JP2006503144A5 - - Google Patents
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- JP2006503144A5 JP2006503144A5 JP2004544292A JP2004544292A JP2006503144A5 JP 2006503144 A5 JP2006503144 A5 JP 2006503144A5 JP 2004544292 A JP2004544292 A JP 2004544292A JP 2004544292 A JP2004544292 A JP 2004544292A JP 2006503144 A5 JP2006503144 A5 JP 2006503144A5
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- Japan
- Prior art keywords
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- 229910052760 oxygen Inorganic materials 0.000 claims 17
- 229910052717 sulfur Inorganic materials 0.000 claims 15
- 229920000642 polymer Polymers 0.000 claims 8
- 125000005647 linker group Chemical group 0.000 claims 7
- 239000000178 monomer Substances 0.000 claims 7
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims 7
- 125000003342 alkenyl group Chemical group 0.000 claims 3
- 125000000304 alkynyl group Chemical group 0.000 claims 3
- 125000003710 aryl alkyl group Chemical group 0.000 claims 3
- 125000003118 aryl group Chemical group 0.000 claims 3
- 125000000753 cycloalkyl group Chemical group 0.000 claims 3
- 125000004475 heteroaralkyl group Chemical group 0.000 claims 3
- 125000001072 heteroaryl group Chemical group 0.000 claims 3
- 125000000623 heterocyclic group Chemical group 0.000 claims 3
- 125000000547 substituted alkyl group Chemical group 0.000 claims 3
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 125000004432 carbon atoms Chemical group C* 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- 150000002431 hydrogen Chemical class 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 150000003949 imides Chemical class 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02102445 | 2002-10-15 | ||
US42154002P | 2002-10-25 | 2002-10-25 | |
PCT/EP2003/050657 WO2004035645A1 (en) | 2002-10-15 | 2003-09-25 | Polymer for heat-sensitive lithographic printing plate precursor |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006503144A JP2006503144A (ja) | 2006-01-26 |
JP2006503144A5 true JP2006503144A5 (US20040106767A1-20040603-C00005.png) | 2006-11-09 |
Family
ID=35306316
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004544292A Pending JP2006503144A (ja) | 2002-10-15 | 2003-09-25 | 感熱性平版印刷版前駆体のためのポリマー |
Country Status (5)
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070077513A1 (en) | 2003-12-18 | 2007-04-05 | Agfa-Gevaert | Positive-working lithographic printing plate precursor |
US7205084B2 (en) | 2003-12-18 | 2007-04-17 | Agfa-Gevaert | Heat-sensitive lithographic printing plate precursor |
US7678533B2 (en) | 2005-06-30 | 2010-03-16 | Agfa Graphics, N.V. | Heat-sensitive lithographic printing plate precursor |
ATE509764T1 (de) | 2007-08-14 | 2011-06-15 | Agfa Graphics Nv | Verfahren zur herstellung einer lithographiedruckform |
EP2159049B1 (en) | 2008-09-02 | 2012-04-04 | Agfa Graphics N.V. | A heat-sensitive positive-working lithographic printing plate precursor |
EP2213690B1 (en) | 2009-01-30 | 2015-11-11 | Agfa Graphics N.V. | A new alkali soluble resin |
ATE553920T1 (de) | 2009-06-18 | 2012-05-15 | Agfa Graphics Nv | Lithographiedruckplattenvorläufer |
EP2329951B1 (en) | 2009-12-04 | 2012-06-20 | AGFA Graphics NV | A lithographic printing plate precursor |
CN102114725A (zh) * | 2009-12-30 | 2011-07-06 | 乐凯集团第二胶片厂 | 一种阳图热敏平版印刷版前体及其制版方法 |
EP2366545B1 (en) | 2010-03-19 | 2012-12-05 | Agfa Graphics N.V. | A lithographic printing plate precursor |
US20130298792A1 (en) | 2011-01-25 | 2013-11-14 | Agfa Graphics Nv | Lithographic printing plate precursor |
ES2427137T3 (es) | 2011-02-18 | 2013-10-29 | Agfa Graphics N.V. | Precursor de plancha de impresión litográfica |
EP2941349B1 (en) | 2013-01-01 | 2017-07-19 | AGFA Graphics NV | (ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
CN103554395B (zh) * | 2013-10-12 | 2017-04-26 | 西安交通大学 | 一种含芳基硼热塑性酚醛树脂的制备方法 |
EP2933278B1 (en) | 2014-04-17 | 2018-08-22 | Agfa Nv | (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
EP2944657B1 (en) | 2014-05-15 | 2017-01-11 | Agfa Graphics Nv | (Ethylene, Vinyl Acetal) Copolymers and Their Use In Lithographic Printing Plate Precursors |
EP2955198B8 (en) | 2014-06-13 | 2018-01-03 | Agfa Nv | Ethylene/vinyl acetal-copolymers and their use in lithographic printing plate precursors |
EP2963496B1 (en) | 2014-06-30 | 2017-04-05 | Agfa Graphics NV | A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers |
EP3130465B1 (en) | 2015-08-12 | 2020-05-13 | Agfa Nv | Heat-sensitive lithographic printing plate precursor |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59157109A (ja) * | 1983-02-25 | 1984-09-06 | Hitachi Ltd | 不飽和イミドメチルフエノ−ル樹脂およびその誘導体 |
JPH02132114A (ja) * | 1988-11-11 | 1990-05-21 | Hitachi Ltd | 不飽和イミド基を持つフエノール樹脂、その組成物、及びその用途 |
JP3137295B2 (ja) * | 1990-03-27 | 2001-02-19 | 住友ベークライト株式会社 | エポキシ樹脂硬化剤及びエポキシ樹脂組成物 |
JP2938174B2 (ja) * | 1990-10-16 | 1999-08-23 | 住友ベークライト株式会社 | 樹脂組成物 |
DE69918754T2 (de) * | 1998-08-24 | 2005-07-21 | Fuji Photo Film Co., Ltd., Minami-Ashigara | Bildaufzeichnungsmaterial und Flachdruckplatte, die dieses verwendet |
JP4969751B2 (ja) * | 1999-11-10 | 2012-07-04 | 株式会社ピーアイ技術研究所 | イミド−ベンゾオキサゾール系重縮合物及びその製造方法 |
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2003
- 2003-09-25 JP JP2004544292A patent/JP2006503144A/ja active Pending
- 2003-09-25 EP EP03769495A patent/EP1554324B1/en not_active Expired - Fee Related
- 2003-09-25 CN CNB038242141A patent/CN1320015C/zh not_active Expired - Fee Related
- 2003-09-25 AU AU2003278180A patent/AU2003278180A1/en not_active Abandoned
- 2003-09-25 WO PCT/EP2003/050657 patent/WO2004035645A1/en active IP Right Grant