JP2006228971A - Heating unit - Google Patents

Heating unit Download PDF

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JP2006228971A
JP2006228971A JP2005040939A JP2005040939A JP2006228971A JP 2006228971 A JP2006228971 A JP 2006228971A JP 2005040939 A JP2005040939 A JP 2005040939A JP 2005040939 A JP2005040939 A JP 2005040939A JP 2006228971 A JP2006228971 A JP 2006228971A
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heat transfer
light source
heating unit
light
heated
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JP4852852B2 (en
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Kiyoyuki Kaburagi
清幸 蕪木
Yoichi Mizukawa
洋一 水川
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Ushio Denki KK
Ushio Inc
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Ushio Denki KK
Ushio Inc
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a heating unit capable of effectively utilizing radiation from a heat transfer plate in the heating unit including a light source and the heat transfer unit. <P>SOLUTION: The heating unit includes the light source 1 and the heat transfer plate 4. In the heating unit, the heat transfer plate consists of a light transmissive holder 2 and a heat transfer member 3. As means for increasing radiation from the surface of the heat transfer member to an article to be heated, a surface 3A is subjected to diffusing surface processing to more increase a surface area than the rear surface 3B of the heat transfer member. The quantity of the radiation from the heat transfer member 3 heated by light from the light source is hereby increased. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

この発明は、半導体ウエハやディスプレイパネル等の基板の加熱処理、もしくは、ガラスやプラスチック等の加熱用の光照射式の加熱ユニットに関するものであり、特に、光源からの光を伝熱板に照射し、該伝熱板からの輻射により被加熱物を加熱する加熱ユニットに係わるものである。   The present invention relates to a light irradiation type heating unit for heating a substrate such as a semiconductor wafer or a display panel, or for heating glass or plastic, and in particular, irradiates a heat transfer plate with light from a light source. The present invention relates to a heating unit that heats an object to be heated by radiation from the heat transfer plate.

従来、半導体ウエハを処理するなどのプロセスにおいては、アニール処理、成膜処理、スパッタ処理等の各種の加熱処理が用いられている。また、ウエハ処理だけでなく、ディスプレイを製造するためのガラス基板処理プロセスにおいても加熱処理が行われている。   Conventionally, various processes such as annealing, film formation, and sputtering are used in processes such as processing semiconductor wafers. In addition to wafer processing, heat treatment is also performed in a glass substrate processing process for manufacturing a display.

このような加熱処理を行う加熱ユニットとしては、加熱処理を行うときに、ワーク表面の温度分布を均一になるように加熱するために、加熱源（光照射式加熱ユニットにおいてはランプ）とワークの間に、均熱板といわれる部材を設けたものが知られている。均熱板としては、熱伝導性のよい金属製やカーボン製のものが使用される。特開平７−１７２９９６号公報には、均熱板としてステンレス板を用いたものが開示されている。   As a heating unit for performing such a heat treatment, a heating source (a lamp in a light irradiation type heating unit) and a work piece are used to heat the work surface so that the temperature distribution on the work surface becomes uniform. A member provided with a so-called soaking plate is known. As the soaking plate, a metal or carbon plate having good thermal conductivity is used. Japanese Patent Application Laid-Open No. 7-172996 discloses one using a stainless steel plate as a soaking plate.

特開平７−１７２９９６号公報Japanese Patent Laid-Open No. 7-172996

ところで、この均熱板（伝熱板）を用いた加熱ユニットでは、外乱の影響を考慮して熱伝導率が高く、熱容量の大きな均熱板が用いられているが、反面で加熱源であるランプの出力変化への対応が鈍くなり、短時間での温度制御が困難になる。
このような観点から、加熱ユニットに用いられる均熱板は、熱容量が小さなものが望ましく、できるだけ薄い均熱板が求められる。 By the way, in the heating unit using the heat equalizing plate (heat transfer plate), a heat equalizing plate having a high thermal conductivity and a large heat capacity is used in consideration of the influence of disturbance, but on the other hand, it is a heating source. The response to changes in lamp output becomes dull, and temperature control in a short time becomes difficult.
From such a viewpoint, it is desirable that the heat equalizing plate used in the heating unit has a small heat capacity, and a heat equalizing plate that is as thin as possible is required.

しかしながら、薄い均熱板、例えば、厚さ３ｍｍといった金属製の均熱板を使用すると、熱容量が小さいが故に、均熱板の両面での温度差により熱歪が発生して反り（変形）が生じてくるという不具合がある。   However, if a thin heat equalizing plate, for example, a metal heat equalizing plate having a thickness of 3 mm is used, the heat capacity is small, so that thermal distortion occurs due to the temperature difference between the two surfaces of the heat equalizing plate and warpage (deformation) occurs. There is a defect that occurs.

また、均熱板としてカーボン板を用いると、高温での成形加工後の冷却時に、加工時の残留歪による反り（変形）が生じることがある。例えば、厚さ３ｍｍのカーボン製の均熱板で、長さ３００ｍｍに対して１ｍｍ程度の反りが生じる。   In addition, when a carbon plate is used as the soaking plate, warpage (deformation) due to residual strain during processing may occur during cooling after molding at high temperature. For example, a carbon soaking plate having a thickness of 3 mm warps about 1 mm for a length of 300 mm.

このような反り（変形）があると、均熱板と被加熱物であるワークとの間隔が一定でなくなり、均熱板からの熱がワークに不均一に伝熱されることになり、ワークの過熱が一様でなくなるという問題がある。   If there is such warping (deformation), the distance between the heat equalizing plate and the work to be heated is not constant, and the heat from the heat equalizing plate is transferred to the work non-uniformly. There is a problem that overheating is not uniform.

均熱板を用いた加熱ユニットのこれらの不具合を解消するものとして、発明者らは、特願２００３−３６４３９８号や特願２００４−４０７４４号を出願して、伝熱板を、光透過性保持体と、該保持体の表面に設けられ、光源からの光を吸収して発熱する伝熱体とから構成した加熱ユニットを提案している。   In order to solve these problems of the heating unit using the heat equalizing plate, the inventors filed Japanese Patent Application No. 2003-364398 and Japanese Patent Application No. 2004-40744 to hold the heat transfer plate with light transmittance. A heating unit is proposed that includes a body and a heat transfer body that is provided on the surface of the holding body and generates heat by absorbing light from a light source.

これらにより、伝熱体を薄くして加熱応答性を良くし、該伝熱体を光透過性保持体上に設けることにより、該伝熱体の反りなどの変形を抑止した伝熱ユニットを提供せんとするものである。   Thus, a heat transfer unit that suppresses deformation such as warpage of the heat transfer body by providing a thin heat transfer body to improve heat responsiveness and providing the heat transfer body on a light-transmissive holding body is provided. It is something to be done.

上記の出願により、加熱応答性が良く、伝熱体の変形がない伝熱板を供えた加熱ユニットを提案したが、本発明はこれらの提案加熱ユニットの改良に関するものである。
すなわち、これらの加熱ユニットにおいては、伝熱体からの輻射はその表面、即ち、被加熱物側表面から被加熱物に向けたものしか利用されておらず、裏面側、即ち、光源（ランプ）側表面側からの輻射が利用されていないので、光源のエネルギーが有効に利用されていない。 The above application has proposed a heating unit provided with a heat transfer plate having good heat responsiveness and no deformation of the heat transfer body, but the present invention relates to an improvement of these proposed heating units.
That is, in these heating units, the radiation from the heat transfer body is only used from the surface, that is, the surface to be heated to the object to be heated, and the back side, that is, the light source (lamp). Since the radiation from the side surface side is not used, the energy of the light source is not used effectively.

そこで、本発明の目的は、伝熱体から被加熱物側への輻射を増加させることにより、光源からの照射光のエネルギーを有効に利用することができる加熱ユニットを提供しようとするものである。   Therefore, an object of the present invention is to provide a heating unit that can effectively use the energy of irradiation light from a light source by increasing radiation from a heat transfer body to an object to be heated. .

この発明の第１の手段は、光源により伝熱板を照射し、該照射された伝熱板からの輻射により被加熱物を加熱する加熱ユニットにおいて、前記伝熱板が、光透過性を有する保持体と、該保持体の被加熱物側に設けられ、該保持体を透過した光を吸収して発熱する伝熱体とからなり、該伝熱体の被加熱物側表面が拡散面加工されていることを特徴とするものである。   According to a first means of the present invention, in the heating unit that irradiates the heat transfer plate with a light source and heats an object to be heated by radiation from the irradiated heat transfer plate, the heat transfer plate has light transmittance. A holding body and a heat transfer body that is provided on the heated object side of the holding body and absorbs light transmitted through the holding body to generate heat, and the heated object side surface of the heat transfer body has a diffusion surface processed It is characterized by being.

第２の手段は、前記伝熱板が、光透過性を有する保持体と、該保持体の被加熱物側に設けられ、該保持体を透過した光を吸収して発熱する伝熱体とからなり、前記保持体の光源側表面が鏡面加工されていることを特徴とするものである。   The second means is that the heat transfer plate has a light-transmitting holding body, a heat transfer body that is provided on the heated object side of the holding body and absorbs light transmitted through the holding body to generate heat. The light source side surface of the holding body is mirror-finished.

第３の手段は、前記伝熱板が、光透過性を有する保持体と、該保持体の被加熱物側に設けられ、該保持体を透過した光を吸収して発熱する伝熱体とからなり、前記伝熱体と光源の間に、光源からの光を透過させるとともに、伝熱体からの輻射光を反射する輻射反射層が設けられていることを特徴とするものである。   The third means is that the heat transfer plate has a light-transmitting holding body and a heat transfer body that is provided on the heated object side of the holding body and absorbs light transmitted through the holding body to generate heat. And a radiation reflecting layer for transmitting light from the light source and reflecting radiation from the heat transfer body is provided between the heat transfer body and the light source.

また、前記第３の手段において、前記輻射反射層が、前記保持体の下方に設けられていることを特徴とするものである。 In the third means, the radiation reflection layer is provided below the holding body.

また、前記第３の手段において、前記輻射反射層が、前記保持体のいずれか一方の表面に形成されていることを特徴とするものである。 In the third means, the radiation reflection layer is formed on one surface of the holding body.

更には、前記第２もしくは３の手段において、前記伝熱体の被加熱物側表面が拡散面加工されていることを特徴とするものである。   Further, in the second or third means, the surface to be heated of the heat transfer body is processed with a diffusion surface.

この発明の第１の手段によれば、被加熱物側表面が拡散面加工されているので、その表面積が裏面である光源側表面より大きくなり、該光源側表面からの輻射量に比べて該拡散面から被加熱物への有効輻射量が多くなり、光源からのエネルギーを有効に利用できる。 According to the first means of the present invention, since the surface to be heated is a diffusion surface processed, the surface area becomes larger than the light source side surface which is the back surface, and the amount of radiation from the light source side surface The amount of effective radiation from the diffusion surface to the object to be heated increases, and the energy from the light source can be used effectively.

第２の手段によれば、保持体下面を鏡面加工することにより、伝熱板から光源側への輻射の少なくとも一部が、反射され伝熱体側に戻されてこれを再加熱することにより、被加熱物への輻射量を増加することができる。 According to the second means, by mirror-finishing the lower surface of the holding body, at least a part of the radiation from the heat transfer plate to the light source side is reflected and returned to the heat transfer body side to reheat it, The amount of radiation to the object to be heated can be increased.

第３の手段によれば、光源光を透過し、伝熱体からの輻射を反射する輻射反射層により、光源側への輻射が反射され、伝熱体側に戻されてこれを再加熱することにより、被加熱物への輻射量を増加させることができる。 According to the third means, the radiation toward the light source is reflected by the radiation reflecting layer that transmits the light source light and reflects the radiation from the heat transfer body, and is returned to the heat transfer body side to reheat it. Thus, the amount of radiation to the object to be heated can be increased.

本発明の実施例を図１乃至第８図を用いて説明する。
図１は、本発明の実施例１に係る加熱ユニットの構成を示す断面図である。
図において、光源１がユニット本体５に複数本設けられている。該光源１は、例えば、ハロゲンランプ等の白熱ランプ、キセノンランプやメタルハライドランプ等の放電ランプなどである。本体５の光源１の上方には、前記光源１からの光を透過する保持体２と、その上面に設けられて、該保持体２を透過した光源１からの光を吸収して発熱する伝熱体３とからなる伝熱板４が設けられている。そして、半導体ウエハやガラス基板などの被加熱物６は該伝熱板４の上方に配置されている。 An embodiment of the present invention will be described with reference to FIGS.
FIG. 1 is a cross-sectional view illustrating a configuration of a heating unit according to Embodiment 1 of the present invention.
In the figure, a plurality of light sources 1 are provided in the unit main body 5. The light source 1 is, for example, an incandescent lamp such as a halogen lamp, a discharge lamp such as a xenon lamp or a metal halide lamp. Above the light source 1 of the main body 5, a holding body 2 that transmits light from the light source 1 and an upper surface thereof, which absorbs light from the light source 1 that has transmitted through the holding body 2 and generates heat. A heat transfer plate 4 composed of the heat body 3 is provided. A heated object 6 such as a semiconductor wafer or a glass substrate is disposed above the heat transfer plate 4.

前記保持体２は、石英ガラス、硼珪酸ガラス、焼結石英ガラス、アルミノ珪酸ガラス等のガラス、ガラスセラミック、透光性アルミナ、サファイア等から成る。これら素材は、金属やカーボングラファイトに比べて熱膨張係数が小さいので、変形が起こりにくく、化学的に堅牢で耐熱性に優れており、紫外域または可視域の光を透過し発熱が少ない。 The holding body 2 is made of glass such as quartz glass, borosilicate glass, sintered quartz glass, and aluminosilicate glass, glass ceramic, translucent alumina, sapphire, and the like. Since these materials have a smaller coefficient of thermal expansion than metals and carbon graphite, they do not easily deform, are chemically robust and have excellent heat resistance, transmit light in the ultraviolet region or visible region, and generate less heat.

また、伝熱体３はダイアモンドライクカーボン（ＤＬＣ）、酸化クロム等の金属酸化物、窒化アルミニウムや窒化ボロン等の窒化物、炭化珪素、珪化モリブデン等のシリサイド、などから成る。または、モリブデン、クロム、カーボン等を含有した諸ガラスや諸セラミックスから成る。これら素材は、化学的に堅牢で耐熱性に優れており、紫外域から可視域の光を遮断して発熱し、熱伝導率が高い。 The heat transfer body 3 is made of diamond-like carbon (DLC), a metal oxide such as chromium oxide, a nitride such as aluminum nitride or boron nitride, a silicide such as silicon carbide or molybdenum silicide, and the like. Or it consists of various glass and various ceramics containing molybdenum, chromium, carbon, etc. These materials are chemically robust and excellent in heat resistance, generate heat by blocking light from the ultraviolet region to the visible region, and have high thermal conductivity.

前記保持体２への伝熱体３の形成（コーティング等）は、ダイアモンドライクカーボン（ＤＬＣ）の場合はＣＶＤにより、また、金属酸化物、窒化物、炭化珪素の場合は、塗布・焼成やプラズマ溶射、印刷等により、そして、シリサイドの場合は、ＣＶＤ、スパッタ、あるいは蒸着後に加熱して形成する。ＣＶＤ、塗布、溶射、印刷、スパッタ、蒸着を利用すると、保持体２に多少の凹凸があった場合でも、伝熱体３の厚さを所望の厚さに制御して形成することができる。   Formation (coating, etc.) of the heat transfer body 3 on the holding body 2 is performed by CVD in the case of diamond-like carbon (DLC), and in the case of metal oxide, nitride, or silicon carbide, coating / firing or plasma. It is formed by thermal spraying, printing, etc., and in the case of silicide, it is formed by heating after CVD, sputtering or vapor deposition. When CVD, coating, thermal spraying, printing, sputtering, and vapor deposition are used, the heat transfer body 3 can be formed by controlling the thickness of the heat transfer body 3 to a desired thickness even if the holding body 2 has some unevenness.

図２は詳細部分図で、前記伝熱体３の上面、即ち、被加熱物６側の表面３Ａを拡散面加工してある。一般に物体からの輻射量は、その表面積に比例するところ、上記拡散面加工により、該表面３Ａの表面積は、裏面、即ち、光源１側の表面３Ｂより増大する。その結果、光源１から保持体２を透過してきた光により加熱される伝熱体３からの輻射は、下方、即ち、光源１側への輻射量より、上方、即ち、被加熱物６側への輻射量が増大する。そのため、光源１からの照射エネルギーがより有効に利用できる。   FIG. 2 is a detailed partial view, wherein the upper surface of the heat transfer body 3, that is, the surface 3A on the heated object 6 side is processed with a diffusion surface. In general, the amount of radiation from an object is proportional to the surface area, but the surface area of the surface 3A is increased from the back surface, that is, the surface 3B on the light source 1 side by the diffusion surface processing. As a result, the radiation from the heat transfer body 3 heated by the light transmitted from the light source 1 through the holding body 2 is lower, that is, higher than the radiation amount toward the light source 1 side, that is, toward the heated object 6 side. The amount of radiation increases. Therefore, the irradiation energy from the light source 1 can be used more effectively.

上記の伝熱体３の上面３Ａの拡散面加工としては、機械的な粗研磨加工やフロスト加工、切削加工、または、化学的なエッチング加工などにより表面に凹凸を形成するものであればよい。そして、その凹凸形状としては、図３に示すように種々の形状であってよい。図３（Ａ）は、山形の凸部７Ａを多数形成したものであり、図３（Ｂ）は連続凸状部７Ｂを形成したものであり、図３（ｃ）は多数の凹部７Ｃを形成したものである。   The diffusion surface processing of the upper surface 3A of the heat transfer body 3 may be any method that forms irregularities on the surface by mechanical rough polishing processing, frost processing, cutting processing, chemical etching processing, or the like. And as the uneven | corrugated shape, as shown in FIG. 3, various shapes may be sufficient. 3A shows a large number of mountain-shaped convex portions 7A, FIG. 3B shows a continuous convex portion 7B, and FIG. 3C shows a large number of concave portions 7C. It is a thing.

図４は異なる実施例２の詳細部分図で、保持体２の下面、即ち、光源１側の表面２Ｂを鏡面加工してある。該鏡面加工した表面２Ｂの面粗さ（Ｒａ）は、輻射光の波長λより小さな値とする。こうすることにより、加熱された伝熱体３から輻射される輻射光のうち、一定の入射角以上の輻射光は該鏡面で全反射して伝熱体３方向に戻され、該伝熱体３を再加熱する。そして、その上表面３Ａから被加熱物６に輻射される。
これにより、伝熱体３の下面３Ｂから下方への輻射光の少なくとも一部を被加熱物６側に戻すことにより、有効利用することができる。 FIG. 4 is a detailed partial view of a second embodiment in which the lower surface of the holding body 2, that is, the surface 2B on the light source 1 side is mirror-finished. The surface roughness (Ra) of the mirror-finished surface 2B is set to a value smaller than the wavelength λ of the radiation light. By doing this, among the radiant light radiated from the heated heat transfer body 3, the radiant light having a certain incident angle or more is totally reflected by the mirror surface and returned to the heat transfer body 3 direction. Reheat 3. And it is radiated | emitted to the to-be-heated material 6 from the upper surface 3A.
Thereby, at least a part of the radiation light downward from the lower surface 3 </ b> B of the heat transfer body 3 can be effectively used by returning it to the heated object 6 side.

図５は他の実施例３の詳細部分図で、伝熱板４の保持体２の下方、即ち、光源１側の下方に輻射反射層１０を設けてある。該輻射反射層１０は、光源１からの光は透過し、伝熱体３からの輻射光は反射するような多層膜反射層からなっている。光源１からの入射光は、光源１がハロゲンランプの場合、図６に示すようにタングステンフィラメントの色温度が、２２００Ｋを越えると、２.５μｍ以上の波長域の放射は少なくなる。一方、伝熱体３からの輻射光は、図７に示すように２.５μｍ以上の波長域のスペクトルである。
従って、輻射反射層１０は、これらの両スペクトルを考慮して、２．０〜２．５μｍの領域以下の波長の光を透過し、該領域以上の波長の光を反射するような特性をもつものであればよく、このような条件を満たす多層膜の構成素材としては、Ａｌ２Ｏ３、ＳｉＯ、ＳｉＯ２、ＭｇＦ２、ＡｌＦ３などの低屈折材と、ＴｉＯ２、Ｔａ２Ｏ５、Ｓｉ、ＺｒＯ２、Ｙ２Ｏ３などの高屈折材から選択された材料の組み合わせで得られる。 FIG. 5 is a detailed partial view of another embodiment 3, in which a radiation reflection layer 10 is provided below the holder 2 of the heat transfer plate 4, that is, below the light source 1 side. The radiation reflection layer 10 is formed of a multilayer film reflection layer that transmits light from the light source 1 and reflects radiation light from the heat transfer body 3. When the light source 1 is a halogen lamp, the incident light from the light source 1 emits less in the wavelength region of 2.5 μm or more when the color temperature of the tungsten filament exceeds 2200 K as shown in FIG. On the other hand, the radiation from the heat transfer body 3 has a spectrum in a wavelength region of 2.5 μm or more as shown in FIG.
Therefore, the radiation reflection layer 10 has such characteristics that it transmits light having a wavelength of 2.0 to 2.5 μm or less and reflects light having a wavelength of more than this region in consideration of both of these spectra. Any material can be used as long as it satisfies such conditions, and examples of the constituent material for the multilayer film include low refractive materials such as Al 2 O 3 , SiO, SiO 2 , MgF 2 , and AlF 3 , TiO 2 , Ta 2 O 5 , It is obtained by a combination of materials selected from high refractive materials such as Si, ZrO 2 and Y 2 O 3 .

上記実施例３においては、前記図４の実施例２と同様に、加熱された伝熱体３から下方に向う輻射光を輻射反射層１０によって伝熱体３方向に戻し、これを再加熱する。こうして、光源１により加熱された伝熱体３からの輻射光を有効に利用することができる。   In the third embodiment, as in the second embodiment of FIG. 4, the radiation light directed downward from the heated heat transfer body 3 is returned to the heat transfer body 3 by the radiation reflection layer 10 and reheated. . Thus, the radiant light from the heat transfer body 3 heated by the light source 1 can be used effectively.

なお、上記輻射反射層１０の透過波長の特性を光源１としてハロゲンランプを用いた場合のスペクトルで説明したが、他のランプ、例えばキセノンランプやメタルハライドランプの場合であっても、２．０〜２．５μｍの領域以下の波長の光を透過する特性であれば、これらのランプからの放射光に対してもその殆どを透過することになり、実用上まったく問題はない。   The transmission wavelength characteristics of the radiation reflection layer 10 have been described in the spectrum when a halogen lamp is used as the light source 1. However, even in the case of other lamps such as a xenon lamp and a metal halide lamp, 2.0 to If it is a characteristic that transmits light having a wavelength of 2.5 μm or less, most of the light emitted from these lamps is transmitted, and there is no practical problem.

ところで、上記実施例３においては、輻射反射層１０を伝熱板４の下方に配置したものを示したが、これに限られない。
図８に他の実施形態を示し、図８（Ａ）に示すものでは、輻射反射層１０は、保持体２の上面、即ち、保持体２と伝熱体３の間に設けられている。
また、図８（Ｂ）に示すものでは、輻射反射層１０は、伝熱板４の保持体２の下面に設けられている。
これら図８に示すいずれの輻射反射層１０も、前記図５に示すものと同様の多層膜からなるものである。 By the way, in the said Example 3, although what has arrange | positioned the radiation reflection layer 10 under the heat exchanger plate 4 was shown, it is not restricted to this.
FIG. 8 shows another embodiment, and in the structure shown in FIG. 8A, the radiation reflection layer 10 is provided on the upper surface of the holding body 2, that is, between the holding body 2 and the heat transfer body 3.
8B, the radiation reflection layer 10 is provided on the lower surface of the holding body 2 of the heat transfer plate 4. As shown in FIG.
Any of these radiation reflecting layers 10 shown in FIG. 8 is made of a multilayer film similar to that shown in FIG.

これらの輻射反射層１０が、前記図５の輻射反射層１０と同様の機能を奏することは容易に理解できるであろう。
即ち、輻射反射層１０は、伝熱体３から光源１方向への輻射を再度伝熱体３に戻すものであればよく、伝熱体３と光源１の間に設けられていればよい。 It will be easily understood that these radiation reflecting layers 10 have the same function as the radiation reflecting layer 10 of FIG.
That is, the radiation reflection layer 10 may be any layer as long as it returns radiation from the heat transfer body 3 toward the light source 1 to the heat transfer body 3 again, and may be provided between the heat transfer body 3 and the light source 1.

なお、本発明の伝熱板の実施例において、伝熱体は、保持体の上表面に形成された構成について説明してきたが、特願２００４−４０７４４号で示すように、伝熱体と保持体との間に間隙子を設けた構成でも良い。本構成においては、輻射光の反射の機能は、保持体の上表面に持たせることが好ましい。 In addition, in the Example of the heat exchanger plate of this invention, although the heat exchanger has demonstrated the structure formed in the upper surface of a holding body, as shown in Japanese Patent Application No. 2004-40744, it holds with a heat exchanger. The structure which provided the gap | interval between the bodies may be sufficient. In this configuration, it is preferable that the upper surface of the holder has a function of reflecting radiation.

また、上記各実施例においては、加熱ユニットは上向きに照射し、被加熱物６は該加熱ユニットの上方に配置するものとして説明したが、これに限られないことは勿論であり、加熱ユニットが下向き、或いは、横向きなど任意の向きであってよく、被加熱物６はその加熱ユニットの伝熱板４に対向配置されていればよい。 Further, in each of the above embodiments, the heating unit is irradiated upward, and the article 6 to be heated is disposed above the heating unit. However, the present invention is not limited to this. It may be in any direction such as downward or sideward, and the object to be heated 6 only needs to be disposed opposite to the heat transfer plate 4 of the heating unit.

以上のように、本発明においては、光源と伝熱板を供えた加熱ユニットにおいて、伝熱板を、光源光を透過する保持体と、その上面に設けた伝熱体とにより構成し、該伝熱体の上面を拡散面加工し、あるいは、保持体の下面を鏡面加工し、あるいは、伝熱体と光源の間に輻射反射層を設けたことにより、光源により加熱された伝熱体から被加熱物側へ輻射される輻射光を増大させることができるので、光源からの照射エネルギーを有効に利用して加熱処理ができるという優れた効果を奏するものである。   As described above, in the present invention, in the heating unit provided with the light source and the heat transfer plate, the heat transfer plate is constituted by the holding body that transmits the light source light and the heat transfer body provided on the upper surface thereof, From the heat transfer body heated by the light source by processing the diffusion surface on the upper surface of the heat transfer body, mirror-finishing the lower surface of the holding body, or providing a radiation reflection layer between the heat transfer body and the light source Since the radiant light radiated to the object to be heated can be increased, an excellent effect that the heat treatment can be performed by effectively using the irradiation energy from the light source is achieved.

この発明の実施例１の全体図。BRIEF DESCRIPTION OF THE DRAWINGS FIG. この発明の実施例１の詳細部分図。1 is a detailed partial view of Embodiment 1 of the present invention. （Ａ）（Ｂ）（Ｃ）この発明の実施例１の実施形態の部分図。(A) (B) (C) The partial figure of embodiment of Example 1 of this invention. この発明の実施例２の詳細部分図。The detailed fragmentary diagram of Example 2 of this invention. この発明の実施例３の詳細部分図。FIG. 5 is a detailed partial view of Embodiment 3 of the present invention. 光源（ハロゲンランプ）のスペクトル。Spectrum of light source (halogen lamp). 伝熱体の発光スペクトル。The emission spectrum of the heat transfer body. （Ａ）（Ｂ）実施例３の他の実施形態の詳細部分図。(A) (B) The detail fragmentary figure of other embodiment of Example 3. FIG.

符号の説明Explanation of symbols

１ 光源
２ 保持体
３ 伝熱体
４ 伝熱板
５ ユニット本体
６ 被加熱物
１０ 輻射反射層



DESCRIPTION OF SYMBOLS 1 Light source 2 Holding body 3 Heat transfer body 4 Heat transfer plate 5 Unit main body 6 Heated object 10 Radiation reflection layer



Claims (6)

光源により伝熱板を照射し、該照射された伝熱板からの伝熱により被加熱物を加熱する加熱ユニットにおいて、
前記伝熱板が、光透過性を有する保持体と、該保持体の被加熱物側に設けられ、該保持体を透過した光を吸収して発熱する伝熱体とからなり、
該伝熱体の被加熱物側表面が拡散面加工されていることを特徴とする加熱ユニット。 In a heating unit that irradiates a heat transfer plate with a light source and heats an object to be heated by heat transfer from the irradiated heat transfer plate,
The heat transfer plate is composed of a holder having light permeability, and a heat transfer body that is provided on the heated object side of the holder and absorbs light transmitted through the holder to generate heat.
A heating unit characterized in that a surface to be heated of the heat transfer body has a diffusion surface processed. 光源により伝熱板を照射し、該照射された伝熱板からの伝熱により被加熱物を加熱する加熱ユニットにおいて、
前記伝熱板が、光透過性を有する保持体と、該保持体の被加熱物側に設けられ、該保持体を透過した光を吸収して発熱する伝熱体とからなり、
前記保持体の光源側表面が鏡面加工されていることを特徴とする加熱ユニット。 In a heating unit that irradiates a heat transfer plate with a light source and heats an object to be heated by heat transfer from the irradiated heat transfer plate,
The heat transfer plate is composed of a holder having light permeability, and a heat transfer body that is provided on the heated object side of the holder and absorbs light transmitted through the holder to generate heat.
A heating unit, wherein the light source side surface of the holder is mirror-finished. 光源により伝熱板を照射し、該照射された伝熱板からの伝熱により被加熱物を加熱する加熱ユニットにおいて、
前記伝熱板が、光透過性を有する保持体と、該保持体の被加熱物側に設けられ、該保持体を透過した光を吸収して発熱する伝熱体とからなり、
前記伝熱体と光源の間に、光源からの光を透過させるとともに、伝熱体からの輻射光を反射する輻射反射層が設けられていることを特徴とする加熱ユニット。 In a heating unit that irradiates a heat transfer plate with a light source and heats an object to be heated by heat transfer from the irradiated heat transfer plate,
The heat transfer plate is composed of a holder having light permeability, and a heat transfer body that is provided on the heated object side of the holder and absorbs light transmitted through the holder to generate heat.
A heating unit, wherein a radiation reflection layer is provided between the heat transfer body and the light source to transmit light from the light source and to reflect radiation light from the heat transfer body. 前記輻射反射層が、前記保持体より光源側に設けられていることを特徴とする請求項３に記載の加熱ユニット。 The heating unit according to claim 3, wherein the radiation reflection layer is provided on a light source side with respect to the holding body. 前記輻射反射層が、前記保持体のいずれか一方の表面に形成されていることを特徴とする請求項３に記載の加熱ユニット。 The heating unit according to claim 3, wherein the radiation reflection layer is formed on one surface of the holding body. 前記伝熱体の被加熱物側表面が拡散面加工されていることを特徴とする請求項２乃至５に記載の加熱ユニット。

The heating unit according to any one of claims 2 to 5, wherein a surface to be heated of the heat transfer body is subjected to diffusion surface processing.

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