JP2007042391A - Electric contact material manufacturing method and electric contact material - Google Patents

Electric contact material manufacturing method and electric contact material Download PDF

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JP2007042391A
JP2007042391A JP2005224511A JP2005224511A JP2007042391A JP 2007042391 A JP2007042391 A JP 2007042391A JP 2005224511 A JP2005224511 A JP 2005224511A JP 2005224511 A JP2005224511 A JP 2005224511A JP 2007042391 A JP2007042391 A JP 2007042391A
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plating
base material
silver
electroplating
electrical contact
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Masahiko Miyata
雅彦 宮田
Keiji Kanematsu
圭史 兼松
Katsuhide Kumagai
勝秀 熊谷
Miyuki Takeuchi
美由紀 竹内
Hiroya Inaoka
宏弥 稲岡
Rentaro Mori
連太郎 森
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Tokai Rika Co Ltd
Toyota Motor Corp
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Tokai Rika Co Ltd
Toyota Motor Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an electric contact material manufacturing method and an electric contact material capable of enlarging a rugged shape on the surface of a metal plating. <P>SOLUTION: In applying electric plating on a parent material 2, overcurrent is made to flow at an initial stage of the electric plating, and afterwards, normal current is made to flow to form a silver plating on the parent material 2. For this treatment, first, an amount of the parent material 2 necessary for plating is rolled for leading it into a first plating tub 3a as a tub in which overcurrent is circulated. As the parent material 2 is set in the first plating tub 3a, overcurrent is made to flow between the parent material 2 dipped in plating liquid 4 and electrodes to form silver plating on the parent material 2 dipped in the plating liquid 4. Further, a part where the silver plating is formed in the first plating tub 3a is set in a second plating tub 3b, a normal-value current is made to flow between the parent material and the electrodes, and a silver component is piled on the above silver plating to form a silver plating with a necessary thickness. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、例えば電気回路のスイッチング接点等に用いる電気接点材料製造方法及び電気接点材料に関する。   The present invention relates to an electrical contact material manufacturing method and electrical contact material used for, for example, a switching contact of an electrical circuit.

従来、電気回路のスイッチング接点等に用いる電気接点材料としては、例えば特許文献1〜3に開示されるような焼結材の銀−グラファイト合金が広く使用されている。グラファイトは、元来、溶着性が殆ど無く、化学的に極めて安定であり、非常に高い潤滑作用を有している。従って、グラファイトを含有した銀−グラファイト合金は高い摺動性を有した材質となるため、銀−グラファイト合金を電気接点材料として用いれば、グリースやオイル等の潤滑剤を用いなくてもよいことから、銀−グラファイト合金はグリースレス摺動接点材料として使用される。   Conventionally, as an electrical contact material used for a switching contact of an electrical circuit, for example, a sintered silver-graphite alloy as disclosed in Patent Documents 1 to 3 has been widely used. Graphite originally has little weldability, is extremely chemically stable, and has a very high lubricating action. Therefore, since the silver-graphite alloy containing graphite becomes a material having high slidability, if the silver-graphite alloy is used as an electrical contact material, it is not necessary to use a lubricant such as grease or oil. Silver-graphite alloys are used as greaseless sliding contact materials.

ここで、焼結材を用いた場合、銀に含有できるグラファイトの量には限界がないが、銀に対するグラファイトの含有量が多くなると電気接点材料の強度が低くなり、強度に対してもろくなってしまう問題がある。従って、電気接点材料の強度的な面を考えた場合には、グラファイトを含有した金属を母材にメッキすることによって、グラファイト含有の電気接点材料を製造する手法がとられることがある。   Here, when a sintered material is used, there is no limit to the amount of graphite that can be contained in silver, but as the graphite content relative to silver increases, the strength of the electrical contact material decreases and becomes brittle with respect to strength. There is a problem. Therefore, when considering the strength of the electrical contact material, a method of manufacturing a graphite-containing electrical contact material by plating a base metal with a metal containing graphite may be taken.

一般的に、メッキ式の電気接点材料の製造手順としては、まず銀含有液体の入ったメッキ漕の中にグラファイト粉末を混入して、そのメッキ液中に例えば銅等の母材を浸す。この状態で母材と電極との間に電圧を印加すると銀が母材に取り付くことになるが、この際に銀がグラファイトを取り込んで母材に付着することから、母材表面にはグラファイト含有の銀メッキが形成された状態となる。このグラファイト含有の銀メッキでは、メッキ表面に露出するグラファイト量によって潤滑効果の程度が決まってくる。
特開2002−53919号公報 特開1996−13065号公報 特開昭63−7345号公報
Generally, as a procedure for manufacturing a plating-type electrical contact material, first, graphite powder is mixed in a plating basket containing a silver-containing liquid, and a base material such as copper is immersed in the plating solution. In this state, when a voltage is applied between the base material and the electrode, silver will be attached to the base material. At this time, since silver takes in graphite and adheres to the base material, the surface of the base material contains graphite. The silver plating is formed. In this graphite-containing silver plating, the degree of lubrication effect is determined by the amount of graphite exposed on the plating surface.
JP 2002-53919 A JP-A-1996-13065 JP 63-7345 A

ところで、この種のグラファイト含有の銀メッキでは、グラファイトは銀に取り込まれた状態でメッキ上に付着するため、メッキ表面上の凹凸に入り込んで取り付くことになる。従って、銀メッキの表面凹凸形状が小さいと、その分だけ取り付くグラファイト量も少なくなり、充分な表面グラファイト面積比(メッキ表面に対するグラファイト面積)が得られず、充分な耐摩耗性を確保できない問題があった。また、グラファイトは銀メッキに引っ掛かって取り付いているため、メッキ表面の凹凸形状が小さいと、その引っ掛かり具合が弱いことから、グラファイトがメッキ表面から脱落し易く、このことも耐摩耗性低下に問題を来していた。   By the way, in this type of graphite-containing silver plating, graphite adheres to the plating in a state of being taken in by the silver, and therefore enters and attaches to the irregularities on the plating surface. Therefore, if the surface unevenness of the silver plating is small, the amount of graphite to be attached decreases accordingly, and a sufficient surface graphite area ratio (graphite area with respect to the plating surface) cannot be obtained, so that sufficient wear resistance cannot be ensured. there were. In addition, graphite is attached by being caught by silver plating, so if the uneven shape on the plating surface is small, the degree of catching will be weak, so graphite will easily drop off from the plating surface, which also causes a problem in reducing wear resistance. It was coming.

本発明の目的は、金属メッキの表面の凹凸形状を大きくすることができる電気接点材料製造方法及び電気接点材料を提供することにある。   The objective of this invention is providing the electrical contact material manufacturing method and electrical contact material which can enlarge the uneven | corrugated shape of the surface of metal plating.

上記問題点を解決するために、請求項1に記載の発明では、メッキ液中に浸した母材と電極との間に電圧を印加して電気メッキを施し、前記メッキ液中の金属イオンを前記母材に付着させて前記母材の表面にグラファイト含有の金属メッキを形成する電気接点材料製造方法において、前記母材と前記電極との間に電圧を印加する際、その電圧印加過程で過電流を流すことを要旨とする。   In order to solve the above-described problems, in the invention according to claim 1, electroplating is performed by applying a voltage between a base material immersed in a plating solution and an electrode, and metal ions in the plating solution are removed. In the electrical contact material manufacturing method in which a graphite-containing metal plating is formed on the surface of the base material by being attached to the base material, when a voltage is applied between the base material and the electrode, excessive voltage is applied during the voltage application process. The gist is to pass an electric current.

この発明によれば、電気メッキに際して母材及び電極の間に過電流を流すと、その過電流印加期間はメッキ速度が速くなり、金属イオンが母材に付着する際にその付着に偏りが出てくることから、金属メッキの表面の凹凸形状が大きくなり、金属メッキの表面形状が粗くなる。ところで、例えばメッキ液中にグラファイト粒子が混入された場合、そのグラファイト粒子は金属イオンが母材に付着する際、金属イオンに取り込まれた状態で母材に付着し、金属メッキの凹凸内に入り込んで金属メッキに取り付く。従って、金属メッキの表面の凹凸形状が大きくなれば、金属メッキ上のグラファイト量が多く取り付くため、金属メッキの表面グラファイト面積比が大きくなり、高い耐摩耗性が確保される。   According to the present invention, when an overcurrent is passed between the base material and the electrode during electroplating, the plating speed is increased during the overcurrent application period, and when the metal ions adhere to the base material, the adhesion is biased. Therefore, the uneven shape on the surface of the metal plating becomes large, and the surface shape of the metal plating becomes rough. By the way, for example, when graphite particles are mixed in the plating solution, when the metal ions adhere to the base material, the graphite particles adhere to the base material in a state of being taken in by the metal ions and enter into the unevenness of the metal plating. Attach to metal plating. Therefore, if the irregular shape on the surface of the metal plating is increased, the amount of graphite on the metal plating is increased, so that the surface graphite area ratio of the metal plating is increased and high wear resistance is ensured.

請求項2に記載の発明では、請求項1に記載の発明において、前記過電流を流す期間は、前記電気メッキを開始してから一定期間内の初期段階であることを要旨とする。
この発明によれば、請求項1に記載の発明の作用に加え、電気メッキの初期段階に過電流を流すと、母材の表層(例えば一層目)には、大きな凹凸形状を有する金属メッキの層が形成された状態となる。従って、電気メッキの早い段階から凹凸形状の大きな金属メッキが形成されるため、金属メッキの層厚をそれほど厚くさせずに、表面凹凸の大きな金属メッキを形成することが可能となる。
The invention according to claim 2 is characterized in that, in the invention according to claim 1, the period in which the overcurrent flows is an initial stage within a certain period after the electroplating is started.
According to the present invention, in addition to the operation of the first aspect of the invention, when an overcurrent is passed in the initial stage of electroplating, the surface layer (for example, the first layer) of the base material is formed of a metal plating having a large uneven shape. A layer is formed. Accordingly, since the metal plating having a large unevenness is formed at an early stage of electroplating, it is possible to form the metal plating having a large surface unevenness without increasing the thickness of the metal plating so much.

請求項3に記載の発明では、母材の表面に加工処理を施して予め粗くしておき、その後工程の段階でメッキ液中に浸した前記母材と電極との間に電圧を印加して電気メッキを施し、前記メッキ液中の金属イオンを前記母材に付着させて前記母材の表面に金属メッキを形成することを要旨とする。   In the invention of claim 3, the surface of the base material is processed and roughened in advance, and then a voltage is applied between the base material and the electrode immersed in the plating solution in the subsequent process step. The gist is that electroplating is performed, and metal ions in the plating solution are adhered to the base material to form metal plating on the surface of the base material.

この発明によれば、母材の表面に加工処理を施して母材表面を予め粗くしておくので、その母材に電気メッキを施すと、金属メッキは母材の表面形状に沿って形成されるため、金属メッキの表面の凹凸形状が大きくなり、金属メッキの表面形状が粗くなる。ところで、例えばメッキ液中にグラファイト粒子が混入された場合、そのグラファイト粒子は金属イオンが母材に付着する際、金属イオンに取り込まれた状態で母材に付着し、金属メッキの凹凸内に入り込んで金属メッキに取り付く。従って、金属メッキの表面の凹凸形状が大きくなれば、金属メッキ上のグラファイト量が多く取り付くため、金属メッキの表面グラファイト面積比が大きくなり、高い耐摩耗性が確保される。   According to this invention, the surface of the base material is processed to roughen the surface of the base material in advance, so that when the base material is electroplated, the metal plating is formed along the surface shape of the base material. Therefore, the uneven shape on the surface of the metal plating becomes large, and the surface shape of the metal plating becomes rough. By the way, for example, when graphite particles are mixed in the plating solution, when the metal ions adhere to the base material, the graphite particles adhere to the base material in a state of being taken in by the metal ions and enter into the unevenness of the metal plating. Attach to metal plating. Therefore, if the irregular shape on the surface of the metal plating is increased, the amount of graphite on the metal plating is increased, so that the surface graphite area ratio of the metal plating is increased and high wear resistance is ensured.

請求項4に記載の発明では、メッキ液中に浸した母材と電極との間に電圧を印加して電気メッキを施し、前記メッキ液中の金属イオンを前記母材に付着させて前記母材の表面に金属メッキを形成し、当該金属メッキを形成した前記母材にエッチングを施して前記金属メッキの表面を溶解し、前記エッチング後の前記母材に前記電気メッキを再度施して、前記エッチング後の前記母材の表面に前記金属メッキを再度形成することを要旨とする。   According to a fourth aspect of the present invention, a voltage is applied between a base material immersed in a plating solution and an electrode to perform electroplating, and metal ions in the plating solution are attached to the base material to thereby form the base material. Forming a metal plating on the surface of the material, etching the base material on which the metal plating is formed to dissolve the surface of the metal plating, re-applying the electroplating on the base material after the etching, The gist is to form the metal plating again on the surface of the base material after the etching.

この発明によれば、1回目の電気メッキの後にエッチングを施すと、金属メッキの表面が溶解してメッキ表面形状が粗い状態となる。そして、エッチング後の母材に電気メッキを再度施すと、表面が粗れた状態のメッキ表面形状に金属イオンが取り付いて金属メッキが形成されるため、エッチング後の金属メッキはその表面の凹凸形状が大きい状態で形成される。ところで、例えばメッキ液中にグラファイト粒子が混入された場合、そのグラファイト粒子は金属イオンが母材に付着する際、金属イオンに取り込まれた状態で母材に付着し、金属メッキの凹凸内に入り込んで金属メッキに取り付く。従って、金属メッキの表面の凹凸形状が大きくなれば、金属メッキ上のグラファイト量が多く取り付くため、金属メッキの表面グラファイト面積比が大きくなり、高い耐摩耗性が確保される。   According to the present invention, when etching is performed after the first electroplating, the surface of the metal plating is dissolved and the plated surface shape becomes rough. Then, when electroplating is again applied to the base material after etching, metal ions are attached to the roughened plating surface shape, so that metal plating is formed. Is formed in a large state. By the way, for example, when graphite particles are mixed in the plating solution, when the metal ions adhere to the base material, the graphite particles adhere to the base material in a state of being taken in by the metal ions and enter into the unevenness of the metal plating. Attach to metal plating. Therefore, if the irregular shape on the surface of the metal plating is increased, the amount of graphite on the metal plating is increased, so that the surface graphite area ratio of the metal plating is increased and high wear resistance is ensured.

請求項5に記載の発明では、請求項1〜4のうちいずれか一項に記載の発明において、前記メッキ液中にはグラファイト粒子が混入され、前記母材に前記電気メッキが施された際には、前記金属メッキが前記グラファイト粒子を含有した状態で前記母材の表面に形成されることを要旨とする。   The invention according to claim 5 is the invention according to any one of claims 1 to 4, wherein graphite particles are mixed in the plating solution, and the electroplating is performed on the base material. The gist is that the metal plating is formed on the surface of the base material in a state containing the graphite particles.

この発明によれば、請求項1〜4のうちいずれか一項に記載の発明の作用に加え、金属メッキ内には固体潤滑作用のあるグラファイト粒子が含有されているので、グラファイト含有の金属メッキの施された電気接点材料は、グリースレス摺動接点材料として使用することが可能となる。   According to the present invention, in addition to the action of the invention according to any one of claims 1 to 4, the metal plating contains graphite particles having a solid lubricating action. The electrical contact material provided with can be used as a greaseless sliding contact material.

請求項6に記載の発明では、メッキ液中に浸した母材と電極との間に電圧を印加して電気メッキを施し、前記メッキ液中の金属イオンを前記母材に付着させて前記母材の表面に金属メッキを形成し、前記母材と前記電極との間に電圧を印加する際、その電圧印加過程で過電流を流して製造された電気接点材料であることを要旨とする。この発明によれば、請求項1と同様の作用が得られる。   In the invention according to claim 6, electroplating is performed by applying a voltage between a base material immersed in a plating solution and an electrode, and metal ions in the plating solution are adhered to the base material to thereby form the base material. The gist of the invention is an electrical contact material produced by forming a metal plating on the surface of the material and applying an overcurrent during the voltage application process when a voltage is applied between the base material and the electrode. According to the present invention, an effect similar to that of the first aspect can be obtained.

請求項7に記載の発明は、母材の表面に加工処理を施して予め粗くしておき、その後工程の段階でメッキ液中に浸した前記母材と電極との間に電圧を印加して電気メッキを施し、前記メッキ液中の金属イオンを前記母材に付着させて前記母材の表面に金属メッキを形成した電気接点材料であることを要旨とする。この発明によれば、請求項3と同様の作用が得られる。   According to the seventh aspect of the present invention, the surface of the base material is processed and roughened in advance, and then a voltage is applied between the base material immersed in the plating solution and the electrode in the subsequent process step. The gist of the present invention is an electrical contact material in which electroplating is performed and metal ions in the plating solution are adhered to the base material to form a metal plating on the surface of the base material. According to the present invention, an effect similar to that of the third aspect can be obtained.

請求項8に記載の発明は、メッキ液中に浸した母材と電極との間に電圧を印加して電気メッキを施し、前記メッキ液中の金属イオンを前記母材に付着させて前記母材の表面に金属メッキを形成し、当該金属メッキを形成した前記母材にエッチングを施して前記金属メッキの表面を溶解し、前記エッチング後の前記母材に前記電気メッキを再度施して、前記エッチング後の前記母材の表面に前記金属メッキを再度形成した電気接点材料であることを要旨とする。この発明によれば、請求項4と同様の作用が得られる。   According to the eighth aspect of the present invention, a voltage is applied between a base material immersed in a plating solution and an electrode to perform electroplating, and metal ions in the plating solution are attached to the base material to thereby form the base material. Forming a metal plating on the surface of the material, etching the base material on which the metal plating is formed to dissolve the surface of the metal plating, re-applying the electroplating on the base material after the etching, The gist of the invention is an electrical contact material in which the metal plating is formed again on the surface of the base material after etching. According to the present invention, an effect similar to that of the fourth aspect can be obtained.

本発明によれば、金属メッキの表面の凹凸形状を大きくすることができる。   According to the present invention, the uneven shape on the surface of the metal plating can be increased.

以下、本発明を具体化した電気接点材料製造方法及び電気接点材料の一実施形態を図1〜図9に従って説明する。   Hereinafter, an embodiment of an electrical contact material manufacturing method and an electrical contact material embodying the present invention will be described with reference to FIGS.

(過電流印加処理)
図1は、電気メッキ装置1の概略構成を示す模式構成図である。電気メッキ装置1は、メッキしたい母材2をメッキ漕3内のメッキ液4に浸した状態で、同じくメッキ液4に浸した電極(図示略)とその母材2との間に直流電圧を印加することで母材2に直流電流を流し、母材2の表面に金属メッキを形成する装置である。このとき、母材2が陰極(マイナス)、電極が陽極(プラス)となり、メッキ液中の金属イオンが母材2に引き寄せられることによって、母材2に金属メッキが形成される。
(Overcurrent application processing)
FIG. 1 is a schematic configuration diagram showing a schematic configuration of the electroplating apparatus 1. The electroplating apparatus 1, while the base material 2 to be plated is immersed in the plating solution 4 in the plating bowl 3, applies a DC voltage between the electrode (not shown) and the base material 2 that are also immersed in the plating solution 4. This is a device for applying a direct current to the base material 2 by applying it and forming metal plating on the surface of the base material 2. At this time, the base material 2 becomes a cathode (minus), the electrode becomes an anode (plus), and metal ions in the plating solution are attracted to the base material 2, whereby metal plating is formed on the base material 2.

本例の電気メッキ装置1はメッキ漕3が中間の区画壁5によって2領域に区画され、電気メッキ時には母材2が第1メッキ漕3a、第2メッキ漕3bの順に各漕内のメッキ液4にそれぞれ浸される。本例の電気メッキ装置1は、母材2を先に潜らす第1メッキ漕3aで母材2に過電流を流し、母材2を後で潜らす第2メッキ漕3bで母材2に通常の電流を流して、母材2の表面に金属メッキを形成する処理を行う。   In the electroplating apparatus 1 of this example, a plating rod 3 is divided into two regions by an intermediate partition wall 5, and at the time of electroplating, the base material 2 is a plating solution in each cage in the order of the first plating rod 3a and the second plating rod 3b. 4 respectively. In the electroplating apparatus 1 of this example, an overcurrent is passed through the base material 2 by the first plating rod 3a in which the base material 2 is first hidden, and the base material 2 is applied by the second plating rod 3b in which the base material 2 is subsequently hidden. A process of forming a metal plating on the surface of the base material 2 is performed by passing a normal current.

母材2は、ロール状に巻かれてメッキ漕3の外部に設置されている。メッキ漕3の区画壁5及び一対の側壁6,7には、その下部に通し孔5a,6a,7aが貫設され、母材2はメッキに際して一方(図1に示す右側)の通し孔6aから第1メッキ漕3a内に導入され、区画壁5の通し孔5aを経由して、他方(図1に示す左側)の通し孔7aから第2メッキ漕3bの外部へ導出される。また、通し孔6a,7aから漏れ出たメッキ液4はメッキ漕3の下方にある貯留部8に一旦溜められ、そのメッキ液4はポンプ装置9によってメッキ漕3へ汲み上げられる。   The base material 2 is wound around a roll and installed outside the plating basket 3. The partition wall 5 and the pair of side walls 6 and 7 of the plating basket 3 are provided with through holes 5a, 6a and 7a in the lower part thereof, and the base material 2 is provided with one through hole 6a (on the right side in FIG. 1) during plating. Is introduced into the first plating rod 3a and led out of the second plating rod 3b from the other (left side in FIG. 1) through the through hole 5a of the partition wall 5. The plating solution 4 leaking from the through holes 6 a and 7 a is temporarily stored in the storage portion 8 below the plating basket 3, and the plating solution 4 is pumped up to the plating basket 3 by the pump device 9.

本例の電気メッキ装置1は、メッキ液4としてシアン化銀の溶融した溶液を用いるため、銅等の母材2の表面に金属メッキとして銀メッキ10(図2参照)を形成する。電気メッキ装置1で母材2に銀メッキ10を形成する際、メッキ液4には例えば粒径が1〜20μm程度のグラファイト粒子11の粉末(以下、グラファイト粒子と記す)が混入される。従って、メッキ処理時に銀成分が母材2に付着する際、銀とともに粉末のグラファイト粒子11も取り込まれ、図2(a)〜(c)に示すように銀メッキ10にはグラファイト粒子11が分散状態で含有した状態となる。なお、銀メッキ10が金属メッキに相当する。   Since the electroplating apparatus 1 of this example uses a molten solution of silver cyanide as the plating solution 4, a silver plating 10 (see FIG. 2) is formed as a metal plating on the surface of a base material 2 such as copper. When the silver plating 10 is formed on the base material 2 by the electroplating apparatus 1, the plating solution 4 is mixed with powder of graphite particles 11 having a particle size of about 1 to 20 μm (hereinafter referred to as graphite particles). Therefore, when the silver component adheres to the base material 2 during the plating process, powder graphite particles 11 are also taken together with the silver, and the graphite particles 11 are dispersed in the silver plating 10 as shown in FIGS. It becomes the state contained in the state. The silver plating 10 corresponds to metal plating.

電気メッキ装置1で母材2上にグラファイト含有の銀メッキ10を形成する際、電気メッキの初期段階、つまり電気メッキ開始から一定期間内で過電流を流して銀メッキ10を形成する。この処理として、まずメッキに必要な量の母材2が順に巻き取られながら通し孔6aを介して第1メッキ漕3a内に導入される。第1メッキ漕3aに必要量の母材2がセットされるとその状態が保持され、第1メッキ漕3aに浸された電極(図示略)と母材2との間に過電流が流される。このとき、母材2に流される過電流の電流値は、通常の電流値(即ち、第2メッキ漕3bで母材2に流される電流値)に対して例えば3〜5倍の値に設定されている。   When the silver plating 10 containing graphite is formed on the base material 2 by the electroplating apparatus 1, the silver plating 10 is formed by flowing an overcurrent within a certain period from the initial stage of electroplating, that is, from the start of electroplating. In this process, first, the base material 2 of an amount necessary for plating is introduced into the first plating rod 3a through the through hole 6a while being wound up in order. When a necessary amount of the base material 2 is set on the first plating rod 3a, the state is maintained, and an overcurrent flows between an electrode (not shown) immersed in the first plating rod 3a and the base material 2. . At this time, the current value of the overcurrent that flows through the base material 2 is set to a value that is, for example, 3 to 5 times the normal current value (that is, the current value that flows through the base material 2 by the second plating rod 3b). Has been.

電気メッキで母材2に過電流を流した場合、過電流印加期間はメッキ速度が速くなるため、銀成分が母材2に付着する際には偏った状態で母材2に付着することから、図2(a)に示すように銀メッキ10は表面10aに大きな凹凸形状を有した状態(表面10aが粗い状態)で母材2に形成される。このとき、銀は電気的な結合によって母材2に付着するが、メッキ液4中のグラファイト粒子11は銀が母材2に付着するにあたってその銀に取り込まれた状態で銀メッキ10に取り付き、銀メッキ10の表面凹凸に包まれた状態で銀メッキ10内に分散する。   When an overcurrent is applied to the base material 2 by electroplating, the plating speed increases during the overcurrent application period, so that when the silver component adheres to the base material 2, it adheres to the base material 2 in a biased state. As shown in FIG. 2A, the silver plating 10 is formed on the base material 2 in a state where the surface 10a has a large uneven shape (the surface 10a is rough). At this time, silver adheres to the base material 2 due to electrical coupling, but the graphite particles 11 in the plating solution 4 are attached to the silver plating 10 in a state where the silver particles are taken into the silver when the silver adheres to the base material 2. The silver plating 10 is dispersed in the silver plating 10 in a state of being surrounded by surface irregularities.

過電流を所定時間流した後、母材2に過電流を流す処理が停止され、続いて第1メッキ漕3aでメッキ処理を施した部分が通し孔5aを介して第2メッキ漕3bに導入される。第1メッキ漕3aでメッキ処理を施した部分が第2メッキ漕3bにセットされるとその状態が保持され、第2メッキ漕3bに浸された電極(図示略)と母材2との間に通常値の電流が流される。通常値の電流が母材2に所定時間流されると、過電流を流してできた銀メッキ10の層上に新たに銀成分が積み重なって積層し、最終的には図2(b)に示すように必要とする層厚の銀メッキ10が母材2に形成される。   After passing the overcurrent for a predetermined time, the process of passing the overcurrent to the base material 2 is stopped, and the portion plated with the first plating rod 3a is subsequently introduced into the second plating rod 3b through the through hole 5a. Is done. When the portion plated with the first plating rod 3a is set on the second plating rod 3b, the state is maintained, and between the electrode (not shown) immersed in the second plating rod 3b and the base material 2 A normal value current is passed through. When a current having a normal value is passed through the base material 2 for a predetermined time, a silver component is newly stacked on the layer of the silver plating 10 formed by passing an overcurrent, and finally, as shown in FIG. Thus, a silver plating 10 having a required layer thickness is formed on the base material 2.

必要とする層厚の銀メッキ10が形成されると、母材2に通常値の電流を流す処理が停止され、続いて第2メッキ漕3bでメッキ処理を施した部分が通し孔7aから第2メッキ漕3bの外部に導出される。そして、過電流を流してから通常値の電流を流す電気メッキが、ロール状に巻かれた母材2の全箇所に銀メッキ10が形成されるまで繰り返し行われ、以上の処理によって製造された母材2が電気接点材料12として取り扱われる。   When the silver plating 10 having the required layer thickness is formed, the process of supplying a normal current to the base material 2 is stopped, and the portion plated with the second plating rod 3b is then passed through the through hole 7a. It leads out to the exterior of 2 plating cage | basket 3b. Then, electroplating in which normal current is passed after passing an overcurrent is repeatedly performed until the silver plating 10 is formed in all locations of the base material 2 wound in a roll shape, and manufactured by the above processing. The base material 2 is handled as the electrical contact material 12.

ところで、電気メッキに際して通常の電流値で銀メッキ10を形成すると、表面凹凸がそれほど大きくない銀メッキ10が形成される。しかし、本例は電気メッキの初期段階で過電流を流して、表面凹凸の大きい銀メッキ10を母材2に予め形成してそこに通常値の電流で銀成分を付着させる。従って、通常の低い電流値で電気メッキを施す場合であっても、予め凹凸の大きい銀メッキ10に銀成分が積み重なっていくため、最終的にできる銀メッキ10の表面は大きな凹凸形状を有した状態となる。   By the way, when the silver plating 10 is formed with a normal current value in the electroplating, the silver plating 10 with the surface unevenness not so large is formed. However, in this example, an overcurrent is passed in the initial stage of electroplating, and a silver plating 10 having large surface irregularities is previously formed on the base material 2 and a silver component is attached thereto at a normal current. Therefore, even when electroplating is performed at a normal low current value, since the silver component is previously stacked on the silver plating 10 having large unevenness, the surface of the finally formed silver plating 10 has a large uneven shape. It becomes a state.

また、銀メッキ10内に含有されたグラファイト粒子11は、銀メッキ10の表面凹凸に包まれた状態で銀メッキ10に取り付くため、銀メッキ10の凹凸形状が大きければ、銀メッキ10に多量のグラファイト粒子が取り付いた状態であると言える。従って、本例は電気メッキの初期段階で母材2に過電流を付与する処理を行うことで、銀メッキ10の表面凹凸が大きく形成されているため、その分だけグラファイト粒子11が多く取り付いた状態となる。よって、銀メッキ10の表面グラファイト面積比が大きくなり、銀メッキ10の耐摩耗性を高くすることが可能となる。   Further, since the graphite particles 11 contained in the silver plating 10 are attached to the silver plating 10 in a state of being wrapped in the surface unevenness of the silver plating 10, if the uneven shape of the silver plating 10 is large, the silver plating 10 has a large amount. It can be said that the graphite particles are attached. Therefore, in this example, the surface unevenness of the silver plating 10 is formed by performing the process of applying an overcurrent to the base material 2 in the initial stage of electroplating, and therefore the graphite particles 11 are attached by that much. It becomes a state. Therefore, the surface graphite area ratio of the silver plating 10 is increased, and the wear resistance of the silver plating 10 can be increased.

(母材表面加工処理)
図3は、母材2の表面2aを粗くする処理を行う際の斜視図である。銀メッキ10の表面凹凸を大きくする方法は電気メッキの初期段階で過電流を流す方法に代えて、母材2の表面2aを予め粗くする加工処理を施しておき、表面2aを粗くした母材2に後工程として電気メッキを施して、銀メッキ10の表面凹凸を大きくする方法もある。母材2の表面2aを予め粗くするには、例えばヤスリやショットブラスト等で粗くする例が挙げられるが、母材2の表面凹凸を粗くできるのであれば、その方法は特に限定されない。
(Base material surface treatment)
FIG. 3 is a perspective view when performing the process of roughening the surface 2 a of the base material 2. The method of enlarging the surface unevenness of the silver plating 10 is replaced with a method of flowing an overcurrent at the initial stage of electroplating, and a base material in which the surface 2a of the base material 2 is roughened in advance, and the base material 2 is roughened. There is also a method of enlarging the surface unevenness of the silver plating 10 by electroplating 2 as a post-process. In order to roughen the surface 2a of the base material 2 in advance, for example, a file or shot blasting may be used. However, the method is not particularly limited as long as the surface unevenness of the base material 2 can be roughened.

表面2aの粗い母材2に電気メッキを施すと、メッキ液4中の銀成分が母材2の表面2aに順次積み重なって銀メッキ10の層となるため、銀メッキ10は母材2の表面形状に沿った形状で形成される。従って、母材2の表面2aの凹凸が大きければ、母材2の表面2aにできる銀メッキ10も表面凹凸が大きい状態で形成される。よって、銀メッキ10の表面凹凸が大きければ、銀メッキ10に多量のグラファイト粒子11が取り付いた状態となり、表面グラファイト面積比が大きくなって、銀メッキ10の耐摩耗性を高くなる。   When electroplating is performed on the base material 2 having a rough surface 2 a, the silver component in the plating solution 4 is sequentially stacked on the surface 2 a of the base material 2 to form a layer of silver plating 10. It is formed in a shape along the shape. Therefore, if the unevenness of the surface 2a of the base material 2 is large, the silver plating 10 formed on the surface 2a of the base material 2 is also formed with a large surface unevenness. Therefore, if the surface unevenness of the silver plating 10 is large, a large amount of graphite particles 11 are attached to the silver plating 10, the surface graphite area ratio is increased, and the wear resistance of the silver plating 10 is increased.

(エッチング−再メッキ処理)
図4は、銀メッキ10を施した電気接点材料12をエッチングする際の説明図である。銀メッキ10の表面凹凸を大きくする方法は電気メッキの初期段階で過電流を流す方法や、母材2の表面2aを予め粗くしておく方法に限らず、銀メッキ10の施された電気接点材料12をエッチングし、それを再メッキする方法でもよい。なお、1回目の電気メッキで母材2に形成される銀メッキ10には、必ずしもグラファイト粒子11が含有される必要はなく、銀成分のみのメッキでもよい。
(Etching-re-plating process)
FIG. 4 is an explanatory diagram when the electrical contact material 12 subjected to the silver plating 10 is etched. The method of enlarging the surface unevenness of the silver plating 10 is not limited to a method of flowing an overcurrent in the initial stage of electroplating or a method of roughening the surface 2a of the base material 2 in advance, but an electrical contact provided with the silver plating 10 Alternatively, the material 12 may be etched and re-plated. Note that the silver plating 10 formed on the base material 2 by the first electroplating does not necessarily need to contain the graphite particles 11, and may be plating of only the silver component.

この処理ではまず最初に、例えば通常値の電流を流す電気メッキによって母材2に銀メッキ10を形成し、表層に銀メッキ10を有する電気接点材料12を用意する。続いて、電気接点材料12にエッチング処理を施す。このエッチング処理としては、まず図4に示すように電気接点材料12をエッチング漕13内のエッチング溶液14に浸してその表面を溶かし、その後、マスクによるパターニング処理を行なって銀メッキ10に表面凹凸を形成する。これにより、銀メッキ10の表面10aは表面凹凸がそれほど大きくない図5(a)に示す状態から、表面凹凸が大きくなった図5(b)に示す状態となる。   In this process, first, the silver plating 10 is formed on the base material 2 by, for example, electroplating in which a current having a normal value is passed, and the electrical contact material 12 having the silver plating 10 on the surface layer is prepared. Subsequently, the electrical contact material 12 is subjected to an etching process. As this etching process, first, as shown in FIG. 4, the electrical contact material 12 is immersed in an etching solution 14 in an etching bowl 13 to melt its surface, and then a patterning process using a mask is performed to make the surface of the silver plating 10 uneven. Form. Thereby, the surface 10a of the silver plating 10 is changed from the state shown in FIG. 5A where the surface unevenness is not so large to the state shown in FIG. 5B where the surface unevenness is increased.

エッチング処理後、その電気接点材料12に電気メッキを再度施す。即ち、エッチング処理の施された電気接点材料12を電気メッキ装置1に再度セットし、この電気接点材料12とメッキ液4内の電極との間に直流電圧を印加して、電気接点材料12の表面に銀成分を積層させて銀メッキ10を再形成する。なお、この再メッキのメッキ条件(例えばメッキ時に付与する電流値)は、最初に行う電気メッキと同条件でもよいし、或いは異なっていてもよい。   After the etching process, the electric contact material 12 is subjected to electroplating again. That is, the electrical contact material 12 subjected to the etching process is set again in the electroplating apparatus 1, and a DC voltage is applied between the electrical contact material 12 and the electrode in the plating solution 4 to A silver component is laminated on the surface to re-form the silver plating 10. The re-plating plating conditions (for example, the current value applied during plating) may be the same as or different from the initial electroplating.

表面凹凸の大きい銀メッキ10に電気メッキを再度施すと、メッキ液4中の銀成分が銀メッキ10の表面10aに順次積み重なって積層状態となっていくため、再メッキ時の銀メッキ10はエッチング後の銀メッキ10の表面形状に沿った形状で形成される。従って、本例はエッチングで表面凹凸を粗くした銀メッキ10の表面に銀メッキ10を再メッキすることから、最終的な銀メッキ10の表層は図5(c)に示すように表面凹凸が大きくなった状態となる。よって、銀メッキ10の表面凹凸が大きければ、銀メッキ10に多量のグラファイト粒子11が取り付いた状態となり、表面グラファイト面積比が大きくなって、銀メッキ10の耐摩耗性を高くなる。   When the electroplating is again applied to the silver plating 10 having a large surface irregularity, the silver component in the plating solution 4 is sequentially stacked on the surface 10a of the silver plating 10 to form a laminated state. It is formed in a shape along the surface shape of the later silver plating 10. Therefore, in this example, since the silver plating 10 is re-plated on the surface of the silver plating 10 whose surface unevenness is roughened by etching, the surface layer of the final silver plating 10 has a large surface unevenness as shown in FIG. It becomes a state. Therefore, if the surface unevenness of the silver plating 10 is large, a large amount of graphite particles 11 are attached to the silver plating 10, the surface graphite area ratio is increased, and the wear resistance of the silver plating 10 is increased.

(レーザ処理)
図6は、レーザ装置15の概略構成を示す模式構成図である。ところで、銀メッキ10を有する電気接点材料12に高温化処理(リフロー処理)を施して、銀メッキ10に含有されたグラファイト粒子11の定着性を高めてもよい。レーザ装置15は、高温化処理として加工物にレーザを照射することで加工物を溶融する装置である。レーザ装置15は、電気接点材料12を密閉状態で収容する処理室16と、処理室16内に取り付けられたレーザ照射部17と、処理室16を真空(非酸化雰囲気)に減圧する真空ポンプ18とを備えている。レーザ装置15は、レーザ照射部17を所定方向に往復動させる駆動機構19と、レーザ照射部17の往復動方向と直交する方向に加工物を搬送する搬送機構20とを備えている。
(Laser processing)
FIG. 6 is a schematic configuration diagram showing a schematic configuration of the laser device 15. Incidentally, the electrical contact material 12 having the silver plating 10 may be subjected to a high temperature treatment (reflow treatment) to improve the fixability of the graphite particles 11 contained in the silver plating 10. The laser device 15 is a device that melts a workpiece by irradiating the workpiece with a laser as a high-temperature treatment. The laser device 15 includes a processing chamber 16 that accommodates the electrical contact material 12 in a sealed state, a laser irradiation unit 17 attached in the processing chamber 16, and a vacuum pump 18 that decompresses the processing chamber 16 to a vacuum (non-oxidizing atmosphere). And. The laser device 15 includes a drive mechanism 19 that reciprocates the laser irradiation unit 17 in a predetermined direction, and a conveyance mechanism 20 that conveys a workpiece in a direction orthogonal to the reciprocation direction of the laser irradiation unit 17.

続いて、レーザ装置15で電気接点材料12を溶融する手順を説明すると、レーザ処理を行う際には、メッキ処理後に所定面積の平板に切断された電気接点材料12がレーザ装置15の処理室16にセットされ、続けて処理室16の内部が真空ポンプ18によって真空状態に減圧される。なお、処理室16は必ずしも真空状態とされることに限らず、非酸化雰囲気であれば足りる。   Next, a procedure for melting the electrical contact material 12 with the laser device 15 will be described. When performing the laser processing, the electrical contact material 12 cut into a flat plate of a predetermined area after the plating processing is processed in the processing chamber 16 of the laser device 15. Then, the inside of the processing chamber 16 is decompressed to a vacuum state by the vacuum pump 18. Note that the processing chamber 16 is not necessarily in a vacuum state, and a non-oxidizing atmosphere is sufficient.

処理室16内が真空状態となった後、レーザ照射部17は駆動機構19によって往動を開始し、その往動の過程で、処理室16内にセットされた電気接点材料12にレーザを照射し、銀メッキ10の表面10aにおいて1ライン目を溶融する。ここで、銀の融点が約962℃、グラファイト粒子11の融点が約3550℃であるため、レーザ照射部17による溶融温度は、母材2の融点よりも低く、しかも銀メッキ10のみを溶融すべく約1000℃〜1500℃に設定されている。   After the inside of the processing chamber 16 is in a vacuum state, the laser irradiation unit 17 starts the forward movement by the drive mechanism 19, and the electric contact material 12 set in the processing chamber 16 is irradiated with the laser in the course of the forward movement. Then, the first line is melted on the surface 10 a of the silver plating 10. Here, since the melting point of silver is about 962 ° C. and the melting point of the graphite particles 11 is about 3550 ° C., the melting temperature by the laser irradiation unit 17 is lower than the melting point of the base material 2 and only the silver plating 10 is melted. Therefore, it is set to about 1000 ° C to 1500 ° C.

レーザ照射部17が1往動を終えると、搬送機構20が電気接点材料12を所定量搬送する。続いて、今度はレーザ照射部17が復動を開始し、その復動の過程で銀メッキ10にレーザを照射して銀メッキ10の表面10aにおいて2ライン目を溶融する。そして、レーザ照射部17が1復動を終えると、搬送機構20が電気接点材料12を所定量だけ再度搬送し、これ以降も上記と同様にレーザ照射部17によるレーザ照射と電気接点材料12の搬送とが、銀メッキ10の全ラインにレーザ照射が行われるまで繰り返し行われる。   When the laser irradiation unit 17 finishes one forward movement, the transport mechanism 20 transports the electrical contact material 12 by a predetermined amount. Subsequently, the laser irradiation unit 17 starts to move backward, and in the process of moving backward, the silver plating 10 is irradiated with a laser to melt the second line on the surface 10 a of the silver plating 10. When the laser irradiation unit 17 completes one backward movement, the transport mechanism 20 transports the electrical contact material 12 again by a predetermined amount. Thereafter, the laser irradiation by the laser irradiation unit 17 and the electrical contact material 12 are performed in the same manner as described above. The conveyance is repeated until laser irradiation is performed on all the lines of the silver plating 10.

従って、銀メッキ10の表面10aが溶融されるので、その溶融した銀成分がグラファイト粒子11の間にある隙間に流れ込み、図2(c)に示すように溶融した銀成分が銀メッキ10の凹凸を埋め、グラファイト粒子11の周囲が銀成分で満たされる。よって、溶融した銀成分が銀メッキ10内のグラファイト粒子11を周囲で強く固定し、グラファイト粒子11の定着性が高まる。これにより、グラファイト粒子11が銀メッキ10から脱落し難くなり、銀メッキ10(電気接点材料12)の耐摩耗性が向上する。   Accordingly, since the surface 10a of the silver plating 10 is melted, the melted silver component flows into the gaps between the graphite particles 11, and the melted silver component is uneven in the silver plating 10 as shown in FIG. The graphite particles 11 are filled with a silver component. Therefore, the melted silver component strongly fixes the graphite particles 11 in the silver plating 10 around, and the fixability of the graphite particles 11 is enhanced. Thereby, it becomes difficult for the graphite particles 11 to fall off from the silver plating 10, and the wear resistance of the silver plating 10 (electrical contact material 12) is improved.

(炉による加熱処理)
図7は、炉装置21の概略構成を示す模式構成図である。銀メッキ10の表面10aを溶融する方法は、上記したレーザ処理に限らず、例えば炉装置21による加熱処理でもよい。炉装置21は、加工物を炉22の中に入れて炉22の内部を高温化して加工物を溶融する装置である。炉装置21は、電気接点材料12を密封状態で収容する処理室23と、処理室23内の温度を高温化する熱源24と、処理室23を真空(非酸化雰囲気)状態とする真空ポンプ25とを備えている。
(Heat treatment by furnace)
FIG. 7 is a schematic configuration diagram showing a schematic configuration of the furnace device 21. The method for melting the surface 10a of the silver plating 10 is not limited to the laser processing described above, and for example, heat treatment using the furnace device 21 may be used. The furnace apparatus 21 is an apparatus that puts a workpiece into the furnace 22 and raises the temperature inside the furnace 22 to melt the workpiece. The furnace device 21 includes a processing chamber 23 that houses the electrical contact material 12 in a sealed state, a heat source 24 that raises the temperature in the processing chamber 23, and a vacuum pump 25 that places the processing chamber 23 in a vacuum (non-oxidizing atmosphere) state. And.

続いて、炉装置21で電気接点材料12を溶融する手順を説明すると、炉22による加熱処理を行う際には、メッキ処理後に所定面積の平板に切断された電気接点材料12が炉22の処理室23にセットされ、続けて処理室23の内部が真空ポンプ25によって真空状態に減圧される。なお、処理室23はレーザ処理の場合と同様に、必ずしも真空状態とされることに限らず、非酸化雰囲気であれば足りる。また、熱源24は例えば高周波加熱用熱源等の種々のものが採用される。   Next, the procedure for melting the electrical contact material 12 in the furnace apparatus 21 will be described. When performing the heat treatment by the furnace 22, the electrical contact material 12 cut into a flat plate having a predetermined area after the plating process is processed in the furnace 22. Then, the inside of the processing chamber 23 is decompressed to a vacuum state by the vacuum pump 25. Note that, as in the case of laser processing, the processing chamber 23 is not necessarily in a vacuum state, and may be a non-oxidizing atmosphere. Various heat sources 24 such as a high-frequency heating heat source are used.

処理室23内が真空状態となった後、熱源24に電源が投入されて処理室23の温度が高温化すると、銀メッキ10の表面10aが溶融する。ここで、炉22による加熱処理の溶融温度は、レーザ処理の場合の同様の理由から約1000℃〜1500℃に設定されている。従って、炉22を用いた場合も銀メッキ10の表面10aが溶融するため、それによってグラファイト粒子11の定着性が高まり、レーザ処理の場合と同様に銀メッキ10の耐摩耗性が向上する。   After the inside of the processing chamber 23 is in a vacuum state, when the power is turned on to the heat source 24 and the temperature of the processing chamber 23 is increased, the surface 10a of the silver plating 10 is melted. Here, the melting temperature of the heat treatment in the furnace 22 is set to about 1000 ° C. to 1500 ° C. for the same reason in the case of the laser treatment. Therefore, even when the furnace 22 is used, the surface 10a of the silver plating 10 is melted, whereby the fixability of the graphite particles 11 is increased, and the wear resistance of the silver plating 10 is improved as in the case of laser processing.

(加圧処理)
図8は、加圧処理装置26の概略構成を示す模式構成図である。ここで、銀メッキ10内のグラファイト粒子11を銀メッキ10に定着する方法は高温化処理に限らず、圧力によって定着させる加圧処理でもよい。加圧処理装置26は、ローラ等で加工物を加圧することによって加工物の表面を塑性変形させる装置である。加圧処理装置26は、電気接点材料12を載置する支持台27と、回転動作が可能なローラ28と、ローラ28を所定圧で電気接点材料12に押しつけた状態でそのローラ28を所定方向(図8の矢印A方向)に移動させる駆動機構29とを備えている。
(Pressure treatment)
FIG. 8 is a schematic configuration diagram showing a schematic configuration of the pressure treatment device 26. Here, the method of fixing the graphite particles 11 in the silver plating 10 to the silver plating 10 is not limited to the high temperature processing, and may be a pressurizing process for fixing by pressure. The pressure treatment device 26 is a device that plastically deforms the surface of the workpiece by pressurizing the workpiece with a roller or the like. The pressure treatment device 26 includes a support base 27 on which the electrical contact material 12 is placed, a roller 28 capable of rotating, and the roller 28 pressed against the electrical contact material 12 with a predetermined pressure in a predetermined direction. And a drive mechanism 29 that moves in the direction of arrow A in FIG.

続いて、加圧処理装置26で電気接点材料12を加圧して電気接点材料12の表面を塑性変形させる手順を説明すると、加圧処理を行う際には、メッキ処理後に所定面積の平板に切断された電気接点材料12が支持台27にセットされる。そして、駆動機構29がローラ28を電気接点材料12に所定圧で押しつけ、その状態で駆動機構29がローラ28を図8の矢印A1方向に移動させて、ローラ28によって銀メッキ10の表面10a全域に圧を加える。この際にローラ28が銀メッキ10の表面10aにかける圧力値(所定圧)は、銀メッキ10の表面10aが塑性変形する程度の値に設定されている。   Next, the procedure for pressurizing the electrical contact material 12 with the pressure treatment device 26 to plastically deform the surface of the electrical contact material 12 will be described. When performing the pressure treatment, the plate is cut into a flat plate having a predetermined area after the plating treatment. The made electrical contact material 12 is set on the support base 27. Then, the drive mechanism 29 presses the roller 28 against the electrical contact material 12 with a predetermined pressure. In this state, the drive mechanism 29 moves the roller 28 in the direction of the arrow A1 in FIG. Pressure. At this time, the pressure value (predetermined pressure) that the roller 28 applies to the surface 10a of the silver plating 10 is set to a value at which the surface 10a of the silver plating 10 is plastically deformed.

従って、加圧処理によって銀メッキ10の表面10aを塑性変形させるので、図2(c)に示すように塑性変形した銀成分がグラファイト粒子11の周りに埋まった状態となる。よって、塑性変形した銀成分が銀メッキ10内のグラファイト粒子11を周囲で強く固定し、グラファイト粒子11の定着性が高まる。これにより、グラファイト粒子11が銀メッキ10から脱落し難くなり、銀メッキ10(電気接点材料12)の耐摩耗性が向上する。また、加圧処理で銀メッキ10内のグラファイト粒子11を定着する場合、その加圧処理によって銀メッキ10の表面硬度が高まるため、グラファイト粒子11が強固な状態で銀メッキ10に定着することになり、銀メッキ10の耐摩耗性が一層高いものとなる。   Therefore, since the surface 10a of the silver plating 10 is plastically deformed by the pressurizing process, the plastically deformed silver component is buried around the graphite particles 11 as shown in FIG. Therefore, the plastically deformed silver component strongly fixes the graphite particles 11 in the silver plating 10 around, and the fixability of the graphite particles 11 is enhanced. Thereby, it becomes difficult for the graphite particles 11 to fall off from the silver plating 10, and the wear resistance of the silver plating 10 (electrical contact material 12) is improved. Further, when the graphite particles 11 in the silver plating 10 are fixed by the pressure treatment, the surface hardness of the silver plating 10 is increased by the pressure treatment, so that the graphite particles 11 are firmly fixed on the silver plating 10. Thus, the wear resistance of the silver plating 10 is further increased.

ここで、メッキ表面表のグラファイト量によって表面グラファイト面積比Sは適宜決まるが、図9に表面グラファイト面積比Sとその耐久回数Nとの関係をグラフで示すと、表面グラファイト面積比Sによってその電気接点材料12の耐久回数Nが決まってくる。従って、耐久回数Nはターゲットとする製品仕様に異なってくるが、充分な耐摩耗性を確保するためには、図9のグラフからも分るように耐久回数Nが100万回確保された0.45以上に表面グラファイト面積比Sを設定することが望ましい。   Here, the surface graphite area ratio S is appropriately determined depending on the amount of graphite on the plating surface table. FIG. 9 is a graph showing the relationship between the surface graphite area ratio S and the number of times of durability N. The endurance number N of the contact material 12 is determined. Accordingly, the durability number N differs depending on the target product specifications. However, in order to ensure sufficient wear resistance, the durability number N is secured 1 million times as can be seen from the graph of FIG. It is desirable to set the surface graphite area ratio S to .45 or more.

本実施形態の構成によれば、以下に記載の効果を得ることができる。
(1)母材2に電気メッキを施す際、その初期段階で過電流を流すので、その過電流印加中はメッキ速度が速くなって、母材2に付着する銀成分に偏りが生じることから、メッキ表面の凹凸形状を大きくすることができる。従って、銀メッキ10の凹凸形状が大きくなれば、それに応じてグラファイト粒子11が多く取り付くため、銀メッキ10の表面グラファイト面積比Sが大きくなり、銀メッキ10の耐摩耗性を向上することができる。また、母材2の表面2aを予め粗くしておいて母材2に電気メッキを施す場合や、電気メッキで母材2に銀メッキ10を形成した後にエッチングを施し、エッチング後に電気メッキで母材2を再メッキする場合も、同様に銀メッキ10の表面凹凸形状を大きくすることができ、銀メッキ10の耐摩耗性を向上できる。
According to the configuration of the present embodiment, the following effects can be obtained.
(1) When electroplating the base material 2, an overcurrent flows at the initial stage, so that the plating speed increases during the overcurrent application, and the silver component adhering to the base material 2 is biased. The uneven shape of the plating surface can be increased. Therefore, if the irregular shape of the silver plating 10 is increased, a large number of graphite particles 11 are attached accordingly, so that the surface graphite area ratio S of the silver plating 10 is increased, and the wear resistance of the silver plating 10 can be improved. . Further, when the surface 2a of the base material 2 is roughened in advance and electroplating is performed on the base material 2, etching is performed after the silver plating 10 is formed on the base material 2 by electroplating, and the electroplating is performed after the etching. Similarly, when the material 2 is re-plated, the surface unevenness of the silver plating 10 can be increased, and the wear resistance of the silver plating 10 can be improved.

(2)電気メッキ時に過電流を流して銀メッキ10を形成する場合、過電流は電気メッキの初期段階に流されるので、電気メッキの初期段階から凹凸形状の大きな銀メッキ10が母材2の表層に形成される。従って、電気メッキの早い段階から凹凸形状の大きな銀メッキ10が形成されるため、銀メッキ10の層厚をそれほど厚くさせずに、表面凹凸の大きな銀メッキ10を形成することができる。   (2) When the silver plating 10 is formed by flowing an overcurrent during electroplating, the overcurrent flows in the initial stage of electroplating. It is formed on the surface layer. Accordingly, since the silver plating 10 having a large concavo-convex shape is formed at an early stage of electroplating, the silver plating 10 having a large surface concavo-convex shape can be formed without increasing the layer thickness of the silver plating 10 so much.

(3)母材2の表面2aを予め粗くしておいてその母材2に電気メッキを施す場合、母材2の表面2aをヤスリ等で削るという簡単な作業を行うだけで済むので、複雑で手間のかかる作業を行うことなく表面凹凸の大きな銀メッキ10を形成することができる。   (3) When the surface 2a of the base material 2 is roughened in advance and electroplating is performed on the base material 2, the surface 2a of the base material 2 needs only a simple work of shaving with a file or the like. Thus, the silver plating 10 having large surface irregularities can be formed without performing laborious work.

(4)銀メッキ10内には固体潤滑作用のあるグラファイト粒子11が含有されているので、グラファイト含有の銀メッキ10の施された本例の電気接点材料12はグリースレス摺動接点材料として使用することができる。従って、グリースやオイル等の潤滑剤を使用せずに済み、潤滑剤にかかるコストを不要とすることができ、しかもグリースやオイル等は低温下で硬化する性質があるが、この問題に対しても対応できる。   (4) Since the silver plating 10 contains graphite particles 11 having a solid lubricating action, the electrical contact material 12 of this example to which the graphite-containing silver plating 10 is applied is used as a greaseless sliding contact material. can do. Therefore, it is not necessary to use a lubricant such as grease or oil, the cost for the lubricant can be eliminated, and grease and oil are hardened at low temperatures. Can also respond.

なお、実施形態は上記構成に限定されず、以下の態様に変更してもよい。
・ 銀メッキ10は光沢メッキ、無光沢メッキのどちらでもよいが、無光沢メッキには表面凹凸が大きくなる性質があるため、無光沢メッキを採用すれば、銀メッキ10の表面凹凸を一層大きくすることができる。
In addition, embodiment is not limited to the said structure, You may change into the following aspects.
-The silver plating 10 may be either glossy plating or matte plating, but the matte plating has the property that the surface unevenness increases, so if the matte plating is adopted, the surface unevenness of the silver plating 10 is further increased. be able to.

・ 電気メッキ時に過電流を流して銀メッキ10を形成する場合、過電流を流すタイミングは電気メッキの初期段階に限らず、例えば電気メッキを通常の電流値で暫く(例えば10秒程度)行ってから、母材2に過電流を流す手順を経てもよい。   When the silver plating 10 is formed by flowing an overcurrent at the time of electroplating, the timing of flowing the overcurrent is not limited to the initial stage of electroplating, for example, by performing electroplating for a while (for example, about 10 seconds) at a normal current value From the above, a procedure for passing an overcurrent to the base material 2 may be performed.

・ 電機メッキ時に過電流を流して銀メッキ10を形成する場合、メッキ漕3は過電流用の第1メッキ漕3aと、通常電流用の第2メッキ漕3bとの2つに区画されることに限らず、メッキ漕3を1つの漕にして、過電流用と通常電流用とで共用してもよい。   When the silver plating 10 is formed by flowing an overcurrent during electroplating, the plating rod 3 is divided into two parts, a first plating rod 3a for overcurrent and a second plating rod 3b for normal current. The present invention is not limited to this, and the plating cage 3 may be used as a single cage for both overcurrent use and normal current use.

・ 銀メッキ10をエッチングしてそれを再メッキする場合、その際に用いるエッチング溶液は銅、塩酸、鉄、過酸化水素又は硫酸等の各種成分を用いた溶液であることに限らず、銀メッキ10の表面を溶解できるものであれば、その成分は特に限定されない。   -When etching the silver plating 10 and re-plating it, the etching solution used at that time is not limited to a solution using various components such as copper, hydrochloric acid, iron, hydrogen peroxide or sulfuric acid. The component is not particularly limited as long as it can dissolve 10 surfaces.

・ 金属メッキを電気メッキで形成する際、その金属メッキは銀メッキ10に限らず、例えば金メッキ、無電解ニッケルメッキ、クロムメッキ、ニッケルメッキ、はんだメッキ、錫メッキ、亜鉛メッキ等を採用してもよい。   -When metal plating is formed by electroplating, the metal plating is not limited to silver plating 10, but for example, gold plating, electroless nickel plating, chromium plating, nickel plating, solder plating, tin plating, zinc plating, etc. may be adopted. Good.

・ 母材2の表面2aを予め粗くしておいてメッキする場合や、銀メッキ10をエッチングしてそれを再メッキする場合、母材2のメッキ方法は電気メッキに限らず、例えば化学メッキ、溶融メッキ、物理蒸着、化学蒸着、浸透メッキ等を採用してもよい。   When the surface 2a of the base material 2 is roughened and plated, or when the silver plating 10 is etched and re-plated, the method of plating the base material 2 is not limited to electroplating, for example, chemical plating, Hot dipping, physical vapor deposition, chemical vapor deposition, penetration plating, or the like may be employed.

次に、上記実施形態及び別例から把握できる技術的思想について、それらの効果とともに以下に追記する。
(1)母材の表面に加工処理を施して予め粗くしておき、その表面が粗い母材にメッキを施して、前記母材の表面に金属メッキを形成することを特徴とする電気接点材料製造方法。この場合も、金属メッキの表面凹凸を大きくすることができる。
Next, technical ideas that can be grasped from the above-described embodiment and other examples will be described below together with their effects.
(1) An electrical contact material characterized in that the surface of the base material is processed to be roughened in advance, and the base material having a rough surface is plated to form a metal plating on the surface of the base material. Production method. Also in this case, the surface unevenness of the metal plating can be increased.

(2)母材にメッキを施して当該母材の表面に金属メッキを形成し、当該金属メッキを形成した該母材にエッチングを施して前記金属メッキの表面を溶解し、前記エッチング後の前記母材にメッキを再度施してエッチング後の前記母材の表面に前記金属メッキを形成することを特徴とする電気接点材料製造方法。この場合も、金属メッキの表面凹凸を大きくすることができる。   (2) Plating the base material to form a metal plating on the surface of the base material, etching the base material on which the metal plating is formed to dissolve the surface of the metal plating, A method for producing an electrical contact material, wherein the base material is plated again and the metal plating is formed on the surface of the base material after etching. Also in this case, the surface unevenness of the metal plating can be increased.

電気メッキ装置の概略構成を示す模式構成図。The schematic block diagram which shows schematic structure of an electroplating apparatus. (a)は電気メッキで過電流を流された際の電気接点材料の断面図、(b)は銀メッキのメッキ処理が完了した際の電気接点材料の断面図、(c)は電気メッキ後の電気接点材料に高温化処理(加圧処理)を施した際の電気接点材料の断面図。(A) is a cross-sectional view of the electrical contact material when an overcurrent is applied by electroplating, (b) is a cross-sectional view of the electrical contact material when the plating process of silver plating is completed, and (c) is after electroplating Sectional drawing of the electrical contact material at the time of giving high temperature processing (pressurization process) to the electrical contact material of. 母材の表面を粗くする際の作業状態を示す斜視図。The perspective view which shows the working state at the time of roughening the surface of a base material. 銀メッキを施した電気接点材料をエッチングする際の説明図。Explanatory drawing at the time of etching the electrical contact material which gave silver plating. (a)は1回目の電気メッキによって銀メッキが形成された電気接点材料の断面図、(b)は1回目の電気メッキの後にエッチングが施された後の電機接点材料の断面図、(c)はエッチング後の電気メッキの再メッキによって銀メッキが形成された電気接点材料の断面図。(A) is a cross-sectional view of an electrical contact material formed with silver plating by the first electroplating, (b) is a cross-sectional view of the electrical contact material after etching is performed after the first electroplating, (c) ) Is a cross-sectional view of an electrical contact material in which silver plating is formed by re-plating of electroplating after etching. レーザ装置の概略構成を示す模式構成図。The schematic block diagram which shows schematic structure of a laser apparatus. 炉装置の概略構成を示す模式構成図。The schematic block diagram which shows schematic structure of a furnace apparatus. 加圧処理装置の概略構成を示す模式構成図。The schematic block diagram which shows schematic structure of a pressurization processing apparatus. 表面グラファイト面積比とその耐久回数との関係を示すグラフ。The graph which shows the relationship between the surface graphite area ratio and its durability.

符号の説明Explanation of symbols

2…母材、2a…表面、4…メッキ液、10…金属メッキとしての銀メッキ、11…グラファイト粒子、12…電気接点材料。   DESCRIPTION OF SYMBOLS 2 ... Base material, 2a ... Surface, 4 ... Plating liquid, 10 ... Silver plating as metal plating, 11 ... Graphite particle, 12 ... Electrical contact material.

Claims (8)

メッキ液中に浸した母材と電極との間に電圧を印加して電気メッキを施し、前記メッキ液中の金属イオンを前記母材に付着させて前記母材の表面にグラファイト含有の金属メッキを形成する電気接点材料製造方法において、
前記母材と前記電極との間に電圧を印加する際、その電圧印加過程で過電流を流すことを特徴とする電気接点材料製造方法。
Electroplating is performed by applying a voltage between a base material immersed in a plating solution and an electrode, and metal ions contained in the plating solution are attached to the base material so that the surface of the base material is plated with graphite. In the electrical contact material manufacturing method for forming
When applying a voltage between the said base material and the said electrode, an overcurrent is sent in the voltage application process, The electrical contact material manufacturing method characterized by the above-mentioned.
前記過電流を流す期間は、前記電気メッキを開始してから一定期間内の初期段階であることを特徴とする請求項1に記載の電気接点材料製造方法。   The electrical contact material manufacturing method according to claim 1, wherein the period for supplying the overcurrent is an initial stage within a predetermined period after the electroplating is started. 母材の表面に加工処理を施して予め粗くしておき、その後工程の段階でメッキ液中に浸した前記母材と電極との間に電圧を印加して電気メッキを施し、前記メッキ液中の金属イオンを前記母材に付着させて前記母材の表面に金属メッキを形成することを特徴とする電気接点材料製造方法。   The surface of the base material is processed and roughened in advance, and then electroplating is performed by applying a voltage between the base material and the electrode immersed in the plating solution in the subsequent process step, in the plating solution A metal ion is formed on the surface of the base material by attaching the metal ions to the base material. メッキ液中に浸した母材と電極との間に電圧を印加して電気メッキを施し、前記メッキ液中の金属イオンを前記母材に付着させて前記母材の表面に金属メッキを形成し、当該金属メッキを形成した前記母材にエッチングを施して前記金属メッキの表面を溶解し、前記エッチング後の前記母材に前記電気メッキを再度施して、前記エッチング後の前記母材の表面に前記金属メッキを再度形成することを特徴とする電気接点材料製造方法。   Electroplating is performed by applying a voltage between a base material immersed in a plating solution and an electrode, and metal ions in the plating solution are attached to the base material to form a metal plating on the surface of the base material. The base material on which the metal plating is formed is etched to dissolve the surface of the metal plating, the electroplating is again applied to the base material after the etching, and the surface of the base material after the etching is applied. The method of manufacturing an electrical contact material, wherein the metal plating is formed again. 前記メッキ液中にはグラファイト粒子が混入され、前記母材に前記電気メッキが施された際には、前記金属メッキが前記グラファイト粒子を含有した状態で前記母材の表面に形成されることを特徴とする請求項1〜4のうちいずれか一項に記載の電気接点材料製造方法。   Graphite particles are mixed in the plating solution, and when the electroplating is performed on the base material, the metal plating is formed on the surface of the base material in a state containing the graphite particles. The electrical contact material manufacturing method according to any one of claims 1 to 4, wherein the electrical contact material is produced. メッキ液中に浸した母材と電極との間に電圧を印加して電気メッキを施し、前記メッキ液中の金属イオンを前記母材に付着させて前記母材の表面に金属メッキを形成し、前記母材と前記電極との間に電圧を印加する際、その電圧印加過程で過電流を流して製造されたことを特徴とする電気接点材料。   Electroplating is performed by applying a voltage between a base material immersed in a plating solution and an electrode, and metal ions in the plating solution are attached to the base material to form a metal plating on the surface of the base material. An electrical contact material manufactured by applying an overcurrent during the voltage application process when applying a voltage between the base material and the electrode. 母材の表面に加工処理を施して予め粗くしておき、その後工程の段階でメッキ液中に浸した前記母材と電極との間に電圧を印加して電気メッキを施し、前記メッキ液中の金属イオンを前記母材に付着させて前記母材の表面に金属メッキを形成したことを特徴とする電気接点材料。   The surface of the base material is processed and roughened in advance, and then electroplating is performed by applying a voltage between the base material and the electrode immersed in the plating solution in the subsequent process step, in the plating solution An electrical contact material characterized in that a metal plating is formed on the surface of the base material by adhering metal ions to the base material. メッキ液中に浸した母材と電極との間に電圧を印加して電気メッキを施し、前記メッキ液中の金属イオンを前記母材に付着させて前記母材の表面に金属メッキを形成し、当該金属メッキを形成した前記母材にエッチングを施して前記金属メッキの表面を溶解し、前記エッチング後の前記母材に前記電気メッキを再度施して、前記エッチング後の前記母材の表面に前記金属メッキを再度形成したことを特徴とする電気接点材料。   Electroplating is performed by applying a voltage between a base material immersed in a plating solution and an electrode, and metal ions in the plating solution are attached to the base material to form a metal plating on the surface of the base material. The base material on which the metal plating is formed is etched to dissolve the surface of the metal plating, the electroplating is again applied to the base material after the etching, and the surface of the base material after the etching is applied. An electrical contact material wherein the metal plating is formed again.
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008248295A (en) * 2007-03-29 2008-10-16 Furukawa Electric Co Ltd:The Plated material having lubricative particle, method of manufacturing the same and electric or electronic component using the same
JP2015125936A (en) * 2013-12-26 2015-07-06 株式会社徳力本店 Electric contact
JP2017014589A (en) * 2015-07-03 2017-01-19 Dowaメタルテック株式会社 Silver plated material and manufacturing method thereof
WO2023218810A1 (en) * 2022-05-11 2023-11-16 Dowaメタルテック株式会社 Composite material, method for producing composite material, and terminal

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JPS59121717A (en) * 1982-12-28 1984-07-13 神鋼電機株式会社 Method of surface treating contact
JPS59232297A (en) * 1983-06-13 1984-12-27 Furukawa Electric Co Ltd:The Production of particle dispersed metal coated material
JP2003082500A (en) * 2001-06-27 2003-03-19 Sharp Corp Method for forming plating film, and electronic component with plating film formed by the method

Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
JPS59121717A (en) * 1982-12-28 1984-07-13 神鋼電機株式会社 Method of surface treating contact
JPS59232297A (en) * 1983-06-13 1984-12-27 Furukawa Electric Co Ltd:The Production of particle dispersed metal coated material
JP2003082500A (en) * 2001-06-27 2003-03-19 Sharp Corp Method for forming plating film, and electronic component with plating film formed by the method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008248295A (en) * 2007-03-29 2008-10-16 Furukawa Electric Co Ltd:The Plated material having lubricative particle, method of manufacturing the same and electric or electronic component using the same
JP2015125936A (en) * 2013-12-26 2015-07-06 株式会社徳力本店 Electric contact
JP2017014589A (en) * 2015-07-03 2017-01-19 Dowaメタルテック株式会社 Silver plated material and manufacturing method thereof
WO2023218810A1 (en) * 2022-05-11 2023-11-16 Dowaメタルテック株式会社 Composite material, method for producing composite material, and terminal

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