JP2006049706A - Switched connection type soft-magnetic material - Google Patents

Switched connection type soft-magnetic material Download PDF

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JP2006049706A
JP2006049706A JP2004231089A JP2004231089A JP2006049706A JP 2006049706 A JP2006049706 A JP 2006049706A JP 2004231089 A JP2004231089 A JP 2004231089A JP 2004231089 A JP2004231089 A JP 2004231089A JP 2006049706 A JP2006049706 A JP 2006049706A
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Kazuhiko Shintaku
一彦 新宅
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a soft-magnetic material having a high saturated magnetic-flux density, an excellent soft-magnetic characteristic, and a wide film-thickness range, wherein its magnetic anisotropy is controlled by a switched connection. <P>SOLUTION: In the soft-magnetic material, there are included a composite bedding film which comprises an Mn-based alloy bedding film represented by the formula of Mn<SB>a</SB>M<SB>1-a</SB>/M' and a metal bedding film, and a film represented by the formula of (Fe<SB>x</SB>Co<SB>1-x</SB>)<SB>y</SB>(A)<SB>1-y</SB>. In the formula of Mn<SB>a</SB>M<SB>1-a</SB>/M', the symbol (a) satisfies the relation of 0.4≤a≤0.95, and M is at least one kind selected from the group comprising Fe, Ir, Pt, Cr, Rh, Ru, Pd, Ni, Co, Au, Cu and Ag, and further, M' is at least one kind selected from the group comprising Ag, Al, Au, Co, Cr, Cu, Fe, Ir, Mo, Nb, Ni, Pd, Pt, Rh, Ru, Ta, Ti, V, W and Zr. In the formula of (Fe<SB>x</SB>Co<SB>1-x</SB>)<SB>y</SB>(A)<SB>1-y</SB>, the symbol (x) satisfies the relation of 0.6≤x≤0.8, (y) satisfies the relation of 0<1-y≤0.05, and further, A is at least one kind selected from the group comprising the oxides and nitrides of Mg, Al, Si, Ti, V, Cr and Mn. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、交換結合により磁気異方性が制御された軟磁性材料に関し、特に垂直磁気記録媒体の軟磁性裏打ち膜および高保磁力記録媒体に対応できる磁気ヘッドのコア材料として好適に使用できる、交換結合により磁気異方性が制御された軟磁性材料に関する。   The present invention relates to a soft magnetic material in which magnetic anisotropy is controlled by exchange coupling, and in particular, an exchange that can be suitably used as a core material of a magnetic head capable of dealing with a soft magnetic backing film of a perpendicular magnetic recording medium and a high coercivity recording medium The present invention relates to a soft magnetic material whose magnetic anisotropy is controlled by bonding.

情報記録の大容量・高速化に伴い、情報ストレージ装置の近年の進歩にはめざましいものがある。特に、大容量・高速で、信頼性に優れ、情報の書き換えが可能なハードディスクは、情報ストレージ装置の中では確固たる地位を築いてきた。   With the increase in capacity and speed of information recording, there has been remarkable progress in information storage devices in recent years. In particular, hard disks with large capacity, high speed, excellent reliability, and capable of rewriting information have built a solid position among information storage devices.

大容量化による記録密度の高密度化に伴って、記録方式は面内磁気記録から垂直磁気記録へと移り変わろうとしている。垂直磁気記録媒体には軟磁性膜からなる裏打ち膜が必要となり、その磁気異方性の制御が課題となっている。また、軟磁性裏打ち膜はその膜厚が比較的厚いため、生産性の観点から膜厚の低減が必要であり、高い飽和磁束密度を持つ軟磁性膜が求められている。   As the recording density increases due to the increase in capacity, the recording system is changing from in-plane magnetic recording to perpendicular magnetic recording. A perpendicular magnetic recording medium requires a backing film made of a soft magnetic film, and the control of the magnetic anisotropy is a problem. Further, since the soft magnetic backing film is relatively thick, it is necessary to reduce the film thickness from the viewpoint of productivity, and a soft magnetic film having a high saturation magnetic flux density is required.

一方、磁気記録媒体の保磁力は増大する傾向にある。こうした高保磁力の記録媒体に記録をするための磁気ヘッドのコア材料には、より高い飽和磁束密度を持つ軟磁性膜が求められるとともに、磁気異方性の制御が課題となっている。   On the other hand, the coercive force of magnetic recording media tends to increase. As a core material of a magnetic head for recording on such a high coercive force recording medium, a soft magnetic film having a higher saturation magnetic flux density is required, and control of magnetic anisotropy is an issue.

その他に、軟磁性裏打ち膜でも磁気ヘッドコア材料でも、高周波領域でのうず電流損失を低減させるために、電気抵抗率の高い軟磁性膜も求められている。   In addition, in order to reduce the eddy current loss in the high frequency region, a soft magnetic film having a high electrical resistivity is required for both the soft magnetic backing film and the magnetic head core material.

上述したように、垂直磁気記録媒体用軟磁性裏打ち膜または磁気ヘッドコア材料に用いられる軟磁性膜に求められる特性として、高い飽和磁束密度が挙げられる。FexCo1-y合金(0.6≦x≦0.8)は2.4T以上の高い飽和磁束密度を持つことが知られており、これまで長年に渡り研究されてきた。しかし、この組成のFeCo合金を通常のスパッタリング法によって薄膜にした場合、保磁力が50〜100Oeとなり、垂直磁気記録媒体用軟磁性裏打ち膜または磁気ヘッドコア材料としては使用できなかった。ところが、最近になって、軟磁性下地膜上にFeCo系合金膜を積層することにより、FeCo系合金の困難軸方向の保磁力を低下させることはできることが報告された(非特許文献1参照)。これにより、2.3T以上の高い飽和磁束密度を有するFeCo系合金を用い、高い飽和磁束密度、優れた軟磁気特性、広い膜厚範囲を同時に達成することができる。さらに、こうした積層構造の軟磁性材料は設計マージンや製造マージンも大きくなるため、軟磁性裏打ち膜材料および磁気ヘッドコア材料だけでなく、薄膜インダクタ、薄膜トランス、高周波ノイズフィルタなどにも適用できる。しかし、従来の技術では、FeCo合金の磁気異方性をうまく制御することはできない。 As described above, a high saturation magnetic flux density can be cited as a characteristic required for a soft magnetic underlayer for a perpendicular magnetic recording medium or a soft magnetic film used for a magnetic head core material. Fe x Co 1-y alloy (0.6 ≦ x ≦ 0.8) is known to have a high saturation magnetic flux density of 2.4 T or more, and has been studied for many years. However, when a FeCo alloy having this composition is formed into a thin film by a normal sputtering method, the coercive force is 50 to 100 Oe, and cannot be used as a soft magnetic backing film for a perpendicular magnetic recording medium or a magnetic head core material. Recently, however, it has been reported that the coercivity in the hard axis direction of an FeCo-based alloy can be reduced by laminating an FeCo-based alloy film on a soft magnetic underlayer (see Non-Patent Document 1). . As a result, a high saturation magnetic flux density, excellent soft magnetic properties, and a wide film thickness range can be achieved simultaneously using an FeCo-based alloy having a high saturation magnetic flux density of 2.3 T or more. Further, since the soft magnetic material having such a laminated structure has a large design margin and manufacturing margin, it can be applied not only to the soft magnetic backing film material and the magnetic head core material but also to a thin film inductor, a thin film transformer, a high frequency noise filter, and the like. However, conventional techniques cannot control the magnetic anisotropy of FeCo alloys well.

次に、垂直磁気記録媒体用軟磁性裏打ち膜または磁気ヘッドコア材料に用いられる軟磁性膜に求められる別の特性として、高い電気抵抗率が挙げられる。FexCo1-x合金(0.6≦x≦0.8)は2.4T以上の高い飽和磁束密度を持つが、その電気抵抗率は10μΩ・cm程度である。前記組成のFexCo1-x合金に絶縁物を添加することによって電気抵抗率は増大させることはできるが、良好な軟磁気特性を保ったまま、磁気異方性をうまく制御することはできない。 Another characteristic required for a soft magnetic film for use in a soft magnetic backing film for a perpendicular magnetic recording medium or a magnetic head core material is high electrical resistivity. The Fe x Co 1-x alloy (0.6 ≦ x ≦ 0.8) has a high saturation magnetic flux density of 2.4 T or more, but its electrical resistivity is about 10 μΩ · cm. The electrical resistivity can be increased by adding an insulator to the Fe x Co 1-x alloy having the above composition, but the magnetic anisotropy cannot be controlled well while maintaining good soft magnetic properties. .

従って、一方では、高い飽和磁束密度、優れた軟磁気特性、広い膜厚範囲という優れた特長を損なうことなく、磁気異方性を良好に制御できる軟磁性材料を見いだすことが必要となる。また、他方では、優れた軟磁気特性、広い膜厚範囲という優れた特長を損なうことなく、高い電気抵抗率を有し、磁気異方性を良好に制御できる軟磁性材料を見いだすことが必要となる。
K. Shintaku, K. Yamakawa, and K. Ouchi, "High-Bs Fe-Co-Al-O soft magnetic films," J. Appl. Phys., vol. 93, no. 10, pp. 6474-6476, 2003.
Therefore, on the other hand, it is necessary to find a soft magnetic material that can satisfactorily control the magnetic anisotropy without impairing the excellent features of high saturation magnetic flux density, excellent soft magnetic properties, and a wide film thickness range. On the other hand, it is necessary to find a soft magnetic material having a high electric resistivity and a good control of magnetic anisotropy without impairing the excellent soft magnetic properties and the excellent feature of a wide film thickness range. Become.
K. Shintaku, K. Yamakawa, and K. Ouchi, "High-Bs Fe-Co-Al-O soft magnetic films," J. Appl. Phys., Vol. 93, no. 10, pp. 6474-6476, 2003.

本発明の目的は、高い飽和磁束密度または高い電気抵抗率を有し、かつ優れた軟磁気特性、広い膜厚範囲を有する、交換結合により磁気異方性が制御された軟磁性材料を提供することにある。   An object of the present invention is to provide a soft magnetic material having high saturation magnetic flux density or high electrical resistivity, excellent soft magnetic properties, and a wide film thickness range, and whose magnetic anisotropy is controlled by exchange coupling. There is.

本発明の第1の態様に係る交換結合により磁気異方性が制御された軟磁性材料は、下記一般式Mna1-a/M’(ここで、0.4≦a≦0.95であり、MはFe、Ir、Pt、Cr、Rh、Ru、Pd、Ni、Co、Au、CuおよびAgからなる群より選択される少なくとも1種であり、M’はAg、Al、Au、Co、Cr、Cu、Fe、Ir、Mo、Nb、Ni、Pd、Pt、Rh、Ru、Ta、Ti、V、W、Zrからなる群より選択される少なくとも1種である)で表されるMn系合金下地膜と金属下地膜からなる複合下地膜と、下記一般式(FexCo1-xy(A)1-y(ここで、0.6≦x≦0.8であり、0<1−y≦0.05であり、AはMg、Al、Si、Ti、V、CrおよびMnの酸化物および窒化物からなる群より選択される少なくとも1種である)で表される膜とを含むことを特徴とする。 Soft magnetic material anisotropy is controlled by the exchange coupling of the first aspect of the present invention is represented by the following general formula Mn a M 1-a / M '( where, 0.4 ≦ a ≦ 0.95 M is at least one selected from the group consisting of Fe, Ir, Pt, Cr, Rh, Ru, Pd, Ni, Co, Au, Cu and Ag, and M ′ is Ag, Al, Au, (Co, Cr, Cu, Fe, Ir, Mo, Nb, Ni, Pd, Pt, Rh, Ru, Ta, Ti, V, W, and Zr). a composite base film made of Mn-based alloy underlayer and the metal underlayer, the following general formula (Fe x Co 1-x) y (a) 1-y ( where a 0.6 ≦ x ≦ 0.8, 0 <1-y ≦ 0.05, and A is a group consisting of oxides and nitrides of Mg, Al, Si, Ti, V, Cr and Mn Characterized in that it comprises a membrane which is represented by at least one a is) selected.

本発明の第2の態様に係る交換結合により磁気異方性が制御された軟磁性材料は、下記一般式Mna1-a/M’(ここで、0.4≦a≦0.95であり、MはFe、Ir、Pt、Cr、Rh、Ru、Pd、Ni、Co、Au、CuおよびAgからなる群より選択される少なくとも1種であり、M’はAg、Al、Au、Co、Cr、Cu、Fe、Ir、Mo、Nb、Ni、Pd、Pt、Rh、Ru、Ta、Ti、V、W、Zrからなる群より選択される少なくとも1種である)で表されるMn系合金下地膜と金属下地膜からなる複合下地膜と、下記一般式(FexCo1-xy(A)1-y(ここで、0.6≦x≦0.8であり、0.05≦1−y≦0.3であり、AはMg、Al、Si、Ti、V、CrおよびMnの酸化物および窒化物からなる群より選択される少なくとも1種である)で表される膜とを含むことを特徴とする。 Soft magnetic material anisotropy is controlled by the exchange coupling in accordance with a second aspect of the present invention is represented by the following general formula Mn a M 1-a / M '( where, 0.4 ≦ a ≦ 0.95 M is at least one selected from the group consisting of Fe, Ir, Pt, Cr, Rh, Ru, Pd, Ni, Co, Au, Cu and Ag, and M ′ is Ag, Al, Au, (Co, Cr, Cu, Fe, Ir, Mo, Nb, Ni, Pd, Pt, Rh, Ru, Ta, Ti, V, W, and Zr). a composite base film made of Mn-based alloy underlayer and the metal underlayer, the following general formula (Fe x Co 1-x) y (a) 1-y ( where a 0.6 ≦ x ≦ 0.8, 0.05 ≦ 1-y ≦ 0.3, and A is composed of oxides and nitrides of Mg, Al, Si, Ti, V, Cr, and Mn. Characterized in that it comprises a membrane which is represented by at least one a is) to be more selective.

本発明に係る軟磁性材料においては、Mn系合金下地膜の膜厚が5nm以上、金属下地膜の膜厚が3nm以上、(FexCo1-xy(A)1-y膜の膜厚が20〜1000nmであることが好ましい。 In the soft magnetic material according to the present invention, the thickness of the Mn-based alloy underlayer is 5nm or more, the thickness of the metal base layer is 3nm or more, (Fe x Co 1-x ) y (A) 1-y film with The thickness is preferably 20 to 1000 nm.

本発明の第1の態様に係る軟磁性材料は、高い飽和磁束密度、優れた軟磁気特性を有し、かつ交換結合により磁気異方性が制御されている。この軟磁性材料を垂直磁気記録媒体用軟磁性裏打ち膜として用いた場合、裏打ち膜に起因するノイズを低減することができるため、再生信号品質が向上する。この軟磁性材料を磁気ヘッドコア材料として用いた場合、高い保磁力を有する記録媒体への情報の書き込みが容易になり、記録媒体上に安定した磁区を形成できるため、再生信号品質が向上する。   The soft magnetic material according to the first aspect of the present invention has a high saturation magnetic flux density, excellent soft magnetic properties, and magnetic anisotropy is controlled by exchange coupling. When this soft magnetic material is used as a soft magnetic backing film for a perpendicular magnetic recording medium, noise caused by the backing film can be reduced, so that reproduced signal quality is improved. When this soft magnetic material is used as a magnetic head core material, information can be easily written on a recording medium having a high coercive force, and a stable magnetic domain can be formed on the recording medium, so that the reproduction signal quality is improved.

本発明の第2の態様に係る軟磁性材料は、高い電気抵抗率、優れた軟磁気特性を有し、かつ交換結合により磁気異方性が制御されている。この軟磁性材料を垂直磁気記録媒体用軟磁性裏打ち膜または磁気ヘッドコア材料として用いた場合、高周波領域でのうず電流損失を低減することができるため、再生信号品質が向上する。   The soft magnetic material according to the second aspect of the present invention has high electrical resistivity, excellent soft magnetic properties, and magnetic anisotropy is controlled by exchange coupling. When this soft magnetic material is used as a soft magnetic backing film for a perpendicular magnetic recording medium or a magnetic head core material, the eddy current loss in the high frequency region can be reduced, and the reproduction signal quality is improved.

また、本発明に係る軟磁性材料は、広い範囲の膜厚で所望の磁気特性が得られることから、垂直磁気記録媒体および磁気ヘッドの設計マージンおよび製造マージンを大きくすることができる。   In addition, since the soft magnetic material according to the present invention can obtain desired magnetic characteristics in a wide range of film thickness, the design margin and manufacturing margin of the perpendicular magnetic recording medium and the magnetic head can be increased.

以下、本発明に係る交換結合により磁気異方性が制御された軟磁性材料について、詳細に説明する。   Hereinafter, the soft magnetic material whose magnetic anisotropy is controlled by exchange coupling according to the present invention will be described in detail.

本発明に係る交換結合により磁気異方性が制御された高飽和磁束密度軟磁性材料は、Mn系合金下地膜と金属下地膜からなる複合下地膜を有する。   The high saturation magnetic flux density soft magnetic material in which magnetic anisotropy is controlled by exchange coupling according to the present invention has a composite base film composed of a Mn-based alloy base film and a metal base film.

Mn系合金下地膜としては、MnFe合金、MnIr合金、MnPt合金、MnCr合金、MnRh合金、MnRu合金、MnPd合金、MnNi合金、MnCo合金、MnAu合金、MnCu合金、MnAg合金、MnRhRu合金、MnFeRh合金、MnPtPd合金、MnPtCr合金、MnNiCr合金などが挙げられる。   As the Mn-based alloy base film, MnFe alloy, MnIr alloy, MnPt alloy, MnCr alloy, MnRh alloy, MnRu alloy, MnPd alloy, MnNi alloy, MnCo alloy, MnAu alloy, MnCu alloy, MnAg alloy, MnRhRu alloy, MnFeRh alloy, A MnPtPd alloy, a MnPtCr alloy, a MnNiCr alloy, etc. are mentioned.

金属下地膜としては、Ag、Al、Au、Co、Cr、Cu、Fe、Mn、Ir、Mo、Nb、Ni、Pd、Pt、Rh、Ru、Ta、Ti、V、W、Zr、AgCu合金、AuCu合金、AuNi合金、AuPd合金、CoFe合金、CoMn合金、CoNi合金、CoPd合金、CrFe合金、CrMo合金、CrNi合金、CrV合金、CrW合金、CuMn合金、CuNi合金、CuPd合金、CuV合金、FeMn合金、FeNi合金、FePd合金、MnNi合金、MoNb合金、MoTa合金、MoTi合金、MoV合金、MoW合金、MoZr合金、NbTa合金、NbTi合金、NbV合金、NbW合金、NbZr合金、NiPd合金、TaTi合金、TaV合金、TaW合金、TiV合金、TiZr合金などが挙げられる。   As the metal base film, Ag, Al, Au, Co, Cr, Cu, Fe, Mn, Ir, Mo, Nb, Ni, Pd, Pt, Rh, Ru, Ta, Ti, V, W, Zr, AgCu alloy , AuCu alloy, AuNi alloy, AuPd alloy, CoFe alloy, CoMn alloy, CoNi alloy, CoPd alloy, CrFe alloy, CrMo alloy, CrNi alloy, CrV alloy, CrW alloy, CuMn alloy, CuNi alloy, CuPd alloy, CuV alloy, FeMn Alloy, FeNi alloy, FePd alloy, MnNi alloy, MoNb alloy, MoTa alloy, MoTi alloy, MoV alloy, MoW alloy, MoZr alloy, NbTa alloy, NbTi alloy, NbV alloy, NbW alloy, NbZr alloy, NiPd alloy, TaTi alloy, TaV alloy, TaW alloy, TiV alloy, TiZr alloy etc. .

Mn系合金下地膜としては、FeCo系合金軟磁性膜の下地膜として用いたときに、FeCo系合金軟磁性膜の保磁力を低下させる機能を示すものが用いられる。Mn系合金下地膜を一般式Mna1-a(MはFe、Ir、Pt、Cr、Rh、Ru、Pd、Ni、Co、Au、CuおよびAgからなる群より選択される少なくとも1種である)で表したとき、Mn組成aは0.4≦a≦0.95であることが必要である。なお、Ir、RhまたはRuを含有するMn系合金では0.5≦a≦0.95、それ以外の元素を含有するMn系合金では0.4≦a≦0.85であることが好ましい。 As the Mn-based alloy base film, a film showing a function of reducing the coercive force of the FeCo-based alloy soft magnetic film when used as the base film of the FeCo-based alloy soft magnetic film is used. Generally the Mn-based alloy underlayer formula Mn a M 1-a (M is at least one kind of Fe, Ir, Pt, Cr, Rh, Ru, Pd, Ni, Co, Au, is selected from the group consisting of Cu and Ag The Mn composition a needs to satisfy 0.4 ≦ a ≦ 0.95. It is preferable that 0.5 ≦ a ≦ 0.95 for an Mn-based alloy containing Ir, Rh, or Ru, and 0.4 ≦ a ≦ 0.85 for an Mn-based alloy containing other elements.

Mn系合金下地膜の下部に設けられる金属下地膜は、Mn系合金下地膜の結晶性、配向性を向上させる機能を示すものが用いられる。この金属下地膜の材料は、非常に幅広い範囲から選択できる。金属下地膜を設けることにより、Mn系合金下地膜とFeCo系合金軟磁性膜との間に強い交換結合を生じさせる。   As the metal base film provided below the Mn-based alloy base film, a film having a function of improving the crystallinity and orientation of the Mn-based alloy base film is used. The material for the metal underlayer can be selected from a very wide range. By providing the metal base film, strong exchange coupling is generated between the Mn-based alloy base film and the FeCo-based alloy soft magnetic film.

FeCo系合金軟磁性膜は、FexCo1-x(0.6≦x≦0.8)を主成分とする。適切な組成を有するFeCoは、スパッタリングターゲットや成膜条件を調整することによって、その飽和磁束密度が合金系で得られる最高値である2.45Tに到達することが知られている。FexCo1-x(0.6≦x≦0.8)で表される組成範囲のFeCo合金は、上記の値に近い飽和磁束密度を有する。本発明においては、FexCo1-x(0.6≦x≦0.8)に対して30%以下のA(ここで、AはMg、Al、Si、Ti、V、CrおよびMnの酸化物および窒化物からなる群より選択される少なくとも1種である)を含有した組成を有する軟磁性膜が用いられる。 The FeCo-based alloy soft magnetic film contains Fe x Co 1-x (0.6 ≦ x ≦ 0.8) as a main component. It is known that FeCo having an appropriate composition reaches a maximum value of 2.45 T, which is the maximum value that can be obtained in an alloy system, by adjusting a sputtering target and film formation conditions. An FeCo alloy having a composition range represented by Fe x Co 1-x (0.6 ≦ x ≦ 0.8) has a saturation magnetic flux density close to the above value. In the present invention, 30% or less A (where A is Mg, Al, Si, Ti, V, Cr and Mn) with respect to Fe x Co 1-x (0.6 ≦ x ≦ 0.8). A soft magnetic film having a composition containing at least one selected from the group consisting of oxides and nitrides is used.

本発明の第1の態様に係る軟磁性材料において、2.3T以上の高い飽和磁束密度を得るためには、A含有量は0.5〜5%であることが好ましい。A含有量が0.5%未満であると、困難軸方向の保磁力が高くなる傾向がある。A含有量が5%を超えると、飽和磁束密度が低下する傾向がある。   In the soft magnetic material according to the first aspect of the present invention, in order to obtain a high saturation magnetic flux density of 2.3 T or more, the A content is preferably 0.5 to 5%. If the A content is less than 0.5%, the coercive force in the hard axis direction tends to increase. When the A content exceeds 5%, the saturation magnetic flux density tends to decrease.

本発明の第2の態様に係る軟磁性材料において、100μΩ・cm以上の高い電気抵抗率を得るためには、A含有量は5〜30%であることが好ましい。A含有量が5%未満であると、電気抵抗率が低くなる傾向がある。A含有量が30%を超えると、軟磁気特性が劣化する傾向がある。   In the soft magnetic material according to the second aspect of the present invention, in order to obtain a high electrical resistivity of 100 μΩ · cm or more, the A content is preferably 5 to 30%. If the A content is less than 5%, the electrical resistivity tends to be low. If the A content exceeds 30%, the soft magnetic properties tend to deteriorate.

本発明に係る軟磁性材料は、Mn系合金下地膜と金属下地膜で形成されている複合下地膜上に(FexCo1-xy(A)1-y膜を形成したことにより、高い飽和磁束密度または高い電気抵抗率、かつ良好な軟磁気特性を示すとともに、交換結合により磁気異方性が制御されている。 Soft magnetic material according to the present invention, by forming the Mn-based alloy underlayer and a metal base on the composite base film formed with a film (Fe x Co 1-x) y (A) 1-y film, The magnetic anisotropy is controlled by exchange coupling while exhibiting high saturation magnetic flux density or high electrical resistivity and good soft magnetic properties.

本発明の第1の態様に係る軟磁性材料は、高い飽和磁束密度、優れた軟磁気特性を有し、かつ交換結合により磁気異方性が制御されている。この軟磁性材料を垂直磁気記録媒体用軟磁性裏打ち膜として用いた場合、裏打ち膜に起因するノイズを低減することができるため、再生信号品質が向上する。この軟磁性材料を磁気ヘッドコア材料として用いた場合、高い保磁力を有する記録媒体への情報の書き込みが容易になり、記録媒体上に安定した磁区を形成できるため、再生信号品質が向上する。   The soft magnetic material according to the first aspect of the present invention has a high saturation magnetic flux density, excellent soft magnetic properties, and magnetic anisotropy is controlled by exchange coupling. When this soft magnetic material is used as a soft magnetic backing film for a perpendicular magnetic recording medium, noise caused by the backing film can be reduced, so that reproduced signal quality is improved. When this soft magnetic material is used as a magnetic head core material, information can be easily written on a recording medium having a high coercive force, and a stable magnetic domain can be formed on the recording medium, so that the reproduction signal quality is improved.

本発明の第2の態様に係る軟磁性材料は、高い電気抵抗率、優れた軟磁気特性を有し、かつ交換結合により磁気異方性が制御されている。この軟磁性材料を垂直磁気記録媒体用軟磁性裏打ち膜または磁気ヘッドコア材料として用いた場合、高周波領域でのうず電流損失を低減することができるため、再生信号品質が向上する。   The soft magnetic material according to the second aspect of the present invention has high electrical resistivity, excellent soft magnetic properties, and magnetic anisotropy is controlled by exchange coupling. When this soft magnetic material is used as a soft magnetic backing film for a perpendicular magnetic recording medium or a magnetic head core material, the eddy current loss in the high frequency region can be reduced, and the reproduction signal quality is improved.

本発明に係る交換結合により磁気異方性が制御された軟磁性材料については、Mn系合金下地膜の膜厚が5nm以上、金属下地膜の膜厚が3nm以上、(FexCo1-xy(A)1-y膜の膜厚が20〜1000nmであることが好ましい。この範囲の膜厚であれば、優れた軟磁気特性が得られるとともに、交換結合により制御された大きな異方性磁界を得ることができる。このように広い範囲の膜厚で所望の磁気特性が得られることから、垂直磁気記録媒体または磁気ヘッドの設計マージンおよび製造マージンを大きくすることができる。 The soft magnetic material anisotropy is controlled by the exchange coupling in accordance with the present invention, the thickness of the Mn-based alloy underlayer is 5nm or more, the thickness of the metal base layer is 3nm or more, (Fe x Co 1-x ) The film thickness of the y (A) 1-y film is preferably 20 to 1000 nm. When the film thickness is within this range, excellent soft magnetic characteristics can be obtained, and a large anisotropic magnetic field controlled by exchange coupling can be obtained. Since desired magnetic characteristics can be obtained in such a wide range of film thickness, the design margin and manufacturing margin of the perpendicular magnetic recording medium or magnetic head can be increased.

本発明において、(FexCo1-xy(A)1-y膜はスパッタリング法により成膜することができる。具体的には、以下のような方法を用いることができる。 In the present invention, (Fe x Co 1-x ) y (A) 1-y film can be deposited by a sputtering method. Specifically, the following method can be used.

1)FeCoにAを5%以下含有させた焼結ターゲットを用いてスパッタリングを行う。   1) Sputtering is performed using a sintering target containing 5% or less of A in FeCo.

2)FeCo合金ターゲットとAターゲットを用いて同時スパッタリングを行う。   2) Simultaneous sputtering is performed using an FeCo alloy target and an A target.

3)FeCo合金ターゲット上にAチップを添付した複合ターゲットを用いてスパッタリングを行う。   3) Sputtering is performed using a composite target with an A chip attached on an FeCo alloy target.

スパッタリング条件をいったん決定すれば、それ以降は安定して所望の磁気特性を有する軟磁性材料を作製できる。Mn系合金下地膜と金属下地膜についても、同様の方法により成膜することができる。   Once the sputtering conditions are determined, a soft magnetic material having desired magnetic properties can be stably produced thereafter. The Mn alloy base film and the metal base film can also be formed by the same method.

以下の実施例においては、図1に示す構成の軟磁性材料を作製した。図1に示すように、基板1上に、金属下地膜2、Mn系合金下地膜3およびFeCo系軟磁性膜4が形成される。   In the following examples, a soft magnetic material having the configuration shown in FIG. 1 was produced. As shown in FIG. 1, a metal base film 2, a Mn alloy base film 3, and an FeCo soft magnetic film 4 are formed on a substrate 1.

実施例1
ターゲットとして、直径100mm、厚さ3mmの円盤状のPt、Mn0.8Ir0.2および(Fe0.70Co0.300.99(Al230.01の焼結体を用いた。基板として、10mm角、厚さ1mmのシリコンの表面に酸化シリコンを形成したものを用いた。
Example 1
As a target, a disc-shaped sintered body having a diameter of 100 mm and a thickness of 3 mm, Pt, Mn 0.8 Ir 0.2 and (Fe 0.70 Co 0.30 ) 0.99 (Al 2 O 3 ) 0.01 was used. A substrate in which silicon oxide was formed on the surface of a 10 mm square and 1 mm thick silicon was used.

上記の3つのターゲットおよび基板を、6ターゲットの高周波マグネトロンスパッタリング装置(トッキ製SPM−505)の真空槽内に固定し、基板とターゲットとの距離を約75mmに調整した。また、軟磁性膜に磁気異方性を付与するために、基板の外側に永久磁石を配置し、基板の中心部で100Oe以上の磁場が印加されるようにした。   The above three targets and the substrate were fixed in a vacuum tank of a six-target high-frequency magnetron sputtering apparatus (SPM-505 manufactured by Tokki), and the distance between the substrate and the target was adjusted to about 75 mm. In order to impart magnetic anisotropy to the soft magnetic film, a permanent magnet is disposed outside the substrate so that a magnetic field of 100 Oe or more is applied at the center of the substrate.

真空槽内を2×10-5Paになるまで排気した。その後、真空槽内にArガスを導入し、圧力1Paになるようにガス流量を調整した。放電電力400W、放電周波数13.56MHzで高周波スパッタリングを行った。基板上にPt合金ターゲットを用いて金属下地膜を10nm、Mn0.8Ir0.2合金ターゲットを用いてMn系合金下地膜を10nm、(Fe0.70Co0.300.99(Al230.01合金ターゲットを用いてFeCo系軟磁性膜を100nm堆積した。 The inside of the vacuum chamber was evacuated to 2 × 10 −5 Pa. Thereafter, Ar gas was introduced into the vacuum chamber, and the gas flow rate was adjusted so that the pressure was 1 Pa. High frequency sputtering was performed at a discharge power of 400 W and a discharge frequency of 13.56 MHz. 10nm The metal base layer by using a Pt alloy target on a substrate, Mn 0.8 Ir 0.2 10nm a Mn-based alloy underlayer film using an alloy target used (Fe 0.70 Co 0.30) 0.99 ( Al 2 O 3) 0.01 alloy target An FeCo-based soft magnetic film was deposited to 100 nm.

比較例として、Al23を含有しないFe70Co30合金ターゲットのみを用意し、上記と同様の手順で基板上に厚さ約100nmのFe70Co30膜のみを堆積した。 As a comparative example, only an Fe 70 Co 30 alloy target containing no Al 2 O 3 was prepared, and only an Fe 70 Co 30 film having a thickness of about 100 nm was deposited on the substrate in the same procedure as described above.

参考のために、MnIr/Pt下地膜を形成することなく、上記と同様の手順で基板上に厚さ約100nmの(Fe0.70Co0.300.99(Al230.01膜を堆積した。 For reference, a (Fe 0.70 Co 0.30 ) 0.99 (Al 2 O 3 ) 0.01 film having a thickness of about 100 nm was deposited on the substrate in the same procedure as above without forming the MnIr / Pt underlayer.

以上のようにして作製したFeCo系軟磁性膜の特性評価を行った。測定には振動試料磁力計(VSM)を用いた。   The characteristics of the FeCo-based soft magnetic film produced as described above were evaluated. A vibrating sample magnetometer (VSM) was used for the measurement.

図2にMnIr/Pt下地膜と(Fe0.70Co0.300.99(Al230.01膜とを有する本実施例の軟磁性材料の磁化曲線を示す。飽和磁束密度は2.42T、困難軸方向の保磁力は0.3Oe、異方性磁界は50Oeとなり、高飽和磁束密度と良好な軟磁気特性、磁気異方性を示していた。また、容易軸方向の磁化曲線から、交換結合によりバイアス磁界が発生し、磁区が制御されていることがわかる。 FIG. 2 shows the magnetization curve of the soft magnetic material of this example having a MnIr / Pt underlayer and (Fe 0.70 Co 0.30 ) 0.99 (Al 2 O 3 ) 0.01 . The saturation magnetic flux density was 2.42 T, the coercivity in the hard axis direction was 0.3 Oe, and the anisotropic magnetic field was 50 Oe, indicating a high saturation magnetic flux density, good soft magnetic properties, and magnetic anisotropy. It can also be seen from the magnetization curve in the easy axis direction that a bias magnetic field is generated by exchange coupling and the magnetic domain is controlled.

図3にFe70Co30膜のみの代表的な磁化曲線を示す。飽和磁束密度は2.45T、困難軸方向の保磁力は100Oeであった。 FIG. 3 shows a typical magnetization curve of only the Fe 70 Co 30 film. The saturation magnetic flux density was 2.45 T, and the coercive force in the hard axis direction was 100 Oe.

図4に(Fe0.70Co0.300.99(Al230.01膜のみの磁化曲線を示す。飽和磁束密度は2.42T、困難軸方向の保磁力は3Oe、異方性磁界は20Oeであった。 FIG. 4 shows the magnetization curve of only the (Fe 0.70 Co 0.30 ) 0.99 (Al 2 O 3 ) 0.01 film. The saturation magnetic flux density was 2.42 T, the coercive force in the hard axis direction was 3 Oe, and the anisotropic magnetic field was 20 Oe.

図2〜図4の結果から、本実施例の軟磁性材料は、MnPt/Pt下地膜を設けたことにより、FeCo系膜の軟磁気特性および磁気異方性を大幅に改善できることがわかる。   2 to 4, it can be seen that the soft magnetic material of this example can significantly improve the soft magnetic characteristics and magnetic anisotropy of the FeCo-based film by providing the MnPt / Pt underlayer.

実施例2
実施例1と同様の手順で、基板上にPt膜の膜厚を10nmに固定して堆積し、その上にMnIr膜の膜厚を10nmに固定して堆積し、その上に(Fe0.70Co0.300.99(Al230.01膜を種々の膜厚で堆積した。
Example 2
In the same procedure as in Example 1, the Pt film was deposited on the substrate with a fixed film thickness of 10 nm, and the MnIr film was fixed on the film with a fixed film thickness of 10 nm, on which (Fe 0.70 Co 0.30 ) 0.99 (Al 2 O 3 ) 0.01 films were deposited in various thicknesses.

図5に、得られた軟磁性材料について、困難軸方向の保磁力および異方性磁界と(Fe0.70Co0.300.99(Al230.01膜の膜厚との関係を示す。図5から、(Fe0.70Co0.300.99(Al230.01膜の膜厚が20〜1000nmの膜厚であれば、困難軸方向の保磁力は1Oe以下、異方性磁界は20Oe以上であることがわかる。 FIG. 5 shows the relationship between the coercive force and anisotropic magnetic field in the hard axis direction and the film thickness of the (Fe 0.70 Co 0.30 ) 0.99 (Al 2 O 3 ) 0.01 film for the obtained soft magnetic material. From FIG. 5, when the film thickness of the (Fe 0.70 Co 0.30 ) 0.99 (Al 2 O 3 ) 0.01 film is 20 to 1000 nm, the coercive force in the hard axis direction is 1 Oe or less and the anisotropic magnetic field is 20 Oe or more. It can be seen that it is.

また、(Fe0.70Co0.300.99(Al230.01膜の膜厚が図5に示す範囲にあるすべての軟磁性材料において、飽和磁束密度は2.42Tとほぼ一定であった。 Further, in all soft magnetic materials in which the film thickness of the (Fe 0.70 Co 0.30 ) 0.99 (Al 2 O 3 ) 0.01 film was in the range shown in FIG. 5, the saturation magnetic flux density was substantially constant at 2.42 T.

実施例3
実施例1と同様の手順で、基板上にPt膜を種々の膜厚で堆積し、その上にMnIr膜の膜厚を10nmに固定して堆積し、その上に(Fe0.70Co0.300.99(Al230.01膜を膜厚約100nmに固定して堆積した。
Example 3
In the same procedure as in Example 1, the Pt film is deposited on the substrate with various thicknesses, and the MnIr film is deposited with the film thickness fixed at 10 nm thereon, and (Fe 0.70 Co 0.30 ) 0.99 thereon. A (Al 2 O 3 ) 0.01 film was deposited with a film thickness fixed at about 100 nm.

図6に、得られた軟磁性材料について、困難軸方向の保磁力および異方性磁界とPt下地膜の膜厚との関係を示す。図6から、Pt膜の膜厚が3nm以上の膜厚であれば、困難軸方向の保磁力は1Oe以下、異方性磁界は50Oe以上であることがわかる。   FIG. 6 shows the relationship between the coercive force and anisotropic magnetic field in the hard axis direction and the film thickness of the Pt underlayer for the obtained soft magnetic material. From FIG. 6, it can be seen that if the thickness of the Pt film is 3 nm or more, the coercive force in the hard axis direction is 1 Oe or less and the anisotropic magnetic field is 50 Oe or more.

また、Pt膜の膜厚が図6に示す範囲にあるすべての軟磁性材料において、飽和磁束密度は2.42Tとほぼ一定であった。   Further, in all soft magnetic materials having a Pt film thickness in the range shown in FIG. 6, the saturation magnetic flux density was substantially constant at 2.42T.

実施例4
実施例1と同様の手順で、基板上にPt膜を膜厚10nmに固定して堆積し、その上にMnIr膜を種々の膜厚で堆積し、その上に(Fe0.70Co0.300.99(Al230.01膜を膜厚約100nmに固定して堆積した。
Example 4
In the same procedure as in Example 1, a Pt film was deposited on a substrate with a fixed thickness of 10 nm, and a MnIr film was deposited thereon with various film thicknesses, and (Fe 0.70 Co 0.30 ) 0.99 ( An Al 2 O 3 ) 0.01 film was deposited with a fixed film thickness of about 100 nm.

図7に、得られた軟磁性材料について、困難軸方向の保磁力および異方性磁界とMnIr膜の膜厚との関係を示す。図7から、MnIr膜の膜厚が5nm以上の膜厚であれば、困難軸方向の保磁力は1Oe以下、異方性磁界は50Oe以上であることがわかる。   FIG. 7 shows the relationship between the coercive force and anisotropic magnetic field in the hard axis direction and the film thickness of the MnIr film for the obtained soft magnetic material. From FIG. 7, it can be seen that if the thickness of the MnIr film is 5 nm or more, the coercive force in the hard axis direction is 1 Oe or less and the anisotropic magnetic field is 50 Oe or more.

また、MnIr膜の膜厚が図7に示す範囲にあるすべての軟磁性材料において、飽和磁束密度は2.42Tとほぼ一定であった。   Further, in all soft magnetic materials in which the film thickness of the MnIr film is in the range shown in FIG. 7, the saturation magnetic flux density was substantially constant at 2.42T.

実施例5
FeCo系軟磁性膜のターゲットとして、Al23含有量が異なる(Fe0.70Co0.30y(Al23)1-y(0.005≦1−y≦0.05)の焼結体を用いた以外、実施例1と同様の手順で、基板上にMnIr/Pt下地膜を介して種々の含有量でAl23を含有したFeCo系軟磁性膜を堆積した。
Example 5
As targets for FeCo-based soft magnetic films, sintered bodies having different contents of Al 2 O 3 (Fe 0.70 Co 0.30 ) y (Al 2 O 3 ) 1-y (0.005 ≦ 1-y ≦ 0.05) A FeCo-based soft magnetic film containing Al 2 O 3 with various contents was deposited on the substrate through a MnIr / Pt underlayer in the same procedure as in Example 1 except that was used.

図8に、得られた軟磁性材料について、飽和磁束密度および困難軸方向の保磁力とAl23含有量との関係を示す。図8から、Al23含有量が0.5〜5%であれば、飽和磁束密度は2.3T以上、困難軸方向の保磁力は1Oe以下であることがわかる。 FIG. 8 shows the relationship between the saturation magnetic flux density and the coercivity in the hard axis direction and the Al 2 O 3 content of the obtained soft magnetic material. FIG. 8 shows that when the Al 2 O 3 content is 0.5 to 5%, the saturation magnetic flux density is 2.3 T or more and the coercive force in the hard axis direction is 1 Oe or less.

また、(Fe0.70Co0.30y(Al231-y膜の組成が図8に示す範囲にあるすべての軟磁性材料において、異方性磁界は50Oe以上であった。 Further, in all the soft magnetic materials in which the composition of the (Fe 0.70 Co 0.30 ) y (Al 2 O 3 ) 1 -y film is in the range shown in FIG. 8, the anisotropic magnetic field was 50 Oe or more.

実施例6
金属下地膜(M’)のターゲットとしてAg、Al、Au、Co、Cr、Cu、Fe、Mn、Ir、Mo、Nb、Ni、Pd、Pt、Rh、Ru、Ta、Ti、V、W、Zrからなる群より選択される少なくとも1種からなる単体金属または合金を用い、実施例1と同様の手順で、基板上に金属下地膜を堆積し、その上にMnIr膜を堆積し、その上に(Fe0.70Co0.300.99(Al230.01膜を堆積した。
Example 6
Ag, Al, Au, Co, Cr, Cu, Fe, Mn, Ir, Mo, Nb, Ni, Pd, Pt, Rh, Ru, Ta, Ti, V, W, as a target for the metal underlayer (M ′) Using a simple metal or alloy selected from the group consisting of Zr and depositing a metal base film on the substrate and depositing a MnIr film on the substrate in the same procedure as in Example 1, (Fe 0.70 Co 0.30 ) 0.99 (Al 2 O 3 ) 0.01 film was deposited thereon .

表1に、得られたいくつかの軟磁性材料について、飽和磁束密度(Bs)、困難軸方向の保磁力(Hch)、異方性磁界(Hk)の値を示す。   Table 1 shows values of saturation magnetic flux density (Bs), hard axis coercive force (Hch), and anisotropic magnetic field (Hk) for some of the obtained soft magnetic materials.

表1から、すべての軟磁性材料で、飽和磁束密度は2.3T以上、困難軸方向の保磁力は1Oe以下、異方性磁界は30Oe以上であることがわかる。   Table 1 shows that for all soft magnetic materials, the saturation magnetic flux density is 2.3 T or more, the coercivity in the hard axis direction is 1 Oe or less, and the anisotropic magnetic field is 30 Oe or more.

Figure 2006049706
Figure 2006049706

実施例7
Mn系合金下地膜ターゲットとして合金成分MがFe、Ir、Pt、Cr、Rh、Ru、Pd、Ni、Co、Au、CuまたはAgであるMna1-a(0.4≦a≦0.95)を用い、実施例1と同様の手順で、基板上にPt下地膜を堆積し、その上にMn系合金下地膜を堆積し、その上に(Fe0.70Co0.300.99(Al230.01膜を堆積した。
Example 7
Mn a M 1-a (0.4 ≦ a ≦ 0) in which the alloy component M is Fe, Ir, Pt, Cr, Rh, Ru, Pd, Ni, Co, Au, Cu, or Ag as the Mn-based alloy underlayer target .95), and a Pt underlayer film is deposited on the substrate and a Mn-based alloy underlayer film is deposited thereon, and (Fe 0.70 Co 0.30 ) 0.99 (Al 2 An O 3 ) 0.01 film was deposited.

表2に、得られた軟磁性材料について、飽和磁束密度(Bs)、困難軸方向の保磁力(Hch)、異方性磁界(Hk)の値を示す。   Table 2 shows values of saturation magnetic flux density (Bs), hard axis coercive force (Hch), and anisotropic magnetic field (Hk) for the obtained soft magnetic material.

表2から、すべての軟磁性材料で、飽和磁束密度は2.3T以上、困難軸方向の保磁力は1Oe以下、異方性磁界は20Oe以上であることがわかる。   Table 2 shows that for all soft magnetic materials, the saturation magnetic flux density is 2.3 T or more, the coercivity in the hard axis direction is 1 Oe or less, and the anisotropic magnetic field is 20 Oe or more.

Figure 2006049706
Figure 2006049706

実施例8
FeCo系軟磁性膜のターゲットとして、Aが異なる(Fe0.70Co0.300.99(A)0.01の焼結体を用いた以外は、上記実施例1と同様の手順で、基板上にPt下地膜を堆積し、その上にMn系合金下地膜を堆積し、その上にFeCo系軟磁性膜を堆積した。
Example 8
A Pt underlayer was formed on the substrate in the same procedure as in Example 1 except that a sintered body having a different A (Fe 0.70 Co 0.30 ) 0.99 (A) 0.01 was used as the target of the FeCo-based soft magnetic film. Then, a Mn alloy base film was deposited thereon, and a FeCo soft magnetic film was deposited thereon.

表3に、得られたいくつかの軟磁性材料について、飽和磁束密度(Bs)、困難軸方向の保磁力(Hch)、異方性磁界(Hk)の値を示す。   Table 3 shows the values of saturation magnetic flux density (Bs), hard axis coercive force (Hch), and anisotropic magnetic field (Hk) for some of the obtained soft magnetic materials.

表3から、すべての軟磁性材料で、飽和磁束密度は2.3T以上、困難軸方向の保磁力は1Oe以下、異方性磁界は40Oe以上であることがわかる。また、Aの含有量が0.5%以上、5%以下の範囲であれば、すべてのAに対して飽和磁束密度は2.3T以上、困難軸方向の保磁力は1Oe以下、異方性磁界は30Oe以上であった。   Table 3 shows that for all soft magnetic materials, the saturation magnetic flux density is 2.3 T or more, the coercivity in the hard axis direction is 1 Oe or less, and the anisotropic magnetic field is 40 Oe or more. If the A content is in the range of 0.5% or more and 5% or less, the saturation magnetic flux density is 2.3 T or more, the coercive force in the hard axis direction is 1 Oe or less, and anisotropy. The magnetic field was 30 Oe or more.

Figure 2006049706
Figure 2006049706

実施例9
ターゲットとして、Al23含有量が異なる(Fe0.70Co0.30y(Al231-y(0.005≦1−y≦0.3)の焼結体を用いた以外、実施例1と同様の手順で、基板上にMnIr/Pt下地膜を介して種々の含有量でAl23を含有量したFeCo系軟磁性膜を堆積した。
Example 9
Except for using a sintered body of (Fe 0.70 Co 0.30 ) y (Al 2 O 3 ) 1-y (0.005 ≦ 1-y ≦ 0.3) having different Al 2 O 3 content as a target. In the same procedure as in Example 1, FeCo-based soft magnetic films containing Al 2 O 3 with various contents were deposited on a substrate via a MnIr / Pt underlayer.

図9に、得られた軟磁性材料について、電気抵抗率および困難軸方向の保磁力とAl23含有量との関係を示す。図9から、Al23含有量が5〜30%であれば、電気抵抗率は100μΩ・cm以上、困難軸方向の保磁力は2Oe以下であることがわかる。 FIG. 9 shows the relationship between the electrical resistivity, the coercive force in the hard axis direction, and the Al 2 O 3 content of the obtained soft magnetic material. FIG. 9 shows that when the Al 2 O 3 content is 5 to 30%, the electrical resistivity is 100 μΩ · cm or more and the coercive force in the hard axis direction is 2 Oe or less.

また、(Fe0.70Co0.30y(Al231-y膜の組成が図9に示す範囲にあるすべての軟磁性材料において、異方性磁界は30Oe以上であった。 Further, in all soft magnetic materials in which the composition of the (Fe 0.70 Co 0.30 ) y (Al 2 O 3 ) 1 -y film is in the range shown in FIG. 9, the anisotropic magnetic field was 30 Oe or more.

本発明の実施例において作製した軟磁性材料の断面図。Sectional drawing of the soft-magnetic material produced in the Example of this invention. 実施例1におけるMnIr/Pt下地膜と(Fe0.70Co0.300.99(Al230.01膜を含む軟磁性材料の磁化曲線を示す図。Shows the magnetization curve of the soft magnetic material containing MnIr / Pt underlayer and (Fe 0.70 Co 0.30) 0.99 ( Al 2 O 3) 0.01 film in Example 1. Fe70Co30膜のみの磁化曲線を示す図。Shows the magnetization curves of Fe 70 Co 30 film only. (Fe0.70Co0.300.99(Al230.01膜のみの磁化曲線を示す図。 (Fe 0.70 Co 0.30) 0.99 ( Al 2 O 3) shows the magnetization curve of only 0.01 membrane. 実施例2における軟磁性材料について、困難軸方向の保磁力および異方性磁界と(Fe0.70Co0.300.99(Al230.01膜の膜厚との関係を示す図。The soft magnetic material according to Example 2, showing the relationship between the thickness of the hard axis direction of the coercive force and the anisotropic magnetic field (Fe 0.70 Co 0.30) 0.99 ( Al 2 O 3) 0.01 film FIG. 実施例3における軟磁性材料について、困難軸方向の保磁力および異方性磁界とPt膜の膜厚との関係を示す図。The figure which shows the relationship between the coercive force and anisotropic magnetic field of a hard-axis direction, and the film thickness of Pt film | membrane about the soft magnetic material in Example 3. 実施例4における軟磁性材料について、困難軸方向の保磁力および異方性磁界とMnIr膜の膜厚との関係を示す図。The figure which shows the relationship between the coercive force and anisotropic magnetic field of a hard-axis direction, and the film thickness of a MnIr film | membrane about the soft-magnetic material in Example 4. FIG. 実施例5における軟磁性材料について、飽和磁束密度および困難軸方向の保磁力とFeCo系軟磁性膜中のAl23含有量との関係を示す図。The soft magnetic material according to Example 5, illustrates the relationship between the Al 2 O 3 content in the saturated magnetic flux density and the hard axis coercivity and FeCo-based soft magnetic film. 実施例9における軟磁性材料について、電気抵抗率および困難軸方向の保磁力とFeCo系軟磁性膜中のAl23含有量との関係を示す図。The soft magnetic material according to Example 9, shows the relationship between the content of Al 2 O 3 of the electric resistivity and the hard axis coercivity and FeCo-based soft magnetic film.

符号の説明Explanation of symbols

1…基板、2…金属下地膜、3…Mn系合金下地膜、4…FeCo系軟磁性膜。   DESCRIPTION OF SYMBOLS 1 ... Board | substrate, 2 ... Metal base film, 3 ... Mn type alloy base film, 4 ... FeCo type soft magnetic film.

Claims (3)

下記一般式
Mna1-a/M’
(ここで、0.4≦a≦0.95であり、MはFe、Ir、Pt、Cr、Rh、Ru、Pd、Ni、Co、Au、CuおよびAgからなる群より選択される少なくとも1種であり、M’はAg、Al、Au、Co、Cr、Cu、Fe、Ir、Mo、Nb、Ni、Pd、Pt、Rh、Ru、Ta、Ti、V、W、Zrからなる群より選択される少なくとも1種である)
で表されるMn系合金下地膜と金属下地膜からなる複合下地膜と、下記一般式
(FexCo1-xy(A)1-y
(ここで、0.6≦x≦0.8であり、0<1−y≦0.05であり、AはMg、Al、Si、Ti、V、CrおよびMnの酸化物および窒化物からなる群より選択される少なくとも1種である)
で表される膜とを含むことを特徴とする交換結合により磁気異方性が制御された軟磁性材料。
The following general formula Mn a M 1-a / M '
(Where 0.4 ≦ a ≦ 0.95, and M is at least one selected from the group consisting of Fe, Ir, Pt, Cr, Rh, Ru, Pd, Ni, Co, Au, Cu, and Ag. M ′ is a seed from the group consisting of Ag, Al, Au, Co, Cr, Cu, Fe, Ir, Mo, Nb, Ni, Pd, Pt, Rh, Ru, Ta, Ti, V, W, and Zr. At least one selected)
A composite base film made of Mn-based alloy underlayer and the metal underlying film represented in the following general formula (Fe x Co 1-x) y (A) 1-y
(Where 0.6 ≦ x ≦ 0.8, 0 <1-y ≦ 0.05, and A is an oxide and nitride of Mg, Al, Si, Ti, V, Cr and Mn. At least one selected from the group consisting of:
And a soft magnetic material whose magnetic anisotropy is controlled by exchange coupling.
下記一般式
Mna1-a/M’
(ここで、0.4≦a≦0.95であり、MはFe、Ir、Pt、Cr、Rh、Ru、Pd、Ni、Co、Au、CuおよびAgからなる群より選択される少なくとも1種であり、M’はAg、Al、Au、Co、Cr、Cu、Fe、Ir、Mo、Nb、Ni、Pd、Pt、Rh、Ru、Ta、Ti、V、W、Zrからなる群より選択される少なくとも1種である)
で表されるMn系合金下地膜と金属下地膜からなる複合下地膜と、下記一般式
(FexCo1-xy(A)1-y
(ここで、0.6≦x≦0.8であり、0.05≦1−y≦0.3であり、AはMg、Al、Si、Ti、V、CrおよびMnの酸化物および窒化物からなる群より選択される少なくとも1種である)
で表される膜とを含むことを特徴とする交換結合により磁気異方性が制御された軟磁性材料。
The following general formula Mn a M 1-a / M '
(Where 0.4 ≦ a ≦ 0.95, and M is at least one selected from the group consisting of Fe, Ir, Pt, Cr, Rh, Ru, Pd, Ni, Co, Au, Cu, and Ag. M ′ is a seed from the group consisting of Ag, Al, Au, Co, Cr, Cu, Fe, Ir, Mo, Nb, Ni, Pd, Pt, Rh, Ru, Ta, Ti, V, W, and Zr. At least one selected)
A composite base film made of Mn-based alloy underlayer and the metal underlying film represented in the following general formula (Fe x Co 1-x) y (A) 1-y
(Where 0.6 ≦ x ≦ 0.8, 0.05 ≦ 1-y ≦ 0.3, A is an oxide and nitridation of Mg, Al, Si, Ti, V, Cr and Mn At least one selected from the group consisting of products)
And a soft magnetic material whose magnetic anisotropy is controlled by exchange coupling.
前記Mn系合金下地膜の膜厚が5nm以上、前記金属下地膜の膜厚が3nm以上、前記(FexCo1-xy(A)1-y膜の膜厚が20〜1000nmであることを特徴とする請求項1または2に記載の交換結合により磁気異方性が制御された軟磁性材料。 Thickness of the Mn-based alloy underlayer is 5nm or more, the thickness of the metal base layer is 3nm or more, the (Fe x Co 1-x) y (A) the thickness of the 1-y layer is a 20~1000nm The soft magnetic material having magnetic anisotropy controlled by exchange coupling according to claim 1 or 2.
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