JP2006328134A - Resin composition for direct metal plating and metal-plated ornamental product - Google Patents

Resin composition for direct metal plating and metal-plated ornamental product Download PDF

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JP2006328134A
JP2006328134A JP2005150651A JP2005150651A JP2006328134A JP 2006328134 A JP2006328134 A JP 2006328134A JP 2005150651 A JP2005150651 A JP 2005150651A JP 2005150651 A JP2005150651 A JP 2005150651A JP 2006328134 A JP2006328134 A JP 2006328134A
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rubber
resin
plating
reinforced styrene
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JP4947923B2 (en
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Takayoshi Fujiwara
隆祥 藤原
Tatsuji Toyotaka
立自 豊高
Yasushi Nakajima
靖 中嶋
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Nippon A&L Inc
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a resin composition for direct metal plating excellent in balance between metal plating precipitation and metal plating adhesiveness in an electric copper plating process of PC/ABS-based resins in a direct metal plating method and in resin characteristics such as impact resistance, heat resistance and the like. <P>SOLUTION: The resin composition for direct metal plating comprises 20-80 wt.% polycarbonate resin (A) and 80-20 wt.% rubber-reinforced styrene-based resin (B). In 100 pts.wt. composition, the rubber-reinforced styrene-based resin (B) comprises 20-99 wt.% rubber-reinforced styrene-based resin (b-1) comprising an ethylene-propylene-based rubbery polymer as a constituent ingredient and 1-80 wt.% rubber-reinforced styrene-based resin (b-2) comprising a conjugated diene-based rubbery polymer as a constituent ingredient. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、ポリカーボネート樹脂とゴム強化スチレン系樹脂からなる、ダイレクトめっき用樹脂組成物に関するものである。詳しくは、該ゴム強化スチレン系樹脂として、エチレン−プロピレン系ゴム状重合体を構成成分とするゴム強化スチレン系樹脂、および共役ジエン系ゴム状重合体を構成成分とするゴム強化スチレン系樹脂とを使用してなる、ダイレクトめっき性、とりわけ電気銅めっき工程におけるめっき析出性とめっき密着強度のバランスおよび耐衝撃性、耐熱性などの樹脂性能に優れたダイレクトめっき用樹脂組成物、および該樹脂組成物を成形してなる樹脂成形品にダイレクトめっきを施してなるめっき装飾製品に関するものである。 The present invention relates to a resin composition for direct plating comprising a polycarbonate resin and a rubber-reinforced styrene resin. Specifically, as the rubber-reinforced styrene resin, a rubber-reinforced styrene resin having an ethylene-propylene rubber-like polymer as a constituent component and a rubber-reinforced styrene resin having a conjugated diene rubber-like polymer as a constituent component. Resin composition for direct plating excellent in resin performance such as direct plating properties, particularly the balance between plating deposition properties and plating adhesion strength in the electrolytic copper plating process, impact resistance, and heat resistance, and the resin composition It is related with the plating decoration product formed by giving direct plating to the resin molded product formed by shape | molding.

ポリカーボネート樹脂とABS系樹脂からなる組成物(以下、PC/ABS系樹脂と記す)は、耐衝撃性、耐熱性、成形加工性に優れることから、車輌用部品、家庭電化製品、事務機器部品をはじめとする多様な用途に使用されている。特に、車輌用部品等は大型化の傾向が見られ、形状がより複雑なデザインになる傾向にある。また、車輌重量の軽量化のために、成形品肉厚は薄肉化に設計される方向にあるため、成形加工性、耐衝撃性、および耐熱性などの性能に優れている材料が求められる。その選択肢の一つとしてPC/ABS系樹脂が採用されるケースが見られる。
加えて、これら用途において、意匠的に金属調外観を有し、かつ軽量化を求められる部品にはPC/ABS系樹脂に装飾用のめっきを施して使用する例が多い。従来、PC/ABS系樹脂のめっき処理工程は、一般に脱脂、化学エッチング、中和、触媒付与、活性化、無電解めっき、酸活性、電気めっきなどの工程からなる、いわゆるキャタリスト−アクセレーター法が主流である。しかしながら、この工法で用いられる無電解めっき液において、例えば無電解ニッケルめっき液には、還元剤として次亜リン酸塩を含有しているが、この次亜リン酸塩は環境問題に影響するため、リン規制対応や、高COD廃液であるため排水規制が非常に厳しく、廃水処理のコストが非常に高くなるという問題がある。また、pH調整として用いられているアンモニア臭気による作業環境の悪化も問題となっている。また同様に、無電解銅めっき液には、還元剤としてホルマリンが使用されているが、ホルマリンの使用は、種々の健康上及び環境問題上に悪影響を与える問題が指摘されている。さらに、このめっき液には、銅イオンをアルカリ溶液中に可溶化させるための強力な錯化剤が用いられるため、めっき液の廃水処理において、金属イオン除去のために廃水処理のコストが非常に高くなる等、種々の問題点を抱えている。
A composition comprising a polycarbonate resin and an ABS resin (hereinafter referred to as a PC / ABS resin) has excellent impact resistance, heat resistance, and molding processability. Therefore, it is suitable for vehicle parts, home appliances, and office equipment parts. It is used for various purposes including the beginning. In particular, there is a tendency for vehicle parts and the like to increase in size, and the shape tends to be more complicated. In addition, in order to reduce the weight of the vehicle, the thickness of the molded product tends to be designed to be thinner, so a material having excellent properties such as molding processability, impact resistance, and heat resistance is required. There is a case where PC / ABS resin is adopted as one of the options.
In addition, in these applications, there are many examples in which decorative plating is applied to PC / ABS resins for parts that have a metallic appearance and are required to be lightweight. Conventionally, the plating process of PC / ABS resin generally includes degreasing, chemical etching, neutralization, catalyst application, activation, electroless plating, acid activation, electroplating, and so-called catalyst-accelerator method. Is the mainstream. However, in the electroless plating solution used in this method, for example, the electroless nickel plating solution contains hypophosphite as a reducing agent, but this hypophosphite affects environmental problems. However, there is a problem that wastewater regulation is very strict because of the high COD waste liquid corresponding to phosphorus regulation, and the cost of wastewater treatment becomes very high. In addition, deterioration of the working environment due to ammonia odor used for pH adjustment is also a problem. Similarly, formalin is used as a reducing agent in the electroless copper plating solution. However, the use of formalin has been pointed out to have adverse effects on various health and environmental problems. Furthermore, since this plating solution uses a powerful complexing agent for solubilizing copper ions in an alkaline solution, the cost of wastewater treatment is extremely high for removing metal ions in the wastewater treatment of the plating solution. It has various problems such as high.

これらキャタリスト−アクセレーター法における、健康上、及び地球環境に関わる法規制などへの対応、および安全な作業環境の確保などの要望から、めっき工法改善の一環として、無電解めっき浴を使用しないめっき法(ダイレクトめっき法、ダイレクトプレーティング法等と呼ばれている)が実用化に向けて検討が行われている。例えば、Pd−Snコロイド触媒法が、特開平7−11487号公報(特許文献1)、特開平11−61425号公報(特許文献2)等に開示されている。 In order to meet the health and global environmental laws and regulations and to ensure a safe working environment in these catalyst-accelerator methods, do not use electroless plating baths as part of plating method improvement. Plating methods (called direct plating methods, direct plating methods, etc.) are being studied for practical use. For example, a Pd—Sn colloid catalyst method is disclosed in Japanese Patent Laid-Open Nos. 7-11487 (Patent Document 1), 11-61425 (Patent Document 2), and the like.

従来の樹脂めっき工法で用いられていたPC/ABS系樹脂も、一般的にはこれらダイレクトめっき法に用いられる場合があるが、ダイレクトめっき法の電気銅めっき工程においてPC/ABS系樹脂は成形品表面にめっきが析出し難く、スキップと表現されるめっきの未着部が発生し易いという傾向があり、特に製品形状の複雑な成形品においては、その傾向が極めて高くなるという問題がある。
特開2003−327817号公報(特許文献3)には、粒子径の異なる2種類のゴム状重合体を使用してなるABS系樹脂とPCからなるダイレクトめっき用樹脂組成物が提案されているが、所望の粒子径を有するゴム状重合体をそれぞれ製造する必要があるため製造プロセス上煩雑であり、特に大粒子径のゴム状重合体を製造するために多大な労力を要するという問題があり、まためっき析出性においても十分満足できるものではなかった。
特開平7−11487号公報 特開平11−61425号公報 特開2003−327817号公報
The PC / ABS resin used in the conventional resin plating method is also generally used in these direct plating methods, but the PC / ABS resin is a molded product in the electrolytic copper plating process of the direct plating method. There is a tendency that plating does not easily deposit on the surface, and an unattached portion of plating expressed as skipping tends to occur, and particularly in a molded product having a complicated product shape, there is a problem that the tendency becomes extremely high.
JP-A 2003-327817 (Patent Document 3) proposes a resin composition for direct plating comprising an ABS resin and PC using two types of rubbery polymers having different particle diameters. In addition, since it is necessary to produce rubbery polymers each having a desired particle size, the production process is complicated, and in particular, there is a problem that a great deal of labor is required to produce a rubbery polymer having a large particle size. Further, the plating precipitation was not satisfactory.
JP-A-7-11487 Japanese Patent Laid-Open No. 11-61425 JP 2003-327817 A

本発明の目的は、ダイレクトめっき性、とりわけ電気銅めっき工程におけるめっき析出性とめっき密着強度のバランスおよび耐衝撃性、耐熱性などの樹脂性能に優れたダイレクトめっき用樹脂組成物を提供することにある。 An object of the present invention is to provide a resin composition for direct plating excellent in direct plating properties, particularly a balance between plating deposition properties and plating adhesion strength in an electrolytic copper plating process, and resin performance such as impact resistance and heat resistance. is there.

本発明者らは、上記の課題につき鋭意検討した結果、意外にもPCと特定の2種類のゴム状重合体を構成成分とするゴム強化スチレン系樹脂を使用することのみでこれら性能を満足することができることを見出し、本発明に到達した。
すなわち、本発明は、ポリカーボネート樹脂(A)20〜80重量%およびゴム強化スチレン系樹脂(B)80〜20重量%からなる組成物100重量部において、該ゴム強化スチレン系樹脂(B)が、エチレン−プロピレン系ゴム状重合体を構成成分とするゴム強化スチレン系樹脂(b−1)20〜99重量%および共役ジエン系ゴム状重合体を構成成分とするゴム強化スチレン系樹脂(b−2)1〜80重量%からなるダイレクトめっき用樹脂組成物を提供するものである。
As a result of intensive studies on the above problems, the present inventors unexpectedly satisfy these performances only by using a rubber-reinforced styrene resin containing PC and two specific types of rubbery polymers as constituent components. The present invention has been found.
That is, in the present invention, in 100 parts by weight of a composition comprising 20 to 80% by weight of a polycarbonate resin (A) and 80 to 20% by weight of a rubber-reinforced styrene resin (B), the rubber-reinforced styrene resin (B) 20 to 99% by weight of rubber-reinforced styrene resin (b-1) containing ethylene-propylene rubber-like polymer as a constituent and rubber-reinforced styrene resin (b-2) containing conjugated diene rubber-like polymer as a constituent ) A resin composition for direct plating comprising 1 to 80% by weight is provided.

ダイレクトめっき法におけるPC/ABS系樹脂のとりわけ電気銅めっき工程におけるめっき析出性とめっき密着強度のバランスおよび耐衝撃性、耐熱性など樹脂性能に優れたダイレクトめっき用樹脂組成物が得られるという効果を奏する。 The effect of obtaining a resin composition for direct plating excellent in resin performance such as the balance of plating deposition and plating adhesion strength in the electrolytic copper plating process, impact resistance, heat resistance, etc. of PC / ABS resin in direct plating method. Play.

以下、本発明につき詳細に説明する。
本発明にて用いられるポリカーボネート樹脂(A)とは、種々のジヒドロキシジアリール化合物とホスゲンとを反応させるホスゲン法、又はジヒドロキシジアリール化合物とジフェニルカーボネート等の炭酸エステルとを反応させるエステル交換法によって得られる重合体であり、代表的なものとしては、2,2−ビス(4−ヒドロキシフェニル)プロパン、;“ビスフェノールA”から製造されたポリカーボネート樹脂が挙げられる。
Hereinafter, the present invention will be described in detail.
The polycarbonate resin (A) used in the present invention is a phosgene method in which various dihydroxydiaryl compounds and phosgene are reacted, or a transesterification method obtained by reacting a dihydroxydiaryl compound and a carbonate such as diphenyl carbonate. Typical examples of the coalescence include 2,2-bis (4-hydroxyphenyl) propane; polycarbonate resin produced from “bisphenol A”.

上記ジヒドロキシジアリール化合物としては、ビスフェノールAの他に、ビス(4−ヒドロキシジフェニル)メタン、1,1−ビス(4−ヒドロキシフェニル)エタン、2,2−ビス(4−ヒドロキシフェニル)ブタン、2,2−ビス(4−ヒドロキシフェニル)オクタン、ビスビス(4−ヒドロキシジフェニル)フェニルメタン、2,2−ビス(4−ヒドロキシジフェニル−3−メチルフェニル)プロパン、1,1−ビス(4−ヒドロキシ−3−第3ブチルフェニル)プロパン、2,2−ビス(4−ヒドロキシ−3−ブロモフェニル)プロパン、2,2−ビス(4−ヒドロキシ−3,5ジブロモフェニル)プロパン、2,2−ビス(4−ヒドロキシ−3,5−ジクロロフェニル)プロパンのようなビス(ヒドロキシアリール)アルカン類、1,1−ビス(4−ヒドロキシフェニル)シクロペンタン、1,1−ビス(4−ヒドロキシフェニル)シクロヘキサンのようなビス(ヒドロキシアリール)シクロアルカン類、4,4‘−ジヒドロキシジフェニルエーテル、4,4’−ジヒドロキシ−3,3‘−ジメチルジフェニルエーテルのようなジヒドロキシジアリールエーテル類、4,4’−ジヒドロキシジフェニルスルファイド、4,4‘−ジヒドロキシ−3,3’−ジメチルジフェニルスルファイドのようなジヒドロキシジアリールスルファイド類、4,4‘−ジヒドロキシジフェニルスルホキシドのようなジヒドロキシジアリールスルホキシド類、4,4’−ジヒドロキシジフェニルスルホン、4,4‘−ジヒドロキシ−3,3’−ジメチルジフェニルスルホンのようなジヒドロキシジアリールスルホン類等が挙げられる。 Examples of the dihydroxydiaryl compound include bisphenol A, bis (4-hydroxydiphenyl) methane, 1,1-bis (4-hydroxyphenyl) ethane, 2,2-bis (4-hydroxyphenyl) butane, 2, 2-bis (4-hydroxyphenyl) octane, bisbis (4-hydroxydiphenyl) phenylmethane, 2,2-bis (4-hydroxydiphenyl-3-methylphenyl) propane, 1,1-bis (4-hydroxy-3) -Tert-butylphenyl) propane, 2,2-bis (4-hydroxy-3-bromophenyl) propane, 2,2-bis (4-hydroxy-3,5dibromophenyl) propane, 2,2-bis (4 Bis (hydroxyaryl) alkanes such as -hydroxy-3,5-dichlorophenyl) propane; , 1-bis (4-hydroxyphenyl) cyclopentane, bis (hydroxyaryl) cycloalkanes such as 1,1-bis (4-hydroxyphenyl) cyclohexane, 4,4′-dihydroxydiphenyl ether, 4,4′- Dihydroxy diaryl ethers such as dihydroxy-3,3′-dimethyldiphenyl ether, 4,4′-dihydroxydiphenyl sulfide, dihydroxydiaryl sulfides such as 4,4′-dihydroxy-3,3′-dimethyldiphenyl sulfide Dihydroxy diaryl sulfoxides such as 4,4'-dihydroxydiphenyl sulfoxide, dihydro such as 4,4'-dihydroxydiphenyl sulfone, 4,4'-dihydroxy-3,3'-dimethyldiphenyl sulfone Siji aryl sulfones and the like.

これらは単独または2種類以上混合して使用されるが、これらの他に、ピペラジン、ジピペリジルハイドロキノン、レゾルシン、4,4‘−ジヒドロキシジフェニル類等を混合しても良い。 These may be used alone or in combination of two or more. In addition to these, piperazine, dipiperidyl hydroquinone, resorcin, 4,4′-dihydroxydiphenyls, and the like may be mixed.

さらに、上記のジヒドロキシジアリール化合物と以下に示すような3価以上のフェノール化合物を混合使用しても良い。3価以上のフェノールとしてはフロログルシン、4,6−ジメチル−2,4,6−トリ−(4−ヒドロキシフェニル)−ヘプテン−2,4,6−ジメチル−2,4,6−トリ−(4−ヒドロキシフェニル)−ヘプタン、1,3,5−トリ−(4−ヒドロキシフェニル)−ベンゾール、1,1,1−トリ−(4−ヒドロキシフェニル)−エタン及び2,2−ビス−(4,4’−(4,4’−ヒドロキシジフェニル)シクロヘキシル)−プロパン等が挙げられる。なお、これらポリカーボネート樹脂を製造するに際し、分子量調整剤、触媒等を必要に応じて使用することが出来る。 Further, the above-mentioned dihydroxydiaryl compound and a trivalent or higher valent phenol compound as shown below may be mixed and used. Trihydric or higher phenols include phloroglucin, 4,6-dimethyl-2,4,6-tri- (4-hydroxyphenyl) -heptene-2,4,6-dimethyl-2,4,6-tri- (4 -Hydroxyphenyl) -heptane, 1,3,5-tri- (4-hydroxyphenyl) -benzol, 1,1,1-tri- (4-hydroxyphenyl) -ethane and 2,2-bis- (4 4 '-(4,4'-hydroxydiphenyl) cyclohexyl) -propane and the like. In addition, when manufacturing these polycarbonate resins, a molecular weight regulator, a catalyst, etc. can be used as needed.

本発明にて使用されるゴム強化スチレン系樹脂(B)とは、エチレン−プロピレン系ゴム状重合体を構成成分とするゴム強化スチレン系樹脂(b−1)および共役ジエン系ゴム状重合体を構成成分とするゴム強化スチレン系樹脂(b−2)からなる混合物である。 The rubber-reinforced styrene-based resin (B) used in the present invention is a rubber-reinforced styrene-based resin (b-1) and a conjugated diene-based rubber-like polymer having an ethylene-propylene rubber-like polymer as a constituent component. It is a mixture comprising a rubber-reinforced styrene resin (b-2) as a constituent component.

本発明にて使用されるゴム強化スチレン系樹脂(b−1)を構成するエチレン−プロピレン系ゴム状重合体としては、エチレン−プロピレン系共重合体ゴム、エチリデンノルボルネン、ジシクロペンタジエン、1,4−ヘキサジエンなどの非共役ジエン成分を導入してなるエチレン−プロピレン−非共役ジエン共重合体ゴム等が挙げられる。特にエチレン含有量30〜80重量%、ムーニー粘度(ML1+4 121℃)40〜80のものを使用することが好ましい。 Examples of the ethylene-propylene rubber-like polymer constituting the rubber-reinforced styrene resin (b-1) used in the present invention include ethylene-propylene copolymer rubber, ethylidene norbornene, dicyclopentadiene, 1,4. -Ethylene-propylene-nonconjugated diene copolymer rubber obtained by introducing a nonconjugated diene component such as hexadiene. In particular, it is preferable to use those having an ethylene content of 30 to 80% by weight and a Mooney viscosity (ML1 + 4 121 ° C.) of 40 to 80.

また、本発明にて使用されるゴム強化スチレン系樹脂(b−2)を構成する共役ジエン系ゴム状重合体としては、ポリブタジエン、スチレン−ブタジエン共重合体、アクリロニトリル−ブタジエン共重合体、スチレン−ブタジエンブロック重合体等が挙げられる。特にゴム強化スチレン系樹脂(b−2)中に分散する共役ジエン系ゴム状重合体の重量平均粒子径は、めっき析出性および密着強度のバランス面から、0.1〜0.8μmであることが好ましい。 Examples of the conjugated diene rubbery polymer constituting the rubber-reinforced styrene resin (b-2) used in the present invention include polybutadiene, styrene-butadiene copolymer, acrylonitrile-butadiene copolymer, and styrene- Examples thereof include a butadiene block polymer. In particular, the weight average particle diameter of the conjugated diene rubber-like polymer dispersed in the rubber-reinforced styrene resin (b-2) is 0.1 to 0.8 μm from the balance of plating precipitation and adhesion strength. Is preferred.

上記のゴム強化スチレン系樹脂(b−1)および(b−2)は、それぞれゴム状重合体と芳香族ビニル系化合物および共重合可能な他のビニル系化合物からなるものである。

本発明にて用いられる芳香族ビニル系化合物としては、スチレン、α−メチルスチレン等が挙げられ、単独あるいは混合して使用することができる。
また、共重合可能な他のビニル系化合物としては、アクリロニトリル、メタクリロニトリル等のシアン化ビニル系化合物、メチルメタアクリレート、メチルアクリレート等の(メタ)アクリル酸エステル系化合物、マレイミド、N−フェニルマレイミド等のマレイミド系化合物、アクリル酸、メタクリル酸、イタコン酸、マレイン酸等の不飽和カルボン酸、無水マレイン酸、無水イタコン酸等の不飽和カルボン酸無水物、グリシジルメタクリレート、アリルグリシジルエーテル等の不飽和エポキシ化合物、ヒドロキシエチルアクリレート、ヒドロキシエチルメタクリレート等の水酸基含有不飽和化合物等が例示され、それぞれ1種または2種以上混合して使用することができる。
The rubber-reinforced styrene resins (b-1) and (b-2) are each composed of a rubber-like polymer, an aromatic vinyl compound, and another vinyl compound that can be copolymerized.

Examples of the aromatic vinyl compound used in the present invention include styrene and α-methylstyrene, and these can be used alone or in combination.
Examples of other copolymerizable vinyl compounds include vinyl cyanide compounds such as acrylonitrile and methacrylonitrile, (meth) acrylic acid ester compounds such as methyl methacrylate and methyl acrylate, maleimide, and N-phenylmaleimide. Such as maleimide compounds, unsaturated carboxylic acids such as acrylic acid, methacrylic acid, itaconic acid and maleic acid, unsaturated carboxylic acid anhydrides such as maleic anhydride and itaconic anhydride, and unsaturated such as glycidyl methacrylate and allyl glycidyl ether Examples thereof include hydroxyl group-containing unsaturated compounds such as epoxy compounds, hydroxyethyl acrylate, and hydroxyethyl methacrylate, which can be used alone or in combination of two or more.

ゴム強化スチレン系樹脂(b−1)および(b−2)を構成する各成分の組成割合には特に制限はないが、それぞれゴム状重合体10〜80重量%および芳香族ビニル系化合物20〜100重量%および共重合可能な他の化合物0〜80重量%からなる化合物(合計)90〜20重量%であることが好ましく、特に、ゴム状重合体10〜80重量%および芳香族ビニル系化合物20〜90重量%および共重合可能な他の化合物としてシアン化ビニル系化合物および/または(メタ)アクリル酸エステル系化合物10〜80重量%からなる化合物(合計)90〜20重量%であることが好ましい。   There are no particular restrictions on the composition ratios of the components constituting the rubber-reinforced styrene resins (b-1) and (b-2), but 10 to 80% by weight of the rubber-like polymer and 20 to 20% of the aromatic vinyl compound, respectively. 100% by weight and 90% to 20% by weight of a compound (total) consisting of 0 to 80% by weight of other compounds copolymerizable, particularly 10 to 80% by weight of a rubbery polymer and an aromatic vinyl compound 20 to 90% by weight and a compound (total) of 90 to 20% by weight consisting of 10 to 80% by weight of a vinyl cyanide compound and / or a (meth) acrylic acid ester compound as another copolymerizable compound. preferable.

本発明におけるダイレクトめっき用樹脂組成物は、ポリカーボネート樹脂(A)20〜80重量%およびゴム強化スチレン系樹脂(B)80〜20重量%からなるものであるが、ポリカーボネート樹脂(A)が20重量%未満では耐熱性や耐衝撃性が低下し、また80重量%を超えるとめっき析出性および成形加工性が低下するという面から好ましくない。 The resin composition for direct plating in the present invention comprises 20 to 80% by weight of the polycarbonate resin (A) and 80 to 20% by weight of the rubber-reinforced styrene resin (B), but the polycarbonate resin (A) is 20% by weight. If it is less than%, heat resistance and impact resistance are lowered, and if it exceeds 80% by weight, plating deposition and molding processability are not preferred.

該ゴム強化スチレン系樹脂(B)は、エチレン−プロピレン系ゴム状重合体を構成成分とするゴム強化スチレン系樹脂(b−1)20〜99重量%および共役ジエン系ゴム状重合体を構成成分とするゴム強化スチレン系樹脂(b−2)1〜80重量%からなるものであるが、ゴム強化スチレン系樹脂(b−1)が20重量%未満では、めっき密着強度およびヒートサイクル性が低下し、また、ゴム強化スチレン系樹脂(b−2)が80重量%を超えると、めっき析出性およびスキップ性が低下するため好ましくない。 The rubber-reinforced styrene resin (B) is composed of 20 to 99% by weight of rubber-reinforced styrene resin (b-1) containing ethylene-propylene rubber-like polymer as a constituent and conjugated diene rubber-like polymer as a constituent. The rubber-reinforced styrene-based resin (b-2) is 1 to 80% by weight, but if the rubber-reinforced styrene-based resin (b-1) is less than 20% by weight, the plating adhesion strength and the heat cycle property are lowered. In addition, when the rubber-reinforced styrene resin (b-2) exceeds 80% by weight, the plating deposition property and the skip property are deteriorated, which is not preferable.

なお、本発明においては、必要に応じてスチレン−アクリロニトリル共重合体(AS)、α−メチルスチレン−アクリロニトリル共重合体(αMS−ACN)、メタクリル酸メチル−スチレン共重合体(MS)、メタクリル酸メチルーアクリロニトリル−スチレン共重合体(MAS)、スチレンーN−フェニルマレイミド共重合体(S−NPMI)、スチレン−N−フェニルマレイミド−アクリロニトリル共重合体(S−A−NPMI)等の他のスチレン系共重合体を上記ゴム強化スチレン系樹脂(B)の一部として配合してもよく、さらには酸化防止剤、紫外線吸収剤、光安定剤、帯電防止剤、滑剤、染料、顔料、可塑剤、難燃剤、離型剤等の公知の添加剤や補強材、充填材等を添加することができる。   In the present invention, if necessary, styrene-acrylonitrile copolymer (AS), α-methylstyrene-acrylonitrile copolymer (αMS-ACN), methyl methacrylate-styrene copolymer (MS), methacrylic acid. Other styrenes such as methyl-acrylonitrile-styrene copolymer (MAS), styrene-N-phenylmaleimide copolymer (S-NPMI), styrene-N-phenylmaleimide-acrylonitrile copolymer (SA-NPMI) The copolymer may be blended as a part of the rubber-reinforced styrene resin (B), and further, an antioxidant, an ultraviolet absorber, a light stabilizer, an antistatic agent, a lubricant, a dye, a pigment, a plasticizer, Known additives such as flame retardants and release agents, reinforcing materials, fillers, and the like can be added.

上記にて得られたダイレクトめっき用樹脂組成物は、射出成形、押出成形、圧縮成形、射出圧縮成形、ブロー成形等の公知の成形方法により成形され、得られた樹脂成形品は、ダイレクトめっき法にてめっきが施され、めっき装飾製品として本発明の効果が発現される。
なお、本発明のダイレクトめっき法は、健康上、及び地球環境に関わる法規制などへの対応、および安全な作業環境の確保などに配慮した、無電解めっき工程を用いないめっき法であれば特に制限はない。
The resin composition for direct plating obtained above is molded by a known molding method such as injection molding, extrusion molding, compression molding, injection compression molding, blow molding, etc., and the resin molded product obtained is a direct plating method. The effect of the present invention is expressed as a plated decorative product.
Note that the direct plating method of the present invention is not particularly limited as long as it is a plating method that does not use an electroless plating process in consideration of compliance with laws and regulations relating to health and the global environment, and ensuring a safe working environment. There is no limit.

〔実施例〕
以下に実施例を用いて本発明を具体的に説明するが、本発明はこれらによって何ら制限されるものではない。なお、実施例中にて示す部および%は重量に基づくものである。
〔Example〕
EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited by these. In addition, the part and% which are shown in an Example are based on a weight.

ポリカーボネート樹脂(A):ホスゲンとビスフェノールAからなる粘度平均分子量20,500のポリカーボネート樹脂。 Polycarbonate resin (A): Polycarbonate resin composed of phosgene and bisphenol A and having a viscosity average molecular weight of 20,500.

ゴム強化スチレン系樹脂(B)
ゴム強化スチレン系樹脂(b−1):公知の懸濁重合法により、樹脂中に分散するゴム状重合体としてエチレン−プロピレンゴム30部を含み、スチレン49部およびアクリロニトリル21部からなる共重合体を製造した。
ゴム強化スチレン系樹脂(b−2):公知の乳化重合法により、樹脂中に分散するゴム状重合体としてポリブタジエン(重量平均粒子径0.36μm)30部を含み、スチレン49部およびアクリロニトリル21部からなる共重合体を製造した。
ゴム強化スチレン系樹脂(b−i):公知の乳化重合法により、樹脂中に分散するゴム状重合体としてポリブタジエン(重量平均粒子径0.8μm(肥大化処理))40部を含み、スチレン42部およびアクリロニトリル18部からなる共重合体を製造した。
Rubber reinforced styrene resin (B)
Rubber-reinforced styrene resin (b-1): a copolymer comprising 30 parts of ethylene-propylene rubber as a rubbery polymer dispersed in the resin by a known suspension polymerization method, and comprising 49 parts of styrene and 21 parts of acrylonitrile. Manufactured.
Rubber-reinforced styrene resin (b-2): containing 30 parts of polybutadiene (weight average particle size 0.36 μm) as a rubbery polymer dispersed in the resin by a known emulsion polymerization method, 49 parts of styrene and 21 parts of acrylonitrile A copolymer consisting of
Rubber Reinforced Styrene Resin (bi): Contains 40 parts of polybutadiene (weight average particle diameter 0.8 μm (enlarged treatment)) as a rubbery polymer dispersed in the resin by a known emulsion polymerization method, and styrene 42 And a copolymer consisting of 18 parts of acrylonitrile.

〔実施例1〜4および比較例1〜4〕
上記のポリカーボネート樹脂(A)、およびゴム強化スチレン系樹脂(B)を表1に示す配合割合で混合し、50mm押出機(オーエヌ機械製)を用い、シリンダー温度250〜270℃にて溶融混合しペレット化した。得られたペレットにつき、射出成形機にて各種試験片を作成し、耐衝撃性、耐熱性、成形加工性、めっき密着強度、めっき析出性およびヒートサイクル性を測定した。
[Examples 1-4 and Comparative Examples 1-4]
The polycarbonate resin (A) and the rubber-reinforced styrene resin (B) are mixed at the blending ratio shown in Table 1, and melt mixed at a cylinder temperature of 250 to 270 ° C. using a 50 mm extruder (manufactured by ON Machinery). Pelletized. About the obtained pellet, various test pieces were created with an injection molding machine, and impact resistance, heat resistance, molding processability, plating adhesion strength, plating deposition property, and heat cycle property were measured.

耐衝撃性:ASTM
D−256に準じてノッチ付きアイゾット衝撃試験を測定した。1/4インチ、23℃(単位:J/m)。
Impact resistance: ASTM
A notched Izod impact test was measured according to D-256. 1/4 inch, 23 ° C. (unit: J / m).

耐熱性:ASTM
D−648に準拠。1/4インチ、アニール無し、1.82MPa荷重(単位:℃)。
Heat resistance: ASTM
Conforms to D-648. 1/4 inch, no annealing, 1.82 MPa load (unit: ° C.).

成形加工性:ASTM
D−1238に準じてメルトフローレイトを測定した。測定条件250℃、10kg(単位:g/10min)。
Formability: ASTM
The melt flow rate was measured according to D-1238. Measurement conditions: 250 ° C., 10 kg (unit: g / 10 min).

めっき密着強度:射出成形機にてめっき用平板成形品(55×90×3mm)を成形し、以下の方法にてダイレクトめっきを施した後、析出しためっき膜の密着強度を、JIS H−8630に基づき、めっき成形品の金属膜に基材に達する1cm間隔の切傷を入れ、金属膜を垂直な方向に引き剥がす時の応力(N)で示した。
<めっき処理工程>上記のめっき用平板を40℃のCRPクリーナーに3分間浸し脱脂した。脱脂後の平板を30℃の水で水洗した後、67℃のエッチング液(クロム酸;400g/l、硫酸;200cc/l)に10分間浸しエッチングを行った。エッチング後の平板を30℃の水で2分間水洗した後、25℃のCRPレデューサーに3分間浸し中和処理を行った。中和後の平板を30℃の水で2分間水洗した後、25℃の塩酸に1分間プリディップし、続いて35℃のCRPキャタリストに6分間浸し、Pd−Snコロイド触媒化処理を行った。触媒化後の平板を30℃の水で2分間水洗した後、45℃のCRPセレクターA,Bに3分間浸して導体化処理を行った。導体化処理した平板を30℃の水で2分間水洗した後、CRPカッパーを用いた電気銅めっき浴に25℃で2時間、電流密度3A/dmの電流を通電して、膜厚50μmの電気銅めっき膜を平板に析出させた。電気銅めっき後の平板を30℃の水で水洗した後、電気銅めっきされた平板を80℃で2時間エージングし一晩放置させた。
Plating adhesion strength: After forming a flat plate product for plating (55 × 90 × 3 mm) with an injection molding machine and performing direct plating by the following method, the adhesion strength of the deposited plating film is determined according to JIS H-8630. Based on the above, cuts at intervals of 1 cm reaching the substrate were made in the metal film of the plated product, and the stress (N) when the metal film was peeled off in the vertical direction was shown.
<Plating treatment step> The above plate for plating was immersed in a CRP cleaner at 40 ° C for 3 minutes for degreasing. The degreased flat plate was washed with water at 30 ° C. and then immersed in an etching solution at 67 ° C. (chromic acid: 400 g / l, sulfuric acid: 200 cc / l) for 10 minutes for etching. The etched flat plate was washed with water at 30 ° C. for 2 minutes and then immersed in a CRP reducer at 25 ° C. for 3 minutes for neutralization. The neutralized flat plate is washed with water at 30 ° C. for 2 minutes, pre-dip in hydrochloric acid at 25 ° C. for 1 minute, and then immersed in a CRP catalyst at 35 ° C. for 6 minutes to perform Pd—Sn colloid catalysis treatment. It was. After the catalyzed flat plate was washed with water at 30 ° C. for 2 minutes, it was immersed in 45 ° C. CRP selectors A and B for 3 minutes to conduct a conductor. After the conductor-treated flat plate was washed with water at 30 ° C. for 2 minutes, a current density of 3 A / dm 2 was applied to an electrolytic copper plating bath using a CRP copper at 25 ° C. for 2 hours, and the film thickness was 50 μm. An electrolytic copper plating film was deposited on a flat plate. The plate after electrolytic copper plating was washed with water at 30 ° C., and then the flat plate plated with copper was aged at 80 ° C. for 2 hours and allowed to stand overnight.

めっき析出性:射出成形機にてめっき用平板成形品(55×90×3mm)を成形し、長辺方向9mm毎に短辺方向に幅1mm長さ45mmの切込みを左右交互に入れ波形平板を作成し、以下の方法にてダイレクトめっきを施した後、めっき膜の析出度合いを、波形平板に析出しためっき膜の長さ:波形平板の段数、および、析出過程におけるめっき未着部(スキップ)の発生度合いを目視判定し、以下の判定基準にて判定した。○;スキップなしで良好。△;一部スキップが見られる状態。×;全体的にスキップが見られ不良。
<めっき処理工程>上記のめっき用平板を40℃のCRPクリーナーに3分間浸し脱脂した。脱脂後の平板を30℃の水で水洗した後、67℃のエッチング液(クロム酸;400g/l、硫酸;200cc/l)に10分間浸しエッチングを行った。エッチング後の平板を30℃の水で2分間水洗した後、25℃のCRPレデューサーに3分間浸し中和処理を行った。中和後の平板を30℃の水で2分間水洗した後、25℃の塩酸に1分間プリディップし、続いて35℃のCRPキャタリストに6分間浸し、Pd−Snコロイド触媒化処理を行った。触媒化後の平板を30℃の水で2分間水洗した後、45℃のCRPセレクターA,Bに3分間浸して導体化処理を行った。導体化処理した平板を30℃の水で2分間水洗した後、CRPカッパーを用いた電気銅めっき浴に25℃で5分間、電流密度2A/dmの電流を通電して、電気銅めっき膜を平板に析出させた。
Plating precipitation: A flat plate product for plating (55 × 90 × 3 mm) is formed by an injection molding machine, and a corrugated flat plate is formed by alternately inserting left and right cuts of 1 mm in width and 45 mm in length in the short side direction every 9 mm in the long side direction. After creating and direct plating by the following method, the degree of deposition of the plating film, the length of the plating film deposited on the corrugated flat plate: the number of steps of the corrugated flat plate, and the unplated portion in the deposition process (skip) The degree of occurrence was visually determined and determined according to the following criteria. ○: Good without skipping. Δ: A state where a part of the skip is seen. X: Skip is seen overall and is poor.
<Plating treatment step> The above plate for plating was immersed in a CRP cleaner at 40 ° C for 3 minutes for degreasing. The degreased flat plate was washed with water at 30 ° C. and then immersed in an etching solution at 67 ° C. (chromic acid: 400 g / l, sulfuric acid: 200 cc / l) for 10 minutes for etching. The etched flat plate was washed with water at 30 ° C. for 2 minutes and then immersed in a CRP reducer at 25 ° C. for 3 minutes for neutralization. The neutralized flat plate is washed with water at 30 ° C. for 2 minutes, pre-dip in hydrochloric acid at 25 ° C. for 1 minute, and then immersed in a CRP catalyst at 35 ° C. for 6 minutes to perform Pd—Sn colloid catalysis treatment. It was. After the catalyzed flat plate was washed with water at 30 ° C. for 2 minutes, it was immersed in 45 ° C. CRP selectors A and B for 3 minutes to conduct a conductor. After the conductive plate was washed with water at 30 ° C. for 2 minutes, an electric copper plating film was energized at 25 ° C. for 5 minutes with a current density of 2 A / dm 2 in an electrolytic copper plating bath using a CRP copper. Was deposited on a flat plate.

ヒートサイクル性:射出成形機にてめっき用平板成形品(55×90×3mm)、および額縁型成形品を成形し、以下の方法にてダイレクトめっきを施した後、−30℃(1hr)→23℃(0.5hr)→80℃(1hr)→23℃(0.5hr)の10サイクルを実施し、各めっき成形品外観に膨れ等の異常の有無を目視にて確認した。
<めっき処理工程>上記のめっき用平板を40℃のCRPクリーナーに3分間浸し脱脂した。脱脂後の平板を30℃の水で水洗した後、67℃のエッチング液(クロム酸;400g/l、硫酸;200cc/l)に10分間浸しエッチングを行った。エッチング後の平板を30℃の水で2分間水洗した後、25℃のCRPレデューサーに3分間浸し中和処理を行った。中和後の平板を30℃の水で2分間水洗した後、25℃の塩酸に1分間プリディップし、続いて35℃のCRPキャタリストに6分間浸し、Pd−Snコロイド触媒化処理を行った。触媒化後の平板を30℃の水で2分間水洗した後、45℃のCRPセレクターA,Bに3分間浸して導体化処理を行った。導体化処理した平板を30℃の水で2分間水洗した後、CRPカッパーを用いた電気銅めっき浴に25℃で15分間、電流密度2A/dmの電流を通電して、15μmの電気銅めっき膜を平板に析出させた。続いて一般的な装飾用電気めっき工程にて、半光沢ニッケル膜:6μm、光沢ニッケル膜:4μm、クロムめっき膜:0.1〜0.3μmを析出させた。
Heat cycle property: A flat plate molded product for plating (55 × 90 × 3 mm) and a frame mold molded product are molded by an injection molding machine, and after direct plating is performed by the following method, −30 ° C. (1 hr) → Ten cycles of 23 ° C. (0.5 hr) → 80 ° C. (1 hr) → 23 ° C. (0.5 hr) were carried out, and the presence or absence of abnormalities such as swelling was visually confirmed on the appearance of each plated product.
<Plating treatment step> The above plate for plating was immersed in a CRP cleaner at 40 ° C for 3 minutes for degreasing. The degreased flat plate was washed with water at 30 ° C. and then immersed in an etching solution at 67 ° C. (chromic acid: 400 g / l, sulfuric acid: 200 cc / l) for 10 minutes for etching. The etched flat plate was washed with water at 30 ° C. for 2 minutes and then immersed in a CRP reducer at 25 ° C. for 3 minutes for neutralization. The neutralized flat plate is washed with water at 30 ° C. for 2 minutes, pre-dip in hydrochloric acid at 25 ° C. for 1 minute, and then immersed in a CRP catalyst at 35 ° C. for 6 minutes to perform Pd—Sn colloid catalysis treatment. It was. After the catalyzed flat plate was washed with water at 30 ° C. for 2 minutes, it was immersed in 45 ° C. CRP selectors A and B for 3 minutes to conduct a conductor. After the conductive plate was washed with water at 30 ° C. for 2 minutes, a current density of 2 A / dm 2 was applied to an electrolytic copper plating bath using a CRP copper at 25 ° C. for 15 minutes to obtain 15 μm electrolytic copper. The plating film was deposited on a flat plate. Subsequently, in a general decorative electroplating process, a semi-bright nickel film: 6 μm, a bright nickel film: 4 μm, and a chromium plating film: 0.1 to 0.3 μm were deposited.

これらの測定結果を表1に示す。 These measurement results are shown in Table 1.

Figure 2006328134
Figure 2006328134

本発明における樹脂組成物は、ダイレクトめっき法におけるPC/ABS系樹脂のとりわけ電気銅めっき工程におけるめっき析出性とめっき密着強度のバランスおよび耐衝撃性、耐熱性などの樹脂性能に優れたダイレクトめっき用樹脂組成物であり、該樹脂組成物を成形してなる樹脂成形品にダイレクトめっきを施してなる上記性能を有するめっき装飾製品が得られるものであり、産業上の利用価値が高い。
The resin composition of the present invention is for direct plating excellent in resin performance such as the balance of plating precipitation and plating adhesion strength in the electrolytic copper plating process, impact resistance, heat resistance, etc. of the PC / ABS resin in the direct plating method. It is a resin composition, and a plated decorative product having the above-mentioned performance obtained by direct plating on a resin molded product obtained by molding the resin composition is obtained, and has high industrial utility value.

Claims (4)

ポリカーボネート樹脂(A)20〜80重量%およびゴム強化スチレン系樹脂(B)80〜20重量%からなる組成物100重量部において、該ゴム強化スチレン系樹脂(B)が、エチレン−プロピレン系ゴム状重合体を構成成分とするゴム強化スチレン系樹脂(b−1)20〜99重量%および共役ジエン系ゴム状重合体を構成成分とするゴム強化スチレン系樹脂(b−2)1〜80重量%からなることを特徴とするダイレクトめっき用樹脂組成物。 In 100 parts by weight of a composition comprising 20 to 80% by weight of a polycarbonate resin (A) and 80 to 20% by weight of a rubber reinforced styrene resin (B), the rubber reinforced styrene resin (B) is an ethylene-propylene rubber 20 to 99% by weight of rubber-reinforced styrene resin (b-1) containing a polymer as a constituent and 1 to 80% by weight of rubber-reinforced styrene resin (b-2) containing a conjugated diene rubber-like polymer as a constituent A resin composition for direct plating, comprising: ゴム強化スチレン系樹脂(B)が、ゴム状重合体と芳香族ビニル系化合物および共重合可能な他のビニル系化合物からなるものである請求項1に記載のダイレクトめっき用樹脂組成物。 The resin composition for direct plating according to claim 1, wherein the rubber-reinforced styrene resin (B) is composed of a rubber-like polymer, an aromatic vinyl compound, and another vinyl compound capable of copolymerization. ゴム強化スチレン系樹脂(b−2)中に分散する共役ジエン系ゴム状重合体の重量平均粒子径が0.1〜0.8μmである請求項1〜2何れかに記載のダイレクトめっき用樹脂組成物。 The resin for direct plating according to any one of claims 1 to 2, wherein the conjugated diene rubber-like polymer dispersed in the rubber-reinforced styrene resin (b-2) has a weight average particle diameter of 0.1 to 0.8 µm. Composition. 請求項1〜3何れかに記載の樹脂組成物を成形してなる樹脂成形品にダイレクトめっきを施してなるめっき装飾製品。
A plated decorative product obtained by subjecting a resin molded product obtained by molding the resin composition according to claim 1 to direct plating.
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JP2007177223A (en) * 2005-11-30 2007-07-12 Techno Polymer Co Ltd Resin composition for direct plating, molding and plated molding
JP2013071982A (en) * 2011-09-27 2013-04-22 Techno Polymer Co Ltd Resin composition for metal plating
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JP2007177223A (en) * 2005-11-30 2007-07-12 Techno Polymer Co Ltd Resin composition for direct plating, molding and plated molding
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US20130217817A1 (en) * 2010-08-27 2013-08-22 Techno Polymer Co., Ltd. Contacting part made of thermoplastic resin composition with reduced squeaking noises
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US10227486B2 (en) 2010-08-27 2019-03-12 Techno Polymer Co., Ltd. Contacting part made of thermoplastic resin composition with reduced squeaking noises
JP2013071982A (en) * 2011-09-27 2013-04-22 Techno Polymer Co Ltd Resin composition for metal plating
US9085687B2 (en) 2012-02-03 2015-07-21 Sabic Global Technologies B.V. Polycarbonate blends having improved electroplate adhesion

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