JP2007059598A - Adjustment method of lighting intensity in charged particle beam exposure device - Google Patents

Adjustment method of lighting intensity in charged particle beam exposure device Download PDF

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JP2007059598A
JP2007059598A JP2005242673A JP2005242673A JP2007059598A JP 2007059598 A JP2007059598 A JP 2007059598A JP 2005242673 A JP2005242673 A JP 2005242673A JP 2005242673 A JP2005242673 A JP 2005242673A JP 2007059598 A JP2007059598 A JP 2007059598A
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illumination intensity
current value
charged particle
error range
particle beam
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Takehisa Yahiro
威久 八尋
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Nikon Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an adjustment method of lighting intensity with high precision without causing components breakage in a charged particle beam exposure device. <P>SOLUTION: In the charged particle beam exposure device, the relation between a current value emitted from the source of a charged particle beam and the lighting intensity on reticle is calibrated in advance, so that it may be defined as an approximate expression which expresses required radiation current as a function of lighting intensity on reticle. When making a setting change of the lighting intensity on reticle, the present radiation current value and the lighting intensity on the reticle are measured before setting change operation, and it is judged whether a lighting intensity measurement value is in a permissible error range 1 with respect to a desired value of lighting intensity calculated from the radiation current value and the above approximate expression. As a result, when a lighting intensity measurement value is in the permissible error range 1, a current value emitted from the source of a charged particle beam is changed. In the case of the outside of the permissible error range 1, processing is ended without changing the radiation current value. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、荷電粒子線露光装置における照明強度の調整方法に関するものである。   The present invention relates to a method for adjusting illumination intensity in a charged particle beam exposure apparatus.

半導体デバイスの集積度の向上と共に、その製造工程におけるリソグラフィに使用される露光装置として、従来の可視光や紫外線を使用したものより微細なパターンの露光が可能な荷電粒子線露光装置、特に電子線露光装置の開発が進められている。このような電子線露光装置の例は、例えば特開2000−49079号公報(特許文献1)に記載されている。電子線露光装置として開発の主流となすものは、分割露光転写方式のものである。これは、露光すべきエリアをサブフィールドと呼ばれる小領域に分割し、このサブフィールドごとに露光を行って、その像を繋ぎ合わせて全体の露光すべきエリアの露光を行うものである。一般に、このサブフィールドの大きさは、レチクル上で1mm角、ウエハ上で0.25mm角である。
特開2000−49079号
Along with the improvement of the degree of integration of semiconductor devices, a charged particle beam exposure apparatus capable of exposing finer patterns than conventional ones using visible light or ultraviolet rays as an exposure apparatus used for lithography in its manufacturing process, especially an electron beam Development of exposure equipment is in progress. An example of such an electron beam exposure apparatus is described in, for example, Japanese Patent Laid-Open No. 2000-49079 (Patent Document 1). The mainstream of development as an electron beam exposure apparatus is a divided exposure transfer system. In this method, an area to be exposed is divided into small areas called subfields, exposure is performed for each subfield, the images are connected, and the entire area to be exposed is exposed. In general, the size of this subfield is 1 mm square on the reticle and 0.25 mm square on the wafer.
JP 2000-49079 A

分割露光転写方式の荷電粒子線露光装置では、空間電荷効果がレチクルパターンによって異なるため、必要な照明強度はレチクルの設計時に既に決まっており、その照明強度はレチクルごとに異なる。つまりレチクルを交換するごとに照明強度を自動的に設定変更する必要が生じる。   In the divided exposure transfer type charged particle beam exposure apparatus, since the space charge effect differs depending on the reticle pattern, the required illumination intensity is already determined at the time of designing the reticle, and the illumination intensity differs for each reticle. That is, it is necessary to change the illumination intensity automatically every time the reticle is changed.

レチクル上の照明強度の調整は、一般的には荷電粒子線源から放射される電流値を調整することによって行う。レチクル上の照明強度を設定変更する場合にまず考えられる方法は、荷電粒子線源から放射される電流値とレチクル上照明強度の関係を事前に把握しておき、その情報をもとに放射電流値を直接設定する方法である。この方法の問題点は、事前に把握した放射電流値とレチクル上の照明強度の関係に誤差があった場合、実際の照明強度が所望の設定値に対し誤差を持ってしまう点にある。また、放射電流を増加させようとして荷電粒子線源のパラメータを変更する場合、例えば、誤動作や故障により、荷電粒子線源を加熱しすぎて、部品が破損する恐れがある。   The illumination intensity on the reticle is generally adjusted by adjusting the current value emitted from the charged particle beam source. The first conceivable method for changing the illumination intensity on the reticle is to know in advance the relationship between the current value emitted from the charged particle beam source and the illumination intensity on the reticle, and based on that information It is a method of setting a value directly. The problem with this method is that if there is an error in the relationship between the radiation current value grasped in advance and the illumination intensity on the reticle, the actual illumination intensity will have an error with respect to a desired set value. Further, when changing the parameters of the charged particle beam source in order to increase the radiation current, the charged particle beam source may be heated too much due to, for example, malfunction or failure, and the components may be damaged.

本発明は、かかる問題に鑑みてなされたものであり、荷電粒子線露光装置において、部品破損をなくし、精度良く照明強度を調整する方法を提供することを課題とする。   The present invention has been made in view of such a problem, and an object of the present invention is to provide a method for adjusting the illumination intensity with high accuracy in a charged particle beam exposure apparatus by eliminating component damage.

前記課題を解決するための第1の手段は、 荷電粒子線露光装置における照明強度を調整する方法であって、以下の(1)〜(4)の工程を有することを特徴とする調整方法である。
(1) 荷電粒子線源から放射される電流値とレチクル上の照明強度との関係を事前に校正して、必要な放射電流をレチクル上の照明強度の関数として表した近似式として定義する。
(2) 荷電粒子線源から放射される電流値を変更する前の放射電流値を計測する。
(3) 荷電粒子線源から放射される電流値を変更する前のレチクル上の照明強度を計測する。
(4) (3)で計測した照明強度値が、(1)で定義した近似式に(2)で計測した放射電流値を代入して計算された照明強度の目標値に対し、許容誤差範囲1内にあるかどうかを判断する。その結果、(3)で計測した照明強度値が許容誤差範囲1内の場合は、荷電粒子線源から放射される電流値を変更する。許容誤差範囲1外の場合は、放射電流値を変更せずに処理を終了する。
A first means for solving the above-described problem is a method for adjusting the illumination intensity in a charged particle beam exposure apparatus, which includes the following steps (1) to (4): is there.
(1) The relationship between the current value radiated from the charged particle beam source and the illumination intensity on the reticle is calibrated in advance, and the necessary radiation current is defined as an approximate expression that is expressed as a function of the illumination intensity on the reticle.
(2) Measure the radiation current value before changing the current value radiated from the charged particle beam source.
(3) Measure the illumination intensity on the reticle before changing the current value emitted from the charged particle beam source.
(4) The illumination intensity value measured in (3) is within an allowable error range with respect to the target value of illumination intensity calculated by substituting the radiation current value measured in (2) into the approximate expression defined in (1). Determine whether it is within 1. As a result, when the illumination intensity value measured in (3) is within the allowable error range 1, the current value radiated from the charged particle beam source is changed. If it is outside the permissible error range 1, the process ends without changing the radiation current value.

前記課題を解決するための第2の手段は、 第1の手段であって、以下の(5)〜(6)の工程をさらに有することを特徴とする調整方法である。
(5) (4)で許容誤差範囲1内の場合に、放射電流値の変更を行った後にレチクル上の照明強度を計測する。
(6) (5)で計測した照明強度値が、(1)で定義した近似式に変更後の放射電流値を代入して計算された照明強度の目標値に対し、許容誤差範囲2内にあるかどうかを判断する。その結果、(5)で計測した照明強度値が許容誤差範囲2内の場合は、変更後の放射電流値で処理を終了するか、又は(5)で計測した照明強度値が、(1)で定義した近似式に変更後の放射電流値を代入して計算された照明強度の目標値に対し、許容誤差範囲3内にあるかどうかを判断する。許容誤差範囲2外の場合は、放射電流値を変更する前の状態に戻す。
The second means for solving the above-mentioned problems is the first means, and is an adjustment method characterized by further comprising the following steps (5) to (6).
(5) If the allowable error range is 1 in (4), the illumination intensity on the reticle is measured after changing the radiation current value.
(6) The illumination intensity value measured in (5) is within the allowable error range 2 with respect to the target value of illumination intensity calculated by substituting the changed radiation current value into the approximate expression defined in (1). Determine if there is. As a result, when the illumination intensity value measured in (5) is within the allowable error range 2, the process ends with the changed radiation current value, or the illumination intensity value measured in (5) is (1) It is determined whether or not the target value of the illumination intensity calculated by substituting the changed radiation current value into the approximate expression defined in (1) is within the allowable error range 3. If it is outside the allowable error range 2, the radiation current value is returned to the state before the change.

前記課題を解決するための第3の手段は、 第2の手段であって、以下の(7)の工程をさらに有することを特徴とする調整方法である。
(7) (6)で許容誤差範囲2内の場合に、(5)で計測した照明強度値が、(1)で定義した近似式に変更後の放射電流値を代入して計算された照明強度の目標値に対し、許容誤差範囲3内にあるかどうかを判断する。その結果、(5)で計測した照明強度値が許容誤差範囲3内の場合は、変更後の放射電流値で処理を終了する。許容誤差範囲3外の場合は、荷電粒子線源から放射される電流値を再変更する。
The third means for solving the above-mentioned problem is the second means, and is an adjustment method characterized by further comprising the following step (7).
(7) The illumination intensity value measured in (5) is calculated by substituting the changed radiation current value into the approximate expression defined in (1) when within the allowable error range 2 in (6). It is determined whether the target intensity value is within the allowable error range 3. As a result, when the illumination intensity value measured in (5) is within the allowable error range 3, the process ends with the changed radiation current value. If it is outside the allowable error range 3, the current value radiated from the charged particle beam source is changed again.

前記課題を解決するための第4の手段は、 第3の手段であって、以下の(8)の工程をさらに有することを特徴とする調整方法である。
(8) (7)で許容誤差範囲3外の場合に、放射電流値の再変更を行った後に(5)〜(7)のステップを、(5)で計測した照明強度値が許容誤差範囲3内に入るまで、又は決められた回数繰り返すまで、繰り返す。ここで、決められた回数繰り返しても許容誤差範囲3内に入らない場合は、放射電流値を変更する前の状態に戻す。
The 4th means for solving the above-mentioned subject is the 3rd means, and is the adjustment method characterized by further having the process of the following (8).
(8) If (7) is outside the allowable error range 3, after changing the radiation current value again, the steps (5) to (7) are performed, and the illumination intensity value measured in (5) is within the allowable error range. Repeat until 3 or repeat a specified number of times. Here, if it does not fall within the allowable error range 3 even after the determined number of repetitions, the radiation current value is returned to the state before the change.

前記課題を解決するための第5の手段は、 第3又は第4の手段であって、再変更する放射電流の設定値yは、再変更する前の放射電流値をy1、レチクル上の照明強度の計測値をx1、x1とレチクル上の照明強度の目標値との差をΔxとした場合、
y=y1+((1)で定義した近似式のx1における微分値)×Δx
の式を満たすことを特徴とする調整方法である。
The fifth means for solving the above-mentioned problem is the third or fourth means, wherein the set value y of the radiated current to be re-changed is the radiated current value before re-change y1, and the illumination on the reticle When the measured intensity value is x1, and the difference between x1 and the target value of the illumination intensity on the reticle is Δx,
y = y1 + (differential value at x1 of the approximate expression defined in (1)) × Δx
An adjustment method characterized by satisfying the following formula.

本発明によれば、荷電粒子線露光装置において、部品破損をなくし、精度良く照明強度を調整する方法を提供することができる。   ADVANTAGE OF THE INVENTION According to this invention, in a charged particle beam exposure apparatus, the method of eliminating part damage and adjusting illumination intensity accurately can be provided.

以下、本発明の実施の形態の例を、図を用いて説明する。図1は、荷電粒子露光装置の概要図である。図1において、11は荷電粒子線源、12A〜12Cは照明用レンズ、13はビーム成形アパーチャ、14は開口絞りでブランキングアパーチャを兼ねている。15はマスク、16A、16Bは投影用レンズ、17は散乱アパーチャ、18はウエハ、19A、19Bはアライナである。   Hereinafter, an example of an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a schematic diagram of a charged particle exposure apparatus. In FIG. 1, 11 is a charged particle beam source, 12A to 12C are illumination lenses, 13 is a beam shaping aperture, and 14 is an aperture stop that also serves as a blanking aperture. Reference numeral 15 denotes a mask, 16A and 16B denote projection lenses, 17 denotes a scattering aperture, 18 denotes a wafer, and 19A and 19B denote aligners.

荷電粒子線源11から放出された荷電粒子線は、照明用レンズ12A、12Bにより開口絞り14の開口面を均一に照明し、レンズ12Cにより開口絞り14の開口面の像をマスク15上に形成する。この像の領域が照明領域となる。マスク15上に形成されたパターンの像は、投影用レンズ16A、16Bによりウエハ18上に結像し、ウエハ18上のレジストを感光させる。照明荷電粒子線の開口角を制限するために開口絞り14が設けられ、マスク15で散乱された散乱線をカットするために散乱アパーチャ17が設けられている。アライナ19A、19Bにより、開口絞り14を照明する荷電粒子線の位置と方向が調整される。この実施の形態においては、アライナ19A、19Bと照明用レンズ12Bを照明一様性の調整に使用している。   The charged particle beam emitted from the charged particle beam source 11 uniformly illuminates the aperture surface of the aperture stop 14 by the illumination lenses 12A and 12B, and an image of the aperture surface of the aperture stop 14 is formed on the mask 15 by the lens 12C. To do. This image area is an illumination area. The image of the pattern formed on the mask 15 is formed on the wafer 18 by the projection lenses 16A and 16B, and the resist on the wafer 18 is exposed. An aperture stop 14 is provided to limit the aperture angle of the illuminating charged particle beam, and a scattering aperture 17 is provided to cut the scattered radiation scattered by the mask 15. The positions and directions of the charged particle beams that illuminate the aperture stop 14 are adjusted by the aligners 19A and 19B. In this embodiment, the aligners 19A and 19B and the illumination lens 12B are used for adjusting the illumination uniformity.

このような荷電粒子線露光装置を例として、本発明の実施の形態の例である荷電粒子線露光装置におけるレチクル上の照明強度の調整方法を図2に示すフローチャート、及び図3を使用して説明する。   Taking such a charged particle beam exposure apparatus as an example, a method for adjusting the illumination intensity on the reticle in the charged particle beam exposure apparatus which is an example of the embodiment of the present invention will be described with reference to the flowchart shown in FIG. explain.

まず、荷電粒子線源から放射される電流値とレチクル上の照明強度との関係を事前に校正して、必要な放射電流をレチクル上の照明強度の関数として表した近似式として定義する(ステップS1)。両者の関係は、放射電流値をy、レチクル上の照明強度をxとすると、式(1)のような1次関数で近似できることが多い。   First, the relationship between the current value radiated from the charged particle beam source and the illumination intensity on the reticle is calibrated in advance, and the necessary radiation current is defined as an approximate expression representing the illumination intensity on the reticle (step). S1). The relationship between the two can often be approximated by a linear function such as equation (1), where y is the radiation current value and x is the illumination intensity on the reticle.

y=ax+b ・・・(1)
ここでレチクル上の照明強度を設定変更する際に、設定変更動作の前に現在の放射電流値とレチクル上の照明強度を計測する(ステップS2及びステップS3)。続いて、照明強度計測値が、放射電流値と上記の近似式から計算された照明強度の目標値に対し、許容誤差範囲1内にあるかどうかを判断する(ステップS4)。例えば、上記の近似式(1)においてa=20、b=0とし、現状の放射電流値が200μAであった場合、照明強度の目標値は10μA/mm2のように計算され、許容誤差範囲1が±10%とすると、レチクル上照明強度が9μA/mm2以上11μA/mm2以下であるかどうかを判断する。もし許容誤差範囲1外であれば、警告を発しつつ電流設定動作を中止し、設定変更前の状態に戻る(ステップS10)。これは、例えば放射電流計測センサや照明強度計測センサの故障などの場合に荷電粒子線露光装置の部品破損が生じないようにするための処置である。
y = ax + b (1)
Here, when changing the setting of the illumination intensity on the reticle, the current radiation current value and the illumination intensity on the reticle are measured before the setting change operation (steps S2 and S3). Subsequently, it is determined whether or not the illumination intensity measurement value is within the allowable error range 1 with respect to the target value of the illumination intensity calculated from the radiation current value and the above approximate expression (step S4). For example, when a = 20 and b = 0 in the above approximate expression (1) and the current radiation current value is 200 μA, the target value of the illumination intensity is calculated as 10 μA / mm 2 , and the allowable error range. If 1 is ± 10%, it is determined whether the illumination intensity on the reticle is 9 μA / mm 2 or more and 11 μA / mm 2 or less. If it is outside the allowable error range 1, the current setting operation is stopped while issuing a warning, and the state before the setting change is returned (step S10). This is a measure for preventing parts of the charged particle beam exposure apparatus from being damaged in the case of, for example, a failure of a radiation current measurement sensor or an illumination intensity measurement sensor.

ステップS4において許容誤差範囲1内と判断された場合には、放射電流の設定変更動作を開始する(ステップ5)。放射電流の設定動作は、事前に校正した近似式(1)に従って、レチクル上の照明強度が所望の値になるように行う。その後、レチクル上の照明強度を計測し(ステップS6)、その計測値の目標値からの誤差が許容誤差範囲2内であるかどうかを判断する(ステップS7)。許容誤差範囲2は、例えば±10%である。許容誤差範囲2の外である場合は、警告を発しつつ電流設定変更動作を中止し、設定変更前の状態に戻る(ステップS10)。これも、例えば放射電流計測センサや照明強度計測センサの故障などの場合に荷電粒子線露光装置の部品破損が生じないようにするための処置である。   When it is determined in step S4 that it is within the allowable error range 1, the setting operation for changing the emission current is started (step 5). The setting operation of the radiation current is performed according to the approximate expression (1) calibrated in advance so that the illumination intensity on the reticle becomes a desired value. Thereafter, the illumination intensity on the reticle is measured (step S6), and it is determined whether the error of the measured value from the target value is within the allowable error range 2 (step S7). The allowable error range 2 is, for example, ± 10%. If it is outside the allowable error range 2, the current setting change operation is stopped while issuing a warning, and the state before the setting change is returned (step S10). This is also a measure for preventing damage to parts of the charged particle beam exposure apparatus in the case of a failure of the radiation current measurement sensor or the illumination intensity measurement sensor, for example.

ステップS7において許容誤差範囲2内と判断された場合には、ステップS6で計測したレチクル上の照明強度が実用的な許容誤差範囲3内であるかどうかを判断する(ステップS8)。許容誤差範囲3は、例えば±2%である。許容誤差範囲3内と判断された場合には、そのときの条件を解として処理を終了する。   If it is determined in step S7 that it is within the allowable error range 2, it is determined whether or not the illumination intensity on the reticle measured in step S6 is within the practical allowable error range 3 (step S8). The allowable error range 3 is, for example, ± 2%. If it is determined that the value is within the allowable error range 3, the process is terminated with the condition at that time as a solution.

ステップS8において許容誤差範囲3の外であると判断された場合には、ステップS5に戻り、所望の照明強度になるように放射電流値の微調整を行う。このとき、繰り返し回数をあらかじめ設定しておき、繰り返し回数がN回(例えば3回)以内であるかどうかを判断する(ステップS9)。放射電流値の微調整は次のように行う。ある時点での放射電流値をy1、レチクル上の照明強度の計測値x1とし、x1とレチクル上の照明強度の目標値x0の差をΔxとした場合、次回の放射電流の設定値yを式(2)で求まる値にする。   If it is determined in step S8 that the value is outside the allowable error range 3, the process returns to step S5, and fine adjustment of the radiation current value is performed so that the desired illumination intensity is obtained. At this time, the number of repetitions is set in advance, and it is determined whether the number of repetitions is within N times (for example, 3 times) (step S9). Fine adjustment of the radiation current value is performed as follows. When the radiation current value at a certain time is y1, the measurement value x1 of the illumination intensity on the reticle, and the difference between x1 and the target value x0 of the illumination intensity on the reticle is Δx, the set value y of the next radiation current is an expression Set to the value obtained in (2).

y=y1+(a×Δx) ・・・(2)
ここで、aは近似式(1)のx1における微分値である。
例えば、式(1)において、照明強度の目標値が10μA/mm2であり、a=20、b=0とし、現状の放射電流が200μA、現状の照明強度が9.9μA/mm2であった場合、次回の放射電流の設定値は、200+(20×(10−9.9))=202μAとする。
y = y1 + (a × Δx) (2)
Here, a is a differential value at x1 of the approximate expression (1).
For example, in equation (1), the target value of illumination intensity is 10 μA / mm 2 , a = 20, b = 0, the current radiation current is 200 μA, and the current illumination intensity is 9.9 μA / mm 2. In this case, the next set value of the radiation current is 200+ (20 × (10−9.9)) = 202 μA.

この方法では、Δxが小さい場合には近似式(1)が誤差を持っていたとしても、非常に追い込みの精度は良くなる。この方法の概略を図3に示す。
放射電流値の設定変更をした後、照明強度の計測を行い、照明強度の所望の値との誤差が許容誤差範囲3に入るまで、放射電流値の設定(ステップS5)、照明強度の計測(ステップS6)、許容誤差範囲2内かどうかの判定(ステップS7)、及び許容誤差範囲3内かどうかの判定(ステップS8)の動作を繰り返す。
In this method, when Δx is small, even if the approximation formula (1) has an error, the accuracy of the driving is very good. An outline of this method is shown in FIG.
After changing the setting of the radiation current value, the illumination intensity is measured, and until the error from the desired value of the illumination intensity enters the allowable error range 3, the setting of the radiation current value (step S5) and the measurement of the illumination intensity ( The operations of step S6), determination of whether or not within the allowable error range 2 (step S7), and determination of whether or not within the allowable error range 3 (step S8) are repeated.

上記の動作をN回(例えば3回)繰り返した時点で、許容誤差範囲3内に入らない場合は警告を発しつつ設定動作を中止し、元の設定値に戻る(ステップ11)。   When the above operation is repeated N times (for example, 3 times), if it does not fall within the allowable error range 3, the setting operation is stopped while issuing a warning, and the original setting value is restored (step 11).

図1は、荷電粒子露光装置の概要図である。FIG. 1 is a schematic diagram of a charged particle exposure apparatus. 本発明の実施の形態の例である荷電粒子線露光装置における照明強度の調整方法を示す図である。It is a figure which shows the adjustment method of the illumination intensity in the charged particle beam exposure apparatus which is an example of embodiment of this invention. 図3は、レチクル上照明強度と放射電流との関係を示す図である。FIG. 3 is a diagram showing the relationship between the illumination intensity on the reticle and the radiation current.

符号の説明Explanation of symbols

11…荷電粒子線源、12A〜12C…照明用レンズ、13…ビーム成形アパーチャ、14…開口絞り、15…マスク、16A、16B…投影用レンズ、17…散乱アパーチャ、18…ウエハ、19A、19B…アライナ DESCRIPTION OF SYMBOLS 11 ... Charged particle beam source, 12A-12C ... Illumination lens, 13 ... Beam shaping aperture, 14 ... Aperture stop, 15 ... Mask, 16A, 16B ... Projection lens, 17 ... Scattering aperture, 18 ... Wafer, 19A, 19B ... Aligner

Claims (5)

荷電粒子線露光装置における照明強度を調整する方法であって、以下の(1)〜(4)の工程を有することを特徴とする調整方法。
(1) 荷電粒子線源から放射される電流値とレチクル上の照明強度との関係を事前に校正して、必要な放射電流をレチクル上の照明強度の関数として表した近似式として定義する。
(2) 荷電粒子線源から放射される電流値を変更する前の放射電流値を計測する。
(3) 荷電粒子線源から放射される電流値を変更する前のレチクル上の照明強度を計測する。
(4) (3)で計測した照明強度値が、(1)で定義した近似式に(2)で計測した放射電流値を代入して計算された照明強度の目標値に対し、許容誤差範囲1内にあるかどうかを判断する。その結果、(3)で計測した照明強度値が許容誤差範囲1内の場合は、荷電粒子線源から放射される電流値を変更する。許容誤差範囲1外の場合は、放射電流値を変更せずに処理を終了する。
A method of adjusting illumination intensity in a charged particle beam exposure apparatus, comprising the following steps (1) to (4).
(1) The relationship between the current value radiated from the charged particle beam source and the illumination intensity on the reticle is calibrated in advance, and the necessary radiation current is defined as an approximate expression that is expressed as a function of the illumination intensity on the reticle.
(2) Measure the radiation current value before changing the current value radiated from the charged particle beam source.
(3) Measure the illumination intensity on the reticle before changing the current value emitted from the charged particle beam source.
(4) The illumination intensity value measured in (3) is within an allowable error range with respect to the target value of illumination intensity calculated by substituting the radiation current value measured in (2) into the approximate expression defined in (1). Determine whether it is within 1. As a result, when the illumination intensity value measured in (3) is within the allowable error range 1, the current value radiated from the charged particle beam source is changed. If it is outside the permissible error range 1, the process ends without changing the radiation current value.
請求項1に記載の荷電粒子線露光装置における照明強度の調整方法であって、以下の(5)〜(6)の工程をさらに有することを特徴とする調整方法。
(5) (4)で許容誤差範囲1内の場合に、放射電流値の変更を行った後にレチクル上の照明強度を計測する。
(6) (5)で計測した照明強度値が、(1)で定義した近似式に変更後の放射電流値を代入して計算された照明強度の目標値に対し、許容誤差範囲2内にあるかどうかを判断する。その結果、(5)で計測した照明強度値が許容誤差範囲2外の場合は、放射電流値を変更する前の状態に戻す。
It is the adjustment method of the illumination intensity in the charged particle beam exposure apparatus of Claim 1, Comprising: The adjustment method characterized by further having the process of the following (5)-(6).
(5) If the allowable error range is 1 in (4), the illumination intensity on the reticle is measured after changing the radiation current value.
(6) The illumination intensity value measured in (5) is within the allowable error range 2 with respect to the target value of illumination intensity calculated by substituting the changed radiation current value into the approximate expression defined in (1). Determine if there is. As a result, when the illumination intensity value measured in (5) is outside the allowable error range 2, the radiation current value is returned to the state before the change.
請求項2に記載の荷電粒子線露光装置における照明強度の調整方法であって、以下の(7)の工程をさらに有することを特徴とする調整方法。
(7) (6)で許容誤差範囲2内の場合に、(5)で計測した照明強度値が、(1)で定義した近似式に変更後の放射電流値を代入して計算された照明強度の目標値に対し、許容誤差範囲3内にあるかどうかを判断する。その結果、(5)で計測した照明強度値が許容誤差範囲3内の場合は、変更後の放射電流値で処理を終了する。許容誤差範囲3外の場合は、荷電粒子線源から放射される電流値を再変更する。
The method for adjusting an illumination intensity in the charged particle beam exposure apparatus according to claim 2, further comprising the following step (7).
(7) The illumination intensity value measured in (5) is calculated by substituting the changed radiation current value into the approximate expression defined in (1) when within the allowable error range 2 in (6). It is determined whether the target intensity value is within the allowable error range 3. As a result, when the illumination intensity value measured in (5) is within the allowable error range 3, the process ends with the changed radiation current value. If it is outside the allowable error range 3, the current value radiated from the charged particle beam source is changed again.
請求項3に記載の荷電粒子線露光装置における照明強度の調整方法であって、以下の(8)の工程をさらに有することを特徴とする調整方法。
(8) (7)で許容誤差範囲3外の場合に、放射電流値の再変更を行った後に(5)〜(7)のステップを、(5)で計測した照明強度値が許容誤差範囲3内に入るまで、又は決められた回数繰り返すまで、繰り返す。ここで、決められた回数繰り返しても許容誤差範囲3内に入らない場合は、放射電流値を変更する前の状態に戻す。
The method for adjusting an illumination intensity in the charged particle beam exposure apparatus according to claim 3, further comprising the following step (8).
(8) If (7) is outside the allowable error range 3, after changing the radiation current value again, the steps (5) to (7) are performed, and the illumination intensity value measured in (5) is within the allowable error range. Repeat until 3 or repeat a specified number of times. Here, if it does not fall within the allowable error range 3 even after the determined number of repetitions, the radiation current value is returned to the state before the change.
請求項3又は4に記載の荷電粒子線露光装置における照明強度の調整方法であって、
再変更する放射電流の設定値yは、再変更する前の放射電流値をy1、レチクル上の照明強度の計測値をx1、x1とレチクル上の照明強度の目標値との差をΔxとした場合、
y=y1+((1)で定義した近似式のx1における微分値)×Δx
の式を満たすことを特徴とする調整方法。
A method for adjusting illumination intensity in a charged particle beam exposure apparatus according to claim 3 or 4,
The set value y of the radiation current to be changed again is the radiation current value y1 before the change, x1 is the measured value of the illumination intensity on the reticle, and Δx is the difference between x1 and the target value of the illumination intensity on the reticle. If
y = y1 + (differential value at x1 of the approximate expression defined in (1)) × Δx
An adjustment method characterized by satisfying the formula:
JP2005242673A 2005-08-24 2005-08-24 Adjustment method of lighting intensity in charged particle beam exposure device Pending JP2007059598A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102681356A (en) * 2011-03-15 2012-09-19 东京毅力科创株式会社 Local exposure method and local exposure device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102681356A (en) * 2011-03-15 2012-09-19 东京毅力科创株式会社 Local exposure method and local exposure device

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