JP2006124626A - Vertical orientation type composition containing low polar polyamic acid resin and liquid crystal oriented film using the same and liquid crystal cell - Google Patents

Vertical orientation type composition containing low polar polyamic acid resin and liquid crystal oriented film using the same and liquid crystal cell Download PDF

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JP2006124626A
JP2006124626A JP2004356471A JP2004356471A JP2006124626A JP 2006124626 A JP2006124626 A JP 2006124626A JP 2004356471 A JP2004356471 A JP 2004356471A JP 2004356471 A JP2004356471 A JP 2004356471A JP 2006124626 A JP2006124626 A JP 2006124626A
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liquid crystal
polyamic acid
acid resin
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crystal cell
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JP4260733B2 (en
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Mi-Hye Lee
ミーヘ イ
Junkun Choi
ジュンクン チョイ
Yunjon Lee
ユンジョン リー
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Korea Research Institute of Chemical Technology KRICT
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00Liquid crystal materials
    • C09K19/52Liquid crystal materials characterised by components which are not liquid crystals, e.g. additives with special physical aspect: solvents, solid particles
    • C09K19/54Additives having no specific mesophase characterised by their chemical composition
    • C09K19/56Aligning agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • G02F1/133723Polyimide, polyamide-imide

Abstract

<P>PROBLEM TO BE SOLVED: To provide a vertical orientation type composition having excellent heat resistance, transparency, surface hardness and vertical orientation, to provide a liquid crystal oriented film using the same, and to provide a liquid crystal cell. <P>SOLUTION: The vertical orientation type composition containing a low polar polyamic acid resin, the liquid crystal oriented film and the liquid crystal sell using the same are provided. In more detail, a new polyamic acid-mixed composition has excellent heat resistance, surface hardness, transparency and liquid crystal orientation and prepared by mixing a polyamic acid derivative with a low polar polyamic acid resin in a proper ratio, wherein the low polar polyamic acid resin is prepared by solution-polymerizing an acid dianhydride with aromatic diamines containing an imide ring-containing side chain-having aromatic diamine. The liquid crystal oriented film has low surface roughness and highly excellent printability, heat resistance and transparency using the polyamic acid composition. The liquid cell has a pretilt angle of ≥89° and a voltage retention of ≥99%. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、低極性ポリアミック酸樹脂を含有する垂直配向型組成物およびそれを用いた液晶配向膜と液晶セルに関し、さらに詳しくは、脂環族系酸二無水物を含有する酸二無水物とイミド環含有側鎖基を有する芳香族ジアミンを含有する芳香族ジアミン類を溶液重合した低極性のポリアミック酸樹脂と、ポリアミック酸誘導体を適正比率で混合して、耐熱性、表面硬さ、透明性および液晶の配向性に優れた新規のポリアミック酸混合組成物と、また、前記ポリアミック酸組成物を用いて低い表面粗さ、印刷性、耐熱性および透明性に非常に優れた液晶配向膜および89°以上のプレティルト角および99%以上の電圧保持率を有する液晶セルに関する。   The present invention relates to a vertical alignment composition containing a low polar polyamic acid resin, a liquid crystal alignment film and a liquid crystal cell using the same, and more specifically, an acid dianhydride containing an alicyclic acid dianhydride and Low-polarity polyamic acid resin obtained by solution polymerization of aromatic diamines containing aromatic diamines having imide ring-containing side chain groups and polyamic acid derivatives are mixed at an appropriate ratio to achieve heat resistance, surface hardness, and transparency. And a novel polyamic acid mixed composition excellent in liquid crystal alignment, and a liquid crystal alignment film having excellent low surface roughness, printability, heat resistance and transparency using the polyamic acid composition, and 89 The present invention relates to a liquid crystal cell having a pretilt angle of more than 0 ° and a voltage holding ratio of more than 99%.

一般に、ポリイミド樹脂とは、芳香族テトラカルボン酸またはその誘導体と芳香族ジアミンまたは芳香族ジイソシアネートを縮重合した後、イミド化して製造された高耐熱性樹脂を指す。   In general, a polyimide resin refers to a high heat-resistant resin produced by condensation polymerization of an aromatic tetracarboxylic acid or derivative thereof and an aromatic diamine or aromatic diisocyanate, followed by imidization.

ポリイミド樹脂は、使用された単量体の種類によって種々の分子構造を有し得る。一般の芳香族テトラカルボン酸成分としては、ピロメリット酸二無水物(PMDA)または重フタル酸二無水物(BPDA)を使用しており、芳香族ジアミン成分としては、パラ−フェニレンジアミン(p−PDA)、メタ−フェニレンジアミン(m−PDA)、4,4−オキシジアニリン(ODA)、4,4−メチレンジアニリン(MDA)、2,2−ビスアミノフェニルヘキサフルオロプロパン(HFDA)、メタビスアミノフェノキシジフェニルスルホン(m−BAPS)、パラビスアミノフェノキシジフェニルスルホン(p−BAPS)、1,4−ビスアミノフェノキシベンゼン(TPE−Q)、1,3−ビスアミノフェノキシベンゼン(TPE−R)、2,2−ビスアミノフェノキシフェニルプロパン(BAPP)、2,2−ビスアミノフェノキシフェニルヘキサフルオロプロパン(HFBAPP)などの芳香族ジアミンを用いて縮重合させて製造している。   The polyimide resin may have various molecular structures depending on the type of monomer used. As a general aromatic tetracarboxylic acid component, pyromellitic dianhydride (PMDA) or heavy phthalic dianhydride (BPDA) is used, and as an aromatic diamine component, para-phenylenediamine (p- PDA), meta-phenylenediamine (m-PDA), 4,4-oxydianiline (ODA), 4,4-methylenedianiline (MDA), 2,2-bisaminophenylhexafluoropropane (HFDA), meta Bisaminophenoxydiphenylsulfone (m-BAPS), parabisaminophenoxydiphenylsulfone (p-BAPS), 1,4-bisaminophenoxybenzene (TPE-Q), 1,3-bisaminophenoxybenzene (TPE-R) 2,2-bisaminophenoxyphenylpropane (BAPP), 2,2-bis It is prepared by condensation polymerization of an aromatic diamine such as amino phenoxyphenyl hexafluoropropane (HFBAPP).

大部分のポリイミド樹脂は不溶および不融の超高耐熱性樹脂であって、(1)優れた耐熱酸化性、(2)高い使用可能温度、(3)約260℃の長期使用可能温度と約480℃の短期使用可能温度を示す優れた耐熱特性、(4)耐放射線性、(5)優れた低温特性および(6)優れた耐薬品性などのような特性を有する。   Most polyimide resins are insoluble and infusible ultra-high heat resistant resins, (1) excellent thermal oxidation resistance, (2) high usable temperature, (3) long-term usable temperature of about 260 ° C and about It has excellent heat-resistant properties showing a short-term usable temperature of 480 ° C., (4) radiation resistance, (5) excellent low-temperature properties, and (6) excellent chemical resistance.

しかし、ポリイミド樹脂のこのような特性にもかかわらず、電荷移動錯体(charge transfer complex)の形成に起因する可視光線領域における低い光透過度によって透明性が要求される分野への適用が非常に難しいという問題がある。したがって、様々な種類の主鎖型脂肪族ポリイミド系樹脂が製造され、液晶配向膜などの優れた光透過性が要求される分野に応用されている。   However, in spite of such characteristics of polyimide resin, it is very difficult to apply to fields where transparency is required due to low light transmittance in the visible light region due to the formation of a charge transfer complex. There is a problem. Therefore, various types of main chain type aliphatic polyimide resins are manufactured and applied to fields requiring excellent light transmittance such as liquid crystal alignment films.

現在まで開発された脂環基が主鎖に導入された液晶配向膜用ポリイミド系樹脂は、プレティルト角の発現のために長いアルキル鎖基を側鎖に導入して使用されており、溶媒に溶解する可溶性ポリイミド系樹脂およびポリアミック酸系樹脂が代表的である。しかし、可溶性ポリイミド系樹脂の場合、溶媒の一般の有機溶剤への溶解度に劣るため、印刷性が良好でないという問題があり、ポリアミック酸系配向膜の場合は高い表面極性によって電圧保持率(VHR, voltage holding ratio)が減少するという短所がある。しかも、様々な駆動モードに対応できる配向膜としての応用のためにはプレティルト角の制御が要求されている。   Polyimide resins for liquid crystal alignment films with alicyclic groups introduced into the main chain, developed so far, have been used by introducing long alkyl chain groups into the side chain for the expression of the pretilt angle. Typical examples thereof include soluble polyimide resins and polyamic acid resins. However, in the case of a soluble polyimide resin, since the solubility of the solvent in a general organic solvent is poor, there is a problem that the printability is not good. In the case of a polyamic acid alignment film, the voltage holding ratio (VHR, There is a disadvantage that the voltage holding ratio decreases. In addition, control of the pretilt angle is required for application as an alignment film that can cope with various drive modes.

そこで、本発明者らは、従来のポリイミド系樹脂を用いて製造された液晶配向膜の光透過性、溶解性および電圧保持率の低下などの問題を解決するために鋭意研究努力した。その結果、有機溶剤に優れた溶解性を有するだけでなく、低極性側鎖を有するポリアミック酸樹脂と、芳香族または脂環族系ポリアミック酸誘導体を溶液状態で一定の比率で混合した組成物が耐熱性、透明性、表面硬さおよび垂直配向性を有することを発見し、本発明を完成するに至った。   Accordingly, the present inventors have made intensive research efforts to solve problems such as light transmittance, solubility, and a decrease in voltage holding ratio of a liquid crystal alignment film manufactured using a conventional polyimide resin. As a result, not only has an excellent solubility in an organic solvent, but also a composition in which a polyamic acid resin having a low-polar side chain and an aromatic or alicyclic polyamic acid derivative are mixed at a certain ratio in a solution state. It has been found that it has heat resistance, transparency, surface hardness, and vertical orientation, and the present invention has been completed.

したがって、本発明は、優れた耐熱性、透明性、表面硬さおよび垂直配向性を有する垂直配向型組成物を提供することにその目的がある。
また、本発明は、前記垂直配向型組成物を用いて低い表面粗さ、優れた印刷性、耐熱性および透明性を有する液晶配向膜と、優れたプレティルト角および電圧保持率を有する液晶セルを提供することに他の目的がある。
Therefore, the object of the present invention is to provide a vertical alignment composition having excellent heat resistance, transparency, surface hardness and vertical alignment.
The present invention also provides a liquid crystal alignment film having low surface roughness, excellent printability, heat resistance and transparency, and a liquid crystal cell having an excellent pretilt angle and voltage holding ratio using the vertical alignment composition. There are other purposes in providing.

本発明の一実施態様によって、本発明では、下記式(1)で表される低極性側鎖含有ポリアミック酸樹脂と下記式(2)で表されるポリアミック酸誘導体が混合されてなる垂直配向型組成物が提供される。


〔式中、

から選ばれた1種または2種以上の4価基であって、必ず構造式(a)、(b)、(c)、(d)および(e)から選ばれた1種または2種以上の脂環族系4価基を含み;および

lおよびmは各々1〜300範囲の自然数を示す。〕
また、本発明の他の実施態様によって、本発明では、前記ポリアミック酸混合組成物をコーティングして製造した液晶配向膜と液晶セルが提供される。
According to an embodiment of the present invention, in the present invention, a vertical alignment type in which a low-polar side chain-containing polyamic acid resin represented by the following formula (1) and a polyamic acid derivative represented by the following formula (2) are mixed. A composition is provided.


[Where,

1 type or 2 types or more of tetravalent groups selected from 1 and 2 types or more selected from structural formulas (a), (b), (c), (d) and (e). Including alicyclic tetravalent groups of

l and m each represent a natural number in the range of 1 to 300. ]
According to another embodiment of the present invention, the present invention provides a liquid crystal alignment film and a liquid crystal cell manufactured by coating the polyamic acid mixed composition.

本発明によれば、光透過性、耐熱性、機械的特性に非常に優れるだけでなく、優れた電気光学的特性および高いプレティルト角を有する新規な構造の低極性側鎖を有するポリアミック酸が含有されたポリアミック酸混合組成物が提供され、これらは、厳しい電気光学的特性が要求されるTFT−TNおよびSTN LCD用液晶配向膜および各種の尖端耐熱構造材料として有用である。   According to the present invention, polyamic acid having a low-polarity side chain with a novel structure having not only excellent optical transparency, heat resistance and mechanical properties but also excellent electro-optical properties and a high pretilt angle is contained. The polyamic acid mixed composition is provided and is useful as a liquid crystal alignment film for TFT-TN and STN LCDs and various point heat-resistant structural materials that require strict electro-optical properties.

以下、本発明をさらに詳細に説明する。
本発明は、前記式(1)で表される低極性側鎖含有ポリアミック酸樹脂と前記式(2)で表されるポリアミック酸誘導体を適正比で混合した垂直配向型組成物に関する。さらに、前記垂直配向型組成物をコーティングすることによって、優れた耐熱性、透明性、表面硬さ、高い電圧保持率およびプレティルト角性などの特性を有する液晶配向膜または液晶セルなどに関する。
Hereinafter, the present invention will be described in more detail.
The present invention relates to a vertical alignment composition in which a low-polarity side chain-containing polyamic acid resin represented by the formula (1) and a polyamic acid derivative represented by the formula (2) are mixed at an appropriate ratio. Furthermore, the present invention relates to a liquid crystal alignment film or a liquid crystal cell having characteristics such as excellent heat resistance, transparency, surface hardness, high voltage holding ratio and pretilt angle by coating the vertical alignment composition.

前記式(1)で表される低極性側鎖含有ポリアミック酸樹脂と、前記式(2)で表されるポリアミック酸誘導体は、1〜99重量%:1〜99重量%の混合比の範囲内で使用する。   The low polar side chain-containing polyamic acid resin represented by the formula (1) and the polyamic acid derivative represented by the formula (2) are within a range of 1 to 99% by weight: 1 to 99% by weight. Used in.

本発明に係る前記式(1)で表される低極性側鎖含有ポリアミック酸樹脂と前記式(2)で表されるポリアミック酸誘導体は、芳香族テトラカルボン酸またはその誘導体と芳香族ジアミンまたは芳香族ジイソシアネートを縮重合して製造し、使用された単量体の種類によって種々の分子構造を有し得る。一般に、芳香族テトラカルボン酸単量体としては、ピロメリット酸二無水物(PMDA)、ベンゾフェノンテトラカルボン酸二無水物、オキシジフタル酸二無水物、重フタル酸二無水物(BPDA)およびヘキサフルオロイソプロピリデンジフタル酸二無水物などから選択して使用している。また、芳香族ジアミン単量体としては、一般に、パラ−フェニレンジアミン(p−PDA)、メタ−フェニレンジアミン(m−PDA)、4,4−オキシジアニリン(ODA)、4,4−メチレンジアニリン(MDA)、2,2−ビスアミノフェニルヘキサフルオロプロパン(HFDA)、メタビスアミノフェノキシジフェニルスルホン(m−BAPS)、パラビスアミノフェノキシジフェニルスルホン(p−BAPS)、1,4−ビスアミノフェノキシベンゼン(TPE−Q)、1,3−ビスアミノフェノキシベンゼン(TPE−R)、2,2−ビスアミノフェノキシフェニルプロパン(BAPP)、2,2−ビスアミノフェノキシフェニルヘキサフルオロプロパン(HFBAPP)などから選択して使用している。   The low polar side chain-containing polyamic acid resin represented by the formula (1) and the polyamic acid derivative represented by the formula (2) according to the present invention include an aromatic tetracarboxylic acid or a derivative thereof and an aromatic diamine or aromatic. It can be produced by polycondensation of a group diisocyanate and have various molecular structures depending on the type of monomer used. In general, aromatic tetracarboxylic acid monomers include pyromellitic dianhydride (PMDA), benzophenone tetracarboxylic dianhydride, oxydiphthalic dianhydride, heavy phthalic dianhydride (BPDA), and hexafluoroisopropylate. It is selected from redene diphthalic dianhydride. As aromatic diamine monomers, generally, para-phenylenediamine (p-PDA), meta-phenylenediamine (m-PDA), 4,4-oxydianiline (ODA), 4,4-methylenedi Aniline (MDA), 2,2-bisaminophenyl hexafluoropropane (HFDA), metabisaminophenoxydiphenyl sulfone (m-BAPS), parabisaminophenoxydiphenyl sulfone (p-BAPS), 1,4-bisaminophenoxy From benzene (TPE-Q), 1,3-bisaminophenoxybenzene (TPE-R), 2,2-bisaminophenoxyphenylpropane (BAPP), 2,2-bisaminophenoxyphenylhexafluoropropane (HFBAPP), etc. Select and use.

本発明に係る前記式(1)で表される低極性側鎖含有ポリアミック酸樹脂と前記式(2)で表されるポリアミック酸誘導体は前記の一般の芳香族単量体以外にも、前記構造式(a)〜(e)で表される脂肪族テトラカルボン酸二無水物単量体と前記構造式(f)で表されるアルキルスクシニックイミド基が置換された芳香族ジアミンが必須成分として含まれたジアミン単量体を用いて製造される。   In addition to the general aromatic monomer, the low polar side chain-containing polyamic acid resin represented by the formula (1) and the polyamic acid derivative represented by the formula (2) according to the present invention have the structure described above. As an essential component, an aliphatic tetracarboxylic dianhydride monomer represented by the formulas (a) to (e) and an aromatic diamine substituted with the alkyl succinic imide group represented by the structural formula (f) are used. Manufactured using the included diamine monomer.

すなわち、前記式(1)で表される低極性側鎖含有ポリアミック酸樹脂は酸二無水物単量体であって、通常の芳香族テトラカルボン酸単量体以外にも脂肪族テトラカルボン酸二無水物単量体として、1,2,3,4−シクロブタンテトラカルボン酸二無水物[CBDA;(a)]、1,2,3,4−シクロペンタンテトラカルボン酸二無水物[CPDA;(b)]、5−(2,5−ジオキソテトラヒドロフリル)−3−メチルシクロヘキサン−1,2−ジカルボン酸二無水物[DOCDA;(c)]、4−(2,5−ジオキソテトラヒドロフリル−3−イル)−テトラリン−1,2−ジカルボン酸二無水物[DOTDA;(d)]、およびビシクロオクテン−2,3,5,6−テトラカルボン酸二無水物[BODA;(e)]から選ばれた1種または2種以上の脂肪族テトラカルボン酸二無水物を必須成分として含む。この際、前記構造式(a)〜(e)で表される脂肪族テトラカルボン酸二無水物は全酸二無水物単量体の使用量に対して1〜99モル%の範囲で使用する。   That is, the low-polar side-chain-containing polyamic acid resin represented by the formula (1) is an acid dianhydride monomer, and an aliphatic tetracarboxylic acid dicarboxylic acid monomer in addition to a normal aromatic tetracarboxylic acid monomer. As anhydride monomers, 1,2,3,4-cyclobutanetetracarboxylic dianhydride [CBDA; (a)], 1,2,3,4-cyclopentanetetracarboxylic dianhydride [CPDA; b)], 5- (2,5-dioxotetrahydrofuryl) -3-methylcyclohexane-1,2-dicarboxylic dianhydride [DOCDA; (c)], 4- (2,5-dioxotetrahydrofuryl) -3-yl) -tetralin-1,2-dicarboxylic dianhydride [DOTDA; (d)], and bicyclooctene-2,3,5,6-tetracarboxylic dianhydride [BODA; (e)] 1 selected from Or comprising two or more kinds of aliphatic tetracarboxylic dianhydride as an essential component. At this time, the aliphatic tetracarboxylic dianhydride represented by the structural formulas (a) to (e) is used in the range of 1 to 99 mol% based on the amount of the total acid dianhydride monomer used. .

前記式(1)で表される低極性側鎖含有ポリアミック酸樹脂の場合、側鎖基として脂環族基とともにアルキルスクシニックイミド基が同時に結合している構造的特徴を有するが、これにより、ジアミン単量体としては、通常の芳香族ジアミン単量体以外にも前記構造式(f)で表されるアルキルスクシニックイミド基が置換された芳香族ジアミンを必須成分として含ませて重合して製造する。この際、前記構造式(f)で表される芳香族ジアミンは、全ジアミン単量体の使用量に対して1〜99モル%の範囲で使用する。   In the case of the low polarity side chain-containing polyamic acid resin represented by the formula (1), it has a structural feature in which an alkyl succinic imide group is simultaneously bonded together with an alicyclic group as a side chain group. As the diamine monomer, in addition to a normal aromatic diamine monomer, an aromatic diamine substituted with an alkyl succinic imide group represented by the structural formula (f) is contained as an essential component, and polymerization is performed. To manufacture. At this time, the aromatic diamine represented by the structural formula (f) is used in the range of 1 to 99 mol% with respect to the amount of all diamine monomers used.

これにより、前記(f)で表される芳香族ジアミンを必須単量体成分として用いて製造された新規な混合物は低極性アルキル基が置換されたスクシニックイミド側鎖基が導入されたポリアミック酸樹脂との混合によって、透明性、印刷性、機械的特性および前記組成物を用いて製造された液晶セルの電気光学的特性が特に改善されたものである。    As a result, the novel mixture prepared using the aromatic diamine represented by (f) as an essential monomer component is a polyamic acid into which a succinic imide side group substituted with a low polar alkyl group is introduced. By mixing with a resin, transparency, printability, mechanical properties, and electro-optical properties of a liquid crystal cell produced using the composition are particularly improved.

前記のような前記式(1)で表される低極性側鎖含有ポリアミック酸樹脂は、重量平均分子量(Mw)が5,000〜150,000g/mol範囲、固有粘度が0.1〜1.5dL/g範囲、ガラス転移温度が150〜300℃範囲の特性を有する。また、前記式(1)で表される可溶性ポリイミド樹脂は、ジメチルアセトアミド(DMAc)、ジメチルホルムアミド(DMF)、N−メチル−2−ピロリドン(NMP)、アセトン、酢酸エチルのような非プロトン性極性溶媒をはじめメタ−クレゾールのような有機溶媒に対して常温で容易に溶解する特性を有する。    The low polar side chain-containing polyamic acid resin represented by the formula (1) as described above has a weight average molecular weight (Mw) in the range of 5,000 to 150,000 g / mol and an intrinsic viscosity of 0.1 to 1. It has characteristics of 5 dL / g range and glass transition temperature in the range of 150 to 300 ° C. The soluble polyimide resin represented by the formula (1) is aprotic polar such as dimethylacetamide (DMAc), dimethylformamide (DMF), N-methyl-2-pyrrolidone (NMP), acetone, ethyl acetate. It has the property of being easily dissolved at room temperature in organic solvents such as solvents and meta-cresol.

さらに、前記式(2)で表されるポリアミック酸誘導体は、酸二無水物単量体として前記構造式(a)〜(e)で表される脂肪族テトラカルボン酸二無水物が必須単量体として使用されるため、機械的特性を向上させ、耐熱性低下を最小にしながらも印刷性が改善されたポリアミック酸誘導体を製造できる。前記した単量体の組成で溶液重合して製造された前記式(2)で表されるポリアミック酸誘導体は、重量平均分子量(Mw)が10,000〜200,000g/mol範囲、固有粘度が0.3〜2.0dL/g範囲、ガラス転移温度が200〜400℃範囲、イミド化温度が200〜300℃範囲の特性を有する。また、前記式(2)で表されるポリアミック酸誘導体は、ジメチルアセトアミド(DMAc)、ジメチルホルムアミド(DMF)、N−メチル−2−ピロリドン(NMP)、アセトン、酢酸エチルのような非プロトン性極性溶媒をはじめ、メタ−クレゾールのような有機溶媒に対して常温で容易に溶解する特性を有する。特に、テトラヒドロフラン(THF)、クロロホルムのような低沸点溶媒およびγ−ブチロラクトンのような低吸収性溶媒に対しても常温で10重量%以上の高い溶解度を示す。また、これらの混合溶媒に対しても高い溶解度を示す。   Furthermore, the polyamic acid derivative represented by the above formula (2) is an essential single amount of the aliphatic tetracarboxylic dianhydride represented by the structural formulas (a) to (e) as an acid dianhydride monomer. Since it is used as a body, it is possible to produce a polyamic acid derivative with improved mechanical properties and improved printability while minimizing a decrease in heat resistance. The polyamic acid derivative represented by the above formula (2) produced by solution polymerization with the monomer composition described above has a weight average molecular weight (Mw) in the range of 10,000 to 200,000 g / mol and an intrinsic viscosity. It has characteristics of 0.3 to 2.0 dL / g, glass transition temperature of 200 to 400 ° C, and imidization temperature of 200 to 300 ° C. The polyamic acid derivative represented by the formula (2) is aprotic polar such as dimethylacetamide (DMAc), dimethylformamide (DMF), N-methyl-2-pyrrolidone (NMP), acetone, ethyl acetate. It has the property of being easily dissolved at room temperature in organic solvents such as meta-cresol, including solvents. In particular, it exhibits a high solubility of 10% by weight or more at room temperature even in low-boiling solvents such as tetrahydrofuran (THF) and chloroform and low-absorbing solvents such as γ-butyrolactone. Moreover, high solubility is shown also with respect to these mixed solvents.

なお、前記式(1)で表される低極性側鎖含有ポリアミック酸樹脂と前記式(2)で表されるポリアミック酸誘導体を当分野で用いられる通常の方法でコーティングして液晶配向膜または液晶セルを製造し、電気光学的特性を評価した結果、プレティルト角(pretilt angle)は87.0〜89.9°範囲であり、電圧保持率(voltage holding ratio)は98.0〜99.9%、残留電圧(residual-D.C)は100〜400mV範囲であった。前記のような特性は既存のポリイミド樹脂の優れた特性を保持しながらも溶解性および液晶配向特性などにも優れているので、各種の電気、電子、宇宙、航空など尖端産業の核心耐熱素材として使用できる。   The low polar side chain-containing polyamic acid resin represented by the formula (1) and the polyamic acid derivative represented by the formula (2) are coated by a usual method used in this field, and then a liquid crystal alignment film or a liquid crystal As a result of manufacturing the cell and evaluating the electro-optical characteristics, the pretilt angle is in the range of 87.0 to 89.9 °, and the voltage holding ratio is 98.0 to 99.9%. The residual voltage (residual-DC) was in the range of 100 to 400 mV. The above-mentioned characteristics are excellent in solubility and liquid crystal alignment characteristics while retaining the excellent characteristics of existing polyimide resins, so as a core heat-resistant material for various industries such as electrical, electronic, space, and aviation Can be used.

(実施例)
以下、本発明を下記実施例によってさらに詳細に説明するが、これらに限定されず、本発明の技術思想範囲内で様々な変形および修正が可能である。
(Example)
Hereinafter, the present invention will be described in more detail with reference to the following examples. However, the present invention is not limited thereto, and various modifications and corrections are possible within the scope of the technical idea of the present invention.

[製造例1]1−(3,5−ジニトロフェニル)−3−(1−ヘキセン)−スクシニックイミド(DN−IM−6)の製造
攪拌機、窒素注入装置付きの250mLの反応器に窒素ガスを徐々に通過させながら3,5−ジニトロアニリン9.2g(0.05mole)を反応溶媒である酢酸50mLに溶解した後、窒素ガスを通過させながら2−ヘキセン−1−イルコハク酸無水物9.1g(0.05mole)を入れ、24時間還流した。反応溶液を常温に冷却した後、析出された固体を得た。
前記で得られた固体をメタノールから再結晶して1−(3,5−ジニトロフェニル)−3−(1−ヘキセン)−スクシニックイミド(DN−IM−6)12.7gを製造した(収率73%)。
[Production Example 1] Production of 1- (3,5-dinitrophenyl) -3- (1-hexene) -succinic imide (DN-IM-6) Nitrogen gas in a 250 mL reactor equipped with a stirrer and a nitrogen injection device 9.2 g (0.05 mole) of 3,5-dinitroaniline was dissolved in 50 mL of acetic acid as a reaction solvent, and then 2-hexen-1-ylsuccinic anhydride 9. 1 g (0.05 mole) was added and refluxed for 24 hours. After cooling the reaction solution to room temperature, a precipitated solid was obtained.
The solid obtained above was recrystallized from methanol to produce 12.7 g of 1- (3,5-dinitrophenyl) -3- (1-hexene) -succinic imide (DN-IM-6). 73%).

[製造例2]1−(3,5−ジニトロフェニル)−3−(1−オクテン)−スクシニックイミド(DN−IM−8)の製造
2−ヘキセン−1−イルコハク酸無水物の代わりに、2−オクテン−1−イルコハク酸無水物10.5g(0.05mole)を用いたことを除いては、前記製造例1と同様な反応を行って1−(3,5−ジニトロフェニル)−3−(1−オクテン)−スクシニックイミド(DN−IM−8)を得た。
前記で得られた固体をメタノールから再結晶して1−(3,5−ジニトロフェニル)−3−(1−オクテン)−スクシニックイミド(DN−IM−8)13.1gを製造した(収率70%)。
[Production Example 2] Production of 1- (3,5-dinitrophenyl) -3- (1-octene) -succinicimide (DN-IM-8) Instead of 2-hexen-1-ylsuccinic anhydride, Except that 10.5 g (0.05 mole) of 2-octen-1-ylsuccinic anhydride was used, the same reaction as in Production Example 1 was performed to give 1- (3,5-dinitrophenyl) -3. -(1-Octene) -succinic imide (DN-IM-8) was obtained.
The solid obtained above was recrystallized from methanol to produce 13.1 g of 1- (3,5-dinitrophenyl) -3- (1-octene) -succinic imide (DN-IM-8). 70%).

[製造例3]1−(3,5−ジニトロフェニル)−3−(1−デセン)−スクシニックイミド(DN−IM−10)の製造
2−ヘキセン−1−イルコハク酸無水物の代わりに、2−デセン−1−イルコハク酸無水物11.9g(0.05mole)を用いたことを除いては、前記製造例1と同様な反応を行って1−(3,5−ジニトロフェニル)−3−(1−デセン)−スクシニックイミド(DN−IM−10)を得た。
前記で得られた固体をメタノールから再結晶して1−(3,5−ジニトロフェニル)−3−(1−デセン)−スクシニックイミド(DN−IM−10)14.5gを製造した(収率70%)。
[Production Example 3] Production of 1- (3,5-dinitrophenyl) -3- (1-decene) -succinic imide (DN-IM-10) Instead of 2-hexen-1-ylsuccinic anhydride, Except that 11.9 g (0.05 mole) of 2-decen-1-ylsuccinic anhydride was used, the same reaction as in Production Example 1 was performed to give 1- (3,5-dinitrophenyl) -3. -(1-Decene) -succinic imide (DN-IM-10) was obtained.
The solid obtained above was recrystallized from methanol to produce 14.5 g of 1- (3,5-dinitrophenyl) -3- (1-decene) -succinimide (DN-IM-10). 70%).

[製造例4]1−(3,5−ジニトロフェニル)−3−(1−ドデセン)−スクシニックイミド(DN−IM−12)の製造
2−ヘキセン−1−イルコハク酸無水物の代わりに、2−ドデセン−1−イルコハク酸無水物13.3g(0.05mole)を用いたことを除いては、前記製造例1と同様な反応を行って1−(3,5−ジニトロフェニル)−3−(1−ドデセン)−スクシニックイミド(DN−IM−12)を得た。
前記で得られた固体をメタノールから再結晶して1−(3,5−ジニトロフェニル)−3−(1−ドデセン)−スクシニックイミド(DN−IM−12)14.0gを製造した(収率65%)。
[Production Example 4] Production of 1- (3,5-dinitrophenyl) -3- (1-dodecene) -succinic imide (DN-IM-12) Instead of 2-hexen-1-ylsuccinic anhydride, Except for using 13.3 g (0.05 mole) of 2-dodecene-1-ylsuccinic anhydride, the same reaction as in Production Example 1 was performed to give 1- (3,5-dinitrophenyl) -3. -(1-Dodecene) -succinic imide (DN-IM-12) was obtained.
The solid obtained above was recrystallized from methanol to produce 14.0 g of 1- (3,5-dinitrophenyl) -3- (1-dodecene) -succinic imide (DN-IM-12). Rate 65%).

[製造例5]1−(3,5−ジニトロフェニル)−3−(1−テトラデセン)−スクシニックイミド(DN−IM−14)の製造
2−ヘキセン−1−イルコハク酸無水物の代わりに、2−テトラデセン−1−イルコハク酸無水物14.7g(0.05mole)を用いたことを除いては、前記製造例1と同様な反応を行って、1−(3,5−ジニトロフェニル)−3−(1−テトラデセン)−スクシニックイミド(DN−IM−14)を得た。
前記で得られた固体をメタノールから再結晶して1−(3,5−ジニトロフェニル)−3−(1−テトラデセン)−スクシニックイミド(DN−IM−14)14.9gを製造した(収率65%)。
[Production Example 5] Production of 1- (3,5-dinitrophenyl) -3- (1-tetradecene) -succinicimide (DN-IM-14) Instead of 2-hexen-1-ylsuccinic anhydride, Except that 14.7 g (0.05 mole) of 2-tetradecen-1-ylsuccinic anhydride was used, the same reaction as in Production Example 1 was carried out to obtain 1- (3,5-dinitrophenyl)- 3- (1-tetradecene) -succinic imide (DN-IM-14) was obtained.
The solid obtained above was recrystallized from methanol to produce 14.9 g of 1- (3,5-dinitrophenyl) -3- (1-tetradecene) -succinic imide (DN-IM-14). Rate 65%).

[製造例6]1−(3,5−ジニトロフェニル)−3−(1−ヘキサデセン)−スクシニックイミド(DN−IM−16)の製造
2−ヘキセン−1−イルコハク酸無水物の代わりに、2−ヘキサデセン−1−イルコハク酸無水物16.1g(0.05mole)を用いたことを除いては、前記製造例1と同様な反応を行って、1−(3,5−ジニトロフェニル)−3−(1−ヘキサデセン)−スクシニックイミド(DN−IM−16)を得た。
前記で得られた固体をメタノールから再結晶して1−(3,5−ジニトロフェニル)−3−(1−ヘキサデセン)−スクシニックイミド(DN−IM−16)15.4gを製造した(収率63%)。
[Production Example 6] Production of 1- (3,5-dinitrophenyl) -3- (1-hexadecene) -succinicimide (DN-IM-16) In place of 2-hexen-1-ylsuccinic anhydride, Except for using 16.1 g (0.05 mole) of 2-hexadecene-1-ylsuccinic anhydride, the same reaction as in Production Example 1 was carried out to obtain 1- (3,5-dinitrophenyl)- 3- (1-Hexadecene) -succinic imide (DN-IM-16) was obtained.
The solid obtained above was recrystallized from methanol to produce 15.4 g of 1- (3,5-dinitrophenyl) -3- (1-hexadecene) -succinic imide (DN-IM-16). Rate 63%).

[製造例7]1−(3,5−ジニトロフェニル)−3−(1−オクタデセン)−スクシニックイミド(DN−IM−18)の製造
2−ヘキセン−1−イルコハク酸無水物の代わりに、2−オクタデセン−1−イルコハク酸無水物17.5g(0.05mole)を用いたことを除いては、前記製造例1と同様な反応を行って、1−(3,5−ジニトロフェニル)−3−(1−オクタデセン)−スクシニックイミド(DN−IM−18)を得た。
前記で得られた固体をメタノールから再結晶して1−(3,5−ジニトロフェニル)−3−(1−オクタデセン)−スクシニックイミド(DN−IM−18)16.2gを製造した(収率63%)。
[Production Example 7] Production of 1- (3,5-dinitrophenyl) -3- (1-octadecene) -succinic imide (DN-IM-18) Instead of 2-hexen-1-ylsuccinic anhydride, Except that 17.5 g (0.05 mole) of 2-octadecene-1-ylsuccinic anhydride was used, the same reaction as in Production Example 1 was performed to give 1- (3,5-dinitrophenyl)- 3- (1-Octadecene) -succinic imide (DN-IM-18) was obtained.
The solid obtained above was recrystallized from methanol to produce 16.2 g of 1- (3,5-dinitrophenyl) -3- (1-octadecene) -succinic imide (DN-IM-18). 63%).

[製造例8]1−(3,5−ジアミノフェニル)−3−ヘキシル−スクシニックイミド(DA−IM−6)の製造
NMPとエタノール(1/3体積比)100mLにDN−IM−6 6.9g(0.02mole)を溶解した後、Pd/C(5%)触媒(炭素粒子の表面に金属パラジウムを5%の量で塗布した触媒)0.5gとともに水素反応器に入れた後、60℃で2時間還元反応を行った。反応混合物を濾過した後、反応溶媒を減圧蒸留した。
前記で得られた固体をヘキサン/酢酸エチルの共溶媒中で再結晶して1−(3,5−ジアミノフェニル)−3−ヘキシル−スクシニックイミド(DA−IM−6)3.18gを製造した(収率55%)。
[Production Example 8] Production of 1- (3,5-diaminophenyl) -3-hexyl-succinic imide (DA-IM-6) DN-IM-6 6 in 100 mL of NMP and ethanol (1/3 volume ratio) 0.9 g (0.02 mole) was dissolved, and then placed in a hydrogen reactor together with 0.5 g of a Pd / C (5%) catalyst (a catalyst in which 5% of metallic palladium was applied to the surface of carbon particles). The reduction reaction was performed at 60 ° C. for 2 hours. After filtering the reaction mixture, the reaction solvent was distilled under reduced pressure.
The solid obtained above was recrystallized in a co-solvent of hexane / ethyl acetate to produce 3.18 g of 1- (3,5-diaminophenyl) -3-hexyl-succinic imide (DA-IM-6). (55% yield).

[製造例9]1−(3,5−ジアミノフェニル)−3−オキシル−スクシニックイミド(DA−IM−8)の製造
DN−IM−6の代わりに7.5g(0.02mole)のDN−IM−8を用いたことを除いては、前記製造例8と同様な方法を行って、1−(3,5−ジアミノフェニル)−3−オキシル−スクシニックイミド(DA−IM−8)を得た。
前記で得られた固体をヘキサン/酢酸エチルの共溶媒中で再結晶して1−(3,5−ジアミノフェニル)−3−オキシル−スクシニックイミド(DA−IM−8)3.68gを製造した(収率58%)。
[Production Example 9] Production of 1- (3,5-diaminophenyl) -3-oxyl-succinic imide (DA-IM-8) 7.5 g (0.02 mole) of DN instead of DN-IM-6 1- (3,5-diaminophenyl) -3-oxyl-succinic imide (DA-IM-8) was prepared in the same manner as in Production Example 8 except that -IM-8 was used. Got.
The solid obtained above was recrystallized in a co-solvent of hexane / ethyl acetate to produce 3.68 g of 1- (3,5-diaminophenyl) -3-oxyl-succinic imide (DA-IM-8). (Yield 58%).

[製造例10]1−(3,5−ジアミノフェニル)−3−デシル−スクシニックイミド(DA−IM−10)の製造
DN−IM−6の代わりに8.1g(0.02mole)のDN−IM−10を用いたことを除いては、前記製造例8と同様な方法を行って、1−(3,5−ジアミノフェニル)−3−デシル−スクシニックイミド(DA−IM−10)を得た。
前記で得られた固体をヘキサン/酢酸エチルの共溶媒中で再結晶して1−(3,5−ジアミノフェニル)−3−デシル−スクシニックイミド(DA−IM−10)4.15gを製造した(収率60%)。
[Production Example 10] Production of 1- (3,5-diaminophenyl) -3-decyl-succinic imide (DA-IM-10) 8.1 g (0.02 mole) of DN instead of DN-IM-6 1- (3,5-diaminophenyl) -3-decyl-succinic imide (DA-IM-10) was prepared in the same manner as in Production Example 8 except that -IM-10 was used. Got.
The solid obtained above was recrystallized in a co-solvent of hexane / ethyl acetate to produce 4.15 g of 1- (3,5-diaminophenyl) -3-decyl-succinic imide (DA-IM-10). (Yield 60%).

[製造例11]1−(3,5−ジアミノフェニル)−3−ドデシル−スクシニックイミド(DA−IM−12)の製造
DN−IM−6の代わりに8.6g(0.02mole)のDN−IM−12を用いたことを除いては、前記製造例8と同様な方法を行って、1−(3,5−ジアミノフェニル)−3−ドデシル−スクシニックイミド(DA−IM−12)を得た。
前記で得られた固体をヘキサン/酢酸エチルの共溶媒中で再結晶して1−(3,5−ジアミノフェニル)−3−ドデシル−スクシニックイミド(DA−IM−12)4.48gを製造した(収率60%)。
[Production Example 11] Production of 1- (3,5-diaminophenyl) -3-dodecyl-succinic imide (DA-IM-12) 8.6 g (0.02 mole) of DN instead of DN-IM-6 1- (3,5-diaminophenyl) -3-dodecyl-succinic imide (DA-IM-12) was prepared in the same manner as in Production Example 8 except that -IM-12 was used. Got.
The solid obtained above was recrystallized in a co-solvent of hexane / ethyl acetate to produce 4.48 g of 1- (3,5-diaminophenyl) -3-dodecyl-succinic imide (DA-IM-12). (Yield 60%).

[製造例12]1−(3,5−ジアミノフェニル)−3−テトラデシル−スクシニックイミド(DA−IM−14)の製造
DN−IM−6の代わりに9.2g(0.02mole)のDN−IM−14を用いたことを除いては、前記製造例8と同様な方法を行って、1−(3,5−ジアミノフェニル)−3−テトラデシル−スクシニックイミド(DA−IM−14)を得た。
前記で得られた固体をヘキサン/酢酸エチルの共溶媒中で再結晶して1−(3,5−ジアミノフェニル)−3−テトラデシル−スクシニックイミド(DA−IM−14)5.6gを製造した(収率70%)。
[Production Example 12] Production of 1- (3,5-diaminophenyl) -3-tetradecyl-succinic imide (DA-IM-14) 9.2 g (0.02 mole) of DN instead of DN-IM-6 1- (3,5-diaminophenyl) -3-tetradecyl-succinic imide (DA-IM-14) was prepared in the same manner as in Production Example 8 except that -IM-14 was used. Got.
The solid obtained above was recrystallized in a co-solvent of hexane / ethyl acetate to produce 5.6 g of 1- (3,5-diaminophenyl) -3-tetradecyl-succinic imide (DA-IM-14). (Yield 70%).

[製造例13]1−(3,5−ジアミノフェニル)−3−ヘキサデシル−スクシニックイミド(DA−IM−16)の製造
DN−IM−6の代わりに9.8g(0.02mole)のDN−IM−16を用いたことを除いては、前記製造例8と同様な方法を行って、1−(3,5−ジアミノフェニル)−3−ヘキサデシル−スクシニックイミド(DA−IM−16)を得た。
前記で得られた固体をヘキサン/酢酸エチルの共溶媒中で再結晶して1−(3,5−ジアミノフェニル)−3−オキシル−スクシニックイミド(DA−IM−16)6.01gを製造した(収率70%)。
[Production Example 13] Production of 1- (3,5-diaminophenyl) -3-hexadecyl-succinic imide (DA-IM-16) 9.8 g (0.02 mole) of DN instead of DN-IM-6 1- (3,5-diaminophenyl) -3-hexadecyl-succinic imide (DA-IM-16) was prepared in the same manner as in Production Example 8 except that -IM-16 was used. Got.
The solid obtained above was recrystallized in a co-solvent of hexane / ethyl acetate to produce 6.01 g of 1- (3,5-diaminophenyl) -3-oxyl-succinimide (DA-IM-16). (Yield 70%).

[製造例14]1−(3,5−ジアミノフェニル)−3−オクタデシル−スクシニックイミド(DA−IM−18)の製造
DN−IM−6の代わりに10.3g(0.02mole)のDN−IM−18を用いたことを除いては、前記製造例8と同様な方法を行って、1−(3,5−ジアミノフェニル)−3−オクタデシル−スクシニックイミド(DA−IM−18)を得た。
前記で得られた固体をヘキサン/酢酸エチルの共溶媒中で再結晶して1−(3,5−ジアミノフェニル)−3−オクタデシル−スクシニックイミド(DA−IM−18)6.87gを製造した(収率75%)。
前記製造例8〜14で製造された、低極性アルキル基が置換されたスクシニックイミド側鎖基を有するジアミン単量体としてのDA−IM−6〜18は、再結晶後の収率が50%以上に製造できることが確認でき、空気中で非常に優れた貯蔵安定性を示した。
[Production Example 14] Production of 1- (3,5-diaminophenyl) -3-octadecyl-succinic imide (DA-IM-18) 10.3 g (0.02 mole) of DN instead of DN-IM-6 1- (3,5-diaminophenyl) -3-octadecyl-succinic imide (DA-IM-18) was prepared in the same manner as in Production Example 8 except that -IM-18 was used. Got.
The solid obtained above was recrystallized in a co-solvent of hexane / ethyl acetate to produce 6.87 g of 1- (3,5-diaminophenyl) -3-octadecyl-succinic imide (DA-IM-18). (Yield 75%).
DA-IM-6-18 as a diamine monomer having a succinic imide side group substituted with a low polar alkyl group produced in Production Examples 8-14 has a yield after recrystallization of 50. %, It was confirmed that it could be produced in excess of%, and showed very excellent storage stability in air.

[製造例15]低極性側鎖含有ポリアミック酸樹脂(PAA−1)の製造
攪拌機、温度調節装置、窒素注入装置および冷却器付きの250mLの反応器に窒素ガスを徐々に通過させながら1−(3,5−ジアミノフェニル)−3−オクタデシル−スクシニックイミド(DA−IM−18)9.15g(0.02mole)を反応溶媒のN−メチル−2−ピロリドンに溶解した後、窒素ガスを通過させながら固体状の5−(2,5−ジオキソテトラヒドロフリル)−3−メチルシクロヘキサン−1,2−ジカルボン酸二無水物5.28g(0.02mole)を徐々に加えた。この際、固形分濃度(solid content)は20重量%に固定し、反応温度を0℃以下に保ちながら24時間攪拌してポリアミック酸溶液(PAA−1)を得た。
[Production Example 15] Production of low-polarity side chain-containing polyamic acid resin (PAA-1) While gradually passing nitrogen gas through a 250 mL reactor equipped with a stirrer, temperature control device, nitrogen injection device and cooler, 3.15 g (0.02 mole) of 3,5-diaminophenyl) -3-octadecyl-succinicimide (DA-IM-18) was dissolved in N-methyl-2-pyrrolidone as a reaction solvent, and then passed through nitrogen gas. Then, 5.28 g (0.02 mole) of solid 5- (2,5-dioxotetrahydrofuryl) -3-methylcyclohexane-1,2-dicarboxylic dianhydride was gradually added. Under the present circumstances, solid content concentration (solid content) was fixed to 20 weight%, and it stirred for 24 hours, keeping reaction temperature below 0 degreeC, and obtained the polyamic acid solution (PAA-1).

[製造例16]低極性側鎖含有ポリアミック酸樹脂(PAA−2)の製造
攪拌機、温度調節装置、窒素注入装置および冷却器付きの250mLの反応器に窒素ガスを徐々に通過させながら1−(3,5−ジアミノフェニル)−3−オクタデシル−スクシニックイミド(DA−IM−18)9.15g(0.02mole)を反応溶媒のN−メチル−2−ピロリドンに溶解した後、窒素ガスを通過させながら固体状の1,2,3,4−シクロブタンテトラカルボン酸二無水物3.92g(0.02mole)を徐々に加えた。この際、固形分濃度(solid content)は20重量%に固定し、反応温度を0℃以下に保ちながら24時間攪拌してポリアミック酸溶液(PAA−2)を得た。
[Production Example 16] Production of low-polar side chain-containing polyamic acid resin (PAA-2) While gradually passing nitrogen gas through a 250 mL reactor equipped with a stirrer, temperature control device, nitrogen injection device and cooler, 1- ( 3.15 g (0.02 mole) of 3,5-diaminophenyl) -3-octadecyl-succinicimide (DA-IM-18) was dissolved in N-methyl-2-pyrrolidone as a reaction solvent, and then passed through nitrogen gas. Then, 3.92 g (0.02 mole) of solid 1,2,3,4-cyclobutanetetracarboxylic dianhydride was gradually added. Under the present circumstances, solid content concentration (solid content) was fixed to 20 weight%, and it stirred for 24 hours, keeping reaction temperature below 0 degreeC, and obtained the polyamic acid solution (PAA-2).

[製造例17]ポリアミック酸(PAA−3)の製造
攪拌機、窒素注入装置付きの500mLの反応器に窒素ガスを徐々に通過させながらメチレンジアニリン19.8g(0.1mole)を反応溶媒のN−メチル−2−ピロリドンに溶解した後、窒素ガスを通過させながら固体状の1,2,3,4−シクロブタンテトラカルボン酸二無水物19.6g(0.1mole)を徐々に加えた。この際、固形分濃度(solid content)は15重量%に固定し、反応温度を0℃以下に保ちながら36時間攪拌してポリアミック酸溶液(PAA−3)を得た。
[Production Example 17] Production of polyamic acid (PAA-3) 19.8 g (0.1 mole) of methylenedianiline was added as a reaction solvent N while gradually passing nitrogen gas through a 500 mL reactor equipped with a stirrer and a nitrogen injection device. -After dissolving in methyl-2-pyrrolidone, 19.6 g (0.1 mole) of solid 1,2,3,4-cyclobutanetetracarboxylic dianhydride was gradually added while passing nitrogen gas. Under the present circumstances, solid content concentration (solid content) was fixed to 15 weight%, and it stirred for 36 hours, keeping reaction temperature below 0 degreeC, and obtained the polyamic acid solution (PAA-3).

[製造例18]可溶性ポリイミド樹脂(SPI)の製造
攪拌機、温度調節装置、窒素注入装置および冷却器付きの250mLの反応器に窒素ガスを徐々に通過させながら1−(3,5−ジアミノフェニル)−3−オクタデシル−スクシニックイミド(DA−IM−18)9.15g(0.02mole)を反応溶媒のN−メチル−2−ピロリドンに溶解した後、窒素ガスを通過させながら固体状の5−(2,5−ジオキソテトラヒドロフリル)−3−メチルシクロヘキサン−1,2−ジカルボン酸二無水物5.28g(0.02mole)を徐々に加えた。この際、固形分濃度(solid content)は20重量%に固定し、反応温度を0℃以下に保ちながら24時間攪拌してポリアミック酸溶液を得た。
前記ポリアミック酸溶液に酢酸無水物6.12g(0.06mole)とピリジン0.1g(0.1mole)を入れて常温で24時間攪拌した後、120℃で3時間攪拌した後、メタノールで数回洗浄して可溶性ポリイミド樹脂(SPI−1)を得た。
[Production Example 18] Production of soluble polyimide resin (SPI) 1- (3,5-diaminophenyl) while gradually passing nitrogen gas through a 250 mL reactor equipped with a stirrer, temperature control device, nitrogen injection device and cooler After dissolving 9.15 g (0.02 mole) of -3-octadecyl-succinic imide (DA-IM-18) in N-methyl-2-pyrrolidone as a reaction solvent, solid 5- 5.28 g (0.02 mole) of (2,5-dioxotetrahydrofuryl) -3-methylcyclohexane-1,2-dicarboxylic dianhydride was gradually added. At this time, the solid content concentration was fixed at 20% by weight, and the mixture was stirred for 24 hours while maintaining the reaction temperature at 0 ° C. or lower to obtain a polyamic acid solution.
Acetic anhydride (6.12 g, 0.06 mole) and pyridine (0.1 g, 0.1 mole) were added to the polyamic acid solution, stirred at room temperature for 24 hours, then stirred at 120 ° C. for 3 hours, and then several times with methanol. By washing, a soluble polyimide resin (SPI-1) was obtained.

[実施例1]
低極性側鎖含有ポリアミック酸樹脂とポリアミック酸混合物(BPAA−2)の製造
攪拌機、窒素注入装置付きの1000mLの反応器に窒素ガスを徐々に通過させながら前記製造例15の低極性側鎖含有ポリアミック酸樹脂溶液1.973gと前記製造例17のポリアミック酸溶液50gを希釈溶媒であるN−メチル−2−ピロリドン80g、γ−ブチロラクトン120g、2−n−ブトキシエタノール60gに入れ、24時間攪拌して25cpsの粘度を有する溶液を製造した。
[Example 1]
Production of low-polar side chain-containing polyamic acid resin and polyamic acid mixture (BPAA-2) Low-polar side-chain-containing polyamic of Production Example 15 while gradually passing nitrogen gas through a 1000 mL reactor equipped with a stirrer and a nitrogen injection device 1.973 g of the acid resin solution and 50 g of the polyamic acid solution of Production Example 17 were put into 80 g of N-methyl-2-pyrrolidone, 120 g of γ-butyrolactone and 60 g of 2-n-butoxyethanol as dilution solvents, and stirred for 24 hours. A solution having a viscosity of 25 cps was produced.

[実施例2]
低極性側鎖含有ポリアミック酸樹脂とポリアミック酸混合物(BPAA−3)の製造
攪拌機、窒素注入装置付きの1000mLの反応器に窒素ガスを徐々に通過させながら前記製造例15の低極性側鎖含有ポリアミック酸樹脂溶液4.166gと、前記製造例17のポリアミック酸溶液50gを希釈溶媒であるN−メチル−2−ピロリドン80g、γ−ブチロラクトン120g、2−n−ブトキシエタノール60gに入れ、24時間攪拌して25cpsの粘度を有する溶液を製造した。
[Example 2]
Production of Low Polarity Side Chain Containing Polyamic Acid Resin and Polyamic Acid Mixture (BPAA-3) The low polarity side chain containing polyamic of Production Example 15 while gradually passing nitrogen gas through a 1000 mL reactor equipped with a stirrer and nitrogen injection device 4.166 g of the acid resin solution and 50 g of the polyamic acid solution of Production Example 17 were put into 80 g of N-methyl-2-pyrrolidone, 120 g of γ-butyrolactone and 60 g of 2-n-butoxyethanol as dilution solvents, and stirred for 24 hours. A solution having a viscosity of 25 cps was produced.

[実施例3]
低極性側鎖含有ポリアミック酸樹脂とポリアミック酸混合物(BPAA−4)の製造
攪拌機、窒素注入装置付きの1000mLの反応器に窒素ガスを徐々に通過させながら前記製造例15の低極性側鎖含有ポリアミック酸樹脂溶液16.073gと、前記製造例17のポリアミック酸溶液50gを希釈溶媒であるN−メチル−2−ピロリドン75g、γ−ブチロラクトン120g、2−n−ブトキシエタノール60gに入れ、24時間攪拌して25cpsの粘度を有する溶液を製造した。
[Example 3]
Production of low-polar side chain-containing polyamic acid resin and polyamic acid mixture (BPAA-4) Low-polar side chain-containing polyamic of Production Example 15 while gradually passing nitrogen gas through a 1000 mL reactor equipped with a stirrer and a nitrogen injection device 16.073 g of the acid resin solution and 50 g of the polyamic acid solution of Production Example 17 were put into 75 g of N-methyl-2-pyrrolidone, 120 g of γ-butyrolactone and 60 g of 2-n-butoxyethanol as dilution solvents, and stirred for 24 hours. A solution having a viscosity of 25 cps was produced.

[実施例4]
低極性側鎖含有ポリアミック酸樹脂とポリアミック酸混合物(BPAA−5)の製造
攪拌機、窒素注入装置付きの1000mLの反応器に窒素ガスを徐々に通過させながら前記製造例15の低極性側鎖含有ポリアミック酸樹脂溶液37.503gと、前記製造例17のポリアミック酸溶液50gを希釈溶媒であるN−メチル−2−ピロリドン75g、γ−ブチロラクトン120g、2−n−ブトキシエタノール60gに入れ、24時間攪拌して25cpsの粘度を有する溶液を製造した。
[Example 4]
Production of low polar side chain-containing polyamic acid resin and polyamic acid mixture (BPAA-5) Low polar side chain-containing polyamic of Production Example 15 while gradually passing nitrogen gas through a 1000 mL reactor equipped with a stirrer and nitrogen injection device 37.503 g of the acid resin solution and 50 g of the polyamic acid solution of Production Example 17 were placed in 75 g of N-methyl-2-pyrrolidone, 120 g of γ-butyrolactone, and 60 g of 2-n-butoxyethanol as dilution solvents, and stirred for 24 hours. A solution having a viscosity of 25 cps was produced.

[実施例5]
低極性側鎖含有ポリアミック酸とポリアミック酸混合物(BPAA−6)の製造
攪拌機、窒素注入装置付きの1000mLの反応器に窒素ガスを徐々に通過させながら前記製造例15の低極性側鎖含有ポリアミック酸樹脂溶液87.5gと、前記製造例17のポリアミック酸溶液50gを希釈溶媒であるN−メチル−2−ピロリドン75g、γ−ブチロラクトン120g、2−n−ブトキシエタノール60gに入れ、24時間攪拌して25cpsの粘度を有する溶液を製造した。
[Example 5]
Production of low-polar side chain-containing polyamic acid and polyamic acid mixture (BPAA-6) Low-polar side-chain-containing polyamic acid of Production Example 15 while gradually passing nitrogen gas through a 1000 mL reactor equipped with a stirrer and a nitrogen injection device 87.5 g of the resin solution and 50 g of the polyamic acid solution of Production Example 17 were put into 75 g of N-methyl-2-pyrrolidone, 120 g of γ-butyrolactone and 60 g of 2-n-butoxyethanol as dilution solvents, and stirred for 24 hours. A solution having a viscosity of 25 cps was produced.

[実施例6]
低極性側鎖含有ポリアミック酸樹脂とポリアミック酸混合物(BPAA−7)の製造
攪拌機、窒素注入装置付きの1000mLの反応器に窒素ガスを徐々に通過させながら前記製造例15の低極性側鎖含有ポリアミック酸樹脂溶液337.3gと、前記製造例17のポリアミック酸溶液50gを希釈溶媒であるN−メチル−2−ピロリドン75g、γ−ブチロラクトン120g、2−n−ブトキシエタノール60gに入れ、24時間攪拌して25cpsの粘度を有する溶液を製造した。
[Example 6]
Production of low-polar side chain-containing polyamic acid resin and polyamic acid mixture (BPAA-7) Low-polar side-chain-containing polyamic of Production Example 15 while gradually passing nitrogen gas through a 1000 mL reactor equipped with a stirrer and a nitrogen injection device 337.3 g of the acid resin solution and 50 g of the polyamic acid solution of Production Example 17 were put into 75 g of N-methyl-2-pyrrolidone, 120 g of γ-butyrolactone and 60 g of 2-n-butoxyethanol as dilution solvents, and stirred for 24 hours. A solution having a viscosity of 25 cps was produced.

[実施例7]
低極性側鎖含有ポリアミック酸樹脂とポリアミック酸混合物(BPAA−8)の製造
攪拌機、窒素注入装置付きの1000mLの反応器に窒素ガスを徐々に通過させながら前記製造例16の低極性側鎖含有ポリアミック酸樹脂溶液0.765gと、前記製造例17のポリアミック酸溶液50gを希釈溶媒であるN−メチル−2−ピロリドン80g、γ−ブチロラクトン120g、2−n−ブトキシエタノール60gに入れ、24時間攪拌して25cpsの粘度を有する溶液を製造した。
[Example 7]
Production of low-polar side chain-containing polyamic acid resin and polyamic acid mixture (BPAA-8) Low-polar side-chain-containing polyamic of Production Example 16 while gradually passing nitrogen gas through a 1000 mL reactor equipped with a stirrer and a nitrogen injection device An acid resin solution (0.765 g) and the polyamic acid solution (50 g) of Production Example 17 were placed in N-methyl-2-pyrrolidone (80 g), γ-butyrolactone (120 g), and 2-n-butoxyethanol (60 g), and stirred for 24 hours. A solution having a viscosity of 25 cps was produced.

[実施例8]
低極性側鎖含有ポリアミック酸樹脂とポリアミック酸混合物(BPAA−9)の製造
攪拌機、窒素注入装置付きの1000mLの反応器に窒素ガスを徐々に通過させながら前記製造例16の低極性側鎖含有ポリアミック酸樹脂溶液1.974gと、前記製造例17のポリアミック酸溶液50gを希釈溶媒であるN−メチル−2−ピロリドン80g、γ−ブチロラクトン120g、2−n−ブトキシエタノール60gに入れ、24時間攪拌して25cpsの粘度を有する溶液を製造した。
[Example 8]
Production of low-polar side chain-containing polyamic acid resin and polyamic acid mixture (BPAA-9) Low-polar side-chain-containing polyamic of Production Example 16 while gradually passing nitrogen gas through a 1000 mL reactor equipped with a stirrer and a nitrogen injection device 1.974 g of the acid resin solution and 50 g of the polyamic acid solution of Production Example 17 were placed in 80 g of N-methyl-2-pyrrolidone, 120 g of γ-butyrolactone and 60 g of 2-n-butoxyethanol as dilution solvents, and stirred for 24 hours. A solution having a viscosity of 25 cps was produced.

[実施例9]
低極性側鎖含有ポリアミック酸樹脂とポリアミック酸混合物(BPAA−10)の製造
攪拌機、窒素注入装置付きの1000mLの反応器に窒素ガスを徐々に通過させながら前記製造例16の低極性側鎖含有ポリアミック酸樹脂溶液4.166gと、前記製造例17のポリアミック酸溶液50gを希釈溶媒であるN−メチル−2−ピロリドン80g、γ−ブチロラクトン120g、2−n−ブトキシエタノール60gに入れ、24時間攪拌して25cpsの粘度を有する溶液を製造した。
[Example 9]
Production of low-polar side chain-containing polyamic acid resin and polyamic acid mixture (BPAA-10) Low-polar side-chain-containing polyamic of Production Example 16 while gradually passing nitrogen gas through a 1000 mL reactor equipped with a stirrer and a nitrogen injection device 4.166 g of the acid resin solution and 50 g of the polyamic acid solution of Production Example 17 were put into 80 g of N-methyl-2-pyrrolidone, 120 g of γ-butyrolactone and 60 g of 2-n-butoxyethanol as dilution solvents, and stirred for 24 hours. A solution having a viscosity of 25 cps was produced.

[実施例10]
低極性側鎖含有ポリアミック酸樹脂とポリアミック酸混合物(BPAA−11)の製造
攪拌機、窒素注入装置付きの1000mLの反応器に窒素ガスを徐々に通過させながら前記製造例16の低極性側鎖含有ポリアミック酸樹脂溶液16.05gと、前記製造例17のポリアミック酸溶液50gを希釈溶媒であるN−メチル−2−ピロリドン75g、γ−ブチロラクトン120g、2−n−ブトキシエタノール60gに入れ、24時間攪拌して25cpsの粘度を有する溶液を製造した。
[Example 10]
Production of low-polar side chain-containing polyamic acid resin and polyamic acid mixture (BPAA-11) Low-polar side-chain-containing polyamic of Production Example 16 while gradually passing nitrogen gas through a 1000 mL reactor equipped with a stirrer and a nitrogen injection device 16.05 g of the acid resin solution and 50 g of the polyamic acid solution of Production Example 17 were put into 75 g of N-methyl-2-pyrrolidone, 120 g of γ-butyrolactone and 60 g of 2-n-butoxyethanol as dilution solvents, and stirred for 24 hours. A solution having a viscosity of 25 cps was produced.

[実施例11]
低極性側鎖含有ポリアミック酸樹脂とポリアミック酸混合物(BPAA−12)の製造
攪拌機、窒素注入装置付きの1000mLの反応器に窒素ガスを徐々に通過させながら前記製造例16の低極性側鎖含有ポリアミック酸樹脂溶液37.503gと、前記製造例17のポリアミック酸溶液50gを希釈溶媒であるN−メチル−2−ピロリドン75g、γ−ブチロラクトン120g、2−n−ブトキシエタノール60gに入れ、24時間攪拌して25cpsの粘度を有する溶液を製造した。
[Example 11]
Production of low-polar side chain-containing polyamic acid resin and polyamic acid mixture (BPAA-12) Low-polar side-chain-containing polyamic of Production Example 16 while gradually passing nitrogen gas through a 1000 mL reactor equipped with a stirrer and a nitrogen injection device 37.503 g of the acid resin solution and 50 g of the polyamic acid solution of Production Example 17 were placed in 75 g of N-methyl-2-pyrrolidone, 120 g of γ-butyrolactone, and 60 g of 2-n-butoxyethanol as dilution solvents, and stirred for 24 hours. A solution having a viscosity of 25 cps was produced.

[実施例12]
低極性側鎖含有ポリアミック酸樹脂とポリアミック酸混合物(BPAA−13)の製造
攪拌機、窒素注入装置付きの1000mLの反応器に窒素ガスを徐々に通過させながら前記製造例16の低極性側鎖含有ポリアミック酸樹脂溶液87.5gと、前記製造例17のポリアミック酸溶液50gを希釈溶媒であるN−メチル−2−ピロリドン75g、γ−ブチロラクトン120g、2−n−ブトキシエタノール60gに入れ、24時間攪拌して25cpsの粘度を有する溶液を製造した。
[Example 12]
Production of low-polar side chain-containing polyamic acid resin and polyamic acid mixture (BPAA-13) Low-polar side-chain-containing polyamic of Production Example 16 while gradually passing nitrogen gas through a 1000 mL reactor equipped with a stirrer and nitrogen injection device 87.5 g of the acid resin solution and 50 g of the polyamic acid solution of Production Example 17 were put into 75 g of N-methyl-2-pyrrolidone, 120 g of γ-butyrolactone, and 60 g of 2-n-butoxyethanol as dilution solvents, and stirred for 24 hours. A solution having a viscosity of 25 cps was produced.

[実施例13]
低極性側鎖含有ポリアミック酸樹脂とポリアミック酸混合物(BPAA−14)の製造
攪拌機、窒素注入装置付きの1000mLの反応器に窒素ガスを徐々に通過させながら前記製造例16の低極性側鎖含有ポリアミック酸樹脂溶液337.3gと、前記製造例17のポリアミック酸溶液50gを希釈溶媒であるN−メチル−2−ピロリドン75g、γ−ブチロラクトン120g、2−n−ブトキシエタノール60gに入れ、24時間攪拌して25cpsの粘度を有する溶液を製造した。
[Example 13]
Production of low-polar side chain-containing polyamic acid resin and polyamic acid mixture (BPAA-14) Low-polar side-chain-containing polyamic of Production Example 16 while gradually passing nitrogen gas through a 1000 mL reactor equipped with a stirrer and a nitrogen injection device 337.3 g of the acid resin solution and 50 g of the polyamic acid solution of Production Example 17 were put into 75 g of N-methyl-2-pyrrolidone, 120 g of γ-butyrolactone and 60 g of 2-n-butoxyethanol as dilution solvents, and stirred for 24 hours. A solution having a viscosity of 25 cps was produced.

[比較例1]低極性側鎖含有ポリアミック酸樹脂(PAA−1)の製造
攪拌機、温度調節装置、窒素注入装置および冷却器付きの250mLの反応器に窒素ガスを徐々に通過させながら1−(3,5−ジアミノフェニル)−3−オクタデシル−スクシニックイミド(DA−IM−18)9.15g(0.02mole)を反応溶媒のN−メチル−2−ピロリドンに溶解した後、窒素ガスを通過させながら固体状の5−(2,5−ジオキソテトラヒドロフリル)−3−メチルシクロヘキサン−1,2−ジカルボン酸二無水物5.28g(0.02mole)を徐々に加えた。この際、固形分濃度(solid content)は20重量%に固定し、反応温度を0℃以下に保ちながら24時間攪拌してポリアミック酸溶液(PAA−1)を得た。
[Comparative Example 1] Production of low-polar side chain-containing polyamic acid resin (PAA-1) 1- () while gradually passing nitrogen gas through a 250 mL reactor equipped with a stirrer, temperature control device, nitrogen injection device and cooler 3.15 g (0.02 mole) of 3,5-diaminophenyl) -3-octadecyl-succinicimide (DA-IM-18) was dissolved in N-methyl-2-pyrrolidone as a reaction solvent, and then passed through nitrogen gas. Then, 5.28 g (0.02 mole) of solid 5- (2,5-dioxotetrahydrofuryl) -3-methylcyclohexane-1,2-dicarboxylic dianhydride was gradually added. Under the present circumstances, solid content concentration (solid content) was fixed to 20 weight%, and it stirred for 24 hours, keeping reaction temperature below 0 degreeC, and obtained the polyamic acid solution (PAA-1).

[比較例2]低極性側鎖含有ポリアミック酸樹脂(PAA−2)の製造
攪拌機、温度調節装置、窒素注入装置および冷却器付きの250mLの反応器に窒素ガスを徐々に通過させながら1−(3,5−ジアミノフェニル)−3−オクタデシル−スクシニックイミド(DA−IM−18)9.15g(0.02mole)を反応溶媒のN−メチル−2−ピロリドンに溶解した後、窒素ガスを通過させながら固体状の1,2,3,4−シクロブタンテトラカルボン酸二無水物3.92g(0.02mole)を徐々に加えた。この際、固形分濃度(solid content)は20重量%に固定し、反応温度を0℃以下に保ちながら24時間攪拌してポリアミック酸溶液(PAA−2)を得た。
[Comparative Example 2] Production of low-polar side chain-containing polyamic acid resin (PAA-2) While gradually passing nitrogen gas through a 250 mL reactor equipped with a stirrer, temperature control device, nitrogen injection device, and cooler, 3.15 g (0.02 mole) of 3,5-diaminophenyl) -3-octadecyl-succinicimide (DA-IM-18) was dissolved in N-methyl-2-pyrrolidone as a reaction solvent, and then passed through nitrogen gas. Then, 3.92 g (0.02 mole) of solid 1,2,3,4-cyclobutanetetracarboxylic dianhydride was gradually added. Under the present circumstances, solid content concentration (solid content) was fixed to 20 weight%, and it stirred for 24 hours, keeping reaction temperature below 0 degreeC, and obtained the polyamic acid solution (PAA-2).

[比較例3]ポリアミック酸(PAA−3)の製造
攪拌機、窒素注入装置付きの500mLの反応器に窒素ガスを徐々に通過させながらメチレンジアニリン19.8g(0.1mole)を反応溶媒のN−メチル−2−ピロリドンに溶解した後、窒素ガスを通過させながら固体状の1,2,3,4−シクロブタンテトラカルボン酸二無水物19.6g(0.1mole)を徐々に加えた。この際、固形分濃度(solid content)は15重量%に固定し、反応温度を0℃以下に保ちながら36時間攪拌してポリアミック酸溶液(PAA−3)を得た。
[Comparative Example 3] Production of polyamic acid (PAA-3) 19.8 g (0.1 mole) of methylenedianiline was added as a reaction solvent N while gradually passing nitrogen gas through a 500 mL reactor equipped with a stirrer and a nitrogen injection device. -After dissolving in methyl-2-pyrrolidone, 19.6 g (0.1 mole) of solid 1,2,3,4-cyclobutanetetracarboxylic dianhydride was gradually added while passing nitrogen gas. Under the present circumstances, solid content concentration (solid content) was fixed to 15 weight%, and it stirred for 36 hours, keeping reaction temperature below 0 degreeC, and obtained the polyamic acid solution (PAA-3).

[比較例4]可溶性ポリイミド含有ポリアミック酸(PAA−4)の製造
攪拌機、窒素注入装置付きの500mLの反応器に窒素ガスを徐々に通過させながら前記製造例17のポリアミック酸樹脂50gと、前記製造例18の可溶性ポリイミド溶液0.395gを希釈溶媒であるN−メチル−2−ピロリドン80g、γ−ブチロラクトン120g、2−n−ブトキシエタノール60gに入れ、24時間攪拌して25cpsの粘度を有する溶液を製造した。
[Comparative Example 4] Production of soluble polyimide-containing polyamic acid (PAA-4) 50 g of the polyamic acid resin of Production Example 17 while gradually passing nitrogen gas through a 500 mL reactor equipped with a stirrer and a nitrogen injection device, and the production A solution having a viscosity of 25 cps was obtained by adding 0.395 g of the soluble polyimide solution of Example 18 to 80 g of N-methyl-2-pyrrolidone as a dilution solvent, 120 g of γ-butyrolactone, and 60 g of 2-n-butoxyethanol and stirring for 24 hours. Manufactured.

[実験例1]
前記実施例1〜13および比較例1〜4に従って製造された溶液をITOガラス板上に0.05〜0.2μmの厚さにスピンコーティングした後、230℃の温度で30分間熱硬化して得られたポリイミド誘導体薄膜の物性を下記表1に示す。
[Experiment 1]
The solutions prepared according to Examples 1 to 13 and Comparative Examples 1 to 4 were spin-coated on an ITO glass plate to a thickness of 0.05 to 0.2 μm, and then thermally cured at 230 ° C. for 30 minutes. The physical properties of the obtained polyimide derivative thin film are shown in Table 1 below.

前記表1に示したように、本発明に係る低極性側鎖含有ポリアミック酸樹脂はすべて明るいカボチャ色の透明な樹脂で、0.49〜1.38dL/g範囲の固有粘度を有することが確認され、前記樹脂は溶媒鋳型によるフィルム成形性および機械的特性に非常に優れていた。   As shown in Table 1, it is confirmed that the low polar side chain-containing polyamic acid resins according to the present invention are all bright pumpkin-colored transparent resins and have an intrinsic viscosity in the range of 0.49 to 1.38 dL / g. The resin was extremely excellent in film moldability and mechanical properties by a solvent mold.

また、本発明に係るポリイミド薄膜の鉛筆硬度は1H〜5H範囲であって、平均3H以上と均一であったが、比較例1、2および4では著しく低下した。薄膜の表面張力はイミド環含有環系側鎖基が導入されたスクシニックイミド側鎖基が導入されたジアミンの含量が増加するにつれて減少する傾向を示し、36.2〜37.2dyne/cmの均一な値を示した。   Moreover, the pencil hardness of the polyimide thin film according to the present invention was in the range of 1H to 5H and was uniform with an average of 3H or more, but in Comparative Examples 1, 2 and 4, it was significantly reduced. The surface tension of the thin film tended to decrease as the content of the diamine introduced with the succinic imide side group introduced with the imide ring-containing ring system side group was increased to 36.2-37.2 dyne / cm. A uniform value was shown.

[実験例2]
前記実施例1〜13および比較例1〜4で得られた溶液の常温における溶液粘度を20〜40cpに保持した後、薄膜コーティング(コーティング条件;400〜4,000rpm、25秒)して薄膜を製造した。そして、ラビング(0.25T)して液晶セルを製作した後、前記製作された液晶セルの特性を測定し、その結果を下記表2に示す。
液晶の配向状態は偏光顕微鏡を用いて目視で観察し、結晶回転法(crystal rotation method)を用いて各液晶セルのプレティルト角(pretilt angles)を測定し、DCバイアス電圧を変えながら液晶パネルを電気容量を測定したC-V hysteresis曲線のキャパシタンス変化率が20%の地点を基準として、同一のキャパシタンスで電圧差を求めて残留電圧(residual D.C)を測定した。
[Experiment 2]
After the solution viscosity at room temperature of the solutions obtained in Examples 1 to 13 and Comparative Examples 1 to 4 was kept at 20 to 40 cp, thin film coating was performed (coating conditions; 400 to 4,000 rpm, 25 seconds). Manufactured. And after rubbing (0.25T) and manufacturing a liquid crystal cell, the characteristic of the manufactured liquid crystal cell was measured, and the result is shown in Table 2 below.
The alignment state of the liquid crystal is visually observed using a polarizing microscope, the pretilt angles of each liquid crystal cell are measured using the crystal rotation method, and the liquid crystal panel is electrically connected while changing the DC bias voltage. The residual voltage (residual DC) was measured by obtaining the voltage difference with the same capacitance with reference to the point where the capacitance change rate of the CV hysteresis curve where the capacitance was measured was 20%.

前記表2に示したように、実施例1〜13で製造された本発明に係る低極性側鎖を有するポリアミック酸が含有されたポリアミック酸混合組成物を用いて製造された液晶セルは非常に高いプレティルト角、電圧保持率を示し、優れた残留電圧特性を示すことが分かった。   As shown in Table 2, the liquid crystal cell manufactured using the polyamic acid mixed composition containing the polyamic acid having a low polarity side chain according to the present invention manufactured in Examples 1 to 13 is very It was found that a high pretilt angle and voltage holding ratio were exhibited, and an excellent residual voltage characteristic was exhibited.

プレティルト角は90°程度であって、低極性側鎖含有ポリアミック酸を含有していない比較例2に比べて大きく増加し、ラビング後にも平均89°以上の高いプレティルト角を保持することによって、可溶性ポリイミド樹脂を含有する比較例4の場合に比べて特性が向上することが分かった。常温における電圧保持率は99.1〜99.9%範囲であって、すべて99%以上であり、比較例1〜4に比べて優れていることが確認でき、特に、これは可溶性ポリイミドを含有するポリアミック酸混合組成物を用いて製造された比較例4の場合よりも増加する結果を示した。また、低極性側鎖を有するポリアミック酸を含有するポリアミック酸混合組成物は液晶セルの残留電圧が89〜395mVまで減少する結果を示した。これは比較例1〜3に比べて著しく低下する傾向を示すものであって、これから本発明がより優れていることが確認できた。   The pretilt angle is about 90 °, which is greatly increased as compared with Comparative Example 2 that does not contain low-polar side chain-containing polyamic acid, and retains a high pretilt angle of 89 ° or more on average even after rubbing. It turned out that a characteristic improves compared with the case of the comparative example 4 containing a polyimide resin. The voltage holding ratio at room temperature is in the range of 99.1 to 99.9%, and all are 99% or more, and it can be confirmed that it is superior to Comparative Examples 1 to 4, in particular, it contains soluble polyimide. As a result, the results increased compared to the case of Comparative Example 4 produced using the polyamic acid mixed composition. Moreover, the polyamic acid mixed composition containing the polyamic acid having a low-polar side chain showed a result that the residual voltage of the liquid crystal cell decreased to 89 to 395 mV. This shows a tendency to be remarkably lowered as compared with Comparative Examples 1 to 3, and it has been confirmed that the present invention is more excellent.

したがって、前記実験例1および実験例2の結果を総合してみると、本発明に係る実施例1〜13の前記式(1)で表される低極性側鎖含有ポリアミック酸樹脂と前記式(2)で表されるポリアミック酸誘導体が混合されてなるポリアミック酸混合組成物は垂直配向型TFT−TNおよびSTN LCD用液晶配向膜および液晶セルへの使用に非常に適した特性を示すことを確認できた。   Therefore, when the results of Experimental Example 1 and Experimental Example 2 are taken together, the low-polarity side chain-containing polyamic acid resin represented by Formula (1) of Examples 1 to 13 according to the present invention and the formula ( 2) It is confirmed that the polyamic acid mixed composition obtained by mixing the polyamic acid derivative represented by 2) exhibits very suitable characteristics for use in liquid crystal alignment films and liquid crystal cells for vertical alignment type TFT-TN and STN LCDs. did it.

本発明の1−(3,5−ジアミノフェニル)−3−オクタデシル−スクシニックイミド(DA−IM−18)のH−NMRスペクトルを示す。 1 shows the 1 H-NMR spectrum of 1- (3,5-diaminophenyl) -3-octadecyl-succinic imide (DA-IM-18) of the present invention. 本発明の製造例15に従って製造されたPAA−1のH−NMRスペクトルを示す。 1 shows a 1 H-NMR spectrum of PAA-1 produced according to Production Example 15 of the present invention. 本発明の製造例17に従って製造されたPAA−3のH−NMRスペクトルを示す。 1 shows a 1 H-NMR spectrum of PAA-3 produced according to Production Example 17 of the present invention. 本発明の実施例1と実施例7〜10に従って製造されたBPAA−2とBPAA−8〜11のUVスペクトルと比較例2〜4に従って製造されたPAA−2〜3とSPPAのUVスペクトルを示す。Figure 2 shows the UV spectra of BPAA-2 and BPAA-8-11 prepared according to Example 1 and Examples 7-10 of the present invention, and the PAA-2-3 and SPPA prepared according to Comparative Examples 2-4. .

Claims (13)

下記式(1)で表される低極性側鎖含有ポリアミック酸樹脂と下記式(2)で表されるポリアミック酸誘導体が混合されてなるものであることを特徴とする垂直配向型組成物。


〔式中、

から選ばれた1種または2種以上の4価基であって、必ず構造式(a)、(b)、(c)、(d)および(e)から選ばれた1種または2種以上の脂環族系4価基を含み;および

lおよびmは各々1〜300範囲の自然数を示す。〕
A vertically oriented composition comprising a mixture of a low polar side chain-containing polyamic acid resin represented by the following formula (1) and a polyamic acid derivative represented by the following formula (2).


[Where,

1 type or 2 types or more of tetravalent groups selected from 1 and 2 types or more selected from structural formulas (a), (b), (c), (d) and (e). Including alicyclic tetravalent groups of

l and m each represent a natural number in the range of 1 to 300. ]
前記式(1)で表される低極性側鎖含有ポリアミック酸樹脂と前記式(2)で表されるポリアミック酸誘導体が1〜99重量%:1〜99重量%の混合比で含有されることを特徴とする請求項1記載の垂直配向型組成物。    The low polar side chain-containing polyamic acid resin represented by the formula (1) and the polyamic acid derivative represented by the formula (2) are contained in a mixing ratio of 1 to 99% by weight: 1 to 99% by weight. The vertical alignment composition according to claim 1, wherein: 前記式(1)で表される低極性側鎖含有ポリアミック酸樹脂は、固有粘度が0.1〜1.5dL/g範囲であり、重量平均分子量が5,000〜150,000g/molの範囲であることを特徴とする請求項1記載の垂直配向型組成物。   The low polar side chain-containing polyamic acid resin represented by the formula (1) has an intrinsic viscosity in the range of 0.1 to 1.5 dL / g and a weight average molecular weight in the range of 5,000 to 150,000 g / mol. The vertical alignment composition according to claim 1, wherein: 前記式(2)で表されるポリアミック酸誘導体は、固有粘度が0.3〜2.0dL/g範囲であり、重量平均分子量が10,000〜200,000g/molの範囲であることを特徴とする請求項1記載の垂直配向型組成物。    The polyamic acid derivative represented by the formula (2) has an intrinsic viscosity in the range of 0.3 to 2.0 dL / g and a weight average molecular weight in the range of 10,000 to 200,000 g / mol. The vertical alignment composition according to claim 1. 前記式(2)で表されるポリアミック酸誘導体のイミド化温度範囲が200〜300℃であることを特徴とする請求項1記載の垂直配向型組成物。   The vertical alignment composition according to claim 1, wherein the imidization temperature range of the polyamic acid derivative represented by the formula (2) is 200 to 300 ° C. 前記式(1)で表される低極性側鎖含有ポリアミック酸樹脂が、ジメチルアセトアミド、ジメチルホルムアミド、N−メチル−2−ピロリドン、テトラヒドロフラン、クロロホルム、アセトン、酢酸エチルおよびγ−ブチロラクトンから選ばれた溶媒に対して溶解特性を有することを特徴とする請求項1記載の垂直配向型組成物。   The low polar side chain-containing polyamic acid resin represented by the formula (1) is a solvent selected from dimethylacetamide, dimethylformamide, N-methyl-2-pyrrolidone, tetrahydrofuran, chloroform, acetone, ethyl acetate and γ-butyrolactone The vertically-oriented composition according to claim 1, wherein the composition has solubility characteristics with respect to the composition. 請求項1〜6から選ばれたいずれか一つの組成物をコーティングして製造したものであることを特徴とする液晶配向膜。   A liquid crystal alignment film produced by coating any one composition selected from claims 1 to 6. 前記液晶配向膜は、ラビング前の表面張力が30〜40dyne/cm範囲であることを特徴とする請求項7記載の液晶配向膜。   The liquid crystal alignment film according to claim 7, wherein the liquid crystal alignment film has a surface tension before rubbing in a range of 30 to 40 dyne / cm. 前記液晶配向膜は、膜表面の鉛筆硬度が1H〜7H範囲であることを特徴とする請求項7記載の液晶配向膜。   The liquid crystal alignment film according to claim 7, wherein the liquid crystal alignment film has a pencil hardness of 1H to 7H in the film surface. 請求項1〜6から選ばれたいずれか一つの組成物をコーティングして製造したものであることを特徴とする液晶セル。    A liquid crystal cell produced by coating any one composition selected from claims 1-6. 前記液晶セルは、プレティルト角(pretilt angle)が89〜90°範囲であることを特徴とする請求項10記載の液晶セル。   The liquid crystal cell according to claim 10, wherein the liquid crystal cell has a pretilt angle in a range of 89 to 90 °. 前記液晶セルは、常温電圧保持率が99〜99.99%の範囲であることを特徴とする請求項10記載の液晶セル。   The liquid crystal cell according to claim 10, wherein the liquid crystal cell has a normal temperature voltage holding ratio in a range of 99 to 99.99%. 前記液晶セルは、常温残留電圧が100〜400mV範囲であることを特徴とする請求項10記載の液晶セル。   The liquid crystal cell according to claim 10, wherein the liquid crystal cell has a room temperature residual voltage in a range of 100 to 400 mV.
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