JP2006310802A5 - - Google Patents

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Publication number
JP2006310802A5
JP2006310802A5 JP2006077987A JP2006077987A JP2006310802A5 JP 2006310802 A5 JP2006310802 A5 JP 2006310802A5 JP 2006077987 A JP2006077987 A JP 2006077987A JP 2006077987 A JP2006077987 A JP 2006077987A JP 2006310802 A5 JP2006310802 A5 JP 2006310802A5
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JP
Japan
Prior art keywords
entrance
exit
reflectors
optical element
reflector
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Application number
JP2006077987A
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English (en)
Japanese (ja)
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JP2006310802A (ja
JP5019767B2 (ja
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Priority to JP2006077987A priority Critical patent/JP5019767B2/ja
Priority claimed from JP2006077987A external-priority patent/JP5019767B2/ja
Publication of JP2006310802A publication Critical patent/JP2006310802A/ja
Publication of JP2006310802A5 publication Critical patent/JP2006310802A5/ja
Application granted granted Critical
Publication of JP5019767B2 publication Critical patent/JP5019767B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2006077987A 2005-03-31 2006-03-22 光学素子および光照射装置 Expired - Fee Related JP5019767B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006077987A JP5019767B2 (ja) 2005-03-31 2006-03-22 光学素子および光照射装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005102316 2005-03-31
JP2005102316 2005-03-31
JP2006077987A JP5019767B2 (ja) 2005-03-31 2006-03-22 光学素子および光照射装置

Publications (3)

Publication Number Publication Date
JP2006310802A JP2006310802A (ja) 2006-11-09
JP2006310802A5 true JP2006310802A5 (cg-RX-API-DMAC7.html) 2009-04-30
JP5019767B2 JP5019767B2 (ja) 2012-09-05

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ID=37477264

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006077987A Expired - Fee Related JP5019767B2 (ja) 2005-03-31 2006-03-22 光学素子および光照射装置

Country Status (1)

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JP (1) JP5019767B2 (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2239084A1 (en) * 2009-04-07 2010-10-13 Excico France Method of and apparatus for irradiating a semiconductor material surface by laser energy
JP4834790B1 (ja) * 2011-01-25 2011-12-14 株式会社エタンデュ目白 光照射装置
DE102014219112A1 (de) * 2014-09-23 2016-03-24 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie sowie Hohlwellenleiter-Komponente hierfür

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5848013A (ja) * 1981-09-18 1983-03-19 Toshiba Corp レ−ザ装置
US5224200A (en) * 1991-11-27 1993-06-29 The United States Of America As Represented By The Department Of Energy Coherence delay augmented laser beam homogenizer
JP3793295B2 (ja) * 1996-11-08 2006-07-05 東洋製罐株式会社 易引裂き性包装袋の製造法

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