cooling water with good responsiveness.

冷却水供給装置の流量制御システムの基本形態を説明する説明図である。It is explanatory drawing explaining the basic form of the flow control system of a cooling water supply apparatus. 本発明にかかる半導体製造装置における冷却水供給装置の流量制御システムの実施例を説明する説明図である。It is explanatory drawing explaining the Example of the flow control system of the cooling water supply apparatus in the semiconductor manufacturing apparatus concerning this invention.

符号の説明Explanation of symbols

16 管路
26 流量センサ
30 流量制御手段
32 操作部
34 モータバルブ
36 流量調整用の比較器
40 命令処理部
50 自動入力手段
16 Pipe line 26 Flow rate sensor 30 Flow rate control means 32 Operation part 34 Motor valve 36 Comparator for flow rate adjustment 40 Command processing part 50 Automatic input means

Claims (1)

所定の系を構成する複数の半導体製造装置の一部又は全部に選択的に冷却水を循環させて供給する半導体製造装置における冷却水供給装置の流量制御システムにおいて、
前記複数の半導体製造装置へ冷却水を供給する共通管路と、
該共通管路から分岐され、前記各半導体製造装置へ冷却水を供給する分岐管路と、
該分岐管路のそれぞれに設けられ、外部からの信号によって開度を自動的に変える分岐管用流量調整弁と、
前記各半導体製造装置へ供給する冷却水の流量の設定条件を入力する半導体製造装置用操作部と、
前記分岐管用流量調整弁から各半導体製造装置へ供給されている冷却水の流量を検出する分岐管用流量センサと、
前記半導体製造装置用操作部から出力される設定信号と前記分岐管用流量センサによる検出信号とを比較し、前記分岐管用流量調整弁の制御にかかる信号を出力する流量調整用の比較器を備えた半導体製造装置用命令処理部と、
前記分岐管用流量調整弁により供給される各半導体製造装置への冷却水の供給量の総和となる設定条件を自動的に入力する自動入力手段と、
該自動入力手段から前記設定条件が入力される操作部と、
前記共通管路に設けられ、外部からの信号によって開度を自動的に変える流量調整弁と、
該流量調整弁により供給される共通管路内における冷却水の流量を検出する流量センサと、
前記操作部から入力される設定信号と前記流量センサによる検出信号とを比較し、前記流量調整弁の制御にかかる信号を出力する流量調整用の比較器を備えた命令処理部とを具備することを特徴とする半導体製造装置における冷却水供給装置の流量制御システム。
In a flow rate control system for a cooling water supply apparatus in a semiconductor manufacturing apparatus that selectively supplies circulating water to a part or all of a plurality of semiconductor manufacturing apparatuses constituting a predetermined system,
A common pipe for supplying cooling water to the plurality of semiconductor manufacturing apparatuses;
A branch pipe branched from the common pipe and supplying cooling water to each semiconductor manufacturing apparatus;
A branch pipe flow rate adjusting valve that is provided in each of the branch pipes and automatically changes the opening degree according to an external signal;
A semiconductor manufacturing apparatus operation unit for inputting a setting condition of a flow rate of cooling water supplied to each of the semiconductor manufacturing apparatuses;
A branch pipe flow sensor for detecting the flow rate of cooling water supplied from the branch pipe flow control valve to each semiconductor manufacturing apparatus;
Comparing a setting signal output from the semiconductor manufacturing apparatus operation unit with a detection signal from the branch pipe flow sensor, and a flow rate adjustment comparator for outputting a signal related to the control of the branch pipe flow control valve. An instruction processing unit for semiconductor manufacturing equipment;
Automatic input means for automatically inputting setting conditions that are the sum of the amount of cooling water supplied to each semiconductor manufacturing apparatus supplied by the branch pipe flow control valve;
An operation unit for inputting the setting condition from the automatic input means;
A flow rate adjusting valve that is provided in the common pipe and automatically changes the opening according to an external signal;
A flow rate sensor for detecting a flow rate of cooling water in the common pipe supplied by the flow rate regulating valve;
A command processing unit including a flow rate adjustment comparator that compares a setting signal input from the operation unit with a detection signal from the flow rate sensor and outputs a signal related to control of the flow rate adjustment valve; A flow rate control system for a cooling water supply device in a semiconductor manufacturing apparatus.
JP2007004811A 2007-01-12 2007-01-12 Flow control system of cooling water supply device in semiconductor manufacturing device Pending JP2007157169A (en)

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WO2013005285A1 (en) * 2011-07-04 2013-01-10 富士通株式会社 Method for controlling adsorption heat pump, information processing system, and control device
JP2018508863A (en) * 2015-02-27 2018-03-29 ユ−ジーン テクノロジー カンパニー.リミテッド Gas multiple supply method and gas multiple supply apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013005285A1 (en) * 2011-07-04 2013-01-10 富士通株式会社 Method for controlling adsorption heat pump, information processing system, and control device
CN103649652A (en) * 2011-07-04 2014-03-19 富士通株式会社 Method for controlling adsorption heat pump, information processing system, and control device
JPWO2013005285A1 (en) * 2011-07-04 2015-02-23 富士通株式会社 Adsorption heat pump control method, information processing system, and control device
US9408333B2 (en) 2011-07-04 2016-08-02 Fujitsu Limited Method of controlling adsorption heat pump, information processing system, and control device
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