JP2006265596A - Method of manufacturing deposition mask - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a deposition mask having the excellent positional accuracy of a pattern part even with a body frame of low strength with a sash removed therefrom when manufacturing the deposition mask by affixing a metal mask on a screen fabric, and transferring the metal mask to the body frame. <P>SOLUTION: The method of manufacturing the deposition mask comprises: a step (1) of affixing a screen fabric to a screen fabric affixing frame; a step (2) of affixing a metal mask rolled web to the screen fabric; a step (3) of removing the screen fabric in contact with the metal mask, and applying the tension to the rolled web; a step (4) of overlapping the rolled web on a glass plotting plate, applying the load to the screen fabric affixing frame, and matching a mark of the metal mask with a mark of the glass plotting plate; a step (5) of placing a body frame of a deposition mask without any sash in place of the glass plotting plate; a step (6) of applying the load to the body frame, and setting the internal stress to the load equal to the internal stress to the tension of the rolled web; a step (7) of affixing the metal mask to the body frame; and a step (8) of removing the screen fabric and a margin around the rolled web and transferring the metal mask to the body frame. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a vapor deposition mask used for forming an organic EL layer and the like, and in particular, a metal mask original fabric is pasted on a ridge pasted on a cocoon pasting frame, and a blank portion is removed from the original fabric. Vapor deposition that does not deteriorate pattern position accuracy even when using a main frame with reduced strength due to the removal of the crosspiece from the main frame of the vapor deposition mask in the method of manufacturing the vapor deposition mask that transfers the metal mask onto the main frame. The present invention relates to a mask manufacturing method.

The organic EL elements are self-luminous and have no visibility angle dependency and excellent visibility. The response speed is fast so that they are suitable for video display. The structure is simple and light and thin. It is said to be a big feature compared to the display.
In the case of a low molecular weight organic EL element, the anode and the cathode constituting the low molecular weight organic EL element are inorganic thin films, but the organic EL layers are all formed of an organic thin film.

This organic EL layer generally has a three-layer structure in which a light emitting layer is sandwiched between a hole transport layer and an electron transport layer. In many cases, each organic thin film is formed in a dense amorphous state by a vapor deposition method.
Further, since the cathode material is a metal material that is weak against water and oxygen, it is difficult to pattern the cathode by a method such as photolithography, and generally a film is formed in a pattern by a vapor deposition method. .

When an organic EL layer or the like is formed in a predetermined pattern on a substrate by vapor deposition, a metal metal mask is often used. An opening having a predetermined pattern is formed in the metal mask. At the time of vapor deposition, the substrate and the metal mask are brought into close contact with each other, and the vapor deposition material passing through the opening is formed on the substrate as a vapor deposition film.
The pattern accuracy of the opening formed in the metal mask is required to be high. For example, the pattern position accuracy is about ± 10 μm in the case of a metal mask having a size of about 50 cm square.

FIG. 1 is a plan view showing an example of a vapor deposition mask used for forming an organic EL layer or the like. 2 is a cross-sectional view taken along the line AA ′ of the vapor deposition mask in FIG.
As shown in FIGS. 1 and 2, the vapor deposition mask (10) used for forming the organic EL layer or the like is formed on the upper surface of a metal main frame (11) such as stainless steel (SUS304, SUS430) or Invar. A metal metal mask (12) such as Invar is applied with tension.

Conventionally, in order to reduce the manufacturing cost of organic EL elements, a large number of organic EL elements are formed on a single substrate and then cut to obtain individual organic EL elements. Therefore, also in the metal mask (12), a large number of pattern portions (13) having a diagonal size of about 2 to 3 inches serving as a screen display area of each organic EL element are provided.
During vapor deposition, an opening (not shown) through which the vapor deposition material passes is formed in the pattern portion (13) in advance by a photoetching method. In FIG. 1, the number of imprinted pattern portions (13) is omitted.

The metal book frame (11) is composed of a frame portion (18) and a crosspiece (19). In the example shown in FIG. 1, in order to increase the strength of the metal main frame (11), the crosspiece (19) is positioned at the horizontal and vertical center positions of the main frame (11) in FIG. It is provided so that the shape of the field becomes a “field shape”.
The size of the metal main frame (11) is, for example, about horizontal (a) 50 cm and vertical (b) 50 cm, and the cross section of the main frame (11) taken along the line BB ′ is height (c). 15 to 20 mm and width (d) of about 30 to 40 mm. The thickness of the metal mask (12) is about 50 to 200 μm.

  As an example of the manufacturing method of the said vapor deposition mask (10), a metal mask is once affixed on the gutter | paste stuck on the metal frame (gutter | paste frame), and this metal mask is made into the said metal main frame. (11) A production method in which a vapor deposition mask (10) is obtained by transferring it onto the surface is mentioned.

FIG. 3 is a plan view showing an example of a metal frame (cracking frame). FIG. 4 is a cross-sectional view taken along the line AA ′ of the frame in FIG.
As shown in FIGS. 3 and 4, the rivet frame (21) used for manufacturing the vapor deposition mask (10) is, for example, a metal frame such as aluminum. A crease (22) is affixed to the upper surface of the crease paste frame (21).
The size of the wrinkle sticking frame (21) is, for example, as the wrinkle sticking frame (21) when manufacturing the vapor deposition mask (10) having a size of about 50 cm in the horizontal (a) and vertical (b) 50 cm. (E) About 80 cm and length (f) about 80 cm, and the cross section of the crease pasting frame (21) taken along the line BB 'is about 30 mm in height (g) and 40 mm in width (h).

FIGS. 5A to 5D are explanatory views of a process of attaching a ridge to the upper surface of the ridge pasting frame (21) and then affixing a metal mask original fabric (16) to the upper surface of the ridge.
First, as shown in FIG. 5A, the ridges (22) are arranged on the entire upper surface of the ridge pasting frame (21). Next, as shown by the arrows, tension is applied to the heel (22) in the horizontal direction outside the heel sticking frame (21), and an adhesive is used for the portion indicated by (i) on the upper surface of the heel sticking frame (21). Glue and apply the tensioned ridge (22).

In FIG. 5 (a), an arrow is shown in the horizontal direction of the tacking frame (21). However, the vertical direction (the arrow direction shown in FIG. 3) of the tacking frame (21) is applied with tension. Then paste. Polyester, stainless steel, silk, etc. are used as the material of the cocoon.
Next, as shown in FIG. 5B, excess portions of the ridges (22) are cut and removed.
The arrow indicates the direction of tension applied to the ridge (22).

Next, as shown in FIG.5 (c), the metal mask original fabric (16) is affixed on the wrinkle (22) of the approximate center of the wrinkle sticking frame (21). The metal mask original fabric (16) is composed of a metal mask (12) and a surrounding margin (14), and the portion of the metal mask original fabric (16) to be bonded to the ridge (22) is (j) This is a margin part (14) of the metal mask original fabric (16) shown in FIG. An adhesive is used for this adhesion.
Further, the width of the margin (14) is about 40 mm to 50 mm.

Next, as shown in FIG. 5D, the portion of the ridge (22) in contact with the metal mask (12) at the center of the original metal mask is cut and removed.
In this cutting, the central portion of the ridge (22) indicated by (k) below the metal mask original fabric (16) in FIG. Cut to size and remove.
As a result, as indicated by the arrow, the metal mask original fabric (16) is also subjected to the outer horizontal tension of the heel, and the metal mask original fabric (16) is pulled and the heel (22) It is attached to the heel pasting frame (21) via

Next, the metal mask original fabric (16) in this state is transferred onto the main frame (11). The vapor deposition mask (10) obtained by transferring the metal mask original fabric (16) in this state as it is. Does not have a pattern positional accuracy of ± 10 μm, which is required for a metal mask pattern accuracy of about 50 cm square.
That is, in the pattern portion (13) on the metal mask (12), the two-dimensional or three-dimensional distortion of the heel pasting frame (21), the non-uniformity of how to apply tension to the heel (22), Uneven distribution of stress when tension is applied to the ridge (22), and when the central portion of the ridge (22) shown in FIG. This is because the position is changed due to the uniformity and the rigidity of the adhesive.

  FIG. 6 is a plan view of an example of a transfer apparatus that corrects this positional variation and transfers the metal mask original fabric (16). FIG. 7 is a side sectional view of the transfer apparatus shown in FIG. As shown in FIGS. 6 and 7, the stage (71) of the transfer device is a flat plate using a transparent material. An illumination device (not shown) is provided below the stage (71), and the metal mask original fabric (16) is illuminated (L) from below.

  A guide rail (72) is provided vertically on the stage (71), and a flat plate-like holding base (73) can be moved up and down via the guide rail (72). The flat plate-like holding base (73) has a frame shape, and the periphery of the eaves sticking frame (21) is held in a cutout portion on the inner upper surface of the frame-like holding base.

A fine adjustment mechanism (76) for precisely aligning the metal mask (12) is provided on the upper surface of the flat holding base (73). The fine adjustment mechanism (76) is directed toward the center of the rivet pasting frame (21), a pushing mechanism (74) for applying a horizontal load to the crease pasting frame (21), and toward the outer side of the crease pasting frame (21). And a pulling mechanism (75) for applying a load in the horizontal direction.
By operating the pushing mechanism (74) and the pulling mechanism (75) of the fine adjustment mechanism (76), a horizontal load is appropriately applied to the crease pasting frame (21) held on the holding base (73), A metal mask alignment mark (17) is made to coincide with a glass drawing plate alignment mark (87) described later.
Above the holding base (73) is a CCD camera (C) that monitors the position of the alignment mark (17) formed on the metal mask (12) and the alignment mark (87) of the glass drawing plate. Is provided.

The original metal mask (16) is composed of a metal mask (12) and surrounding margins (14). The metal mask (12) is provided with a large number of pattern portions (13). This is omitted in FIG. The metal mask (12) is provided with an alignment mark (17) in advance.
The glass drawing plate (80) serves as a reference for precise alignment, and a reference alignment mark (87) is provided on a transparent glass substrate.

  The operation of matching the alignment mark (17) of the metal mask (12) with the alignment mark (87) of the glass drawing plate (80) is performed by the position of the glass drawing plate (80) displayed on the monitor screen by the CCD camera. While monitoring the alignment mark (87) and the alignment mark (17) of the metal mask (12), the fine adjustment mechanism (76) is operated to align the alignment mark (17) with the alignment mark (87). .

In the next transfer step, as shown in FIG. 8, the glass drawing plate (80) is removed from the stage (71) and replaced, and the main frame (11) of the vapor deposition mask is placed on the stage (71) of the transfer device. Put. Then, the metal mask original fabric (16) is brought into contact with the upper surface of the main frame (11), and is pressed from the upper surface of the peripheral portion of the metal mask (12) as indicated by a white arrow, and the upper surface of the main frame (11). The peripheral part of the metal mask (12) is affixed with an adhesive. The margin (14) is not pasted. Next, as shown in FIG. 9, the portion of the ridge (22) indicated by (m) around the metal mask original fabric (16) is cut, and the blank portion (14) of the metal mask original fabric (16) is cut. The metal mask (12) is transferred to the main frame (11) of the vapor deposition mask. Thereby, the vapor deposition mask (10) shown in FIG. 2 is obtained.

  That is, by the manufacturing method as described above, the variation in the position of the pattern portion (13) on the metal mask (12) due to the two-dimensional or three-dimensional distortion of the crease frame (21) is corrected. A vapor deposition mask having a size of about 50 cm square having a pattern positional accuracy of ± 10 μm is manufactured.

As the number of organic EL elements applied to one substrate increases, the manufacturing cost of each organic EL element decreases. Therefore, even in the case of using a conventional manufacturing apparatus without changing the size of the main frame (11) of the evaporation mask, that is, for example, without increasing the size of the manufacturing apparatus, the pattern portion (as much as possible) There is a strong demand to increase the number of impositions of 13).
As a method for meeting this demand, the crosspieces (19) provided at the horizontal and vertical center positions of the main frame (11) of the vapor deposition mask shown in FIG. Attempts have been made to use vapor deposition masks that are "shaped". That is, a pattern part (13) can be provided also in the site | part which had the crosspiece (19) conventionally, and the number of imposition can be increased.

  FIG. 10 is a plan view showing a vapor deposition mask (30) having no crosspiece (19), which is attempted to meet the above-mentioned demand. FIG. 11 is a cross-sectional view taken along the line A-A ′ of the vapor deposition mask (30) in FIG. 10. If the vapor deposition mask (30) shown in FIG. 10 and FIG. 11 is used, the number of impositions of the pattern portion (13) certainly increases, but even if the vapor deposition mask (30) is produced by the production method as described above. That is, a metal mask is once pasted on the collar (22) pasted on the metal frame (the collar pasting frame (21)), and the variation in the position of the pattern portion (13) on the metal mask is corrected. However, even if the vapor deposition mask (10) is manufactured by transferring the metal mask onto the metal main frame (11), there arises a problem that the pattern positional accuracy of ± 10 μm cannot be maintained. ing.

This is because the strength of the main frame (11) of the vapor deposition mask that does not have the crosspiece (19) is reduced because the crosspiece (19) is removed from the main frame of the vapor deposition mask in the attempted vapor deposition mask (30). It is guessed.
That is, after transferring the tensioned metal mask to the main frame (11) through the heel, the main frame with reduced strength is deformed by the restoring force generated in the metal mask when the tension is released. The position accuracy cannot be maintained.
Japanese Patent Application No. 2003-395061 Japanese Patent Application No. 2003-391874

The present invention has been made in view of the above problems. That is, by a transfer method in which a metal mask is temporarily pasted on a heel pasted with tension applied to the heel pasting frame, and the variation in the position of the pattern portion of the metal mask is corrected and transferred onto the main frame. When manufacturing a vapor deposition mask, even when using a main frame whose strength has decreased due to the removal of the crosspiece from the main frame of the vapor deposition mask, good pattern position accuracy is required, that is, metal mask pattern accuracy is required. It is an object of the present invention to provide a method for manufacturing a vapor deposition mask that can achieve a pattern positional accuracy of ± 10 μm using a metal mask having a size of about 50 cm square.

  As a result, even if the vapor deposition mask has no crosspieces with the crosspieces removed from the main frame of the vapor deposition mask, the vapor deposition work is performed by increasing the number of impositions of the pattern portions without causing any trouble in the pattern position accuracy. Will be able to.

The present invention relates to a method of manufacturing a vapor deposition mask used when forming a film in a pattern by vapor deposition on a substrate.
1) A step of applying a tension to the upper surface of the cocoon pasting frame by applying tension in the outer horizontal direction of the cocoon pasting frame,
2) A process of attaching a metal mask original fabric having a size smaller than a ridge, in which a portion where a pattern-like film is formed by vapor deposition is previously perforated by a photo-etching method, to the ridge on the margin of the metal mask original fabric ,
3) A step of removing a part of the ridge in contact with the metal mask at the center of the metal mask original fabric, and applying an outer horizontal direction tension of the ridge to the metal mask original fabric,
4) Overlay the metal mask original fabric pasted on the above-mentioned 枠 pasting frame on the glass drawing board on which the alignment mark is drawn, and apply a horizontal load to the 紗 pasting frame to apply the metal mask positioning mark. Matching the alignment mark on the glass drawing board,
5) With the alignment mark of the metal mask aligned with the alignment mark of the glass drawing plate, remove the glass drawing plate from the stage of the transfer device and replace it so that the main frame of the vapor deposition mask without the crosspiece is attached to the transfer device. The process of placing on the stage,
6) A load in the inner horizontal direction from the outside is applied to the main frame of the vapor deposition mask that does not have the crosspiece placed on the stage of the transfer device, and the load applied to the main frame of the vapor deposition mask that does not have the crosspiece is applied to the main frame. A step of antagonizing the internal horizontal stress in the outer horizontal direction of the main frame with the internal horizontal stress in the inner side of the metal mask against the tension applied to the original metal mask;
7) With the internal stress in the inner horizontal direction of the metal mask original fabric and the internal stress in the outer horizontal direction of the main frame of the vapor deposition mask not having the crosspiece antagonized, the peripheral portion of the metal mask of the metal mask original fabric is A process of attaching the upper surface of the main frame of the vapor deposition mask not having the crosspiece,
8) A step of cutting a ridge around the metal mask original fabric, removing a blank portion of the metal mask original fabric, and transferring the metal mask to the main frame of the vapor deposition mask not having the crosspiece,
It is a manufacturing method of the vapor deposition mask characterized by comprising at least.

  In addition, the present invention provides the method for producing a vapor deposition mask according to the above invention, wherein the metal mask original fabric pasted on the glazing frame is overlaid on the glass drawing plate on which the alignment mark has been drawn, In the process of applying a horizontal load to the frame and aligning the alignment mark on the metal mask with the alignment mark on the glass drawing plate, the load on the frame is weakened and the original metal mask is applied to the main frame. A method of manufacturing a vapor deposition mask, wherein the metal mask is placed in a desired position when the metal mask original fabric is pasted and cut off around the metal mask.

In the present invention, 1) a step of attaching a heel to the upper surface of the heel sticking frame, 2) a step of attaching a metal mask original fabric on the heel, and 3) removing a portion of the heel in contact with the metal mask. 4) Applying the outer horizontal tension of the metal mask original fabric on the metal mask. 4) Overlay the metal mask original fabric pasted on the glazed frame on the glass drawing plate with the glazed frame in the horizontal direction. A process of applying a load to align the alignment mark of the metal mask with the alignment mark of the glass drawing plate. 5) Remove the glass drawing plate from the stage of the transfer device and replace it so that the main frame of the evaporation mask without the crosspiece. 6) A load in the inner horizontal direction from the outside is applied to the main frame of the vapor deposition mask that does not have a crosspiece, and the internal stress in the outer horizontal direction of the main frame with respect to the load applied to the main frame is measured by a metal mask. Step of antagonizing internal stress in inner horizontal direction of metal mask original fabric against tension applied to the original fabric, 7) Internal stress in inner horizontal direction of metal mask original fabric and internal stress in outer horizontal direction of main frame antagonize In this state, the step of attaching the peripheral portion of the metal mask to the upper surface of the main frame, 8) the step of cutting the ridge around the original metal mask, removing the blank portion, and transferring the metal mask to the main frame. Since it is at least a method for manufacturing a vapor deposition mask, the pattern portion has a good positional accuracy, that is, the pattern accuracy of a metal mask, even if a main frame whose strength has been reduced by removing a crosspiece from the main frame of the vapor deposition mask is used. The deposition mask manufacturing method can achieve a pattern positional accuracy of ± 10 μm using a metal mask having a size of about 50 cm square.

  As a result, even if the vapor deposition mask has no crosspieces with the crosspieces removed from the main frame of the vapor deposition mask, the vapor deposition work is performed by increasing the number of impositions of the pattern portions without hindering the pattern position accuracy. Will be able to.

Hereinafter, embodiments of the present invention will be described in detail.
FIG. 12 is a plan view of the vapor deposition mask (30) manufactured by the above manufacturing method using the main frame (31) of the vapor deposition mask shown in FIG. As shown in FIG. 12, the vapor deposition mask (30) does not have the crosspiece (19), and is constituted by a main frame (31) consisting only of a square frame (18) and a metal mask (12). Has been.
The planar shape of the vapor deposition mask (30) having no crosspiece is exaggerated, but as shown in FIG. 12, it has a so-called pincushion shape.
Based on this phenomenon, the present inventor has scrutinized the reason why the pattern positional accuracy of ± 10 μm cannot be maintained when the crosspiece is removed from the main frame of the vapor deposition mask, and the present invention has been completed.

That is, as shown in FIG. 5 (d), the metal mask (12) is shown with (k) below the metal mask original fabric (16) after the metal mask original fabric is attached to the iron. At the stage where the central portion of (22) is cut and removed to approximately the size of the metal mask (12), the tension of the wrinkles indicated by the arrow in FIG. 5 (d) is also outside the metal mask original fabric (16). It was hanging horizontally.
Accordingly, as shown in FIG. 12, the inner horizontal stress (indicated by an arrow in FIG. 12) of the metal mask (12) with respect to the outer horizontal tension of the metal mask (12) is the shape of the metal mask (12). Was in a direction to restore.

  On the other hand, in the vapor deposition mask (30) having no crosspiece, as shown in FIG. 9, the peripheral portion of the metal mask (12) is attached to the upper surface of the main frame (31) with an adhesive, and the original metal mask is made. The step of cutting the ridge (22) indicated by (m) around (16), cutting and removing the blank portion (14), and transferring the metal mask (12) to the main frame (31) of the vapor deposition mask. That is, when the vapor deposition mask (30) is obtained, the main frame (31) cannot be resisted by the internal stress in the inner horizontal direction of the metal mask (12) and is bent in the direction of the internal stress indicated by the arrow. It is a thing.

  Thereby, although the planar shape of the vapor deposition mask (30) which does not have a crosspiece is exaggerated, as shown in FIG. 12, it will show what is called a pincushion shape. Because the planar shape of the vapor deposition mask (30) having no crosspiece has been changed to a pincushion shape, the pattern accuracy of the metal mask of about 50 cm square, which is required for the metal mask pattern accuracy, is achieved. I can no longer do it.

FIG. 13 is a plan view of an example of a transfer apparatus for transferring the metal mask original fabric (16) used in the present invention. FIG. 14 is a side sectional view of the transfer apparatus shown in FIG. As shown in FIGS. 13 and 14, the transfer device of this example is provided with a main frame fine adjustment mechanism (66) in addition to the transfer device shown in FIGS.
The frame fine adjustment mechanism (66) is provided at a position substantially below the center of the four sides of the stage (71) of the transfer device and below the holding base (73). A load in the inner horizontal direction is applied to the main frame (31) of the vapor deposition mask (30) having no crosspiece placed in the center on the stage (71).

The vapor deposition mask manufacturing method according to the present invention is characterized by the transfer process when the metal mask original fabric (16) attached to the ridge is transferred to the main frame (31) of the vapor deposition mask (30) having no crosspiece. have.
First, using the transfer device shown in FIGS. 13 and 14, the operation as shown in FIGS. 6 and 7, that is, the glass drawing plate (80) on which the alignment marks are drawn, ) Is overlapped with the metal mask original fabric (16) pasted through the heel, a horizontal load is applied to the heel pasting frame (21), and the alignment mark (17) of the metal mask is aligned with the glass drawing plate. Match mark (87).

Next, in a state where the alignment mark (17) of the metal mask matches the alignment mark (87) of the glass drawing plate, the glass drawing plate (80) is removed from the stage (71) of the transfer device shown in FIG. Instead, the main frame (31) of the vapor deposition mask having no crosspiece is placed on the stage (71) of the transfer device.
The main frame fine adjustment mechanism (66) is operated from the periphery of the stage (71) to the main frame (31) of the vapor deposition mask which is mounted on the stage (71) of the transfer apparatus shown in FIG. Apply the horizontal load inside from outside.

By applying a load in the inner horizontal direction from the outside to the main frame (31), the main frame (31) of the vapor deposition mask having no crosspiece is bent in the inner horizontal direction and exaggerated as shown in FIG. As shown, it exhibits a pincushion shape. In FIG. 15, the white arrow represents the load in the inner horizontal direction due to the operation of the main frame fine adjustment mechanism (66).
When applying a load to the main frame (31) of the vapor deposition mask not having a crosspiece, the internal stress (restoring force) in the horizontal direction outside the main frame with respect to the load applied to the main frame (31) of the vapor deposition mask not having the crosspiece. Is applied so as to antagonize the internal stress (restoring force) in the inner horizontal direction of the metal mask original fabric with respect to the tension applied to the metal mask original fabric (16).

Next, in the state where the internal stress in the inner horizontal direction of the metal mask original fabric (16) and the internal stress in the outer horizontal direction of the main frame (31) of the vapor deposition mask not having a crosspiece are in competition, The peripheral edge of the metal mask (12) of 16) is attached to the upper surface of the main frame (31) of the vapor deposition mask not having a crosspiece.
Subsequently, the ridge (22) around the metal mask original fabric is cut, the blank portion (14) of the metal mask original fabric is removed, and the main frame (31) of the vapor deposition mask having no crosspiece is formed on the metal mask (12). To obtain a vapor deposition mask according to the present invention.

  FIG. 16 is a plan view showing the vapor deposition mask (90) according to the present invention obtained as described above. As shown in FIG. 16, the internal stress indicated by an arrow (F1) in the horizontal direction inside the metal mask (12) with respect to the tension applied to the metal mask original fabric (16) (metal mask (12)), The internal stress indicated by arrow (F2) in the outer horizontal direction of the main frame (31) to be restored in the outer direction with respect to the load applied in the inner horizontal direction from the outer side of the main frame (31) of the vapor deposition mask not having It is antagonistic.

Accordingly, the metal mask (12) remains in a state where the alignment mark (17) of the metal mask is aligned with the alignment mark (87) of the glass drawing plate, that is, the position of the pattern portion (13) varies. A state of good accuracy without any problem is maintained. Therefore, also in FIG. 16 exaggerated, the shape of the metal mask (12) is, for example, a square, neither a pincushion shape nor a barrel shape.
On the other hand, the shape of the main frame (31) of the vapor deposition mask that does not have the crosspieces remains in a pincushion shape when a load is applied in the horizontal direction from the outside to the inside as described above.

  Since the mutual internal stress is antagonistic, the peripheral portion of the metal mask (12) is attached to the upper surface of the main frame (31) with an adhesive, and is shown by (m) around the metal mask original fabric (16). At the stage where the ridge (22) is cut, the blank portion (14) is cut and removed, and the metal mask (12) is transferred to the main frame (31) of the vapor deposition mask, there is no change in the mutual shape. .

  As for the load on the main frame (31) of the vapor deposition mask, the main frame (31) uses stainless steel such as SUS304 and SUS430 or Invar as the material of the main frame as described above, and the size is horizontal. (A) about 50 cm, length (b) about 50 cm, the cross section is about 15-20 mm in height (c) and about 30-40 mm in width (d), and the metal mask (12) is as described above When invar is used as the material for the metal mask and the thickness is about 100 μm, a load is applied so that the bending amount (E) of the main frame (31) shown in FIG. 15 is about 10 to 20 μm. Thus, mutual internal stress can be antagonized.

In the method described above, when the metal mask original fabric (16) is attached to the main frame (31), the internal stress of the main frame (31) and the internal stress of the metal mask original fabric (16) are made equal to each other. (31) shows an example in which it remains in a pincushion shape.
However, the internal stress of the metal mask original fabric (16) is made stronger than the internal stress of the main frame (31), and after the metal mask original fabric (16) is attached, the main frame (31) returns to the original shape, At that time, the position of the metal mask (12) may be a desired position.

  In that case, when a horizontal load is applied to the wrinkle pasting frame (21) and the alignment mark (17) of the metal mask and the alignment mark (87) of the glass drawing plate are aligned, the metal mask (12 described later) ) To reduce the load on the crease frame (21), and align so that the alignment mark (17) of the metal mask is slightly inside the alignment mark (87) of the glass drawing plate. Do.

  Thereafter, in the same manner as described above, a load is applied so that the internal stress of the main frame (31) is stronger than the internal stress of the metal mask original fabric (16), and the main frame (31) formed in a pincushion shape is applied to the main frame (31). Paste anti (16). In this case, since the internal stress of the main frame (31) is stronger than the internal stress of the metal mask original fabric (16), the main frame (31) is cut when the ridge (22) around the metal mask original fabric (16) is cut. ) Returns from the pincushion shape to the base shape. At that time, the metal mask (12) attached to the main frame (31) is pulled, and the position of the metal mask (12) comes to a desired position.

It is a top view which shows an example of the vapor deposition mask used for formation of an organic electroluminescent layer. It is sectional drawing in the A-A 'line of the vapor deposition mask in FIG. It is a top view which shows an example of metal frames (crack pasting frame). It is sectional drawing in the A-A 'line of the frame (crack pasting frame) in FIG. (A)-(d) is explanatory drawing of the process which affixes a wrinkle on the upper surface of a wrinkle sticking frame, and then affixes a metal mask original fabric on the upper surface of a wrinkle. It is a top view of an example of the transfer apparatus which corrects the change of a position, and transfers a metal mask original fabric. FIG. 7 is a side sectional view of the transfer device shown in FIG. 6. It is a sectional side view of the state which affixed the metal mask original fabric to the main frame of a vapor deposition mask of the transfer apparatus shown in FIG. It is explanatory drawing which transcribe | transfers a metal mask to the main frame of a vapor deposition mask. It is a top view which shows the vapor deposition mask which does not have a crosspiece. It is sectional drawing in the A-A 'line of the vapor deposition mask in FIG. It is a top view of the vapor deposition mask which does not have the crosspiece manufactured by the said manufacturing method using the main frame of the vapor deposition mask shown in FIG. It is a top view of an example of the transfer apparatus which transfers the metal mask original fabric used in this invention. FIG. 14 is a side sectional view of the transfer device shown in FIG. 13. It is explanatory drawing of the main frame of the vapor deposition mask which exhibits a pincushion shape and does not have a crosspiece. It is a top view which shows the vapor deposition mask in this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 ... Deposition mask 11 ... Main frame 12 of a vapor deposition mask ... Metal mask 13 ... Pattern part 14 of a metal mask ... Blank part 16 of a metal mask ... Metal mask original fabric 17 ...・ Metal mask alignment mark 18 ... frame portion 19 of main frame ... bar 21 of main frame ... saddle pasting frame 22 ... 紗 30 ... deposition mask 31 without bar ... Main frame 66 of vapor deposition mask without crosspieces ... Main frame fine adjustment mechanism 71 ... Transfer device stage 72 ... Guide rail 73 ... Holding base 74 ... Pushing mechanism 75 ... Pulling mechanism 76 ... Fine adjustment mechanism 80 for positioning ... Glass drawing plate 87 ... Glass drawing plate alignment mark 90 ... Vapor deposition mask C in the present invention ... CCD camera F1 ... Metal mask Inner horizontal internal stress F2 ... Internal stress L in the horizontal direction outside the main frame of the evaporation mask without a crosspiece ... Illumination a ... Horizontal b of the main frame ... Vertical c of the main frame ... Height d of the main frame ... The width e of the main frame e ... The side f of the hail sticking frame f The vertical g of the hail sticking frame h The height h of the hull sticking frame h The width k of the hanger sticking frame ... Central part m to be removed: The part of the metal mask that is to be cut

Claims (2)

In the manufacturing method of a vapor deposition mask used when forming a vapor deposition film of a predetermined pattern on a substrate,
1) A process of attaching a cocoon tensioned in the outer horizontal direction of the cocoon paste frame on the upper surface of the cocoon paste frame;
2) A process of attaching a metal mask original fabric having a size smaller than a ridge, in which a portion where a pattern-like film is formed by vapor deposition is previously perforated by a photo-etching method, to the ridge on the margin of the metal mask original fabric ,
3) A step of removing a part of the ridge in contact with the metal mask at the center of the metal mask original fabric, and applying an outer horizontal direction tension of the ridge to the metal mask original fabric,
4) Overlay the metal mask original fabric pasted on the above-mentioned 枠 pasting frame on the glass drawing board on which the alignment mark is drawn, and apply a horizontal load to the 紗 pasting frame to apply the metal mask positioning mark. Matching the alignment mark on the glass drawing board,
5) With the alignment mark of the metal mask aligned with the alignment mark of the glass drawing plate, remove the glass drawing plate from the stage of the transfer device and replace it so that the main frame of the vapor deposition mask without the crosspiece is attached to the transfer device. The process of placing on the stage,
6) A load in the inner horizontal direction from the outside is applied to the main frame of the vapor deposition mask that does not have the crosspiece placed on the stage of the transfer device, and the load applied to the main frame of the vapor deposition mask that does not have the crosspiece is applied to the main frame. A step of making the internal stress in the horizontal direction outside the main frame equal to the internal stress in the horizontal direction inside the metal mask original with respect to the tension applied to the metal mask original,
7) In the state where the internal stress in the inner horizontal direction of the metal mask original fabric is equal to the internal stress in the outer horizontal direction of the main frame of the vapor deposition mask not having the crosspiece, the peripheral portion of the metal mask of the metal mask original fabric A step of attaching the upper surface of the main frame of the vapor deposition mask not having the crosspiece,
8) A step of cutting a ridge around the metal mask original fabric, removing a blank portion of the metal mask original fabric, and transferring the metal mask to the main frame of the vapor deposition mask not having the crosspiece,
A method for producing a vapor deposition mask, comprising:   4) Overlaying the metal mask original fabric pasted on the glazed frame on the glass drawing plate on which the alignment mark is drawn, and applying a horizontal load to the glazed frame, aligns the metal mask. In the process of aligning the mark with the alignment mark on the glass drawing board, when the load on the heel sticking frame is weakened, and the metal mask original fabric is pasted on the main frame, and the heel around the metal mask original fabric is cut 2. The method of manufacturing a vapor deposition mask according to claim 1, wherein the position of the metal mask is set to a desired position.

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