JP2006252784A - Infrared uniform heating device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an infrared uniform heating device with a simple structure and a simple assembly work. <P>SOLUTION: This infrared uniform heating device comprises an infrared-heating mechanism part 1 housing an infrared lamp 2 and comprising a composite type reflecting mirror and a transparent quartz cylinder 3 condensing and transmitting infrared light generated by the infrared lamp 2. A uniform heating mechanism 10 wherein a notch recessed part 7 is formed in a central part is provided in an infrared emission end 3B of the transparent quartz cylinder 3. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to an infrared soaking apparatus used to heat a new material such as a silicon wafer in vacuum or various gas atmospheres at a high speed and with a uniform temperature distribution.

An infrared and soaking heat treatment apparatus that heats a disk-shaped material having a medium area of about 50φ at a high speed with a uniform temperature distribution is known (for example, Patent Document 1).
JP 2004-303672 A

  This known infrared soaking device is composed of a composite reflective mirror and an infrared lamp, and the composite reflective mirror is a combination of a hollow conical reflective mirror and a cylindrical reflective mirror. Infrared light that irradiates and heats the heated object, including straight light, reflected light that is reflected by the conical reflecting mirror, and obliquely reflected light that is reflected by the cylindrical reflecting mirror. A disk-shaped heat equalization mechanism is placed in the irradiation area of the laser, and the heated object is irradiated by uniformizing the infrared radiation intensity radiated in a horizontal direction with the infrared radiation radiated straight from the infrared lamp and reflected by the conical reflecting mirror. The whole object is heated substantially uniformly, and the disc-shaped soaking mechanism is a transparent support plate with a thin periphery, and the center soaking is thicker than the transparent support plate supported by this transparent support plate. From a disk A vacuum chamber provided with a transparent disk on the top is placed below the composite reflective mirror. A heated object is placed in the vacuum chamber, and infrared rays emitted from the infrared lamp are transmitted through the transparent disk. Then, the heated object is irradiated to heat the entire heated object to a substantially uniform temperature distribution, and a transparent cylinder is provided in the vacuum chamber so as to be fixed to the transparent disk.

  As described above, this known infrared soaking device is arranged in the infrared irradiation area to irradiate and heat the heated object, and a disk-like soaking mechanism is arranged to irradiate the heated object with uniform infrared radiation intensity, The entire heated product is heated substantially uniformly. Specifically, a thick central soaking disc supported by a transparent support plate with a thin periphery is placed between the lower part of the cylindrical reflection mirror of the composite reflection mirror and the upper cover of the vacuum chamber. The board is sandwiched and supported.

In the known infrared soaking device, as described above, the disc-like soaking mechanism is constituted by a thick central soaking disc supported by a transparent support plate having a thin periphery, and this disc-like soaking device is used. The heat mechanism is supported by sandwiching a thin transparent support plate between the lower part of the cylindrical reflection mirror of the composite reflection mirror and the upper cover of the vacuum chamber.
In this structure, a thin transparent support plate is provided around a thick central soaking disc, and the disc-like soaking mechanism having such a structure has no concreteness and is not feasible. Even if there is a possibility, the assembly work is troublesome.
Therefore, the present invention provides an infrared soaking device having a simpler structure and easier assembly work.

  For this purpose, the infrared soaking device of the present invention has an infrared lamp built-in, an infrared heating mechanism part composed of a composite reflection mirror, and a transparent quartz that condenses the infrared light generated by the infrared lamp and transmits and transmits the infrared light. An infrared soaking device comprising a cylinder is provided with a soaking mechanism formed by forming a notch recess at the center at the infrared emitting end of the transparent quartz cylinder.

In the infrared soaking device of the present invention, the notch recess of the soaking mechanism is formed directly on the infrared emitting end of the transparent quartz cylinder.
Further, the infrared soaking device of the present invention forms a notch recess at the center of one end of a short transparent quartz cylinder to form a soaking jig, and this soaking jig is attached to the infrared emission end of the transparent quartz. It will be.

  An infrared soaking device of the present invention includes an infrared heating mechanism unit including an infrared lamp and composed of a composite reflection mirror, and a transparent quartz cylinder that collects infrared rays generated by the infrared lamp and transmits and transmits the infrared rays. An infrared soaking device comprising the infrared emitting end of the transparent quartz cylinder is provided with a soaking mechanism formed by forming a notch recess in the center, so that it is emitted from the emitting end of the transparent quartz cylinder. The intensity of infrared rays reaching the heated object is such that the distance that the infrared rays emitted from the notch recess at the center of the emission end reaches the heated item is longer than the distance from the periphery of the emission end to the heated item. The strength is attenuated, the periphery and the center of the discharge end become uniform, and there is an effect that the heated object can be heated uniformly.

In addition, since the infrared soaking device of the present invention has the notch recess of the above soaking mechanism formed directly on the infrared emitting end of the transparent quartz cylinder, the apparatus of the present invention is provided only by processing the emitting end of the transparent quartz cylinder. There is an effect that can be done.
Further, the infrared soaking device of the present invention forms a notch recess at the center of one end of a short transparent quartz cylinder to form a soaking jig, and this soaking jig is attached to the infrared emission end of the transparent quartz. Therefore, it has an effect that it can be easily used by being attached to an existing infrared soaking device.

  FIG. 6 and FIG. 7 show a part of the infrared soaking apparatus of the different embodiments. These infrared soaking and heating devices incorporate an infrared lamp 2, condensing infrared rays generated by the infrared heating mechanism portion 1 composed of a composite reflection mirror and the infrared lamp 2, and transmitting and transmitting the infrared rays. It consists of a cylinder 3.

  In the embodiment shown in FIG. 6, the infrared heating mechanism unit 1 is constituted by a rotating ellipsoidal reflecting mirror, and this rotating ellipsoidal reflecting mirror is composed of the infrared radiation side 1/2 rotating ellipse reflecting mirror 4 and the infrared condensing side 1/2 rotation. The infrared ray generated by the infrared lamp 2 is composed of an elliptical reflection mirror 5, and the incident end 3 </ b> A of the transparent quartz cylinder 3 passes through the infrared radiation side ½ rotation reflection mirror 4 and the infrared light collection side ½ rotation reflection mirror 5. Enters the transparent quartz cylinder 3, transmits through the transparent quartz cylinder 3, emits from the discharge end 3B of the transparent quartz cylinder 3, and is placed in a vacuum chamber 6 in a vacuum or various gas atmospheres. P is irradiated.

  In the embodiment shown in FIG. 7, the infrared heating mechanism 1 is configured by combining a hollow conical reflecting mirror 14 located at the upper part and a hollow cylindrical reflecting mirror 15 connected to the conical reflecting mirror 14. It is. Then, infrared rays from the infrared lamp 2 provided at the center of the conical reflecting mirror 14 are incident on the transparent quartz cylinder 3 from the incident end 3A of the transparent quartz cylinder 3, and are transmitted through the transparent quartz cylinder 3, so that the transparent quartz cylinder 3 is transmitted. Is emitted from the discharge end 3B and irradiated with a heated object P placed in a vacuum chamber 6 in a vacuum or various gas atmospheres.

  The emission end of the transparent quartz cylinder 3 of the conventional infrared heating device was a flat surface as shown in FIG. For this reason, the amount of infrared radiation is different between the central portion and the peripheral portion of the transparent quartz cylinder 3, and the amount of infrared radiation emitted from the central portion of the transparent quartz cylinder 3 is larger than that of the peripheral portion. Therefore, as shown in the intensity distribution of the infrared irradiation shown in FIG.

In the present invention, as shown in FIG. 1, the infrared radiation emitting end 3 </ b> B of the transparent quartz column 3 is provided with a soaking mechanism 10 configured by forming a notch recess 7 in the center. For example, the diameter of the transparent quartz cylinder 3 is 20φ, the hole diameter of the notch recess 7 is 10φ, and the depth of the notch recess 7 is 10 mm.
The infrared rays generated by the infrared lamp 2 are transmitted from the incident end 3A to the emission end 3B with almost no attenuation within the transparent quartz cylinder 3, but the attenuation increases when emitted from the emission end 3B. Therefore, when the distance from the discharge end to the heated object is short, the attenuation is small, and when the distance is long, the attenuation is large.
In the case of the present invention, since the cutout recess 7 is formed in the central portion where the amount of infrared rays is large, the attenuation amount of infrared rays from the cutout recess 7 in the central portion increases, and the amount of infrared rays emitted from the emission end 3B. Are averaged.

  FIG. 2 shows another embodiment 2. In this embodiment, a notch recess 7 is formed at the center of one end of a short transparent quartz cylinder 13 to constitute a soaking device 11, and this soaking device 11 is attached to the discharge end 3 B of a normal transparent quartz cylinder 3. Installed and configured. The attachment means may be any known attachment means, but in the illustrated embodiment, a rising portion 16 is provided by raising the periphery of the upper portion of the short transparent quartz cylinder 13, and the transparent quartz is provided in the rising portion 16. The front ends of the cylinders 3 are fitted, and these are attached with quartz screws 7.

  In this way, as described above, the attenuation of the infrared rays emitted from the central portion of the emission end is increased, the intensity of the infrared radiation emitted from the emission end 3B is averaged as shown in FIG. Heat on average.

Explanatory drawing of the principal part of one Example of this invention infrared soaking apparatus. Explanatory drawing of the principal part of another Example similarly. The figure which shows intensity distribution of infrared irradiation of this invention infrared soaking apparatus. Explanatory drawing of the part of the conventional apparatus corresponded to the principal part of this invention apparatus. The figure which shows the intensity distribution of the infrared irradiation of the conventional apparatus shown in FIG. The cross-sectional front view which abbreviate | omitted and showed an example of the infrared soaking apparatus. Sectional front view which abbreviate | omitted and showed another example of the infrared soaking apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Infrared heating mechanism part 2 Infrared lamp 3 Transparent quartz cylinder 3A Incidence end 3B Emission end 4 Infrared radiation side 1/2 rotation ellipsoidal reflection mirror 5 Infrared light collection side 1/2 rotation ellipsoidal reflection mirror 6 Vacuum chamber 7 Notch recess 10 Soaking Mechanism 11 Heat equalizing device 13 Short transparent quartz cylinder 14 Conical reflection mirror 15 Cylindrical reflection mirror 16 Start-up part 17 Quartz screw P Heated object

Claims (3)

An infrared soaking device comprising an infrared heating mechanism having a built-in infrared lamp and composed of a composite reflection mirror and a transparent quartz cylinder that collects infrared rays generated by the infrared lamp and transmits and transmits infrared rays. An infrared heat equalizing heating device provided with a heat equalizing mechanism formed by forming a notch recess in the central portion at the infrared emission end of the transparent quartz cylinder. 2. The infrared soaking device according to claim 1, wherein the notch recess of the soaking mechanism is formed directly at the infrared emitting end of the transparent quartz cylinder. 2. The infrared ray according to claim 1, wherein a soaking jig is formed by forming a notch recess at the center of one end of the short transparent quartz cylinder, and the soaking jig is attached to the infrared emitting end of the transparent quartz cylinder. Soaking device.

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