JP2007035972A5 - - Google Patents

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Publication number
JP2007035972A5
JP2007035972A5 JP2005217937A JP2005217937A JP2007035972A5 JP 2007035972 A5 JP2007035972 A5 JP 2007035972A5 JP 2005217937 A JP2005217937 A JP 2005217937A JP 2005217937 A JP2005217937 A JP 2005217937A JP 2007035972 A5 JP2007035972 A5 JP 2007035972A5
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JP
Japan
Prior art keywords
atom
wiring
group
adhesion layer
wiring board
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JP2005217937A
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Japanese (ja)
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JP4648122B2 (en
JP2007035972A (en
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Priority to JP2005217937A priority Critical patent/JP4648122B2/en
Priority claimed from JP2005217937A external-priority patent/JP4648122B2/en
Publication of JP2007035972A publication Critical patent/JP2007035972A/en
Publication of JP2007035972A5 publication Critical patent/JP2007035972A5/ja
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Publication of JP4648122B2 publication Critical patent/JP4648122B2/en
Expired - Fee Related legal-status Critical Current
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Claims (4)

金属層上に、メルカプト基、スルホン酸基、及び下記構造式(1)で表される含トリアジン骨格を少なくとも含む配線基板用密着層を介して絶縁層を有することを特徴とする配線基板。
ただし、前記構造式(1)中、Xは、NR及びSAの少なくともいずれかを表す。Rは、水素原子、メチル基、エチル基、プロピル基、及びフェニル基の少なくともいずれかを表し、Aは、水素原子、Li原子、Na原子、K原子、Rb原子、及びCs原子の少なくともいずれかを表す。
On the metal layer, main mercapto group, a sulfonic acid group, and the wiring, characterized in that an insulating layer over at least including wiring substrate adhesion layer containing triazine skeleton represented by the following structural formula (1) substrate.
However, in the structural formula (1), X represents at least one of NR 2 and SA. R represents a hydrogen atom, a methyl group, an ethyl group, a propyl group, or a phenyl group, and A represents at least one of a hydrogen atom, a Li atom, a Na atom, a K atom, an Rb atom, and a Cs atom. Represents.
配線基板用密着層が、カップリング剤により表面処理されてなる請求項1に記載の配線基板。 Adhesion layer wiring board, the wiring board according to claim 1 comprising surface treated with a coupling agent. 請求項1から2のいずれかに記載の配線基板を製造する方法であって、配線を形成する配線形成工程と、該配線上に配線基板用密着層を形成する密着層形成工程と、該配線基板用密着層上に絶縁層を形成する絶縁層形成工程とを少なくとも含むことを特徴とする配線基板の製造方法。A method for manufacturing a wiring board according to claim 1, wherein a wiring forming step for forming wiring, an adhesion layer forming step for forming an adhesion layer for wiring substrate on the wiring, and the wiring A method for manufacturing a wiring board, comprising: an insulating layer forming step of forming an insulating layer on an adhesion layer for a substrate. 密着層形成工程が、メルカプト基及びスルホン酸基を少なくとも含む化合物、並びにそのアルカリ金属塩の少なくともいずれかを含む溶液と、下記構造式(1)で表されるトリアジン骨格を有する化合物を少なくとも含む溶液とを用いて、配線表面を処理することにより配線基板用密着層を形成する請求項3に記載の配線基板の製造方法。The adhesion layer forming step includes a solution containing at least one of a compound containing at least a mercapto group and a sulfonic acid group, and an alkali metal salt thereof, and a solution containing at least a compound having a triazine skeleton represented by the following structural formula (1) The method for manufacturing a wiring board according to claim 3, wherein a wiring board adhesion layer is formed by treating the wiring surface using

ただし、前記構造式(1)中、Xは、NRHowever, in said structural formula (1), X is NR. 2 及びSAの少なくともいずれかを表す。Rは、水素原子、メチル基、エチル基、プロピル基、及びフェニル基の少なくともいずれかを表し、Aは、水素原子、Li原子、Na原子、K原子、Rb原子、及びCs原子の少なくともいずれかを表す。And at least one of SA. R represents a hydrogen atom, a methyl group, an ethyl group, a propyl group, or a phenyl group, and A represents at least one of a hydrogen atom, a Li atom, a Na atom, a K atom, an Rb atom, and a Cs atom. Represents.
JP2005217937A 2005-07-27 2005-07-27 Wiring board and manufacturing method thereof Expired - Fee Related JP4648122B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005217937A JP4648122B2 (en) 2005-07-27 2005-07-27 Wiring board and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005217937A JP4648122B2 (en) 2005-07-27 2005-07-27 Wiring board and manufacturing method thereof

Publications (3)

Publication Number Publication Date
JP2007035972A JP2007035972A (en) 2007-02-08
JP2007035972A5 true JP2007035972A5 (en) 2008-07-10
JP4648122B2 JP4648122B2 (en) 2011-03-09

Family

ID=37794849

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005217937A Expired - Fee Related JP4648122B2 (en) 2005-07-27 2005-07-27 Wiring board and manufacturing method thereof

Country Status (1)

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JP (1) JP4648122B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4843538B2 (en) * 2007-03-22 2011-12-21 富士通株式会社 Circuit board and manufacturing method thereof
JP5891814B2 (en) * 2012-01-25 2016-03-23 大日本印刷株式会社 Pattern structure manufacturing method and pattern forming substrate used therefor
JP6582850B2 (en) * 2015-10-09 2019-10-02 富士通株式会社 Adhesion improving material, wiring structure, manufacturing method thereof, semiconductor device, and manufacturing method thereof

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4016078B2 (en) * 2000-01-18 2007-12-05 株式会社東亜電化 Printed wiring board manufacturing method and multilayer printed wiring board
DE10066028C2 (en) * 2000-07-07 2003-04-24 Atotech Deutschland Gmbh Copper substrate with roughened surfaces

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