JP2006283540A - Chemical-solution feeder - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a chemical-solution feeder which can appropriately maintain the concentration of a chemical solution supplied from a chemical-solution container. <P>SOLUTION: The chemical-solution feeder for liquid flowing intermittently is provided with a support 2, a guide member 5, a supply part 4, and an adjustment mechanism. The support 2 supports the chemical-solution container 1, and the guide member 5 guides the chemical solution to the position where it is brought into contact with the liquid. Then the supply part 4 supplies the chemical solution to the guide member 5, and the adjustment mechanism retains and discharges the chemical solution in a shock absorption chamber 6 in accordance with temperature fluctuations. Then the shock absorption chamber 6 is provided with a lower member 20 and a top member 31. The lower member 20 is provided to the support, and the top member 31 is engaged with the lower member from above. Then the lower member 20 of the chemical-solution feeder is provided with a bottom wall and an outer wall 23 extended upward from the bottom wall, and the top member 31 is provided with a top wall 34 and an inner wall 33. The top wall 34 covers the top of the shock absorption chamber 6, and the inner wall 33 hanging down from the top wall is enaged with the inside of the outer wall 23. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a chemical liquid supply apparatus that discharges a chemical liquid by liquid that flows intermittently, for example, a chemical liquid supply apparatus for a cleaning apparatus that is installed in a hand-washing portion on the upper surface of a water storage tank in a flush toilet.

  As this type of chemical solution supply device, for example, a device that is disposed in a hand-washing section above a water storage tank in a flush toilet and supplies chemical liquid into the water storage tank together with water supplied to the hand-washing section has been proposed (Patent Document 1). ). As shown in FIGS. 11 to 15, the chemical solution supply apparatus includes a support 2 that supports the chemical solution container 1, and a chemical solution guide member 5 attached to the support contacts the water flowing into the water storage tank. As shown in FIG. The chemical liquid is supplied to the guide member 5 from the outlet hole 420 at the lower end of the supply section through the supply section 4 extending in the vertical direction. The support 2 is further provided with an adjusting mechanism. This adjustment mechanism prevents the outflow of the chemical solution from the chemical solution container 1 and the reverse flow thereof from the chemical solution container 1 when the temperature of the chemical solution fluctuates due to contact with running water or the like. A buffer chamber 6 supported by the buffer chamber, an air circulation hole 343 provided in the upper portion of the buffer chamber, and a buffer hole 42 provided in the lower portion of the supply unit 4 so as to communicate with the buffer chamber 6. .

This chemical supply device operates as follows. That is, when the temperature rises and the pressure in the chemical solution container 1 rises, the aromatic cleaning agent in the chemical solution container flows out from the buffer hole 42 and flows into the buffer chamber 6. On the other hand, when the temperature decreases and the pressure in the chemical liquid container 1 decreases, the aromatic cleaning agent in the buffer chamber 6 is drawn back into the chemical liquid container 1 through the buffer holes 42. With such a configuration, it is possible to prevent the fragrance cleaning agent from flowing out wastefully even when the temperature change is repeated. In particular, since the temperature change of the drug container occurs both due to the change in room temperature and the contact of running water to the hand-washing part, preventing wasteful discharge of the chemical liquid due to this enables the long-term use of the chemical liquid. is important.
JP-A-2004-300861

  As described above, the chemical solution supply device prevents the excessive outflow of the chemical solution by installing the buffer chamber 6, and as a result, it is possible to lead the chemical solution from the chemical solution container to the guide member in an accurate amount for long-term use. Is realized.

  However, in the conventional chemical solution supply apparatus, the buffer chamber 6 has the following structure, which may cause a problem of inflow of running water. That is, the buffer chamber 6 includes a lower member 20 having a bottom wall 21 and a side wall 23 ′ supported by the support 2, and an upper member 31 having a side wall 33 ′ and an upper wall 34 and fitted to the lower member from above. However, as a structure for fixing the upper member 31 to the support 2, a structure in which hooks 36 ′ and 38 ′ provided on both members are mutually locked outside the buffer chamber has been adopted. . Therefore, the upper member 31 is fitted so that the side wall 33 ′ is located outside the side wall 23 ′ of the lower member 20 so that the hook 36 ′ of the upper member is located outside the buffer chamber.

  However, in the fitting structure by normal plastic molding, it is difficult to make the fitting part completely liquid-tight, and flowing water may intrude through gaps that are inevitably generated. As is well shown in FIG. 15 which is a cross section (seen in the direction of the arrow) along the plane including the center lines L, L of the two air circulation holes 343 in FIG. 12, the side wall of the upper member 31 in the fitting structure. The lower end of 33 ′ is located below the outer wall 23 ′ of the lower member 20. Therefore, the opening located outside the buffer chamber in the gap formed between the two side walls is positioned at the lower part of the buffer chamber. As a result, the flowing water that has entered the support 2 easily reaches the opening of the gap along the bottom surface of the support 2. In this way, the flowing water enters the buffer chamber by capillary action or the like through the gap of the fitting structure. The chemical solution in the buffer chamber 6 is diluted by the flowing water, and the diluted chemical solution is absorbed into the chemical solution container 1 due to a temperature change and diluted to the chemical solution in the chemical solution container. This not only hinders the medicinal effect due to an appropriate amount of the chemical solution, but also reduces the original viscosity depending on the chemical solution, and may excessively flow out from the discharge port of the chemical solution container and impair long-term use.

  An object of the present invention is to solve such a problem of the prior art and to provide a chemical solution supply device capable of maintaining an appropriate concentration of the chemical solution supplied from the chemical solution container.

In order to achieve the above object, the present invention is a chemical liquid supply device for supplying a chemical liquid in a chemical liquid container to a liquid that flows intermittently,
A support for supporting the chemical container;
A guide member that is supported by the support below the chemical solution container and guides the chemical solution from the chemical solution container to a position in contact with the intermittently flowing liquid;
A supply unit for supplying a chemical solution from a chemical solution container to the guide member;
An adjustment mechanism that prevents the chemical liquid from flowing out from the chemical liquid container to the guide member due to temperature fluctuation of the chemical liquid container;
The adjustment mechanism includes a buffer chamber supported by the support, an air circulation hole provided in the upper portion of the buffer chamber, and a buffer hole provided in the lower portion of the supply unit so as to communicate with the buffer chamber. With
The buffer chamber includes a lower member provided on the support, and an upper member fitted to the lower member from above,
The lower member includes a bottom wall and an outer wall extending upward from the bottom wall;
The upper member includes an upper wall that covers an upper portion of the buffer chamber, and an inner wall that hangs down from the upper wall and fits inside the outer wall,
The supply section extends in the vertical direction, the upper part is connectable to the discharge part of the chemical container, and the lower end is in contact with or close to the guide member. .

  ADVANTAGE OF THE INVENTION According to this invention, the chemical | medical solution supply apparatus which has the following effects can be provided. That is, the chemical solution supply apparatus includes a support that supports the chemical solution container, and a guide member that is supported by the support below the chemical solution container and guides the chemical solution from the chemical solution container to a position in contact with the intermittently flowing liquid. A supply unit for supplying the chemical solution from the chemical solution container to the guide member, and an adjustment mechanism for preventing the chemical solution from flowing out from the chemical solution container to the guide member due to temperature fluctuation of the chemical solution container, A buffer chamber supported by the support, an air circulation hole provided in an upper portion of the buffer chamber, and a buffer hole provided in a lower portion of the supply unit so as to communicate with the buffer chamber, The supply part extends in the vertical direction, and the upper part can be coupled to the discharge part of the chemical container, and the lower end is in contact with or close to the guide member.

  Therefore, the chemical solution in the chemical solution container flows into the buffer chamber or returns to the chemical solution container through the buffer hole according to the fluctuation of the ambient temperature, separately from the flow to the guide member. As a result, useless outflow of the chemical solution due to temperature fluctuation can be prevented.

  In particular, the buffer chamber includes a lower member provided on the support and an upper member fitted to the lower member from above, and the lower member is a bottom wall formed by a bottom wall of the support. And an outer wall extending upward from the bottom wall, wherein the upper member includes an upper wall that covers the upper portion of the buffer chamber, and an inner wall that hangs from the upper wall and fits inside the outer wall. It has.

  Therefore, even if a gap is generated in the fitting between the upper member and the lower member of the buffer chamber, the opening outside the buffer chamber in the gap is located above the inner wall (upper member) and the outer wall (lower member). Will be located. As a result, even if the intermittent flow that has flowed into the support body tries to enter the buffer chamber from the lower side through the bottom wall of the support body, it is difficult to reach the opening of the gap and entry is prevented. As a result of preventing the intrusion of the intermittent flow into the buffer chamber, the chemical solution in the buffer chamber is prevented from being diluted and the chemical solution in the chemical solution container from being diluted by the return of the chemical solution, and thus the concentration of the chemical solution supplied from the chemical solution container is prevented. Can be maintained properly and long-term use can be ensured.

  Hereinafter, an embodiment of a chemical solution supply apparatus according to the present invention will be described with reference to the accompanying drawings. In the embodiments shown in the drawings, the same or similar members may be denoted by the same reference numerals and description thereof may be omitted.

  FIG. 1 is a front view (a) and a side view (b) of a chemical liquid supply device arranged in a hand washing part at the upper part of a water storage tank in a flush toilet, and FIG. 2 is an exploded view of the chemical liquid supply device.

  As shown in FIGS. 1 and 2, this chemical solution supply apparatus includes a chemical solution container 1 that stores a chemical solution such as an aromatic cleaning agent, a cup-shaped support 2 that supports the chemical solution container 1, and a support 2. A cover member 3 that is attached and connected to the chemical liquid container 1 and a guide member 5 that is supported by the support 2 below the chemical liquid container and guides the chemical liquid from the chemical liquid container to a position that contacts the intermittently flowing liquid. I have.

  This chemical solution supply apparatus is installed in the hand-washing part A above the water storage tank so that the legs of the support 2 are inserted into the discharge port B of the hand-washing part.

  FIG. 3 is a longitudinal front view of the chemical solution container 1. As shown in the figure, the chemical liquid container 1 includes a pair of adjacent chemical liquid storage portions 11, and a mouth portion 12 for discharging the chemical liquid is formed at the lower end of each chemical liquid storage portion 11. The chemical solution storage unit 11 is partially or entirely made of a transparent or translucent material, and the remaining amount of the chemical solution such as the fragrance cleaning agent can be confirmed from the outside. The mouth portion 12 is closed with a cap (not shown) during distribution and storage after manufacture, and is opened during use.

  FIG. 4 is a plan view (a) and a front sectional view (b) of the cover member 3. As shown in FIG. 4, the cover member 3 has a pair of cylindrical portions 31 joined together by a plate-like joining portion 32 to form a bowl shape in plan view. Each cylindrical portion 31 includes an inner wall 33 and an upper wall 34, the supply unit 4 penetrates the upper wall 34, and the lower end is opened. The upper wall 34 of the cylindrical portion 31 is a lower step wall 341 that surrounds the supply unit 4, and an upper step wall 342 that is higher than the lower step wall 341 outside the pair of cylindrical portions 31 and has a crescent shape in plan view. The upper wall 342 is provided with a plurality of air circulation holes 343 (four in this example). The cylindrical portion 31 constitutes an upper member described later (hereinafter, the upper member is also indicated by 31).

  The supply part 4 is formed integrally as a part of the cover member 3 and extends through the lower step wall 341. The fitting part 4 is integrally formed with the support 2 and extends upward from the bottom wall of the support. Part 42 (described later), and forms a chemical liquid passage through which the chemical liquid passes from the chemical liquid container 1 to the guide member 5.

  The tubular portion 41 includes a connection portion 411 that extends through the lower wall 341 and has an upper end connected to the mouth portion 11 of the chemical liquid container 1 and a small-diameter narrow tube portion 412 that is continuous with the lower end of the connection portion 411. A partition wall 413 surrounding the upper end of the thin tube portion 412 is provided at the lower end of the connection portion 411, and a plurality of buffer holes 414 (three in this example) are formed in the partition wall 413.

  FIG. 5 is a plan view (a) and a front sectional view (b) of the support 2, and FIG. 6 is an exploded perspective view (a) showing the support and the cover member 3, and a combination thereof. It is front sectional drawing (b) shown in a state. As shown in FIG. 5, the support 2 includes a bottom wall 21 and side walls 22. On the bottom wall 21, a bowl-shaped outer wall 23 that fits on the outer surface of the inner wall 33 of the cover member 3 is formed. By fitting the cover member 3 on the outer side wall 23, the buffer chamber 6 is formed between the pair of cylindrical portions 31 and the bottom wall 21 of the support 2 (see FIG. 6B). Thus, the outer wall 23 and the portion of the bottom wall 21 surrounded by the outer wall constitute the lower member 20 that forms the buffer chamber 6. The lower member may be provided integrally with the support 2 as described above, or may be separately formed and connected to the support 2 by bonding, screwing, or the like.

  A plurality of openings 24 are formed in the bottom wall 21 and the side wall 22 at positions outside the upright wall 23 for discharging water from the water storage tank discharge tap into the support body 2 when the water flows into the support body 2. Yes. The openings 24 have a size and a number (one or a plurality) necessary for discharging.

  7 is a diagram showing in detail the fitting of the narrow tube portion 412 of the cover member 3 and the fitting protrusion 42 of the support 2 shown in FIG. 6, and the right thin tube portion 412 and the fitting protrusion in FIG. 42 is shown in the center. Fig.7 (a) is a perspective view which shows the state before a fitting, FIG.7 (b) is a longitudinal cross-sectional view which shows the state after a fitting.

  As shown in FIG. 7, the fitting protrusion 42 extending upward from the bottom wall 21 of the support has a diameter that fits into the inner surface of the lower end of the narrow tube portion 412. Further, a longitudinal groove 421 extending from the upper end to the lower end is formed on the outer surface of the fitting projection 42, and the longitudinal groove 421 forms a lead-out path 421 a between the inner wall surface of the narrow tube portion 412. The cross-sectional shape of the vertical groove 421 may be various cross-sectional shapes such as a semi-circular shape in this example, and a square shape such as a triangle and a quadrangle. The cross-sectional dimension is desirably set to such an extent that the chemical solution can be led out along the lead-out path 421a by capillary action. Furthermore, in this example, an annular portion 43 that fits to the outer surface of the lower end of the narrow tube portion 412 extends upward from the bottom surface of the support 2 in order to securely maintain the fitted state with the narrow tube portion 412.

  Below the lead-out path 421a, a guide member 5 for guiding the lead-out chemical solution is provided. The guide member 5 is formed in a plate shape having a width straddling the pair of lead-out paths 421a, and the upper end portion is in contact with the opening edge of the lower end of each lead-out path 421a and extends downward. A large number of narrow grooves 51 extending in the vertical direction are formed in the planar portions of the front and back surfaces of the guide member 5 in order to spread the chemical solution led out from the lead-out path 421a to the upper portion of the surface (FIG. 1A). reference).

  Also, on the bottom surface of the support 2, two long legs 25 that are spaced from the front and back surfaces of the guide member 5, and four short legs 26 that are arranged around the long legs 25, downward. It is provided to extend. Of these legs 25, 26, the long legs 25 can be inserted into the drainage port B of the hand-washing section, and each short leg 26 is attached to the support 2 in a state where the long legs 25 are inserted into the drainage port B. It is supported almost horizontally on the hand-washing part A. Further, a shielding member 27 extends downward from the bottom surface of the support 2 between the guide member 5 and the long legs. The length of the guide member 5 and the shielding member 27 is shortened in this order with respect to the long leg 25. The long leg 25 positions the support body 2 at the drainage port, and the guide member 5 is used for water flowing down to the drainage port. In contact with each other, the length of each of the shielding members 27 is determined so that the water flowing down does not reach the outlet path 421a.

  As shown in FIG. 6 (b), the chemical solution supply apparatus is configured such that the buffer chamber 6 is formed by fitting the outer wall 23 of the support 2 outside the inner wall 33 of the cover member 3, and then the cover member 3. Assembling is performed by fitting the mouth portion 12 of the chemical liquid container 1 into the connecting portion 411 extending upward.

  The chemical solution supply apparatus configured as described above operates as follows. That is, the chemical solution in the chemical solution container 1 flows into the connecting portion 411 and flows out from the outlet path 421a, and then is guided to the planar portion of the guide member 5. And the chemical | medical solution on the guide member 5 is washed away by the water supplied at the time of flushing, and flows into a water storage tank.

  The buffer chamber 6, the air circulation hole 343 of the cover member 3, and the buffer hole 414 of the supply unit 4 constitute an adjustment mechanism, and buffer the temperature change as follows. For example, when the temperature rises and the chemical solution container 1 is warmed, the air in the container 1 expands and the inside of the container 1 becomes positive pressure. In this case, the chemical solution in the chemical solution container 1 is pushed out and discharged, but since this chemical solution flows into the buffer chamber 6 through the buffer hole 414 in addition to the lead-out path 421a, the chemical liquid flows out excessively into the lead-out path 421a. Is prevented.

  On the other hand, when the temperature of the chemical liquid container 1 is lowered by cooling with running water or the like, and the air in the chemical liquid container 1 contracts to become negative pressure, the buffer chamber in which atmospheric pressure or indoor pressure is applied by the air circulation hole 343. The chemical solution in 6 is sucked into the chemical solution container 1 through the buffer hole 414. Therefore, it is possible to prevent the water on the guide member 5 or the diluted chemical solution from returning to the container 1 side through the narrow tube portion 412. Further, it is possible to prevent the discharge of the chemical liquid from being restricted by the negative pressure in the chemical liquid container 1. Thus, the buffer chamber 6 circulates between the chemical solution container 1 and the buffer chamber 6 even when a pressure change occurs in the chemical solution container 1 due to a temperature change. It is possible to prevent excessive outflow or restriction of outflow.

  The buffer chamber 6 has a structure in which the outer wall 23 of the lower member formed integrally with the support 2 is fitted to the outer side of the inner wall 33 of the upper member. Therefore, even if a gap occurs in the fitting between the upper member and the lower member of the buffer chamber 6, the opening outside the buffer chamber in the gap is between the inner wall 33 (upper member) and the outer wall 23 (lower member). It will be located at the top. As a result, even if the intermittent flow that has flowed into the support body 2 tries to enter the buffer chamber 6 from below through the support bottom wall 21, it is difficult to reach the opening of the gap and the intrusion is prevented. Therefore, dilution of the chemical solution in the buffer chamber 6 and dilution of the chemical solution in the chemical solution container due to the return of the chemical solution are prevented, and the concentration of the chemical solution supplied from the chemical solution container can be maintained appropriately.

  In addition, since the guide member 5 extends downward from a position where it abuts on the lower end of the fitting protrusion 42 of the supply unit 4, the chemical solution led out from the lead-out path 421 a to the guide member 5 runs along the guide member 5. Guided down. Therefore, even if the water flowing at the time of flushing contacts the guide member 5, this water can be prevented from reaching the lead-out path 421 a through the guide member 5, and water is mixed into the chemical solution container 1 to cause the chemical solution. Can be prevented from being diluted.

  In this chemical solution supply apparatus, the chemical solution is normally supplied by a narrow vertical groove 421 provided in the fitting protrusion 42 of the supply unit 4 and an inner surface of the thin tube portion 412 of the tubular portion 41. This is the path 421a. In the lead-out path 421a, even if the lower end opening edge of the vertical groove 421 itself is a semicircular smooth curve, the portion where the opening edge is in contact with the inner wall surface of the supply section is a corner. In this way, a portion of the smooth curved shape at the lower end opening edge is blocked, so that the surface tension of the chemical solution becomes discontinuous at the blocking portion and the uniform dispersion is broken. The chemical solution is smoothly led out from the supply unit. As a result, the chemical solution is smoothly led out from the supply unit.

  Even if the other part of the opening edge has a smooth curved shape, the smooth shape is cut off at the corner.

  In order to smooth the buffering action of the chemical solution inflow / outflow with respect to the temperature change, it is desirable that the buffer hole 414 has a smaller flow resistance than the outlet path 421a. The following principle is considered to work for the derivation of the chemical solution at the normal time and the buffering action at the time of temperature change. Under normal conditions, the chemical solution in the chemical solution container 1 is guided to the guide member 5 through the lead-out path 421a of the tubular portion 41. The negative pressure in the chemical liquid container 1 due to the chemical liquid outflow is compensated by air flowing in from the air circulation hole 343 of the cover member 3. At this time, the chemical liquid almost flows out from the outlet path 421a rather than the buffer hole 414. This is because the capillary action acts on the lead-out path 421a, and the guide member 5 abuts or approaches the guide channel 5 to guide the drug solution to the guide member 5, whereas the buffer hole 414 has no such adjacent member. Therefore, it is considered that the chemical solution derivation action does not work, and the chemical solution flow through the buffer chamber 6 is suppressed by the holding action such as the viscosity of the chemical solution, meniscus formation, the balance between the chemical solution container pressure and the buffer chamber pressure. When the temperature of the chemical liquid container 1 rises and the pressure in the container rises, the positive pressure breaks the holding action in the buffer hole 414, the buffer hole 414 chemical liquid passes through and flows into the buffer chamber 6, and the chemical liquid container When the temperature of 1 decreases and the pressure in the container decreases, the principle that the chemical solution temporarily stored in the buffer chamber 6 is returned to the chemical solution container through the buffer hole 414 due to the negative pressure is considered to work. It is done.

  A plurality of vertical grooves 421 for forming the lead-out path 421a can be provided. In this case, the total opening area of the lead-out path (the sum of the opening areas of all the lead-out paths) is adjusted so that the discharge amount of the chemical solution is appropriate and excessive discharge or discharge amount is prevented. Further, in order to smooth the buffering action against the temperature change, the flow resistance of the buffer hole is preferably smaller than the flow resistance of the lead-out path.

  In this way, the inflow and outflow from the buffer hole for buffering action and the normal outflow from the lead-out path can be maintained stably and in an appropriate amount, and the chemical solution can be discharged accurately. It becomes possible. For this purpose, when an aroma deodorant is used as a chemical solution, the lead-out path is, for example, a sector shape (center angle) with a radius of 0.2 mm to 0.3 mm with respect to a normal chemical solution viscosity (120 to 800 mPa · s). It is desirable that the buffer holes have a circular size (about 1 to 5) having a radius of 0.6 mm to 0.9 mm.

  As described above, the lead-out path 421 a is formed by the vertical groove provided on the outer surface of the fitting protrusion 42 and the inner surface of the narrow tube portion 412. Therefore, a mold for manufacturing is provided with a concave portion corresponding to the fitting protrusion and a vertical protrusion corresponding to the vertical groove 421 on one mold such as an upper and lower mold, and a narrow tube on the other mold. An annular recess corresponding to the portion 412 may be provided. Therefore, there is no need to provide a long and narrow needle-like portion corresponding to the thin lead-out path in the manufacturing mold, and stable manufacturing with a mold that is difficult to cause damage is possible.

  Since the lower end portion of the guide member 5 is inserted into the drain port of the hand-washing unit, the discharged chemical solution is guided along the guide member 5 into the drain port. Regardless of the form of the hand washing part, the running water from the water discharge tap flows into the drain outlet of the hand washing part, so that the chemical solution on the guide member 5 is reliably washed away by the running water. Therefore, the chemical solution supply apparatus according to the present embodiment can be used in various toilets without depending on, for example, the position of the water discharge tap and the form of the hand-washing portion. Further, since the chemical solution on the guide member 5 flows directly into the drain outlet by being washed away with running water, for example, even if the chemical solution contains a component such as a pigment, the hand washing part is soiled by this pigment. Can be prevented.

  FIG. 8 shows an example in which the present invention is applied to the chemical solution supply apparatus shown in FIGS. A difference from the apparatus shown in FIGS. 11 to 15 is a structure centering on each side wall of the lower member 20 and the upper member 31. That is, the lower member 20 has an inner wall 33 located on the inner side, and the upper member 31 has an outer wall 23 located on the outer side. In this example, the upper member 31 further includes a surrounding wall 35 that extends from the upper end of the inner wall 33 beyond the upper end of the outer wall 23 of the lower member 20. The surrounding wall 35 includes an upper wall portion 351 that extends outwardly from the upper wall 34 of the upper member 31 and a side wall portion 352 that hangs down from an end portion of the upper wall portion. As shown in FIG. 8, the side wall portion 352 is separated from the outer surface of the outer wall 23. This is to block the flowing water from above in a wider range, but it can be brought close to or brought into contact with the outer wall 23 according to necessity, and the side wall portion 352 is left leaving the upper wall portion 351. It can be omitted.

  Also in this example, the outer wall 23 of the lower member of the buffer chamber 6 has a structure that fits outside the inner wall 33 of the upper member. Therefore, even if a gap occurs in the fitting between the upper member and the lower member, the opening outside the buffer chamber in the gap is located above the inner wall 33 (upper member) and the outer wall 23 (lower member). Thus, the intermittent flow is prevented from entering the buffer chamber 6 from the lower side along the support bottom wall 21.

  In particular, in this example, the upper member 31 further includes a surrounding wall 35 that extends from the upper end of the inner wall 33 beyond the upper end of the outer wall 23 of the lower member 20. Therefore, even if an intermittent flow enters the support body 2 from above, the enclosure wall 35 prevents the intrusion into the buffer chamber 6. This intrusion prevention effect can be obtained by the surrounding wall 35 only by the upper wall portion 351, but in this example, it is strengthened by including the side wall portion 352.

  As mentioned above, although one Embodiment of this invention was described, this invention is not limited to this, A various change is possible unless it deviates from the meaning. For example, in the above-described example, two chemical solution storage portions of the chemical solution container are provided, and two buffer chambers are provided correspondingly, but one or three or more of these may be provided.

  Further, the guide member 5 does not necessarily have to be in the insertion position into the drain outlet, and may be disposed at other positions that contact the running water, such as a position facing the drain outlet. In the above description, the upper end of the guide member 5 is in contact with the lower end of the fitting protrusion 42, that is, the opening edge of the lower end of the outlet path 421a, but the chemical liquid discharged from the outlet path 421a is on the guide member 5. It is also possible to bring the guide member 5 and the fitting protrusion 42 close to each other to such an extent that they can be transferred to. Further, the guide member 5 can enter the support body 2, and in this case, the guide member 5 and the fitting protrusion 42 abut or are close to each other in the support body 2. If it does in this way, it can prevent more reliably that flowing water flows in into the outlet channel 421a.

  Further, the shape of the guide member 5 is not limited to the plate shape as described above, and may be a rod shape or a cylindrical shape, and the position where the chemical solution contacts the liquid flowing intermittently. Various shapes that can be guided to

  Further, the mode of the narrow groove 51 is not limited to the one extending in the vertical direction, and may be formed to extend obliquely downward, or may be formed in a lattice shape or a dot shape. Alternatively, when the chemical solution is sufficiently spread on the guide member, the narrow groove can be omitted.

  Further, the guide member 5 is configured such that a portion (medical solution receiving portion) in contact with or close to the opening edge at the lower end of the outlet path 421a is made of a non-permeable material, and the other portion is easy to hold a chemical solution such as a porous material. It is also possible to optimize the derived amount and the retained amount of the chemical solution as the material. Moreover, if the desired chemical | medical solution derivation | leading-out amount and holding | maintenance amount can be obtained, the chemical | medical solution receiving part of the guide member 5 can also be comprised with a permeable material.

  Instead of forming the lead-out path using the vertical groove 421 and the narrow tube portion 412 of the fitting projection 42 as in the above-described example, the lead-out path is formed by a through hole provided in the closing portion that closes the lower end portion of the chemical liquid passage. You can also. It can also be formed by a through hole 420a provided in a closing portion 420 that closes the lower end portion of the chemical liquid passage. The lower end opening edge of this through-hole can also have various shapes such as a semicircle, a triangle, and a quadrangle, and it is desirable to have a shape having a corner at at least one place.

  Furthermore, the chemical solution supply apparatus according to the present invention is used in a hand-washing part of a water storage tank of a flush toilet, as well as an in-tank (a type used by hanging in a tank), a rim type (a type attached to the edge of a toilet) It can be used in various applications for supplying a chemical solution in a chemical solution container to an intermittently flowing liquid such as a drainage port of a kitchen or bathroom.

Experiments were conducted using the examples of the present invention and comparative examples according to other specifications as follows.
(1) Common Items For the examples, the apparatus according to the embodiment shown in FIGS. 1 to 7 is used, and for the comparative example, only the fitting structure of the side wall of the lower member 20 and the upper member 31 is different. Was used.
・ Viscosity of chemical solution stored in chemical solution container: 220 mPa · s (viscosity under each test environment)
・ Temperature environment:
Environment S (temperature close to summer): room temperature 25 ° C, temperature of water in contact with chemical supply device 25 ° C
Environment W (temperature close to winter): room temperature 15 ° C, temperature of water in contact with chemical supply device 5 ° C
-Installation of apparatus: The chemical solution supply apparatus was installed on the hand-washing part of TOTO water storage tank S731B.
・ Measurement: Operate the water tank lever every 90 minutes to flush the water in the tank (flush), and measure the remaining amount (weight) of the chemical in the chemical container every time the flush is performed a predetermined number of times (16 times) did.

(2) Specification of Example As for the structure of the side wall of the buffer chamber 6, the lower member 20 is the outside (outside wall 23), and the upper member 31 is the inside (inside wall 33).
(3) Specification of Comparative Example In the structure of the side wall of the buffer chamber 6, the lower member 20 is the inner side (side wall 23 ') and the upper member 31 is the outer side (wall 33').

(4) Results The experimental results are shown in the graphs of FIGS. In each graph, (a) is the result in the environment S, and (b) is the result in the environment W. The vertical axis represents the remaining amount of the chemical solution in the chemical solution container, and the horizontal axis represents the number of flushes.
-FIG. 9: When using the apparatus of the example-FIG. 10: When using the apparatus of the comparative example-Evaluation of the results:
From the above graph, the following is clear. The graph of FIG. 9A of the embodiment apparatus shows 360 flashes in the environment S, and the graph of FIG. 9B shows 350 flashes in the environment W, indicating that the chemical solution in the chemical solution container is almost gone. ing. On the other hand, the graph of FIG. 10A of the comparative example apparatus shows that the chemical solution in the chemical solution container almost disappeared after 500 flashes in the environment S, but the graph of FIG. In W, it decreases rapidly after 300 times and almost disappears after 410 times. The remaining amount of the chemical solution slowly decreases until the 300th flush, but this is because the flowing water that has entered the buffer chamber through the gap between the side walls of the upper member and the lower member is absorbed into the chemical solution container, As a result, the substantial decrease in the chemical solution was suppressed because the chemical was discharged from the outlet path.

  The graph of the comparative example in FIG. 10B means the following. That is, in the environment W (temperature close to winter), the viscosity of the chemical solution was reduced by 300 flashes, and it became easier to pass through the narrow outlet, and the amount of outflow from the chemical solution container increased. This is due to the following action. In the environment W, since the temperature of the flowing water from the water storage tank tap is low and the difference from the outside air temperature is large, the amount of movement of the chemical solution between the buffer chamber and the chemical solution container increases every flush. In the apparatus of the comparative example, the side wall structure of the buffer chamber 6 is such that the lower member 20 is on the inner side (side wall 23 ') and the upper member 31 is on the outer side (wall 33'). Opened at the bottom outside. As a result, the flowing water reaches the opening of the gap along the bottom surface of the support and enters the buffer chamber through the gap. And the chemical | medical solution in a buffer chamber is diluted with the flowing water, The diluted chemical | medical solution is absorbed in a chemical | medical solution container, and is diluted to the chemical | medical solution in a chemical | medical solution container.

  As described above, in the comparative apparatus, not only the proper chemical concentration is not maintained particularly in the low temperature period such as in winter, but long-term use is impaired. On the other hand, in the apparatus according to the embodiment, an appropriate concentration of the chemical solution is maintained regardless of the temperature environment, and long-term use becomes possible.

It is the front view (a) and side view (b) of the chemical | medical solution supply apparatus which concern on one Embodiment of this invention. It is a front view which decomposes | disassembles and shows the chemical | medical solution supply apparatus shown in FIG. It is a vertical front view of the chemical | medical solution storage part of the chemical | medical solution supply apparatus shown in FIG. It is the top view (a) and longitudinal cross-sectional front view (b) of the cover member of the chemical | medical solution supply apparatus shown in FIG. It is the top view (a) and longitudinal cross-sectional front view (b) of the support body of the chemical | medical solution supply apparatus shown in FIG. It is the perspective view (a) which decomposes | disassembles and shows the cover member and support body of the chemical | medical solution supply apparatus shown in FIG. 1, and the vertical front view (b) of a combined state. It is explanatory drawing about the fitting of the thin tube part of the cover member shown in FIG. 6, and the fitting protrusion part of a support body, FIG.7 (a) is a perspective view which shows the state before fitting, FIG.7 (b) is FIG. It is a longitudinal cross-sectional view which shows the state after a fitting. The principal part about other embodiment of this invention is shown, (a) is a front view, (b) is a side view of the left half. It is a graph showing the relationship between the frequency | count of flush about an Example apparatus, and a chemical | medical solution residual amount. It is a graph showing the relationship between the frequency | count of flushing and the chemical | medical solution residual amount about a comparative example apparatus. It is a front view which shows an example of the conventional chemical | medical solution supply apparatus. It is a side view of the conventional apparatus shown in FIG. It is a perspective view which decomposes | disassembles and shows the cover member and support body of the conventional apparatus shown in FIG. It is a vertical front view which shows the combined state of the cover member and support body of the conventional apparatus shown in FIG. FIG. 14 is a cross-sectional view (seen in the direction of the arrow) along a plane including the center lines L and L of the two air circulation holes shown in FIG. 13.

Explanation of symbols

1: Chemical solution container 2: Support body 3: Cover member 4: Supply unit 5: Guide member 6: Buffer chamber (adjustment mechanism)
20: Lower member 31: Cylindrical part (upper member)
23: Outer wall 33: Inner wall 35: Surrounding wall 41: Tubular portion 42: Fitting protrusion 343: Air circulation hole (adjustment mechanism)
421a: Derivation path

Claims (5)

A chemical liquid supply device for supplying chemical liquid in a chemical liquid container to intermittently flowing liquid,
A support for supporting the chemical container;
A guide member that is supported by the support below the chemical solution container and guides the chemical solution from the chemical solution container to a position in contact with the intermittently flowing liquid;
A supply unit for supplying a chemical solution from a chemical solution container to the guide member;
An adjustment mechanism that prevents the chemical liquid from flowing out from the chemical liquid container to the guide member due to temperature fluctuation of the chemical liquid container;
The adjustment mechanism includes a buffer chamber supported by the support, an air circulation hole provided in the upper portion of the buffer chamber, and a buffer hole provided in the lower portion of the supply unit so as to communicate with the buffer chamber. With
The buffer chamber includes a lower member provided on the support, and an upper member fitted to the lower member from above,
The lower member includes a bottom wall and an outer wall extending upward from the bottom wall;
The upper member includes an upper wall that covers an upper portion of the buffer chamber, and an inner wall that hangs down from the upper wall and fits inside the outer wall,
The supply part is characterized in that the supply part extends in the vertical direction, the upper part is connectable to the discharge part of the chemical liquid container, and the lower end is in contact with or close to the guide member. A cover member coupled to the support;
The supply unit passes through the upper wall of the buffer chamber and can be connected to the discharge part of the chemical solution container, and the upper part is connected to the support and has an upper end connected to the upper pipe and a lower end connected to the guide member. Abutting or adjacent lower tube,
The chemical solution supply apparatus according to claim 1, wherein the cover member is configured integrally with an upper member of the buffer chamber and an upper pipe of the supply unit.   The chemical solution supply device according to claim 2, wherein an opening for discharging the intermittent flow that has entered the support body to the outside is provided in a lower portion of the support body.   3. The chemical solution supply apparatus according to claim 1, wherein the upper member further includes a surrounding wall extending from an upper end of the inner wall to an upper end of an outer wall of the lower member.   The chemical solution supply device according to any one of claims 1 to 4, wherein the chemical solution container is positioned so as to cover an upper portion of the upper member so as to prevent contact of the intermittent flow with the upper member.

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