JP2007033672A - Liquid crystal display - Google Patents
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Abstract
Description
本発明は、液晶表示装置に係り、特に配向膜に光の照射で配向制御能を付与した液晶表示装置に関する。 The present invention relates to a liquid crystal display device, and more particularly to a liquid crystal display device in which an alignment film is imparted with an alignment control ability by light irradiation.
液晶表示装置に使用する配向膜を配向処理すなわち配向制御能を付与する方法として、従来からラビングで処理する方法がある。このラビングによる配向処理は、配向膜を布で擦ることで配向処理を行うものである。一方、配向膜に非接触で配向制御能を付与する光配向法がある。 As a method for imparting an alignment treatment, that is, an alignment control ability, to an alignment film used in a liquid crystal display device, there is a conventional method of rubbing. The alignment treatment by rubbing is performed by rubbing the alignment film with a cloth. On the other hand, there is a photo-alignment method in which alignment control ability is imparted to the alignment film without contact.
紫外線に代表される光の照射により配向処理を行う光配向を開示する特許文献１には、基板の面積を大きくすることなく基板に照射される偏光光の偏光方向を変える技術について記載されている。
特許文献１では、液晶表示パネルを構成する一方の基板（通例、画素選択用のアクティブ素子として薄膜トランジスタが形成された基板、以下薄膜トランジスタ基板:ＴＦＴ基板とも称する）とこの一方の基板に対向する他方の基板（通例、カラーフィルタが形成された基板、カラーフィルタ基板:ＣＦ基板とも称する）のそれぞれの配向膜に配向制御能を付与するための光量には特に差を持たせていない。
In
紫外線照射による配向制御能を付与した（配向処理を施した）液晶表示パネルにおいて、表示/非表示部分の長時間経過後の輝度の変化率、つまり焼き付きを低減させるため、ＣＦ基板側の配向膜に対する紫外線の照射量をＴＦＴ基板側配向膜に対する照射量よりも大としたものが特許文献２に開示されている。
光照射による配向膜への配向制御能の付与では、ラビングによるものと比較して処理に長時間を要する（タクトが低い）。その結果、製品の製造プロセス全体の処理時間が多くかかり、コスト低減の妨げの一つになっている。また、ＣＦ基板の配向膜に照射する光の積算値（積算光量）が大になると、その白色度座標が増加し、所謂黄変が増加する。さらに、ＣＦ基板の配向膜に照射する光の積算値が多いと、所謂アンカリング強度が低下し、残像特性が劣化する。 In the case of imparting alignment control ability to the alignment film by light irradiation, a longer time is required for processing than in the case of rubbing (low tact). As a result, the entire manufacturing process of the product takes a long time, which is one of the obstacles to cost reduction. Further, when the integrated value (integrated light amount) of light applied to the alignment film of the CF substrate becomes large, the whiteness coordinate increases and so-called yellowing increases. Furthermore, if the integrated value of light applied to the alignment film of the CF substrate is large, the so-called anchoring strength is lowered and the afterimage characteristics are deteriorated.
本発明の目的は、特にＣＦ基板の配向膜への配向制御能の付与時間を最適化することで、タクトをアップし、黄変を低減すると共に残像発生を抑制した液晶表示装置を提供することである。 An object of the present invention is to provide a liquid crystal display device that improves tact, reduces yellowing and suppresses afterimage generation by optimizing the time for imparting alignment control ability to the alignment film of the CF substrate. It is.
本発明は、第２の配向膜すなわちＣＦ基板の配向膜に照射された積算光量を、第１の配向膜すなわちＴＦＴ基板の配向膜に照射された積算光量よりも少なくした。また、本発明は、一方の基板すなわちＴＦＴ基板のリタデーションを、他方の基板すなわちＣＦ基板のリタデーションより大とした。 In the present invention, the integrated light amount irradiated to the second alignment film, that is, the alignment film of the CF substrate, is made smaller than the integrated light amount irradiated to the first alignment film, that is, the alignment film of the TFT substrate. Further, in the present invention, the retardation of one substrate, that is, the TFT substrate is made larger than the retardation of the other substrate, that is, the CF substrate.
以下、本発明の代表的な特徴的構成を列挙する。すなわち、
（１）本発明の液晶表示装置は、画素選択用のアクティブ素子が形成された主面の最上層に第１の配向膜を備えた一方の基板と、カラーフィルタが形成された主面の最上層に第２の配向膜を備えた他方の基板とを有し、一方の基板の第１の配向膜と他方の基板の第２の配向膜の間に液晶を挟持して封止された液晶表示パネルを具備している。そして、第１の配向膜と第２の配向膜は共に、光の照射により液晶配向制御能が付与されており、第２の配向膜に照射された積算光量が、第１の配向膜に照射された積算光量よりも少ないことを特徴とする。
Hereinafter, typical characteristic configurations of the present invention will be listed. That is,
(1) In the liquid crystal display device of the present invention, one substrate having the first alignment film on the uppermost layer of the main surface on which the active elements for pixel selection are formed, and the uppermost surface of the main surface on which the color filter is formed. And a second substrate having a second alignment film as an upper layer, and the liquid crystal is sealed by sandwiching a liquid crystal between the first alignment film of one substrate and the second alignment film of the other substrate A display panel is provided. The first alignment film and the second alignment film are both given liquid crystal alignment control ability by light irradiation, and the integrated light quantity irradiated to the second alignment film is irradiated to the first alignment film. It is characterized in that it is less than the integrated integrated light quantity.
上記した第２の配向膜の積算光量を、第１の配向膜の積算光量の３０％乃至８０％、好ましくは４０％乃至７０％、さらに好ましく４０％乃至５０％とする。 The integrated light amount of the second alignment film is 30% to 80%, preferably 40% to 70%, more preferably 40% to 50% of the integrated light amount of the first alignment film.
また、本発明は、一方の基板のリタデーションを、他方の基板のリタデーションより大としたことを特徴とする。 Further, the present invention is characterized in that the retardation of one substrate is larger than the retardation of the other substrate.
上記一方の基板のリタデーション２．０ｎｍに対し、他方の基板のリタデーションを０．７ｎｍ乃至１．８ｎｍ、好ましくは１．３ｎｍ乃至１．７ｎｍ、より好ましくは１．１ｎｍ乃至１．３ｎｍとする。 The retardation of the other substrate is set to 0.7 nm to 1.8 nm, preferably 1.3 nm to 1.7 nm, more preferably 1.1 nm to 1.3 nm with respect to the retardation of the one substrate of 2.0 nm.
なお、本発明は、上記の構成および後述する実施の形態に開示される構成に限定されるものではなく、本発明の技術思想を逸脱することなく、種々の変更が可能であることは言うまでもない。 Note that the present invention is not limited to the above-described configuration and the configuration disclosed in the embodiments described later, and it goes without saying that various modifications can be made without departing from the technical idea of the present invention. .
本発明によれば、光配向プロセスのタクトがアップし、ＣＦ基板の配向膜の黄変を低減すると共に残像発生が抑制され、高品質の液晶表示装置が得られる。 According to the present invention, the tact of the photo-alignment process is increased, the yellowing of the alignment film of the CF substrate is reduced, and the afterimage generation is suppressed, and a high-quality liquid crystal display device is obtained.
以下、本発明の具体的な実施の形態について、実施例の図面を参照して詳細に説明する。 Hereinafter, specific embodiments of the present invention will be described in detail with reference to the drawings of the examples.
図１は、液晶表示装置を構成する液晶表示パネルの外観を模式的に示す斜視図である。この液晶表示パネルは、薄膜トランジスタ（ＴＦＴ）基板ＳＵＢ１とカラーフィルタ（ＣＦ）基板ＳＵＢ２を貼り合わせ、両基板の貼り合わせ間隙に液晶が封入されている。ＴＦＴ基板ＳＵＢ１の２辺はＣＦ基板ＳＵＢ２の対応する２辺からはみ出しており、このはみ出した短辺に走査信号線駆動回路チップであるゲートドライバＧＤＲが搭載され、長辺には表示信号線駆動回路チップであるドレインドライバＤＤＲが搭載されている。図１には、ゲートドライバＧＤＲが二個、ドレインドライバＤＤＲが五個示したが、これは模式的なものであり、各ドライバの数は液晶表示パネルのサイズ、精細度等により決められる。 FIG. 1 is a perspective view schematically showing an appearance of a liquid crystal display panel constituting a liquid crystal display device. In this liquid crystal display panel, a thin film transistor (TFT) substrate SUB1 and a color filter (CF) substrate SUB2 are bonded together, and liquid crystal is sealed in a bonding gap between the two substrates. Two sides of the TFT substrate SUB1 protrude from the corresponding two sides of the CF substrate SUB2, and a gate driver GDR which is a scanning signal line driving circuit chip is mounted on the protruding short side, and a display signal line driving circuit is provided on the long side. A drain driver DDR which is a chip is mounted. Although FIG. 1 shows two gate drivers GDR and five drain drivers DDR, this is a schematic one, and the number of each driver is determined by the size, definition, etc. of the liquid crystal display panel.
図２は、液晶表示装置全体の構成例を模式的に説明する展開斜視図である。図２は所謂縦電界方式（ＴＮ方式）の液晶表示パネルを用いたものである。図２において、ＴＦＴ基板ＳＵＢ１の主面にはアクティブ素子として薄膜トランジスタ回路を用いたマトリクス配列の多数の画素を構成する画素電極ＰＸ、画素のマトリクス配列領域（表示領域）の周囲に実装されたゲートドライバＧＤＲ、ドレインドライバＤＤＲおよび付属回路ＣＩＲが形成されている。この表示領域を含む最表面を覆ってＴＦＴ基板側配向膜ＯＲＩ１が成膜されている。 FIG. 2 is an exploded perspective view schematically illustrating a configuration example of the entire liquid crystal display device. FIG. 2 uses a so-called vertical electric field type (TN type) liquid crystal display panel. In FIG. 2, the main surface of the TFT substrate SUB1 has pixel electrodes PX constituting a large number of pixels in a matrix arrangement using thin film transistor circuits as active elements, and a gate driver mounted around the pixel matrix arrangement area (display area). A GDR, a drain driver DDR, and an attached circuit CIR are formed. A TFT substrate side alignment film ORI1 is formed so as to cover the outermost surface including the display region.
ＣＦ基板ＳＵＢ２の主面には対向電極（この方式では共通電極とも称する）ＣＴとカラーフィルタＣＦが形成され、前記表示領域に対応する領域を含む最表面を覆ってＣＦ基板側配向膜ＯＲＩ２が成膜されている。 A counter electrode (also referred to as a common electrode in this method) CT and a color filter CF are formed on the main surface of the CF substrate SUB2, and a CF substrate side alignment film ORI2 is formed to cover the outermost surface including the region corresponding to the display region. It is a membrane.
そして、ＴＦＴ基板ＳＵＢ１の配向膜ＯＲＩ１とＣＦ基板ＳＵＢ２の配向膜ＯＲＩ２の間に液晶ＬＣが封入されてシールＳＬで封止されている。 The liquid crystal LC is sealed between the alignment film ORI1 of the TFT substrate SUB1 and the alignment film ORI2 of the CF substrate SUB2 and sealed with a seal SL.
なお、ＴＦＴ基板ＳＵＢ１の外面、およびＣＦ基板ＳＵＢ２の外面には、それぞれ偏光板ＰＯＬ１、ＰＯＬ２が積層されている。この液晶表示装置は透過型であり、ＴＦＴ基板ＳＵＢ１の背面にバックライトＢＬが設置されている。 Note that polarizing plates POL1 and POL2 are laminated on the outer surface of the TFT substrate SUB1 and the outer surface of the CF substrate SUB2, respectively. This liquid crystal display device is a transmissive type, and a backlight BL is installed on the back surface of the TFT substrate SUB1.
図３は、所謂横電界方式の液晶表示パネルのＴＦＴ基板の構成例を模式的に説明する断面図である。なお、図３では薄膜トランジスタの図示を省略した。この方式では、ＴＦＴ基板ＳＵＢ１の主面に、対向電極ＣＴがべた電極として成膜されている。この対向電極ＣＴの上にゲート絶縁層ＧＩ、ＳｉＮを好適とする保護層であるパッシべーション層ＰＡＳが成膜され、その上に櫛歯状の画素電極ＰＸが形成されている。そして、画素電極ＰＸを覆って配向膜ＯＲＩ１が成膜されている。 FIG. 3 is a cross-sectional view schematically illustrating a configuration example of a TFT substrate of a so-called horizontal electric field type liquid crystal display panel. Note that the thin film transistor is not shown in FIG. In this method, the counter electrode CT is formed as a solid electrode on the main surface of the TFT substrate SUB1. A passivation layer PAS, which is a protective layer suitable for the gate insulating layer GI and SiN, is formed on the counter electrode CT, and a comb-like pixel electrode PX is formed thereon. An alignment film ORI1 is formed to cover the pixel electrode PX.
図４は、所謂横電界方式の液晶表示パネルのＴＦＴ基板の他の構成例を模式的に説明する断面図である。なお、図４でも薄膜トランジスタの図示を省略してある。この方式では、ＴＦＴ基板ＳＵＢ１の主面に、形成されたゲート絶縁層ＧＩの上にパッシべーション層ＰＡＳが成膜され、その上にそれぞれが櫛歯状とされた画素電極ＰＸと対向電極ＣＴとが交互に形成されている。そして、これら画素電極ＰＸと対向電極ＣＴとを覆って配向膜ＯＲＩ１が成膜されている。 FIG. 4 is a cross-sectional view schematically illustrating another configuration example of a TFT substrate of a so-called horizontal electric field type liquid crystal display panel. Note that the thin film transistor is not shown in FIG. In this method, a passivation layer PAS is formed on the main surface of the TFT substrate SUB1 on the formed gate insulating layer GI, and the pixel electrode PX and the counter electrode CT each having a comb-like shape are formed thereon. And are formed alternately. An alignment film ORI1 is formed to cover the pixel electrode PX and the counter electrode CT.
図５は、所謂横電界方式の液晶表示パネルのＣＦ基板の構成例を模式的に説明する断面図である。このＣＦ基板ＳＵＢ２は前記図３又は図４に示したＴＦＴ基板の何れかと組み合わせて液晶表示パネルを構成する。ＣＦ基板ＳＵＢ２は、その主面にブラックマトリクスＢＭで区画された３色のカラーフィルタＣＦが形成されている。なお、図５には一色のカラーフィルタのみを示してある。カラーフィルタＣＦは保護と平滑化のためのオーバコート層ＯＣが形成され、その上面を覆って配向膜ＯＲＩ２が形成されている。 FIG. 5 is a cross-sectional view schematically illustrating a configuration example of a CF substrate of a so-called horizontal electric field type liquid crystal display panel. This CF substrate SUB2 constitutes a liquid crystal display panel in combination with any of the TFT substrates shown in FIG. 3 or FIG. The CF substrate SUB2 has three color filters CF partitioned by a black matrix BM on its main surface. FIG. 5 shows only one color filter. In the color filter CF, an overcoat layer OC for protection and smoothing is formed, and an alignment film ORI2 is formed to cover the upper surface.
なお、図２に示したＴＮ方式の液晶表示パネルのＣＦ基板には、例えば図５のカラーフィルタの上層に対向電極が形成される。図２にはオーバコート層ＯＣは図示していない。オーバコート層ＯＣの主たる機能は、ブラックマトリクスＢＭとカラーフィルタＣＦの表面を平滑にして配向膜ＯＲＩ２を平坦にすることにある。 Note that, on the CF substrate of the TN liquid crystal display panel shown in FIG. 2, for example, a counter electrode is formed on the color filter of FIG. FIG. 2 does not show the overcoat layer OC. The main function of the overcoat layer OC is to smooth the surfaces of the black matrix BM and the color filter CF and to flatten the alignment film ORI2.
図６は、光配向の処理装置を模式的に説明する図である。ＴＦＴ基板ＳＵＢ１又はＣＦ基板ＳＵＢ２の主面に配向制御能未付与の配向膜ＯＲＩ１又はＯＲＩ２が成膜されている。光源には紫外線ランプＵＶＬが用いられる。紫外線ランプＵＶＬからの紫外線は偏光子ＰＬＺで所定の偏光成分のみが選択されてＴＦＴ基板ＳＵＢ１又はＣＦ基板ＳＵＢ２に成膜された配向膜ＯＲＩ１又はＯＲＩ２を照射する。ＴＦＴ基板ＳＵＢ１又はＣＦ基板ＳＵＢ２は矢印Ａ方向に移送され、基板全域の配向膜に配向制御能を付与する。なお、光源に対する基板の移動は相対的なものであり、光源側を移動させてもよく、あるいは光源と基板の両者を移動させるようにしてもよい。 FIG. 6 is a diagram schematically illustrating a photo-alignment processing apparatus. An alignment film ORI1 or ORI2 to which no alignment control ability is imparted is formed on the main surface of the TFT substrate SUB1 or the CF substrate SUB2. An ultraviolet lamp UVL is used as the light source. Ultraviolet rays from the ultraviolet lamp UVL irradiate the alignment film ORI1 or ORI2 formed on the TFT substrate SUB1 or the CF substrate SUB2 with only a predetermined polarization component selected by the polarizer PLZ. The TFT substrate SUB1 or the CF substrate SUB2 is transferred in the direction of arrow A, and imparts alignment control capability to the alignment film over the entire substrate. The movement of the substrate relative to the light source is relative, and the light source side may be moved, or both the light source and the substrate may be moved.
配向膜の材料としては、一般的にポリイミドが用いられる。この配向膜に紫外線を照射すると、その積算光量にが大きいほど白色度座標が増加する。ＣＦ基板ＳＵＢ２側には、その配向膜ＯＲＩ２の下層（基板側）にカラーフィルタが配置されている。配向膜ＯＲＩ２の白色度座標が増加すると、当然のこととしてカラーフィルタを通過した色光の純度が劣化する。 As the material for the alignment film, polyimide is generally used. When this alignment film is irradiated with ultraviolet rays, the whiteness coordinate increases as the integrated light quantity increases. On the CF substrate SUB2 side, a color filter is disposed below the alignment film ORI2 (substrate side). As the whiteness coordinate of the alignment film ORI2 increases, the purity of the color light that has passed through the color filter naturally deteriorates.
図７は、配向膜に照射する紫外線の積算光量に対する白色度の変化をＣＩＥ色度図のx値とy値で説明する図である。図７（ａ）はx値の変化を、図７（ｂ）はy値の変化を示す。図７では、照射光の積算光量をＪ/ｃｍ2で示す。 FIG. 7 is a diagram for explaining the change in whiteness with respect to the cumulative amount of ultraviolet light applied to the alignment film, using the x and y values in the CIE chromaticity diagram. FIG. 7A shows a change in the x value, and FIG. 7B shows a change in the y value. In FIG. 7, the integrated light quantity of irradiation light is shown by J / cm < 2 >.
図８は、配向膜に照射する紫外線の積算光量に対するアンカリング強度の変化を説明する図である。図８では、照射光の積算光量をＪ/ｃｍ2で示し、アンカリング強度は１０-3J/ｍ2で示す。 FIG. 8 is a diagram for explaining a change in anchoring intensity with respect to the cumulative amount of ultraviolet light irradiated to the alignment film. In FIG. 8, the integrated light quantity of irradiation light is indicated by J / cm 2 , and the anchoring intensity is indicated by 10 −3 J / m 2 .
図９は、配向膜に照射する紫外線の積算光量に対するリタデーションの変化を説明する図である。図９では、照射光の積算光量をＪ/ｃｍ2で示し、リタデーションをｎｍで示す。通常の液晶表示装置におけるリタデーションは、ＴＦＴ基板側で２．０ｎｍ付近、ＣＦ基板側で０．６ｎｍ付近である。 FIG. 9 is a diagram for explaining the change in retardation with respect to the cumulative amount of ultraviolet light irradiated to the alignment film. In FIG. 9, the integrated light quantity of irradiation light is shown by J / cm < 2 >, and retardation is shown by nm. The retardation in a normal liquid crystal display device is around 2.0 nm on the TFT substrate side and around 0.6 nm on the CF substrate side.
ＴＦＴ基板ＳＵＢ１側の配向膜ＯＲＩ１の積算光量を１００％としたとき、ＣＦ基板ＳＵＢ２側の配向膜ＯＲＩ２への積算光量は３０％乃至８０％の範囲とする。３０％未満では必要なアンカリング強度が得られず、残像特性が悪化する。また、８０％を越えるとＣＦ基板の配向膜ＯＲＩ２の黄変が大きくなる。 When the integrated light amount of the alignment film ORI1 on the TFT substrate SUB1 side is 100%, the integrated light amount to the alignment film ORI2 on the CF substrate SUB2 side is in the range of 30% to 80%. If it is less than 30%, the required anchoring strength cannot be obtained, and the afterimage characteristics deteriorate. If it exceeds 80%, yellowing of the alignment film ORI2 of the CF substrate becomes large.
好ましくは、ＣＦ基板ＳＵＢ２側の配向膜ＯＲＩ２への積算光量を５０％乃至７０％の範囲とすることで、所要のアンカリング強度を確保すると共に、ＣＦ基板の配向膜ＯＲＩ２の黄変を抑制して色純度の劣化を回避できる。そして、さらに好ましくは上記積算光量を４０％乃至５０％の範囲とすれば、アンカリング強度を十分に確保すると共に、ＣＦ基板の配向膜ＯＲＩ２の黄変を防止して色純度の劣化を回避できる。 Preferably, by setting the integrated light amount to the alignment film ORI2 on the CF substrate SUB2 side in the range of 50% to 70%, the required anchoring strength is ensured and yellowing of the alignment film ORI2 of the CF substrate is suppressed. Therefore, deterioration of color purity can be avoided. More preferably, when the integrated light quantity is in the range of 40% to 50%, anchoring strength can be sufficiently secured, and yellowing of the alignment film ORI2 of the CF substrate can be prevented to avoid deterioration of color purity. .
また、配向膜の膜厚が１００ｎｍであるとき、ＴＦＴ基板ＳＵＢ１のリタデーションをアンカリング強度が十分に確保できる２．０ｎｍとしたときに、ＣＦ基板の配向膜ＯＲＩ２に照射する紫外線の積算光量を少なくしてリタデーションを０．７ｎｍ乃至１．８ｎｍとすることで焼き付き及び黄変を低減した表示特性を得ることができる。この場合、ＴＦＴ基板ＳＵＢ１のリタデーションを１とすると、ＣＦ基板の配向膜ＯＲＩ２のリタデーションは０．３５ｎｍ以上、０．９ｎｍ以下となる。そして、ＣＦ基板の配向膜ＯＲＩ２のリタデーションを１．３ｎｍ乃至１．７ｎｍとなる積算光量とすることで、より焼き付きを改善した表示とすることができ、さらに１．１ｎｍ乃至１．３ｎｍとなる積算光量とすることで焼き付きを改善するとともに黄変も抑制できる理想的な表示とすることができる。この場合、ＴＦＴ基板ＳＵＢ１のリタデーションが１とすると、ＣＦ基板のリタデーションは０．６５ｎｍ以上、０．８５ｎｍ以下となり、また、０．５５以上、０．６５ｎｍ未満となる。 Further, when the thickness of the alignment film is 100 nm, when the retardation of the TFT substrate SUB1 is 2.0 nm at which anchoring strength can be sufficiently secured, the cumulative amount of ultraviolet light irradiated to the alignment film ORI2 of the CF substrate is reduced. By setting the retardation to 0.7 nm to 1.8 nm, display characteristics with reduced burn-in and yellowing can be obtained. In this case, assuming that the retardation of the TFT substrate SUB1 is 1, the retardation of the alignment film ORI2 of the CF substrate is 0.35 nm or more and 0.9 nm or less. Then, by setting the retardation of the alignment film ORI2 of the CF substrate to an integrated light amount of 1.3 nm to 1.7 nm, it is possible to obtain a display with improved burn-in, and further to an integration of 1.1 nm to 1.3 nm. By setting the amount of light, it is possible to achieve an ideal display that can improve burn-in and suppress yellowing. In this case, if the retardation of the TFT substrate SUB1 is 1, the retardation of the CF substrate is 0.65 nm or more and 0.85 nm or less, and is 0.55 or more and less than 0.65 nm.
図１０は、配向膜の膜厚に対するリタデーションの値を説明する図である。ここで用いた配向膜の焼成条件は２３０℃/３０ｍｉｎ、積算光量は５Ｊ/ｃｍ2、消光比は１７:１である。図中、小さい白丸は実測値、黒丸は平均値を示す。この図から、配向膜の膜厚に対するリタデーションは、略直線状に比例することが分かる。 FIG. 10 is a diagram illustrating the retardation value with respect to the thickness of the alignment film. The baking conditions for the alignment film used here are 230 ° C./30 min, the integrated light quantity is 5 J / cm 2 , and the extinction ratio is 17: 1. In the figure, small white circles indicate measured values, and black circles indicate average values. From this figure, it can be seen that the retardation with respect to the film thickness of the alignment film is proportional to a substantially linear shape.
図１１は、ＣＦ基板の配向膜の積算光量をＴＦＴ基板の配向膜の積算光量より少なくした本発明の効果をまとめた説明図である。図１１では、ＣＦ基板の配向膜の積算光量（図１１では、ＣＦ側積算光量と表記）をＴＦＴ基板の配向膜の積算光量を１００としたときの割合として、４０〜５０％とした場合、５０〜７０％とした場合、３０〜８０％とした場合、のそれぞれについてのＣＦ（カラーフィルタ）の黄変低減効果をＣＦ基板の配向膜の積算光量を１００％にした場合の白色度座標（ｘ,ｙ）からの偏差Δｘ,Δｙで示し、また、アンカリング強度、タクトアップ効果、ＣＦ側リタデーションの対ＴＦＴ側リタデーションの差を示した。なお、黄変低減効果についてはΔｘ、Δｙとも、０．００２以下であると黄変ＮＧレベルと認識される。また、アンカリング強度は配向性を維持するためには、０．９以上であることが必要とされる。 FIG. 11 is an explanatory view summarizing the effects of the present invention in which the integrated light amount of the alignment film of the CF substrate is less than the integrated light amount of the alignment film of the TFT substrate. In FIG. 11, when the integrated light amount of the alignment film of the CF substrate (in FIG. 11, expressed as CF-side integrated light amount) is 40 to 50% as a ratio when the integrated light amount of the alignment film of the TFT substrate is 100, When 50 to 70%, 30 to 80%, the yellowing reduction effect of CF (color filter) for each of the whiteness coordinates when the integrated light quantity of the alignment film of the CF substrate is 100% ( x, y) are indicated by deviations Δx, Δy, and anchoring strength, tact-up effect, and CF side retardation versus TFT side retardation are shown. Regarding the yellowing reduction effect, if both Δx and Δy are 0.002 or less, it is recognized as a yellowing NG level. Further, the anchoring strength is required to be 0.9 or more in order to maintain the orientation.
ＳＵＢ１・・・ＴＦＴ基板、ＰＸ・・・画素電極、ＧＤＲ・・・ゲートドライバ、ＤＤＲ・・・ドレインドライバ、ＣＩＲ・・・付属回路、ＯＲＩ１・・・ＴＦＴ基板側配向膜、ＯＲＩ２・・・ＣＦ基板ＳＵＢ２配向膜、ＣＴ・・・対向電極（共通電極）、ＣＦ・・・カラーフィルタ、ＬＣ・・・液晶、ＳＬ・・・シール、ＰＯＬ１,ＰＯＬ２・・・偏光板、ＢＬ・・・バックライト。
SUB1 ... TFT substrate, PX ... Pixel electrode, GDR ... Gate driver, DDR ... Drain driver, CIR ... Attached circuit, ORI1 ... TFT substrate side alignment film, ORI2 ... CF Substrate SUB2 alignment film, CT ... counter electrode (common electrode), CF ... color filter, LC ... liquid crystal, SL ... seal, POL1, POL2 ... polarizing plate, BL ... backlight .
Claims (9)
前記第１の配向膜と前記第２の配向膜は共に、光の照射により液晶配向制御能が付与されており、
前記第２の配向膜に照射された積算光量が、前記第１の配向膜に照射された積算光量よりも少ないことを特徴とする液晶表示装置。 One substrate having the first alignment film on the uppermost layer of the main surface on which the active element for pixel selection is formed, and the other substrate having the second alignment film on the uppermost layer of the main surface on which the color filter is formed And a liquid crystal display device comprising a liquid crystal display panel comprising a liquid crystal sealed between the first alignment film of the one substrate and the second alignment film of the other substrate,
Both the first alignment film and the second alignment film are given liquid crystal alignment control ability by light irradiation,
The liquid crystal display device characterized in that an integrated light amount applied to the second alignment film is smaller than an integrated light amount applied to the first alignment film.
前記一方の基板のリタデーションが、前記他方の基板のリタデーションより大であることを特徴とする液晶表示装置。 One substrate having the first alignment film on the uppermost layer of the main surface on which the active element for pixel selection is formed, and the other substrate having the second alignment film on the uppermost layer of the main surface on which the color filter is formed And a liquid crystal display device comprising a liquid crystal display panel comprising a liquid crystal sealed between the first alignment film of the one substrate and the second alignment film of the other substrate,
A liquid crystal display device, wherein the retardation of the one substrate is larger than the retardation of the other substrate.
6. The liquid crystal display device according to claim 5, wherein when the retardation of the one substrate is 1, the retardation of the other substrate is 0.35 nm or more and 0.9 nm or less.
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