JP2006330165A - Exposure apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus whose productivity is improved by enabling exposure processing to be performed by a user's judgment. <P>SOLUTION: The exposure apparatus 10 comprises an exposure means 46 for irradiating a photosensitive material 40 with a light beam to perform scanning and exposure, a conveying means 28 for moving relatively to the exposure means 46 to convey the photosensitive material 40 in a scanning direction, an accommodation chamber 13 in which the exposure means 46 and conveying means 28 are accommodated movably, temperature measuring means 58 which are provided at a plurality of positions in the accommodation chamber 13 containing at least one of the exposure means 46 and conveying means 28 to measure temperatures at the plurality of positions, a decision means 100 for deciding temperature stability at each of the plurality of positions from measurement results of the temperature measuring means 58, a display means 108 for displaying an exposure performance level derived from the decision result of the decision means 100, and an input means 110 for instructing the start of exposure based upon the exposure performance level displayed by the display means 108. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to an exposure apparatus, and more particularly to an exposure apparatus capable of determining and displaying an exposure performance level by measuring the temperature of each main part in the apparatus body.

  A scanning exposure apparatus such as a laser drawing apparatus (for example, see Patent Document 1) that draws a predetermined pattern by irradiating a photosensitive material such as a photosensitive film conveyed in the sub-scanning direction with laser light while performing main scanning. In addition, a spatial light modulator (SLM) such as a digital micromirror device (DMD) is used to irradiate a photosensitive material conveyed in the scanning direction with a light beam modulated according to image data. In an image exposure apparatus that performs exposure, there are many exposure chambers (container chambers) such as an exposure head that irradiates a light beam, a drive motor that drives photosensitive material conveying means such as a rotating drum and a stage, and a control board that controls each part of the apparatus Exothermic parts are present.

When these heat-generating parts are energized, the temperature around them is raised, but normally, the exposure process is started after waiting until the temperature is stabilized (stable temperature is reached). This is because the image exposure quality cannot be guaranteed unless the exposure process is started after the stable temperature (stable state) is reached. However, some users demand that the exposure process be started for the purpose of improving productivity even if the image exposure quality is not guaranteed (even if the temperature is not stable).
JP 2002-82446 A

  Accordingly, an object of the present invention is to obtain an exposure apparatus that can improve the productivity by allowing the exposure process to be executed according to the judgment of the user in consideration of the above facts.

  In order to achieve the above object, an exposure apparatus according to claim 1 of the present invention comprises an exposure unit that scans and exposes a photosensitive material by irradiating a light beam, a relative movement with respect to the exposure unit, and the exposure unit A plurality of locations in the storage chamber including transport means for transporting the photosensitive material along the scanning direction, a storage chamber in which the exposure means and the transport means are movably stored, and at least one of the exposure means and the transport means A temperature measuring means for measuring the temperature at the plurality of locations, a determination means for determining the degree of temperature stability for each of the plurality of locations from the measurement result by the temperature measurement means, and a determination result of the determination means And a display means for displaying the exposure performance level.

  An exposure apparatus according to a second aspect of the invention is characterized in that in the exposure apparatus according to the first aspect, the exposure apparatus has an input means for giving an exposure start instruction based on an exposure performance level displayed on the display means. Yes.

  According to the first aspect of the present invention, the exposure performance level is recognized by the user by the display means. According to the second aspect of the present invention, an exposure start instruction can be given according to the exposure performance level recognized by the user. Therefore, it is possible to perform the exposure process even when the temperature of each part is not stable, and this makes it possible to improve productivity.

  An exposure apparatus according to a third aspect is the exposure apparatus according to the first or second aspect, wherein the exposure performance level includes a time until exposure is possible.

  According to the third aspect of the present invention, since the time until exposure is possible is determined, the user waits until the temperature stabilizes according to the time, or performs exposure without waiting until the temperature stabilizes. Can be judged.

  Further, in the exposure apparatus according to claim 4, in the exposure apparatus according to any one of claims 1 to 3, the exposure apparatus is further reconfirmed after an exposure start instruction according to the exposure performance level. It is characterized by.

  According to the fourth aspect of the present invention, when an exposure start instruction is mistakenly given in a state where the temperature is not stable, the instruction can be canceled, so that a malfunction can be prevented.

  An exposure apparatus according to a fifth aspect is the exposure apparatus according to any one of the first to fourth aspects, wherein all the temperatures at the plurality of locations are set after the exposure start instruction according to the exposure performance level. It is characterized in that the exposure process is automatically started after waiting for stabilization.

  According to the fifth aspect of the present invention, even if an exposure start instruction is issued in a state where the temperature is not stable, the exposure process is not started until the temperature is stabilized, so that malfunction can be prevented and quality is guaranteed. The exposure process is executed.

  As described above, according to the present invention, it is possible to provide an exposure apparatus that can execute an exposure process at the user's discretion and can improve productivity.

  DESCRIPTION OF THE PREFERRED EMBODIMENTS The best mode for carrying out the present invention will be described below in detail based on the embodiments shown in the drawings. 1 to 5 show an exposure apparatus according to the present invention. 6 and 7 show a stage for conveying a photosensitive material provided in the exposure apparatus according to the present invention.

  As shown in FIGS. 1 to 5, the exposure apparatus 10 is configured such that the apparatus main body 20 is accommodated in a large cover body 12, and in the illustrated state, the indoor temperature and humidity are controlled, and the indoor It is installed in an air-conditioning environment such as a clean room in which dust, fine particles, etc. floating in the air are removed and the air cleanliness is kept high.

  The cover body 12 is configured by mounting a plurality of panels 16 for blocking the inside and outside on a frame body formed by assembling a rod-shaped square pipe 14 (see FIG. 5) into a frame shape, and only the lower surface portion is opened. A housing chamber 13 for housing the apparatus main body 20 is formed therein, and a lower square pipe 14 is connected to and supported by a pair of mounts 24 installed on the floor surface.

  The cover body 12 is provided with an exposure chamber (chamber) 15 that constitutes a part of the housing chamber 13 therein, and has a substantially cubic cover body portion 12A in which the main part of the apparatus body 20 is housed, and a cover body. Projecting on one side surface of the part 12A, the stage 28 and the like of the apparatus main body 20 are accommodated, and a set part 12B for attaching / detaching a photosensitive material 40 such as a substrate to / from the stage 28 is configured.

  As shown in FIG. 5, the panel 16 provided in the cover main body 12A includes an inner panel 16A that forms the exposure chamber 15 by constituting the inner wall surface of the cover main body 12A, and a predetermined distance on the outer side of the inner panel 16A. And the outer panel 16B that constitutes the exterior surface of the cover main body 12A, whereby the wall surface of the cover body 12 has a two-layer structure. In addition, a component housing chamber 17 is provided between the inner panel 16A and the outer panel 16B. The component housing chamber 17 is a substantially hermetic layered space and is formed along the wall surface of the cover body 12.

  As shown in FIGS. 1 to 3, the set portion 12B has an upper surface that is lower than the cover main body portion 12A, and is set to be approximately the height of an operator standing in front of the set portion 12B. . On the upper surface of the set portion 12B, a rectangular opening 18 is formed at a portion corresponding to the stage 28, and an opening / closing panel 19 for opening and closing the opening 18 is provided.

  The opening / closing panel 19 is attached to the set portion 12B via a hinge (not shown) at the edge on the cover body 12A side. The opening / closing panel 19 is opened and closed by being manually rotated by the operator. It can be configured. A temperature sensor 72 for measuring the temperature of the storage chamber 13 is attached to the back surface of the open / close panel 19.

  When the open / close panel 19 is opened, the photosensitive material placement surface 28A, which is the upper surface of the stage 28, is exposed through the opening 18, and when the open / close panel 19 is closed, the stage 28 is concealed and the temperature sensor 72 is exposed. Is disposed in the vicinity of the upper portion of the stage 28, and in the set portion 12B, only the lower surface portion is opened. The temperature sensor 72 disposed in the vicinity of the stage 28 may be replaced with a non-contact infrared temperature sensor or the like that measures the temperature of the photosensitive material 40 immediately after being placed on the stage 28.

  The apparatus main body 20 of the exposure apparatus 10 accommodated in the accommodating chamber 13 of the cover body 12 includes a surface plate 22 formed in a rectangular thick plate shape serving as a base portion. The surface plate 22 is supported by a gantry 24 to which the square pipes 14 constituting the cover body 12 are connected, and is arranged from the set portion 12B to the cover main body portion 12A (exposure chamber 15) as shown in the figure. ing.

  On the upper surface of the surface plate 22, a pair of guide rails 26 extending in a straight line along the longitudinal direction (arrow Y direction) and arranged parallel to each other are laid. The pair of guide rails 26 form a linear stage moving path on the surface plate 22. Further, on the pair of guide rails 26, a stage 28 formed in a rectangular flat plate shape, a base 30 that movably supports the stage 28, an elevating mechanism 32 that raises and lowers the stage 28, and details will be described later. A measurement unit 70 including a light amount measurement unit, a beam position detection unit, and a camera calibration reference plate is provided as a unit.

  The base plate 30 has a rectangular flat plate shape, and four leg portions 34 slidably engaged with the guide rail 26 are attached in the vicinity of the four corners of the lower surface. On the upper surface of the base 30, an elevating mechanism 32 that moves the stage 28 in the vertical direction (arrow Z direction) is provided in parallel with the base 30 at a predetermined interval. Further, in FIGS. 1 to 3, a stepping motor 36 that generates a driving force for the lifting operation is provided on the side surface of the lifting mechanism 32 located on the back side, as shown in FIGS. It protrudes (exposes) from the side part of 32, and is attached.

  The stage 28 is arranged on the surface plate 22 with its longitudinal direction oriented along the extending direction of the guide rail 26, and each leg 34 of the base 30 engaged with the pair of guide rails 26 is By being slidable with respect to the guide rail 26, it is guided by each guide rail 26 and can be reciprocated in the direction of arrow Y along a stage moving path provided linearly on the surface plate 22.

  Between the pair of guide rails 26 on the upper surface of the surface plate 22, a linear motion linear servo motor 38 serving as a drive source for moving the stage is disposed, and a linear encoder 37 is further connected to the linear servo motor 38. Is attached. The linear servo motor 38 is attached to a round bar-shaped stator part (magnet part) 38A extending in parallel with the guide rail 26 along the longitudinal direction (arrow Y direction) of the surface plate 22, and the lower surface of the base 30. It is comprised with the cylindrical coil part 38B by which the stator part 38A was penetrated (refer FIG.3 and FIG.5).

  As shown in FIG. 7C, a plurality of heat radiation fins 38C are integrally provided on the lower surface and both side surfaces of the coil portion 38B, and the heat radiation fins 38C are arranged in the axial direction (arrows) of the coil portion 38B. (Y direction). Moreover, as for the coil part 38B installed in the lower surface of the base | substrate 30, the upper surface does not contact the lower surface of the base | substrate 30 directly, and as shown to FIG. A gap is provided between the heat insulating bush 39 and the lower surface of the base 30, and is attached in a state of protruding (exposed) from the lower surface of the base 30. The heat insulating bush 39 is made of a low thermal conductivity / low thermal expansion material such as glass or ceramic.

  In the linear servo motor 38, a driving force in the axial direction is generated in the coil portion 38B relative to the stator portion 38A by the magnetic action of the magnetic field formed by energizing the coil portion 38B and the magnetic field of the stator portion 38A. It is supposed to be. The stage 28 is guided by the pair of guide rails 26 by this driving force, and reciprocates in the direction of the arrow Y on the stage moving path on the surface plate 22 (see FIG. 10). In the drawing, the forward movement direction (alignment measurement direction) of the stage 28 is indicated by an arrow YA, and the backward movement direction (exposure direction / scanning direction) is indicated by an arrow YB.

  In addition, when the coil unit 38B moves relative to the stator unit 38A together with the stage 28, the linear encoder 37 outputs a pulse signal having a predetermined polarity corresponding to the reciprocating direction by the number of pulses proportional to the amount of movement. Output. Based on the pulse signal from the linear encoder 37, movement control such as constant speed movement, reverse movement, and stop of the stage 28 is performed.

  In addition, the photosensitive material placement surface 28A provided on the upper surface of the stage 28 is image-exposed to form, for example, a wiring pattern, which is an object to be exposed by the exposure apparatus 10, for example, a wiring pattern. A photosensitive material 40 such as a printed wiring board material is set in a state of being positioned at a predetermined mounting position by a positioning unit (not shown).

  As shown in FIG. 4, the photosensitive material 40 is provided with a plurality of alignment marks M (4 in the vicinity of each corner in the present embodiment) near the corners to indicate the reference of the exposure position. M is formed by, for example, a circular through hole. In addition, a plurality of grooves (not shown) are formed on the photosensitive material mounting surface 28A of the stage 28, and the photosensitive material 40 is placed on the stage 28 by applying a negative pressure inside the grooves by a negative pressure supply source. Adsorbed and held. The setting and removal of the photosensitive material 40 on the stage 28 is performed in a state where the stage 28 is disposed and stopped on the set portion 12B side which is the origin position of the moving path, as shown in FIGS. The opening / closing panel 19 is opened by the operator.

  In addition, a pair of support columns 42 are provided upright at both ends of the upper surface of the surface plate 22 in the width direction (arrow X direction) at a substantially intermediate position of the stage moving path provided on the surface plate 22. On the upper side of one side (the set portion 12B side) of the pair of support columns 42, a light beam is irradiated from above onto the photosensitive material 40 conveyed in the scanning direction (arrow YB direction) by the backward movement of the stage 28. An exposure unit 44 having a plurality of exposure heads 46 for scanning exposure is attached.

  Further, the upper portion on the other side is movable along the width direction (arrow X direction), and with respect to the photosensitive material 40 conveyed in the alignment measurement direction (arrow YA direction) by the forward movement of the stage 28, An alignment unit 60 including a plurality of cameras 62 that are arranged in accordance with the position of the alignment mark M and photograph the alignment mark M from above is attached.

  The exposure unit 44, the alignment unit 60, and a pair of support columns 42 that support both ends of each unit are configured in a gate shape that can pass through the stage 28 across the stage moving path, as shown in FIG. Arranged in the exposure chamber 15. Further, as shown in FIGS. 1 and 4, the exposure unit 44 includes a unit base 48 installed on a pair of support columns 42. The unit base 48 has a moving direction of the stage 28 (arrow Y direction) and the unit base 48. A plurality of (for example, eight) exposure heads 46 arranged in a substantially matrix form of m rows and n columns (for example, 2 rows and 4 columns) are attached along the orthogonal direction (arrow X direction).

  As shown in FIGS. 1 and 2, a component storage chamber 49 that is partitioned from the exposure chamber 15 is provided on the other side of the cover main body 12A. The component storage chamber 49 includes a light source. A large number of heat generating components that generate heat when the exposure apparatus 10 is operated, such as the unit 50, the power supply unit 74, and the control unit 76, are accommodated. A blower fan 78 is attached to the side surface (outer panel 16B) of the cover main body 12A to exhaust the air (high-temperature air) in the component storage chamber 49 to the outside and suppress the temperature increase in the component storage chamber 49. Yes.

  The light source unit 50 incorporates a plurality of laser light sources (semiconductor lasers), and the laser light emitted from each laser light source is guided to each exposure head 46 of the exposure unit 44 through an optical fiber (not shown). It has become. Each exposure head 46 includes a digital micromirror device (DMD) as a spatial light modulation element that modulates laser light incident from the light source unit 50 for each pixel in accordance with image data (not shown).

  Accordingly, in each exposure head 46, the incident light (laser light) from the light source unit 50 is modulated in units of pixels by the DMD, and is emitted as an exposure beam (laser beam). Thereby, in the exposure operation of the exposure apparatus 10, the exposure unit 44, on the surface of the photosensitive material 40 on the stage 28, at a predetermined timing from each exposure head 46 when the stage 28 passes below at a constant speed, respectively. A light beam is irradiated to expose the pixel pattern (image exposure).

  As shown in FIG. 8B, each exposure area 52 exposed by the light beam emitted from each exposure head 46 has a rectangular shape with a short side in the scanning direction, and is inclined at a predetermined angle with respect to the scanning direction. is doing. As the stage 28 moves, a strip-shaped exposed region 54 is formed for each exposure head 46 in the photosensitive material 40 as shown in FIG.

  As shown in FIG. 9, the alignment unit 60 includes a unit base 64 that is attached to a pair of support columns 42. The unit base 64 has a T-shaped cross section as shown in FIG. Yes. A pair of guide rails 66 is extended on the surface of the unit base 64 on the exposure unit 44 side along a direction (arrow X direction) orthogonal to the moving direction of the stage 28 (arrow Y direction). 62 is slidably guided by the pair of guide rails 66 and is driven by a drive source such as a ball screw mechanism 68 prepared individually and a stepping motor (not shown) for driving the stage 28, and the stage 28. It is the structure which moves independently in the direction orthogonal to this movement direction.

  In addition, each camera 62 is arranged in a posture in which the lens portion 62B provided at the tip of the camera body 62A is directed downward and the lens optical axis is substantially vertical, and at the tip of the lens portion 62B, A ring-shaped strobe light source (LED strobe light source) 62C is attached. Each camera 62 is moved in the direction of the arrow X by the drive source and the ball screw mechanism 68 when the alignment mark M of the photosensitive material 40 is photographed, and is arranged at a predetermined photographing position.

  That is, the optical axis of the lens is arranged so as to match the passing position of the alignment mark M of the photosensitive material 40 conveyed by the stage 28, and the strobe light source 62C is caused to emit light when the alignment mark M reaches a predetermined photographing position. The reflected light of the strobe light irradiated on the photosensitive material 40 is input to the camera main body 62A via the lens unit 62B, and the alignment mark M is photographed.

  Further, as described above, each exposure head 46 of the exposure unit 44 modulates the laser light incident from the light source unit 50 by DMD and irradiates the light beam onto the photosensitive material 40 to perform image exposure. A light amount distribution in a direction perpendicular to the scanning direction becomes non-uniform in a light beam reflected and emitted by the DMD due to disturbances generated during operation or changes with time, and a predetermined exposure amount on the photosensitive material 40. In some cases, the exposure amount of each portion to be exposed with the value of? Changes from a predetermined exposure amount value.

  Therefore, in this exposure apparatus 10, in order to perform shading adjustment and exposure amount adjustment to make the light amount distribution uniform, a light amount measuring device (light amount measurement) for measuring the light amount distribution and exposure amount in the light beam emitted from the DMD side. Means).

  In addition, since each exposure head 46 is provided with a large number of optical members and mechanism members from the light source to the imaging surface, thermal expansion and contraction due to temperature change, and accumulation of changes over time due to long-term use. As a result, the image formed by the light beam from each exposure head 46 (exposed region 54) may cause a shift that cannot be ignored at the joints, and the image quality may deteriorate.

  Therefore, in this exposure apparatus 10, a beam position for detecting the exposure position of each light beam in order to correct the connection between the images (exposure areas 52) formed by the light beams emitted from the plurality of exposure heads 46. A reference plate for detection and a light receiving element (beam position detecting means) are provided.

  Further, in the exposure apparatus 10 having the alignment function, the posture of the camera 62B is changed by rolling, pitching, and yawing when each camera 62 of the alignment unit 60 moves, and the light of the lens unit 62B is placed in the shooting position. The axis center may deviate from the normal position. Therefore, even if image exposure is performed by correcting the exposure position using the alignment function, the exposure position may deviate from the proper position and exceed the allowable range.

  Therefore, in this exposure apparatus 10, in order to calibrate the alignment function whose accuracy is affected by the cause of optical axis deviation caused by the posture change of each camera 62, a plurality of calibration marks photographed by each camera 62 are provided. A reference plate is provided. The light quantity measuring means, the beam position detecting means, and the camera calibration reference plate are provided in a measurement unit 70 attached to the front end portion of the stage 28 and integrally configured.

  The light amount measurement operation for shading adjustment and exposure amount adjustment, and the exposure position detection operation of each light beam for correcting the connection of each image formed by the light beam emitted from each exposure head 46 are the exposure apparatus. 10 is performed at a predetermined timing in the exposure operation (for example, after an exposure operation for a predetermined number of photosensitive materials), and the alignment function is calibrated at the time of manufacture or maintenance of the exposure apparatus 10 or at a predetermined timing in the exposure operation. To be implemented.

  As shown in FIG. 1, the exposure apparatus 10 includes an air conditioner 80 that air-conditions the storage chamber 13 in the cover body 12 that stores the apparatus main body 20. The air conditioner 80 is communicated with the exposure chamber 15 in the cover main body 12A by a cylindrical duct 82, and air (outside air) of the installation environment sucked from the intake port 84 is incorporated into a built-in HEPA filter (High Efficiency Particulate Air). Filter) 88 is used to collect and clean dust and fine particles, and further adjusts to a predetermined temperature and humidity to be ejected to duct 82. A temperature sensor 86 for measuring the temperature of the outside air sucked into the air conditioner 80 is attached to the intake port 84.

  As shown in FIG. 3, the duct 82 has a front end portion 82A attached to an inner wall surface 15A facing the inner wall surface in the exposure chamber 15 where the exposure unit 44 is disposed in the vicinity. At the upper position of the wall surface 15A and as shown in FIG. 4, it is arranged at the approximate center in the width direction (arrow X direction) of the exposure chamber 15.

  The air outlet 82B of the duct 82 has a circular opening and is directed downward so that the cooling air from the air conditioner 80 is blown out almost directly below. Moreover, the front-end | tip part 82A of the duct 82 is formed in linear form, and the length (length to the blower outlet 82B: L) of this linear part is set to the predetermined dimension.

The air conditioner 80 can adjust the flow rate and flow rate of the cooling air blown from the air outlet 82B of the duct 82. In this embodiment, the air flow rate at the air outlet 82B is 9.4 m / s, and the flow rate (volume flow rate) is. It is set to 10 m ³ / min. In the duct 82 of the present embodiment, the length (L) of the tip end portion 82A (linear portion) is 30 cm or more, and the diameter (D) of the outlet 82B is 15 cm.

  Further, a wind direction changing plate 90 formed in a rectangular flat plate shape is provided below the air outlet 82B of the duct 82. As shown in FIG. 4, the air direction changing plate 90 has substantially the same width as that of the stage 28, and is substantially in the width direction of the exposure chamber 15 so that the center portion is located almost directly below the air outlet 82 </ b> B of the duct 82. As shown in FIG. 3, one long side edge (base end) is attached to the inner wall surface 15 </ b> A of the exposure chamber 15 via a hinge 92, and can be rotated around the hinge 92. It is said that. Further, the tip end side is supported by an angle adjustment mechanism 94, and the inclination angle can be adjusted by manually operating the angle adjustment mechanism 94.

  The inclination angle of the wind direction changing plate 90 is adjusted so as to be inclined downward at a predetermined angle (for example, about 45 degrees) from the proximal end side to the distal end side directed inward of the exposure chamber 15. In this state, the tip is disposed at a height that does not hinder the movement of the stage 28. As a result, the cooling air blown downward from the air outlet 82B of the duct 82 and supplied into the exposure chamber 15 is changed in the blowing direction by the wind direction changing plate 90 to the substantially horizontal direction, and in the scanning direction (arrow YB direction). It is blown in the direction along.

  Further, as shown in FIGS. 3 and 4, an air guide plate 96 is provided on the stage 28 side. As shown in FIG. 6, the air guide plate 96 is manufactured by bending a rectangular flat plate-shaped sheet metal or the like at an acute angle in the longitudinal direction, and one side sandwiching the corner portion is the air guide plate main body portion 96 </ b> A. Is a mounting plate portion 96B, and the front end portion (rear end portion) of the mounting plate portion 96B is attached to the front end portion of the base 30 and is disposed in front of the stage 28.

  As shown in FIG. 4, the air guide plate 96 has a width dimension that is approximately ½ of the width dimension of the stage 28, and is disposed at the approximate center in the width direction with respect to the stage 28 (base 30). Further, as shown in FIG. 3, the mounting plate portion 96B protruding forward from the base 30 is arranged substantially horizontally, and the air guide plate main body portion 96A located on the upper side of the mounting plate portion 96B is connected to the base end side (corner). It is arranged so as to be inclined upward at a predetermined angle (for example, about 45 degrees) from the front side toward the stage 28 side.

  Further, when the stage 28 is arranged at the origin position shown in FIGS. 3 and 4, the air guide plate 96 is arranged almost directly below the camera 62 provided in the alignment unit 60. As shown in FIG. When 28 moves into the exposure chamber 15, it enters the retreat space 15 </ b> B recessed in the lower portion of the inner wall surface 15 </ b> A constituting the exposure chamber 15 together with the measurement unit 70.

  Thereby, when the stage 28 is stopped at the origin position and during the reciprocating movement between the origin position and the exposure chamber 15, among the cooling air blown to the stage 28 side along the scanning direction, What flows in the center of the stage moving path is guided to the upper surface (photosensitive material placing surface 28A) side of the stage 28 by the air guide plate 96, and flows on the stage 28 along the scanning direction.

  In addition, a neutralization device (ionizer) 98 is disposed over the width of the stage 28 above the front portion of the stage 28 disposed at the origin position. The static eliminator 98 includes a hollow pipe-shaped blowing part 98A and an ion generating part 98B that supplies ionized air to the blowing part 98A. In the ion generating part 98B, a gap between the ground electrode and the discharge electrode is formed. In this configuration, ions are generated by generating corona discharge.

  Then, the ions are supplied to the blowing unit 98A by a blower source, and ionized air is blown from the blowing unit 98A toward the photosensitive material placement surface 28A of the stage 28. As a result, when the photosensitive material 40 conveyed by the stage 28 passes below the static eliminator 98, the dust adhering to the photosensitive material 40 due to static electricity is blown out from the blowing portion 98A. Is removed from the photosensitive material 40 by air blowing.

  As shown in FIG. 1, the exposure apparatus 10 includes a controller 100 that controls the apparatus main body 20, an air conditioner 80, and the like. The controller 100 includes a stepping motor 36, a linear encoder 37, a linear servo motor 38, an exposure head 46 of the exposure unit 44, a camera 62 of the alignment unit 60, a camera moving drive source, and a measurement. Unit 70, negative pressure supply source, temperature sensor 72 provided in storage chamber 13, static eliminator 98, light source unit 50 provided in component storage chamber 49, power supply unit 74, control unit 76, and air conditioner 80 Are connected to the temperature sensor 86 and the like, and these are controlled by the controller 100 to operate.

  As shown in FIG. 5, a plurality of control boards 102 (102 </ b> A to 102 </ b> E) are housed in the component housing chamber 17 of the cover body 12. These control boards 102 are fixed to the base 104 and attached to the outer surface of the inner panel 16 </ b> A, and are connected to the controller 100.

  In addition, the control board 102 includes boards that control the exposure unit 44, the camera 62, the static eliminator 98, and the like of the apparatus main body 20 in conjunction with the controller 100. They are arranged close to each other. A blower fan 106 is attached to the outer panel 16 </ b> B provided on the upper part of the cover body 12 to exhaust the air (high-temperature air) in the component storage chamber 17 to the outside and suppress the temperature rise in the component storage chamber 17. ing.

  Further, in the exposure apparatus 10, temperature sensors 58 as temperature measuring means are attached around a plurality of main parts. The main parts mentioned here are the exposure head 46, the camera 62, the stage 28, the linear encoder 37, and the measurement unit 70, and are shown in a plurality of locations including at least one of the exposure head 46 and the stage 28, for example, FIG. 3 and FIG. As described above, the temperature sensor 58 is attached to the upper surface of the unit base 48, the lower surface of the unit base 64, the lower surface of the stage 28, the end portion of the camera calibration reference plate, etc. The temperature sensor 58 is attached to the

  Each temperature sensor 58 is connected to the controller 100, and the controller 100 (determination means) determines whether the temperature stability of each main part, that is, whether or not the temperature measured in each main part is a stable temperature. ). The stable temperature mentioned here is a temperature at which the image exposure quality in the exposure apparatus 10 is guaranteed, and a high-definition image is obtained by performing image exposure when all the main parts are at a stable temperature. Is accurately exposed. The stable temperature is a temperature having a certain range (± α ° C.) with respect to a predetermined center value (θ ° C.).

  Further, as shown in FIG. 1, the controller 100 includes a display panel 108 as display means and a keyboard 110 as input means. On the display panel 108, the exposure performance level (degree of guaranteed image quality) derived from the determination result of the controller 100 (determination means) is displayed with numbers, characters, symbols, colors, and the like. The keyboard 110 is configured to be able to input instruction content (such as an exposure start instruction) determined by the user according to the displayed exposure performance level.

  The displayed exposure performance level includes at least a waiting time until exposure is possible. The exposure start timing can be measured by the length of the standby time. That is, it is possible to determine whether exposure is performed after reaching a stable temperature at which image exposure quality is guaranteed, or whether exposure is performed without waiting for a stable temperature to increase productivity. Further, the display means for displaying the exposure performance level is not limited to the display panel 108. For example, by flashing a plurality of LEDs (not shown) in order, the exposure performance level is displayed, or exposure is performed with sound or the like. The performance level may be displayed.

  Next, the operation of the exposure apparatus 10 configured as described above will be described. That is, the air conditioning operation (room temperature control operation) of the storage chamber 13, the determination of the temperature stability degree in each main part, and the exposure operation for the photosensitive material 40 will be described.

  First, the air conditioning operation will be described. In the exposure apparatus 10 in a non-operating state in which the power is cut off, the stage 28 provided in the apparatus main body 20 is arranged at the origin position shown in FIGS. In this state, when the operator operates the controller 100 to turn on the power of the exposure apparatus 10, each power supply unit of the apparatus main body 20 is energized to generate heat, and the air in the storage chamber 13 is warmed and gradually rises in temperature. .

  Note that the coil unit 38B, the exposure unit 44, and the alignment unit 60 of the stage raising / lowering stepping motor 36 and the stage moving linear servo motor 38 that are particularly high during the exposure operation are arranged along the scanning direction. The room temperature becomes non-uniform along the scanning direction, and a temperature distribution is easily formed along the scanning direction.

  Further, after the power is turned on, the operator performs an operation for starting the air conditioning operation from the controller 100 or manually, thereby operating the air conditioner 80. The air conditioner 80 purifies the outside air sucked from the air inlet 84 through the HEPA filter 88 in the machine, and adjusts it to a predetermined temperature and humidity to generate cooling air (cold air) for air conditioning. It spouts to 82.

  This cooling air is blown out from the outlet 82B of the duct 82 substantially downward (arrow AR1 in FIG. 3) at a flow rate and flow rate preset by the controller 100, and is supplied to the exposure chamber 15. The cooling air blown downward from the duct 82 is blown in the direction along the scanning direction by the air direction changing plate 90 to change the air blowing direction (arrow AR2 in FIG. 3).

  As the cooling air flows, the surrounding air (hot air) staying in the upper part of the exposure chamber 15 also flows in the direction along the scanning direction (arrows AR3 and AR4 in FIG. 3). Further, in the lower part in the exposure chamber 15, among the cooling air that is blown in the direction along the scanning direction and flows toward the stage 28, the air flow that flows in the center of the stage moving path rises along the air guide plate 96. And is led downward of the exposure unit 44 (arrows AR5 and AR6 in FIG. 3).

  Along with the flowing air, the cooling air is further blown along the scanning direction, passes below the alignment unit 60 and the exposure unit 44 (arrow AR7 in FIG. 3), and is on the photosensitive material placement surface 28A of the stage 28. Is passed (arrow AR8 in FIG. 3) and reaches the rear end of the stage 28, the blowing direction is changed downward along the inner wall surface of the set portion 12B (arrow AR9 in FIG. 3).

  Further, the cooling air blown in the direction along the scanning direction on both sides of the stage moving path in the lower part in the exposure chamber 15 flows into the lower side and both sides of the measuring unit 70 (arrow AR10 in FIG. 3) and scans as it is. When the fluid flows between the surface plate 22 and the base 30 along the direction and both sides of the lifting mechanism 32 and passes through them, the flow direction is changed downward along the inner wall surface of the set portion 12B (arrow AR11 in FIG. 3). ). Then, the downward flow from above the stage 28 and the downward flow from both sides of the lifting mechanism 32 and the lower surface side of the base 30 are merged, pass through the lower surface opening of the set portion 12B, and exhausted to the outside.

  Further, the controller 100 grasps the temperature of the storage chamber 13 from the measured temperature of the temperature sensor 72 provided near the upper portion of the stage 28 in the storage chamber 13, and the temperature sensor 86 provided in the air inlet 84 of the air conditioner 80. The temperature of the apparatus installation environment such as a clean room in which the exposure apparatus 10 is installed and the photosensitive material 40 before exposure is placed is grasped from the temperature of the outside air measured.

  Then, the controller 100 performs temperature adjustment (air conditioning control) of the air supplied to the storage chamber 13 (exposure chamber 15) based on these measured temperatures. Specifically, the air conditioner 80 is controlled so that the temperature of the storage chamber 13 (the temperature near the stage) is substantially the same as the temperature of the apparatus installation environment or within a predetermined temperature difference (for example, ± 0.2 ° C.). In addition, the temperature of the cooling air generated by the air conditioner 80 is adjusted. Accordingly, the room temperature is always kept substantially the same as the temperature of the apparatus installation environment or within a predetermined temperature difference near the upper portion of the storage chamber 13, particularly the stage 28.

  As described above, in the air conditioning operation of the exposure apparatus 10, the cooling air supplied to the exposure chamber 15 is blown in the storage chamber 13 including the exposure chamber 15 in the direction along the scanning direction. The temperature distribution along the line becomes substantially uniform, and the temperature change along the scanning direction hardly occurs. Further, in the exposure chamber 15, the indoor air is circulated by the blowing of the cooling air, and the temperature rise in the entire room is suppressed. Thereby, each heat generating part of the apparatus main body 20 is air-cooled to suppress the temperature rise, and dust floating in the air in the storage chamber 13 is discharged to the outside of the room, and the air cleanliness is kept at a high level in the room. .

  On the other hand, in the component storage chamber 49 of the exposure apparatus 10, the light source unit 50, the power supply unit 74, and the control unit 76 are energized to generate heat after the power is turned on, and the indoor air is warmed and the temperature rises. In the component housing chamber 49, the blower fan 78 is operated to exhaust the indoor high-temperature air to the outside, and the room temperature and the temperature rise of each heat generating component are suppressed. In the component storage chamber 17, each control board 102 is energized to generate heat, and the indoor air is warmed and the temperature rises. However, the blower fan 106 is activated and the indoor high-temperature air is exhausted to the outside. The temperature rise of each heat generating component can be suppressed.

  Further, the temperature of each main part in the storage chamber 13 (exposure chamber 15) is measured by the temperature sensor 58. That is, based on the flowchart shown in FIG. 11, first, in step S1, the temperature near the exposure head 46, the camera 62, the stage 28, the linear encoder 37, and the measurement unit 70 (camera calibration reference plate) is a temperature sensor. 58.

  Then, in step S2, whether or not the measured temperature is a stable temperature is determined by the controller 100 as the determination means (whether or not the temperature in the storage chamber 13 is stable). In step S3, the exposure performance level guaranteed thereby is displayed on the display panel.

  That is, for example, “Since all of the main parts are at a stable temperature, it is possible to perform exposure in a state in which image quality is guaranteed” or “Of the main parts, the exposure head 46, the camera 62, and the stage 28 are Since the temperature is stable, the image quality is not guaranteed, but the exposure is possible. "Or" Preparation stage where exposure is possible. At least the exposure head 46, the camera 62, and the stage 28 are included in the main parts. The display panel 108 displays an exposure performance level at which the content such as “the waiting time until the temperature reaches a stable temperature?

  As described above, since the stable temperature (θ ± α ° C.) is a temperature at which the image exposure quality in the exposure apparatus 10 is guaranteed, image exposure is always performed when each main part is at a stable temperature. However, when exposure is performed in a state where the installation environment of the exposure apparatus 10 is changed, when exposure is performed by driving for the first time of the day, or when exposure is performed by driving for a long time, all the main parts are stable. It may take time to reach temperature.

  If the exposure process is started when some of the main parts are not at a stable temperature, there may be a slight displacement in the exposed image, resulting in a non-guaranteed image exposure quality. If a state (time) for waiting until the temperature reaches a stable temperature is added to a series of processing steps, productivity is lowered. Therefore, although an exposure start instruction can be issued in step S4, subsequent processing is selected depending on the content (exposure performance level) displayed on the display panel 108 in step S5.

  That is, if all the main parts are at a stable temperature (stable state), the exposure process is started in step S6 according to the exposure start instruction in step S4. On the other hand, if even one of the plurality of main parts has not reached the stable temperature (stable state), one of the three modes is selected and executed in step S7. The mode to be executed may be selected by the user inputting in advance from the keyboard 110 after the exposure performance level is displayed in step S3 and before the exposure start instruction in step S4.

  For example, the following three modes (1) to (3) are considered as the three modes. That is, (1) the exposure process is started (forcibly) in accordance with the exposure start instruction in step S4. (2) The exposure processing is automatically started after the stable state (exposure performance guaranteed state) is reached. (3) A display for confirming again whether or not the exposure process may be started is displayed to the user while displaying that it is not in a stable state.

  When the mode (2) is selected, the exposure process is not started unless the temperature reaches a stable temperature, so that the malfunction can be prevented and the exposure process with guaranteed image quality is executed. Further, when the mode (3) is selected, when the exposure is mistakenly started, the instruction can be canceled, so that the malfunction can be similarly prevented. In any case, such a configuration increases the degree of freedom for the user to determine exposure start. That is, since the exposure process can be started even in a state where the temperature is not stable, productivity can be improved when accuracy is not so much required.

  Next, the exposure operation will be described. The exposure operation of the exposure apparatus 10 is performed in a state where the above-described air conditioning operation is being performed. In the exposure operation, first, image data corresponding to the exposure pattern of the photosensitive material 40 is input to the controller 100. Then, the controller 100 temporarily stores the image data in a built-in memory. This image data is data representing the density of each pixel constituting the image by binary values (whether or not dots are recorded).

  Next, the operator opens the opening / closing panel 19 of the setting unit 12B and sets the photosensitive material 40 on the stage 28 of the apparatus main body 20 in order to set the photosensitive material 40 to be exposed in the apparatus installation environment in the exposure apparatus 10. 40 is placed.

  The photosensitive material 40 for image exposure by the exposure apparatus 10 is a photosensitive epoxy on the surface of a printed wiring board, a substrate or a glass plate as a material for forming a pattern (image exposure) such as a liquid crystal display element. Examples include those coated with a photoresist such as a resin, and laminated films in the case of a dry film.

  Here, the photosensitive material 40 may be carried into the apparatus installation environment in a state where dust or the like attached in the manufacturing process cannot be completely removed and is slightly attached. In that case, the operator's hand touches the photosensitive material 40 or a vibration is applied during the setting operation on the stage 28, so that dust falls from the photosensitive material 40 and easily enters the storage chamber 13.

  On the other hand, in this exposure apparatus 10, when the open / close panel 19 is opened, the cooling air blown on the stage 28 along the scanning direction is exhausted to the outside through the opening 18 of the set portion 12B (FIG. 3, the dust falling from the photosensitive material 40 is blown off by the wind pressure, making it difficult to enter the storage chamber 13. Further, even if it enters the storage chamber 13, it is blown away to the rear of the stage 28 before falling onto the stage 28 by the cooling air, and the downward flow generated behind the stage 28 (arrow in FIG. 3). AR9 and AR12) are discharged outside the room.

  The photosensitive material placement surface 28A of the stage 28 is moved up and down by the driving force of the stepping motor 36 controlled and driven by the controller 100 when the lifting mechanism 32 is operated (in the direction of arrow Z in FIG. 1). Accordingly, it is possible to cope with exposure to a plurality of types of photosensitive materials having different thicknesses.

  In addition, the controller 100 performs current-down control on the stepping motor 36 for raising and lowering the stage to reduce the supplied motor driving current by a predetermined amount (for example, about 50%) when the pulse signal that enters the standby state is stopped. Thereby, the heat generation of the stepping motor 36 during standby is suppressed.

  The operator completes the height setting of the photosensitive material placement surface 28A corresponding to the photosensitive material 40 to be exposed by an input operation from the controller 100, and then the photosensitive material placement surface 28A of the stage 28 stopped at the origin position. Then, the photosensitive material 40 is set, the open / close panel 19 is closed, and the controller 100 starts the exposure operation. Then, the controller 100 is controlled to operate the negative pressure supply source, and the photosensitive material 40 is adsorbed and held on the stage 28.

  Subsequently, the linear servo motor 38 is driven and controlled by the controller 100, and the stage 28 holding the photosensitive material 40 starts moving at a constant speed along the guide rail 26 in the alignment measurement direction (arrow YA direction / outward movement direction). To do. As the stage 28 moves, when the photosensitive material 40 passes below the static eliminator 98, it is attached to the photosensitive material 40 by static electricity due to air blow from the static eliminator 98 operated under the control of the controller 100. Dust is removed and the exposed surface is cleaned. Also, dust removed from the photosensitive material 40 by this air blow cleaning is blown off to the rear of the stage by the cooling air blown on the stage 28 along the scanning direction and is discharged outside the room.

  When the stage 28 moves further and the photosensitive material 40 passes below the alignment unit 60, each alignment mark M of the photosensitive material 40 is photographed by each camera 62 controlled by the controller 100, and alignment measurement is performed. Done. In this alignment measurement, each camera 62 photographs each of the alignment marks M passing directly below (on the optical axis of the lens unit 62B) at a predetermined timing, and the photographed image data, that is, the reference of the exposure position is the alignment mark M. The image data including the reference position data indicated by is output to the controller 100.

  The controller 100 determines the alignment mark M determined from the pulse position from the linear encoder 37 and the mark position and the mark pitch in the image determined from the image data (reference position data) of each input alignment mark M. From the position of the stage 28 at the time of shooting and the position of the camera 62, a shift in the mounting position of the photosensitive material 40 on the stage 28, a shift in the tilt of the photosensitive material 40 with respect to the moving direction, and the photosensitive material 40 are calculated. Is obtained, and an appropriate exposure position with respect to the exposed surface of the photosensitive material 40 is calculated.

  Then, at the time of image exposure by the exposure unit 44 to be described later, a control signal generated based on the image data of the exposure pattern stored in the memory is adjusted to the appropriate exposure position to correct exposure position deviation ( Execute alignment). Thus, when the photosensitive material 40 passes below the alignment unit 60, the alignment measurement is completed. As shown in FIG. 10, when the stage 28 reaches the most downstream position in the forward movement direction, the controller 100 detects the linear servo motor 38. To drive in the opposite direction.

  Here, the air conditioning operation described above is continued even when the stage 28 is moving in the alignment measurement direction or at the most downstream portion shown in FIG. On 28, cooling air is always blown along the scanning direction. Therefore, even if the stage 28 moves in this manner, the temperature distribution in the storage chamber 13 along the scanning direction is maintained in a substantially uniform state, and temperature changes along the scanning direction are less likely to occur. Each main part is also maintained at a stable temperature.

  The stage 28 that has reached the most downstream position in the forward movement direction reversely moves by driving the linear servo motor 38 in the reverse direction, and moves along the guide rail 26 in the scanning direction (arrow YB direction / return path movement direction) at a constant speed. Start moving. When the photosensitive material 40 passes under the exposure unit 44 as the stage 28 moves, each exposure of the exposure unit 44 controlled by the controller 100 is performed when the image exposure area on the exposure surface reaches the exposure start position. The head 46 irradiates the exposure beam and starts image exposure on the exposure surface of the photosensitive material 40.

  Here, the controller 100 sequentially reads out the image data stored in the memory for each of a plurality of lines, and generates a control signal for each exposure head 46 based on the image data. This control signal is subjected to the above-described shading adjustment for uniformizing the light amount distribution of the exposure beam, the adjustment of the exposure amount, and the correction of the exposure position deviation with respect to the photosensitive material 40 obtained by the alignment measurement. Then, the DMD of each exposure head 46 is controlled based on the generated and corrected control signal.

  The light source unit 50 controlled by the controller 100 emits a laser beam. When this laser beam is applied to the DMD of each exposure head 46, an exposure beam modulated for each pixel of the DMD is emitted from each exposure head 46. The photosensitive material 40 is irradiated, and the exposure surface of the photosensitive material 40 is exposed in a pixel unit (exposure area) of approximately the same number as the number of used pixels of the DMD. Thus, the photosensitive material 40 moved at a constant speed together with the stage 28 is scanned and exposed by the exposure unit 44, and a strip-shaped exposed region 54 (see FIG. 8) is formed for each exposure head 46.

  Thus, when the photosensitive material 40 passes below the exposure unit 44, the image exposure is completed, and the stage 28 is directly moved downstream in the scanning direction by the driving force of the linear servo motor 38. Then, it returns to the most downstream origin position in the backward movement direction, stops, the negative pressure supply from the negative pressure supply source onto the stage 28 is released, and the exposure operation for the photosensitive material 40 is completed.

  Thereafter, the operator opens the open / close panel 19 of the setting unit 12B, takes out the exposed photosensitive material 40 from the stage 28, and in the case of continuing exposure, a new (unexposed) photosensitive material 40 is placed on the stage. 28, the open / close panel 19 is closed, and the controller 100 starts the exposure operation again. By repeating the procedure of such an exposure operation, a plurality of photosensitive materials 40 can be continuously exposed by the exposure apparatus 10, and thus the exposed photosensitive material 40 is continuously produced.

  As described above, in the exposure apparatus 10 of the present embodiment, the air supplied from the air conditioner 80 through the duct 82 to the accommodation chamber 13 (exposure chamber 15) by the air conditioning operation is along the scanning direction by the wind direction changing plate 90. Therefore, the temperature distribution along the scanning direction in the storage chamber 13 becomes uniform, and the temperature change along the scanning direction hardly occurs. As a result, the photosensitive material 40 reciprocally conveyed in the direction along the scanning direction by the stage 28 is thermally deformed due to the temperature distribution and the temperature change along the scanning direction, thereby suppressing deterioration in accuracy such as deviation in exposure position. It is done. Therefore, highly accurate image exposure can be realized.

  Further, the photosensitive material placement surface 28A of the stage 28 and the photosensitive material 40 placed on the photosensitive material placement surface 28A are cleaned by cooling air blown in the direction along the scanning direction, and dust or the like. Is kept clean without accumulating. As a result, floating or misalignment of the photosensitive material 40 placed on the photosensitive material placement surface 28A, or accumulation of dust or the like on the photosensitive material 40 can be suppressed, and deterioration of exposure accuracy caused by them can be prevented. Can do.

  In particular, here, since the purified cooling air is supplied from the air conditioner 80, the air cleanliness of the storage chamber 13 is improved, and adverse effects on exposure due to dust or the like floating in the storage chamber 13 can be prevented. Further, the cleaned cooling air is blown in a direction along the scanning direction, so that the photosensitive material placement surface 28A of the stage 28, the measurement unit 70, the stage moving path, the exposure unit 44, and the alignment unit 60 are also obtained. Contamination due to dust and the like is more reliably prevented.

  Further, in the present embodiment, the blowing direction of the cooling air blown downward from the duct 82 is changed in the direction along the scanning direction by the wind direction changing plate 90, and thereby, for example, disposed in the storage chamber 13. Even when the installation position and the blowing direction of the duct 82 are restricted due to the relationship with the apparatus component, the air blown from the duct 82 is easily moved in the direction along the scanning direction by the wind direction changing plate 90. It can be changed and blown.

  Further, if the configuration is such that the wind direction changing plate 90 is movable and the inclination angle can be adjusted as in the present embodiment, the air blowing direction can be finely adjusted. Furthermore, in this embodiment, since the cooling air from the air conditioner 80 passes through the front end portion 82A (straight portion) of the duct 82 and is blown out from the blowout port 82B, the flow of air after the blowout port 82B (air blowing) (Direction) is stable, and air can be accurately blown in a desired direction (wind direction changing plate 90 side).

In addition, under the above-described flow velocity (9.4 m / s) and flow rate (10 m ³ / min), the length of the linear portion of the duct 82 is set to 30 cm or more as in the present embodiment, so that An effect is obtained. However, since the flow velocity and flow rate are appropriately set according to the air conditioning conditions, for example, in order to obtain a sufficient effect even when the flow velocity and flow rate are larger than the above values, a linear shape is used. The length (L) of the tip end portion 82A of the duct 82 to be formed is preferably as long as possible.

  In the present embodiment, the air guide plate 96 provided on the upstream side in the flow direction of the cooling air that is blown in the direction along the scanning direction with respect to the photosensitive material placement surface 28A in front of the stage 28. Since more cooling air is introduced onto the mounting surface, the temperature change of the photosensitive material mounting surface 28A and the photosensitive material 40 mounted on the photosensitive material mounting surface 28A is less likely to occur. Temperature stability is increased. Further, since the amount of air blown on the photosensitive material placement surface 28A is increased, the cleaning performance on the photosensitive material placement surface 28A by air blowing is also improved.

  In this embodiment, a plurality of cameras 62 that read the alignment mark M provided on the photosensitive material 40 in order to correct the exposure position with respect to the photosensitive material 40 are attached to the unit base 64 and arranged on the stage moving path. ing. The unit base 64 has a T-shaped cross section and is flat except for the upper part, and has a shape with no protrusions on the lower side.

  Therefore, even if the stage 28 reciprocates below the unit base 64, the cooling air blown in the direction along the scanning direction as shown in part B of FIG. 3 and FIG. The flow (flow state) is not changed by the unit base 64 and becomes substantially constant, and the air cooling state of the unit base 64 and the camera 62 is stabilized.

  Thus, since the unit base 64 has a shape that does not substantially change the flow of air blown in the direction along the scanning direction even when the stage 28 moves, the temperature changes of the unit base 64 and the camera 62 are caused. The temperature is kept constant, and the displacement of the camera 62 caused by this temperature change, that is, the decrease in accuracy of the reading position of the alignment mark M is suppressed. Furthermore, the air-cooled state of the photosensitive material 40 conveyed by the stage 28 and moving relative to the unit base 64 and the camera 62 is also stabilized, and thermal deformation is suppressed.

  Further, both ends of the unit base 64 are supported by a pair of support columns 42, and together with the pair of support columns 42, a gate-like structure is configured on the stage moving path. Below the unit base 64, the pair of struts 42 arranged to face each other functions as a rectifying unit (rectifying means) that rectifies the cooling air blown in the direction along the scanning direction.

  That is, as shown in FIG. 6, the cooling air (arrow AR14) blown in the direction along the scanning direction in the vicinity of the unit base 64 passes between a pair of opposed struts 42, thereby causing turbulence and outward. The spread of diffused flow is suppressed and rectified. Thereby, the flow state of the cooling air passing between the pair of support columns 42 is stabilized, and the temperature change of the unit base 64 and the adverse effect caused by the temperature change are more effectively suppressed.

  In this embodiment, the coil portion 38B of the linear servo motor 38 that drives the stage 28 is attached to the base 30 that supports the stage 28 via the heat insulating bush 39 (see FIG. 7). Even when the high temperature state of the coil portion 38B is continued by continuously moving, the amount of heat conducted from the coil portion 38B to the stage 28 via the base 30 and the lifting mechanism 32 is reduced by the heat insulating bush 39. Thereby, the temperature rise (temperature change) of the stage 28 is suppressed, and thermal deformation of the photosensitive material 40 due to heat conduction from the stage 28 is suppressed.

  Moreover, since this coil part 38B is exposed and attached to the lower surface of the board | substrate 30, even when the stage 28 becomes high temperature by moving continuously, as shown to FIG. 7 (A), a board | substrate is shown. The cooling is efficiently performed by the cooling air (arrow AR15) blown in the direction along the scanning direction on the lower surface side of 30. Thereby, the temperature rise (temperature change) of the coil part 38B and the stage 28 is suppressed, and thermal deformation of the photosensitive material 40 due to heat conduction from the stage 28 is suppressed.

  Further, since the stepping motor 36 that moves up and down the stage 28 is also exposed and attached to the side surface portion of the lifting mechanism 32, the side surface side of the lifting mechanism 32 is moved in the direction along the scanning direction as shown in FIG. It is cooled efficiently by the cooling air blown (arrow AR16). Thereby, the temperature rise (temperature change) of the stepping motor 36 and the stage 28 is suppressed, and thermal deformation of the photosensitive material 40 due to heat conduction from the stage 28 is suppressed.

  In the present embodiment, the temperature in the vicinity of the stage 28 is measured by the temperature sensor 72, and based on the measured temperature, the air conditioner 80 controlled by the controller 100 supplies cooling air to the accommodation chamber 13 (exposure chamber 15). The temperature is adjusted. In this way, by performing the air conditioning of the storage chamber 13 using the measured temperature in the vicinity of the stage, it is possible to control the room temperature in accordance with the temperature of the photosensitive material 40 set on the stage 28 (temperature of the apparatus installation environment) from the outside of the apparatus. Thus, for example, the temperature of the storage chamber 13 (room temperature) can be brought closer to the temperature of the photosensitive material 40. As a result, the amount of thermal deformation of the photosensitive material 40 caused by the temperature difference between the apparatus installation environment and the room temperature after being placed on the stage 28 can be suppressed.

  Further, here, the temperature of the outside air is measured by the temperature sensor 86 provided at the air inlet 84 of the air conditioner 80, thereby grasping the temperature of the apparatus installation environment where the photosensitive material 40 before exposure is placed. Based on the measured temperature and the measured temperature of the storage chamber 13, the adjustment temperature of the air supplied to the storage chamber 13 (exposure chamber 15) by the air conditioner 80 controlled by the controller 100 is changed.

  As described above, even when the temperature of the apparatus installation environment is used for air conditioning of the storage chamber 13, the temperature of the storage chamber 13 in accordance with the temperature of the photosensitive material 40 placed on the stage 28 from the outside of the apparatus (temperature of the apparatus installation environment). The temperature can be controlled, and the apparatus installation environment in the photosensitive material 40 placed on the stage 28 is performed by performing air conditioning that brings the temperature (room temperature) of the storage chamber 13 close to the temperature of the apparatus installation environment as in this embodiment. And the amount of thermal deformation caused by the temperature difference between room temperature and room temperature can be suppressed. In this case, the temperature of the apparatus installation environment, that is, the temperature of the photosensitive material 40 can be grasped through the temperature measurement of the outside air regardless of the room temperature measurement of the storage chamber 13 by the temperature sensor 72 provided in the vicinity of the stage 28. The temperature of the chamber 13 can be quickly controlled.

  In the present embodiment, the light source unit 50, the power supply unit 74, and the control unit 76 that generate heat during operation of the apparatus are accommodated in the component storage chamber 49 that is provided independently of the storage chamber 13, and generate heat during operation of the apparatus. By accommodating the control board 102 in the component housing chamber 17 formed along the wall surface of the cover body 12 independently of the housing chamber 13, the number of heat generating components (heat sources) provided in the housing chamber 13 can be reduced. Can be reduced. Thereby, the temperature change of the storage chamber 13 is suppressed, air conditioning control is facilitated, and the temperature distribution and temperature change that occur along the scanning direction of the photosensitive material 40 are easily suppressed.

  In this embodiment, the temperature around the main part (exposure head 46, camera 62, stage 28, linear encoder 37, measurement unit 70) is measured, and the exposure performance level is determined from the temperature (difference from the stable temperature). Is displayed. Therefore, the user can determine whether or not to start the exposure process based on the displayed exposure performance level. In other words, even if the temperature is not stable (even if the image exposure quality is not guaranteed), the exposure process can be forcibly started. It is possible to prioritize and improve sex.

Schematic perspective view showing exposure apparatus Schematic side view showing the exposure apparatus in a state where the apparatus main body is accommodated in the cover body Schematic side view showing the apparatus main body in a state of being accommodated in the cover body Schematic plan view showing the main body of the exposure apparatus Schematic rear view showing the apparatus body in a state of being accommodated in the cover body Schematic perspective view showing a stage provided in the exposure apparatus main body (A) Schematic plan view showing the stage, (B) Schematic front view showing the stage, (C) Enlarged front view enlarging the vicinity of the coil portion of (B) (A) Schematic plan view showing an exposure pattern exposed by the exposure unit, (B) Schematic plan view showing an array pattern of a plurality of exposure heads provided in the exposure unit Schematic perspective view showing the alignment unit 3 is a schematic side view showing a state in which the stage is disposed at the most downstream position in the forward movement direction in the apparatus main body of FIG. Flowchart for explaining the operation of the present invention

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Exposure apparatus 13 Storage chamber 15 Exposure chamber 20 Apparatus main body 28 Stage (conveyance means)
37 Linear encoder 40 Photosensitive material 44 Exposure unit 46 Exposure head (exposure means)
58 Temperature sensor (temperature measuring means)
60 Alignment Unit 62 Camera 70 Measurement Unit 72 Temperature Sensor 80 Air Conditioner 82 Duct 86 Temperature Sensor 90 Wind Direction Change Plate 96 Wind Guide Plate 98 Static Eliminator 100 Controller (Determination Unit)
108 Display panel (display means)
110 Keyboard (input means)

Claims (5)

Exposure means for scanning and exposing a photosensitive material by irradiating a light beam;
A transport unit that moves relative to the exposure unit and transports the photosensitive material along a scanning direction;
A storage chamber in which the exposure unit and the transport unit are movably stored;
A temperature measuring unit that is provided at a plurality of locations of the storage chamber including at least one of the exposure unit and the transport unit, and measures the temperature of the plurality of locations;
Determination means for determining a temperature stability degree for each of the plurality of locations from the measurement result by the temperature measurement means;
Display means for displaying an exposure performance level derived from the determination result of the determination means;
An exposure apparatus comprising:   The exposure apparatus according to claim 1, further comprising an input unit configured to instruct an exposure start based on an exposure performance level displayed on the display unit.   The exposure apparatus according to claim 1, wherein the exposure performance level includes a time until exposure is possible.   4. The exposure apparatus according to claim 1, wherein the reconfirmation is further performed after an instruction to start exposure according to the exposure performance level.   5. The exposure process according to claim 1, wherein after the exposure start instruction, the exposure process is automatically started after waiting until all the temperatures at the plurality of locations become stable depending on the exposure performance level. The exposure apparatus according to item.

Images