JP2006019510A5 - - Google Patents

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JP2006019510A5
JP2006019510A5 JP2004195839A JP2004195839A JP2006019510A5 JP 2006019510 A5 JP2006019510 A5 JP 2006019510A5 JP 2004195839 A JP2004195839 A JP 2004195839A JP 2004195839 A JP2004195839 A JP 2004195839A JP 2006019510 A5 JP2006019510 A5 JP 2006019510A5
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photosensitive substrate
exposure apparatus
mirror
extreme ultraviolet
light
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JP2004195839A
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Japanese (ja)
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JP2006019510A (en
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Priority to JP2004195839A priority Critical patent/JP2006019510A/en
Priority claimed from JP2004195839A external-priority patent/JP2006019510A/en
Publication of JP2006019510A publication Critical patent/JP2006019510A/en
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Claims (17)

極端紫外光を発生する光源と、該光源から射出された極端紫外光を反射集光する集光鏡とを有する光源部を備え、該光源部から射出される極端紫外光を照明光としてマスクを照明し、前記マスクのパターンを感光性基板上に露光する露光装置において、
前記集光鏡の構造に起因して生成される不均一な反射光束の光強度分布を除去する除去手段
を備えることを特徴とする露光装置。 A light source unit having a light source that generates extreme ultraviolet light and a condensing mirror that reflects and collects the extreme ultraviolet light emitted from the light source; and a mask using the extreme ultraviolet light emitted from the light source unit as illumination light In an exposure apparatus that illuminates and exposes a pattern of the mask on a photosensitive substrate,
An exposure apparatus comprising: removal means for removing a light intensity distribution of a non-uniform reflected light beam generated due to the structure of the condenser mirror. 前記除去手段は、前記集光鏡の非反射部分による影に起因して生じる反射光束の不均一な光強度分布を除去することを特徴とする請求項１記載の露光装置。   2. The exposure apparatus according to claim 1, wherein the removing unit removes a non-uniform light intensity distribution of the reflected light beam caused by a shadow caused by a non-reflecting portion of the condenser mirror. 前記除去手段は、前記極端紫外光を前記感光性基板上に照射中に、前記集光鏡を該集光鏡から射出される光束の中心である基準軸方向に移動させることを特徴とする請求項１または請求項２に記載の露光装置。   The removing means moves the condensing mirror in a reference axis direction that is a center of a light beam emitted from the condensing mirror during irradiation of the extreme ultraviolet light on the photosensitive substrate. The exposure apparatus according to claim 1 or 2. 前記除去手段は、前記極端紫外光を前記感光性基板上に照射中に、前記集光鏡を該集光鏡から射出される光束の中心である基準軸に垂直な方向に移動させることを特徴とする請求項１乃至請求項３の何れか一項に記載の露光装置。   The removing means moves the condenser mirror in a direction perpendicular to a reference axis that is a center of a light beam emitted from the condenser mirror during irradiation of the extreme ultraviolet light onto the photosensitive substrate. The exposure apparatus according to any one of claims 1 to 3. 前記除去手段は、前記極端紫外光を前記感光性基板上に照射中に、前記集光鏡を該集光鏡から射出される光束の中心である基準軸に対して傾斜させることを特徴とする請求項１乃至請求項４の何れか一項に記載の露光装置。   The removing means tilts the condenser mirror with respect to a reference axis that is a center of a light beam emitted from the condenser mirror during irradiation of the extreme ultraviolet light onto the photosensitive substrate. The exposure apparatus according to any one of claims 1 to 4. 前記除去手段は、前記極端紫外光を前記感光性基板上に照射中に、前記集光鏡を該集光鏡から射出される光束の中心である基準軸周りに回転させることを特徴とする請求項１乃至請求項５の何れか一項に記載の露光装置。   The removing means rotates the condensing mirror around a reference axis that is a center of a light beam emitted from the condensing mirror during irradiation of the extreme ultraviolet light on the photosensitive substrate. The exposure apparatus according to any one of claims 1 to 5. 前記除去手段は、前記極端紫外光を前記感光性基板上に照射中に、前記光源を前記集光鏡から射出される光束の中心である基準軸方向に移動させることを特徴とする請求項１乃至請求項６の何れか一項に記載の露光装置。   2. The removal means moves the light source in a reference axis direction that is a center of a light beam emitted from the condenser mirror during irradiation of the extreme ultraviolet light onto the photosensitive substrate. The exposure apparatus according to claim 6. 前記除去手段は、前記極端紫外光を前記感光性基板上に照射中に、前記光源を前記集光鏡から射出される光束の中心である基準軸に垂直な方向に移動させることを特徴とする請求項１乃至請求項７の何れか一項に記載の露光装置。   The removing means moves the light source in a direction perpendicular to a reference axis that is a center of a light beam emitted from the condenser mirror during irradiation of the extreme ultraviolet light onto the photosensitive substrate. The exposure apparatus according to any one of claims 1 to 7. 前記集光鏡は、複数の反射部材を有し、
前記極端紫外光を前記感光性基板上に照射中に、前記複数の反射部材の少なくとも１つの姿勢を変更する反射部材駆動手段を備えることを特徴とする請求項１乃至請求項８の何れか一項に記載の露光装置。 The condensing mirror has a plurality of reflecting members,
9. A reflection member driving unit that changes at least one posture of the plurality of reflection members during irradiation of the extreme ultraviolet light on the photosensitive substrate is provided. The exposure apparatus according to item. 前記除去手段は、前記極端紫外光を前記感光性基板上に照射中に、
前記集光鏡の姿勢を変更する集光鏡姿勢変更手段と、
前記光源の位置を変更する光源位置変更手段と
を備えることを特徴とする請求項１または請求項２に記載の露光装置。 The removing means is irradiating the photosensitive substrate with the extreme ultraviolet light,
A condenser mirror attitude changing means for changing the attitude of the condenser mirror;
The exposure apparatus according to claim 1, further comprising a light source position changing unit that changes a position of the light source. 前記集光鏡姿勢変更手段は、前記極端紫外光を前記感光性基板上に照射中に、
前記集光鏡を該集光鏡から射出される光束の中心である基準軸方向、前記集光鏡を前記基準軸に垂直な方向、前記集光鏡を前記基準軸に対して傾斜させる方向、及び前記集光鏡を前記基準軸周りに回転させる方向の中の少なくとも１つの方向に移動させ、
前記光源位置変更手段は、前記極端紫外光を前記感光性基板上に照射中に、
前記光源を前記基準軸方向及び前記基準軸に垂直な方向の少なくとも一方に移動させることを特徴とする請求項１０に記載の露光装置。 The collector mirror changing means is irradiating the extreme ultraviolet light on the photosensitive substrate,
A direction of a reference axis that is a center of a light beam emitted from the light collecting mirror, a direction perpendicular to the reference axis, a direction in which the light collecting mirror is inclined with respect to the reference axis, And moving the condenser mirror in at least one of the directions of rotating around the reference axis,
The light source position changing means is configured to irradiate the extreme ultraviolet light on the photosensitive substrate,
The exposure apparatus according to claim 10, wherein the light source is moved in at least one of the reference axis direction and a direction perpendicular to the reference axis. 前記集光鏡は、複数の反射部材を有し、
前記極端紫外光を前記感光性基板上に照射中に、前記複数の反射部材の少なくとも１つの姿勢を変更する反射部材駆動手段を備えることを特徴とする請求項１０または請求項１１に記載の露光装置。 The condensing mirror has a plurality of reflecting members,
12. The exposure according to claim 10, further comprising a reflection member driving unit that changes at least one posture of the plurality of reflection members during irradiation of the extreme ultraviolet light on the photosensitive substrate. apparatus. 前記集光鏡を露光中に移動させることを特徴とする請求項１乃至１２の何れか一項に記載の露光装置。  The exposure apparatus according to claim 1, wherein the condenser mirror is moved during exposure. 前記集光鏡を露光中に振動させることを特徴とする請求項１乃至１３の何れか一項に記載の露光装置。  The exposure apparatus according to claim 1, wherein the condenser mirror is vibrated during exposure. 前記集光鏡の振動周波数ｆは感光性基板上のスキャン方向の露光幅をｗ、感光性基板のスキャンスピードをｖとしたとき、ｖ／２ｗよりも大きいことを特徴とする請求項１４に記載の露光装置。  15. The vibration frequency f of the condensing mirror is greater than v / 2w, where w is the exposure width in the scanning direction on the photosensitive substrate and v is the scanning speed of the photosensitive substrate. Exposure equipment. 前記集光鏡を露光中に回転させることを特徴とする請求項１乃至１４の何れか一項に記載の露光装置。  The exposure apparatus according to claim 1, wherein the condenser mirror is rotated during exposure. 請求項１乃至請求項１６の何れか一項に記載の露光装置を用いたマイクロデバイスの製造方法であって、
前記マスクのパターンを前記感光性基板上に露光する露光工程と、
前記露光工程により露光された前記感光性基板を現像する現像工程と
を含むことを特徴とするマイクロデバイスの製造方法。 A method of manufacturing a microdevice using the exposure apparatus according to any one of claims 1 to 16 ,
An exposure step of exposing the pattern of the mask onto the photosensitive substrate;
And a development step of developing the photosensitive substrate exposed in the exposure step.
JP2004195839A 2004-07-01 2004-07-01 Aligner and fabrication process of microdevice Withdrawn JP2006019510A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004195839A JP2006019510A (en) 2004-07-01 2004-07-01 Aligner and fabrication process of microdevice

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Application Number Priority Date Filing Date Title
JP2004195839A JP2006019510A (en) 2004-07-01 2004-07-01 Aligner and fabrication process of microdevice

Publications (2)

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JP2006019510A JP2006019510A (en) 2006-01-19
JP2006019510A5 true JP2006019510A5 (en) 2007-06-14

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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007051537A2 (en) * 2005-11-02 2007-05-10 University College Dublin, National University Of Ireland, Dublin High power euv lamp system
JP5076349B2 (en) * 2006-04-18 2012-11-21 ウシオ電機株式会社 Extreme ultraviolet light collector mirror and extreme ultraviolet light source device
DE102008042462B4 (en) * 2008-09-30 2010-11-04 Carl Zeiss Smt Ag Illumination system for EUV microlithography
US8587768B2 (en) * 2010-04-05 2013-11-19 Media Lario S.R.L. EUV collector system with enhanced EUV radiation collection
JP6356971B2 (en) * 2013-01-30 2018-07-11 株式会社ブイ・テクノロジー Proximity exposure apparatus, proximity exposure method, and illumination optical system
KR101630916B1 (en) * 2014-04-17 2016-06-15 추상완 Stereo Mobile 3D camera

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