JP2007152703A - Method for producing lens substrate, lens substrate, transmission type screen, and rear type projector - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a lens substrate which can display an excellent image excellent in contrast with the occurrence of luminescent spots suppressed, a method which can efficiently produce the lens substrate, a transmission type screen equipped with the lens substrate, and a rear type projector. <P>SOLUTION: The method for producing the lens substrate includes a process for applying a composition having fluidity on a surface in which the recess 61 of a recess-attached member 6 is formed, a solidification process in which the composition is solidified to obtain a substrate body, a process for specifying a defective place 61' where a convex lens is not formed in a desired shape by examining the substrate body, a process in which liquid droplets mainly composed of a material constituting the substrate body are discharged to the defective place 61', and the defective place is corrected by the liquid droplets to obtain a corrected substrate body, and a process for forming a shading part having an opening 81 on a surface opposite to a surface where the convex lens of the substrate body is set. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a lens substrate manufacturing method, a lens substrate, a transmissive screen, and a rear projector.

In recent years, the demand for rear projectors is increasing as a display suitable for home theater monitors, large-screen televisions, and the like.
A lens substrate having a lenticular lens (lens portion) is generally used for a transmissive screen used in a rear projector. In such a lens substrate (lens sheet), a light-shielding layer is provided on the side opposite to the side where the lens portion is provided for the purpose of improving the contrast of the image.

  In the manufacture of such a lens substrate (lens sheet), generally, a light-shielding layer having an opening (light-transmitting portion) is formed by using light condensing in the lens portion (for example, Patent Document 1). By forming the light-shielding layer by such a method, an opening (light-transmitting portion) can be formed at a portion corresponding to the focal point of the lens portion, which is advantageous in improving contrast. .

  By the way, when manufacturing such a lens substrate, generally, a mold having a concave portion corresponding to the lens portion is used. However, a lens to be formed is formed on the formed lens substrate due to a defect in the mold or the like. There is a case where there is a region that is not formed, or a lens that is smaller than other lenses is formed. When such a lens portion defect exists, when the light shielding layer forming method as described above is applied, a portion of the light shielding layer corresponding to a portion where the lens portion is not provided (flat portion), An opening is formed. When such an opening is formed, light that is not refracted by the lens portion in a transmission screen or the like is emitted to the observer side as straight light. Such straight light is recognized as a bright spot (white spot) on the screen and has a significant adverse effect on the displayed image.

By using a mold that does not have a defect in the concave portion corresponding to the lens portion, the above problems can be prevented and suppressed. However, it is possible to produce a mold without such a defect. ,Have difficulty.
On the other hand, with the recent increase in the size of displays and screens, a large lens substrate is required. In the mold used for manufacturing such a large lens substrate, the occurrence of the above-described defects is prevented. It was extremely difficult. In addition, when trying to manufacture a mold for manufacturing a large lens substrate without the above-mentioned defects, the yield is very bad, which greatly affects the productivity and manufacturing cost of the lens substrate. End up.

JP 2004-361875 A

  An object of the present invention is to provide a lens substrate that can display an excellent image with excellent contrast and suppressed generation of bright spots, and a manufacturing method that can efficiently manufacture the lens substrate. It is another object of the present invention to provide a transmissive screen and a rear projector provided with the lens substrate.

Such an object is achieved by the present invention described below.
The method for producing a lens substrate according to the present invention is a method for producing a lens substrate having a substrate body having a large number of convex lenses and a light-shielding film made of a light-shielding material and having an opening.
Preparing a member with a recess having a recess corresponding to the convex lens;
A composition applying step for applying a composition having fluidity to the surface of the recessed portion of the member provided with the recess;
Solidifying the composition to obtain a substrate body;
Inspecting the surface of the substrate body where the convex lens is provided, and inspecting the substrate body inspecting step where the convex lens is not formed in a desired shape; and
A correction step of discharging a droplet mainly composed of a material constituting the substrate main body with respect to the defective portion, correcting the defective portion with the droplet, and obtaining a correction substrate main body,
A light-shielding film-forming material application step for providing a light-shielding film-forming material for forming the light-shielding film on the surface of the correction substrate body opposite to the surface on which the convex lens is provided;
And an opening forming step of forming the light shielding portion having the opening by performing a process of irradiating the light shielding film forming material with light through the correction substrate body.
Accordingly, it is possible to provide a manufacturing method that can efficiently manufacture a lens substrate that can display an excellent image with excellent contrast and suppressed generation of bright spots.

In the lens substrate manufacturing method of the present invention, in the substrate body inspection step, an image of the surface of the substrate body on the side where the convex lens is provided is taken, and the image is processed to obtain a desired shape of the convex lens. It is preferable to identify a defective portion that is not formed on the surface.
Thereby, it is possible to detect and identify a defective portion more efficiently.
In the lens substrate manufacturing method of the present invention, it is preferable to identify a defective portion where the convex lens is not formed in a desired shape by detecting a convex lens having a predetermined height or less in the substrate body inspection step.
Thereby, it is possible to detect and identify a defective portion more efficiently.

The method for producing a lens substrate according to the present invention is a method for producing a lens substrate having a substrate body having a large number of convex lenses and a light-shielding film made of a light-shielding material and having an opening.
Preparing a member with a recess having a recess corresponding to the convex lens;
Inspecting the surface of the member with the concave portion on the side where the concave portion is provided, and identifying the defective portion where the concave portion is not formed in a desired shape,
A composition applying step for applying a composition having fluidity to the surface of the recessed portion of the member provided with the recess;
Solidifying the composition to obtain a substrate body;
A droplet composed mainly of a material constituting the substrate main body is discharged to a defective lens portion of the substrate main body corresponding to the defective portion specified in the member inspection process with a concave portion, and the defect is caused by the liquid droplet. A correction step of correcting the location and obtaining a correction substrate body;
A light-shielding film-forming material application step for providing a light-shielding film-forming material for forming the light-shielding film on the surface of the correction substrate body opposite to the surface on which the convex lens is provided;
And an opening forming step of forming the light shielding portion having the opening by performing a process of irradiating the light shielding film forming material with light through the correction substrate body.
Accordingly, it is possible to provide a manufacturing method that can efficiently manufacture a lens substrate that can display an excellent image with excellent contrast and suppressed generation of bright spots.

In the method for manufacturing a lens substrate according to the present invention, in the member inspection process with a recess, an image of the surface of the member with the recess provided on the side where the recess is provided is taken, and the image is processed to obtain a recess It is preferable to identify a defective portion that is not formed in the shape.
Thereby, it is possible to detect and identify a defective portion more efficiently.
In the lens substrate manufacturing method of the present invention, it is preferable to identify a defective portion where the recess is not formed in a desired shape by detecting a recess having a predetermined depth or less in the member inspection process with a recess.
Thereby, it is possible to detect and identify a defective portion more efficiently.
In the lens substrate manufacturing method of the present invention, it is preferable that the droplets are ejected by an inkjet method in the correction step.
Thus, a desired amount of droplets can be selectively and easily discharged onto a defective portion easily and reliably.

In the method for manufacturing a lens substrate according to the present invention, a microlens substrate provided with a microlens as the convex lens is preferable.
Thereby, the viewing angle characteristic in each direction (for example, the vertical direction and the horizontal direction) can be made particularly excellent. Further, in the manufacture of the microlens substrate, it is easy to cause a defect of the lens portion, and thereby, a bright spot or the like due to straight light is particularly likely to occur in the displayed image. Also, the occurrence of bright spots can be sufficiently prevented. Therefore, by applying the present invention to the manufacture of the microlens substrate, the effect is more remarkably exhibited.

The lens substrate of the present invention is manufactured using the method of the present invention.
Accordingly, it is possible to provide a lens substrate that can display an excellent image with excellent contrast and suppressed generation of bright spots.
The transmission screen of the present invention is characterized by including the lens substrate of the present invention.
As a result, it is possible to provide a transmissive screen capable of displaying an excellent image with excellent contrast and suppressed generation of bright spots.

The transmissive screen of the present invention, a Fresnel lens portion in which a Fresnel lens is formed on the light emission side,
And a lens substrate of the present invention disposed on the light emission side of the Fresnel lens portion.
As a result, it is possible to provide a transmissive screen capable of displaying an excellent image with excellent contrast and suppressed generation of bright spots.
A rear projector according to the present invention includes the transmission screen according to the present invention.
Accordingly, it is possible to provide a rear projector that can display an excellent image with excellent contrast and suppressed generation of bright spots.

Hereinafter, a lens substrate manufacturing method, a lens substrate, a transmissive screen, and a rear projector according to the present invention will be described in detail based on preferred embodiments shown in the accompanying drawings.
In the present invention, the “substrate” refers to a concept that is substantially inflexible and includes a relatively large thickness, a sheet-like material, a film-like material, and the like. .
The use of the lens substrate of the present invention is not particularly limited, but in the following description, the lens substrate will be described as being mainly used as a member constituting a transmissive screen and a rear projector.

<Lens substrate and transmissive screen>
First, prior to the description of the manufacturing method of the lens substrate of the present invention, the configurations of the lens substrate (convex lens substrate) and the transmissive screen of the present invention will be described.
1 is a schematic longitudinal sectional view showing a preferred embodiment of a lens substrate (microlens substrate) of the present invention, FIG. 2 is a plan view of the lens substrate (microlens substrate) shown in FIG. 1, and FIG. FIG. 2 is a schematic longitudinal sectional view showing a preferred embodiment of the transmission screen of the present invention including the lens substrate (microlens substrate) shown in FIG. 1. In the following description, the left side in FIGS. 1 and 3 is referred to as “(light) incident side”, and the right side is referred to as “(light) emission side”. In the present invention, unless otherwise specified, the “(light) incident side” and the “(light) output side” are the “incident side” of light for obtaining image light (video light), respectively. ”And“ outgoing side ”, not“ incident side ”or“ outgoing side ”of external light or the like.

A microlens substrate (lens substrate) 1 is a member constituting a transmissive screen 10 to be described later, and includes a plurality of microlenses (convex lenses) 21 arranged in a predetermined pattern as shown in FIG. A main body (correction substrate main body) 2 and a black matrix (light-shielding film) 3 made of a light-shielding material are provided.
The substrate body 2 is usually made of a transparent material.
The constituent material of the substrate body 2 is not particularly limited, but is mainly composed of a resin material and is composed of a transparent material having a predetermined refractive index.

  Examples of the resin material constituting the substrate body 2 include polyolefins such as polyethylene, polypropylene, ethylene-propylene copolymer, ethylene-vinyl acetate copolymer (EVA), cyclic polyolefin, modified polyolefin, polyvinyl chloride, and polychlorinated. Vinylidene, polystyrene, polyamide (eg, nylon 6, nylon 46, nylon 66, nylon 610, nylon 612, nylon 11, nylon 12, nylon 6-12, nylon 6-66), polyimide, polyamideimide, polycarbonate (PC), Poly- (4-methylpentene-1), ionomer, acrylic resin, acrylonitrile-butadiene-styrene copolymer (ABS resin), acrylonitrile-styrene copolymer (AS resin), butadiene-styrene copolymer Polyoxymethylene, polyvinyl alcohol (PVA), ethylene-vinyl alcohol copolymer (EVOH), polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polyester such as polycyclohexane terephthalate (PCT), polyether, polyether ketone (PEK), polyether ether ketone (PEEK), polyether imide, polyacetal (POM), polyphenylene oxide, modified polyphenylene oxide, polysulfone, polyether sulfone, polyphenylene sulfide, polyarylate, aromatic polyester (liquid crystal polymer), poly Tetrafluoroethylene, polyvinylidene fluoride, other fluororesins, styrene, polyolefin, polyvinyl chloride, polyurea Various polyesters, polyesters, polyamides, polybutadienes, transpolyisoprenes, fluororubbers, chlorinated polyethylenes, and other thermoplastic elastomers, epoxy resins, phenol resins, urea resins, melamine resins, unsaturated polyesters, silicones Resins, urethane-based resins, etc., or copolymers, blends, polymer alloys, etc. mainly composed of these, and combinations of one or more of these (for example, blend resins, polymer alloys, laminates) As body etc.).

The constituent material (solidified material) of the substrate body 2 generally has an absolute refractive index greater than various gases (the atmosphere in which the microlens substrate 1 is used), but the specific value of the absolute refractive index is 1.4 to 1.58 is preferable, and 1.5 to 1.56 is more preferable. When the absolute refractive index of the constituent material of the substrate body 2 is a value within the above range, the viewing angle characteristic can be made particularly excellent while making the utilization efficiency of light (incident light) particularly excellent.
The microlens substrate 1 includes a plurality of microlenses 21 as convex lenses having a convex surface on the light incident surface side.

  In the present embodiment, the microlens (convex lens) 21 has a flat shape (substantially oval or substantially elliptical) in which the vertical width (vertical width) when the microlens substrate 1 is viewed in plan is smaller than the horizontal width (horizontal width). It has a bowl shape. When the microlens 21 has such a shape, it is possible to make the viewing angle characteristics particularly excellent while effectively preventing the occurrence of inconvenience such as moire. In particular, both the horizontal and vertical viewing angle characteristics can be improved.

When the length in the minor axis direction (longitudinal direction) of the microlens 21 in plan view is L ₁ [μm] and the length in the major axis direction (lateral direction) is L ₂ [μm], 0.50 ≦ It is preferable to satisfy the relationship of L ₁ / L ₂ ≦ 0.99, more preferably satisfy the relationship of 0.60 ≦ L ₁ / L ₂ ≦ 0.90, and 0.65 ≦ L ₁ / L ₂ More preferably, the relationship of ≦ 0.80 is satisfied. By satisfying the relationship as described above, the effects as described above become more remarkable.

  The length of the microlens 21 in the short axis direction (vertical width of the microlens 21) in plan view is preferably 10 to 200 μm, more preferably 30 to 150 μm, and 50 to 100 μm. Is more preferable. When the length of the microlens 21 in the short axis direction is a value within the above range, it is possible to obtain sufficient resolution in the image projected on the screen while effectively preventing the occurrence of inconvenience such as moire. The productivity of the microlens substrate 1 (transmission type screen 10) can be further increased.

  Further, the length of the microlens 21 in the major axis direction (horizontal width of the microlens 21) in plan view is preferably 15 to 250 μm, more preferably 45 to 200 μm, and 70 to 150 μm. Is more preferable. When the length of the microlens 21 in the short axis direction is a value within the above range, it is possible to obtain sufficient resolution in the image projected on the screen while effectively preventing the occurrence of inconvenience such as moire. The productivity of the microlens substrate 1 (transmission type screen 10) can be further increased.

  Further, the radius of curvature of the microlens 21 is preferably 7.5 to 125 μm, more preferably 15 to 90 μm, and further preferably 30 to 60 μm. When the radius of curvature of the microlens 21 is a value within the above range, the viewing angle characteristics can be made particularly excellent. In particular, both the horizontal and vertical viewing angle characteristics can be improved. The microlens 21 may have a different radius of curvature in the minor axis direction and a radius of curvature in the major axis direction. In such a case, the radius of curvature in the major axis direction is a value within the above range. Is preferred.

The height of the microlens 21 is preferably 7.5 to 125 μm, more preferably 15 to 90 μm, and still more preferably 30 to 60 μm. When the height of the microlens 21 is within the above range, the light utilization efficiency and viewing angle characteristics can be made particularly excellent.
The microlens (convex lens) 21 has a spherical surface, and the distance (pitch) between the apexes of adjacent microlenses 21 is smaller than the value obtained by multiplying the curvature radius of the microlens 21 by 2. Is preferred. Thereby, in the manufacturing method of the microlens board | substrate (lens board | substrate) 1 which is mentioned later, the lens surface side light-shielding part 4 can be selectively formed by the target site | part, and the displayed image is more suitable. It can be. Further, the light utilization efficiency of the microlens substrate 1 can be made particularly excellent.

  The plurality of microlenses 21 are arranged in a staggered pattern (in a staggered pattern). By arranging the microlenses 21 in this way, it is possible to effectively prevent inconveniences such as moire. On the other hand, for example, if the microlenses are arranged in a square lattice shape or the like, it may be difficult to sufficiently prevent the occurrence of inconvenience such as moire depending on the size of the microlenses 21 and the like. . Further, when the microlenses are randomly arranged, depending on the size of the microlens 21 or the like, it becomes difficult to sufficiently increase the occupation ratio of the microlenses in the effective region where the microlenses are formed. It is difficult to sufficiently increase the transmittance (light utilization efficiency), and the obtained image may be dark.

  As described above, in the present embodiment, the microlenses 21 are arranged in a staggered pattern when the microlens substrate 1 is viewed in plan view. However, the first row includes a plurality of microlenses 21. 25 and the second row 26 adjacent thereto are preferably shifted by a half pitch in the vertical direction (the minor axis direction of the microlens 21). As a result, it is possible to more effectively prevent the occurrence of moire due to light interference and to make the viewing angle characteristics particularly excellent.

The arrangement method of the microlenses 21 is not limited to the one described above. For example, even if the arrangement is a square lattice, the arrangement is optically random (from the main surface side of the microlens substrate 1 in plan view). In this case, the microlenses 21 may be arranged in a random positional relationship with each other.
Further, when the microlens substrate 1 is viewed in plan from the light incident surface side (direction shown in FIG. 2), the occupation ratio of the microlens 21 is 95 to 115 in the effective region where the microlens 21 is formed. % Is preferred. When the occupation ratio of the microlens 21 is a value within the above range, the light use efficiency can be further improved, and the brightness and contrast of the projected image can be made particularly excellent.

  As described above, by strictly defining the shape and arrangement method of the microlenses, the viewing angle characteristics and the like can be made particularly excellent while effectively preventing the occurrence of moire due to light interference. . In particular, by strictly defining the shape and arrangement method of the microlens as described above, the effect of having the microlens having the shape and arrangement method as described above and the black matrix 3 as described in detail later are provided. The effects of having them act synergistically, and particularly excellent effects (for example, particularly excellent viewing angle characteristics, light utilization efficiency, etc.) can be obtained.

  Each microlens 21 is formed as a convex lens protruding to the incident side, and the focal point f is located in the vicinity of an opening (non-light-shielding part) 31 provided in a black matrix (light-shielding film) 3 described later. Designed to be That is, parallel light La (parallel light La from a Fresnel lens unit 6 described later) incident on the microlens substrate 1 from a substantially perpendicular direction is collected by each microlens 21 of the microlens substrate 1 and is black. A focal point f is formed in the vicinity of the opening 31 of the matrix 3. As described above, the microlens 21 is focused in the vicinity of the opening 31 of the black matrix 3 so that the light utilization efficiency can be made particularly excellent. As a result, the contrast of an image formed by light transmitted through the microlens substrate can be made particularly excellent.

  A black matrix 3 is provided on the surface of the substrate body 2 on the light emission side. The black matrix 3 is made of a light-shielding material and is formed in a film shape. By having such a black matrix 3, the black matrix 3 can absorb external light (external light that is not preferable for forming a projection image), and the image projected on the screen has excellent contrast. Can be. In particular, by having the lens surface side light-shielding portion 4 as described above and the black matrix 3, the contrast of the image by the microlens substrate 1 can be made particularly excellent.

Such a black matrix 3 has an opening 31 on the optical path of the light transmitted through each microlens 21. Thereby, the light condensed by each micro lens 21 can be efficiently passed through the opening 31 of the black matrix 3. As a result, the light utilization efficiency of the microlens substrate 1 can be increased.
The opening 31 sufficiently prevents the light for image formation from being absorbed and reflected by the black matrix 3 while effectively preventing reflection of external light at a portion other than the opening 31 of the black matrix 3. It is provided with a large size. In the present invention, the “opening” refers to a portion through which light can be transmitted in a light-shielding film having light-shielding properties, and is filled with a material that is not substantially colored (a material having light-transmissive properties). It is a concept that includes such parts.

As will be described in detail later, the black matrix 3 is prevented from forming an opening at a portion not corresponding to the lens. Thereby, the viewing angle characteristics and light utilization efficiency of the microlens substrate 1 can be made particularly excellent, and the contrast of the projected image can be made higher.
The opening 31 of the black matrix 3 may have any shape, but it is preferable that the shape when viewed in plan is substantially circular. When the opening 31 is substantially circular, the size of the opening 31 is not particularly limited, but the diameter is preferably 5 to 80 μm, more preferably 15 to 60 μm, and 20 to 50 μm. More preferably. Thereby, the image projected on a screen can be made more excellent in contrast.

  Further, the thickness (average thickness) of the black matrix 3 is preferably 0.3 to 8 μm, more preferably 0.6 to 5 μm, and further preferably 0.8 to 1.5 μm. preferable. When the thickness of the black matrix 3 is a value within the above range, the function as the black matrix 3 (that is, the image contrast is improved) while preventing unintentional peeling and cracking of the black matrix 3 more reliably. For example, in the transmission screen 10 including the microlens substrate 1, the contrast of the projected image can be made particularly excellent.

  Further, the area ratio (opening ratio) of the opening 31 to the black matrix 3 when viewed in plan is preferably 3 to 40%, more preferably 5 to 30%, and more preferably 10 to 25%. Is more preferable. If the aperture ratio is a value within the above range, external light (for example, external light incidentally incident from the side opposite to the light incident side) is sufficiently suppressed from reflecting to the output side. In addition to making the light utilization efficiency particularly excellent, it is possible to prevent the reflection and make the contrast of the obtained image particularly excellent, and the viewing angle characteristics of the microlens substrate 1 are particularly excellent. Can be. On the other hand, if the aperture ratio is less than the lower limit, it may be difficult to make the light utilization efficiency and viewing angle characteristics sufficiently excellent. Also, if the aperture ratio exceeds the upper limit, it becomes difficult to keep external light reflection sufficiently low, and it becomes difficult to prevent reflection and make the contrast of the obtained image sufficiently excellent. there is a possibility.

  Further, a diffusing portion 4 is provided on the light emitting side surface of the microlens substrate 1. The diffusion unit 4 has a function of diffusing incident light (incident light) by irregular reflection. By having such a diffusing portion 4, the viewing angle characteristics can be made particularly excellent. In addition, since the diffuser 4 is provided, light can be diffusely reflected, so that generation of bright spots in the displayed image can be more effectively prevented. The diffusing portion 4 has a region formed on the light emission side from the black matrix 3. With such a configuration, the light incident on the diffusing portion 4 can be efficiently directed to the emission side (the direction opposite to the light incident side), and the light utilization efficiency is reduced. While effectively preventing, the viewing angle characteristics of the transmissive screen 10 can be made particularly excellent (the viewing angle at which the image projected on the screen can be suitably viewed is particularly large). it can). In the present embodiment, the diffusing section 4 has a configuration in which a diffusing material is dispersed in a substantially transparent material (for example, an acrylic resin, a polycarbonate resin, or the like) excellent in light transmittance. As the diffusing material, for example, particulate (bead-shaped) silica, glass, resin, or the like can be used. The average particle size of the diffusing material is not particularly limited, but is preferably 1 to 50 μm, and more preferably 2 to 10 μm.

  Moreover, although the thickness of the spreading | diffusion part 4 is not specifically limited, It is preferable that it is 0.5-10 mm, It is more preferable that it is 0.7-5 mm, It is further more preferable that it is 1.0-3 mm. When the thickness of the diffusing portion 4 is a value within the above range, the viewing angle characteristics can be made particularly excellent while sufficiently improving the light utilization efficiency. On the other hand, if the thickness of the diffusing portion 4 is less than the lower limit, the effect of providing the diffusing portion 4 may not be sufficiently exhibited. Moreover, when the thickness of the diffusing part 4 exceeds the upper limit, the probability (frequency) that the light (photon) and the diffusing material collide with each other tends to increase rapidly, and quenching is likely to occur. There is a high possibility that the incident light (photon) returns to the incident side again. As a result, it may be difficult to sufficiently increase the light use efficiency.

Next, the transmission screen 10 including the microlens substrate 1 as described above will be described.
As shown in FIG. 3, the transmission screen 10 includes a Fresnel lens portion 5 and the microlens substrate 1 described above. The Fresnel lens unit 5 is installed on the light (image light) incident side, and the light transmitted through the Fresnel lens unit 5 is incident on the microlens substrate 1.
The Fresnel lens unit 5 has a prism-shaped Fresnel lens 51 formed in a substantially concentric shape on the exit side surface. The Fresnel lens unit 5 refracts image light from a projection lens (not shown) to produce parallel light La parallel to the vertical direction of the main surface of the microlens substrate 1.

  In the transmissive screen 10 configured as described above, the image light from the projection lens is refracted by the Fresnel lens unit 5 and becomes parallel light La. The parallel light La is incident from the side of the microlens substrate 1 on which the microlenses 21 are formed, collected by the microlenses 21, diffused after being focused. The light that has passed through the opening 31 diffuses and is observed as a planar image by the observer.

<< First Embodiment of Lens Substrate Manufacturing Method >>
Next, a first embodiment of the method for manufacturing the microlens substrate 1 described above will be described.
FIG. 4 is a schematic longitudinal sectional view showing a member with a recess used for manufacturing a lens substrate, FIG. 5 is a schematic longitudinal sectional view showing a method for manufacturing the member with a recess shown in FIG. 4, and FIG. FIG. 7 is a schematic longitudinal sectional view showing an example of a manufacturing method of the main body, FIG. 7 is a schematic view showing an inspection correction device used for inspection and correction of the substrate main body, and FIG. 8 is a method of forming a light shielding portion on the correction substrate main body. It is a longitudinal cross-sectional view which shows an example.
Further, in the manufacture of the member with concave portions, a large number of concave portions (recesses for microlenses) are actually formed on the substrate, and in the manufacture of the microlens substrate (substrate body), actually a large number of convex portions (convex lenses). However, in order to make the explanation easier to understand, a part thereof is highlighted.

First, the structure of the member with a recess used for manufacturing the lens substrate and the manufacturing method thereof will be described.
Although the member 6 with a recessed part may be comprised with what kind of material, it is preferable that it is comprised with the material which is hard to produce a bending | flexion and is hard to be damaged. As a constituent material of the member 6 with a recessed part, various glass materials, various resin materials, etc. are mentioned, for example. Examples of the glass material include soda glass, crystalline glass, quartz glass, lead glass, potassium glass, borosilicate glass, and alkali-free glass. Examples of the resin material include polyethylene, polypropylene, and ethylene- Polyolefin such as propylene copolymer, ethylene-vinyl acetate copolymer (EVA), cyclic polyolefin, modified polyolefin, polyvinyl chloride, polyvinylidene chloride, polystyrene, polyamide (eg, nylon 6, nylon 46, nylon 66, nylon 610) , Nylon 612, nylon 11, nylon 12, nylon 6-12, nylon 6-66), polyimide, polyamideimide, polycarbonate (PC), poly- (4-methylpentene-1), ionomer, acrylic resin, acryloni Ryl-butadiene-styrene copolymer (ABS resin), acrylonitrile-styrene copolymer (AS resin), butadiene-styrene copolymer, polyoxymethylene, polyvinyl alcohol (PVA), ethylene-vinyl alcohol copolymer (EVOH) ), Polyesters such as polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polycyclohexane terephthalate (PCT), polyether, polyetherketone (PEK), polyetheretherketone (PEEK), polyetherimide, polyacetal (POM) ), Polyphenylene oxide, modified polyphenylene oxide, polysulfone, polyethersulfone, polyphenylene sulfide, polyarylate, aromatic polyester (liquid crystal polymer) Polytetrafluoroethylene, polyvinylidene fluoride, other fluororesins, styrene, polyolefin, polyvinyl chloride, polyurethane, polyester, polyamide, polybutadiene, trans polyisoprene, fluoro rubber, chlorinated polyethylene Various thermoplastic elastomers such as epoxy resins, phenol resins, urea resins, melamine resins, unsaturated polyesters, silicone resins, urethane resins, etc., or copolymers, blends, polymer alloys, etc. mainly comprising these A resin material etc. are mentioned, Among these, it can use combining 1 type (s) or 2 or more types. Among these, as a constituent material of the member 6 with a recessed part, a glass material is preferable and soda glass, crystalline glass (for example, neo-ceram etc.), and an alkali free glass are more preferable. Such a material is generally excellent in shape stability. Further, soda glass, crystalline glass, and non-alkali glass are easy to process, are relatively inexpensive, and are advantageous from the viewpoint of manufacturing cost.

The member 6 with concave portions includes a plurality of concave portions 61 arranged in a method (transferred positional relationship) corresponding to the arrangement method of the microlenses 21. These recesses 61 have a shape corresponding to the microlens 21 (substantially the same shape except for the transferred shape) and dimensions, except that the microlens 21 is a recess while the microlens 21 is a protrusion. have.
More specifically, in the present embodiment, the concave portion 61 has a flat shape (substantially oval) in which the vertical width (width in the vertical direction) when viewed in plan is smaller than the horizontal width (width in the horizontal direction). (Substantially bowl-shaped). The concave portion 61 having such a shape is preferably used for manufacturing the microlens substrate 1 capable of effectively preventing the occurrence of inconvenience such as moire and having particularly excellent viewing angle characteristics. Can do.

When the length in the minor axis direction (longitudinal direction) of the concave portion 61 in plan view is L ₁ [μm] and the length in the major axis direction (lateral direction) is L ₂ [μm], 0.50 ≦ L ₁ / L ₂ ≦ 0.99 is preferably satisfied, 0.60 ≦ L ₁ / L ₂ ≦ 0.90 is more preferable, and 0.65 ≦ L ₁ / L _It is more preferable to satisfy the relationship of ₂ ≦ 0.80. By satisfying the relationship as described above, the effects as described above become more remarkable.

  Further, the length of the concave portion 61 in the short axis direction when viewed in plan is preferably 10 to 200 μm, more preferably 30 to 150 μm, and further preferably 50 to 100 μm. When the length of the concave portion 61 in the minor axis direction is a value within the above range, the viewing angle characteristics of the manufactured microlens substrate 1 and the contrast and brightness of the image projected by the microlens substrate 1 are particularly excellent. However, sufficient resolution can be obtained in the projected image. Further, when the length of the concave portion 61 in the short axis direction is a value within the above range, it is possible to effectively prevent the occurrence of inconvenience such as moire when the manufactured microlens substrate 1 is used. The productivity of the microlens substrate 1 (member 6 with a recess) can be further increased.

  Further, the length in the major axis direction of the recess 61 when seen in a plan view is preferably 15 to 250 μm, more preferably 45 to 200 μm, and still more preferably 70 to 150 μm. When the length of the concave portion 61 in the major axis direction is a value within the above range, the viewing angle characteristics of the obtained microlens substrate 1 and the contrast and brightness of the image projected by the microlens substrate 1 are particularly excellent. However, sufficient resolution can be obtained in the projected image. In addition, when the length of the concave portion 61 in the major axis direction is a value within the above range, it is possible to effectively prevent the occurrence of inconvenience such as moire and to produce the microlens substrate 1 (member with concave portion 6). The sex can be further enhanced.

Moreover, it is preferable that the curvature radius of the recessed part 61 is 7.5-125 micrometers, It is more preferable that it is 15-90 micrometers, It is further more preferable that it is 30-60 micrometers. When the radius of curvature of the recess 61 is a value within the above range, the viewing angle characteristics of the obtained microlens substrate 1 can be made particularly excellent. In particular, both the horizontal and vertical viewing angle characteristics can be improved. The concave portion 61 may have a different radius of curvature in the minor axis direction and a radius of curvature in the major axis direction. In such a case, the radius of curvature in the major axis direction is a value within the above range. Preferably there is.
Moreover, it is preferable that the depth of the recessed part 61 is 7.5-125 micrometers, It is more preferable that it is 15-90 micrometers, It is further more preferable that it is 30-60 micrometers. When the depth of the recess 61 is a value within the above range, the viewing angle characteristics of the obtained microlens substrate 1 can be made particularly excellent.

  The plurality of recesses 61 are arranged in a staggered pattern (in a staggered pattern). By arranging the recesses 61 in this way, it is possible to effectively prevent the occurrence of inconvenience such as moire when the obtained microlens substrate 1 is used. On the other hand, for example, if the recesses are arranged in a square lattice shape, it is difficult to sufficiently prevent the occurrence of inconvenience such as moire depending on the size of the recesses. In addition, when the concave portions are randomly arranged, depending on the size of the concave portion or the like, it becomes difficult to sufficiently increase the occupancy ratio of the concave portions in the effective region where the concave portions are formed. It is difficult to sufficiently increase the use efficiency), and the resulting image may be dark.

  Further, as described above, the recesses 61 are arranged in a staggered pattern when the member 6 with recesses is viewed in plan view, but are adjacent to the first row composed of the plurality of recesses 61. It is preferable that the second row is shifted by a half pitch in the vertical direction (the short axis direction of the recess 61). As a result, when the manufactured microlens substrate 1 is used, it is possible to more effectively prevent the occurrence of moiré due to light interference and to make the viewing angle characteristics particularly excellent. it can.

Next, the manufacturing method of a member with a recessed part is demonstrated, referring FIG. In practice, a large number of recesses (microlens formation recesses) are formed on the substrate. Here, in order to make the description easy to understand, a part of them is shown highlighted.
<A1> First, when manufacturing the member 6 with concave portions, a substrate 60 is prepared (see FIG. 5A).
As the substrate 60, a substrate having a uniform thickness and free from bending and scratches is preferably used. The substrate 60 preferably has a surface cleaned by cleaning or the like.

<A2> A mask 8 having a large number of initial holes (openings) 81 is formed on the surface of the prepared substrate 60, and the back surface of the substrate 60 (the surface opposite to the surface on which the mask 8 is formed) A protective film 89 is formed (see a masking step, FIG. 5B and FIG. 5C).
In particular, in this embodiment, first, as shown in FIG. 5B, a back surface protective film 89 is formed on the back surface of the prepared substrate 60, and a mask forming film 80 is formed on the surface of the substrate 60 (mask). (Formation film forming step) Then, as shown in FIG. 5C, the mask 8 is obtained by forming the initial hole 81 in the mask formation film 80 (initial hole formation step). The mask forming film 80 and the back surface protective film 89 can be formed simultaneously.

  The mask forming film 80 is preferably capable of forming an initial hole 81 to be described later by laser light irradiation or the like and having resistance to etching in an etching process to be described later. In other words, the mask forming film 80 (mask 8) is preferably configured so that the etching rate is substantially equal to or lower than that of the substrate 60.

From this point of view, the material forming the mask forming film 80 (mask 8) is, for example, a metal such as Cr, Au, Ni, Ti, or Pt, an alloy containing two or more selected from these metals, Examples thereof include oxides (metal oxides), silicon, and resins.
Further, the mask forming film 80 (mask 8) may have, for example, a substantially uniform composition, or a laminated body having a plurality of different layers.

  As described above, the configuration of the mask forming film 80 (mask 8) is not particularly limited. However, the mask forming film 80 (mask 8) is a laminate including a layer mainly composed of chromium and a layer mainly composed of chromium oxide. Preferably there is. The mask forming film 80 having such a configuration can easily and surely form an opening having a desired shape by irradiation of laser light as described later. The mask 8 obtained by using the mask forming film 80 has excellent stability with respect to etching solutions having various compositions (the substrate 60 can be more reliably protected in an etching process described later). . Further, when the substrate 60 is made of a glass material and the mask forming film 80 (mask 8) has the above structure, for example, in an etching process described later, one hydrogen as an etchant is used. A liquid containing ammonium difluoride can be suitably used. Since ammonium monohydrogen difluoride is not a poisonous deleterious substance, it is possible to prevent the human body and the environment during work more reliably. Further, the mask forming film 80 (mask 8) having the above-described configuration can relieve the internal stress of the mask efficiently, and is particularly excellent in adhesion with the substrate 60 (particularly, adhesion in the etching process). ing. For this reason, by using the mask forming film 80 (mask 8) having the above-described configuration, it is possible to easily and reliably form the recess 61 having a desired shape.

  The method for forming the mask forming film 80 is not particularly limited, but the mask forming film 80 (mask 8) is made of a metal material (including an alloy) such as chromium (Cr) or gold (Au) or a metal oxide (for example, chromium oxide). ), Or a composite material thereof (for example, a laminated body having a metal layer made of a metal material and a metal oxide layer made of a metal oxide, etc.) The film 80 can be suitably formed by, for example, a vapor deposition method or a sputtering method. When the mask forming film 80 (mask 8) is made of silicon, the mask forming film 80 can be suitably formed by, for example, a sputtering method or a CVD method.

  The thickness of the mask forming film 80 (mask 8) varies depending on the material constituting the mask forming film 80 (mask 8), but is preferably about 0.01 to 2.0 μm, preferably 0.01 to 0.3 μm. The degree is more preferable. If the thickness is less than the lower limit, the shape of the initial hole 81 formed in the initial hole forming step (opening forming step) described later may be distorted depending on the constituent material of the mask forming film 80 and the like. There is. In addition, when wet etching is performed in an etching process described later, the masked portion of the substrate 60 may not be sufficiently protected. On the other hand, if the upper limit value is exceeded, depending on the constituent material of the mask forming film 80, it becomes difficult to form the initial hole 81 that penetrates in the initial hole forming step described later, and the mask forming film 80 (mask Due to the internal stress of 8), the mask forming film 80 (mask 8) may be easily peeled off.

  The back surface protective film 89 is for protecting the back surface of the substrate 60 in the subsequent steps. By this back surface protective film 89, erosion, deterioration, etc. of the back surface of the substrate 60 are suitably prevented. This back surface protective film 89 has the same configuration as the mask forming film 80 (mask 8), for example. Therefore, the back surface protective film 89 can be provided in the same manner as the mask forming film 80 simultaneously with the formation of the mask forming film 80.

<A3> Next, as shown in FIG. 5C, a plurality of initial holes (openings) 81 are formed in the mask forming film 80 to obtain the mask 8 (initial hole forming step). The initial hole 81 formed in this step functions as a mask opening in the later-described etching.
A method for forming the initial hole 81 is not particularly limited, but a method using laser light irradiation is preferable. Thereby, the initial holes 81 having a desired shape arranged in a desired pattern can be easily and accurately formed. As a result, the shape, arrangement method, and the like of the recesses 61 can be controlled more reliably. In addition, by forming the initial hole 81 by laser irradiation, a member with a recess can be manufactured with high productivity. In particular, the concave portion can be easily formed even on a large-area substrate. In addition, by forming the initial hole 81 in the mask forming film 80 by laser light irradiation, the opening (e.g., easier and less expensive than the case where the opening is formed in the resist film by a photolithography method as in the prior art. An initial hole 81) can be formed.

In addition, when the initial hole 81 is formed by laser light irradiation, the type of laser light to be used is not particularly limited, but a ruby laser, a semiconductor laser, a YAG laser, a femtosecond laser, a glass laser, a YVO ₄ laser, a Ne- He laser, Ar laser, CO ₂ laser, excimer laser or the like may be mentioned. Moreover, you may use wavelengths, such as SHG of each laser, THG, and FHG.

  The shape and size of the initial hole 81 formed in this step is not particularly limited, but is substantially circular and the diameter is preferably 0.5 to 30 μm, more preferably 1.0 to 10 μm. Preferably, it is 1.5-5 micrometers. When the diameter of the initial hole 81 is a value within the above range, the concave portion 61 having the above-described shape can be reliably formed in the etching process described later. However, when the initial hole 81 has a flat shape such as a substantially elliptical shape, the length in the minor axis direction can be substituted for the value of the diameter. That is, when the initial hole 81 formed in this step has a flat shape, the width of the initial hole 81 (length in the minor axis direction) is not particularly limited, but is preferably 0.8 to 30 μm, More preferably, it is 1.0-10 micrometers, and it is still more preferable that it is 1.5-5 micrometers. When the width of the initial hole 81 is a value within the above range, the concave portion 61 having the above-described shape can be reliably formed in the etching process described later.

  In addition, when the initial hole 81 formed in this step is a flat shape, the length of the initial hole 81 (length in the major axis direction) is preferably 0.5 to 30 μm, and 1.0 to More preferably, it is 15 micrometers, and it is still more preferable that it is 1.5-10 micrometers. When the length of the initial hole 81 is a value within the above range, the concave portion 61 having the above-described shape can be more reliably formed in the etching process described later.

<A4> Next, as shown in FIG. 5D, the substrate 60 is etched using the mask 8 in which the initial holes 81 are formed, and a large number of recesses 61 are formed on the substrate 60 (etching step). .
The etching method is not particularly limited, and examples thereof include wet etching and dry etching. In the following description, a case where wet etching is used will be described as an example.

By performing etching (wet etching) on the substrate 60 covered with the mask 8 in which the initial holes 81 are formed, as shown in FIG. 5D, the substrate 60 has a portion where the mask 8 does not exist ( A large number of recesses 61 are formed on the substrate 60 by etching from a portion corresponding to the initial hole 81 of the mask 8. As described above, since the initial holes 81 formed in the mask 8 are arranged in a staggered pattern (in a staggered pattern), the formed recesses 61 are formed in a staggered pattern (in a staggered pattern) on the surface of the substrate 60. It will be arranged.
Further, when the wet etching method is used, the concave portion 61 can be suitably formed. For example, when an etchant containing ammonium monohydrogen difluoride is used as the etchant, the substrate 60 can be etched more selectively, and the recesses 61 can be suitably formed.

In the case where the mask 8 (mask forming film 80) is mainly composed of chromium or chromium oxide, a liquid containing ammonium monohydrogen difluoride is particularly suitable as the hydrofluoric acid-based etching solution. Since the ammonium hydrogen difluoride solution is not a poisonous and deleterious substance, it can prevent the influence on the human body and the environment during work. When ammonium monohydrogen difluoride is used as the etching solution, the etching solution may contain, for example, hydrogen peroxide and / or sulfuric acid. Thereby, an etching speed can be made faster.
Further, according to wet etching, it is possible to perform processing with a simpler apparatus than dry etching, and it is possible to perform processing on many substrates at once. Thereby, productivity improves and the member 6 with a recessed part can be provided cheaply.

<A5> Next, as shown in FIG. 5E, the mask 8 is removed (mask removal step). At this time, the back surface protective film 89 is also removed together with the removal of the mask 8.
When the mask 8 is a laminated body having a layer mainly composed of chromium and a layer mainly composed of chromium oxide as described above, the removal of the mask 8 is, for example, ceric ammonium nitrate and perchlorine. It can carry out suitably by etching using a mixture containing an acid.
As described above, as shown in FIG. 4, the concave member 6 in which a large number of concave portions 61 are formed in a staggered pattern on the substrate 60 is obtained.

  The method of forming the plurality of recesses 61 arranged in a staggered pattern on the substrate 60 is not particularly limited, but the method as described above (the initial holes 81 in the mask forming film 80 by laser light irradiation). To obtain the mask 8, and then etching using the mask 8 to form the recess 61 on the substrate 60), the following effects are obtained.

That is, by forming the initial holes 81 in the mask forming film 80 by laser light irradiation, the openings (with a predetermined pattern) can be easily and inexpensively compared to the case where the openings are formed by a conventional photolithography method. A mask having initial holes 81) can be obtained. Thereby, productivity improves and the member 6 with a recessed part can be provided cheaply.
Further, according to the method as described above, it is possible to easily perform processing on a large substrate. When manufacturing a large substrate (a member with a recess, a lens substrate), it is not necessary to bond a plurality of substrates as in the prior art, and the seam of bonding can be eliminated. As a result, a high-quality large-sized substrate (a member with a recess, a lens substrate) can be manufactured at a low cost by a simple method.

Further, when the initial holes 81 are formed by laser irradiation, the shape, size, arrangement, and the like of the formed initial holes 81 can be managed easily and reliably.
In addition, you may perform a mold release process with respect to the member 6 with a recessed part, for example in order to form the mold release process part as mentioned above. As the mold release treatment, for example, formation of a film composed of a material having releasability such as silicone resin such as alkylpolysiloxane, fluorine resin such as polytetrafluoroethylene, hexamethyldisilazane ([(CH _{3) 3 Si]} 2 NH) surface treatment with a silylating agent such as a surface treatment or the like with a fluorine gas.

  By the way, since the member 6 with recesses obtained as described above forms a large number of recesses 61, a target recess (with a desired shape) is formed at a site where the recesses 61 are to be formed. There may not be. That is, as shown in the drawing, there is a defective portion 61 ′ in which the concave portion 61 is not provided in a portion where the concave portion 61 is to be provided or a concave portion smaller than the concave portion 61 to be formed is formed. In such a case, a flat portion having a predetermined size or more exists at or around the site as described above. A substrate body manufactured using such a member with a recess having a flat portion has a flat portion at a corresponding site. When the microlens substrate (lens substrate) is provided with a substrate body having a flat portion as described above, light is incident from the light incident side (the surface side where the microlens (convex lens) of the substrate body is provided). When (incident light) is incident on the flat part, the flat part has no light collecting function like the lens part, so the incident light is emitted as straight light, and on the viewer side (on the transmission screen), It is recognized as a bright spot and has a significant adverse effect on the displayed image. The above-mentioned defects are caused by, for example, in the manufacture of a member with a recess, the initial hole cannot be reliably formed in a portion where the initial hole of the mask forming film is to be formed, or the mask is formed during etching. This occurs when dirt adheres to the vicinity of the initial hole. Although it is possible to try to suppress the occurrence of defects as described above by optimizing mask formation conditions and etching conditions, it is used for manufacturing a large lens substrate (for example, a lens substrate having a diagonal length of 100 cm or more). In a member with a recess, it is extremely difficult to completely prevent the occurrence of defects as described above.

  Therefore, in the present invention, the surface of the substrate body 2 ′, which will be described later, obtained by using such a member 6 with a concave portion is inspected by a method described in detail later, and the convex lens is inspected. Has found that the above-mentioned problems can be solved by specifying a defective portion (a portion corresponding to the aforementioned defective portion 61 ′) that is not formed in a desired shape and correcting the defective portion. It has the characteristics. In the present specification, the term “defective part” means that a convex lens having a desired shape is not formed or a target convex lens is not formed at a position to be formed.

Hereinafter, an example of a method of forming the substrate body 2 ′ using the member 6 with a recess as described above will be described.
<B1> First, the recessed member 6 is prepared.
<B2> Next, as shown in FIG. 6A, on the surface of the member 6 with recesses on the side where the recesses 61 are formed, the composition 23 having fluidity (for example, a softened resin material, An unpolymerized (uncured resin material) is applied (composition applying step), and a base film 24 is placed thereon, and the composition 23 is flattened (pressing member) 11 through the base film 24. (Pressing process).

  The base film 24 is preferably made of a material having a refractive index comparable to that of the composition 23 (the composition 23 after solidification). More specifically, the base film 24 is an absolute constituent material of the base film 24. The absolute value of the difference between the refractive index and the absolute refractive index of the composition 23 after solidification is preferably 0.20 or less, more preferably 0.10 or less, and 0.02 or less. Further preferred. The base film 24 may be made of any material, but is preferably made of polyethylene terephthalate. In addition, the base film 24 may be a relatively thick film or a film that is not substantially flexible.

  In addition, you may perform the press by the flat plate 11 in the state which has arrange | positioned the spacer between the member 6 with a recessed part, and the base film 24, for example. Thereby, the thickness of the board | substrate body 2 formed can be controlled more reliably. Moreover, when using a spacer, when solidifying the composition 23, the spacer should just be distribute | arranged between the member 6 with a recessed part, and the base film 24, and the timing which supplies a spacer is not specifically limited. For example, the composition 23 in which spacers are dispersed in advance as a resin to be applied may be used on the surface of the member 6 with recesses where the recesses 61 are formed, or in a state where the spacers are arranged on the member 6 with recesses. The composition 23 may be applied, or a spacer may be applied after the composition 23 is supplied.

In the case of using a spacer, the spacer is preferably made of a material having a refractive index comparable to that of the solidified composition 23, and more specifically, the absolute refractive index of the constituent material of the spacer and the solidified material. The absolute value of the difference from the absolute refractive index of the composition 23 is preferably 0.20 or less, more preferably 0.10 or less, still more preferably 0.02 or less, and after solidification The composition 23 and the spacer are most preferably composed of the same material.
The shape of the spacer is not particularly limited, but is preferably substantially spherical or substantially cylindrical. When the spacer has such a shape, the diameter thereof is preferably 10 to 300 μm, more preferably 30 to 200 μm, and further preferably 30 to 170 μm.

  <B3> Next, the composition 23 is solidified (including curing (polymerization)) to obtain a substrate body 2 ′ having the microlenses 21 corresponding to the recesses 61 (solidification step, see FIG. 6B). ). In the present embodiment, the substrate body 2 ′ is obtained as a bonded body of the solidified composition 23 and the base film 24. Further, the obtained substrate body 2 ′ has a defective portion 21 ′ at a portion corresponding to the defective portion 61 ′ of the member 6 with a recess.

In the case where the composition 23 is solidified by curing (polymerization), examples of the method include methods such as irradiation with light such as ultraviolet rays, irradiation with electron beams, and heating.
Here, if necessary, in the composition 23 and / or the base film 24, for example, polystyrene beads, glass beads, organic cross-linked polymers, etc. are used as a diffusing material in advance in order to diffuse the incident light from the light source. May be mixed. Here, the diffusing material may be mixed in the composition 23 and / or the entire base film 24, or may be mixed only in part.

  <B4> Next, the flat plate 11 and the recessed member 6 are removed from the formed substrate body 2 '(pressing member / recessed member removing step, see FIG. 6C). The removed flat plate 11 and the recessed member 6 can be repeatedly used for manufacturing the substrate body 2 ′ (microlens substrate 1).

Next, a method for inspecting and correcting a defective portion of the substrate body 2 ′ thus obtained will be described.
Inspection / correction of a defective portion of the substrate body 2 ′ can be performed using an inspection correction apparatus 150 as shown in FIG.
The inspection correction device 150 for the substrate body 2 ′ includes a CCD camera 151, a droplet discharge head (inkjet head) 152, a mounting table 153 on which the substrate body 2 ′ is mounted, a moving stage 154, and an image processing unit. And a control device 155.

The CCD camera 151 has a function of taking an image of the surface of the substrate body 2 ′ on which the convex lens is formed.
In addition, the droplet discharge head 152 has a function of discharging the droplets 20 mainly composed of the material constituting the substrate body 2 ′ to the defective portion 21 ′ and correcting the defective portion 21 ′. .

The moving stage 154 moves the CCD camera 151 and the droplet discharge head 152 in a planar manner (XY direction, R-θ direction, etc.) with respect to the mounting table.
In addition, when the inspection signal of the CCD camera 151 is input, the control device 155 performs image processing on the detected signal to detect a defective portion (a portion where the convex lens is not formed in a desired shape) 21 ′ of the substrate body 2 ′. In such a case, it has a function of storing the position of the unnecessary portion 21 ′.

  This inspection correction device 150 performs the inspection and correction process of the substrate main body 2 ′ with the same apparatus. First, the CCD camera 151 is used to perform the entire range of the substrate main body 2 ′ (effectively formed with a convex lens portion). Area). Then, an inspection signal is input to the image processing unit, and image processing is performed to detect a defective portion 21 '. If a defective portion 21 ′ is detected, the position is stored in the control device 155 (substrate body inspection process). At this time, the size or the like of the defective portion 21 'is stored and used to control the droplet discharge amount when correcting the substrate body 2'.

  Then, when the defective portion 21 ′ is detected in the substrate body 2 ′ and the position is specified, the control device 155, based on the position signal from the image processing unit, controls the droplet discharge head as shown in FIG. 152 is moved right above the defective portion 21 ′, and the droplet discharge head 152 discharges the droplet 20 mainly composed of the material constituting the substrate body 2 ′ to correct the defective portion 21 ′ (correction). Process). The corrected portion is subjected to solidification treatment such as ultraviolet irradiation treatment or heat treatment in accordance with the type of material constituting the droplet (material constituting the substrate body 2 ').

As described above, the substrate body (corrected substrate body) 2 is obtained.
According to the present embodiment, inspection and correction can be performed in a series of flows, and the defective portion 21 ′ can be corrected more efficiently. Further, by using image processing as the inspection method, the defective portion 21 ′ can be detected and specified more efficiently.
Further, the method for discharging the droplets is not particularly limited, but it is preferable to apply the ink jet method. According to the ink jet method, the droplet 20 can be selectively and reliably discharged to the defective portion 21 ′ of the substrate body 2 ′. In addition, according to the ink jet method, the ejection of the droplets 20 can be speeded up, and a material that is effectively ejected can be used, which is preferable from the viewpoint of resource saving.

The inspection of the defective portion 21 ′ is not limited to the above-described image processing, and can be performed by measuring the height of the convex lens and detecting the convex lens having a predetermined height or less, for example. . Thereby, it is possible to detect and identify a defective portion more efficiently. Such an inspection can be performed using, for example, a step difference measuring device.
Next, a microlens substrate is formed using the substrate body 2 obtained as described above.

<C1> First, a black matrix (light-shielding film) 3 is formed on the emission side surface of the substrate body 2 produced as described above.
In the present embodiment, the light shielding layer is formed using a process of applying a light shielding layer forming material to the substrate body and exposing the light shielding layer forming material. The light shielding layer forming material may be any material as long as it contains a photosensitive component, but in the following description, the positive photopolymer 32 is mainly used as the light shielding layer forming material 32. It is assumed that

  First, as shown in FIG. 8D, a positive type photopolymer (light shielding film forming material) 32 having a light shielding property is applied to the emission side surface of the substrate body 2 (light shielding film forming material applying process). . As a method for applying the photopolymer 32 to the surface of the substrate body 2, for example, various coating methods such as dip coating, doctor blade, spin coating, brush coating, spray coating, electrostatic coating, electrodeposition coating, roll coater, etc. are used. be able to. The photopolymer 32 may be composed of a resin having a light shielding property, or may be a resin material (low light shielding property) dispersed or dissolved in a light shielding material. After application of the photopolymer 32, heat treatment such as pre-baking treatment may be performed as necessary.

  <C2> Next, as shown in FIG. 8E, the substrate main body 2 is irradiated with exposure light Lb in a direction perpendicular to the incident side surface. The irradiated exposure light Lb is refracted and collected by entering the microlens 21. Then, by being condensed, the photopolymer 32 in the portion irradiated with the light having an increased luminous intensity (light beam) is exposed, and the other portion of the photopolymer 32 is not exposed or the exposure amount is reduced. Only the photopolymer 32 in the portion irradiated with light having an increased luminous intensity (light flux) is exposed.

Thereafter, development is performed. Here, since the photopolymer 32 is a positive photopolymer, the photopolymer 32 in the vicinity of the exposed focal point f is dissolved and removed by development. As a result, as shown in FIG. 8F, the black matrix 3 in which the opening 31 is formed in the portion corresponding to the optical axis L of the microlens 21 is formed. The development method varies depending on the composition of the photopolymer 32 and the like, but can be performed using, for example, an alkaline solution such as a KOH aqueous solution.
In this way, a black matrix can be formed in a simpler process than when using photolithographic technology, for example, by irradiating photopolymer with exposure light condensed by a microlens to form a black matrix. Can do.

In particular, the substrate body 2 is corrected as described above. For this reason, when forming the black matrix by irradiating the exposure light condensed by the microlens 21, it is possible to prevent the opening from being formed at an unintended position. As a result, the obtained microlens substrate 1 can display an excellent image with excellent contrast and suppressed generation of bright spots.
In addition, you may perform heat processing, such as a post-baking process after development, as needed.

  In the above description, as the light shielding layer forming material, a positive type photopolymer is used to form the light shielding layer (black matrix 3). However, a material other than the photopolymer may be used. For example, a reversal developing material such as a silver salt photosensitive material may be used as the light shielding layer forming material. When a silver salt photosensitive material (reversal developing material) is used, after exposure as described above, once the exposed portion is processed to be desalted, and then further exposed and developed. The first exposed portion can be a light transmissive non-light-shielding portion, and the other portions can be light-shielding portions (light-shielding regions).

Moreover, you may perform repeatedly a series of process of provision of the light shielding layer forming material as mentioned above, and exposure. Thereby, the light shielding layer (black matrix) can be formed thicker, and the contrast can be further improved.
In the above description, the light shielding layer forming material is directly applied to the surface of the substrate body 2 (the surface on the light emission surface side). It does not have to be directly applied to the surface. For example, after performing a series of processes such as application of a photosensitive material that does not exhibit sufficient light-shielding property after exposure and development on the surface of the substrate body 2 (surface on the light emission surface side), the light shielding as described above. You may perform the process using the material for layer formation. Thereby, the light shielding layer (black matrix) can be formed thicker, and the contrast can be further improved.

<C3> Next, the diffusion part 4 is formed on the side of the substrate body 2 on which the black matrix 3 is provided to obtain the microlens substrate 1 (see FIG. 1).
The diffusion part 4 is formed, for example, by previously joining a diffusion plate formed into a plate shape, or by providing a diffusion part forming material including a diffusion material and having fluidity, and then solidifying the material. can do.
Examples of the method for applying the diffusion portion forming material include various application methods such as doctor blade, spin coating, brush coating, spray coating, electrostatic coating, electrodeposition coating, and roll coater, and the substrate body 2 for forming the diffusion portion. A method such as dipping immersed in the material can be used.

<< Second Embodiment of Lens Lens Manufacturing Method >>
The second embodiment of the lens substrate manufacturing method of the present invention will be described below. In the following description, parts different from those of the above-described first embodiment will be mainly described, and description of similar parts will be omitted.
The present embodiment is different from the first embodiment described above in that the defective portion is inspected using the member 6 with a recess.
FIG. 9 is a schematic diagram showing an inspection apparatus used in manufacturing a lens substrate.
As shown in FIG. 9, the inspection device 110 for the member 6 with a concave portion includes a CCD camera 114, a mounting table 115 on which the member 6 with a concave portion is placed, a moving stage 112, and a control device 113 incorporating an image processing unit. have.

  The moving stage 112 moves the CCD camera 114 in a planar manner (XY direction, R-θ direction, etc.) with respect to the mounting table 115, and the control device 113 receives an inspection signal from the CCD camera 114. Then, this is subjected to image processing, and the position of the defective portion 61 ′ where the recess 61 is not formed in a desired shape is stored. As a result, it is possible to detect and identify a defective portion more efficiently.

  Specifically, first, the CCD camera 114 scans the entire range of the member 6 with a recess (an effective area in which the recess is formed). Then, an inspection signal is input to the image processing unit, and image processing is performed to detect a defective portion. And when a defective location is detected, the position is memorize | stored. At this time, the size of the defective portion and the like are stored and used to control the droplet discharge amount when correcting the substrate body 2 '.

Based on the position information obtained in this way, the defective portion 21 ′ of the substrate body 2 ′ is corrected in the same manner as in the first embodiment described above.
In addition, the inspection of the unnecessary part of the member 6 with a recessed part can also be performed by measuring the depth of the recessed part 61 and detecting the recessed part below predetermined depth, for example. Thereby, it is possible to detect and identify a defective portion more efficiently.
Such an inspection can be performed using, for example, a step difference measuring device.

A rear projector using the transmission screen will be described below.
FIG. 10 is a diagram schematically showing the configuration of the rear projector of the present invention.
As shown in the figure, the rear projector 300 has a configuration in which a projection optical unit 310, a light guide mirror 320, and a transmissive screen 10 are arranged in a housing 340.
Since the rear projector 300 includes the transmission screen 10 as described above, it is possible to display an excellent image with excellent contrast and suppressed generation of bright spots. In addition, the viewing angle characteristics, light utilization efficiency, etc. are particularly excellent.

In particular, in the microlens substrate 1 described above, since the elliptical microlenses 21 are arranged in a staggered pattern (in a staggered pattern), the rear projector 300 is not particularly susceptible to problems such as moire.
As mentioned above, although this invention was demonstrated based on embodiment of illustration, this invention is not limited to these.

  For example, each part constituting a member with a recess, a lens substrate (microlens substrate), a transmissive screen, and a rear projector can be replaced with any component that can exhibit the same function. Moreover, you may add arbitrary structures. For example, the lens substrate may have a colored portion colored at a predetermined density near the surface thereof. Thereby, the contrast of the displayed image can be further improved.

Moreover, in the manufacturing method of a lens substrate (microlens substrate), you may add arbitrary processes.
Moreover, the order of each process in the manufacturing method of a lens substrate is not limited to what was mentioned above, You may change the order as needed.
Moreover, in embodiment mentioned above, although demonstrated as what gives a composition to the surface of a member with a recessed part, for example, a composition is provided to the surface of a flat plate (or the base film mounted on the flat plate), You may manufacture a microlens board | substrate by pressing this with a member with a recessed part.
Further, in the first embodiment described above, the inspection and correction are described as being performed by the same apparatus, but may be performed by different apparatuses.

  In the above-described embodiment, the microlens substrate has been described as having a layered diffusion portion, but the shape of the diffusion portion is not limited to this. For example, the diffusion portion may be provided in a convex shape at a portion corresponding to the opening of the black matrix. Even in such a case, the effects described above can be obtained. In addition, by forming such a diffusion portion, it is possible to more effectively prevent reflection of external light at a portion other than the opening portion of the black matrix, so that the contrast of the obtained image is particularly excellent. can do. Further, the microlens substrate may not include the diffusion portion as described above. In such a case, the light utilization efficiency can be made particularly excellent.

In the above-described embodiment, the lens substrate is described as a microlens substrate including a microlens. However, in the present invention, the lens substrate may be, for example, a lenticular lens substrate.
In the above-described embodiment, the transmission screen is described as including a microlens substrate and a Fresnel lens portion. However, the transmission screen of the present invention does not necessarily include a Fresnel lens portion. Good. For example, the transmission screen of the present invention may be substantially constituted only by the microlens substrate of the present invention.

  In the above-described embodiment, the lens substrate is described as a member constituting a transmission screen and a rear projector. However, the use of the lens substrate of the present invention is not limited to the above, It can be anything. For example, the lens substrate of the present invention is applied to a diffusion plate, a black matrix screen, a projection display device (front projector) screen (front projection screen), a liquid crystal light valve component of a projection display device (front projector), and the like. It may be done.

Example 1
The member with a recessed part provided with the recessed part was manufactured as follows.
First, a soda glass substrate (absolute refractive index n ₂ : 1.50) having a width of 1.2 m × length of 0.7 m square and a thickness of 4.8 mm was prepared as a substrate.
This soda glass substrate was immersed in a cleaning solution containing 4 wt% ammonium monohydrogen difluoride and 8 wt% hydrogen peroxide and etched by 6 μm to clean the surface.
Thereafter, cleaning with pure water and drying using N ₂ gas (removal of pure water) were performed.

  Next, a chromium / chromium oxide laminate (a laminate in which chromium oxide was laminated on the outer surface side of chromium) was formed on the soda glass substrate by sputtering. That is, a mask forming film and a back surface protective film made of a chromium / chromium oxide laminate were formed on the surface of a soda glass substrate. The thickness of the chromium layer was 0.03 μm, and the thickness of the chromium oxide layer was 0.01 μm.

Next, laser processing was performed on the mask forming film to form a large number of initial holes in a range of 113 cm × 65 cm in the central portion of the mask forming film, thereby forming a mask.
The laser processing was performed using an excimer laser under the conditions of an energy density of 1.2 J / cm ² , a beam diameter of 2 μm at the processing point, and a scanning speed of 0.1 m / sec.
As a result, substantially circular initial holes were formed in a staggered pattern over the entire range of the mask forming film. The diameter of the initial hole was 2 μm.

Next, wet etching was performed on the soda glass substrate to form concave portions (recesses for forming microlenses) having a flat shape (substantially elliptical shape) when viewed in plan on the soda glass substrate. The formed recess has a spherical surface, and the length (pitch) in the minor axis direction is 54 μm, the length in the major axis direction is 72 μm, the radius of curvature is 38 μm, and the depth is 38 μm. Moreover, the occupation rate of the recessed part in the effective area | region in which the recessed part was formed was 98%.
In the wet etching, an aqueous solution containing 4 wt% ammonium monohydrogen difluoride and 8 wt% hydrogen peroxide was used as an etchant, and the immersion time was 2.0 hours.

Next, the mask and the back surface protective film were removed by etching using a mixture of ceric ammonium nitrate and perchloric acid.
Next, cleaning with pure water and drying (removing pure water) using N ₂ gas were performed.
Thereafter, a gas phase surface treatment (silylation treatment) with hexamethyldisilazane was performed on the surface side of the substrate where the concave portions were formed, thereby forming a release treatment portion.
Thereby, the member with a recessed part in which many recessed parts for microlens formation were arranged on the soda glass substrate in zigzag form was obtained.

Next, a composition composed of an unpolymerized (uncured) acrylic resin (PMMA resin (methacrylic resin)) is applied to the surface on which the concave portion of the member with concave portions is formed, and polyethylene is formed thereon. A substrate film (thickness: 50 mm) made of terephthalate (PET) was placed. The refractive index (absolute refractive index n ₁ ) of polyethylene terephthalate constituting the base film was 1.57.

Next, the said composition was pressed through the base film with the flat plate comprised with soda glass. At this time, air was prevented from entering between the base film and the composition.
Then, the composition was completely hardened by irradiating the composition with ultraviolet rays while being pressed with a flat plate to obtain a substrate body. The obtained substrate main body had a microlens having a shape corresponding to the concave portion of the concave member. The formed microlens had a flat shape (substantially elliptical shape), and had a length in the major axis direction of 72 μm, a radius of curvature of 38 μm, and a height of 38 μm. Further, the occupation ratio of the microlens in the effective region where the microlens is formed was 98%. Further, the refractive index (absolute refractive index n ₁ ) of the material constituting the formed cured portion was 1.56.

Next, the flat plate and the concave member were removed from the substrate body.
Next, the substrate body was inspected using the inspection correction apparatus shown in FIG. And based on the positional information, unpolymerized (uncured) acrylic resin was discharged to the defective part, and the defective part was corrected. Thereafter, the correction portion was irradiated with ultraviolet rays and cured to obtain a correction substrate body.

Next, a positive type photopolymer (PC405G: JSR Corporation) in which a light-shielding material (carbon black) is added to the exit side (surface opposite to the surface on which the microlens is formed) of the correction substrate body. Made by a roll coater. The content of the light shielding material in the photopolymer was 20 wt%.
Next, ultraviolet rays as 10 mJ / cm ² parallel light were irradiated from the surface on which the microlenses were formed.

As a result, the irradiated ultraviolet rays were collected by each microlens, and the photopolymer of the portion irradiated with the collected ultraviolet rays was selectively exposed.
Thereafter, development was performed for 40 seconds using a 0.5 wt% aqueous KOH solution.
Thereafter, cleaning with pure water and drying using N ₂ gas (removal of pure water) were performed. Thereby, a black matrix having openings corresponding to the respective microlenses was formed. The opening was substantially circular, and its diameter was 30 μm. The formed black matrix had a thickness of 1.2 μm. Further, the formed black matrix has a tapered shape in which the opening has a cross-sectional area that increases toward the light emission side. Further, the area ratio (opening ratio) of the opening with respect to the black matrix when viewed in plan was 18%.

Next, a diffusion part was formed on the side of the substrate body on which the black matrix was formed to obtain a microlens substrate. The diffusion portion was formed by joining a diffusion plate having a configuration in which a diffusion material (silica particles having an average particle size of 8 μm) was dispersed in an acrylic resin by heat fusion. Note that the thickness of the diffusion portion was 2.0 mm.
A transmissive screen as shown in FIG. 3 was obtained by assembling the microlens substrate manufactured as described above and the Fresnel lens portion manufactured by extrusion molding.

(Example 2)
A microlens substrate and a transmissive screen were manufactured in the same manner as in Example 1 except that a step difference measuring device was used as a defective portion detection means.
(Example 3)
A member with a recess was formed in the same manner as in Example 1.

Next, using a device as shown in FIG. 9, a defective portion was detected and the position was stored.
Next, a substrate body (uncorrected substrate body) was formed in the same manner as in Example 1.
Next, based on the positional information obtained by the inspection, unpolymerized (uncured) acrylic resin was discharged to unnecessary portions of the substrate body, and the defective portions were corrected. Thereafter, the correction portion was irradiated with ultraviolet rays and cured to obtain a correction substrate body.

Thereafter, in the same manner as in Example 1 described above, a black matrix was formed, and a microlens substrate and a transmission screen were manufactured.
Example 4
A microlens substrate and a transmissive screen were manufactured in the same manner as in Example 3 except that a step difference measuring device was used as a defective portion detection means.

(Comparative example)
A microlens substrate and a transmissive screen were manufactured in the same manner as in Example 1 except that the substrate body was not corrected.
About each Example and a comparative example, the structure of the member with a recessed part used for manufacture and the structure of a microlens substrate are put together in Table 1, and are shown.

[Production of rear projector]
Using the transmission screens of the respective examples and comparative examples, rear type projectors as shown in FIG. 13 were produced.
[Generation of bright spots]
Sample images were displayed on the transmissive screens of the rear projectors of the respective examples and comparative examples, and in the displayed images, the state of occurrence of bright spots was evaluated according to the following five criteria.

A: A bright spot does not exist or cannot be confirmed visually.
B: There are a small number of bright spots on a part of the screen, which can be confirmed slightly.
C: A bright spot exists in a part of the screen and can be clearly confirmed visually.
D: There are a small number of bright spots on the entire screen, which can be clearly confirmed visually.
E: Many bright spots exist on the entire screen, which can be clearly confirmed visually.

[Evaluation of contrast]
The front contrast of each of the rear projectors of the examples and comparative examples was evaluated.
As contrast (CNT), the front luminance (white luminance) LW [cd / m ² ] of white display when all white light of 373 lx is incident in the bright room and the front of black display when the light source is completely turned off in the bright room The ratio LW / LB with the luminance LB [cd / m ² ] was determined. The black luminance increase amount is an increase amount with respect to the black display luminance in the dark room. The measurement in the bright room was performed in an environment where the ambient light illuminance was about 82 lx. The measurement in the dark room was performed in an environment where the external light illuminance was 0.1 lx or less.

[Measurement of viewing angle]
With the sample images displayed on the transmissive screens of the rear projectors of the examples and comparative examples, the viewing angles in the vertical direction (up and down direction) and the horizontal direction (left and right direction) were measured.
The viewing angle was measured under the condition of measuring with a variable angle photometer (goniophotometer) at intervals of 1 degree.
These results are summarized in Table 2.

  As can be seen from Table 2, in the present invention, bright spots were sufficiently prevented and a high contrast image could be displayed. Also, the viewing angle characteristics were excellent. On the other hand, in the comparative example, a satisfactory result was not obtained.

It is a typical longitudinal section showing a suitable embodiment of a micro lens substrate (lens substrate) of the present invention. FIG. 2 is a plan view of the microlens substrate shown in FIG. 1. It is a typical longitudinal cross-sectional view which shows suitable embodiment of the transmission type screen of this invention provided with the micro lens board | substrate (lens board | substrate) shown in FIG. It is a typical longitudinal cross-sectional view which shows the member with a recessed part used for manufacture of a lens board | substrate. It is a typical longitudinal cross-sectional view which shows the manufacturing method of the member with a recessed part shown in FIG. It is a typical longitudinal section showing an example of a manufacturing method of a substrate body. It is a schematic diagram which shows the test | inspection correction apparatus used for a test | inspection and correction | amendment of a board | substrate body. It is a longitudinal cross-sectional view which shows an example of the method of forming a light-shielding part in a correction | amendment board | substrate body. It is a schematic diagram which shows the inspection apparatus used in manufacture of a lens board | substrate. It is a figure which shows typically the structure of the rear type projector of this invention.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Microlens board | substrate (lens board | substrate) 2 ... Substrate body (correction board body) 2 '... Substrate body 21 ... Microlens (convex lens) 21' ... Defect part 23 ... Composition 24 ... Base film 25 ... 1st line 26 ... second row 20 ... droplet 3 ... black matrix (light shielding film) 31 ... opening 32 ... photopolymer (light shielding film forming material) 4 ... diffusion part 5 ... Fresnel lens part 51 ... Fresnel lens 6 ... with recess Member (member with concave portion for microlens formation) 60 ... Substrate 61 ... Recessed portion (recessed portion for microlens formation) 61 '... Defect 8 ... Mask 81 ... Initial hole (opening) 89 ... Back surface protective film 80 ... Film for mask formation DESCRIPTION OF SYMBOLS 9 ... Correction | amendment electroforming mother mold 91 ... Conductive film 11 ... Flat plate 10 ... Transmission type screen 110 ... Inspection apparatus 112 ... Moving stage 113 ... Control apparatus DESCRIPTION OF SYMBOLS 114 ... CCD camera 115 ... Mounting stage 150 ... Inspection correction apparatus 151 ... CCD camera 152 ... Droplet discharge head 153 ... Mounting stage 154 ... Moving stage 155 ... Control apparatus 300 ... Rear type projector 310 ... Projection optical unit 320 ... Light guide mirror 340 ... Case

Claims (12)

A method of manufacturing a lens substrate having a substrate body having a large number of convex lenses and a light-shielding film made of a light-shielding material and having an opening,
Preparing a member with a recess having a recess corresponding to the convex lens;
A composition applying step for applying a composition having fluidity to the surface of the recessed portion of the member provided with the recess;
Solidifying the composition to obtain a substrate body;
Inspecting the surface of the substrate body where the convex lens is provided, and inspecting the substrate body inspecting step where the convex lens is not formed in a desired shape; and
A correction step of discharging a droplet mainly composed of a material constituting the substrate main body with respect to the defective portion, correcting the defective portion with the droplet, and obtaining a correction substrate main body,
A light-shielding film-forming material application step for providing a light-shielding film-forming material for forming the light-shielding film on the surface of the correction substrate body opposite to the surface on which the convex lens is provided;
A process for irradiating the light shielding film forming material with light through the correction substrate body, and an opening forming step for forming the light shielding part having the opening. .   In the substrate body inspection step, an image of the surface of the substrate body on the side where the convex lens is provided is taken, and the image is processed to identify a defective portion where the convex lens is not formed in a desired shape. The method for manufacturing a lens substrate according to claim 1.   The method of manufacturing a lens substrate according to claim 1, wherein in the substrate main body inspection step, a defective portion where the convex lens is not formed in a desired shape is identified by detecting a convex lens having a predetermined height or less. A method of manufacturing a lens substrate having a substrate body having a large number of convex lenses and a light-shielding film made of a light-shielding material and having an opening,
Preparing a member with a recess having a recess corresponding to the convex lens;
Inspecting the surface of the member with the concave portion on the side where the concave portion is provided, and identifying the defective portion where the concave portion is not formed in a desired shape,
A composition applying step for applying a composition having fluidity to the surface of the recessed portion of the member provided with the recess;
Solidifying the composition to obtain a substrate body;
A droplet composed mainly of a material constituting the substrate main body is discharged to a defective lens portion of the substrate main body corresponding to the defective portion specified in the member inspection process with a concave portion, and the defect is caused by the liquid droplet. A correction step of correcting the location and obtaining a correction substrate body;
A light-shielding film-forming material application step for providing a light-shielding film-forming material for forming the light-shielding film on the surface of the correction substrate body opposite to the surface on which the convex lens is provided;
A process for irradiating the light shielding film forming material with light through the correction substrate body, and an opening forming step for forming the light shielding part having the opening. .   In the step of inspecting the member with recesses, an image of the surface of the member with recesses on the side where the recesses are provided is taken, and image processing is performed on the image, whereby defective portions where the recesses are not formed in a desired shape The manufacturing method of the lens substrate of Claim 4 specified.   The method for manufacturing a lens substrate according to claim 4, wherein in the member inspection process with a recess, a defective portion where the recess is not formed in a desired shape is identified by detecting a recess having a predetermined depth or less.   The method for manufacturing a lens substrate according to claim 1, wherein in the correction step, the droplets are ejected by an ink jet method.   The method of manufacturing a lens substrate according to claim 1, wherein the lens substrate is a microlens substrate provided with a microlens as the convex lens.   A lens substrate manufactured using the method according to claim 1.   A transmissive screen comprising the lens substrate according to claim 9. A Fresnel lens part having a Fresnel lens formed on the light exit side;
A transmissive screen comprising: the lens substrate according to claim 9 disposed on a light emission side of the Fresnel lens portion.   A rear projector comprising the transmissive screen according to claim 10.

Images