JP2007026488A - Water abrasive for magnetic disk substrate and manufacturing method of magnetic disk substrate - Google Patents

Water abrasive for magnetic disk substrate and manufacturing method of magnetic disk substrate Download PDF

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JP2007026488A
JP2007026488A JP2005203326A JP2005203326A JP2007026488A JP 2007026488 A JP2007026488 A JP 2007026488A JP 2005203326 A JP2005203326 A JP 2005203326A JP 2005203326 A JP2005203326 A JP 2005203326A JP 2007026488 A JP2007026488 A JP 2007026488A
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magnetic disk
fine particles
disk substrate
abrasive
diamond fine
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Koichi Aizawa
宏一 会沢
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Fuji Electric Co Ltd
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Fuji Electric Device Technology Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a water abrasive for a magnetic disk substrate, wherein polishing properties of a Ni-P surface of the magnetic disk substrate are excellent and an organic residue does not remain on a polished surface after polishing. <P>SOLUTION: The water abrasive for the magnetic disk substrate contains abrasive fine particles, a higher fatty acid and a polyethylene glycol ether type non-ionic surfactant. The abrasive fine particles consist of diamond fine particles, wherein a dispersion liquid formed by dispersing the fine particles in pure water in a ratio of 20 carat/L has a pH value of ≥7.0. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、磁気ディスク基板用水性研磨剤に関し、さらに詳しくは、研削材微粒子がダイヤモンド微粒子からなる磁気ディスク基板用水性研磨剤および該水性研磨剤による基板研磨工程を含む磁気ディスク基板の製造方法に関する。   The present invention relates to an aqueous abrasive for a magnetic disk substrate, and more particularly to an aqueous abrasive for a magnetic disk substrate in which abrasive fine particles are diamond fine particles and a method for producing a magnetic disk substrate including a substrate polishing step using the aqueous abrasive. .

磁気ディスク(ハードディスクメモリー)は、コンピュータの高速アクセスが可能な外部記憶装置として広く採用されている。   Magnetic disks (hard disk memories) are widely used as external storage devices that can be accessed at high speed by computers.

磁気ディスクの代表的な一例は、アルミ合金基板上に無電解メッキにより形成されたニッケルリン(Ni−P)層を有する磁気ディスク基板上に、クロム下地層、コバルト磁性膜層、カーボン保護膜層を順次積層した構造を有し、前記Ni−P層の表面は、研磨によるテクスチャ加工が施されている。   A typical example of a magnetic disk is a chromium underlayer, a cobalt magnetic film layer, a carbon protective film layer on a magnetic disk substrate having a nickel phosphorus (Ni-P) layer formed by electroless plating on an aluminum alloy substrate. The surface of the Ni-P layer is textured by polishing.

磁気ディスク表面の表面粗さは、磁気ディスクの品質に大きく影響し、特に、磁気ディスク表面に磁気ヘッドの浮上高さを越えるような突起が存在すると、磁気ヘッドおよび磁気ディスクの両方を損傷させる原因となることから、磁気ディスク表面は極めて平滑な表面に仕上られている。   The surface roughness of the magnetic disk has a significant effect on the quality of the magnetic disk. In particular, the presence of protrusions on the surface of the magnetic disk that exceed the flying height of the magnetic head can cause damage to both the magnetic head and the magnetic disk. Therefore, the surface of the magnetic disk is finished to an extremely smooth surface.

磁気ディスク表面の突起の原因として、磁気ディスク基板表面に始めから存在する突起、その表面にスパッタリングなどにより積層される各層の微粒子の付着、成膜後の塵埃の付着などが挙げられるが、特に、磁気ディスク基板表面の突起は、その上に積層される各層に引き継がれることから、磁気ディスク基板表面は各層の積層前に所定のテクスチャを有するように精密研磨される。   Causes of protrusions on the surface of the magnetic disk include protrusions existing on the surface of the magnetic disk substrate, adhesion of fine particles of each layer laminated by sputtering, etc., adhesion of dust after film formation, etc. Since the protrusions on the surface of the magnetic disk substrate are inherited by the layers stacked thereon, the surface of the magnetic disk substrate is precisely polished so as to have a predetermined texture before the layers are stacked.

磁気ディスク基板表面をテクスチャ加工するための研磨方法として、研磨テープを用いる方法(特許文献1など)、パニッシング法(特許文献2など)、ホーニング法(特許文献3)などが知られ、これらの方法には種々の研磨剤が使用される。   Known polishing methods for texturing the surface of a magnetic disk substrate include a method using a polishing tape (Patent Document 1 and the like), a punishing method (Patent Document 2 and the like), a honing method (Patent Document 3), and the like. A variety of abrasives are used.

これらの方法で使用される研磨剤は、研削材の微粒子を研磨時に発生する熱を除去するクーラントを兼ねる分散媒に分散させたものであり、たとえば、研削材としてダイヤモンド微粒子を含有する研磨剤(特許文献4、5など)、酸化アルミニウム微粒子を含有する研磨剤(特許文献6、7、8、9など)、コロイドシリカ系の研磨剤(特許文献10など)等が知られている。   The abrasive used in these methods is obtained by dispersing fine particles of an abrasive in a dispersion medium that also serves as a coolant that removes heat generated during polishing. For example, an abrasive containing diamond fine particles as an abrasive ( Patent Documents 4, 5, etc.), abrasives containing aluminum oxide fine particles (Patent Documents 6, 7, 8, 9 etc.), colloidal silica-based abrasives (Patent Document 10, etc.) and the like are known.

磁気ディスク基板表面に目的とするテクスチャを形成するために、研削材微粒子には、極めて小さな粒子径と、研磨剤中に均一にかつ安定して分散している分散安定性が要求されることから、研磨剤は、研削材微粒子の分散剤として各種の界面活性剤を含有し、クーラントを兼ねる分散媒には水が好適に使用されている。   In order to form the desired texture on the surface of the magnetic disk substrate, the abrasive fine particles need to have an extremely small particle size and dispersion stability that is uniformly and stably dispersed in the abrasive. The abrasive contains various surfactants as a dispersant for the abrasive fine particles, and water is suitably used as a dispersion medium that also serves as a coolant.

近年、研削材微粒子としてダイヤモンド微粒子を含み、分散剤として高級脂肪酸のアルカノールアミン塩型の非イオン系界面活性剤とポリエチレングリコールエーテル型の非イオン系化面活性剤とを主成分とする混合物を含む水性研磨剤(特許文献11)が研磨性に優れることから注目されている。   In recent years, diamond fine particles have been included as abrasive fine particles, and a mixture mainly composed of a higher fatty acid alkanolamine salt type nonionic surfactant and a polyethylene glycol ether type nonionic surfactant as a dispersant. An aqueous abrasive (Patent Document 11) is attracting attention because of its excellent abrasiveness.

特開昭64−086320号公報JP-A 64-086320 特開平03−273523号公報Japanese Patent Laid-Open No. 03-273523 特開平03−290822号公報Japanese Patent Laid-Open No. 03-290822 特開昭62−157327号公報JP-A-62-157327 特開昭63−197030号公報JP-A 63-197030 特開昭60−108489号公報Japanese Patent Laid-Open No. 60-108489 特開昭62−025187号公報JP-A-62-025187 特開平01−188264号公報Japanese Patent Laid-Open No. 01-188264 特開平04−275387号公報Japanese Patent Laid-Open No. 04-275387 特開平07−240025号公報Japanese Patent Laid-Open No. 07-240025 特開平11−185249号公報JP-A-11-185249

前記ダイヤモンド微粒子および非イオン系界面活性剤の混合物を含む水性研磨剤は、優れた研磨性を有するが、その研磨性にはかなりのバラツキがあり、磁気ディスク基板の研磨後の洗浄によっても、基板上に有機残渣が残留し固着することが認められる。   The aqueous abrasive containing the mixture of the diamond fine particles and the nonionic surfactant has excellent abrasiveness, but there is considerable variation in the abrasiveness, and even after cleaning the magnetic disk substrate, the substrate It can be seen that organic residues remain on top and stick.

本発明は、研磨性にバラツキがなく、かつ、洗浄により有機残渣が残留しないダイヤモンド微粒子を研削材として含有する水性研磨剤を提供することを目的とする。また、磁気ヘッドおよび磁気ディスクに損傷を及ぼすような突起のない平滑な表面を有する磁気ディスク基板の製造方法を提供することを別の目的とする。   An object of the present invention is to provide an aqueous abrasive containing diamond fine particles, which have no variation in abrasiveness and in which no organic residue remains after washing, as an abrasive. Another object of the present invention is to provide a method of manufacturing a magnetic disk substrate having a smooth surface free from protrusions that damage the magnetic head and the magnetic disk.

本発明者等は、前記目的を達成すべく鋭意研究した結果、研削材として市販されているダイヤモンド微粒子を純水中に分散させた分散液において、ダイヤモンド微粒子の分散性には大きな差は認められないものの、分散液のpH値には、約3ないし約8と大きな差があること、そして、高級脂肪酸を含む水系中においては、ダイヤモンド微粒子の分散性が、前記分散液のpH値に依存することを見出し、本発明を完成した。   As a result of diligent research to achieve the above object, the present inventors have found that there is a large difference in the dispersibility of diamond fine particles in a dispersion in which diamond fine particles that are commercially available as abrasives are dispersed in pure water. Although there is no difference, the pH value of the dispersion has a large difference of about 3 to about 8, and the dispersibility of the diamond fine particles depends on the pH value of the dispersion in an aqueous system containing a higher fatty acid. As a result, the present invention has been completed.

本発明の磁気ディスク基板用水性研磨剤は、研削材微粒子、高級脂肪酸およびポリエチレングリコールエーテル型非イオン系界面活性剤を含有する磁気ディスク基板用水性研磨剤であって、前記研削材微粒子が、該微粒子を純水中に20カラット/リットルの割合で分散させた分散液のpH値が7.0以上を示すダイヤモンド微粒子からなることを特徴とする。   The aqueous abrasive for magnetic disk substrate of the present invention is an aqueous abrasive for magnetic disk substrate containing abrasive fine particles, higher fatty acid and polyethylene glycol ether type nonionic surfactant, wherein the abrasive fine particles are It is characterized by comprising diamond fine particles having a pH value of 7.0 or more in a dispersion liquid in which fine particles are dispersed in pure water at a rate of 20 carats / liter.

本発明において、前記ダイヤモンド微粒子は、純水中20カラット/リットルの分散液のpH値が7.0以上となるまで水洗されたダイヤモンド微粒子であってもよい。また、前記高級脂肪酸は、ノナン酸、リシノール酸およびそれらの混合物よりなる群から選択される。   In the present invention, the diamond fine particles may be diamond fine particles that have been washed with water until the pH value of a dispersion of 20 carats / liter in pure water becomes 7.0 or more. The higher fatty acid is selected from the group consisting of nonanoic acid, ricinoleic acid and mixtures thereof.

本発明の磁気ディスク基板の製造方法は、前記磁気ディスク基板用水性研磨剤を用いて磁気ディスク基板を研磨する工程、および研磨された磁気ディスク基板面を水洗する工程を含むことを特徴とする。   The method of manufacturing a magnetic disk substrate according to the present invention includes a step of polishing the magnetic disk substrate using the aqueous abrasive for magnetic disk substrate and a step of washing the polished magnetic disk substrate surface with water.

本発明の水性研磨剤においては、研削材のダイヤモンド微粒子が分散性に優れることから、それを用いた磁気ディスク基板の研磨において、目的とするテクスチャ加工面が得られるだけでなく、ダイヤモンド微粒子の分散剤として高級脂肪酸とポリエチレングリコールエーテル型非イオン系界面活性剤との組み合わせを選択したことにより、研磨後の水洗により基板表面から有機物を効率よく除去することができる。その結果、本発明の水性研磨剤を用いた磁気ディスク基板の研磨工程における、研磨不良の発生率が低減し製品の歩留まりが著しく向上する。   In the water-based abrasive of the present invention, the diamond fine particles of the abrasive are excellent in dispersibility. Therefore, in the polishing of the magnetic disk substrate using the abrasive, not only the desired textured surface is obtained but also the dispersion of the diamond fine particles. By selecting a combination of a higher fatty acid and a polyethylene glycol ether type nonionic surfactant as an agent, organic substances can be efficiently removed from the substrate surface by washing with water after polishing. As a result, in the polishing process of the magnetic disk substrate using the aqueous abrasive of the present invention, the occurrence rate of poor polishing is reduced and the yield of products is remarkably improved.

本発明の水性研磨剤において、研削材として、市販されているダイヤモンド微粒子またはそれらを水洗したダイヤモンド微粒子であって、純水中に20カラット/リットルの濃度で分散させた分散液のpH値が7.0以上を示すダイヤモンド微粒子を含有する。   In the water-based abrasive of the present invention, as a grinding material, commercially available diamond fine particles or diamond fine particles obtained by washing them with water and having a pH of 7 dispersed in pure water at a concentration of 20 carats / liter. Contains diamond fine particles exhibiting 0.0 or more.

市販のダイヤモンド微粒子は、それらの製造方法、製造後の洗浄方法の違いによって、アニオンとしてCl、NO、SOなど、カチオンとしてCa、Mg、Naなどの不純物を含み、それらを純水中に20カラット/リットルの濃度で分散させた分散液は、表1に示すように3.3〜8.1の広い範囲のpH値を示す。 Commercially available diamond fine particles contain impurities such as Cl, NO 3 and SO 4 as anions and Ca, Mg and Na as cations, depending on the production method and the cleaning method after production. The dispersion dispersed at a concentration of 20 carats / liter exhibits a wide range of pH values from 3.3 to 8.1 as shown in Table 1.

Figure 2007026488
Figure 2007026488

上記純水分散液中のダイヤモンド微粒子の粒径は、表1中に示すように、それらの分散液の示すpH値にかかわらず大きな差はなく、粒径のpH依存性は認められない。   As shown in Table 1, the particle diameters of the diamond fine particles in the pure water dispersion are not greatly different regardless of the pH values indicated by these dispersions, and the pH dependence of the particle diameter is not recognized.

一方、これらの各ダイヤモンド微粒子を、5%ノナン酸水溶液中に添加して分散させた場合、ダイヤモンド微粒子の一部、特に純水分散液のpH値が4.5以下のダイヤモンド微粒子に凝集が認められ、その凝集粒径は、表1中に示したように水分散液のpH値に依存する。純水分散液中およびノナン酸溶液分散液中のダイヤモンド微粒子の粒径のpH依存性を図1に示す。   On the other hand, when each of these diamond fine particles is added and dispersed in a 5% nonanoic acid aqueous solution, agglomeration is observed in a part of the diamond fine particles, particularly diamond fine particles having a pure water dispersion having a pH value of 4.5 or less. The aggregated particle size depends on the pH value of the aqueous dispersion as shown in Table 1. FIG. 1 shows the pH dependence of the particle size of the diamond fine particles in the pure water dispersion and in the nonanoic acid solution dispersion.

本発明の水性研磨剤においては、ノナン酸溶液分散液中において大きな凝集の認められない純水分散液のpH値が7.0以上を示すダイヤモンド微粒子を用いる。水洗によって純水分散液のpH値が7.0以上を示すようになったダイヤモンド微粒子を用いることもできる。ダイヤモンド微粒子の配合量は、重量で0.1〜2.0カラット/リットル、好ましくは0.3〜1.3カラット/リットルの範囲である。   In the aqueous abrasive of the present invention, diamond fine particles having a pH value of 7.0 or higher in a pure water dispersion in which no large aggregation is observed in the nonanoic acid solution dispersion are used. Diamond fine particles in which the pH value of the pure water dispersion is 7.0 or more by washing with water can also be used. The blending amount of the diamond fine particles is 0.1 to 2.0 carat / liter, preferably 0.3 to 1.3 carat / liter in weight.

本発明の水性研磨剤において、高級脂肪酸は、炭素数8〜18の飽和または不飽和の脂肪族カルボン酸およびヒドロキシカルボン酸、たとえば、オクタン酸、ノナン酸、ラウリン酸、ミリスチン酸、パルミチン酸、ステアリン酸、アゼライン酸、セバシン酸、オレイン酸、リシノール酸などであり、好ましくはノナン酸、リシノール酸およびそれらの混合物から選択される。高級脂肪酸の配合量は、水性研磨剤の重量基準で0.1〜30重量%、好ましくは、0.5〜5重量%の範囲である。   In the aqueous abrasive of the present invention, the higher fatty acid is a saturated or unsaturated aliphatic carboxylic acid having 8 to 18 carbon atoms and a hydroxycarboxylic acid such as octanoic acid, nonanoic acid, lauric acid, myristic acid, palmitic acid, stearin. Acids, azelaic acid, sebacic acid, oleic acid, ricinoleic acid and the like, preferably selected from nonanoic acid, ricinoleic acid and mixtures thereof. The blending amount of the higher fatty acid is 0.1 to 30% by weight, preferably 0.5 to 5% by weight, based on the weight of the aqueous abrasive.

本発明の水性研磨剤において、ポリエチレングリコールエーテル型非イオン系界面活性剤は、重合度が5〜9のポリエチレングリコールとC12〜C18の高級アルコールまたはC〜Cのアルキルフェノールとから導かれた非イオン系界面活性剤である。ポリエチレングリコール型非イオン系界面活性剤の配合量は、水性研磨剤の重量基準で0.1〜30重量%、好ましくは、0.5〜5重量%の範囲である。 In the aqueous abrasive of the present invention, the polyethylene glycol ether type nonionic surfactant is derived from polyethylene glycol having a degree of polymerization of 5 to 9 and a higher alcohol of C 12 to C 18 or an alkyl phenol of C 8 to C 9. It is a nonionic surfactant. The blending amount of the polyethylene glycol type nonionic surfactant is in the range of 0.1 to 30% by weight, preferably 0.5 to 5% by weight, based on the weight of the aqueous abrasive.

水性研磨剤
前記表1に示した試料番号1〜11のダイヤモンド微粒子のそれぞれを、リシノール酸1%およびポリエチレングリコールエーテル型非イオン系界面活性剤(n−ブチルカルビトールのポリエチレングリコールエーテル:和光純薬(株)製)1%を含む水溶液中に、1カラット/リットルの濃度で分散させ水性研磨剤を調製した。
Aqueous abrasives Each of the diamond fine particles of Sample Nos. 1 to 11 shown in Table 1 was mixed with ricinoleic acid 1% and a polyethylene glycol ether type nonionic surfactant (polyethylene glycol ether of n-butyl carbitol: Wako Pure Chemical Industries, Ltd.) An aqueous abrasive was prepared by dispersing it in an aqueous solution containing 1% at a concentration of 1 carat / liter.

磁気ディスク基板の研磨
無電解メッキによりNi−P層を形成したアルミ合金製基板からなる3.5インチの磁気ディスク基板のNi−P層面に、研磨テープをコンタクトローラーにより圧着し、前記水性研磨剤のそれぞれを滴下しながら磁気ディスク基板を回転させ1分間研磨した。
Polishing of magnetic disk substrate A polishing tape is pressure-bonded to a Ni-P layer surface of a 3.5-inch magnetic disk substrate made of an aluminum alloy substrate on which a Ni-P layer is formed by electroless plating with a contact roller. The magnetic disk substrate was rotated while each of these was dropped and polished for 1 minute.

洗浄
研磨後の基板表面が乾固しないように水シャワーをかけながら、洗浄剤中で超音波洗浄を1分間、次いで純水すすぎを2分間実施し、風乾した。
Cleaning Ultrasonic cleaning was performed in a cleaning agent for 1 minute and then rinsed with pure water for 2 minutes while air-drying while applying a water shower so that the substrate surface after polishing was not dried.

評価
洗浄処理後の各磁気ディスク基板の表面への付着パーティクル数および有機残渣の有無を、表面検査装置OSA6100(キャンベラ インスツルメント社製)を用いて評価した。磁気ディスク基板表面への付着パーティクル数を表2に、ダイヤモンド微粒子分散液のpHと付着パーティクル数の関係を図2に示す。
Evaluation The number of adhered particles on the surface of each magnetic disk substrate after the cleaning treatment and the presence or absence of organic residues were evaluated using a surface inspection apparatus OSA6100 (manufactured by Canberra Instruments). Table 2 shows the number of particles adhering to the magnetic disk substrate surface, and FIG. 2 shows the relationship between the pH of the diamond fine particle dispersion and the number of adhering particles.

Figure 2007026488
Figure 2007026488

試料番号4のダイヤモンド微粒子を、撹拌下の純水中に20カラット/リットルの濃度で分散させて洗浄した後、ろ過分離する操作を3回繰り返した。洗浄されたダイヤモンド微粒子の20カラット/リットルの濃度の水分散液のpH値は、7.1であった。   The operation of separating and filtering the sample No. 4 diamond fine particles after dispersing and washing in pure water under stirring at a concentration of 20 carats / liter was repeated three times. The pH value of the washed aqueous dispersion of diamond fine particles having a concentration of 20 carats / liter was 7.1.

得られた洗浄ダイヤモンド微粒子を用いた以外には、実施例1と同一の条件で調製した水性研磨剤を用い、実施例1と同一の条件で磁気ディスク基板の研磨および洗浄を行い、実施例1と同様の方法で基板表面の評価を行った。基板表面の付着パーティクル数は、10個であり、有機残渣は認められなかった。   A magnetic disk substrate was polished and cleaned under the same conditions as in Example 1 using an aqueous abrasive prepared under the same conditions as in Example 1 except that the obtained washed diamond fine particles were used. The substrate surface was evaluated in the same manner as described above. The number of adhered particles on the substrate surface was 10, and no organic residue was observed.

ダイヤモンド微粒子の粒径の水分散液およびノナン酸溶液分散液中におけるpH依存性を示すグラフ。The graph which shows the pH dependence in the aqueous dispersion and nonanoic acid solution dispersion of the particle diameter of a diamond fine particle. 実施例1で得られたダイヤモンド微粒子分散液のpHと付着パーティクル数との関係を示すグラフ。3 is a graph showing the relationship between the pH of the diamond fine particle dispersion obtained in Example 1 and the number of attached particles.

Claims (4)

研削材微粒子、高級脂肪酸およびポリエチレングリコールエーテル型非イオン系界面活性剤を含有する磁気ディスク基板用水性研磨剤であって、前記研削材微粒子が、該微粒子を純水中に20カラット/リットルの割合で分散させた分散液のpHが7.0以上を示すダイヤモンド微粒子からなることを特徴とする磁気ディスク基板用水性研磨剤。   An aqueous abrasive for a magnetic disk substrate containing abrasive fine particles, higher fatty acid and polyethylene glycol ether type nonionic surfactant, wherein the abrasive fine particles are contained in pure water at a rate of 20 carats / liter. An aqueous abrasive for magnetic disk substrates, comprising diamond fine particles having a pH of 7.0 or higher in the dispersion dispersed in (1). 前記ダイヤモンド微粒子が、純水中20カラット/リットルの分散液のpHが7.0以上となるまで水洗されたダイヤモンド微粒子からなることを特徴とする請求項1に記載の磁気ディスク基板用水性研磨剤。   The aqueous abrasive for magnetic disk substrate according to claim 1, wherein the diamond fine particles are diamond fine particles washed with water until the pH of a dispersion of 20 carats / liter in pure water becomes 7.0 or higher. . 前記高級脂肪酸が、ノナン酸、リシノール酸およびそれらの混合物よりなる群から選択されることを特徴とする請求項1に記載の磁気ディスク基板用水性研磨剤。   2. The aqueous abrasive for magnetic disk substrates according to claim 1, wherein the higher fatty acid is selected from the group consisting of nonanoic acid, ricinoleic acid and mixtures thereof. 請求項1〜3のいずれかに記載の磁気ディスク基板用水性研磨剤を用いて磁気ディスク基板を研磨する工程、および研磨された磁気ディスク基板面を水洗する工程を含むことを特徴とする磁気ディスク基板の製造方法。
A magnetic disk comprising: a step of polishing a magnetic disk substrate using the aqueous abrasive for magnetic disk substrate according to claim 1; and a step of washing the polished magnetic disk substrate surface with water. A method for manufacturing a substrate.
JP2005203326A 2005-07-12 2005-07-12 Water abrasive for magnetic disk substrate and manufacturing method of magnetic disk substrate Pending JP2007026488A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012011514A (en) * 2010-07-01 2012-01-19 Yushiro Chemical Industry Co Ltd Slurry composition for polishing processing, semiconductor substrate, and composite material formed of different hardness material
JP2020037669A (en) * 2018-09-04 2020-03-12 株式会社フジミインコーポレーテッド Polishing composition and polishing system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012011514A (en) * 2010-07-01 2012-01-19 Yushiro Chemical Industry Co Ltd Slurry composition for polishing processing, semiconductor substrate, and composite material formed of different hardness material
JP2020037669A (en) * 2018-09-04 2020-03-12 株式会社フジミインコーポレーテッド Polishing composition and polishing system
JP7316797B2 (en) 2018-09-04 2023-07-28 株式会社フジミインコーポレーテッド Polishing composition and polishing system

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