JP2007005107A - Light-emitting panel and method for manufacturing the same - Google Patents

Light-emitting panel and method for manufacturing the same Download PDF

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JP2007005107A
JP2007005107A JP2005183098A JP2005183098A JP2007005107A JP 2007005107 A JP2007005107 A JP 2007005107A JP 2005183098 A JP2005183098 A JP 2005183098A JP 2005183098 A JP2005183098 A JP 2005183098A JP 2007005107 A JP2007005107 A JP 2007005107A
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self
substrate
sealing member
resin layer
layer
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Yoshio Menda
芳生 免田
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Tohoku Pioneer Corp
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<P>PROBLEM TO BE SOLVED: To prevent a sealing member from peeling off after panel formation. <P>SOLUTION: An adhesive layer 5 is formed between a substrate 2L or a sealing member 6L and a resin layer 4 to stick the sealing member 6L on to the substrate 2L, when a plurality of light-emitting elements 3 are formed on the substrate 2L to stick the sealing member 6L on to the substrate 2L via the resin layer 4 for covering the light-emitting elements 3. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、自発光パネルの製造方法、自発光パネルに関するものである。   The present invention relates to a method for manufacturing a self-luminous panel and a self-luminous panel.

有機EL(Electroluminescence)パネルに代表される自発光パネルは、携帯電話や薄型テレビ、情報端末等のディスプレイは勿論のこと、車載用機能表示、例えばスピードメータ等のインパネや電化製品の機能表示部、フィルム状ディスプレイへの応用、屋外案内表示または照明への応用が期待され、盛んに開発・研究が進められている。   A self-luminous panel typified by an organic EL (Electroluminescence) panel is not only a display of a mobile phone, a flat-screen TV, an information terminal, but also an in-vehicle function display, such as an instrument panel such as a speedometer, or a function display unit of an electrical appliance, It is expected to be applied to film displays, outdoor guidance displays, or lighting, and is actively developed and researched.

このような自発光パネルは基板上に自発光素子を複数又は単数配置して形成されるものであり、自発光素子としては、有機EL素子の他に、LED(Light Emitting Diode)、FED(Field Emission Display)等の発光素子を挙げることができる。   Such a self-light-emitting panel is formed by arranging a plurality of or a single self-light-emitting element on a substrate. As the self-light-emitting element, in addition to an organic EL element, an LED (Light Emitting Diode), FED (Field And a light emitting element such as Emission Display).

自発光素子の構造は、有機EL素子を例にすると、アノード(陽極、正孔注入電極)とカソード(陰極、電子注入電極)との間に有機層(発光層を含み、低分子又は高分子有機材料からなる層)を挟み込んだ構造になっており、アノード,カソードの両電極間に電圧を印加することにより、アノードから有機層内に注入・輸送された正孔とカソードから有機層内に注入・輸送された電子が再結合して、この有機層(発光層)内での再結合によって所望の発光が得られるものである。   The structure of the self-luminous element is, for example, an organic EL element, an organic layer (including a light-emitting layer, low molecular weight or polymer) between an anode (anode, hole injection electrode) and a cathode (cathode, electron injection electrode). A layer made of an organic material) is sandwiched between the anode and cathode, and by applying a voltage between the anode and cathode, holes injected and transported from the anode into the organic layer and from the cathode into the organic layer The injected and transported electrons are recombined, and desired light emission is obtained by recombination in the organic layer (light emitting layer).

このような自発光パネルにおいては、自発光素子の発光特性を維持するために、自発光素子を外気から遮断する封止構造が一般に採用されている。特に有機ELパネルでは、有機層及び電極が大気中の水分や酸素に曝されると有機EL素子の発光特性が劣化することから、有機EL素子を外気から遮断する封止手段を設けることが現状の開発段階では不可欠になっている。   In such a self-luminous panel, in order to maintain the light emission characteristics of the self-luminous element, a sealing structure that blocks the self-luminous element from the outside air is generally employed. In particular, in an organic EL panel, when the organic layer and the electrode are exposed to moisture and oxygen in the atmosphere, the light emission characteristics of the organic EL element deteriorate. Therefore, a sealing means for blocking the organic EL element from the outside air is provided. It is indispensable at the development stage.

有機ELパネルの封止構造としては、金属製又はガラス製の封止部材と有機EL素子が形成された基板とを貼り合わせて、有機EL素子の周囲に乾燥剤を配備できる封止空間を形成する構造が一般に採用されてきたが、パネルの更なる薄型化や基板上の有機EL素子に対して基板と逆側から光を取り出すトップエミッション方式の採用が検討されるようになり、基板上の有機EL素子を直接樹脂層で覆う構造が検討されている。   As a sealing structure of the organic EL panel, a metal or glass sealing member and a substrate on which the organic EL element is formed are bonded together to form a sealing space in which a desiccant can be disposed around the organic EL element. In general, however, the use of a top emission method in which light is extracted from the opposite side of the substrate with respect to the organic EL element on the substrate has been studied. A structure in which an organic EL element is directly covered with a resin layer has been studied.

下記特許文献1に示される従来技術では、封止部材に封止用樹脂フィルムを貼り、封止用樹脂フィルムを介して自発光素子部が形成された基板とを加圧しながら貼り合わせて封止している。   In the prior art disclosed in Patent Document 1 below, a sealing resin film is pasted on a sealing member, and the substrate on which the light-emitting element part is formed is pressed and sealed through the sealing resin film. is doing.

図1は、この従来技術を自発光素子部が多面取り可能な大型化へ展開をした場合について説明する説明図である。図1(a)に示すように、自発光パネルJ1は、基板J10上に自発光素子部J11を形成し、その自発光素子部J11を覆うように樹脂層J12を配備し、この樹脂層J12を介して基板J10と封止部材J13とを貼り合わせている。   FIG. 1 is an explanatory view for explaining a case where this conventional technique is expanded to a large-sized self-luminous element part capable of taking multiple faces. As shown in FIG. 1A, the self-luminous panel J1 has a self-luminous element portion J11 formed on a substrate J10, and a resin layer J12 is provided so as to cover the self-luminous element portion J11. The substrate J10 and the sealing member J13 are pasted together.

特開2004−139977号公報JP 2004-139777 A

このような従来技術によると、自発光素子部J11が形成された基板J10と封止部材J13とを強固に貼り付けるために、貼り付け時に自発光パネルJ1を加圧処理することが必要になる。大板状の基板J10上に複数の自発光素子部J11を形成して、その上に大板状の封止部材J13を貼り付け、接着硬化後に切断・分割して個々の自発光パネルJ1を得る多面取りを行う場合、大板状の封止部材J13に対して、自発光素子部J11を覆う樹脂層J12が存在する部分と存在しない部分とで圧力の掛かり具合が異なるので、例えば、図1(b)で示すように、封止部材J13側から加圧する場合では封止部材J13の変形が生じ易くなり、基板J10側からの加圧に対し基板J10の変形が生じ易くなり、加圧処理した後の自発光パネルJ1には、図1(c)に示すような、封止部材J13の端部、基板J10の端部で樹脂層J12との間に剥がれ(S)が生じ易くなる問題があった。   According to such a conventional technique, it is necessary to pressurize the self-luminous panel J1 at the time of attachment in order to firmly adhere the substrate J10 on which the self-luminous element portion J11 is formed and the sealing member J13. . A plurality of self-luminous element portions J11 are formed on a large plate-like substrate J10, a large plate-like sealing member J13 is pasted thereon, and after bonding and curing, the individual light-emitting panels J1 are cut and divided. When performing multiple chamfering to obtain, since the degree of pressure applied is different between the portion where the resin layer J12 covering the self-light emitting element portion J11 is present and the portion where it does not exist with respect to the large plate-shaped sealing member J13, for example, FIG. As shown in FIG. 1B, when the pressure is applied from the sealing member J13 side, the sealing member J13 is likely to be deformed, and the substrate J10 is likely to be deformed relative to the pressure from the substrate J10 side. In the self-luminous panel J1 after processing, peeling (S) is likely to occur between the end of the sealing member J13 and the end of the substrate J10 and the resin layer J12 as shown in FIG. There was a problem.

本発明は、このような問題に対処することを課題の一例とするものである。すなわち、基板上に自発光素子部を形成して、その自発光素子部を覆う樹脂層を介して封止部材を貼り付ける自発光パネルにおいて、貼り付け処理後の封止部材の剥がれ或いは浮きを防止すること、これによって封止性能の高い自発光パネルを得ること、等が本発明の目的である。   This invention makes it an example of a subject to cope with such a problem. That is, in a self light emitting panel in which a self light emitting element portion is formed on a substrate and a sealing member is attached via a resin layer covering the self light emitting element portion, the sealing member is peeled off or floated after the attaching process. It is an object of the present invention to prevent, and thereby obtain a self-luminous panel with high sealing performance.

このような目的を達成するために、本発明は、以下の各独立請求項に係る構成を少なくとも具備するものである。   In order to achieve such an object, the present invention comprises at least the configurations according to the following independent claims.

[請求項1]基板上に自発光素子部を形成し、該自発光素子部を覆う樹脂層を介して前記基板に封止部材を貼り付ける自発光パネルの製造方法であって、前記基板又は前記封止部材と前記樹脂層との間に液状の接着剤層を形成することを特徴とする自発光パネルの製造方法。   [Claim 1] A method of manufacturing a self-luminous panel in which a self-luminous element is formed on a substrate and a sealing member is attached to the substrate via a resin layer covering the self-luminous element. A method for producing a self-luminous panel, wherein a liquid adhesive layer is formed between the sealing member and the resin layer.

[請求項2]基板上に自発光素子部を形成する工程と、該自発光素子部を覆うように前記基板上に樹脂層を形成する工程と、該樹脂層上に液状の接着剤層を形成する工程と、該接着剤層を介して前記樹脂層上に封止部材を貼り付ける工程とを有することを特徴とする自発光パネルの製造方法。   [Claim 2] A step of forming a self-luminous element portion on the substrate, a step of forming a resin layer on the substrate so as to cover the self-luminous element portion, and a liquid adhesive layer on the resin layer The manufacturing method of the self-light-emitting panel characterized by having the process to form and the process of sticking a sealing member on the said resin layer through this adhesive bond layer.

[請求項3]基板上に自発光素子部を形成する工程と、該自発光素子部を覆うように前記基板上に樹脂層を形成する工程と、該封止部材上に液状の接着剤層を形成する工程と、該接着剤層を介して前記樹脂層上に封止部材を貼り付ける工程とを有することを特徴とする自発光パネルの製造方法。   [Claim 3] A step of forming a self-luminous element portion on the substrate, a step of forming a resin layer on the substrate so as to cover the self-luminous element portion, and a liquid adhesive layer on the sealing member The manufacturing method of the self-luminous panel characterized by having the process of forming a sealing member on the said resin layer through this adhesive bond layer.

[請求項4]基板上に自発光素子部を形成する工程と、封止部材上に樹脂層を形成する工程と、前記基板上に液状の接着剤層を形成する工程と、該接着剤層を介して前記自発光素子部上に封止部材を貼り付ける工程とを有することを特徴とする自発光パネルの製造方法。   [Claim 4] A step of forming a self-luminous element on a substrate, a step of forming a resin layer on a sealing member, a step of forming a liquid adhesive layer on the substrate, and the adhesive layer And a step of attaching a sealing member on the self-light-emitting element part through a method.

[請求項5]基板上に自発光素子部を形成する工程と、封止部材上に樹脂層を形成する工程と、該樹脂層上に液状の接着剤層を形成する工程と、該接着剤層を介して前記自発光素子部上に封止部材を貼り付ける工程とを有することを特徴とする自発光パネルの製造方法。   [Claim 5] A step of forming a self-luminous element portion on a substrate, a step of forming a resin layer on a sealing member, a step of forming a liquid adhesive layer on the resin layer, and the adhesive And a step of affixing a sealing member on the self-luminous element portion through a layer.

[請求項9]基板上に自発光素子部を形成し、該自発光素子部を覆う樹脂層を介して前記基板に封止部材を貼り付ける自発光パネルであって、前記樹脂層はフィルム材からなり、該樹脂層と前記封止部材とを接着する接着剤層が液状接着剤の硬化層として形成されることを特徴とする自発光パネル。   [Claim 9] A self-luminous panel in which a self-luminous element portion is formed on a substrate and a sealing member is attached to the substrate via a resin layer covering the self-luminous element portion, the resin layer being a film material A self-luminous panel comprising: an adhesive layer for bonding the resin layer and the sealing member as a hardened layer of a liquid adhesive.

以下、本発明の実施形態を図面を参照して説明する。図2は本発明の一実施形態に係る自発光パネルの製造方法を示す説明図である。本発明の実施形態に係る自発光パネル1の製造方法は、基板2L上に自発光素子部3を形成し、自発光素子部3を覆う樹脂層4を介して基板2Lに封止部材6Lを貼り付ける製造方法であって、基板2L又は封止部材6Lと樹脂層4との間に液状の接着剤層5を形成することを特徴とする。すなわち、基板2L又は封止部材6Lと樹脂層4との接着性を高めるために、基板2Lと樹脂層4との間、封止部材6Lと樹脂層4との間、或いはその両方に、液状の接着剤層5を形成して基板2Lに対する封止部材6Lの貼り付けを行ったものである。   Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 2 is an explanatory view showing a method for manufacturing a self-luminous panel according to an embodiment of the present invention. In the method for manufacturing the self light emitting panel 1 according to the embodiment of the present invention, the self light emitting element portion 3 is formed on the substrate 2L, and the sealing member 6L is provided on the substrate 2L through the resin layer 4 covering the self light emitting element portion 3. In this manufacturing method, the liquid adhesive layer 5 is formed between the substrate 2L or the sealing member 6L and the resin layer 4. That is, in order to improve the adhesion between the substrate 2L or the sealing member 6L and the resin layer 4, the liquid is provided between the substrate 2L and the resin layer 4, between the sealing member 6L and the resin layer 4, or both. The adhesive layer 5 is formed and the sealing member 6L is attached to the substrate 2L.

図2によって、その工程の一例を説明すると、先ず、同図(a)に示すように、基板2L上に複数の自発光素子部3が形成される(自発光素子部形成工程)。自発光素子部3の形成は既知の工程に基づいてなされ、例えば、有機EL素子からなる自発光素子部3を形成する場合には、基板2Lの洗浄、下部電極及び引出電極の成膜・パターニング、有機EL機能層の成膜・パターニング、上部電極の成膜・パターニング等の工程に基づいてなされる。   An example of the process will be described with reference to FIG. 2. First, as shown in FIG. 2A, a plurality of self light emitting element portions 3 are formed on a substrate 2L (self light emitting element portion forming step). The self-light emitting element part 3 is formed based on a known process. For example, when the self-light emitting element part 3 made of an organic EL element is formed, the substrate 2L is washed, and the lower electrode and the extraction electrode are formed and patterned. The organic EL functional layer is formed / patterned and the upper electrode is formed / patterned.

次に同図(b)に示すように、自発光素子部3を覆うように、自発光素子部3の配列位置に応じて樹脂層4をパターン形成する(樹脂層形成工程)。この工程では、ディッピング,スピンコート等の塗布、印刷、フィルムラミネート等によって、自発光素子部3を覆う樹脂層4を形成する。マスクの利用やスクリーン印刷の採用、或いはフィルムパターンの転写等、各種のパターン形成方法を採用してもよい。樹脂層4としては、低透湿性を有する紫外線又は熱硬化型樹脂等が用いられる。   Next, as shown in FIG. 2B, the resin layer 4 is patterned according to the arrangement position of the self-light-emitting element portions 3 so as to cover the self-light-emitting element portions 3 (resin layer forming step). In this step, the resin layer 4 that covers the self-luminous element portion 3 is formed by application such as dipping, spin coating, printing, film lamination, or the like. Various pattern forming methods such as use of a mask, screen printing, or transfer of a film pattern may be employed. As the resin layer 4, ultraviolet light or thermosetting resin having low moisture permeability is used.

次に同図(c)に示すように、樹脂層4上に液状の接着剤層5を形成する(接着剤層形成工程)。液状の接着剤層5は、加圧工程を施すことなく樹脂層4と封止部材6Lとを接着するためのものであり、例えば2液硬化型接着剤等で、硬化するまで液状で、接着対象物の自重のみで接着が可能な接着剤が用いられる。この層の形成は、例えば、滴下装置50を順次又は一度に配置するなどして、樹脂層4の上面に接着剤5Aを塗布させることで行われる。   Next, as shown in FIG. 3C, a liquid adhesive layer 5 is formed on the resin layer 4 (adhesive layer forming step). The liquid adhesive layer 5 is for adhering the resin layer 4 and the sealing member 6L without performing a pressurizing step. For example, the liquid adhesive layer 5 is a two-component curable adhesive, etc. An adhesive that can be bonded only by its own weight is used. This layer is formed, for example, by applying the adhesive 5 </ b> A to the upper surface of the resin layer 4 by arranging the dropping device 50 sequentially or at once.

次に、同図(d)に示すように、接着剤層5を介して樹脂層4上に大板の封止部材6Lを貼り付ける(封止部材貼り付け工程)。この際には、加圧を行わず、封止部材6Lの自重のみで樹脂層4上に封止部材6Lを密着させる。封止部材6Lは、ガラス基板、金属基板、金属箔等、防湿効果が得られるものであれば特に限定されない。   Next, as shown in FIG. 4D, a large-sized sealing member 6L is pasted on the resin layer 4 via the adhesive layer 5 (sealing member pasting step). At this time, without applying pressure, the sealing member 6L is brought into close contact with the resin layer 4 only by its own weight. The sealing member 6L is not particularly limited as long as a moisture-proof effect can be obtained, such as a glass substrate, a metal substrate, and a metal foil.

その後、液状の接着剤層5及び樹脂層4を硬化させることにより、自発光素子部3が封止された自発光パネル1を得る。自発光パネル1は、例えば、樹脂層4はフィルム材からなり、樹脂層4と封止部材6Lとを接着する接着剤層5Sが液状接着剤の硬化層として形成されている。   Thereafter, the liquid adhesive layer 5 and the resin layer 4 are cured to obtain the self light emitting panel 1 in which the self light emitting element portion 3 is sealed. In the self-luminous panel 1, for example, the resin layer 4 is made of a film material, and an adhesive layer 5S that bonds the resin layer 4 and the sealing member 6L is formed as a hardened layer of a liquid adhesive.

その後は、同図(e)に示すように、接着剤層5Sが形成された後、切断箇所Cでの切断・分割処理がなされ、個々の自発光パネル1を得ることができる。自発光パネル1は、例えば、樹脂層4はフィルム材からなり、樹脂層4と封止部材6Lとを接着する接着剤層5Sが液状接着剤の硬化層として形成されている。   Thereafter, as shown in FIG. 5E, after the adhesive layer 5S is formed, cutting and dividing processes are performed at the cutting points C, and individual self-luminous panels 1 can be obtained. In the self-luminous panel 1, for example, the resin layer 4 is made of a film material, and an adhesive layer 5S that bonds the resin layer 4 and the sealing member 6L is formed as a hardened layer of a liquid adhesive.

このような実施形態によると、同図(d)に示す貼り付け時に、封止部材6Lの貼り付け部分は樹脂層4の存在する部分のみになり、樹脂層4が存在しない部分は封止部材6Lと基板2Lとの間に空間が形成されることになるが、接着剤層5を設けることで、封止部材6Lを加圧する必要がなくなるので、封止部材6Lに撓みが生じることがない。また樹脂層にフィルム状の樹脂を用いた場合には、封止部材との密着性を向上させるため、封止部材6Lを加圧の他に加熱する必要があるが、前述のように封止部材6Lに加熱による収縮なども生じることがない。   According to such an embodiment, at the time of attaching shown in FIG. 4D, the attaching portion of the sealing member 6L is only the portion where the resin layer 4 exists, and the portion where the resin layer 4 does not exist is the sealing member. Although a space is formed between 6L and the substrate 2L, since it is not necessary to pressurize the sealing member 6L by providing the adhesive layer 5, the sealing member 6L does not bend. . Further, when a film-like resin is used for the resin layer, it is necessary to heat the sealing member 6L in addition to pressurization in order to improve the adhesion with the sealing member. The member 6L is not contracted by heating.

したがって、樹脂層4と封止部材6Lとに熱収縮率の異なるものを採用した場合や、樹脂層4と封止部材6Lとを貼り合わせて硬化させた後に封止部材6Lと基板2Lを切断・分割した後にも、封止部材6Lが樹脂層4から剥がれることがない。   Accordingly, when the resin layer 4 and the sealing member 6L have different heat shrinkage rates, or after the resin layer 4 and the sealing member 6L are bonded and cured, the sealing member 6L and the substrate 2L are cut. -Even after the division, the sealing member 6 </ b> L is not peeled off from the resin layer 4.

また、接着剤層5の存在によって基板2Lに対して封止部材6Lを強固に密着固定することができる。これによって、樹脂層4と封止部材6Lとの界面での広い面積で高い密着性を確保することができ、自発光素子部3へのバリア性(水分遮断性)をより強化することができる。   Further, the presence of the adhesive layer 5 makes it possible to firmly and firmly fix the sealing member 6L to the substrate 2L. Thereby, high adhesion can be ensured with a wide area at the interface between the resin layer 4 and the sealing member 6L, and the barrier property (moisture blocking property) to the self-light emitting element portion 3 can be further enhanced. .

また、液状の接着剤層5を介して基板2Lと封止部材6Lとを貼り付けているので、接着剤層5が硬化するまでの間、基板2Lと封止部材6Lとを貼り合わせた状態で位置合わせの調整を行うことが可能になり、貼り付け工程の作業性を向上させることができる。更には、パターニングされた樹脂層4の上に適量の液状接着剤5Aを滴下させるので、樹脂層4のパターン以上に接着剤が拡がることが無く、不必要な箇所で基板2Lと封止部材6Lとを接着させてしまう不都合を回避することができる。なお、前述した実施形態では、接着剤層5を樹脂層4の全面に形成してもよい。   In addition, since the substrate 2L and the sealing member 6L are attached via the liquid adhesive layer 5, the state in which the substrate 2L and the sealing member 6L are attached until the adhesive layer 5 is cured. Thus, the alignment can be adjusted, and the workability of the attaching process can be improved. Furthermore, since an appropriate amount of the liquid adhesive 5A is dropped on the patterned resin layer 4, the adhesive does not spread beyond the pattern of the resin layer 4, and the substrate 2L and the sealing member 6L are disposed at unnecessary portions. Can be avoided. In the embodiment described above, the adhesive layer 5 may be formed on the entire surface of the resin layer 4.

また、接着剤層5は、前述したように樹脂層4上に形成してもよいし、封止部材6L側の接着領域上に形成して、その後、接着剤層5を介して樹脂層4上に封止部材6Lを貼り付けるようにしてもよい。   The adhesive layer 5 may be formed on the resin layer 4 as described above, or may be formed on the adhesive region on the sealing member 6L side, and then the resin layer 4 via the adhesive layer 5. You may make it affix the sealing member 6L on it.

また、樹脂層4は、前述したように基板2L側の自発光素子部3上に形成しても良いし、封止部材6L上に樹脂層4を形成して、基板2L上に接着剤層5を形成し、接着剤層5を介して自発光素子部3上に樹脂層4と封止部材6Lを貼り付けるようにしても良い。   Further, the resin layer 4 may be formed on the self-luminous element portion 3 on the substrate 2L side as described above, or the resin layer 4 is formed on the sealing member 6L, and the adhesive layer is formed on the substrate 2L. 5 may be formed, and the resin layer 4 and the sealing member 6 </ b> L may be attached to the self-light emitting element portion 3 via the adhesive layer 5.

また、封止部材6L上に樹脂層4を形成して、その樹脂層4上に接着剤層5を形成して、接着剤層5を介して自発光素子部3上に樹脂層4と封止部材6Lを貼り付けるようにしても良い。   Further, the resin layer 4 is formed on the sealing member 6L, the adhesive layer 5 is formed on the resin layer 4, and the resin layer 4 and the self-light emitting element portion 3 are sealed with the adhesive layer 5 interposed therebetween. The stop member 6L may be pasted.

以下、本発明のより具体的な実施形態として、有機EL素子からなる自発光素子部3を備えた自発光パネル(有機ELパネル)の製造方法及び構造を、図3及び図4によって説明する。   Hereinafter, as a more specific embodiment of the present invention, a manufacturing method and a structure of a self-luminous panel (organic EL panel) provided with a self-luminous element portion 3 made of an organic EL element will be described with reference to FIGS.

基板準備工程S1は、基板2Lに対して、必要に応じて、洗浄、表面処理、表面被覆を行う工程を含み、アクティブ駆動の自発光パネル1を形成する際には、基板2L上に駆動素子21(TFT等)を形成する工程、駆動素子21が形成された基板2L上に平坦化膜22を形成する工程を含む。   The substrate preparation step S1 includes steps of performing cleaning, surface treatment, and surface coating on the substrate 2L as necessary. When forming the self-light-emitting panel 1 for active driving, a driving element is formed on the substrate 2L. 21 (TFT or the like), and a step of forming the planarizing film 22 on the substrate 2L on which the driving element 21 is formed.

下部電極形成工程S2では、基板準備工程S1を経た基板2L上に下部電極30のパターンを形成する。下部電極30は、アクティブ駆動の場合には画素電極として区画されたパターンに形成され、平坦化膜22の接続孔22Aを介して駆動素子21に接続される。また、パッシブ駆動の場合には、下部電極30はストライプ状のパターンとして形成され、同時に引出電極部が形成される(図4はアクティブ駆動の例を示している)。   In the lower electrode formation step S2, a pattern of the lower electrode 30 is formed on the substrate 2L that has undergone the substrate preparation step S1. In the case of active driving, the lower electrode 30 is formed in a pattern partitioned as a pixel electrode, and is connected to the driving element 21 through the connection hole 22A of the planarizing film 22. In the case of passive driving, the lower electrode 30 is formed as a stripe pattern, and at the same time, an extraction electrode portion is formed (FIG. 4 shows an example of active driving).

絶縁膜パターン形成工程S3では、下部電極30上の発光領域を区画し、隣接する下部電極30間を絶縁するように、絶縁膜31のパターンが形成される。
パッシブ駆動の場合など、必要に応じて、上部電極を分断する隔壁を形成する工程を含ませても構わない。
In the insulating film pattern forming step S <b> 3, the pattern of the insulating film 31 is formed so as to partition the light emitting region on the lower electrode 30 and insulate between the adjacent lower electrodes 30.
A step of forming a partition for dividing the upper electrode may be included as necessary, such as in the case of passive driving.

有機層成膜工程S4では、例えば、正孔輸送層32A,発光層32B,電子輸送層32Cなどからなる有機層32が、絶縁膜31で区画された下部電極30上の発光領域に成膜される。   In the organic layer forming step S4, for example, an organic layer 32 composed of a hole transport layer 32A, a light emitting layer 32B, an electron transport layer 32C, and the like is formed in a light emitting region on the lower electrode 30 partitioned by the insulating film 31. The

上部電極形成工程S5では、成膜された有機層32上に上部電極33を成膜する。(図4はアクティブ駆動の例を示している)。   In the upper electrode formation step S5, the upper electrode 33 is formed on the formed organic layer 32. (FIG. 4 shows an example of active driving).

樹脂層形成工程S6では、例えば、樹脂層4を形成するフィルム材が自発光素子3を覆うように基板2L上に貼り付けられる。貼り付けには、線状の接触をこの接触線と直交する方向に連続して行う貼り付け装置を用いて、樹脂層4と基板2Lとの間に気泡が入らないようにする。   In the resin layer forming step S <b> 6, for example, a film material for forming the resin layer 4 is attached on the substrate 2 </ b> L so as to cover the self-light emitting element 3. Affixing is performed using an affixing device that continuously performs linear contact in a direction orthogonal to the contact line, so that bubbles do not enter between the resin layer 4 and the substrate 2L.

また、上部電極形成工程S5と樹脂層形成工程S6の間に、例えば、窒化珪素、酸化珪素などの無機材料などからなる保護層を形成する工程を入れても構わない。また、これとは逆に樹脂層4を封止基板6側に貼りつけても良い(図示しない)。   Further, a step of forming a protective layer made of an inorganic material such as silicon nitride or silicon oxide may be inserted between the upper electrode forming step S5 and the resin layer forming step S6. Conversely, the resin layer 4 may be attached to the sealing substrate 6 side (not shown).

接着剤層形成工程S7では、例えば、樹脂層4の上に、2液硬化型の液状接着剤が滴下されて、樹脂層4の上のみに接着剤層5が形成される。また、これとは逆に基板側に接着剤層5を形成してもよい。この場合、基板上の樹脂層4と貼り合わせ領域の全面に接着剤層5を形成しても良い(図示しない)。   In the adhesive layer forming step S <b> 7, for example, a two-component curable liquid adhesive is dropped on the resin layer 4, and the adhesive layer 5 is formed only on the resin layer 4. On the contrary, the adhesive layer 5 may be formed on the substrate side. In this case, the adhesive layer 5 may be formed on the entire surface of the bonding region with the resin layer 4 on the substrate (not shown).

封止部材貼り付け工程S8では、接着剤層5の上にガラス基板等からなる封止部材6Lを置いて接着剤層5が硬化するまでの間に必要に応じて位置合わせを行う。その後は、必要に応じて加熱処理を行って接着剤層5を硬化させる。   In the sealing member attaching step S8, the sealing member 6L made of a glass substrate or the like is placed on the adhesive layer 5 and alignment is performed as necessary until the adhesive layer 5 is cured. Thereafter, heat treatment is performed as necessary to cure the adhesive layer 5.

絶縁膜31に用いる材料としては感光性材料などの公知の材料を用いることができ、特に限定されない。   A known material such as a photosensitive material can be used as the material used for the insulating film 31 and is not particularly limited.

自発光素子部を構成する有機EL素子について更に説明すると、有機EL素子は、アノード(陽極、正孔注入電極;下部電極30又は上部電極33)とカソード(陰極、電子注入電極;上部電極33又は下部電極30)との間に有機EL機能を有する有機層32を挟み込んだ構造を有しており、両電極に電圧を印加することにより、アノードから有機層30内に注入・輸送された正孔とカソードから有機層内に注入・輸送された電子がこの層内の発光部分(発光層32B)で再結合することで発光を得るものである。   The organic EL element constituting the self-light emitting element portion will be further described. The organic EL element includes an anode (anode, hole injection electrode; lower electrode 30 or upper electrode 33) and a cathode (cathode, electron injection electrode; upper electrode 33 or It has a structure in which an organic layer 32 having an organic EL function is sandwiched between the lower electrode 30) and holes injected and transported from the anode into the organic layer 30 by applying a voltage to both electrodes. The electrons injected and transported from the cathode into the organic layer are recombined at the light emitting portion (light emitting layer 32B) in the layer to obtain light emission.

基板2Lについては、基板2L側から光を取り出すボトムエミッション構造を採用する場合には、透明性を有する平板状、フィルム状のものが採用され、材質としてはガラス又はプラスチックを用いることができる。封止部材6L側から光を取り出すトップエミッション構造を採用する場合には、基板2Lの透明性は特に要求されない。   As for the substrate 2L, in the case of adopting a bottom emission structure in which light is extracted from the substrate 2L side, a transparent flat plate or film is used, and glass or plastic can be used as the material. When employing a top emission structure in which light is extracted from the sealing member 6L side, the transparency of the substrate 2L is not particularly required.

下部電極30,上部電極33については、一方が陰極、他方が陽極に設定されることになる。この場合、陽極は仕事関数の高い材料で構成されるのがよく、クロム(Cr),モリブデン(Mo),ニッケル(Ni),白金(Pt)等の金属膜、或いはITO,IZO等の酸化金属膜等による透明導電膜が用いられる。そして、陰極は仕事関数の低い材料で構成されるのがよく、特に、アルミニウム、銀などの金属、マグネシウムと銀の合金、アルカリ金属(Li,Na,K,Rb,Cs),アルカリ土類金属(Be,Mg,Ca,Sr,Ba),希土類金属といった仕事関数の低い金属、その化合物、又はそれらを含む合金を用いることができる。また、下部電極30、上部電極33ともに透明な材料により構成した場合には、光の放出側と反対の電極側に反射膜を設けた構成とすることもできる。   One of the lower electrode 30 and the upper electrode 33 is set as a cathode and the other is set as an anode. In this case, the anode is preferably made of a material having a high work function, such as a metal film such as chromium (Cr), molybdenum (Mo), nickel (Ni), platinum (Pt), or a metal oxide such as ITO or IZO. A transparent conductive film such as a film is used. The cathode is preferably composed of a material having a low work function, in particular, metals such as aluminum and silver, alloys of magnesium and silver, alkali metals (Li, Na, K, Rb, Cs), and alkaline earth metals. A metal having a low work function such as (Be, Mg, Ca, Sr, Ba) or a rare earth metal, a compound thereof, or an alloy containing them can be used. Further, when both the lower electrode 30 and the upper electrode 33 are made of a transparent material, a configuration in which a reflective film is provided on the electrode side opposite to the light emission side can also be adopted.

また、下部電極30又は上部電極33から引き出される引出電極は、自発光表示パネル1とそれを駆動するIC,ドライバ等の駆動手段とを接続するために設けられる配線電極であって、好ましくはAg,Cr,Al等の低抵抗金属材料やそれらの合金を用いるのがよい。   In addition, the extraction electrode extracted from the lower electrode 30 or the upper electrode 33 is a wiring electrode provided to connect the self-luminous display panel 1 and driving means such as an IC and a driver for driving the display panel, and preferably Ag. It is preferable to use low resistance metal materials such as Cr, Al, and alloys thereof.

一般に、下部電極30と引出電極の形成は、ITO,IZO等の電極材料を蒸着或いはスパッタリング等の方法で成膜し、フォトリソグラフィ法などによってパターン形成がなされる。下部電極30と引出電極(特に低抵抗化の必要な引出電極)に関しては、前述のITO,IZO等の下地にAg,Ag合金,Al,Cr等の低抵抗金属を積層した2層構造にしたもの、或いは、Ag等の保護層としてCu,Cr,Ta等の耐酸化性の高い材料を更に積層した3層構造にしたものを採用することができる。   In general, the lower electrode 30 and the extraction electrode are formed by depositing an electrode material such as ITO or IZO by a method such as vapor deposition or sputtering, and forming a pattern by a photolithography method or the like. The lower electrode 30 and the extraction electrode (particularly the extraction electrode that requires low resistance) have a two-layer structure in which a low-resistance metal such as Ag, Ag alloy, Al, or Cr is laminated on the base such as ITO or IZO described above. Alternatively, a three-layer structure in which a material having high oxidation resistance such as Cu, Cr, Ta or the like is further laminated can be adopted as a protective layer such as Ag.

下部電極30と上部電極33の間に成膜される有機層32としては、下部電極30を陽極、上部電極33を陰極とした場合には、前述したように、正孔輸送層32A/発光層32B/電子輸送層32Cの積層構成が一般的であるが(下部電極30を陰極、上部電極33を陽極とした場合にはその逆の積層順になる)、発光層32B,正孔輸送層32A,電子輸送層32Cはそれぞれ1層だけでなく複数層積層して設けてもよく、正孔輸送層32A,電子輸送層32Cについてはどちらかの層を省略しても、両方の層を省略して発光層32Bのみにしても構わない。また、有機層32としては、正孔注入層,電子注入層,正孔障壁層,電子障壁層等の有機機能層を用途に応じて挿入することができる。   As the organic layer 32 formed between the lower electrode 30 and the upper electrode 33, when the lower electrode 30 is an anode and the upper electrode 33 is a cathode, as described above, the hole transport layer 32A / light emitting layer The stack structure of 32B / electron transport layer 32C is general (when the lower electrode 30 is used as a cathode and the upper electrode 33 is used as an anode, the stacking order is reversed), but the light emitting layer 32B, the hole transport layer 32A, The electron transport layer 32C may be provided by laminating not only one layer but also a plurality of layers, and either one of the hole transport layer 32A and the electron transport layer 32C may be omitted, or both layers may be omitted. Only the light emitting layer 32B may be used. In addition, as the organic layer 32, an organic functional layer such as a hole injection layer, an electron injection layer, a hole barrier layer, or an electron barrier layer can be inserted depending on the application.

有機層の材料は、有機EL素子の用途に合わせて適宜選択可能である。以下に例を示すがこれらに限定されるものではない。   The material of the organic layer can be appropriately selected according to the use of the organic EL element. Examples are shown below, but are not limited thereto.

正孔輸送層32Aとしては、正孔移動度が高い機能を有していればよく、その材料としては従来公知の化合物の中から任意のものを選択して用いることができる。具体例としては、銅フタロシアニン等のポルフィリン化合物、4,4’−ビス[N−(1−ナフチル)−N−フェニルアミノ]−ビフェニル(NPB)等の芳香族第三アミン、4−(ジ−p−トリルアミノ)−4’−[4−(ジ−p−トリルアミノ)スチリル]スチルベンゼン等のスチルベン化合物や、トリアゾール誘導体、スチリルアミン化合物等の有機材料が用いられる。また、ポリカーボネート等の高分子中に低分子の正孔輸送用の有機材料を分散させた、高分子分散系の材料も使用できる。好ましくは、ガラス転移温度が封止用樹脂を加熱硬化させる温度より高い材料が好ましく、例えば4,4’−ビス[N−(1−ナフチル)−N−フェニルアミノ]−ビフェニル(NPB)が挙げられる。   The hole transport layer 32A only needs to have a function of high hole mobility, and any material can be selected and used from conventionally known compounds. Specific examples include porphyrin compounds such as copper phthalocyanine, aromatic tertiary amines such as 4,4′-bis [N- (1-naphthyl) -N-phenylamino] -biphenyl (NPB), 4- (di- Organic materials such as stilbene compounds such as p-tolylamino) -4 ′-[4- (di-p-tolylamino) styryl] stilbenzene, triazole derivatives and styrylamine compounds are used. In addition, a polymer-dispersed material in which a low-molecular organic material for hole transport is dispersed in a polymer such as polycarbonate can also be used. Preferably, a material whose glass transition temperature is higher than the temperature at which the sealing resin is heated and cured is preferable, for example, 4,4′-bis [N- (1-naphthyl) -N-phenylamino] -biphenyl (NPB). It is done.

発光層32Bは、公知の発光材料が使用可能であり、具体例としては、4,4’−ビス(2,2’−ジフェニルビニル)−ビフェニル(DPVBi)等の芳香族ジメチリディン化合物、1,4−ビス(2−メチルスチリル)ベンゼン等のスチリルベンゼン化合物、3−(4−ビフェニル)−4−フェニル−5−t−ブチルフェニル−1,2,4−トリアゾール(TAZ)等のトリアゾール誘導体、アントラキノン誘導体、フルオレノン誘導体等の蛍光性有機材料、(8−ヒドロキシキノリナト)アルミニウム錯体(Alq)等の蛍光性有機金属化合物、ポリパラフェニレンビニレン(PPV)系、ポリフルオレン系、ポリビニルカルバゾール(PVK)系等の高分子材料、白金錯体やイリジウム錯体等の三重項励起子からのりん光を発光に利用できる有機材料(特表2001−520450)を使用できる。上述したような発光材料のみから構成したものでもよいし、正孔輸送材料、電子輸送材料、添加剤(ドナー、アクセプター等)または発光性ドーパント等が含有されてもよい。また、これらが高分子材料又は無機材料中に分散されてもよい。 A known light emitting material can be used for the light emitting layer 32B. Specific examples thereof include aromatic dimethylidin compounds such as 4,4′-bis (2,2′-diphenylvinyl) -biphenyl (DPVBi), 1,4 -Styrylbenzene compounds such as bis (2-methylstyryl) benzene, triazole derivatives such as 3- (4-biphenyl) -4-phenyl-5-t-butylphenyl-1,2,4-triazole (TAZ), anthraquinones Derivatives, fluorescent organic materials such as fluorenone derivatives, fluorescent organometallic compounds such as (8-hydroxyquinolinato) aluminum complex (Alq 3 ), polyparaphenylene vinylene (PPV), polyfluorene, polyvinylcarbazole (PVK) Of phosphorescence from triplet excitons such as platinum and iridium complexes Usable organic materials (Special Tables 2001-520450) can be used. It may be composed only of the light emitting material as described above, or may contain a hole transport material, an electron transport material, an additive (donor, acceptor, etc.) or a light emitting dopant. These may be dispersed in a polymer material or an inorganic material.

電子輸送層32Cは、陰極より注入された電子を発光層に伝達する機能を有していればよく、その材料としては従来公知の化合物の中から任意のものを選択して用いることができる。具体例としては、ニトロ置換フルオレノン誘導体、アントラキノジメタン誘導体等の有機材料、8−キノリノール誘導体の金属錯体、メタルフタロシアニン等が使用できる。   The electron transport layer 32C only needs to have a function of transmitting electrons injected from the cathode to the light emitting layer, and any material can be selected and used from conventionally known compounds. Specific examples include organic materials such as nitro-substituted fluorenone derivatives and anthraquinodimethane derivatives, metal complexes of 8-quinolinol derivatives, metal phthalocyanines, and the like.

上記の正孔輸送層32A、発光層32B、電子輸送層32Cは、スピンコーティング法、ディッピング法等の塗布法、インクジェット法、スクリーン印刷法等の印刷法等のウェットプロセス、又は、蒸着法、後述するレーザ転写法等のドライプロセスで形成することができる。   The hole transport layer 32A, the light emitting layer 32B, and the electron transport layer 32C are formed by a wet process such as a spin coating method, a coating method such as a dipping method, a printing method such as an ink jet method or a screen printing method, or a vapor deposition method, which will be described later. It can be formed by a dry process such as a laser transfer method.

そして、自発光素子部3は、単一の有機EL素子を形成するものであってもよいし、所望のパターン構造を有して複数の画素を構成するものであってもよい。後者の場合には、その表示方式は、単色発光でも2色以上の複数色発光でもよく、特に複数色発光の有機ELパネルを実現するためには、RGBに対応した3種類の発光機能層を形成する方式を含む2色以上の発光機能層を形成する方式(塗り分け方式)、白色や青色等の単色の発光機能層にカラーフィルタや蛍光材料による色変換層を組み合わせた方式(CF方式、CCM方式)、単色の発光機能層の発光エリアに電磁波を照射する等して複数発光を実現する方式(フォトブリーチング方式)、異なる発光色の低分子有機材料を予め異なるフィルム上に成膜してレーザによる熱転写で一つの基板上に転写するレーザ転写方式等によって行うことができる。   And the self-light-emitting element part 3 may form a single organic EL element, or may have a desired pattern structure and constitute a plurality of pixels. In the latter case, the display method may be single-color light emission or multi-color light emission of two or more colors, and in particular, in order to realize a multi-color light emission organic EL panel, three types of light emitting function layers corresponding to RGB are provided. A method of forming a light emitting functional layer of two or more colors including a forming method (coloring method), a method of combining a color conversion layer made of a color filter or a fluorescent material with a single color light emitting functional layer such as white or blue (CF method, CCM method), a method that realizes multiple light emission by irradiating electromagnetic waves to the light emitting area of the monochromatic light emitting functional layer (photo bleaching method), and low molecular organic materials with different light emitting colors are formed on different films in advance. For example, a laser transfer method in which the image is transferred onto one substrate by thermal transfer using a laser can be used.

以下に、本発明の実施例を説明する。
[実施例1]ガラス製の基板上に、110nmのITO膜をスパッタ法により成膜した。次に、フォトレジストAZ6112(東京応化工業製)を用いてフォトリソグラフィ法によりストライプ状にITO電極(下部電極)をパターン形成した。
Examples of the present invention will be described below.
[Example 1] An ITO film of 110 nm was formed on a glass substrate by a sputtering method. Next, ITO electrodes (lower electrodes) were formed in a stripe pattern by photolithography using photoresist AZ6112 (manufactured by Tokyo Ohka Kogyo Co., Ltd.).

このITO電極(下部電極)が形成された基板上に、電気絶縁性が高いポジ型レジスト材料(ポリイミド等)を塗布しスピンコート法にて成膜した後、基板を100℃で80秒加熱して溶媒を揮発させ、露光装置でフォトマスクを介して50mJ/cmの照射条件で露光した後、アルカリ水溶液にて現像を行い、処理槽にて300℃で加熱処理し、パターン化された絶縁膜を形成した。 A positive resist material (polyimide, etc.) with high electrical insulation is applied on the substrate on which this ITO electrode (lower electrode) is formed, and the film is formed by spin coating, and then the substrate is heated at 100 ° C. for 80 seconds. The solvent is volatilized, and exposure is performed with an exposure apparatus through a photomask under irradiation conditions of 50 mJ / cm 2 , followed by development with an alkaline aqueous solution, heat treatment at 300 ° C. in a treatment tank, and patterned insulation. A film was formed.

その後、基板を真空槽に投入し、抵抗加熱蒸着で、正孔注入層としてCuPcを20nm、正孔輸送層としてα−NPDを50nm、発光層としてAlqを60nm、電子注入層としてLiFを0.5nmの厚さで、それぞれ抵抗加熱真空成膜した。 Then, the substrate was put into a vacuum chamber, and CuPc was 20 nm as a hole injection layer, α-NPD was 50 nm as a hole transport layer, Alq 3 was 60 nm as a light emitting layer, and LiF was 0 as an electron injection layer by resistance heating vapor deposition. Each film was formed by resistance heating vacuum with a thickness of 0.5 nm.

その後、真空中にて陰極用のシャドーマスクを施し、ITO電極(下部電極)のストライプ状パターンと直交するように、Al電極(上部電極)を毎秒1nmの速度で100nmの厚さに抵抗加熱真空成膜した。   Then, a shadow mask for the cathode is applied in vacuum, and the Al electrode (upper electrode) is heated by resistance heating to a thickness of 100 nm at a rate of 1 nm per second so as to be orthogonal to the stripe pattern of the ITO electrode (lower electrode). A film was formed.

このようにして基板上に形成された自発光素子部に対して、この自発光素子部上に樹脂層のパターンを貼り付けた。樹脂層4としては、低透湿性を有するエポキシ系樹脂フィルムを用い、10−2Pa以下の真空雰囲気下で、前述した貼り付け装置を用いて基板との間に気泡が混入しないように貼り付けた。 A resin layer pattern was affixed on the self-luminous element portion thus formed on the substrate. As the resin layer 4, an epoxy resin film having low moisture permeability is used and pasted in a vacuum atmosphere of 10 −2 Pa or less using the above-described pasting apparatus so that no bubbles are mixed with the substrate. It was.

そして、接着剤として2液硬化型エポキシ樹脂を用い、樹脂層を覆うように滴下した後、接着剤層を介してガラス板からなる封止部材を基板に貼り付けた。封止部材と基板とを貼り付けた後、加熱オーブンに移動させて加熱を加えて樹脂層及び接着剤層の完全な硬化を行った。その後、できあがった自発光パネルを取り出し、樹脂層が基板又は封止部材から剥離しているか否かを確認したところ、特にそのような箇所は見当たらなかった。   Then, a two-component curable epoxy resin was used as an adhesive and dropped so as to cover the resin layer, and then a sealing member made of a glass plate was attached to the substrate via the adhesive layer. After pasting the sealing member and the substrate, the resin layer and the adhesive layer were completely cured by moving to a heating oven and applying heat. Thereafter, the completed self-luminous panel was taken out and it was confirmed whether or not the resin layer was peeled off from the substrate or the sealing member. In particular, such a portion was not found.

[比較例1]
実施例1に対し、接着剤層を用いずに封止部材を基板に貼り合わせた以外は実施例1と同様に行ったところ、樹脂層が基板や封止部材から浮いている箇所があった。
[Comparative Example 1]
When Example 1 was performed in the same manner as Example 1 except that the sealing member was bonded to the substrate without using the adhesive layer, there was a portion where the resin layer floated from the substrate or the sealing member. .

このような本発明の実施形態に係る自発光パネル及びその製造方法によると、基板上に自発光素子部を形成して、その自発光素子部を覆う樹脂層を介して封止部材を貼り付ける自発光パネルにおいて、貼り付け処理後の封止部材の剥がれや浮きを防止することができる。また、これによって封止性能の高い自発光パネルを得ることができる。また、封止部材の加熱や加圧の工程の必要のない自発光パネルの製造方法を提供することができる。   According to the self light emitting panel and the manufacturing method thereof according to the embodiment of the present invention, the self light emitting element portion is formed on the substrate, and the sealing member is attached via the resin layer covering the self light emitting element portion. In the self-luminous panel, it is possible to prevent the sealing member from being peeled off or lifted after the pasting process. Moreover, a self-luminous panel with high sealing performance can be obtained thereby. Moreover, the manufacturing method of the self-light-emitting panel which does not require the process of heating and pressurizing a sealing member can be provided.

従来技術の説明図である。It is explanatory drawing of a prior art. 本発明の実施形態に係る自発光パネルの製造方法を説明する説明図である。It is explanatory drawing explaining the manufacturing method of the self-light-emitting panel which concerns on embodiment of this invention. 本発明の実施形態に係る自発光パネル(有機ELパネル)の製造方法を説明する説明図(工程フロー)である。It is explanatory drawing (process flow) explaining the manufacturing method of the self-light emission panel (organic EL panel) which concerns on embodiment of this invention. 本発明の実施形態に係る自発光パネル(有機ELパネル)を説明する説明図である。It is explanatory drawing explaining the self-light emission panel (organic EL panel) which concerns on embodiment of this invention.

符号の説明Explanation of symbols

1 自発光パネル
2,2L 基板
3 自発光素子部
4 樹脂層
5 接着剤層
5A 接着剤
50 滴下装置
6,6L 封止部材
DESCRIPTION OF SYMBOLS 1 Self-light-emitting panel 2,2L board | substrate 3 Self-light-emitting element part 4 Resin layer 5 Adhesive layer 5A Adhesive 50 Dripping apparatus 6,6L Sealing member

Claims (9)

基板上に自発光素子部を形成し、該自発光素子部を覆う樹脂層を介して前記基板に封止部材を貼り付ける自発光パネルの製造方法であって、
前記基板又は前記封止部材と前記樹脂層との間に液状の接着剤層を形成することを特徴とする自発光パネルの製造方法。
A method for manufacturing a self-luminous panel, wherein a self-luminous element is formed on a substrate, and a sealing member is attached to the substrate via a resin layer covering the self-luminous element.
A method for producing a self-luminous panel, wherein a liquid adhesive layer is formed between the substrate or the sealing member and the resin layer.
基板上に自発光素子部を形成する工程と、
該自発光素子部を覆うように前記基板上に樹脂層を形成する工程と、
該樹脂層上に液状の接着剤層を形成する工程と、
該接着剤層を介して前記樹脂層上に封止部材を貼り付ける工程とを有することを特徴とする自発光パネルの製造方法。
Forming a self-luminous element on the substrate;
Forming a resin layer on the substrate so as to cover the self-luminous element portion;
Forming a liquid adhesive layer on the resin layer;
And a step of affixing a sealing member on the resin layer through the adhesive layer.
基板上に自発光素子部を形成する工程と、
該自発光素子部を覆うように前記基板上に樹脂層を形成する工程と、
該封止部材上に液状の接着剤層を形成する工程と、
該接着剤層を介して前記樹脂層上に封止部材を貼り付ける工程とを有することを特徴とする自発光パネルの製造方法。
Forming a self-luminous element on the substrate;
Forming a resin layer on the substrate so as to cover the self-luminous element portion;
Forming a liquid adhesive layer on the sealing member;
And a step of affixing a sealing member on the resin layer through the adhesive layer.
基板上に自発光素子部を形成する工程と、
封止部材上に樹脂層を形成する工程と、
前記基板上に液状の接着剤層を形成する工程と、
該接着剤層を介して前記自発光素子部上に封止部材を貼り付ける工程とを有することを特徴とする自発光パネルの製造方法。
Forming a self-luminous element on the substrate;
Forming a resin layer on the sealing member;
Forming a liquid adhesive layer on the substrate;
And a step of attaching a sealing member on the self-light-emitting element portion through the adhesive layer.
基板上に自発光素子部を形成する工程と、
封止部材上に樹脂層を形成する工程と、
該樹脂層上に液状の接着剤層を形成する工程と、
該接着剤層を介して前記自発光素子部上に封止部材を貼り付ける工程とを有することを特徴とする自発光パネルの製造方法。
Forming a self-luminous element on the substrate;
Forming a resin layer on the sealing member;
Forming a liquid adhesive layer on the resin layer;
And a step of attaching a sealing member on the self-light-emitting element portion through the adhesive layer.
前記基板上には複数の自発光素子部が配列して形成され、
前記樹脂層は、前記複数の自発光素子部の配列に応じてパターン形成されることを特徴とする請求項1〜5のいずれかに記載された自発光パネルの製造方法。
A plurality of self-luminous element parts are arranged on the substrate,
The method for manufacturing a self-luminous panel according to claim 1, wherein the resin layer is patterned in accordance with an arrangement of the plurality of self-luminous element portions.
前記接着剤層は、被形成面へ接着剤を塗布することによって形成されることを特徴とする請求項1〜6のいずれかに記載された自発光パネルの製造方法。   The said adhesive bond layer is formed by apply | coating an adhesive agent to a to-be-formed surface, The manufacturing method of the self-light-emitting panel described in any one of Claims 1-6 characterized by the above-mentioned. 前記樹脂層は、前記基板又は封止部材へフィルム材を付着させることによって形成されることを特徴とする請求項1〜7のいずれかに記載された自発光パネルの製造方法。   The method for manufacturing a self-luminous panel according to claim 1, wherein the resin layer is formed by attaching a film material to the substrate or the sealing member. 基板上に自発光素子部を形成し、該自発光素子部を覆う樹脂層を介して前記基板に封止部材を貼り付ける自発光パネルであって、
前記樹脂層はフィルム材からなり、該樹脂層と前記封止部材とを接着する接着剤層が液状接着剤の硬化層として形成されることを特徴とする自発光パネル。
A self-luminous panel that forms a self-luminous element part on a substrate and attaches a sealing member to the substrate via a resin layer covering the self-luminous element part,
The self-luminous panel, wherein the resin layer is made of a film material, and an adhesive layer that bonds the resin layer and the sealing member is formed as a hardened layer of a liquid adhesive.
JP2005183098A 2005-06-23 2005-06-23 Light-emitting panel and method for manufacturing the same Pending JP2007005107A (en)

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WO2013147156A1 (en) 2012-03-30 2013-10-03 古河電気工業株式会社 Resin composition for sealing organic electro-luminescence element, method for manufacturing same, adhesive film in which same resin composition is used, gas-barrier film, organic electro-luminescence element, and organic electro-luminescence panel
US9257671B2 (en) 2012-03-30 2016-02-09 Furukawa Electric Co., Ltd. Resin composition for sealing organic electroluminescent device; method of producing the same; and adhesive film, gas-barrier film, organic electroluminescent device and organic electroluminescent panel using the resin composition
KR20170039313A (en) 2012-03-30 2017-04-10 후루카와 덴키 고교 가부시키가이샤 Resin composition for sealing organic electro-luminescence element, method for manufacturing same, adhesive film in which same resin composition is used, gas-barrier film, organic electro-luminescence element, and organic electro-luminescence panel

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