JP2006513536A - イオン加速器装置 - Google Patents
イオン加速器装置 Download PDFInfo
- Publication number
- JP2006513536A JP2006513536A JP2004565958A JP2004565958A JP2006513536A JP 2006513536 A JP2006513536 A JP 2006513536A JP 2004565958 A JP2004565958 A JP 2004565958A JP 2004565958 A JP2004565958 A JP 2004565958A JP 2006513536 A JP2006513536 A JP 2006513536A
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- JP
- Japan
- Prior art keywords
- magnetic field
- ionization chamber
- ion
- longitudinal direction
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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- 150000002500 ions Chemical class 0.000 claims description 26
- 230000007935 neutral effect Effects 0.000 claims description 5
- 230000005686 electrostatic field Effects 0.000 claims description 4
- 238000010884 ion-beam technique Methods 0.000 claims description 3
- 230000001133 acceleration Effects 0.000 claims description 2
- 230000003472 neutralizing effect Effects 0.000 claims 1
- 239000007789 gas Substances 0.000 description 9
- 239000008186 active pharmaceutical agent Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 150000002835 noble gases Chemical class 0.000 description 1
- 239000003380 propellant Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H15/00—Methods or devices for acceleration of charged particles not otherwise provided for, e.g. wakefield accelerators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B64—AIRCRAFT; AVIATION; COSMONAUTICS
- B64G—COSMONAUTICS; VEHICLES OR EQUIPMENT THEREFOR
- B64G1/00—Cosmonautic vehicles
- B64G1/22—Parts of, or equipment specially adapted for fitting in or to, cosmonautic vehicles
- B64G1/40—Arrangements or adaptations of propulsion systems
- B64G1/405—Ion or plasma engines
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F03—MACHINES OR ENGINES FOR LIQUIDS; WIND, SPRING, OR WEIGHT MOTORS; PRODUCING MECHANICAL POWER OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
- F03H—PRODUCING A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
- F03H1/00—Using plasma to produce a reactive propulsive thrust
- F03H1/0037—Electrostatic ion thrusters
- F03H1/0062—Electrostatic ion thrusters grid-less with an applied magnetic field
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/54—Plasma accelerators
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Remote Sensing (AREA)
- Aviation & Aerospace Engineering (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Electron Sources, Ion Sources (AREA)
- Particle Accelerators (AREA)
- Plasma Technology (AREA)
Abstract
Description
図2はz−x平面における断面図を示し、
図3は部分的にx−y平面における断面図を示し、
図4はy−z平面における断面図を示す。
IK イオン化チャンバ
KB 幅
KH 高さ
KL 長さ
RB 縁部部分
MI 中心領域
MF 磁界
MA1 第1の種類の長手方向区間
MA2 第2の種類の長手方向区間
PM 永久磁石
KA カソード
EA アノード
EZ1、EZ2、EZ3 中間電極
WA 壁面
PB イオンビーム
AG 中性作業ガス
DS ドリフト流
EF 静電界
Claims (5)
- イオン化チャンバ、マグネット装置及び電極装置及び前記イオン化チャンバに中性作業ガスを注入するための手段を有するイオン加速器装置において、
前記電極装置は前記イオン化チャンバにおいて主にこの装置の長手方向に向いた静電加速フィールドを正に帯電したイオンのために発生し、
前記マグネット装置は前記イオン化チャンバにおいて磁界を発生し、該磁界は長手方向において主にこの長手方向に対して垂直に経過する磁界を有する少なくとも1つの第1の種類の長手方向区間とこの第1の種類の長手方向区間に対して長手方向において両側に隣接してそれぞれ主に長手方向に対してパラレルな磁界の経過を有するそれぞれ第2の種類の長手方向区間とを有し、
前記イオン化チャンバは、長手方向においてイオン射出開口部を有し、側面では取り囲むチャンバ壁面によって限定されており、直手方向に対して垂直にイオン化チャンバ横断面は単純につながっている横断面を形成し、該横断面は第1の方向(y)において少なくともこの第1の方向(y)に対して垂直な第2の方向(x)の少なくとも2倍の大きさである、イオン加速器装置。 - 第1の方向(y)において中心領域(MI)では磁界(MF)、静電界(EF)及びチャンバ横断面の寸法(KH)は第2の方向(z)においてほぼ一定である(KH(y)=一定)ことを特徴とする、請求項1記載の装置。
- イオン化チャンバは2つの直交平面(x−y、x−z)に関して鏡面対称に構成されていることを特徴とする、請求項1又は2記載の装置。
- カソード(KA)は、電子源としてイオン射出開口部(A0)の領域にかつこのイオン射出開口部(A0)から間隔をおいて横に配置されていることを特徴とする、請求項1〜3のうちの1項記載の装置。
- 電子放出カソードは中和電子源及び/又は一次電子源としてイオンビームの発生のためには設けられていないことを特徴とする、請求項1〜3のうちの1項記載の装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10300728A DE10300728B3 (de) | 2003-01-11 | 2003-01-11 | Ionenbeschleuniger-Anordnung |
PCT/EP2003/013988 WO2004064459A2 (de) | 2003-01-11 | 2003-12-10 | Ionenbeschleuniger-anordnung |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2006513536A true JP2006513536A (ja) | 2006-04-20 |
Family
ID=32694881
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004565958A Withdrawn JP2006513536A (ja) | 2003-01-11 | 2003-12-10 | イオン加速器装置 |
Country Status (8)
Country | Link |
---|---|
US (1) | US7247993B2 (ja) |
EP (1) | EP1585667B1 (ja) |
JP (1) | JP2006513536A (ja) |
CN (1) | CN100369528C (ja) |
AU (1) | AU2003293819A1 (ja) |
DE (2) | DE10300728B3 (ja) |
RU (1) | RU2306684C2 (ja) |
WO (1) | WO2004064459A2 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004079188A2 (de) * | 2003-03-05 | 2004-09-16 | Thales Electron Devices Gmbh | Antriebsvorrichtung eines raumflugkörpers und verfahren zur lagesteuerung eines raumflugkörpers mit einer solchen antriebsvorrichtung |
US7183515B2 (en) * | 2004-12-20 | 2007-02-27 | Lockhead-Martin Corporation | Systems and methods for plasma jets |
US8006939B2 (en) | 2006-11-22 | 2011-08-30 | Lockheed Martin Corporation | Over-wing traveling-wave axial flow plasma accelerator |
US7870720B2 (en) * | 2006-11-29 | 2011-01-18 | Lockheed Martin Corporation | Inlet electromagnetic flow control |
GB201210994D0 (en) * | 2012-06-21 | 2012-08-01 | Univ Surrey | Ion accelerators |
EP3093966B1 (en) * | 2015-05-13 | 2019-03-27 | Airbus Defence and Space Limited | Electric power generation from a low density plasma |
CN111365207A (zh) * | 2020-04-21 | 2020-07-03 | 何振 | 分段式脉冲等离子体推力器 |
CN114776547A (zh) * | 2022-03-28 | 2022-07-22 | 广州大学 | 一种无燃料卫星推进装置及推进方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1539264A1 (de) * | 1967-01-16 | 1970-05-06 | Rocket Research Corp | Plasma-Impulsbeschleuniger |
US3613370A (en) * | 1969-11-26 | 1971-10-19 | Nasa | Ion thruster |
FR2423951A1 (fr) * | 1978-04-21 | 1979-11-16 | Cgr Mev | Miroir magnetique pour faisceaux de particules chargees, et accelerateur de particules muni d'un tel miroir |
US4293794A (en) * | 1980-04-01 | 1981-10-06 | Kapetanakos Christos A | Generation of intense, high-energy ion pulses by magnetic compression of ion rings |
KR100271244B1 (ko) * | 1993-09-07 | 2000-11-01 | 히가시 데쓰로 | 전자빔 여기식 플라즈마장치 |
RU2092983C1 (ru) * | 1996-04-01 | 1997-10-10 | Исследовательский центр им.М.В.Келдыша | Плазменный ускоритель |
US5892235A (en) * | 1996-05-15 | 1999-04-06 | Semiconductor Energy Laboratory Co., Ltd. | Apparatus and method for doping |
DE19828704A1 (de) | 1998-06-26 | 1999-12-30 | Thomson Tubes Electroniques Gm | Plasmabeschleuniger-Anordnung |
DE10014033C2 (de) * | 2000-03-22 | 2002-01-24 | Thomson Tubes Electroniques Gm | Plasma-Beschleuniger-Anordnung |
US6448721B2 (en) * | 2000-04-14 | 2002-09-10 | General Plasma Technologies Llc | Cylindrical geometry hall thruster |
US6777862B2 (en) * | 2000-04-14 | 2004-08-17 | General Plasma Technologies Llc | Segmented electrode hall thruster with reduced plume |
DE10130464B4 (de) * | 2001-06-23 | 2010-09-16 | Thales Electron Devices Gmbh | Plasmabeschleuniger-Anordnung |
US6696792B1 (en) * | 2002-08-08 | 2004-02-24 | The United States Of America As Represented By The United States National Aeronautics And Space Administration | Compact plasma accelerator |
-
2003
- 2003-01-11 DE DE10300728A patent/DE10300728B3/de not_active Expired - Fee Related
- 2003-12-10 US US10/541,915 patent/US7247993B2/en not_active Expired - Lifetime
- 2003-12-10 AU AU2003293819A patent/AU2003293819A1/en not_active Abandoned
- 2003-12-10 CN CNB2003801084381A patent/CN100369528C/zh not_active Expired - Fee Related
- 2003-12-10 JP JP2004565958A patent/JP2006513536A/ja not_active Withdrawn
- 2003-12-10 DE DE50313480T patent/DE50313480D1/de not_active Expired - Lifetime
- 2003-12-10 RU RU2005125537/11A patent/RU2306684C2/ru not_active IP Right Cessation
- 2003-12-10 WO PCT/EP2003/013988 patent/WO2004064459A2/de active Application Filing
- 2003-12-10 EP EP03789199A patent/EP1585667B1/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
WO2004064459A3 (de) | 2005-07-28 |
EP1585667B1 (de) | 2011-02-16 |
AU2003293819A8 (en) | 2004-08-10 |
DE10300728B3 (de) | 2004-09-02 |
WO2004064459A2 (de) | 2004-07-29 |
RU2306684C2 (ru) | 2007-09-20 |
CN1741936A (zh) | 2006-03-01 |
US7247993B2 (en) | 2007-07-24 |
CN100369528C (zh) | 2008-02-13 |
EP1585667A2 (de) | 2005-10-19 |
DE50313480D1 (de) | 2011-03-31 |
RU2005125537A (ru) | 2006-01-27 |
US20060138966A1 (en) | 2006-06-29 |
AU2003293819A1 (en) | 2004-08-10 |
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