JP2006302785A5 - - Google Patents

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Publication number
JP2006302785A5
JP2006302785A5 JP2005125806A JP2005125806A JP2006302785A5 JP 2006302785 A5 JP2006302785 A5 JP 2006302785A5 JP 2005125806 A JP2005125806 A JP 2005125806A JP 2005125806 A JP2005125806 A JP 2005125806A JP 2006302785 A5 JP2006302785 A5 JP 2006302785A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005125806A
Other languages
Japanese (ja)
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JP2006302785A (ja
JP4747361B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2005125806A priority Critical patent/JP4747361B2/ja
Priority claimed from JP2005125806A external-priority patent/JP4747361B2/ja
Publication of JP2006302785A publication Critical patent/JP2006302785A/ja
Publication of JP2006302785A5 publication Critical patent/JP2006302785A5/ja
Application granted granted Critical
Publication of JP4747361B2 publication Critical patent/JP4747361B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2005125806A 2005-04-22 2005-04-22 多価イオン照射装置及びそれを用いた微細構造の製造方法 Expired - Fee Related JP4747361B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005125806A JP4747361B2 (ja) 2005-04-22 2005-04-22 多価イオン照射装置及びそれを用いた微細構造の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005125806A JP4747361B2 (ja) 2005-04-22 2005-04-22 多価イオン照射装置及びそれを用いた微細構造の製造方法

Publications (3)

Publication Number Publication Date
JP2006302785A JP2006302785A (ja) 2006-11-02
JP2006302785A5 true JP2006302785A5 (zh) 2008-05-22
JP4747361B2 JP4747361B2 (ja) 2011-08-17

Family

ID=37470823

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005125806A Expired - Fee Related JP4747361B2 (ja) 2005-04-22 2005-04-22 多価イオン照射装置及びそれを用いた微細構造の製造方法

Country Status (1)

Country Link
JP (1) JP4747361B2 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5135503B2 (ja) * 2007-07-03 2013-02-06 独立行政法人情報通信研究機構 多価イオンビーム照射方法及び装置
JP2009248284A (ja) * 2008-04-10 2009-10-29 Japan Science & Technology Agency ナノ構造体の作製方法及びナノ構造体の作製装置
WO2014184881A1 (ja) 2013-05-14 2014-11-20 株式会社日立製作所 試料ホルダ及びそれを備えた集束イオンビーム加工装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2731886B2 (ja) * 1993-04-27 1998-03-25 ▲巌▼ 大泊 シングルイオン注入装置及び方法
JPH08166362A (ja) * 1994-10-14 1996-06-25 Hitachi Ltd 表面解析方法および装置
JPH08213363A (ja) * 1995-02-03 1996-08-20 Hitachi Ltd 表面処理方法および装置
JP3774953B2 (ja) * 1995-10-19 2006-05-17 株式会社日立製作所 走査形電子顕微鏡
JP2001023917A (ja) * 1999-07-06 2001-01-26 Univ Waseda ゆらぎを抑制した半導体装置

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