JP2006339671A - Laser device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an organic laser device capable of radiating a laser beam when an electric current is injected. <P>SOLUTION: The organic laser device comprises an organic compound layer, a first electrode formed on the upper surface of the organic compound layer, and a second electrode formed on the lower surface of the organic compound layer. The laser device radiates a laser beam by applying an electric current that exceeds a threshold value between the first and second electrodes, wherein the first electrode functions as a reflecting mirror. For the organic compound layer used in the laser device to radiate the laser beam, a laminated structure thereof and the thickness of each layer are determined considering the wavelength of the laser beam. The organic compound layer is formed between a pair of electrodes, and preferably, is formed with a plurality of layers, each having a different carrier transport property and a different wavelength of the emitting light. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

The present invention relates to a laser device using an organic material, and particularly to a current excitation type organic laser device.

  A solid-state laser has features such as high output, high efficiency, high energy storage, wide wavelength tunable characteristics, and small size, and is therefore a laser with a wide application field. Of these, semiconductor lasers are characterized by their small size, light weight, and low threshold. Semiconductor lasers using inorganic semiconductors have already been developed and put into practical use in many fields.

  On the other hand, if laser oscillation is realized using an organic compound, characteristics that cannot be obtained with an inorganic semiconductor laser can be imparted to the laser. For example, flexible lasers can be produced based on the flexibility of materials, manufacturing processes can be simplified and costs can be reduced, and manufacturing processes can be varied (evaporation, spin coating, printing, dip coating, etc. are applicable) Etc.). Non-patent literature 1 summarizes lasers using organic compounds.

There have been many examples of laser oscillation by photoexcitation of organic compounds. By using a fluorescent material having a high quantum yield and irradiating a laser for photoexcitation such as a nitrogen laser, laser oscillation can be performed relatively easily. However, the energy required for laser oscillation is extremely large, and an energy density of several μJ / cm ² to several hundred μJ / cm ² is required. This value is an energy density of several tens of W / cm ² to several thousand W / cm ² , and in the case of a 1 cm square element, it is necessary to pass a current of about 10 A to 1000 A at a voltage of several tens of volts.

An organic electroluminescence (EL) element is known as a typical light emitting element that emits light from an organic material. This element is formed by stacking layers called a hole transport layer, a light emitting layer, and an electron transport layer using an organic material between a pair of electrodes. Then, light is emitted by applying a voltage between the electrodes and injecting electrons and holes into the light emitting layer. This emission can change the wavelength band of the emission depending on the material used for the light emitting layer or the guest material to be added, but in any case, the wavelength band is relatively wide (color purity is poor) and directivity is high. Because it was not available, it could not be used as a laser beam. Furthermore, it is said that the conventional organic EL element cannot flow a high-density current required for laser oscillation.
Nir Tessler, “Laser Based on Semiconductor Organic Materials”, Adv. Mater. 1999, 11, p. 363-370

The present invention has been made in view of the above problems, and an object of the present invention is to provide a laser device that can excite current by using an organic material as a laser medium.

  The present invention is an organic laser device including an organic compound that emits laser light when an electric current is injected. In the present invention, a thin film mainly composed of an organic compound formed between a pair of electrodes is generically called an organic compound layer. The organic compound layer used in the laser apparatus of the present invention has a laminated structure and a thickness of each layer determined in consideration of the wavelength in order to enable laser light emission. The organic compound layer is formed so as to be sandwiched between a pair of electrodes, and is preferably formed using a plurality of layers having different carrier transport properties and emission wavelengths. In addition, a so-called resonator structure in which a pair of electrodes are formed via a reflector is a desirable mode.

  The organic laser device of the present invention is formed by contacting a plurality of layers capable of emitting light in an organic compound layer so that laser light can be emitted by passing an electric current through an organic compound layer formed between a pair of electrodes. It is what.

  In this organic laser device, between the pair of electrodes, both or one surface of the organic compound layer is provided with a reflector, and a so-called resonator structure is preferable. That is, it is preferable that a reflector is provided on at least one surface of the organic compound layer so as to form a standing wave with respect to light having a specific wavelength emitted from the organic compound layer between the pair of electrodes. It becomes. Furthermore, it is desirable that the thickness of the organic compound layer is 1/2 times (half wavelength) of the wavelength of the laser beam or an integer multiple thereof. Here, it is known that the speed of light in a substance is different from that in a vacuum, and the speed of light in a substance is obtained by multiplying the speed of light in a vacuum by the refractive index of the substance. Therefore, in actuality, the film thickness obtained by multiplying the film thickness in the organic compound by the refractive index (hereinafter referred to as the optical film thickness, that is, optical film thickness = film thickness × refractive index) is an integer of the half wavelength of the laser beam. Must be doubled. Hereinafter, the film thickness simply refers to the film thickness of the substance, and the optical film thickness is obtained by multiplying the film thickness of the substance film by its refractive index.

  The present invention is an organic laser device in which an organic compound layer that emits light having a plurality of emission peaks and having a half width of at least one emission peak of 10 nm or less is provided between a pair of electrodes.

  The organic compound layer applied to the present invention has a structure in which a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, an electron injection layer, and the like are appropriately combined. In this classification, layers suitable for hole transport such as hole mobility are called hole injection layers and hole transport layers, and layers suitable for electron transport such as electron mobility are called electron transport layers and electron injection layers. Note that the hole injection layer and the hole transport layer are distinguished from each other, but these are the same in the sense that the hole transport property is a particularly important characteristic. For the sake of convenience, the hole injection layer is a layer in contact with the anode, and the layer in contact with the light emitting layer is called a hole transport layer. Further, the layer in contact with the cathode is called an electron injection layer, and the layer in contact with the light emitting layer is called an electron transport layer. The light-emitting layer may also serve as an electron transport layer, and can also be referred to as a light-emitting electron transport layer. A hole injection layer, a hole transport layer, an electron injection layer, and the like can also be used as the light emitting layer. In addition, the light emitting layer can be applied with a metal complex, an organic dye material, various derivatives, or the like in order to change the emission color.

  When such a stacked structure of organic compound layers is applied, electrons injected from the cathode and holes injected from the anode recombine in the light emitting layer to form excitons, and the excitons return to the ground state. Light emission is obtained by so-called electroluminescence, which sometimes emits light. In the present invention, the hole transport layer is in contact with the light emitting layer so as to emit light having a wavelength shorter than the wavelength band of light emitted from the light emitting layer by current injection and having a peak wavelength half width of 10 nm or less. By forming a laser beam, it is possible to express a laser beam.

In the present invention, an organic compound layer that emits light having a half-width of a peak wavelength of 10 nm or less by current injection is provided between a pair of electrodes, and the change in emission intensity at the emission peak with respect to the current density has a different slope. The region can be divided into two linear regions, and the region with a large inclination is an organic laser device on the high current density side with respect to the region with a small inclination. In particular, the present invention, the current density two linear regions with different slopes are in contact (hereinafter, referred to as threshold) ^is, is characterized in that is between ^{5mA / cm 2 ~20mA / cm 2} . Further, the half-value width of the emission peak changes by 20% or more before the current density of the current injected into the organic compound layer reaches the threshold value.

With the above-described configuration of the present invention, a laser device capable of current excitation using an organic material as a laser medium can be obtained.

Here, as a substance constituting the first layer of the organic compound layer, a substance having a hole mobility of 10 ⁻⁶ cm ² / V · sec or more, for example, 4,4′-bis [N- (1-naphthyl) is used. ) -N-phenyl-amino] biphenyl (hereinafter referred to as α-NPB), 4,4 ′, 4 ″ -tris (N, N-diphenylamino) triphenylamine (hereinafter referred to as TDATA), 4 , 4′-bis [N- (3-methylphenyl) -N-phenylamino] biphenyl (hereinafter referred to as TPD), 4,4 ′, 4 ″ -tris (N-carbazolyl) triphenylamine (hereinafter referred to as “TPD”) TCTA) and the like are preferable. However, substances other than those listed here may be used.

The substance constituting the second layer is represented by a substance having an electron mobility of 10 ⁻⁸ cm ² / V · sec or more, for example, tris (8-quinolinolato) aluminum (hereinafter referred to as Alq3). A metal complex having a quinoline skeleton or a benzoquinoline skeleton, a mixed ligand complex thereof, or the like is preferable. In addition to metal complexes, 2- (4-biphenylyl) -5- (4-tert-butylphenyl) -1,3,4-oxadiazole (hereinafter referred to as PBD), 1,3-bis [ Oxadiazole derivatives such as 5- (p-tert-butylphenyl) -1,3,4-oxadiazol-2-yl] benzene (hereinafter referred to as OXD-7), 3- (4-tert-butyl Phenyl) -4-phenyl-5- (4-biphenylyl) -1,2,4-triazole (hereinafter referred to as TAZ), 3- (4-tert-butylphenyl) -4- (4-ethylphenyl)- Triazole derivatives such as 5- (4-biphenylyl) -1,2,4-triazole (hereinafter referred to as p-EtTAZ), bathophenanthroline (hereinafter referred to as BPhen), bathocuproin (hereinafter referred to as “p-EtTAZ”) Phenanthroline derivatives such as indicated as BCP), 4, 4 '- (N-carbazolyl) biphenyl (hereinafter referred to as CBP) can be used. However, substances other than those listed here may be used.

  Note that one or both of the first layer and the second layer may be a layer containing an inorganic compound.

According to the present invention, laser oscillation can be performed by current excitation using an organic material as a laser medium. That is, an organic laser device capable of current excitation can be obtained.

  The inventors of the present invention have considered that there is a problem in the threshold value measurement method in the studies of the photoexcited organic lasers reported so far. Conventionally, in an organic solid-state laser by photoexcitation, a thin layered organic compound is irradiated with strong laser light and the resulting fluorescence is measured. Here, the fluorescence spectrum is measured while changing the incident energy of the laser beam, and the emission peak intensity with a narrow half-value width is monitored. The measurement problem is based on the assumption that all incident energy is absorbed by the organic compound in the film. Actually, laser light transmitted without being absorbed by the organic compound in the thin film and laser light reflected by the film are not taken into consideration. Therefore, it is considered that the energy density required for laser oscillation is considerably smaller than the values reported so far.

  In an organic EL element, a large amount of carriers are supplied to a thin film of an organic compound. If a rough estimate is made, the number of carriers present in the organic EL element during energization and the number of molecules in the element are almost equal or more. Therefore, the number of molecules that do not have carriers, that is, molecules in the ground state, may be less than those that have carriers. When carrier recombination occurs in this state and an excited state is generated, there is a possibility that the number of molecules in the excited state may be relatively larger than the number of molecules in the ground state. In other words, it can be expected that a reversal distribution can be sufficiently produced even with a low current amount. Here, a resonator structure may be added to the element. In other words, by making the optical film thickness of the organic compound thin film functioning as a resonator an integral multiple of a half wavelength, the laser can be oscillated by amplifying the light by stimulated radiation and resonance resulting from the inversion distribution state. Expected.

Therefore, the present inventors have studied in detail the correlation between the current density and the emission intensity in the low current region for the purpose of searching for the possibility of laser oscillation from the organic EL element. As a result, all or part of the correlation of the light emission intensity with respect to the current density is represented by two straight lines having different inclinations, and the region having a large inclination is located on the high current density side with respect to the region having a small inclination. I understood that. The inventors have found that the current density (threshold) where the two regions are in contact with each other is an extremely small value of several mA / cm ² to several tens of mA / cm ² . At the same time, it was clarified that the full width at half maximum of the emission spectrum decreased by about 20% around this threshold. That is, by confirming that a specific plurality of organic compound layers are formed in contact with each other, even a current-excitation laser device using an organic compound as a medium exhibits the same behavior as a so-called solid laser. I was able to.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. However, the present invention can be implemented in many different modes, and those skilled in the art can easily understand that the modes and details can be variously changed without departing from the spirit and scope of the present invention. Is done. Therefore, the present invention is not construed as being limited to the description of this embodiment mode.

Embodiment 1

  In this embodiment mode, a structure in which laser light can be extracted from a substrate side (anode side) in a laser device in which an electrode and an organic compound layer are stacked over a substrate will be described. FIG. 1 shows a laser device of the present embodiment configured by laminating a plurality of layers on a substrate 11. In this embodiment mode, since the laser light is extracted from the substrate side 11, any substrate that has translucency with respect to the laser light may be used. Specifically, glass, quartz, transparent plastic, or the like can be used. Reference numeral 12 denotes an anode, and a metal, an alloy, an electrically conductive compound, or a mixture thereof can be used, and there is no particular need to consider the work function. This is because the conductive reflector 13 formed on the anode 12 is responsible for hole injection into the organic compound layer, and the anode 12 only needs to be in ohmic contact with the conductive reflector 13. However, in this structure, since laser light is output to the substrate 11 side, the anode 12 is preferably as translucent as possible. Therefore, when the material of the anode 12 is a metal or an alloy, it is preferable to use a metal having a small absorption in the visible light region and form it as a thin film. Specifically, a light-transmitting conductive oxide such as ITO (Indium Tin Oxide) or ZnO (Zinc Oxide) or a light-transmitting conductive nitride such as TiN (Titanium Nitride) can be used. However, since these materials also absorb light to some extent, the anode 12 is preferably a thin film having a thickness of about 100 nm or less.

  The conductive reflector 13 has a function as an electrode for injecting holes into the organic compound layer, and also has a function as a reflector for confining light generated in the light emitting layer 16 to form a standing wave. ing. Therefore, it is preferable to use a conductive material that has low visible light absorption, high reflectivity, and conductivity as the reflecting mirror. Here, since holes need to be injected into the organic compound layer, it is necessary to select a material having a large work function (a work function of 4.0 eV or more). Examples of satisfying these conditions include Ag and Pt. In addition, in order to take out a laser beam through the conductive reflector 13 functioning as the reflecting mirror, it is preferable that the reflectance is about 50% to 95%.

  In the organic compound layer, a hole injection layer 14 excellent in hole injection from the anode, a hole transport layer 15 for efficiently transporting holes from the hole injection layer 14 to the light emitting layer 16, and an electron injection barrier from the cathode 19 are reduced. An electron injection layer 18 having a function and an electron transport layer 17 for efficiently transporting the injected electrons to the light emitting layer 16 are included. The injected carriers (holes and electrons) are recombined in the light emitting layer 16. The mechanism from these carrier injection, transport, recombination to light emission is the same as that of a normal organic EL device. Therefore, a material that can be used in a normal organic EL element can be used in each functional layer described above. In this embodiment, five functional layers are used as the organic compound layer. However, the present invention is not limited to this, and the number of layers can be reduced by performing a plurality of functions in the same layer. Is also possible.

  As the hole injection material for forming the hole injection layer 14, a material having a small ionization potential is used, which is roughly classified into a metal oxide, a low molecular organic compound, and a high molecular compound. As examples of the metal oxide, vanadium oxide, molybdenum oxide, ruthenium oxide, aluminum oxide, or the like can be used. Examples of low molecular weight organic compounds include starburst amines typified by m-MTDATA and metal phthalocyanines. On the other hand, conjugated polymers such as polyaniline and polythiophene derivatives can be used as an example of the polymer compound. By using these materials as the hole injection layer 14, the hole injection barrier is reduced and holes are efficiently injected.

  A well-known material can be used also for the hole transport layer 15, and an aromatic amine is a good example. For example, 4,4′-bis [N- (1-naphthyl) -N-phenyl-amino] biphenyl (hereinafter referred to as α-NPB) or 4,4 ′, 4 ″ -tris (N, N-diphenyl) -Amino) triphenylamine (hereinafter referred to as TDATA) and the like can be used. As the polymer material, poly (vinyl carbazole) or the like showing good hole transport properties may be used.

A known material can also be used for the light emitting layer 16. For example, tris (8-quinolinolato) aluminum (hereinafter referred to as Alq ₃ ), tris (4-methyl-8-quinolinolato) aluminum (hereinafter referred to as Almq ₃ ), bis (10-hydroxybenzo [η] -quinolinato) beryllium (Hereinafter referred to as BeBq ₂ ), bis (2-methyl-8-quinolinolato)-(4-hydroxy-biphenylyl) -aluminum (hereinafter referred to as BAlq), bis [2- (2-hydroxyphenyl) -benzoxa Zolato] zinc (hereinafter referred to as Zn (BOX) ₂ ), bis [2- (2-hydroxyphenyl) -benzothiazolato] zinc (hereinafter referred to as Zn (BTZ) ₂ ), and various other fluorescent complexes Dyes are effective. Phosphorescent materials such as platinum octaethylporphyrin complex, tris (phenylpyridine) iridium complex, and tris (benzylideneacetonato) phenanthrene europium complex are also effective. In particular, phosphorescent materials have a longer excitation lifetime than fluorescent materials, so it is easy to create an inversion distribution, that is, a state in which there are more molecules in the excited state than in the ground state, which is essential for laser oscillation. become.

  Note that in the above-described light emitting layer, a light emitting material may be used as a dopant. That is, a material having a larger ionization potential and a larger band gap than the light emitting material may be used as a host, and a small amount (about 0.001% to 30%) of the above light emitting material may be mixed therewith.

A known material can also be used for the electron transport layer 17. Specifically, a metal complex having a quinoline skeleton or a benzoquinoline skeleton as represented by Alq ₃ or a mixed ligand complex thereof is preferable. In addition to metal complexes, 2- (4-biphenylyl) -5- (4-tert-butylphenyl) -1,3,4-oxadiazole (hereinafter referred to as PBD), 1,3-bis [ Oxadiazole derivatives such as 5- (p-tert-butylphenyl) -1,3,4-oxadiazol-2-yl] benzene (hereinafter referred to as OXD-7), 3- (4-tert-butyl Phenyl) -4-phenyl-5- (4-biphenylyl) -1,2,4-triazole (hereinafter referred to as TAZ), 3- (4-tert-butylphenyl) -4- (4-ethylphenyl)- Triazole derivatives such as 5- (4-biphenylyl) -1,2,4-triazole (hereinafter referred to as p-EtTAZ), bathophenanthroline (hereinafter referred to as BPhen), bathocuproin (hereinafter referred to as “p-EtTAZ”) Shown as BCP) can be used phenanthroline derivatives such as.

  In the electron injection layer 18, an alkali metal salt such as lithium fluoride or cesium bromide or an alkaline earth metal salt such as calcium fluoride may be used. A cathode 19 is formed on the electron injection layer 18. The cathode 19 may be made of a metal, an alloy, an electrically conductive compound, a mixture thereof, or the like having a small work function as used in a normal EL element. Specifically, Group 1 or Group 2 typical elements, that is, alkali metals such as Li and Cs, and alkaline earth metals such as Mg, Ca, and Sr, and alloys containing them (Mg / Ag, Al / Li) In addition, it can be formed using a transition metal containing a rare earth metal, but can also be formed by lamination with a metal (including an alloy) such as Al, Ag, or ITO. However, in this embodiment, it is necessary to form a resonator structure between the cathode 19 and the conductive reflector 13 that functions as a reflecting mirror on the anode 12 for light emission obtained from the light emitting layer. Therefore, the cathode material is preferably a metal having low visible light absorption and high reflectance. Specifically, Al, Mg, or an alloy thereof is preferable. In addition, since the reflectance of the cathode is preferably as close as possible to 100%, a film thickness that does not transmit visible light is required.

  Note that the organic material described above may be formed by applying any one of a wet method and a dry method. In the case of a polymer material, a spin coating method, an ink jet method, a dip coating method, a printing method, or the like is suitable. On the other hand, in the case of a low molecular material, the film is formed not only by the dip coating method and the spin coating method but also by vacuum deposition or the like. The anode material and the cathode material are formed by vapor deposition, sputtering, or the like.

  The most important point here is the distance between the conductive reflector 13 functioning as a reflecting mirror on the anode 12 and the cathode 19. In order to amplify light by forming a standing wave, an interval that is an integral multiple of a half wavelength is required. Therefore, the film thickness obtained by multiplying the film thickness of the organic material disposed between the conductive reflector 13 and the cathode 19 and the refractive index thereof, that is, the optical film thickness is an integral multiple of the half wavelength of the laser beam. It is necessary to set the distance between the conductive reflector 13 and the cathode 19.

For example, in order to amplify light of 400 nm, the optical film thickness is required to be at least 200 nm. Therefore, the distance between the conductive reflector 13 and the cathode 19 is a length obtained by dividing 200 nm by the refractive index of the organic material. Similarly, in order to amplify light of 800 nm, the organic layer needs to have an optical film thickness of at least 400 nm. Therefore, the distance between the conductive reflector 13 and the cathode 19 is a length obtained by dividing 400 nm by the refractive index of the organic material. The light emission wavelength of the organic light-emitting material described above exists mainly in the visible light region. Therefore, in order to amplify visible light defined as 400 nm to 800 nm, the distance between the conductive reflector 13 and the cathode 19, that is, the optical film thickness of the functional layer needs to be 200 nm or more.

  By energizing between the electrodes of the organic laser device shown in FIG. 1, electrons injected from the cathode 19 and holes injected from the anode 12 are recombined mainly by the light emitting layer 16 to emit light. Part of the light emission obtained here is amplified between the conductive reflector 13 functioning as a reflecting mirror and the cathode. Therefore, an inversion distribution is formed by passing a current at a current density equal to or higher than the threshold, and the laser oscillates. Laser light is extracted from the anode 12 side. The laser light can be observed as a relatively sharp emission spectrum centered on the wavelength that is allowed to be amplified in the resonator structure in the spectrum emitted from the light emitting layer 16.

Embodiment 2

  In this embodiment mode, a structure of a laser device using an anode as a reflecting mirror is shown. In FIG. 2, the substrate 21 can be formed using a material similar to that shown in Embodiment Mode 1. An anode 22 is formed on the substrate 21. At the same time, the anode 22 functions as a reflecting mirror. Therefore, the anode 22 is formed using a material that has low visible light absorption, high reflectance, and conductivity. Further, since it is necessary to inject holes into the organic compound layer, it is necessary to select a material having a large work function (work function of 4.0 eV or more). For example, Ag, Pt, or Au can be used as a material that satisfies these conditions. In order to take out the laser light through the anode 22 functioning as the reflecting mirror, the reflectance is preferably about 50% to 90%.

  The organic compound layer formed on the anode 22 is the same as that in Embodiment 1, and a hole injection layer 23, a hole transport layer 24, a light emitting layer 25, an electron transport layer 26, an electron injection layer 27, and the like are appropriately stacked. Form.

  Similarly, the material shown in Embodiment 1 can also be used for the cathode 28. In addition, the distance between the anode 22 and the cathode 28 (that is, the optical film thickness of the organic compound layer) needs to be manufactured so as to satisfy the conditions described in the first embodiment. By energizing between the electrodes of the organic laser device shown in FIG. 2, the electrons injected from the cathode 28 and the holes injected from the anode 22 are recombined mainly in the light emitting layer 25 to emit light. Part of the light emission obtained here is amplified between the anode 22 and the cathode 28. Therefore, an inversion distribution is formed by flowing a current at a current density equal to or higher than the threshold, and the laser is oscillated. Laser light is extracted from the anode 22 side. The laser beam is observed as a relatively sharp emission spectrum centered on a wavelength radiated from the light emitting layer 25 and allowed to be amplified in the resonator structure.

Embodiment 3

  In the first and second embodiments, a resonator structure is formed between the anode or the conductive reflector functioning as a reflecting mirror on the anode and the cathode, and the amplification of light and the formation of the inversion distribution by the current are performed. This shows a configuration in which stimulated radiation based on the above occurs and the laser oscillates. In this case, since the light is amplified between the electrodes or between the conductive reflector and the cathode, the thickness of the organic compound layer inevitably increases. This directly leads to an increase in the driving voltage, so that the voltage for oscillating the laser increases. Therefore, in this embodiment mode, a structure of a laser device that can reduce the film thickness of the organic compound layer by attaching a reflecting mirror under the transparent electrode and incorporating the transparent electrode itself into a part of the resonator will be described.

  In FIG. 3, since the laser beam is extracted from the substrate 31 side, it is desirable that the substrate 31 has high translucency with respect to the oscillating laser beam. Specifically, the materials as shown in Embodiment Modes 1 and 2 may be used.

  Reference numeral 32 denotes a reflecting mirror formed on the substrate. As the reflecting mirror 32, it is preferable to use a material that absorbs less visible light and has a high reflectance. Specifically, metals and alloys such as Al, Ag, and Pt are preferable. Alternatively, Ti may be further formed after forming an alloy of Al and Si. Alternatively, a dielectric multilayer film can be used. For example, a dielectric multilayer film in which silicon oxide and titanium oxide are alternately deposited can be used. This dielectric multilayer film is formed by vacuum deposition or sputtering. In this case, the film thicknesses of silicon oxide and titanium oxide are determined by the wavelength of light to be resonated, and the light reflectance may be controlled by the number of layers. In the laser apparatus of the present embodiment, since the reflecting mirror 32 is also a light extraction port, that is, an output mirror, the reflectance is preferably set to 50% to 95%.

  A transparent electrode 33 is formed on the reflecting mirror 32 thus obtained. As the transparent electrode 33, a transparent conductive oxide such as ITO or ZnO, or a transparent conductive nitride such as TiN can be used. However, since it is necessary to inject holes into the organic compound layer, those having a large work function, such as ITO and TiN, are preferable. The organic compound layer includes a hole injection layer 34, a hole transport layer 35, a light emitting layer 36, an electron transport layer 37, an electron injection layer 38, and the like, and has the same structure as that of an organic EL element that emits light by passing an electric current. This is manufactured by applying a method and a material as shown in Embodiment Mode 1.

・・・（１）
この光学膜厚ｄが半波長（λ／２）の整数（ｑ）倍である必要があるので、式（２）の関係がある。

・・・（２）
したがって、透明電極の膜厚は、式（３）のように与えられる。

・・・（３） The film thickness of the transparent electrode 33 may be determined in consideration of the following. Now, the average refractive index of the functional layer is n _org , the film thickness is d _org , the refractive index and the film thickness of the transparent electrode are n _ele and d _ele , respectively, and the wavelength of the oscillating light is λ. The optical film thickness d is given by equation (1).

... (1)
Since this optical film thickness d needs to be an integer (q) times the half wavelength (λ / 2), there is a relationship of the formula (2).

... (2)
Therefore, the film thickness of the transparent electrode is given by the equation (3).

... (3)

  For example, when the light of 500 nm is oscillated, the average refractive index of the organic compound layer is 1.7, the refractive index of the transparent electrode is 2, and the thickness of the organic compound layer is 100 nm of a standard organic EL element, the transparent electrode The film thickness is 40 nm or 160 nm.

  A cathode 39 is formed on the device constructed according to such design guidelines. As the cathode 39, a material as shown in Embodiment Mode 1 can be used. The cathode 39 is used as a reflecting mirror and not as an output mirror. Therefore, it may be formed with a film thickness that does not allow the emitted light to pass therethrough.

  In the configuration shown in FIG. 3, when current is applied between the electrodes, electrons injected from the cathode 39 and holes injected from the transparent electrode 33, that is, the anode, are recombined mainly in the light emitting layer 36 to emit light. Part of the light emission obtained here is amplified between the reflecting mirror 32 and the cathode 39. Therefore, an inversion distribution is formed by flowing a current at a current density equal to or higher than the threshold, and the laser is oscillated. Laser light is extracted from the anode 33 side. The laser light is observed as a relatively sharp peak of the emission spectrum centered on the wavelength radiated from the light emitting layer 36 and allowed to be amplified in the resonator structure.

Embodiment 4

  In the first to third embodiments, a configuration in which laser light is extracted from the substrate side, that is, the anode side is shown. However, in this embodiment mode, laser light is emitted from the upper side of the anode, that is, from the cathode side (element upper surface). The configuration of the laser device to be extracted will be described. In FIG. 4, reference numeral 41 denotes a substrate, and the material is not particularly selected. Not only glass, quartz and plastic but also flexible substrates such as paper and cloth can be used. Of course, it does not have to be transparent.

  Reference numeral 42 denotes an anode. This functions to inject holes into the organic compound layer and to function as a reflector. Therefore, it is necessary to select a material that absorbs less visible light, has high reflectivity, and has a high work function (work function of 4.0 eV or more). For example, Ag, Pt, or Au can be used as a material that satisfies these conditions. In addition, since this anode is used as a reflecting mirror, it needs to have a film thickness that does not transmit visible light. Specifically, it may be several tens nm to several hundreds nm.

  On the anode 42, a structure similar to that of an organic EL element that emits light by passing a current can be used. That is, the hole injection layer 43, the hole transport layer 44, the light emitting layer 45, and the electron transport layer 46 are provided. For these, a known material as shown in Embodiment Mode 1 may be used. An electron injection layer 47 is usually provided on the electron transport layer 46. As a material for the electron injection layer 47, an organic compound doped with an alkali metal such as Li or Ce is preferably used. As the organic compound, the electron transport material described in Embodiment Mode 1 can be used in combination. Thereafter, the cathode 48 is formed. As the cathode 48, a known material as shown in the first embodiment may be used. Alternatively, the cathode 48 may be formed by directly laminating an MgAg alloy having excellent electron injection properties without providing the electron injection layer 47. In this structure, since the laser light is extracted from the upper surface, the cathode functions as an output mirror. Therefore, the cathode is formed so that the transmittance is 50% to 95% with respect to the oscillating laser beam. For example, when an alloy of Mg and Ag is used as a material, the film thickness of the cathode 48 is about 5 nm to 20 nm.

  The light emitted from the organic compound layer by energizing the laser device of the present embodiment formed in this way is amplified by stimulated radiation and resonates between the cathode and the anode, and is emitted as laser light on the cathode side (element upper surface). ).

Embodiment 5

  In the present embodiment, a reflecting mirror is attached under the transparent electrode, the transparent electrode itself is taken into a part of the resonator to reduce the thickness of the organic compound layer, and the upper surface of the substrate (of the pair of electrodes). Of these, the structure of a laser device capable of oscillating laser light from the electrode side farther from the substrate is shown.

In FIG. 5, 51 is a board | substrate and a material is not specifically limited. Not only glass, quartz and plastic but also flexible substrates such as paper and cloth can be used. Of course, it does not have to be transparent. A reflecting mirror 52 is provided on the substrate 51. As the reflecting mirror 52, a material having a high reflectance and a low visible light absorption rate is selected. Specifically, a metal such as Al or Ag, an alloy containing these metals as a main component, or a dielectric laminated film such as SiO ₂ or TiO ₂ is used. In the dielectric laminated film, the thickness of each layer is designed so as to selectively reflect light having a wavelength to oscillate. In addition, the number of layers necessary for total reflection of light is stacked. An electrode 53 is provided on the reflecting mirror 52. The electrode 53 is required to be capable of injecting holes into the organic compound layer and to have high transparency. Therefore, it is preferable to use a transparent electrode such as ITO or TiN.

  On the electrode 53, a structure similar to that of an organic EL element that emits light by passing a current is provided. That is, the hole injection layer 54, the hole transport layer 55, the light emitting layer 56, and the electron transport layer 57 are formed. For these, a known material as shown in Embodiment Mode 1 may be used. Of the hole injection layer 54 and the electron transport layer 57, the layers other than those responsible for light emission can be omitted. An electron injection layer 58 is usually provided on the electron transport layer 57. As a material for the electron injection layer 58, an organic compound doped with an alkali metal such as Li or Ce is preferably used. As the organic compound, the electron transport material described in Embodiment Mode 1 can be used in combination. Thereafter, the cathode 59 is formed. As the cathode 59, a known material as shown in Embodiment Mode 1 may be used. Alternatively, the cathode 59 may be formed by directly laminating an MgAg alloy excellent in electron injection without providing the electron injection layer 58. In this structure, since the laser beam is extracted from the upper surface, the cathode 59 functions as an output mirror. Therefore, the cathode is formed so that the transmittance is 50% to 95% with respect to the oscillating laser beam. For example, when the material is Mg / Ag alloy, the thickness of the cathode 59 is about 5 nm to 20 nm.

  By energizing the laser device of this embodiment formed in this way, a part of the light amplified by the induced radiation from the organic compound layer resonates between the cathode 59 and the electrode 53, that is, the anode, and the standing wave. Is formed. At this time, since the transparent electrode is also included in the resonator, the thickness of the organic compound layer can be reduced accordingly. That is, light emission is possible at a low voltage, and therefore laser oscillation is possible at a low voltage.

Embodiment 6

  In this embodiment mode, a structure of a laser device capable of extracting laser light from an end surface (edge portion) of a light-emitting element, that is, a side surface of an organic compound layer will be described.

  In FIG. 6, 61 is a board | substrate and the material is not specifically limited. A material as shown in Embodiment Mode 5 can be used. An electrode 62 is formed on the substrate 61. Here, the amplification of light by resonance focuses only on the light emitting component parallel to the film surface. That is, focusing on only the longitudinal mode, the resonance in the transverse mode as shown in the first to fifth embodiments can be ignored. Therefore, since the transparency and reflectance of the electrode can be ignored, the electrode material may be selected with the work function as the main parameter. Specifically, a metal having a large work function such as Ag, Pt, or Au, or an alloy may be used. Of course, ITO or ZnO, which is a transparent electrode having a large work function, may be used. However, in consideration of the wraparound of light emitted in the plane direction, an electrode having no transparency is preferable.

  On the electrode 62, the same structure as that of the organic EL element that causes light emission by applying a current is adopted. That is, a hole injection layer 63, a hole transport layer 64, a light emitting layer 65, an electron transport layer 66, and an electron injection layer 67 are provided, which are manufactured by selecting a method and a material as shown in Embodiment Mode 1. The In addition, what is necessary is just to select an appropriate film thickness for these organic compound layers and the film thickness of the said electrode to light-emit efficiently. An electrode 68 is provided on the electron injection layer 67. It is not necessary to consider transparency and reflectance as the material, and the work function may be selected mainly as a parameter. Specifically, a material as shown in Embodiment Mode 1 may be used.

  In this embodiment mode, laser oscillation occurs from the end face of the organic compound layer. Accordingly, the width may be small, and usually a width of several μm and a length of several hundred μm are sufficient. What is important here is control of a plurality of longitudinal modes. When oscillating from the lateral direction of the organic compound layer, since the wavelength is usually shorter than the length of the organic compound layer, many longitudinal modes occur, and as a result, many longitudinal modes are included in the width of the spectrum shape curve. enter. Therefore, as shown in FIG. 6, a diffraction grating 69 is formed near the light emitting layer. For example, in FIG. 6, the upper surface of the hole transport layer is not flat, but is formed in a striped pattern to form a diffraction grating. Then, the light generated in the light emitting layer is periodically reflected and resonated / amplified by the lattice spacing of the diffraction grating, and light with high monochromaticity can be amplified. Here, if the refractive index of the organic compound layer is n and the wavelength to oscillate is λ, a diffraction grating may be fabricated with a lattice spacing of (λ / 2n).

By doing in this way, a single longitudinal mode can be realized and laser light with good monochromaticity can be obtained from the side surface of the organic compound layer.

Embodiment 7

  In this embodiment, a light-emitting element having a structure in which laser light can be extracted from an end surface (edge portion) of the light-emitting element will be described with reference to FIGS.

  In FIG. 14, reference numeral 121 denotes a substrate for supporting the element. There is no particular limitation on the material of the substrate 121. Not only glass, quartz and plastic but also flexible substrates such as paper and cloth can be used.

  A first electrode 122 is formed on the substrate 121. The first electrode 122 functions as an anode and also functions as a reflector for reflecting emitted light. In the light-emitting element described in this embodiment, the first electrode 122 includes two layers (122a and 122b). The first electrode 122a only needs to be formed of a highly conductive material, and is not particularly limited. The first electrode 122b is in contact with the first layer 123, injects holes into the first layer 123, and functions as a reflector. Accordingly, in consideration of injecting holes, the first electrode 122b is formed using a metal oxide such as ITO or ZnO having a high work function, or a metal or alloy such as Ag, Pt, or Au. It is preferable to do. In consideration of functioning also as a reflector, it is preferable to use a material having a low visible light absorptivity such as Ag and a high reflectance. The film thickness is controlled so as to function as a reflector. Note that, since the first electrode 122b is formed using a material having a high work function, the work function of the first electrode 122a is not particularly limited. The first electrode 122 is not necessarily formed of two layers, and may have a single layer structure or a stacked structure of three layers or more.

  The first layer 123 formed over the first electrode 122b is a layer for transporting holes and a layer that emits light. Note that in the light-emitting element of this embodiment, the first layer 123 is preferably formed with a hole transporting property higher than that of electrons, an excellent hole injecting property, and a large energy band gap. In addition, since the first layer 123 is also a layer that emits light, the first layer 123 is preferably formed using a material having a high quantum yield of light emission. For example, an aromatic amine is preferable. Specifically, α-NPB, TDATA, 4,4′-bis [N- (3-methylphenyl) -N-phenylamino] -biphenyl (hereinafter referred to as TPD), 4,4 ′, 4 ′ '-Tris (N-carbazolyl) triphenylamine (hereinafter referred to as TCTA) or the like can be used. Alternatively, a polymer material such as poly (vinyl carbazole) that exhibits good hole transport properties may be used. It is particularly preferable to use a triphenylamine derivative. Note that the first layer 123 is not limited to a single layer, and may be a layer having a stacked structure of two or more layers including the above-described substances.

  A second layer 124 is formed on the first layer 123. The second layer is a layer for transporting electrons. The second layer 124 is preferably formed using a material having a higher electron transporting property than holes, an excellent electron injecting property, and a high ionization potential. For example, it is preferable to use a metal complex having a quinoline skeleton or a benzoquinoline skeleton represented by Alq3, a mixed ligand complex thereof, or the like. In addition to metal complexes, oxadiazole derivatives such as PBD and OXD-7, triazole derivatives such as TAZ and p-EtTAZ, phenanthroline derivatives such as BPhen and BCP, 4,4 ′-(N-carbazolyl) biphenyl ( (Hereinafter referred to as CBP) can be used. Note that it is preferable to use a material that forms the second layer 124 that has a larger band gap and a larger ionization potential than the material that forms the first layer 123. Specifically, phenanthroline derivatives such as CBP and BCP, carbazole derivatives, and the like. Note that the second layer 124 is not limited to a single layer, and may be a layer having a stacked structure of two or more layers including the above-described substances.

  A second electrode 125 is formed on the second layer 124. The second electrode 125 functions as a cathode and also functions as a reflector for reflecting the emitted light. In the light-emitting element described in this embodiment, the second electrode 125 includes two layers (125a and 125b). The second electrode 125 a is in contact with the second layer 124 and injects electrons into the second layer 124. Therefore, the second electrode 125a includes a typical element of Group 1 or Group 2, that is, an alkali metal such as Li or Cs, an alkaline earth metal such as Mg, Ca, or Sr, and an alloy containing these (Mg / Ag, In addition to (Al / Li), it is preferable to form with a low work function such as transition metals including rare earth metals. The second electrode 125b functions as a reflector. Accordingly, it is preferable to use a metal having low visible light absorption and high reflectance such as Ag, Al, Mg, or an alloy thereof. The film thickness is controlled so as to function as a reflector. Note that since the second electrode 125a is formed of a material having a low work function, the work function of the second electrode 125b is not particularly limited. The second electrode 125 is not necessarily formed of two layers, and may be a single layer or a stacked structure of three or more layers.

  Note that the first layer 123 and the second layer 124 may be formed by applying either a wet method or a dry method. In the case of a polymer material, a spin coating method, an ink jet method, a dip coating method, a printing method, or the like is suitable. On the other hand, in the case of a low molecular material, the film is formed not only by the dip coating method and the spin coating method but also by vacuum deposition or the like. The formation method of the first electrode 122 and the second electrode 125 is not particularly limited, and is formed by an evaporation method, a sputtering method, or the like.

  Between the first electrode 122 and the second electrode 125 functioning as a reflector, a first layer 123 and a second layer 124 are provided, and the light emitted in these two layers resonates. Amplified. Therefore, the sum of the optical film thicknesses of these two layers needs to be an integral multiple of the half wavelength of the emitted light. That is, the distance between the first electrode 122 and the second electrode 125 is a value obtained by dividing the optical film thickness of the first layer 123 and the second layer 124 by the refractive index.

  Note that in this embodiment mode, the layer provided between the first electrode 122 and the second electrode 125 includes two layers of the first layer 123 and the second layer 124. It is good also as a thing of the structure of three or more layers which provided not only this but provided the other functional layer. For example, functions such as an electron injection layer, a hole injection layer, and a hole blocking layer may be provided.

The light-emitting element has a threshold for stimulated emission in a range of 200 mA / cm ² or less in terms of change in emission intensity with respect to current density. That is, an inverted distribution state is formed when a current is supplied so as to have a current density equal to or higher than this threshold value. Note that the threshold value is preferably ² mA / cm ^{2 to} 50 mA / cm ² in consideration of durability of the light-emitting element. In the region where the state is formed, electrons and holes injected from each electrode are recombined, and a part of the emitted light is a reflector (first electrode and second electrode in this embodiment). Resonance and amplification. Note that the emission spectrum of the emitted light has a light emission wavelength that can resonate within the light emitting element and has a relatively sharp peak. The light emitting element can be used as, for example, a laser oscillator, that is, a laser device.

Examples of the present invention will be described below.
FIG. 8 shows an element structure of a sample manufactured in this example. As a substrate for forming a film such as an electrode or a light emitting layer, a glass substrate (for example, Corning # 1737 glass) is used. An ITO film having a thickness of 100 nm was formed thereon as the anode 101 by sputtering.

On the anode 101, α-NPB, which is a hole transport material, was formed as a hole transport layer 102 with a film thickness of 135 nm by vacuum deposition. Subsequently, 4,4′-N, N′-dicarbazole biphenyl (hereinafter referred to as CBP) as the host material and the iridium complex Ir (tpy) as the triplet light emitting material are formed over the hole transport layer 102 as the light emitting layer 103. ) ₂ (acac) was co-evaporated to form a film with a thickness of 30 nm. CBP and iridium complex are 10: 1 by weight. On these films, BCP was formed as the blocking and electron transporting layer 104, calcium fluoride (CaF ₂ ) as an electron injecting material was formed as the electron injecting layer 105, and Al was formed as the cathode 106 by vapor deposition to form a sandwich structure. Note that the size of the element may be determined as appropriate, but in the present example, the size was 2 mm × 2 mm.

The thickness of each layer formed of an organic material is set for the purpose of amplifying the generated light in the organic compound layer. That is, light emitted from an Ir complex added to the CBP layer or a 4,4′-bis [N- (1-naphthyl) -N-phenyl-amino] biphenyl (hereinafter referred to as α-NPB) layer is emitted. The film thickness is set to form a standing wave while repeating reflection at the interface where ITO and the organic compound layer are in contact, the interface where the BCP layer and the CaF ₂ layer are in contact, or the interface where the CaF ₂ layer and the Al layer are in contact It is preferable to do.

  Among the organic materials used in this example, those capable of emitting light are Ir complex and α-NPB. These emit light in the visible light region (400 nm to 800 nm). In order to form a standing wave, it is a necessary condition that the interval between the reflecting surfaces is an integral multiple of a value obtained by dividing the half wavelength of the standing wave by the refractive index of the organic material. For example, in order to form a standing wave of 400 nm light, the interval between the reflecting surfaces needs to be an integral multiple of 200 nm divided by the refractive index of the organic material. Therefore, assuming that the refractive index of the organic material is 1.7, a value obtained by dividing 200 by 1.7, that is, an integer multiple of 120 nm. That is, the total thickness of the α-NPB layer, the CBP layer, and the BCP layer needs to be an integral multiple of 120 nm. Similarly, in order to form a standing wave of 800 nm light, the total optical film thickness of α-NPB, CBP layer, and BCP layer must be an integer multiple of 400 nm, such as 400 nm, 800 nm, and 1200 nm. Is a necessary condition. Assuming that the refractive index is 1.7, the total film thickness is an integral multiple of 240 nm, such as 240, 480, and 720 nm, and the interval between the reflective surfaces, that is, the α-NPB, CBP layer, and BCP layer The total film thickness is an integral multiple of 240 nm, such as 240 nm, 480 nm, and 720 nm.

  In the present embodiment, in view of the above, in the organic EL element shown in FIG. 8, the optical film thickness of the organic compound layer is set to 270 nm, and the organic EL element is intentionally set to a thick film thickness. The film thickness is not limited to this. In the case of the organic EL device shown in FIG. 8, assuming that the refractive index of the organic compound is 1.7, the wavelength of light that can form a standing wave is a wavelength obtained by dividing 920 nm by an integer, and is 460 nm in the visible light region.

FIG. 9 shows an emission spectrum of the organic EL element shown in FIG. 8 observed from the substrate surface. Luminescence is obtained by applying a DC voltage and flowing current so that ITO serves as an anode and Al serves as a cathode. FIG. 10A shows voltage-current density characteristics, and it can be seen that a current of several mA flows when about 20 V is applied. The emission area of the element is a 0.04 cm ^2, current density becomes 100 mA / cm ² approximately. FIG. 10B shows voltage vs. light emission intensity characteristics. The emission intensity is observed from the emission extraction surface (ITO side). Light emission starts from around 6V, and light emission of tens of thousands of candela (Cd) is obtained by applying 24V.

  11A and 11B show emission spectra of the organic EL element shown in FIG. In both spectra, the emission intensity is normalized by the maximum value. FIG. 11A shows a spectrum of surface emission observed from the ITO side. On the other hand, FIG. 11B is a side emission spectrum observed from the lateral direction of the element.

  In FIG. 11A, strong light emission is observed in the wavelength band of 475 nm to 650 nm. This light emission is based on the light emission from the Ir complex. Further, another light emission is observed in the vicinity of 400 nm to 475 nm. This light emission is based on the light emission from the α-NPB layer. This result is considered that carriers (holes and electrons) recombine mainly in the CBP layer and contribute to light emission from Ir, but some carriers are recombined in the α-NPB layer. In this surface emission, the emission intensity changes in proportion to the change in current density. Therefore, at any current density, the spectra have exactly the same shape, and only the intensity increases linearly in proportion to the increase in current density.

  In contrast to the spectrum in FIG. 11A, an emission spectrum obtained from the side surface of the element has two characteristics as shown in FIG. The first is that the emission spectrum waveforms in the wavelength band of 475 nm to 650 nm are different. Another point is that a sharp emission spectrum is observed around 460 nm. Although the cause of the former is not clear, the latter emission spectrum is thought to be because a standing wave is formed in the organic compound layer of the device, and only light of this wavelength is amplified. In fact, as described above, the wavelength at which a standing wave is allowed by the film thickness of this element is 460 nm. Most characteristically, the emission in the wavelength range of 475 nm to 650 nm changes in intensity in proportion to the increase in current density, whereas another emission spectrum having a peak near 460 nm is more than the increase in current density. Furthermore, the emission intensity is greatly increased. Therefore, in the standardized FIG. 11B, only 460 nm emission is relatively increased.

From the above, it is considered that light having a wavelength of 460 nm in the organic EL element shown in FIG. 8 forms a standing wave. That is, it can be said that this element functions as a resonator of 460 nm light and amplifies the light. When the current density is further increased to 120 mA / cm ² , the spectral shape of the surface emission does not change at all, whereas the emission at 460 nm further increases in intensity and gives a sharp emission signal (FIG. 12).

FIG. 13 is a diagram in which the emission intensity of light having a wavelength of 460 nm is plotted with respect to the current density. FIG. 13 (A) is from the surface side of the organic EL element shown in FIG. The light emitted from the side surface of the element is measured. In any characteristic, the emission intensity increases linearly with increasing current density. However, it is not a monotonous increase, even in the each of the light-emitting, it is shown that the current density is a threshold whose inclination varies around ^{5mA / cm 2 ~10mA / cm 2} . At this time, when the current density is lower than the threshold value, light is emitted by spontaneous emission, and when it is high, light is emitted by stimulated emission.

  FIG. 13B also shows a diagram in which the half width of the emission spectrum at an emission peak of 460 nm is plotted against the current density. Until the threshold is reached, the full width at half maximum decreases rapidly, and at a current density equal to or higher than the threshold, the full width at half maximum gradually decreases. FIG. 7 shows the results of examining the dependence of the emission spectrum observed from the side surface of the device on the measurement angle. The emission spectrum observed from the front is subtracted from the emission spectrum at each angle. As shown in the figure, the light emission from the side surface of the device was measured by changing the angle in the range of 0 to 61 degrees, but there was no significant change in the emission wavelength and the half-value width. This can be considered that the decrease in the half width is not because the refractive index depends on the wavelength. In other words, it can be said that the emission spectrum is not apparently sharp because only a small part of the emission wavelength is selectively observed.

  On the other hand, in any case of light emission from the surface side and light emission from the side surface side, a threshold value could not be found for light emission of 475 nm to 650 nm. The light emission in this wavelength band showed a phenomenon that the intensity increased linearly as the current density increased, and the increase rate of the light emission decreased when reaching a high current region. This is the same as a typical behavior of a normal organic EL element. In addition, since light emission of 460 nm observed from the ITO side of the device gives a broad spectrum at any current density, the half width could not be obtained.

Table 1 shows the laser oscillation characteristics of the sample (element) manufactured in this example. This shows the results of measurement for three identical samples. In each case, the peak wavelength is 462 nm to 464 nm, the half width is 10 nm or less, and the threshold is 10 mA / cm ^{2 to} 12.5 mA / cm. ² This characteristic is a value measured at room temperature.

From the above results, the following conclusions can be drawn. The element of this example has a resonator structure for light emission near 460 nm, and a standing wave of light having this wavelength is formed. In addition, light emission at 460 nm shows a threshold value with respect to current density. Such behavior is similar to that of a so-called solid laser. If this threshold is a threshold at which a so-called inversion distribution has begun, laser light is oscillated at a current density higher than this.

The light-emitting element of the present invention and various characteristics of the light-emitting element will be described.
The structure of the light-emitting element described in this embodiment will be described with reference to FIGS. An ITO film is formed on the glass substrate 130 to form the electrode 131. After forming α-NPB as a first layer 132 on the electrode 131 by vacuum deposition, CBP and BCP are sequentially formed on the first layer 132 as a second layer 133 (133a, 133b). Filmed. After forming calcium fluoride as a third layer 134 on the second layer 133, aluminum was further formed as an electrode 135, whereby a light-emitting element was obtained. Note that the film thicknesses of the first layer 132 and the second layers 133a and 133b are 100 nm, 30 nm, and 130 nm, respectively, and the total film thickness thereof is 260 nm. This is because the electrode 131 and the third layer 134 function as reflectors in the light-emitting element. As described above, the light emitting element in this embodiment is configured to resonate the emitted light.

FIG. 16A shows an emission spectrum of the light-emitting element having the structure shown in FIG. FIG. 16A shows that light emission having a narrow half-width peak at 465 nm is obtained. In addition, FIG. 17 shows the change in emission intensity with respect to the current density. From FIG. 17, it can be seen that the emission intensity increases linearly as the current density increases, but the gradient increases with the current density being 12 mA / cm ² as the inflection point (that is, the threshold). This indicates that spontaneous radiation is dominant in the region of current density smaller than 12 mA / cm ² , whereas stimulated radiation occurs in the region of current density larger than 12 mA / cm ^2. Conceivable.

Comparative example

A comparative example for the light emitting element having the configuration shown in FIG. 15 will be described.
As shown in FIG. 18, ITO is formed on a glass substrate 140 to form an electrode 141. An α-NPB film was formed as a first layer 142 on the electrode 141 by vacuum evaporation, and then a BCP film was formed as a second layer 143 on the first layer 142. After forming calcium fluoride as a third layer 144 over the second layer 143, aluminum was further formed as an electrode 145, whereby a light-emitting element was obtained. Note that the film thicknesses of the first layer 142 and the second layer 143 are 100 nm and 160 nm, respectively, and the total film thickness thereof is 260 nm. Note that in the light-emitting element, the electrode 141 and the third layer 144 each function as a reflector. Such a light emitting element in this comparative example is configured to resonate emitted light.

  FIG. 16B shows an emission spectrum of the light-emitting element having the structure shown in FIG. FIG. 16B shows that light emission having a narrow peak at 460 nm is obtained. However, in the dependence of the light emission intensity on the current density (FIG. 17), the light emission intensity increases linearly as the current density increases, but this is seen in the light emitting device having the configuration shown in FIG. 15 of the present invention. It can be seen that it does not have an inflection point.

FIG. 1 is a cross-sectional view illustrating the structure of the laser device shown in the first embodiment. FIG. 2 is a cross-sectional view illustrating the structure of the laser device shown in the second embodiment. FIG. 3 is a cross-sectional view illustrating the structure of the laser device shown in Embodiment 3. FIG. 4 is a cross-sectional view illustrating the structure of the laser device shown in the fourth embodiment. FIG. 5 is a cross-sectional view illustrating the structure of the laser device shown in Embodiment 5. FIG. 6 is a cross-sectional view illustrating the structure of the laser device described in Embodiment 6. FIG. 7 is a graph showing the emission characteristics of the element produced in Example 1, and the results of measuring the emission spectrum by changing the angle of the detector. FIG. 8 is a diagram for explaining the structure of the element manufactured in Example 1. FIG. FIG. 9 is a graph showing an emission spectrum of the device produced in Example 1. FIG. 10 is a graph showing (A) voltage-to-current characteristics and (B) voltage-to-luminescence intensity characteristics of the element fabricated in Example 1. FIG. 11 is a graph showing the current density dependence of the emission spectrum of the device produced in Example 1, normalized by the maximum value of the emission intensity. FIG. 12 is a graph showing an emission spectrum of the device manufactured in Example 1 at a current density of 120 mA / cm ² . FIG. 13 is a graph showing the light emission characteristics of the device manufactured in Example 1, in which the half width of the emission peak at 460 nm is plotted against the current density. FIG. 14 illustrates the structure of the light-emitting element described in Embodiment 7. FIG. 15 illustrates the structure of the light-emitting element manufactured in Example 2. FIG. 16 is a graph showing an emission spectrum of the light-emitting element manufactured in Example 2. FIG. 17 is a diagram showing the current density dependence of the emission spectrum intensity of the light-emitting element manufactured in Example 2 and the light-emitting element of the comparative example. FIG. 18 is a diagram illustrating a stacked structure of a light emitting element of a comparative example.

Claims (15)

An organic compound layer, a first electrode provided on the upper surface of the organic compound layer, and a second electrode provided on the lower surface of the organic compound layer,
The first electrode functions as a reflecting mirror;
A laser device, wherein an inversion distribution is formed in the organic compound layer by passing a current of a threshold value or more between the first electrode and the second electrode. An organic compound layer, a first electrode provided on the upper surface of the organic compound layer, and a second electrode provided on the lower surface of the organic compound layer,
The first electrode functions as a reflecting mirror;
By passing a current of a threshold value or more between the first electrode and the second electrode, an inversion distribution is formed in the organic compound layer, and the half width from the organic compound layer has an emission wavelength of 10 nm or less. A laser device that emits light. An organic compound layer, a first electrode provided on the upper surface of the organic compound layer, and a second electrode provided on the lower surface of the organic compound layer,
The first electrode functions as a reflecting mirror;
By passing a current of a threshold value or more between the first electrode and the second electrode, an inversion distribution is formed in the organic compound layer, and the half width from the organic compound layer has an emission wavelength of 10 nm or less. Light is emitted,
The optical film thickness of the organic compound layer is an emission wavelength of light emitted from the organic compound layer, or an integer multiple of half the wavelength,
A laser device, wherein an inversion distribution is formed in the organic compound layer by passing a current of a threshold value or more between the first electrode and the second electrode. An organic compound layer, a first electrode provided on the upper surface of the organic compound layer, and a second electrode provided on the lower surface of the organic compound layer,
The second electrode functions as a reflecting mirror;
A laser device, wherein an inversion distribution is formed in the organic compound layer by passing a current of a threshold value or more between the first electrode and the second electrode. An organic compound layer, a first electrode provided on the upper surface of the organic compound layer, and a second electrode provided on the lower surface of the organic compound layer,
The second electrode functions as a reflecting mirror;
By passing a current of a threshold value or more between the first electrode and the second electrode, an inversion distribution is formed in the organic compound layer, and the half width from the organic compound layer has an emission wavelength of 10 nm or less. A laser device that emits light. An organic compound layer, a first electrode provided on the upper surface of the organic compound layer, and a second electrode provided on the lower surface of the organic compound layer,
The second electrode functions as a reflecting mirror;
By passing a current of a threshold value or more between the first electrode and the second electrode, an inversion distribution is formed in the organic compound layer, and the half width from the organic compound layer has an emission wavelength of 10 nm or less. Light is emitted,
The optical film thickness of the organic compound layer is an emission wavelength of light emitted from the organic compound layer, or an integer multiple of half the wavelength,
A laser device, wherein an inversion distribution is formed in the organic compound layer by passing a current of a threshold value or more between the first electrode and the second electrode. An organic compound layer, a first electrode provided on the upper surface of the organic compound layer, and a second electrode provided on the lower surface of the organic compound layer,
The first electrode and the second electrode function as a reflecting mirror,
A laser device, wherein an inversion distribution is formed in the organic compound layer by passing a current of a threshold value or more between the first electrode and the second electrode. An organic compound layer, a first electrode provided on the upper surface of the organic compound layer, and a second electrode provided on the lower surface of the organic compound layer,
The first electrode and the second electrode function as a reflecting mirror,
By passing a current of a threshold value or more between the first electrode and the second electrode, an inversion distribution is formed in the organic compound layer, and the half width from the organic compound layer has an emission wavelength of 10 nm or less. A laser device characterized in that light is emitted from a direction crossing the direction of current injection. An organic compound layer, a first electrode provided on the upper surface of the organic compound layer, and a second electrode provided on the lower surface of the organic compound layer,
The first electrode and the second electrode function as a reflecting mirror,
By passing a current of a threshold value or more between the first electrode and the second electrode, an inversion distribution is formed in the organic compound layer, and the half width from the organic compound layer has an emission wavelength of 10 nm or less. Light is emitted from a direction intersecting the direction of current injection;
The optical film thickness of the organic compound layer is an emission wavelength of light emitted from the organic compound layer, or an integer multiple of half the wavelength,
A laser device, wherein an inversion distribution is formed in the organic compound layer by passing a current of a threshold value or more between the first electrode and the second electrode. In any one of Claims 1 thru | or 9,
The laser apparatus is characterized in that the threshold value is determined by an intersection of a first line indicating a light emission intensity with respect to a current density and a second line. According to claim 10, wherein the intersection point is a laser device characterized by a range of current density ^{5mA / cm 2 ~20mA / cm 2} . According to claim 10, wherein the intersection point is a laser device characterized by a range of current density ^{10mA / cm 2 ~12.5mA / cm 2} . In any one of Claims 10 to 12,
The laser apparatus according to claim 1, wherein the half width changes by 20% or more before the current density of the current injected into the organic compound layer reaches the intersection. In any one of Claims 1 thru | or 13,
The organic compound layer has a light emitting layer and a hole injection layer in contact with the light emitting layer,
The laser apparatus, wherein the hole injection layer is made of a metal oxide. In any one of Claims 1 thru | or 14,
The organic compound layer has a light emitting layer and a hole injection layer in contact with the light emitting layer,
The hole injection layer has any one of vanadium oxide, molybdenum oxide, ruthenium oxide, and aluminum oxide.

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