JP2005521491A - Mobile automatic plasma neutralization device and neutralization method for highly toxic biochemical waste - Google Patents

Abstract

The invention is comprised of an apparatus in form of a single transportable unit, a chamber for the main treatment, with the necessary dimensions to fit the canister drum containing the waste which is to be eliminated, and with the capacity to create and manipulate the direction of the RF plasma flows at a temperature higher than 10.000 DEG K so that it totally surrounds the container, in order to carry out its complete dissociation. The chamber has the capacity to individually collect and select the various materials by species resulting from the dissociation, transporting them by means of the plasma flow generated by an argon gas or other gasses which are injected into the chamber at the far end, where the gas conditioning / separator is situated. This chamber which carries out the main treatment process has embedded antennas which emit the radio frequency which produces and maintains the plasma core and is associated to: a) A robotic unit to load the waste drums / canisters into the main chamber. ; b) A RF generator unit; c) A main chamber cooling unit and peripherals; d) A control and monitoring unit for the entire process and e) A power generator with the peripherals to regulate its functions f) Database for product compatibility / inventory <??>The invention extends as well to the method for the elimination of waste. <IMAGE>

Description

  The present invention relates to a method and apparatus for treating various types of highly toxic waste, and more particularly to a method and apparatus for treating waste stored in 55/65 gallon metal drums and the like.

  Currently, there are a variety of toxic waste treatment methods and equipment. For example, there are incinerators that process by incineration, which converts waste into harmless compounds and gases at high temperatures. However, it is also a cause of pollution in many cases. Therefore, incineration is regulated by various laws and regulations. Another treatment apparatus or method treats hazardous waste with plasma arc (resistance plasma) or RF (radio frequency) induction plasma. However, there is a maintenance problem related to electrode collapse and the like, and plasma control (shape, temperature, uniformity, etc.) is required. Plasma arc technology is a melting process and requires rugged and permanent equipment. Inductive plasma technology cannot be processed in large quantities at once. These technologies require large equipment. In any case, there was no technology for neutralizing 55/65 gallon drums at once in a safe and closed manner.

  The generation of plasma RF coupling has been studied. RF plasma coupling is a well-known phenomenon, 1947 to explore its application in fusion technology, propulsion technology, metallurgy technology, coating technology, cutting technology, ceramic technology field, and recently in the field of waste treatment at high temperature. Has been studied since. RF was used for induction plasma induction and containment technology (electric multi-layer phenomenon: EDL).

  The present inventor has studied RF plasma coupling at a high temperature by utilizing a pseudo model of several nonlinear physical phenomena. The plasma model requires the concept of bifluid with Maxwell's related solutions.

  Following the study, the inventor conducted a preliminary proof-of-concept experiment of the concept, A) availability, B) equipment scale (plasma source gas volume and plasma flow, plasma core, plasma shape and plasma flow control, coolant, necessary Power, etc.), C) accessory equipment, and D) materials needed to build the equipment were determined.

  It is an object of the present invention to provide a one-time treatment of highly toxic waste contained in a 55/65 gallon drum (approximately 200 to 250 liters) by means of a high temperature RF plasma couple in a single treatment chamber. A mobile processing device can also be used. These size drums are commonly used by the military and civilians. At present, these steel drums are often made brittle by long-term storage. Transporting these drums containing hazardous substances is dangerous. Examples of toxic substances include polychlorinated dibenzodioxins / furans (PCDD-PCPF), polybifinil chloride (PCB), and military uses such as nerve gases and biochemical warfare compounds. As a result, special permission is required to transport these drums. The process of obtaining such permission is very cumbersome and time consuming. It is often necessary for years. At present, there is no fast, safe disposal method, facility or storage location for drums containing these hazardous substances. Storage requires a large facility, and storage reliability is also a problem. Thus, an object of the present invention is to solve the problem of processing large quantities of toxic substances stored in many places around the world. Consideration should also be given to the nature of toxic substances, storage period, storage location, and storage conditions, which are other factors that pose problems. Archive records are not always reliable. Therefore, it is mobile and automatic, can handle hazardous substances, can identify the contents and amount of substances before processing, and can safely use only a device that can safely and quickly destroy drums.

  In order to achieve the object, the present inventor has reached the present invention through long-term research and development. The present invention provides a method in which RF plasma coupling is utilized at high temperature and controlled by magnetohydrodynamic method (MHD) to completely detoxify harmful substances packed in a drum and can be processed and recovered at a single time in a closed manner.

  At the same time, the present inventor has developed an apparatus for realizing the above method. Unlike the conventional apparatus, the waste neutralization (treatment) apparatus does not require drum slices. The device of the present invention separates chemical substances at the molecular level and prevents recombination.

  Another object of the present invention is to provide an apparatus that can be moved before processing the drums, and to safely transport the drums from the storage site to the processing site. This device can handle toxic substances at the molecular level and safely transport drums on airplanes, trains, trucks, etc. The processing of hazardous substances according to the present invention reduces processing costs, eliminates transportation problems and protects the environment.

  In developing the present invention, the present inventor studied the following.

  1. The maintenance time of the molecular form of harmful substances destroyed in the plasma core. It is important that the harmful components are completely dissociated (1 ppb or less) and not recombined during the neutralization process.

  2. The flow of harmful substances. It is necessary to accurately feed harmful substances into the plasma vortex after opening the drum. Therefore, it is necessary to have a capability of sending harmful substances into the plasma core in a controlled state during the dissociation process.

  3. Effect of processing time. This processing time is the time during which the target substance is exposed to plasma. It is necessary to elongate the heat treatment time of the plasma sufficiently to evaporate the drum and the contents. Furthermore, the plasma core must be above 10,000 ° K. Therefore, the place where the drum can be placed is also important.

  4). Plasma efficiency and control. In order to maintain the plasma at a high temperature (10,000 ° K or higher), it is necessary to minimize the plasma loss, maximize the thermal efficiency, and maximize the molecular decomposition efficiency.

  5. material. In order to cool the inner wall of the incineration chamber, an RF antenna, a cooling device, and the like are embedded in the inner wall. Therefore, the inner wall material must be RF transparent. This inner wall material must be a material that is resistant to the harsh environment generated by molecular dissociation at high temperatures. The preferred material is beryllium oxide (BeO), but other materials are possible.

  The device is mobile and can process 240 to 350 liter (55/65 gallon) drums and other metal containers in a single neutralization chamber using RF plasma coupling technology in one step. The apparatus also includes means for recovering, recycling or neutralizing the recombined material in a closed environment within the processing chamber in a neutralization process performed in accordance with safety standards. In executing this neutralization process, the present apparatus uses the following various apparatuses (units).

Unit 1: main unit with neutralization chamber;
Unit 2: a cooling unit having a function of maintaining the temperature of the RF antenna and other elements at 600 ° C. or lower, preferably about 500 ° C. or lower;
Unit 3: RF generator designed to generate sufficient power at an appropriate frequency and maintain the plasma core vortex;
Unit 4: Robot unit with a function to recognize and select drums to be neutralized, as well as handling, moving and sampling functions;
Unit 5: Power generator designed to provide sufficient power for the entire system;
Unit 6: intake and intake regulator;
Unit 7: Smoke regulator from power generator;
Unit 8: Fuel tank for fuel generator and fuel supply unit;
Unit 9: Main control / monitor unit;
Unit 10: monitor / supply unit;
Unit 11: Plasma dopant supply unit;
Unit 12: Plasma source gas supply unit;
Unit 13: Coolant tank for storage, maintenance and transfer of coolant to various cooling units;
Unit 14: Backup power generator;
Unit 15: An analysis unit / sampling chamber that performs sample analysis of drums containing material to be discarded in a safe and airtight chamber prior to processing.

  The present invention will be described in more detail below with reference to the accompanying drawings.

  The object of the present invention is the complete processing of drums and contents. For example, the waste drum can is processed by the procedure (step) described below.

  Evaluating drum samples prior to processing to determine if safe neutralization is possible.

  The drum can is prepared for processing by a metal annular bracket at the end of the drum. This metal annular bracket has the following functions: A) Increases the metal portion of the drum can, allows safe and easy transport to the processing chamber by rail means, prevents contact between the drum can and the inner wall of the processing chamber; B) In order to avoid the risk of explosions in the processing chamber, the cans are opened rapidly synchronously above the drums by triggering means that induce a series of small scale explosions. These series of small-scale explosions open the drum can and accurately put its contents into the plasma core vortex.

  Using an array of disposable support brackets instead of magnetic retention.

  Exposing the drum in the processing chamber to RF coupling and MHD controlled plasma for a short time (1 to 6 seconds) at 8000 ° K to 14000 ° K.

  Using a mixture of lanthanides, Fe or other similar effect-providing substances and / or other plasma source gases such as hydrogen, helium, etc., as a dopant to enhance plasma properties, particularly with respect to temperature.

  Using two types of concentric plasma cores, a first plasma and a second plasma;

  Enclosing the drum in a homogeneous manner, particularly with respect to temperature, with the first plasma core, enclosing the first plasma vortex with the second plasma core, and holding the plasma flow at a homogeneous temperature to flow towards the recovery / separation device.

  MHD equipment is used to control various plasma cores in the processing chamber, A) the first and second plasma vortices are shaped, and B) the processing time is controlled, the material molecules as the maximum temperature and the best exposure time Dissociating.

  A step of detecting a dissociation comfort element with a special sensor in order to confirm the molecular dissociation process in real time (part of the safety device).

  The apparatus of the present invention is substantially composed of the aforementioned units, and treats waste by the aforementioned steps. The present invention will be described below with reference to the drawings.

  FIG. 1 schematically shows a decomposition chamber for the treatment of drums containing the target waste. In addition, a monitoring system and control system are shown, including a ferrohydrodynamic unit (MHD) and peripheral devices. This main unit has different areas for gas (gas) recovery. A gas separation compartment 101, an injector compartment U16 and a rear compartment 102; A neutralization compartment, a cooling unit, a recycling compartment and other peripheral compartments are also included. The neutralization compartment must be large enough. The function of this main unit is mainly neutralization of the waste drum. This unit is composed of various parts. They are a gas conditioning compartment 101, a gas separator, a filter, a gas compartment, an RF unit, a main chamber containing a cooling unit and a regulation system, a magnetic rail, an antenna, a cooling system and a recovery system including a refrigeration system. It further includes an injector compartment and includes plasma source gas injector means capable of maintaining the plasma core as described above. It also includes a rear compartment and a neutralization compartment, including a neutralizer tank and peripheral monitor / control unit, a cooling unit, a recycling compartment including a safety unit and monitor / control means, a dopant liquid tank, and a plasma source tank. Yes. The RF unit is embedded in the inner wall. This is a modular style installed interchangeably. Unit 1 includes a waste input hatch with its own RF device and cooling unit and the like.

  Unit 1 includes unit 10. This is a control and maintenance unit and has the following functions.

・ Control / monitoring of all vacuum paths V1, V2, V3, V4, V5, V6, V7 shown in FIG. 3 and FIG. 6)
・ Control / monitoring of recovery unit and its peripheral system (Figs. 3 and 8)
・ Control / monitoring of neutralization unit and its peripheral system (Figs. 3 and 6)
・ Recycling compartment control / monitor (Figs. 3 and 5)
・ Control / monitoring of hatch units and peripheral systems (Figs. 3 and 12)
-Control / monitoring of plasma source gas flow and plasma temperature and shape from ignition (including necessary equipment)
・ Control / monitor of MHD and peripheral devices (cooling, magnet, power supply) ・ Control / monitor of RF communication antenna and peripheral devices (cooling, power supply)・ Control / monitoring of the work procedure of this equipment including safety / object data processing ・ Control / monitoring of on-line waste neutralization analysis (including peripheral equipment and safety procedures)
-Control / monitoring of tractor system that provides on-site mobility (if necessary)-Control / monitoring of inner wall and recovery device (including leakage) when material molecule dissociation is performed in a high temperature environment
・ Control / monitoring of gas and liquid leakage (including safety procedures)
The following additional elements are also illustrated in FIG. A cooling control unit 103 that interacts with other units, an RF control unit 104 that interacts with other units, and a connection 105 that interacts with units U1 and U10. 106 is a connection part of U5 with U1 and U14, 107 is a connection part to a database, 108 is a connection part to U1 and U13, 109 is a connection part to safety function and reinforcement function, 110 is a database to U15 The connection part of is shown.

  2 and 2B show the external structure of the main unit. The important ones are the unit 201 front hatch block, gas compressor separation compartment 202, coupling unit compartment structure 203, recovery compartment 204, coupling unit compartment structure 205, slide rail 206 at the front hatch opening, hatch 208. A drum can hatch 207 and a hatch slide rail 209. 210 shown is an outer wall or device sleeve, and 211, 212, 213 are two structure coupling elements and a rear slide rail, respectively. Reference numeral 214 denotes a rear hatch in the rear compartment. Reference numerals 215, 216, and 217 denote hydraulic units.

  218 and 219 shown represent the main frame structure elements and the main bracket of the apparatus, respectively.

  In the figure, 220 is a closing hatch mechanism, and 221 is another bracket for supporting the main apparatus structure.

  The closing hatch is operated by the hydraulic unit 222.

  The support portion of the main structure is indicated by 223, and 224, 225 and 226 are hydraulic units.

  The rear hatch is attached to the slide rail 227 and the front-end hatch is attached to the slide rail 228. This front-end hatch is represented at 229 in FIG. 2B and the shock absorber is illustrated at 230.

  FIG. 3 shows a longitudinal section of the main chamber. A gas separation area is indicated at 301 and gas is separated in various gas tanks 302. Furthermore, filter area 303, gas suction part 304, MHD array 305, wall structure 306, frame structure 307, outer wall structure 308, magnet rail 309, RF antenna 310, inner wall 311, injector compartment 312, rear compartment 313, recovery device 314, embedded An antenna 315 and an MHD area 316 are shown. Also shown is an input area 317, a main frame support structure 318, an RF antenna 319, a compressor compartment 320, an RF antenna cooling line 321, a magnetic mechanics array cooling line 322, and a unit 323 of a tractor device that provides additional movement functions of the device. Yes. Also shown in FIG. 3 is the rear chamber 313, which includes neutralization, recycling and cooling units and various other control and operating systems.

  Different vacuum functional areas are indicated by V1 to V6.

  FIG. 4 is a schematic diagram of the conditioning and recycling process, showing a unit 503 for detecting contamination at the final stage, a compressor 404 and its compartment 405. 406 shown represents the interface from the all-hatch closure device to the detection / analysis unit in case a chemical leaks. This is part of the safety system.

  E1 to E10 represent remote electronic control circuits, and EV1 (electronic valves) to EV8 represent different electromagnetic valves. The vacuum pump is VP and the liquid pump is FP. The gas separation compartment is represented by GCC and the injector compartment is represented by IC. 406 shown in the figure is a connection part to a remote electronic circuit, and the connection part 407 is an electronic valve interface.

  FIG. 5 illustrates a gas / liquid control system that does not include a monitoring system and cooling line.

  V1 to V6 are vacuum function areas, T1 and T2 are a tank compartment and an AR (argon) tank, F is a liquid, and F1 is a neutralizer. F2 represents the high temperature liquid F3, F4 is the plasma source gas, U1 represents the main unit, U9 is the main control, and U10 is the control unit for U1. Reference numeral 501 denotes a rear compartment, 502 denotes a gas compartment, 503 denotes a neutralization processing compartment, 505 denotes a mixer, 506 denotes a shunt, and 507 denotes another mixer. NC is a neutralization compartment, CC is a compressor compartment, NT is a neutralization liquid tank, and CU represents a cooling unit.

  Similarly, the illustrated 508 represents an emergency dump, 509 is an exit to unit U9, 510 to 513 are interfaces to control sensors, 514 is an interface to a substance spectrometer, 515 is a chromatograph etc. An interface is shown, 516 is an interface to the environment analyzer, and 517 is a recovery monitor unit. 519 monitors the RF / MHD process monitor, and 522 monitors and controls the reactor wall structure.

  6 and 6BIS show the details of the rear chamber in cross-section. Reference numeral 601 controls and monitors the decontamination process. Reference numeral 602 denotes a recycling vessel, 603 denotes a dopant liquid tank, 604 denotes a plasma source gas tank, and 605 denotes a cooling unit. 606 shown is a cooling compartment, 607 is a neutralization processing compartment, 608 represents a neutralization liquid tank, and 609 is an injector compartment.

  Using the same abbreviation, the vacuum functional area is represented by V, the liquid pump by FP, and the main unit by U1.

  FIG. 7 is a schematic diagram of the cooling circuit of the present invention, showing the main unit U1 and the cooling circuit. Coupled to the main unit U1 are cooling lines 733 and 734 of the magnetic mechanics unit and other lines 735 and 736 from the RF unit. They extend to the monitor and control unit as shown at 701. After that, it extends to other cooling units such as the cooling unit 706 by the monitor control unit 702 and the electromagnetic valve 705 via the electromagnetic valves 703 and 704. There are a cooling tank 707, a cooling compressor 708, and a heat exchange unit 709. This circuit includes a coolant pump such as 701, 711, and other control mechanisms, interfaces, pumps and electronic valves, which are not shown. The cooling unit further includes a cooling array 726 doubled on the recovery device 727. This is connected to line 732 by an electronic valve 728 and together with line 733 completes the aforementioned closed outlet cooling loop.

  FIG. 8 illustrates the recovery device and the surrounding bracket 801, its external structure 802 and the RF antenna 803 embedded in the inner wall 804. A plasma vortex is shown with a rear gas deflector 805 and a rear portion 806 shown. Also shown is the passageway 807 of the element during the molecular separation process and the area surrounding the hyperfilter 808. Respective elements of this structure are also shown at 809 and 810, and 811 representing the internal support bracket is also shown. The collection device includes an embedded induction antenna 812, a cooling line 813, and a feeder 815. The inner wall support structure 815 and the inner surface 816 of the recovery device are also shown. Reference numeral 817 represents an MHD unit area, and reference numeral 818 represents an RF area. Reference numerals 819 and 820 denote the structure of the recovery device / separation device and the support part, respectively.

  FIG. 9 illustrates a module that is part of the main chamber. An RF antenna 901 is embedded in the inner wall 902 there. This module shows a hatch opening 903, which is part 904 of the hatch area mechanism. A magnet rail 905 is also shown and holds the drum to be processed. Reference numeral 906 denotes an opening for inserting a hatch.

  FIG. 10 illustrates the structure of the main chamber. FIG. 10 shows an outer wall which is a sleeve 1002, its frame structure 1003, main frames 1004 and 1005, and a roller 1001 provided therebetween. This structure has a beam 1006 and a bracket 1007 to hold the inner wall. The connection between the outer and inner walls of the main chamber is provided by the control unit of the controller 1008 with its own bracket 1009. There is also an optical device 1010 for optical alignment of the inner wall. This controller is driven by a linear motor 1011 and has an articulated arm 1012.

  Reference numerals 1013 and 1014 denote an RF power line feeder and an RF antenna, respectively. Reference numeral 1015 denotes an inner wall control bracket, and reference numerals 1016 and 1017 denote a main frame and an outer wall rail which is slid from the sleeve for maintenance purposes.

  Reference numeral 1018 represents an outer wall support portion, and 1019 represents an inner wall support rail 1020.

  The cooling line is in 1021 and the linear motor control (not shown) is in 1022.

  1023 shown represents various sections and constitutes the inner wall. They are compatible as modules. Numbers 1024 and 1025 are upper and lower RF cooling units, respectively, and the inner wall is represented by 1026.

  11 and 12 show the frame structure. FIG. 11 shows the outer wall 1101, the inner wall 1111, the control 1102, the outer wall structure 1103, the main frame 1104, the beam 1105, the control 1106 of the hazard controller 1107, the magnet rail 1108 in the inner wall, and the groove 1109 in the inner wall bracket. The inner wall bracket 1110, the bracket controller 1112 and the controller's own mechanism 1113 are also shown.

  FIG. 12 shows a rail 1201 on the outer wall 1202, a frame 1203 on the outer wall, a roller 1204, and a groove 1205 for the roller 1204 on the main frame 1206. The harm mechanism 1207 controls the inner wall 1210, the control mechanism 1208, and the harm mechanism 1209. Also shown are an inner wall bracket 1212, an inner wall support groove 1212, an inner wall rail 1213 and a linear motor actuator 14.

  FIG. 13 illustrates the thermal insulation and Faraday shield net protection 1302 of the device surrounding the inner wall bracket. Reference numeral 1301 is an external Faraday net protector, 1302 is an external heat insulating means, and 1303 is a controller bracket. Reference numeral 1304 denotes an internal insulator, and an inner wall bracket is represented by 1305. The inner wall insulation is 1305 and the inner Faraday net is 1306. The chamber inner wall is provided with various similar modules 1307.

  14 and 15 are schematic views of the module on the inner wall of the reactor. This module includes a cooling line 1402 and is part of the inner wall 1401. 1403 is an RF antenna embedded in a part of the inner wall. The cooling line 1402 corresponds to the inside, and the cooling line 1404 corresponds to the outside. Reference numeral 1405 denotes a module rail, 1406 denotes an upper cooling line feeder, and 1407 denotes a lower cooling pipe feeder. Reference numeral 1408 denotes a feeder for the RF antenna.

  16 and 17 represent the injector system of the present invention.

  Although the number of injectors can be changed, this figure shows three examples, and has a structure (gas and liquid leakage prevention) separation device 1601, an injector compartment, a separation device 1602, an outer wall 1603, and an external structure 1604. Limit. Reference numeral 1605 is an injector compartment, and 1606 is a manifold that houses the injector.

  Reference numeral 1607 is a plasma source gas manifold, 1608 is a central injector, and 1609 is a gas flow control. Reference numeral 1610 denotes a second central injector manifold, and 11 denotes one of three gas pressure tanks that individually supply gas to the injector. Each gas tank is supplied with gas via a gas pump 1612 and supplies fuel to a gas pressure regulator 1613 and a recovery device 1614.

  The injector manifold is also designated 1615, and its bracket for the MHD unit is designated 1616. The injector compartment is supported by structure 1618 and attached to main frame 1619.

  This figure also shows another MHD unit 1620 and its monitor / control unit 1621.

  The inner wall has a bracket 1622 and an inner wall 1624 separation / insulation device 1623.

  The RF antenna is indicated by 1625 in the drawing.

  In FIG. 16, gas is sent from the main external tank. This is not shown through pump 1626. This is the same number as the plasma source tank 1611 and the gas injection device. Reference numeral 1627 denotes a control unit for introducing plasma source gas. Connection from 1628 to units U9 and U10, connection from 1629 to U9 and U10, connection from 1630 to U9, U10 and U12, connection from 1631 to U9 and U10, connection from 1632 to U9, U10 and U12 It is shown in the figure. The connections from 1633, 1634, 1635 to the respective injectors are also shown.

  FIG. 18 shows a concentric plasma core shape. Also shown are a gas separation compartment 1801, a recovery device 1802, a material processing time control MHD device, an RF antenna 1804, a second plasma shape control MHD device 1805, and a first plasma shape control MHD 1806. 1807, 1808 and 1809 shown are plasma source gas injectors, 1810 is the rear compartment of the decomposition chamber, 1811 is an injector compartment, 1812 is a plasma source gas injector, 1813 is a drum can, and 1814 is Magnet rail, 1815 is the first plasma back or NTE (non-local heat balance), 1817 is the second plasma core vortex or LTE (local heat balance), and 1817 is the second plasma core vortex or LTE , 1818 is the second plasma rear part or NLTE.

  Illustrated are a double membrane 231 of an internal sealing unit, an external (vacuum) sealing unit 232, a magnet rail 233 and brackets 236 and 237 of the inner wall modules 234 and 235. The double membrane of the sealing unit 238 is illustrated in FIGS. 19-22 and the external vacuum 9 sealing unit 239 is also illustrated.

  The carrier 240 holds the hatch 208 and can be slid along the external structure 212, and together the crane unit 243 can hold the hatch as shown in FIGS. 19 to 22. A double membrane (inside) of the outer wall 244 and sealing unit 245 and a double membrane (inside) of the reactor chamber inner wall 246 and sealing unit 247 are shown.

  The hatch 208 includes an internal structure and an external structure 249, and is connected to the controller 248 (FIG. 10) by a connection arm 241.

  A double membrane of an external sealing unit (vacuum) 250 and a sealing unit 252 is shown.

  The dimensions in the drawings are only for explaining the present invention and do not limit the present invention.

  The present invention is not limited to the description of the above embodiments. Improvements and modifications thereof are also within the scope of the present invention.

FIG. 1 is a schematic view showing all device components of the device of the present invention. FIG. 2 is a schematic external view of the main part of the apparatus. 2B is a cross-sectional view of the apparatus of FIG. FIG. 3 is an internal schematic diagram of the apparatus. FIG. 4 is a schematic view showing a vacuum line. FIG. 5 is a schematic diagram of a basic circuit for monitoring and controlling gas and liquid. FIG. 6 is a schematic view of the rear compartment. FIG. 6BIS is a cross-sectional view of the rear compartment. FIG. 7 is a schematic diagram of a basic cooling circuit. FIG. 8 is a schematic diagram of a gas recovery / separation unit. FIG. 9 is a perspective view of the inner wall module configuration showing the neutralization chamber, embedded RF antenna, hatch and magnetic rail. FIG. 10 is a detailed cross-sectional view showing the main neutralization chamber, the inner wall and the outer structure. FIG. 11 is a detailed view of the frame structure. FIG. 12 is a detailed view of the frame structure. FIG. 13 is a cross-sectional view showing the heat insulation structure and Faraday protection of this apparatus. FIG. 14 is a perspective view of the module on the inner wall of the reactor. FIG. 15 is a perspective view of the module on the inner wall of the reactor. FIG. 16 is a schematic view of the injector compartment. FIG. 17 is a schematic view of the injector compartment. FIG. 18 is a concentric plasma core shape diagram. FIG. 19 is a schematic diagram of the input hatch and sensor including an RF mechanism, a cooling mechanism, and various other mechanisms. FIG. 20 is a schematic diagram of the input hatch and sensor including an RF mechanism, a cooling mechanism, and various other mechanisms. FIG. 21 is a schematic view of the input hatch and sensor including an RF mechanism, a cooling mechanism, and various other mechanisms. FIG. 22 is a schematic diagram of the input hatch and sensor including an RF mechanism, a cooling mechanism, and various other mechanisms.

Claims (17)

A method for eliminating waste contained in a metal can,
Examining each containment can sample to determine if it can be processed prior to processing;
Attaching an external reinforcing frame having the capability of automatically opening the containing can to the containing can;
A step of neutralizing the containing can and the contents in a plasma vortex controlled in shape from 8000 ° K to 14000 ° K in the processing chamber to a molecular dissociation phase in a processing time according to the target substance;
The processing method characterized by including. The processing method according to claim 1, further comprising the step of opening the container can with an explosive disposed on the external reinforcing frame. 2. A process according to claim 1, characterized in that an RF plasma doped with Fe and / or lanthanides or helium or hydrogen is used to raise the temperature and stabilize the plasma. The processing method according to claim 1, wherein the processing time in the molecular dissociation phase of the substance is adjusted by generating the second plasma core. The processing method according to claim 1, wherein the container and the target object are supported in the processing chamber by a special support. The processing method according to claim 1, wherein the container and the target substance are supported in the processing chamber by a strong magnetic force that guides the container in which the contents are removed into the processing chamber. The processing method according to claim 6, wherein the metal frame is mounted on the storage can to be conveyed by magnetic force, and the storage can is suspended in the processing chamber without contacting the inner wall of the processing chamber. . The processing method according to claim 1, wherein dissociated molecules of the target waste material generated by the processing are recovered by a special recovery device. A processing apparatus embodying the processing method according to any one of claims 1 to 8, comprising a single transportable unit and a size according to a size of a storage can that stores a target waste substance, A processing apparatus including a main processing chamber that generates and controls an RF plasma flow at a temperature of 10000 ° K. or more, surrounds the containment can with the generated RF plasma, and heat-treats the processing chamber. The generated molecules are collected individually, transported by plasma means generated by argon gas, etc., processed by a gas conditioning / separator device, and an RF antenna is embedded in the inner wall of the processing chamber to generate a plasma core. And maintain
a) an automatic device for sending the containment can to the main chamber;
b) an RF generation unit;
c) a main chamber cooling unit and peripherals;
d) a control and monitoring unit for the whole process;
e) a power generator with peripherals;
f) Target substance treatment database,
Is further included. The processing apparatus characterized by the above-mentioned. The main processing chamber is composed of an outer wall and a modular inner wall, is fitted with the main frame structure and is associated with the articulated connection system, and is characterized by being actuated by a linear motor and holding the inner wall of the chamber fixed The apparatus according to claim 9. 10. A device according to claim 9, wherein the outer wall and the inner wall have embedded independent cooling circuits. The leading plasma source gas injector carrier and the tip treated waste particle recovery device have their own cooling unit and RF antenna embedded in the same manner as the main chamber wall for RF generation and propagation control. The apparatus according to claim 9. The apparatus of claim 9, wherein the processing chamber wall is made of a material that is transparent to RF. 10. The apparatus of claim 9, wherein the chamber wall is made of beryllium oxide (BeO) or a material of similar nature. The plasma vortex shape control step by MHD provided in the vicinity of the injector and the recovery device is included, and the shape of the intermediate part of the plasma flow is controlled to control the processing time of the target processing substance. Processing method. The tip injector includes several plasma source gas tanks that are supplied with gas from a central external tank, each of which is supplied by an injector unit via a gas flux control device and a gas flow control device for each injector. The apparatus according to claim 9. 10. The apparatus of claim 9, wherein the processing chamber includes a waste input hatch, the hatch having its own cooling means, RF antenna unit and monitoring means.

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