JP2006343401A - Method for manufacturing reflective board using reflective substrate film - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a reflective board for eliminating display defect of a display by dissolving a scratch of the outside surface of a film, and to provide a TFT display with an inexpensive reflective board. <P>SOLUTION: In a laminate process using an auto cut laminator of a reflective substrate photosensitive element consisting of a laminate in order of (a) an irregular formation layer support film, (b) a reflective substrate photosensitive resin layer and (c) a protection film, the method for manufacturing the reflective board uses the reflective substrate film laminated to be rotated while synchronizing a film suction part of the auto cut laminator at a film conveying speed when sticking (a) the irregular formation layer support film and (b) the reflective substrate photosensitive resin layer in a plate-like matter while exfoliating (c) the protection film. When a film suction part is rotated, suction force during suction is 0.05-0.4 KPa, and a mechanism for jetting air in an advance direction of the film preferably exists by a roll type sucking the film suction part by having 50-300 mm of a roll diameter. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  This invention arises when performing a lamination process using the photosensitive element under reflection laminated | stacked in order of (a) uneven | corrugated formation layer support film, (b) reflective base photosensitive resin layer, and (c) protective film. The present invention relates to a reflector manufacturing method using a reflective base film that reduces scratches on the outer surface of a film.

Flat panels such as liquid crystal color televisions and liquid crystal color display computers have been put into practical use. These liquid crystal displays (hereinafter referred to as LCDs) have a mechanism for displaying a display by light emission from a built-in backlight.
In this indoor display method, the display can be displayed with almost no light source brighter than the backlight. However, when viewing a backlight-type display outside the room during the daytime, it is difficult to see the displayed display vividly because sunlight is brighter than the backlight.
In order to solve this problem, there is a method of providing a reflection plate inside the LCD and viewing the LCD by reflection.
As a method of manufacturing this reflector, a varnish obtained by kneading glass particles in an organic binder is formed by spin coating, and then a process such as baking is performed, and then a metal film is sputtered to form a reflective film. There is a method of forming (bead dispersion method).
There is a method in which an organic binder is applied in advance to a glass surface, and irregularities are formed thereon with rubber stamps, and a reflective film is formed by sputtering a metal film in the same manner as the bead dispersion method (printing method).
A method in which a photosensitive resin layer is applied to a glass plate, mask exposure is performed several times, unevenness is formed on the surface by multiple exposure, and a reflective film is formed by sputtering a metal film in the same manner as the above method (multistage exposure) Method), a method of producing a reflector (dry film method) using a reflective base film in which a minute unevenness is provided on a base film, a photosensitive resin layer is coated on the surface, and a cover film is laminated.
Patent documents 1-5 are mentioned as a manufacturing method of a reflecting plate.

Japanese Patent Laid-Open No. 4-184084 JP 2003-215317 A JP 2002-564462 A JP 2004-191417 A JP 2000-98102 A

Conventionally, the STN method that mainly uses still images has been used as the LCD driving method, but in recent years, the TFT driving method for moving images has become the mainstream, and there have been cases where a reflective base film is used for these TFTs. . When a reflective base film is formed using a reflective base film in the TFT method, it is necessary to form a fine pattern by a photo method.
However, in the step of laminating (reflecting) the reflective base film in the pre-process of the photo process, the outer surface of the support base film (a) of the reflective base film and the film adsorbing part of the auto-cut laminator By rubbing, fine vertical streaks remain on the outer surface of the concavo-convex forming layer support film, and this scratch may become a pattern in the photo process and may cause a display defect.
An object of the present invention is to eliminate scratches on the outer surface of a film. Thereby, the reflector obtained by the present invention can be applied to the TFT field, and an inexpensive TFT display with a reflector can be provided.

The present invention provides a laminate using an auto-cut laminator of a reflective ground photosensitive element laminated in the order of (1) (a) a concavo-convex forming layer support film, (b) a reflective ground photosensitive resin layer, and (c) a protective film. (C) While peeling off the protective film, the film adsorbing part of the auto-cut laminator is attached when the (a) concavo-convex forming layer support film and (b) the reflective base photosensitive resin layer are bonded to the plate-like material. The present invention relates to a reflector manufacturing method using a reflective base film, wherein the laminate is rotated and laminated in synchronization with a film transport speed.
Further, the present invention is (2) a roll type in which the suction force at the time of suction is 0.05 to 0.4 KPa when the film suction part rotates, the film suction part can be sucked, and the roll diameter is 50 to 300 mm. The present invention also relates to a reflector manufacturing method using the reflective base film according to (1) above, which has a mechanism for ejecting air in the film traveling direction.

  According to the present invention, scratches on the outer surface of the film can be eliminated, and display defects on the display can be eliminated. Accordingly, the reflector obtained by the present invention can be applied to the TFT field, and an inexpensive TFT display with a reflector can be provided.

The (a) concavo-convex forming layer support film of the reflective base photosensitive element in the present invention is not particularly limited as long as it can transmit ultraviolet rays, but a polyester film having a film thickness of about 2 to 100 μm is preferably used. It is desirable to use a film of 16 to 80 μm. If it is less than 16 μm, the rigidity of the film is weak and it tends to be wrinkled during lamination. On the other hand, when the thickness is 80 μm or more, there is a tendency that appearance defects such as missing lines (coating defects) tend to occur when the reflective base photosensitive resin layer is applied.
Examples of the polyester film include polyester films such as Tetoron Film manufactured by Teijin Limited, Mylar Film manufactured by DuPont, and other polyester films manufactured by Toray Industries, Inc., Mitsubishi Chemical Polyester Film Co., Ltd., and Toyobo Co., Ltd.

  (A) The unevenness forming layer support film is formed by applying a photo-curing or thermosetting resin, pressing a mold to form an uneven surface, applying a treatment such as sandblasting or laser processing to the transparent support film, Examples thereof include a method of forming irregularities and a method of forming a film obtained by kneading beads or a lubricant having a specified diameter on a transparent support film. The surface unevenness Rmax (maximum surface roughness) of the unevenness forming layer support film is desirably 0.5 to 5 μm, and in the case of less than 0.5 μm and exceeding 5 μm, sufficient reflection characteristics cannot be obtained.

(B) The reflective base photosensitive resin layer is a polymer, for example, (meth) acrylic acid alkyl ester ((meth) acrylic acid means methacrylic acid or acrylic acid; hereinafter the same) and (meth) acrylic acid. And a copolymer of (meth) acrylic acid alkyl ester, (meth) acrylic acid, and a vinyl monomer copolymerizable therewith. Examples of the (meth) acrylic acid alkyl ester include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, and the like. Moreover, (meth) acrylic acid alkyl ester and (meth) acrylic acid and vinyl monomers copolymerizable therewith include dimethylethyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, 2,2,2- Trifluoroethyl (meth) acrylate ((meth) acrylate means methacrylate or acrylate; the same shall apply hereinafter), 2,2,3,3-tetrafluoropropyl (meth) acrylate, benzyl methacrylate, glycidyl methacrylate, acrylamide, diester Acetone acrylamide, styrene, vinyltoluene, etc., and polyesters such as terephthalic acid, isophthalic acid, and sebacic acid that contain (meth) acrylic acid as a copolymerization component, copolymers of butadiene and acrylonitrile, cellulose acetate, Loin acetate butyrate, methyl cellulose, ethyl cellulose, or the like can also be used.
A reactive organic polymer compound obtained by addition polymerization of a monomer having an unsaturated group to these organic polymer compounds can also be used. To obtain these, a functional group capable of reacting with a carboxylic acid and an unsaturated group can be obtained. As long as the monomer has a glycidyl group and an unsaturated group, the monomer having an aliphatic epoxy group such as glycidyl methacrylate, β-methyl glycidyl methacrylate, and allyl glycidyl ether, and other derivatives are particularly limited. There is no.
The compounding amount of the reactive organic polymer compound is preferably 50 to 90 parts by weight with respect to 100 parts by weight of the total amount of the polymer component and the monomer component. If the blending amount is less than 50 parts by weight, the coating properties are insufficient, and if it exceeds 90 parts by weight, the film properties of the cured product tend to be reduced.

  (B) The reflective base photosensitive resin layer is photopolymerized, so that it is necessary to impart reactivity. Therefore, it is preferable that the photoreactive monomer has at least two ethylenically unsaturated groups. Examples of the photopolymerizable compound include compounds obtained by adding an α, β-unsaturated carboxylic acid to a polyhydric alcohol (trimethylolpropane di (meth) acrylate, trimethylolpropane tri (meth) acrylate, tetramethylolmethane). Tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate, etc.), compounds obtained by adding α, β-unsaturated carboxylic acid to glycidyl group-containing compounds (trimethylolpropane triglycidyl ether triacrylate, bisphenol A diacrylate) Glycidyl ether di (meth) acrylate, etc.), ester compounds of polyvalent carboxylic acid (phthalic anhydride, etc.) and a compound having a hydroxyl group and an ethylenically unsaturated group (β-hydroxyethyl (meth) acrylate, etc.), (meth) Alkyl Este of acrylic acid (Methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate), trimethylhexamethylene diisocyanate, dihydric alcohol and (meth) acrylic acid Examples thereof include urethane diacrylate compounds obtained by reacting with hydroxy monoesters, 2,2-bis (4-methacryloxypolyethoxyphenyl) propane, and the like. Two or more of these compounds may be used. The blending amount is preferably 10 to 50 parts by weight with respect to 100 parts by weight of the total amount of the polymer component and the monomer component. If the blending amount is less than 10 parts by weight, the photosensitivity is insufficient and the film properties of the cured product are deteriorated, and if it exceeds 50 parts by weight, the coating properties tend to be insufficient.

  As photopolymerization initiators, 1,6- (bis (9-acridinyl) hexane, 1,7- (bis (9-acridinyl) heptane, 1,8-bis ((9-acridinyl) octane), 1,6- (Bis (9-acridinyl) nonane, 1,10- (bis (9-acridinyl) decane, 1,11- (bis (9-acridinyl) undecane), 1,12- (bis (9-acridinyl) dodecane, benzophenone, 4,4'-dimethylaminobenzophenone (Michler's ketone), 4,4'-diethylaminobenzophenone, 4-methoxy-4'-dimethylaminobenzophenone, 2-ethylanthraquinone, phenanthrenequinone and other aromatic ketones, benzoin methyl ether, benzoin ethyl Benzoins such as ether and benzoin phenyl ether, 2- (o- Lorophenyl) -4,5-diphenylimidazole dimer, 2- (o-chlorophenyl) -4,5-di (m-methoxyphenyl) -4,5-diphenylimidazole dimer, 2- (o-fluorophenyl) ) -4,5-diphenylimidazole dimer, 2- (o-methoxyphenyl) -4,5-diphenylimidazole dimer, 2- (p-methoxyphenyl) -4,5-diphenylimidazole dimer, 2,4-di (p-methoxyphenyl) -5-phenylimidazole dimer, 2- (p-methoxyphenyl) -4,5-diphenylimidazole dimer, 2- (p-methylmercaptophenyl) -4 2,4,5-triarylimidazole dimer such as 2,5-diphenylimidazole dimer, 2-methyl- [4- (methylthio) phenyl] -2 Morpholino) -1-propanone can be optionally combined, and the amount of these photoinitiator components is preferably 0.1 to 10 parts by weight based on 100 parts by weight of the total amount of the polymer component and the monomer component. When the blending amount is less than 0.1 parts by weight, the photosensitivity is insufficient, and when it exceeds 10 parts by weight, the light absorption on the surface of the photosensitive resin layer increases at the time of exposure, and the internal photocuring is insufficient. And the photoinitiator is crystallized inside the reflective underlayer, and cannot be used as a product, and more preferably 5 parts by weight or less, which improves the storage stability and reduces the cost of the product.

As other components, pigments or dyes can be used. A known colorant can be used as the pigment or dye, and is selected in consideration of the compatibility of the components of the photosensitive resin layer, the target hue, light transmittance, and the like. The blending amount of these components is preferably 0.05 to 50 parts by weight with respect to 100 parts by weight of the total amount of the polymer component and the monomer component. If the blending amount is less than 0.05 parts by weight, coloring is insufficient, and if it exceeds 50 parts by weight, the light transmittance tends to decrease.
In addition, the photosensitive resin layer may contain a thermosetting resin such as a thermopolymerizable component stabilizer and a melamine resin such as hexamethoxymelamine.

  The varnish prepared with the composition of the (b) reflective base photosensitive resin layer is diluted with a solution of methyl ethyl ketone, propylene glycol monomethyl ether, propylene glycol monoethyl ether, acetone, toluene, dimethyldiglycol, etc. The resin layer solution is applied with a roll coater, comma coater, gravure coater, air knife coater, die coater, bar coater, slide die coater, etc. and dried. Thereafter, a protective film is laminated to obtain a reflective base photosensitive element.

  (C) As a protective film, a polyethylene film, a biaxially stretched polypropylene film, an unstretched polypropylene film, a polyester film, a polyester film subjected to a release treatment, and the like can be used. The thickness of these protective films is 5 to 120 μm. Desirably, when the thickness is less than 5 μm, the film may be cut, and the film tends to be defective. On the other hand, if the thickness exceeds 120 μm, the film is wrinkled when the film is wound up in a subsequent process, and workability is lowered.

The plate-like material used in the present invention is not limited to be transparent or opaque, and examples of the material include glass materials and plastic materials, and the plate-like materials are heated as necessary (100 to 200 ° C., 3 to 30). (B) Reflective base photosensitive resin layer (c) The protective film is peeled off, and (a) the concave / convex forming layer support film and (b) the reflective base photosensitive resin layer are laminated on the plate-like material. . In this laminating process, an auto-cut laminator is used to increase productivity. Major manufacturers of auto-cut laminators include Hitachi AIC Corporation, Hitachi Industries Co., Ltd., and others. When using this auto-cut laminator, the conventional method rubs the film adsorbing part (adsorption guide: part name in the Hitachi AIC Co., Ltd. laminator) and (a) the concavo-convex forming layer support film. ) Scratches are formed on the outer surface of the irregularity-forming layer support film. This is because the conventional film adsorbing part has a crescent-shaped cross-sectional shape, and when the film is conveyed, it cannot operate in accordance with the film conveying speed until the end, and the adsorption guide and (a) the unevenness forming layer support film This is because the surface is rubbed (see FIG. 1).
In this invention, by making a film adsorption | suction part into a roll type, a roll rotational speed is synchronized at the time of film conveyance, and the friction with a film adsorption | suction part and (a) uneven | corrugated formation layer support film is reduced. The suction force of the film adsorbing part is desirably 0.05 to 0.4 KPa. If it is less than 0.05 KPa, there is no sufficient film holding force, and the film will fall in the laminator, resulting in poor laminator. When the pressure exceeds 0.4 KPa, the suction force of the film adsorbing portion is too strong, so that the suction mark where the film is drawn into the suction hole tends to remain, resulting in a display failure in the subsequent process. Further, the roll diameter of the film adsorbing part is desirably 50 to 300 mm. If the diameter is less than 50 mm, the holding force at the time of film suction is insufficient, the pattern drops, and the laminator becomes defective. When the diameter exceeds 300 mm, the size is too large with respect to the diameter of the laminate roll of about 90 mm, and the auto-cut laminator itself is too large, which is not desirable. Furthermore, it is desirable to attach a mechanism for ejecting air in the film traveling direction as a function of assisting the film suction force at the film adsorbing portion in the laminator. A function that stabilizes the direction of the film tip by injecting air forward at the start of the laminator. Furthermore, in the latter half of the lamination, it is desirable to stop the air injection so that the laminating wrinkle at the rear end portion does not occur (see FIG. 2).

  When a rubber roll or the like is brought into contact with the plate-like material (glass surface) before lamination, the adhesion between the photosensitive resin layer and the plate-like material (glass surface) after lamination is extremely lowered, and the rubber roll or the like is contacted. Therefore, the plate-like object (glass surface) immediately before lamination for causing a foreign matter defect to become a display defect preferably has a structure that the roll does not touch. Moreover, you may add the process of reducing microbubbles by making it pass 1-5 times with the rubber roll of surface temperature 80-160 degreeC after lamination.

Usually, since laminating is performed in the air, at least a small amount of bubbles (diameter: around 5 to 100 μm) may be mixed, resulting in a display defect. There is an effect of downsizing and reducing the number. At this time, if the surface temperature is less than 80 ° C., the photosensitive resin layer cannot be sufficiently heated to lower the resin flow, and if the surface temperature exceeds 160 ° C., the rubber lined in the laminator The durability of the adhesive is insufficient, and lining peeling tends to occur.
It is desirable that the number of times of passing the rubber roll is larger, but if it is 5 times or more, the effect of reducing bubbles is almost saturated and the apparatus size becomes too large, which is not so desirable.
The laminating process is generally a heatable roll generally called a hot roll. The laminating process uses a rubber exclusively for a general laminator having a rubber hardness of 50 to 90 for the heating roll, more preferably a rubber having a rubber hardness of 60 to 80. If the rubber hardness is 50 or less, the rubber is used during long-term running. Fragile.
In addition, when the rubber hardness is 90 or more, the effect of erasing minute bubbles in the plate-like object (glass plate) is reduced.

The exposure process generally has a dedicated exposure machine and is performed using a contact or non-contact type. As the lamp, a lamp that effectively emits ultraviolet rays, such as a high-pressure mercury lamp, an ultra-high pressure mercury lamp, a metal halide lamp, or a xenon lamp, can be used.
Then, 0.05 to 0.5 _wt% K 2 CO ₃ or, _Na 2 CO ₃ solution, the developing solution such as an alkaline aqueous solution such as 0.05 to 1.0 wt% of TMAH (tetramethyl ammonium hydride) solution can do. Moreover, you may contain 5-20 weight% of components, such as surfactant, in a developing solution as needed.
Thereafter, it is thermally cured at 250 to 280 ° C. for 15 to 60 minutes, and (b) the reflective base photosensitive resin layer is cured. For heating, a general superheating method such as a hot air dryer or a far-infrared heater can be used. Thereafter, a thin film of an inorganic film (SiO ₂ , TiN, Al, Pt, etc.) is sputtered on the photosensitive resin layer that has been baked to produce a reflector.

EXAMPLES Next, although an Example demonstrates this invention further more concretely, this invention is not restrict | limited to this.
(Example)
The photosensitive resin layer for uneven | corrugated transfer was apply | coated on the polyester film (50 micrometers thickness), the unevenness | corrugation was transcribe | transferred using the metal mold | die, and it photocured (a) The unevenness formation layer support body film was produced.
Thereafter, the solution of the photosensitive resin composition (b) shown in Table 1 was uniformly applied on the uneven transfer surface, dried for about 2 minutes with a hot air convection dryer at 100 ° C. and dried. A reflective base photosensitive resin layer having a thickness of 2.3 μm was formed, and then a polyester film having a release treatment of 25 μm thickness was laminated as a protective film (c) to obtain a reflective base photosensitive element.
While peeling off the protective film of the resulting reflective base photosensitive element, the film adsorbing part (adsorption guide) of the auto-cut laminator (HLM-A60, manufactured by Hitachi AIC Co., Ltd.) is removed, and the roll type film adsorbing part (suction roll) A laminating test was conducted. The reflective base photosensitive resin layer was laminated on a glass substrate at room temperature (23 ° C.) at a roll temperature of 140 ° C., a roll pressure of 0.58 MPa, and a speed of 1.0 m / min. Thereafter, the exposure pattern HMW-201B (3 KW, ultra-high pressure mercury lamp, manufactured by Oak Manufacturing Co., Ltd.) was used to expose a 10 μm square extraction pattern, and then the unevenness forming layer support film was removed. The exposure amount at this time was 50 mJ / cm ^2, and then development was performed at 30 ° C. with a 0.4 wt% solution of TMAH (tetramethylammonium hydride).
Thereafter, the film was thermally cured at 230 ° C. for 30 minutes to form a reflective base film. The scratches of the reflector plate (panel appearance) thus obtained were evaluated as follows.

(Suction power)
The measured value of the meter installed in the vacuum pump was taken as the suction force.
(Scratches after lamination)
Visual evaluation was performed as follows.
○ …… No defects due to scratches,
Δ: Slightly scratched and slightly display defect (presence of suction mark after lamination)
○… No suction marks △… Suction marks remain and display is slightly defective.
When the suction part is a conventional crescent type (Comparative Example 1), it is a roll type, and when the roll diameter is 80 mm and 150 mm, lamination is performed when the suction force is changed, and the results are shown in Table 2.

When the conventional crescent type is used as the suction unit type, scratches occurred, but when the film suction part of the auto-cut laminator is rotated in synchronization with the film transport speed and laminated with a roll type, scratches are eliminated. It was. In Comparative Example 1 in which the suction force during suction was 0.5 KPa when the film suction portion rotated during lamination, suction marks were observed after lamination.
In the laminating step of the under-reflection photosensitive element laminated in the order of (a) concavo-convex forming layer support film, (b) reflective base photosensitive resin layer and (c) protective film of the present invention, (c) protective film While peeling, the film adsorbing part of the auto-cut laminator used when laminating the (a) unevenness forming layer support film and (b) the reflective underlayer photosensitive resin layer to the plate is rotated and laminated while synchronizing with the film transport speed. In this case, scratches on the outer surface of the film adsorbing portion and the (a) concavo-convex forming layer support film can be reduced, and a panel having no scratch on the panel surface can be produced with high yield. Thereby, the reflecting plate for TFT-LCD can be manufactured.

The cross-sectional schematic diagram of the auto cut laminator which has a film adsorption | suction part of a prior art example. The auto cut laminator cross-sectional schematic diagram which has a roll type film adsorption | suction part of this invention.

Claims (2)

(A) Lamination process using an auto-cut laminator of a reflective ground photosensitive element laminated in the order of a concavo-convex forming layer support film, (b) a reflective ground photosensitive resin layer, and (c) a protective film, ) While peeling off the protective film, when the (a) concavo-convex forming layer support film and (b) the reflective base photosensitive resin layer are laminated to the plate-like material, the film adsorbing part of the auto-cut laminator is synchronized with the film transport speed. A method for producing a reflector using a reflective base film, wherein the laminate is rotated and laminated. When the film suction part rotates, the suction force at the time of suction is set to 0.05 to 0.4 KPa, the roll type is capable of being sucked by the film suction part, the roll diameter is 50 to 300 mm, and air is jetted in the film traveling direction. It has a mechanism, The reflecting plate manufacturing method using the reflective base film of Claim 1 characterized by the above-mentioned.

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