JP2007042983A5 - - Google Patents

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JP2007042983A5
JP2007042983A5 JP2005227677A JP2005227677A JP2007042983A5 JP 2007042983 A5 JP2007042983 A5 JP 2007042983A5 JP 2005227677 A JP2005227677 A JP 2005227677A JP 2005227677 A JP2005227677 A JP 2005227677A JP 2007042983 A5 JP2007042983 A5 JP 2007042983A5
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layer
lattice constant
piezoelectric layer
piezoelectric
buffer layer
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JP2005227677A
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JP2007042983A (en
JP5007780B2 (en
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Claims (8)

シリコン(Si)単結晶基板上に設けられた二酸化シリコン(SiO)からなる弾性膜の上側に、下電極と、該下電極上に設けられた導電性の材料からなる面方位(100)のバッファ層と、該バッファ層上にエピタキシャル成長により形成されたチタン酸ジルコン酸鉛(PZT)からなる面方位(100)の圧電体層と、該圧電体層上に設けられた上電極とからなる圧電素子を有し、前記圧電体層は前記バッファ層との境界部分に設けられて組成を厚さ方向に連続的に変化させた組成傾斜層とこの組成傾斜層上に積層された圧電体層本体とを有し、前記組成傾斜層は、Zr/Ti(モル比)及び格子定数が厚さ方向に連続的に変化したものであることを特徴とするアクチュエータ装置。 On the upper side of an elastic film made of silicon dioxide (SiO 2 ) provided on a silicon (Si) single crystal substrate, a lower electrode and a plane orientation (100) made of a conductive material provided on the lower electrode A piezoelectric layer comprising a buffer layer, a piezoelectric layer having a plane orientation (100) made of lead zirconate titanate (PZT) formed by epitaxial growth on the buffer layer, and an upper electrode provided on the piezoelectric layer. And a piezoelectric layer body provided on a boundary portion with the buffer layer, the composition gradient layer having a composition continuously changed in the thickness direction, and the piezoelectric layer body laminated on the composition gradient layer. DOO have a, the composition gradient layer, Zr / Ti (molar ratio) and an actuator and wherein the lattice constant is obtained by continuously changing the thickness direction. 請求項において、前記組成傾斜層の格子定数が、前記バッファ層の格子定数と前記圧電体層本体の格子定数との間の値であり、前記バッファ層から厚さ方向に離れるにしたがって、前記バッファ層の格子定数に近い値から前記圧電体層本体の格子定数に近い値へと連続的に変化することを特徴とするアクチュエータ装置。 In Claim 1 , the lattice constant of the composition gradient layer is a value between the lattice constant of the buffer layer and the lattice constant of the piezoelectric body, and as the distance from the buffer layer increases, An actuator device characterized by continuously changing from a value close to the lattice constant of the buffer layer to a value close to the lattice constant of the piezoelectric layer body. 請求項において、前記バッファ層と前記圧電体層本体の格子定数の差が8%以下であることを特徴とするアクチュエータ装置。 3. The actuator device according to claim 2 , wherein a difference in lattice constant between the buffer layer and the piezoelectric layer body is 8% or less. 請求項またはにおいて、前記バッファ層の格子定数が前記圧電体層本体の格子定数よりも小さく、前記組成傾斜層のZr/Ti(モル比)が、前記バッファ層から厚さ方向に離れるにしたがって漸大していることを特徴とするアクチュエータ装置。 According to claim 2 or 3, wherein the lattice constant of the buffer layer is smaller than the lattice constant of the piezoelectric layer body, the composition gradient layer Zr / Ti (molar ratio), separated in the thickness direction from the buffer layer Therefore, the actuator device is characterized by being gradually enlarged. 請求項の何れかにおいて、前記格子定数はa軸の格子定数であることを特徴とするアクチュエータ装置。 In any one of claims 1 to 4, wherein the lattice constant actuator device which is a lattice constant of a-axis. 請求項1〜の何れかのアクチュエータ装置を、前記基板に形成された圧力発生室に当該圧力発生室内の液体をノズル開口から吐出させるための圧力を発生させる圧力発生手段として具備することを特徴とする液体噴射ヘッド。 The actuator device according to any one of claims 1 to 5 is provided as pressure generating means for generating a pressure for discharging liquid in the pressure generating chamber from a nozzle opening in a pressure generating chamber formed on the substrate. Liquid ejecting head. 請求項の液体噴射ヘッドを具備することを特徴とする液体噴射装置。 A liquid ejecting apparatus comprising the liquid ejecting head according to claim 6 . シリコン(Si)単結晶基板上の二酸化シリコン(SiO)からなる弾性膜の上側に、下電極、導電性の材料からなる面方位(100)のバッファ層、エピタキシャル成長により形成されたチタン酸ジルコン酸鉛(PZT)からなる面方位(100)の圧電体層、及び上電極からなる圧電素子を具備するアクチュエータ装置の製造方法であって、前記圧電体層を形成する工程で、前記バッファ層上に形成したチタン酸ジルコン酸鉛前駆体膜を400℃以上に昇温する前に180〜350℃で一定時間保持した後、焼成することにより組成を厚さ方向に連続的に変化させた組成傾斜層を形成し、この組成傾斜層上にチタン酸ジルコン酸鉛からなる圧電体層本体を積層し前記組成傾斜層と前記圧電体層本体とで前記圧電体層とすることを特徴とするアクチュエータ装置の製造方法。 On the upper side of an elastic film made of silicon dioxide (SiO 2 ) on a silicon (Si) single crystal substrate, a lower electrode, a surface orientation (100) buffer layer made of a conductive material, zirconate titanate formed by epitaxial growth A method of manufacturing an actuator device including a piezoelectric layer having a plane orientation (100) made of lead (PZT) and a piezoelectric element made of an upper electrode, wherein the piezoelectric layer is formed on the buffer layer in a step of forming the piezoelectric layer. A composition graded layer in which the composition of the lead zirconate titanate precursor film formed is continuously changed in the thickness direction by firing after holding at 180 to 350 ° C. for a certain period of time before raising the temperature to 400 ° C. or higher. And a piezoelectric layer body made of lead zirconate titanate is laminated on the composition gradient layer, and the composition gradient layer and the piezoelectric layer body constitute the piezoelectric layer. Method of manufacturing an actuator device for.
JP2005227677A 2005-08-05 2005-08-05 Piezoelectric element manufacturing method, liquid ejecting head manufacturing method, and liquid ejecting apparatus manufacturing method Active JP5007780B2 (en)

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JP2005227677A JP5007780B2 (en) 2005-08-05 2005-08-05 Piezoelectric element manufacturing method, liquid ejecting head manufacturing method, and liquid ejecting apparatus manufacturing method

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JP2005227677A JP5007780B2 (en) 2005-08-05 2005-08-05 Piezoelectric element manufacturing method, liquid ejecting head manufacturing method, and liquid ejecting apparatus manufacturing method

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JP2007042983A JP2007042983A (en) 2007-02-15
JP2007042983A5 true JP2007042983A5 (en) 2008-09-18
JP5007780B2 JP5007780B2 (en) 2012-08-22

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JP5056139B2 (en) * 2007-04-20 2012-10-24 日立電線株式会社 Piezoelectric thin film element
JP5754198B2 (en) * 2011-03-24 2015-07-29 セイコーエプソン株式会社 Liquid ejecting head, liquid ejecting apparatus, and piezoelectric actuator
JP6128126B2 (en) * 2012-08-08 2017-05-17 コニカミノルタ株式会社 Piezoelectric element, piezoelectric device, inkjet head, and inkjet printer
JP6596634B2 (en) 2014-10-23 2019-10-30 アドバンストマテリアルテクノロジーズ株式会社 Ferroelectric ceramics, electronic parts, and manufacturing method of ferroelectric ceramics
CN109829203B (en) * 2019-01-07 2020-11-24 重庆大学 Production method of fabric base material in building space membrane structure

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JP3482883B2 (en) * 1998-08-24 2004-01-06 株式会社村田製作所 Ferroelectric thin film element and method of manufacturing the same
JP2004066600A (en) * 2002-08-05 2004-03-04 Seiko Epson Corp Liquid ejection head and liquid ejector
JP4521751B2 (en) * 2003-03-26 2010-08-11 国立大学法人東京工業大学 Lead zirconate titanate-based film, dielectric element, and method for manufacturing dielectric film
JP2004296919A (en) * 2003-03-27 2004-10-21 Seiko Epson Corp Process for fabricating capacitor, memory, and electronic apparatus

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