JP2006228781A - Method for manufacturing resistance element for incorporating component - Google Patents

Method for manufacturing resistance element for incorporating component Download PDF

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JP2006228781A
JP2006228781A JP2005037338A JP2005037338A JP2006228781A JP 2006228781 A JP2006228781 A JP 2006228781A JP 2005037338 A JP2005037338 A JP 2005037338A JP 2005037338 A JP2005037338 A JP 2005037338A JP 2006228781 A JP2006228781 A JP 2006228781A
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laser
manufacturing
resistance element
resistor
trimming
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JP4645221B2 (en
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Tatsuhiro Okano
達広 岡野
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Toppan Inc
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Toppan Printing Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a resistance element for preventing the resistance element whose resistance value has been adjusted by trimming incorporated in a substrate from varying by heating due to reflow caused by the lamination process of a multilayer interconnection board and the packaging of packaging components in a later process. <P>SOLUTION: In the manufacturing method of the resistance element for incorporating components, the resistance element arranged at a wiring board incorporated inside the substrate or on the outermost layer is irradiated with laser beams having output for preventing the resistance element from being damaged by using a laser trimming apparatus, and then the resistance element is trimmed by laser beams whose output has been increased. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、内部に抵抗素子を有するプリント配線板において、絶縁基板上へ一対の電極とその間に配置された抵抗体からなる抵抗素子を内蔵したプリント配線板の製造方法に係るものであり、特に、従来の方法より、抵抗体の精度が高く、熱による変動の少ない抵抗素子の製造方法に係わる。 The present invention relates to a printed wiring board having a resistance element therein, and relates to a method of manufacturing a printed wiring board having a built-in resistance element composed of a pair of electrodes and a resistor disposed therebetween on an insulating substrate. The present invention relates to a method of manufacturing a resistance element with higher accuracy of the resistor and less fluctuation due to heat than the conventional method.

近年、携帯電話やデジタルカメラ等の機器の小型化と軽量化が進むにつれて、プリント配線板に実装する抵抗、キャパシタ、インダクタ等の受動素子は、小型化やこれら素子同士の間隔の微細化といった、従来の実装技術では対応が難しくなっており、これら課題に対応可能な構成として、受動素子をプリント配線板内に内蔵した多層プリント配線基板が挙げられる。
この受動素子をプリント配線板内に内蔵した多層プリント配線基板は、受動素子(キャパシタ、抵抗、インダクタ)として、既存のチップ素子を埋め込むことにより、機器メーカーが必要とする特性を比較的容易に満たすことができるが、受動素子を内蔵した基板が厚くなってしまうという問題点がある。
そこで薄い部品や薄膜素子で十分な特性を満たすことができる受動素子を内蔵したプリント配線基板が求められている。
In recent years, as devices such as mobile phones and digital cameras have become smaller and lighter, passive elements such as resistors, capacitors, and inductors mounted on printed wiring boards have been downsized and the spacing between these elements has been reduced. Conventional mounting techniques make it difficult to cope with, and as a configuration that can cope with these problems, a multilayer printed wiring board in which a passive element is built in a printed wiring board can be cited.
Multilayer printed wiring boards with passive elements built into the printed wiring board can easily satisfy the characteristics required by equipment manufacturers by embedding existing chip elements as passive elements (capacitors, resistors, inductors). However, there is a problem in that the substrate containing the passive element becomes thick.
Therefore, a printed wiring board incorporating a passive element that can satisfy sufficient characteristics with a thin component or a thin film element is required.

受動素子を内蔵したプリント配線基板において、プリント配線板内部に抵抗素子を作りこむ方法としては、例えば、抵抗素子の場合、銅箔上に金属薄膜で抵抗層を形成する方法、絶縁基板上にめっきで形成する方法、抵抗性の厚膜ポリマーを印刷する方法などがある。この抵抗素子は、抵抗値、精度、形状、価格などから用途に応じて形成方法を選択していく必要がある。
具体的には、基板上に抵抗素子を形成した後に、抵抗値を調整するためにレーザー加工を用いたトリミングという手法が用いるのが一般的である。
まず、トリミングは、形成した抵抗素子の抵抗値を測定しながらレーザー加工によって抵抗体部分を切断し、目的の抵抗値まで抵抗を切断上昇させるものである。現在、トリミングによって抵抗値の精度は、目的値に対して±3%の精度まで調整することが可能である。
トリミングの手法には、特許文献1のように抵抗体を切断するだけではなく、加熱によって抵抗値を調整する方法もあるが、しかし、この方法だけでは、後工程の多層配線基板の積層工程や実装部品の実装時にかかるリフローによる加熱により、再度抵抗値が変化してしまうという問題があった。
特願平4−95350号公報
In a printed wiring board with a built-in passive element, as a method of creating a resistance element inside the printed wiring board, for example, in the case of a resistance element, a method of forming a resistance layer with a metal thin film on a copper foil, plating on an insulating substrate And a method of printing a resistive thick film polymer. It is necessary to select a forming method for this resistance element according to the use from the resistance value, accuracy, shape, price, and the like.
Specifically, a technique called trimming using laser processing is generally used to adjust the resistance value after a resistance element is formed on a substrate.
First, trimming is to cut a resistor portion by laser processing while measuring the resistance value of the formed resistance element, and to cut the resistance up to a target resistance value. At present, it is possible to adjust the accuracy of the resistance value to ± 3% accuracy with respect to the target value by trimming.
As a trimming technique, there is a method of adjusting a resistance value not only by cutting a resistor as in Patent Document 1, but also by heating. There has been a problem that the resistance value changes again due to heating by reflow when mounting the mounting component.
Japanese Patent Application No. 4-95350

本発明の目的は、基板内に内蔵したトリミングによって抵抗値を調整した抵抗素子が、後工程の、多層配線基板の積層工程や実装部品の実装時にかかるリフローによる加熱によって変動しない抵抗素子の製造方法を提供することである。   An object of the present invention is to provide a resistance element manufacturing method in which a resistance element whose resistance value is adjusted by trimming incorporated in a substrate does not fluctuate due to heating by reflow applied in a subsequent step of laminating a multilayer wiring board or mounting a mounting component Is to provide.

まず、請求項1に記載の発明は、基板内部あるいは最外層に内蔵する配線基板に配置する抵抗素子を、レーザートリミング装置を用い、前記抵抗素子がダメージを受けない出力のレーザービームを抵抗素子に照射した後、出力を上昇させたレーザービームにより抵抗素子をトリミングすることを特徴とする部品内蔵用抵抗素子の製造方法である。 First, the invention according to claim 1 uses a laser trimming apparatus as a resistance element disposed on a wiring board built in the substrate or in the outermost layer, and uses a laser beam with an output that does not damage the resistance element as a resistance element. After the irradiation, the resistance element is trimmed with a laser beam whose output is increased.

請求項2に記載の発明は、前記抵抗素子は、ダメージを受けない出力のレーザービームを照射した部分の温度が、100℃〜1200℃の範囲であることを特徴とする、請求項1記載に部品内蔵用抵抗素子の製造方法である。 According to a second aspect of the present invention, in the first aspect, the resistance element has a temperature of a portion irradiated with a laser beam having an output that is not damaged in a range of 100 ° C. to 1200 ° C. This is a manufacturing method of a component built-in resistor.

請求項3に記載の発明は、前記レーザービームは、ダメージを受けない出力のレーザービームのスポット径が、トリミング時のスポット径よりも大きくしたことを特徴とする、請求項1または2記載の部品内蔵用抵抗素子の製造方法である。 The invention according to claim 3 is the component according to claim 1 or 2, wherein the laser beam has a spot diameter of an output laser beam not damaged is larger than a spot diameter at the time of trimming. This is a method of manufacturing a built-in resistance element.

請求項4に記載の発明は、前記レーザーが、YAGレーザーまたは炭酸ガスレーザーを用いたことを特徴とする、請求項1乃至3のいずれかに記載の部品内蔵用抵抗素子の製造方法である。 The invention described in claim 4 is the method of manufacturing a component built-in resistor element according to any one of claims 1 to 3, wherein the laser is a YAG laser or a carbon dioxide gas laser.

請求項5に記載の発明は、前記抵抗素子が、カーボンフィラーと有機樹脂の混合体であることを特徴とする、請求項1乃至4のいずれかに記載の部品内蔵用抵抗素子の製造方法である。 According to a fifth aspect of the present invention, in the method for manufacturing a component built-in resistance element according to any one of the first to fourth aspects, the resistive element is a mixture of a carbon filler and an organic resin. is there.

請求項6に記載の発明は、前記抵抗素子が、ニッケル、クロム、タングステンのいずれかを含む金属箔からなることを特徴とする、請求項1乃至4のいずれかに記載の部品内蔵用抵抗素子の製造方法である。 The invention according to claim 6 is characterized in that the resistance element is made of a metal foil containing any one of nickel, chromium and tungsten. It is a manufacturing method.

請求項7に記載の発明は、前記レーザー照射を、窒素、ヘリウム、ネオン、アルゴンの少なくともいずれかを含む不活性ガスを吹きつけながら行うことを特徴とする、請求項1乃至6のいずれかに記載の部品内蔵用抵抗素子の製造方法である。 The invention according to claim 7 is characterized in that the laser irradiation is performed while blowing an inert gas containing at least one of nitrogen, helium, neon, and argon. It is a manufacturing method of the resistor element for built-in description of description.

請求項1の発明のように、トリミングを行う前に抵抗素子を加熱することにより、抵抗体を多層基板の積層プロセスや部品実装時のリフロー時にかかる熱履歴よる、トリミング後の抵抗値変化を抑えることができた。 As in the first aspect of the present invention, the resistance element is heated before trimming, thereby suppressing a change in resistance value after trimming due to a heat history applied to the resistor during the reflow process during the multilayer substrate lamination process or component mounting. I was able to.

請求項2の発明のように、トリミングを行う前に抵抗素子を、抵抗体を多層基板の積層プロセスや部品実装時のリフロー時にかかる熱履歴よりも高い温度に加熱することで、トリミング後の抵抗値変化をより効果的に抑えることができた。 As in the invention of claim 2, before trimming, the resistance element is heated to a temperature higher than the thermal history applied during the reflow process during the multi-layer substrate laminating process or component mounting. The value change could be suppressed more effectively.

請求項3の発明のように、抵抗素子を加熱させる場合に、レーザースポット径をトリミング時よりも大きくすることで、加熱面積大きく採れ、抵抗素子全体を加熱する場合の時間を短時間に処理することを可能とした。 When heating the resistance element as in the third aspect of the invention, the laser spot diameter is made larger than that at the time of trimming so that the heating area can be increased, and the time for heating the entire resistance element is processed in a short time. Made it possible.

また、請求項4の発明のように、トリミング用のレーザーにYAGレーザーあるいは炭酸ガスレーザーを用いることで、効率良く抵抗素子を加熱できると同時に、トリミングのレーザーのランニングコストも抑えることができた。 Further, as in the invention of claim 4, by using a YAG laser or a carbon dioxide gas laser as a trimming laser, the resistance element can be efficiently heated, and at the same time, the running cost of the trimming laser can be suppressed.

また、請求項6の発明のように、加熱による抵抗変化が著しい金属箔を用いた抵抗素子で、特に有効であった。 Further, as in the sixth aspect of the present invention, the resistance element using a metal foil whose resistance change due to heating is remarkable is particularly effective.

請求項7の発明のように、抵抗素子をレーザー照射で加熱する最に窒素、ヘリウム、ネオン、アルゴンのいずれかを含む不活性ガスを吹きつけながら加熱することで、抵抗体の熱による燃焼や基板への熱ダメージを軽減することができる。また、金属箔抵抗では加熱時の表面酸化を防止することができる効果がある。   As in the seventh aspect of the invention, when the resistance element is heated by laser irradiation while being heated while blowing an inert gas containing any of nitrogen, helium, neon and argon, Thermal damage to the substrate can be reduced. In addition, the metal foil resistor has an effect of preventing surface oxidation during heating.

本発明の配線基板の抵抗素子の製造方法を、図に従って説明する。
本発明の部品内蔵用抵抗素子の製造方法は、図1(a)のように、抵抗体20を形成した後に、トリミング装置のレーザースポットを拡大し、抵抗素子が加工されないエネルギーまでビーム出力を低下させ加熱用レーザービーム30をスキャニングし、前記抵抗体20の全面に照射する。
この抵抗体に照射した部分の温度が、100℃〜1200℃の範囲で、以降の工程でる、抵抗体を多層基板の積層プロセスや部品実装時のリフロー時にかかる熱履歴よりも高い温度に加熱することが好ましい。
次に、抵抗体20が十分加熱された後に、レーザースポットをトリミングするスポット径に戻したトリミング用レーザービーム40を、抵抗値を測定しながら所望の抵抗値になるように切断調整し調整抵抗体20aを形成する。
なお、加熱用レーザービーム照射時には、窒素、ヘリウム、ネオン、アルゴン等の不活性ガスを吹きつけて、レーザー照射部以外の熱ダメージを抑えるとともに、抵抗体20の熱による酸化を防止した。
抵抗体20は、カーボンフィラーと有機樹脂の混合体、またはニッケル、クロム、タングステンのいずれかを含む金属箔からなる。
トリミング後に多層配線基板の積層工程や実装部品の実装時に使用するリフローなどの加熱によって抵抗値が変化しない部品内蔵用抵抗素子の製造が可能となった。
A method for manufacturing a resistance element of a wiring board according to the present invention will be described with reference to the drawings.
As shown in FIG. 1A, the manufacturing method of the component built-in resistor element of the present invention expands the laser spot of the trimming device after the resistor 20 is formed, and reduces the beam output to an energy at which the resistor element is not processed. The heating laser beam 30 is scanned to irradiate the entire surface of the resistor 20.
When the temperature of the portion irradiated to the resistor is in the range of 100 ° C. to 1200 ° C., the resistor is heated to a temperature higher than the heat history applied during the reflow process during the multi-layer substrate lamination process or component mounting in the subsequent steps. It is preferable.
Next, after the resistor 20 is sufficiently heated, the trimming laser beam 40 that has been returned to the spot diameter for trimming the laser spot is cut and adjusted so as to obtain a desired resistance value while measuring the resistance value, and the adjusting resistor 20a is formed.
At the time of irradiation with the heating laser beam, an inert gas such as nitrogen, helium, neon, and argon was blown to suppress thermal damage other than the laser irradiation portion and prevent oxidation of the resistor 20 due to heat.
The resistor 20 is made of a mixture of a carbon filler and an organic resin, or a metal foil containing nickel, chromium, or tungsten.
It has become possible to manufacture a component built-in resistance element in which the resistance value does not change due to heating such as a reflow process used for mounting a multilayer wiring board or mounting components after trimming.

以下、実施例1について図1を用いて説明する。
図1(a)の抵抗素子は、無電解ニッケルめっきによって配線基板の電極22上に形成された抵抗体20である。この抵抗体の膜厚は、0.5μmの厚みで形成されており、抵抗体20の大きさは、幅が、0.2mm、長さが、0.4mmで、抵抗値は、約400オームを示している。
この抵抗体20を、YAGレーザーを用いたトリミング装置で、通常のトリミング時にはレーザーのスポット径が、40μmφであるが、抵抗体を図1(b)のように加熱するためにスポット径を80μm〜100μmに設定しビームエネルギーを2Wで照射した。
抵抗体20全体を加熱するため、加熱用レーザービーム30をスキャンさせ、抵抗体20全体をピーク温度が280℃に達するまで加熱した。
なお、加熱用レーザービーム照射時には、窒素ガスを吹きつけて、レーザー照射部以外の熱ダメージを抑えるとともに、抵抗体20の熱による酸化を防止した。
この加熱によって抵抗値は低下し、400Ωであった抵抗値が、50〜100Ω程度まで低下した。
抵抗体20の加熱が完了した後、図1(c)のように、レーザースポット径を40μmφに戻し、ビームエネルギーを2.5Wに引き上げたトリミング用レーザービーム40により、抵抗体両端の電極部に抵抗測定用のプローブを落とし、抵抗値を測定しながら抵抗値が120Ωになるまでレーザートリミングによって切断し調整した。
このトリミング後の調整抵抗体は、抵抗値が120オーム±3%の範囲で調整することができた。
この方法でトリミングした抵抗素子は、多層配線基板の工程で絶縁層を積層する際、175℃、2時間の熱履歴がかかったが、その場合でも抵抗値変化は、1%程度であった。
また、鉛フリーのハンダ実装時に、260℃のリフローをかけても抵抗値変化は、3%以内に抑えることができた。
Hereinafter, Example 1 will be described with reference to FIG.
1A is a resistor 20 formed on an electrode 22 of a wiring board by electroless nickel plating. The thickness of the resistor is 0.5 μm, the size of the resistor 20 is 0.2 mm in width, 0.4 mm in length, and the resistance value is about 400 ohms. Is shown.
The resistor 20 is a trimming apparatus using a YAG laser, and the spot diameter of the laser is 40 μmφ during normal trimming. However, in order to heat the resistor as shown in FIG. The beam energy was set at 100 μm and irradiated with 2 W.
In order to heat the entire resistor 20, the heating laser beam 30 was scanned, and the entire resistor 20 was heated until the peak temperature reached 280 ° C.
During the heating laser beam irradiation, nitrogen gas was blown to suppress thermal damage other than the laser irradiation portion and to prevent oxidation of the resistor 20 due to heat.
This heating lowered the resistance value, and the resistance value, which was 400Ω, decreased to about 50 to 100Ω.
After the heating of the resistor 20 is completed, as shown in FIG. 1C, the laser spot diameter is returned to 40 μmφ, and the trimming laser beam 40 with the beam energy raised to 2.5 W is applied to the electrode portions at both ends of the resistor. The probe for resistance measurement was dropped, and it was cut and adjusted by laser trimming until the resistance value became 120Ω while measuring the resistance value.
The trimming adjustment resistor was able to be adjusted within a resistance value range of 120 ohms ± 3%.
The resistance element trimmed by this method took a thermal history of 175 ° C. for 2 hours when an insulating layer was laminated in the process of the multilayer wiring board, but even in that case, the resistance value change was about 1%.
In addition, when lead-free solder was mounted, the resistance value change could be suppressed to 3% or less even when reflowing at 260 ° C. was applied.

以下、実施例2について、図2を用いて説明する。
図2(a)の抵抗素子は、カーボンペーストのスクリーン印刷によって配線基板の電極上に形成された抵抗体を用い、配線電極22と抵抗体20の間に、接触抵抗を低減するために銀ペーストを同様にスクリーン印刷により設けた銀ペースト層24が形成されている。
この抵抗体20の膜厚は、20μmの厚みで形成されており、大きさは、幅が0.4mm、長さが0.7mmで、抵抗値は、約1KΩ示している。
次に、この抵抗体20を、YAGレーザーを用いたトリミング装置で、通常のトリミング時にはレーザーのスポット径が40μmφであるが、抵抗体を加熱するためにスポット径を80μm〜100μmに設定し、ビームエネルギーを1.8Wで照射した。
抵抗体20全体を加熱するため、図2(b)に示すように、加熱用レーザービーム30をスキャンさせ、抵抗体20全体を、ピーク温度280℃に達するまで加熱した。
加熱時のレーザービーム照射時には、窒素ガスを吹きつけて、レーザー照射部以外の熱ダメージを抑えた。加熱によって抵抗値は低下し、1KΩであった抵抗値が、800〜900Ω程度まで低下した。
抵抗体20の加熱が完了した後、図2(c)に示すように、レーザースポット径を40μmφに戻し、ビームエネルギーを2.5Wに引き上げたトリミング用レーザービーム40を用いて、抵抗体両端の電極部に抵抗測定用のプローブを落とし、抵抗値を測定しながら抵抗値が、再度1KΩになるまでレーザートリミングによって切断し、調整抵抗体20aを作成した。
トリミング後の調整抵抗体は、抵抗値1KΩ±3%の範囲で調整することができた。
この方法でトリミングした抵抗素子は、多層配線基板の工程で絶縁層を積層する場合に この方法でトリミングした抵抗素子は、多層配線基板の工程で絶縁層を積層する際、175℃、2時間の熱履歴がかかったが、その場合でも抵抗値変化は、1%程度であった。
また、鉛フリーのハンダ実装時に、260℃のリフローをかけても抵抗値変化は、5%以内に抑えることができた。
Hereinafter, Example 2 will be described with reference to FIG.
2A uses a resistor formed on an electrode of a wiring board by screen printing of carbon paste, and a silver paste for reducing contact resistance between the wiring electrode 22 and the resistor 20 is used. Similarly, a silver paste layer 24 provided by screen printing is formed.
The resistor 20 has a thickness of 20 μm, a width of 0.4 mm, a length of 0.7 mm, and a resistance value of about 1 KΩ.
Next, the resistor 20 is a trimming apparatus using a YAG laser, and the spot diameter of the laser is 40 μmφ during normal trimming. The spot diameter is set to 80 μm to 100 μm to heat the resistor, and the beam The energy was irradiated at 1.8W.
In order to heat the entire resistor 20, the heating laser beam 30 was scanned as shown in FIG. 2B, and the entire resistor 20 was heated until the peak temperature reached 280 ° C.
At the time of laser beam irradiation during heating, nitrogen gas was blown to suppress thermal damage other than the laser irradiation part. The resistance value decreased by heating, and the resistance value, which was 1 KΩ, decreased to about 800 to 900Ω.
After the heating of the resistor 20 is completed, as shown in FIG. 2C, the laser spot diameter is returned to 40 μmφ, and the trimming laser beam 40 with the beam energy raised to 2.5 W is used. A resistance measurement probe was dropped on the electrode part, and the resistance value was measured and then cut by laser trimming until the resistance value became 1 KΩ again, thereby producing an adjustment resistor 20a.
The trimming adjustment resistor could be adjusted within a resistance value range of 1 KΩ ± 3%.
The resistance element trimmed by this method is used when the insulating layer is laminated in the process of the multilayer wiring board. The resistance element trimmed by this method is 175 ° C. for 2 hours when the insulating layer is laminated in the process of the multilayer wiring board. Although a heat history was applied, the resistance value change was about 1% even in that case.
In addition, when lead-free solder mounting was performed, the resistance value change could be suppressed to within 5% even when reflowing at 260 ° C. was applied.

(比較例1)
抵抗素子は、無電解Ni−P−Feめっきによって配線基板の電極22上に形成された金属抵抗体である。この抵抗体の膜厚は、0.3μmの厚みで形成されており、抵抗体20の大きさは、幅が、0.2mm、長さが、0.4mmで、抵抗値は、この抵抗体を、YAGレーザーを用いたトリミング装置で、加熱処理を行わずにレーザースポット径を40μmφ、ビームエネルギーを2.5Wリミング用レーザービーム40により、抵抗体両端の電極部に抵抗測定用のプローブを落とし、抵抗値を測定しながら抵抗値が1KΩ±3%の範囲なるようにレーザートリミングによって切断し調整した。
この抵抗素子は、多層配線基板の工程で絶縁層を積層する際、175℃、2時間の熱履歴がかかったため、抵抗値が40%に低下した。
(Comparative Example 1)
The resistance element is a metal resistor formed on the electrode 22 of the wiring board by electroless Ni—P—Fe plating. The film thickness of this resistor is 0.3 μm, the size of the resistor 20 is 0.2 mm in width, 0.4 mm in length, and the resistance value is This is a trimming device using a YAG laser, with a laser spot diameter of 40 μmφ and a beam energy of 2.5 W rimming laser beam 40 without performing heat treatment, and a resistance measurement probe is dropped on the electrodes at both ends of the resistor. While measuring the resistance value, it was cut and adjusted by laser trimming so that the resistance value was in the range of 1 KΩ ± 3%.
This resistive element had a resistance value of 40% because a thermal history of 175 ° C. for 2 hours was applied when an insulating layer was laminated in the multilayer wiring board process.

(比較例2)
実施例2において、加熱処理を行わないで、レーザートリミングし、抵抗値1KΩ±3%の範囲で調整した調整抵抗体した。
この調整抵抗体は、鉛フリーのハンダ実装時に、260℃のリフローをかけると、抵抗値変化は、5%以上であった。
(Comparative Example 2)
In Example 2, an adjustment resistor was prepared by laser trimming without performing heat treatment and adjusting the resistance value within a range of 1 KΩ ± 3%.
When this adjustment resistor was subjected to reflow at 260 ° C. during lead-free solder mounting, the resistance value change was 5% or more.

本発明を製造方法の一例を示す説明図。Explanatory drawing which shows an example of the manufacturing method of this invention. 本発明を製造方法の他の例を示す説明図。Explanatory drawing which shows the other example of the manufacturing method of this invention.

符号の説明Explanation of symbols

10・・・・・・・・・ 配線電極
20・・・・・・・・・ 抵抗体
20a・・・・・・・・・調整抵抗体
30・・・・・・・・・ 加熱用レーザービーム
40・・・・・・・・・ トリミング用レーザービーム
10... Wiring electrode 20... Resistor 20 a... Adjustment resistor 30. Beam 40 ... Laser beam for trimming

Claims (7)

基板内部あるいは最外層に内蔵する配線基板に配置する抵抗素子を、レーザートリミング装置を用い、前記抵抗素子がダメージを受けない出力のレーザービームを抵抗素子に照射し、加熱した後、出力を上昇させたレーザービームにより抵抗素子をトリミングすることを特徴とする部品内蔵用抵抗素子の製造方法。   Using a laser trimming device, the resistive element placed on the wiring board built in the substrate or on the outermost layer is irradiated with a laser beam with an output that does not damage the resistive element. After heating, the output is increased. A method for manufacturing a component-embedded resistor element, wherein the resistor element is trimmed with a laser beam. 前記抵抗素子は、ダメージを受けない出力のレーザービームを照射した部分の温度が、100℃〜1200℃の範囲であることを特徴とする、請求項1記載に部品内蔵用抵抗素子の製造方法。   2. The method of manufacturing a component built-in resistance element according to claim 1, wherein the temperature of a portion irradiated with the laser beam having an output not damaged is in a range of 100 ° C. to 1200 ° C. 3. 前記レーザービームは、ダメージを受けない出力のレーザービームのスポット径が、トリミング時のスポット径よりも大きくしたことを特徴とする、請求項1または2記載の部品内蔵用抵抗素子の製造方法。   3. The method of manufacturing a component built-in resistor element according to claim 1, wherein the laser beam has a spot diameter of an output laser beam that is not damaged and larger than a spot diameter at the time of trimming. 前記レーザーが、YAGレーザーまたは炭酸ガスレーザーを用いたことを特徴とする、請求項1乃至3のいずれかに記載の部品内蔵用抵抗素子の製造方法。   4. The method for manufacturing a component built-in resistor element according to claim 1, wherein the laser is a YAG laser or a carbon dioxide gas laser. 前記抵抗素子が、カーボンフィラーと有機樹脂の混合体であることを特徴とする、請求項1乃至4のいずれかに記載の部品内蔵用抵抗素子の製造方法。   The method for manufacturing a component built-in resistor element according to any one of claims 1 to 4, wherein the resistor element is a mixture of a carbon filler and an organic resin. 前記抵抗素子が、ニッケル、クロム、タングステンのいずれかを含む金属箔からなることを特徴とする、請求項1乃至3のいずれかに記載の部品内蔵用抵抗素子の製造方法。   The method of manufacturing a component built-in resistor element according to claim 1, wherein the resistor element is made of a metal foil containing any one of nickel, chromium, and tungsten. 前記レーザー照射を、窒素、ヘリウム、ネオン、アルゴンの少なくともいずれかを含む不活性ガスを吹きつけながら行うことを特徴とする請求項1乃至5のいずれかに記載の部品内蔵用抵抗素子の製造方法。   6. The method of manufacturing a component built-in resistance element according to claim 1, wherein the laser irradiation is performed while blowing an inert gas containing at least one of nitrogen, helium, neon, and argon. .
JP2005037338A 2005-02-15 2005-02-15 Manufacturing method of resistance element for built-in component Expired - Fee Related JP4645221B2 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8142597B2 (en) 2007-09-19 2012-03-27 Nippon Mektron, Ltd. Method for manufacturing a printed-wiring board having a resistive element

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51113148A (en) * 1975-03-31 1976-10-06 Hitachi Ltd Laser trimming method
JPH0258309A (en) * 1988-08-24 1990-02-27 Hitachi Ltd Method and apparatus for trimming resistance value
JPH02214672A (en) * 1989-02-15 1990-08-27 Hitachi Ltd Manufacture of thick-film thermal head
JPH11150011A (en) * 1997-11-18 1999-06-02 Sumitomo Metal Mining Co Ltd Formation of thick film resistor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51113148A (en) * 1975-03-31 1976-10-06 Hitachi Ltd Laser trimming method
JPH0258309A (en) * 1988-08-24 1990-02-27 Hitachi Ltd Method and apparatus for trimming resistance value
JPH02214672A (en) * 1989-02-15 1990-08-27 Hitachi Ltd Manufacture of thick-film thermal head
JPH11150011A (en) * 1997-11-18 1999-06-02 Sumitomo Metal Mining Co Ltd Formation of thick film resistor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8142597B2 (en) 2007-09-19 2012-03-27 Nippon Mektron, Ltd. Method for manufacturing a printed-wiring board having a resistive element

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