JP2007139969A - Liquid crystal display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To make light from a backlight contribute even to a reflection type pixel with a simple construction. <P>SOLUTION: A liquid crystal display device having a liquid crystal interposed between a first substrate and a viewer side second substrate and the backlight disposed on the rear surface of the first substrate has: a first display region wherein a plurality of first pixels are arranged; and a second display region wherein a plurality of second pixels are arranged. When display is performed by using light from the rear surface, transmission efficiency of the first pixel is lower than that of the second pixel, and when display is performed by reflecting light from the viewer side, reflection efficiency of the first pixel is made to be higher than that of the second pixel. The second substrate has a reflection film reflecting light made incident from the first substrate side and the first pixel reflects light made incident from the first substrate side and reflected by the reflection film of the second substrate to the second substrate side to perform display. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a liquid crystal display device, for example, a liquid crystal display device having a so-called main screen and sub screen in its liquid crystal display section.

For example, a liquid crystal display device formed by being incorporated in a mobile phone generally has a main screen and a sub screen in the liquid crystal display portion.
The main use of the sub screen is configured to display, for example, time or date when the backlight is not lit in the power saving mode during standby.
For this reason, the main screen is configured as a so-called transmissive pixel, and the sub-screen is configured as a so-called total reflection or partially transmissive pixel.

In such a tendency, for example, the one shown in Patent Document 1 below is known. That is, in Patent Document 1, in the first embodiment, as shown in FIGS. 1 and 2, a part of the liquid crystal display area is a reflective area (51), and a part is a combined reflective / transmissive area (52). It is configured as. In this case, the backlight is arranged so as to overlap only with the reflection / transmission area (52), and is not provided below the reflection area (51).
Further, as shown in FIG. 7, the second embodiment discloses that the reflection / transmission combined region (52) is configured as a transmission region.

JP 2002-303863 A

However, in the above-described configuration, the light from the backlight is not contributed at all in the reflection region, and in some situations, the display is unavoidable. It was.
Therefore, even in the reflection type pixel, if necessary, it is desirable to have a configuration in which the light from the backlight also contributes, but at that time, it is wise to avoid complication of the pixel configuration. .
The present invention has been made based on such circumstances, and the object thereof is a liquid crystal display device configured to contribute light from a backlight to a reflection type pixel even in a simple configuration. Is to provide.

  Of the inventions disclosed in this application, the outline of typical ones will be briefly described as follows.

(1)
The liquid crystal display device according to the present invention includes, for example, a first substrate, a second substrate disposed closer to an observer side than the first substrate, the first substrate, and the second substrate. A liquid crystal display device having a liquid crystal sandwiched between and a backlight disposed on a side opposite to the liquid crystal of the first substrate,
A first display area in which a plurality of first pixels are arranged; and a second display area in which a plurality of second pixels are arranged;
When performing display by transmitting light incident from the first substrate side, the transmission efficiency of the first pixel is lower than the transmission efficiency of the second pixel,
When performing display by reflecting light incident from the second substrate side, the reflection efficiency of the first pixel is higher than the reflection efficiency of the second pixel,
When viewed in plan, the backlight overlaps both the first display area and the second display area,
The second substrate has a reflective film that reflects light incident from the first substrate side,
The first pixel performs display by reflecting light incident from the first substrate side reflected by the reflective film of the second substrate toward the second substrate side.

(2)
The liquid crystal display device according to the present invention is based on, for example, the configuration of (1), and the reflection film of the second substrate reflects light incident from a gap between two adjacent first pixels. It is characterized by.

(3)
The liquid crystal display device according to the present invention is based on, for example, the configuration (1) or (2), and the reflective film of the second substrate overlaps with a gap between two adjacent first pixels. It is characterized by being formed.

(4)
The liquid crystal display device according to the present invention is premised on, for example, any one of the constitutions (1) to (3), and the reflective films of the second substrate are incident from the first substrate side and are adjacent to each other. It also serves as a light-shielding film that shields light that has passed through the gap between the two first pixels from directly passing through the second substrate and reaching the viewer.

(5)
The liquid crystal display device according to the present invention is premised on, for example, any one of the constitutions (1) to (4), and the reflection film of the second substrate receives light incident from the first substrate side. It has an inclined part that reflects toward one pixel.

(6)
The liquid crystal display device according to the present invention is premised on, for example, any one of the constitutions (1) to (5), and the first pixel is characterized in that almost the entire area in one pixel is a reflective display region. .

(7)
The liquid crystal display device according to the present invention is premised on, for example, any one of the constitutions (1) to (6), and the second pixel has a reflective display region and a transmissive display region in one pixel. And

(8)
The liquid crystal display device according to the present invention is premised on, for example, any one of the constitutions (1) to (6), and the second pixel is characterized in that almost the entire area of one pixel is a transmissive display region. .

  In addition, this invention is not limited to the above structure, A various change is possible in the range which does not deviate from the technical idea of this invention.

Embodiments of a liquid crystal display device according to the present invention will be described below with reference to the drawings.
FIGS. 1A and 1B are a front view and a side view, respectively, showing an embodiment of a liquid crystal display device according to the present invention.

  First, as shown in FIG. 1A, the liquid crystal display device includes a display unit AR in a central portion excluding a slight periphery thereof, and the display unit AR is a reflective display unit (hereinafter referred to as a reflective display unit). ARr) and a transmissive display portion (hereinafter referred to as a transmissive display portion) ARt.

The reflective display area ARr is formed by arranging reflective pixels in a matrix, and the transmissive display area ARt is formed by arranging transmissive pixels in a matrix.
In this embodiment, each pixel of the reflective display area ARr is configured to have a slight transmission part (fine transmission part), and each pixel of the transmission type display ARt has a slight reflection part (fine reflection part). It is comprised so that it may have. The configuration of each of these pixels will be described in detail later.

  The reflective display area ARr and the transmissive display area ARt are divided by using the display area AR as a boundary, for example, with a virtual line segment in the x direction in the figure. The area occupied by the reflective display area ARr is formed smaller than the area occupied by the transmissive display area ARt. This is because the transmissive display unit ARt is used as a main image plane, whereas the reflective display unit ARr is used as a sub-image plane.

  In the display portion AR, for example, a gate signal line (not shown) extending in the x direction and arranged in parallel in the y direction, and a drain signal line extending in the y direction and arranged in parallel in the x direction. (Not shown) are formed, and pixels are formed in regions surrounded by these signal lines.

  Each pixel has a thin film transistor (not shown) turned on by a signal (scanning signal) from a gate signal line, and a pixel electrode (not shown) to which a signal (video signal) from a drain signal line is supplied via the thin film transistor. And a counter electrode (not shown) for generating an electric field in the liquid crystal with this pixel electrode.

  A driver circuit DR for driving each of the pixels in the display unit AR is formed on a part of the outer periphery of the display unit AR. The driver circuit DR sends a scanning signal to the gate signal line and a drain signal line to the driver signal DR. A video signal is supplied.

  The driver circuit DR includes a semiconductor device made of amorphous silicon, for example, and is formed at the same time as the thin film transistor TFT formed in each pixel of the display portion AR, for example.

  As shown in FIG. 1 (b), the liquid crystal display device uses transparent substrates SUB1 and SUB2 arranged with liquid crystal interposed therebetween as an envelope, and the viewer side surface has the transparent substrate SUB2 side. The optical compensation film OCF2 and the polarizing plate POL2 are disposed on the surface opposite to the surface on the viewer side, and the optical compensation film OCF1 and the polarizing plate POL1 are disposed on the surface opposite to the observer side from the transparent substrate SUB1 side.

  Although shown separately in FIG. 1B, the optical compensation film OCF2 is attached to the transparent substrate SUB2, and the polarizing plate POL2 is attached to the optical compensation film OCF2 and arranged. OCF1 is attached to the transparent substrate SUB1, and the polarizing plate POL1 is attached to the optical compensation film OCF1.

  Further, a backlight BL is disposed on the back surface (the surface opposite to the viewer side) of the liquid crystal display device, and this backlight BL faces at least the reflective display portion ARr and the transmissive display portion ARt of the liquid crystal display device. The size is arranged.

  As described above, the liquid crystal display device configured as described above is configured to have a small transmission part (slight transmission part) in each pixel of the reflection type display unit ARr, and slightly in each pixel of the transmission type display ARt. It is comprised so that it may have a reflective part (fine reflection part). For this reason, when performing display by transmitting light incident from the transparent substrate SUB1 side, the transmission efficiency of each pixel of the reflective display area ARr is lower than the transmission efficiency of each pixel of the transmissive display ARt, When displaying by reflecting light incident from the transparent substrate SUB2 side, the reflection efficiency of each pixel of the reflective display area ARr is higher than the reflection efficiency of each pixel of the transmissive display ARt. It has become.

FIG. 2 is a plan view illustrating an example of a transmissive pixel formed in the transmissive display unit ARt. As described above, this pixel is configured to have a small number of reflection portions (fine reflection portions). A sectional view taken along line IV-IV in FIG. 2 is shown in FIG.
The pixel shown in FIG. 2 is formed in a region surrounded by a pair of gate signal lines GL extending in the x direction in the drawing and a pair of drain signal lines DL extending in the y direction in the drawing.

  Most of this pixel area is formed as a transmissive area TR, but a reflective area RR is formed in a partial area on one side of a virtual line segment extending in the x direction in the figure. It has come to be.

  First, the gate signal line GL extending in the x direction in the figure is formed on the liquid crystal side surface (main surface) of the transparent substrate SUB1. The gate signal line GL has a portion that extends into the pixel region and becomes thick in a part of the pixel region. This portion forms a gate electrode GT of a thin film transistor TFT described later.

  In addition, a storage capacitor signal line CPL is formed adjacent to one gate signal line GL (gate signal line GL positioned on the lower side in the drawing) of the pair of gate signal lines GL surrounding the pixel. The storage capacitor signal line CPL has a portion that is largely extended from both sides in the pixel region. In other words, the storage capacitor signal line CPL has a portion that has a larger width than the portion that intersects the gate signal line GL. The wide portion constitutes one electrode of each electrode of a capacitive element CD described later.

A first insulating film GI (see FIG. 4) is formed on the main surface of the transparent substrate SUB1 so as to cover the gate signal line GL. This insulating film functions as a gate insulating film in the formation region of the thin film transistor TFT, and the film thickness is set in accordance with this.
In the formation region of the thin film transistor TFT on the surface of the insulating film GI, for example, amorphous silicon serving as the semiconductor layer AS of the thin film transistor TFT is formed.

  The formation region of the thin film transistor TFT is provided in the vicinity of one drain signal line DL (the drain signal line DL on the left side in the figure) of a pair of drain signal lines DL (described later) surrounding the pixel region, and the semiconductor layer AS is in proximity. The drain signal line DL is formed in an integrated manner extending to the intersection with the gate signal line. This is because consideration is given to the formation of a drain signal line DL, which will be described later, in order to prevent a step break at a step portion in the gate signal line GL.

  The same consideration is also made at the intersection of the storage capacitor signal line CPL and the drain signal line DL, and the semiconductor layer AS formed here is formed separately from the semiconductor layer AS of the thin film transistor TFT.

  In the semiconductor layer ASt in the region where the thin film transistor TFT is formed, the thin film transistor TFT is formed by forming the drain electrode and the source electrode on the surface thereof. The drain electrode and the source electrode are, for example, the drain signal line DL It is formed at the same time as forming.

  That is, the drain signal line DL extending in the y direction in the drawing is formed, and a part of the drain signal line DL extends on the surface of the semiconductor layer ASt, whereby the drain electrode DT is formed. ing. At this time, the source electrode ST is formed at a distance corresponding to the channel length of the drain electrode DT and the thin film transistor TFT.

Here, the source electrode ST extends to the outside of the formation region of the semiconductor layer AS, and is formed so as to overlap almost the entire region of the storage capacitor signal line CPL formed as a relatively large area in the pixel region. . As described above, the storage capacitor signal line CPL constitutes one of the electrodes of the later-described capacitor element CD, and the extending portion of the source electrode ST overlapping therewith is also one of the electrodes of the capacitor element CD. Is configured. In this case, the insulating film GI interposed between these electrodes constitutes one dielectric film of the capacitive element CD.
Thereby, the source electrode ST is formed in most of the reflective region PR and functions as the reflective film RP.

  The reason why the insulating film GI is referred to as one dielectric film of the capacitive element CD is that the capacitive element CD is composed in a complex manner as will be described later. This is because the pixel electrode PX (T) is also used as the remaining electrode.

  A second insulating film INS2 is formed on the main surface of the transparent substrate SUB1 so as to cover the drain signal line DL and the source electrode ST (see FIG. 4). The second insulating film INS2 constitutes another dielectric film of the capacitive element CD, and the film thickness is set based on this.

  A pixel electrode PX (T) is formed on the surface of the second insulating film INS2. The pixel electrode PX (T) is formed of a light-transmitting conductive film such as ITO (Indium Tin Oxide), for example, and the entire central region excluding a slight periphery of the pixel region, that is, any of the reflection region RR and the transmission region TR. Also formed.

  The pixel electrode PX (T) is connected to the extending portion of the source electrode ST through a through hole TH formed in advance in the second insulating film INS2 in a part of the reflection region PR. Accordingly, when the thin film transistor TFT is turned on by a signal (scanning signal) from the gate signal line GL, a signal (video signal) from the drain signal line DL passes through the extending portion of the source electrode ST via the thin film transistor TFT. It is supplied to the pixel electrode PX (T).

  A capacitive element using the second insulating film INS as a dielectric film is formed between the extending portion of the source electrode ST and the pixel electrode PX (T) formed over the extended portion. It is configured as one capacitive element combined with SD. As a result, the capacitive element SD is configured to have a relatively large capacitance.

  An alignment film ORI1 (see FIG. 4) is formed on the main surface of the transparent substrate SUB1 so as to cover the pixel electrode PX (T). This alignment film ORI1 is a film that is in direct contact with the liquid crystal LC, and regulates the initial alignment of liquid crystal molecules.

  A black matrix BM is first formed on the liquid crystal side surface (main surface) of the counter substrate SUB2 disposed to face the transparent substrate SUB1 via the liquid crystal LC, as shown in FIG. As shown in FIG. 2, the black matrix BM is formed so as to sufficiently cover the gate signal line GL and the drain signal line DL, and the outline of the opening in the pixel region formed thereby. Is configured to delineate a region that substantially functions as a pixel. The black matrix BM is made of a material such as a resin. However, it goes without saying that it may be made of a metal or the like having good reflection efficiency.

A color filter CF is formed in the opening of the black matrix BM. The color filter CF is usually formed over the entire area of the opening of the black matrix BM. In this embodiment, a part called a color hole CHL having a part opened in the reflective region PR is provided. It has been. This is to brighten the light passing through the color filter CF.
A planarization film OC is formed so as to cover the black matrix BM and the color filter CF.

  Further, a protrusion PRJ (the top is flattened) is formed in a region corresponding to the reflective region PR on the upper surface of the planarizing film OC. This projection PRJ is provided in order to reduce the layer thickness of the liquid crystal LC in the reflective region PR than in the transmissive region TR. The optical distance is made substantially equal to the optical distance in the transmissive region TR.

  A counter electrode CT made of, for example, ITO is formed on the surface of the flattening film OC including the protrusion PRJ, and an alignment film ORI2 is formed on the surface of the counter electrode CT.

  FIG. 3 is a plan view showing an embodiment of a reflective pixel formed in the reflective display area ARr. As described above, this pixel is configured to have a slight transmissive portion (slight transmissive portion). FIG. 5 shows a cross-sectional view taken along the line VV in FIG. 3, and FIG. 6 shows a cross-sectional view taken along the line VI-VI.

  3 also includes a pair of gate signal lines GL extending in the x direction in the drawing and a pair of drain signal lines DL extending in the y direction in the drawing, as in the case of the pixel shown in FIG. It is formed in the enclosed area.

  Most of this pixel region is formed as a reflective region PR, but a transmissive region TR is formed in the region between the pixel electrode PX functioning as a reflective film in the vicinity of the drain signal line DL. It is like that.

  The transmissive region TR is not specially formed in a substantial pixel region (for example, an opening portion of the black matrix BM), but is formed to face the formation portion of the black matrix BM. The meaning of the light passage from BL is strong.

Compared with the configuration of the pixel shown in FIG. 2, the pixel electrode PX (Al) is formed of a reflective film, the protrusion PRJ is formed in most of the pixel region, and the transparent substrate SUB2 There is a great difference in that a reflective film is provided on the surface on the liquid crystal side, and the remainder is substantially similar.
However, the pixel shown in FIG. 3 will be described below without omitting duplication.

  First, the gate signal line GL extending in the x direction in the figure is formed on the liquid crystal side surface (main surface) of the transparent substrate SUB1. The gate signal line GL has a portion that extends into the pixel region and becomes thick in a part of the pixel region. This portion forms a gate electrode GT of a thin film transistor TFT described later.

  In addition, a storage capacitor signal line CPL is formed adjacent to one gate signal line GL (gate signal line GL positioned on the lower side in the drawing) of the pair of gate signal lines GL surrounding the pixel. The storage capacitor signal line CPL has a portion that is largely extended from both sides in the pixel region. In other words, the storage capacitor signal line CPL has a portion that has a larger width than the portion that intersects the gate signal line GL. The wide portion constitutes one electrode of each electrode of a capacitive element CD described later.

  A first insulating film GI (see FIGS. 5 and 6) is formed on the main surface of the transparent substrate SUB1 so as to cover the gate signal line GL. This insulating film functions as a gate insulating film in the formation region of the thin film transistor TFT, and the film thickness is set in accordance with this.

  In the formation region of the thin film transistor TFT on the surface of the insulating film GI, for example, amorphous silicon serving as the semiconductor layer AS of the thin film transistor TFT is formed.

  The formation region of the thin film transistor TFT is provided in the vicinity of one drain signal line DL (the drain signal line DL on the left side in the figure) of a pair of drain signal lines DL (described later) surrounding the pixel region, and the semiconductor layer AS is in proximity. The drain signal line DL is formed in an integrated manner extending to the intersection with the gate signal line. This is because consideration is given to the formation of a drain signal line DL, which will be described later, in order to prevent a step break at a step portion in the gate signal line GL.

  The same consideration is also made at the intersection of the storage capacitor signal line CPL and the drain signal line DL, and the semiconductor layer AS formed here is formed separately from the semiconductor layer AS of the thin film transistor TFT.

  In the semiconductor layer ASt in the region where the thin film transistor TFT is formed, the thin film transistor TFT is formed by forming the drain electrode and the source electrode on the surface thereof. The drain electrode and the source electrode are, for example, the drain signal line DL It is formed at the same time as forming.

  That is, the drain signal line DL extending in the y direction in the drawing is formed, and a part of the drain signal line DL extends on the surface of the semiconductor layer ASt, whereby the drain electrode DT is formed. ing. At this time, the source electrode ST is formed at a distance corresponding to the channel length of the drain electrode DT and the thin film transistor TFT.

  Here, the source electrode ST extends to the outside of the formation region of the semiconductor layer AS, and is formed so as to overlap almost the entire region of the storage capacitor signal line CPL formed as a relatively large area in the pixel region. . As described above, the storage capacitor signal line CPL constitutes one of the electrodes of the later-described capacitor element CD, and the extending portion of the source electrode ST overlapping therewith is also one of the electrodes of the capacitor element CD. Is configured. In this case, the insulating film GI interposed between these electrodes constitutes one dielectric film of the capacitive element CD.

  In the pixel shown in FIG. 2, the electrode corresponding to the source electrode ST is configured to function as the reflective film RP. However, in the pixel shown in FIG. 3, the function is not performed at all. This is because the pixel electrode PX (Al), which will be described later, formed on the upper layer covering the source electrode ST plays a role.

  The reason why the insulating film GI is referred to as one dielectric film of the capacitive element CD is that the capacitive element CD is composed in a complex manner as will be described later. This is because the pixel electrode PX (Al) is also used as the remaining electrode.

  A second insulating film INS2 is formed on the main surface of the transparent substrate SUB1 so as to cover the drain signal line DL and the source electrode ST (see FIGS. 5 and 6). The second insulating film INS2 constitutes another dielectric film of the capacitive element CD, and the film thickness is set based on this.

  A pixel electrode PX (Al) is formed on the surface of the second insulating film INS2. The pixel electrode PX (Al) is formed of a conductive film having good reflection efficiency, such as Al, and is formed in the entire central portion excluding a slight periphery of the pixel region.

  As a result, the pixel electrode PX (Al) which is also in the region of the opening of the black matrix BM formed on the transparent substrate SUB2 side and also serves as a reflective film is formed in the entire region.

  The pixel electrode PX (Al) is connected to the extending portion of the source electrode ST through a through hole TH formed in advance in the second insulating film INS2 in a part of the reflection region PR. Accordingly, when the thin film transistor TFT is turned on by a signal (scanning signal) from the gate signal line GL, a signal (video signal) from the drain signal line DL passes through the extending portion of the source electrode ST via the thin film transistor TFT. The pixel electrode PX (Al) is supplied.

  A capacitive element using the second insulating film INS as a dielectric film is formed between the extending portion of the source electrode ST and the pixel electrode PX (Al) formed to overlap therewith. It is configured as one capacitive element combined with SD. As a result, the capacitive element SD is configured to have a relatively large capacitance.

  An alignment film ORI1 (see FIGS. 5 and 6) is formed on the main surface of the transparent substrate SUB1 so as to cover the pixel electrode PX (Al). This alignment film ORI1 is a film that is in direct contact with the liquid crystal LC, and regulates the initial alignment of liquid crystal molecules.

  As is clear from the above description, in the configuration on the transparent substrate SUB1 side, the pixel electrode PX (Al) is formed of a metal having a non-transparent reflection function as compared with the pixel shown in FIG. It is almost the same except that there is. For this reason, it is the structure which can avoid the complexity of manufacture.

  A black matrix BM is first formed on the liquid crystal side surface (main surface) of the counter substrate SUB2 that is disposed to face the transparent substrate SUB1 via the liquid crystal LC, as shown in FIGS. As shown in FIG. 2, the black matrix BM is formed so as to sufficiently cover the gate signal line GL and the drain signal line DL, and the outline of the opening in the pixel region formed thereby. Is configured to delineate a region that substantially functions as a pixel.

  The black matrix BM has a function as a reflection film in addition to a function as a light shielding film. For example, it is formed by laminating Cr layers in multiple layers (for example, three layers). The reason for this will be described in detail later.

A color filter CF is formed in the opening of the black matrix BM. The color filter CF is normally formed over the entire opening of the black matrix BM. In this embodiment, for example, a so-called color hole CHL made up of an opening cut in the x direction in the figure at the approximate center of the pixel region. The part called is provided. This is to brighten the light that has passed through the color filter CF.
A planarization film OC is formed so as to cover the black matrix BM and the color filter CF.

  Further, a protrusion PRJ (the top is flattened) is formed on the upper surface of the planarizing film OC in a region corresponding to the reflective region PR. This projection PRJ is provided in order to reduce the layer thickness of the liquid crystal LC in the reflective region PR than in the transmissive region TR. The optical distance is made substantially equal to the optical distance in the transmissive region TR.

  A counter electrode CT made of, for example, ITO is formed on the surface of the flattening film OC including the protrusion PRJ, and an alignment film ORI2 is formed on the surface of the counter electrode CT.

  The cross-sectional view shown in FIG. 6 is a diagram showing a path LP of transmitted light from the backlight BL side to the observer side in the transmissive region TR described above.

  The transmissive region TR is formed as a slight region on both sides of the drain signal line DL and between the pixel electrode PX. In other words, the transmissive region TR is formed in the gap between two adjacent pixels. Therefore, the transmissive region TR is formed outside the substantial pixel region (region in the opening of the black matrix BM) (region facing or overlapping with the black matrix BM).

Here, as described above, since the black matrix BM functions as a reflective film, the light incident from the transmissive region TR is reflected by the black matrix BM. The reflected light is directed to the pixel electrode PX side.
In this way, the light incident on the pixel electrode PX is reflected by the pixel electrode PX and is emitted through the openings of the black matrix BM.

FIG. 7 is a diagram corresponding to FIG. 6, and is a schematic diagram drawn so that the arrangement relationship of the drain signal line DL, the pixel electrode PX, and the black matrix BM that regulates the path L of transmitted light can be clearly understood.
FIG. 8 is a block diagram showing another embodiment of the liquid crystal display device according to the present invention and is shown as a diagram corresponding to FIG.

  That is, in FIG. 8, the black matrix BM has a triangular cross section having a top so as to face the central axis along the longitudinal direction of the drain signal line DL facing the black matrix BM. In other words, the black matrix BM is configured to have a slope (inclined portion) on each pixel side on both sides with respect to the longitudinal direction, and the inclined surface (inclined portion) is incident on both sides of the drain signal line DL. Is formed as a reflecting surface that guides the pixel to the pixel electrode PX side.

  Since the black matrix BM having such a configuration can be configured as a layered body whose thickness changes, it can be easily formed by applying a so-called half exposure technique.

  That is, for example, a light-shielding film of a photomask is provided with a pattern in which a plurality of linear light-shielding films are arranged in parallel. Thus, a mask made of a photoresist having a different film thickness can be formed on the upper surface of the film to be etched.

  Then, by etching the film to be etched while also etching the mask, the patterned film to be etched can be formed with different thicknesses.

  Each of the embodiments described above may be used alone or in combination. This is because the effects of the respective embodiments can be achieved independently or synergistically.

It is the top view and side view which show one Example of the liquid crystal display device by this invention. It is a top view which shows one Example of the transmissive pixel formed in the transmissive display part of the display part of the liquid crystal display device by this invention. It is a top view which shows one Example of the reflection type pixel formed in the reflection type display part of the display part of the liquid crystal display device by this invention. It is sectional drawing in the IV-IV line of FIG. It is sectional drawing in the VV line of FIG. It is sectional drawing in the VI-VI line of FIG. It is sectional drawing which showed the structure of FIG. 6 typically. It is sectional drawing which shows the other Example of the liquid crystal display device by this invention, and is a figure corresponding to FIG.

Explanation of symbols

SUB ... Transparent substrate, OCF ... Optical compensation film, POL ... Polarizing plate, GL ... Gate signal line, DL ... Drain signal line, TFT ... Thin film transistor, DT ... Drain electrode, ST ... Source electrode, PX ... Pixel electrode, ORI ... Alignment film, BM ... Black matrix, CF ... Color filter, OC ... Flattening film, PRJ ... Projection, CT ... Counter electrode.

Claims (8)

A first substrate, a second substrate disposed closer to the viewer side than the first substrate, a liquid crystal sandwiched between the first substrate and the second substrate, A liquid crystal display device having a backlight disposed on a side opposite to the liquid crystal of the first substrate,
A first display area in which a plurality of first pixels are arranged; and a second display area in which a plurality of second pixels are arranged;
When performing display by transmitting light incident from the first substrate side, the transmission efficiency of the first pixel is lower than the transmission efficiency of the second pixel,
When performing display by reflecting light incident from the second substrate side, the reflection efficiency of the first pixel is higher than the reflection efficiency of the second pixel,
When viewed in plan, the backlight overlaps both the first display area and the second display area,
The second substrate has a reflective film that reflects light incident from the first substrate side,
The first pixel performs display by reflecting light incident from the first substrate side reflected by the reflective film of the second substrate toward the second substrate side. Display device.   2. The liquid crystal display device according to claim 1, wherein the reflective film of the second substrate reflects light incident from a gap between two adjacent first pixels.   3. The liquid crystal display device according to claim 1, wherein the reflective film of the second substrate is formed at a position overlapping with a gap between two adjacent first pixels. 4.   In the reflection film of the second substrate, light that has entered from the first substrate side and passed through the gap between the two adjacent first pixels passes directly through the second substrate to an observer. 4. The liquid crystal display device according to claim 1, wherein the liquid crystal display device also serves as a light-shielding film that shields the light from reaching the light source.   The reflective film of the second substrate has an inclined portion that reflects light incident from the first substrate side toward the first pixel. The liquid crystal display device described.   6. The liquid crystal display device according to claim 1, wherein the first pixel has a reflective display region almost entirely within one pixel.   The liquid crystal display device according to claim 1, wherein the second pixel has a reflective display region and a transmissive display region in one pixel.   7. The liquid crystal display device according to claim 1, wherein substantially the entire area of the second pixel is a transmissive display area. 8.

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