JP2006015223A - Nozzle for cleaning substrate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a nozzle for cleaning substrates capable of uniformly and efficiently cleaning a substrate. <P>SOLUTION: This nozzle for cleaning substrates, which comprises an approximately rectangularly formed tip opening part 2, is used to clean the surface of the substrate by injecting a cleaning liquid as droplets in a fan shape expanding in a width direction and letting the droplets collide with the surface of the substrate having a dimension of 400 mm at least in the width direction, and the shape provided for the tip opening part 2 of the nozzle allows trapezoidal kinetic energy distribution to be obtained in which the kinetic energy distribution of the droplets colliding with the surface of the substrate becomes uniform except the portions at both ends in width direction. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a nozzle for cleaning a substrate having a jet port for high-pressure liquid ejected from the cleaning device when the substrate is cleaned by the cleaning device.

  The shape of the opening of the tip of the conventional nozzle is a cat-like shape, and the cleaning liquid is ejected from the fan shape.

  According to the conventional nozzle, it is difficult to efficiently and uniformly clean the substrate to be cleaned. This is because, when a substrate is cleaned with a cleaning liquid (hereinafter referred to as “droplet” as appropriate) ejected in a fan shape from the opening at the tip of the nozzle, the surface of the substrate (hereinafter referred to as “impact surface” as appropriate) on which the droplet collides. This is because both end portions are not sufficiently cleaned as compared with the central portion of the collision surface. Here, the portion excluding both end portions from the collision surface, that is, the vicinity of the nozzle tip opening on the substrate surface is defined as the “center portion”.

  Therefore, in order to clean the substrate surface uniformly using the conventional nozzle, it is necessary to clean the substrate surface a plurality of times while changing the position of the nozzle or the position of the substrate. This means a reduction in work efficiency and has become an issue to be solved immediately.

  The present invention has been made in view of the above problems. That is, an object of the present invention is to provide a substrate cleaning nozzle that can efficiently clean a substrate without unevenness.

  The nozzle for cleaning a substrate of the present invention has a substantially rectangular opening at the tip, and the cleaning liquid is ejected in the form of a fan that spreads in the width direction as droplets, and the substrate surface is cleaned by colliding with the substrate surface at least in the width direction of 400 mm. A cleaning nozzle that has a shape of a tip opening that obtains a trapezoidal kinetic energy distribution in which the kinetic energy distribution of the liquid droplets colliding with the substrate surface is uniform except for both end portions in the width direction. And

  According to the conventional nozzle, the cleaning liquid is a fan-shaped water film at the time when it is ejected from the tip opening of the nozzle. The water film becomes thinner as it gets closer to both ends. For this reason, the flow rate of the cleaning liquid that collides with both end portions is smaller than the flow rate of the cleaning liquid that collides with the central portion. Also, the thinner the water film, the more easily the water film becomes droplets by collision with air, so the water film tends to become droplets. In addition, the stall of the water film which became the droplet is large. For this reason, the particle velocity of the droplet that collides with both end portions is smaller than the particle velocity of the droplet that collides with the central portion. That is, the kinetic energy of the droplet that collides with both end portions is smaller than the kinetic energy of the droplet that collides with the central portion. Therefore, both end portions are not sufficiently cleaned as compared with the central portion.

  In order to efficiently clean the substrate uniformly, it is necessary to make the kinetic energy of the liquid droplets colliding with both end portions of the surface of the substrate equal to the kinetic energy of the liquid droplet colliding with the central portion.

  The shape of the tip opening of the substrate cleaning nozzle of the present invention is substantially rectangular. Therefore, the flow rate of the cleaning liquid that collides with both end portions can be increased from the flow rate of the cleaning liquid that collides with the central portion. Thereby, the kinetic energy of the droplet colliding with both end portions can be made the same level as the kinetic energy of the droplet colliding with the central portion.

  By using the substrate cleaning nozzle of the present invention, the substrate can be efficiently cleaned without unevenness.

  Hereinafter, embodiments of the substrate cleaning nozzle of the present invention will be described.

(Nozzle tip opening)
First, the tip opening of the substrate cleaning nozzle of the present invention will be described.

  The tip opening of the substrate cleaning nozzle of the present invention has a substantially rectangular shape. Since the tip opening has a substantially rectangular shape, the liquid droplets ejected from the tip opening are ejected in a fan shape spreading in the long side direction of the substantially rectangular shape of the tip opening.

  The shape of the tip opening is preferably a shape that opens across the bottom surface of the center of the groove extending in one direction and both wall surfaces thereof. Because the shape of the tip opening is a shape that extends across the bottom surface of the groove extending in one direction and both wall surfaces thereof, the cleaning liquid ejected from the center part of the tip opening is regulated by both wall surfaces of the groove, and the cleaning liquid This is because it has the effect of pushing the both ends of the tip opening.

  By the way, the short sides of the substantially rectangular shape, which is the shape of the tip opening, facing each other may swell outward. Since the tip opening has a substantially rectangular shape, when the substrate is cleaned, it is possible to increase the flow rate of droplets that collide with both end portions of the substrate, compared to the flow rate of droplets that collide with the central portion of the substrate. Thereby, the kinetic energy of the droplet colliding with both end portions can be made the same level as the kinetic energy of the droplet colliding with the central portion. That is, it is possible to enhance the cleaning effect of both end portions that are difficult to be cleaned as compared with the central portion, and it is possible to finish the substrate without unevenness.

(Droplet)
Next, the liquid droplets ejected from the tip opening of the substrate cleaning nozzle of the present invention and colliding with the substrate will be described.

  The cleaning ability of the droplet is caused by the particle size, particle velocity, and flow rate of the droplet that collides with the substrate. Therefore, a preferable particle diameter of the droplet is 1 to 100 μm. The preferred particle speed is 10 to 100 m / s. This is because if the particle diameter of the droplet is smaller than 1 μm or the particle velocity of the droplet is smaller than 10 m / s, the kinetic energy of the droplet is too small to clean the substrate sufficiently. On the other hand, if the particle diameter of the droplet is larger than 100 μm or the particle velocity of the droplet is larger than 100 m / s, the kinetic energy of the droplet becomes excessive, and the substrate may be damaged.

  A more preferable droplet diameter is 10 to 50 μm. Further, the particle speed of the droplet is more preferably 10 to 70 m / s. This is because droplets having a particle diameter of 10 to 50 μm and a particle velocity of 10 to 70 m / s greatly contribute to the substrate cleaning effect. This is clarified from the performance measurement described later.

(substrate)
Further, the substrate to be cleaned by the droplets ejected from the tip opening of the substrate cleaning nozzle of the present invention will be described. In particular, the material and the material of the substrate are not limited. However, the width of the substrate to be cleaned is 400 mm or more. This is because the droplets ejected from the substrate cleaning nozzle of the present invention are fan-shaped and greatly spread in the width direction, so that a cleaning effect is exerted on a wide substrate, particularly a substrate having a width of 400 mm or more.

  A plurality of nozzles can be used together. In this case, it is preferable to install the nozzles obliquely so that the cleaning liquid ejected from each nozzle does not overlap.

  In the following performance measurement, the nozzle 1 of the embodiment embodying the nozzle for cleaning a substrate of the present invention is compared with the nozzle 6 of a comparative example which is a conventional nozzle.

(Preparation for performance measurement)
First, as shown in FIG. 1, the nozzle 1 of the Example was prepared. At the tip of the nozzle 1 of this embodiment, a groove 3 having a U-shaped cross section composed of a bottom surface 4 at the center and both wall surfaces 5 is deeply recessed. Both wall surfaces 5 are parallel to each other. The substantially rectangular tip opening 2 extends across the bottom surface 4 and both wall surfaces 5 of the central portion of the groove 3 having a U-shaped cross section. The substantially rectangular short sides of the front end opening 2 swell outward.

  For the nozzle 1 of this example, a nozzle 6 of a comparative example was prepared as shown in FIG. A groove 10 having a V-shaped cross section is recessed at the tip of the nozzle 6 of this comparative example. The cat-like tip opening 9 extends over both wall surfaces 11 of the groove 10 having a V-shaped cross section.

(Performance measurement 1)
In the following performance measurement 1, the flow rate of the droplet 8 ejected from the nozzle 1 of the example and the flow rate of the droplet 12 ejected from the nozzle 6 of the comparative example were measured.

  First, the nozzle 1 of the example prepared in the performance measurement preparation was installed at a predetermined height. A cell for receiving the droplet 8 was disposed at a position 100 mm below the tip opening 2 of the nozzle 1 of the example (hereinafter referred to as “pattern center 7”). A total of 21 similar cells were arranged from the pattern central portion 7 to the left and right sides in the left-right width direction at intervals of 10 mm up to 100 mm on each side. The droplet 8 was ejected downward from the nozzle 1 of the example at an ejection pressure of 10 MPa. The flow rate was measured by measuring the volume of droplets accumulated in each cell after a certain time. The flow rate of the droplet 8 ejected from the nozzle 1 of the embodiment is shown as the nozzle of the embodiment in FIG.

  Next, the nozzle 6 of the comparative example was installed instead of the nozzle 1 of the example. And the flow volume of the droplet 12 ejected from the nozzle 6 of a comparative example was measured in the procedure similar to the nozzle 1 of an Example. Measurement conditions such as the ejection pressure, the position of the cells, and the number of cells are the same as the flow rate measurement by the nozzle 1 of the above embodiment. The flow rate of the droplet 12 ejected from the nozzle 6 of the comparative example is shown as the nozzle of the comparative example in FIG.

(Performance measurement 2)
In the following performance measurement 2, the average particle velocity and average particle diameter of the droplets 8 ejected from the nozzle 1 of the example, and the average particle velocity and average particle diameter of the droplets 12 ejected from the nozzle 6 of the comparative example are determined. It was measured.

  First, the nozzle 1 of the example prepared in the performance measurement preparation was installed at a predetermined height. The droplet 8 was ejected downward from the nozzle 1 of the example at an ejection pressure of 10 MPa. The average particle velocity of the droplet 8 and the average particle size of the droplet 8 at each measurement point were measured by an SDPA (Shadow Doppler Particle Analyzer) (manufacturer: Nippon Kanomax Co., Ltd.). The measurement points were 17 points from the pattern center 7 to the left and right 80 mm at 10 mm intervals in the left and right width direction.

  The average particle velocity of the droplet 8 ejected from the nozzle 1 of the embodiment is shown as the nozzle of the embodiment in FIG. Moreover, the average particle diameter of the droplet 8 ejected from the nozzle 1 of an Example is shown as a nozzle of an Example in FIG.

  Next, the nozzle 6 of the comparative example was installed instead of the nozzle 1 of the example. And the average particle velocity of the droplet 12 ejected from the nozzle 6 of the comparative example and the average particle size of the droplet 12 were measured. The measurement conditions such as the measurement device, the ejection pressure, and the measurement position are the same as those of the measurement of the particle velocity of the droplet and the particle size of the droplet by the nozzle 1 of the above embodiment.

  The average particle velocity of the droplets 12 ejected from the nozzle 6 of the comparative example is shown as the nozzle of the comparative example in FIG. Moreover, the average particle diameter of the droplet 12 ejected from the nozzle 6 of a comparative example is shown as a nozzle of a comparative example in FIG.

(Discussion)
Hereinafter, the results obtained from the performance measurements 1 and 2 will be considered.

  Using Equation 1, the kinetic energy of the droplet 8 ejected from the nozzle 1 of the example was calculated from the measured values of the performance measurements 1 and 2. Similarly, the kinetic energy of the droplet 12 ejected from the nozzle 6 of the comparative example was calculated. These results are shown in FIG.

ただし、Ｅ（Ｊ／（ｃｍ・ｓ））：各測定点の幅方向１ｃｍ当たりの液滴の運動エネルギー
Ｑ（ｍ³／（ｃｍ・ｓ））：各測定点の幅方向１ｃｍ当たりの液滴の流量
Ｄ（ｍ）：各液滴の粒子径
ｖ（ｍ／ｓ）：各液滴の粒子速度

However, E (J / (cm · s)): Kinetic energy Q (m ³ / (cm · s)) of a droplet per 1 cm in the width direction of each measurement point: Droplet per 1 cm in the width direction of each measurement point Flow rate D (m): particle diameter of each droplet v (m / s): particle velocity of each droplet

  As shown in FIG. 6, the kinetic energy distribution of the droplets 12 ejected from the nozzle 6 of the comparative example has a mountain shape. This is because the tip opening 9 of the nozzle has a cat-like shape, so that the flow rate of the droplets 12 at both ends away from the pattern center portion 7 is significantly smaller than the flow rate of the droplets 12 that collide with the pattern center portion 7. This is because the. Furthermore, the particle velocity of the droplets 12 that collide with both end portions was lower than the particle velocity of the droplets 12 that collide with the pattern central portion 7.

  On the other hand, the kinetic energy distribution of the droplet 8 ejected from the nozzle 1 of the example was trapezoidal. This is because the flow rate of the droplet 8 that collides with both end portions 70 mm apart from each other in the width direction from the pattern center portion 7 is increased (see FIG. 3), and thus the kinetic energy of the droplet 8 that collides with both end portions is reduced. It is because it was able to suppress. The increase in the flow rate of the droplet 8 that collides with both end portions is caused by the shape of the tip opening of the nozzle 1 of the embodiment.

  FIG. 7 shows the distribution of the particle velocity of the droplet with respect to the particle diameter of the droplet in the pattern central portion 7. Further, FIG. 8 shows the distribution of the particle velocity of the droplet with respect to the particle size of the droplet at a position 40 mm away from the pattern center portion 7 in the left-right width direction.

  7 and 8, it can be seen that the droplet 8 having a particle diameter of 10 to 50 μm and a particle velocity of 10 to 70 m / s greatly contributed to the cleaning effect of the substrate.

It is a perspective view which shows the shape of the nozzle of an Example. It is a perspective view which shows the shape of the nozzle of a comparative example. It is a figure which shows the flow volume of the droplet ejected from the nozzle of an Example and the nozzle of a comparative example. It is a figure which shows the average particle velocity of the droplet ejected from the nozzle of an Example and the nozzle of a comparative example. It is a figure which shows the average particle diameter of the droplet ejected from the nozzle of an Example and the nozzle of a comparative example. It is a figure which shows the kinetic energy of the droplet ejected from the nozzle of an Example and the nozzle of a comparative example. It is a figure which shows distribution of the particle velocity of the droplet with respect to the particle diameter of the droplet ejected from the nozzle of an Example and the nozzle of a comparative example in the pattern center part. It is a figure which shows distribution of the particle velocity of the droplet with respect to the particle diameter of the droplet ejected from the nozzle of an Example and the nozzle of a comparative example in the position 40 mm away from the pattern center part in the left-right width direction.

Explanation of symbols

1: Nozzle of Example 2: Opening of tip 3: Groove 4: Bottom surface 5: Wall surface 6: Nozzle of comparative example 7: Pattern center 8: Droplet 9: Opening of tip 10: Groove 11: Wall surface 12: Droplet

Claims (6)

A cleaning nozzle that cleans the surface of the substrate by causing the tip opening to have a substantially rectangular shape, ejecting the cleaning liquid into a fan-shaped fan that spreads in the width direction and colliding with the substrate surface having a width direction of at least 400 mm,
A nozzle for cleaning a substrate, characterized by having a shape of a tip opening that obtains a trapezoidal kinetic energy distribution in which the kinetic energy distribution of the droplets impinging on the substrate surface is uniform except for both end portions in the width direction.   The shape of the tip opening that obtains a flow rate distribution in which the flow rate distribution of the liquid droplets colliding with the substrate surface is uniform in the central portion in the width direction and has a larger flow rate than the central portion at the boundary portion between the central portion and the both end portions The substrate cleaning nozzle according to claim 1.   3. The substrate cleaning nozzle according to claim 1, wherein the droplet has a particle diameter of 1 to 100 μm and a particle velocity of the droplet of 10 to 100 m / s.   The substrate cleaning nozzle according to claim 1, wherein the droplet has a particle diameter of 10 to 50 μm and a particle velocity of the droplet of 10 to 70 m / s.   The substrate cleaning nozzle according to claim 1, wherein the tip opening is opened across the bottom surface and wall surface of a central portion of a groove extending in one direction.   The substrate cleaning nozzle according to claim 4, wherein the tip opening has a shape in which short sides of the substantially rectangular shape facing each other swell outward.

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