JP2006322665A - Hollow laminate, plate type cooling member using it, and electronic apparatus using it - Google Patents

Hollow laminate, plate type cooling member using it, and electronic apparatus using it Download PDF

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JP2006322665A
JP2006322665A JP2005146149A JP2005146149A JP2006322665A JP 2006322665 A JP2006322665 A JP 2006322665A JP 2005146149 A JP2005146149 A JP 2005146149A JP 2005146149 A JP2005146149 A JP 2005146149A JP 2006322665 A JP2006322665 A JP 2006322665A
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layer
hollow
cooling member
type cooling
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Takahiro Hayashida
貴裕 林田
Masahito Uechi
将人 上地
Hiroyuki Yamane
博之 山根
Masaki Yoshikawa
雅紀 吉川
Shinji Ichijima
真司 市島
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Toyo Kohan Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a hollow laminate using an aluminum sheet which can be joined by low temperature soldering without requiring a large-scale pressure welding device, a plate type cooling member using it, and an electronic apparatus using it. <P>SOLUTION: The hollow laminate is formed by soldering and layering at least two surface treated Al sheets comprised by forming a Zn layer, an Ni layer or an Ni-Zn alloy layer, and an Sn layer in an order from base material side on an Al base material, so as to form a hollow part of a predetermined shape on a layered and adjacent opposing face. A heat pipe operating body is sealed in the hollow part to compose the plate type cooling member, and it is applied in a heat dissipation member or the like of the electronic apparatus. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、ハンダ付けが可能な表面処理Al薄板を用いた中空積層体、それを用いたプレート型冷却部材、およびそれを用いた電子機器に関する。   The present invention relates to a hollow laminate using a surface-treated Al thin plate that can be soldered, a plate-type cooling member using the same, and an electronic device using the same.

パーソナルコンピュータやゲーム機器などの各種電子機器において、高性能化および小型化が急速に進められている。高性能化および小型化を実現させるためには、これらの各種電子機器から発生する熱を効率よく放熱させるコンパクトな放熱器が求められている。   In various electronic devices such as personal computers and game machines, high performance and miniaturization are rapidly progressing. In order to realize high performance and miniaturization, a compact heat radiator that efficiently dissipates heat generated from these various electronic devices is required.

このような放熱器として、特許文献1にはアルミニウム合金材を複数枚積層圧着し、積層境界面に蛇行した細径のトンネルをロールボンド法を用いて形成し、そのトンネル内にヒートパイプ作動液としてフロン134aなどを封入した熱拡散板に用いられるプレート型ヒートパイプが提案されている。このプレート型ヒートパイプは、2枚の金属板を積層して熱間圧延して接合し、予め圧着防止剤を所定のパターンで塗布し未圧着となった境界面のパタン部を膨管して前記蛇行したトンネルを形成するものである。しかし、金属板を熱間圧延により接合するため母材の変形が大きく、トンネルの形状を精度良く形成できないばかりでなく、接合面における異種金属間の合金化などにより、接合強度が低下するなどの問題も生じる。   As such a heatsink, in Patent Document 1, a plurality of aluminum alloy materials are laminated and pressure-bonded, and a small-diameter tunnel meandering on the boundary surface of the lamination is formed by a roll bond method, and a heat pipe working liquid is formed in the tunnel. A plate type heat pipe has been proposed for use in a heat diffusion plate enclosing chlorofluorocarbon 134a and the like. This plate-type heat pipe is formed by laminating two metal plates, hot rolling and joining them, and applying an anti-crimping agent in a predetermined pattern in advance to expand the pattern portion of the boundary surface that has become non-crimped. The meandering tunnel is formed. However, since the metal plates are joined by hot rolling, the deformation of the base metal is large, and not only the tunnel shape cannot be formed with high accuracy, but also the joining strength decreases due to alloying between dissimilar metals on the joining surface, etc. Problems also arise.

また、特許文献2には、真空槽内で複数枚の金属板の隣り合う金属板の対向面が予め活性化処理され、活性化処理面に所定のパターンで圧着防止剤を塗布して同士が対向するように当接して重ね合わせて冷間圧接することにより、圧着抑止部が形成されたプレート積層体が提案されている。このプレート積層体において、前記圧着抑止部を膨らませることによりトンネル状の中空部を所定のパターンで形成し、中空部にヒートパイプ作動体を封入してプレート型ヒートパイプとしたものである。しかし、金属板を真空槽内で活性化処理するため、大型の金属板を大量に処理するためには大掛かりな真空処理装置を必用とし、また処理に時間を要するために、寸法の大きい金属板を用いて短時間に多量の処理を行なうことは、コスト的には不利にならざるを得ない欠点を有している。   Further, in Patent Document 2, the opposing surfaces of adjacent metal plates of a plurality of metal plates are pre-activated in a vacuum chamber, and an anti-bonding agent is applied to the activated surface in a predetermined pattern. There has been proposed a plate laminate in which a pressure-bonding suppressing portion is formed by abutting and overlapping so as to face each other and performing cold pressure welding. In this plate laminated body, a tunnel-shaped hollow portion is formed in a predetermined pattern by expanding the pressure-bonding suppressing portion, and a heat pipe working body is enclosed in the hollow portion to form a plate-type heat pipe. However, since the metal plate is activated in the vacuum chamber, a large-scale vacuum processing apparatus is required to process a large amount of the large metal plate, and the processing takes time. It is disadvantageous in terms of cost to perform a large amount of processing in a short period of time.

本出願に関する先行技術文献情報として次のものがある。
特開平10−185465号公報 特開2002−221397号公報
Prior art document information relating to the present application includes the following.
Japanese Patent Laid-Open No. 10-185465 Japanese Patent Application Laid-Open No. 2002-221397

本発明は、大掛かりな圧接装置を必用とせず、低温のハンダ付けで接合可能なアルミニウム薄板を用いた中空積層体、それを用いたプレート型冷却部材、およびそれを用いた電子機器を提供することを目的とする。   The present invention provides a hollow laminate using an aluminum thin plate that can be joined by low-temperature soldering without requiring a large pressure welding apparatus, a plate-type cooling member using the same, and an electronic device using the same. With the goal.

上記の目的を達成する本発明の中空積層体は、少なくとも2枚の表面処理Al薄板がハンダ付けして積層され、積層されて隣接した対向面に所定形状の中空部が形成されてなる中空積層体(請求項1)であり、
上記(請求項1)の中空積層体において、前記表面処理Al薄板の少なくとも一方に溝加工が施されてなること(請求項2)を特徴とし、また
上記(請求項1または2)の中空積層体において、
前記表面処理Al薄板が、Al薄板側から順にZn層、Ni層、Sn層を形成してなること(請求項3)、または
前記表面処理Al薄板が、Al薄板側から順にZn層、Ni−Zn合金層、Sn層を形成してなること(請求項4)を特徴とし、また
上記(請求項3または4)の中空積層体において、前記Sn層上にハンダ性を向上させる有機樹脂層を形成してなること(請求項5)を特徴とし、また
上記(請求項5)の中空積層体において、前記有機樹脂層がウレタン系樹脂であること(請求項6)を特徴とする。
The hollow laminated body of the present invention that achieves the above object is a hollow laminated body in which at least two surface-treated Al thin plates are laminated by soldering, and a hollow portion having a predetermined shape is formed on the adjacent opposing surfaces. Body (claim 1),
In the hollow laminate of the above (Claim 1), groove processing is performed on at least one of the surface-treated Al thin plates (Claim 2), and the hollow laminate of the above (Claim 1 or 2) In the body,
The surface-treated Al thin plate is formed by sequentially forming a Zn layer, a Ni layer, and a Sn layer from the Al thin plate side (Claim 3), or the surface-treated Al thin plate is a Zn layer, Ni- A Zn alloy layer and a Sn layer are formed (Claim 4), and in the hollow laminate of the above (Claim 3 or 4), an organic resin layer for improving solderability is formed on the Sn layer. It is characterized in that it is formed (Claim 5), and in the hollow laminate of the above (Claim 5), the organic resin layer is a urethane resin (Claim 6).

また本発明のプレート型冷却部材は、上記(請求項1〜6)のいずれかの中空積層体の前記中空部にヒートパイプ作動体を封入してなること(請求項7)を特徴とする。
さらに本発明の電子機器は、上記( 請求項7)のプレート型冷却部材を用いてなること(請求項8)を特徴とする。
The plate-type cooling member of the present invention is characterized in that a heat pipe operating body is enclosed in the hollow portion of any one of the above-described hollow laminates (invention 7).
Furthermore, an electronic apparatus according to the present invention is characterized by using the plate-type cooling member of the above (Claim 7) (Claim 8).

本発明の中空積層体は、Al薄板基材に基材側から順にZn層、Ni層またはNi−Zn合金層、Sn層を形成してなる表面処理Al薄板の少なくとも2枚がハンダ付けして積層され、積層されて隣接した対向面に所定形状の中空部が形成されてなる中空積層体であるので、従来のクラッド材を用いるような熱間圧延装置や真空処理装置のような大掛かりな圧接装置を必用とせず、低コストで製造することができる。そのため、本発明の中空積層体の中空部にヒートパイプ作動体を封入することにより、プレート型冷却部材を容易にかつ低コストで製造することが可能であり、そのプレート型冷却部材を用いた放熱用の電子機器も低コストで製造することができる。   In the hollow laminated body of the present invention, at least two surface-treated Al thin plates formed by forming a Zn layer, a Ni layer or a Ni—Zn alloy layer, and a Sn layer in this order from the substrate side on an Al thin plate substrate are soldered. Since this is a hollow laminate in which a hollow portion having a predetermined shape is formed on the adjacent opposing surfaces that are laminated, large pressure welding such as a hot rolling device or a vacuum processing device using a conventional clad material is used. It does not require an apparatus and can be manufactured at low cost. Therefore, by enclosing the heat pipe working body in the hollow portion of the hollow laminate of the present invention, the plate type cooling member can be manufactured easily and at low cost, and heat dissipation using the plate type cooling member is possible. Can be manufactured at low cost.

以下、本発明を詳細に説明する。本発明の中空積層体に適用する表面処理Al薄板の基板となるAlとしては、0.05〜1mmの厚さの純Al板およびJIS規格の1000系、2000系、3000系、5000系、6000系、7000系のいずれのAl合金も用いることができる。これらの純AlやAl合金からなるAl基板を脱脂し、次いで酸性エッチングし、引き続きスマットを除去した後、Znを置換めっきする。Znの置換めっきは、硝酸浸漬処理した後、Znによる置換めっき処理を行う。Zn置換めっき処理は第一Zn置換めっき処理、第二Zn置換めっき処理の2回の工程に分けて行ってもよい。この場合、各工程の処理後には水洗処理を実施する。この第一Zn置換めっき処理および第二Zn置換めっき処理により形成するZnめっき層は、この置換めっき処理後にNiめっきを施す際にわずかに溶解するので、Zn層の皮膜量としてはNiめっき後の状態で5〜500mg/mであることが好ましく、30〜300mg/mであることがより好ましい。皮膜量は処理液中のZnイオン濃度および第二Zn置換めっき処理において処理液中に浸漬する時間を適宜選択して調整する。皮膜量が5mg/m未満であるとZn層の上に形成するNiめっき層との密着性に乏しくなり、曲げ加工を施した際にめっき層が剥離しやすくなる。一方、皮膜量が500mg/mを超えるとNiめっきが不均一になり、ハンダ強度が低下する。 Hereinafter, the present invention will be described in detail. As Al used as the substrate of the surface-treated Al thin plate applied to the hollow laminate of the present invention, a pure Al plate having a thickness of 0.05 to 1 mm and JIS standard 1000 series, 2000 series, 3000 series, 5000 series, 6000 series. Both Al and 7000 series Al alloys can be used. These Al substrates made of pure Al or Al alloy are degreased, then acid-etched, and subsequently smut is removed, followed by Zn substitution plating. In the displacement plating of Zn, after immersion treatment with nitric acid, displacement plating treatment with Zn is performed. The Zn substitution plating treatment may be performed in two steps, a first Zn substitution plating treatment and a second Zn substitution plating treatment. In this case, the water washing process is implemented after the process of each process. The Zn plating layer formed by the first Zn substitution plating treatment and the second Zn substitution plating treatment is slightly dissolved when Ni plating is performed after the substitution plating treatment. It is preferable that it is 5-500 mg / m < 2 > in a state, and it is more preferable that it is 30-300 mg / m < 2 >. The coating amount is adjusted by appropriately selecting the Zn ion concentration in the treatment liquid and the time of immersion in the treatment liquid in the second Zn displacement plating treatment. When the coating amount is less than 5 mg / m 2 , the adhesion with the Ni plating layer formed on the Zn layer becomes poor, and the plating layer is easily peeled off when bending is performed. On the other hand, when the coating amount exceeds 500 mg / m 2 , the Ni plating becomes non-uniform and the solder strength decreases.

次いで、このようにして形成されたZn層の上にNi層をめっきにより形成する。Niめっきは電気めっき法または無電解めっき法のいずれを用いて形成してもよい。無電解めっき法を用いる場合は、還元剤としてP化合物やB化合物を用いるので、Niめっき皮膜はNi−P合金やNi−B合金からなる皮膜として形成するが、電気めっき法による純Niからなる皮膜と同様に、めっき皮膜のAl基板に対する密着性や、優れたハンダ濡れ性およびハンダ強度が得られる。このようにして得られるNi層は、皮膜量として0.2〜50g/mであることが好ましく、1〜10g/mであることがより好ましい。皮膜量が0.2g/m未満であるとNi層がZn層の全面を均一に被覆することができないので十分なハンダ強度が得られない。一方、皮膜量が50g/mを超えるとハンダ濡れ性およびハンダ強度の向上効果が飽和し、コスト的に有利でなくなる。 Next, a Ni layer is formed by plating on the Zn layer thus formed. Ni plating may be formed using either electroplating or electroless plating. When the electroless plating method is used, since a P compound or a B compound is used as a reducing agent, the Ni plating film is formed as a film made of a Ni-P alloy or a Ni-B alloy, but is made of pure Ni by electroplating. Similar to the coating, adhesion of the plating coating to the Al substrate, and excellent solder wettability and solder strength can be obtained. Thus Ni layer obtained is preferably 0.2 to 50 g / m 2 as a film weight, and more preferably 1 to 10 g / m 2. If the coating amount is less than 0.2 g / m 2 , the Ni layer cannot uniformly cover the entire surface of the Zn layer, and thus sufficient solder strength cannot be obtained. On the other hand, if the coating amount exceeds 50 g / m 2 , the effect of improving the solder wettability and the solder strength is saturated, which is not advantageous in terms of cost.

上記のようにZnを置換めっきし、次いでNiをめっきする場合、Al基板上に析出したZnがNiめっき時にNiめっき浴中にわずかに溶解するので、長時間の連続めっき作業によりNiめっき浴中にZnが増加した結果、置換めっきにより形成したZn層上にNi−Zn合金として形成するようになる。Niめっき浴中に溶解したZnを除去手段を用いて除去してもよいが、Zn層上にNiめっき層の替りにNi−Zn合金層が形成しても特に問題はない。   When Zn is plated as described above and then Ni is plated, Zn deposited on the Al substrate is slightly dissolved in the Ni plating bath during Ni plating. As a result of the increase in Zn, a Ni—Zn alloy is formed on the Zn layer formed by displacement plating. Although Zn dissolved in the Ni plating bath may be removed using a removing means, there is no particular problem even if a Ni—Zn alloy layer is formed on the Zn layer instead of the Ni plating layer.

次いで、公知の電気めっき法を用いてNi層上またはNi−Zn合金層上にSn層を形成する。Sn層はめっき皮膜量として0.2〜20g/mであることが好ましく、1〜10g/mであることがより好ましい。皮膜量が0.2g/m未満であると非活性のフラックスを用いた場合にハンダが濡れにくくなる。一方、皮膜量が20g/mを超えるとハンダ濡れ性およびハンダ強度の向上効果が飽和し、コスト的に有利でなくなる。また、Snめっき層を形成した後にSnの融点未満または融点以上の温度に加熱してNi層とSn層の間に合金層を形成して密着性を向上してもよい。 Next, an Sn layer is formed on the Ni layer or the Ni—Zn alloy layer using a known electroplating method. The Sn layer is preferably 0.2 to 20 g / m 2 and more preferably 1 to 10 g / m 2 in terms of the plating film amount. When the coating amount is less than 0.2 g / m 2 , solder becomes difficult to wet when an inactive flux is used. On the other hand, when the coating amount exceeds 20 g / m 2 , the effect of improving the solder wettability and the solder strength is saturated, which is not advantageous in terms of cost. Further, after forming the Sn plating layer, the adhesiveness may be improved by heating to a temperature lower than or higher than the melting point of Sn to form an alloy layer between the Ni layer and the Sn layer.

このようにしてAl基材上に基材側から順にZn層、Ni層またはNi−Zn合金層、Sn層を形成し、本発明の中空積層体用の表面処理Al薄板としてもよいが、さらにSn層上にハンダ性を向上させるために、ウレタン系樹脂などの有機樹脂層を形成してもよい。このハンダ性を向上させる有機樹脂層を形成することにより、Pb−Sn系ハンダよりもハンダ濡れ性の劣るPbフリーハンダや低融点ハンダなどを用いても、良好なハンダ接着強度が得られるようになる。すなわち、水系ウレタン樹脂または水溶性ロジンを含有させた水系アクリル樹脂をSn層上に塗布し乾燥させて有機樹脂層を形成する。これらの有機樹脂はフラックス効果を有しているのでハンダ濡れ性を向上させる。水系樹脂の濃度は100〜900g/Lであることが好ましい。乾燥後の有機樹脂層の厚さは0.01〜1μmであることが好ましい。0.01μm未満では充分なフラックス効果が得られず、1μmを超えてもフラックス効果の向上は飽和してコスト的に有利でなくなる。また、これらの有機樹脂層にカーボン粉末などの黒色顔料を含有させることにより、表面の放熱効果を向上させてもよい。以上のようにして、本発明の中空積層体用の表面処理Al板を得ることができる。   In this way, a Zn layer, a Ni layer or a Ni—Zn alloy layer, and a Sn layer may be formed in order from the substrate side on the Al substrate, and the surface-treated Al thin plate for the hollow laminate of the present invention may be used. An organic resin layer such as urethane resin may be formed on the Sn layer in order to improve solderability. By forming the organic resin layer that improves the solderability, good solder bond strength can be obtained even when using Pb-free solder or low-melting-point solder having poor solder wettability than Pb-Sn solder. Become. That is, a water-based acrylic resin containing a water-based urethane resin or a water-soluble rosin is applied on the Sn layer and dried to form an organic resin layer. Since these organic resins have a flux effect, solder wettability is improved. The concentration of the aqueous resin is preferably 100 to 900 g / L. The dried organic resin layer preferably has a thickness of 0.01 to 1 μm. If it is less than 0.01 μm, a sufficient flux effect cannot be obtained, and if it exceeds 1 μm, the improvement of the flux effect is saturated and is not advantageous in terms of cost. Moreover, you may improve the thermal radiation effect of the surface by making these organic resin layers contain black pigments, such as carbon powder. As described above, the surface-treated Al plate for the hollow laminate of the present invention can be obtained.

本発明の中空積層体は、少なくとも2枚の上記の表面処理Al薄板を隣接した対向面同士を、トンネル状などの所定形状の中空部を形成するようにしてハンダ付けして積層することにより、得ることができる。すなわち、図1に示すように、表面処理Al薄板の少なくとも一方1aに溝加工を施して溝加工部2を設けるか、予め溝加工を施したAl薄板にに上記の表面処理を施した後、溝加工部以外の部分3にクリームハンダ3aを塗布して他方の平板状の表面処理Al薄板1bを当接して積層し、ハンダの融点以上の温度に加熱することにより、中空部4を有する中空積層体10を得ることができる。溝加工部の溝の深さ2aは1mm以下であることが好ましい。   The hollow laminate of the present invention is formed by soldering and laminating at least two surface-treated Al thin plates adjacent to each other so as to form a hollow portion of a predetermined shape such as a tunnel shape, Obtainable. That is, as shown in FIG. 1, after grooving at least one surface 1a of the surface-treated Al thin plate to provide a grooved portion 2, or after applying the above surface treatment to a pre-grooved Al thin plate, Applying cream solder 3a to the portion 3 other than the groove processed portion, and contacting and laminating the other flat surface-treated Al thin plate 1b, and heating to a temperature equal to or higher than the melting point of the solder, the hollow having the hollow portion 4 The laminated body 10 can be obtained. It is preferable that the groove depth 2a of the groove processed portion is 1 mm or less.

また、図2に示すように、中空積層体10において、中空部4を連続したループ状のトンネルとして設け、封入口4aからヒートパイプ作動体として水、純粋、アルコールなどを封入して密封し、プレート状の冷却部材20とすることができる。このようにして本発明のプレート型冷却部材が得られる。本発明のプレート型冷却部材はノート型パーソナルコンピュータのような電子機器の放熱部材として、好適に適用することができる。   Further, as shown in FIG. 2, in the hollow laminated body 10, the hollow portion 4 is provided as a continuous loop-shaped tunnel, and water, pure, alcohol, etc. are sealed and sealed as a heat pipe operating body from the sealing port 4a. The plate-like cooling member 20 can be obtained. Thus, the plate type cooling member of the present invention is obtained. The plate type cooling member of the present invention can be suitably applied as a heat radiating member of an electronic device such as a notebook personal computer.

以下、実施例を示して本発明をさらに詳細に説明する。
[表面処理Al薄板の作成]
Al薄板(JIS 5052、厚さ:0.1mm)に、プレス加工により図2に示すような蛇行した溝加工部を形成した。この溝加工部を形成したAl薄板と、溝加工部を形成しない同一組成および同一厚さの平板状のAl薄板をめっき基材として、アルカリ液中で脱脂し、次いで硫酸中に浸漬するエッチング処理を施し、引き続いて硝酸中で脱スマット処理を施した後、水酸化ナトリウム:150g/L、ロッシェル塩:50g/L、酸化亜鉛:25g/L、塩化第一鉄:1.5g/Lを含む処理液中に浸漬する第一Zn置換めっき処理を行い、次いで400g/Lの硝酸水溶液中に浸漬して置換析出したZnを除去した後、第一Zn置換めっき処理で用いたのと同一の処理液中に浸漬して第二Zn置換めっき処理を行い、約200mg/mの皮膜量のZn層を形成したZnめっきAl薄板を得た。
Hereinafter, the present invention will be described in more detail with reference to examples.
[Creation of surface-treated aluminum sheet]
A meandering grooved portion as shown in FIG. 2 was formed on an Al thin plate (JIS 5052, thickness: 0.1 mm) by pressing. Etching treatment in which the Al thin plate in which the groove processed portion is formed and the flat Al thin plate having the same composition and the same thickness that does not form the groove processed portion are used as a plating base, degreased in an alkaline solution, and then immersed in sulfuric acid. And subsequently desmutting in nitric acid, sodium hydroxide: 150 g / L, Rochelle salt: 50 g / L, zinc oxide: 25 g / L, ferrous chloride: 1.5 g / L The same treatment as that used in the first Zn substitution plating treatment was performed after removing the Zn deposited by immersion in a 400 g / L aqueous nitric acid solution after performing the first Zn substitution plating treatment immersed in the treatment liquid. The Zn-plated Al thin plate in which a Zn layer having a coating amount of about 200 mg / m 2 was formed was obtained by immersing in the solution and performing a second Zn substitution plating treatment.

次いで、これらのZnめっきAl薄板に無電解めっき法を用いて、Zn層上にNi−12重量%P合金めっき皮膜を、約15g/mの皮膜量で形成し、引き続いてZn層とNi層を形成したAl薄板に下記に示す条件で電気めっき法を用いてNi層上にSnめっき皮膜を、約5g/mの皮膜量で形成した。 Next, using an electroless plating method on these Zn-plated Al thin plates, a Ni-12 wt% P alloy plating film was formed on the Zn layer with a film amount of about 15 g / m 2 , and subsequently the Zn layer and Ni An Sn plating film was formed on the Ni layer on the Al thin plate on which the layer was formed using the electroplating method under the conditions shown below at a film amount of about 5 g / m 2 .

[Snめっき条件]
浴組成 硫酸第一スズ 30g/L
フェノールスルホン酸 60g/L
エトキシ化α−ナフトール 5g/L
陽極 Sn板
撹拌 めっき浴の循環
浴温 50〜55℃
電流密度 10A/dm
[Sn plating conditions]
Bath composition Stannous sulfate 30g / L
Phenolsulfonic acid 60g / L
Ethoxylated α-naphthol 5g / L
Anode Sn plate stirring Circulating bath temperature of plating bath 50-55 ° C
Current density 10A / dm 2

次いで、Zn層、Ni層、およびSn層を形成したこれらのAl薄板を、水系ウレタン樹脂水溶液(樹脂濃度550g/L)中に浸漬した後乾燥し、0.3μmの厚さの有機樹脂層を形成した。このようにして、表面処理Al薄板を作成した。   Next, these Al thin plates on which the Zn layer, Ni layer, and Sn layer were formed were immersed in an aqueous urethane resin aqueous solution (resin concentration 550 g / L) and then dried to form an organic resin layer having a thickness of 0.3 μm. Formed. In this way, a surface-treated Al thin plate was prepared.

[中空積層体の作成]
以上のようにして作成した溝加工部を形成した表面処理Al薄板の片面の溝加工部以外の部分に、鉛フリーのクリームハンダ(M705(Sn−3.0Ag−0.5Cu)融点:220℃、千住金属株式会社製)を塗布し、ハンダ塗布面に溝加工部を形成しない平板状の表面処理Al薄板を当接し、250℃に加熱した電気オーブン中に挿入して30秒保持した後取り出して放冷した。このようにして、蛇行したループ状のトンネルの中空部を有する中空積層体を作成した。
[Creation of hollow laminate]
Lead-free cream solder (M705 (Sn-3.0Ag-0.5Cu) melting point: 220 ° C.) on the portion other than the grooved portion on one side of the surface-treated Al thin plate on which the grooved portion formed as described above is formed. , Manufactured by Senju Metal Co., Ltd.), a flat surface-treated Al thin plate that does not form a grooved portion on the solder coating surface is abutted, inserted into an electric oven heated to 250 ° C., held for 30 seconds, and then removed. And allowed to cool. Thus, the hollow laminated body which has the hollow part of the meandering loop-shaped tunnel was created.

[ヒートパイプの作成]
以上のようにして作成した中空積層体の封入口からヒートパイプ作動体としてイソプロピルアルコールを封入して密封し、プレート状のヒートパイプとした。
[Create heat pipe]
Isopropyl alcohol was sealed and sealed as a heat pipe working body from the sealing port of the hollow laminate produced as described above to obtain a plate-shaped heat pipe.

Al薄板基材に基材側から順にZn層、Ni層またはNi−Zn合金層、Sn層を形成してなる本発明の中空積層体は、表面処理Al薄板の少なくとも2枚をハンダ付けして積層し、積層隣接した対向面に所定形状の中空部を形成して中空積層体としたものであり、従来のクラッド材を用いるような熱間圧延装置や真空処理装置のような大がかりな圧接装置を必用とせず、低コストで中空積層体として製造することができる。そのため、本発明の中空積層体の中空部にヒートパイプ作動体を封入することにより、プレート型冷却部材を容易にかつ低コストで製造することが可能であり、そのプレート型冷却部材を用いた放熱用の電子機器も低コストで製造することができる。   The hollow laminate of the present invention in which a Zn layer, Ni layer or Ni—Zn alloy layer, and Sn layer are formed on an Al thin plate substrate in this order from the substrate side is obtained by soldering at least two surface-treated Al thin plates. A large pressure welding apparatus such as a hot rolling apparatus or a vacuum processing apparatus using a conventional clad material, in which a hollow portion having a predetermined shape is formed on opposite surfaces adjacent to each other. Can be manufactured as a hollow laminate at low cost. Therefore, by enclosing the heat pipe working body in the hollow portion of the hollow laminate of the present invention, the plate type cooling member can be manufactured easily and at low cost, and heat dissipation using the plate type cooling member is possible. Can be manufactured at low cost.

本発明の中空積層体の一例を示す概略断面図。The schematic sectional drawing which shows an example of the hollow laminated body of this invention. 本発明の冷却部材の一例を示す概略平面図。The schematic plan view which shows an example of the cooling member of this invention.

符号の説明Explanation of symbols

1a: 表面処理Al薄板
1b: 表面処理Al薄板
2 : 溝加工部
3 : 溝加工部以外の部分
3a: クリームハンダ
4 : 中空部
4a: 封入口
10 : 中空積層体
20 : 冷却部材
DESCRIPTION OF SYMBOLS 1a: Surface treatment Al thin plate 1b: Surface treatment Al thin plate 2: Groove processing part 3: Parts other than a groove processing part 3a: Cream solder 4: Hollow part 4a: Enclosure 10: Hollow laminated body 20: Cooling member

Claims (8)

少なくとも2枚の表面処理Al薄板がハンダ付けして積層され、積層されて隣接した対向面に所定形状の中空部が形成されてなる中空積層体。 A hollow laminated body in which at least two surface-treated Al thin plates are laminated by soldering, and a hollow portion having a predetermined shape is formed on the adjacent opposing surfaces. 前記表面処理Al薄板の少なくとも一方に溝加工が施されてなる、請求項1に記載の中空積層体。 The hollow laminated body according to claim 1, wherein groove processing is applied to at least one of the surface-treated Al thin plates. 前記表面処理Al薄板が、Al薄板側から順にZn層、Ni層、Sn層を形成してなることを特徴とする、請求項1または2に記載の中空積層体。 The hollow laminate according to claim 1 or 2, wherein the surface-treated Al thin plate is formed by forming a Zn layer, a Ni layer, and a Sn layer in this order from the Al thin plate side. 前記表面処理Al薄板が、Al薄板側から順にZn層、Ni−Zn合金層、Sn層を形成してなることを特徴とする、請求項1または2に記載の中空積層体。 The hollow laminate according to claim 1, wherein the surface-treated Al thin plate is formed by forming a Zn layer, a Ni—Zn alloy layer, and a Sn layer in this order from the Al thin plate side. 前記Sn層上にハンダ性を向上させる有機樹脂層を形成してなることを特徴とする、請求項3または4に記載の中空積層体。 The hollow laminate according to claim 3 or 4, wherein an organic resin layer for improving solderability is formed on the Sn layer. 前記有機樹脂層がウレタン系樹脂であることを特徴とする、請求項5に記載の中空積層体。 The hollow laminate according to claim 5, wherein the organic resin layer is a urethane resin. 請求項1〜6のいずれかに記載の中空積層体の前記中空部にヒートパイプ作動体を封入してなるプレート型冷却部材。 The plate-type cooling member formed by enclosing a heat pipe operation body in the said hollow part of the hollow laminated body in any one of Claims 1-6. 請求項7に記載のプレート型冷却部材を用いてなる電子機器。
An electronic device using the plate-type cooling member according to claim 7.
JP2005146149A 2005-05-19 2005-05-19 Hollow laminate, plate type cooling member using it, and electronic apparatus using it Pending JP2006322665A (en)

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