JP2007070328A - Trisoxetane ether compound, method for producing the same and optical waveguide using the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a new trisoxetane ether compound capable of producing a polymer excellent in thick membrane-forming property, curing property, heat resistance, etc., a method for producing the same and an optical waveguide using the same. <P>SOLUTION: This trisoxetane ether compound is produced by cesium-phenolating phenols with cesium salts, and then reacting with a sulfonic acid ester. Further, an optical waveguide comprising a substrate plate 1 and a cladding layer 2 formed on the substrate plate 1, and formed with a core part 3 having a prescribed pattern and transmitting light signals, in the cladding layer 2 is provided with that at least one of the cladding layer 2 and core part 3 is formed by a resin composition containing the above trisoxetane ether compound. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a trisoxetane ether compound having an oxetane ring capable of cationic polymerization, a method for producing the same, and an optical waveguide using the same. Specifically, a trisoxetane ether compound in which a photocurable resin and a thermosetting resin using the compound are excellent in heat resistance, mechanical properties, low water absorption, coating film flatness, adhesion, and the like, and production method thereof, and The present invention relates to an optical waveguide using the.

  Oxetane compounds are recently attracting attention as monomers capable of photoinitiated cationic polymerization or curing, and many monofunctional and polyfunctional oxetane compounds have been developed, and accordingly, methods for synthesizing various oxetane compounds. Has been proposed.

  As said oxetane compound, the oxetane compound represented by following General formula (4) is proposed also in the patent document, for example (refer patent document 1).

  Furthermore, biphenyl derivatives having an oxetane ring represented by the following general formula (5) and general formula (6) have also been proposed (see Patent Documents 2 and 3).

The above compounds are usually obtained by synthesizing an oxetane sulfonic acid ester and a corresponding dihydric phenol compound in the presence of an alkali metal such as sodium hydroxide or potassium hydroxide as a base. can get. In the synthesis, a phase transfer catalyst such as a quaternary ammonium salt is also used as necessary to increase the yield of the compound. Furthermore, the oxetane compound has been conventionally used for materials such as paints and adhesives in order to improve heat resistance, adhesion, etc. In recent years, it has also been proposed to use it as a material for forming optical waveguides. (See Patent Documents 4 and 5). Optical waveguides are incorporated in optical waveguide devices, optical integrated circuits, and optical wiring boards, and are widely used in the fields of optical communication, optical information processing, and other general optics.
JP-A-6-16804 JP-A-11-106380 JP 2001-31665 A JP 2000-356720 A JP 2003-147045 A

  However, among the oxetane compounds, the biphenyl derivative is a compound having a low molecular weight, and thus has a low viscosity. For example, when a film is formed on a substrate, it has a difficulty in forming a thick film. Moreover, since it is bifunctional, there also exists a fault that hardening requires time. Further, other oxetane compounds have a problem that it is difficult to obtain desired thick film formability and curability.

  In addition, when such a conventional oxetane compound is used, for example, as a material for forming an optical waveguide, it is difficult to stably cure and produce the same shape. There are also problems such as inability to form.

  Furthermore, the conventional method for synthesizing an oxetane compound also has a problem that the introduction of an oxetanyl group does not proceed quantitatively and the yield of the target oxetane compound is low. In addition, since a compound having an unreacted hydroxyl group is generated as a by-product, a complicated operation is often involved before obtaining the target oxetane compound.

  The present invention has been made in view of such circumstances, and a novel trisoxetane ether compound capable of producing a polymer excellent in thick film formability, curability, heat resistance, and the like, a production method thereof, and a method for using the same. The purpose is to provide an optical waveguide.

  In order to achieve the above object, the present invention has a trisoxetane ether compound represented by the following general formula (1) as a first gist.

  Further, the present invention is a process for producing the trisoxetane ether compound of the first aspect, wherein the phenol represented by the following general formula (2) is converted to cesium phenolate with a cesium salt, and then the following general formula A method for producing a trisoxetane ether compound to be reacted with the sulfonic acid ester represented by the formula (3) is a second gist.

  Furthermore, the present invention is an optical waveguide comprising a substrate and a clad layer formed on the substrate, wherein a core portion that propagates an optical signal in a predetermined pattern is formed in the clad layer, An optical waveguide in which at least one of the cladding layer and the core portion is formed of the resin composition containing the trisoxetane ether compound of the first aspect is a third aspect.

  That is, the present inventors have developed an oxetane compound that is excellent in heat resistance, mechanical properties, etc., and can produce a polymer that can be effectively used as a material for paints, coating materials, adhesives, lenses, optical waveguides, and the like. We sought and intensively studied. As a result of synthesizing various compounds having a special structure and repeating experiments, the intended purpose as described above is achieved when the novel trisoxetane ether compound represented by the general formula (1) is used. As a result, the present invention has been reached. That is, since the above novel compound has three oxetane rings in one molecule, it has fast curability and has excellent heat resistance and the like because the cured product forms a high-density network structure. It becomes. In addition, the above-mentioned new compound is not a low molecular weight but a high molecular weight like existing compounds, so it has a high viscosity and is advantageous when forming a thick film, especially for the formation of optical waveguides (cladding layer and core part). When used as a material, it is easy to cure and produce the same shape in a stable manner, so that effects such as stabilization of waveguide characteristics can be obtained. On the other hand, the present inventors have also conducted research on a synthesis method capable of synthesizing the novel compound with high yield. As a result, the phenol represented by the general formula (2) and the sulfonic acid ester of 3-alkyl-3-hydroxymethyloxetane represented by the general formula (3), in particular, a cesium salt as a base. As a result of using and reacting under predetermined conditions, it was also found that the target novel compound can be synthesized in high yield.

  Thus, the present invention relates to a novel trisoxetane ether compound represented by the general formula (1). Since this compound has a high molecular weight rather than a low molecular weight like existing compounds, it has a high viscosity and can easily form a thick film. Further, since it contains three oxetane rings in one molecule, it has the property of being rapidly cured by light or heat. Therefore, the photocurable resin composition and thermosetting resin composition using the trisoxetane ether compound of the present invention are excellent in curability, heat resistance, toughness and mechanical properties, and have low water absorption, coating flatness and It has high adhesion and can reduce the use of a polymerization initiator due to its high reactivity, so it has high transparency, for example, a material for forming paints, coating materials, adhesives, optical lenses, optical waveguides, etc. Useful as.

  Then, when synthesizing the tris oxetane ether compound, a specific oxetane sulfonic acid ester and a specific phenol are reacted with each other under a predetermined condition using a cesium salt as a base. It can be synthesized in high yield without any operation.

  Furthermore, when at least one of the clad layer and the core portion in the optical waveguide is formed of the resin composition containing the trisoxetane ether compound represented by the general formula (1), it is stably cured in the same shape. It is easy to manufacture and stable waveguide characteristics can be obtained.

  Next, an embodiment of the present invention will be described.

The trisoxetane ether compound of the present invention is a compound represented by the following general formula (1), and has a structure having three oxetane rings in one molecule. In general formula (1), examples of the alkyl group having 1 to 6 carbon atoms represented by R _{1 to} R ₃ include a methyl group, an ethyl group, a propyl group, a butyl group, and the like, A methyl group and an ethyl group.

  The tris oxetane ether compound represented by the general formula (1) includes a phenol represented by the following general formula (2) and a 3-alkyl-3-hydroxymethyl represented by the following general formula (3). It can be produced by reacting oxetane sulfonate and a base as synthetic raw materials.

  Here, as the base, a conventionally known alkali metal (sodium hydroxide, potassium hydroxide, etc.) may be used. However, in the present invention, particularly when a cesium salt is used as the base, the trisoxetane is used. Since an ether compound can be synthesized in a high yield without complicated operation, it is preferable. In this case, for example, synthesis of each raw material is performed by, for example, (i) converting phenols to cesium phenolate with a cesium salt and then reacting with oxetane sulfonate, or (ii) oxetane sulfonate and phenol. The reaction is carried out in the presence of a cesium salt. Preferably, it is carried out according to the procedure (i) above. The above synthesis is usually carried out in an organic solvent (reaction solvent), and after the reaction is completed, water or the like is added to the reaction solution to form an aqueous phase and an organic phase, and extraction from the organic phase is performed for the purpose. A tris oxetane ether compound can be obtained.

  Examples of the cesium salt include cesium carbonate, cesium hydroxide, cesium fluoride, cesium formate, and the like. Among these, cesium carbonate is preferably used because the target tris oxetane ether compound can be obtained in a higher yield.

  And it is preferable to set the usage-amount of the said cesium salt to 0.8-2.0 mol with respect to 1 mol of phenolic hydroxyl groups of the phenols represented by the said General formula (2), More preferably, 1 The range is from 0.0 to 1.5 mol.

  Specific examples of the phenols represented by the general formula (2) are not particularly limited. For example, 1,1-di (hydroxyphenyl) -1- (2- (hydroxyphenyl) -2- Propylbenzene) methane, 1,1-di (hydroxyphenyl) -1- (2- (hydroxyphenyl) -2-propylbenzene) ethane and the like. These may be used alone or in combination of two or more.

  A specific example of the sulfonic acid ester of 3-alkyl-3-hydroxymethyloxetane represented by the general formula (3) used together with the phenols as described above is 2- (3-oxetanyl) propylmesi Rate, 2- (3-oxetanyl) propylphenylsulfonylate, 2- (3-oxetanyl) propyl tosylate, 2- (3-oxetanyl) butyl mesylate, 2- (3-oxetanyl) butyl tosylate and the like It is done. These may be used alone or in combination of two or more.

  The sulfonic acid ester of 3-alkyl-3-hydroxymethyloxetane represented by the general formula (3) is, for example, organic synthesis vol. 1 [Organic Synthesis, Collective vol. 1, pp. 145 (1941)]. It can be synthesized according to the method described in 1.

  Furthermore, the usage-amount of the sulfonic acid ester of 3-alkyl-3-hydroxymethyl oxetane represented by the said General formula (3) is 1 mol of phenolic hydroxyl groups of the phenol represented by the said General formula (2). Is preferably set to 1.5 to 2.0 mol, and more preferably in the range of 1.0 to 1.5 mol.

  And at the time of manufacture of the tris oxetane ether compound of this invention, it is preferable to set the reaction temperature in the case of the synthesis | combination to 0-120 degreeC, More preferably, it is the range of 60-100 degreeC. Moreover, when phenols are cesium phenolated in advance with a cesium salt, the reaction temperature in the cesium phenolate is preferably set to 0 to 120 ° C, more preferably in the range of 40 to 100 ° C. . And the pressure in these reactions is not specifically limited, Any of a normal pressure, pressurization, and pressure reduction may be sufficient. Also, the reaction atmosphere is not particularly limited.

  In addition, when synthesizing the trisoxetane ether compound of the present invention, an alkali metal such as sodium or potassium, an alkali metal hydride such as lithium hydride or sodium hydride, sodium hydroxide, potassium hydroxide or the like, if necessary. Alkali metal hydroxides, alkali metal carbonates such as sodium carbonate, and the like may be appropriately added as synthetic raw materials.

  Moreover, you may add a quaternary ammonium salt, a quaternary phosphonium salt, etc. as a phase transfer catalyst between an aqueous phase and an organic phase as needed. The quaternary ammonium salt is not particularly limited, and examples thereof include tetraalkylammonium halides such as tetrabutylammonium bromide (TBAB) and tetraethylammonium bromide, and aralkyltrialkylammonium halides such as benzyltrimethylammonium chloride. Can be given. The quaternary phosphonium salt is not particularly limited, and examples thereof include tetraarylphosphonium halides such as tetraphenylphosphonium bromide.

  Furthermore, when producing the trisoxetane ether compound of the present invention, a reaction solvent is usually used as described above. The reaction solvent is not particularly limited. For example, aromatic hydrocarbons (toluene, xylene, etc.), ethers (tetrahydrofuran, dibutyl ether, etc.), aprotic polar solvents (N-methylpyrrolidone, N-methyl-2- Pyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, etc.) are preferably used. These may be used alone or in combination of two or more.

  As described above, the trisoxetane ether compound synthesized from each of these raw materials is usually separated into an aqueous phase and an organic phase by adding water and ethyl acetate to the reaction solution, and the organic phase is separated. The extracted product can be recovered by drying with anhydrous magnesium sulfate or the like.

  The trisoxetane ether compound of the present invention thus obtained is effectively used as a material for a photocurable resin and a thermosetting resin constituting a paint, a coating material, an adhesive, a lens, an optical waveguide, and the like. be able to.

  Among them, an optical waveguide, specifically, as shown in FIG. 1, includes a substrate 1 and a cladding layer 2 formed on the substrate 1, and propagates an optical signal in a predetermined pattern in the cladding layer 2. In the optical waveguide in which the core portion 3 is formed, when at least one of the cladding layer 2 and the core portion 3 is formed of a resin composition containing the trisoxetane ether compound, the compound has a high molecular weight. Therefore, the viscosity becomes high, which is advantageous when forming a thick film. In addition, it is possible to obtain an effect such as that the waveguide characteristics can be stably stabilized by being easily cured in the same shape. The clad layer 2 needs to have a refractive index smaller than that of the core portion 3.

  Further, when at least one of the clad layer 2 and the core part 3 is formed of a resin composition containing a compound having an epoxy group or a vinyl ether group together with the trisoxetane ether compound of the present invention, heat resistance and moisture resistance It is preferable because a cured product having excellent properties can be obtained and the exposure sensitivity can be improved. Here, as the compound having an epoxy group, any compound can be used as long as it is compatible with the compound represented by the formula (1) of the present invention. Specifically, examples of the epoxy compound having one epoxy group include phenyl glycidyl ether and butyl glycidyl ether, and examples of the epoxy compound having two or more epoxy groups include bisphenol A diglycidyl ether and bisphenoxyethanol full orange. Glycidyl ether, trimethylolpropane triglycidyl ether, bisphenolfluorene tetraglycidyl ether, 3,4-epoxycyclohexenylmethyl-3 ', 4'-epoxycyclohexene carboxylate, 2,2-bis as a compound having an alicyclic epoxy group An adduct of 1,2-epoxy-4- (2-oxiranyl) cyclohexane with (hydroxymethyl) -1-butanol is preferably used. Moreover, as a compound which has the said vinyl ether group, all can be used if it shows compatibility with the compound represented by Formula (1) of this invention. Specifically, examples of the compound having one vinyl ether group include hydroxyethyl vinyl ether, hydroxybutyl vinyl ether, dodecyl vinyl ether and the like. As the compound having two or more vinyl ether groups, cyclohexane dimethanol divinyl ether, triethylene glycol divinyl ether, novolak type divinyl ether and the like are preferably used. And these compounds are used individually or in combination of 2 or more types.

  And the said optical waveguide can be manufactured by a process as shown in FIG. 2, for example. That is, as shown in FIG. 2A, first, a substrate 1 is prepared, and as shown in FIG. 2B, an under cladding layer 2a (a lower portion of the cladding layer 2) is formed on the surface of the substrate 1. Next, as shown in (c), a layer 3 ′ made of a resin composition for forming the core portion 3 is formed on the under cladding layer 2 a. Then, as shown in (d), a photomask 9 for exposing a predetermined pattern (optical waveguide pattern) is disposed on the surface of the resin composition layer 3 ′, and ultraviolet rays are emitted through the photomask 9. Irradiation and further heat treatment. Thereafter, the unexposed portion of the resin composition layer 3 ′ is dissolved and removed using a developer to form the core portion 3 as shown in FIG. Then, as shown in (f), the over clad layer 2b (the upper portion of the clad layer 2) is formed on the core portion 3. Thereby, the target optical waveguide can be obtained.

  Each layer on the substrate 1 can be formed by a conventionally known method such as spin coating or coater. The optical waveguide can also be made into a film-like optical waveguide by peeling and removing the substrate 1. In such a configuration, the flexibility becomes excellent.

  The optical waveguide thus obtained is, for example, a straight optical waveguide, a curved optical waveguide, a crossed optical waveguide, a Y-branch optical waveguide, a slab optical waveguide, a Mach-Zehnder optical waveguide, an AWG optical waveguide, a grating, or an optical waveguide lens. Etc. can be used. Optical devices using these optical waveguides include wavelength filters, optical switches, optical splitters, optical multiplexers, optical multiplexers / demultiplexers, optical amplifiers, wavelength converters, wavelength dividers, optical splitters, directional couplers. Furthermore, an optical transmission module in which laser diodes and photodiodes are integrated in a hybrid manner can be used.

  Next, examples will be described.

  First, prior to Examples, 2- (3-oxetanyl) butyl tosylate, which is a sulfonic acid ester of 3-alkyl-3-hydroxymethyloxetane, was synthesized as follows.

[Synthesis of 2- (3-oxetanyl) butyl tosylate]
In a 2000 ml three-necked eggplant flask equipped with a thermometer, a condenser, a stirrer and a dropping funnel, 190.65 g (1.0 mol) of p-toluenesulfonic acid chloride, 32.24 g (0.1 mol) of tetramethylammonium bromide and toluene 400 ml was added and cooled to 5 ° C. with stirring in an ice bath. After adding 116.16 g (1.0 mmol) of 3-ethyl-hydroxymethyloxetane to this, 130 ml of 35 wt% sodium hydroxide aqueous solution was dripped over 30 minutes with the dropping funnel. After completion of the dropwise addition, the mixture was stirred at the same temperature for 1 hour, and further stirred at room temperature for 16 hours. After completion of the reaction, 800 ml of water was added to the flask and stirred vigorously, and then left to separate into an aqueous phase and an organic phase. This organic phase was further washed with 400 ml of water and dried over anhydrous magnesium sulfate overnight. Then, magnesium sulfate was filtered and the filtrate was concentrated. The obtained crude product was separated and purified by silica gel column chromatography (eluent: hexane / ethyl acetate), and 243.3 g of 2- (3-oxetanyl) butyl tosylate as a colorless liquid as a target product (yield 90). %).

[Example 1]
In a 200 ml three-necked flask equipped with a thermometer, a condenser, and a stirrer, 8.49 g (20 mmol) of 1,1-di (hydroxyphenyl) -1- (2- (hydroxyphenyl) -2-propylbenzene) ethane was added. And 20 ml of N-methyl-2-pyrrolidone were added and stirred under heating in a nitrogen atmosphere until completely dissolved. After dissolution, 23.46 g (72 mmol) of cesium carbonate was added, and the mixture was further stirred at 80 ° C. for 30 minutes in a nitrogen atmosphere. Thereto was added 17.84 g (66 mmol) of 2- (3-oxetanyl) butyl tosylate synthesized earlier, and the mixture was stirred at 80 ° C. for 20 hours in a nitrogen atmosphere. After completion of the reaction, the reaction mixture was cooled to room temperature, 200 ml of distilled water was added, stirred and filtered. The residue was further washed with water and dried to obtain a crude product.

  The crude product thus obtained was analyzed by thin layer chromatography, and only one spot was confirmed. This was purified by recrystallization to obtain 13.18 g (92% yield) of a white solid. When the purity of this compound was examined by liquid chromatography, it was 99% or more.

The compound obtained as described above is a trisoxetane ether compound represented by the following structural formula (7) as a result of ¹ H-NMR and ¹³ C-NMR (both manufactured by JEOL Ltd.) shown below. It was confirmed.

¹ H-NMR (CDCl ₃ , 400 MHz): δ (ppm); 0.93 (t, J = 7.6 Hz, 9H, CH ₃ ), 1.65 (s, 6H, CH ₃ ), 1.87 ( q, J = 7.6 Hz, 6H, CH ₂ ), 2.11 (s, 3H, CH ₃ ), 4.05 (s, 6H, CH ₂ ), 4.47 (d, J = 6.0 Hz, 6H, CH ₂ ), 4.55 (d, J = 6.0 Hz, 2H, CH ₂ ), 4.56 (d, J = 6.0 Hz, 4H, CH ₂ ), 6.82 (d, J = 8.8 Hz, 4H, Ar), 6.84 (d, J = 8.8 Hz, 2H, Ar), 6.96 (d, J = 8.4 Hz, 2H, Ar), 7.01 (d, J = 8.8 Hz, 4H, Ar), 7.10 (d, J = 8.4 Hz, 2H, Ar), 7.17 (d, J = 8.8 Hz, 2H, Ar)
¹³ C-NMR (CDCl ₃ , 100 MHz): δ (ppm); 8.23, 26.72, 30.63, 30.87, 41.91, 43.22, 50.91, 70.20, 78. 19, 78.21, 113.67, 113.85, 126.09, 127.80, 128.11, 129.69, 142.01, 143.20, 146.47, 148.25, 156.87, 157.04

[Example 2]
In the following manner, an under cladding layer, a core portion, and an under cladding layer were formed to produce an optical waveguide (see FIG. 1). And the evaluation with respect to the optical waveguide was performed as follows.

[Formation of underclad layer]
First, 70 parts by weight (hereinafter abbreviated as “part”) of the trisoxetane ether compound obtained in Example 1 and 3,4-epoxycyclohexenylmethyl-3 ′, 4′-epoxycyclohexene carboxy which is an alicyclic epoxy. 30 parts of a rate (manufactured by Daicel Chemical Industries, Celoxide 2021P) and 1 part of a 50% propion carbide solution of 4,4-bis [di (β-hydroxyethoxy) phenylsulfinio] phenyl sulfide-bis-hexafluoroantimonate Was dissolved in cyclohexanone to prepare a polymerizable composition A for forming a clad layer. Next, an Si substrate (5 cm × 5 cm × thickness 2 mm) was prepared, and the polymerizable composition A was applied to the surface by a spin coating method and dried at 100 ° C. for 5 minutes. Then, the entire surface was irradiated with ultraviolet rays at a dose of 2000 mJ / cm ² , and subsequently heat-treated at 100 ° C. for 30 minutes to form an under cladding layer (see FIG. 2B). It was 30 micrometers when the thickness of this under clad layer was measured with the contact-type film thickness meter. The refractive index of the underclad was 1.589 at a wavelength of 633 nm.

[Formation of core part]
90 parts of the trisoxetane ether compound obtained in Example 1, 10 parts of bisphenoxyethanol fluorenediglycidyl ether (epoxy equivalent 320), 4,4-bis [di (βhydroxyethoxy) phenylsulfinio] phenyl sulfide- 1 part of a 50% propion carbide solution of bis-hexafluoroantimonate was dissolved in cyclohexanone to prepare a polymerizable composition B for forming a core part. And the said polymeric composition B was apply | coated on the said under clad layer by the spin coat method (refer FIG.2 (c)). Then, this coated layer was dried at 150 ° C. for 20 minutes, and a synthetic quartz-based chromium mask (photomask) on which a 50 μm-wide linear optical waveguide pattern was drawn was further disposed (FIG. 2 (d) )), And an ultraviolet ray with an irradiation amount of 2000 mJ / cm ² was irradiated through this chrome mask by a contact exposure method, and further a heat treatment was performed at 150 ° C. for 30 minutes. Then, in order to remove an unirradiated part, development was performed using a γ-butyrolactone aqueous solution, and the core pattern was formed by further heating at 150 ° C. for 30 minutes (see FIG. 2E). When the core shape was measured with a length measuring microscope, the core pattern had a square cross-sectional shape with a width of 50 μm and a height of 50 μm. Further, the refractive index of the core portion formed in this manner was 1.612 at a wavelength of 633 nm.

[Formation of overclad layer]
The same composition as the polymerizable composition A prepared at the time of forming the underclad layer was applied onto the core part and the underclad layer by a spin coating method. Next, it was dried at 100 ° C. for 5 minutes, irradiated with ultraviolet rays at an irradiation amount of 2000 mJ / cm ² , and subsequently heat-treated at 150 ° C. for 60 minutes to form an overcladding layer (FIG. 2 ( f)). Thus, an optical waveguide having a relative refractive index Δ = 1.4% was produced.

[Evaluation]
The optical waveguide was cut into a length of 10 cm using a dicing apparatus (Model 522 manufactured by Disco Corporation) and subjected to end face processing. When the cross-sectional shape of the optical waveguide was observed with a length measuring microscope, it was found to be a buried multimode optical waveguide with an under cladding layer thickness of 30 μm, a core portion of 50 μm × 50 μm, and an over cladding layer thickness of 70 μm. It was confirmed. And when this optical waveguide was measured for light propagation loss by a conventional cutback method using laser light having a wavelength of 850 nm, it was 0.09 dB / cm.

  The trisoxetane ether compound of the present invention is used as a constituent of a photocurable resin composition or a thermosetting resin composition, and these resin compositions include, for example, paints, coating materials, adhesives, optical lenses, and optical waveguides. It is used for various forming materials. Examples of the optical waveguide include a straight optical waveguide, a curved optical waveguide, a crossed optical waveguide, a Y-branch optical waveguide, a slab optical waveguide, a Mach-Zehnder optical waveguide, an AWG optical waveguide, a grating, and an optical waveguide lens. It is done. The optical device using the optical waveguide includes a wavelength filter, an optical switch, an optical splitter, an optical multiplexer, an optical multiplexer / demultiplexer, an optical amplifier, a wavelength converter, a wavelength divider, an optical splitter, and directional coupling. And an optical transmission module in which a laser diode and a photodiode are hybrid-integrated.

It is a cross-sectional view showing an example of the optical waveguide of the present invention. It is explanatory drawing which shows the manufacturing process of the optical waveguide of this invention.

Explanation of symbols

1 Substrate 2 Clad layer 3 Core part

Claims (5)

The tris oxetane ether compound represented by the following general formula (1).
It is a manufacturing method of the tris oxetane ether compound of Claim 1, Comprising: The phenol represented by following General formula (2) is cesium phenolate by a cesium salt, Then, it represents by following General formula (3) A method for producing a trisoxetane ether compound characterized by reacting with a sulfonic acid ester.
  The method for producing a trisoxetane ether compound according to claim 2, wherein the cesium salt is cesium carbonate.   An optical waveguide comprising a substrate and a clad layer formed on the substrate, wherein a core portion that propagates an optical signal in a predetermined pattern is formed in the clad layer, wherein the clad layer and the core portion At least one is formed with the resin composition containing the tris oxetane ether compound of Claim 1, The optical waveguide characterized by the above-mentioned.   The optical waveguide according to claim 4, wherein at least one of the cladding layer and the core part is formed of a resin composition containing the trisoxetane ether compound according to claim 1 and a compound having an epoxy group or a vinyl ether group.