JP2006260862A - Electroluminescent lamp and its manufacturing method - Google Patents

Electroluminescent lamp and its manufacturing method Download PDF

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JP2006260862A
JP2006260862A JP2005074260A JP2005074260A JP2006260862A JP 2006260862 A JP2006260862 A JP 2006260862A JP 2005074260 A JP2005074260 A JP 2005074260A JP 2005074260 A JP2005074260 A JP 2005074260A JP 2006260862 A JP2006260862 A JP 2006260862A
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film
transparent
thin
electroluminescent lamp
layer
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Naoyuki Mori
尚之 森
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Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
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Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
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<P>PROBLEM TO BE SOLVED: To provide an ultra-thin electroluminescent lamp, and its manufacturing method, with excellent mechanical strength suitable for a backlight of a liquid crystal display or a key-part illumination of a cell phone. <P>SOLUTION: A double-layer structure base material film 6 with a slightly adhesive film 4 stuck with a thin-film transparent film 5 is used, on top of which, a transparent electrode 7, a luminous layer 8, a reflective insulation layer 9, a rear-face electrode 10, and a protective layer 11 are printed in turn. After drying and hardening, the slightly adhesive film 4 is peeled off and removed from the thin-film transparent film 5 to obtain an ultra-thin electroluminescent lamp 1. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は電界発光灯及びその製造方法に関し、特に薄膜の基材フィルムを使用した超薄型の電界発光灯及びその製造方法に関するものである。   The present invention relates to an electroluminescent lamp and a manufacturing method thereof, and more particularly to an ultra-thin electroluminescent lamp using a thin base film and a manufacturing method thereof.

超薄型の電界発光灯は、基材フィルムのない印刷層のみに形成される電界発光灯が、例えば特開2004−55440号公報及び特開2004−207015号公報に開示されている。   As the ultra-thin electroluminescent lamp, electroluminescent lamps formed only on a printing layer without a base film are disclosed in, for example, Japanese Patent Application Laid-Open Nos. 2004-55440 and 2004-207015.

図3(a)、(b)は、従来の電界発光灯40の構成を示す要部断面図である。従来の電界発光灯40は離型処理を施した離型基材41の上面に、透明電極層42 、発光層43 、反射絶縁層44 、裏面電極層45を積層して順次形成し、最後に離型基材41を透明電極層42から剥離して電界発光灯40を製造している。また、図4(a)、(b)に示す他の従来の電界発光灯50のように、離型処理を施した離型基材51の上面に、透明絶縁層52 、透明電極層53 、発光層54 、反射絶縁層55 、裏面電極層56を積層して順次形成し、最後に離型基材51を透明絶縁層52から剥離して電界発光灯50を製造している。
特開2004−55440号公報 特開2004−207015号公報
FIGS. 3A and 3B are cross-sectional views of the main part showing the configuration of a conventional electroluminescent lamp 40. A conventional electroluminescent lamp 40 is formed by sequentially laminating a transparent electrode layer 42, a light emitting layer 43, a reflective insulating layer 44, and a back electrode layer 45 on the upper surface of a release substrate 41 that has been subjected to a release treatment. The electroluminescent lamp 40 is manufactured by peeling the release substrate 41 from the transparent electrode layer 42. Further, as in other conventional electroluminescent lamps 50 shown in FIGS. 4A and 4B, a transparent insulating layer 52, a transparent electrode layer 53, The electroluminescent lamp 50 is manufactured by laminating the light emitting layer 54, the reflective insulating layer 55, and the back electrode layer 56 sequentially and finally peeling the release substrate 51 from the transparent insulating layer 52.
JP 2004-55440 A JP 2004-207015 A

しかしながら、上述した従来の電界発光灯40、50には次のような問題があった。   However, the conventional electroluminescent lamps 40 and 50 described above have the following problems.

基材フィルムがなく、印刷層のみで形成されているので引張り、引き裂き、押し圧という機械的な強度に対して弱いという問題があった。また、シリコン等の離型処理を施した離型基材41、51の上に直接印刷するので樹脂の種類によっては印刷性が悪くなる。そのため印刷時にはじきが発生しやすく、乾燥時の熱収縮によって製造課程で部分的に印刷層と離型基材41、51が剥がれるという問題があった。また、薄膜の透明フィルムをそのまま基材として利用することにより超薄型の電界発光灯を製造することも考えられるが、基材フィルムが薄いと例えばスクリーン印刷する際に、印刷装置の吸着痕が印刷面に残る、印刷後の取り扱いが困難である、加工性が悪い等の問題があった。   Since there was no base film and it was formed only by the printing layer, there was a problem that it was weak against mechanical strength such as tension, tearing and pressing pressure. In addition, since printing is performed directly on the release base materials 41 and 51 which have been subjected to a release treatment such as silicon, the printability is deteriorated depending on the type of resin. For this reason, there is a problem that repellence is likely to occur during printing, and the print layer and the release substrates 41 and 51 are partially peeled off during the manufacturing process due to heat shrinkage during drying. In addition, it is conceivable to produce an ultra-thin electroluminescent lamp by using a thin transparent film as a base material as it is. There were problems such as remaining on the printing surface, difficulty in handling after printing, and poor workability.

本発明は上記問題点を解決するために考えられたもので、液晶のバックライトや携帯電話のキー部照明に好適な強度的にも優れた超薄型の電界発光灯及びその製造方法を提供することを目的とする。   The present invention has been conceived in order to solve the above-described problems, and provides an ultra-thin electroluminescent lamp excellent in strength and suitable for a backlight of a liquid crystal or a key part of a cellular phone, and a method for manufacturing the same. The purpose is to do.

上記目的を達成するために、本発明の請求項1記載の電界発光灯は、透明電極と裏面電極の間に発光層と反射絶縁層が形成されてなる電界発光灯において、前記透明電極を支持する基材が厚さ10〜35μmの薄膜透明フィルムからなることを特徴とする。この構成によれば、基材がフィルムでできているため機械的強度や絶縁性に優れた超薄型の電界発光灯を提供することができる。   In order to achieve the above object, the electroluminescent lamp according to claim 1 of the present invention supports the transparent electrode in an electroluminescent lamp in which a light emitting layer and a reflective insulating layer are formed between a transparent electrode and a back electrode. The base material to be formed is a thin film transparent film having a thickness of 10 to 35 μm. According to this configuration, since the substrate is made of a film, an ultra-thin electroluminescent lamp excellent in mechanical strength and insulation can be provided.

また、請求項2記載の電界発光灯は、請求項1記載の電界発光灯において、前記透明電極が、酸化インジウム、酸化錫、酸化アンチモン、酸化亜鉛及び導電性高分子の少なくとも一種類以上を含む透明導電性材料からなることを特徴とする。この構成によれば、透明性及び導電性に優れた透明電極を容易に得ることができる。   The electroluminescent lamp according to claim 2 is the electroluminescent lamp according to claim 1, wherein the transparent electrode includes at least one of indium oxide, tin oxide, antimony oxide, zinc oxide, and a conductive polymer. It consists of a transparent conductive material. According to this structure, the transparent electrode excellent in transparency and electroconductivity can be obtained easily.

また、請求項3記載の電界発光灯は、請求項2記載の電界発光灯において、前記透明電極が、印刷、蒸着及びコーティングのいずれかにより形成したことを特徴とする。この構成によれば、透明性及び導電性に優れた透明電極を生産性よく容易に得ることができる。   The electroluminescent lamp according to claim 3 is the electroluminescent lamp according to claim 2, wherein the transparent electrode is formed by any one of printing, vapor deposition, and coating. According to this configuration, a transparent electrode excellent in transparency and conductivity can be easily obtained with high productivity.

また、請求項4の電界発光灯の製造方法は、厚さ50〜188μmの透明フィルムの上に微粘着層を形成した微粘着フィルムに、厚さ10〜35μmの薄膜透明フィルムを貼り付けてなる二層構造の基材フィルム上に、透明電極、発光層、反射絶縁層、裏面電極、保護層を順次印刷形成し、乾燥固化後、前記微粘着フィルムを前記薄膜透明フィルムから剥離除去することを特徴とする。この製造方法によれば、製造時点での基材フィルムは十分厚いため、印刷時あるいは取り扱い時にシワや折れが発生することもなく、電界発光灯形成後、微粘着フィルムを薄膜透明フィルムから剥がすことができるため、容易に超薄型の電界発光灯を製造することができる。   According to a fourth aspect of the present invention, there is provided a method for manufacturing an electroluminescent lamp, comprising: attaching a thin transparent film having a thickness of 10 to 35 μm to a slightly adhesive film having a fine adhesive layer formed on a transparent film having a thickness of 50 to 188 μm. A transparent electrode, a light emitting layer, a reflective insulating layer, a back electrode, and a protective layer are sequentially printed on a base film having a two-layer structure, and after drying and solidifying, the fine adhesive film is peeled off from the thin film transparent film. Features. According to this manufacturing method, since the base film at the time of manufacture is sufficiently thick, no wrinkles or creases occur during printing or handling, and after the electroluminescent lamp is formed, the slightly adhesive film is peeled off from the thin transparent film. Therefore, an ultra-thin electroluminescent lamp can be easily manufactured.

また、請求項5の電界発光灯の製造方法は、厚さ50〜188μmの透明フィルムの上に微粘着層を形成した微粘着フィルムに、厚さ10〜35μmの薄膜透明フィルムに透明電極を形成した薄膜透明導電フィルムを貼り付けてなる二層構造の基材フィルム上に、発光層、反射絶縁層、裏面電極、保護層を順次印刷形成し、乾燥固化後、前記微粘着フィルムを前記薄膜透明導電フィルムから剥離除去することを特徴とする。この製造方法によれば、超薄型の電界発光灯を容易に製造できるとともに、印刷層を一層削減することができる。   According to a fifth aspect of the present invention, there is provided a method for manufacturing an electroluminescent lamp, comprising forming a transparent electrode on a thin transparent film having a thickness of 10 to 35 μm on a thin adhesive film having a thin adhesive layer formed on a transparent film having a thickness of 50 to 188 μm. A light-emitting layer, a reflective insulating layer, a back electrode, and a protective layer are sequentially printed on a base film having a two-layer structure formed by attaching the thin film transparent conductive film, dried and solidified, and then the thin adhesive film is transparent to the thin film It is characterized by peeling off from the conductive film. According to this manufacturing method, an ultra-thin electroluminescent lamp can be easily manufactured, and the number of printed layers can be further reduced.

本発明の電界発光灯によれば、基材フィルムに微粘着フィルムと薄膜透明フィルムの二層構造品を用いているため、製造時に取り扱いで不具合を引き起こすことがなく、製造後、容易に微粘着フィルムを薄膜透明フィルムから剥離できる。これにより、薄膜透明フィルムを基材とした機械的な強度に優れた携帯電話のキー部照明に好適な超薄型の電界発光灯を容易に製造することができる   According to the electroluminescent lamp of the present invention, since the base film uses a two-layer structure product of a slightly adhesive film and a thin transparent film, it does not cause trouble in handling during manufacturing, and can be easily adhered after manufacturing. The film can be peeled from the thin film transparent film. Thereby, it is possible to easily manufacture an ultra-thin electroluminescent lamp suitable for key part illumination of a cellular phone, which is excellent in mechanical strength using a thin film transparent film as a base material.

以下、本発明の電界発光灯の好ましい実施の形態を図面を参照して説明する。図1(a)は本発明の第1実施例の電界発光灯1の要部断面図であり、図1(b)は電界発光灯1の製造方法を説明する要部断面図である。   Hereinafter, preferred embodiments of the electroluminescent lamp of the present invention will be described with reference to the drawings. 1A is a cross-sectional view of a main part of an electroluminescent lamp 1 according to a first embodiment of the present invention, and FIG. 1B is a cross-sectional view of a main part for explaining a method for manufacturing the electroluminescent lamp 1.

図1(a)に示すように、本発明の電界発光灯1は、厚さ50〜188μmのPET(ポリエチレンテレフタレート)等からなる透明フィルム2の上に微粘着層3を形成した微粘着フィルム4に、厚さ10〜35μmのPET等からなる薄膜透明フィルム5を貼り付けた積層フィルムを基材フィルム6としている。この電界発光灯1の製造方法は、先ず、基材フィルム6の上に透明ITO(Indium tin oxide)等の透明導電粉末からなる透明導電ペーストを印刷し、透明電極7を5〜15μmの厚さに形成する。次に、透明電極7の上に硫化亜鉛を銅で付活し防湿コーティングを施した蛍光体8aを例えばフッ素ゴム等の樹脂8b中に分散したインクを印刷し、発光層8を20〜40μmの厚さに形成する。次に、発光層8の上にチタン酸バリウム等の白色誘電粉末を樹脂中に分散させたインクを印刷し、反射絶縁層9を10〜20μmの厚さに形成する。次に、反射絶縁層9の上にカーボンインク等の導電ペーストを印刷し、裏面電極10を10〜20μmの厚さに形成する。次に、裏面電極10の上に絶縁性のインクを印刷し、保護層11を10〜20μmの厚さに形成する。その後、図1(b)に示すように、微粘着フィルム4を薄膜透明フィルム5から剥ぎ取り、厚さ70〜150μmの超薄型の電界発光灯1を得る。   As shown in FIG. 1 (a), the electroluminescent lamp 1 of the present invention is a microadhesive film 4 in which a microadhesive layer 3 is formed on a transparent film 2 made of PET (polyethylene terephthalate) having a thickness of 50 to 188 μm. The base film 6 is a laminated film on which a thin transparent film 5 made of PET or the like having a thickness of 10 to 35 μm is attached. In the method of manufacturing the electroluminescent lamp 1, first, a transparent conductive paste made of transparent conductive powder such as transparent ITO (Indium tin oxide) is printed on the base film 6, and the transparent electrode 7 is 5 to 15 μm thick. To form. Next, an ink in which a phosphor 8a in which zinc sulfide is activated with copper and applied with a moisture-proof coating is dispersed on a transparent electrode 7 in a resin 8b such as fluorine rubber, for example, is printed, and the light emitting layer 8 has a thickness of 20 to 40 μm. Form to thickness. Next, ink in which white dielectric powder such as barium titanate is dispersed in the resin is printed on the light emitting layer 8 to form the reflective insulating layer 9 to a thickness of 10 to 20 μm. Next, a conductive paste such as carbon ink is printed on the reflective insulating layer 9 to form the back electrode 10 to a thickness of 10 to 20 μm. Next, an insulating ink is printed on the back electrode 10, and the protective layer 11 is formed to a thickness of 10 to 20 μm. Then, as shown in FIG.1 (b), the slightly adhesive film 4 is peeled off from the thin film transparent film 5, and the ultra-thin electroluminescent lamp 1 of thickness 70-150 micrometers is obtained.

このように、本実施例の電界発光灯1は、基材に薄膜透明フィルム5を使用しているため、引張り、引き裂き強度に優れ、かつ局部的な押し圧による変形も少なく、500g、100万回の打鍵試験実施後の変形や断線、発光上の異常もなく携帯電話のキー部照明等に用いられた場合の打鍵にも十分耐えうることができる。さらに、最終的に微粘着フィルム4を剥がすようにすれば、工程上あるいは輸送上の傷防止にも効果がある。   Thus, since the electroluminescent lamp 1 of the present embodiment uses the thin film transparent film 5 as the base material, it has excellent tensile and tearing strength and is less deformed by local pressing force, 500 g, 1 million. It can withstand keystrokes when used for key part illumination of a mobile phone, etc. without deformation, disconnection, and light emission abnormalities after a single keystroke test. Furthermore, if the fine-adhesive film 4 is finally peeled off, it is effective in preventing scratches in the process or transportation.

ここで、薄膜透明フィルム5の厚さは10〜35μmとしているが、10μm以下では微粘着フィルム4への貼り付けする際にシワがはいりやすく実現性が劣り、35μm以上では薄型のメリットが乏しくなるためである。より望ましい薄膜透明フィルム5の厚さは16〜25μmである。また、薄膜透明フィルム5の材料もPETのみならず、PEN(ポリエチレンナフタレート)、ポリカーボネート樹脂、ポリメチルメタクリレート樹脂、ポリエステル樹脂、ポリエーテルスルホン樹脂、ポリアリレート樹脂、ポリオレフィン樹脂等が使用できる。   Here, the thickness of the thin transparent film 5 is set to 10 to 35 μm, but if it is 10 μm or less, wrinkles are likely to occur when pasted on the slightly adhesive film 4, and the feasibility is inferior. Because. The thickness of the more preferable thin film transparent film 5 is 16-25 micrometers. The thin transparent film 5 can be made of not only PET but also PEN (polyethylene naphthalate), polycarbonate resin, polymethyl methacrylate resin, polyester resin, polyethersulfone resin, polyarylate resin, polyolefin resin, and the like.

また、微粘着フィルム4の厚さは50〜188μmとしているが、50μm以下では前述した印刷上の問題(吸着痕、取り扱い、加工性等)が発生する恐れがあるとともに最終的に剥ぎ取る際に剥ぎ取りにくく、188μm以上では基材のコスト増とともにフィルムの巻き取り数が少なくなり原反自体の値段が高くなるためである。   Moreover, although the thickness of the slightly adhesive film 4 is 50-188 micrometers, when it is 50 micrometers or less, there is a possibility that the above-mentioned printing problems (suction marks, handling, workability, etc.) may occur, and at the time of peeling off finally. This is because it is difficult to peel off, and when the thickness is 188 μm or more, the cost of the substrate is increased, and the number of windings of the film is decreased, so that the price of the original fabric itself is increased.

また、微粘着フィルム4の粘着力が強すぎると製品化後剥離することが困難となるため、粘着力としては0.01〜0.2N/25mm(対PET)のものが望ましい。   Moreover, since it will become difficult to peel after product manufacture if the adhesive force of the slightly adhesive film 4 is too strong, as an adhesive force, the thing of 0.01-0.2N / 25mm (vs PET) is desirable.

また、薄膜透明フィルム5の微粘着層3への貼り付け側に離型処理を施すようにすれば、微粘着フィルム4をより剥離しやすくすることができる。   Moreover, if the mold release process is performed on the side where the thin transparent film 5 is attached to the slightly adhesive layer 3, the slightly adhesive film 4 can be more easily peeled off.

なお、本実施例では透明電極7の材料にITO粉末を用いた透明導電ペーストを用いたが、酸化アンチモン、酸化亜鉛等の粉末やPEDOT(Polyethylene dioxythiophene)等の有機ポリマーを用いることもできる。有機ポリマーを用いた場合の透明電極7の厚さは2〜5μmであり、さらに薄型の電界発光灯1を提供することができる。   In the present embodiment, a transparent conductive paste using ITO powder is used as the material of the transparent electrode 7, but powders such as antimony oxide and zinc oxide and organic polymers such as PEDOT (Polyethylene dioxythiophene) can also be used. When the organic polymer is used, the thickness of the transparent electrode 7 is 2 to 5 μm, and a thinner electroluminescent lamp 1 can be provided.

次に、本発明の第2実施例の電界発光灯を、図面を参照して説明する。図2(a)は本発明の第2実施例の電界発光灯20の要部断面図であり、図2(b)は電界発光灯20の製造方法を説明する要部断面図である。   Next, an electroluminescent lamp according to a second embodiment of the present invention will be described with reference to the drawings. 2A is a cross-sectional view of the main part of the electroluminescent lamp 20 according to the second embodiment of the present invention, and FIG. 2B is a cross-sectional view of the main part for explaining a method for manufacturing the electroluminescent lamp 20.

図2(a)に示すように、本発明の電界発光灯20は、厚さ50〜188μmのPET等からなる透明フィルム21の上に微粘着層22を形成した微粘着フィルム23に、厚さ10〜35μmのPET等からなる薄膜透明フィルム24にITO等の透明電極25を蒸着してなる薄膜透明導電フィルム26を貼り付けた積層フィルムを基材フィルム27としている。この電界発光灯20の製造方法は、先ず、基材フィルム27の上に硫化亜鉛を銅で付活し防湿コーティングを施した蛍光体28aを例えばフッ素ゴム等の樹脂28b中に分散したインクを印刷し、発光層28を20〜40μmの厚さに形成する。次に、発光層28の上にチタン酸バリウム等の白色誘電粉末を樹脂中に分散させたインクを印刷し、反射絶縁層29を10〜20μmの厚さに形成する。次に、反射絶縁層29の上にカーボンインク等の導電ペーストを印刷し、裏面電極30を10〜20μmの厚さに形成する。次に、裏面電極30の上に絶縁性のインクを印刷し、保護層31を10〜20μmの厚さに形成する。その後、図2(b)に示すように、微粘着層フィルム23を薄膜透明導電フィルム26から剥ぎ取り、超薄型の電界発光灯20を得る。   As shown in FIG. 2A, the electroluminescent lamp 20 of the present invention has a thickness on a slightly adhesive film 23 in which a slightly adhesive layer 22 is formed on a transparent film 21 made of PET or the like having a thickness of 50 to 188 μm. A laminated film in which a thin film transparent conductive film 26 formed by vapor-depositing a transparent electrode 25 such as ITO is attached to a thin film transparent film 24 made of 10 to 35 μm of PET or the like is used as a base film 27. In the method of manufacturing the electroluminescent lamp 20, first, an ink in which a phosphor 28a obtained by activating zinc sulfide with copper and applying a moisture-proof coating on a base film 27 is dispersed in a resin 28b such as fluorine rubber is printed. Then, the light emitting layer 28 is formed to a thickness of 20 to 40 μm. Next, an ink in which a white dielectric powder such as barium titanate is dispersed in a resin is printed on the light emitting layer 28 to form the reflective insulating layer 29 with a thickness of 10 to 20 μm. Next, a conductive paste such as carbon ink is printed on the reflective insulating layer 29, and the back electrode 30 is formed to a thickness of 10 to 20 μm. Next, an insulating ink is printed on the back electrode 30, and the protective layer 31 is formed to a thickness of 10 to 20 μm. Thereafter, as shown in FIG. 2 (b), the slightly adhesive layer film 23 is peeled off from the thin transparent conductive film 26 to obtain an ultrathin electroluminescent lamp 20.

このように、本実施例の電界発光灯20は、基材に薄膜透明導電フィルム26を使用しており、透明電極25の厚さを数千Åと薄く出来るため、さらに厚さの薄い電界発光灯20を提供することができ、さらに透明電極25を印刷する必要がないため生産性を大きく向上させることができる。   As described above, the electroluminescent lamp 20 of the present embodiment uses the thin transparent conductive film 26 as the base material, and the thickness of the transparent electrode 25 can be reduced to several thousand mm. The lamp 20 can be provided, and the productivity can be greatly improved because there is no need to print the transparent electrode 25.

本実施例では透明電極25の材料にITOを蒸着した透明導電膜を用いたが、PEDOT等の有機ポリマーやITO、酸化アンチモン、酸化亜鉛等の導電粉末をコーティングしたものでも同様の効果が得られる。   In this embodiment, a transparent conductive film in which ITO is vapor-deposited is used as the material for the transparent electrode 25, but the same effect can be obtained by coating an organic polymer such as PEDOT or conductive powder such as ITO, antimony oxide, and zinc oxide. .

また、薄膜のフィルムに透明電極の蒸着やコーティングが困難な場合はPET等からなる透明フィルム21の上に微粘着層22を形成した微粘着フィルム23にPET等からなる薄膜透明フィルム24をあらかじめ貼り付けた積層フィルムの形態で蒸着やコーティングを施してもかまわない。   In addition, when it is difficult to deposit or coat a transparent electrode on a thin film, a thin transparent film 24 made of PET or the like is previously attached to a fine adhesive film 23 in which a fine adhesive layer 22 is formed on a transparent film 21 made of PET or the like. Vapor deposition or coating may be applied in the form of an attached laminated film.

本発明の電界発光灯によれば、基材フィルムとして微粘着フィルムと薄膜透明フィルムの二層構造品を用いることにより、製造時の取り扱いで不具合を引き起こすことがなく、しかも製造後容易に微粘着フィルムを薄膜透明フィルムから剥離できるので、薄膜透明フィルムを基材とした機械的な強度に優れた携帯電話のキー部照明に好適な超薄型の電界発光灯を容易に製造することができる。   According to the electroluminescent lamp of the present invention, by using a two-layer structure product of a slightly adhesive film and a thin transparent film as a base film, there is no problem in handling at the time of manufacture, and it can be easily adhered after manufacturing. Since the film can be peeled off from the thin transparent film, an ultra-thin electroluminescent lamp suitable for illumination of a key part of a cellular phone having excellent mechanical strength using the thin transparent film as a base material can be easily manufactured.

本発明の第1の実施例の電界発光灯及びその製造方法を説明する要部断面図Sectional drawing of the principal part explaining the electroluminescent lamp of 1st Example of this invention, and its manufacturing method 本発明の第2の実施例の電界発光灯及びその製造方法を説明する要部断面図Sectional drawing of the principal part explaining the electroluminescent lamp of 2nd Example of this invention, and its manufacturing method 従来の電界発光灯の要部断面図Cross-sectional view of the main parts of a conventional electroluminescent lamp 他の従来の電界発光灯の要部断面図Cross-sectional view of the main part of another conventional electroluminescent lamp

符号の説明Explanation of symbols

1 本発明の第1実施例の電界発光灯
2 透明フィルム
3 微粘着層
4 微粘着フィルム
5 薄膜透明フィルム
6 基材フィルム
7 透明電極
8 発光層
9 反射絶縁層
10 裏面電極
11 保護層
20 本発明の第2実施例の電界発光灯
21 透明フィルム
22 微粘着層
23 微粘着フィルム
24 薄膜透明フィルム
25 透明電極
26 透明導電フィルム
27 基材フィルム
28 発光層
29 反射絶縁層
30 裏面電極
31 保護層
40 従来の電界発光灯
41 離型基材
42 透明電極層
43 発光層
44 反射絶縁層
45 裏面電極
50 他の従来の電界発光灯
51 離型基材
52 透明絶縁層
53 透明電極層
54 発光層
55 反射絶縁層
56 裏面電極
DESCRIPTION OF SYMBOLS 1 Electroluminescent lamp of 1st Example of this invention 2 Transparent film 3 Slight adhesion layer 4 Slight adhesion film 5 Thin film transparent film 6 Base film 7 Transparent electrode 8 Light emitting layer 9 Reflective insulating layer 10 Back surface electrode 11 Protection layer 20 This invention Electroluminescent lamp 21 of the second embodiment 21 Transparent film 22 Slightly adhesive layer 23 Slightly adhesive film 24 Thin film transparent film 25 Transparent electrode 26 Transparent conductive film 27 Base film 28 Light emitting layer 29 Reflective insulating layer 30 Back electrode 31 Protective layer 40 Conventional Electroluminescent lamp 41 Release base 42 Transparent electrode layer 43 Light emitting layer 44 Reflective insulating layer 45 Back electrode 50 Other conventional electroluminescent lamp 51 Release base 52 Transparent insulating layer 53 Transparent electrode layer 54 Light emitting layer 55 Reflective insulation Layer 56 Back electrode

Claims (5)

透明電極と裏面電極の間に発光層と反射絶縁層が形成されてなる電界発光灯において、前記透明電極を支持する基材が厚さ10〜35μmの薄膜透明フィルムからなることを特徴とする電界発光灯。   An electroluminescent lamp comprising a light emitting layer and a reflective insulating layer formed between a transparent electrode and a back electrode, wherein the base material supporting the transparent electrode is a thin film transparent film having a thickness of 10 to 35 μm. Luminescent lamp. 前記透明電極が、酸化インジウム、酸化錫、酸化アンチモン、酸化亜鉛及び導電性高分子の少なくとも一種類以上を含む透明導電性材料からなることを特徴とする請求項1記載の電界発光灯。   The electroluminescent lamp according to claim 1, wherein the transparent electrode is made of a transparent conductive material containing at least one of indium oxide, tin oxide, antimony oxide, zinc oxide, and a conductive polymer. 前記透明電極が、印刷、蒸着及びコーティングのいずれかにより形成したことを特徴とする請求項2記載の電界発光灯。   The electroluminescent lamp according to claim 2, wherein the transparent electrode is formed by any one of printing, vapor deposition, and coating. 厚さ50〜188μmの透明フィルムの上に微粘着層を形成した微粘着フィルムに、厚さ10〜35μmの薄膜透明フィルムを貼り付けてなる二層構造の基材フィルム上に、透明電極、発光層、反射絶縁層、裏面電極、保護層を順次印刷形成し、乾燥固化後、前記微粘着フィルムを前記薄膜透明フィルムから剥離除去することを特徴とする電界発光灯の製造方法。   A transparent electrode and light emission on a base film having a two-layer structure in which a thin adhesive film having a thickness of 10 to 35 μm is pasted on a slightly adhesive film having a thin adhesive layer formed on a transparent film having a thickness of 50 to 188 μm. A method of manufacturing an electroluminescent lamp, wherein a layer, a reflective insulating layer, a back electrode, and a protective layer are sequentially printed and formed, and after drying and solidifying, the fine adhesive film is peeled off from the thin film transparent film. 厚さ50〜188μmの透明フィルムの上に微粘着層を形成した微粘着フィルムに、厚さ10〜35μmの薄膜透明フィルムに透明電極を形成した薄膜透明導電フィルムを貼り付けてなる二層構造の基材フィルム上に、発光層、反射絶縁層、裏面電極、保護層を順次印刷形成し、乾燥固化後、前記微粘着フィルムを前記薄膜透明導電フィルムから剥離除去することを特徴とする電界発光灯の製造方法。   It has a two-layer structure in which a thin film transparent conductive film in which a transparent electrode is formed on a thin film transparent film having a thickness of 10 to 35 μm is attached to a thin adhesive film in which a thin adhesive layer is formed on a transparent film having a thickness of 50 to 188 μm. An electroluminescent lamp characterized in that a light emitting layer, a reflective insulating layer, a back electrode, and a protective layer are sequentially printed on a base film, and after drying and solidifying, the fine adhesive film is peeled off from the thin film transparent conductive film. Manufacturing method.
JP2005074260A 2005-03-16 2005-03-16 Electroluminescent lamp and its manufacturing method Pending JP2006260862A (en)

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