JP2007042300A - Mass separation device, ion beam generating device, function element, manufacturing method of function element, and ion beam generation method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To perform a mass separation of high accuracy even for an ion beam of large area. <P>SOLUTION: The mass separation device 10 is provided with a nearly folding fan-shaped deflection case 1; hollow-core solenoid-shaped current passages 2 composed of an inlet part conductor 22, an outlet part conductor 2d, an outer diameter side conductor 2a, and an inner diameter side conductor 2b; inlet part magnetic shielding 7c arranged so as to face the inlet part conductor 2c; and outlet part magnetic shielding 7d arranged so as to face the outlet part conductor 2d. A uniform magnetic field is formed inside the current passage 2 composed of the inlet part conductor, the outlet part conductor, the outer diameter side conductor, and the inner diameter side conductor, and leakage of magnetic field toward outside of the current passage 2 is prevented by the inlet part magnetic shielding 7c and the outlet part magnetic shielding 7d. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a mass separator that separates a plurality of types of ions having different masses contained in an ion beam, and a semiconductor device such as a semiconductor integrated circuit (IC) or a thin film transistor (TFT) liquid crystal element equipped with the mass separator. In the manufacturing process, in order to form a semiconductor of a predetermined conductivity type, an ion beam generator that performs an ion implantation (ion doping) process on the semiconductor, and a high-accuracy manufactured using this ion beam generator Functional element such as a low carrier density conductive layer of an LDD structure transistor requiring ion implantation, a transistor having a channel portion into which low dose ions are implanted for threshold voltage adjustment, a method of manufacturing the functional element, and the ion The present invention relates to an ion beam generation method using a beam generator.

  For example, in a manufacturing process of a semiconductor device such as an IC (semiconductor integrated circuit) or a thin film transistor (TFT) liquid crystal element, an ion implantation (ion doping) process is performed on the semiconductor in order to form a semiconductor of a predetermined conductivity type. .

  In this ion implantation (ion doping) process, in addition to the conventional requirement of implanting a specific ion species into a semiconductor with high accuracy, in recent years, a larger area ion implantation process has been required. . For this reason, a mass separation apparatus capable of stably performing high-precision mass separation (ion species separation) even for a large-area ion beam is desired.

  As a mass separation apparatus that meets this requirement, for example, in Patent Document 1, a uniform magnetic field is formed using an air-core excitation current path so that mass separation (ion species separation) can be performed even for a wide ion beam. An apparatus is disclosed.

  FIG. 14 is a cross-sectional perspective view of a main part showing a schematic configuration example of a conventional mass separation device disclosed in Patent Document 1, and FIG. 15 illustrates a configuration example of a main part of the air-core excitation current path of FIG. It is a perspective view for doing.

  14 and 15, the mass separator 100 includes an ion deflection casing 101 and an air-core excitation current path 102.

  The ion deflection casing 101 is an ion deflection casing having a fan-shaped side surface, through which an ion beam passes.

  The air-core excitation current path 102 is configured by winding a conductor spirally around the ion deflection casing 101 at a predetermined interval.

  The conductors forming the air-core excitation current path 102 are a plurality of outer arcuate conductors 102a arranged at a predetermined interval outside the large diameter (outer diameter) side of the ion deflection casing 101, and the small diameter (inner diameter) side of the ion deflection casing 101. And a plurality of linear conductors 102c and 102d arranged at the required intervals respectively at the inlet portion 103 and the outlet portion 104 of the ion deflection casing 101. . These conductors 102a, 102b, 102c and 102d are sequentially connected to form a spiral air-core exciting current path 102 wound outside the ion deflection casing 101.

  Each of the conductors 102a, 102b, 102c, and 102d is surrounded by, for example, a cylindrical outer conductor 105 via pure water, and each of the outer conductors 105 is electrically connected to each other and is empty. The potential of the core excitation current path 102 is shielded. 14 and 15, only the outer conductors 105c and 105d surrounding the conductors 102c and 102d are shown. Here, the outer conductors surrounding the conductors 102a and 102b are not shown.

  In the air-core exciting current path 102, a required gap S is formed between the conductors of the outer conductor 105c (or the straight conductor 102c) of the inlet 103, and the ion beam Ia is passed through the gap S through the ion deflection casing. 101 is introduced. Similarly, a necessary gap S is formed between the conductors of the outer conductor 105d (or the straight conductor 102d) of the outlet 104, and the mass is separated inside the ion deflection casing 101 through the gap S. The ion beam Ic is led out to the outside. Note that both end portions in the longitudinal direction of the outer conductor 105 d of the outlet portion 104 are closed by the shielding member 106.

  Inside the ion deflection casing 101, a magnetic field Hin (y) is generated by the air-core excitation current path 102, and the trajectory of each ion contained in the ion beam Ia is curved by the action of the magnetic field Hin (y). Among the ions whose trajectories are curved, ions of a specific mass bent with a specific trajectory radius (or a specific range of trajectory radii) are formed in the outer conductor 105d (or the straight conductor 102d) at the opening 106d of the shielding member 106. The ion beam Ic is led out to the outside as an ion beam Ic.

  According to the above configuration, the air core exciting current path 102 is formed by winding the conductors 102a, 102b, 102c and 102d spirally around the ion deflection casing 101 at a required interval. Even if the shape 102 is long in the y direction in the figure, a uniform magnetic field Hin (y) can be formed in the longitudinal direction (y direction).

Since the ion beam is bent inside the air-core excitation current path 102 by the action of the uniform magnetic field Hin (y), even if the ion beam is wide in the magnetic field direction (y direction) The ion beam can be bent uniformly. Therefore, mass separation can be performed even for a large area (wide) ion beam.
Japanese Patent Laid-Open No. 2002-203805

  The conventional mass separation apparatus 100 can perform mass separation even for a wide ion beam by using the air-core excitation current path 102 to form a uniform magnetic field Hin (y) therein. .

  However, in this conventional mass separation apparatus 100, there is a possibility that mass separation with desired accuracy may not always be performed due to the influence of a magnetic field leaked to the outside of the air-core excitation current path 102. This problem will be described in detail below with reference to FIGS.

  FIG. 16 is a diagram illustrating a magnetic field formed by the air-core excitation current path 102 of the conventional mass separator 100 of FIG.

  As shown by a thick broken line in FIG. 16, in this air-core exciting current path 102, a magnetic field Hin (y) in the y direction (the positive direction of the y axis) is formed inside, while the outward direction is opposite. A magnetic field Hout (y) in the negative direction of the y-axis is formed. That is, a looped magnetic field is formed.

  For this reason, the inside of the ion deflection casing 101 (air-core excitation current path) is located on the upstream side of the inlet portion 103 (straight conductor 102c) of the ion deflection casing 101 and on the rear side of the outlet portion 104 (straight conductor 102d). This means that a magnetic field in the opposite direction is acting.

  Therefore, the ion beam that should be bent as shown in FIG. 17A is actually bent as shown in FIG. 17B. That is, on the front stage side from the entrance portion 103, the ion beam Ia is inclined upward by the action of the magnetic field from the front side to the back side of the sheet. Further, the ion beam Ia tilted upward is curved as indicated by Ib in the figure by the action of a magnetic field from the back of the paper to the front inside the air-core excitation current path 102. Further, the ion beam Ic is inclined to the right side in the figure by the action of the magnetic field from the front side to the back side of the paper surface on the rear side of the exit portion 104.

  Among the above, the inclination of the ion beam on the upstream side of the entrance portion 103 changes the incident angle of the ion beam to the ion deflection casing 101 (or the air-core excitation current path 102). It directly affects the ion beam curvature. In addition, the inclination of the ion beam on the rear stage side from the outlet portion 104 affects the passage state of the slit in the case where the slit is disposed on the rear stage side of the mass separation apparatus 100.

  As described above, in the conventional mass separation apparatus 100, the ion beam is bent in a state different from the originally desired state due to the influence of the leakage magnetic field, so that there is a possibility that desired mass separation cannot be performed.

  The present invention solves the above-described conventional problems, and suppresses a leakage magnetic field to the outside of the air-core excitation current path, thereby enabling high-precision mass separation (even for a large area (wide) ion beam). Mass separation apparatus capable of stably performing (ion species separation), an ion beam generation apparatus equipped with the mass separation apparatus, a functional element manufactured using the ion beam generation apparatus, a method of manufacturing the functional element, and An object of the present invention is to provide an ion beam generation method using the ion beam generator.

  The mass separator of the present invention is an air-core solenoid-like shape that generates a magnetic field in a mass separator that separates one or more kinds of ions contained in the ion beam by curving the trajectory of the ion beam by the action of a magnetic field. A plurality of entrance-portion magnetic shields arranged at a predetermined interval opposite to the entrance-portion conductor, and the air-core solenoid-like current-path; And at least one magnetic shield of a plurality of exit portion magnetic shields arranged at a required interval facing the conductor of the exit portion, on the rear side of the conductor of the exit portion of the ion beam constituting The magnetic shield can suppress the leakage of the magnetic field to the outside of the current path, thereby achieving the above object.

  Preferably, in the mass separation device of the present invention, the air-core solenoid-like current path has a deflection case having a substantially fan-shaped side surface serving as a path of the ion beam from the inlet to the outlet. Are a plurality of the inlet conductors arranged at a required interval at the inlet portion, a plurality of the outlet conductors arranged at a required interval at the outlet portion, and an outer surface on the outer diameter side of the deflection case. A plurality of outer diameter side conductors arranged on the inner surface of the deflection case and a plurality of inner diameter side conductors arranged at a required interval on the outer surface of the deflection case. The magnetic field is formed in the current path in which the current paths in the order of the partial conductor and the inner diameter side conductor or the reverse order are sequentially connected in a spiral manner.

  Further preferably, in the mass separator according to the present invention, an outer diameter side yoke portion provided outside the outer diameter side of the air core solenoid-shaped current path, and an outer diameter side outer side of the air core solenoid-shaped current path. It has at least one yoke part among the provided inner diameter side yoke parts.

  Further preferably, the magnetic shield in the mass separator of the present invention is magnetically connected to the yoke portion.

  Further preferably, in the mass separator according to the present invention, the magnetic shield is disposed between the outer diameter side yoke part and the inner diameter side yoke part.

  Further preferably, at least one of the inlet conductor and the outlet conductor in the mass separator of the present invention is housed in a conductor electrostatic shield tube.

  Further preferably, the magnetic shield in the mass separator of the present invention is housed in a magnetic shield portion electrostatic shield tube.

  Further preferably, in the mass separator according to the present invention, at least one of the inlet conductor and the outlet conductor is accommodated in a conductor electrostatic shield tube, and the magnetic shield is in the magnetic shield electrostatic shield tube. The conductor portion electrostatic shield tube and the magnetic shield portion electrostatic shield tube are at the same potential.

  Further preferably, in the mass separation device of the present invention, at least one of the inlet conductor and the outlet conductor is accommodated in a conductor electrostatic shield tube, and the conductor electrostatic shield tube and the magnetic shield are The potential is the same.

  Further preferably, in the mass separator according to the present invention, at least one of the inlet conductor and the outlet conductor is accommodated in a conductor electrostatic shield tube, and the magnetic shield is in the magnetic shield electrostatic shield tube. A predetermined potential difference is given between the conductor part electrostatic shield tube and the magnetic shield part electrostatic shield tube.

  Further preferably, in the mass separator of the present invention, the conductor electrostatic shield tube at the entrance is set to a negative potential with respect to the magnetic shield electrostatic shield tube at the entrance.

  Further preferably, in the mass separator according to the present invention, the conductor electrostatic shield tube of the outlet portion is set to a positive potential with respect to the magnetic shield electrostatic shield tube of the outlet portion.

  Further preferably, in the mass separator according to the present invention, at least one of the inlet conductor and the outlet conductor is accommodated in a conductor electrostatic shield tube, and the conductor electrostatic shield tube and the magnetic shield A predetermined potential difference is given between them.

  Further preferably, in the mass separator according to the present invention, the conductor electrostatic shield tube at the entrance is set to a negative potential with respect to the magnetic shield at the entrance.

  Further preferably, in the mass separator according to the present invention, the conductor electrostatic shield tube at the outlet is set to a positive potential with respect to the magnetic shield at the outlet.

  Further preferably, in the mass separator of the present invention, the inlet conductor and the inlet magnetic shield are accommodated in the same electrostatic shield tube.

  Further preferably, in the mass separator of the present invention, the outlet conductor and the outlet magnetic shield are accommodated in the same electrostatic shield tube.

  Further preferably, the magnetic shield in the mass separator of the present invention is at least one of a substantially semi-cylindrical shape, a cylindrical shape, a columnar shape, a prismatic shape, a long plate shape, and a curved surface shape.

  Further preferably, in the mass separator according to the present invention, the magnetic shield of the inlet portion has a long, substantially arc-shaped curved surface shape, and is arranged so that the inner surface side of the curved surface faces the inlet portion conductor. ing.

  Further preferably, in the mass separator according to the present invention, the magnetic shield of the outlet portion has a long, substantially arc-shaped curved surface shape, and is arranged so that the inner surface side of the curved surface faces the outlet portion conductor. ing.

  Further preferably, the deflection case in the mass separator of the present invention has a fan-shaped side surface, and the outer diameter side conductor and the inner diameter side conductor have an arc shape.

  Further preferably, in the mass separation device of the present invention, the outer diameter side and the inner diameter side of the side shape of the deflection case are tapered, and the outer diameter side conductor and the inner diameter side conductor are linear.

  Further preferably, the magnetic shield in the mass separator of the present invention is made of a magnetic material.

  Further preferably, the magnetic shield in the mass separator of the present invention is made of magnetic stainless steel or iron.

  Further preferably, the electrostatic shield tube in the mass separator of the present invention is made of a conductive material.

  Further preferably, the electrostatic shield tube in the mass separator of the present invention is made of stainless steel.

  Further preferably, in the mass separation device of the present invention, the interval between the entrance magnetic shield and the interval between the conductor electrostatic shield tubes at the entrance is set equal.

  Further preferably, in the mass separator of the present invention, the interval between the outlet magnetic shields and the interval between the conductor electrostatic shield tubes at the outlet are set equal.

  Further preferably, in the mass separator of the present invention, the interval between the magnetic shield electrostatic shield tube at the entrance and the interval between the conductor electrostatic shield tube at the entrance are set equal.

  Further preferably, in the mass separation device of the present invention, the interval between the magnetic shield portion electrostatic shield tube at the outlet portion and the interval between the conductor portion electrostatic shield tubes at the outlet portion are set equal.

  An ion beam generator of the present invention includes an ion source that outputs an ion beam composed of a plurality of types of ions, and the mass separation device of the present invention, and the ion beam output from the ion source is subjected to the mass separation. An ion beam that is incident on the inlet of the apparatus and that can output an ion beam of a specific type from the outlet of the mass separator can be output, thereby achieving the above object.

  A functional element of the present invention has a semiconductor layer ion-implanted by an ion beam composed of the specific kind of ions using the ion beam generator according to claim 31, thereby achieving the above object. Is done.

  The method for producing a functional element of the present invention includes a step of ion-implanting a semiconductor layer in a predetermined region with an ion beam composed of the specific type of ions, using the ion beam generator of the present invention. This achieves the above object.

  The ion beam generating method of the present invention outputs an ion beam composed of the specific kind of ions using the ion beam generating apparatus of the present invention, and thereby the above object is achieved.

  The operation of the present invention will be described below with the above configuration.

  In the present invention, it is possible to form a uniform magnetic field inside the current path of the air-core solenoid. Further, it is possible to shield the magnetic field generated by the inlet conductor by providing the inlet magnetic shield on the upstream side of the inlet conductor. Similarly, it is possible to shield the magnetic field generated by the outlet conductor by providing the outlet magnetic shield on the rear stage side of the outlet conductor. Therefore, the leakage magnetic field to the outside of the current path can be suppressed.

  Further, by providing a yoke member on the outer diameter side and the inner diameter side of the deflection case and connecting the magnetic shield and the yoke member, the current path can be surrounded by the magnetic shield and the yoke member. For this reason, it is possible to efficiently form a magnetic field inside the current path and more effectively suppress the leakage magnetic field to the outside of the current path. It is also possible to shield the magnetic field generated by the inner diameter side conductor and the outer diameter side conductor.

  Furthermore, by covering the conductor constituting the current path with an electrostatic shield tube and electrostatically shielding it, it is possible to prevent the potential from becoming non-uniform in the current path and improve the uniformity of the magnetic field.

  In addition, by covering the magnetic shield with an electrostatic shield tube and electrostatically shielding it, the magnetic shield is not directly exposed to the ion beam, preventing the generation of corrosion, rust and impure gas, and improving the reliability of the mass separator. It becomes possible.

  Furthermore, by using the same electrostatic shield tube (second electrostatic shield tube) that serves as both the conductor portion electrostatic shield tube and the magnetic shield portion electrostatic shield tube, the device configuration can be simplified. .

  Furthermore, the ion beam is appropriately accelerated or decelerated by applying a potential difference between the conductor electrostatic shield tube and the magnetic shield electrostatic tube or between the conductor electrostatic shield tube and the magnetic shield. It becomes possible.

  Further, by using a magnetic shield having a substantially arcuate curved surface, it is possible to more effectively suppress the leakage magnetic field to the outside of the current path.

  As described above, according to the present invention, an air core solenoid-like current path forms a uniform magnetic field inside the magnetic path, and a magnetic shield is provided on at least one side of the inlet and outlet of the mass separator. The leakage magnetic field to the outside of the road can be effectively suppressed. Therefore, a wide ion beam can be bent uniformly in an ideal state, and as a result, high-precision mass separation (ion species separation) can be stably performed even for large area (wide) ion beams. It can be carried out.

  By using the ion beam generator on which the mass separator of the present invention is mounted, ion implantation processing for a semiconductor can be performed with high accuracy and at high speed. Therefore, a low carrier density conductive layer of an LDD structure transistor that requires high-precision ion implantation, a channel portion into which low-dose ions are implanted for threshold voltage adjustment, and the like can be easily and accurately performed at high speed. Can be formed.

  A functional element such as a transistor manufactured as described above is very useful as a device having high switching characteristics, low power consumption, and high reliability. In addition, since this functional element can be manufactured with a high throughput using an ion beam with a large area, the cost can be reduced.

Hereinafter, Embodiments 1 to 7 of the mass separator of the present invention and Embodiment 8 of the ion beam generator of the present invention using these will be described in detail with reference to the drawings.
(Embodiment 1)
FIG. 1 is a cross-sectional perspective view of an essential part showing a schematic configuration example of a mass separator according to Embodiment 1 of the present invention.

  As shown in FIG. 1, in the mass separator 10 of the first embodiment, the conductors 2 a to 2 d constituting the air-core exciting current path 2 are spirally wound around the ion deflection casing 1 at a predetermined interval. At first glance, it appears to be similar to the conventional mass separator 100 shown in FIG. 14, but the magnetic shield 7 c and the outlet 4 of the ion deflection casing 1 are provided on the front side of the inlet 3 of the ion deflection casing 1. The first embodiment is characterized in that a magnetic shield 7d is provided on the rear stage side.

  In the first embodiment, by providing these magnetic shields 7c and 7d, the leakage magnetic field to the outside of the air-core excitation current path 2, which has been a conventional problem, is effectively suppressed, and a large area (wide) High-accuracy mass separation (ion species separation) can also be performed for the ion beam.

  First, the basic configuration of the mass separator 10 according to the first embodiment will be described with reference to FIG. In FIG. 1, the configuration other than the entrance magnetic shield 7c and the exit magnetic shield 7d is the same as that of the configuration example of the conventional mass separator 100 shown in FIG.

  In FIG. 1, a mass separation apparatus 10 according to the first embodiment includes an ion deflection casing 1 as a deflection case, an air-core solenoid-like air-core excitation current path 2, an inlet magnetic shield 7c, and an outlet magnetic shield 7d. have.

  The ion deflection casing 1 is a deflection case having a substantially fan-shaped side surface corresponding to the conventional ion deflection casing 101, and an ion beam passes through the inside thereof.

  Air-core solenoid-shaped air-core excitation current path 2 corresponds to conventional air-core excitation current path 102, and conductors 2 a to 2 d corresponding to conventional conductors 102 a to 102 d are disposed around ion deflection casing 1. It is configured to be spirally wound at a required interval.

  FIG. 2 is a perspective view of an essential part for explaining a configuration example of the air-core excitation current path 2 of FIG.

  In FIG. 2, a plurality of conductors 2a to 2d constituting the air-core exciting current path 2 are arranged on the outer diameter side outside of an ion deflection casing 1 (hereinafter referred to as a deflection case 1) at a required interval. (Corresponding to the conventional outer arcuate conductor 102a), a plurality of inner diameter side conductors 2b (corresponding to the conventional inner arcuate conductor 102b) arranged at a predetermined interval outside the inner diameter side of the deflection case 1, and the entrance of the deflection case 1 3 and a plurality of rod-shaped inlet conductors 2c (corresponding to the conventional linear conductor 102c) arranged at a required interval, and a plurality of rod-shaped outlet conductors 2d arranged at the outlet 4 of the deflection case 1 at a required interval ( Corresponding to the conventional linear conductor 102d).

  The “bar shape” of the inlet conductor 2c and the outlet conductor 2d is “a shape extending from the inner diameter side to the outer diameter side (or from the outer diameter side to the inner diameter side) of the deflection case 1”. It does not represent the cross-sectional shape or size. Therefore, as a matter of course, a thin line and a thick line having a substantially circular cross section are also “bar-shaped”.

  These conductors 2a to 2d are: an outlet portion conductor 2d (2d-1) → an outer diameter side conductor 2a (2a-1) → an inlet portion conductor 2c (2c-1) → an inner diameter side conductor 2b (2b-1) → an outlet The partial conductors 2d (2d-2) are sequentially connected to form a spiral (air-core solenoid-like) air-core excitation current path 2 wound outside the deflection case 1. .

  By this air-core excitation current path 2, a magnetic field Hin (y) (magnetic flux density Bin (y)) in the y direction in the figure is generated inside the deflection case 1 (inside the air-core solenoid-like air core excitation current path 2). Is formed.

  In this way, the magnetic field Hin (y) formed inside the air-core solenoid-like air-core excitation current path 2 (hereinafter simply referred to as the current path 2) has uniformity in the longitudinal direction (y-direction). Since the current path 2 is long in the y direction, it is possible to form a uniform magnetic field Hin (y) in the longitudinal direction (y direction).

  Each of the conductors 2a to 2d is surrounded by a conductor portion electrostatic shield tube 5 (5a to 5d: corresponding to the conventional outer conductor 105) as an outer conductor through space, pure water, an insulator, and the like. Furthermore, each of the conductor part electrostatic shield tubes 5 is electrically connected to each other so that the potential of the current path 2 is shielded.

  Such an electrostatic shield prevents potential non-uniformity from occurring in the current path 2, and as a result, the uniformity of the magnetic field Hin (y) can be further enhanced.

  1 and 2, only the inlet conductor electrostatic shield tube 5c surrounding the inlet conductor 2c and the outlet conductor electrostatic shield tube 5d surrounding the outlet conductor 2d are shown, and the conductors 2a and 2b are shown. The illustration of the electrostatic shield tube that surrounds is omitted.

  In this current path 2, the entrance conductor electrostatic shield tube 5c (5c-1, 5c-2,...) Surrounding the entrance conductor 2c (2c-1, 2c-2,...) A required gap S is formed between the matching electrostatic shield tubes, and the ion beam Ia is introduced into the deflection case 1 through the gap S.

  Similarly, the exit conductor electrostatic shield tube 5d (5d-1, 5d-2,...) Surrounding the exit conductor 2d (2d-1, 2d-2,...) Is also adjacent. A required gap S is formed between the electrostatic shield tubes, and the ion beam mass-separated inside the deflection case 1 is led out from the deflection case 1 through the gap S.

  Both ends of the exit conductor portion electrostatic shield tube 5d in the longitudinal direction are closed by a shielding member 6 having a slit-like opening at the center, and the width of the slit-like opening 6d of the shielding member 6 is as follows. The length of the exit conductor portion electrostatic shield tube 5d coincides with the length.

  Next, the entrance magnetic shield 7c and the exit magnetic shield 7d will be described in detail as components unique to the first embodiment.

  The entrance magnetic shield 7c is disposed upstream of the entrance conductor 2c (inlet conductor electrostatic shield tube 5c). The entrance conductors 2c-1, 2c-2, ... (inlet conductor electrostatic shield tube 5c). -1, 5c-2,...) And a plurality of magnetic shield rods 7c-1, 7c-2,. A required gap S 'is formed between the magnetic shield bars 7c-1, 7c-2,. The gap S ′ is preferably as much as possible as the gap S of the entrance conductor portion electrostatic shield tube 5c. Therefore, the diameter and width of the entrance magnetic shield 7c (magnetic shield rods 7c-1, 7c-2,...) Are the same as the entrance conductor electrostatic shield tube 5c (inlet conductor electrostatic shield tubes 5c-1, 5c). −2...) Is preferably about the same as the diameter and width.

  Similarly, the outlet magnetic shield 7d has outlet conductors 2d-1, 2d-2,... (Exit conductors) on the rear side of the outlet conductor 2d (exit conductor electrostatic shield tube 5d). .., And a plurality of magnetic shield rods 7d-1, 7d-2,... Arranged to face each of the electrostatic shield tubes 5d-1, 5d-2,. A required gap S 'is formed between the magnetic shield bars 7d-1, 7d-2,. The gap S ′ is preferably as much as possible as the gap S of the outlet conductor portion electrostatic shield tube 5d. Therefore, the diameter and width of the exit portion magnetic shield 7d (magnetic shield rods 7d-1, 7d-2,...) Are equal to the exit conductor portion electrostatic shield tube 5d (exit conductor portion electrostatic shield tubes 5d-1, 5d). −2...) Is preferably about the same as the diameter and width.

  A magnetic material such as magnetic SUS (stainless steel) or iron is used for the magnetic shields 7c and 7d. In addition, when using an iron material for the magnetic shields 7c and 7d, these magnetic shields 7c and 7d are also covered with an electrostatic shield tube (magnetic shield portion electrostatic shield tube), like the conductors 2a to 2d. Is preferred. A configuration in which such a magnetic shield part electrostatic shield tube is provided will be described in detail in a third embodiment to be described later.

  The operation of the mass separator 10 according to the first embodiment will be described below with the above configuration.

  First, the ion beam Ia output from an ion source (not shown) etc. injects into the mass separator 10 of this Embodiment 1. FIG. Specifically, the ion beam Ia passes through the gap S ′ of the entrance magnetic shield 7c, and then is introduced into the deflection case 1 through the gap S of the entrance conductor electrostatic shield tube 5c (inlet conductor 2c). The If the gap S ′ of the entrance magnetic shield 7c is approximately the same as the gap S of the entrance conductor electrostatic shield tube 5c, the entrance magnetic shield 7c is provided to the mass separator 10 of the ion beam Ia. There is no risk that the incident will be disturbed.

  A magnetic field Hin (y) in the y direction is formed by the current path 2 inside the deflection case 1 (inside the air-core solenoid-like current path 2). Due to the action of the magnetic field Hin (y), the trajectories of a plurality of ion species having different masses included in the ion beam Ia are each curved with a trajectory radius corresponding to the mass.

  Among the ions whose trajectories are curved in this way, ions having a specific mass bent with a specific trajectory radius (or a trajectory radius in a specific range) are exit conductor portions in the slit-shaped opening 6 d of the shielding member 6. It passes through the gap S of the electrostatic shield tube 5d (exit portion conductor 2d) and is led out of the deflection case 1. Thereafter, the ion beam Ic is output from the mass separator 10 through the gap S ′ of the outlet magnetic shield 7d on the rear stage side.

  Here, unlike the conventional mass separator 100, the mass separator 10 of the first embodiment is provided with an inlet magnetic shield 7c and an outlet magnetic shield 7d. Therefore, the leakage magnetic field to the upstream side of the entrance conductor portion electrostatic shield tube 5c (inlet portion conductor 2c) and the downstream side of the exit conductor portion electrostatic shield tube 5d (exit portion conductor 2d) is effectively prevented. Is done.

  FIG. 3A and FIG. 3B are schematic diagrams for explaining this action. FIG. 3A shows the magnetic field Hc formed around the inlet conductor 2c when the inlet magnetic shield 7c is provided as in the mass separation device 10 of the first embodiment. FIG. 3B shows the magnetic field Hc formed around the inlet conductor 2c when the inlet magnetic shield 7c of the first embodiment is not provided as in the conventional mass separator 100. Yes.

  When the entrance magnetic shield 7c according to the first embodiment is not provided as in the conventional mass separator 100, as shown in FIG. 3B, the entrance conductor 2c (2c-1, 2c-2, ..) Is formed with a substantially circular magnetic field Hc (Hc-1, Hc-2,...). This substantially circular magnetic field Hc spreads toward the inside of the air-core solenoid-like current path 2 (in the positive direction of the z-axis in the figure) and to the outside of the current path 2 (in the negative direction of the z-axis). Also spread. As a result, on the upstream side of the inlet conductor 2c (the inlet conductor electrostatic shield tube 5c), the direction opposite to the inside of the current path 2 (Hin (y): the positive direction of the y axis) (the negative direction of the y axis) ) Magnetic field Hout (y).

  On the other hand, when the entrance magnetic shield 7c is provided as in the mass separation device 10 of the first embodiment, as shown in FIG. 3A, the entrance conductor 2c (2c-1, 2c- 2,...) Is shielded by the entrance magnetic shield 7c (7c-1, 7c-2,...) Formed around the magnetic field Hc (Hc-1, Hc-2,...). Therefore, the spread of the magnetic field Hc toward the outside of the current path 2 (toward the negative direction of the z axis) can be suppressed. Therefore, by combining each of the magnetic fields Hc-1, Hc-2,... Generated from the inlet conductors 2c-1, 2c-2,. (Positive direction) of the magnetic field Hin (y) is formed, but almost no magnetic field is formed outside the current path 2 (before the entrance conductor 2c).

  In this case, there is a concern about the influence of the magnetic field in the space between the entrance magnetic shield 7c and the entrance conductor 2c, but in the first embodiment, the entrance portion is opposed to the entrance conductor 2c. Since the magnetic shield 7c is provided, even in the space, the gap S ′ of the entrance magnetic shield 7c to the gap S of the entrance shield electrostatic shield tube 5c through which the ion beam passes is almost not. The leakage magnetic field does not work. Therefore, the ion beam passing through the gap S 'to the gap S has almost no adverse effect.

  The outlet magnetic shield 7d also exhibits the same action as that of the inlet magnetic shield 7c, and magnetic fields Hd-1, Hd-2 generated from the outlet conductors 2d-1, 2d-2,. Are combined to form a magnetic field Hin (y) in the y direction (the positive direction of the y-axis) inside the current path 2, but outside the current path 2 (after the outlet conductor 2d). Almost no magnetic field is formed. Note that the illustration of the magnetic field generated by the exit magnetic shield 7d is omitted.

  As described above, according to the mass separator 10 of the first embodiment, the magnetic field Hin in the y direction (the positive direction of the y axis) is almost only inside the deflection case 1 (air-core solenoid-like current path 2). Since (y) can be formed, the ion beam is bent in an ideal state as shown in FIG. FIG. 4 is a schematic diagram showing the trajectory of the ion beam in the mass separator 10 of the first embodiment.

  In the first embodiment, as in the case of the conventional mass separator 100, the air core solenoid-like current path 2 is used. Therefore, even if the current path 2 has a shape that is long in the y direction, A uniform magnetic field Hin (y) can be formed in the (y direction).

  Since the ion beam is bent by the action of the uniform magnetic field Hin (y) inside the current path 2, even an ion beam that is wide in the magnetic field direction (y direction) can be bent uniformly. it can.

  Furthermore, by providing the entrance magnetic shield 7c and the exit magnetic shield 7d, the leakage magnetic field to the outside of the current path 2 can be effectively suppressed. For this reason, it is possible to perform mass separation with high accuracy by bending the ion beam in an ideal state.

  Therefore, it is possible to perform mass separation (ion species separation) with high accuracy even for a large area (wide) ion beam.

  The deflection case 1 (current path 2) may have any shape that allows a curved ion beam to pass therethrough, and is not limited to a complete fan shape as shown in FIG. For example, as shown in FIG. 5B, the outer diameter side and the inner diameter side may be tapered. Including these, in the claims, the shape of the deflection case 1 is defined as “substantially fan-shaped”. When the deflection case 1 having the shape as shown in FIG. 5B is used, the outer diameter side conductor 2a and the inner diameter side conductor 2b are not circular arcs but linear conductors.

Further, in the first embodiment, the case where both the entrance part magnetic shield 7c and the exit part magnetic shield 7d are provided in the mass separator 10 has been described. In addition, only one of the magnetic shields (the entrance magnetic shield 7c or the exit magnetic shield 7d) may be used. However, in this case, the mass separation accuracy slightly decreases.
(Embodiment 2)
FIG. 6 is a cross-sectional perspective view of an essential part showing a schematic configuration example of a mass separator according to Embodiment 2 of the present invention.

  In FIG. 6, the mass separator 20 according to the second embodiment adds a yoke member 8 to the mass separator 10 according to the first embodiment shown in FIG. 1, and more effectively reduces the leakage magnetic field to the outside of the current path 2. Suppressed. Since the other configuration is the same as that of the mass separator 10 of the first embodiment, the same symbols are attached to the same members, and the description thereof is omitted.

  The yoke member 8 is provided so as to cover the periphery of the deflection case 1, and is located on the outer diameter side yoke portion 8 a located outside the outer diameter side of the deflection case 1 and on the inner diameter side outside the deflection case 1. It consists of an inner diameter side yoke part 8b and end face yoke parts (not shown) located outside the both end faces in the y direction of the deflection case 1.

  An entrance case 1 c connected to the deflection case 1 is provided on the upstream side of the entrance portion 3 of the deflection case 1. An entrance magnetic shield 7c is provided to be connected to the outer diameter side yoke portion 8a and the inner diameter side yoke portion 8b through an open hole (not shown) of the entrance case 1c.

  Similarly, an outlet case 1d connected to the deflection case 1 is provided on the rear stage side of the outlet portion 4 of the deflection case 1. An exit portion magnetic shield 7d is connected to the outer diameter side yoke portion 8a and the inner diameter side yoke portion 8b through an open hole (not shown) of the outlet case 1d.

  With the above configuration, according to the mass separator 20 of the second embodiment, the current path 2 (deflection case 1) is completely surrounded by the yoke member 8, the entrance magnetic shield 7c, and the exit magnetic shield 7d.

  Therefore, as in the case of the mass separator 10 of the first embodiment, the magnetic field generated by the inlet conductor 2c and the outlet conductor 2d is shielded by the inlet magnetic shield 7c and the outlet magnetic shield 7d. Further, a magnetic path is formed so that the magnetic flux flowing into these magnetic shields 7c and 7d passes through the outer diameter side yoke portion 8a and the inner diameter side yoke portion 8b. Further, the magnetic field formed outside the current path 2 by the outer diameter side conductor 2a and the inner diameter side conductor 2b is also shielded by the outer diameter side yoke portion 8a and the inner diameter side yoke portion 8b.

As a result, the magnetic field Hin (y) can be efficiently formed inside the current path 2, and the leakage magnetic field to the outside of the current path 2 is more effectively suppressed than in the case of the first embodiment. can do. Therefore, the ion beam can be bent in a more ideal state, and as a result, mass separation with higher accuracy can be performed. Therefore, highly accurate mass separation (ion species separation) can be performed even for a large area (wide) ion beam.
(Embodiment 3)
FIG. 7 is a cross-sectional perspective view of an essential part showing a schematic configuration example of a mass separator according to Embodiment 3 of the present invention.

  In FIG. 7, the mass separator 30 according to the third embodiment includes an inlet magnetic shield 7c and an outlet magnetic shield 7d in the mass separator 10 according to the first embodiment shown in FIG. The reliability of the mass separator 30 is enhanced by covering with the electric shield tubes 71c and 71d). Since the other configuration is the same as that of the mass separator 10 of the first embodiment, the same members are denoted by the same symbols, and the description thereof is omitted.

  The magnetic shield part electrostatic shield tubes 71c and 71d are made of a conductive material such as stainless steel (SUS) and surround the entrance part magnetic shield 7c and the exit part magnetic shield 7d, respectively.

  It should be noted that the gap S ′ between the magnetic shield part electrostatic shield pipe 71c (71c-1, 71c-2,...) Is preferably about the same as the gap S of the entrance conductor part electrostatic shield pipe 5c. . Similarly, the gap S ′ between the magnetic shield part electrostatic shield pipe 71d (71d-1, 71d-2,...) Is also approximately the same as the gap S of the outlet conductor part electrostatic shield pipe 5d. It is preferable.

  According to the mass separator 30 of the third embodiment, the entrance magnetic shield 7c and the exit magnetic shield 7d are covered with the magnetic shield electrostatic shield tubes 71c and 71d so that they are not directly exposed to the ion beam. It has become.

  Therefore, any high permeability material can be used as the material of the entrance magnetic shield 7c and the exit magnetic shield 7d without being aware of problems such as corrosion, rust, and generation of impure gas. Therefore, as a matter of course, even the iron material can be used without any problem as the material of the entrance magnetic shield 7c and the exit magnetic shield 7d.

  For this reason, there is no possibility that problems such as corrosion occur in the inlet magnetic shield 7c and the outlet magnetic shield 7d, and the reliability of the mass separator 30 of the third embodiment can be improved. Further, as in the case of the first and second embodiments, since the leakage magnetic field to the outside of the current path 2 is effectively suppressed by the entrance magnetic shield 7c and the exit magnetic shield 7d, the ion beam is ideal. It is possible to perform mass separation with high accuracy by bending in a general state. Therefore, highly accurate mass separation (ion species separation) can be performed even for a large area (wide) ion beam.

In the third embodiment, the case where the magnetic shield part electrostatic shield tubes 71c and 71d are applied to the mass separator 10 of the first embodiment has been described. However, the magnetic shield part electrostatic shield tubes 71c and 71d are the same as those described above. The present invention can also be applied to the mass separator 20 of the second embodiment.
(Embodiment 4)
In the fourth embodiment, in addition to the mass separation device 30 of the third embodiment, the magnetic shield unit electrostatic shield tube 71c and the entrance conductor unit electrostatic shield tube 5c, and the magnetic shield unit electrostatic shield tube 71d. A mass separation device 40A that accelerates or decelerates an ion beam by appropriately applying a potential difference as shown in FIG. 8 between the outlet shield portion electrostatic shield tube 5d will be described.

  In the mass separator 40A, for example, the power supply 72a can make the entrance conductor electrostatic shield tube 5c have a negative potential with respect to the magnetic shield electrostatic shield tube 71c. In this case, since the ion beam can be appropriately accelerated between the two, the initial velocity of the ion beam Ia introduced into the deflection case 1 can be adjusted. Further, this potential difference can be used for extracting an ion beam from the ion source.

  Similarly, the outlet conductor part electrostatic shield tube 5d can be set to a positive potential with respect to the magnetic shield part electrostatic shield tube 71d by the power source 72b. In this case, the ion beam can be appropriately accelerated between the two and an ion implantation process or the like can be performed in the accelerated state.

  When a corrosion-resistant conductive material such as magnetic stainless steel (SUS) is used as the material for the entrance magnetic shield 7c and the exit magnetic shield 7d, the magnetic shield electrostatic shield tubes 71c and 71d are provided. In addition, as in the mass separation device 40B shown in FIG. 9, between the entrance magnetic shield 7c and the entrance conductor electrostatic shield tube 5c, and between the exit magnetic shield 7d and the exit conductor electrostatic shield tube 5d, Alternatively, a potential difference may be directly applied.

According to the mass separators 40A and 40B of the fourth embodiment, a potential difference can be applied between the conductor electrostatic shield tube and the magnetic shield electrostatic shield tube (or the magnetic shields 7c and 7d). The ion beam introduced into the deflection case 1 and the ion beam derived from the deflection case 1 can be appropriately accelerated or decelerated.
Further, similarly to the first to third embodiments, the leakage magnetic field to the outside of the current path 2 is effectively suppressed by the entrance magnetic shield 7c and the exit magnetic shield 7d. It is possible to perform mass separation with high accuracy by bending in a general state. Therefore, highly accurate mass separation (ion species separation) can be performed even for a large area (wide) ion beam.
(Embodiment 5)
In the fifth embodiment, a mass separation device 50A used in the case where it is not desirable to perform acceleration or deceleration of an ion beam by applying a potential difference as in the fourth embodiment will be described. In this mass separator 50A, instead of the power sources 72a and 72b of FIG. 8, each is short-circuited, and the magnetic shield part electrostatic shield pipe 71c and the electrostatic shield pipe 5c are electrically connected on the inlet part 3 side. These are set to the same potential, and at the outlet 4 side, the magnetic shield part electrostatic shield pipe 71d and the electrostatic shield pipe 5d are electrically connected to make them the same potential.

  Further, when a corrosion-resistant conductive material such as magnetic stainless steel (SUS) is used as the material of the entrance magnetic shield 7c and the exit magnetic shield 7d, the magnetic shield electrostatic shield tubes 71c and 71d are provided. Without providing, the entrance magnetic shield 7c and the electrostatic shield tube 5c may be electrically connected, and the exit magnetic shield 7d and the electrostatic shield tube 5d may be electrically connected.

That is, in the mass separator 50B shown in FIG. 9, each of the power supply 72a and 72b is short-circuited, and the inlet magnetic shield 7c and the electrostatic shield tube 5c are electrically connected on the inlet 3 side. While making these have the same potential, the outlet magnetic shield 7d and the electrostatic shield tube 5d are electrically connected to each other on the outlet 4 side so that they have the same potential.
According to the mass separators 50A and 50B of the fifth embodiment, the conductor electrostatic shield tube and the magnetic shield electrostatic shield tube (or the magnetic shields 7c and 7d) are electrically connected. It can also be applied to applications where beam acceleration or deceleration is undesirable.
Further, similarly to the first to fourth embodiments, the leakage magnetic field to the outside of the current path 2 is effectively suppressed by the entrance magnetic shield 7c and the exit magnetic shield 7d. It is possible to perform mass separation with high accuracy by bending in a general state. Therefore, highly accurate mass separation (ion species separation) can be performed even for a large area (wide) ion beam.
(Embodiment 6)
FIG. 10 is a main part perspective view showing a schematic configuration in the vicinity of the inlet 3 in the mass separator according to Embodiment 6 of the present invention.

  10, in the mass separator 60 of the sixth embodiment, the magnetic shield electrostatic shield tubes 71c and 71d in the mass separator 30 of the third embodiment shown in FIG. Second electrostatic shield tubes 73c and 73d that are also used as 5d are used.

  Specifically, as shown in FIG. 10, both the entrance conductor 2 c and the entrance magnetic shield 7 c are surrounded and accommodated inside by the second electrostatic shield tube 73 c of the entrance 3. Similarly, the second electrostatic shield tube 73d (not shown) of the outlet portion 4 surrounds and accommodates both the outlet portion conductor 2d and the outlet portion magnetic shield 7d. The other configuration is the same as that of the mass separation device 30 of the third embodiment, and the description thereof is omitted here.

  According to the mass separator 60 of the sixth embodiment, the second electrostatic shield tubes 73c and 73d serve as both the conductor portion electrostatic shield tube and the magnetic shield portion electrostatic shield tube. Compared to the separation device 30, the configuration of the device can be simplified.

Further, as in the case of the first to fifth embodiments, the leakage magnetic field to the outside of the current path 2 is effectively suppressed by the entrance magnetic shield 7c and the exit magnetic shield 7d. It is possible to perform mass separation with high accuracy by bending in a general state. Therefore, highly accurate mass separation (ion species separation) can be performed even for a large area (wide) ion beam.
(Embodiment 7)
In the mass separators 10 to 60 of the first to sixth embodiments, the magnetic shield rods 7c-1, 7c-2,..., 7d-1, 7d constituting the entrance magnetic shield 7c and the exit magnetic shield 7d. The shapes of -2, ... are not limited to the columnar shape shown in Fig. 1, and various shapes such as a prismatic shape, a plate shape with a predetermined width, and a substantially semi-cylindrical shape can be adopted.

  The shapes of the entrance magnetic shield 7c and the exit magnetic shield 7d are magnetic fields Hc (Hc-1, Hc-2,...) Formed around the entrance conductor 2c (2c-1, 2c-2,...). ..) is shielded by the entrance magnetic shield 7c (7c-1, 7c-2,...) And formed around the exit conductor 2d (2d-1, 2d-2,...). As long as the magnetic field Hd (Hd-1, Hd-2,...) To be shielded by the outlet magnetic shield 7d (7d-1, 7d-2,...) Is sufficient.

  FIG. 11: is a principal part perspective view which shows the schematic structural example of the entrance part vicinity in the mass separator which concerns on Embodiment 7 of this invention.

In FIG. 11, in the mass separator 70A of the seventh embodiment, the shape of the entrance magnetic shield 74c having the characteristic configuration is replaced with the cylindrical magnetic shield 7c in the mass separators 10 to 60 of the first to sixth embodiments. A substantially semi-cylindrical shape having an arcuate curved surface. FIG. 11 shows only the substantially semi-cylindrical entrance magnetic shield 74c. Since the other structure is the same as that of any of the mass separators 10-60 of Embodiments 1-6, the description is abbreviate | omitted here.
The entrance magnetic shield 74c (74c-1, 74c-2,...) Has an arcuate curved surface so as to cover substantially half the circumference of the entrance conductor 2c (2c-1, 2c-2,...). It is a substantially semi-cylindrical shape. That is, the entrance magnetic shield 74c has a long, substantially arc-shaped curved surface, and is arranged so that the inner surface side of the curved surface faces the entrance conductor 2c. With this configuration, the magnetic field Hc (Hc-1, Hc-2,...) Formed around the entrance conductor 2c (2c-1, 2c-2,...) By the entrance magnetic shield 74c. It can be received in a wide range, and the spread of the magnetic field Hc to the upstream side of the entrance conductor 2c can be effectively suppressed.

  Similarly, the exit portion magnetic shield 74d (not shown) is also formed in a substantially semi-cylindrical shape having an arcuate curved surface so as to cover a substantially half circumference of the exit portion conductor 2d, thereby providing an exit portion magnetic shield. By 74d, the magnetic field Hd formed around the outlet conductor 2d can be received in a wide range, and the spread of the magnetic field Hd toward the rear stage side of the outlet conductor 2d can be effectively suppressed.

  Therefore, according to the mass separator 70A of the seventh embodiment, the leakage magnetic field to the outside of the current path 2 is further effective by the substantially semi-cylindrical entrance magnetic shield 74c and the exit magnetic shield 74d having an arcuate curved surface. Therefore, the ion beam can be bent in a more ideal state, and high-precision mass separation can be performed. Therefore, highly accurate mass separation (ion species separation) can be performed even for a large area (wide) ion beam.

In addition, in the substantially semi-cylindrical entrance magnetic shield 74c and the exit magnetic shield 74d of the seventh embodiment, similarly to the second embodiment, a yoke member is used together to form a magnetic path, or As in the case of the third embodiment, the magnetic shield part may be covered with an electrostatic shield tube. Further, as in the case of the sixth embodiment, as shown in the mass separator 70B of FIG. 12, both the entrance conductor 2c and the entrance magnetic shield 74c are surrounded by the second electrostatic shield tube 75c so as to be internal. The second electrostatic shield tube 75d (not shown) of the outlet portion 4 surrounds both the outlet portion conductor 2d and the outlet portion magnetic shield 74d (not shown) and can be accommodated therein. .
(Embodiment 8)
In the mass separators 10 to 70 of the first to seventh embodiments (for example, the mass separator 10 of FIGS. 1 and 2), the ion beam is bent inside the current path 2 using the air-core solenoid-like current path 2. Therefore, even an ion beam that is wide in the longitudinal direction (magnetic field direction) of the current path 2 can be bent uniformly.

  Furthermore, since the leakage magnetic field to the outside of the current path 2 is effectively suppressed by the entrance magnetic shield 7c and the exit magnetic shield 7d, the ion beam is curved in an ideal state, and a high-precision mass is obtained. Separation can be performed.

  Therefore, highly accurate mass separation (ion species separation) can be performed even for a large area (wide) ion beam.

  When such mass separators 10 to 70 of the first to seventh embodiments (for example, the mass separator 10 of FIGS. 1 and 2) are applied to an ion beam generator such as an ion implanter, for example, a specific ion species A stable ion implantation process or the like can be performed with high accuracy and high throughput by outputting a large area ion beam.

  FIG. 13 is a schematic diagram showing a configuration example of a main part of an ion beam generator on which the mass separator of the present invention is mounted.

  In FIG. 13, the ion beam generator 80 of the eighth embodiment includes an ion source 91 and the mass separators 10, 20, 30, 40, 50, 60, or 70 of the present invention (for example, the mass separators of FIGS. 1 and 2). Device 10).

The ion source 91 generates a plurality of types of ions by discharge or the like, and outputs a first ion beam Ia composed of the plurality of types of ions to the outside. The ion source 91 generates, for example, plasma based on a source gas (for example, B ₂ H ₆ diluted with H ₂ ) between the anode 91a and the cathode 91b. The configuration is such that ions (B ₂ H _x ⁺ , B ₁ H _x ⁺ , H _x ^+, etc.) in this plasma are extracted as a first ion beam Ia by an extraction electrode 91 c provided on the exit side of the ion source 91. Has been. Preferably, a filament 91d is provided between the anode 91a and the cathode 91b, and electrons for generating plasma more efficiently are supplied.

  The ion beam Ia output from the ion source 91 passes through the gap S ′ of the entrance magnetic shield 7c in the mass separator of the present invention (for example, the mass separator 10 of FIG. 1), and thereafter, the entrance conductor electrostatic It is introduced into the deflection case 1 through the gap S of the shield tube 5c (inlet portion conductor 2c).

  Note that the means for introducing the first ion beam Ia into the mass separation device (for example, the mass separation device 10) is not limited to the extraction electrode 91c, and as described in the fourth embodiment, for example, the entrance magnetic shield 7c. It may be based on a potential difference between the entrance conductor portion electrostatic shield tube 5c or between the magnetic shield portion electrostatic shield tube 71c and the entrance conductor portion electrostatic shield tube 5c. Further, a potential difference may be applied between the extraction electrode 91c and the entrance magnetic shield 7c, or between the extraction electrode 91c and the magnetic shield electrostatic shield tube 71c.

  The ion beam Ia introduced into the deflection case 1 is affected by the magnetic field Hin (y) formed by the current path 2, and the trajectories of a plurality of ion species having different masses included in the ion beam Ia are illustrated. As shown by the middle track Ib, each is curved with a track radius corresponding to its mass.

  Among the ions whose trajectories are curved in this way, ions having a specific mass bent with a specific trajectory radius (or a specific range of trajectory radii) are exit conductor electrostatic shield tubes at the openings 6 d of the shielding member 6. 5d (outlet conductor 2d) passes through the gap S and is led out from the deflection case 1. Thereafter, the ion beam Ic is further output from the mass separation device (for example, the mass separation device 10) to the outside through the gap S 'of the outlet magnetic shield 7d at the subsequent stage.

Thus, the ion beam Ic output from the mass separation apparatus (for example, the mass separation apparatus 10) is appropriately accelerated as necessary, and the ion beam Ic performs an ion implantation process on the object to be processed (substrate). Done. Further, if necessary, for example, a slit may be appropriately disposed on the rear stage side of the mass separation device 10 to increase the mass separation accuracy.
In addition, when an ion implantation process or the like is performed on the entire surface of a workpiece (substrate) larger than the size of the ion beam Ic, the workpiece (substrate) is moved relative to the ion beam Ic. I will let you. In this case, the larger the size of the ion beam Ic, the higher the moving speed of the object to be processed (substrate), so that the throughput can be increased. Moreover, when performing an ion implantation process etc. with respect to the to-be-processed object (substrate) smaller than the size of the ion beam Ic, a several to-be-processed object (substrate) can be processed simultaneously. In this case, the larger the size of the ion beam Ic, the greater the number of objects (substrates) that can be processed simultaneously, so that the throughput can be increased.

  According to the ion beam generation apparatus 80 of the eighth embodiment, a mass separation apparatus (for example, mass separation) capable of performing high-precision mass separation (ion species separation) even for a large area (wide) ion beam. Since the apparatus 10) is used, the current supplied to the current path 2, that is, the magnetic field Hin (y) inside the current path 2 is appropriately set, so that a large-area ion beam composed of a specific ion species. Can be output.

  By using such an ion beam generator 80 of the eighth embodiment, ion implantation (ion doping) into a semiconductor can be performed stably with high accuracy and at high speed. Therefore, a low carrier density conductive layer of an LDD structure transistor that requires high-precision ion implantation (ion doping), a channel portion into which low-dose ions are implanted for threshold voltage adjustment, and the like are easy, precise, and high-speed. Can be formed.

  A functional element such as a transistor manufactured in this way is very useful as a device having high switching characteristics, low power consumption, and high reliability. In addition, this functional element is manufactured at a high throughput using an ion beam with a large area, so that the cost is very low.

  As described above, according to the first to eighth embodiments, an air-core solenoid-like current including the substantially fan-shaped deflection case 1 and the inlet conductor 2c, outlet conductor 2d, outer diameter side conductor 2a, and inner diameter side conductor 2b. Since it includes the path 2, the entrance magnetic shield 7c arranged to face the entrance conductor 2c, and the exit magnetic shield 7d arranged to face the exit conductor 2d, the exit conductor to the outside A uniform magnetic field can be formed inside the current path 2 by the current path 2 including the diameter side conductor, the inlet portion conductor, and the inner diameter side conductor, and further, the current path 2 is formed by the inlet portion magnetic shield 7c and the outlet portion magnetic shield 7d. The leakage of the magnetic field to the outside can be suppressed. Accordingly, the wide ion beam can be uniformly bent in an ideal state in the mass separation apparatus, so that high-precision mass separation can be performed even for a large area ion beam.

  In addition, as mentioned above, although this invention was illustrated using preferable Embodiment 1-8 of this invention, this invention should not be limited and limited to this Embodiment 1-8. It is understood that the scope of the present invention should be construed only by the claims. It is understood that those skilled in the art can implement an equivalent range based on the description of the present invention and the common general technical knowledge from the description of specific preferred embodiments 1 to 8 of the present invention. Patents, patent applications, and documents cited herein should be incorporated by reference in their entirety, as if the contents themselves were specifically described herein. Understood.

  The present invention relates to a mass separator that separates a plurality of types of ions having different masses contained in an ion beam, and a semiconductor device such as a semiconductor integrated circuit (IC) or a thin film transistor (TFT) liquid crystal element equipped with the mass separator. In the manufacturing process, in order to form a semiconductor of a predetermined conductivity type, an ion beam generator that performs an ion implantation (ion doping) process on the semiconductor, and a high-accuracy manufactured using this ion beam generator Functional element such as a low carrier density conductive layer of an LDD structure transistor requiring ion implantation, a transistor having a channel portion into which low dose ions are implanted for threshold voltage adjustment, a method of manufacturing the functional element, and the ion In the field of ion beam generation using a beam generator, an air-core solenoid-like current path Therefore, it is possible to form a uniform magnetic field therein, and a magnetic shield provided on at least one of the inlet and outlet of the mass separator, to effectively suppress the leakage magnetic field outside the current path. Therefore, it is possible to bend a wide ion beam uniformly in an ideal state. As a result, high-precision mass separation (ion species separation) can be performed even for a large area (wide) ion beam. Can do.

  Therefore, by using the ion beam generator equipped with the mass separator of the present invention, it is possible to perform ion implantation processing on a semiconductor with high accuracy and high speed. Therefore, a low carrier density conductive layer of an LDD structure transistor that requires high precision ion implantation, a channel portion into which low dose ions are implanted for threshold voltage adjustment, and the like can be formed easily and at high speed. Can do.

  A functional element such as a transistor manufactured as described above is very useful as a device having high switching characteristics, low power consumption, and high reliability. In addition, since this functional element can be manufactured with a high throughput using an ion beam with a large area, the cost can be reduced.

It is a principal part cross-section perspective view which shows the structural example of the mass separator which concerns on Embodiment 1 of this invention. It is a principal part perspective view explaining the structural example of the electric current path of the mass separator of FIG. (A) And (b) is a principal part schematic diagram for demonstrating operation | movement of the mass separator of FIG. It is a schematic diagram which shows the track | orbit of an ion beam in the mass separator of FIG. (A) And (b) is a side view which shows typically each shape example of the deflection | deviation case in the mass separator of FIG. It is a principal part cross-section perspective view which shows the structural example of the mass separator which concerns on Embodiment 2 of this invention. It is a principal part cross-sectional perspective view which shows the structural example of the mass separator which concerns on Embodiment 3 of this invention. It is a schematic diagram which shows the principal part structural example of the mass separator which concerns on Embodiment 4 of this invention. It is a schematic diagram which shows the principal part structural example of the mass separator which concerns on the modification of Embodiment 4 of this invention. It is a perspective view which shows typically the example of a principal part structure of the entrance part vicinity of the mass separator which concerns on Embodiment 6 of this invention. It is a perspective view which shows typically the example of a principal part structure of the entrance part vicinity of the mass separator which concerns on Embodiment 7 of this invention. It is a perspective view which shows typically the principal part structure example of the inlet_port | entrance part vicinity of the mass separator which concerns on the modification of Embodiment 7 of this invention. It is a schematic diagram which shows the principal part structural example of the ion beam generator which concerns on Embodiment 8 of this invention. It is a principal part cross-sectional perspective view of the conventional mass separator. It is a principal part perspective view explaining the structural example of the air core exciting current path of the mass separator of FIG. It is a figure for demonstrating the leakage magnetic field to the exterior of the electric current path of the mass separator of FIG. (A) And (b) is a schematic diagram for demonstrating the subject of the mass separator of FIG. 14 with an ion beam orbit.

Explanation of symbols

1 Ion deflection casing (deflection case)
1c Inlet case (connection part)
1d Outlet case (connection part)
2 Air-core excitation current path (current path)
2a Outer diameter side conductor 2b Inner diameter side conductor 2c Inlet portion conductor 2d Outlet portion conductor 3 Inlet portion 4 Outlet portion 5 Conductor portion electrostatic shield tube 5c Inlet conductor portion electrostatic shield tube 5d Outlet conductor portion electrostatic shield tube 6 Shielding member 6d Shield member opening 7c, 74c Entrance magnetic shield 7d, 74d Exit magnetic shield 71c, 71d Magnetic shield electrostatic shield tube 72a, 72b Power supply 73c, 73d, 75c, 75d Second electrostatic shield tube 8 Yoke member 8a Outer diameter side yoke part 8b Inner diameter side yoke part 91 Ion source 91a Anode
91b Cathode 91c Extraction electrode 91d Filament 10, 20, 30, 40A, 40B, 50A, 50B, 60, 70A, 70B Mass separator 80 Ion beam generator

Claims (34)

In a mass separation apparatus that separates one or more types of ions contained in the ion beam by bending the trajectory of the ion beam by a magnetic field effect,
A plurality of entrance-portion magnetic shields arranged at a required interval opposite to the entrance-portion conductor, on the upstream side of the conductor at the entrance-portion of the ion beam constituting the air-core solenoid-like current path for generating the magnetic field When,
Outlet magnetic shields arranged at a required interval on the rear stage side of the conductor of the exit portion of the ion beam constituting the air-core solenoid-like current path and facing the conductor of the exit portion A mass separation apparatus having at least one magnetic shield and capable of suppressing leakage of a magnetic field to the outside of the current path by the magnetic shield. A side face shape serving as a passage of the ion beam from the entrance to the exit has a substantially fan-shaped deflection case,
The air-core solenoid current path is:
A plurality of the inlet portion conductors arranged at a required interval at the inlet portion, a plurality of the outlet portion conductors arranged at a required interval at the outlet portion, and a plurality of the outer portions on the outer diameter side of the deflection case at a required interval. The outer-diameter-side conductor arranged in this way and the inner-diameter-side conductor arranged in a plurality at a required interval on the outer surface on the inner-diameter side of the deflection case,
2. The magnetic field is formed in the current path in which current paths in the order of the outer diameter side conductor, the inlet section conductor, and the inner diameter side conductor from the outlet portion conductor, or the reverse order thereof, are sequentially spirally connected. Mass separator.   At least one of an outer diameter side yoke portion provided outside the outer diameter side of the air core solenoid-like current path and an inner diameter side yoke portion provided outside the inner diameter side of the air core solenoid-like current path. The mass separator according to claim 1, further comprising a yoke portion.   The mass separator according to claim 3, wherein the magnetic shield is magnetically connected to the yoke portion.   The mass separator according to claim 3 or 4, wherein the magnetic shield is disposed between the outer diameter side yoke part and the inner diameter side yoke part.   The mass separator according to claim 1, wherein at least one of the inlet conductor and the outlet conductor is accommodated in a conductor electrostatic shield tube.   The mass separator according to claim 1, wherein the magnetic shield is accommodated in a magnetic shield portion electrostatic shield tube. At least one of the inlet conductor and the outlet conductor is accommodated in a conductor electrostatic shield tube, and the magnetic shield is accommodated in a magnetic shield electrostatic shield tube;
The mass separator according to claim 1 or 2, wherein the conductor part electrostatic shield tube and the magnetic shield part electrostatic shield tube have the same potential. At least one of the inlet portion conductor and the outlet portion conductor is accommodated in a conductor portion electrostatic shield tube,
The mass separator according to claim 1 or 2, wherein the conductor electrostatic shield tube and the magnetic shield have the same potential. At least one of the inlet conductor and the outlet conductor is accommodated in a conductor electrostatic shield tube, and the magnetic shield is accommodated in a magnetic shield electrostatic shield tube;
The mass separator according to claim 1 or 2, wherein a predetermined potential difference is provided between the conductor part electrostatic shield tube and the magnetic shield part electrostatic shield tube.   The mass separator according to claim 10, wherein the conductor electrostatic shield tube at the entrance is set to a negative potential with respect to the magnetic shield electrostatic shield tube at the entrance.   The mass separator according to claim 10, wherein the conductor electrostatic shield tube at the outlet is set to a positive potential with respect to the magnetic shield electrostatic shield at the outlet. At least one of the inlet portion conductor and the outlet portion conductor is accommodated in a conductor portion electrostatic shield tube,
The mass separator according to claim 1, wherein a predetermined potential difference is given between the conductor part electrostatic shield tube and the magnetic shield.   The mass separator according to claim 13, wherein the conductor electrostatic shield tube at the entrance is set to a negative potential with respect to the magnetic shield at the entrance.   The mass separator according to claim 13, wherein the conductor electrostatic shield tube at the outlet is set to a positive potential with respect to the magnetic shield at the outlet.   The mass separator according to claim 1, wherein the inlet conductor and the inlet magnetic shield are accommodated in the same electrostatic shield tube.   The mass separator according to claim 1 or 2, wherein the outlet conductor and the outlet magnetic shield are accommodated in the same electrostatic shield tube.   The mass separator according to claim 1, wherein the magnetic shield is at least one of a substantially semi-cylindrical shape, a cylindrical shape, a columnar shape, a prismatic shape, a long plate shape, and a curved surface shape.   The magnetic shield of the said entrance part has a long substantially arc-shaped curved surface shape, and is arrange | positioned so that the inner surface side of this curved surface may face the said entrance part conductor. Mass separator.   The magnetic shield of the said exit part has a long substantially arc-shaped curved surface shape, and is arrange | positioned so that the inner surface side of this curved surface may face the said exit part conductor. Mass separator.   The mass separator according to claim 2, wherein the deflection case has a fan-shaped side surface, and the outer diameter side conductor and the inner diameter side conductor have an arc shape.   The mass separation device according to claim 2, wherein the deflection case has a tapered shape on the outer diameter side and the inner diameter side of a side surface, and the outer diameter side conductor and the inner diameter side conductor are linear.   The mass separator according to claim 1, wherein the magnetic shield is made of a magnetic material.   The mass separator according to claim 23, wherein the magnetic shield is made of magnetic stainless steel or iron.   The mass separator according to claim 6, wherein the electrostatic shield tube is made of a conductive material.   The mass separator according to claim 25, wherein the electrostatic shield tube is made of stainless steel.   The mass separator according to any one of claims 9 and 13 to 15, wherein an interval between the entrance magnetic shield and an interval between the conductor electrostatic shield pipes at the entrance are set equal.   The mass separator according to any one of claims 9 and 13 to 15, wherein an interval between the outlet magnetic shield and an interval between the conductor electrostatic shield pipes at the outlet are set to be equal.   The mass separator according to any one of claims 8 and 10 to 12, wherein an interval between the magnetic shield electrostatic shield tube at the entrance and an interval between the conductor electrostatic shield tube at the entrance are set equal.   The mass separation device according to any one of claims 8 and 10 to 12, wherein an interval between the magnetic shield portion electrostatic shield tube at the outlet portion and an interval between the conductor portion electrostatic shield tube at the outlet portion are set equal. An ion source that outputs an ion beam composed of multiple types of ions;
A mass separation device according to any one of claims 1 to 30,
An ion beam generating apparatus in which the ion beam output from the ion source is incident on the entrance of the mass separator, and an ion beam composed of specific types of ions can be output from the exit of the mass separator .   32. A functional element having a semiconductor layer ion-implanted by an ion beam comprising the specific type of ions using the ion beam generator according to claim 31.   32. A method of manufacturing a functional element, comprising using the ion beam generator according to claim 31 to perform ion implantation into a semiconductor layer in a predetermined region with an ion beam composed of the specific type of ions.   An ion beam generating method for outputting an ion beam composed of the specific type of ions using the ion beam generating apparatus according to claim 31.