JP2007103970A - Method of supplying power to electrode, plasma surface treatment method using the same, and plasma surface treatment system - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a plasma surface treatment method and its surface treatment system which are not influenced by standing waves, and carry out larger area/uniform treatment, in the application of VHF plasma and UHF plasma to larger area/uniform treatment. <P>SOLUTION: Two high-frequency power sources of phase variable 2 outputs are installed, and the output of either of the power sources is randomly phase-modulated, then either of each of two outputs of the two power sources is supplied to a first feeding point set to an electrode, while the other of each two output is supplied to a second feeding point which is installed opposite to the first feeding point, respectively. Positions of two antinodes of these two standing waves generated are controlled individually, by which uniform plasma is generated which does not change temporally and spatially. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a surface treatment apparatus and a surface treatment method for performing a predetermined treatment on a surface of a substrate using plasma. The present invention particularly relates to a method of supplying high-frequency power to a plasma generating electrode for a large-scale substrate of a metric class size, a plasma surface treatment method and a plasma surface treatment apparatus using the supply method.

  Various kinds of processing are performed on the surface of the substrate using plasma to manufacture various electronic devices, such as LSI (Large Scale Integrated Circuit), LCD (Liquid Crystal Display) TFT (Thin Film Transistor), Amorphous Si Solar Cell, Thin Film Already put into practical use in the fields of polycrystalline Si solar cells, photoconductors for copying machines, and various information recording devices. In addition, practical application is also progressing in the field of manufacturing ultra-hard films such as diamond thin films and cubic boron nitride (C-BN).

  Recently, the cost reduction of large-area solar cell plasma CVD equipment and high-quality large-area liquid crystal displays required for cost reduction and productivity improvement aiming at full-scale commercialization of thin-film solar cells. A plasma CVD apparatus for manufacturing a necessary large area thin film transistor (TFT) has attracted particular attention.

The above technical fields cover various fields such as thin film formation, etching, surface modification, and coating, all of which utilize the chemical and physical action of reactive plasma. The apparatus and method relating to the generation of the reactive plasma can be broadly classified into three typical techniques according to the shape of the electrode structure.
The first representative technique is described in, for example, Patent Document 1 and Non-Patent Documents 1 and 2, and uses two parallel plate electrodes composed of a non-ground electrode and a ground electrode as a pair for plasma generation. It is characterized by.
The second representative technique is described in, for example, Patent Documents 2 and 3, and is characterized by using a pair of rod electrodes or ladder-type electrodes and plate electrodes for plasma generation.
A third representative technique is described in, for example, Patent Document 4, and is characterized in that the electrode is an antenna system.

The first typical technique is roughly described in, for example, Patent Documents 1 and 3, and supplies power to at least two feeding points on the electrode. It is characterized in that the influence of the generation is suppressed by changing the phase difference of the voltage of the power with time and swinging the standing wave in the voltage distribution of the electrode.
The second representative technique is described in Patent Document 5, and two standing waves with different antinode positions are generated on the electrodes while being shifted in time, and the electrodes are overlapped to generate uniform waves. A voltage distribution can be obtained.
The third representative technique is described in Patent Document 6, and simultaneously generates two standing waves that are independent of each other and have different antinode positions, and superimposes them. Thus, a uniform voltage distribution can be obtained.

The features of the technique described in the above document are roughly as follows. In the technique described in Patent Document 1, a non-grounded electrode is a square electrode, a plurality of first power supply points are arranged on the side surface of the first side of the rectangular electrode, and a second electrode facing the first side is provided. A plurality of second power supply points are arranged on the side surface of the side, and the voltage of power supplied to the plurality of first power supply points and the power supplied to the plurality of second power supply points By varying the voltage phase difference with respect to time, the electric field distribution between the pair of electrodes is averaged, and as a result, the spatial distribution of the plasma intensity is made uniform. In this technique, a standing wave is generated by interfering with traveling waves of two electric power supplied so as to propagate in directions opposite to each other, and the position of the antinode of the standing wave is changed with time. Is possible.
The technique described in Patent Document 2 is characterized in that a phase adjustment circuit that adjusts the phase of reflected power is connected to the tip of the pair of electrodes on the opposite side of the power supply point. In this technique, by controlling the phase adjustment circuit, the phase of the reflected wave can be adjusted, the traveling wave of the supplied power can interfere with the reflected wave, and a standing wave can be generated, and The position of the antinode of the standing wave can be moved.
The technique described in Patent Document 3 changes temporally the phase difference between the voltage of power supplied to one power supply point on the electrode and the voltage of power supplied to at least one other power supply point. Thus, the electric field distribution between the pair of electrodes is averaged, and as a result, the spatial distribution of the plasma intensity is made uniform. In this technique, it is possible to generate a standing wave by interfering with traveling waves of two electric power supplied from opposite directions, and to change the position of the antinode of the standing wave with time. .
The technique described in Patent Document 4 is characterized in that the electrode is formed by folding a linear conductor so as to be included in a plane with reference to the central point, and the central point is used as a feeding point. Note that the shape of this electrode is, for example, U-shaped or M-shaped. Further, the U-shaped or M-shaped electrode serves as an antenna to radiate supplied power to the space.
The technique described in Patent Document 5 is based on two pulse-modulated sinusoidal powers output from a first high-frequency power source to a first feeding point and a second feeding point arranged opposite to both ends of an electrode, respectively. The phase difference between the two voltages is set to a predetermined value and supplied, and the two pulse-modulated sine wave powers output from the first high-frequency power source are output from the second high-frequency power source with different time zones. By supplying a voltage phase difference between the two pulse-modulated sinusoidal powers set to a predetermined value, that is, a pulse power output from the first high-frequency power source and a pulse output from the second high-frequency power source By supplying power alternately in time, two standing waves with different antinode positions and different generation time zones are generated, thereby making it possible to make the power distribution of the electrodes uniform.
The technique described in Patent Document 6 is such that the first and second high-frequency waves of phase variable two outputs that are independent of each other at the first feeding point and the second feeding point that are arranged to face both ends of the electrode. The high frequency power output from the power source is supplied at the same time, and the phase difference between the voltages of the two powers output from the first high frequency power source is set to a predetermined value and output from the second high frequency power source. In addition, by setting the phase difference between the two power voltages to a predetermined value and supplying them, two standing waves having different belly positions and independent from each other in time and space are generated. By generating it, it is possible to make the power distribution of the electrode uniform.
The technique described in Patent Document 7 supplies a pair of electrodes with the outputs of a plurality of power sources that incorporate a high-frequency oscillator that is randomly phase-modulated by a random phase modulator, so that the electrodes are independent of each other in time. By simultaneously generating a plurality of standing waves that do not vary spatially and individually controlling the positions of the antinodes of the plurality of standing waves, the large-area plasma is made uniform and uniform. According to this technology, there is no restriction on the shape of the electrode used, and apparatus parameters such as pressure and power can be arbitrarily selected, and it is possible to cope with plasma processing on a large-area substrate.

The technique described in Non-Patent Document 1 is that an H-shaped feeding band is installed on the back side of the surface of the non-grounded electrode in contact with plasma, and a plurality of feeding points are installed on the H-shaped feeding band. It is a feature.
The technique described in Non-Patent Document 2 is that a coil is installed on the opposite side of the feeding point of the non-grounded electrode, that is, the end of the electrode located in the power propagation direction, It is characterized in that the position of the antinode of the standing wave generated in the electrode is shifted.

Japanese Patent Application Laid-Open No. 2002-12977 (second page, FIG. 1, FIG. 10-11) Japanese Patent Laid-Open No. 11-243062 (second page, FIG. 1, FIGS. 7 to 8) Japanese Patent No. 3316490 (first page, FIG. 1, FIG. 8) JP 2000-345351 (Page 2, FIG. 1, FIG. 5, FIG. 7) JP-A-2005-123203 (pages 2 to 4, FIG. 1, FIG. 2, FIG. 8) JP-A-2005-123199 (pages 2 to 4, FIG. 1, FIG. 2, FIG. 6) JP 2006-332709 (pages 1 to 4, FIG. 1, FIG. 6, FIG. 7, FIG. 11)

L. Sansonnens, A. Pletzer, D. Magni, AA Howling, Ch. Hollenstein and JPMSchmitt, A voltage uniformity study in large-area reactors for RF plasma deposition, Plasma Source Sci. Technol. 6 (1997), p. 170-178. J. Kuske, U. Stephan, O. Steinke and S. Rohleck: Power feeding in large area PECVD of amorphous silicon, Mat. Res. Soc. Symp. Proc. Vol. 377 (1995), p.27-32.

The above-mentioned plasma surface treatment technology, that is, the plasma surface treatment apparatus and the plasma surface treatment method, reduce the product cost and increase the area of the product due to the improvement in productivity in any of the industrial fields such as LCD, LSI, electronic copying machine and solar cell. The need for large area, uniformization and high-speed processing for performance improvement such as wall-mounted TV is increasing year by year.
In particular, in the field of thin-film silicon solar cells, which are expected to accelerate the spread of practical use as a new energy source that has recently responded to energy resource problems and global environmental problems, production costs can be further reduced even more than before. It is demanded as a special need.

In order to meet the above needs, recently, as a technical trend, not only in industry but also in academic societies, both plasma CVD (chemical vapor deposition) technology and plasma etching technology are capable of high performance and high speed processing (low) Research on practical application of plasma CVD technology using a power source in the VHF band (30 MHz to 300 MHz) and UHF band (300 MHz to 3000 MHz), which is characterized by high density plasma generation at an electron temperature, has become active.
However, in the prior art, there are still problems as described below, and there is a problem in the field of the above needs.

The problem in the above technical field is that VHF and UHF plasma surface treatment apparatus and VHF for high productivity processes capable of speeding up, large area and uniforming (improvement of productivity and performance) of surface treatment using VHF and UHF plasma. And a breakthrough of the technology relating to the UHF plasma surface treatment method.
Generally, in the LCD field, the film thickness distribution ensures reproducibility of about ± 5%, and in the solar cell field, the film thickness distribution ensures reproducibility of about ± 10%. It has become. However, the technology for increasing the speed, area, and uniformity of VHF plasma, which appeared as the world's first attempt in 1987, has not made much progress.
In the conventional VHF plasma technology, for example, in the case of manufacturing an a-Si film, assuming that reproducibility is ensured, when the substrate area is about 50 cm × 50 cm, the film thickness distribution is about ± 10 to 15%, and about 100 cm × 100 cm. The film thickness distribution is about ± 20 to 40%, and there is a problem that the above-mentioned index cannot be cleared.

The direct cause of the non-uniformity of the film thickness distribution is the non-uniformity of the plasma density, and the non-uniformity of the plasma density is caused by the standing wave caused by the wave interference phenomenon which is a problem inherent to the VHF. Occurs. Since this problem of standing waves is a fundamental phenomenon associated with the propagation of electromagnetic waves, there has been no drastic solution in the past, and the techniques described in Patent Documents 1 to 4 are being put into practical use as the next best measure. .
However, both technologies have the following problems. That is, the problem of standing waves cannot be fundamentally solved.
(1) The technique described in Patent Document 1 changes the phase difference of the voltage of power supplied from two opposite sides of a rectangular electrode in a sawtooth shape with respect to time, for example, at a frequency of several kilohertz. The position of the antinode of the generated standing wave is moved between the pair of electrodes, and the time average is made uniform. Regarding the film thickness distribution, in the case of amorphous Si film formation, a film thickness distribution of about ± 10 to 15% is obtained when the substrate area is about 50 cm × 50 cm, but it is considered to be ± 20% or more for about 100 cm × 100 cm. . Further, it is difficult to improve the technology, and about ± 20% is considered the limit.
(2) In the technology described in Patent Document 2, a phase adjustment device is installed on the opposite side of the power supply point to control the phase of the reflected wave of power, so that the power absorption rate is high, for example, the pressure is several hundred Pa. In plasma generation at ˜several 1000 Pa, the intensity of the reflected wave becomes weak, and the reflected wave cannot be controlled. That is, there is a drawback that it can be applied only when the pressure of plasma generation is about several hundred Pa or less.
(3) The technique described in Patent Document 3 is similar to the technique described in Patent Document 1, in which the voltage of power supplied to one certain feeding point on the electrode and the power supplied to at least one other feeding point are arranged. By varying the voltage phase difference with time, the electric field distribution between the pair of electrodes is averaged, and as a result, the spatial distribution of the plasma intensity is made uniform. As data of the present technology, it has been reported that the film thickness distribution is about ± 18% at a film forming speed of 1.7 ns with respect to a substrate area of about 140 cm × 110 cm in an amorphous Si film. However, it is difficult to improve the technology, and about ± 18% is considered the limit.
(4) Since the technique described in Patent Document 4 is an antenna system, that is, inductively coupled plasma generation, there is a restriction that the pressure condition is several Pa or less. That is, there is a drawback that it is impossible for an application in which the pressure condition such as microcrystalline Si is several hundred to several thousand Pa. In addition, it is presumed that it is difficult to grasp the appropriate conditions of the film forming conditions because it is easily affected by the shape of the vacuum vessel around the electrode and the grounding conditions.
(5) The technique described in Patent Document 5 is a technique that can potentially improve the techniques described in Patent Documents 1 and 3 above. However, the technology is still in the basic research and development stage.
(6) The technique described in Patent Document 6 is a technique that can possibly improve the techniques described in Patent Documents 1 and 3 above. However, the technology is still in the basic research and development stage.
(7) The technique described in Patent Document 7 can be applied to plasma processing of a large area substrate. However, for each application, there are problems to be improved, such as improvement of the configuration of the power supply system and cost reduction.

As described above, in the prior art, VHF (frequency 30-300 MHz) and UHF plasma CVD for large area substrates required for productivity improvement and cost reduction, for example, large area substrates of size 1 mx 1 m class, VHF and In applications such as UHF plasma etching, the standing wave problem remains unsolved.
That is, the surface treatment apparatus and method capable of increasing the speed, area, and uniformity of using VHF and UHF plasma targeting a large area substrate exceeding 1 mx 1 m class still have standing waves generated in the electrodes. There is a problem of non-uniformity of power distribution due to it.

  The present invention has been made to solve the above-described problem, and is a plasma surface treatment method and a plasma surface that can be applied to film formation on a large area substrate by plasma CVD, etching treatment of a large area substrate by plasma, and the like. An object is to provide a processing apparatus.

  A method of supplying power to an electrode according to the present invention includes a vacuum vessel provided with an exhaust system, a discharge gas supply system for supplying a discharge gas into the vacuum vessel, a discharge electrode, a plurality of high-frequency power supplies, and a plurality of A power supply system comprising an impedance matching device and a substrate holding means for arranging a substrate to be plasma-treated, and using the generated plasma to treat the surface of the substrate to an electrode used in a plasma surface treatment apparatus In the power supply method, the phases of the sine wave power output from all of the high frequency power supplies except any one of the plurality of high frequency power supplies are randomly modulated with different random signals, thereby the plurality of high frequency power supplies. It is characterized by eliminating mutual interference between power supply outputs.

  Further, in the power supply method to the electrode according to the present invention, a vacuum vessel provided with an exhaust system, a discharge gas supply system for supplying a discharge gas into the vacuum vessel, a discharge electrode, and a plurality of high-frequency waves A power supply system including a power source and a plurality of impedance matching units, and a substrate holding means for arranging a substrate to be plasma-processed, are used in a plasma surface processing apparatus that processes the surface of a substrate using generated plasma. In the method of supplying power to the electrodes, one of a plurality of high-frequency power sources having a plurality of phase-variable outputs to each of a plurality of feeding points and a plurality of other feeding points facing each other disposed on the discharge electrode. Of the plurality of high-frequency power supplies when the output of the first and the other output are supplied to generate a plurality of standing waves between the pair of electrodes at the same time and the power distribution between the electrodes becomes uniform. Randomly modulating the phase of sine wave power output from all high frequency power supplies except for one unit with different random signals, thereby eliminating mutual interference between the outputs of the plurality of high frequency power supplies And

  Further, in the power supply method to the electrode according to the present invention, the first and second feeding points are arranged at two positions which are opposite points in the power propagation of the discharge electrode, and the first and second power supply points are arranged. The two feeding points are respectively supplied with one output and the other output of the first phase variable two-output high-frequency power source, and one output and the other of the second phase variable two-output high-frequency power source. When the output is supplied, the phase of the sine wave signal output from the built-in oscillation circuit is applied to either the first phase variable 2 output high frequency power supply or the second phase variable 2 output high frequency power supply. , By performing random phase modulation using a random phase modulator, mutual interference between the output of the first phase variable 2-output high-frequency power supply and the output of the second phase-variable 2-output high-frequency power supply is eliminated. It is characterized by that.

  In the power supply method to the electrodes according to the present invention, all the high-frequency power supplies except for any one of the plurality of high-frequency power supplies include an oscillator, a random phase modulator, a distributor, and a phase shifter. And an amplifier.

  In the power supply method to the electrodes according to the present invention, all the high-frequency power supplies except for any one of the plurality of high-frequency power supplies include an oscillator, a random phase modulator, a distributor, and a phase shifter. And a coupler and an amplifier.

  A plasma surface treatment method according to the present invention includes a vacuum vessel provided with an exhaust system, a discharge gas supply system for supplying a discharge gas into the vacuum vessel, a discharge electrode, a plurality of high-frequency power supplies, and a plurality of impedances. A plasma surface processing method comprising: a power supply system comprising a matching unit; and a substrate holding means for arranging a substrate to be plasma-processed, and processing the surface of the substrate using generated plasma. By using the method for supplying power to the electrode according to any one of 5, each of the plurality of feeding points and the other plurality of feeding points that are disposed on the discharge electrode and are opposed to each other, And supplying a plurality of phase-variable two-output high-frequency power supplies with one output and the other output, and simultaneously generating a plurality of standing waves that do not vary temporally and spatially between the pair of electrodes, of And performing plasma surface treatment.

  In the plasma surface treatment method according to the present invention, the first phase variable and two-output high-frequency power source that is supplied to the first and second feeding points that are disposed on the discharge electrode and that face each other. By controlling the phase difference between the two output voltages and the phase difference between the two output voltages of the second phase variable two-output high-frequency power source, two standing waves, ie, first The first standing wave and the second standing wave are generated simultaneously, and the distance between the antinode position of the first standing wave and the antinode position of the second standing wave is adjusted. By setting an odd multiple of a quarter of the wavelength λ of the electromagnetic wave propagating in the generated plasma between the electrodes, that is, an odd multiple of λ / 4, the distribution of power intensity between the electrodes is uniform. It is characterized by making it.

  In the plasma surface treatment method according to the present invention, the first phase variable and two-output high-frequency power source that is supplied to the first and second feeding points that are disposed on the discharge electrode and that face each other. By controlling the phase difference between the two output voltages and the phase difference between the two output voltages of the second phase variable two-output high-frequency power source, two standing waves, ie, first The first standing wave and the second standing wave are generated simultaneously, and the distance between the antinode position of the first standing wave and the antinode position of the second standing wave is adjusted. The distribution of power intensity between the electrodes is made uniform by making the odd number times half of the spatial period of the antinode of the standing wave.

  In the plasma surface treatment method according to the present invention, before performing the predetermined plasma treatment on the substrate, at least one of the film thickness distribution, the etching rate distribution, the plasma emission distribution, and the plasma density distribution is previously determined. Based on the measurement result, the relationship between the antinode position of the standing wave and the phase difference between the voltages of the two output powers of each of the plurality of two-output phase variable high-frequency power sources is grasped. The phase difference value for performing a predetermined plasma treatment of the substrate is used.

  In the plasma surface treatment method according to the present invention, a film of a silicon-based film having a phase difference between two voltages of the first high-frequency power supply and a sinusoidal film thickness distribution formed on the substrate surface. Silicon having a first step of grasping a relationship with a position where the thickness is maximum, a phase difference between two voltages of the second high-frequency power supply, and a sinusoidal film thickness distribution formed on the substrate surface The second step of grasping the relationship with the position where the film thickness of the system film becomes maximum, and the voltages of the two outputs of the first and second high-frequency power sources grasped in the first and second steps By setting the phase difference between the two outputs of each of the first and second high-frequency power sources based on the relationship between the phase difference between the first and second high-frequency power supplies based on the relationship between the phase difference between the first and second high-frequency power supplies, the target silicon-based film is manufactured It is characterized by comprising a third step of forming a film.

  A plasma surface treatment apparatus according to the present invention includes a vacuum vessel provided with an exhaust system, a discharge gas supply system for supplying a discharge gas into the vacuum vessel, a discharge electrode, a plurality of high-frequency power supplies, and a plurality of impedances. A plasma surface treatment apparatus comprising a power supply system comprising a matching unit and substrate holding means for placing a substrate to be plasma-treated, and treating the surface of the substrate using the generated plasma, wherein the plurality of high-frequency waves The remaining high frequency power supply except any one of the power supplies is composed of an oscillator, a random phase modulator, a distributor, a phase shifter, and an amplifier.

  In the plasma surface treatment apparatus of the present invention, a vacuum vessel provided with an exhaust system, a discharge gas supply system for supplying a discharge gas into the vacuum vessel, and a pair of electrodes comprising a non-ground electrode and a ground electrode And a power supply system comprising a plurality of high-frequency power supplies and a plurality of impedance matching devices, and a substrate holding means for arranging a substrate to be plasma-processed, and a plasma surface for processing the surface of the substrate using the generated plasma In the processing apparatus, the plurality of high-frequency power sources include an oscillator, a random phase modulator, a distributor, a phase shifter, a coupler, and an amplifier.

  In the plasma surface treatment apparatus of the present invention, two outputs of the first high-frequency power source are respectively connected to one feeding point and the other feeding point that are disposed on the discharge electrode and face each other. The output terminal of the first impedance matching unit connected to one side and the output terminal of the third impedance matching unit connected to one of the two outputs of the second high frequency power source, and the two of the first high frequency power source The output terminal of the second impedance matching device connected to the other of the outputs and the output terminal of the fourth impedance matching device connected to the other of the two outputs of the second high frequency power supply are connected. It is characterized by that.

Film formation by plasma CVD and plasma etching by conventional methods and apparatuses are difficult to make uniform due to the standing wave problem when the substrate becomes large, but according to the present invention, it is easily possible. It is.
That is, according to the present invention, by supplying the discharge electrodes with outputs of a plurality of power sources incorporating a high-frequency oscillator that is randomly phase-modulated by a random phase modulator,
It is possible to simultaneously generate a plurality of standing waves that are independent of each other and do not vary temporally and spatially on the electrode, and to control the positions of the antinodes of the plurality of standing waves individually. is there. As a result, it is possible to control so that the sum of the strengths of a plurality of standing waves generated in the discharge electrode becomes a constant value. That is, plasma generation that is not affected by standing waves is possible, and uniformization and uniformization of large-area plasma can be easily realized.
In addition, the present invention supplies two outputs of a power source incorporating a high-frequency oscillator that is randomly phase-modulated by a random phase modulator and a power source not incorporating a random phase modulator to the discharge electrode. It is possible to simultaneously generate a plurality of standing waves that are independent from each other and do not vary temporally and spatially, and it is possible to individually control the positions of the antinodes of the plurality of standing waves. This means that the large area plasma, which is difficult with the prior art, can be easily made uniform and uniform, and the contribution in the industry is extremely large.
The random phase modulator does not need to be incorporated in each of the plurality of high frequency power supplies, and the random phase modulator can be deleted for any one of the plurality of high frequency power supplies.
Even in the VHF band where the power supply frequency is 30 MHz to 300 MHz, the power intensity distribution between the pair of electrodes can be made uniform, so that the plasma density in the application of VHF and UHF plasma, which is difficult to achieve with the prior art. And a method for equalizing the radial density.
In addition, a plasma surface processing method and a plasma surface processing apparatus in a large area process field for a metric class size substrate are provided.
In particular, large-area, high-speed high-frequency plasma for improving productivity and reducing product costs in industries such as thin-film silicon solar cells, liquid crystal displays, LSIs, and electronic copiers that require uniform plasma surface treatment on large-area substrates -Application to uniform product manufacturing can be realized reliably, and the contribution is extremely large.

Hereinafter, a power supply method to an electrode, a plasma surface treatment method and a plasma surface treatment apparatus using the power supply method according to an embodiment of the present invention will be described with reference to the drawings.
In the following description, as an example of a method for supplying power to the electrodes, a plasma surface treatment method using the power supply method, and a plasma surface treatment apparatus, an amorphous silicon-based thin film necessary for producing a solar cell is produced. Although the apparatus and method are described, the subject matter of the present application is not limited to the apparatus and method of the following example.

Example 1
1 to FIG. 5 regarding a power supply method to an electrode according to the first embodiment of the present invention, a plasma surface treatment method (plasma CVD method) using the power supply method, and a plasma surface treatment apparatus (plasma CVD apparatus). I will explain.

  FIG. 1 is a schematic diagram showing the configuration of the plasma surface treatment apparatus according to the first embodiment, FIG. 2 is an explanatory view of a power feeding portion to the first and second electrodes of the plasma surface treatment apparatus shown in FIG. 1, and FIG. FIG. 4 is an explanatory diagram showing a standing wave of power generated between a pair of electrodes, and FIG. 5 is a standing wave of two powers generated between the pair of electrodes. It is explanatory drawing which shows the position of a belly.

First, the configuration of the apparatus will be described. 1 and 2, reference numeral 1 denotes a vacuum vessel. The vacuum vessel 1 includes a pair of electrodes for plasmaizing a discharge gas, which will be described later, that is, a first electrode 2 composed of a single non-grounded bar and a grounded flat plate-like first member containing a substrate heater 3 (not shown). Two electrodes 4 are arranged.
The first electrode 2 is fixed to the vacuum vessel 1 through an insulator support 5 and a gas mixing box 6. The gas mixing box 6 has a function of uniformly supplying a discharge gas such as silane gas (SiH 4) supplied from the discharge gas supply pipe 8 between the pair of electrodes 2 and 4 through the rectifying holes 7. Yes.
The supplied discharge gas such as SiH 4 is turned into plasma between the pair of electrodes 2 and 4, and is then discharged out of the vacuum vessel 1 by the exhaust pipe 9 and a vacuum pump 10 (not shown).

  The pressure in the vacuum vessel 1 is monitored by a pressure gauge (not shown), and is automatically adjusted and set to a predetermined value by a pressure adjustment valve (not shown). In the case of the present embodiment, when the discharge gas has a flow rate of about 500 sccm to 1500 sccm, the pressure can be adjusted to about 0.01 Torr to 10 Torr (1.33 Pa to 1330 Pa). The vacuum ultimate pressure of the vacuum vessel 1 is about 2 to 3E-7 Torr (2.66 to 3.99E-5 Pa).

  Reference numeral 11 denotes a substrate, which is installed on the second electrode 4 by opening and closing a gate valve 12 (not shown). Then, it is heated to a predetermined temperature by a substrate heater 3 (not shown).

  One feeding point, which is a position for feeding high-frequency power to the electrode, is one end of the first electrode 2 composed of the one bar, and this is a first feeding point 12. The other end of the electrode, which is in a position that is a point opposite to the feeding point 12 in the propagation of a high-frequency power wave, is a second feeding point 13.

Reference numeral 50 denotes a first oscillator that generates a sine wave signal having a frequency of 10 MHz to 30 MHz (VH band) to 30 MHz to 300 MHz (VHF band), and the phase of the sine wave signal is a first random phase modulation. Modulator 51 randomly modulates.
As will be described later, by mutually modulating the phase of the sine wave signal, it is possible to reduce mutual coherence between outputs of first and second power supply systems described later.
Reference numeral 51 denotes a first random phase modulator, which has a function of randomly modulating the phase of the sine wave signal of the first transmitter 50. That is, since the first oscillator 50 is phase-modulated by the first random phase modulator 51, the first oscillator 50 transmits a signal represented by sin {ωt + Φ1 (t)} to the first distributor 52. Where ω is an angular frequency, t is time, and Φ1 (t) is a randomly modulated phase.

For the random phase modulation, means for controlling the capacitance of the resonance circuit, which is the internal circuit of the first oscillator 50, with an external signal, that is, with a random phase modulator. Note that the capacitance control of the resonance circuit can be easily performed by using, for example, a variable capacitance diode.
Random phase modulators generally include random number generators, white noise generators, and random number signal generators that are used in computers such as communication engineering and mechanical vibration engineering. Here, a white noise generator is used.
The output signal can also be subjected to random phase modulation by using a computer-controlled synthesizer oscillator, the random number generator, the white noise generator, and a random number signal generator using a computer.
Further, the output of the oscillator 50 may be subjected to random phase modulation using an analog voltage control type phase shifter (phase shifter) and the random number generator, white noise generator and random number signal generator using a computer. it can.

Reference numeral 52 denotes a first distributor, which distributes the output of the first transmitter 50 into two. One of them is transmitted to a first phase shifter 53 described later, and the other is transmitted to a second phase shifter 56 described later.
Reference numeral 53 is a first phase shifter having a function of arbitrarily shifting the phase of the input signal. Reference numeral 54 amplifies the power of the signal input by the first amplifier.
Reference numeral 55 denotes a first impedance matching unit. The output of the first amplifier 54 is supplied to the first coaxial cable 14, the first current introduction terminal 15, the first vacuum coaxial cable 16, and the first vacuum. Power is supplied to the first feeding point 12 via the core wire 17 of the coaxial cable 16 for use. Reference numeral 18 denotes a power supply line that connects the outer conductor of the first vacuum coaxial cable 16 and the second electrode.
A tubular insulating material (not shown) is attached to the power supply lines 17 and 18 to suppress abnormal discharge in the vicinity thereof.
The first power amplifier 54 includes an output value (traveling wave) monitor and a reflected wave monitor reflected back from the downstream side. In addition, an isolator for protecting the electric circuit of the power amplifier main body by the reflected wave is attached.

The other output of the first distributor 52 is transmitted to the downstream via the second phase shifter 56, the second amplifier 57, and the second impedance matcher 58.
The second impedance matcher 58 outputs the output of the second amplifier 57 to the second coaxial cable 19, the second current introduction terminal 20, the second vacuum coaxial cable 21, and the second vacuum coaxial cable. Electric power is supplied to the second feeding point 13 via the 21 core wires 22. Reference numeral 23 denotes a power supply line that connects the outer conductor of the second vacuum coaxial cable 21 and the second electrode.
Note that a tubular insulating material (not shown) is attached to the power supply lines 22 and 23 to suppress abnormal discharge in the vicinity thereof.
The second power amplifier 57 includes an output value (traveling wave) monitor and a reflected wave monitor reflected from the downstream side. In addition, an isolator for protecting the electric circuit of the power amplifier main body by the reflected wave is attached.

  Here, the first oscillator 50, the first random phase modulator 51, the first and second phase shifters 53 and 56, the first and second amplifiers 54 and 57, the first and second impedances. The power supply system configured from the matching units 55 and 58 is referred to as a first power supply system.

Reference numeral 60 denotes a second oscillator which generates a sine wave signal having a frequency of 10 MHz to 30 MHz (VH band) to 30 MHz to 300 MHz (VHF band), and the phase of the sine wave signal is a second random phase modulation. The device 61 randomly modulates the signal.
As will be described later, the mutual coherence between the outputs of the first power supply system and the second power supply system described later can be reduced by randomly modulating the phase of the sine wave signal. Is possible.
Reference numeral 61 denotes a second random phase modulator, which has a function of randomly modulating the phase of the sine wave signal of the second transmitter 60. That is, since the second transmitter 60 is phase-modulated by the second random phase modulator 61, the second transmitter 60 transmits a signal represented by sin {ωt + Φ2 (t)} to the second distributor 62. Where ω is an angular frequency, t is time, and Φ2 (t) is a randomly modulated phase.
Here, the second random phase modulator 61 can be omitted for the reason described later when the high-frequency power supply system is composed of two oscillators as in the present embodiment, for example.
Further, when the high-frequency power supply system is composed of three or more oscillators, any one of them can be omitted for the reason described later.

For the random phase modulation, means for controlling the capacitance of the resonance circuit, which is the internal circuit of the second oscillator 60, with an external signal, that is, with a random phase modulator. Note that the capacitance control of the resonance circuit can be easily performed by using, for example, a variable capacitance diode.
Random phase modulators generally include random number generators, white noise generators, and random number signal generators that are used in computers such as communication engineering and mechanical vibration engineering. Here, a white noise generator is used.
The output signal can also be subjected to random phase modulation by using a computer-controlled synthesizer oscillator, the random number generator, the white noise generator, and a random number signal generator using a computer.
Further, the output of the oscillator 60 may be subjected to random phase modulation using an analog voltage control type phase shifter (phase shifter) and the random number generator, white noise generator and random number signal generator using a computer. it can.

Reference numeral 62 denotes a second distributor, which distributes the output of the second transmitter 60 into two. One of them is transmitted to a third phase shifter 63 described later, and the other is transmitted to a fourth phase shifter 66 described later.
Reference numeral 63 denotes a third phase shifter having a function of arbitrarily shifting the phase of the input signal. Reference numeral 64 amplifies the power of the signal input by the third amplifier. Reference numeral 65 is a third impedance matching unit, and the output of the third amplifier 64 is supplied to the third coaxial cable 24, the third current introduction terminal 25, the third vacuum coaxial cable 26, and the third vacuum. Electric power is supplied to the first feeding point 12 via the core wire 27 of the coaxial cable 26 for use. Reference numeral 28 denotes a power supply line that connects the outer conductor of the third vacuum coaxial cable 26 and the second electrode.
Note that a tubular insulating material (not shown) is attached to the power supply lines 27 and 28 to suppress abnormal discharge in the vicinity thereof.
The third power amplifier 64 is provided with an output value (traveling wave) monitor and a reflected wave monitor reflected back from the downstream side. In addition, an isolator for protecting the electric circuit of the power amplifier main body by the reflected wave is attached.

The other output of the second distributor 62 is transmitted to the downstream via a fourth phase shifter 66, a fourth amplifier 67, and a fourth impedance matching unit 68.
The fourth impedance matching unit 68 uses the output of the fourth amplifier 67 as the fourth coaxial cable 29, the fourth current introduction terminal 30, the fourth vacuum coaxial cable 31, and the fourth vacuum coaxial cable. Power is supplied to the second feeding point 13 via the core wire 32 of 31. Reference numeral 33 is a power supply line connecting the outer conductor of the fourth vacuum coaxial cable 31 and the second electrode.
In addition, a tubular insulating material (not shown) is attached to the power supply lines 32 and 33 to suppress abnormal discharge in the vicinity thereof.
The fourth power amplifier 67 includes an output value (traveling wave) monitor and a reflected wave monitor reflected back from the downstream side. In addition, an isolator for protecting the electric circuit of the power amplifier main body by the reflected wave is attached.

As will be described later, an apparatus configuration in which either the first random phase modulator 51 or the second random phase modulator 61 is omitted may be used.
In addition, here, the second transmitter 60, the second random phase modulator 61, the second distributor 62, the third and fourth phase shifters 63 and 66, and the third and fourth amplifiers 64 and 67 are used. The power supply system composed of the third and fourth impedance matching units 65 and 68 is referred to as a second power supply system.

Next, a method for producing an amorphous silicon film for a thin film solar cell by plasma CVD using the plasma surface treatment apparatus having the above configuration will be described.
In the implementation or application of the present invention, it is preferable to use the first and second preliminary film forming steps and the main film forming step as procedures.
The first preliminary film forming step relates to the first power supply system, and uses the first and second phase shifters 53 and 56 to supply two electric powers supplied from the first and second feeding points. This is performed in order to obtain data for grasping the relationship between the phase difference of the voltage of the first electrode and the thickness distribution of the amorphous silicon film formed on the substrate 11.
The second preliminary film-forming step relates to the second power supply system, and uses the third and fourth phase shifters 63 and 66 to supply two powers supplied from the first and second feeding points. This is performed in order to obtain data for grasping the relationship between the phase difference of the voltage of the first electrode and the thickness distribution of the amorphous silicon film formed on the substrate 11.
This film-forming process is performed for the production of the target amorphous Si.

  In this embodiment, as shown below, in the first preliminary film-forming process and the second preliminary film-forming process, as means for grasping information on the position of the antinode of the standing wave, for example, an amorphous silicon film However, instead of this, at least one of the etching rate distribution, the plasma emission distribution, the plasma density distribution, etc. is measured in advance, and the antinode of the standing wave is determined based on the measurement result. You may grasp | ascertain the relationship between the information of a position, and the phase difference of the voltage of two output electric power of each of the several 2 output phase variable high frequency power supply mentioned later.

First, in the first first preliminary film-forming step, in FIGS. 1 and 2, the substrate 11 is previously set on the second electrode 4, and the vacuum pump 10 (not shown) is operated to operate the vacuum container. After removing the impurity gas and the like in 1, the substrate temperature is in the range of 80 to 350 ° C., for example 180, while the SiH 4 gas is supplied from the discharge gas supply tube 8 at 600 sccm and the pressure 0.5 Torr (66.5 Pa), for example. Hold at ° C.
Next, the first power supply system, that is, the first transmitter 50, the first random phase modulator 51, the first and second phase shifters 53 and 56, and the first and second amplifiers 54 and 57 are used. The power supplied from the first and second impedance matching units 55 and 58 is supplied to the first and second coaxial cables 14 and 19 and the first and second current introduction terminals 15 and 20 through the first and second current introducing terminals 15 and 20, respectively. And supplied to the second feeding points 12 and 13.
In this case, the frequency of the first oscillator 50 is set to 60 MHz, for example.
Then, the adjuster of the first phase shifter 53 is set to θ1, for example, the output of the first power amplifier 54 is set to 500 W, for example, and the output is set to the first impedance matcher 55, the first The current is supplied to the first feeding point 12 through the current introduction terminal 15 and the core wire 17 of the first vacuum coaxial cable 16. Then, the adjuster of the second phase shifter 56 is set to θ2, for example, the output of the second power amplifier 57 is set to 500 W, for example, and the output is set to the second impedance matcher 58, the second The current is supplied to the second feeding point 13 through the current introduction terminal 20 and the core wire 22 of the second vacuum coaxial cable 21.
By adjusting the first impedance matching unit 55 and the second impedance matching unit 58, the reflected wave of the supplied power can be prevented from returning to the upstream side of the respective impedance matching units 55 and 58.
As a result, plasma of the SiH 4 gas is generated and, for example, amorphous Si is deposited on the substrate 11.

In the above manner, an amorphous Si film is formed on the substrate 11 with a film formation time of, for example, 10 to 20 minutes. After film formation, the substrate 11 is taken out from the vacuum vessel 1 and the film thickness distribution of the amorphous Si film is evaluated. As will be described later, the film thickness distribution of, for example, amorphous Si deposited on the substrate 11 becomes a sinusoidal distribution due to the occurrence of a standing wave, which is a phenomenon inherent to VHF plasma. Such a film forming test is repeatedly performed using the phases θ1 and θ2 of the first and second phase shifters 53 and 56 as parameters.
Then, in the length direction of the first electrode 2, the distance from the center point of the substrate 11 to the position of the maximum thickness of the sine film thickness distribution and the phase θ 1 of the first and second phase shifters 53, 56, The relation of θ2 is grasped as data.
For example, it is understood that the phase values of the first and second phase shifters 53 and 56 at which the position of the maximum thickness of the film thickness distribution is the center point of the substrate 11 are θ11 and θ22, for example.

By the way, the voltage wave of the power supplied from the first and second feeding points 12 and 13 oscillates from the same power source and propagates between the electrodes from opposite directions, that is, both face each other. Since they propagate from each other and overlap, an interference phenomenon occurs. This will be described with reference to FIGS.
2 and 3, the distance in the direction from the first feeding point 12 to the second feeding point 13 is x,
A voltage wave propagating from the first feeding point 12 toward the second feeding point 13 is W11 (x, t), and a voltage wave propagating from the second feeding point 13 toward the first feeding point 12 is W21. If (x, t), it is expressed as follows.
W11 (x, t) = V · cos {ωt + Φ1 (t) + 2πx / λ) + θ1}
W12 (x, t) = V · cos {ωt + Φ1 (t) −2π (x−L0) / λ + θ2}
Where V is the amplitude of the voltage wave, ω is the angular frequency of the voltage, λ is the wavelength of the voltage wave, t is time, Φ1 (t) is a phase that changes randomly in time, and L0 is the first and second power supplies. The interval between points, θ1 is the initial phase of the voltage wave of power supplied from the first feeding point 12, and θ2 is the initial phase of the voltage wave of power supplied from the second feeding point 13.
The above two waves are expressed as follows when expressed in a complex function.
W11 (x, t) = Re [V · exp {−i (2πx / λ + θ1)} · exp {−iωt−iΦ1 (t)}]
W12 (x, t) = Re [V · exp {i2π (x−L0) / λ−iθ2)} · exp {−iωt−iΦ1 (t)}]

The wave intensity I (x, t) when considering the interference of electromagnetic waves is expressed as follows. However, * shows a conjugate complex number.
I (x, t) = {W11 (x, t) + W12 (x, t)} squared absolute value = {W11 (x, t) + W12 (x, t)} · {W11 (x, t) ^* + W12 (x, t) ^* }
= 2V ² + V ² · exp [−i {2π (2x−L0) / λ + (θ1−θ2)}] + exp [i {2π (2x−L0) / λ + (θ1−θ2)}]
= 2V ² + 2V ² cos {2π (2x−L0) / λ + (θ1−θ2)}
= 4V ² cos ² {2π (x−L0 / 2) / λ + (θ1−θ2) / 2}
However, although λ is a wavelength, it is not the wavelength of the electromagnetic wave in vacuum but the wavelength λ under the above-mentioned film forming conditions, and is generally shorter than the wavelength λ ₀ of the electromagnetic wave in vacuum. In the SiH 4 gas plasma, the ratio λ / λ ₀ between the wavelength λ in the plasma and the wavelength λ ₀ in the vacuum is about 0.6.
As shown in FIG. 4, this equation is obtained when (θ1−θ2) = Δθ = 0, that is, when the difference in the initial phase of the voltage of the power supplied to the first and second feeding points 12 and 13 is zero. Indicates that the position of the antinode (maximum value) is at x = L0 / 2, and that a standing wave is generated in which the interval between the antinode and the antinode is one-half of the wavelength.
Further, it is shown that the antinode position of the standing wave can be arbitrarily set by adjusting the value of Δθ = (θ1−θ2).

  Here, the standing wave generated using the first power supply system is referred to as a first standing wave. In addition, a standing wave generated using a second power supply system described later is referred to as a second standing wave.

Next, in the second preliminary film forming step, in FIGS. 1 and 2, the substrate 11 is previously set on the second electrode 4, the vacuum pump 10 (not shown) is operated, and the inside of the vacuum container 1 is operated. After removing the impurity gas, etc., the substrate temperature is in the range of 80 to 350 ° C., for example, 180 ° C. while supplying SiH 4 gas from the discharge gas supply tube 8 at 600 sccm and pressure of 0.5 Torr (66.5 Pa) Hold.
The second power supply system, that is, the second transmitter 60, the second random phase modulator 61, the second distributor 62, the third and fourth phase shifters 63, 66, the third and the second The power supplied from the fourth amplifiers 64 and 67, the third and fourth impedance matching units 65 and 68 is supplied to the third and fourth coaxial cables 24 and 29, the third and fourth current introduction terminals 25, The first and second feeding points 12 and 13 are supplied via 30.
In this case, the frequency of the second oscillator 60 is set to 60 MHz, for example.
Then, the regulator of the third phase shifter 63 is set to δ1, for example, the output of the third power amplifier 64 is set to 500 W, for example, and the output is set to the third impedance matching device 65, the third The current is supplied to the first feeding point 12 through the current introduction terminal 25 and the core wire 27 of the third vacuum coaxial cable 26. Then, the regulator of the fourth phase shifter 66 is set to δ2, for example, the output of the fourth power amplifier 67 is set to 500 W, for example, and the output is set to the fourth impedance matching device 68, the fourth The current is supplied to the second feeding point 13 through the current introduction terminal 30 and the core wire 32 of the fourth vacuum coaxial cable 31.
By adjusting the third and fourth impedance matching units 65 and 68, the reflected wave of the supplied power can be prevented from returning to the upstream side of the respective impedance matching units 65 and 68.
As a result, plasma of the SiH 4 gas is generated and, for example, amorphous Si is deposited on the substrate 11.

In the above manner, an amorphous Si film is formed on the substrate 11 with a film formation time of, for example, 10 to 20 minutes. After film formation, the substrate 11 is taken out from the vacuum vessel 1 and the film thickness distribution of the amorphous Si film is evaluated. As will be described later, the film thickness distribution of, for example, amorphous Si deposited on the substrate 11 becomes a sinusoidal distribution due to the occurrence of a standing wave, which is a phenomenon inherent to VHF plasma. Such a film forming test is repeatedly performed using the phases δ1 and δ2 of the third and fourth phase shifters 63 and 66 as parameters.
Then, in the length direction of the first electrode 2, the distance from the center point of the substrate 11 to the position of the maximum thickness of the sinusoidal film thickness distribution and the phase difference Δδ = (δ1) of the fourth phase shifters 63 and 66 The relation of -δ2) is grasped as data.
For example, the phase difference Δδ = (δ1−δ2) for setting a position away from the center point of the substrate 11 by a quarter of the wavelength λ in the direction of the second feeding point 13, that is, λ / 4 is, for example, It is understood that δ11-δ22.
The position is not limited to a position separated by λ / 4, but may be an odd multiple of a quarter of the wavelength λ, that is, an odd multiple of λ / 4.
However, the wavelength λ is not the wavelength of the electromagnetic wave in vacuum but the wavelength λ under the above-mentioned film forming conditions, and is generally shorter than the wavelength λ ₀ of the electromagnetic wave in vacuum. In the SiH 4 gas plasma, the ratio λ / λ ₀ between the wavelength λ in the plasma and the wavelength λ ₀ in the vacuum is about 0.6.
Further, when setting the above phase difference Δδ = (δ1−δ2), the interval between the antinode position of the first standing wave and the antinode position of the second standing wave is the antinode space. The phase difference Δδ = (δ1-δ2) may be selected so as to be equal to an odd multiple of one half of the target period.
That is, the position of the maximum thickness (the antinode of the second standing wave) of the film having a sinusoidal film thickness formed on the substrate 11 in the second preliminary film forming step is the second position from the center point of the substrate 11. What is necessary is just to make it match | combine with the point separated by the odd multiple of 1/2 of the period of the film | membrane in the direction of the feeding point 13. FIG. Note that the value of half of the film cycle can be grasped in advance in the first preliminary film-forming step.

By the way, the voltage wave of the power supplied from the first and second feeding points 12 and 13 is oscillated from the same power source and propagates between the electrodes, that is, both propagate from the direction facing each other. Since they overlap each other, an interference phenomenon occurs. This will be described with reference to FIGS.
2 and 3, the distance in the direction from the first feeding point 12 to the second feeding point 13 is x, and a voltage wave propagating from the first feeding point 12 to the second feeding point 13 is represented by W21. Assuming that the voltage wave propagating from the second feeding point 13 to the first feeding point 12 is (x, t) and W22 (x, t), it is expressed as follows.
W21 (x, t) = V · cos {ωt + Φ2 (t) + 2πx / λ + δ1)}
W22 (x, t) = V · cos {ωt + Φ2 (t) −2π (x−L0) / λ + δ2}
Where V is the amplitude of the voltage wave, ω is the angular frequency of the voltage, λ is the wavelength of the voltage wave, t is time, Φ2 (t) is a phase that changes randomly in time, and L0 is the first and second power supplies. The point interval, δ1 is the initial phase of the voltage wave of the power supplied from the first feeding point 12, and δ2 is the initial phase of the voltage wave of the power supplied from the second feeding point 13.
The above two waves are expressed as follows when expressed in a complex function.
W21 (x, t) = Re [V · exp {−i (2πx / λ + δ1)} · exp {−iωt−iΦ2 (t)}]
W22 (x, t) = Re [V · exp {i2π (x−L0) / λ) −iδ2} · exp {−iωt−iΦ2 (t)}]

The wave intensity I (x, t) when considering the interference of electromagnetic waves is expressed as follows.
I (x, t) = {square root of absolute value of W21 (x, t) + W22 (x, t)} = {W21 (x, t) + W22 (x, t)} · {W21 (x, t) ^* + W22 (x, t) ^* }
= 2V ² + V ² · exp [−i {2π (2x−L0) / λ) + (δ1−δ2)}] + V ² · exp [i {2π (2x−L0) / λ) + (δ1−δ2) }]
= 2V ² + 2V ² cos {2π (2x−L0) / λ + (δ1-δ2)}
= 4V ² cos ² {2π (x−L0 / 2) / λ + (δ1-δ2) / 2}
However, although λ is a wavelength, it is not the wavelength of the electromagnetic wave in vacuum but the wavelength λ under the above-mentioned film forming conditions, and is generally shorter than the wavelength λ ₀ of the electromagnetic wave in vacuum. In the SiH 4 gas plasma, the ratio λ / λ ₀ between the wavelength λ in the plasma and the wavelength λ ₀ in the vacuum is about 0.6.
As shown in FIG. 4, this equation is obtained when Δδ = (δ1−δ2) = 0, that is, when the difference in the initial phase of the voltage of the power supplied to the first and second feeding points 12 and 13 is zero. Indicates that a standing wave is generated in which the position of the antinode (maximum value) is at x = L0 / 2, and the interval between the antinode is half the wavelength.
Further, it is shown that the antinode position of the standing wave can be arbitrarily set by adjusting the value to Δδ = (δ1−δ2).
Here, the standing wave generated using the second power supply system is referred to as a second standing wave.

Now, in response to the results of the first and second preliminary film forming steps, the main film forming step is started.
First, in FIGS. 1 and 2, the substrate 11 is previously set on the second electrode 4, the vacuum pump 10 (not shown) is operated to remove the impurity gas in the vacuum vessel 1, and then the discharge gas is supplied. While supplying SiH4 gas from the tube 8 at, for example, 600 sccm and a pressure of 0.5 Torr (66.5 Pa), the substrate temperature is maintained in the range of 80 to 350 ° C., for example, 180 ° C.
Next, the frequency of the oscillator 50 of the first power supply system is set to 60 MH, and the phases of the outputs of the two phase shifters 53 and 56 are set to θ11 and θ22 that are grasped as data of the first preliminary film forming process. For example, 400 W is supplied to the first and second feeding points 12 and 13, respectively.
Similarly, the frequency of the oscillator 60 of the second power supply system is set to 60 MH, and the phases of the outputs of the two phase shifters 63 and 66 are set to δ11 and δ22 which are grasped as data of the second preliminary film forming process. For example, 400 W is supplied to the first and second feeding points 12 and 13, respectively.

When power is supplied to the first and second feeding points 12 and 13 from the first and second power supply systems, the distribution of power generated between the pair of electrodes is as follows. become.
In this case, since four voltage waves are applied simultaneously, the intensity I (x, t) of the electromagnetic wave is expressed by the following equation.
Where V is the amplitude of the voltage wave, ω is the angular frequency of the voltage, λ is the wavelength of the voltage wave, t is time, Φ1 (t) is a phase that changes randomly in time, and L0 is the first and second power supplies. The interval between points, θ1 is the initial phase of the voltage wave of power supplied from the first feeding point 12, θ2 is the initial phase of the voltage wave of power supplied from the second feeding point 13, and Φ2 (t) is the time. Δ1 is an initial phase of a voltage wave of power supplied from the first feeding point 12, and δ2 is an initial phase of a voltage wave of power supplied from the second feeding point 13. * Represents a conjugate complex number.
I (x, t) = {W11 (x, t) + W12 (x, t) + W21 (x, t) + W22 (x, t)} · {W11 (x, t) ^* + W12 (x, t) ^* + W21 (X, t) ^* + W22 (x, t) ^* }
Here, W11 (x, t), W12 (x, t), W21 (x, t), and W22 (x, t) are as described above and represented by the following equations.
W11 (x, t) = Re [V · exp {−i (2πx / λ + θ1)} · exp {−iωt−iΦ1 (t)}]
W12 (x, t) = Re [V · exp {i2π (x−L0) / λ−iθ2)} · exp {−iωt−iΦ1 (t)}]
W21 (x, t) = Re [V · exp {−i (2πx / λ + δ1)} · exp {−iωt−iΦ2 (t)}]
W22 (x, t) = Re [V · exp {i2π (x−L0) / λ) −iδ2} · exp {−iωt−iΦ2 (t)}]

The intensity I (x, t) of the electromagnetic wave is calculated as follows.
I (x, t) = {W11 (x, t) .W11 (x, t) ^* + W11 (x, t) .W12 (x, t) ^* + W12 (x, t) .W11 (x, t) ^* + W12 (x, t) ^* W12 (x, t) ^* } + {W21 (x, t) ^* W21 (x, t) ^* + W21 (x, t) ^* W22 (x, t) ^* + W22 (x, t ) · W21 (x, t) ^* + W22 (x, t) · W22 (x, t) ^* } + {W11 (x, t) · W21 (x, t) ^* + W21 (x, t) · W11 (x , T) ^* } + {W11 (x, t) .W22 (x, t) ^* + W22 (x, t) .W11 (x, t) ^* } + {W12 (x, t) .W21 (x, t ^{) * + W21 (x, t} ) · W12 (x, t) *} + {W12 (x, t) · W22 (x, t) * + W22 (x, t) · W12 (x, t) *}

That is, I (x, t) is as follows.
I (x, t) = 4V ² cos ² {2π (x−L0 / 2) / λ + (θ1−θ2) / 2} + 4V ² cos ² {2π (x−L0 / 2) / λ + (δ1−δ2) / 2}
+ 2V ² cos [{Φ1 (t) −Φ2 (t)} + (θ1−δ1)] + 2V ² cos [{Φ1 (t) −Φ2 (t)} + 2π (2x−L0 / 2) / λ + (θ1− δ2)] + 2V ² cos [{Φ1 (t) −Φ2 (t)} + 2π (2x−L0 / 2) / λ + (θ2−δ1)] + 2V ² cos [{Φ1 (t) −Φ2 (t)} + (Θ2-δ2)]

  In the above equation, the first term represents the above-mentioned first standing wave, and the second term represents the above-mentioned second standing wave.

In the above equation, the third term includes the voltage wave W11 (x, t) of power supplied from the first power supply system shown in FIG. 2 to the first feeding point 12 and the second power supply system. 1 shows a composite wave of the voltage wave W21 (x, t) of power supplied to one feeding point 12.
The value indicated in this term changes randomly in the voltage of the output from the first and second oscillators 50 and 60 that are phase-modulated randomly by the first and second random phase modulators 51 and 61, respectively. Since the phase difference {Φ1 (t) −Φ2 (t)} is included, the value is random in time. That is, the instantaneous value changes randomly with time. As a result, in terms of time average, the average value is almost zero.
The time average is to take an average over a sufficiently large time compared to the period of the oscillator output. That is, if the time average is indicated by <>,
<Third term> = <2V ² cos [{Φ1 (t) −Φ2 (t)} + (θ1−δ1)]>
= 0
This indicates that W11 (x, t) and W21 (x, t) cannot generate a standing wave.
Here, the above item <3> is considered. The value of the above <third term> is the case where one of the random phase changes Φ1 (t) and Φ2 (t) of the voltage signals output from the first and second oscillators 50 and 60 is constant or zero. Is also zero.
This means that in the configuration shown in FIG. 1, either the first random phase modulator 51 or the second random phase modulator 61 can be excluded. That is, it is not necessary to attach a random phase modulator to one oscillator among a plurality of oscillators constituting the apparatus. In this case, the configuration of the apparatus is simple.

In the above equation, the fourth term includes the voltage wave W11 (x, t) of power supplied from the first power supply system shown in FIG. 2 to the first feeding point 12 and the second power supply system. 2 shows a composite wave of the voltage wave W22 (x, t) of the power supplied to the two feeding points 13.
The value indicated in this term changes randomly in the voltage of the output from the first and second oscillators 50 and 60 that are phase-modulated randomly by the first and second random phase modulators 51 and 61, respectively. Since the phase difference {Φ1 (t) −Φ2 (t)} is included, the value is random in time. That is, the instantaneous value changes randomly with time. As a result, in terms of time average, the average value is almost zero.
The time average is to take an average over a sufficiently large time compared to the period of the oscillator output. That is, if the time average is indicated by <>,
<4th term> = <2V ² cos [{Φ1 (t) −Φ2 (t)} + 2π (2x−L0 / 2) / λ + (θ1−δ2)]> = 0
This indicates that W11 (x, t) and W22 (x, t) cannot generate a standing wave.
Here, the above <4th term> is considered. The value of the <fourth term> is obtained when either of the random phase changes Φ1 (t) and Φ2 (t) of the voltage signals output from the first and second oscillators 50 and 60 is constant or zero. Is also zero.
This means that in the configuration shown in FIG. 1, either the first random phase modulator 51 or the second random phase modulator 61 can be excluded. That is, it is not necessary to attach a random phase modulator to one oscillator among a plurality of oscillators constituting the apparatus. In this case, the configuration of the apparatus is simple.

In the above equation, the fifth term includes the voltage wave W12 (x, t) of the power supplied from the first power supply system shown in FIG. 2 to the second feeding point 13 and the second power supply system. 1 shows a combined wave of the voltage wave W21 (x, t) of power supplied to one feeding point 12.
The value indicated in this term changes randomly in the voltage of the output from the first and second oscillators 50 and 60 that are phase-modulated randomly by the first and second random phase modulators 51 and 61, respectively. Since the phase difference {Φ1 (t) −Φ2 (t)} is included, the value is random in time. That is, the instantaneous value changes randomly with time. As a result, in terms of time average, the average value is almost zero.
The time average is to take an average over a sufficiently large time compared to the period of the oscillator output. That is, if the time average is indicated by <>,
<5th term> = <2V ² cos [{Φ1 (t) −Φ2 (t)} + 2π (2x−L0 / 2) / λ + (θ2−δ1)]> = 0
This indicates that W12 (x, t) and W21 (x, t) cannot generate a standing wave.
Here, <Section 5> will be considered. The value of the <fifth term> is when the random phase change Φ1 (t) or Φ2 (t) of the voltage signals output from the first and second oscillators 50 and 60 is a constant value or zero. Is also zero.
This means that in the configuration shown in FIG. 1, either the first random phase modulator 51 or the second random phase modulator 61 can be excluded. That is, it is not necessary to attach a random phase modulator to one oscillator among a plurality of oscillators constituting the apparatus. In this case, the configuration of the apparatus is simple.

In the above equation, the sixth term includes the voltage wave W12 (x, t) of power supplied from the first power supply system shown in FIG. 2 to the second feeding point 13 and the second power supply system. 2 shows a combined wave of the voltage wave W22 (x, t) of the power supplied to the two feeding points 13.
The value indicated in this term changes randomly in the voltage of the output from the first and second oscillators 50 and 60 that are phase-modulated randomly by the first and second random phase modulators 51 and 61, respectively. Since the phase difference {Φ1 (t) −Φ2 (t)} is included, the value is random in time. That is, the instantaneous value changes randomly with time. As a result, in terms of time average, the average value is almost zero.
The time average is to take an average over a sufficiently large time compared to the period of the oscillator output. That is, if the time average is indicated by <>,
<Sixth term> = <2V ² cos [{Φ1 (t) −Φ2 (t)} + (θ2−δ2)]> = 0
This indicates that W12 (x, t) and W22 (x, t) cannot generate a standing wave.
Here, <Section 6> will be considered. The value of the <sixth term> is when the random phase change Φ1 (t) or Φ2 (t) of the voltage signals output from the first and second oscillators 50 and 60 is a constant value or zero. Is also zero.
This means that in the configuration shown in FIG. 1, either the first random phase modulator 51 or the second random phase modulator 61 can be excluded. That is, it is not necessary to attach a random phase modulator to one oscillator among a plurality of oscillators constituting the apparatus. In this case, the configuration of the apparatus is simple.

As described above, the first oscillator 50 configuring the first power supply system and the second oscillator 60 configuring the second power supply system are respectively connected to the first and second random phase modulators 51 and 61. As a result of the phase of the sine wave signal being randomly modulated, W11 (x, t) and W21 (x, t), W11 (x, t) and W22 (x, t), W12 (x, t) And W21 (x, t), and W12 (x, t) and W22 (x, t) do not generate a standing wave, respectively.
That is, it is possible to eliminate the mutual interference effect between the outputs of the first and second power supply systems by randomly modulating the phases of the outputs of the first oscillator 50 and the second oscillator 60. Is shown.
Further, as described above, in this embodiment, it is not necessary to randomly modulate the phases of the outputs of both the first oscillator 50 and the second oscillator 60, and only one of the phases is randomly modulated. That is enough.

Therefore, the intensity I (xt) of the electromagnetic wave between the pair of electrodes 2 and 4 generated by the power supplied from the first and second power supply systems to the first and second feeding points 12 and 13. Is as follows in terms of time average.
I (x, t) = 4V ² cos ² {2π (x−L0 / 2) / λ + (θ1−Δθ2) / 2} + 4V ² cos ² {2π (x−L0 / 2) / λ + (δ1−δ2) / 2}
This indicates that it is the sum of two standing waves that do not vary with time.
The phase difference Δθ = (θ1−θ2) that can be adjusted by the first and second phase shifters 53 and 56 and the phase difference Δδ = (δ1−) that can be adjusted by the third and fourth phase shifters 63 and 66. It is shown that the position of the antinodes of the two standing waves can be arbitrarily adjusted by adjusting δ2).

Specifically, for example, the phase values of the first and second phase shifters 53 and 56 are set to θ11 and θ22 shown in the first preliminary film forming step, and
Assuming that the phase values of the third and third phase shifters 63 and 66 are δ11 and δ22 shown in the second preliminary film-forming step, as shown in FIG. Waves will be added in a form separated by λ / 4.
That is, the sum I2 (x) of the two standing waves is
I2 (x) = 4V ² cos ² {2π (x−L0 / 2) / λ} + 4V ² cos ² {2π (x−L0 / 2) / λ + π / 2}
= 4V ² cos ² {2π (x−L0 / 2) / λ} + 4V ² sin ² {2π (x−L0 / 2) / λ}
= 4V ²
It is represented by
In the above specific example, as shown in FIG. 5, it means that the first and second standing waves are added in a form separated by λ / 4. When the phase difference Δδ = (δ1-δ2) is set in the preliminary film-forming process of 2, the interval between the antinode position of the first standing wave and the antinode position of the second standing wave is This means that the phase difference Δδ = (δ1−δ2) should be selected so as to be equal to one half of the antinode spatial period.

Incidentally, in general, the distribution of power intensity between the pair of electrodes 2 and 4 and the distribution of plasma intensity are in a proportional relationship. On the other hand, when the SiH 4 gas is turned into plasma in the above process, radicals such as SiH 3, SiH 2, and SiH existing in the plasma diffuse due to the diffusion phenomenon and are adsorbed on the surface of the substrate 11, thereby causing the a-Si film. However, the plasma intensity distribution and the film thickness distribution are proportional to each other.
This means that the fact that the power intensity distribution is made uniform means that the film thickness distribution is made uniform.
In addition, the distribution of power intensity being uniform means that the plasma density and the radial density are uniform over a large area.
Therefore, when the power intensity between the pair of electrodes 2 and 4 is uniform as described above, the distribution of the deposited film is uniform. As a result, the variation in film thickness is uniform. Since the variation of the film thickness necessary for practical use is 5 to 10%, it can be easily achieved.
This means that it is possible to form a uniform film thickness distribution, which is impossible with the conventional VHF plasma surface treatment apparatus and method for a substrate having a size exceeding a quarter of the wavelength λ. It means that. Therefore, the above is an epoch-making discovery in the application field of VHF plasma, and its practical value is remarkably large.
Note that microcrystalline Si or thin-film polycrystalline Si can be formed by optimizing the flow rate ratio, pressure, and power of SiH and H2 in the film forming conditions. It is a matter of course that the film can be formed in the same manner as the film formation.

In this embodiment, since the first electrode 2 is a single bar, the substrate size is limited to a length of 2 m to 3 mx and a width of about 0.1 m, but the number of bar electrodes as the first electrode 2 is limited. It goes without saying that the width of the substrate size can be increased if it increases in the width direction.

In the production of thin film solar cells, thin film transistors, and photosensitive drums, there is no problem in performance as long as the film thickness distribution is within ± 10%. According to the above embodiment, it is possible to obtain a significantly better film thickness distribution as compared with the conventional apparatus and method even when a power supply frequency of 60 MHz is used. This means that the industrial value related to productivity improvement and cost reduction in the manufacturing field of thin film solar cells, thin film transistors, photosensitive drums and the like is remarkably large.

(Example 2)
A method for supplying power to an electrode according to the second embodiment of the present invention, a plasma surface treatment method (plasma CVD method) and a plasma surface treatment apparatus (plasma CVD apparatus) using the power supply method will be mainly described with reference to FIG. To do.

First, the configuration of the apparatus will be described. However, the same members as those shown in FIG. 1 and FIG.
FIG. 6 is a schematic diagram showing a configuration relating to a power supply device of the plasma surface treatment apparatus according to the second embodiment. The devices other than the power supply device are the same as those in the first embodiment shown in FIG.

In FIG. 6, two rod-like first electrodes 2 a and 2 b and a flat plate-like second electrode 4 are arranged inside the vacuum vessel 1. The substrate 11 is disposed on the second electrode 4.
The feeding point that is a position for feeding high-frequency power to the electrodes is the end of each of the first electrodes 2a and 2b composed of the two rods, and these are the first feeding point 12a and the second feeding point 13a. , A third feeding point 12b and a fourth feeding point 13b. The feed points 12a, 13a and 12b, 13b are in a relationship of being opposite points on the propagation of the high-frequency power wave.

The output signal of the first oscillator 50 that generates a sine wave signal having a frequency of 10 MHz to 30 MHz (VH band) to 30 MHz to 300 MHz (VHF band), that is, the phase of the sine wave signal is a first random phase modulator 51. Modulated randomly.
As will be described later, by mutually modulating the phase of the sine wave signal, it is possible to reduce mutual coherency between outputs of third and fourth power supply systems described later.
The first random phase modulator 51 has a function of randomly modulating the phase of the sine wave signal of the first transmitter 50. That is, since the first oscillator 50 is phase-modulated by the first random phase modulator 51, the first oscillator 50 transmits a signal represented by sin {ωt + Φ1 (t)} to the first distributor 52. Where ω is an angular frequency, t is time, and Φ1 (t) is a randomly modulated phase.

For the random phase modulation, means for controlling the capacitance of the resonance circuit, which is the internal circuit of the first oscillator 50, with an external signal, that is, with a random phase modulator. Note that the capacitance control of the resonance circuit can be easily performed by using, for example, a variable capacitance diode.
Random phase modulators generally include random number generators, white noise generators, and random number signal generators that are used in computers such as communication engineering and mechanical vibration engineering. Here, a white noise generator is used.
The output signal can also be subjected to random phase modulation by using a computer-controlled synthesizer oscillator, the random number generator, the white noise generator, and a random number signal generator using a computer.
Further, the output of the oscillator 50 may be subjected to random phase modulation using an analog voltage control type phase shifter (phase shifter) and the random number generator, white noise generator and random number signal generator using a computer. it can.

The first distributor 52 distributes the output of the first transmitter 50 into two and transmits it to the first and second phase shifters 53 and 56.
The first phase shifter 53 has a function of arbitrarily shifting the phase of the input signal. The first amplifier 54 amplifies the output of the first phase shifter 53 and transmits it to the first power combiner 80 described later.
The second phase shifter 56 has a function of arbitrarily shifting the phase of the input signal. The second amplifier 57 amplifies the output of the second phase shifter 56 and transmits it to the second power combiner 81 described later.

The output signal of the second oscillator 60 that generates a sine wave signal having a frequency of 10 MHz to 30 MHz (VH band) to 30 MHz to 300 MHz (VHF band), that is, the phase of the sine wave signal is a second random phase modulator 61. Modulated randomly.
As will be described later, by mutually modulating the phase of the sine wave signal, it is possible to reduce mutual coherency between outputs of third and fourth power supply systems described later.
The second random phase modulator 61 has a function of randomly modulating the phase of the sine wave signal of the second transmitter 60. That is, since the second transmitter 60 is phase-modulated by the second random phase modulator 61, the second transmitter 60 transmits a signal represented by sin {ωt + Φ1 (t)} to the second distributor 62. Where ω is an angular frequency, t is time, and Φ1 (t) is a randomly modulated phase.
Here, the second random phase modulator 61 can be omitted for the reason described later when the high-frequency power supply system is composed of two oscillators as in the present embodiment, for example.
Further, when the high-frequency power supply system is composed of three or more oscillators, any one of them can be omitted for the reason described later.

For the random phase modulation, means for controlling the capacitance of the resonance circuit, which is the internal circuit of the second oscillator 60, with an external signal, that is, with a random phase modulator. Note that the capacitance control of the resonance circuit can be easily performed by using, for example, a variable capacitance diode.
Random phase modulators generally include random number generators, white noise generators, and random number signal generators that are used in computers such as communication engineering and mechanical vibration engineering. Here, a white noise generator is used.
The output signal can also be subjected to random phase modulation by using a computer-controlled synthesizer oscillator, the random number generator, the white noise generator, and a random number signal generator using a computer.
Further, the output of the oscillator 60 may be subjected to random phase modulation using an analog voltage control type phase shifter (phase shifter) and the random number generator, white noise generator and random number signal generator using a computer. it can.

The second distributor 62 distributes the output of the second transmitter 60 into two and transmits it to the third and fourth phase shifters 63 and 66.
The third phase shifter 63 has a function of arbitrarily shifting the phase of the input signal. The third amplifier 64 amplifies the output of the third phase shifter 63 and transmits it to the first power combiner 80.
The fourth phase shifter 66 has a function of arbitrarily shifting the phase of the input signal. The fourth amplifier 67 amplifies the output of the fourth phase shifter 66 and transmits it to a second power combiner 81 described later.

Reference numeral 80 denotes a first power combiner, which combines the outputs of the first amplifier 54 and the third amplifier 64 and transmits the combined signals to the first impedance matcher 55.
Reference numeral 81 denotes a second power combiner, which couples the outputs of the second amplifier 57 and the fourth amplifier 67 and transmits them to the second impedance matcher 58.

The first impedance matcher 55 outputs the outputs of the first amplifier 54 and the third amplifier 64 transmitted from the first power combiner 80 via the first power distributor 82 described later, Power is supplied to the third feeding points 12a and 12b.
Reference numeral 82 denotes a first power distributor, which distributes the output of the first impedance matching unit 55 into two. One of them feeds power to the first feeding point 12 a via the first coaxial cable 14, the first current introduction terminal 15, and the core wire 17 of the first vacuum coaxial cable 16. The other feeds power to the third feeding point 12 b via the third coaxial cable 24, the third current introduction terminal 25, and the core wire 27 of the third vacuum coaxial cable 26.

The second impedance matcher 58 outputs the outputs of the second amplifier 57 and the fourth amplifier 67 transmitted from the second power combiner 81 via the second power distributor 83 described later, Power is supplied to the fourth feeding points 13a and 13b.
Reference numeral 83 denotes a second power distributor that distributes the output of the second impedance matching unit 58 into two. One of them feeds power to the second feeding point 13a via the second coaxial cable 19, the second current introduction terminal 20, and the core wire 22 of the second vacuum coaxial cable 21. The other feeds power to the fourth feeding point 13b via the fourth coaxial cable 29, the fourth current introduction terminal 30, and the core wire 32 of the fourth vacuum coaxial cable 31.

Note that a tubular insulating material (not shown) is attached to the power supply lines 17, 27, 22, and 32 to suppress abnormal discharge in the vicinity thereof.
The first, second, third, and fourth power amplifiers 54, 57, 64, and 67 have an output value (traveling wave) monitor and a reflected wave monitor reflected and returned from the downstream side, respectively. Comes with. In addition, an isolator for protecting the electric circuit of the power amplifier main body by the reflected wave is attached.

As will be described later, an apparatus configuration in which either the first random phase modulator 51 or the second random phase modulator 61 is omitted may be used.
In addition, here, the first transmitter 50, the first random phase modulator 51, the first distributor 52, the first and second phase shifters 53 and 56, and the first and second amplifiers 54 and 57 are used. , The first and second power combiners 80 and 81, the first and second impedance matchers 55 and 58, and the first and second power distributors 82 and 83 are connected to the third power supply system. This is called a power supply system.
Also, the second transmitter 60, the second random phase modulator 61, the second distributor 62, the third and fourth phase shifters 63 and 66, the third and fourth amplifiers 64 and 67, the first And a second power combiner 80, 81, first and second impedance matchers 55, 58, and first and second power distributors 82, 83, a fourth power supply system. Call it.

In the above apparatus configuration, the specifications and lengths of the coaxial cable and the vacuum coaxial cable of the two transmission lines from the first power distributor 82 to the first and third feeding points 12a and 12b are the same. The parts of the current introduction terminals 15 and 25 have the same specifications. As a result, there is no phase difference due to the difference in the propagation path of the electromagnetic wave that is power-transmitted through the two propagation paths.
Then, the specifications and lengths of the coaxial cable and the vacuum coaxial cable of the two transmission paths from the second power distributor 83 to the second and fourth feeding points 13a and 13b are made the same, and the current is introduced. The parts of the terminals 20 and 30 have the same specifications. As a result, there is no phase difference due to the difference in the propagation path of the electromagnetic wave that is power-transmitted through the two propagation paths.

In the above configuration, if the distance between the first and second electrodes 2a and 2b is too wide, the film thickness is reduced along both electrodes in the film-forming test described later. The film thickness increases along the electrode. Here, the interval is set to 0.15 m based on experience in plasma CVD using silane gas.
If, as a result of the film formation test, the film thickness distribution does not reach the required result, it is natural that the film formation test can be performed using the distance between the two electrodes as a parameter, and the optimum distance can be selected.

Next, a method for producing an amorphous silicon film for a thin film solar cell by plasma CVD using the plasma surface treatment apparatus having the above configuration will be described.
In the implementation or application of the present invention, it is preferable to use the first and second preliminary film forming steps and the main film forming step as procedures.
The first preliminary film forming step relates to the third power supply system, and is supplied from the first and third feeding points 12a and 12b using the first and second phase shifters 53 and 56. Data for grasping the relationship between the electric power, the phase difference between the voltages of the electric power supplied from the second and fourth feeding points 13a and 13b, and the thickness distribution of the amorphous silicon film formed on the substrate 11 is acquired. Done for.
The second preliminary film forming step relates to the fourth power supply system, and is supplied from the first and third feeding points 12a and 12b using the third and fourth phase shifters 63 and 66. Data for grasping the relationship between the electric power, the phase difference between the voltages of the electric power supplied from the second and fourth feeding points 13a and 13b, and the thickness distribution of the amorphous silicon film formed on the substrate 11 is acquired. Done for.
This film-forming process is performed for the production of the target amorphous Si.

  In this embodiment, as shown below, in the first preliminary film-forming process and the second preliminary film-forming process, as means for grasping information on the position of the antinode of the standing wave, for example, an amorphous silicon film However, instead of this, at least one of the etching rate distribution, the plasma emission distribution, the plasma density distribution, etc. is measured in advance, and the antinode of the standing wave is determined based on the measurement result. You may grasp | ascertain the relationship between the information of a position, and the phase difference of the voltage of two output electric power of each of the several 2 output phase variable high frequency power supply mentioned later.

First, in the first first preliminary film forming step, in FIG. 6, the substrate 11 is previously set on the second electrode 4, the vacuum pump 10 (not shown) is operated, After removing the impurity gas and the like, the substrate temperature is in the range of 80 to 350 ° C., for example, 180 ° C. while supplying SiH 4 gas from a discharge gas supply tube 8 (not shown) at 600 sccm and a pressure of 0.5 Torr (66.5 Pa). Hold on.
Next, the third power supply system, that is, the first transmitter 50, the first random phase modulator 51, the first distributor 52, the first and second phase shifters 53, 56, the first And second amplifiers 54 and 57, first and second power combiners 80 and 81, first and second impedance matchers 55 and 58, and first and second power distributors 82 and 83, respectively. The first, second, third and fourth feeding points 12a, 12b, 13a and 13b are supplied.
In this case, the frequency of the first oscillator 50 is set to 60 MHz, for example.
Then, the regulator of the first phase shifter 53 is set to θ1, for example, the output of the first power amplifier 54 is set to 500 W, for example, and the output is set to the first power combiner 80, the first The impedance matching unit 55, the first power distributor 82, the first and third current introduction terminals 15 and 25, and the core wires 17 and 27 of the first and second vacuum coaxial cables 16 and 26, And supplied to the third feeding points 12a and 12b.
Then, the adjuster of the second phase shifter 56 is set to θ2, for example, the output of the second power amplifier 57 is set to 500 W, for example, and the output is set to the second power combiner 81, the second power combiner 81, The impedance matching unit 58, the second power distributor 83, the second and fourth current introduction terminals 20 and 30, and the second and fourth vacuum coaxial cables 21 and 31 through the core wires 22 and 32, And supplied to the fourth feeding points 13a and 13b.
By adjusting the first impedance matching unit 55 and the second impedance matching unit 58, the reflected wave of the supplied power can be prevented from returning to the upstream side of the respective impedance matching units 55 and 58.
As a result, plasma of the SiH 4 gas is generated and, for example, amorphous Si is deposited on the substrate 11.

In the above manner, an amorphous Si film is formed on the substrate 11 with a film formation time of, for example, 10 to 20 minutes. After film formation, the substrate 11 is taken out from the vacuum vessel 1 and the film thickness distribution of the amorphous Si film is evaluated. The film thickness distribution of, for example, amorphous Si deposited on the substrate 11 becomes a sinusoidal distribution due to the generation of a standing wave that is a phenomenon unique to VHF plasma. Such a film forming test is repeatedly performed using the phases θ1 and θ2 of the first and second phase shifters 53 and 56 as parameters.
In the length direction of the first and second electrodes 2a, 2b, the distance from the center point of the substrate 11 to the position of the maximum thickness of the sine thickness distribution, and the first and second phase shifters 53, The relationship between 56 phases θ1 and θ2 is grasped as data.
For example, it is understood that the phase values of the first and second phase shifters 53 and 56 at which the position of the maximum thickness of the film thickness distribution is the center point of the substrate 11 are θ11 and θ22.

By the way, the voltage wave of the electric power supplied from the first and third feeding points 12a and 12b and the second and fourth feeding points 13a and 13b is oscillated from the same power source, and it is between the electrodes from opposite directions. That is, since it propagates between 2a and 4, 2b and 4, an interference phenomenon occurs. This will be described with reference to FIGS. 6, 3, and 4. FIG.
In FIG. 6, the distance in the direction from the first feeding point 12a to the second feeding point 13a is x, and similarly, the distance in the direction from the third feeding point 12b to the fourth feeding point 13b is x.

A voltage wave propagating from the first feeding point 12a toward the second feeding point 13a is W11 (x, t), and a voltage wave propagating from the second feeding point 13a toward the first feeding point 12a is W21. If (x, t), it is expressed as follows.
W11 (x, t) = V · cos {ωt + Φ1 (t) + 2πx / λ) + θ1}
W12 (x, t) = V · cos {ωt + Φ1 (t) −2π (x−L0) / λ + θ2}
Where V is the amplitude of the voltage wave, ω is the angular frequency of the voltage, λ is the wavelength of the voltage wave, t is time, Φ1 (t) is a phase that changes randomly in time, and L0 is the first and second power supplies. The interval between points, θ1 is the initial phase of the voltage wave of power supplied from the first feeding point 12, and θ2 is the initial phase of the voltage wave of power supplied from the second feeding point 13.
The above two waves are expressed as follows when expressed in a complex function.
W11 (x, t) = Re [V · exp {−i (2πx / λ + Δθ1)} · exp {−iωt−iΦ1 (t)}]
W12 (x, t) = Re [V · exp {i2π (x−L0) / λ−iΔθ2)} · exp {−iωt−iΦ1 (t)}]

The wave intensity I (x, t) when considering the interference of electromagnetic waves is expressed as follows. However, * shows a conjugate complex number.
I (x, t) = {W11 (x, t) + W12 (x, t)} squared absolute value = {W11 (x, t) + W12 (x, t)} · {W11 (x, t) ^* + W12 (x, t) ^* }
= 2V ² + V ² · exp [−i {2π (2x−L0) / λ + (θ1−θ2)}] + exp [i {2π (2x−L0) / λ + (θ1−θ2)}]
= 2V ² + 2V ² cos {2π (2x−L0) / λ + (θ1−θ2)}
= 4V ² cos ² {2π (x−L0 / 2) / λ + (θ1−θ2) / 2}
However, although λ is a wavelength, it is not the wavelength of the electromagnetic wave in vacuum but the wavelength λ under the above-mentioned film forming conditions, and is generally shorter than the wavelength λ ₀ of the electromagnetic wave in vacuum. In the SiH 4 gas plasma, the ratio λ / λ ₀ between the wavelength λ in the plasma and the wavelength λ ₀ in the vacuum is about 0.6.
As shown in FIG. 4, this equation is obtained when (θ1−θ2) = Δθ = 0, that is, when the difference in the initial phase of the voltage of the power supplied to the first and second feeding points 12a and 13a is zero. Indicates that the position of the antinode (maximum value) is at x = L0 / 2, and that a standing wave is generated in which the interval between the antinode and the antinode is one half of the wavelength.
Further, it is shown that the antinode position of the standing wave can be arbitrarily set by adjusting the value of Δθ = (θ1−θ2).
Here, the standing wave generated using the third power supply system is referred to as a first standing wave.

Interference phenomenon of two waves, a voltage wave propagating from the third feeding point 12b to the fourth feeding point 13b and a voltage wave propagating from the fourth feeding point 13b to the third feeding point 12b The two waves of the voltage wave propagating from the first feeding point 12a to the second feeding point 13a and the voltage wave propagating from the second feeding point 13a to the first feeding point 12a are also described. This is the same as the interference phenomenon. That is, also in this case, a standing wave as shown in FIG. 4 is generated.
As described above, the specifications and lengths of the coaxial cable and the vacuum coaxial cable of the two transmission lines from the first power distributor 82 to the first and third feeding points 12a and 12b are the same. Further, since the components of the current introduction terminals 15 and 25 have the same specifications, there is no phase change due to the difference between the two propagation paths.
Then, the specifications and lengths of the coaxial cable and the vacuum coaxial cable of the two transmission lines from the second power distributor 83 to the second and fourth feeding points 13a and 13b are made the same, and current is introduced. Since the parts of the terminals 20 and 30 have the same specifications, there is no phase change due to the difference between the two propagation paths.

Next, in the second preliminary film forming step, in FIG. 6, the substrate 11 is previously set on the second electrode 4, the vacuum pump 10 (not shown) is operated, and the impurity gas in the vacuum container 1 is operated. Etc., the substrate temperature is maintained in the range of 80 to 350 ° C., for example, 180 ° C. while supplying SiH 4 gas from a discharge gas supply tube 8 (not shown) at a pressure of, for example, 600 sccm and a pressure of 0.5 Torr (66.5 Pa). To do.
Next, the fourth power supply system, that is, the second transmitter 60, the second random phase modulator 61, the second distributor 52, the third and fourth phase shifters 63, 66, and the third And fourth amplifiers 64 and 77, first and second power combiners 80 and 81, first and second impedance matchers 55 and 58, and first and second power distributors 82 and 83, respectively. The first, second, third and fourth feeding points 12a, 12b, 13a and 13b are supplied.
In this case, the frequency of the second oscillator 60 is set to 60 MHz, for example.
Then, the regulator of the second phase shifter 63 is set to δ1, for example, the output of the third power amplifier 64 is set to 500 W, for example, and the output is set to the first power combiner 80, the first The impedance matching unit 55, the first power distributor 82, the first and third current introduction terminals 15 and 25, and the core wires 17 and 27 of the first and second vacuum coaxial cables 16 and 26, And supplied to the third feeding points 12a and 12b.
Then, the regulator of the fourth phase shifter 66 is set to δ2, for example, the output of the fourth power amplifier 67 is set to 500 W, for example, and the output is set to the second power combiner 81, the second The impedance matching unit 58, the second power distributor 83, the second and fourth current introduction terminals 20 and 30, and the second and fourth vacuum coaxial cables 21 and 31 through the core wires 22 and 32, And supplied to the fourth feeding points 13a and 13b.
By adjusting the first impedance matching unit 55 and the second impedance matching unit 58, the reflected wave of the supplied power can be prevented from returning to the upstream side of the respective impedance matching units 55 and 58.
As a result, plasma of the SiH 4 gas is generated and, for example, amorphous Si is deposited on the substrate 11.

In the above manner, an amorphous Si film is formed on the substrate 11 with a film formation time of, for example, 10 to 20 minutes. After film formation, the substrate 11 is taken out from the vacuum vessel 1 and the film thickness distribution of the amorphous Si film is evaluated. As will be described later, the film thickness distribution of, for example, amorphous Si deposited on the substrate 11 becomes a sinusoidal distribution due to the occurrence of a standing wave, which is a phenomenon inherent to VHF plasma. Such a film forming test is repeatedly performed using the phases δ1 and δ2 of the third and fourth phase shifters 63 and 6 as parameters.
In the length direction of the first and second electrodes 2a and 2b, the distance from the center point of the substrate 11 to the position of the maximum thickness of the sinusoidal film thickness distribution and the first and second phase shifters 63, The relation between the phases δ1 and δ2 of 66 is grasped as data.
For example, the phase difference Δδ = (δ1−δ2) for setting a position apart from the center point of the substrate 11 by a quarter of the wavelength λ in the direction of the second feeding point 13a, that is, λ / 4 is, for example, It can be understood that (δ11−δ22).
The position is not limited to a position separated by λ / 4, but may be an odd multiple of a quarter of the wavelength λ, that is, an odd multiple of λ / 4.
However, the wavelength λ is not the wavelength of the electromagnetic wave in vacuum but the wavelength λ under the above-mentioned film forming conditions, and is generally shorter than the wavelength λ ₀ of the electromagnetic wave in vacuum. In the SiH 4 gas plasma, the ratio λ / λ ₀ between the wavelength λ in the plasma and the wavelength λ ₀ in the vacuum is about 0.6.
Further, when setting the phase difference Δδ = (δ1-δ2), the interval between the antinode position of the first standing wave and the antinode position of the second standing wave is The phase difference Δδ = (δ1-δ2) may be selected so as to be equal to an odd multiple of one half of the spatial period.
That is, the position of the maximum thickness of the film having a sinusoidal film thickness (the third antinode of the third standing wave) formed on the substrate 11 in the second preliminary film forming step is the second point from the center point of the substrate 11. What is necessary is just to make it match | combine with the point separated by the odd multiple of 1/2 of the period of the film | membrane in the direction of the feeding point 13. FIG. Note that the value of half of the film cycle can be grasped in advance in the first preliminary film-forming step.

By the way, the voltage wave of the electric power supplied from the first and third feeding points 12a and 12b and the second and fourth feeding points 13a and 13b is oscillated from the same power source, and it is between the electrodes from opposite directions. That is, since it propagates between 2a and 4, 2b and 4, an interference phenomenon occurs. This will be described with reference to FIGS. 6, 3, and 4.
In FIG. 6, the distance in the direction from the first feeding point 12a to the second feeding point 13a is x, and similarly, the distance in the direction from the third feeding point 12b to the fourth feeding point 13b is x.

A voltage wave propagating from the first feeding point 12a in the direction of the second feeding point 13a is W21 (x, t), and a voltage wave propagating from the second feeding point 13a in the direction of the first feeding point 12a is W22. If (x, t), it is expressed as follows.
W21 (x, t) = V · cos {ωt + Φ2 (t) + 2πx / λ) + δ1}
W22 (x, t) = V · cos {ωt + Φ2 (t) −2π (x−L0) / λ + δ2}
Where V is the amplitude of the voltage wave, ω is the angular frequency of the voltage, λ is the wavelength of the voltage wave, t is time, Φ2 (t) is a phase that changes randomly in time, and L0 is the first and second power feeds. The point interval, δ1 is the initial phase of the voltage wave of power supplied from the first feeding point 12a, and δ2 is the initial phase of the voltage wave of power supplied from the second feeding point 13a.
The above two waves are expressed as follows when expressed in a complex function.
W21 (x, t) = Re [V · exp {−i (2πx / λ + δ1)} · exp {−iωt−iΦ2 (t)}]
W22 (x, t) = Re [V · exp {i2π (x−L0) / λ−iδ2)} · exp {−iωt−iΦ2 (t)}]

The wave intensity I (x, t) when considering the interference of electromagnetic waves is expressed as follows. However, * shows a conjugate complex number.
I (x, t) = {square root of absolute value of W21 (x, t) + W22 (x, t)} = {W21 (x, t) + W22 (x, t)} · {W21 (x, t) ^* + W22 (x, t) ^* }
= 2V ² + V ² · exp [−i {2π (2x−L0) / λ + (δ1−δ2)}] + exp [i {2π (2x−L0) / λ + (δ1−δ2)}]
= 2V ² + 2V ² cos {2π (2x−L0) / λ + (δ1-δ2)}
= 4V ² cos ² {2π (x−L0 / 2) / λ + (δ1-δ2) / 2}
However, although λ is a wavelength, it is not the wavelength of the electromagnetic wave in vacuum but the wavelength λ under the above-mentioned film forming conditions, and is generally shorter than the wavelength λ ₀ of the electromagnetic wave in vacuum. In the SiH 4 gas plasma, the ratio λ / λ ₀ between the wavelength λ in the plasma and the wavelength λ ₀ in the vacuum is about 0.6.
As shown in FIG. 4, this equation is obtained when (δ1−δ2) = Δδ = 0, that is, when the difference in the initial phase of the voltage of the power supplied to the first and second feeding points 12a and 13a is zero. Indicates that the position of the antinode (maximum value) is at x = L0 / 2, and that a standing wave is generated in which the interval between the antinode and the antinode is one half of the wavelength.
Further, it is shown that the antinode position of the standing wave can be arbitrarily set by adjusting the value of Δδ = (δ1−δ2).
Here, the standing wave generated using the fourth power supply system is referred to as a second standing wave.

Interference phenomenon of two waves, a voltage wave propagating from the third feeding point 12b to the fourth feeding point 13b and a voltage wave propagating from the fourth feeding point 13b to the third feeding point 12b The two waves of the voltage wave propagating from the first feeding point 12a to the second feeding point 13a and the voltage wave propagating from the second feeding point 13a to the first feeding point 12a are also described. This is the same as the interference phenomenon. That is, also in this case, a standing wave as shown in FIG. 4 is generated.
As described above, the specifications and lengths of the coaxial cable and the vacuum coaxial cable of the two transmission lines from the first power distributor 82 to the first and third feeding points 12a and 12b are the same. Further, since the components of the current introduction terminals 15 and 25 have the same specifications, there is no phase change due to the difference between the two propagation paths.
Then, the specifications and lengths of the coaxial cable and the vacuum coaxial cable of the two transmission lines from the second power distributor 83 to the second and fourth feeding points 13a and 13b are made the same, and current is introduced. Since the parts of the terminals 20 and 30 have the same specifications, there is no phase change due to the difference between the two propagation paths.

Now, in response to the results of the first and second preliminary film forming steps, the main film forming step is started.
First, in FIG. 6, the substrate 11 is previously set on the second electrode 4, the vacuum pump 10 (not shown) is operated to remove the impurity gas in the vacuum vessel 1, and then the discharge gas supply pipe (not shown). The substrate temperature is maintained in the range of 80 to 350 ° C., for example, 180 ° C., while supplying SiH 4 gas from 8 at 600 sccm and a pressure of 0.5 Torr (66.5 Pa).
Next, the frequency of the oscillator 50 of the third power supply system is set to 60 MH, and the phases of the outputs of the two phase shifters 53 and 56 are set to θ11 and θ22 that are grasped as data of the first preliminary film forming process. For example, 500 W is supplied to each of the first, second, third, and fourth feeding points 12a, 13a, 12b, and 13b.
Similarly, the frequency of the oscillator 60 of the fourth power supply system is set to 60 MH, and the phases of the outputs of the two phase shifters 63 and 66 are set to δ11 and δ22 grasped as data of the second preliminary film forming process. For example, 500 W is supplied to the first, second, third, and fourth feeding points 12a, 13a, 12b, and 13b, respectively.

When power is supplied to the first, second, third, and fourth feeding points 12a, 13a, 12b, and 13b from the third and third power supply systems, respectively, between the pair of electrodes. The distribution of generated power is as shown below.
Here, for convenience of explanation, the power supplied from the third power supply system to the first and third feeding points 12a and 12b via the first and third current introduction terminals 15 and 25 is expressed as W11 (x, t).
The power supplied from the third power supply system to the second and fourth feeding points 13a and 13b via the second and fourth current introduction terminals 20 and 30 is represented by W12 (x, t).
Further, the power supplied from the fourth power supply system to the first and third feeding points 12a and 12b through the first and third current introduction terminals 15 and 25 is represented by W21 (x, t).
The power supplied from the fourth power supply system to the second and fourth feeding points 13a and 13b via the second and fourth current introduction terminals 20 and 30 is represented by W22 (x, t).

In this case, since four voltage waves are applied simultaneously, the intensity I (x, t) of the electromagnetic wave is expressed by the following equation.
Where V is the amplitude of the voltage wave, ω is the angular frequency of the voltage, λ is the wavelength of the voltage wave, t is time, Φ1 (t) is a phase that changes randomly in time, and L0 is the first and second power supplies. The interval between the points, θ1 is the initial phase of the voltage wave of the power supplied from the first and third feed points 12a and 12b in the third power supply system, and θ2 is the second and fourth in the third power supply system. The initial phase of the voltage wave of the power supplied from the feed points 13a and 13b, Φ2 (t) is a phase that changes randomly in time, and δ1 is the first and third feed points 12a in the fourth power supply system. , 12b is the initial phase of the voltage wave of power supplied from 12b, and δ2 is the initial phase of the voltage wave of power supplied from the second and fourth feed points 13a, 13b in the fourth power supply system. * Represents a conjugate complex number.
I (x, t) = {W11 (x, t) + W12 (x, t) + W21 (x, t) + W22 (x, t)} · {W11 (x, t) ^* + W12 (x, t) ^* + W21 (X, t) ^* + W22 (x, t) ^* }
Here, W11 (x, t), W12 (x, t), W21 (x, t), and W22 (x, t) are as described above and represented by the following equations.
W11 (x, t) = Re [V · exp {−i (2πx / λ + θ1)} · exp {−iωt−iΦ1 (t)}]
W12 (x, t) = Re [V · exp {i2π (x−L0) / λ−iθ2)} · exp {−iωt−iΦ1 (t)}]
W21 (x, t) = Re [V · exp {−i (2πx / λ + δ1)} · exp {−iωt−iΦ2 (t)}]
W22 (x, t) = Re [V · exp {i2π (x−L0) / λ) −iδ2} · exp {−iωt−iΦ2 (t)}]

The intensity I (x, t) of the electromagnetic wave is calculated as follows.
I (x, t) = {W11 (x, t) .W11 (x, t) ^* + W11 (x, t) .W12 (x, t) ^* + W12 (x, t) .W11 (x, t) ^* + W12 (x, t) ^* W12 (x, t) ^* } + {W21 (x, t) ^* W21 (x, t) ^* + W21 (x, t) ^* W22 (x, t) ^* + W22 (x, t ) · W21 (x, t) ^* + W22 (x, t) · W22 (x, t) ^* } + {W11 (x, t) · W21 (x, t) ^* + W21 (x, t) · W11 (x , T) ^* } + {W11 (x, t) .W22 (x, t) ^* + W22 (x, t) .W11 (x, t) ^* } + {W12 (x, t) .W21 (x, t ^{) * + W21 (x, t} ) · W12 (x, t) *} + {W12 (x, t) · W22 (x, t) * + W22 (x, t) · W12 (x, t) *}

That is, I (x, t) is as follows.
I (x, t) = 4V ² cos ² {2π (x−L0 / 2) / λ + (θ1−θ2) / 2} + 4V ² cos ² {2π (x−L0 / 2) / λ + (δ1−δ2) / ^{2} +} 2V 2 cos [{Φ1 (t) -Φ2 (t )} + (θ1-δ1) ] ⁺ 2V 2 cos [{Φ1 (t) -Φ2 (t )} + 2π (2x-L0 / 2) / λ + (Θ1-δ2)] + 2V ² cos [{Φ1 (t) −Φ2 (t)} + 2π (2x−L0 / 2) / λ + (θ2−δ1)] + 2V ² cos [{Φ1 (t) −Φ2 (t ]} + (Θ2−δ2)]

  In the above equation, the first term represents the above-mentioned first standing wave, and the second term represents the above-mentioned second standing wave.

In the above equation, the third term includes the voltage wave W11 (x, t) of power supplied from the third power supply system shown in FIG. 6 to the first and third feeding points 12a and 12b, and the fourth A combined wave of the voltage wave W21 (x, t) of power supplied from the power supply system to the first and third feeding points 12a and 12b is shown. The value indicated in this term changes randomly in the voltage of the output from the first and second oscillators 50 and 60 that are phase-modulated randomly by the first and second random phase modulators 51 and 61, respectively. Since the phase difference {Φ1 (t) −Φ2 (t)} is included, the value is random in time.
That is, the instantaneous value changes randomly with time. As a result, in terms of time average, the average value is almost zero.
The time average is to take an average over a sufficiently large time compared to the period of the oscillator output. That is, if the time average is indicated by <>,
<Third term> = <2V ² cos [{Φ1 (t) −Φ2 (t)} + (θ1−δ1)]> = 0
This indicates that W11 (x, t) and W21 (x, t) cannot generate a standing wave.
Here, the above item <3> is considered. The value of the above <third term> is the case where one of the random phase changes Φ1 (t) and Φ2 (t) of the voltage signals output from the first and second oscillators 50 and 60 is constant or zero. Is also zero.
This means that in the configuration shown in FIG. 6, either the first random phase modulator 51 or the second random phase modulator 61 can be excluded. That is, it is not necessary to attach a random phase modulator to one oscillator among a plurality of oscillators constituting the apparatus. In this case, the configuration of the apparatus is simple.

In the above equation, the fourth term includes the voltage wave W11 (x, t) of power supplied from the third power supply system shown in FIG. 6 to the first and second feeding points 12a and 12b, and the fourth A combined wave of the voltage wave W22 (x, t) of power supplied from the power supply system to the second and fourth feeding points 13a and 13b is shown. The value indicated in this term changes randomly in the voltage of the output from the first and second oscillators 50 and 60 that are phase-modulated randomly by the first and second random phase modulators 51 and 61, respectively. Since the phase difference {Φ1 (t) −Φ2 (t)} is included, the value is random in time.
That is, the instantaneous value changes randomly with time. As a result, in terms of time average, the average value is almost zero.
The time average is to take an average over a sufficiently large time compared to the period of the oscillator output. That is, if the time average is indicated by <>,
<4th term> = <2V ² cos [{Φ1 (t) −Φ2 (t)} + 2π (2x−L0 / 2) / λ + (θ1−δ2)]> = 0
This indicates that W11 (x, t) and W22 (x, t) cannot generate a standing wave.
Here, the above <4th term> is considered. The value of the <fourth term> is the case where one of the random phase changes Φ1 (t) and Φ2 (t) of the voltage signals output from the first and second oscillators 50 and 60 is constant or zero. Is also zero.
This means that in the configuration shown in FIG. 6, either the first random phase modulator 51 or the second random phase modulator 61 can be excluded. That is, it is not necessary to attach a random phase modulator to one oscillator among a plurality of oscillators constituting the apparatus. In this case, the configuration of the apparatus is simple.

In the above equation, the fifth term includes the voltage wave W12 (x, t) of the power supplied from the third power supply system shown in FIG. 6 to the second and fourth feeding points 13a and 13b, and the fourth A combined wave of a voltage wave W21 (x, t) of power supplied from the power supply system to the first and second feeding points 12a and 12b is shown. The value indicated in this term changes randomly in the voltage of the output from the first and second oscillators 50 and 60 that are phase-modulated randomly by the first and second random phase modulators 51 and 61, respectively. Since the phase difference {Φ1 (t) −Φ2 (t)} is included, the value is random in time. That is, the instantaneous value changes randomly with time. As a result, in terms of time average, the average value is almost zero.
The time average is to take an average over a sufficiently large time compared to the period of the oscillator output. That is, if the time average is indicated by <>,
<5th term> = <2V ² cos [{Φ1 (t) −Φ2 (t)} + 2π (2x−L0 / 2) / λ + (θ2−δ1)]> = 0
This indicates that W12 (x, t) and W21 (x, t) cannot generate a standing wave.
Here, <Section 5> will be considered. The value of the <fifth term> is when the random phase change Φ1 (t) or Φ2 (t) of the voltage signals output from the first and second oscillators 50 and 60 is a constant value or zero. Is also zero.
This means that in the configuration shown in FIG. 6, either the first random phase modulator 51 or the second random phase modulator 61 can be excluded. That is, it is not necessary to attach a random phase modulator to one oscillator among a plurality of oscillators constituting the apparatus. In this case, the configuration of the apparatus is simple.

In the above equation, the sixth term includes the voltage wave W12 (x, t) of the power supplied from the third power supply system shown in FIG. 6 to the second and fourth feeding points 13a and 13b, and the fourth A combined wave of the voltage wave W22 (x, t) of power supplied from the power supply system to the second and fourth feeding points 13a and 13b is shown. The value indicated in this term changes randomly in the voltage of the output from the first and second oscillators 50 and 60 that are phase-modulated randomly by the first and second random phase modulators 51 and 61, respectively. Since the phase difference {Φ1 (t) −Φ2 (t)} is included, the value is random in time.
That is, the instantaneous value changes randomly with time. As a result, in terms of time average, the average value is almost zero.
The time average is to take an average over a sufficiently large time compared to the period of the oscillator output. That is, if the time average is indicated by <>,
<Sixth term> = <2V ² cos [{Φ1 (t) −Φ2 (t)} + (θ2−δ2)]> = 0
This indicates that W12 (x, t) and W22 (x, t) cannot generate a standing wave.
Here, <Section 6> will be considered. The value of the <sixth term> is when the random phase change Φ1 (t) or Φ2 (t) of the voltage signals output from the first and second oscillators 50 and 60 is a constant value or zero. Is also zero.
This means that in the configuration shown in FIG. 6, either the first random phase modulator 51 or the second random phase modulator 61 can be excluded. That is, it is not necessary to attach a random phase modulator to one oscillator among a plurality of oscillators constituting the apparatus. In this case, the configuration of the apparatus is simple.

As described above, the first oscillator 50 constituting the third power supply system and the second oscillator 60 constituting the fourth power supply system are respectively connected to the first and second random phase modulators 51 and 61. As a result of the phase of the sine wave signal being randomly modulated, W11 (x, t) and W21 (x, t), W11 (x, t) and W22 (x, t), W12 (x, t) And W21 (x, t), and W12 (x, t) and W22 (x, t) do not generate a standing wave, respectively.
That is, it is possible to eliminate the mutual interference effect between the outputs of the third and fourth power supply systems by randomly modulating the phases of the outputs of the first oscillator 50 and the second oscillator 60. Is shown.
Further, as described above, in this embodiment, it is not necessary to randomly modulate the phases of the outputs of both the first oscillator 50 and the second oscillator 60, and only one of the phases is randomly modulated. That is enough.

Therefore, the pair of electrodes generated by the power supplied from the third and fourth power supply systems to the first, second, third and fourth feeding points 12a, 12b, 13a and 13b, that is, 2a. The intensity I (xt) of the electromagnetic wave between 2b and 4 is as follows.
I (x, t) = 4V ² cos ² {2π (x−L0 / 2) / λ + (θ1−θ2) / 2} + 4V ² cos ² {2π (x−L0 / 2) / λ + (δ1−δ2) / 2}
This indicates that it is the sum of two standing waves that do not vary with time.
The phase difference Δθ = (θ1−θ2) that can be adjusted by the first and second phase shifters 53 and 56 and the phase difference Δδ = (δ1−) that can be adjusted by the third and fourth phase shifters 63 and 66. It is shown that the position of the antinodes of the two standing waves can be arbitrarily adjusted by adjusting δ2).

Specifically, for example, the phase values of the first and second phase shifters 53 and 56 are set to θ11 and θ22 shown in the first preliminary film forming step, and the third and fourth phase shifters 53 and 56 are used. Assuming that the phase values of the phase shifters 63 and 66 are δ11 and δ22 shown in the second preliminary film forming step, the first and second standing waves are λ / 4 as shown in FIG. Will be added away from each other.
That is, the sum I (x) of the two standing waves is
I (x) = 4V ² cos ² {2π (x−L0 / 2) / λ} + 4V ² cos ² {2π (x−L0 / 2) / λ + π / 2}
= 4V ² cos ² {2π (x−L0 / 2) / λ} + 4V ² sin ² {2π (x−L0 / 2) / λ}
= 4V ²
It is represented by
In the above specific example, as shown in FIG. 5, it means that the first and second standing waves are added in a form separated by λ / 4. When the phase difference Δδ = (δ1-δ2) is set in the preliminary film-forming process of 2, the interval between the antinode position of the first standing wave and the antinode position of the second standing wave is This means that the phase difference Δδ = (δ1−δ2) should be selected so as to be equal to one half of the antinode spatial period.

Incidentally, in general, the distribution of power intensity between the pair of electrodes 2 and 4 and the distribution of plasma intensity are in a proportional relationship.
On the other hand, when the SiH 4 gas is turned into plasma in the above process, radicals such as SiH 3, SiH 2, and SiH existing in the plasma diffuse due to the diffusion phenomenon and are adsorbed on the surface of the substrate 11, thereby causing the a-Si film. However, the plasma intensity distribution and the film thickness distribution are proportional to each other. This means that the fact that the power intensity distribution is made uniform means that the film thickness distribution is made uniform.
In addition, the distribution of power intensity being uniform means that the plasma density and the radial density are uniform over a large area.
Therefore, when the power intensity between the pair of electrodes 2 and 4 is uniform as described above, the distribution of the deposited film is uniform. As a result, the variation in film thickness is uniform. Since the variation of the film thickness necessary for practical use is 5 to 10%, it can be easily achieved.
This means that it is possible to form a uniform film thickness distribution, which is impossible with the conventional VHF plasma surface treatment apparatus and method for a substrate having a size exceeding a quarter of the wavelength λ. It means that. Therefore, the above is an epoch-making discovery in the application field of VHF plasma, and its practical value is remarkably large.
Note that microcrystalline Si or thin-film polycrystalline Si can be formed by optimizing the flow rate ratio, pressure, and power of SiH and H2 in the film forming conditions. It is a matter of course that the film can be formed in the same manner as the film formation.

In this embodiment, since the first electrode 2 is two rods, the substrate size is limited to about 2 m to 3 mx width 0.3 m, but the first electrodes 2 a and 2 b which are rod electrodes are limited. It goes without saying that the width of the substrate size can be increased if the number is increased in the width direction.

In the production of thin film solar cells, thin film transistors, and photosensitive drums, there is no problem in performance as long as the film thickness distribution is within ± 10%. According to the above embodiment, it is possible to obtain a significantly better film thickness distribution as compared with the conventional apparatus and method even when a power supply frequency of 60 MHz is used. This means that the industrial value related to productivity improvement and cost reduction in the manufacturing field of a-Si solar cells, thin film transistors, and photosensitive drums is remarkably large.

(Example 3)
A method for supplying power to the electrode according to the third embodiment of the present invention, a plasma surface treatment method (plasma CVD method) using the power supply method, and a plasma surface treatment apparatus (plasma CVD apparatus) will be mainly described with reference to FIG. To do.

First, the configuration of the apparatus will be described. However, the same members as those shown in FIG. 1, FIG. 2 and FIG.
FIG. 7 is a schematic diagram showing a configuration relating to the power supply device of the plasma surface treatment apparatus according to the third embodiment.

In FIG. 7, a rectangular flat plate first electrode 2 and a flat plate-like second electrode 4 are arranged inside the vacuum vessel 1. The substrate 11 is disposed on the second electrode 4.
A feeding point, which is a position for feeding high-frequency power to the electrodes, is the opposite sides of the first electrode 2 of the rectangular flat plate. Then, a plurality of, for example, a first feeding point 12a shown in FIG. 7, a second feeding point 13a, a third feeding point 12b, a fourth feeding point 13b, and a fourth feeding point 13b. Deploy. The feeding points 12a and 13a, and 12b and 13b are in a relationship of being opposite points on the propagation of the high-frequency power wave.

In the arrangement of the feeding points, if the distance between the first and third feeding points 12a and 12b and the distance between the second and fourth feeding points 13a and 13b are too wide, both feeding points are used in the film-forming test described later. On the other hand, if the distance between the two feeding points is too close, the film thickness between the two feeding points increases.
Here, based on experience in plasma CVD using silane gas, the interval is set to 0.3 m. Specifically, for example, the first feeding point 12a is located at a position 0.015 m from the end of the side of the first electrode 2 of the rectangular flat plate, and the third feeding point 12b is located 0.3 m away from the first feeding point 12b. Is set to 0.015 m between the third feeding point 12b and the end of the side.
If, as a result of the film formation test described later, the film thickness distribution does not reach the required result, the film formation test is performed using the distance between the two feeding points and the width of the first electrode 2 of the rectangular flat plate as parameters. It is natural that the feeding point interval can be selected.

The output signal of the first oscillator 50 that generates a sine wave signal having a frequency of 10 MHz to 30 MHz (VH band) to 30 MHz to 300 MHz (VHF band), that is, the phase of the sine wave signal is a first random phase modulator 51. Modulated randomly.
As will be described later, by mutually modulating the phase of the sine wave signal, it is possible to reduce mutual coherence between outputs of fifth and sixth power supply systems described later.
The first random phase modulator 51 has a function of randomly modulating the phase of the sine wave signal of the first transmitter 50. That is, since the first oscillator 50 is phase-modulated by the first random phase modulator 51, the first oscillator 50 transmits a signal represented by sin {ωt + Φ1 (t)} to the first distributor 52. Where ω is an angular frequency, t is time, and Φ1 (t) is a randomly modulated phase.

For the random phase modulation, means for controlling the capacitance of the resonance circuit, which is the internal circuit of the first oscillator 50, with an external signal, that is, with a random phase modulator. Note that the capacitance control of the resonance circuit can be easily performed by using, for example, a variable capacitance diode.
Random phase modulators generally include random number generators, white noise generators, and random number signal generators that are used in computers such as communication engineering and mechanical vibration engineering. Here, a white noise generator is used.
The output signal can also be subjected to random phase modulation by using a computer-controlled synthesizer oscillator, the random number generator, the white noise generator, and a random number signal generator using a computer.
Further, the output of the oscillator 50 may be subjected to random phase modulation using an analog voltage control type phase shifter (phase shifter) and the random number generator, white noise generator and random number signal generator using a computer. it can.

The first distributor 52 distributes the output of the first transmitter 50 into two and transmits it to the first and second phase shifters 53 and 56.
The first phase shifter 53 has a function of arbitrarily shifting the phase of the input signal. The output of the first phase shifter 53 is transmitted to a third coupler 84 described later.
The second phase shifter 56 has a function of arbitrarily shifting the phase of the input signal. The output of the second phase shifter 56 is transmitted to a third combiner 84 described later.

Reference numeral 84 denotes a third coupler, which combines the outputs of the first phase shifter 53 and a third phase shifter 63 described later and transmits the result to a first amplifier 54 described later.
Reference numeral 85 denotes a fourth combiner, which combines the outputs of the second phase shifter 56 and a fourth phase shifter 66 described later and transmits the result to a second amplifier 57 described later.

The first amplifier 54 amplifies the power of the signal transmitted from the third coupler 84 and transmits it to the first impedance matching unit 55.
The first impedance matching unit 55 outputs the output of the first amplifier 54 to the first power distributor 82, the first current introduction terminal 15, the first vacuum coaxial cable 16, and the first vacuum coaxial. The power is supplied to the first feeding point 12 a via the core wire 17 of the cable 16. Further, the power is supplied to the third feeding point 12 b via the third current introduction terminal 25, the third vacuum coaxial cable 26, and the core wire 27 of the third vacuum coaxial cable 26.

A tubular insulating material (not shown) is attached to the power supply lines 17 and 27 to suppress abnormal discharge in the vicinity thereof.
Each of the first power amplifiers 54 includes an output value (traveling wave) monitor and a reflected wave monitor reflected back from the downstream side. In addition, an isolator for protecting the electric circuit of the power amplifier main body by the reflected wave is attached.

The second amplifier 57 amplifies the power of the signal transmitted from the fourth coupler 85 and transmits it to the second impedance matching unit 58.
The second impedance matching unit 58 outputs the output of the second amplifier 57 to the third power distributor 83, the second current introduction terminal 20, the second vacuum coaxial cable 21, and the second vacuum coaxial. The power is supplied to the second feeding point 13a through the core wire 22 of the cable 21. In addition, the fourth current introduction terminal 30, the fourth vacuum coaxial cable 31, and the core wire 32 of the fourth vacuum coaxial cable 31 are supplied to the fourth feeding point 13 b.

Note that a tubular insulating material (not shown) is attached to the feeder lines 22 and 32 to suppress abnormal discharge in the vicinity thereof.
Each of the second power amplifiers 57 includes an output value (traveling wave) monitor and a reflected wave monitor reflected back from the downstream side. In addition, an isolator for protecting the electric circuit of the power amplifier main body by the reflected wave is attached.

The output signal of the second oscillator 60 that generates a sine wave signal having a frequency of 10 MHz to 30 MHz (VH band) to 30 MHz to 300 MHz (VHF band), that is, the phase of the sine wave signal is a second random phase modulator 61. Modulated randomly.
As will be described later, by mutually modulating the phase of the sine wave signal, it is possible to reduce mutual coherence between outputs of fifth and sixth power supply systems described later.
The second random phase modulator 61 has a function of randomly modulating the phase of the sine wave signal of the second transmitter 60. That is, since the second transmitter 60 is phase-modulated by the second random phase modulator 61, the second transmitter 60 transmits a signal represented by sin {ωt + Φ1 (t)} to the second distributor 62. Where ω is an angular frequency, t is time, and Φ1 (t) is a randomly modulated phase.
Here, the second random phase modulator 61 can be omitted for the reason described later when the high-frequency power supply system is composed of two oscillators as in the present embodiment, for example.
Further, when the high-frequency power supply system is composed of three or more oscillators, any one of them can be omitted for the reason described later.

For the random phase modulation, means for controlling the capacitance of the resonance circuit, which is the internal circuit of the second oscillator 60, with an external signal, that is, with a random phase modulator. Note that the capacitance control of the resonance circuit can be easily performed by using, for example, a variable capacitance diode.
Random phase modulators generally include random number generators, white noise generators, and random number signal generators that are used in computers such as communication engineering and mechanical vibration engineering. Here, a white noise generator is used.
The output signal can also be subjected to random phase modulation by using a computer-controlled synthesizer oscillator, the random number generator, the white noise generator, and a random number signal generator using a computer.
Further, the output of the oscillator 60 may be subjected to random phase modulation using an analog voltage control type phase shifter (phase shifter) and the random number generator, white noise generator and random number signal generator using a computer. it can.

The second distributor 62 distributes the output of the second transmitter 60 into two and transmits it to the third and fourth phase shifters 63 and 66.
The third phase shifter 63 has a function of arbitrarily shifting the phase of the input signal. The output of the third phase shifter 63 is transmitted to the third coupler 84.
The fourth phase shifter 66 has a function of arbitrarily shifting the phase of the input signal. The output of the fourth phase shifter 66 is transmitted to the fourth combiner 85.

The second amplifier 57 amplifies the power of the signal transmitted from the fourth coupler 85 and transmits it to the second impedance matching unit 58.
The second impedance matching unit 58 outputs the output of the second amplifier 57 to the second power distributor 83, the second current introduction terminal 20, the second vacuum coaxial cable 21, and the second vacuum coaxial. It is supplied to the second feeding point 13a through the core wire 22 of the cable 21. In addition, the fourth current introduction terminal 30, the fourth vacuum coaxial cable 31, and the core wire 32 of the fourth vacuum coaxial cable 31 are supplied to the fourth feeding point 13 b.
The first impedance matching unit 55 outputs the output of the first amplifier 54 to the first power distributor 82, the first current introduction terminal 15, the first vacuum coaxial cable 16, and the first vacuum coaxial. The power is supplied to the first feeding point 12 a via the core wire 17 of the cable 16. Further, the power is supplied to the third feeding point 12 b via the third current introduction terminal 25, the third vacuum coaxial cable 26, and the core wire 27 of the third vacuum coaxial cable 26.

Note that a tubular insulating material (not shown) is attached to the feeder lines 22 and 32 to suppress abnormal discharge in the vicinity thereof.
Each of the second power amplifiers 57 includes an output value (traveling wave) monitor and a reflected wave monitor reflected back from the downstream side. In addition, an isolator for protecting the electric circuit of the power amplifier main body by the reflected wave is attached.

As will be described later, an apparatus configuration in which either the first random phase modulator 51 or the second random phase modulator 61 is omitted may be used.
Also, here, the first oscillator 50, the first random phase modulator 51, the first distributor 52, the first and second phase shifters 53 and 56, the third and fourth couplers 84, 85, the first and second amplifiers 54 and 57, the first and second impedance matching units 55 and 58, and the first and second power distributors 82 and 83 are connected to the fifth power. Called the supply system.
Further, the second transmitter 60, the second random phase modulator 61, the second distributor 62, the third and fourth phase shifters 63 and 66, the third and fourth couplers 84 and 85,
A power supply system including first and second amplifiers 54 and 57, first and second impedance matching units 55 and 58, and first and second power distributors 82 and 83 is a sixth power supply system. Call it.

In the above apparatus configuration, the specifications and lengths of the coaxial cable and the vacuum coaxial cable of the two transmission lines from the first power distributor 82 to the first and third feeding points 12a and 12b are the same. The parts of the current introduction terminals 15 and 25 have the same specifications. As a result, there is no phase difference due to the difference in the propagation path of the electromagnetic wave that is transmitted through the two propagation paths.
Also, the specifications and lengths of the coaxial cable and the vacuum coaxial cable of the two transmission lines from the second power distributor 83 to the second and fourth feeding points 13a and 13b are made the same, and the current is introduced. The parts of the terminals 20 and 30 have the same specifications. As a result, there is no phase difference due to the difference in the propagation path of the electromagnetic wave that is transmitted through the two propagation paths.

Next, a method for manufacturing an amorphous silicon film for an a-Si solar cell by plasma CVD using the plasma surface treatment apparatus having the above configuration will be described.
In the implementation or application of the present invention, it is preferable to use the first and second preliminary film forming steps and the main film forming step as procedures.
The first preliminary film forming step relates to the fifth power supply system, and is supplied from the first and third feeding points 12a and 12b using the first and second phase shifters 53 and 56. Data for grasping the relationship between the electric power, the phase difference between the voltages of the electric power supplied from the second and fourth feeding points 13a and 13b, and the thickness distribution of the amorphous silicon film formed on the substrate 11 is acquired. To be done.
The second preliminary film forming step relates to the sixth power supply system, and is supplied from the first and third feeding points 12a and 12b using the third and fourth phase shifters 63 and 66. Data for grasping the relationship between the electric power, the phase difference between the voltages of the electric power supplied from the second and fourth feeding points 13a and 13b, and the thickness distribution of the amorphous silicon film formed on the substrate 11 is acquired. To be done.
This film-forming process is performed for the production of the target amorphous Si.

  In this embodiment, as shown below, in the first preliminary film-forming process and the second preliminary film-forming process, as means for grasping information on the position of the antinode of the standing wave, for example, an amorphous silicon film However, instead of this, at least one of the etching rate distribution, the plasma emission distribution, the plasma density distribution, etc. is measured in advance, and the antinode of the standing wave is determined based on the measurement result. You may grasp | ascertain the relationship between the information of a position, and the phase difference of the voltage of two output electric power of each of the several 2 output phase variable high frequency power supply mentioned later.

First, in the first first preliminary film-forming step, in FIG. 7, the substrate 11 is previously set on the second electrode 4, the vacuum pump 10 (not shown) is operated, After removing the impurity gas and the like, the substrate temperature is in the range of 80 to 350 ° C., for example, 180 ° C. while supplying SiH 4 gas from a discharge gas supply tube 8 (not shown) at 350 sccm and a pressure of 0.5 Torr (66.5 Pa), for example. Hold on.
Next, the fifth power supply system, that is, the first transmitter 50, the first random phase modulator 51, the first distributor 52, the first and second phase shifters 53, 56, and the third And fourth couplers 84 and 85, first and second amplifiers 54 and 57, first and second impedance matchers 55 and 58, and first and second power distributors 82 and 83.
Is used to supply power to the first, second, third and fourth feeding points 12a, 12b, 13a and 13b.
In this case, the frequency of the first oscillator 50 is set to 60 MHz, for example.
Then, the regulator of the first phase shifter 53 is set to θ1, for example, the output of the first power amplifier 54 is set to 500 W, for example, and the first impedance matching device 55 and the first power distribution are set. To the first and third feeding points 12a and 12b via the core 82, the first and third current introduction terminals 15 and 25, and the core wires 17 and 27 of the first and second vacuum coaxial cables 16 and 26. Supply.
Then, the regulator of the second phase shifter 56 is set to θ2, for example, and the output of the second power amplifier 57 is set to 500 W, for example, so that the second impedance matching unit 58 and the second power distribution unit To the second and fourth feeding points 13a and 13b via the conductor 83, the second and fourth current introduction terminals 20 and 30, and the core wires 22 and 32 of the second and fourth vacuum coaxial cables 21 and 31. Supply.
By adjusting the first impedance matching unit 55 and the second impedance matching unit 58, the reflected wave of the supplied power can be prevented from returning to the upstream side of the respective impedance matching units 55 and 58.
As a result, plasma of the SiH 4 gas is generated and, for example, amorphous Si is deposited on the substrate 11.

In the above manner, an amorphous Si film is formed on the substrate 11 with a film formation time of, for example, 10 to 20 minutes. After film formation, the substrate 11 is taken out from the vacuum vessel 1 and the film thickness distribution of the amorphous Si film is evaluated. As will be described later, the film thickness distribution of, for example, amorphous Si deposited on the substrate 11 becomes a sinusoidal distribution due to the occurrence of a standing wave, which is a phenomenon inherent to VHF plasma. Such a film forming test is repeatedly performed using the phases θ1 and θ2 of the first and second phase shifters 53 and 56 as parameters.
In the direction connecting the first feeding point 12a and the second feeding point 13a, the distance from the center point of the substrate 11 to the position of the maximum thickness of the sine thickness distribution and the first and second phase shifters. The relationship between the phases θ1 and θ2 of 53 and 56 is grasped as data. For example, the phase of the first and second phase shifters 53 and 56 serving as the center point of the substrate 11 in the direction connecting the first feeding point 12a and the second feeding point 13a is the position of the maximum thickness of the film thickness distribution. It is understood that the values of are, for example, θ11 and θ22.

By the way, the voltage wave of the electric power supplied from the first and third feeding points 12a and 12b and the second and fourth feeding points 13a and 13b is oscillated from the same power source, and between the electrodes from opposite directions. That is, since it propagates between 2 and 4, an interference phenomenon occurs. This will be described with reference to FIGS. 7, 3 and 4. FIG.
In FIG. 7, the distance in the direction from the first feeding point 12a to the second feeding point 13a is x, and similarly, the distance in the direction from the third feeding point 12b to the fourth feeding point 13b is x.

A voltage wave propagating from the first feeding point 12a toward the second feeding point 13a is W11 (x, t), and a voltage wave propagating from the second feeding point 13a toward the first feeding point 12a is W21. If (x, t), it is expressed as follows.
W11 (x, t) = V · cos {ωt + Φ1 (t) + 2πx / λ) + θ1}
W12 (x, t) = V · cos {ωt + Φ1 (t) −2π (x−L0) / λ + θ2}
Where V is the amplitude of the voltage wave, ω is the angular frequency of the voltage, λ is the wavelength of the voltage wave, t is time, Φ1 (t) is a phase that changes randomly in time, and L0 is the first and second power supplies. The interval between points, θ1 is the initial phase of the voltage wave of power supplied from the first feeding point 12a, and θ2 is the initial phase of the voltage wave of power supplied from the second feeding point 13a.
The above two waves are expressed as follows when expressed in a complex function.
W11 (x, t) = Re [V · exp {−i (2πx / λ + θ1)} · exp {−iωt−iΦ1 (t)}]
W12 (x, t) = Re [V · exp {i2π (x−L0) / λ−iθ2)} · exp {−iωt−iΦ1 (t)}]
The wave intensity I (x, t) when considering the interference of electromagnetic waves is expressed as follows. However, * shows a conjugate complex number.
I (x, t) = {W11 (x, t) + W12 (x, t)} squared absolute value = {W11 (x, t) + W12 (x, t)} · {W11 (x, t) ^* + W12 (x, t) ^* }
= 2V ² + V ² · exp [−i {2π (2x−L0) / λ + (θ1−θ2)}] + exp [i {2π (2x−L0) / λ + (θ1−θ2)}]
= 2V ² + 2V ² cos {2π (2x−L0) / λ + (θ1−θ2)}
= 4V ² cos ² {2π (x−L0 / 2) / λ + (θ1−θ2) / 2}
However, although λ is a wavelength, it is not the wavelength of the electromagnetic wave in vacuum but the wavelength λ under the above-mentioned film forming conditions, and is generally shorter than the wavelength λ ₀ of the electromagnetic wave in vacuum. In the SiH 4 gas plasma, the ratio λ / λ ₀ between the wavelength λ in the plasma and the wavelength λ ₀ in the vacuum is about 0.6.
As shown in FIG. 4, this equation is obtained when (θ1−θ2) = Δθ = 0, that is, when the difference in the initial phase of the voltage of the power supplied to the first and second feeding points 12a and 13a is zero. Indicates that the position of the antinode (maximum value) is at x = L0 / 2, and that a standing wave is generated in which the interval between the antinode and the antinode is one half of the wavelength.
Further, it is shown that the antinode position of the standing wave can be arbitrarily set by adjusting the value of Δθ = (θ1−θ2).
Here, the standing wave generated using the fifth power supply system is referred to as a first standing wave.

Interference phenomenon of two waves, a voltage wave propagating from the third feeding point 12b to the fourth feeding point 13b and a voltage wave propagating from the fourth feeding point 13b to the third feeding point 12b The two waves of the voltage wave propagating from the first feeding point 12a to the second feeding point 13a and the voltage wave propagating from the second feeding point 13a to the first feeding point 12a are also described. This is the same as the interference phenomenon. That is, also in this case, a standing wave as shown in FIG. 4 is generated.
As described above, the specifications and lengths of the coaxial cable and the vacuum coaxial cable of the two transmission lines from the first power distributor 82 to the first and third feeding points 12a and 12b are the same. Further, since the components of the current introduction terminals 15 and 25 have the same specifications, there is no phase change due to the difference between the two propagation paths.
Then, the specifications and lengths of the coaxial cable and the vacuum coaxial cable of the two transmission lines from the second power distributor 83 to the second and fourth feeding points 13a and 13b are made the same, and current is introduced. Since the parts of the terminals 20 and 30 have the same specifications, there is no phase change due to the difference between the two propagation paths.

Next, in the second preliminary film forming step, in FIG. 7, the substrate 11 is previously set on the second electrode 4, the vacuum pump 10 (not shown) is operated, and the impurity gas in the vacuum container 1 is operated. Etc., the substrate temperature is kept in the range of 80 to 350 ° C., for example, 180 ° C. while supplying SiH 4 gas from a discharge gas supply tube 8 (not shown) at 350 sccm and a pressure of 0.5 Torr (66.5 Pa). To do.
Next, the sixth power supply system, that is, the second transmitter 60, the second random phase modulator 61, the second distributor 62, the third and fourth phase shifters 63, 66, the third And fourth couplers 84 and 85, first and second amplifiers 54 and 57, first and second impedance matchers 55 and 58, and first and second power distributors 82 and 83. The sixth power supply system is used as the power supply system to supply power to the first, second, third, and fourth feeding points 12a, 12b, 13a, and 13b.
In this case, the frequency of the second oscillator 60 is set to 60 MHz, for example.
Then, the adjuster of the second phase shifter 63 is set to δ1, for example, the output of the first power amplifier 54 is set to 500 W, for example, and the output is set to the first impedance matcher 55, the first The first and third feeding points 12 a, the power distributor 82, the first and third current introduction terminals 15 and 25, and the core wires 17 and 27 of the first and second vacuum coaxial cables 16 and 26, 12b.
Then, the regulator of the fourth phase shifter 66 is set to δ2, for example, the output of the second power amplifier 57 is set to 500 W, for example, and the output is set to the second impedance matching device 58, the second The second and fourth feeding points 13a, the power distributor 83, the second and fourth current introduction terminals 20, 30 and the core wires 22, 32 of the second and fourth vacuum coaxial cables 21, 31 are provided. 13b.
By adjusting the first impedance matching unit 55 and the second impedance matching unit 58, the reflected wave of the supplied power can be prevented from returning to the upstream side of the respective impedance matching units 55 and 58.
As a result, plasma of the SiH 4 gas is generated and, for example, amorphous Si is deposited on the substrate 11.

In the above manner, an amorphous Si film is formed on the substrate 11 with a film formation time of, for example, 10 to 20 minutes. After film formation, the substrate 11 is taken out from the vacuum vessel 1 and the film thickness distribution of the amorphous Si film is evaluated. As will be described later, the film thickness distribution of, for example, amorphous Si deposited on the substrate 11 becomes a sinusoidal distribution due to the occurrence of a standing wave, which is a phenomenon inherent to VHF plasma. Such a film forming test is repeatedly performed using the phases δ1 and δ2 of the third and fourth phase shifters 63 and 6 as parameters.
In the direction connecting the first feeding point 12a and the second feeding point 13a, the distance from the center point of the substrate 11 to the position of the maximum thickness of the sine thickness distribution and the first and second phase shifters. The relationship between the phases δ1 and δ2 of 63 and 66 is grasped as data.

For example, the phase difference Δδ = (δ1−δ2) for setting a position away from the center point of the substrate 11 by a quarter of the wavelength λ, that is, λ / 4, in the direction of the second feeding point 13a is, for example, It is understood that δ11-δ22.
The position is not limited to a position separated by λ / 4, but may be an odd multiple of a quarter of the wavelength λ, that is, an odd multiple of λ / 4.
However, the wavelength λ is not the wavelength of the electromagnetic wave in vacuum but the wavelength λ under the above-mentioned film forming conditions, and is generally shorter than the wavelength λ ₀ of the electromagnetic wave in vacuum. In the SiH 4 gas plasma, the ratio λ / λ ₀ between the wavelength λ in the plasma and the wavelength λ ₀ in the vacuum is about 0.6.
Further, when setting the phase difference Δδ = (δ1-δ2), the interval between the antinode position of the first standing wave and the antinode position of the second standing wave is The phase difference Δδ = (δ1-δ2) may be selected so as to be equal to an odd multiple of one half of the spatial period.
That is, the position of the maximum thickness of the film having a sinusoidal film thickness formed on the substrate 11 in the second preliminary film formation step is the period of the film from the center point of the substrate 11 to the second feeding point 13. It is sufficient to match points that are an odd multiple of one-half. Note that the value of half of the film cycle can be grasped in advance in the first preliminary film-forming step.

By the way, the voltage wave of the electric power supplied from the first and third feeding points 12a and 12b and the second and fourth feeding points 13a and 13b is oscillated from the same power source, and it is between the electrodes from opposite directions. Since it propagates between 2 and 4, an interference phenomenon occurs. This will be described with reference to FIGS. 7, 3 and 4. FIG.
In FIG. 7, the distance in the direction from the first feeding point 12a to the second feeding point 13a is x, and similarly, the distance in the direction from the third feeding point 12b to the fourth feeding point 13b is x.

A voltage wave propagating from the first feeding point 12a in the direction of the second feeding point 13a is W21 (x, t), and a voltage wave propagating from the second feeding point 13a in the direction of the first feeding point 12a is W22. If (x, t), it is expressed as follows.
W21 (x, t) = V · cos {ωt + Φ2 (t) + 2πx / λ) + δ1}
W22 (x, t) = V · cos {ωt + Φ2 (t) −2π (x−L0) / λ + δ2}
Where V is the amplitude of the voltage wave, ω is the angular frequency of the voltage, λ is the wavelength of the voltage wave, t is time, Φ2 (t) is a phase that changes randomly in time, and L0 is the first and second power feeds. The point interval, δ1 is the initial phase of the voltage wave of power supplied from the first feeding point 12a, and δ2 is the initial phase of the voltage wave of power supplied from the second feeding point 13a.
The above two waves are expressed as follows when expressed in a complex function.
W21 (x, t) = Re [V · exp {−i (2πx / λ + δ1)} · exp {−iωt−iΦ2 (t)}]
W22 (x, t) = Re [V · exp {i2π (x−L0) / λ−iδ2)} · exp {−iωt−iΦ2 (t)}]
The wave intensity I (x, t) when considering the interference of electromagnetic waves is expressed as follows. However, * shows a conjugate complex number.
I (x, t) = {square root of absolute value of W21 (x, t) + W22 (x, t)} = {W21 (x, t) + W22 (x, t)} · {W21 (x, t) ^* + W22 (x, t) ^* }
= 2V ² + V ² · exp [−i {2π (2x−L0) / λ + (δ1−δ2)}] + exp [i {2π (2x−L0) / λ + (δ1−δ2)}]
= 2V ² + 2V ² cos {2π (2x−L0) / λ + (δ1-δ2)}
= 4V ² cos ² {2π (x−L0 / 2) / λ + (δ1-δ2) / 2}
However, although λ is a wavelength, it is not the wavelength of the electromagnetic wave in vacuum but the wavelength λ under the above-mentioned film forming conditions, and is generally shorter than the wavelength λ ₀ of the electromagnetic wave in vacuum. In the SiH 4 gas plasma, the ratio λ / λ ₀ between the wavelength λ in the plasma and the wavelength λ ₀ in the vacuum is about 0.6.
As shown in FIG. 4, this equation is obtained when (δ1−δ2) = Δδ = 0, that is, when the difference in the initial phase of the voltage of the power supplied to the first and second feeding points 12a and 13a is zero. Indicates that the position of the antinode (maximum value) is at x = L0 / 2, and that a standing wave is generated in which the interval between the antinode and the antinode is one half of the wavelength.
Further, it is shown that the antinode position of the standing wave can be arbitrarily set by adjusting the value of Δδ = (δ1−δ2).
Here, the standing wave generated using the sixth power supply system is referred to as a second standing wave.

Interference phenomenon of two waves, a voltage wave propagating from the third feeding point 12b to the fourth feeding point 13b and a voltage wave propagating from the fourth feeding point 13b to the third feeding point 12b The two waves of the voltage wave propagating from the first feeding point 12a to the second feeding point 13a and the voltage wave propagating from the second feeding point 13a to the first feeding point 12a are also described. This is the same as the interference phenomenon. That is, also in this case, a standing wave as shown in FIG. 4 is generated.
As described above, the specifications and lengths of the coaxial cable and the vacuum coaxial cable of the two transmission lines from the first power distributor 82 to the first and third feeding points 12a and 12b are the same. Further, since the components of the current introduction terminals 15 and 25 have the same specifications, there is no phase change due to the difference between the two propagation paths.
Then, the specifications and lengths of the coaxial cable and the vacuum coaxial cable of the two transmission lines from the second power distributor 83 to the second and fourth feeding points 13a and 13b are made the same, and current is introduced. Since the parts of the terminals 20 and 30 have the same specifications, there is no phase change due to the difference between the two propagation paths.

Now, in response to the results of the first and second preliminary film forming steps, the main film forming step is started.
First, in FIG. 7, the substrate 11 is previously set on the second electrode 4, the vacuum pump 10 (not shown) is operated, the impurity gas in the vacuum vessel 1 is removed, and then a discharge gas supply pipe (not shown). The substrate temperature is maintained in the range of 80 to 350 ° C., for example, 180 ° C. while SiH 4 gas is supplied from 8 at 350 sccm and pressure of 0.5 Torr (66.5 Pa).
Next, the frequency of the oscillator 50 of the fifth power supply system is set to 60 MH, and the phases of the outputs of the two phase shifters 53 and 56 are set to θ11 and θ22 that are grasped as data of the first preliminary film forming process, Electric power is supplied to the first, second, third and fourth feeding points 12a, 13a, 12b and 13b, respectively. The power is 1000 W, for example, together with the sixth power supply system.
Similarly, the frequency of the oscillator 60 of the sixth power supply system is set to 60 MH, and the phases of the outputs of the two phase shifters 63 and 66 are set to δ11 and δ22 grasped as data of the second preliminary film forming process. The power is supplied to the first, second, third and fourth feeding points 12a, 13a, 12b and 13b. The power is 1000 W, for example, together with the fifth power supply system.

When power is supplied to the first, second, third, and fourth feeding points 12a, 13a, 12b, and 13b from the fifth and sixth power supply systems, respectively, between the pair of electrodes. The distribution of generated power is as shown below.
Here, for convenience of explanation, a voltage wave of power supplied from the fifth power supply system to the first and third feeding points 12a and 12b via the first and third current introduction terminals 15 and 25 is expressed as W11. (X, t).
A voltage wave of power supplied from the fifth power supply system to the second and fourth feeding points 13a and 13b via the second and fourth current introduction terminals 20 and 30 is represented by W12 (x, t). .
In addition, a voltage wave of power supplied from the sixth power supply system to the first and third feeding points 12a and 12b via the first and third current introduction terminals 15 and 25 is expressed as W21 (x, t). Represented by
In addition, a voltage wave of power supplied from the sixth power supply system to the second and fourth feeding points 13a and 13b via the second and fourth current introduction terminals 20 and 30 is expressed as W22 (x, t). Represented by

In this case, since four voltage waves are applied simultaneously, the intensity I (x, t) of the electromagnetic wave is expressed by the following equation.
Where V is the amplitude of the voltage wave, ω is the angular frequency of the voltage, λ is the wavelength of the voltage wave, t is time, Φ1 (t) is a phase that changes randomly in time, and L0 is the first and second power supplies. The interval between the points, θ1 is the initial phase of the voltage wave of the power supplied from the first and third feeding points 12a and 12b in the fifth power supply system, and θ2 is the second and fourth in the fifth power supply system. The initial phase of the voltage wave of the power supplied from the feeding points 13a and 13b, Φ2 (t) is a phase that changes randomly in time, and δ1 is the first and third feeding points 12a in the sixth power supply system. , 12b is the initial phase of the voltage wave of power supplied from 12b, and δ2 is the initial phase of the voltage wave of power supplied from the second and fourth feed points 13a, 13b in the fourth power supply system. * Represents a conjugate complex number.
I (x, t) = {W11 (x, t) + W12 (x, t) + W21 (x, t) + W22 (x, t)} · {W11 (x, t) ^* + W12 (x, t) ^* + W21 (X, t) ^* + W22 (x, t) ^* }
Here, W11 (x, t), W12 (x, t), W21 (x, t), and W22 (x, t) are as described above, and are expressed by the following equations.
W11 (x, t) = Re [V · exp {−i (2πx / λ + θ1)} · exp {−iωt−iΦ1 (t)}]
W12 (x, t) = Re [V · exp {i2π (x−L0) / λ−iθ2)} · exp {−iωt−iΦ1 (t)}]
W21 (x, t) = Re [V · exp {−i (2πx / λ + δ1)} · exp {−iωt−iΦ2 (t)}]
W22 (x, t) = Re [V · exp {i2π (x−L0) / λ) −iδ2} · exp {−iωt−iΦ2 (t)}]

The intensity I (x, t) of the electromagnetic wave is calculated as follows.
I (x, t) = {W11 (x, t) .W11 (x, t) ^* + W11 (x, t) .W12 (x, t) ^* + W12 (x, t) .W11 (x, t) ^* + W12 (x, t) ^* W12 (x, t) ^* } + {W21 (x, t) ^* W21 (x, t) ^* + W21 (x, t) ^* W22 (x, t) ^* + W22 (x, t ) · W21 (x, t) ^* + W22 (x, t) · W22 (x, t) ^* } + {W11 (x, t) · W21 (x, t) ^* + W21 (x, t) · W11 (x , T) ^* } + {W11 (x, t) .W22 (x, t) ^* + W22 (x, t) .W11 (x, t) ^* } + {W12 (x, t) .W21 (x, t ^{) * + W21 (x, t} ) · W12 (x, t) *} + {W12 (x, t) · W22 (x, t) * + W22 (x, t) · W12 (x, t) *}

That is, I (x, t) is as follows.
I (x, t) = 4V ² cos ² {2π (x−L0 / 2) / λ + (θ1−θ2) / 2} + 4V ² cos ² {2π (x−L0 / 2) / λ + (δ1−δ2) / 2} + 2V ² cos [{Φ1 (t) −Φ2 (t)} + (θ1−δ1)]
+ 2V ² cos [{Φ1 (t) −Φ2 (t)} + 2π (2x−L0 / 2) / λ + (θ1−δ2)] + 2V ² cos [{Φ1 (t) −Φ2 (t)} + 2π (2x− L0 / 2) / λ + (θ2−δ1)] + 2V ² cos [{Φ1 (t) −Φ2 (t)} + (θ2−δ2)]

  In the above equation, the first term represents the above-mentioned first standing wave, and the second term represents the above-mentioned second standing wave.

In the above equation, the third term includes the voltage wave W11 (x, t) of the power supplied from the fifth power supply system shown in FIG. A combined wave of the voltage wave W21 (x, t) of power supplied from the power supply system to the first and third feeding points 12a and 12b is shown. The value indicated in this term changes randomly in the voltage of the output from the first and second oscillators 50 and 60 that are phase-modulated randomly by the first and second random phase modulators 51 and 61, respectively. Since the phase difference {Φ1 (t) −Φ2 (t)} is included, the value is random in time.
That is, the instantaneous value changes randomly with time. As a result, in terms of time average, the average value is almost zero.
The time average is to take an average over a sufficiently large time compared to the period of the oscillator output. That is, if the time average is indicated by <>,
<Third term> = <2V ² cos [{Φ1 (t) −Φ2 (t)} + (θ1−δ1)]> = 0
This indicates that W11 (x, t) and W21 (x, t) cannot generate a standing wave.
Here, the above item <3> is considered. The value of the above <third term> is the case where one of the random phase changes Φ1 (t) and Φ2 (t) of the voltage signals output from the first and second oscillators 50 and 60 is constant or zero. Is also zero.
This means that either the first random phase modulator 51 or the second random phase modulator 61 can be excluded from the configuration shown in FIG. That is, it is not necessary to attach a random phase modulator to one oscillator among a plurality of oscillators constituting the apparatus. In this case, the configuration of the apparatus is simple.

In the above equation, the fourth term includes the voltage wave W11 (x, t) of power supplied from the fifth power supply system shown in FIG. 7 to the first and second feeding points 12a and 12b, and the sixth A combined wave of the voltage wave W22 (x, t) of the power supplied from the power supply system to the second and fourth feeding points 13a and 13b is shown. The value indicated in this term changes randomly in the voltage of the output from the first and second oscillators 50 and 60 that are phase-modulated randomly by the first and second random phase modulators 51 and 61, respectively. Since the phase difference {Φ1 (t) −Φ2 (t)} is included, the value is random in time.
That is, the instantaneous value changes randomly with time. As a result, in terms of time average, the average value is almost zero.
The time average is to take an average over a sufficiently large time compared to the period of the oscillator output. That is, if the time average is indicated by <>,
<4th term> = <2V ² cos [{Φ1 (t) −Φ2 (t)} + 2π (2x−L0 / 2) / λ + (θ1−δ2)]> = 0
This indicates that W11 (x, t) and W22 (x, t) cannot generate a standing wave.
Here, the above <4th term> is considered. The value of the <fourth term> is the case where one of the random phase changes Φ1 (t) and Φ2 (t) of the voltage signals output from the first and second oscillators 50 and 60 is constant or zero. Is also zero.
This means that either the first random phase modulator 51 or the second random phase modulator 61 can be excluded from the configuration shown in FIG. That is, it is not necessary to attach a random phase modulator to one oscillator among a plurality of oscillators constituting the apparatus. In this case, the configuration of the apparatus is simple.

In the above equation, the fifth term includes the voltage wave W12 (x, t) of the power supplied from the fifth power supply system shown in FIG. A combined wave of a voltage wave W21 (x, t) of power supplied from the power supply system to the first and second feeding points 12a and 12b is shown. The value indicated in this term changes randomly in the voltage of the output from the first and second oscillators 50 and 60 that are phase-modulated randomly by the first and second random phase modulators 51 and 61, respectively. Since the phase difference {Φ1 (t) −Φ2 (t)} is included, the value is random in time.
That is, the instantaneous value changes randomly with time. As a result, in terms of time average, the average value is almost zero.
The time average is to take an average over a sufficiently large time compared to the period of the oscillator output. That is, if the time average is indicated by <>,
<5th term> = <2V ² cos [{Φ1 (t) −Φ2 (t)} + 2π (2x−L0 / 2) / λ + (θ2−δ1)]> = 0
This indicates that W12 (x, t) and W21 (x, t) cannot generate a standing wave.
Here, <Section 5> will be considered. The value of the <fifth term> is when the random phase change Φ1 (t) or Φ2 (t) of the voltage signals output from the first and second oscillators 50 and 60 is a constant value or zero. Is also zero.
This means that either the first random phase modulator 51 or the second random phase modulator 61 can be excluded from the configuration shown in FIG. That is, it is not necessary to attach a random phase modulator to one oscillator among a plurality of oscillators constituting the apparatus. In this case, the configuration of the apparatus is simple.

In the above equation, the sixth term includes the voltage wave W12 (x, t) of the power supplied from the fifth power supply system shown in FIG. A combined wave of the voltage wave W22 (x, t) of power supplied from the power supply system to the second and fourth feeding points 13a and 13b is shown. The value indicated in this term changes randomly in the voltage of the output from the first and second oscillators 50 and 60 that are phase-modulated randomly by the first and second random phase modulators 51 and 61, respectively. Since the phase difference {Φ1 (t) −Φ2 (t)} is included, the value is random in time.
That is, the instantaneous value changes randomly with time. As a result, in terms of time average, the average value is almost zero.
The time average is to take an average over a sufficiently large time compared to the period of the oscillator output. That is, if the time average is indicated by <>,
<Sixth term> = <2V ² cos [{Φ1 (t) −Φ2 (t)} + (θ2−δ2)]> = 0
This indicates that W12 (x, t) and W22 (x, t) cannot generate a standing wave.
Here, <Section 6> will be considered. The value of the <sixth term> is when the random phase change Φ1 (t) or Φ2 (t) of the voltage signals output from the first and second oscillators 50 and 60 is a constant value or zero. Is also zero.
This means that either the first random phase modulator 51 or the second random phase modulator 61 can be excluded from the configuration shown in FIG. That is, it is not necessary to attach a random phase modulator to one oscillator among a plurality of oscillators constituting the apparatus. In this case, the configuration of the apparatus is simple.

As described above, the first and second oscillators 50 and 60 constituting the fifth power supply system and the second oscillator 60 constituting the sixth power supply system include the first and second random phase modulators 51 and 61, respectively. As a result of the phase of the sine wave signal being randomly modulated, W11 (x, t) and W21 (x, t), W11 (x, t) and W22 (x, t), W12 (x, t) And W21 (x, t), and W12 (x, t) and W22 (x, t) do not generate a standing wave, respectively.
That is, it is possible to eliminate the mutual interference effect between the outputs of the fifth and sixth power supply systems by randomly modulating the phases of the outputs of the first oscillator 50 and the second oscillator 60. Is shown.
Further, as described above, in this embodiment, it is not necessary to randomly modulate the phases of the outputs of both the first oscillator 50 and the second oscillator 60, and only one of the phases is randomly modulated. That is enough.

Therefore, the pair of electrodes 2, 4 generated by the power supplied from the fifth and sixth power supply systems to the first, second, third, and fourth feeding points 12a, 12b, 13a, 13b. The intensity I (xt) of the electromagnetic wave between is as follows.
I (x, t) = 4V ² cos ² {2π (x−L0 / 2) / λ + (θ1−θ2) / 2} + 4V ² cos ² {2π (x−L0 / 2) / λ + (δ1−δ2) / 2}
This indicates that it is the sum of two standing waves that do not vary with time.
The phase difference Δθ = (θ1−θ2) that can be adjusted by the first and second phase shifters 53 and 56 and the phase difference Δδ = (δ1−) that can be adjusted by the third and fourth phase shifters 63 and 66. It is shown that the position of the antinodes of the two standing waves can be arbitrarily adjusted by adjusting δ2).

Specifically, for example, the phase values of the first and second phase shifters 53 and 56 are set to θ11 and θ22 shown in the first preliminary film forming step, and
Assuming that the phase values of the third and fourth phase shifters 63 and 66 are δ11 and δ22 shown in the second preliminary film forming step, the first and second standing positions are shown in FIG. Waves will be added in a form separated by λ / 4.
That is, the sum I (x) of the two standing waves is
I (x) = 4V ² cos ² {2π (x−L0 / 2) / λ} + 4V ² cos ² {2π (x−L0 / 2) / λ + π / 2}
= 4V ² cos ² {2π (x−L0 / 2) / λ} + 4V ² sin ² {2π (x−L0 / 2) / λ}
= 4V ²
It is represented by
In the above specific example, as shown in FIG. 5, it means that the first and second standing waves are added in a form separated by λ / 4. When the phase difference Δδ = (δ1-δ2) is set in the preliminary film-forming process of 2, the interval between the antinode position of the first standing wave and the antinode position of the second standing wave is This means that the phase difference Δδ = (δ1−δ2) should be selected so as to be equal to one half of the antinode spatial period.

Incidentally, in general, the distribution of power intensity between the pair of electrodes 2 and 4 and the distribution of plasma intensity are in a proportional relationship.
On the other hand, when the SiH 4 gas is turned into plasma in the above process, radicals such as SiH 3, SiH 2, and SiH existing in the plasma diffuse due to the diffusion phenomenon and are adsorbed on the surface of the substrate 11, thereby causing the a-Si film. However, the plasma intensity distribution and the film thickness distribution are proportional to each other.
This means that the fact that the power intensity distribution is made uniform means that the film thickness distribution is made uniform.
In addition, the distribution of power intensity being uniform means that the plasma density and the radial density are uniform over a large area.
Therefore, when the power intensity between the pair of electrodes 2 and 4 is uniform as described above, the distribution of the deposited film is uniform. As a result, the variation in film thickness is uniform. Since the variation of the film thickness necessary for practical use is 5 to 10%, it can be easily achieved.
This means that it is possible to form a uniform film thickness distribution, which is impossible with the conventional VHF plasma surface treatment apparatus and method for a substrate having a size exceeding a quarter of the wavelength λ. It means that. Therefore, the above is an epoch-making discovery in the application field of VHF plasma, and its practical value is remarkably large.
Note that microcrystalline Si or thin-film polycrystalline Si can be formed by optimizing the flow rate ratio, pressure, and power of SiH and H2 in the film forming conditions. It is a matter of course that the film can be formed in the same manner as the film formation.

In the present embodiment, since there are two feed points on opposite sides, the substrate size is limited to about 2 m to 3 mx in length and about 0.5 m in width, but if the number of feed points is increased in the width direction, the substrate Of course, the size range can be expanded.

Further, in the manufacture of a-Si solar cells, thin film transistors, and photosensitive drums, there is no problem in performance as long as the film thickness distribution is within ± 10%. According to the above embodiment, it is possible to obtain a significantly better film thickness distribution as compared with the conventional apparatus and method even when a power supply frequency of 60 MHz is used. This means that the industrial value related to productivity improvement and cost reduction in the manufacturing field of a-Si solar cells, thin film transistors, and photosensitive drums is remarkably large.

Example 4
Regarding the power supply method to the electrode of Example 4 relating to the present invention, the plasma surface treatment method (plasma CVD method) and the plasma surface treatment device (plasma CVD device) using the power supply method, mainly refer to FIG. 8 and FIG. To explain.

First, the configuration of the apparatus will be described. However, the same members as those shown in FIG. 1, FIG. 2, FIG. 6 and FIG.
FIG. 8 is a schematic diagram showing a configuration related to the film forming chamber of the plasma surface processing apparatus according to the fourth embodiment, and FIG. 9 is a schematic diagram showing a configuration related to the power supply apparatus of the plasma surface processing apparatus according to the fourth embodiment.

8 and 9, a first flat plate electrode 2 and a second flat plate electrode 4 incorporating a substrate heater (not shown) are disposed inside the vacuum vessel 1.
The first flat electrode 2 is fixed to the vacuum vessel 1 via an insulating member 87. The first flat electrode 2 has a hollow inside and is provided with a gas shower hole 7. A discharge gas, for example, silane gas, is supplied to the hollow from a gas introduction tube 8 electrically insulated by an insulating member 86. The The first flat plate electrode 2 is provided with a large number of gas discharge holes 2 a and has a function of uniformly supplying the discharge gas between the pair of electrodes 2 and 4.
The supplied discharge gas such as silane gas is turned into plasma between the pair of electrodes, and is then discharged out of the vacuum vessel 1 by the exhaust pipes 9a and 9b and a vacuum pump (not shown).
The substrate 11 is disposed on the second electrode 4 using the substrate lifter 90 and the substrate carry-in / out gate 91. A bellows 89 is used to keep the vacuum vessel 1 airtight when the substrate lifter 90 moves up and down.
Further, in order to improve the energization between the inner wall of the vacuum vessel 1 and the second electrode 4, the first connection conductor 88 a fixed to the inner wall of the vacuum vessel and the second electrode fixed to the second electrode 4. A connection conductor 88a is disposed.

  As shown in FIGS. 8 and 9, the feeding point, which is a position for feeding high-frequency power to the electrode, is the opposite sides of the first plate-type electrode 2. In addition, a plurality of, for example, a first feeding point 12a shown in FIG. 9, a second feeding point 13a, a third feeding point 12b, a fourth feeding point 13b, and a fourth feeding point 13b. Deploy. The feed points 12a and 13a, and 12b and 13b are in a relationship of being opposite points on the propagation of the high-frequency power wave.

In the arrangement of the feeding points, if the distance between the first and third feeding points 12a and 12b and the distance between the second and fourth feeding points 13a and 13b are too wide, both feeding points are used in the film-forming test described later. On the other hand, if the distance between the two feeding points is too close, the film thickness between the two feeding points increases.
Here, based on experience in plasma CVD using silane gas, the interval is set to 0.3 m. Specifically, for example, the first feeding point 12a is located at a position 0.015 m from the end of the side of the first flat plate electrode 2, and the third feeding point 12b is located 0.3 m away from the first feeding point 12b. The distance between the third feeding point 12b and the end of the side is 0.015 m.
If, as a result of the film formation test described later, the film thickness distribution does not reach the required result, the film formation test is performed using the distance between the two feeding points and the width of the first electrode 2 of the rectangular flat plate as parameters. It is natural that the feeding point interval can be selected.

8 and 9, the output signal of the first transmitter 50 that generates a sine wave signal having a frequency of 10 MHz to 30 MHz (VH band) to 30 MHz to 300 MHz (VHF band), that is, the phase of the sine wave signal is the first. The random phase modulator 51 performs random modulation.
As described in the first to third embodiments, the mutual coherence between outputs of the fifth and sixth power supply systems described later can be reduced by randomly modulating the phase of the sine wave signal. Is possible.

The first distributor 52 distributes the output of the first transmitter 50 into two and transmits it to the first and second phase shifters 53 and 56.
The first phase shifter 53 has a function of arbitrarily shifting the phase of the input signal. The output of the first phase shifter 53 is transmitted to the third coupler 84.
The second phase shifter 56 has a function of arbitrarily shifting the phase of the input signal. The output of the second phase shifter 56 is transmitted to the fourth combiner 85.

The first amplifier 54 amplifies the power of the signal transmitted from the third coupler 84 and transmits it to the first impedance matching unit 55.
The first impedance matching unit 55 outputs the output of the first amplifier 54 to the first power distributor 82, the first current introduction terminal 15, the first vacuum coaxial cable 16, and the first vacuum coaxial. The power is supplied to the first feeding point 12 a via the core wire 17 of the cable 16. Further, the power is supplied to the third feeding point 12 b via the third current introduction terminal 25, the third vacuum coaxial cable 26, and the core wire 27 of the third vacuum coaxial cable 26.

A tubular insulating material (not shown) is attached to the power supply lines 17 and 27 to suppress abnormal discharge in the vicinity thereof.
Each of the first power amplifiers 54 includes an output value (traveling wave) monitor and a reflected wave monitor reflected back from the downstream side. In addition, an isolator for protecting the electric circuit of the power amplifier main body by the reflected wave is attached.

The second amplifier 57 amplifies the power of the signal transmitted from the fourth coupler 85 and transmits it to the second impedance matching unit 58.
The second impedance matching unit 58 outputs the output of the second amplifier 57 to the second power distributor 83, the second current introduction terminal 25, the second vacuum coaxial cable 21, and the second vacuum coaxial. The power is supplied to the second feeding point 13a through the core wire 22 of the cable 21. In addition, the fourth current introduction terminal 30, the fourth vacuum coaxial cable 31, and the core wire 32 of the fourth vacuum coaxial cable 31 are supplied to the fourth feeding point 13 b.

Note that a tubular insulating material (not shown) is attached to the feeder lines 22 and 32 to suppress abnormal discharge in the vicinity thereof.
Each of the second power amplifiers 57 includes an output value (traveling wave) monitor and a reflected wave monitor reflected back from the downstream side. In addition, an isolator for protecting the electric circuit of the power amplifier main body by the reflected wave is attached.

The output signal of the second oscillator 60 that generates a sine wave signal having a frequency of 10 MHz to 30 MHz (VH band) to 30 MHz to 300 MHz (VHF band), that is, the phase of the sine wave signal is a second random phase modulator 61. Modulated randomly.
As described in the first to third embodiments, the mutual coherence between outputs of the fifth and sixth power supply systems described later can be reduced by randomly modulating the phase of the sine wave signal. Is possible.

The second distributor 62 distributes the output of the second transmitter 60 into two and transmits it to the third and fourth phase shifters 63 and 66.
The third phase shifter 63 has a function of arbitrarily shifting the phase of the input signal. The output of the third phase shifter 63 is transmitted to the third coupler 84.
The fourth phase shifter 66 has a function of arbitrarily shifting the phase of the input signal. The output of the fourth phase shifter 66 is transmitted to the fourth combiner 85.

The second amplifier 57 amplifies the power of the signal transmitted from the fourth coupler 85 and transmits it to the second impedance matching unit 58.
The second impedance matching unit 58 outputs the output of the second amplifier 57 to the second power distributor 83, the second current introduction terminal 20, the second vacuum coaxial cable 21, and the second vacuum coaxial. It is supplied to the second feeding point 13a through the core wire 22 of the cable 21. In addition, the fourth current introduction terminal 30, the fourth vacuum coaxial cable 31, and the core wire 32 of the fourth vacuum coaxial cable 31 are supplied to the fourth feeding point 13 b.

The output of the third phase shifter 63 is transmitted to the first amplifier via the third coupler 84.
The first amplifier 54 amplifies the power of the signal transmitted from the third coupler 84 and transmits it to the first impedance matching unit 55.
The first impedance matching unit 55 outputs the output of the first amplifier 54 to the first power distributor 82, the first current introduction terminal 15, the first vacuum coaxial cable 16, and the first vacuum coaxial. The power is supplied to the first feeding point 12 a via the core wire 17 of the cable 16. Further, the power is supplied to the third feeding point 12 b via the third current introduction terminal 25, the third vacuum coaxial cable 26, and the core wire 27 of the third vacuum coaxial cable 26.

Here, the first transmitter 50, the first random phase modulator 51, the first distributor 52, the first and second phase shifters 53 and 56, the third and fourth couplers 84, 85, the first and second amplifiers 54 and 57, the first and second impedance matching devices 55 and 58, and the first and second power distributors 82 and 83 are connected to the fifth power. Called the supply system.
Also, the second transmitter 60, the second random phase modulator 51, the second distributor 62, the third and fourth phase shifters 63 and 66, the third and fourth couplers 84 and 85,
A power supply system including first and second amplifiers 54 and 57, first and second impedance matching units 55 and 58, and first and second power distributors 82 and 83 is a sixth power supply system. Call it.

In the above apparatus configuration, the specifications and lengths of the coaxial cable and the vacuum coaxial cable of the two transmission lines from the first power distributor 82 to the first and third feeding points 12a and 12b are the same. The parts of the current introduction terminals 15 and 25 have the same specifications. As a result, there is no phase difference due to the difference in the propagation path of the electromagnetic wave that is transmitted through the two propagation paths.
Then, the specifications and lengths of the coaxial cable and the vacuum coaxial cable of the two transmission paths from the second power distributor 83 to the second and fourth feeding points 13a and 13b are made the same, and the current is introduced. The parts of the terminals 20 and 30 have the same specifications. As a result, there is no phase difference due to the difference in the propagation path of the electromagnetic wave that is transmitted through the two propagation paths.

Next, a method for manufacturing an amorphous silicon film for an a-Si solar cell by plasma CVD using the plasma surface treatment apparatus having the above configuration will be described.
In the implementation or application of the present invention, it is preferable to use the first and second preliminary film forming steps and the main film forming step as procedures.
The first preliminary film forming step relates to the fifth power supply system, and is supplied from the first and third feeding points 12a and 12b using the first and second phase shifters 53 and 56. Data for grasping the relationship between the electric power, the phase difference between the voltages of the electric power supplied from the second and fourth feeding points 13a and 13b, and the thickness distribution of the amorphous silicon film formed on the substrate 11 is acquired. To be done.
The second preliminary film forming step relates to the sixth power supply system, and is supplied from the first and third feeding points 12a and 12b using the third and fourth phase shifters 63 and 66. Data for grasping the relationship between the electric power, the phase difference between the voltages of the electric power supplied from the second and fourth feeding points 13a and 13b, and the thickness distribution of the amorphous silicon film formed on the substrate 11 is acquired. To be done.
This film-forming process is performed for the production of the target amorphous Si.

  In this embodiment, as shown below, in the first preliminary film-forming process and the second preliminary film-forming process, as means for grasping information on the position of the antinode of the standing wave, for example, an amorphous silicon film However, instead of this, at least one of the etching rate distribution, the plasma emission distribution, the plasma density distribution, etc. is measured in advance, and the antinode of the standing wave is determined based on the measurement result. You may grasp | ascertain the relationship between the information of a position, and the phase difference of the voltage of two output electric power of each of the several 2 output phase variable high frequency power supply mentioned later.

First, in the first first preliminary film forming step, in FIGS. 8 and 9, the substrate 11 is previously set on the second electrode 4, a vacuum pump (not shown) is operated, and the vacuum container 1 is operated. After removing the impurity gas and the like in the substrate, the substrate temperature is in the range of 80 to 350 ° C., for example, 180 ° C. while supplying SiH 4 gas from the discharge gas supply tube 8 at 350 sccm and the pressure of 0.5 Torr (66.5 Pa), for example. Hold on.
Next, the fifth power supply system, that is, the first transmitter 50, the first random phase modulator 51, the first distributor 52, the first and second phase shifters 53, 56, and the third And fourth couplers 84 and 85, first and second amplifiers 54 and 57, first and second impedance matchers 55 and 58, and first and second power distributors 82 and 83.
Is used to supply power to the first, second, third and fourth feeding points 12a, 12b, 13a and 13b.
In this case, the frequency of the first oscillator 50 is set to 60 MHz, for example.
Then, the regulator of the first phase shifter 53 is set to, for example, θ1, the output of the first power amplifier 54 is set to, for example, 500 W, the first impedance matching unit 55, the first power distributor 82, supplied to the first and third feeding points 12a and 12b via the first and third current introduction terminals 15 and 25 and the core wires 17 and 27 of the first and second vacuum coaxial cables 16 and 26, respectively. To do.
Then, the regulator of the second phase shifter 56 is set to, for example, θ2, the output of the second power amplifier 57 is set to, for example, 500 W, the second impedance matching unit 58, the second power distributor 83, supplied to the second and fourth feeding points 13a and 13b via the second and fourth current introduction terminals 20 and 30 and the core wires 22 and 32 of the second and fourth vacuum coaxial cables 21 and 31, respectively. To do.
By adjusting the first impedance matching unit 55 and the second impedance matching unit 58, the reflected wave of the supplied power can be prevented from returning to the upstream side of the respective impedance matching units 55 and 58.
As a result, plasma of the SiH 4 gas is generated and, for example, amorphous Si is deposited on the substrate 11.

In the above manner, an amorphous Si film is formed on the substrate 11 with a film formation time of, for example, 10 to 20 minutes. After film formation, the substrate 11 is taken out from the vacuum vessel 1 and the film thickness distribution of the amorphous Si film is evaluated. As will be described later, the film thickness distribution of, for example, amorphous Si deposited on the substrate 11 becomes a sinusoidal distribution due to the occurrence of a standing wave, which is a phenomenon inherent to VHF plasma. Such a film forming test is repeatedly performed using the phases θ1 and θ2 of the first and second phase shifters 53 and 56 as parameters.
Then, in the direction connecting the first feeding point 12a and the second feeding point 12b, the distance from the center point of the substrate 11 to the position of the maximum thickness of the sinusoidal film thickness distribution and the first and second phase shifters. The relationship between the phases θ1 and θ2 of 53 and 56 is grasped as data.
For example, the phase of the first and second phase shifters 53 and 56 serving as the center point of the substrate 11 in the direction connecting the first feeding point 12a and the second feeding point 12b is the position of the maximum thickness of the film thickness distribution. It is understood that the values of are, for example, θ11 and θ22.
As a result, an amorphous silicon film having a thickness distribution in the shape of the first standing wave shown in FIG. 5 is obtained.

Next, in the second preliminary film forming step, in FIGS. 8 and 9, the substrate 11 is previously set on the second electrode 4, a vacuum pump (not shown) is operated, After removing the impurity gas and the like, the substrate temperature is in the range of 80 to 350 ° C., for example, 180 ° C. while supplying SiH 4 gas from a discharge gas supply tube 8 (not shown) at 350 sccm and a pressure of 0.5 Torr (66.5 Pa). Hold on.
Next, the sixth power supply system, that is, the second transmitter 60, the second random phase modulator 61, the second distributor 62, the third and fourth phase shifters 63, 66, the third And fourth couplers 84 and 85, first and second amplifiers 54 and 57, first and second impedance matchers 55 and 58, and first and second power distributors 82 and 83. The sixth power supply system is used as the power supply system to supply power to the first, second, third, and fourth feeding points 12a, 12b, 13a, and 13b.
In this case, the frequency of the second oscillator 60 is set to 60 MHz, for example.
Then, the adjuster of the second phase shifter 63 is set to δ1, for example, the output of the first power amplifier 54 is set to 500 W, for example, and the output is set to the first impedance matcher 55, the first The first and third feeding points 12 a, the power distributor 82, the first and third current introduction terminals 15 and 25, and the core wires 17 and 27 of the first and second vacuum coaxial cables 16 and 26, 12b.
Then, the regulator of the fourth phase shifter 66 is set to δ2, for example, the output of the second power amplifier 57 is set to 500 W, for example, and the output is set to the second impedance matching device 58, the second The second and fourth feeding points 13a, the power distributor 83, the second and fourth current introduction terminals 20, 30 and the core wires 22, 32 of the second and fourth vacuum coaxial cables 21, 31 are provided. 13b.
By adjusting the first impedance matching unit 55 and the second impedance matching unit 58, the reflected wave of the supplied power can be prevented from returning to the upstream side of the respective impedance matching units 55 and 58.
As a result, plasma of the SiH 4 gas is generated and, for example, amorphous Si is deposited on the substrate 11.

In the above manner, an amorphous Si film is formed on the substrate 11 with a film formation time of, for example, 10 to 20 minutes. After film formation, the substrate 11 is taken out from the vacuum vessel 1 and the film thickness distribution of the amorphous Si film is evaluated. The film thickness distribution of, for example, amorphous Si deposited on the substrate 11 becomes a sinusoidal distribution due to the generation of a standing wave that is a phenomenon unique to VHF plasma. Such a film forming test is repeatedly performed using the phases δ1 and δ2 of the third and fourth phase shifters 63 and 6 as parameters.
In the direction connecting the first feeding point 12a and the second feeding point 13a, the distance from the center point of the substrate 11 to the position of the maximum thickness of the sine thickness distribution and the first and second phase shifters. The relationship between the phases δ1 and δ2 of 63 and 66 is grasped as data.

For example, the phase difference Δδ = (δ1−δ2) for setting a position away from the center point of the substrate 11 by a quarter of the wavelength λ, that is, λ / 4, in the direction of the second feeding point 13a is, for example, It is understood that δ11-δ22.
However, the wavelength λ is not the wavelength of the electromagnetic wave in vacuum but the wavelength λ under the above-mentioned film forming conditions, and is generally shorter than the wavelength λ ₀ of the electromagnetic wave in vacuum. In the SiH 4 gas plasma, the ratio λ / λ ₀ between the wavelength λ in the plasma and the wavelength λ ₀ in the vacuum is about 0.6.
Further, when setting the phase difference Δδ = (δ1−δ2), the interval between the antinode position of the first standing wave and the antinode position of the second standing wave is the antinode The phase difference Δδ = (δ1−δ2) may be selected so as to be equal to one half of the spatial period.
That is, the position of the maximum thickness of the film having a sinusoidal film thickness formed on the substrate 11 in the second preliminary film formation step is the period of the film from the center point of the substrate 11 to the second feeding point 13. Just match points that are one-half the distance away. Note that the value of half of the film cycle can be grasped in advance in the first preliminary film-forming step.
As a result, an amorphous silicon film having a thickness distribution in the shape of the second standing wave shown in FIG. 5 is obtained.

Now, in response to the results of the first and second preliminary film forming steps, the main film forming step is started.
First, in FIG. 8 and FIG. 9, the substrate 11 is previously set on the second electrode 4, a vacuum pump (not shown) is operated to remove impurity gas and the like in the vacuum vessel 1, and then a discharge gas supply pipe. The substrate temperature is maintained in the range of 80 to 350 ° C., for example, 180 ° C. while SiH 4 gas is supplied from 8 at 350 sccm and pressure of 0.5 Torr (66.5 Pa).
Next, the frequency of the oscillator 50 of the fifth power supply system is set to 60 MH, and the phases of the outputs of the two phase shifters 53 and 56 are set to θ11 and θ22 that are grasped as data of the first preliminary film forming process, Electric power is supplied to the first, second, third and fourth feeding points 12a, 13a, 12b and 13b, respectively. The power is 1000 W, for example, together with the sixth power supply system.
Similarly, the frequency of the oscillator 60 of the sixth power supply system is set to 60 MH, and the phases of the outputs of the two phase shifters 63 and 66 are set to δ11 and δ22 grasped as data of the second preliminary film forming process. The power is supplied to the first, second, third and fourth feeding points 12a, 13a, 12b and 13b. The power is 1000 W, for example, together with the fifth power supply system.

When power is supplied from the fifth and sixth power supply systems to the first, second, third, and fourth feeding points 12a, 13a, 12b, and 13b, respectively, Similarly, the power distribution generated between the pair of electrodes is a power intensity distribution I (x) expressed by the following equation.
I (x) = 4V ² cos ² {2π (x−L0 / 2) / λ} + 4V ² cos ² {2π (x−L0 / 2) / λ + π / 2}
= 4V ² cos ² {2π (x−L0 / 2) / λ} + 4V ² sin ² {2π (x−L0 / 2) / λ}
= 4V ²
Where x is the distance from the first feeding point 12a to the second feeding point 13a, V is the amplitude of the voltage wave, ω is the angular frequency of the voltage, λ is the wavelength of the voltage wave, t is the time, and L0 is the first The interval between the first and second feeding points.

Incidentally, in general, the distribution of power intensity between the pair of electrodes 2 and 4 and the distribution of plasma intensity are in a proportional relationship.
On the other hand, when the SiH 4 gas is turned into plasma in the above process, radicals such as SiH 3, SiH 2, and SiH existing in the plasma diffuse due to the diffusion phenomenon and are adsorbed on the surface of the substrate 11, thereby causing the a-Si film. However, the plasma intensity distribution and the film thickness distribution are proportional to each other.
This means that the fact that the power intensity distribution is made uniform means that the film thickness distribution is made uniform.
In addition, the distribution of power intensity being uniform means that the plasma density and the radial density are uniform over a large area.
Therefore, when the power intensity between the pair of electrodes 2 and 4 is uniform as described above, the distribution of the deposited film is uniform. As a result, the variation in film thickness is uniform. Since the variation of the film thickness necessary for practical use is 5 to 10%, it can be easily achieved.
This means that it is possible to form a uniform film thickness distribution, which is impossible with the conventional VHF plasma surface treatment apparatus and method for a substrate having a size exceeding a quarter of the wavelength λ. It means that. Therefore, the above is an epoch-making discovery in the application field of VHF plasma, and its practical value is remarkably large.
Note that microcrystalline Si or thin-film polycrystalline Si can be formed by optimizing the flow rate ratio, pressure, and power of SiH and H2 in the film forming conditions. It is a matter of course that the film can be formed in the same manner as the film formation.

  In the present embodiment, since there are two feed points on opposite sides, the substrate size is limited to about 2 m to 3 mx in length and about 0.5 m in width, but if the number of feed points is increased in the width direction, the substrate Of course, the size range can be expanded.

  Further, in the manufacture of a-Si solar cells, thin film transistors, and photosensitive drums, there is no problem in performance as long as the film thickness distribution is within ± 10%. According to the above embodiment, it is possible to obtain a significantly better film thickness distribution as compared with the conventional apparatus and method even when a power supply frequency of 60 MHz is used. This means that the industrial value related to productivity improvement and cost reduction in the manufacturing field of a-Si solar cells, thin film transistors, and photosensitive drums is remarkably large.

(Example 5)
Regarding a power supply method to an electrode of Example 5 relating to the present invention, a plasma surface treatment method (plasma CVD method) and a plasma surface treatment apparatus (plasma CVD apparatus) using the power supply method, mainly refer to FIG. 10 and FIG. To explain.

First, the configuration of the apparatus will be described. However, the same members as those shown in FIG. 1, FIG. 2, FIG. 6, and FIG. 7 to FIG.
FIG. 10 is a schematic diagram showing a configuration related to the film forming chamber of the plasma surface processing apparatus according to the fifth embodiment, and FIG. 11 is a schematic diagram showing a configuration related to the power supply apparatus of the plasma surface processing apparatus according to the fifth embodiment.

10 and 11, the electrode 2 with the first flat plate gas discharge hole 2a and the electrode 4 with the second flat plate gas discharge hole 4a are arranged inside the vacuum vessel 1. An insulating member 87 having a cavity is provided between the electrodes 2 and 4.
The second electrode 4 is fixed to the vacuum vessel 1. The second electrode 2 has a hollow inside and is provided with a gas shower hole 7. A discharge gas, for example, silane gas, is supplied to the hollow from a gas introduction tube 8 electrically insulated by an insulating member 86. The second electrode 4 is provided with a large number of gas discharge holes 4 a and has a function of uniformly supplying the discharge gas between the pair of electrodes 2 and 4.
The supplied discharge gas such as silane gas is converted into plasma between the pair of electrodes, and then the first electrode 2 is connected to the exhaust pipe through the gas discharge hole 2a together with the radical generated in the space. It is discharged out of the vacuum container 1 by 9a, 9b and a vacuum pump (not shown).
In this case, the electrically neutral radical or the like diffuses due to a diffusion phenomenon, and is thus deposited on the substrate 11 installed on the substrate holding plate 4b. As a result, a film such as amorphous silicon is formed on the substrate 11.
A substrate heater (not shown) is incorporated in the substrate holding plate 4b, and the temperature of the substrate 11 can be arbitrarily adjusted.
The substrate 11 is disposed on the substrate holding plate 4b using the substrate lifter 90 and the substrate carry-in / out gate 91. A bellows 89 is used to keep the vacuum vessel 1 airtight when the substrate lifter 90 moves up and down.
Further, in order to improve the energization between the inner wall of the vacuum vessel 1 and the second electrode 4, the first connection conductor 88a fixed to the inner wall of the vacuum vessel and the second connection fixed to the substrate holding plate 4b. A conductor 88a is disposed.

  As shown in FIG. 11, a feeding point that is a position for feeding high-frequency power to the electrode is a side opposite to each other of the first electrode 2. Then, a plurality of, for example, a first feeding point at 12a shown in FIG. 11, a second feeding point at 13a, a third feeding point at 12b, and a fourth feeding point at 13b. Deploy. The feed points 12a and 13a, and 12b and 13b are in a relationship of being opposite points on the propagation of the high-frequency power wave.

In the arrangement of the feeding points, if the distance between the first and third feeding points 12a and 12b and the distance between the second and fourth feeding points 13a and 13b are too wide, both feeding points are used in the film-forming test described later. On the other hand, if the distance between the two feeding points is too close, the film thickness between the two feeding points increases.
Here, based on experience in plasma CVD using silane gas, the interval is set to 0.3 m. Specifically, for example, the first feeding point 12a is located at a position 0.015m from the end of the side of the first electrode 2, and the third feeding point 12b is located at a position 0.3m away from the first feeding point 12a. The distance between the third feeding point 12b and the edge of the side is 0.015 m.
If, as a result of the film formation test described later, the film thickness distribution does not reach the required result, the film formation test is performed using the distance between the two feeding points and the width of the first electrode 2 of the rectangular flat plate as parameters. It is natural that the feeding point interval can be selected.

10 and 11, the output signal of the first transmitter 50 that generates a sine wave signal having a frequency of 10 MHz to 30 MHz (VH band) to 30 MHz to 300 MHz (VHF band), that is, the phase of the sine wave signal is the first. The random phase modulator 51 performs random modulation.
As described in the first to third embodiments, the mutual coherence between outputs of the fifth and sixth power supply systems described later can be reduced by randomly modulating the phase of the sine wave signal. Is possible.

The first distributor 52 distributes the output of the first transmitter 50 into two and transmits it to the first and second phase shifters 53 and 56.
The first phase shifter 53 has a function of arbitrarily shifting the phase of the input signal. The output of the first phase shifter 53 is transmitted to the third coupler 84.
The second phase shifter 56 has a function of arbitrarily shifting the phase of the input signal. The output of the second phase shifter 56 is transmitted to the fourth combiner 85.

The first amplifier 54 amplifies the power of the signal transmitted from the third coupler 84 and transmits it to the first impedance matching unit 55.
The first impedance matching unit 55 outputs the output of the first amplifier 54 to the first power distributor 82, the first current introduction terminal 15, the first vacuum coaxial cable 16, and the first vacuum coaxial. The power is supplied to the first feeding point 12 a via the core wire 17 of the cable 16. Further, the power is supplied to the third feeding point 12 b via the third current introduction terminal 25, the third vacuum coaxial cable 26, and the core wire 27 of the third vacuum coaxial cable 26.

A tubular insulating material (not shown) is attached to the power supply lines 17 and 27 to suppress abnormal discharge in the vicinity thereof.
Each of the first power amplifiers 54 includes an output value (traveling wave) monitor and a reflected wave monitor reflected back from the downstream side. In addition, an isolator for protecting the electric circuit of the power amplifier main body by the reflected wave is attached.

The second amplifier 57 amplifies the power of the signal transmitted from the fourth coupler 85 and transmits it to the second impedance matching unit 58.
The second impedance matching unit 58 outputs the output of the second amplifier 57 to the second power distributor 83, the second current introduction terminal 20, the second vacuum coaxial cable 21, and the second vacuum coaxial. The power is supplied to the first feeding point 12a via the core wire 22 of the cable 21. In addition, the fourth current introduction terminal 30, the fourth vacuum coaxial cable 31, and the core wire 32 of the fourth vacuum coaxial cable 31 are supplied to the fourth feeding point 13 b.

Note that a tubular insulating material (not shown) is attached to the feeder lines 22 and 32 to suppress abnormal discharge in the vicinity thereof.
Each of the second power amplifiers 57 includes an output value (traveling wave) monitor and a reflected wave monitor reflected back from the downstream side. In addition, an isolator for protecting the electric circuit of the power amplifier main body by the reflected wave is attached.

  Here, the first transmitter 50, the first random phase modulator 51, the first distributor 52, the first and second phase shifters 53 and 56, the third and fourth couplers 84, 85, the first and second amplifiers 54 and 57, the first and second impedance matching devices 55 and 58, and the first and second power distributors 82 and 83 are connected to the fifth power. Called the supply system.

The output signal of the second oscillator 60 that generates a sine wave signal having a frequency of 10 MHz to 30 MHz (VH band) to 30 MHz to 300 MHz (VHF band), that is, the phase of the sine wave signal is a second random phase modulator 61. Modulated randomly.
As described in the first to third embodiments, the mutual coherence between outputs of the fifth and sixth power supply systems described later can be reduced by randomly modulating the phase of the sine wave signal. Is possible.

The second distributor 62 distributes the output of the second transmitter 60 into two and transmits it to the third and fourth phase shifters 63 and 66.
The third phase shifter 63 has a function of arbitrarily shifting the phase of the input signal. The output of the third phase shifter 63 is transmitted to the third coupler 84.
The fourth phase shifter 66 has a function of arbitrarily shifting the phase of the input signal. The output of the fourth phase shifter 66 is transmitted to the fourth combiner 85.

The output of the third phase shifter 63 transmitted to the third coupler 84 and the output of the fourth phase shifter 66 transmitted to the fourth coupler 85 are respectively the fifth power supply. Similar to the system, it is amplified, impedance matched, and supplied to the first, second, third and fourth feeding points 12a, 13a, 12b and 13b.

Here, the second transmitter 60, the second random phase modulator 51, the second distributor 62, the third and fourth phase shifters 63 and 66, the third and fourth couplers 84 and 85,
A power supply system including first and second amplifiers 54 and 57, first and second impedance matching units 55 and 58, and first and second power distributors 82 and 83 is a sixth power supply system. Call it.

In the above apparatus configuration, the lengths of the coaxial cable and the vacuum coaxial cable of the two transmission lines from the first power distributor 82 to the first and third feeding points 12a and 12b are made equal, and current is introduced. The parts of the terminals 15 and 25 have the same specifications. As a result, there is no phase difference due to the difference in the propagation path of the electromagnetic wave that is transmitted through the two propagation paths.
Further, the lengths of the coaxial cables and the vacuum coaxial cables of the two transmission lines from the second power distributor 83 to the second and fourth feeding points 13a and 13b are made the same, and the current introduction terminal 20, The 30 parts have the same specifications. As a result, there is no phase difference due to the difference in the propagation path of the electromagnetic wave that is transmitted through the two propagation paths.

Next, a method for producing an amorphous silicon film for a thin film solar cell by plasma CVD using the plasma surface treatment apparatus having the above configuration will be described.
In the implementation or application of the present invention, it is preferable to use the first and second preliminary film forming steps and the main film forming step as procedures.
The first preliminary film forming step relates to the fifth power supply system, and is supplied from the first and third feeding points 12a and 12b using the first and second phase shifters 53 and 56. Data for grasping the relationship between the electric power, the phase difference between the voltages of the electric power supplied from the second and fourth feeding points 13a and 13b, and the thickness distribution of the amorphous silicon film formed on the substrate 11 is acquired. To be done.
The second preliminary film forming step relates to the sixth power supply system, and is supplied from the first and third feeding points 12a and 12b using the third and fourth phase shifters 63 and 66. Data for grasping the relationship between the electric power, the phase difference between the voltages of the electric power supplied from the second and fourth feeding points 13a and 13b, and the thickness distribution of the amorphous silicon film formed on the substrate 11 is acquired. To be done.
This film-forming process is performed for the production of the target amorphous Si.

  In this embodiment, as shown below, in the first preliminary film-forming process and the second preliminary film-forming process, as means for grasping information on the position of the antinode of the standing wave, for example, an amorphous silicon film However, instead of this, at least one of the etching rate distribution, the plasma emission distribution, the plasma density distribution, etc. is measured in advance, and the antinode of the standing wave is determined based on the measurement result. You may grasp | ascertain the relationship between the information of a position, and the phase difference of the voltage of two output electric power of each of the several 2 output phase variable high frequency power supply mentioned later.

First, in the first first preliminary film-forming step, in FIGS. 10 and 11, the substrate 11 is previously set on the substrate holding plate 4b, and a vacuum pump (not shown) is operated so that the inside of the vacuum vessel 1 After removing the impurity gas, etc., the substrate temperature is in the range of 80 to 350 ° C., for example, 180 ° C. while supplying the SiH 4 gas from the discharge gas supply tube 8 at 500 sccm and the pressure of 0.5 Torr (66.5 Pa), for example. Hold.
Next, the fifth power supply system, that is, the first transmitter 50, the first random phase modulator 51, the first distributor 52, the first and second phase shifters 53, 56, and the third And fourth couplers 84 and 85, first and second amplifiers 54 and 57, first and second impedance matchers 55 and 58, and first and second power distributors 82 and 83.
Is used to supply the first, second, third and fourth feeding points 12a, 12b, 13a and 13b.
In this case, the frequency of the first oscillator 50 is set to 60 MHz, for example.
Then, the regulator of the first phase shifter 53 is set to, for example, θ1, the output of the first power amplifier 54 is set to, for example, 500 W, the first impedance matching unit 55, the first power distributor 82, supplied to the first and third feeding points 12a and 12b via the first and third current introduction terminals 15 and 25 and the core wires 17 and 27 of the first and second vacuum coaxial cables 16 and 26, respectively. To do.
Then, the regulator of the second phase shifter 56 is set to, for example, θ2, the output of the second power amplifier 57 is set to, for example, 500 W, the second impedance matching unit 58, the second power distributor 83, supplied to the second and fourth feeding points 13a and 13b via the second and fourth current introduction terminals 20 and 30 and the core wires 22 and 32 of the second and fourth vacuum coaxial cables 21 and 31, respectively. To do.
By adjusting the first impedance matching unit 55 and the second impedance matching unit 58, the reflected wave of the supplied power can be prevented from returning to the upstream side of the respective impedance matching units 55 and 58.
As a result, plasma of the SiH 4 gas is generated and, for example, amorphous Si is deposited on the substrate 11.

In the above manner, an amorphous Si film is formed on the substrate 11 with a film formation time of, for example, 10 to 20 minutes. After film formation, the substrate 11 is taken out from the vacuum vessel 1 and the film thickness distribution of the amorphous Si film is evaluated. As will be described later, the film thickness distribution of, for example, amorphous Si deposited on the substrate 11 becomes a sinusoidal distribution due to the occurrence of a standing wave, which is a phenomenon inherent to VHF plasma. Such a film forming test is repeatedly performed using the phases θ1 and θ2 of the first and second phase shifters 53 and 56 as parameters.
Then, in the direction connecting the first feeding point 12a and the second feeding point 12b, the distance from the center point of the substrate 11 to the position of the maximum thickness of the sinusoidal film thickness distribution and the first and second phase shifters. The relationship between the phases θ1 and θ2 of 53 and 56 is grasped as data. For example, the phase of the first and second phase shifters 53 and 56 serving as the center point of the substrate 11 in the direction connecting the first feeding point 12a and the second feeding point 12b is the position of the maximum thickness of the film thickness distribution. It is understood that the values of are, for example, θ11 and θ22.
As a result, an amorphous silicon film having a thickness distribution in the shape of the first standing wave shown in FIG. 5 is obtained.

Next, in the second preliminary film forming step, in FIGS. 10 and 11, the substrate 11 is previously placed on the substrate holding plate 4b, a vacuum pump (not shown) is operated, and impurities in the vacuum vessel 1 are operated. After removing the gas and the like, the substrate temperature is set in the range of 80 to 350 ° C., for example, 180 ° C. while supplying SiH 4 gas from a discharge gas supply tube 8 (not shown) at 500 sccm and a pressure of 0.5 Torr (66.5 Pa). Hold.
Next, the sixth power supply system, that is, the second transmitter 60, the second random phase modulator 51, the second distributor 62, the third and fourth phase shifters 63, 66, the third, And fourth couplers 84 and 85, first and second amplifiers 54 and 57, first and second impedance matchers 55 and 58, and first and second power distributors 82 and 83. The sixth power supply system is used as the power supply system to supply power to the first, second, third, and fourth feeding points 12a, 12b, 13a, and 13b.
In this case, the frequency of the second oscillator 60 is set to 60 MHz, for example.
Then, the adjuster of the second phase shifter 63 is set to δ1, for example, the output of the first power amplifier 54 is set to 500 W, for example, and the output is set to the first impedance matcher 55, the first The first and third feeding points 12 a, the power distributor 82, the first and third current introduction terminals 15 and 25, and the core wires 17 and 27 of the first and second vacuum coaxial cables 16 and 26, 12b.
Then, the regulator of the fourth phase shifter 66 is set to δ2, for example, the output of the second power amplifier 57 is set to 500 W, for example, and the output is set to the second impedance matching device 58, the second The second and fourth feeding points 13a, the power distributor 83, the second and fourth current introduction terminals 20, 30 and the core wires 22, 32 of the second and fourth vacuum coaxial cables 21, 31 are provided. 13b.
By adjusting the first impedance matching unit 55 and the second impedance matching unit 58, the reflected wave of the supplied power can be prevented from returning to the upstream side of the respective impedance matching units 55 and 58.
As a result, plasma of the SiH 4 gas is generated and, for example, amorphous Si is deposited on the substrate 11.

In the above manner, an amorphous Si film is formed on the substrate 11 with a film formation time of, for example, 10 to 20 minutes. After film formation, the substrate 11 is taken out from the vacuum vessel 1 and the film thickness distribution of the amorphous Si film is evaluated. As will be described later, the film thickness distribution of, for example, amorphous Si deposited on the substrate 11 becomes a sinusoidal distribution due to the occurrence of a standing wave, which is a phenomenon inherent to VHF plasma. Such a film forming test is repeatedly performed using the phases δ1 and δ2 of the third and fourth phase shifters 63 and 6 as parameters.
In the direction connecting the first feeding point 12a and the second feeding point 13a, the distance from the center point of the substrate 11 to the position of the maximum thickness of the sine thickness distribution and the first and second phase shifters. The relationship between the phases δ1 and δ2 of 63 and 66 is grasped as data.

For example, the phase difference Δδ = (δ1−δ2) for setting a position apart from the center point of the substrate 11 by a quarter of the wavelength λ in the direction of the second feeding point 13a, that is, λ / 4 is, for example, It can be understood that (δ11−δ22).
However, the wavelength λ is not the wavelength of the electromagnetic wave in vacuum but the wavelength λ under the above-mentioned film forming conditions, and is generally shorter than the wavelength λ ₀ of the electromagnetic wave in vacuum. In the SiH 4 gas plasma, the ratio λ / λ ₀ between the wavelength λ in the plasma and the wavelength λ ₀ in the vacuum is about 0.6.
Further, when setting the phase difference Δδ = (δ1−δ2), the interval between the antinode position of the first standing wave and the antinode position of the second standing wave is the antinode The phase difference Δδ = (δ1−δ2) may be selected so as to be equal to one half of the spatial period.
That is, the position of the maximum thickness of the film having a sinusoidal film thickness formed on the substrate 11 in the second preliminary film formation step is the period of the film from the center point of the substrate 11 to the second feeding point 13. Just match points that are one-half the distance away. Note that the value of half of the film cycle can be grasped in advance in the first preliminary film-forming step.
As a result, an amorphous silicon film having a thickness distribution in the shape of the second standing wave shown in FIG. 5 is obtained.

Now, in response to the results of the first and second preliminary film forming steps, the main film forming step is started.
First, in FIGS. 10 and 11, the substrate 11 is previously set on the substrate holding plate 4b, and a vacuum pump (not shown) is operated to remove impurity gas and the like in the vacuum vessel 1, and then the discharge gas supply tube 8 is used. The substrate temperature is maintained in the range of 80 to 350 ° C., for example, 180 ° C., while supplying SiH 4 gas at 500 sccm and a pressure of 0.5 Torr (66.5 Pa).
Next, the frequency of the oscillator 50 of the fifth power supply system is set to 60 MH, and the phases of the outputs of the two phase shifters 53 and 56 are set to θ11 and θ22 that are grasped as data of the first preliminary film forming process, Electric power is supplied to the first, second, third and fourth feeding points 12a, 13a, 12b and 13b, respectively. The power is 1000 W, for example, together with the sixth power supply system.
Similarly, the frequency of the oscillator 60 of the sixth power supply system is set to 60 MH, and the phases of the outputs of the two phase shifters 63 and 66 are set to δ11 and δ22 grasped as data of the second preliminary film forming process. The power is supplied to the first, second, third and fourth feeding points 12a, 13a, 12b and 13b. The power is 1000 W, for example, together with the fifth power supply system.

When power is supplied to the first, second, third, and fourth feeding points 12a, 13a, 12b, and 13b from the fifth and sixth power supply systems, respectively, between the pair of electrodes. The generated power intensity distribution I (x) is expressed by the following equation as in the third embodiment.
I (x) = 4V ² cos ² {2π (x−L0 / 2) / λ} + 4V ² cos ² {2π (x−L0 / 2) / λ + π / 2}
= 4V ² cos ² {2π (x−L0 / 2) / λ} + 4V ² sin ² {2π (x−L0 / 2) / λ}
= 4V ²
Where x is the distance from the first feeding point 12a to the second feeding point 13a, V is the amplitude of the voltage wave, ω is the angular frequency of the voltage, λ is the wavelength of the voltage wave, t is the time, and L0 is the first The interval between the first and second feeding points.

Incidentally, in general, the distribution of power intensity between the pair of electrodes 2 and 4 and the distribution of plasma intensity are in a proportional relationship.
On the other hand, when the SiH 4 gas is turned into plasma in the above process, radicals such as SiH 3, SiH 2, and SiH existing in the plasma diffuse due to the diffusion phenomenon and are adsorbed on the surface of the substrate 11, thereby causing the a-Si film. However, the plasma intensity distribution and the film thickness distribution are proportional to each other. This means that the fact that the power intensity distribution is made uniform means that the film thickness distribution is made uniform.
In addition, the distribution of power intensity being uniform means that the plasma density and the radial density are uniform over a large area.
Therefore, when the power intensity between the pair of electrodes 2 and 4 is uniform as described above, the distribution of the deposited film is uniform. As a result, the variation in film thickness is uniform. Since the variation of the film thickness necessary for practical use is 5 to 10%, it can be easily achieved.
This means that it is possible to form a uniform film thickness distribution, which is impossible with the conventional VHF plasma surface treatment apparatus and method for a substrate having a size exceeding a quarter of the wavelength λ. It means that. Therefore, the above is an epoch-making discovery in the application field of VHF plasma, and its practical value is remarkably large.
Note that microcrystalline Si or thin-film polycrystalline Si can be formed by optimizing the flow rate ratio, pressure, and power of SiH and H2 in the film forming conditions. It is a matter of course that the film can be formed in the same manner as the film formation.

  In the present embodiment, since there are two feed points on opposite sides, the substrate size is limited to about 2 m to 3 mx in length and about 0.5 m in width, but if the number of feed points is increased in the width direction, the substrate Of course, the size range can be expanded.

  Further, in the manufacture of a-Si solar cells, thin film transistors, and photosensitive drums, there is no problem in performance as long as the film thickness distribution is within ± 10%. According to the above embodiment, it is possible to obtain a significantly better film thickness distribution as compared with the conventional apparatus and method even when a power supply frequency of 60 MHz is used. This means that the industrial value related to productivity improvement and cost reduction in the manufacturing field of a-Si solar cells, thin film transistors, and photosensitive drums is remarkably large.

FIG. 1 is a schematic diagram illustrating the configuration of a plasma surface treatment apparatus according to the first embodiment. FIG. 2 is an explanatory view of a power feeding unit to the first and second electrodes of the plasma surface treatment apparatus shown in FIG. FIG. 3 is an explanatory diagram showing a power wave propagating between a pair of electrodes. FIG. 4 is an explanatory diagram showing a standing wave of electric power generated between a pair of electrodes. FIG. 5 is an explanatory diagram showing the positions of antinodes of two standing waves of power generated between a pair of electrodes. FIG. 6 is a schematic diagram illustrating a configuration related to a power supply device of the plasma surface treatment apparatus according to the second embodiment. FIG. 7 is a schematic diagram showing a configuration relating to a power supply device of the plasma surface treatment apparatus according to the third embodiment. FIG. 8 is a schematic view showing a configuration relating to a film forming chamber of the plasma surface treatment apparatus according to the fourth embodiment. FIG. 9 is a schematic diagram showing a configuration relating to a power supply device of the plasma surface treatment apparatus according to the fourth embodiment. FIG. 10 is a schematic view showing a configuration relating to a film forming chamber of the plasma surface treatment apparatus according to the fifth embodiment. FIG. 11 is a schematic diagram illustrating a configuration related to a power supply device of a plasma surface treatment apparatus according to a fifth embodiment.

Explanation of symbols

1 ... Vacuum container,
2 ... 1st electrode,
4 ... second electrode,
5 ... Insulating member,
7. Gas shower hole,
8: Gas introduction tank,
9a, 9b ... exhaust pipe,
11 ... substrate
12, 12a ... 1st feeding point,
12b ... third feeding point,
13, 13a ... second feeding point,
13b ... fourth feeding point,
15: First current introduction terminal,
20: Second current introduction terminal,
25: Third current introduction terminal,
30: Fourth current introduction terminal,
50 ... first transmitter,
51 ... first random phase modulator,
52... First distributor 53... First phase shifter 54... First amplifier,
55 ... 1st impedance matching device,
56 ... second phase shifter 57 ... second amplifier,
58... Second impedance matcher,
60 ... second transmitter,
61 ... second random phase modulator,
62 ... second distributor 63 ... third phase shifter 64 ... third amplifier,
65 ... a third impedance matching unit,
66 ... Fourth phase shifter 67 ... Fourth amplifier,
68. Fourth impedance matching unit,
82 ... first power distributor,
83 ... the second power distributor,
84... Third coupler,
85... Fourth coupler,
87, 87a: Insulating material.

Claims (13)

  A vacuum vessel provided with an exhaust system, a discharge gas supply system for supplying a discharge gas into the vacuum vessel, a discharge electrode, a power supply system comprising a plurality of high-frequency power supplies and a plurality of impedance matching devices, and plasma A substrate holding means for arranging a substrate to be processed, and a method of supplying power to an electrode used in a plasma surface processing apparatus for processing the surface of the substrate by using generated plasma. By randomly modulating the phase of the sine wave power output from all the high frequency power supplies except any one of them with different random signals, mutual interference between the outputs of the plurality of high frequency power supplies is eliminated. A method for supplying power to the electrode.   A vacuum vessel provided with an exhaust system, a discharge gas supply system for supplying a discharge gas into the vacuum vessel, a discharge electrode, a power supply system comprising a plurality of high-frequency power supplies and a plurality of impedance matching devices, and plasma A substrate holding means for placing a substrate to be processed, and a method for supplying power to an electrode used in a plasma surface treatment apparatus for treating the surface of the substrate using the generated plasma. And supplying the one output and the other output of a plurality of phase-variable two-output high-frequency power supplies to one of the plurality of feed points and the other of the plurality of feed points that are opposed to each other. A sine output from all high-frequency power supplies except for any one of the plurality of high-frequency power supplies when a plurality of standing waves are generated simultaneously to make the power distribution between the electrodes uniform. The power of the phase, by modulating randomly in different random signals together, the power supply method to the electrodes, characterized in that to eliminate mutual interference between the output of the high frequency power source of said plurality of.   3. The power supply method to the electrode according to claim 1, wherein the first and second feeding points are provided at two positions which are opposite points in the power propagation of the discharge electrode. The first and second feed points are supplied with one output and the other output of the first phase variable two-output high-frequency power source, respectively, and the second phase variable two-output high frequency is supplied. When supplying one output of the power supply and the other output, the high-frequency power supply of the first phase variable 2 output or the high-frequency power supply of the second phase variable 2 output is output from the built-in oscillation circuit The phase of the generated sine wave signal is randomly modulated using a random phase modulator, so that the output of the first phase variable 2-output high-frequency power source and the second phase variable 2-output high-frequency power source Characterized by eliminating mutual interference with output Power supply method to the electrodes.   The method for supplying power to an electrode according to any one of claims 1 to 3, wherein all the high-frequency power supplies except for any one of the plurality of high-frequency power supplies include an oscillator, a random phase modulator, A method of supplying power to an electrode, comprising: a distributor, a phase shifter, and an amplifier.   The method for supplying power to an electrode according to any one of claims 1 to 3, wherein all the high-frequency power supplies except for any one of the plurality of high-frequency power supplies include an oscillator, a random phase modulator, A method for supplying power to an electrode, comprising: a distributor, a phase shifter, a coupler, and an amplifier.   A vacuum vessel provided with an exhaust system, a discharge gas supply system for supplying a discharge gas into the vacuum vessel, a discharge electrode, a power supply system comprising a plurality of high-frequency power supplies and a plurality of impedance matching devices, and plasma 6. A plasma surface treatment method comprising a substrate holding means for arranging a substrate to be processed, and processing the surface of the substrate using generated plasma, wherein the electrode according to claim 1 is used. By using the method of supplying power to the discharge electrodes, a plurality of phase-variable two-output high-frequency waves are respectively provided to one of the plurality of feeding points and the other plurality of feeding points that are disposed to face each other. A plasma surface treatment of the substrate is performed by supplying one output and the other output of a power source, and simultaneously generating a plurality of standing waves that do not vary temporally and spatially between the pair of electrodes. Do Plasma surface treatment method.   7. The plasma surface treatment method according to claim 6, wherein two high-frequency power sources of the first phase variable and two outputs that are supplied to the first and second feeding points that are disposed on the discharge electrode and are opposed to each other. By controlling the phase difference between the output voltage and the phase difference between the two output voltages of the second phase variable two-output high-frequency power source, two standing waves, i.e. In simultaneously generating the second standing wave and adjusting the distance between the antinode position of the first standing wave and the antinode position of the second standing wave, the distance is set to the electrode. By setting an odd multiple of a quarter of the wavelength λ of the electromagnetic wave propagating in the plasma generated between them, that is, an odd multiple of λ / 4, the power intensity distribution between the electrodes is made uniform. A plasma surface treatment method.   7. The plasma surface treatment method according to claim 6, wherein two high-frequency power sources of the first phase variable and two outputs that are supplied to the first and second feeding points that are disposed on the discharge electrode and are opposed to each other. By controlling the phase difference between the output voltage and the phase difference between the two output voltages of the second phase variable two-output high-frequency power source, two standing waves, i.e. In simultaneously generating the second standing wave and adjusting the distance between the antinode position of the first standing wave and the antinode position of the second standing wave, the distance is determined. A plasma surface treatment method characterized in that the distribution of power intensity between the electrodes is made uniform by making the odd number times one half of the spatial period of the antinodes of standing waves.   9. The plasma surface treatment method according to claim 6, wherein at least one of a film thickness distribution, an etching rate distribution, a plasma emission distribution, and a plasma density distribution is performed before the predetermined plasma treatment is performed on the substrate. One is measured in advance, and based on the measurement result, information on the position of the antinode of the standing wave and the phase difference between the two output power voltages of each of the plurality of two-output phase variable high-frequency power supplies The plasma surface treatment method is used for setting the phase difference value for performing a predetermined plasma treatment on the substrate.   10. The plasma surface treatment method according to claim 6, wherein a phase difference between two voltages of the first high-frequency power source and a sinusoidal film thickness distribution formed on the substrate surface are provided. A first step of grasping a relationship with a position where the film thickness of the silicon-based film is maximized; a phase difference between voltages of two outputs of the second high-frequency power source; and a sine film formed on the substrate surface A second step of grasping the relationship with the position where the film thickness of the silicon-based film having the thickness distribution is maximized, and the first and second high-frequency power sources grasped in the first and second steps, respectively. By setting the phase difference between the two outputs of each of the first and second high-frequency power sources from the relationship between the phase difference between the two output voltages and the position where the film thickness is maximized, A plasma comprising the third step of forming a silicon-based film Surface treatment method.   A vacuum vessel provided with an exhaust system, a discharge gas supply system for supplying a discharge gas into the vacuum vessel, a discharge electrode, a power supply system comprising a plurality of high-frequency power supplies and a plurality of impedance matching devices, and plasma A plasma surface processing apparatus for processing the surface of the substrate using generated plasma, excluding any one of the plurality of high-frequency power supplies A plasma surface treatment apparatus, wherein the remaining high-frequency power source includes an oscillator, a random phase modulator, a distributor, a phase shifter, and an amplifier.   A vacuum vessel provided with an exhaust system, a discharge gas supply system for supplying a discharge gas into the vacuum vessel, a discharge electrode, a power supply system comprising a plurality of high-frequency power supplies and a plurality of impedance matching devices, and plasma A plasma surface processing apparatus for processing the surface of the substrate using generated plasma, excluding any one of the plurality of high-frequency power supplies A plasma surface treatment apparatus, wherein the remaining high-frequency power source includes an oscillator, a random phase modulator, a distributor, a phase shifter, a coupler, and an amplifier.   13. The plasma surface treatment apparatus according to claim 11, wherein one of the feeding points and the other feeding point, which are disposed on the discharge electrode and face each other, are respectively connected to the plasma surface treatment apparatus. An output terminal of a first impedance matcher connected to one of the two outputs of one high frequency power supply and an output terminal of a third impedance matcher connected to one of the two outputs of the second high frequency power supply; and An output terminal of a second impedance matcher connected to the other of the two outputs of the first high frequency power supply and an output of a fourth impedance matcher connected to the other of the two outputs of the second high frequency power supply A plasma surface treatment apparatus having a configuration in which terminals are connected.

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