JP2006123139A - Movable long size material grinding/polishing/cleaning device - Google Patents
Movable long size material grinding/polishing/cleaning device Download PDFInfo
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- JP2006123139A JP2006123139A JP2004317984A JP2004317984A JP2006123139A JP 2006123139 A JP2006123139 A JP 2006123139A JP 2004317984 A JP2004317984 A JP 2004317984A JP 2004317984 A JP2004317984 A JP 2004317984A JP 2006123139 A JP2006123139 A JP 2006123139A
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- abrasive grain
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- abrasive grains
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Abstract
Description
本発明は、移動しながら砥粒を投射して、長い寸法の平板、角材、帯板、その他角部が鈍角を成す異形材などの長尺材料を研掃するのに好適な装置に関する。 The present invention relates to an apparatus suitable for polishing long materials such as long-sized flat plates, square members, strips, and other irregularly shaped materials having obtuse angles by projecting abrasive grains while moving.
従来、長尺材料の研掃は、一般に砥粒投射装置を装着して研掃室を構成するキャビネット内に長尺材料を通過させて行っている。 Conventionally, long materials are generally cleaned by passing a long material through a cabinet that is equipped with an abrasive grain projection device and constitutes a polishing chamber.
しかし、このように構成された従来の研掃装置では、研掃装置が設置された工場内に長尺材料に持ち込んで研掃を行う必要があり、このため、例えば、環境に有害な物質が付着した長尺材料等を多数研掃する場合には、利便性に欠けるなどの問題があった。 However, in the conventional scouring device configured as described above, it is necessary to carry out scouring by taking a long material into the factory where the scouring device is installed. When a large number of adhering long materials and the like are cleaned, there are problems such as lack of convenience.
解決しようとする問題点は、設備を構成する部品の一つではあるが、有害物質が付着した長尺材料等を多数研掃する場合には、従来の研掃装置では利便性に欠ける点である。 The problem to be solved is one of the components that make up the equipment, but when a large number of long materials, etc., to which harmful substances have adhered are to be cleaned, the conventional polishing equipment lacks convenience. is there.
上記の問題を解消するために本発明における移動式の長尺材料用研掃装置は、移動しながら砥粒を投射して長尺材料を研掃する装置であって、前記長尺材料が水平に貫通可能な中空室を構成しかつ水平方向へ移動可能な包囲手段と、この包囲手段の下部に装着されて前記中空室を貫通する前記長尺材料に向けて斜め上方へ砥粒を投射するインペラを有する1個の遠心式砥粒投射装置と、前記包囲手段の上部内面に装着されて前記遠心式砥粒投射装置から投射された砥粒を下方へ向けて反射させる反射部材と、前記包囲手段の下部内の砥粒を前記遠心式砥粒投射装置に送り込む砥粒送込み手段と、を備えたことを特徴とする。 In order to solve the above problems, the movable long material blasting device in the present invention is a device for projecting abrasive grains while moving and scouring the long material, wherein the long material is horizontal. A surrounding chamber that can penetrate the hollow chamber and that is movable in the horizontal direction, and projects abrasive grains obliquely upward toward the long material that is attached to the lower portion of the surrounding device and penetrates the hollow chamber One centrifugal abrasive grain projecting device having an impeller, a reflecting member mounted on the upper inner surface of the surrounding means and reflecting downwardly projected abrasive grains from the centrifugal abrasive grain projecting device, and the enclosure Abrasive feeding means for feeding abrasive grains in the lower part of the means to the centrifugal abrasive grain projection device.
このように構成されたものは、包囲手段に長尺材料を差し込んだのち、遠心式砥粒投射装置から砥粒を投射しながら長尺材料に沿って研掃装置全体を移動させる。これにより、長尺材料を研掃することができる。 In the structure configured as described above, after the long material is inserted into the surrounding means, the entire polishing apparatus is moved along the long material while projecting abrasive grains from the centrifugal abrasive grain projecting device. Thereby, a long material can be cleaned.
以上の説明から明らかなように本発明は、長尺材料が水平に貫通可能な中空室を構成しかつ水平方向へ移動可能な包囲手段と、この包囲手段の下部に装着されて前記中空室を貫通する前記長尺材料に向けて斜め上方へ砥粒を投射するインペラを有する1個の遠心式砥粒投射装置と、前記包囲手段の上部内面に装着されて前記遠心式砥粒投射装置から投射された砥粒を下方へ向けて反射させる反射部材と、前記包囲手段の下部内の砥粒を前記遠心式砥粒投射装置に送り込む砥粒送込み手段と、を備えたから、包囲手段に長尺材料を差し込んだのち、遠心式砥粒投射装置から砥粒を投射しながら長尺材料に沿って研掃装置全体を移動させるだけで、長尺材料を適確に研掃することができるなどの優れた実用的効果を奏する。 As is apparent from the above description, the present invention comprises a surrounding chamber in which a long material can be horizontally penetrated and movable in the horizontal direction, and the hollow chamber mounted on the lower portion of the surrounding means. One centrifugal abrasive grain projection device having an impeller for projecting abrasive grains obliquely upward toward the long material penetrating, and a projection from the centrifugal abrasive grain projection device mounted on the upper inner surface of the surrounding means A reflecting member that reflects the abrasive grains downward and an abrasive feeding means that feeds the abrasive grains in the lower part of the enclosing means to the centrifugal abrasive projection device. After inserting the material, the long material can be properly cleaned by simply moving the entire polishing device along the long material while projecting abrasive grains from the centrifugal abrasive grain projection device. Excellent practical effect.
以下、本発明を適用した移動式の長尺材料用研掃装置の最良の形態について図1〜図3に基づき詳細に説明する。本移動式の長尺材料用研掃装置は、長尺材料としての長方形状の板材Wの平坦面が水平方向へ延びた状態で貫通可能な中空室を構成しかつ水平方向へ移動可能な包囲手段1と、この包囲手段1の下部に装着されて前記中空室を貫通する前記板材Wに向けて斜め上方へ砥粒を投射するインペラを有しかつ投射されて扇状に広がる砥粒群が板材Wとほぼ直交する1個の遠心式砥粒投射装置2と、前記包囲手段1の上部内面に装着されて前記遠心式砥粒投射装置2から投射された砥粒を下方へ向けて反射させる反射部材3と、前記包囲手段1の下部内の砥粒を前記遠心式砥粒投射装置2に送り込む砥粒送込み手段としてのスクリュウコンベア4とで、構成してある。 Hereinafter, the best mode of the mobile long material polishing apparatus to which the present invention is applied will be described in detail with reference to FIG. 1 〜 FIG. This mobile long-abrasive device for long materials constitutes a hollow chamber that can be penetrated in a state in which a flat surface of a rectangular plate W as a long material extends in the horizontal direction, and can be moved in the horizontal direction. Means 1 and an impeller for projecting abrasive grains obliquely upward toward the plate member W that is attached to the lower part of the surrounding means 1 and penetrates the hollow chamber, and a group of abrasive grains that are projected and spread in a fan shape One centrifugal abrasive grain projection device 2 substantially orthogonal to W, and a reflection that is attached to the upper inner surface of the surrounding means 1 and reflects the abrasive grains projected from the centrifugal abrasive grain projection device 2 downward. A member 3 and a screw conveyor 4 as abrasive grain feeding means for feeding abrasive grains in the lower part of the surrounding means 1 to the centrifugal abrasive grain projection device 2 are configured.
そして、前記包囲手段1は、下細り状の空間を形成しかつ、図2に示すように、上部の左右両外面に複数のローラ5・5を前後方向へ適宜の間隔を置き並べて軸着したホッパ6と、このホッパ6の上端開口部を包囲するようにして空間を形成する、縦断面がアーチ状のフード7とで構成してあり、前記複数のローラ5・5は、板材を支持する支持手段20の上面に水平移動自在にして装架してあって、前記包囲手段1は、図1において前記複数のローラ5・5を介して前記支持手段20の上面上を左右方向へ移動できるようになっている。また、前記フード7の天井部の下面中央付近には前記反射部材3が装着してあり、さらに、前記フード7の天井部には砥粒の飛出しを防止する多数のゴム暖簾8・8が左右方向へ適宜の間隔を置いて垂設してある。また、図1に示すように、前記ホッパ6の左側には図示しない集塵機と連通する吸引口(図示せず)が設けてあり、さらに、前記ホッパ6の右側には飛散した砥粒を回収する受けホッパ9が設けてある。 The surrounding means 1 forms a lower narrow space and, as shown in FIG. 2, a plurality of rollers 5 and 5 are axially attached to the upper left and right outer surfaces with appropriate intervals in the front-rear direction. The hopper 6 and a hood 7 having an arched longitudinal section that forms a space so as to surround the upper end opening of the hopper 6 are configured, and the plurality of rollers 5 and 5 support a plate material. Mounted on the upper surface of the support means 20 so as to be horizontally movable, the surrounding means 1 can move in the left-right direction on the upper surface of the support means 20 via the plurality of rollers 5 and 5 in FIG. It is like that. In addition, the reflective member 3 is mounted in the vicinity of the center of the lower surface of the ceiling portion of the hood 7. Further, the ceiling portion of the hood 7 has a number of rubber warmers 8 and 8 for preventing abrasive grains from jumping out. It is suspended in the left-right direction at an appropriate interval. Further, as shown in FIG. 1, a suction port (not shown) communicating with a dust collector (not shown) is provided on the left side of the hopper 6, and further, scattered abrasive grains are collected on the right side of the hopper 6. A receiving hopper 9 is provided.
また、前記遠心式砥粒投射装置2は、図3に示すように、インペラ9と、インペラ9を包囲するケース10と、前記インペラ9内に砥粒を分散するデストリビュータ11と、インペラ9およびデストリビュータ11を回転させるモータ12とで構成してある。 Further, as shown in FIG. 3, the centrifugal abrasive grain projection device 2 includes an impeller 9, a case 10 surrounding the impeller 9, a distributor 11 for dispersing abrasive grains in the impeller 9, an impeller 9, and The motor 12 is configured to rotate the distributor 11.
また、前記スクリュウコンベア4は、前記ホッパ6の下端開口部に装着した左端閉鎖の樋状のカバー13と、カバー13内に回転自在に配設したスクリュウ軸14と、カバー13内に装着して砥粒の搬入口15および搬出口16を形成する遮蔽部材17と、前記スクリュウ軸14を回転させるモータ18とで構成してあって、前記搬入口15から前記カバー13内に進入した砥粒を、スクリュウ軸14の回転により前記遠心式砥粒投射装置2の前記デストリビュータ11の中心に向けて送り込むことができるようになっている。 Further, the screw conveyor 4 is attached to the cover 13 with a hook-like cover 13 with a left end closed attached to the lower end opening of the hopper 6, a screw shaft 14 rotatably disposed in the cover 13, and a cover 13. It is composed of a shielding member 17 that forms an abrasive grain entrance 15 and an exit 16 and a motor 18 that rotates the screw shaft 14, and abrasive grains that have entered the cover 13 through the entrance 15 The screw shaft 14 can be rotated toward the center of the distributor 11 of the centrifugal abrasive grain projection device 2 by the rotation of the screw shaft 14.
このように構成したものは、スクリュウコンベア4のモータ18の駆動によりスクリュウ軸14を回転させてホッパ6内の砥粒を、カバー13内を通して遠心式砥粒投射装置2のデストリビュータ11内に送り込むとともに、遠心式砥粒投射装置2のモータの駆動によりインペラ9等を回転させて砥粒を反射部材3の方向へ投射しながら、板材Wをフード7内に差し込んだのち、支持手段20を介して研掃装置全体を板材Wに沿って左方へ移動させる。これにより、板材Wの下面を研掃することができる。 In this configuration, the screw shaft 14 is rotated by driving the motor 18 of the screw conveyor 4 to feed the abrasive grains in the hopper 6 through the cover 13 into the distributor 11 of the centrifugal abrasive grain projection device 2. At the same time, the impeller 9 and the like are rotated by driving the motor of the centrifugal abrasive grain projection device 2 to project the abrasive grains in the direction of the reflecting member 3, and the plate material W is inserted into the hood 7, and then the support means 20 is interposed. The entire polishing apparatus is moved to the left along the plate material W. Thereby, the lower surface of the board | plate material W can be cleaned.
1
包囲手段
2
遠心式砥粒投射装置
3
反射部材
4
スクリュウコンベア
9 インペラ
1
Enclosing means
2
Centrifugal abrasive grain projection device
Three
Reflective member
Four
Screw conveyor
9 Impeller
Claims (3)
前記長尺材料が水平に貫通可能な中空室を構成しかつ水平方向へ移動可能な包囲手段と、
この包囲手段の下部に装着されて前記中空室を貫通する前記長尺材料に向けて斜め上方へ砥粒を投射するインペラを有する1個の遠心式砥粒投射装置と、
前記包囲手段の上部内面に装着されて前記遠心式砥粒投射装置から投射された砥粒を下方へ向けて反射させる反射部材と、
前記包囲手段の下部内の砥粒を前記遠心式砥粒投射装置に送り込む砥粒送込み手段と、
を備えたことを特徴とする移動式の長尺材料用研掃装置。 A device that polishes long materials by projecting abrasive grains while moving,
An enclosing means which constitutes a hollow chamber through which the elongated material can penetrate horizontally and is movable in the horizontal direction;
One centrifugal abrasive grain projecting device having an impeller mounted on the lower part of the surrounding means and projecting abrasive grains obliquely upward toward the long material penetrating the hollow chamber;
A reflective member that is mounted on the upper inner surface of the surrounding means and reflects the abrasive grains projected from the centrifugal abrasive grain projection device downward;
Abrasive grains feeding means for feeding abrasive grains in the lower part of the surrounding means to the centrifugal abrasive grain projection device;
A mobile long-abrasive device for long materials.
前記砥粒送込み手段は前記インペラの中心に砥粒を送り込むスクリュウコンベアであることを特徴とする移動式の長尺材料用研掃装置。 The mobile long material polishing apparatus according to claim 1,
The abrasive material feeding means is a screw conveyor for feeding abrasive particles to the center of the impeller, characterized in that it is a mobile long material polishing apparatus.
前記包囲手段は、前記長尺材料を支持する支持手段に水平移動自在に装着されたことを特徴とする移動式の長尺材料用研掃装置。
In the mobile long material polishing apparatus according to claim 1 or 2,
The encircling means is mounted on a supporting means for supporting the long material so as to be horizontally movable.
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JP2004317984A JP2006123139A (en) | 2004-11-01 | 2004-11-01 | Movable long size material grinding/polishing/cleaning device |
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JP2004317984A JP2006123139A (en) | 2004-11-01 | 2004-11-01 | Movable long size material grinding/polishing/cleaning device |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011030652A1 (en) * | 2009-09-08 | 2011-03-17 | 新東工業株式会社 | Steel plate shot blasting method and equipment therefor |
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2004
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011030652A1 (en) * | 2009-09-08 | 2011-03-17 | 新東工業株式会社 | Steel plate shot blasting method and equipment therefor |
CN102009074A (en) * | 2009-09-08 | 2011-04-13 | 新东工业株式会社 | Steel plate shot blasting method and equipment therefor |
JP2011079121A (en) * | 2009-09-08 | 2011-04-21 | Sintokogio Ltd | Shot blasting method of steel plate and equipment therefor |
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