JP2006110769A - Surface-treated al plate excellent in solderability, heat sink using it and manufacturing method of surface-treated al plate excellent in solderability - Google Patents

Surface-treated al plate excellent in solderability, heat sink using it and manufacturing method of surface-treated al plate excellent in solderability Download PDF

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JP2006110769A
JP2006110769A JP2004298121A JP2004298121A JP2006110769A JP 2006110769 A JP2006110769 A JP 2006110769A JP 2004298121 A JP2004298121 A JP 2004298121A JP 2004298121 A JP2004298121 A JP 2004298121A JP 2006110769 A JP2006110769 A JP 2006110769A
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JP2006110769A5 (en
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Takahiro Hayashida
貴裕 林田
Hiroyuki Yamane
博之 山根
Masahito Uechi
将人 上地
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Toyo Kohan Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a surface-treated Al plate excellent in the adhesion with a plating layer, the wettability with solder and solder strength, large in heat emissivity or heat conductivity and efficiently adaptable to a heat sink required in solderability and heat emissivity, the heat sink using it, and a manufacturing method of the surface-treated Al plate. <P>SOLUTION: The surface-treated Al plate is constituted by forming a Zn layer on the surface of an Al substrate by substitution plating, forming an Ni layer and a Cu layer on the Zn layer by plating and further providing a layer for enhancing heat conductivity on the Cu layer. This surface-treated Al plate is adapted to the heat sink 2. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は表面処理Al板に関し、特にハンダの濡れ性、ハンダ強度に優れるとともに、熱放射率や熱伝導率が大きく、ハンダ付けが可能で優れた放熱性が求められるヒートシンクに好適に適用することができる表面処理Al板、それを用いたヒートシンク、およびその表面処理Al板の製造方法に関する。   The present invention relates to a surface-treated Al plate, and particularly suitable for a heat sink that is excellent in solder wettability and solder strength, has high thermal emissivity and thermal conductivity, can be soldered, and requires excellent heat dissipation. The present invention relates to a surface-treated Al plate that can be used, a heat sink using the same, and a method for producing the surface-treated Al plate.

電子機器の小型化や高密度化にともなって、狭い筐体内部や間隙が殆ど無い状態で装填された部品の温度上昇を抑制する必要が生じている。プリント基板においては、部品の温度上昇を抑制するために、放熱用のヒートシンク2が、図1に示すように発熱体1の少なくとも片面に密着され、プリント基板10の金属面10aにハンダ5を用いてハンダ付けにより接合して設けられる。密着した面が大きいほど熱伝導が大きくなり、放熱効果が高まる。ヒートシンクに用いる材料としては、発熱体から急速に熱を吸収できるように、熱伝導性に優れた材料を用いることが好ましい。また、ヒートシンク2を発熱体1から離れた部分まで延ばして設け、延長部分から放熱するので、ヒートシンクの表面は熱放射性に優れていることが好ましい。なお、図1において、矢印3は熱伝導の方向を示し、矢印4は熱放射の方向を示している。   As electronic devices become smaller and higher in density, it is necessary to suppress the temperature rise of components loaded in a narrow housing or with almost no gap. In the printed circuit board, a heat sink 2 for heat dissipation is in close contact with at least one surface of the heating element 1 as shown in FIG. 1 and solder 5 is used on the metal surface 10a of the printed circuit board 10 in order to suppress the temperature rise of the components. Are joined by soldering. The larger the close contact surface, the greater the heat conduction and the higher the heat dissipation effect. As a material used for the heat sink, it is preferable to use a material having excellent thermal conductivity so that heat can be rapidly absorbed from the heating element. In addition, since the heat sink 2 is provided extending to a portion away from the heating element 1 and radiates heat from the extended portion, the surface of the heat sink is preferably excellent in thermal radiation. In FIG. 1, arrow 3 indicates the direction of heat conduction, and arrow 4 indicates the direction of heat radiation.

鋼板ベースの材料からなるヒートシンクの場合は、図1に示すようにプリント基板に直接ハンダ付けして接合することができる。放熱性がさらに要求される場合は、ヒートシンクとして鋼板よりも熱伝導性に優れたAlをベースとする材料を用いることが好ましいが、プリント基板に直接ハンダ付けして接合することが困難であるので、従来はAlベースのヒートシンクに専用のハンダ付けが可能なピンをかしめて取り付け、ピンを介してプリント基板にハンダ付けしている。しかしながら、このようにピンを介して接合する場合はピンとヒートシンクの強固な結合状態が得られず、落下などの衝撃が負荷された場合にヒートシンクがピンからはずれてしまうことがある。そのため、プリント基板とヒートシンクの強固な結合状態が得られるハンダ付けが可能なAl板を得るために、以下に示すような試みが行われている。   In the case of a heat sink made of a steel plate base material, it can be soldered and bonded directly to the printed circuit board as shown in FIG. If heat dissipation is further required, it is preferable to use a material based on Al that has better thermal conductivity than the steel plate as the heat sink, but it is difficult to solder and bond directly to the printed circuit board. Conventionally, a special solderable pin is attached by caulking to an Al-based heat sink, and soldered to the printed circuit board via the pin. However, when the pins are joined through the pins as described above, a strong coupling state between the pins and the heat sink cannot be obtained, and the heat sink may come off the pins when an impact such as dropping is applied. Therefore, in order to obtain an Al plate that can be soldered so that a strong bonding state between the printed circuit board and the heat sink can be obtained, the following attempts have been made.

例えば特許文献1には、Al板またはAl系合金金属材にNi系めっき層を介してSnめっき層が形成されたハンダ付け性およびめっき密着性に優れたAl系合金金属板が開示されている。このAl系合金金属板においては、溶融Alめっき鋼板などの基材に真空蒸着法を用いてNi系めっきした後、続いてSnめっきを施す。この方法による場合、NiおよびSnをめっきするために真空蒸着法を用いるが、真空装置などの大掛かりな装置が必要であり、また製膜速度が小さく生産性に乏しいため、安価に製造することが困難である。   For example, Patent Document 1 discloses an Al-based alloy metal plate excellent in solderability and plating adhesion, in which an Sn plating layer is formed on an Al plate or an Al-based alloy metal material via a Ni-based plating layer. . In this Al-based alloy metal plate, a Ni-based plating is performed on a base material such as a hot-dip Al-plated steel plate using a vacuum deposition method, followed by Sn plating. In this method, a vacuum deposition method is used for plating Ni and Sn. However, a large-scale apparatus such as a vacuum apparatus is necessary, and the film forming speed is low and the productivity is low. Have difficulty.

また特許文献2には、アルミニウム基材上に錫または錫合金層が、アルミニウム基材と錫または錫合金層との界面に錫の濃度勾配を形成して被覆されたことを特徴とするハンダ付性に優れる錫または錫合金層を被覆したアルミニウム材料が開示されている。このアルミニウム材料においては、アルミニウム合金板に錫を電気めっきした後に加熱する、または溶融した錫合金中にアルミニウム合金板を通すことにより、アルミニウム基材と錫または錫合金層との界面に錫の濃度勾配を形成して錫めっきするが、アルミニウム基材と錫または錫合金層との密着性が不十分であり、特に曲げ加工を施した場合に、錫めっき被膜がアルミニウム基材から剥離しやすい欠点を有している。
特開平05−345969号公報 特開平09−291394号公報
Further, Patent Document 2 discloses that a tin or tin alloy layer is coated on an aluminum base material by forming a tin concentration gradient at the interface between the aluminum base material and the tin or tin alloy layer. An aluminum material coated with a tin or tin alloy layer having excellent properties is disclosed. In this aluminum material, tin is electroplated on the aluminum alloy plate and then heated, or the aluminum alloy plate is passed through a molten tin alloy, whereby the concentration of tin at the interface between the aluminum base and the tin or tin alloy layer is increased. Tin plating with a gradient, but the adhesion between the aluminum substrate and the tin or tin alloy layer is insufficient, especially when bending is applied, the tin plating film tends to peel off from the aluminum substrate have.
JP 05-345969 A JP 09-291394 A

本発明は、めっき層の密着性、ハンダの濡れ性、ハンダ強度に優れるとともに、熱放射率や熱伝導率が大きく、ハンダ付けが可能で放熱性が求められるヒートシンクに好適に適用することができる表面処理Al板、それを用いたヒートシンク、およびその表面処理Al板の製造方法を提供することを目的とする。   INDUSTRIAL APPLICATION While this invention is excellent in the adhesiveness of a plating layer, the wettability of solder | pewter, and solder | pewter intensity | strength, thermal emissivity and thermal conductivity are large, it can apply suitably for the heat sink in which soldering is possible and heat dissipation is calculated | required. An object of the present invention is to provide a surface-treated Al plate, a heat sink using the same, and a method for producing the surface-treated Al plate.

本発明者は、上記問題点を解決するために、ハンダ濡れ性に優れ且つ高いハンダ強度を得る手段として、Ni層の上に一段とハンダ濡れ性に優れているCu層を設けることを着想し、それを放熱性に優れたアルミニウム板に真空蒸着によらないめっきによって高い密着性を有して形成させることを種々研究した結果、Znめっきを施して後Niめっき層を形成することによって良好な密着性が得られることを見出し本発明に到達したものである。
すなわち、上記目的を達成する本発明の表面処理Al板は、Al基板表面に、基板側から順にZn層、Ni層、Cu層を形成してなることを特徴とするもの(請求項1)である。
Al板はめっきが困難であるが、ZnはAl板への高い密着性を有するめっきが可能であり、またZnめっき上へのNiめっきも高い密着性を有するめっきが可能であるので、Al板表面に順にZn層、Ni層、Cu層を形成することによって、めっき密着性に優れ且つハンダ付けが可能で、放熱性に優れた表面処理Al板を得ることができる。
In order to solve the above problems, the present inventor conceived of providing a Cu layer having excellent solder wettability on the Ni layer as a means for obtaining excellent solder wettability and high solder strength, As a result of various researches on forming an aluminum plate with excellent heat dissipation with high adhesion by non-vacuum deposition, good adhesion is achieved by forming a Zn plating layer after applying Zn plating. As a result, the inventors have found that the properties can be obtained, and have reached the present invention.
That is, the surface-treated Al plate of the present invention that achieves the above object is characterized in that a Zn layer, a Ni layer, and a Cu layer are formed in this order from the substrate side on the surface of the Al substrate (Claim 1). is there.
Although Al plate is difficult to plate, Zn can be plated with high adhesion to Al plate, and Ni plating on Zn plating is also possible to plate with high adhesion, so Al plate By forming a Zn layer, Ni layer, and Cu layer in order on the surface, it is possible to obtain a surface-treated Al plate that is excellent in plating adhesion, can be soldered, and has excellent heat dissipation.

上記表面処理Al板において、より放熱性を向上させるために、Cu層上に熱放射性を向上させる層をさらに形成してなること(請求項2)が望ましい。さらに上記表面処理Al板において、熱放射率が0.2〜0.9であること(請求項3)、メニスコグラフ法によるハンダ濡れ性が10秒以下であること(請求項4)、熱伝導率が60W/m・K以上であること(請求項5)が望ましい。   In the surface-treated Al plate, in order to further improve heat dissipation, it is desirable that a layer for improving thermal radiation is further formed on the Cu layer (Claim 2). Further, in the surface-treated Al plate, the thermal emissivity is 0.2 to 0.9 (Claim 3), the solder wettability by the meniscograph method is 10 seconds or less (Claim 4), and the thermal conductivity. Is preferably 60 W / m · K or more (Claim 5).

また、本発明のヒートシンクは、上記請求項1〜5のいずれかの表面処理Al板を用いてなるヒートシンク(請求項6)である。   Moreover, the heat sink of this invention is a heat sink (Claim 6) using the surface treatment Al plate in any one of the said Claims 1-5.

さらに、本発明の表面処理Al板の製造方法は、Al基板にZnを置換めっきし、次いでNiめっきし、その後Cuめっきすることを特徴とする(請求項7)ものである。
Al板は、ハンダ付けができないため、それを可能とするにはその表面にハンダ濡れ性のよい金属層を形成する必要があるが、本発明は金属層をより簡単な装置で可能であるめっきにより形成する。しかし、Al板はめっきが困難であるが、Znを置換めっきすることによって容易にめっき可能である。しかしZnは経時すれば半田ができなくなるため、Znめっき上にNiめっきをし、その上にハンダ濡れ性に優れているCuめっきを施すことによって、めっき密着性に優れ且つハンダ付けが可能となり、放熱性に優れた表面処理Al板を得ることができる。
Furthermore, the method for producing a surface-treated Al plate of the present invention is characterized in that Zn is displacement-plated on an Al substrate, then Ni is plated, and then Cu is plated (Claim 7).
Since the Al plate cannot be soldered, in order to make it possible, it is necessary to form a metal layer with good solder wettability on the surface, but in the present invention, the metal layer can be plated with a simpler apparatus. To form. However, although the Al plate is difficult to plate, it can be easily plated by substitution plating of Zn. However, since Zn cannot be soldered over time, by applying Ni plating on the Zn plating and applying Cu plating with excellent solder wettability thereon, it is possible to have excellent plating adhesion and soldering, A surface-treated Al plate having excellent heat dissipation can be obtained.

上記(請求項7)の表面処理Al板の製造方法において、Zn置換めっきを第一置換めっきと第二置換めっきの2回に分けて行うこと(請求項8)により、Zn層が均一になり、その上に施すNiめっきがめっき不良を起こさなくなる。また、上記請求項7または8の表面処理Al板の製造方法において、Cuめっき後、さらに熱放射性を向上させる層を形成させること(請求項9)によって、より放熱性に優れた表面処理Al板を得ることができる。上記熱放射性を向上させる層は、好適には黒色顔料を含有する水系樹脂をCuめっき上に塗布し乾燥させて設けること(請求項10)ができる。   In the method for manufacturing a surface-treated Al plate according to the above (Claim 7), Zn substitution plating is performed in two steps of first substitution plating and second substitution plating (Claim 8), so that the Zn layer becomes uniform. , Ni plating applied thereon does not cause poor plating. Further, in the method for producing a surface-treated Al plate according to claim 7 or 8, a surface-treated Al plate having a higher heat dissipation property is formed by further forming a layer for improving thermal radiation after Cu plating (claim 9). Can be obtained. The layer for improving thermal radiation can be provided by applying a water-based resin containing a black pigment on Cu plating and drying it (Claim 10).

本発明の表面処理Al板は、Al基板表面に置換めっきによりZn層を形成させ、その上にNi層とCu層をめっきにより形成させているので、Al板とめっき層の密着性に優れている。また最表面にCu層を設けているので、ハンダ濡れ性に優れるとともに、高いハンダ強度が得られる。さらに基板がAl板であるので熱伝導率が大きく、放熱性に優れている。さらに、本発明の表面処理Al板に、ハンダフラックス性を有し熱放射性に向上させる層を設けることにより、ハンダ性をさらに向上させるとともに放熱性を向上させることができる。そのため、本発明の表面処理Al板は、ハンダ付けが可能な放熱性に優れたヒートシンクとして好適に適用することができる。   The surface-treated Al plate of the present invention has a Zn layer formed on the surface of the Al substrate by displacement plating, and a Ni layer and a Cu layer are formed thereon by plating, so that the adhesion between the Al plate and the plated layer is excellent. Yes. In addition, since the Cu layer is provided on the outermost surface, the solder wettability is excellent and high solder strength is obtained. Furthermore, since the substrate is an Al plate, the thermal conductivity is large and the heat dissipation is excellent. Furthermore, by providing the surface-treated Al plate of the present invention with a layer having solder flux properties and improving heat radiation properties, it is possible to further improve solderability and heat dissipation. Therefore, the surface-treated Al plate of the present invention can be suitably applied as a heat sink excellent in heat dissipation that can be soldered.

以下、本発明を詳細に説明する。
本発明の表面処理Al板の基板となるAlとしては、純Al板およびJIS規格の1000系、2000系、3000系、5000系、6000系、7000系のいずれのAl合金板も用いることができる。これらのAl合金板を脱脂し、次いで酸性エッチングし、引き続きスマットを除去した後、Znを置換めっきする。Znの置換めっきは、硝酸浸漬処理を行った後に実施するが、第一Zn置換めっき処理、第二Zn置換めっき処理の2回の工程に分けて行うのが好ましいが、1回で行ってもよい。Zn置換めっき処理を2回分けて行うことによって、Al板上にZ層をより均一に形成することができ、後工程でその上にめっきするNiめっきをめっき不良(密着不良)を起こすことなく形成できる利点がある。この場合、各工程の処理後には水洗処理を実施する。この第一Zn置換めっき処理および第二Zn置換めっき処理により形成するZnめっき層は、この置換めっき処理後にNiめっきを施す際にわずかに溶解するので、Zn層の皮膜量としてはNiめっき後の状態で5〜500mg/mであることが好ましく、30〜300mg/mであることがより好ましい。皮膜量は処理液中のZnイオン濃度および第二Zn置換めっき処理において処理液中に浸漬する時間を適宜選択して調整する。皮膜量が5mg/m未満であるとZn層の上に形成するNiめっき層との密着性に乏しくなり、曲げ加工を施した際にめっき層が剥離しやすくなる。一方、皮膜量が500mg/mを超えるとNiめっきが不均一になり、ハンダ強度が低下する。
Hereinafter, the present invention will be described in detail.
As Al used as the substrate of the surface-treated Al plate of the present invention, a pure Al plate and any JIS standard 1000 series, 2000 series, 3000 series, 5000 series, 6000 series, or 7000 series Al alloy sheet can be used. . These Al alloy plates are degreased and then acid-etched. Subsequently, the smut is removed, and then Zn is replaced by plating. The substitution plating of Zn is carried out after the nitric acid immersion treatment, but it is preferably carried out in two steps of the first Zn substitution plating treatment and the second Zn substitution plating treatment. Good. By performing the Zn displacement plating process twice, the Z layer can be more uniformly formed on the Al plate, and the Ni plating plated on it in the subsequent process does not cause poor plating (adhesion failure). There is an advantage that can be formed. In this case, the water washing process is implemented after the process of each process. The Zn plating layer formed by the first Zn substitution plating treatment and the second Zn substitution plating treatment is slightly dissolved when Ni plating is performed after the substitution plating treatment. It is preferable that it is 5-500 mg / m < 2 > in a state, and it is more preferable that it is 30-300 mg / m < 2 >. The coating amount is adjusted by appropriately selecting the Zn ion concentration in the treatment liquid and the time of immersion in the treatment liquid in the second Zn displacement plating treatment. When the coating amount is less than 5 mg / m 2 , the adhesion with the Ni plating layer formed on the Zn layer becomes poor, and the plating layer is easily peeled off when bending is performed. On the other hand, when the coating amount exceeds 500 mg / m 2 , the Ni plating becomes non-uniform and the solder strength decreases.

次いでこのようにして形成されたZn層の上にNi層をめっきにより形成する。Niめっきは電気めっき法または無電解めっき法のいずれを用いて形成してもよい。無電解めっき法を用いる場合は、還元剤としてP化合物やB化合物を用いるので、Niめっき皮膜はNi−P合金やNi−B合金からなる皮膜として形成するが、電気めっき法による純Niからなる皮膜と同様に、めっき皮膜のAl基板に対する密着性や、優れたハンダ濡れ性およびハンダ強度が得られる。このようにして得られるNi層は、皮膜量として0.2〜50g/mであることが好ましく、1〜10g/mであることがより好ましい。皮膜量が0.2g/m未満であるとNi層がZn層の全面を均一に被覆することができないので十分なハンダ強度が得られない。一方、皮膜量が50g/mを超えるとハンダ濡れ性およびハンダ強度の向上効果が飽和し、コスト的に有利でなくなる。 Next, a Ni layer is formed on the Zn layer thus formed by plating. Ni plating may be formed using either electroplating or electroless plating. When the electroless plating method is used, since a P compound or a B compound is used as a reducing agent, the Ni plating film is formed as a film made of a Ni-P alloy or a Ni-B alloy, but is made of pure Ni by electroplating. Similar to the coating, adhesion of the plating coating to the Al substrate, and excellent solder wettability and solder strength can be obtained. Thus Ni layer obtained is preferably 0.2 to 50 g / m 2 as a film weight, and more preferably 1 to 10 g / m 2. If the coating amount is less than 0.2 g / m 2 , the Ni layer cannot uniformly cover the entire surface of the Zn layer, and thus sufficient solder strength cannot be obtained. On the other hand, if the coating amount exceeds 50 g / m 2 , the effect of improving the solder wettability and the solder strength is saturated, which is not advantageous in terms of cost.

次いでNi層上にCu層をめっきにより形成する。Cuめっきは電気めっき法または無電解めっき法のいずれを用いて形成してもよい。Cuめっきの皮膜量は0.2〜20g/mであることが好ましく、1〜10g/mであることがより好ましい。皮膜量が0.2g/m未満であると非活性のフラックスを用いた場合にハンダが濡れにくくなる。一方、皮膜量が20g/mを超えるとハンダ濡れ性およびハンダ強度の向上効果が飽和し、コスト的に有利でなくなる。 Next, a Cu layer is formed on the Ni layer by plating. Cu plating may be formed using either electroplating or electroless plating. The coating amount of Cu plating is preferably 0.2 to 20 g / m 2 , and more preferably 1 to 10 g / m 2 . When the coating amount is less than 0.2 g / m 2 , solder becomes difficult to wet when an inactive flux is used. On the other hand, when the coating amount exceeds 20 g / m 2 , the effect of improving the solder wettability and the solder strength is saturated, which is not advantageous in terms of cost.

以上のようにしてAl基板上にZn層、Ni層、Cu層を形成することにより、本発明の表面処理Al板が得られる。また、この表面処理Al板をAlの融点以下の温度に加熱して、Al基板とZn層、Zn層とNi層、Ni層とCu層、またはAl基板とZn層とNi層、Zn層とNi層とCu層をそれぞれ相互拡散させることにより、Al基板とめっき層、および各めっき層同士の密着強度を向上させることもできる。   By forming the Zn layer, Ni layer, and Cu layer on the Al substrate as described above, the surface-treated Al plate of the present invention can be obtained. Further, this surface-treated Al plate is heated to a temperature not higher than the melting point of Al, and the Al substrate and Zn layer, Zn layer and Ni layer, Ni layer and Cu layer, or Al substrate and Zn layer, Ni layer, Zn layer, By mutually diffusing the Ni layer and the Cu layer, the adhesion strength between the Al substrate, the plating layer, and each plating layer can also be improved.

このようにして得られる本発明の表面処理Al板は、60W/m・K以上の熱伝導率を有しており、熱伝導性に優れたヒートシンクとして発熱体から熱を効率的に吸収して放熱することができるが、Cu層上に熱放射性に向上させる層を設けることにより、放熱性をさらに向上させることができる。Al基板上にZn層、Ni層、Cu層を形成した本発明の表面処理Al板の熱放射率は0.05〜0.1前後であるが、熱放射性に向上させる層を設けることにより、熱放射率は0.2〜0.9程度まで向上させることができる。   The surface-treated Al plate of the present invention thus obtained has a thermal conductivity of 60 W / m · K or more, and efficiently absorbs heat from the heating element as a heat sink with excellent thermal conductivity. Although heat can be dissipated, the heat dissipating property can be further improved by providing a layer for improving heat radiation on the Cu layer. The thermal emissivity of the surface-treated Al plate of the present invention in which a Zn layer, Ni layer, and Cu layer are formed on an Al substrate is around 0.05 to 0.1, but by providing a layer that improves thermal radiation, The thermal emissivity can be improved to about 0.2 to 0.9.

熱放射性を向上させる層は以下のようにしてCu層上に形成する。すなわち、Al基板上にZn層、Ni層、Cu層を形成した表面処理Al板、またはこの表面処理Al板に上記の加熱拡散処理を施した後、黒色顔料を含有させた水系樹脂、好ましくは水系ウレタン樹脂または水溶性ロジンを含有させた水系アクリル樹脂を塗布し、乾燥させて処理皮膜を形成する。これらの処理皮膜はフラックス効果を有しており、ハンダ濡れ性も向上させる。これらの水系樹脂の濃度は100〜900g/Lであることが好ましく、黒色顔料は樹脂中に樹脂の固形分に対して50重量%以下で含有していることが好ましい。50重量%を超えて含有しているとハンダ濡れ性およびハンダ強度が不良となる。乾燥後の処理皮膜の厚さは0.05〜10μmであることが好ましい。0.05μm未満では放熱性の向上効果に乏しく、10μmを超えると熱伝導性が損なわれるようになり、放熱性を向上させることができなくなる。このように、Cu層上に熱放射性に向上させる層を設けることにより、ヒートシンクとして用いた場合の放熱性を向上させることができる。   The layer for improving thermal radiation is formed on the Cu layer as follows. That is, a surface-treated Al plate in which a Zn layer, a Ni layer, or a Cu layer are formed on an Al substrate, or a water-based resin containing a black pigment after the surface-treated Al plate is subjected to the above heat diffusion treatment, preferably A water-based acrylic resin containing water-based urethane resin or water-soluble rosin is applied and dried to form a treatment film. These treatment films have a flux effect and improve solder wettability. The concentration of these aqueous resins is preferably 100 to 900 g / L, and the black pigment is preferably contained in the resin at 50% by weight or less based on the solid content of the resin. If the content exceeds 50% by weight, solder wettability and solder strength are poor. The thickness of the treated film after drying is preferably 0.05 to 10 μm. If it is less than 0.05 μm, the effect of improving the heat dissipation is poor, and if it exceeds 10 μm, the thermal conductivity is impaired, and the heat dissipation cannot be improved. Thus, by providing a layer that improves thermal radiation on the Cu layer, the heat dissipation when used as a heat sink can be improved.

以下、実施例を示して本発明をさらに詳細に説明する。
[供試板の作成]
Al合金板(JIS 5052 H19、板厚0.5mm)をめっき基板として、アルカリ液中で脱脂し、次いで硫酸中に浸漬するエッチング処理を施し、引き続いて硝酸中で脱スマット処理を施した後、水酸化ナトリウム:150g/L、ロッシェル塩:50g/L、酸化亜鉛:25g/L、塩化第一鉄:1.5g/Lを含む処理液中に浸漬する第一Zn置換めっき処理を行い、次いで400g/Lの硝酸水溶液中に浸漬して置換析出したZnを除去した後、第一Zn置換めっき処理で用いたのと同一の処理液中に浸漬して第二Zn置換めっき処理を行った。この第二Zn置換めっき処理において、浸漬時間を種々変化させて、表1に示す皮膜量のZn層を形成したZnめっきAl板を得た。
Hereinafter, the present invention will be described in more detail with reference to examples.
[Create test plate]
An Al alloy plate (JIS 5052 H19, plate thickness 0.5 mm) was used as a plating substrate, degreased in an alkaline solution, then etched in sulfuric acid, and subsequently desmutted in nitric acid. A first Zn displacement plating treatment is performed by immersing in a treatment solution containing sodium hydroxide: 150 g / L, Rochelle salt: 50 g / L, zinc oxide: 25 g / L, ferrous chloride: 1.5 g / L, and then After removing Zn deposited by substitution by immersion in a 400 g / L nitric acid aqueous solution, it was immersed in the same treatment solution used in the first Zn substitution plating treatment to perform a second Zn substitution plating treatment. In this second Zn substitution plating treatment, the immersion time was variously changed to obtain a Zn-plated Al plate on which a Zn layer having the coating amount shown in Table 1 was formed.

次いで、ZnめっきAl板に無電解めっき法を用いて、Zn層上にNi−12重量%P合金めっき皮膜を、表1に示す皮膜量で形成した。引き続いてZn層とNi層を形成したAl板に電気めっき法を用いてNi層上に純Cuめっき皮膜を、表1に示す皮膜量で形成して供試板とした。一部の供試板については、これらのめっきを施した後、350℃に加熱し、Al板とめっき層および各めっき層同士を相互拡散させる拡散熱処理を施した。また、他の一部の供試板については、表2に示す液組成の処理液を用いて熱放射性を向上させる層をCuめっき皮膜上に形成した。   Next, an Ni-12 wt% P alloy plating film was formed on the Zn layer with the coating amount shown in Table 1 by using an electroless plating method on the Zn plating Al plate. Subsequently, a pure Cu plating film was formed on the Ni layer using an electroplating method on an Al plate on which a Zn layer and a Ni layer were formed, and used as a test plate. About some test plates, after performing these plating, it heated at 350 degreeC, and performed the diffusion heat processing which mutually diffuses an Al plate, a plating layer, and each plating layer. Moreover, about the other one part test plate, the layer which improves heat radiation was formed on Cu plating film | membrane using the processing liquid of the liquid composition shown in Table 2.

また、比較用として、上記のAl合金板にZn置換めっき層を設けずに直接Niめっき層およびCuめっき層を設けた供試板、上記のAl合金板にZn置換めっき層を設けずにCuめっき層のみを設けた供試板、低炭素鋼板(板厚0.5mm)にCuめっき層のみを設けた供試板を作成した。   For comparison, a test plate in which a Ni plating layer and a Cu plating layer were directly provided without providing a Zn substitution plating layer on the Al alloy plate, and a Cu plate without a Zn substitution plating layer provided on the Al alloy plate. A test plate provided only with a plating layer, and a test plate provided only with a Cu plating layer on a low carbon steel plate (plate thickness 0.5 mm) were prepared.

Figure 2006110769
Figure 2006110769

Figure 2006110769
Figure 2006110769

[供試板の特性評価]
上記のようにして得られた供試板を、下記の特性について評価した。
(ハンダ濡れ性)
メニスコグラフ法(MIL−STD−883B)により、SOLDERCHECKER(MODEL SAT−5000、RHESCA製)を使用し、上記の各供試板から切り出した幅7mmの試片をフラックス(NA−200、タムラ化研製)に浸漬し、その後250℃に保持したハンダ浴(JISZ 3282:H60A)に前記のフラックスを塗布した試片を、浸漬速度2mm/秒で2mm浸漬し、ハンダが濡れるまでの時間(ゼロクロスタイム)を測定し、下記に示す基準でハンダ濡れ性を評価した。短時間であるほどハンダ濡れ性が良好であることを示す。
◎:5秒未満
○:5〜7秒未満
△:7〜10秒未満
×:10秒以上
[Characteristic evaluation of test plate]
The test plates obtained as described above were evaluated for the following characteristics.
(Solder wettability)
Using a SOLDERCHECKER (MODEL SAT-5000, manufactured by RHESCA) by a meniscograph method (MIL-STD-883B), a 7 mm wide test piece cut out from each of the above test plates was fluxed (NA-200, manufactured by Tamura Kaken) The test piece coated with the above-mentioned flux in a solder bath (JISZ 3282: H60A) maintained at 250 ° C. is immersed for 2 mm at an immersion speed of 2 mm / second, and the time until the solder gets wet (zero cross time) is set. The solder wettability was evaluated based on the following criteria. The shorter the time, the better the solder wettability.
◎: Less than 5 seconds ○: Less than 5-7 seconds △: Less than 7-10 seconds ×: More than 10 seconds

[ハンダ強度]
上記の各供試板から切り出した幅7mm、長さ50mmの試片をL字型に折り曲げた2つの切り出し片を、評価面を向かい合わせてT字状になるように重ね、T字の縦棒の部分に厚さ0.5mmの鋼板を挟み、T字の縦棒の下部に0.5mmの空隙部を形成した試片を作成した。この試片の空隙部に上記のハンダ濡れ性の評価に用いたのと同様のフラックスを塗布した後、ソルダーチェッカー(SAT−5000、レスカ製)を用い、250℃に保持したハンダ浴(JISZ 3282:H60A)に試片の空隙部を10mmの深さまで浸漬し5秒間保持して空隙部にハンダを充填した後取り出し、Tピール試験片とした。次いでテンシロンを用い、Tピール試験片のT字の横棒の部分をチャックで挟んで引っ張ってT字の縦棒の部分のハンダ充填部を引き剥がし、このときの引張強度をハンダ強度として測定し、下記の基準でハンダ強度の優劣を評価した。
◎:4fgf/7mm以上
○:3〜4fgf/7mm未満
△:1〜3fgf/7mm未満
×:1fgf/7mm未満
[Solder strength]
Two cut pieces obtained by bending a test piece having a width of 7 mm and a length of 50 mm cut out from each of the test plates into an L-shape are stacked so that the evaluation surfaces face each other in a T-shape, and the vertical direction of the T-shape. A test piece was prepared in which a 0.5 mm thick steel plate was sandwiched between the bars and a 0.5 mm gap was formed below the T-shaped vertical bar. After applying the same flux as that used for the evaluation of the solder wettability to the void portion of the specimen, a solder bath (JISZ 3282) maintained at 250 ° C. using a solder checker (SAT-5000, manufactured by Resca). : H60A), the void portion of the specimen was immersed to a depth of 10 mm, held for 5 seconds, filled with solder in the void portion, and taken out to obtain a T peel specimen. Next, using Tensilon, the portion of the T-shaped horizontal bar of the T-peel test piece is pulled with a chuck, and the solder filling portion of the T-shaped vertical bar is peeled off. The tensile strength at this time is measured as the solder strength. The superiority or inferiority of the solder strength was evaluated according to the following criteria.
◎: 4 fgf / 7 mm or more ○: 3 to less than 4 fgf / 7 mm Δ: less than 1 to 3 fgf / 7 mm ×: less than 1 fgf / 7 mm

[めっき皮膜の密着性]
上記の各供試板から幅15mm、長さ50mmの試験片を切り出し、90゜折り曲げ、折り曲げ部にスコッチテープを貼り付け、次いで引き剥がした後、めっき皮膜の剥離の有無を肉眼観察し、下記の基準でめっき皮膜の密着性を評価した。
○:剥離は認められない。
×:剥離が認められる。
[Adhesion of plating film]
A test piece having a width of 15 mm and a length of 50 mm was cut out from each of the above test plates, bent at 90 °, a scotch tape was attached to the bent portion, and then peeled off. The adhesion of the plating film was evaluated based on the above criteria.
○: No peeling is observed.
X: Peeling is recognized.

[放熱性]
上記の各供試板から幅5mm、長さ10mmの試験片を切り出し、光交流法熱定数測定装置(PIT−R2型、真空理工製)を用いて熱伝導率を測定した。また、放射率計(D and S AERD放射率計、京都電子工業製)を用いて熱放射率を測定し、下記に示す基準で放熱性を評価した。
◎:熱伝導率60W/m/K以上でかつ熱放射率0.20以上
○:熱伝導率60W/m/K以上でかつ熱放射率0.05〜0.20未満
△:熱伝導率40〜60W/m/K未満
×:熱伝導率40W/m/K未満
[Heat dissipation]
A test piece having a width of 5 mm and a length of 10 mm was cut out from each of the test plates, and the thermal conductivity was measured using an optical alternating current method thermal constant measurement device (PIT-R2 type, manufactured by Vacuum Riko). Moreover, the thermal emissivity was measured using the emissometer (D and SAERD emissometer, Kyoto Electronics Industry make), and the heat dissipation was evaluated on the basis of the following criteria.
A: Thermal conductivity of 60 W / m / K or more and thermal emissivity of 0.20 or more O: Thermal conductivity of 60 W / m / K or more and thermal emissivity of 0.05 to less than 0.20 Δ: Thermal conductivity of 40 ˜less than 60 W / m / K ×: thermal conductivity less than 40 W / m / K

その結果、表3に示すように、Al板にZn層、Ni層、Cu層を形成した本発明の表面処理Al板はハンダの濡れ性に優れ、ハンダ強度が高く、かつ熱伝導率が大きく放熱性に優れている。またこの表面処理Al板のCu層上に熱伝導性を向上させる層を設けることにより、放熱性がさらに向上していることが確認された。そのため、本発明はハンダ付けが可能な放熱性に優れたヒートシンクとして好適に適用できる。   As a result, as shown in Table 3, the surface-treated Al plate of the present invention in which a Zn layer, a Ni layer, and a Cu layer are formed on an Al plate has excellent solder wettability, high solder strength, and high thermal conductivity. Excellent heat dissipation. It was also confirmed that the heat dissipation was further improved by providing a layer for improving the thermal conductivity on the Cu layer of the surface-treated Al plate. Therefore, the present invention can be suitably applied as a heat sink excellent in heat dissipation that can be soldered.

Figure 2006110769
Figure 2006110769

本発明のAl基板表面に置換めっきによりZn層を形成させ、その上にNi層とCu層をめっきにより形成させている表面処理Al板は、Al板とめっき層の密着性に優れており、最表面にCu層を設けているので、ハンダ濡れ性に優れるとともに、高いハンダ強度が得られる。また基板がAl板であるので熱伝導率が大きく、放熱性に優れている。さらに、Cu層上にハンダフラックス性を有し熱放射性に向上させる層を設けることにより、ハンダ性をさらに向上させるとともに放熱性を向上させることができる。そのため、本発明の表面処理Al板は、ハンダ付けが可能で放熱性が求められるヒートシンクに好適に適用することができるハンダ付けが可能な放熱性に優れたヒートシンクとして好適に適用することができる。   A surface-treated Al plate in which a Zn layer is formed by displacement plating on the Al substrate surface of the present invention, and a Ni layer and a Cu layer are formed thereon by plating, is excellent in adhesion between the Al plate and the plating layer, Since the Cu layer is provided on the outermost surface, the solder wettability is excellent and a high solder strength is obtained. Moreover, since the substrate is an Al plate, the thermal conductivity is large and the heat dissipation is excellent. Furthermore, by providing a layer having solder flux properties and improving heat radiation on the Cu layer, it is possible to further improve solderability and heat dissipation. Therefore, the surface-treated Al plate of the present invention can be suitably applied as a heat sink excellent in heat dissipation capable of soldering, which can be suitably applied to a heat sink that can be soldered and requires heat dissipation.

ヒートシンクと発熱体の接合状態を示す概略図である。It is the schematic which shows the joining state of a heat sink and a heat generating body.

符号の説明Explanation of symbols

1 発熱体
2 ヒートシンク
3 熱伝導の方向
4 放熱の方向
5 ハンダ
10 プリント基板
10a 金属面
DESCRIPTION OF SYMBOLS 1 Heat generating body 2 Heat sink 3 Direction of heat conduction 4 Direction of heat dissipation 5 Solder 10 Printed circuit board 10a Metal surface

Claims (10)

Al基板表面に、基板側から順にZn層、Ni層、Cu層を形成してなる、表面処理Al板。   A surface-treated Al plate in which a Zn layer, a Ni layer, and a Cu layer are formed in this order from the substrate side on the surface of the Al substrate. 前記Cu層上に熱放射性を向上させる層をさらに形成してなる、請求項1に記載の表面処理Al板。   The surface-treated Al plate according to claim 1, wherein a layer for improving thermal radiation is further formed on the Cu layer. 熱放射率が0.2〜0.9である、請求項1または2に記載の表面処理Al板。   The surface-treated Al plate according to claim 1 or 2, wherein the thermal emissivity is 0.2 to 0.9. メニスコグラフ法によるハンダ濡れ性が10秒以下である、請求項1〜3のいずれかに記載の表面処理Al板。   The surface-treated Al plate according to any one of claims 1 to 3, wherein a solder wettability by a meniscograph method is 10 seconds or less. 熱伝導率が60W/m・K以上である、請求項1〜4のいずれかに記載の表面処理Al板。   The surface-treated Al plate according to any one of claims 1 to 4, wherein the thermal conductivity is 60 W / m · K or more. 請求項1〜5のいずれかに記載の表面処理Al板を用いてなるヒートシンク。   A heat sink using the surface-treated Al plate according to claim 1. Al基板にZnを置換めっきし、次いでNiめっきし、その後Cuめっきすることを特徴とする、表面処理Al板の製造方法。   A method for producing a surface-treated Al plate, comprising subjecting an Al substrate to substitution plating with Zn, then Ni plating, and then Cu plating. 前記Zn置換めっきを第一置換めっきと第二置換めっきの2回に分けて行うことを特徴とする、請求項7に記載の表面処理Al板の製造方法。   The method for producing a surface-treated Al plate according to claim 7, wherein the Zn substitution plating is performed in two steps of first substitution plating and second substitution plating. Cuめっき後、さらに熱放射性を向上させる層を形成させることを特徴とする、請求項7または8に記載の表面処理Al板の製造方法。   The method for producing a surface-treated Al plate according to claim 7 or 8, further comprising forming a layer for improving thermal radiation after Cu plating. 前記熱放射性を向上させる層を、黒色顔料を含有する水系樹脂を前記Cuめっき上に塗布し乾燥させて設けることを特徴とする、請求項9に記載の表面処理Al板の製造方法。   The method for producing a surface-treated Al plate according to claim 9, wherein the layer for improving thermal radiation is provided by applying a water-based resin containing a black pigment on the Cu plating and drying the layer.
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JPS6120988B2 (en) * 1977-08-09 1986-05-24 Tokyo Shibaura Electric Co
JPS61148900A (en) * 1984-12-22 1986-07-07 三菱電線工業株式会社 Aluminum with electrodeposited layer
JP2004263210A (en) * 2003-02-26 2004-09-24 Toyo Kohan Co Ltd SURFACE TREATED Al SHEET SUPERIOR IN SOLDERABILITY, HEAT SINK USING IT, AND METHOD FOR MANUFACTURING SURFACE TREATED Al SHEET SUPERIOR IN SOLDERABILITY

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6120988B2 (en) * 1977-08-09 1986-05-24 Tokyo Shibaura Electric Co
JPS61148900A (en) * 1984-12-22 1986-07-07 三菱電線工業株式会社 Aluminum with electrodeposited layer
JP2004263210A (en) * 2003-02-26 2004-09-24 Toyo Kohan Co Ltd SURFACE TREATED Al SHEET SUPERIOR IN SOLDERABILITY, HEAT SINK USING IT, AND METHOD FOR MANUFACTURING SURFACE TREATED Al SHEET SUPERIOR IN SOLDERABILITY

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