JP2007127839A - Pattern data conversion method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To prevent unnecessary increase in data correction processing time without changing a process tool in a pattern data conversion method. <P>SOLUTION: When a drawing pattern is converted from design data to manufacture data, the direction of a figure pattern 1 in the design data is determined according to an advantageous process direction of the pattern data process tool to be used. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a pattern data conversion method, and in particular, when a pattern to be drawn on a reticle is converted from design data to manufacturing data for actual exposure, the conversion speed is increased without converting a conversion tool. The present invention relates to a pattern data conversion method characterized by a technique for performing the above.

  With the recent improvement in the degree of integration of semiconductor integrated circuit devices, high-precision pattern formation technology is required to form a high-precision semiconductor integrated circuit pattern. In high-precision pattern formation, optical proximity effect correction ( Pattern data correction processing such as OPC) is applied.

  This pattern data correction processing employs a method of generating a correction pattern on a mask pattern in order to optically correct a pattern on a reticle and realize a target wafer transfer image.

  Since this correction process requires several times to several tens of times longer than the normal rectangle creation process, it is necessary to shorten the processing time while effectively utilizing existing resources (equipment / processing license, etc.).

  In conventional pattern data correction processing, a pattern for correcting design data created by a designer is ruled, and a correction pattern is generated in reticle pattern data based on a correction pattern generation rule.

  In such pattern data correction processing, the correction processing time greatly increases with the miniaturization of the semiconductor integrated circuit pattern, and therefore further reduction in processing time is required.

  Various proposals have been made to shorten such processing time.For example, a portion of graphic data to be selectively corrected by a plane scanning method is extracted from photomask pattern data at a higher speed than in the past, It has been proposed that a correction value included in a correction table corresponding to an extracted figure data portion is searched at high speed using a hash function, and correction is performed based on the searched correction value (for example, see Patent Document 1). ).

Alternatively, the edges of the mask pattern whose line width is less than or equal to the predetermined dimension are extracted, a central figure having a predetermined dimension width is generated based on the center between the extracted edges, and a mask pattern whose line width is less than or equal to the predetermined dimension is generated. It has also been proposed to reduce the processing time by replacing the center graphic with the corrected pattern without using a correction table (for example, see Patent Document 2).
JP 2001-281836 A JP 2004-252023 A

  However, when executing the data correction process, the processing tool (Tool) algorithm (speciality in processing, etc.) was executed without being conscious of it. Had the problem of enormous processing time.

  For example, after using a tool to correct pattern data with a large amount of horizontal patterns for 2.73 hours, turn the pattern direction 90 ° to convert it into pattern data with a large number of vertical patterns. When the correction process was performed, the processing time was shortened to 2.49 hours, which was reduced by about 10%.

  In other words, when data correction processing is performed using a processing tool that is good at processing vertical pattern data, processing time is increased when pattern data with many horizontal patterns is processed without being aware of the processing tool algorithm. Will increase unnecessarily.

  In particular, since the pattern data correction processing of the semiconductor integrated circuit device requires a processing time of several days as a whole, an unnecessary increase in the processing time becomes a problem and rebounds as an increase in product cost.

  Therefore, an object of the present invention is to prevent an unnecessary increase in data correction processing time without changing a processing tool in creating mask pattern data.

FIG. 1 is a diagram illustrating the basic configuration of the present invention. Means for solving the problems in the present invention will be described with reference to FIG.
In addition, the code | symbol 4,5,6 in a figure is the manufacturing figure pattern after conversion, and a manufacturing individual pattern, respectively.
Refer to FIG. 1. In order to solve the above problem, according to the present invention, in the pattern data conversion method, when converting a drawing pattern from design data to manufacturing data, according to the processing direction proficiency of a pattern data processing tool used, The direction of the graphic pattern 1 in the design data is set.

  In this way, the orientation of the graphic pattern 1 is set so that the number of graphic patterns 1 in the processing direction of the pattern data processing tool is increased in consideration of the processing direction proficiency of the pattern data processing tool used for pattern data conversion in advance. As a result, an unnecessary increase in data processing time can be prevented.

  Such a pattern data conversion method is suitable for performing optical proximity effect correction on a drawing pattern when converting the drawing pattern from design data to manufacturing data, and unnecessarily increases the processing time required for optical proximity effect correction. Can be prevented.

  In this case, in the step of setting the orientation of the graphic pattern 1 in the design data, the graphic pattern 1 is decomposed into vectors for each of the individual patterns 2 and 3 by drawing the outer periphery of the individual patterns 2 and 3 with a single stroke. It is desirable to provide a step of extracting the length / width length ratio of the individual patterns 2 and 3 using the direction and length, and the length / width length of the individual patterns 2 and 3 by a simple method. A ratio can be obtained.

  Further, based on the vertical / horizontal length ratio of the acquired individual patterns 2 and 3, it may be accumulated as the entire drawing pattern to determine whether or not to convert the orientation of the entire graphic pattern 1, Alternatively, whether or not to convert the orientation of the graphic pattern 1 may be determined for each individual pattern 2 and 3, and when the conversion is performed for each individual pattern 2 and 3, the processing time is surely shortened. Can do.

  In this case, when the vertical / horizontal length ratio of the drawing pattern is 0.5 or more in the processing direction in which the pattern data processing tool is not good, the figure pattern 1 in the design data is displayed. Direction conversion may be performed, thereby reliably preventing an unnecessary increase in data correction processing time.

  Alternatively, when the vertical / horizontal length ratio of the drawing pattern is less than 0.5 in the processing direction in which the pattern data processing tool is not good, the orientation of the graphic pattern 1 in the design data This conversion may not be performed, and the processing time required for converting the orientation of the graphic data and the improvement in the data conversion processing time are offset.

  By adopting the pattern data conversion method described above, it is possible to construct a pattern data conversion system that can always perform data conversion processing at the optimum speed of the pattern data processing tool, thereby eliminating the need for data processing time. Can be reliably prevented.

  In the present invention, the processing time of the processing pattern data is recognized by rotating the data in the direction to be processed at a high speed by each processing tool and performing the correction processing, thereby reducing the processing time compared to the conventional method. Unnecessary increase can be eliminated, and it greatly contributes to shortening of reticle production.

  In addition, depending on the pattern data correction tool, the amount of output data can be reduced by processing in the direction that you are good at. Is also effective.

  The present invention provides a graphic pattern in the design data according to the processing direction proficiency of a pattern data processing tool used when converting a drawing pattern from design data to manufacturing data in EB data conversion or optical proximity effect correction processing. In this case, the figure pattern is decomposed into vectors for each individual pattern by dividing the outer periphery of the individual pattern into a vector with a single stroke, and using the direction and length of the vector, The vertical / horizontal length ratio is extracted, and the entire drawing pattern is accumulated based on the extracted vertical / horizontal length ratio of the individual pattern to determine whether or not to convert the orientation of the entire graphic pattern. Alternatively, it is determined whether or not to convert the orientation of the graphic pattern for each individual pattern.

  When determining the conversion, the vertical / horizontal length ratio of the drawing pattern is 0.5 or more in the processing direction in which the pattern data processing tool is not good. The orientation of the graphic pattern in the design data may be converted, or the vertical / horizontal length ratio of the drawing pattern is the vertical / horizontal length ratio in the processing direction that the pattern data processing tool is not good at. Is less than 0.5, the orientation of the graphic pattern in the design data may not be converted.

Here, the EB data conversion method according to the first embodiment of the present invention will be described with reference to FIGS.
See FIG. 2 and FIG.
2 and 3 are diagrams showing a processing flow of the EB data conversion method according to the first embodiment of the present invention. First, various types of information (Data information, Topfig information, Layer information) are defined and designed. Read data.

  The data information means the version number (sequential number) of design data, and is information for identifying each design data, and identifies design data to be processed selected from among various design data. Therefore, this Data information is defined.

  The top fig information is located at the top of the cell hierarchy configured in a tree structure of FIG (structure cell block), and it is necessary to acquire the top fig information specified in the process in the data conversion process. There is.

See Figure 4
FIG. 4 is a conceptual explanatory diagram of the FIG structure, in which cell blocks in each layer are arranged in a tree shape, and the cell block constituting the uppermost layer is a Topfig.

See Figure 5
FIG. 5 is an explanatory diagram of a graphic pattern as viewed from Topfig. Here, as an example, UNIT-A consisting of a wind symbol pattern, UNIT-B consisting of a minute rectangular pattern, and UNIT-C consisting of a concave pattern are shown. ing.

  The Layer information means a level code of a layer, and is information that is acquired to specify a layer to be processed when there are a plurality of layers in the design data and the FIG.

See FIG.
Next, the vertical / horizontal ratio of the pattern data is extracted. The vertical / horizontal ratio of the pattern data is determined based on the direction and length of the pattern data vector. In this case, the pattern data is a processing target. The outer periphery of the figure pattern is broken down into vectors with a single stroke.

Next, the vertical / horizontal ratio is extracted using the direction and length of the vector. Since the vector direction is always “number of horizontal directions = number of vertical directions”, the vertical / horizontal length Extract the ratio.
At this time, it is discriminated whether the direction of the vector is right / left or top / bottom, that is, vertical or horizontal, and the distinction between upward / downward and left / right is ignored, and the total length of the vertical vector and the horizontal Take the ratio to the sum of the vectors.

In FIG. 6, an F-shaped pattern of UNIT-F is shown as an example. In this pattern data, there are 10 sides a to j, and the ratio of vertical / horizontal is vertical: horizontal = 10: 14 and it is determined that the figure pattern has a lot of horizontal orientation.
In the figure, the unit of length is roughly shown to simplify the explanation, but in an actual pattern, a more detailed numerical value is taken.

See FIG.
FIG. 7 is an explanatory diagram of the vertical / horizontal ratio of other pattern data. In the upper diagram, vertical = horizontal, in the middle diagram, vertical <horizontal, and in the lower diagram, vertical> Lie down.

Again see FIGS. 2 and 3
In addition, regarding the Tool for EB data conversion processing, information (algorithm) such as whether each Tool is good at the vertical or horizontal is registered in advance, and the data after the Tool selection is rotated (vertical / Determine whether to change the horizontal orientation.

  That is, there are cases where the data conversion process is performed as it is without rotating the design data at the time of input due to the pros and cons of the processing direction of the selected tool. In some cases, it is used as data. When rotated, the manufacturing data after data conversion is reversely rotated to return the direction of the data and output the data.

See FIG.
FIG. 8 is an explanatory diagram in the case of rotating the design data. Here, the graphic pattern of FIG. 5 described above will be described as an example of the design data.
The aspect ratio of the entire graphic pattern in this case is as follows: UNIT-A is vertical: horizontal = 54: 88, vertical <horizontal, UNIT-B is vertical: horizontal = 20: 12, vertical> horizontal, and UNIT-C is Vertical: horizontal = 12:10, vertical> horizontal, but overall, vertical: horizontal = 90: 110, so vertical <horizontal.

At this time, if the processing tool used is good at processing in the vertical direction, the graphic pattern is rotated by 90 ° to perform data conversion processing as an input graphic.
In the figure, it is rotated 90 ° clockwise, but it may be rotated 90 ° counterclockwise.

This rotation process changes the aspect ratio from 90: 110 to 110: 90. Therefore, when the horizontal processing time is x times the vertical processing time, the time taken by (90 + 110x) is (110 + 90x), which is improved by (20x-20) / (90 + 110x).
Incidentally, when x = 1.5, the improvement is about 4%, when x = 2, the improvement is about 6.5%, and when x = 10, the improvement is about 15%. The

  Next, the graphic pattern of the manufacturing data that has been converted into data is reversely rotated by 90 ° to return the direction of the data, and the data is output as manufacturing data.

See FIG.
FIG. 9 is an explanatory diagram when the design data is not rotated. Here, since the processing tool to be used is good at processing in the horizontal direction, the figure of the design data with vertical: horizontal = 90: 110 The pattern is inputted as it is without rotating, and the data-converted figure pattern is outputted as production data as it is.

  As described above, according to the first embodiment of the present invention, the processing tool of the processing tool used for data conversion is acquired in advance, whereby the vertical-horizontal conversion of the design data to be converted is processed in the processing direction of the processing tool. By performing according to the specialty, it is possible to eliminate an unnecessary increase in the processing time as compared with the case where data processing is performed randomly without being aware of the processing direction proficiency of the processing tool.

Next, an EB data conversion processing method according to the second embodiment of the present invention will be described with reference to FIGS.
In the case of the above-described first embodiment, the entire area of the chip is targeted as a processing area. However, in this second embodiment, each UNIT is targeted, and the method for acquiring the aspect ratio and the data conversion are used. The processing itself is exactly the same as in the first embodiment.

See FIG.
FIG. 10 is a main part flow diagram of the EB data conversion process according to the second embodiment of the present invention, which includes a step of determining whether or not to perform the UNIT division process. This is exactly the same as Example 1.
In this case, a processing figure name for each UNIT is defined, and a vector for a pattern for each UNIT is extracted. Here, the unit is divided into UNIT-A, UNIT-B, and UNIT-C.

See FIG.
FIG. 11 is an explanatory diagram of a rotation processing method when the processing tool is good at vertical processing. Only the UNIT-A that is vertical <horizontal is rotated into an input figure, and after data conversion processing, UNIT-A Only the manufacturing data is rotated backward by 90 °, and the entire data is output as manufacturing data.

  In this case, the vertical / horizontal conversion changes the overall aspect ratio from 90: 110 to 124: 76. Therefore, if the horizontal processing time is x times the vertical processing time, it takes (90 + 110x). Time is (124 + 76x), which is improved by (34x−34) / (90 + 110x).

Incidentally, when x = 1.5, the improvement is about 6.7%, when x = 2, the improvement is about 13%, and when x = 10, the improvement is about 120%. Compared with the first embodiment in which the entire figure is rotated, a great improvement effect can be obtained.
However, it takes time to determine which figure to rotate.

See FIG.
FIG. 12 is an explanatory diagram of a rotation processing method when the processing tool is good at horizontal processing, and rotates UNIT-B and UNIT-C whose vertical> horizontal are input figures, and after data conversion processing, Only the manufacturing data of UNIT-B and UNIT-C is rotated backward by 90 °, and then the entire data is output as manufacturing data.

  In this case, since the overall aspect ratio is changed from 90: 110 to 76: 124 by the aspect conversion, it takes (90x + 110) when the vertical processing time is x times the horizontal processing time. Time is (76x + 124), which is improved by (14x-14) / (90x + 110).

  Incidentally, when x = 1.5, the improvement is about 3%, when x = 2, the improvement is about 6%, and when x = 10, the improvement is about 51%. Compared to the first embodiment in which the whole is not rotated at all, that is, in a case where conversion is performed with vertical: horizontal = 90: 110, a large improvement effect can be obtained.

  Thus, in the second embodiment of the present invention, since it is determined whether or not to rotate for each UNIT, the time required for EB data conversion can be greatly shortened.

Next, an EB data conversion processing method according to the third embodiment of the present invention will be described with reference to FIG.
In the case of the above-described second embodiment, all the corresponding UNITs are rotated according to the aspect ratio for each UNIT, but in this third embodiment, the aspect ratio of a specific UNIT is approximately 1. : 1 and when the pattern ratio in the whole is small, the rotation processing is not performed for a specific UNIT.

See FIG.
In this case, as in the case of FIG. 12, the processing tool is good at horizontal processing, and by rotating only UNIT-C without rotating UNIT-B of vertical: horizontal = 12: 10, The overall aspect ratio is changed from 90: 110 to 78: 122, which is almost the same as 76: 124 in the second embodiment, but the time required for the rotation process is not required, so the entire process time is effective. The difference will disappear.

  In this case, the target of whether or not to rotate is that if the aspect ratio of the entire graphic data = poor direction / all directions is less than 0.5, the direction of the graphic pattern in the design data is not converted. To.

  Next, the pattern data correction method according to the fourth embodiment of the present invention will be described with reference to FIGS. 14 to 17, but only by adding the optical proximity effect correction to the design data and outputting the manufacturing data, The technical idea and process are the same as those in the first embodiment.

See FIGS. 14 and 15
14 and 15 are flowcharts of the pattern data correction method according to the fourth embodiment of the present invention. First, various types of information (Data information, Topfig information, Layer information) for processing are defined, and design data is read. .

  Next, the vertical / horizontal ratio of the pattern data is extracted in the same manner as in the first embodiment, and the vertical / horizontal ratio information of the pattern data is acquired.

  Next, the data is rotated (vertical / horizontal orientation) based on information (algorithm) such as whether the tool of the data correction processing for performing the optical proximity effect correction acquired and registered in advance is good at vertical or horizontal. Change).

  That is, there are cases where the data correction processing is performed as it is without rotating the design data at the time of input due to the pros and cons of the processing direction of the selected tool. In some cases, it is used as data, and when rotated, the manufacturing data after data correction is reversely rotated to return the direction of the data and output the data.

See FIG.
FIG. 16 is an explanatory diagram of a rotation processing method when the processing tool is good at the vertical direction processing. The entire data is rotated by 90 ° to obtain an input figure, and after the data correction processing based on the data correction table, correction is performed. The obtained data is reversely rotated by 90 ° and then output as manufacturing data.
Here, the description will be given using the F-shaped pattern UNIT-F and the concave pattern UNIT-U.

  Here, in order to simplify the explanation and illustration, in each corner, a minute additional pattern is added to the outer and only a subtraction pattern is subtracted from the inner, but in practice, a normal subtraction pattern is used. In exactly the same manner as the optical proximity effect process, the line width of the straight line portion is locally increased or reduced according to the proximity state of each UNIT.

See FIG.
FIG. 17 is an explanatory diagram of a rotation processing method when the processing tool is good at horizontal processing. The entire data is used as it is as an input figure without being rotated, and is manufactured as it is after the data correction processing based on the data correction table. Output data as data.

  As described above, even when the optical proximity effect correction process is performed on the design data, it is possible to prevent an unnecessary increase in the data correction processing time by considering the strength and processing direction of the selected data correction process Tool. it can.

Next, the pattern data correction method according to the fifth embodiment of the present invention will be described with reference to FIGS. 18 to 20, but the basic technical idea and process are the same as those of the second embodiment.
See FIG.
FIG. 18 is a main part flow diagram of the pattern data correction method according to the fifth embodiment of the present invention, which includes a step of determining whether or not to perform UNIT division processing. This is exactly the same as Example 4.
In this case as well, the process figure name for each UNIT is defined, and a vector for the pattern for each UNIT is extracted. Here, the unit is divided into UNIT-F and UNIT-U.

See FIG.
FIG. 19 is an explanatory diagram of a rotation processing method when the processing tool is good at vertical processing. Only the UNIT-F that is vertical <horizontal is rotated into an input figure, and data correction based on the data correction table is performed. After the processing, only the manufacturing data of UNIT-F is reversely rotated by 90 °, and the entire data is output as manufacturing data.

See FIG.
FIG. 20 is an explanatory diagram of a rotation processing method when the processing tool is good at horizontal processing. Only the UNIT-U that is vertical> horizontal is rotated into an input figure, and after the data correction processing, the UNIT-U Only the manufacturing data is rotated backward by 90 °, and the entire data is output as manufacturing data.

  Thus, in the fifth embodiment of the present invention, whether or not to rotate for each UNIT is determined in the same manner as in the second embodiment, so that the time required for pattern data correction can be greatly shortened.

Next, the pattern data correction method according to the sixth embodiment of the present invention will be described. However, since it is substantially the same as the third embodiment, the illustration is omitted.
In the case of the sixth embodiment, data correction is performed by adding a graphic pattern corresponding to UNIT-B. As in the case of FIG. 12, the processing tool is good at horizontal processing, and the vertical: Pattern data correction processing is performed as an input figure by rotating only UNIT-U without rotating UNIT-B at horizontal = 12: 10.

  In this case, if the aspect ratio of the entire graphic data = poor direction / all directions is less than 0.5, the direction of the graphic pattern in the design data is not converted. To.

Next, a data correction processing system according to a seventh embodiment of the present invention will be described with reference to FIG. 21. The processing flow performed in this data correction processing system is exactly the same as that of the fourth embodiment.
See FIG.
FIG. 21 is a system configuration diagram of the pattern data correction system according to the seventh embodiment of the present invention. Various information (Data information, Topfig information, Layer information) necessary for definition based on the creation request information, various information Used according to the characteristics of the data to be processed from the mechanism for reading design data defined from the above, various processing tools (Tool-A, Tool-B, Tool-C), and various processing tools provided based on the creation request information A mechanism for selecting a processing tool to perform, a data correction table set in advance for optical proximity effect correction, a pattern vertical / horizontal ratio extraction function for extracting a pattern vertical / horizontal ratio from the read design data, and an extracted pattern Function for storing aspect ratio information, function for storing processing direction information of the processing tool used, processing method of processing tool A pattern rotation function for rotating the pattern by comparing the direction information with the extracted pattern vertical / horizontal ratio information, and a drawing data conversion process for converting the input figure set in a predetermined direction into manufacturing data by performing data correction using the data correction table The information processing mechanism is provided with various functions, and the converted manufacturing data is output from the information processing mechanism as output data.

  Although the embodiments of the present invention have been described above, the present invention is not limited to the configurations and conditions described in the embodiments, and various modifications can be made. Although only the system configuration diagram corresponding to the fourth embodiment is shown, the systems for the first to third, third, fifth, and sixth configurations are similarly configured.

  That is, by providing a rotation function for each UNIT to the pattern rotation mechanism in the system configuration diagram of FIG. 21, a system configuration diagram corresponding to the fifth embodiment is obtained, and the aspect ratio of a specific UNIT is approximately 1: 1. When the ratio of the pattern occupying the whole is small, a system configuration diagram corresponding to the sixth embodiment can be obtained by providing a function that does not perform rotation processing for a specific UNIT.

  Further, the EB data conversion process is performed as it is without using the data correction table, and system configuration diagrams corresponding to the first to third embodiments are obtained according to the functions of the pattern rotation mechanism.

  In the first embodiment or the fourth embodiment described above, the rotation processing is always performed when the aspect ratio of the entire graphic data = poor direction / all directions is 0.5 or more. If ratio = poor direction / all directions are less than 0.5, it is not always necessary to rotate, and the time required for rotation and the processing time improved by data conversion are offset.

The detailed features of the present invention will be described again with reference to FIG. 1 again.
Again see Figure 1
(Supplementary note 1) When converting a drawing pattern from design data to manufacturing data, the orientation of the graphic pattern 1 in the design data is set according to the processing direction proficiency of the pattern data processing tool to be used. Pattern data conversion method.
(Supplementary note 2) The pattern data conversion method according to supplementary note 1, wherein when the drawing pattern is converted from design data to manufacturing data, optical proximity effect correction is performed on the drawing pattern.
(Supplementary note 3) In the step of setting the orientation of the graphic pattern 1 in the design data, the graphic pattern 1 is decomposed into vectors for each of the individual patterns 2 and 3, and the outer periphery of the individual patterns 2 and 3 by a single stroke. The data pattern conversion according to appendix 1 or 2, further comprising a step of extracting a vertical / horizontal length ratio of the individual patterns 2 and 3 using the direction and length of the vector. Method.
(Supplementary Note 4) The vertical / horizontal length ratio of the individual patterns 2 and 3 is accumulated as the entire drawing pattern to determine whether or not the orientation of the entire graphic pattern 1 is to be converted. The data pattern conversion method described.
(Additional remark 5) It is determined from the vertical / horizontal length ratio of the said individual patterns 2 and 3 whether or not the direction of the graphic pattern 1 is converted for each individual pattern 2 and 3. The data pattern conversion method described.
(Supplementary Note 6) When the ratio of the vertical / horizontal length of the drawing pattern is 0.5 or more in the processing direction in which the pattern data processing tool is not good, the orientation of the graphic pattern 1 in the design data is 6. The pattern data conversion method according to any one of appendices 3 to 5, wherein conversion is performed.
(Supplementary Note 7) When the ratio of the vertical / horizontal length of the drawing pattern is less than 0.5 in the processing direction in which the pattern data processing tool is poor, the orientation of the graphic pattern 1 in the design data is 6. The pattern data conversion method according to any one of appendices 3 to 5, wherein no conversion is performed.
(Additional remark 8) The pattern data conversion system characterized by employ | adopting the pattern data conversion method of any one of Additional remark 1 thru | or 7.

  As an application example of the present invention, as long as the reticle manufacturing process of the semiconductor integrated circuit device is typical, the invention is not limited to the semiconductor integrated circuit device, and the drive circuit formation of the liquid crystal display device or the organic EL display device is performed. It is also applied to the manufacturing process of reticles for superconducting devices and reticles for superconducting devices, and is not limited to the manufacturing process of reticles, but is applied to the conversion process of various pattern data. .

It is explanatory drawing of the fundamental structure of this invention. It is a processing flow figure until the middle of the EB data conversion method of Example 1 of this invention. It is a processing flowchart after FIG. 2 of the EB data conversion method of Example 1 of this invention. It is a conceptual explanatory drawing of a FIG structure. It is explanatory drawing of the figure pattern seen from Topfig. It is explanatory drawing of the extraction process of the vertical / horizontal ratio of pattern data. It is explanatory drawing of the ratio of the length / width of other pattern data. It is explanatory drawing in the case of rotating a design data. It is explanatory drawing when not rotating a design data. It is a principal part flowchart of the EB data conversion process of Example 2 of this invention. It is explanatory drawing of the rotation processing method in case a processing tool is good at a vertical direction process. It is explanatory drawing of the rotation processing method in case a processing tool is good at a horizontal direction process. It is explanatory drawing of the EB data conversion processing method of Example 3 of this invention. It is a processing flow figure until the middle of the pattern data correction method of Example 4 of this invention. It is a processing flow figure after FIG. 14 of the pattern data correction method of Example 4 of this invention. It is explanatory drawing of the rotation processing method in case a processing tool is good at a vertical direction process. It is explanatory drawing of the rotation processing method in case a processing tool is good at a horizontal direction process. It is a principal part flowchart of the pattern data correction method of Example 5 of this invention. It is explanatory drawing of the rotation processing method in case a processing tool is good at a vertical direction process. It is explanatory drawing of the rotation processing method in case a processing tool is good at a horizontal direction process. It is a system block diagram of the pattern data correction system of Example 7 of this invention.

1 Graphic pattern 2 Individual pattern 3 Individual pattern 4 Manufacturing graphic pattern 5 Manufacturing individual pattern 6 Manufacturing individual pattern

Claims (5)

A pattern data conversion method characterized in that, when a drawing pattern is converted from design data to manufacturing data, the orientation of the graphic pattern in the design data is set according to the processing direction proficiency of the pattern data processing tool to be used. 2. The pattern data conversion method according to claim 1, wherein when the drawing pattern is converted from design data to manufacturing data, optical proximity effect correction is performed on the drawing pattern. In the step of setting the direction of the graphic pattern in the design data, for each individual pattern, the outer periphery of the individual pattern is decomposed into a vector with a single stroke, and the vector direction and length are used. The data pattern conversion method according to claim 1, further comprising a step of extracting a vertical / horizontal length ratio of the individual pattern. 4. The data pattern conversion method according to claim 3, wherein the vertical / horizontal length ratio of the individual pattern is accumulated as the entire drawing pattern to determine whether or not to convert the orientation of the entire graphic pattern. 4. The data pattern conversion method according to claim 3, wherein whether or not to convert the orientation of the graphic pattern is determined for each individual pattern from the vertical / horizontal length ratio of the individual pattern.

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