JP2006280736A - Silver substrate biomedical electrode and method of manufacturing the same - Google Patents
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本発明は、医療診断などで屡々使用される心電計、筋電計、脳波計などの機器において、生体から発生する微弱な電気信号例えば電位を検出するための銀基体生体用電極に関する。 The present invention relates to a silver-based biological electrode for detecting a weak electrical signal generated from a living body, such as a potential, in devices such as electrocardiographs, electromyographs, and electroencephalographs often used in medical diagnosis and the like.
現在医療分野で使用されている生体電気信号検出用電極としては、金属洋白からなる再利用可能な電極と、銀粉末と塩化銀粉末をペースト状にした後、導電性電極基体上に印刷により設けてなる使い捨て用電極がある。心電図や脳波図を測定する場合、生体からの電気信号は数ｍＶ程度の極めて微弱なものであり、生体からのかかる微弱な電気信号を検出するためには、電極電位が安定であり且つ電極インピーダンスが小さく、さらに、雑音電圧を発生しないことなどが要求される。具体的には、アメリカ規格協会（ＡＮＳＩ：Ａｍｅｒｉｃａｎ Ｎａｔｉｏｎａｌ Ｓｔａｎｄａｒｄｓ Ｉｎｓｔｉｔｕｔｅ）で制定されている使い捨て用心電図検査用電極の規格（ＡＡＭＩ―ＥＣ１２：Ａｓｓｏｃｉａｔｉｏｎ ｆｏｒ ｔｈｅ Ａｄｖａｎｃｅｍｅｎｔ ｏｆ Ｍｅｄｉｃａｌ Ｉｎｓｔｒｕｍｅｎｔａｔｉｏｎ −ＥＣ１２）では、電極面と電極面との間に電解質ゲル又は電解質クリームを貼り又は塗り電極対とし、一対の電極が、（１）直流１００μＡを１分間印加し、遮断後１分後の電圧値が１００ｍＶ以上のオフセット電圧を示さないこと（ＤＣＯ：Ｄｉｒｅｃｔ Ｃｕｒｒｅｎｔ Ｏｆｆｓｅｔ ｖｏｌｔａｇｅ）、（２）１０Ｈｚ、１００μＡｐ−ｐ（Ａｐ−ｐ：最大電流値−最小電流値）を超えない印加でのインピーダンスの平均値が、２ＫΩを超えないこと（ＡＣＺ：Ａｌｔｅｒｎａｔｉｎｇ Ｃｕｒｒｅｎｔ ｉｍｐｅｄａｎｃｅ、ｉｍｐｅｄａｎｃｅはＺと記す）、（３）一対の電極の分極電圧の絶対値が４回の２００Ｖの充放電のそれぞれの５秒後で１００ｍＶを越えないことが要求されている。これら３項目の特性を満たすためには、電極が可逆性の良い電極反応を示すことが重要であり、可逆性の良い電極反応を示す生体用電極としては、銀―塩化銀電極が最適なものとして知られている。 The bioelectric signal detection electrode currently used in the medical field includes a reusable electrode made of a metal powder, a paste of silver powder and silver chloride powder, and printing on a conductive electrode substrate. There is a disposable electrode provided. When measuring an electrocardiogram or an electroencephalogram, the electrical signal from the living body is extremely weak, about several mV, and in order to detect such a weak electrical signal from the living body, the electrode potential is stable and the electrode impedance Is required to be small and no noise voltage is generated. Specifically, the electrode standard for disposable electrocardiography (AAMI-EC12: Association of the Medical Instrument-EC12), which is established by the American National Standards Institute (ANSI) Electrolyte gel or electrolyte cream is applied to the surface or applied as a pair of electrodes, and the pair of electrodes (1) DC 100 μA is applied for 1 minute, and the voltage value after 1 minute after blocking shows an offset voltage of 100 mV or more. (DCO: Direct Current Offset voltage), (2) 10 Hz, 100 μAp-p (Ap-p: maximum current value−minimum current value). The average value of the impedance does not exceed 2 KΩ (ACZ: Alternating Current impedance, impedance is indicated as Z), (3) 5 seconds each of charging / discharging of 200V with the absolute value of the polarization voltage of the pair of electrodes four times Later it is required not to exceed 100 mV. In order to satisfy the characteristics of these three items, it is important that the electrode exhibits an electrode reaction with good reversibility, and a silver-silver chloride electrode is the most suitable as a biological electrode showing an electrode reaction with good reversibility. Known as.
銀−塩化銀電極の製造方法としては、例えば、（１）銀箔を電気化学的に処理して銀箔上に塩化銀の薄い表面層を形成させる方法（陽極酸化法）、（２）銀粒子及び塩化銀粒子の混合粉を圧縮した後、加熱焼結することによってペレット型電極を形成させる方法（焼結法）、（３）導電性基体上に銀−塩化銀ペーストを印刷又は塗布する方法（ペースト法）などが挙げられる（例えば、特許文献１参照）。 As a method for producing a silver-silver chloride electrode, for example, (1) a method of electrochemically treating silver foil to form a thin surface layer of silver chloride on the silver foil (anodic oxidation method), (2) silver particles and After compressing the mixed powder of silver chloride particles, a method of forming a pellet-type electrode by heating and sintering (sintering method), (3) a method of printing or applying a silver-silver chloride paste on a conductive substrate ( Paste method) (see, for example, Patent Document 1).
しかしながら、上記の如き方法で製造される銀−塩化銀電極は、塩化銀の電気抵抗が極めて高く、塩化銀含有層を厚くすると銀−塩化銀電極のインピーダンスが大きくなるため、塩化銀及び塩化銀と接する回路箇所で生体電気信号の減衰が生じ、生体電気信号の検出感度が低下したりするという欠点がある。一方、銀−塩化銀電極のインピーダンスを低くするために塩化銀含有層を薄くすると、銀−塩化銀電極電位が不安定となり、銀‐塩化銀電極電位の可逆性が悪くなったり、生体電気信号の検出速度が低下するなどの問題が生ずる。
本発明の目的は、生体電気信号の検出感度が高く、検出速度が速く、且つ電極電位の可逆性に優れた生体用電極を提供することである。 An object of the present invention is to provide a biomedical electrode that has high bioelectric signal detection sensitivity, high detection speed, and excellent reversibility of electrode potential.
本発明によれば、少なくとも一面が粗面化されて表面に凹凸を有する銀基体と、該銀基体の該表面の凹底部に担持せしめられた酸化ホウ素と、該銀基体の該表面の凸頭部に担持せしめられた塩化銀を有することを特徴とする銀基体生体用電極が提供される。 According to the present invention, at least one surface is roughened and the surface of the silver substrate has irregularities, boron oxide supported on the concave bottom of the surface of the silver substrate, and the convexity of the surface of the silver substrate. There is provided a silver-based biological electrode characterized by having silver chloride carried on the part.
以下、本発明の銀基体生体用電極についてさらに詳細に説明する。 Hereinafter, the silver-based biomedical electrode of the present invention will be described in more detail.
本発明における電極基体としては、銀又は銀合金から形成されたもの、或いは導電性支持体（金属洋白、ステンレス、導電性樹脂など）又は非導電性支持体（プラスチックなど）上に銀又は銀合金の薄層を設けたものなどを使用することができる。本明細書においては、これらを総称して「銀基体」という。 As the electrode substrate in the present invention, silver or silver formed on silver or a silver alloy, or a conductive support (metal white, stainless steel, conductive resin, etc.) or a non-conductive support (plastic, etc.) The thing provided with the thin layer of the alloy etc. can be used. In the present specification, these are collectively referred to as “silver substrate”.
銀基体の形状は、生体と接し、微弱な生体電気信号を安定的にキャッチすることができるものであれば特に制約はなく、例えば、平板状、湾曲板状、有孔板状、棒状、板網状などの形状であることができる。 The shape of the silver substrate is not particularly limited as long as it can contact a living body and stably catch weak bioelectric signals. For example, a flat plate shape, a curved plate shape, a perforated plate shape, a rod shape, a plate shape It can be a net-like shape.
本発明によれば、上記の銀基体の少なくとも一面を粗面化することにより、表面に微細な凹凸が形成される。銀基体の粗面化は、例えば、次のように行うことができる。 According to the present invention, fine irregularities are formed on the surface by roughening at least one surface of the silver substrate. The roughening of the silver substrate can be performed, for example, as follows.
先ず、銀基体の表面を、常法に従い、例えばアルコールなどによる洗浄によって脱脂した後、過酸化水素濃度及びアンモニア濃度がそれぞれ１〜１０重量％の範囲内にある混合水溶液で処理することにより、銀基体表面の酸化膜などを除去するとともに銀結晶粒界単位の粗面化を行う。この処理は、銀基体の表面状態に応じて常温ないし約４０℃の温度において数秒間ないし数分間行うことができる。なお、粗面化を均一に行うため、必要に応じて、上記アルコールなどによる洗浄後、銀基体を酸化性雰囲気中で、約４００〜約６００℃の温度において、十数分間ないし数時間熱処理してもよい。 First, the surface of the silver substrate is degreased by washing with an alcohol or the like according to a conventional method, and then treated with a mixed aqueous solution having a hydrogen peroxide concentration and an ammonia concentration within the range of 1 to 10% by weight, respectively. The oxide film and the like on the surface of the substrate are removed and the surface of the silver crystal grain boundary is roughened. This treatment can be performed for several seconds to several minutes at a temperature of room temperature to about 40 ° C. depending on the surface state of the silver substrate. In order to uniformly roughen the surface, the silver substrate is heat-treated in an oxidizing atmosphere at a temperature of about 400 to about 600.degree. May be.
銀基体表面の粗面化は、後述する方法で酸化ホウ素が銀基体表面の凹底部に選択的に効率よく析出するようにするため、表面粗さＲａが通常０．５〜１０μｍ、特に２〜５μｍの範囲内となるようにして行うのが好適である。該表面粗さＲａが０．５μｍ未満では、銀基体表面全体に酸化ホウ素が析出し、他方、該表面粗さＲａが１０μｍを超えると、電気を流すための酸化ホウ素が銀基体表面近くに存在する確率が少なくなり、いずれにしても、電極対特性が低下し、生体電気信号の検出感度が低下する可能性がある。 The surface of the silver substrate is roughened so that boron oxide is selectively and efficiently deposited on the concave bottom of the surface of the silver substrate by the method described later, and the surface roughness Ra is usually 0.5 to 10 μm, particularly 2 It is preferable to carry out in a range of ˜5 μm. Is less than the surface roughness R a is 0.5 [mu] m, boron oxide on the entire silver substrate surface is deposited, on the other hand, when the surface roughness R a of more than 10 [mu] m, boron oxide silver substrate surface near to electrify In any case, there is a possibility that the electrode pair characteristics are lowered and the detection sensitivity of the bioelectric signal is lowered.
なお、本明細書で用いる表面粗さＲｍａｘ、Ｒａ及びＲｚは、ＪＩＳ Ｂ０６０１−１９９４に従うものである。 Note that the surface roughnesses R max , R a and R z used in this specification are in accordance with JIS B0601-1994.
上記の如くして表面が粗面化されて表面に微細な凹凸が形成された銀基体の粗面化された表面に、次いで、ホウ素含有化合物の溶液が塗布される。該ホウ素含有化合物としては、酸素含有雰囲気中での加熱により分解して酸化ホウ素を生成し且つ酸化ホウ素以外に固体の分解生成物を実質的に形成しないものが好ましく、具体的には、例えば、ホウ酸、ホウ酸アンモニウムなどが挙げられ、中でも、ホウ酸が好適である。これらのホウ素含有化合物を溶解するための溶媒としては、銀基体表面に対して不活性なものであれば特に制限はなく、例えば、メタノール、エタノール、プロパノール、イソプロパノール、ブタノールなどのアルコール、水などを使用することができ、中でも、アルコールが好適である。 Next, a boron-containing compound solution is applied to the roughened surface of the silver substrate having a roughened surface and fine irregularities formed on the surface as described above. The boron-containing compound is preferably one that decomposes by heating in an oxygen-containing atmosphere to form boron oxide and does not substantially form a solid decomposition product other than boron oxide. Specifically, for example, Examples thereof include boric acid and ammonium borate. Among them, boric acid is preferable. The solvent for dissolving these boron-containing compounds is not particularly limited as long as it is inert to the surface of the silver substrate. For example, alcohol such as methanol, ethanol, propanol, isopropanol, butanol, water, etc. Among them, alcohol is preferable.
塗布溶液中における上記ホウ素含有化合物の濃度は、ホウ素換算で、通常２〜１４ｇ／ｌ、特に５〜１１ｇ／ｌの範囲内が適当である。 The concentration of the boron-containing compound in the coating solution is usually 2 to 14 g / l, particularly 5 to 11 g / l in terms of boron.
ホウ素含有化合物の溶液の銀基体の粗面化表面への塗布は、例えば、ハケ塗り、ロール塗り、スプレー、浸漬などの方法で行うことができ、塗布後、適宜加熱して溶媒を除去する（以下、乾燥という）。ホウ素含有化合物の塗布量は、ホウ素換算で、通常０．０１〜０．１０ｍｇ／ｃｍ２、特に０．０２〜０．０５ｍｇ／ｃｍ２の範囲内が好適である。 Application of the boron-containing compound solution to the roughened surface of the silver substrate can be performed, for example, by brushing, roll coating, spraying, dipping, or the like. After coating, the solvent is removed by heating as appropriate ( Hereinafter referred to as drying). The coating amount of the boron-containing compound is preferably 0.01 to 0.10 mg / cm 2 , particularly preferably 0.02 to 0.05 mg / cm 2 in terms of boron.
１回の塗布で上記の塗布量に達しない場合には、上記の塗布操作を繰り返し行うことができる。また、塗布に際して、銀基体表面に付着している余分な溶液は、例えば、ドクターブレード、スキージーなどで除去することができる。 When the above application amount is not reached by one application, the above application operation can be repeated. Further, at the time of application, an excessive solution adhering to the surface of the silver substrate can be removed by, for example, a doctor blade or a squeegee.
ホウ素含有化合物の溶液を塗布し乾燥した銀基体は、酸素含有雰囲気中、例えば空気中で熱処理することにより、ホウ素含有化合物を酸化ホウ素に転換させる。熱処理温度は、用いるホウ素含有化合物の種類などにもよるが、一般には、２５０〜６００℃、特に３５０〜５００℃の範囲内が適しており、加熱処理は銀基体上のホウ素含有化合物の実質的に全てが酸化ホウ素に転換されるまで、通常、５〜６０分間行うことができる。 The silver substrate coated with the boron-containing compound solution and dried is heat-treated in an oxygen-containing atmosphere, for example, in air, thereby converting the boron-containing compound into boron oxide. Although the heat treatment temperature depends on the type of boron-containing compound used, etc., in general, it is suitable within the range of 250 to 600 ° C., particularly 350 to 500 ° C., and the heat treatment is substantially performed for the boron-containing compound on the silver substrate. In general, it can be carried out for 5 to 60 minutes until everything is converted into boron oxide.
かくして、表面が粗面化された銀基体表面の凹底部に酸化ホウ素が固着担持された銀基体が得られる。 Thus, a silver substrate in which boron oxide is fixedly supported on the concave bottom of the surface of the silver substrate having a roughened surface is obtained.
次いで、該銀基体を塩素イオンを含む水溶液中に浸漬し、銀基体を陽極（アノード）として電気分解を行うことにより銀基体を陽極酸化し、銀基体表面の酸化ホウ素が存在しない部分、すなわち、銀が露出している凸頭部に塩化銀を生成させる。 Next, the silver substrate is immersed in an aqueous solution containing chlorine ions, and the silver substrate is anodized by electrolysis using the silver substrate as an anode (anode). Silver chloride is generated on the convex head where silver is exposed.
上記の塩素イオンを含む水溶液は、水に可溶性の塩素含有化合物を水に溶解することによって調製することができ、該塩素含有化合物としては、例えば、塩酸、塩化ナトリウム、塩化カリウム、塩化リチウムなどが挙げられる。該水溶液中の塩素イオンの濃度は、特に制限されないが、通常、２０ｇ／ｌないし飽和、特に１００ｇ／ｌないし飽和の範囲内が適当である。 The aqueous solution containing chlorine ions can be prepared by dissolving a water-soluble chlorine-containing compound in water. Examples of the chlorine-containing compound include hydrochloric acid, sodium chloride, potassium chloride, lithium chloride, and the like. Can be mentioned. The concentration of chloride ions in the aqueous solution is not particularly limited, but is usually within the range of 20 g / l to saturation, particularly 100 g / l to saturation.
上記の電気分解は、通常、電流密度：０．５〜４．０ｍＡ／ｃｍ２、好ましくは、１．０〜３．０ｍＡ／ｃｍ２の範囲内、槽温度：２０〜８０℃、好ましくは３０〜６０℃の範囲内の条件下で行うことができ、これによって、銀基体表面に、塩化銀を通常０．２〜７．２ｍｇ／ｃｍ２、特に１．４〜４．２ｍｇ／ｃｍ２の範囲内の量で析出せしめることができる。 The above electrolysis is usually performed at a current density of 0.5 to 4.0 mA / cm 2 , preferably 1.0 to 3.0 mA / cm 2 , and a bath temperature of 20 to 80 ° C., preferably 30. Can be carried out under conditions in the range of ˜60 ° C., whereby silver chloride is usually 0.2-7.2 mg / cm 2 , especially 1.4-4.2 mg / cm 2 on the surface of the silver substrate. It can be deposited in an amount within the range.
析出せしめた塩化銀は、場合により、酸素含有雰囲気中、例えば空気中で、２５０〜６００℃、特に３５０〜４５０℃の範囲内の温度で１０〜６０分間程度熱処理することにより、塩化銀を安定化させることができる。 In some cases, the precipitated silver chloride is stabilized by subjecting the silver chloride to heat treatment for about 10 to 60 minutes at a temperature in the range of 250 to 600 ° C., particularly 350 to 450 ° C. in an oxygen-containing atmosphere, for example, air. It can be made.
かくして、表面に凹凸を有する銀基体の該表面の凹底部に酸化ホウ素が担持され且つ凸頭部に塩化銀が担持された銀基体生体用電極が得られる。該電極における銀基体上に担持された酸化ホウ素と塩化銀の相対的割合は、厳密に制限されるものではなく広い範囲にわたって変えることができるが、一般には、酸化ホウ素：２〜６７ｍｏｌ％、特に４〜３３ｍｏｌ％及び塩化銀：３３〜９８ｍｏｌ％、特に６７〜９６ｍｏｌ％の範囲内が好適である。 Thus, a silver-based biomedical electrode is obtained in which boron oxide is supported on the concave bottom of the surface of the silver substrate having irregularities on the surface and silver chloride is supported on the convex head. The relative proportion of boron oxide and silver chloride supported on the silver substrate in the electrode is not strictly limited and can vary over a wide range, but generally boron oxide: 2-67 mol%, especially The range of 4 to 33 mol% and silver chloride: 33 to 98 mol%, particularly 67 to 96 mol% is preferable.
さらに、必要に応じて、上記の如くして作製された該電極を、例えば、硫黄イオンを含む水溶液中に浸漬することにより、電極上の酸化ホウ素又は塩化銀が担持されていない銀表面に、導電性の硫化銀を形成せしめることができ、これによって、該電極表面に部分的に露出していることがある銀基体表面を保護することができる。 Furthermore, if necessary, the electrode prepared as described above is immersed in an aqueous solution containing sulfur ions, for example, on the silver surface on which no boron oxide or silver chloride is supported on the electrode. Conductive silver sulfide can be formed, thereby protecting the surface of the silver substrate that may be partially exposed on the electrode surface.
上記の硫黄イオンを含む溶液は、水に可溶性の硫黄含有化合物を水に溶解することによって調製することができ、該硫黄含有水溶液としては、例えば、硫化水素、硫化ナトリウム、硫化カリウム、硫化アンモニウムなどが挙げられる。該水溶液中の硫黄イオンの濃度は、特に制限されないが、通常、０．２〜０．８ｇ／ｌ、特に０．３〜０．６ｇ／ｌの範囲内が適当である。これによって、該電極表面に部分的に露出していることがある銀基体上に、硫化銀を通常０．０１〜０．１ｍｇ／ｃｍ２、特に０．０３〜０．０９ｍｇ／ｃｍ２の範囲内の量で析出せしめることができる。 The solution containing sulfur ions can be prepared by dissolving a water-soluble sulfur-containing compound in water. Examples of the sulfur-containing aqueous solution include hydrogen sulfide, sodium sulfide, potassium sulfide, and ammonium sulfide. Is mentioned. The concentration of sulfur ions in the aqueous solution is not particularly limited, but is usually within the range of 0.2 to 0.8 g / l, particularly 0.3 to 0.6 g / l. Thus, on the silver substrate that is being partially exposed on the electrode surface, usually 0.01 to 0.1 mg / cm 2 of silver sulfide, particularly from 0.03 to 0.09 / cm 2 It can be deposited in the amount within.
本発明により提供される生体用電極は、生体電気信号の検出感度及び電極電位の可逆性に優れ、しかも検出速度が速く、医療診断分野において使用される心電計、筋電計、脳波計などの機器の生体用電極として極めて有用である。 The biomedical electrode provided by the present invention is excellent in the detection sensitivity of bioelectric signals and the reversibility of the electrode potential, and has a high detection speed. It is extremely useful as a biomedical electrode for these devices.
以下、実施例により本発明を更に具体的に説明する。 Hereinafter, the present invention will be described more specifically with reference to examples.
実施例１：
エタノールで脱脂した銀板（ｔ０．５ｍｍ×ｗ１０ｍｍ×Ｌ２０ｍｍ）を大気中５００℃で１時間熱処理をした後、過酸化水素１重量％及びアンモニア１０重量％を含有する２５℃の混合水溶液に３０秒間浸漬することにより、銀基体表面の酸化膜などを除去するとともに銀結晶粒界単位の粗面化を行い、表面の粗さがＲｍａｘ５μｍ、Ｒａ３μｍ、Ｒｚ３μｍの凹凸を有する銀基体Ａを得た。
Example 1:
A silver plate degreased with ethanol ( t 0.5 mm × w 10 mm × L 20 mm) was heat treated in the atmosphere at 500 ° C. for 1 hour, and then mixed at 25 ° C. containing 1% by weight of hydrogen peroxide and 10% by weight of ammonia. For 30 seconds, the oxide film on the surface of the silver substrate is removed and the grain boundaries of the silver crystal grain boundaries are roughened, and irregularities having a surface roughness of R max 5 μm, R a 3 μm, and R z 3 μm are formed. A silver substrate A having was obtained.
ホウ酸粉末（高純度化学社製）をエタノールに溶かし、ホウ酸濃度がホウ素換算で８．７ｇ／ｌの溶液を得た。 Boric acid powder (manufactured by Koyo Chemical Co., Ltd.) was dissolved in ethanol to obtain a solution having a boric acid concentration of 8.7 g / l in terms of boron.
銀基体Ａの片面に上記ホウ酸溶液を、マイクロピペットで１ｃｍ２当たり４．０μｌ秤量し塗布した後、乾燥し、大気中、４００℃で１０分間熱処理を施し、ホウ素換算で０．０４ｍｇ／ｃｍ２の酸化ホウ素を銀表面の凹部に形成させた。 The boric acid solution was applied to one side of the silver substrate A by weighing 4.0 μl per 1 cm 2 with a micropipette, dried, and then heat treated at 400 ° C. for 10 minutes in the air, and 0.04 mg / cm in terms of boron. Two boron oxides were formed in the recesses on the silver surface.
次いで、４０℃の飽和食塩水中、白金カソード（ｔ０．５ｍｍ×ｗ１０ｍｍ×Ｌ２０ｍｍ）、極間距離３５ｍｍ、電流密度２．０ｍＡ／ｃｍ２の一定電流で１０分間陽極酸化し、銀表面凸部に塩化銀１．７８ｍｇ／ｃｍ２を形成させた後、酸化性雰囲気中４００℃で３０分間熱処理を施し、銀基体Ａの銀表面の凹部の溝に酸化ホウ素が形成され且つ該銀表面の凸部の頭部に塩化銀が形成された実施例電極１を作製した。 Next, in a saturated saline solution at 40 ° C., a platinum cathode ( t 0.5 mm × w 10 mm × L 20 mm), a distance between electrodes of 35 mm, and a current density of 2.0 mA / cm 2 are anodized for 10 minutes, and the silver surface is convex. After forming 1.78 mg / cm 2 of silver chloride on the part, heat treatment was performed at 400 ° C. for 30 minutes in an oxidizing atmosphere, so that boron oxide was formed in the groove of the concave part of the silver surface of the silver substrate A and the silver surface Example electrode 1 in which silver chloride was formed on the head of the convex part was produced.
実施例２：
実施例１で作製した実施例電極１を、０．１％硫化ナトリウム水溶液に３０秒間浸漬し、該電極表面の銀が露出している部分に硫化銀０．０４ｍｇ／ｃｍ２を形成させて、銀基体Ａの凹部の溝に酸化ホウ素が形成され、該銀層の凸部の頭部に塩化銀が形成され且つ部分的に露出していた銀基体表面に硫化銀が形成された実施例電極２を作製した。
Example 2:
Example electrode 1 produced in Example 1 was immersed in a 0.1% aqueous sodium sulfide solution for 30 seconds to form 0.04 mg / cm 2 of silver sulfide on the exposed portion of the silver on the electrode surface, Example electrode in which boron oxide is formed in the groove of the concave portion of the silver base A, silver chloride is formed on the head of the convex portion of the silver layer, and silver sulfide is formed on the surface of the silver base that is partially exposed 2 was produced.
比較例１
銀板を実施例電極１と同様に、４０℃飽和食塩水中、電流密度２．０ｍＡ／ｃｍ２の一定電流で１０分間陽極酸化した後、大気中４００℃で３０分間熱処理を施し、銀基体表面に厚さが５μｍの塩化銀層が形成された比較例電極１を作製した。なお、比較例１〜３における塩化銀層の厚さはＥＰＭＡでの断面分析による。
Comparative Example 1
The silver plate was anodized at 40 ° C. saturated saline at a constant current density of 2.0 mA / cm 2 for 10 minutes in the same manner as Example electrode 1 and then heat-treated at 400 ° C. for 30 minutes in the atmosphere to obtain a silver substrate surface. A comparative electrode 1 was prepared in which a silver chloride layer having a thickness of 5 μm was formed. In addition, the thickness of the silver chloride layer in Comparative Examples 1-3 is based on the cross-sectional analysis by EPMA.
比較例２
電流密度１．０ｍＡ／ｃｍ２の一定電流で５分間陽極酸化する以外は比較例１と同様にして、銀基体表面に厚さが１μｍの塩化銀層が形成された比較例電極２を作製した。
Comparative Example 2
A comparative electrode 2 in which a silver chloride layer having a thickness of 1 μm was formed on the surface of a silver substrate was prepared in the same manner as in Comparative Example 1 except that anodization was performed for 5 minutes at a constant current of 1.0 mA / cm 2 . .
比較例３
電流密度４．０ｍＡ／ｃｍ２の一定電流で２０分間陽極酸化する以外は比較例１と同様にして、銀基体表面に厚さが２０μｍの塩化銀層が形成された比較例電極３を作製した。
Comparative Example 3
A comparative electrode 3 in which a silver chloride layer having a thickness of 20 μm was formed on the surface of a silver substrate was prepared in the same manner as in Comparative Example 1 except that anodization was performed for 20 minutes at a constant current of 4.0 mA / cm 2 . .
上記で作製した実施例電極１、実施例電極２、比較例電極１、比較例電極３及び比較例電極３を各２枚用い、それぞれの電極の担持表面にケラチンクリーム（フクダ電子社製）約０．４ｇを一様に塗り、ケラチンクリームが内側になるように２枚の電極を貼り合わせ、電極対特性：（１）直流１００μＡを１分間印加し、遮断後１分後の電圧値（以下、ＤＣＯと記す）及び（２）１０Ｈｚで１００μＡｐ―ｐ印加した時のインピーダンス値（以下、ＡＣＺと記す）を測定した。その結果を表１に示す。また、実施例電極１及び実施例電極２について１００回の心電波形測定後の電極対特性を測定した。その結果を表２に示す。 Each of the Example electrode 1, Example electrode 2, Comparative example electrode 1, Comparative example electrode 3 and Comparative example electrode 3 prepared above was used, and keratin cream (manufactured by Fukuda Denshi Co., Ltd.) was used on each electrode support surface. Apply 0.4g uniformly and paste two electrodes so that the keratin cream is on the inside. Electrode pair characteristics: (1) DC 100 μA is applied for 1 minute, voltage value after 1 minute after blocking (below) , And DCO) and (2) the impedance value (hereinafter referred to as ACZ) when 100 μAp-p was applied at 10 Hz was measured. The results are shown in Table 1. Further, the electrode pair characteristics after measuring the electrocardiographic waveform 100 times for the example electrode 1 and the example electrode 2 were measured. The results are shown in Table 2.
電極対特性のＤＣＯ値が低いことは、繰り返し発生する生体電気信号の検出速度が速くなること及び電極電位の可逆性に優れていることを意味し、ＡＣＺ値が低いことは、検出感度が高いことを意味する。 The low DCO value of the electrode pair characteristic means that the detection speed of the repetitive bioelectric signal is increased and the reversibility of the electrode potential is excellent, and the low ACZ value is high in detection sensitivity. Means that.
表１の結果より、本発明の実施例電極は電極電位の可逆性に優れ、検出速度が速く且つ検出感度が高い生体用電極であることがわかる。また、表２の結果より、酸化ホウ素又は塩化銀が担持されていない銀露出表面に硫化銀を担持させることにより、電極特性の安定性が向上することがわかる。 From the results shown in Table 1, it can be seen that the example electrodes of the present invention are excellent in electrode potential reversibility, high detection speed, and high detection sensitivity. Further, from the results in Table 2, it is understood that the stability of the electrode characteristics is improved by supporting silver sulfide on the exposed silver surface on which boron oxide or silver chloride is not supported.
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| JPH05176903A (en) * | 1991-12-27 | 1993-07-20 | Tokuriki Honten Co Ltd | Silver-silver chloride electrode and its production |
| JP2006280735A (en) * | 2005-04-01 | 2006-10-19 | Ishifuku Metal Ind Co Ltd | Biomedical electrode |
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| JPH05176903A (en) * | 1991-12-27 | 1993-07-20 | Tokuriki Honten Co Ltd | Silver-silver chloride electrode and its production |
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