JP2006173434A - Wiring board, and semiconductor device, and its manufacturing method - Google Patents

Wiring board, and semiconductor device, and its manufacturing method Download PDF

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JP2006173434A
JP2006173434A JP2004365628A JP2004365628A JP2006173434A JP 2006173434 A JP2006173434 A JP 2006173434A JP 2004365628 A JP2004365628 A JP 2004365628A JP 2004365628 A JP2004365628 A JP 2004365628A JP 2006173434 A JP2006173434 A JP 2006173434A
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resin layer
semiconductor device
wiring board
opening
manufacturing
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JP4692719B2 (en
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Yoshiharu Ogata
義春 尾形
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Seiko Epson Corp
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Seiko Epson Corp
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    • H—ELECTRICITY
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    • H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
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    • H01L2224/10—Bump connectors; Manufacturing methods related thereto
    • H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161—Disposition
    • H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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    • H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
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    • H01L2224/16227—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the bump connector connecting to a bond pad of the item
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    • H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321—Disposition
    • H01L2224/32135—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/32145—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
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    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481—Disposition
    • H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
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    • H01L2224/732—Location after the connecting process
    • H01L2224/73201—Location after the connecting process on the same surface
    • H01L2224/73203—Bump and layer connectors
    • H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
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    • H01L2224/732—Location after the connecting process
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    • H01L2224/732—Location after the connecting process
    • H01L2224/73251—Location after the connecting process on different surfaces
    • H01L2224/73265—Layer and wire connectors
    • H—ELECTRICITY
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    • H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/04—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
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    • H01L2225/06503—Stacked arrangements of devices
    • H01L2225/06555—Geometry of the stack, e.g. form of the devices, geometry to facilitate stacking
    • H01L2225/06558—Geometry of the stack, e.g. form of the devices, geometry to facilitate stacking the devices having passive surfaces facing each other, i.e. in a back-to-back arrangement
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    • H01L2924/102—Material of the semiconductor or solid state bodies
    • H01L2924/1025—Semiconducting materials
    • H01L2924/10251—Elemental semiconductors, i.e. Group IV
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    • H01L2924/151—Die mounting substrate
    • H01L2924/153—Connection portion
    • H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
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  • Engineering & Computer Science (AREA)
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  • Wire Bonding (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a wiring board which makes it possible to manufacture a reliable semiconductor device easily, and to provide the reliable semiconductor device and its manufacturing method. <P>SOLUTION: The wiring board comprises a base substrate 10, a wiring pattern 20 formed on the base substrate 10, and a resin layer 30 which partially covers the wiring pattern 20. The resin layer 30 contains two or more separated portions 32 in corner areas 44 which are within the smallest rectangle 40 surrounding the resin layer 30 and are outside a circle or ellipse which touches the rectangle 40 internally. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、配線基板、半導体装置及びその製造方法に関する。   The present invention relates to a wiring board, a semiconductor device, and a manufacturing method thereof.

配線パターンと、配線パターンの少なくとも一部を覆う樹脂層とを有する配線基板が知られている。また、配線基板と半導体チップとを、接着剤を介して接着することが知られている。シート状の接着剤を利用する場合、信頼性の高い半導体装置を製造するためには、接着剤と樹脂層との間に気泡が入らないように、接着剤を設ける事が好ましい。   A wiring substrate having a wiring pattern and a resin layer covering at least a part of the wiring pattern is known. It is also known to bond a wiring board and a semiconductor chip via an adhesive. In the case of using a sheet-like adhesive, it is preferable to provide an adhesive so that air bubbles do not enter between the adhesive and the resin layer in order to manufacture a highly reliable semiconductor device.

本発明の目的は、信頼性の高い半導体装置を容易に製造することが可能な配線基板、信頼性の高い半導体装置及びその製造方法を提供することにある。
特開平１０−２３３４６３号公報 An object of the present invention is to provide a wiring board, a highly reliable semiconductor device, and a method for manufacturing the same that can easily manufacture a highly reliable semiconductor device.
JP-A-10-233463

（１）本発明に係る配線基板は、ベース基板と、
前記ベース基板に設けられた配線パターンと、
前記配線パターンを部分的に覆う樹脂層と、
を含み、
前記樹脂層は、前記樹脂層を囲む最も小さい矩形の内側であって前記矩形に内接する円又は楕円よりも外側の角部領域内に、２つ以上の離れた部分を有する。本発明によると、接着シートを、樹脂層との間にボイドが発生しないように設けることができる。そのため、接着層を、配線基板と密着性が高くなるように形成することができるため、信頼性の高い電子部品を製造することが可能になる。
（２）この配線基板において、
開口を有する第２の樹脂層をさらに有し、
前記樹脂層は、前記開口の内側の領域に配置されていてもよい。
（３）この配線基板において、
前記第２の樹脂層の前記開口は、前記ベース基板の面と平行に拡がる溝部を有してもよい。
（４）この配線基板において、
前記第２の樹脂層の前記開口は矩形をなし、
前記第２の樹脂層は、前記開口に連通する凹部を有してもよい。
（５）本発明に係る半導体装置は、ベース基板と、前記ベース基板に設けられた、複数の電気的接続部を有する配線パターンと、前記電気的接続部を避けて配置された、前記配線パターンを部分的に覆う樹脂層とを含む配線基板と、
複数の電極を有し、それぞれの前記電極がいずれかの前記電気的接続部と対向するように前記配線基板に搭載された半導体チップと、
前記配線基板と前記半導体チップとの間に配置されて、両者を接着する接着層と、
を含み、
前記樹脂層は、前記樹脂層を囲む最も小さい矩形の内側であって前記矩形に内接する円又は楕円よりも外側の角部領域内に、２つ以上の離れた部分を有する。本発明によると、樹脂層と接着層との密着性の高い、信頼性の高い半導体装置を提供することができる。
（６）この半導体装置において、
前記配線基板は、開口を有する第２の樹脂層をさらに含み、
前記樹脂層は、前記開口の内側の領域に配置されていてもよい。
（７）この半導体装置において、
前記第２の樹脂層の前記開口は、前記ベース基板の面と平行に拡がる溝部を有してもよい。
（８）この半導体装置において、
前記第２の樹脂層の前記開口は矩形をなし、
前記第２の樹脂層は、前記開口に連通する凹部を有してもよい。
（９）本発明に係る半導体装置の製造方法は、ベース基板と、前記ベース基板に設けられた、複数の電気的接続部を有する配線パターンと、前記電気的接続部を避けて配置された、前記配線パターンを部分的に覆う樹脂層とを含む配線基板を用意すること、
前記配線基板に、接着シートを、前記樹脂層を覆うように設けること、
複数の電極を有する半導体チップを、それぞれの前記電極がいずれかの前記電気的接続部と対向するように前記配線基板に搭載して、前記電極と前記電気的接続部とを電気的に接続すること、及び、
前記接着シートを利用して、前記配線基板と前記半導体チップとの間に、両者を接着する接着層を形成することを含み、
前記樹脂層は、前記樹脂層を囲む最も小さい矩形の内側であって前記矩形に内接する円又は楕円よりも外側の角部領域内に、２つ以上の離れた部分を有する。本発明によると、接着層を、樹脂層との密着性が高くなるように形成することができるため、信頼性の高い半導体装置を製造することができる。
（１０）この半導体装置の製造方法において、
前記配線基板は、開口を有する第２の樹脂層をさらに含み、
前記樹脂層は、前記開口の内側の領域に配置されていてもよい。
（１１）この半導体装置の製造方法において、
前記第２の樹脂層の前記開口は、前記ベース基板の面と平行に拡がる溝部を有し、
前記接着シートを、前記溝部と部分的にオーバーラップするように設けてもよい。
（１２）この半導体装置の製造方法において、
前記第２の樹脂層の前記開口は矩形をなし、
前記第２の樹脂層は、前記開口に連通する凹部を有し、
前記接着シートを、前記凹部と部分的にオーバーラップするように設けてもよい。
（１３）この半導体装置の製造方法において、
前記接着シートを設ける工程は、前記接着シートを前記配線基板に向かって押圧することを含んでもよい。 (1) A wiring substrate according to the present invention includes a base substrate,
A wiring pattern provided on the base substrate;
A resin layer partially covering the wiring pattern;
Including
The resin layer has two or more separated portions in a corner region inside the smallest rectangle surrounding the resin layer and outside a circle or ellipse inscribed in the rectangle. According to this invention, an adhesive sheet can be provided so that a void may not generate | occur | produce between resin layers. Therefore, since the adhesive layer can be formed so as to have high adhesion to the wiring substrate, a highly reliable electronic component can be manufactured.
(2) In this wiring board,
A second resin layer having an opening;
The resin layer may be disposed in a region inside the opening.
(3) In this wiring board,
The opening of the second resin layer may have a groove that extends parallel to the surface of the base substrate.
(4) In this wiring board,
The opening of the second resin layer is rectangular,
The second resin layer may have a recess that communicates with the opening.
(5) A semiconductor device according to the present invention includes a base substrate, a wiring pattern provided on the base substrate having a plurality of electrical connection portions, and the wiring pattern disposed so as to avoid the electrical connection portions. A wiring board including a resin layer partially covering
A semiconductor chip that has a plurality of electrodes and is mounted on the wiring board such that each of the electrodes faces one of the electrical connection portions;
An adhesive layer disposed between the wiring board and the semiconductor chip and bonding them;
Including
The resin layer has two or more separated portions in a corner region inside the smallest rectangle surrounding the resin layer and outside a circle or ellipse inscribed in the rectangle. According to the present invention, a highly reliable semiconductor device with high adhesion between the resin layer and the adhesive layer can be provided.
(6) In this semiconductor device,
The wiring board further includes a second resin layer having an opening,
The resin layer may be disposed in a region inside the opening.
(7) In this semiconductor device,
The opening of the second resin layer may have a groove that extends parallel to the surface of the base substrate.
(8) In this semiconductor device,
The opening of the second resin layer is rectangular,
The second resin layer may have a recess that communicates with the opening.
(9) In the method for manufacturing a semiconductor device according to the present invention, a base substrate, a wiring pattern having a plurality of electrical connection portions provided on the base substrate, and the electrical connection portions are disposed. Preparing a wiring board including a resin layer partially covering the wiring pattern;
Providing an adhesive sheet on the wiring board so as to cover the resin layer;
A semiconductor chip having a plurality of electrodes is mounted on the wiring board such that each of the electrodes faces any one of the electrical connection portions, and the electrodes and the electrical connection portions are electrically connected. And
Using the adhesive sheet, forming an adhesive layer between the wiring substrate and the semiconductor chip to bond them;
The resin layer has two or more separated portions in a corner region inside the smallest rectangle surrounding the resin layer and outside a circle or ellipse inscribed in the rectangle. According to the present invention, since the adhesive layer can be formed so as to have high adhesion with the resin layer, a highly reliable semiconductor device can be manufactured.
(10) In this method of manufacturing a semiconductor device,
The wiring board further includes a second resin layer having an opening,
The resin layer may be disposed in a region inside the opening.
(11) In this method of manufacturing a semiconductor device,
The opening of the second resin layer has a groove that extends parallel to the surface of the base substrate,
The adhesive sheet may be provided so as to partially overlap the groove.
(12) In this method of manufacturing a semiconductor device,
The opening of the second resin layer is rectangular,
The second resin layer has a recess communicating with the opening,
The adhesive sheet may be provided so as to partially overlap the concave portion.
(13) In this method of manufacturing a semiconductor device,
The step of providing the adhesive sheet may include pressing the adhesive sheet toward the wiring board.

以下、本発明を適用した実施の形態について図面を参照して説明する。ただし、本発明は以下の実施の形態に限定されるものではない。また、以下に説明する実施の形態及び変形例の内容は、いずれかを組み合わせて適用してもよい。   Embodiments to which the present invention is applied will be described below with reference to the drawings. However, the present invention is not limited to the following embodiments. Further, the contents of the embodiments and modifications described below may be applied in combination.

（第１の実施の形態）
図１（Ａ）〜図５は、本発明を適用した第１の実施の形態に係る半導体装置の製造方法について説明するための図である。 (First embodiment)
FIG. 1A to FIG. 5 are diagrams for explaining a method of manufacturing a semiconductor device according to the first embodiment to which the present invention is applied.

本実施の形態に係る半導体装置の製造法は、配線基板１を用意することを含む。以下、配線基板１の構成について説明する。なお、図１（Ａ）〜図２は、配線基板１の構成について説明するための図である。図１（Ａ）は、配線基板１の平面図である。図１（Ｂ）は、図１（Ａ）のIＢ−IＢ線断面図であり、図１（Ｃ）は、図１（Ａ）のIC−IC線断面の一部拡大図である。また、図２は、樹脂層３０の平面形状を説明するための図である。   The method for manufacturing a semiconductor device according to the present embodiment includes preparing the wiring board 1. Hereinafter, the configuration of the wiring board 1 will be described. 1A to 2 are diagrams for explaining the configuration of the wiring board 1. FIG. FIG. 1A is a plan view of the wiring board 1. 1B is a cross-sectional view taken along the line IB-IB in FIG. 1A, and FIG. 1C is a partially enlarged view taken along the line IC-IC in FIG. FIG. 2 is a diagram for explaining the planar shape of the resin layer 30.

配線基板１は、図１（Ａ）〜図１（Ｃ）に示すように、ベース基板１０を含む。ベース基板１０の材料や構造は特に限定されず、既に公知となっているいずれかの基板を利用してもよい。ベース基板１０は、フレキシブル基板であってもよく、リジッド基板であってもよい。ベース基板１０は、積層型の基板であってもよく、あるいは、単層の基板であってもよい。ベース基板１０は、有機系又は無機系のいずれの材料で構成されていてもよく、これらの複合構造からなるものであってもよい。ベース基板１０として、例えばポリエチレンテレフタレート（ＰＥＴ）からなる基板又はフィルムを使用してもよい。あるいは、ベース基板１０としてポリイミド樹脂からなるフレキシブル基板を使用してもよい。フレキシブル基板としてFPC(Flexible Printed Circuit)や、TAB(Tape Automated Bonding)技術で使用されるテープを使用してもよい。また、無機系の材料から形成されたベース基板１０として、例えばセラミックス基板やガラス基板が挙げられる。有機系及び無機系の材料の複合構造として、例えばガラスエポキシ基板が挙げられる。ベース基板１０の外形も特に限定されるものではない。   The wiring substrate 1 includes a base substrate 10 as shown in FIGS. 1 (A) to 1 (C). The material and structure of the base substrate 10 are not particularly limited, and any known substrate may be used. The base substrate 10 may be a flexible substrate or a rigid substrate. The base substrate 10 may be a laminated substrate or a single layer substrate. The base substrate 10 may be composed of any organic or inorganic material, or may be composed of a composite structure thereof. As the base substrate 10, for example, a substrate or a film made of polyethylene terephthalate (PET) may be used. Alternatively, a flexible substrate made of a polyimide resin may be used as the base substrate 10. As the flexible substrate, a tape used in FPC (Flexible Printed Circuit) or TAB (Tape Automated Bonding) technology may be used. Examples of the base substrate 10 formed from an inorganic material include a ceramic substrate and a glass substrate. An example of a composite structure of organic and inorganic materials is a glass epoxy substrate. The external shape of the base substrate 10 is not particularly limited.

配線基板１は、図１（Ａ）及び図１（Ｂ）に示すように、配線パターン２０を含む。配線パターン２０は、ベース基板１０に設けられてなる。配線パターン２０は、電気的接続部２２を有していてもよい。電気的接続部２２は、電子部品（例えば半導体チップやチップコンデンサ等）の電極との電気的な接続に利用される部分である。配線パターン２０の構造及び材料は特に限定されない。配線パターン２０は、例えば、銅（Ｃｕ）、クロム（Ｃｒ）、チタン（Ｔｉ）、ニッケル（Ｎｉ）、チタンタングステン（Ｔｉ−Ｗ）のうちのいずれかが積層した構成をなしていてもよい。配線パターン２０は、異なる構成をなす複数の部分を有していてもよい。例えば、後述する樹脂層３０に覆われている領域では、配線パターン２０は銅によって形成されていてもよい。このとき、配線パターン２０は、樹脂層３０（第２の樹脂層５０）から露出した領域（例えば電気的接続部２２）で、銅によって形成された下地配線に金メッキがなされた構造をなしていてもよい。配線パターン２０は、ベース基板１０の表面のみに設けられていてもよいが、図１（Ｂ）に示すように、ベース基板１０の内部を通るように設けられていてもよい。また、電気的接続部２２は、ベース基板１０の両面に設けられていてもよい。   The wiring board 1 includes a wiring pattern 20 as shown in FIGS. 1 (A) and 1 (B). The wiring pattern 20 is provided on the base substrate 10. The wiring pattern 20 may have an electrical connection portion 22. The electrical connection portion 22 is a portion used for electrical connection with an electrode of an electronic component (for example, a semiconductor chip or a chip capacitor). The structure and material of the wiring pattern 20 are not particularly limited. For example, the wiring pattern 20 may have a configuration in which any of copper (Cu), chromium (Cr), titanium (Ti), nickel (Ni), and titanium tungsten (Ti-W) is laminated. The wiring pattern 20 may have a plurality of portions having different configurations. For example, in a region covered with a resin layer 30 to be described later, the wiring pattern 20 may be formed of copper. At this time, the wiring pattern 20 is a region exposed from the resin layer 30 (second resin layer 50) (for example, the electrical connection portion 22) and has a structure in which the base wiring formed of copper is gold-plated. Also good. The wiring pattern 20 may be provided only on the surface of the base substrate 10, but may be provided so as to pass through the inside of the base substrate 10 as shown in FIG. In addition, the electrical connection portion 22 may be provided on both surfaces of the base substrate 10.

配線基板１は、図１（Ａ）〜図１（Ｃ）に示すように、配線パターン２０を部分的に覆う樹脂層３０を含む。樹脂層３０は、配線パターン２０の電気的接続部２２を避けて配置されていてもよい。樹脂層３０は、図２に示すように、樹脂層３０を囲む最も小さい矩形４０の内側であって矩形４０に内接する円４２よりも外側の角部領域４４内に、２つ以上の離れた部分３２を有する。角部領域４４が複数ある場合、樹脂層３０は、１つの角部領域４４内のみで、２つ以上の離れた部分３２を有していてもよい。あるいは、樹脂層３０は、複数の角部領域内のそれぞれで、２つ以上の離れた部分３２を有していてもよい。樹脂層３０は、矩形４０の外周から、矩形４０の中央領域に向かって延びる溝を有するといってもよい。樹脂層３０は、１つの角部領域４４内に、２つの部分３２を有していてもよいが、それ以上の数の部分３２を有していてもよい。なお、矩形４０が長方形をなす場合、角部領域４４は、矩形４０に内接する楕円よりも外側の領域であってもよい（図示せず）。配線パターン２０がベース基板１０の両面に配置されている場合、樹脂層３０は、図１（Ｂ）に示すように、ベース基板１０の両面に設けられていてもよい。ただしこれとは別に、樹脂層３０は、ベース基板１０の片面（半導体チップが搭載される面）のみに設けられていてもよい（図示せず）。なお、配線パターン２０及び樹脂層３０は、矩形４０よりも内側の領域で、配線パターン２０が露出しないように設計されていてもよい。   The wiring substrate 1 includes a resin layer 30 that partially covers the wiring pattern 20 as shown in FIGS. The resin layer 30 may be disposed avoiding the electrical connection portion 22 of the wiring pattern 20. As shown in FIG. 2, the resin layer 30 is separated by two or more in the corner region 44 inside the smallest rectangle 40 surrounding the resin layer 30 and outside the circle 42 inscribed in the rectangle 40. It has a portion 32. When there are a plurality of corner regions 44, the resin layer 30 may have two or more separated portions 32 only in one corner region 44. Alternatively, the resin layer 30 may have two or more separated portions 32 in each of the plurality of corner regions. The resin layer 30 may have a groove extending from the outer periphery of the rectangle 40 toward the central region of the rectangle 40. The resin layer 30 may have two portions 32 in one corner region 44, but may have a larger number of portions 32. When the rectangle 40 is a rectangle, the corner region 44 may be a region outside the ellipse inscribed in the rectangle 40 (not shown). When the wiring pattern 20 is disposed on both surfaces of the base substrate 10, the resin layer 30 may be provided on both surfaces of the base substrate 10 as shown in FIG. However, separately from this, the resin layer 30 may be provided only on one surface (surface on which a semiconductor chip is mounted) of the base substrate 10 (not shown). The wiring pattern 20 and the resin layer 30 may be designed so that the wiring pattern 20 is not exposed in a region inside the rectangle 40.

配線基板１は、図１（Ａ）〜図１（Ｃ）に示すように、第２の樹脂層５０をさらに含んでいてもよい。第２の樹脂層５０は、開口５２を有する。このとき、樹脂層３０は、開口５２の内側の領域に配置されてなる。また、配線パターン２０の電気的接続部２２は、開口５２から露出していてもよい。開口５２は、図１（Ａ）及び図１（Ｃ）に示すように、ベース基板１０の面と平行に拡がる溝部５４を有していてもよい。溝部５４は、樹脂層３０の部分３２の隣に配置されていてもよい。言い換えると、溝部５４は、角部領域４４の隣に配置されていてもよい。   The wiring board 1 may further include a second resin layer 50 as shown in FIGS. 1 (A) to 1 (C). The second resin layer 50 has an opening 52. At this time, the resin layer 30 is disposed in a region inside the opening 52. Further, the electrical connection portion 22 of the wiring pattern 20 may be exposed from the opening 52. As shown in FIGS. 1A and 1C, the opening 52 may have a groove portion 54 that extends in parallel with the surface of the base substrate 10. The groove portion 54 may be disposed next to the portion 32 of the resin layer 30. In other words, the groove portion 54 may be disposed next to the corner region 44.

配線基板１は、以上のように構成されていてもよい。配線基板１によると、後述する接着シート６０を設ける際に、樹脂層３０及び第２の樹脂層５０と接着シート６０との間にボイドが発生しにくくなる。そのため、配線基板１を利用することで、信頼性の高い半導体装置を製造することが可能になる（詳しくは後述）。なお、配線基板１は、半導体装置以外の電子部品（例えばチップコンデンサが搭載された電子部品など）の製造に利用しても同じ効果を奏するため、信頼性の高い電子部品を製造することができる。   The wiring board 1 may be configured as described above. According to the wiring board 1, voids are less likely to be generated between the resin layer 30 and the second resin layer 50 and the adhesive sheet 60 when the adhesive sheet 60 described later is provided. Therefore, by using the wiring substrate 1, it becomes possible to manufacture a highly reliable semiconductor device (details will be described later). Since the wiring board 1 has the same effect even when used for manufacturing electronic components other than semiconductor devices (for example, electronic components on which chip capacitors are mounted), it is possible to manufacture highly reliable electronic components. .

本実施の形態に係る半導体装置の製造方法は、図３（Ａ）及び図３（Ｂ）に示すように、配線基板１に、接着シート６０を設けることを含む。接着シート６０は、図３（Ａ）及び図３（Ｂ）に示すように、樹脂層３０を覆うように設ける。先に説明したように、樹脂層３０は、角部領域４４内に、２つ以上の離れた部分３２を有する。これによると、接着シート６０を設ける際に、隣り合う２つの部分３２の間から空気を逃がすことができる。そのため、接着シート６０を、接着シート６０と樹脂層３０との間にボイドが発生しないように設けることができる。すなわち、配線基板１によると、接着シート６０と樹脂層３０との間（特に、端部領域４４の範囲内）にボイドが発生しないように、接着シート６０を設けることができる。なお、配線基板１が第２の樹脂層５０を有する場合、接着シート６０を、開口５２の端部を部分的に覆うように設けてもよい。このとき、接着シート６０を、開口５２の端部の一部を覆い、かつ、端部の一部が露出するように設けてもよい。これによると、開口５２の端部から空気を排出することができる。そのため、接着シート６０と第２の樹脂層５０との間にボイドが発生しないように、接着シート６０を設けることができる。なお、開口５２が溝部５４を有する場合、図３（Ａ）に示すように、接着シート６０を、溝部５４と部分的にオーバーラップするように設けてもよい。このとき、溝部５４は、樹脂層３０の部分３２の隣に配置されていてもよい。これによれば、隣り合う２つの部分３２の間を通る空気を効率よく開口５２の外に排出することができる。接着シート６０を設ける工程は、接着シート６０を、配線基板１に押圧することを含んでいてもよい。これによると、効率よく接着シート６０と樹脂層３０及び第２の樹脂層５０との間から空気を逃がすことができる。なお、接着シート６０を設ける工程は、接着シート６０を加熱しながら行ってもよい。接着シート６０は、内部に導電粒子が分散された異方性導電フィルム（ＡＣＦ）であってもよい。あるいは、接着シート６０は、絶縁性接着フィルム（ＮＣＦ）であってもよい。   The method for manufacturing a semiconductor device according to the present embodiment includes providing an adhesive sheet 60 on the wiring board 1 as shown in FIGS. 3 (A) and 3 (B). As shown in FIGS. 3A and 3B, the adhesive sheet 60 is provided so as to cover the resin layer 30. As described above, the resin layer 30 has two or more separated portions 32 in the corner region 44. According to this, when providing the adhesive sheet 60, air can escape from between two adjacent portions 32. Therefore, the adhesive sheet 60 can be provided so that no void is generated between the adhesive sheet 60 and the resin layer 30. That is, according to the wiring board 1, the adhesive sheet 60 can be provided so that no void is generated between the adhesive sheet 60 and the resin layer 30 (particularly within the end region 44). In the case where the wiring substrate 1 has the second resin layer 50, the adhesive sheet 60 may be provided so as to partially cover the end portion of the opening 52. At this time, you may provide the adhesive sheet 60 so that a part of edge part of the opening 52 may be covered and a part of edge part may be exposed. According to this, air can be discharged from the end of the opening 52. Therefore, the adhesive sheet 60 can be provided so that no void is generated between the adhesive sheet 60 and the second resin layer 50. In addition, when the opening 52 has the groove part 54, as shown to FIG. 3 (A), you may provide the adhesive sheet 60 so that it may overlap with the groove part 54 partially. At this time, the groove portion 54 may be disposed next to the portion 32 of the resin layer 30. According to this, the air passing between the two adjacent portions 32 can be efficiently discharged out of the opening 52. The step of providing the adhesive sheet 60 may include pressing the adhesive sheet 60 against the wiring board 1. According to this, air can be efficiently released from between the adhesive sheet 60 and the resin layer 30 and the second resin layer 50. Note that the step of providing the adhesive sheet 60 may be performed while heating the adhesive sheet 60. The adhesive sheet 60 may be an anisotropic conductive film (ACF) in which conductive particles are dispersed. Alternatively, the adhesive sheet 60 may be an insulating adhesive film (NCF).

本実施の形態に係る半導体装置の製造方法は、図４（Ａ）及び図４（Ｂ）に示すように、配線基板１に半導体チップ７０を搭載することを含む。半導体チップ７０は、複数の電極７２を有する。半導体チップ７０は、それぞれの電極７２がいずれかの電気的接続部２２と対向するように搭載して、電極７２と電気的接続部２２とを電気的に接続させる。図４（Ｂ）に示すように、電極７２と電気的接続部２２とを接触させることによって、両者を電気的に接続してもよい。あるいは、電極７２と電気的接続部２２との間に導電粒子を介在させて、該導電粒子を介して両者を電気的に接続してもよい（図示せず）。半導体チップ７０は、例えばシリコンチップであってもよい。半導体チップ７０は、集積回路を有していてもよい。集積回路の構成は特に限定されないが、例えば、トランジスタ等の能動素子や、抵抗、コイル、コンデンサ等の受動素子を含んでいてもよい。このとき、電極７２は、集積回路に電気的に接続されていてもよい。電極７２の構成は特に限定されない。例えば、パッドと該パッドに設けられたバンプとを合わせて、電極７２と称してもよい。なお、配線パターン２０の電気的接続部２２がベース基板１０の両面に形成されている場合、ベース基板１０の両面に半導体チップを搭載してもよい（図５参照）。   The method for manufacturing a semiconductor device according to the present embodiment includes mounting a semiconductor chip 70 on the wiring substrate 1 as shown in FIGS. 4 (A) and 4 (B). The semiconductor chip 70 has a plurality of electrodes 72. The semiconductor chip 70 is mounted so that each electrode 72 faces one of the electrical connection portions 22, and the electrode 72 and the electrical connection portion 22 are electrically connected. As shown in FIG. 4B, the electrodes 72 and the electrical connection portion 22 may be brought into contact with each other so as to be electrically connected. Alternatively, conductive particles may be interposed between the electrode 72 and the electrical connection portion 22, and the two may be electrically connected via the conductive particles (not shown). The semiconductor chip 70 may be a silicon chip, for example. The semiconductor chip 70 may have an integrated circuit. The configuration of the integrated circuit is not particularly limited, and may include, for example, an active element such as a transistor or a passive element such as a resistor, a coil, or a capacitor. At this time, the electrode 72 may be electrically connected to the integrated circuit. The configuration of the electrode 72 is not particularly limited. For example, the pad and the bump provided on the pad may be collectively referred to as the electrode 72. In addition, when the electrical connection part 22 of the wiring pattern 20 is formed on both surfaces of the base substrate 10, semiconductor chips may be mounted on both surfaces of the base substrate 10 (see FIG. 5).

本実施の形態に係る半導体装置の製造方法は、接着シート６０を利用して、配線基板１と半導体チップ７０との間に、両者を接着する接着層６２を形成することを含む（図４（Ｂ）参照）。接着層６２は、第２の樹脂層５０の開口５２の端部の少なくとも一部を覆うように形成してもよい。接着層６２は、例えば、接着シート６０を溶融させ、その後、硬化させて形成してもよい。先に説明したように、本実施の形態に係る半導体装置の製造方法では、接着シート６０を、樹脂層３０及び第２の樹脂層５０との間にボイドが残らないように設けることができる。そのため、接着層６２を、樹脂層３０及び第２の樹脂層５０との間にボイドが発生しないように形成することができる。そのため、配線基板１との密着性の高い接着層６２を形成することができる。なお、本工程は、半導体チップ７０を搭載する工程と同時に行ってもよい。すなわち、半導体チップ７０を搭載する際に加える熱を利用して、半導体チップ７０を搭載しながら接着シート６０を溶融させてもよい。   The manufacturing method of the semiconductor device according to the present embodiment includes forming an adhesive layer 62 for bonding the wiring substrate 1 and the semiconductor chip 70 between the wiring substrate 1 and the semiconductor chip 70 using the adhesive sheet 60 (FIG. 4 ( B)). The adhesive layer 62 may be formed so as to cover at least a part of the end of the opening 52 of the second resin layer 50. The adhesive layer 62 may be formed, for example, by melting the adhesive sheet 60 and then curing it. As described above, in the method for manufacturing a semiconductor device according to the present embodiment, the adhesive sheet 60 can be provided such that no voids remain between the resin layer 30 and the second resin layer 50. Therefore, the adhesive layer 62 can be formed so that no void is generated between the resin layer 30 and the second resin layer 50. Therefore, the adhesive layer 62 having high adhesion to the wiring board 1 can be formed. Note that this step may be performed simultaneously with the step of mounting the semiconductor chip 70. That is, the adhesive sheet 60 may be melted while mounting the semiconductor chip 70 by using heat applied when mounting the semiconductor chip 70.

そして、外部端子８０を形成する工程や、検査工程などを経て、図５に示す半導体装置２を製造してもよい。半導体装置２は配線基板１を含む。配線基板１は、ベース基板１０と、ベース基板１０に設けられた、複数の電気的接続部２２を有する配線パターン２０と、電気的接続部２２を避けて配置された、配線パターン２０を部分的に覆う樹脂層３０とを有する。樹脂層３０は、樹脂層３０を囲む最も小さい矩形４０の内側であって矩形４０に内接する円又は楕円よりも外側の角部領域４４内に、２つ以上の離れた部分３２を有する。半導体装置２は、複数の電極７２を有する半導体チップ７０を含む。半導体チップ７０は、それぞれの電極７２がいずれかの電気的接続部２２と対向するように配線基板１に搭載されてなる。半導体装置２は、配線基板１と半導体チップ７０との間に配置されて、両者を接着する接着層６２を含む。これによれば、配線基板１との密着性が高い接着層を有する、信頼性の高い半導体装置を提供することができる。そして、図６には、半導体装置２が実装された回路基板１０００を示す。また、半導体装置２を有する電子機器として、図７にはノート型パーソナルコンピュータ２０００を、図８には携帯電話３０００を、それぞれ示す。   And you may manufacture the semiconductor device 2 shown in FIG. 5 through the process of forming the external terminal 80, an inspection process. The semiconductor device 2 includes a wiring board 1. The wiring substrate 1 includes a base substrate 10, a wiring pattern 20 having a plurality of electrical connection portions 22 provided on the base substrate 10, and a wiring pattern 20 that is arranged avoiding the electrical connection portions 22. And a resin layer 30 covering the surface. The resin layer 30 has two or more separated portions 32 in a corner region 44 inside the smallest rectangle 40 surrounding the resin layer 30 and outside the circle or ellipse inscribed in the rectangle 40. The semiconductor device 2 includes a semiconductor chip 70 having a plurality of electrodes 72. The semiconductor chip 70 is mounted on the wiring board 1 such that each electrode 72 faces one of the electrical connection portions 22. The semiconductor device 2 includes an adhesive layer 62 that is disposed between the wiring substrate 1 and the semiconductor chip 70 and adheres them. According to this, a highly reliable semiconductor device having an adhesive layer with high adhesion to the wiring substrate 1 can be provided. FIG. 6 shows a circuit board 1000 on which the semiconductor device 2 is mounted. As an electronic device having the semiconductor device 2, FIG. 7 shows a notebook personal computer 2000 and FIG. 8 shows a mobile phone 3000.

（変形例）
図９に示す例では、配線基板は、樹脂層３５を含む。樹脂層３５は、樹脂層３５を囲む最も小さい矩形に囲まれた領域内で、２つ以上の離れた部分３６に分割されてなる。部分３６は、例えば、図９に示すように、１辺が矩形の辺に沿って延びる三角形をなしていてもよい。これによっても、上記の樹脂層３０と同様の効果を奏することができ、信頼性の高い半導体装置を製造することができる。 (Modification)
In the example shown in FIG. 9, the wiring board includes a resin layer 35. The resin layer 35 is divided into two or more separated portions 36 within a region surrounded by the smallest rectangle surrounding the resin layer 35. For example, as shown in FIG. 9, the portion 36 may have a triangular shape with one side extending along a rectangular side. Also by this, the same effect as the resin layer 30 can be obtained, and a highly reliable semiconductor device can be manufactured.

図１０に示す例では、配線基板は、樹脂層３７を含む。樹脂層３７は、樹脂層３７を囲む最も小さい矩形に囲まれた領域内で、２つ以上の離れた部分３８に分割されてなる。そして、樹脂層３７は、矩形の中央領域を避けて形成されてなる。このとき、配線パターンは、矩形の中央領域を避けて設けられていてもよい。これによれば、特にベース基板１０の中央領域で、配線基板と接着層６２との密着性を高めることができる。そのため、接着層６２が剥離しにくい、信頼性の高い半導体装置を製造することが可能になる。   In the example shown in FIG. 10, the wiring board includes a resin layer 37. The resin layer 37 is divided into two or more separated portions 38 within a region surrounded by the smallest rectangle surrounding the resin layer 37. The resin layer 37 is formed so as to avoid a rectangular central region. At this time, the wiring pattern may be provided to avoid the rectangular central region. According to this, the adhesion between the wiring board and the adhesive layer 62 can be enhanced particularly in the central region of the base substrate 10. Therefore, it is possible to manufacture a highly reliable semiconductor device in which the adhesive layer 62 is difficult to peel off.

図１１（Ａ）及び図１１（Ｂ）に示す例では、配線基板は、第２の樹脂層５６を含む。第２の樹脂層５６は、図１１（Ａ）に示すように、矩形の開口５７を有する。このとき、樹脂層３０は、開口５７の内側に配置されていてもよい。そして、第２の樹脂層５６は、図１１（Ａ）及び図１１（Ｂ）に示すように、開口５７に連通する凹部５８を有する。このとき、接着シート６０を、凹部５８と部分的にオーバーラップするように設けてもよい。これによると、凹部５８を通して空気を排出することができる。そのため、配線基板との密着性が高くなるように樹脂層６２を形成することができ、信頼性の高い半導体装置を製造することが可能になる。凹部５８は、図１１（Ａ）に示すように、溝状に延びる形状をなしていてもよい。また、凹部５８は、図１１（Ａ）に示すように、矩形の開口５７の角部に連通するように形成されていてもよい。なお、図１１（Ｂ）は、図１１（Ａ）のXIB−XIB線断面の一部拡大図である。   In the example shown in FIGS. 11A and 11B, the wiring board includes a second resin layer 56. The second resin layer 56 has a rectangular opening 57 as shown in FIG. At this time, the resin layer 30 may be disposed inside the opening 57. And the 2nd resin layer 56 has the recessed part 58 connected to the opening 57, as shown to FIG. 11 (A) and FIG. 11 (B). At this time, the adhesive sheet 60 may be provided so as to partially overlap the recess 58. According to this, air can be discharged through the recess 58. Therefore, the resin layer 62 can be formed so as to have high adhesion to the wiring substrate, and a highly reliable semiconductor device can be manufactured. As shown in FIG. 11A, the recess 58 may have a shape extending in a groove shape. Moreover, the recessed part 58 may be formed so that it may connect with the corner | angular part of the rectangular opening 57, as shown to FIG. 11 (A). Note that FIG. 11B is a partially enlarged view of a cross section taken along line XIB-XIB in FIG.

（第２の実施の形態）
図１２（Ａ）〜図１６は、本発明を適用した第２の実施の形態に係る半導体装置の製造方法について説明するための図である。 (Second Embodiment)
12A to 16 are views for explaining a method for manufacturing a semiconductor device according to the second embodiment to which the present invention is applied.

本実施の形態に係る半導体装置の製造方法は、図１２（Ａ）及び図１２（Ｂ）に示す、配線基板３を用意することを含む。なお、図１２（Ａ）は、配線基板３の平面形状を示す図である。また、図１２（Ｂ）は、図１２（Ａ）のXIIB−XIIB線断面図である。配線基板３は、ベース基板１０を含む。配線基板３は、ベース基板１０に形成された配線パターン２０を含む。配線基板３は、配線パターン２０を部分的に覆う樹脂層３０を含む。樹脂層３０は、樹脂層３０を囲む最も小さい矩形４０の内側であって矩形４０に内接する円又は楕円よりも外側の角部領域内に、２つ以上の離れた部分を有する。配線基板３は、樹脂層３０以外の樹脂層を有していなくてもよい。言い換えると、ベース基板１０における矩形４０よりも外側の領域には、樹脂層が設けられていなくてもよい。そして、配線基板３は、樹脂層３０よりも外側の領域に配置された、第２の電気的接続部２４を含んでいてもよい。第２の電気的接続部２４は、配線パターン２０の一部であってもよい。   The manufacturing method of the semiconductor device according to the present embodiment includes preparing the wiring board 3 shown in FIGS. 12 (A) and 12 (B). FIG. 12A is a diagram illustrating a planar shape of the wiring board 3. FIG. 12B is a cross-sectional view taken along the line XIIB-XIIB in FIG. The wiring substrate 3 includes a base substrate 10. The wiring substrate 3 includes a wiring pattern 20 formed on the base substrate 10. The wiring board 3 includes a resin layer 30 that partially covers the wiring pattern 20. The resin layer 30 has two or more separated portions inside the smallest rectangle 40 surrounding the resin layer 30 and in a corner region outside the circle or ellipse inscribed in the rectangle 40. The wiring board 3 may not have a resin layer other than the resin layer 30. In other words, the resin layer may not be provided in a region outside the rectangle 40 in the base substrate 10. The wiring board 3 may include a second electrical connection portion 24 disposed in a region outside the resin layer 30. The second electrical connection portion 24 may be a part of the wiring pattern 20.

本実施の形態に係る半導体装置の製造方法は、図１３に示すように、配線基板３に接着シート６０を設けることを含む。先に説明したように、配線基板３では、樹脂層３０よりも外側の領域に樹脂層が形成されていない。そのため、接着シート６０を設ける際に、接着シート６０と樹脂層３０との間から空気が抜けやすくなる。そのため、接着シート６０と樹脂層３０との間にボイドが残らないように接着シート６０を設けることができる。そのため、接着層６２を、樹脂層３０との間にボイドが発生しないように形成することができる。   The method for manufacturing a semiconductor device according to the present embodiment includes providing an adhesive sheet 60 on the wiring board 3 as shown in FIG. As described above, in the wiring board 3, no resin layer is formed in a region outside the resin layer 30. Therefore, when the adhesive sheet 60 is provided, air can easily escape from between the adhesive sheet 60 and the resin layer 30. Therefore, the adhesive sheet 60 can be provided so that no void remains between the adhesive sheet 60 and the resin layer 30. Therefore, the adhesive layer 62 can be formed so that no void is generated between the adhesive layer 62 and the resin layer 30.

本実施の形態に係る半導体装置の製造方法は、図１４に示すように、配線基板３に半導体チップ７０を搭載した後に、半導体チップ７０に第２の半導体チップ７１を搭載することを含んでいてもよい。第２の半導体チップ７１を、図１４に示すように、電極７３が設けられた面とは反対側の面が半導体チップ７０と対向するように搭載してもよい。第２の半導体チップ７１は、図１４に示すように、半導体チップ７０と同じ大きさをなしていてもよいが、これに限定されるものではない。   As shown in FIG. 14, the method for manufacturing a semiconductor device according to the present embodiment includes mounting a second semiconductor chip 71 on the semiconductor chip 70 after mounting the semiconductor chip 70 on the wiring substrate 3. Also good. As shown in FIG. 14, the second semiconductor chip 71 may be mounted so that the surface opposite to the surface on which the electrode 73 is provided faces the semiconductor chip 70. As shown in FIG. 14, the second semiconductor chip 71 may have the same size as the semiconductor chip 70, but is not limited thereto.

本実施の形態に係る半導体装置の製造方法は、図１５に示すように、電極７３と配線パターン２０の第２の電気的接続部２４とを電気的に接続するワイヤ８２を設けることを含んでいてもよい。ワイヤ８２を設ける方法は特に限定されず、既に公知となっているいずれかの方法を適用してもよい。   The method for manufacturing a semiconductor device according to the present embodiment includes providing a wire 82 for electrically connecting the electrode 73 and the second electrical connection portion 24 of the wiring pattern 20 as shown in FIG. May be. The method for providing the wire 82 is not particularly limited, and any known method may be applied.

本実施の形態に係る半導体装置の製造方法は、図１６に示すように、半導体チップ７０，７１及びワイヤ８２を封止するモールド工程を含んでいてもよい。本工程によって、図１６に示す、モールド樹脂８４を形成してもよい。モールド樹脂８４によって、ワイヤ８２及び、配線パターン２０における樹脂層３０からの露出部を覆うことができるため、信頼性の高い半導体装置を提供することができる。そして、外部端子８０を形成する工程や、検査工程を経て、図１６に示す半導体装置４を製造してもよい。   The method for manufacturing a semiconductor device according to the present embodiment may include a molding step for sealing the semiconductor chips 70 and 71 and the wires 82 as shown in FIG. By this step, a mold resin 84 shown in FIG. 16 may be formed. Since the mold resin 84 can cover the exposed portion of the wire 82 and the wiring pattern 20 from the resin layer 30, a highly reliable semiconductor device can be provided. And you may manufacture the semiconductor device 4 shown in FIG. 16 through the process of forming the external terminal 80, and an inspection process.

なお、本発明は、上述した実施の形態に限定されるものではなく、種々の変形が可能である。例えば、本発明は、実施の形態で説明した構成と実質的に同一の構成（例えば、機能、方法及び結果が同一の構成、あるいは目的及び効果が同一の構成）を含む。また、本発明は、実施の形態で説明した構成の本質的でない部分を置き換えた構成を含む。また、本発明は、実施の形態で説明した構成と同一の作用効果を奏する構成又は同一の目的を達成することができる構成を含む。また、本発明は、実施の形態で説明した構成に公知技術を付加した構成を含む。   In addition, this invention is not limited to embodiment mentioned above, A various deformation | transformation is possible. For example, the present invention includes configurations that are substantially the same as the configurations described in the embodiments (for example, configurations that have the same functions, methods, and results, or configurations that have the same objects and effects). In addition, the invention includes a configuration in which a non-essential part of the configuration described in the embodiment is replaced. In addition, the present invention includes a configuration that achieves the same effect as the configuration described in the embodiment or a configuration that can achieve the same object. Further, the invention includes a configuration in which a known technique is added to the configuration described in the embodiment.

図１（Ａ）〜図１（Ｃ）は、本発明を適用した第１の実施の形態に係る半導体装置の製造方法を説明するための図である。FIG. 1A to FIG. 1C are diagrams for explaining a semiconductor device manufacturing method according to a first embodiment to which the present invention is applied. 図２は、本発明を適用した第１の実施の形態に係る半導体装置の製造方法を説明するための図である。FIG. 2 is a diagram for explaining the method of manufacturing the semiconductor device according to the first embodiment to which the present invention is applied. 図３（Ａ）及び図３（Ｂ）は、本発明を適用した第１の実施の形態に係る半導体装置の製造方法を説明するための図である。FIG. 3A and FIG. 3B are diagrams for explaining a method of manufacturing a semiconductor device according to the first embodiment to which the present invention is applied. 図４（Ａ）及び図４（Ｂ）は、本発明を適用した第１の実施の形態に係る半導体装置の製造方法を説明するための図である。FIG. 4A and FIG. 4B are diagrams for explaining the method of manufacturing the semiconductor device according to the first embodiment to which the present invention is applied. 図５は、本発明を適用した第１の実施の形態に係る半導体装置の製造方法を説明するための図である。FIG. 5 is a diagram for explaining the method of manufacturing the semiconductor device according to the first embodiment to which the present invention is applied. 図６は、本発明を適用した実施の形態に係る半導体装置が実装された回路基板を示す図である。FIG. 6 is a diagram showing a circuit board on which a semiconductor device according to an embodiment to which the present invention is applied is mounted. 図７は、本発明を適用した実施の形態に係る半導体装置を有する電子機器を示す図である。FIG. 7 is a diagram showing an electronic apparatus having a semiconductor device according to an embodiment to which the present invention is applied. 図８は、本発明を適用した実施の形態に係る半導体装置を有する電子機器を示す図である。FIG. 8 is a diagram showing an electronic apparatus having a semiconductor device according to an embodiment to which the present invention is applied. 図９は、本発明を適用した第１の実施の形態に係る半導体装置の製造方法の変形例を説明するための図である。FIG. 9 is a diagram for explaining a modification of the method for manufacturing the semiconductor device according to the first embodiment to which the present invention is applied. 図１０は、本発明を適用した第１の実施の形態に係る半導体装置の製造方法の変形例を説明するための図である。FIG. 10 is a diagram for explaining a modification of the method for manufacturing the semiconductor device according to the first embodiment to which the present invention is applied. 図１１（Ａ)及び図１１（Ｂ）は、本発明を適用した第１の実施の形態に係る半導体装置の製造方法の変形例を説明するための図である。FIG. 11A and FIG. 11B are diagrams for explaining a modification of the method for manufacturing the semiconductor device according to the first embodiment to which the present invention is applied. 図１２（Ａ)及び図１２（Ｂ）は、本発明を適用した第２の実施の形態に係る半導体装置の製造方法を説明するための図である。12A and 12B are views for explaining a method for manufacturing a semiconductor device according to the second embodiment to which the present invention is applied. 図１３は、本発明を適用した第２の実施の形態に係る半導体装置の製造方法を説明するための図である。FIG. 13 is a diagram for explaining a method of manufacturing a semiconductor device according to the second embodiment to which the present invention is applied. 図１４は、本発明を適用した第２の実施の形態に係る半導体装置の製造方法を説明するための図である。FIG. 14 is a view for explaining the method for manufacturing a semiconductor device according to the second embodiment to which the present invention is applied. 図１５は、本発明を適用した第２の実施の形態に係る半導体装置の製造方法を説明するための図である。FIG. 15 is a diagram for explaining a method of manufacturing a semiconductor device according to the second embodiment to which the present invention is applied. 図１６は、本発明を適用した第２の実施の形態に係る半導体装置の製造方法を説明するための図である。FIG. 16 is a view for explaining the method for manufacturing a semiconductor device according to the second embodiment to which the present invention is applied.

符号の説明Explanation of symbols

１０…ベース基板、 ２０…配線パターン、 ２２…電気的接続部、 ３０…樹脂層、 ３２…部分、 ４０…矩形、 ４２…円、 ４４…角部領域、 ５０…第２の樹脂層、 ５２…開口、 ５４…溝部、 ６０…接着シート、 ６２…接着層、 ７０…半導体チップ、 ７２…電極   DESCRIPTION OF SYMBOLS 10 ... Base board | substrate, 20 ... Wiring pattern, 22 ... Electrical connection part, 30 ... Resin layer, 32 ... Part, 40 ... Rectangular, 42 ... Circle, 44 ... Corner | angular area | region, 50 ... 2nd resin layer, 52 ... Opening, 54 ... groove, 60 ... adhesive sheet, 62 ... adhesive layer, 70 ... semiconductor chip, 72 ... electrode

Claims (13)

ベース基板と、
前記ベース基板に設けられた配線パターンと、
前記配線パターンを部分的に覆う樹脂層と、
を含み、
前記樹脂層は、前記樹脂層を囲む最も小さい矩形の内側であって前記矩形に内接する円又は楕円よりも外側の角部領域内に、２つ以上の離れた部分を有する配線基板。 A base substrate;
A wiring pattern provided on the base substrate;
A resin layer partially covering the wiring pattern;
Including
The wiring board which has two or more parts apart in the corner area outside the circle or ellipse inside the smallest rectangle which encloses the resin layer, and inscribed in the rectangle. 請求項１記載の配線基板において、
開口を有する第２の樹脂層をさらに有し、
前記樹脂層は、前記開口の内側の領域に配置されてなる配線基板。 The wiring board according to claim 1,
A second resin layer having an opening;
The resin layer is a wiring board arranged in a region inside the opening. 請求項２記載の配線基板において、
前記第２の樹脂層の前記開口は、前記ベース基板の面と平行に拡がる溝部を有する配線基板。 The wiring board according to claim 2,
The wiring board having a groove portion in which the opening of the second resin layer extends parallel to the surface of the base substrate. 請求項２記載の配線基板において、
前記第２の樹脂層の前記開口は矩形をなし、
前記第２の樹脂層は、前記開口に連通する凹部を有する配線基板。 The wiring board according to claim 2,
The opening of the second resin layer is rectangular,
The second resin layer is a wiring board having a recess communicating with the opening. ベース基板と、前記ベース基板に設けられた、複数の電気的接続部を有する配線パターンと、前記電気的接続部を避けて配置された、前記配線パターンを部分的に覆う樹脂層とを含む配線基板と、
複数の電極を有し、それぞれの前記電極がいずれかの前記電気的接続部と対向するように前記配線基板に搭載された半導体チップと、
前記配線基板と前記半導体チップとの間に配置されて、両者を接着する接着層と、
を含み、
前記樹脂層は、前記樹脂層を囲む最も小さい矩形の内側であって前記矩形に内接する円又は楕円よりも外側の角部領域内に、２つ以上の離れた部分を有する半導体装置。 A wiring including a base substrate, a wiring pattern provided on the base substrate and having a plurality of electrical connection portions, and a resin layer partially disposed to avoid the electrical connection portions and covering the wiring pattern. A substrate,
A semiconductor chip that has a plurality of electrodes and is mounted on the wiring board such that each of the electrodes faces one of the electrical connection portions;
An adhesive layer disposed between the wiring board and the semiconductor chip and bonding them;
Including
The semiconductor device, wherein the resin layer has two or more separated portions in a corner area inside a smallest rectangle surrounding the resin layer and outside a circle or ellipse inscribed in the rectangle. 請求項５記載の半導体装置において、
前記配線基板は、開口を有する第２の樹脂層をさらに含み、
前記樹脂層は、前記開口の内側の領域に配置されてなる半導体装置。 The semiconductor device according to claim 5.
The wiring board further includes a second resin layer having an opening,
The semiconductor device, wherein the resin layer is disposed in a region inside the opening. 請求項６記載の半導体装置において、
前記第２の樹脂層の前記開口は、前記ベース基板の面と平行に拡がる溝部を有する半導体装置。 The semiconductor device according to claim 6.
The opening of the second resin layer is a semiconductor device having a groove extending in parallel with the surface of the base substrate. 請求項６記載の半導体装置において、
前記第２の樹脂層の前記開口は矩形をなし、
前記第２の樹脂層は、前記開口に連通する凹部を有する半導体装置。 The semiconductor device according to claim 6.
The opening of the second resin layer is rectangular,
The second resin layer is a semiconductor device having a recess communicating with the opening. ベース基板と、前記ベース基板に設けられた、複数の電気的接続部を有する配線パターンと、前記電気的接続部を避けて配置された、前記配線パターンを部分的に覆う樹脂層とを含む配線基板を用意すること、
前記配線基板に、接着シートを、前記樹脂層を覆うように設けること、
複数の電極を有する半導体チップを、それぞれの前記電極がいずれかの前記電気的接続部と対向するように前記配線基板に搭載して、前記電極と前記電気的接続部とを電気的に接続すること、及び、
前記接着シートを利用して、前記配線基板と前記半導体チップとの間に、両者を接着する接着層を形成することを含み、
前記樹脂層は、前記樹脂層を囲む最も小さい矩形の内側であって前記矩形に内接する円又は楕円よりも外側の角部領域内に、２つ以上の離れた部分を有する半導体装置の製造方法。 A wiring including a base substrate, a wiring pattern provided on the base substrate and having a plurality of electrical connection portions, and a resin layer partially disposed to avoid the electrical connection portions and covering the wiring pattern. Preparing a substrate,
Providing an adhesive sheet on the wiring board so as to cover the resin layer;
A semiconductor chip having a plurality of electrodes is mounted on the wiring board such that each of the electrodes faces any one of the electrical connection portions, and the electrodes and the electrical connection portions are electrically connected. And
Using the adhesive sheet, forming an adhesive layer between the wiring substrate and the semiconductor chip to bond them;
The method for manufacturing a semiconductor device, wherein the resin layer has two or more separated portions inside a corner region outside the circle or ellipse inscribed in the rectangle inside the smallest rectangle surrounding the resin layer . 請求項９記載の半導体装置の製造方法において、
前記配線基板は、開口を有する第２の樹脂層をさらに含み、
前記樹脂層は、前記開口の内側の領域に配置されてなる半導体装置の製造方法。 In the manufacturing method of the semiconductor device according to claim 9,
The wiring board further includes a second resin layer having an opening,
The method for manufacturing a semiconductor device, wherein the resin layer is disposed in a region inside the opening. 請求項１０記載の半導体装置の製造方法において、
前記第２の樹脂層の前記開口は、前記ベース基板の面と平行に拡がる溝部を有し、
前記接着シートを、前記溝部と部分的にオーバーラップするように設ける半導体装置の製造方法。 The method of manufacturing a semiconductor device according to claim 10.
The opening of the second resin layer has a groove that extends parallel to the surface of the base substrate,
A method for manufacturing a semiconductor device, wherein the adhesive sheet is provided so as to partially overlap the groove. 請求項１０記載の半導体装置の製造方法において、
前記第２の樹脂層の前記開口は矩形をなし、
前記第２の樹脂層は、前記開口に連通する凹部を有し、
前記接着シートを、前記凹部と部分的にオーバーラップするように設ける半導体装置の製造方法。 The method of manufacturing a semiconductor device according to claim 10.
The opening of the second resin layer is rectangular,
The second resin layer has a recess communicating with the opening,
A method for manufacturing a semiconductor device, wherein the adhesive sheet is provided so as to partially overlap the recess. 請求項９から請求項１２のいずれかに記載の半導体装置の製造方法において、
前記接着シートを設ける工程は、前記接着シートを前記配線基板に向かって押圧することを含む半導体装置の製造方法。 In the manufacturing method of the semiconductor device in any one of Claims 9-12,
The process of providing the said adhesive sheet is a manufacturing method of the semiconductor device including pressing the said adhesive sheet toward the said wiring board.
JP2004365628A 2004-12-17 2004-12-17 Wiring substrate, semiconductor device and manufacturing method thereof Expired - Fee Related JP4692719B2 (en)

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