JP2005344182A - Method for controlling concentration of sealing treatment liquid - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for measuring and controlling at least one concentration variation selected from the group consisting of fluorine, phosphoric acid, substrate metal, and inorganic acid in a sealing treatment liquid with high precision in accordance with the characteristics of a sealing treatment stage, and to provide a method for producing an aluminum supporting body for a lithographic printing plate using the same. <P>SOLUTION: In the method for subjecting micropores present in an anodized coating formed by performing anodizing treatment to a metallic substrate to sealing treatment with an aqueous solution comprising a fluorine compound and a phosphoric compound, at least the one concentration variation selected from the group consisting of fluorine, phosphoric acid, metallic substrate, and inorganic acid in the treatment liquid corresponding to a throughput in sealing treatment is beforehand estimated from the measured result by a multicomponent concentration measurement method, and in accordance with a throughput or from the difference obtained by comparing the measured result with a beforehand set concentration range, the addition amount of the component to be supplied to the sealing treatment liquid is calculated, and a fluorine compound, a phosphoric compound or water is added, so as to control the concentration. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a method for controlling the concentration of a sealing treatment liquid and a method for producing a lithographic printing plate support using the same.

  A technique for forming a film on a metal substrate in an aqueous solution containing a fluorine compound and a phosphoric acid compound is widely used in the fields of automobiles, cans and the like. Conventionally, the concentration of fluorine compound and phosphate compound in aqueous solution is measured by the fluorine ion electrode method, and the concentration of the fluorine compound is controlled by this method. In general, the phosphoric acid compound concentration is controlled by measuring the phosphoric acid concentration.

Various methods for measuring the concentration of fluorine and phosphoric acid have been proposed (Patent Document 6). <1> Fluorine ion concentration measurement by the fluorine ion electrode method, a method combining the phosphoric acid concentration measurement by the colorimetric method, <2> Fluorine ion concentration measurement result by the fluorine ion electrode method, and the conductivity measured, prepared in advance Method of obtaining fluorine and phosphoric acid concentration by conversion table, <3> Method of measuring pH and electrical conductivity, obtaining fluorine and phosphoric acid concentration by conversion table prepared in advance, <4> Ultrasonic propagation velocity and electric conductivity The method of measuring and calculating | requiring a fluorine and phosphoric acid concentration with the conversion table created beforehand is mentioned.
However, in these methods, two sensors are required for concentration measurement, and the labor required for the management is enormous. Also, in terms of measurement accuracy, there are large variations in measurement due to the introduction of other elements from the pretreatment process, etc., and aluminum ions, which are dissolved metal substrate ions, and there is a problem in controlling the manufacturing process using these measured values. was there.

  Conventionally, ion chromatography has been used in boiler water analysis (Patent Document 1), environmental component measurement (Patent Document 2), water treatment device (Patent Document 3), plating apparatus (Patent Document 4), and etching process in a power plant. A concentration measurement method for measuring concentration (Patent Document 5) is known.

JP-A-7-269303 Japanese Patent Laid-Open No. 6-242093 JP 2000-246259 A Japanese Patent Laid-Open No. 2001-49448 Japanese Patent Laid-Open No. 2001-108666 Japanese Patent Laid-Open No. 2001-121837

  In the above-described prior art, there is a problem that accuracy is inferior in the concentration measurement in the sealing treatment liquid in which a plurality of types of ions influence each other. Moreover, in the sealing treatment, there is a large variation in measurement due to the introduction of other elements from the pretreatment process or the like, or aluminum ions that are dissolved metal substrate ions, etc., and this measurement value is used to control the manufacturing process. There was a problem.

  Therefore, the present invention can accurately measure at least one concentration variation selected from the group consisting of fluorine, phosphoric acid, base metal and inorganic acid in the sealing treatment liquid according to the characteristics of the sealing treatment step. Therefore, it is possible to control the concentration by predicting the concentration fluctuation in advance using this measured value, and to control the concentration, and if necessary, measure the concentration at an appropriate timing to measure the concentration of the sealing treatment liquid. It is an object of the present invention to provide a method capable of controlling the above.

  The present inventor, in the production of a lithographic printing plate support using an aluminum plate, performs a sealing treatment for sealing micropores present in an anodized film formed by anodizing treatment with a fluorine compound and phosphorus. By using an aqueous solution containing an acid compound and using ion chromatography to measure the concentration of the sealing solution containing fluorine and phosphoric acid, variations in concentration measurement can be reduced, and not only the concentration of fluorine and phosphoric acid. The concentration of sulfuric acid brought in from the anodizing process, which is the previous process that makes the sealing process unstable by changing the pH of the sealing process liquid, can be accurately measured, and the concentration control of the excellent sealing process liquid can be performed. As a result, the present invention has been achieved.

  Concentration measurement by ion chromatography requires a long measurement time of 10 to 30 minutes, making real-time concentration measurement difficult, but changes in concentration of fluorine, phosphoric acid, aluminum ion, and sulfuric acid according to the amount of treatment. , Evaporating and taking out the liquid by the web, bringing in the liquid by the web, etc. are predicted in advance, and the feed forward control to add the fluorine compound, phosphate compound or water in advance according to the processing amount is used together, The present invention has been completed by discovering that more accurate concentration management is possible by correcting the concentration measurement result by the graph method.

That is, the present invention provides the following (1) to (4).
(1) In a method of sealing a micropore of an anodized film formed by anodizing a metal substrate surface with an aqueous solution containing fluorine and phosphoric acid,
Measure at least one concentration selected from the group consisting of fluorine, phosphoric acid, base metal and inorganic acid in the sealing treatment solution by a multi-component concentration measurement method, and the measurement result and a preset concentration range The concentration control method of the sealing treatment liquid which calculates the addition amount of the component supplemented to a sealing treatment liquid from the difference, and adds a fluorine compound, a phosphoric acid compound, or water.
(2) In a method of sealing a micropore of an anodized film formed by anodizing a metal substrate surface with an aqueous solution containing fluorine and phosphoric acid,
Measure at least one concentration selected from the group consisting of fluorine, phosphoric acid, base metal and inorganic acid in the sealing treatment solution by a multi-component concentration measurement method, and the measurement result and a preset concentration range The amount of the component to be replenished to the sealing treatment liquid is calculated from the difference, and the concentration control method of the sealing treatment liquid to which a fluorine compound, a phosphate compound, or water is added,
Fluctuation with respect to the treatment amount of at least one concentration selected from the group consisting of fluorine, phosphoric acid, base metal and inorganic acid in the treatment liquid is predicted in advance, and the fluorine compound, phosphate compound, Or a method for controlling the concentration of the sealing treatment liquid to which water is added,
A method for controlling the concentration of the combined sealing treatment liquid.
(3) The method (1) or (2), wherein the multi-component concentration measurement method is at least one selected from the group consisting of capillary electrophoresis, isotacophoresis, and ion chromatography. A method for controlling the concentration of the sealing treatment liquid according to 1.
(4) Sealing the aluminum plate with an aqueous solution containing at least an anodizing treatment and a fluorine compound and a phosphoric acid compound for sealing micropores present in the anodized film formed by the anodizing treatment. A support for a lithographic printing plate comprising a pore treatment, wherein the sealing treatment has at least one concentration selected from the group consisting of fluorine, phosphoric acid, aluminum and sulfuric acid in the treatment liquid, A method for producing a support for a lithographic printing plate, which is carried out while being controlled by the concentration control method according to any one of (1) to (3) above.

  The feed forward method is preferred in which the addition amount of the fluorine compound, phosphate compound and water is determined by experiment and added every 1 to 10 minutes. In addition, based on the results of measuring the concentration of fluorine compounds and phosphate compounds by multi-component concentration measurement methods such as ion chromatography, combined with a feedback method that increases or decreases the interval between each addition. The method is particularly preferred. The concentration measurement by the multi-component concentration measurement method may be performed once, but may be continuously performed several times at an interval of 1 to 30 minutes at a necessary position in the feedforward method.

In addition, in the ion chromatographic measurement, by providing a step of diluting the sealing solution before the measurement, the metal ion concentration that decreases the column life of the ion chromatographic method can be lowered, and the column life is reduced. As a result, the calibration cycle can be extended.
In addition, by providing a process to remove fine particle components with a filter before or after dilution, fine particles that reduce the column lifetime of the ion chromatograph can be removed, extending the column lifetime and extending the calibration cycle. It became possible to do.

In addition, ion exchange of the solution before dilution or diluted solution is performed to remove metal ions contained in the sealing treatment solution, thereby reducing the metal ion concentration that reduces the column lifetime of the ion chromatography method. In addition to extending the column life, the calibration cycle can be extended.
In addition, by adding a chelating agent that forms a complex with metal ions contained in the sealing solution to the solution before or after dilution of the sealing solution, the column life of the ion chromatograph is reduced. This makes it possible to make the metal ions to be harmless, extend the column life, and increase the calibration cycle.

  According to the present invention, it is possible to accurately measure at least one concentration variation selected from the group consisting of fluorine, phosphoric acid, base metal and inorganic acid in the sealing treatment liquid in accordance with the characteristics of the sealing treatment step. it can. Therefore, it is possible to control the concentration by predicting the concentration fluctuation in advance using this measured value and designing and managing the process. Further, if necessary, the concentration can be measured in the middle of the process, and the concentration of the sealing treatment liquid can be appropriately controlled based on the result. Therefore, there is no waste in the sealing treatment process, and the waste liquid treatment can be performed appropriately, which is excellent as a metal substrate treatment process. Further, when a lithographic printing plate support is produced using the present invention, a lithographic printing plate support having a certain quality is obtained, the yield is excellent, and the waste liquid treatment can be appropriately performed.

  Hereinafter, the method for controlling the concentration of the sealing treatment liquid of the present invention and the method for producing the lithographic printing plate support of the present invention will be described in detail.

The method of the present invention is a concentration control of a sealing treatment liquid used to seal micropores present in an anodized film formed by anodizing a metal substrate, but the metal substrate is not particularly limited. A steel plate, a plated steel plate, a silicon plate, an aluminum plate, and the like can be exemplified, and a laminated plate other than a resin or other metal may be used as long as the surface can be anodized.
In the following description, an example in which an aluminum plate is mainly used as a metal substrate will be mainly described.

In the sealing treatment liquid concentration control method of the present invention, the sealing treatment liquid is an aqueous solution containing a fluorine compound and a phosphoric acid compound, and there are a first method and a second method.
<First concentration control method>
Measure at least one concentration selected from the group consisting of fluorine, phosphoric acid, base metal and inorganic acid in the sealing treatment solution by a multi-component concentration measurement method, and the measurement result and a preset concentration range are obtained. A method of comparing, calculating the addition amount of the component supplemented to the sealing liquid from the difference, and adding a fluorine compound, a phosphoric acid compound, or water.
<Second concentration control method>
Measure at least one concentration selected from the group consisting of fluorine, phosphoric acid, base metal and inorganic acid in the sealing treatment solution by a multi-component concentration measurement method, and the measurement result and a preset concentration range are obtained. Comparing, calculating the addition amount of the component to replenish the sealing treatment liquid from the difference, a method of adding a fluorine compound, a phosphate compound, or water,
Fluctuation with respect to the treatment amount of at least one concentration selected from the group consisting of fluorine, phosphoric acid, base metal and inorganic acid in the sealing treatment liquid is predicted in advance, and the fluorine compound and the phosphoric acid compound according to the treatment amount Or a method of combining with the method of adding water.

[Measurement of concentration]
First, the concentration measuring method used in the present invention will be described.
The concentration measurement method of the present invention is not particularly limited as long as it is a multi-component concentration measurement method capable of measuring the concentration of fluorine, phosphoric acid, base metal or inorganic acid in the sealing treatment liquid alone or in combination. This eliminates the need for multiple sensors and eliminates the need for management. In addition, the measurement accuracy is small due to the introduction of other elements from the pretreatment process, etc., and aluminum ions that are dissolved metal substrate ions, etc., and it is excellent for controlling the manufacturing process using concentration measurement values. Therefore, it is preferable.

The multi-component concentration measurement method is a method capable of measuring a single component or a plurality of components present in a mixed component in an aqueous solution,
For example,
1) Capillary electrophoresis analysis,
2) Isotachophoresis (capillary isotachophoresis) analysis method,
3) Concentration measuring method by ion chromatography is mentioned.
In the method of the present invention, at least one concentration selected from the group consisting of fluorine, phosphoric acid, base metal, and inorganic acid in the sealing treatment solution may be measured by a multi-component concentration measuring method. These concentration measurement methods may be used in combination for the measurement of fluorine ion concentration and phosphoric acid concentration, and other known concentration measurement methods may be used alone or in combination. Of course, measurement of temperature, pH and the like may be combined with concentration measurement.
4) Examples of other measurement methods include fluorine ion concentration measurement by a fluorine ion electrode method, phosphoric acid concentration measurement by a colorimetric method, conductivity, pH, ultrasonic wave propagation speed, and electrical conductivity.

The electrical conductivity of the aqueous solution can be measured using a conventionally known electrical conductivity meter.
The fluorine ion concentration of the aqueous solution is the concentration of fluorine ions (F ⁻ , fluoride ions) present in the aqueous solution, and is measured by the fluorine ion electrode method. A conventionally well-known method can be used for the fluorine ion electrode method.

The ultrasonic wave propagation speed of the aqueous solution can be measured by a conventionally known method, for example, a method described in JP-A-6-235721 and JP-A-58-77656.
The pH of the aqueous solution can be measured using a conventionally known pH meter.

<Capillary electrophoresis analysis>
The capillary electrophoresis analysis method is a method of separating and analyzing a mixed substance using a phenomenon in which particles move toward an electrode when an electric field is applied in the capillary, and a conventionally known method can be used. it can.

<Isotacophoresis analysis method>
Isotacophoresis analysis is also called (capillary) isotachophoresis. Polyacrylamide is an electrophoresis method in which a sample solution is sandwiched between an electrolyte solution containing ions (L *) with a higher mobility than the ions to be analyzed and a solution containing ions (T *). Or agarose gel is used as a support. It is useful as a qualitative or quantitative analysis method for many organic and inorganic substances, and known measuring instruments can be used.

<Ion chromatography method>
The official name of the ion chromatographic method is ion exchange chromatography, which is effective for analyzing ions as a technique for separating mixed multi-components and analyzing the components qualitatively and quantitatively. Chromatography includes gas chromatography, liquid chromatography, column chromatography, thin layer chromatography, paper chromatography, countercurrent distribution chromatography, supercritical fluid chromatography and the like.
Liquid chromatography is a chromatography that uses a liquid as a mobile phase, and is a method of separation utilizing the interaction of sample components that occurs between the stationary phase and the mobile phase of a column.
A solution in which a mobile phase is fed at a high pressure to obtain high separation in a short time is called high performance liquid chromatography. In high performance liquid chromatography, there are names such as partition chromatography, adsorption chromatography, size exclusion chromatography, ion chromatography (ion exchange chromatography), etc., depending on the combination of the fixed layer and mobile phase used.
The ion chromatograph method is defined by general rules of ion chromatograph (JIS K 0127) and is adopted as an official analysis method.

  Further, depending on the detector, there are types such as an absorbance detection ion chromatograph, a non-suppressor type electric conductivity detection ion chromatograph, and a suppressor type ion chromatograph. In the present invention, it is preferable to use a suppressor type ion chromatograph in order to ensure measurement stability.

(1) Apparatus The basic configuration of a high-performance liquid chromatograph is as follows. As shown in FIG. 1, a suppressor type (suppressed) ion chromatograph is configured to send a mobile phase liquid (eluent 30) having a degassing device 32. It consists of a liquid section, a liquid feed pump 34, a sample injector 36, a separation column 38, a detector 40, and a data processing device 42. The sample injector 36 and the separation column 38 are maintained at a constant temperature in the column thermostat 35, and the sample after detection is processed as a waste liquid 46.
In an ion chromatograph, a measurement sample obtained by further diluting an aqueous solution of a sealing treatment solution is injected from a sample injector 36, passes through a guard column, and is subjected to a difference in selectivity coefficient (ion exchange capacity) in a separation column 38. Based on separation. As the ion detector 40, an electric conductivity detector is generally used because of its versatility, sensitivity, responsiveness, linearity, and the like.
When an electrical conductivity detector is used, the suppression may be performed using a suppressor 54 which is a device that reduces the background electrical conductivity without impairing the detection of the ionic species component to be measured. In the suppressor 54, the removal liquid 50 is flowed to the sample separated by the separation column 38 through the deaeration device 32 by the pump 52, and the electrical conductivity that becomes the background is reduced and processed as the waste liquid 56. As a non-suppressor method, an ion species may be separated and detected using an eluent with low electrical conductivity without using a suppressor.
As the ion chromatograph column to be used, known commercially available columns can be used as long as they analyze inorganic ions, organic acids, and low molecular weight amines. In addition, various inorganic ions can be measured by selecting standard conditions, eluents, and column conditions.

(2) Eluent Any known eluent can be used as long as it can separate anions. For example, the type, concentration and pH are not particularly limited.
In addition, it is particularly preferable to provide a guard column in front of the separation column and remove substances that affect the lifetime of the column with this guard column in order to extend the lifetime of the column. A dilute electrolyte is generally used as the eluent, and the anion or cation concentration is generally measured using a separation column packed with a low exchange capacity ion exchange resin. . However, for the analysis of organic acid ions, ion exchange resins having a high exchange capacity may be used, or metal cyano complexes may be separated using a resin having no ion exchange function.
The pH of the eluent is preferably 2 to 12, and when it is out of this range, it is preferable to perform neutralization treatment in advance.

(3) Pretreatment The sample solution to be measured is preferably preliminarily subjected to filtration for removing suspended substances and precipitates, dilution to obtain a measurable concentration, and the like. Filtration and dilution are preferably performed automatically, and it is particularly preferable to use pure water (ion exchange water) for dilution. Since the concentration measurement is easily influenced by dust, bubbles, etc., it is preferable to measure the liquid treated with a filter, a deaeration device or the like.
For the filtration, a membrane filter and a cartridge filter are used. The pore size of the filter used for filtration is preferably 0.5 μm or less, particularly preferably 0.3 μm or less. For example, filtration membranes made of polytetrafluoroethylene (PTFE) are commercially available, and those having a pore diameter of 0.22 μm and 0.45 μm are available.
When a high molecular compound is present in the sample by ion measurement, it is preferable to filter using an ultrafiltration membrane.
The sample may be filtered before or after diluting the sealing solution, but it is particularly preferable to dilute the sample to reduce clogging of the filter.

  In the sealing treatment liquid to be measured according to the present invention, fluorine or phosphoric acid in the sealing treatment liquid reacts with the substrate, etc., so that sodium fluoroaluminate, zirconium phosphate, zirconium hydroxide, aluminum phosphate , Calcium hydroxide and the like are likely to precipitate, and are often present as fine particles having a particle size of about 0.05 to 2.0 μm. Therefore, it is preferable that the sealing treatment liquid is filtered by a filter.

If the element in the measurement sample affects the life of the column or forms a matrix with the element to be measured and cannot be measured accurately, interfering ions can be passed through ion exchange gel, ion exchange resin, chelate disk, chelate fiber, etc. Is preferably removed in advance or mixed with a chelating agent to render the interfering ions harmless.
There is no restriction | limiting in particular in the density | concentration of the chelating agent to add, In order to raise the fixed_quantity | quantitative_assay precision of a fluorine ion effectively, 1 micromol-500 micromol are good, and although it changes with kinds of chelating agent, about 4 micromol-100 micromol is more preferable. Since the concentration of the chelating agent added in the present invention is low, it does not form a system peak that interferes with other ion peaks and the peak of the chelating agent itself. The chelating agent to be added is preferably a water-soluble chelating agent, and examples thereof include aminopolycarboxylic acids, oxycarboxylic acids, and inorganic compounds. Of these, aminopolycarboxylic acid is particularly preferred, and nitrilotriacetic acid (NTA), N-hydroxyethyliminodiacetic acid (NIMDA), ethylenediaminediacetic acid (EDDA), ethylenediaminetetraacetic acid (EDTA), and N-hydroxyethylethylenediaminetetraacetic acid. (HEDTA), diethylenetriaminepentaacetic acid (DTPA), 1,2-cyclohexanediaminetetraacetic acid (CyDTA), trimethylenediaminetetraacetic acid (TMTA), ethylene glycol diethyl etherdiaminetetraacetic acid (GEDTA), ethylenediaminetetrapropionic acid (EDTP) Preferred examples include glutamic acid-N, N-diacetic acid, aspartic acid-N, N-diacetic acid, and salts thereof. Further, examples of the oxycarboxylic acid type include lactic acid, glycolic acid, citric acid, tartaric acid, mandelic acid, and examples of the inorganic compound include pyrophosphoric acid, triphosphoric acid, condensed phosphoric acid and the like. The chelating agent used in the present invention is preferably an aminopolycarboxylic acid system that reacts instantaneously with a cation, and examples thereof include a method of adding EDTA or CyDTA, 2 to 10 μM to the eluent.

Further, the pH when chelating interfering ions by mixing a chelating agent in the eluent is preferably not strongly acidic, and more preferably pH 3-8 in view of the binding stability of the chelating agent and metal ions.
Even if the pH of the sample to be measured is within the range of 2 to 12, if the electrical conductivity is high, the exchange capacity of the column may be exceeded, or the separation of ions may be deteriorated. In the case of a measurement sample, since the resin of the separation column deteriorates, it is preferable to perform a reduction treatment or a treatment for decomposing the oxidizing agent.
Addition of a chelating agent to the eluent is effective when a non-suppressor type ion chromatograph is used.

(4) Dilution ratio A method that removes substances that affect column life by pretreatment using ion exchange gel, ion exchange resin, chelate disc, etc. results in complicated equipment, resulting in increased equipment and running costs and maintenance. Therefore, it is particularly preferable to use a suppressor type ion chromatograph and measure the dilution magnification of the measurement sample as 200 to 5000 times, determine the number of measurements, and replace the column.
The dilution ratio is preferably 200 to 5000 times, and particularly preferably 500 to 2500 times. The dilution is particularly preferably performed automatically, and it is particularly preferable to use degassed pure water (ion exchange water).
If it is less than 200 times, the column life is remarkably shortened, and if it is more than 5000 times, the variation in measurement due to dilution increases.

  In the present invention, the anion whose concentration is measured is fluorine, phosphoric acid, or an inorganic acid, and the cation is an ion of a metal constituting the substrate. The kind of inorganic acid in the treatment liquid is not limited, but the concentration of inorganic acid ions such as chloride, nitrous acid, bromide, nitric acid can be measured.

Since these data are easily influenced by temperature, these measurements are preferably performed in a pipe that is kept warm and temperature controlled within plus or minus 0.3 ° C.
Moreover, since it is preferable to measure each density | concentration of multicomponent at the same temperature, it is preferable to measure in the same piping or the same piping flow.
In addition, the pressure fluctuation and the flow velocity distribution in the pipe to be measured are preferably small because they cause temperature fluctuation.

  The first control method is to measure at least one concentration variation selected from the group consisting of fluorine, phosphoric acid, base metal and inorganic acid in the sealing treatment solution by a multi-component concentration measurement method, The concentration range set in advance is compared, the amount of the component to be replenished in the sealing treatment liquid is calculated from the difference, and the fluorine compound, phosphate compound, or water is added. The second control method predicts in advance, in the first control method, a change in the treatment amount of at least one concentration selected from the group consisting of fluorine, phosphoric acid, base metal, and inorganic acid in the sealing treatment liquid. In addition, a concentration control method for the sealing treatment liquid in which a fluorine compound, a phosphoric acid compound, or water is added according to the treatment amount is combined.

The ion chromatograph method takes 10 to 30 minutes for one measurement time, and it is difficult to measure the concentration in real time. Predict liquid removal by web, liquid carry-in by substrate web, etc. by measuring the concentration of fluorine, phosphoric acid, substrate metal ions and / or inorganic acids using a multi-component concentration measurement method such as ion chromatography. Depending on the treatment amount, feedforward control in which a fluorine compound, a phosphoric acid compound, or water is added in advance can be suitably performed. If necessary, a part of the treatment liquid after the sealing treatment may be discarded or recirculated after appropriate treatment.
In addition to feedforward control, more accurate concentration management is possible by adding feedback and correction based on the results of measurement of fluorine, phosphoric acid, base metal ion and / or inorganic acid concentrations by multi-component concentration measurement methods such as ion chromatography. It becomes possible.

  As a specific example of the second concentration control method of the present invention, the addition amount of the fluorine compound, phosphate compound, and water is determined in advance by measuring the concentration in advance, and each 1 to 10 minutes each. It is preferable to add at a timing set from the range. And the method of combining the feedback which lengthens or shortens each addition interval based on the measurement result in an ion chromatograph is especially preferable.

In the sealing treatment liquid, ions of the base metal, such as aluminum, are eluted, but the aluminum ion concentration is preferably controlled within a predetermined range.
Also, in the sealing treatment liquid, sulfate ions increase due to the introduction of sulfuric acid from the anodizing process in the previous process and the dissolution of SO ₄ contained in the anodized film, so the sulfate ion concentration is set to a predetermined value. It is preferable to control the range.

  During operation, the method of controlling the concentration so as to seal with an aqueous solution containing an inorganic fluorine compound having a predetermined range of concentration and a phosphate compound is not limited. Solution, a concentrated solution in which a phosphoric acid compound is dissolved, and either concentration is compared with a preset concentration range to find the difference between them. Correct by adding water. If the concentration increases due to evaporation of water, water is replenished. The amount of drainage of the sealing treatment liquid may be changed and controlled.

  When the concentration of the sealing treatment liquid is always managed, the concentration control of the sealing treatment liquid is at least one selected from the group consisting of fluorine, phosphoric acid, base metal and inorganic acid in the sealing treatment liquid to be used. Two concentrations are measured individually or simultaneously with the concentration measuring method described above. In particular, a method of controlling by combining fluorine / phosphoric acid / substrate metal concentration, fluorine / phosphoric acid / inorganic acid concentration, fluorine / phosphoric acid / substrate metal / inorganic acid concentration is preferable.

  In the method of measuring the concentration by the ion chromatograph method, since a measurement time of 15 to 30 minutes is required, 2 to 10 measurement columns are prepared, and automatic sampling and 200 to 200 at regular intervals are controlled by a personal computer. It is preferable to measure the liquid that has been automatically diluted 2000 times by switching each column. By doing so, it becomes possible to measure the concentration, which can be measured only at intervals of 30 minutes with one column, at short intervals, and it is possible to measure the concentration change of the liquid in a timely manner.

For concentration measurement, prepare liquids in which the fluorine compound concentration and phosphate compound concentration are changed stepwise over a wide range, and measure the fluorine concentration and phosphoric acid concentration for each solution to create a data table. A method may be used in which the measurement results of the liquid and the data table created in advance are matched to calculate the amount of the current fluorine compound concentration and phosphate compound concentration of the sealing treatment liquid. If necessary, a data table can be similarly created for the metal ion concentration and the inorganic acid concentration.
Next, a step of calculating the concentration of the fluorine compound and the phosphate compound in the sealing treatment liquid is performed from the measured concentration and a data table prepared in advance.
The data table is prepared by preparing aqueous solutions containing various concentrations of sodium zirconate fluoride and sodium dihydrogen phosphate, and measured by the above-described concentration measurement method, for example, at each liquid temperature of 25 to 50 ° C. You may create it.

  When the measured value is located in the middle of a plurality of data in the data table, it may be calculated from the plurality of data by calculation using a regression equation or the like. Further, when the temperature of the aqueous solution is an intermediate temperature of each data table, it may be calculated from the data of each data table by calculation using a regression equation or the like.

As described above, the concentration control method of the present invention adjusts at least one concentration variation selected from the group consisting of fluorine, phosphoric acid, base metal and inorganic acid in the sealing treatment liquid to the characteristics of the sealing treatment step. Can be measured accurately. Therefore, there is no waste of the sealing treatment process, and the waste liquid treatment can be appropriately performed, which is an excellent method for controlling the concentration of the sealing treatment liquid.
Further, when a lithographic printing plate support is produced using the present invention, a lithographic printing plate support having a certain quality is obtained, the yield is excellent, and the waste liquid treatment can be appropriately performed.
Therefore, the method for controlling the concentration of the sealing treatment liquid of the present invention is suitably used for producing a lithographic printing plate support described later.

[Method for producing support for lithographic printing plate]
Below, the manufacturing method of the support body for lithographic printing plates of this invention is demonstrated. The method for producing a lithographic printing plate support according to the present invention comprises an aluminum plate, at least an anodizing treatment, and a fluorine compound for sealing micropores present in the anodized film formed by the anodizing treatment, and A support for a lithographic printing plate comprising a sealing treatment using an aqueous solution containing a phosphoric acid compound, wherein the concentration of the fluorine compound and the phosphoric acid compound in the aqueous solution It is a method for producing a lithographic printing plate support, which is calculated by the measurement method of the invention and manages the concentrations of the fluorine compound and the phosphate compound based on the calculated value.

<Aluminum plate (rolled aluminum)>
The aluminum plate used in the present invention is a metal whose main component is dimensionally stable aluminum, and is made of aluminum or an aluminum alloy. In addition to a pure aluminum plate, an alloy plate containing aluminum as a main component and containing a trace amount of foreign elements, or a plastic film or paper on which aluminum or an aluminum alloy is laminated or vapor-deposited can also be used. Furthermore, a composite sheet in which an aluminum sheet is bonded to a polyethylene terephthalate film as described in Japanese Patent Publication No. 48-18327 can also be used.

  The aluminum plate used in the present invention is not particularly limited, but a pure aluminum plate is preferably used. Since completely pure aluminum is difficult to manufacture in terms of scouring techniques, it may be used that contains slightly different elements. For example, known materials described in Aluminum Handbook 4th Edition (Light Metals Association (1990)), specifically, JIS1050 material, JIS1100 material, JIS3003 material, JIS3005 material, international registered alloy 3103A, etc. can be used. . Further, the content of aluminum (Al) is 99.4 to 95% by mass, and iron (Fe), silicon (Si), copper (Cu), magnesium (Mg), manganese (Mn), zinc (Zn) Further, an aluminum plate using an aluminum alloy, a scrap aluminum material, or a secondary metal containing at least five of chromium (Cr) and titanium (Ti) within a range described later can also be used.

  In the method for producing a lithographic printing plate support of the present invention, an aluminum alloy is preferably used. The aluminum alloy preferably contains Al, Fe, Si, and Cu, and more preferably contains Ti.

  Fe is usually contained in an aluminum alloy (Al ingot) used as a raw material in an amount of about 0.04 to 0.2% by mass. Fe has a small amount of solid solution in aluminum, and most remains as an intermetallic compound. Fe has an effect of increasing the mechanical strength of the aluminum alloy, and greatly affects the strength of the support. If the Fe content is too small, the mechanical strength is too low, and it becomes easy to cause plate breakage when the lithographic printing plate is attached to the plate cylinder of a printing press. Further, when printing a large number of copies at high speed, the plate is likely to be cut out similarly. On the other hand, when the Fe content is too high, the strength becomes higher than necessary, and when the lithographic printing plate is attached to the plate cylinder of a printing press, the fitness is inferior, and the plate is easily cut during printing. Further, if the Fe content is more than 1.0% by mass, for example, cracking is likely to occur during rolling.

The present inventor explained that the intermetallic compound containing Fe, which will be described later, occupies most of the intermetallic compound contained in the aluminum plate, and that they are easily removed (dropped off) during the surface roughening treatment. It has been found that the exposure of the image recording layer and the development failure are caused by the image recording layer entering into the local concave portion formed after being removed (dropped).
In the present invention, excellent mechanical strength can be obtained by setting the upper limit of the Fe content to preferably 0.29% by mass based on the above findings. In addition, the amount of intermetallic compounds containing Fe is reduced and the number of local recesses formed after the intermetallic compound is removed (dropped off) is reduced, so that exposure failure, and hence development failure is unlikely to occur, and the sensitivity is excellent. become.
The lower limit of the Fe content is preferably 0.05% or more in consideration of the content in the metal, but is 0.20% by mass or more for maintaining the mechanical strength. It is more preferable.
Examples of the intermetallic compound containing Fe include Al ₃ Fe, Al ₆ Fe, AlFeSi-based compounds, and AlFeSiMn-based compounds.

Si is an element contained as an inevitable impurity in an Al ingot, which is a raw material, in an amount of about 0.03 to 0.1% by mass, and is often intentionally added in a small amount to prevent variation due to a difference in raw materials. Moreover, Si is an element contained in scrap aluminum. Si exists as a solid solution in aluminum, or as an intermetallic compound or a single precipitate. In addition, when heated in the process of producing a lithographic printing plate support, the dissolved Si may precipitate as elemental Si. According to the knowledge of the present inventors, when the amount of simple Si is excessive, the resistance to severe ink stains may be lowered. Here, “severe ink stains” appear on printed paper as a result of ink becoming more likely to adhere to the non-image area surface portion of a lithographic printing plate when printing is interrupted many times. This refers to dot-like or annular dirt. Si also affects the electrolytic surface roughening treatment.
Furthermore, if the Si content is too large, when anodizing is performed after the surface roughening treatment, defects in the anodized film occur, the water retention of the defective portion is inferior, and the paper tends to become dirty during printing.
In the present invention, the Si content is preferably 0.03% by mass or more, and preferably 0.15% by mass or less. More preferably, it is 0.04 mass% or more, and is 0.1 mass% or less at the point which is excellent in the stability of an electrolytic roughening process.

Cu is a very important element in controlling the electrolytic surface roughening treatment. The Cu content is preferably used in the range of 0.000 to 0.2% by mass. If the Cu content is preferably 0.020% by mass or more, the diameter of the pits generated by the electrolytic surface-roughening treatment in nitric acid solution can be increased. A large amount of water can be secured, and stain resistance is improved. On the other hand, if the Cu content exceeds 0.2% by mass, the diameter of the pits generated by the electrolytic surface-roughening treatment in the nitric acid solution becomes too large and the uniformity of the diameter is lowered. May be inferior.
Further, the present inventor can make the pits having a diameter of 0.5 μm or less generated by electrolytic surface roughening treatment in hydrochloric acid solution by making the Cu content within this range, and also the surface area of the support surface. We found that the rate of increase could be maximized. Since the contact area with the image recording layer can be increased by increasing the increase ratio of the surface area, the adhesion is improved, and the printing durability and the cleaner printing durability are excellent. Further, the stain resistance when the planographic printing plate is obtained is excellent.

Ti has been conventionally contained in a content of 0.05% by mass or less as a crystal refining material in order to make the crystal structure during casting finer. If the Ti content is too high, the resistance of the surface oxide film becomes excessive in the electrolytic surface roughening treatment, particularly in the electrolytic surface roughening treatment with an aqueous nitric acid solution, so that uniform pits may not be formed. In the present invention, the Ti content is preferably 0.05% by mass or less, and more preferably 0.03% by mass or less.
Further, Ti may or may not be contained in the aluminum plate, and the content thereof may be small, but in order to enhance the crystal refining effect, the Ti content is 0.005% by mass or more. It is preferable that it is 0.01 mass% or more.
Ti is mainly added as an intermetallic compound with Al or TiB ₂ , but is preferably added as an Al—Ti alloy or an Al—B—Ti alloy in order to enhance the crystal refining effect. When added as an Al—B—Ti alloy, a small amount of B is contained in the aluminum alloy, but the effect of the present invention is not impaired.

  When an aluminum plate containing the above different elements in the above range is used, uniform and large pits are formed in the electrolytic surface-roughening process described later. Therefore, the sensitivity when using a lithographic printing plate, the resistance to cleaner printing, Chemical properties), printing durability and stain resistance are all excellent.

The balance of the aluminum plate is preferably made of Al and inevitable impurities. Most of the inevitable impurities are contained in the Al ingot. If the inevitable impurities are contained in, for example, a metal having an Al purity of 99.7% by mass, the effects of the present invention are not impaired. For inevitable impurities, see, for example, L.A. F. The amount of impurities described in Mondolfo's “Aluminum Alloys: Structure and properties” (1976) and the like may be contained.
Examples of inevitable impurities contained in the aluminum alloy include Mg, Mn, Zn, Cr, and the like, and each of these may be contained in an amount of 0.05% by mass or less. About elements other than these, you may be contained by conventionally well-known content.

The aluminum plate used in the present invention is appropriately cast using the above-mentioned raw materials and subjected to appropriate rolling treatment or heat treatment to have a thickness of, for example, 0.1 to 0.7 mm, and flatness as necessary. Manufactured with straightening treatment. This thickness can be appropriately changed according to the size of the printing press, the size of the printing plate, and the user's desire.
In addition, as a manufacturing method of the said aluminum plate, the method which abbreviate | omitted soaking and / or annealing treatment from DC casting method, DC casting method, and the continuous casting method can be used, for example.

In the present invention, unevenness can be formed on the aluminum plate as described above by transfer using a transfer roll in the final rolling step or the like.
Above all, along with cold rolling to adjust the final plate thickness, or finish cold rolling to finish the surface shape after final plate thickness adjustment, the uneven surface of the rolling roll is pressed against the aluminum plate to transfer the uneven shape, and the aluminum plate A method of forming a concavo-convex pattern on the surface is preferable. Specifically, the method described in JP-A-6-262203 can be suitably used.
By using an aluminum plate having a concavo-convex pattern on the surface, it is possible to easily adjust the amount of dampening water on the printing press while reducing energy consumed in subsequent electrochemical roughening treatment. it can.

  The transfer is particularly preferably performed in the final cold rolling step of a normal aluminum plate. Rolling for transfer is preferably performed in 1 to 3 passes, and the rolling reduction is preferably 3 to 8%.

  In the present invention, a method of spraying predetermined alumina particles is used as a method of obtaining a transfer roll having irregularities on the surface, which is used for transferring irregularities, and among these, an air blast method is preferred.

  The lithographic printing plate support used in the present invention is obtained by forming at least an anodized film on the aluminum plate and further subjecting it to a sealing treatment, but the production process includes various other processes. It may be included.

The aluminum plate includes a degreasing step for removing the adhering rolling oil, a desmutting step for dissolving the smut on the surface of the aluminum plate, a roughening step for roughening the surface of the aluminum plate, and an anode on the surface of the aluminum plate. It is preferable that a support for a lithographic printing plate is obtained after an anodizing treatment step for forming an oxide film and a sealing treatment for sealing micropores of the anodized film.
The process for producing a lithographic printing plate support used in the present invention comprises a roughening treatment (electrochemical roughening treatment) in which an aluminum plate is electrochemically roughened using an alternating current in an acidic aqueous solution. It is preferable to include.
In addition, the manufacturing process of the lithographic printing plate support used in the present invention includes a mechanical surface roughening treatment, a chemical etching treatment in an acid or alkaline aqueous solution, in addition to the electrochemical surface roughening treatment. You may include the surface treatment process of the combined aluminum plate. The production process such as the roughening treatment of the lithographic printing plate support used in the present invention may be a continuous method or an intermittent method, but it is preferable to use a continuous method industrially.
In the present invention, a hydrophilic treatment is further performed as necessary.

More specifically, (a) mechanical surface roughening treatment, (b) alkali etching treatment, (c) desmut treatment, (d) electrolytic surface roughening treatment using an electrolytic solution mainly composed of nitric acid (nitric acid electrolysis) ), (E) alkali etching treatment, (f) desmut treatment, (g) electrolytic surface roughening treatment using hydrochloric acid as a main component (hydrochloric acid electrolysis), (h) alkali etching treatment, (i) desmut treatment (J) Anodizing treatment, (k) sealing treatment and (l) hydrophilization treatment in this order are preferred.
In addition, from the above method, from (g) to (i), from the above method, from (a), from the above method, from (a) and (g) to (i), from the above method A method in which (a) to (d) are omitted is also preferable.
In addition, it is preferable that the relative speed of the process liquid with respect to the aluminum plate in each process mentioned later is 10-5000 cm / sec.

<Roughening treatment (graining treatment)>
First, the roughening process will be described.
The aluminum plate is grained to a more preferable shape. Examples of the graining method include mechanical graining (mechanical surface roughening), chemical etching, and electrolytic grain as described in JP-A-56-28893. In addition, electrochemical graining (electrochemical roughening, electrolytic graining), which is electrochemically grained in hydrochloric acid electrolyte or nitric acid electrolyte, or the aluminum surface is scratched with metal wire Mechanical graining methods (mechanical roughening treatment) such as brush grain method, ball grain method to grain the aluminum surface with abrasive balls and abrasives, brush grain method to grain the surface with nylon brush and abrasives, etc. Can be used. These graining methods can be used alone or in combination. For example, a combination of a mechanical surface roughening treatment with a nylon brush and an abrasive and an electrolytic surface roughening treatment with a hydrochloric acid electrolytic solution or a nitric acid electrolytic solution, or a combination of a plurality of electrolytic surface roughening treatments may be mentioned. Of these, electrochemical surface roughening is preferred. Moreover, it is also preferable to perform a mechanical surface roughening process and an electrochemical surface roughening process in combination, and it is particularly preferable to perform an electrochemical surface roughening process after the mechanical surface roughening process.

The mechanical roughening treatment is a treatment for mechanically roughening the surface of the aluminum plate using a brush or the like, and is preferably performed before the electrochemical roughening treatment described above.
In a suitable mechanical surface roughening treatment, the treatment is performed with a rotating nylon brush roll having a bristle diameter of 0.07 to 0.57 mm and a slurry of an abrasive supplied to the aluminum plate surface.

The nylon brush preferably has a low water absorption rate. For example, nylon bristle 200T manufactured by Toray Industries, Inc. (6,10-nylon, softening point: 180 ° C., melting point: 212 to 214 ° C., specific gravity: 1.08 to 1.09, Moisture content: 1.4 to 1.8 at 20 ° C. and 65% relative humidity, 2.2 to 2.8 at 20 ° C. and 100% relative humidity, dry tensile strength: 4.5 to 6 g / d, dry tensile elongation Degree: 20-35%, boiling water shrinkage: 1-4%, dry tensile resistance: 39-45 g / d, Young's modulus (dry): 380-440 kg / mm ² ).

  As the abrasive, known ones can be used, but silica sand, quartz, aluminum hydroxide, or a mixture thereof described in JP-A-6-135175 and JP-B-50-40047 is used. Is preferred.

  As a slurry liquid, what has a specific gravity in the range of 1.05-1.3 is preferable. Examples of the method of supplying the slurry liquid to the aluminum plate surface include a method of spraying the slurry liquid, a method of using a wire brush, and a method of transferring the surface shape of the uneven roll to the aluminum plate. Moreover, you may use the method described in Unexamined-Japanese-Patent No. 55-74898, 61-162351, and 63-104889. Furthermore, as described in JP-A-9-509108, an aluminum plate in an aqueous slurry comprising a mixture of particles made of alumina and quartz at a mass ratio in the range of 95: 5 to 5:95. A method of brush polishing the surface can also be used. The average particle size of the mixture at this time is preferably in the range of 1 to 40 μm, particularly 1 to 20 μm.

The electrochemical surface roughening treatment is a step of electrochemically roughening the surface of the aluminum plate in an acidic aqueous solution through an alternating current using the aluminum plate as an electrode. Is different.
In the present invention, in the electrochemical surface roughening treatment, the amount of electricity when the aluminum plate becomes a cathode, that is, the amount of electricity at cathode Q _C, and the amount of electricity when it becomes an anode, ie, amount of electricity at the time of anode the ratio Q _C / Q _a and Q _a, for example, by in the range of 0.5 to 2.0, it is possible to produce a uniform honeycomb pits on the surface of the aluminum plate. If Q _C / Q _A is less than 0.50, non-uniform honeycomb pits are likely to be formed, and even if it exceeds 2.0, non-uniform honeycomb pits are likely to be formed. Q _C / Q _A is preferably in the range of 0.8 to 1.5.

Examples of the alternating current waveform used for the electrochemical surface roughening treatment include a sine wave, a rectangular wave, a triangular wave, and a trapezoidal wave. Among these, a rectangular wave or a trapezoidal wave is preferable. In addition, the frequency of the alternating current is preferably 30 to 200 Hz, more preferably 40 to 120 Hz, and further preferably 50 to 60 Hz, from the viewpoint of the cost of manufacturing the power supply device.
An example of a trapezoidal wave preferably used in the present invention is shown in FIG. In FIG. 2, the vertical axis indicates the current value, and the horizontal axis indicates time. Further, ta is the anode reaction time, tc is the cathode reaction time, tp is the time until the current value reaches the peak on the cathode cycle side from zero, and tp ′ is the time until the current value reaches the peak on the anode cycle side from zero. , Ia represents a peak current on the anode cycle side, and Ic represents a peak current on the cathode cycle side. When a trapezoidal wave is used as the waveform of the alternating current, the time tp and tp ′ until the current reaches a peak from zero is preferably 0.1 to 2 msec, and more preferably 0.3 to 1.5 msec. preferable. If tp and tp ′ are less than 0.1 msec, the impedance of the power supply circuit is affected, and a large power supply voltage is required when the current waveform rises, which may increase the equipment cost of the power supply. On the other hand, when tp and tp ′ exceed 2 msec, the influence of trace components in the acidic aqueous solution increases, and it may be difficult to perform a uniform roughening treatment.

  Further, the duty of the alternating current used for the electrochemical surface roughening treatment is preferably in the range of 0.25 to 0.75 from the point of uniformly roughening the aluminum plate surface, More preferably, it is within the range of 0.6. The duty in the present invention refers to ta / T, where ta is the time during which the anode reaction of the aluminum plate continues in the period T of the alternating current (anode reaction time). In particular, on the surface of the aluminum plate during the cathode reaction, in addition to the formation of smut components mainly composed of aluminum hydroxide, dissolution and destruction of the oxide film occurred, and the start of the pitting reaction during the anode reaction of the next aluminum plate Therefore, the selection of the duty of the alternating current has a great effect on uniform roughening.

In the case of a trapezoidal wave or a rectangular wave, the alternating current current density is preferably such that the peak current density Iap on the anode cycle side and the peak current density Icp on the cathode cycle side are 10 to 200 A / dm ² , respectively. Icp / Iap is preferably in the range of 0.9 to 1.5.
In electrochemical graining treatment, total amount of electricity used in the anode reaction of the aluminum plate at the time electrochemical graining treatment has been completed is preferably from 50~1000C / dm ^2. The electrochemical surface roughening treatment time is preferably 1 second to 30 minutes.

  As the acidic aqueous solution used for the electrochemical surface roughening treatment, those used for the electrochemical surface roughening treatment using a normal direct current or alternating current can be used, and among them, the acidic aqueous solution mainly composed of nitric acid. Alternatively, it is preferable to use an acidic aqueous solution mainly composed of hydrochloric acid. Here, “mainly” means that the main component is contained in the aqueous solution in an amount of 30% by mass or more, preferably 50% by mass or more based on the total components. Hereinafter, the same applies to other components.

  As the acidic aqueous solution mainly composed of nitric acid, as described above, those used for the electrochemical surface roughening treatment using a normal direct current or alternating current can be used. For example, one or more of nitric acid compounds such as aluminum nitrate, sodium nitrate and ammonium nitrate are added to a nitric acid aqueous solution having a nitric acid concentration of 5 to 15 g / L at a concentration from 0.01 g / L to saturation. be able to. In the acidic aqueous solution mainly composed of nitric acid, a metal contained in an aluminum alloy such as iron, copper, manganese, nickel, titanium, magnesium, or silicon may be dissolved.

  As the acidic aqueous solution mainly composed of nitric acid, nitric acid, aluminum salt, and nitrate are contained, and aluminum ion is 1 to 15 g / L, preferably 1 to 10 g / L, and ammonium ion is 10 to 300 ppm. Thus, it is preferable to use a solution obtained by adding aluminum nitrate and ammonium nitrate to an aqueous nitric acid solution having a nitric acid concentration of 5 to 15 g / L. The aluminum ions and ammonium ions increase spontaneously during the electrochemical surface roughening treatment. Moreover, it is preferable that the liquid temperature in this case is 10-95 degreeC, It is more preferable that it is 20-90 degreeC, It is especially preferable that it is 30-70 degreeC.

As the acidic aqueous solution mainly composed of nitric acid, as described above, those used for the electrochemical surface roughening treatment using a normal direct current or alternating current can be used. For example, at least one hydrochloric acid compound having a hydrochloric acid ion such as aluminum chloride, sodium chloride, ammonium chloride is added to an aqueous solution of hydrochloric acid having a concentration of 1 to 100 g / L in a range from 1 g / L to saturation. be able to. Moreover, the metal contained in aluminum alloys, such as iron, copper, manganese, nickel, titanium, magnesium, a silica, may melt | dissolve in the aqueous solution containing hydrochloric acid.
Specifically, a solution prepared by dissolving aluminum chloride in an aqueous hydrochloric acid solution having a hydrochloric acid concentration of 2 to 10 g / L to adjust the aluminum ion concentration to 3 to 7 g / L is preferable.

  The temperature of the aqueous solution containing hydrochloric acid is preferably 25 ° C. or higher, more preferably 30 ° C. or higher, more preferably 55 ° C. or lower, and even more preferably 40 ° C. or lower.

Since hydrochloric acid has a strong aluminum dissolving power, it is possible to form fine irregularities on the surface with only slight electrolysis. These fine irregularities have an average opening diameter of 0.01 to 0.2 μm and are uniformly generated on the entire surface of the aluminum plate.
Further, as the amount of electricity is increased, pits having an average opening diameter of 1 to 15 μm having pits having an average opening diameter of 0.01 to 0.4 μm on the surface are generated. In order to obtain such a grain, the total amount of electricity involved in the anode reaction of the aluminum plate at the time when the electrolytic reaction is completed is preferably 10 C / dm ² or more, and more preferably 50 C / dm ² or more. Is more preferable, and more preferably 100 C / dm ² or more. But preferably not more 2000C / dm ² or less, more preferably 600C / dm ² or less.

In the electrochemical surface roughening treatment, a known electrolytic device such as a vertical type, a flat type, or a radial type can be used, but a radial type electrolytic device as described in JP-A-5-195300 is used. Particularly preferred.
FIG. 3 is a schematic diagram of a radial electrolyzer suitably used in the present invention. In FIG. 3, the radial electrolysis apparatus has an aluminum plate 11 wound around a radial drum roller 12 disposed in a main electrolytic cell 21 and electrolyzed by main poles 13 a and 13 b connected to an AC power supply 20 in the course of conveyance. Is done. The acidic aqueous solution 14 is supplied from the solution supply port 15 through the slit 16 to the solution passage 17 between the radial drum roller 12 and the main poles 13a and 13b.
Next, the aluminum plate 11 treated in the main electrolytic cell 21 is subjected to electrolytic treatment in the auxiliary anode cell 22. An auxiliary anode 18 is disposed opposite to the aluminum plate 11 in the auxiliary anode tank 22, and the acidic aqueous solution 14 is supplied so as to flow between the auxiliary anode 18 and the aluminum plate 11. Note that the current flowing through the auxiliary electrode is controlled by the thyristors 19a and 19b.
In the illustrated example, the auxiliary anode tank is disposed on the rear side of the main electrolytic cell, but in the present invention, the auxiliary anode tank may be on the front side or the rear side of the main electrolytic cell, and on both sides. There may be.

The main electrodes 13a and 13b can be selected from carbon, platinum, titanium, niobium, zirconium, stainless steel, electrodes used for cathodes for fuel cells, etc., and carbon is particularly preferable. As the carbon, commercially available impervious graphite for chemical devices, resin cored graphite, and the like can be used.
The auxiliary anode 18 can be selected from known oxygen generating electrodes such as ferrite, iridium oxide, platinum, or platinum clad or plated with a valve metal such as titanium, niobium or zirconium.

The supply direction of the acidic aqueous solution passing through the main electrolytic cell 21 and the auxiliary anode cell 22 may be parallel to the progress of the aluminum plate 11 or a counter.
One electrolysis apparatus can be connected to one or more AC power supplies. Two or more electrolysis devices may be used, and electrolysis conditions in each device may be the same or different.
In addition, after the electrolytic treatment is completed, it is preferable to perform liquid drainage by a nip roller and water washing by spraying so that the treatment liquid is not taken out to the next process.

  In the case of using the above electrolyzer, for example, (i) the conductivity of the acid aqueous solution and (ii) the ultrasonic wave propagation velocity ( iii) Based on the nitric acid and aluminum ion concentrations determined from the temperature, add while adjusting the addition amount of nitric acid and water, and sequentially overflow the acidic aqueous solution with the same volume as the addition volume of nitric acid and water from the electrolyzer. It is preferable to keep the concentration of the acidic aqueous solution constant by discharging.

  Next, the surface treatments such as chemical etching treatment and desmut treatment in acidic aqueous solution or alkaline aqueous solution will be described in order. The surface treatment is performed before the electrochemical roughening treatment or after the electrochemical roughening treatment and before an anodic oxidation treatment described later. However, the description of each surface treatment below is an exemplification, and the present invention is not limited to the contents of each surface treatment below. In addition, the following treatments including the surface treatment are optionally performed.

<Alkaline etching treatment>
The alkali etching treatment is a treatment for chemically etching the surface of the aluminum plate in an alkaline aqueous solution, and is preferably performed before and after the electrochemical roughening treatment. Moreover, when performing a mechanical surface roughening process before an electrochemical surface roughening process, it is preferable to carry out after a mechanical surface roughening process. The alkali etching treatment is more advantageous than the acid etching treatment described later because the fine structure can be destroyed in a short time.
Examples of the alkaline aqueous solution used for the alkali etching treatment include an aqueous solution containing one or more of caustic soda, sodium carbonate, sodium aluminate, sodium metasilicate, sodium phosphate, potassium hydroxide, lithium hydroxide and the like. . In particular, an aqueous solution mainly composed of sodium hydroxide (caustic soda) is preferable. The alkaline aqueous solution may contain 0.5 to 10% by mass of alloy components contained in the aluminum plate as well as aluminum.
The concentration of the alkaline aqueous solution is preferably 1 to 50% by mass, and more preferably 1 to 30% by mass.

The alkaline etching treatment is preferably carried out by treating the alkaline aqueous solution at a temperature of 20 to 100 ° C., preferably 40 to 80 ° C., and treating for 1 to 120 seconds, preferably 2 to 60 seconds. Dissolution amount of aluminum, if carried out after mechanical graining treatment is preferably from 5 to 20 g / m ^2, if carried out after the electrochemical graining treatment is 0.01 to 10 g / m ² Preferably there is. When mixing a chemical etching solution in an alkaline aqueous solution first, it is preferable to prepare a treatment solution using liquid sodium hydroxide (caustic soda) and sodium aluminate (sodium aluminate).
In addition, after the alkali etching process is completed, it is preferable to perform liquid drainage with a nip roller and water washing with a spray so that the processing liquid is not taken out to the next process.

  When the alkali etching treatment is performed after the electrochemical surface roughening treatment, smut generated by the electrochemical surface roughening treatment can be removed. As such an alkali etching treatment, for example, a method of contacting with 15 to 65 mass% sulfuric acid at a temperature of 50 to 90 ° C. as described in JP-A-53-12739 and JP-B-48-28123. A method for performing alkali etching described in Japanese Patent Publication No. JP-A-2000-133 is preferred.

<Acid etching process>
The acidic etching treatment is a treatment for chemically etching the aluminum plate in an acidic aqueous solution, and is preferably performed after the electrochemical surface roughening treatment. Moreover, when performing the said alkali etching process before and / or after the said electrochemical roughening process, it is also preferable to perform an acidic etching process after an alkali etching process.
When the above-mentioned alkaline etching treatment is performed on the aluminum plate and then the above-mentioned acidic etching treatment is performed, the intermetallic compound containing silica or simple substance Si on the surface of the aluminum plate can be removed, and the anodic oxidation generated in the subsequent anodizing treatment Film defects can be eliminated. As a result, it is possible to prevent the trouble that the dot-like ink adheres to the non-image portion called “dirty stain” during printing.

  Examples of the acidic aqueous solution used for the acidic etching treatment include an aqueous solution containing phosphoric acid, nitric acid, sulfuric acid, chromic acid, hydrochloric acid, or a mixed acid of two or more of these. Of these, a sulfuric acid aqueous solution is preferable. The concentration of the acidic aqueous solution is preferably 50 to 500 g / L. The acidic aqueous solution may contain an alloy component contained in the aluminum plate as well as aluminum.

The acidic etching treatment is preferably performed by treating the liquid temperature at 60 to 90 ° C., preferably 70 to 80 ° C., for 1 to 10 seconds. The amount of dissolution of the aluminum plate at this time is preferably 0.001 to 0.2 g / m ² . The acid concentration, for example, the sulfuric acid concentration and the aluminum ion concentration are preferably selected from a range that does not crystallize at room temperature. A preferable aluminum ion concentration is 0.1 to 50 g / L, and particularly preferably 5 to 15 g / L.
In addition, after the acidic etching process is completed, in order not to take out the processing liquid to the next process, it is preferable to perform liquid drainage by a nip roller and water washing by spraying.

<Desmut treatment>
When performing the alkali etching treatment before and / or after the electrochemical surface roughening treatment, smut is generally generated on the surface of the aluminum plate by the alkali etching treatment, so that phosphoric acid, nitric acid, sulfuric acid, chromic acid, The so-called desmut treatment, in which the smut is dissolved in an acidic solution containing hydrochloric acid, hydrofluoric acid, borofluoric acid, or a mixed acid of two or more of these, is preferably performed after the alkali etching treatment. In addition, after an alkali etching process, it is enough to perform any one of an acidic etching process and a desmut process.

The concentration of the acidic solution is preferably 1 to 500 g / L. 0.001 to 50 g / L of the alloy component contained in the aluminum plate as well as aluminum may be dissolved in the acidic solution.
The liquid temperature of the acidic solution is preferably 20 ° C to 95 ° C, more preferably 30 to 70 ° C. Moreover, it is preferable that processing time is 1-120 second, and it is more preferable that it is 2-60 second.
In addition, as the desmutting treatment liquid (acid solution), it is possible to use the waste solution of the acidic aqueous solution used in the electrochemical surface roughening treatment or the waste solution of the acidic aqueous solution used in the anodizing treatment described later in order to reduce the amount of waste liquid. Is preferable.
After the desmutting process is completed, it is preferable to perform liquid drainage by a nip roller and water washing by spraying so that the processing liquid is not taken out to the next process.

<Anodizing treatment>
As described above, the anodized film is formed by anodizing the aluminum plate that has been subjected to each treatment as necessary.
The anodizing treatment can be performed by a method conventionally used in this field. Specifically, when direct current or alternating current is applied to an aluminum plate in an aqueous solution or non-aqueous solution of sulfuric acid, phosphoric acid, chromic acid, oxalic acid, sulfamic acid, benzenesulfonic acid, etc., alone or in combination of two or more. An anodized film can be formed on the surface of the aluminum plate.
The conditions for anodizing treatment vary depending on the electrolyte used, and thus cannot be determined in general. In general, the electrolyte concentration is 1 to 80% by mass, the solution temperature is 5 to 70 ° C., and the current density is 0.5. ˜60 A / dm ² , voltage 1 to 200 V, electrolysis time 1 to 1000 seconds are appropriate.
Among these anodizing treatments, a method for anodizing at a high current density in a sulfuric acid electrolyte solution described in British Patent 1,412,768, and US Pat. No. 3,511,661. A method of anodizing treatment using phosphoric acid as an electrolytic bath is preferable. Further, multi-stage anodizing treatment such as anodizing treatment in sulfuric acid and further anodizing treatment in phosphoric acid can be performed.

In the present invention, the anodic oxide film is preferably 0.5 g / m ² or more, more preferably 1.0 g / m ² or more, in terms of scratch resistance and printing durability. particularly preferably at .0g / m ² or more, in view that it requires a large amount of energy in order to provide a thicker coating is preferably at 100 g / m ² or less, 10 g / m ² or less It is more preferable that it is 6 g / m ² or less.

  On the surface of the anodized film, fine recesses called micropores are uniformly distributed. The density of the micropores present in the anodized film can be adjusted by appropriately selecting the treatment conditions.

<Sealing treatment>
In the present invention, after an anodized film is formed on the aluminum plate as described above, a sealing treatment is performed. By this sealing treatment, the pore diameter of the micropores of the anodic oxide film is reduced, so that it is possible to prevent the image recording layer from entering the micropores during the production of the lithographic printing plate precursor. The property is greatly improved.
In addition, this sealing treatment can reduce the amount of the remaining film of the image recording layer after on-press development, thereby making the surface of the non-image area of the lithographic printing plate hydrophilic, which is resistant to damage. The soiling property is excellent. In addition, the pore diameter of the micropores of the anodic oxide film is reduced by this sealing treatment, thereby suppressing the ink from entering during printing, so that the stain resistance is excellent also in this respect. .
Furthermore, if vapor sealing is used for this sealing processing, it is possible to form fine irregularities with Ra of 5 to 50 nm and pitch of 10 to 100 nm on the surface of the lithographic printing plate support. The surface area of the support is increased, thereby improving the adhesion with the image recording layer, so that the sensitivity and chemical resistance are excellent.

  The sealing treatment used in the present invention is performed using an aqueous solution (sealing treatment liquid) containing a fluorine compound and a phosphoric acid compound. The phosphoric acid compound improves the hydrophilicity of the surface of the anodized film and improves the developability and stain resistance.

As the fluorine compound, a metal fluoride is preferably exemplified.
Specifically, for example, sodium fluoride, potassium fluoride, calcium fluoride, magnesium fluoride, sodium fluoride zirconate, potassium fluoride zirconate, sodium fluoride titanate, potassium fluoride titanate, zircon fluoride Ammonium acid, ammonium fluoride titanate, potassium fluoride titanate, zirconate fluoride, titanate fluoride, hexafluorosilicic acid, nickel fluoride, iron fluoride, phosphor fluoride, ammonium fluoride phosphate It is done. Of these, sodium fluorinated zirconate, sodium fluorinated titanate, fluorinated zirconic acid, and fluorinated titanic acid are preferable.

Suitable examples of the phosphoric acid compound include phosphates of metals such as alkali metals and alkaline earth metals.
Specifically, for example, zinc phosphate, aluminum phosphate, ammonium phosphate, diammonium hydrogen phosphate, ammonium dihydrogen phosphate, monoammonium phosphate, monopotassium phosphate, monosodium phosphate, dihydrogen phosphate Potassium, dipotassium hydrogen phosphate, calcium phosphate, sodium ammonium hydrogen phosphate, magnesium hydrogen phosphate, magnesium phosphate, ferrous phosphate, ferric phosphate, sodium dihydrogen phosphate, sodium phosphate, hydrogen phosphate Disodium, lead phosphate, diammonium phosphate, calcium dihydrogen phosphate, lithium phosphate, phosphotungstic acid, phosphotungstic acid, sodium phosphotungstate, ammonium phosphomolybdate, sodium phosphomolybdate, sodium phosphite , Tripolyphosphate Potassium, and sodium pyrophosphate. Among these, sodium dihydrogen phosphate, disodium hydrogen phosphate, potassium dihydrogen phosphate, and dipotassium hydrogen phosphate are preferable.

  The combination of the fluorine compound and the phosphoric acid compound is not particularly limited, but it is preferable that the fluorine compound is sodium zirconate fluoride and the phosphate compound is sodium dihydrogen phosphate.

The concentration of the fluorine compound in the aqueous solution is preferably 0.5 g / L or more, more preferably 0.8 g / L or more in terms of sufficiently sealing the micropores of the anodized film. Moreover, it is preferable that it is 4.0 g / L or less at the point from which a waste-liquid process cost becomes low, and it is more preferable that it is 2.5 g / L or less.
The fluorine ion concentration contained in the sealing treatment liquid is preferably 290 mg / L or more, more preferably 460 mg / L or more, and preferably 2200 mg / L or less, 1400 mg / L or less. It is more preferable that

The concentration of the phosphoric acid compound in the aqueous solution is preferably 1.0 g / L or more, more preferably 1.5 g / L or more from the viewpoint of sufficiently imparting hydrophilicity, and the waste liquid treatment cost. Is preferably 10.0 g / L or less, and more preferably 4.0 g / L or less.
The phosphate ion concentration contained in the sealing treatment liquid is preferably 610 mg / L or more, more preferably 920 mg / L or more, and preferably 6000 mg / L or less, 2400 mg / L. The following is more preferable.

  The ratio of each compound in the aqueous solution is not particularly limited, but the mass ratio of the fluorine compound and the phosphoric acid compound is preferably 1/200 to 10/1, more preferably 1/30 to 2/1. preferable.

  The water used for the aqueous solution is preferably well water or pure water (ion exchange water). Among these, pure water (ion exchange water) is preferably used from the viewpoint of preventing the aqueous solution from becoming cloudy due to reaction of calcium and / or magnesium in water with fluorine ions and / or phosphate ions.

Further, the temperature of the aqueous solution is preferably 40 ° C. or higher, more preferably 60 ° C. or higher, in order to sufficiently seal the micropores of the anodized film, and also suppresses evaporation of water. In this respect, the temperature is preferably 95 ° C. or lower, and more preferably 80 ° C. or lower.
The aqueous solution preferably has a pH of 3.0 or more, more preferably has a pH of 3.2 or more, preferably has a pH of 5.0 or less, and more preferably has a pH of 3.8 or less. Within the above range, the micropores of the anodized film are more fully sealed.
During the sealing treatment, pH control is always performed, and the pH is preferably adjusted by adding phosphoric acid or sodium hydroxide.

The manufacturing method of aqueous solution is not specifically limited, It can obtain by dissolving a fluorine compound and a phosphoric acid compound in water. In this case, the fluorine compound and the phosphate compound may be dissolved in water simultaneously or sequentially, or at least one of the fluorine compound and the phosphate compound may be dissolved in water and then mixed.
When using a phosphoric acid compound and a fluorine compound in powder form, it is preferable to first dissolve the fluorine compound in water in order to promote dissociation of the fluorine compound.

The method for sealing treatment with an aqueous solution containing a fluorine compound is not particularly limited, and examples thereof include a dipping method and a spray method. These may be used alone or in combination, or may be used in combination of two or more.
Of these, the spray method is preferred. According to the spray method, since the back surface of the aluminum plate is not treated, fatigue of the sealing treatment liquid is reduced, so that the amount used is reduced.

Aluminum is eluted in the sealing treatment solution, but the aluminum ion concentration is preferably controlled within the range of 10 to 250 mg / L, more preferably within the range of 100 to 200 mg / L. When the aluminum ion concentration is 10 mg / L or more, the renewal amount of the sealing treatment liquid can be suppressed. In addition, when the aluminum ion concentration is 250 mg / L or less, sodium fluoroaluminate (Na ₃ AlF ₆ , cryolite) and aluminum phosphate are less likely to precipitate, and clogging is difficult when filtered with a filter.
The aluminum ion concentration is managed by adjusting the renewal amount of the sealing treatment liquid.

Further, the sealing treatment liquid contains sulfuric acid ions by bringing sulfuric acid from the anodizing treatment step or dissolving SO ₄ contained in the anodized film. The concentration of sulfate ions is preferably 10 to 200 mg / L, and more preferably 50 to 150 mg / L. When the sulfate ion concentration is 10 mg / L or more, the renewal amount of the sealing treatment liquid can be suppressed. Further, when the sulfate ion concentration is 200 mg / L or less, the influence on the electric conductivity of the sealing treatment liquid is reduced, and more accurate concentration measurement is possible.

  In the method for producing a lithographic printing plate support of the present invention, in this sealing treatment, the concentration of the fluorine compound and phosphoric acid compound in the aqueous solution is controlled by the above-described concentration control method of the present invention. Either the first density control method or the second density control method may be used.

In addition, the sealing treatment prevents the liquid from becoming cloudy by reacting the eluted aluminum with sodium, fluorine and phosphoric acid in the sealing treatment liquid to produce sodium fluorinated aluminate and aluminum phosphate. While filtering with a filter and removing these with a sedimentation tank, it is preferable that the sealing treatment liquid in the circulation tank is always filtered with a filter.
In addition, since the filter is likely to be clogged, it is preferable to provide two or more strainers, manage the pressure of the filter, and perform clogging processing while switching the filter while removing the residue by backwashing the clogged filter. .

<Hydrophilic treatment>
In the present invention, it is preferable to perform a hydrophilic treatment after the sealing treatment. Examples of the hydrophilization treatment include phosphomolybdate treatment described in US Pat. No. 3,201,247, alkyl titanate treatment described in British Patent No. 1,108,559, and German patent. Polyacrylic acid treatment described in US Pat. No. 1,091,433, polyvinyl phosphones described in German Patent No. 1,134,093 and British Patent No. 1,230,447 Acid treatment, phosphonic acid treatment described in JP-B 44-6409, phytic acid treatment described in US Pat. No. 3,307,951, JP-A 58-16893 and JP Treatment with a salt of a lipophilic organic polymer compound and a divalent metal described in JP-A-58-18291, described in US Pat. No. 3,860,426 As shown in the drawing, a treatment for providing an undercoat layer of a hydrophilic cellulose (for example, carboxymethylcellulose) containing a water-soluble metal salt (for example, zinc acetate), a sulfo group described in JP-A-59-101651 The process which undercoats the water-soluble polymer which has is mentioned.

Further, phosphates described in JP-A-62-19494, water-soluble epoxy compounds described in JP-A-62-33692, and JP-A-62-97892 Phosphoric acid-modified starch, diamine compounds described in JP-A-63-56498, inorganic or organic acids of amino acids described in JP-A-63-130391, JP-A-63-145092 Organic phosphonic acids containing a carboxy group or hydroxy group, compounds having an amino group and a phosphonic acid group described in JP-A-63-165183, and JP-A-2-316290 Specific carboxylic acid derivatives, phosphate esters described in JP-A-3-215095, and JP-A-3-261592 A compound having one amino group and one oxygen acid group of phosphorus, a phosphoric acid ester described in JP-A-3-215095, and a phenylphosphone described in JP-A-5-246171 Aliphatic or aromatic phosphonic acids such as acids, compounds containing S atoms such as thiosalicylic acid described in JP-A-1-307745, phosphorus oxyacids described in JP-A-4-282737 A treatment by undercoating using a compound having the above group is also included.
Further, coloring with an acid dye described in JP-A-60-64352 can also be performed.

  Hydrophilicity can also be achieved by soaking in an aqueous solution of an alkali metal silicate such as sodium silicate or potassium silicate, or by applying a hydrophilic vinyl polymer or hydrophilic compound to form a hydrophilic primer layer. It is preferable to carry out the treatment.

Hydrophilization treatment with an aqueous solution of an alkali metal silicate such as sodium silicate and potassium silicate is described in US Pat. No. 2,714,066 and US Pat. No. 3,181,461. It can be performed according to methods and procedures.
Examples of the alkali metal silicate include sodium silicate, potassium silicate, and lithium silicate. The aqueous solution of alkali metal silicate may contain an appropriate amount of sodium hydroxide, potassium hydroxide, lithium hydroxide or the like.

  The aqueous solution of alkali metal silicate may contain an alkaline earth metal salt or a Group 4 (Group IVA) metal salt. Examples of the alkaline earth metal salt include nitrates such as calcium nitrate, strontium nitrate, magnesium nitrate, and barium nitrate; sulfates; hydrochlorides; phosphates; acetates; oxalates; Examples of the Group 4 (Group IVA) metal salt include titanium tetrachloride, titanium trichloride, potassium fluoride titanium, potassium oxalate, titanium sulfate, titanium tetraiodide, zirconium chloride, zirconium dioxide, zirconium oxychloride. And zirconium tetrachloride. These alkaline earth metal salts and Group 4 (Group IVA) metal salts are used alone or in combination of two or more.

The hydrophilization treatment by forming a hydrophilic undercoat layer can also be performed according to the conditions and procedures described in JP-A Nos. 59-101651 and 60-149491.
Examples of the hydrophilic vinyl polymer used in this method include polyvinyl sulfonic acid, a sulfo group-containing vinyl polymerizable compound such as p-styrene sulfonic acid having a sulfo group, and ordinary vinyl polymerization such as (meth) acrylic acid alkyl ester. And a copolymer with a functional compound. Examples of hydrophilic compounds that may be used in this method include, -NH ₂ group, compounds having at least one selected from the group consisting of -COOH group and sulfo group.

The hydrophilization treatment is preferably performed at a temperature in the range of 20 to 100 ° C, more preferably at a temperature in the range of 20 to 75 ° C.
The method for the hydrophilic treatment is not particularly limited, but a dipping method and a spray method are preferably exemplified.
In the case of the dipping method, the dipping time is preferably 1 second or longer, more preferably 3 seconds or longer, 100 seconds or shorter, more preferably 20 seconds or shorter.

<Back coat layer>
The support for a lithographic printing plate obtained as described above has a back surface (a surface on which the image recording layer is not provided) so that the image recording layer is not damaged even if it is overlaid when the lithographic printing plate precursor is used. ) May be provided with a coating layer made of an organic polymer compound (hereinafter also referred to as “backcoat layer”) as necessary.
As a main component of the back coat layer, at least one resin selected from the group consisting of a saturated copolymerized polyester resin, a phenoxy resin, a polyvinyl acetal resin, and a vinylidene chloride copolymer resin having a glass transition point of 20 ° C. or higher is used. Is preferred.

  The saturated copolyester resin is composed of a dicarboxylic acid unit and a diol unit. Examples of the dicarboxylic acid unit include aromatic dicarboxylic acids such as phthalic acid, terephthalic acid, isophthalic acid, tetrabromophthalic acid, and tetrachlorophthalic acid; adipic acid, azelaic acid, succinic acid, oxalic acid, suberic acid, and sebacic acid , Saturated aliphatic dicarboxylic acids such as malonic acid and 1,4-cyclohexanedicarboxylic acid.

  The backcoat layer further comprises a dye or pigment for coloring, a silane coupling agent for improving the adhesion to the support, a diazo resin comprising a diazonium salt, an organic phosphonic acid, an organic phosphoric acid, a cationic polymer, Wax, higher fatty acids, higher fatty acid amides, silicone compounds composed of dimethylsiloxane, modified dimethylsiloxane, polyethylene powder and the like that are usually used as slipping agents can be appropriately contained.

  The thickness of the backcoat layer may basically be such that even if no interleaf is present, the recording layer to be described later is hardly damaged, and is preferably 0.01 to 8 μm. When the thickness is less than 0.01 μm, it is difficult to prevent the recording layer from being scratched when the planographic printing plate precursors are handled in layers. On the other hand, when the thickness exceeds 8 μm, the backcoat layer swells due to chemicals used around the lithographic printing plate during printing, the thickness varies, and the printing pressure may change to deteriorate the printing characteristics.

  Various methods can be used as a method of providing the back coat layer on the back surface of the support. For example, a method in which the above components for the back coat layer are dissolved in an appropriate solvent and applied as a solution, or applied as an emulsified dispersion and dried; a pre-molded film is supported with an adhesive or heat The method of bonding to a body; The method of forming a molten film with a melt extruder and bonding to a support body is mentioned. The most preferable method for securing a suitable thickness is a method in which the components for the backcoat layer are dissolved in a suitable solvent, applied as a solution, and dried. In this method, an organic solvent as described in JP-A-62-251739 can be used alone or in combination as a solvent.

  In the production of a lithographic printing plate precursor, either the back coat layer on the back surface or the image recording layer on the front surface may be provided on the support first, or both may be provided simultaneously.

  Since the method for producing a lithographic printing plate support of the present invention uses the above-described measurement method of the present invention in the sealing treatment, the obtained lithographic printing plate support is a case of continuous production. Even so, the quality is constant.

<Image recording layer>
The lithographic printing plate support obtained by the present invention can be provided with an image recording layer to form a lithographic printing plate precursor. A photosensitive composition is used for the image recording layer.
Examples of the photosensitive composition suitably used in the present invention include a thermal positive photosensitive composition containing an alkali-soluble polymer compound and a photothermal conversion substance (hereinafter, this composition and an image recording layer using the same). ), A thermal negative photosensitive composition containing a curable compound and a photothermal conversion substance (hereinafter also referred to as “thermal negative type”), a photopolymerizable photosensitive composition (hereinafter referred to as “thermal positive type”). , Also referred to as “photopolymer type”), negative photosensitive composition containing diazo resin or photocrosslinking resin (hereinafter also referred to as “conventional negative type”), and positive photosensitive composition containing quinonediazide compound. Product (hereinafter also referred to as “conventional positive type”), a photosensitive composition that does not require a special development step (hereinafter referred to as “the conventional positive type”). As the referred to as "non-treatment type".), And the like.
Further, the support for a lithographic printing plate obtained by the present invention is a thermal positive type, a thermal negative type, or the like, which carries digitized image information on a high-convergence radiation such as a laser beam, and uses that light. It is suitably used for computer-to-plate (CTP) technology in which a lithographic printing plate precursor is scanned and exposed to directly produce a lithographic printing plate without using a lithographic film.
Hereinafter, these suitable photosensitive compositions will be described.

<Thermal positive type>
<Photosensitive layer>
The thermal positive type photosensitive composition contains an alkali-soluble polymer compound and a photothermal conversion substance. In the thermal positive type image recording layer, the photothermal conversion substance converts the energy of light such as infrared lasers into heat, and the heat efficiently cancels the interaction that reduces the alkali solubility of the alkali-soluble polymer compound. To do.

Examples of the alkali-soluble polymer compound include a resin containing an acidic group in the molecule and a mixture of two or more thereof. In particular, a phenolic hydroxy group, sulfonamide group (in -SO ₂ NH-R (wherein, R represents a hydrocarbon group.)), Active imino group _{(-SO 2 NHCOR, -SO 2 NHSO} 2 R, -CONHSO A resin having an acidic group such as ₂ R (wherein R has the same meaning as described above) is preferable in terms of solubility in an alkali developer.
In particular, a resin having a phenolic hydroxy group is preferable in that it has excellent image-forming properties when exposed to light such as an infrared laser, and examples thereof include phenol-formaldehyde resins, m-cresol-formaldehyde resins, p-cresol-formaldehyde resins, m- / p-mixed cresol-formaldehyde resin, phenol / cresol (any of m-, p- and m- / p-mixed) mixed-formaldehyde resin (phenol-cresol-formaldehyde co-condensation resin) and other novolak resins Are preferable.
Furthermore, the polymer compound described in JP-A No. 2001-305722 (particularly [0023] to [0042]), and the repetition represented by the general formula (1) described in JP-A No. 2001-215893 Preferred examples also include polymer compounds containing units, and polymer compounds described in JP-A No. 2002-311570 (particularly [0107]).

  Preferable examples of the photothermal conversion substance include pigments or dyes having a light absorption region in the infrared region having a wavelength of 700 to 1200 nm from the viewpoint of recording sensitivity. Examples of the dye include azo dyes, metal complex azo dyes, pyrazolone azo dyes, naphthoquinone dyes, anthraquinone dyes, phthalocyanine dyes, carbonium dyes, quinoneimine dyes, methine dyes, cyanine dyes, squarylium dyes, pyrylium salts, metal thiolate complexes (for example, , Nickel thiolate complex). Among these, cyanine dyes are preferable, and cyanine dyes represented by the general formula (I) described in JP 2001-305722 A are particularly preferable.

The thermal positive type photosensitive composition may contain a dissolution inhibitor. As the dissolution inhibitor, for example, dissolution inhibitors described in JP-A-2001-305722, [0053] to [0055] are preferably exemplified.
In addition, in the thermal positive type photosensitive composition, as a additive, a sensitivity modifier, a printing agent for obtaining a visible image immediately after heating by exposure, a compound such as a dye as an image colorant, a coating property In addition, it is preferable to include a surfactant for improving the processing stability. For these, compounds described in JP-A-2001-305722, [0056] to [0060] are preferable.
The photosensitive composition described in detail in Japanese Patent Application Laid-Open No. 2001-305722 is also preferably used in other respects.

Further, the thermal positive type image recording layer is not limited to a single layer but may have a two-layer structure.
As an image recording layer having a two-layer structure (multilayer image recording layer), a lower layer (hereinafter referred to as “A layer”) having excellent printing durability and solvent resistance is provided on the side close to the support, and a positive layer is provided thereon. A type provided with a layer having excellent image formability (hereinafter referred to as “B layer”) is preferable. This type has high sensitivity and can realize a wide development latitude. The B layer generally contains a photothermal conversion substance. Preferred examples of the photothermal conversion substance include the dyes described above.
As the resin used in the A layer, a polymer having a monomer having a sulfonamide group, an active imino group, a phenolic hydroxy group or the like as a copolymerization component is preferably used because it has excellent printing durability and solvent resistance. . As the resin used for the B layer, an alkaline aqueous solution-soluble resin having a phenolic hydroxy group is preferably exemplified.
In addition to the resin, the composition used for the A layer and the B layer can contain various additives as necessary. Specifically, various additives as described in JP-A-2002-3233769, [0062] to [0085] are preferably used. Further, the additives described in [0053] to [0060] of JP-A-2001-305722 described above are also preferably used.
About each component which comprises A layer and B layer, and its content, it is preferable to make it describe in Unexamined-Japanese-Patent No. 11-218914.

<Intermediate layer>
An intermediate layer is preferably provided between the thermal positive type image recording layer and the support. As the component contained in the intermediate layer, various organic compounds described in [0068] of JP-A No. 2001-305722 are preferably exemplified.

<Others>
As a method for producing a thermal positive type image recording layer and a plate making method, methods described in detail in JP-A No. 2001-305722 can be used.

<Thermal negative type>
The thermal negative photosensitive composition contains a curable compound and a photothermal conversion substance. The thermal negative type image recording layer is a negative photosensitive layer in which a portion irradiated with light such as an infrared laser is cured to form an image portion.
<Polymerized layer>
As one of the thermal negative type image recording layers, a polymerization type image recording layer (polymerization layer) is preferably exemplified. The polymerization layer contains a photothermal conversion substance, a radical generator, a radical polymerizable compound that is a curable compound, and a binder polymer. In the polymerization layer, infrared light absorbed by the light-to-heat conversion substance is converted into heat, the radical generator is decomposed by this heat to generate radicals, and the radical polymerizable compound is polymerized in a chain by the generated radicals and cured. .

As a photothermal conversion substance, the photothermal conversion substance used for the thermal positive type mentioned above is mentioned, for example. Specific examples of particularly preferred cyanine dyes include those described in JP-A-2001-133969, [0017] to [0019].
Preferred examples of the radical generator include onium salts. In particular, onium salts described in JP-A-2001-133969, [0030] to [0033] are preferable.
Examples of the radical polymerizable compound include compounds having at least one terminal ethylenically unsaturated bond, preferably two or more.
As the binder polymer, a linear organic polymer is preferably exemplified. Preferred examples include linear organic polymers that are soluble or swellable in water or weak alkaline water. Among them, a (meth) acrylic resin having an unsaturated group such as an allyl group or an acryloyl group or a benzyl group and a carboxy group in the side chain is preferable in that it has an excellent balance of film strength, sensitivity, and developability. .
As the radical polymerizable compound and the binder polymer, those described in detail in [0036] to [0060] of JP-A No. 2001-133969 can be used.

  In the thermal negative photosensitive composition, an additive described in JP-A-2001-133969, [0061] to [0068] (for example, a surfactant for improving coatability) is contained. Is preferred.

  As a method for producing the polymerization layer and a plate making method, methods described in detail in JP-A No. 2001-133969 can be used.

<Acid cross-linked layer>
Further, as one of the thermal negative type image recording layers, an acid cross-linked image recording layer (acid cross-linked layer) is also preferably exemplified. The acid cross-linking layer comprises a photothermal conversion substance, a thermal acid generator, a compound that cross-links with an acid that is a curable compound (cross-linking agent), and an alkali-soluble polymer compound that can react with the cross-linking agent in the presence of an acid. contains. In the acid cross-linking layer, infrared light absorbed by the photothermal conversion substance is converted into heat, the heat acid generator is decomposed by this heat to generate an acid, and the generated acid reacts with the cross-linking agent and the alkali-soluble polymer compound. And harden.

Examples of the photothermal conversion substance include the same substances as those used for the polymerization layer.
Examples of the thermal acid generator include thermal decomposition compounds such as photoinitiators for photopolymerization, photochromic agents for dyes, and acid generators used in microresists.
Examples of the crosslinking agent include an aromatic compound substituted with a hydroxymethyl group or an alkoxymethyl group; a compound having an N-hydroxymethyl group, an N-alkoxymethyl group or an N-acyloxymethyl group; and an epoxy compound.
Examples of the alkali-soluble polymer compound include a novolak resin and a polymer having a hydroxyaryl group in the side chain.

<Photopolymer type>
The photopolymerization type photosensitive composition contains an addition polymerizable compound, a photopolymerization initiator, and a polymer binder.
As the addition polymerizable compound, an ethylenically unsaturated bond-containing compound capable of addition polymerization is preferably exemplified. The ethylenically unsaturated bond-containing compound is a compound having a terminal ethylenically unsaturated bond. Specifically, for example, it has a chemical form such as a monomer, a prepolymer, and a mixture thereof. Examples of monomers include esters of unsaturated carboxylic acids (eg, acrylic acid, methacrylic acid, itaconic acid, maleic acid) and aliphatic polyhydric alcohol compounds, amides of unsaturated carboxylic acids and aliphatic polyvalent amine compounds. Is mentioned.
Moreover, as an addition polymerizable compound, a urethane type addition polymerizable compound is also preferably exemplified.

As the photopolymerization initiator, various photopolymerization initiators or a combination system (photoinitiation system) of two or more photopolymerization initiators can be appropriately selected depending on the wavelength of the light source to be used. For example, the initiation system described in JP-A-2001-22079, [0021] to [0023] is preferable.
The polymer binder not only functions as a film forming agent for the photopolymerization type photosensitive composition, but is soluble or swellable in alkaline water because the image recording layer needs to be dissolved in an alkaline developer. An organic high molecular polymer is used. As such an organic polymer, those described in JP-A-2001-22079, [0036] to [0063] are preferably exemplified.

  In the photopolymer type photopolymerization type photosensitive composition, additives described in JP-A-2001-22079, [0079] to [0088] (for example, a surfactant for improving coatability) , Colorants, plasticizers, thermal polymerization inhibitors).

Further, it is preferable to provide an oxygen-blocking protective layer on the photopolymer type image recording layer in order to prevent the action of inhibiting polymerization of oxygen. Examples of the polymer contained in the oxygen barrier protective layer include polyvinyl alcohol and copolymers thereof.
Furthermore, it is also preferable to provide an intermediate layer or an adhesive layer as described in [0124] to [0165] of JP-A-2001-228608.

<Conventional negative type>
The conventional negative-type photosensitive composition contains a diazo resin or a photocrosslinking resin. Among them, preferred is a photosensitive composition containing a diazo resin and an alkali-soluble or swellable polymer compound (binder).
Examples of the diazo resin include condensates of aromatic diazonium salts and active carbonyl group-containing compounds such as formaldehyde; condensates of p-diazophenylamines and formaldehyde with hexafluorophosphate or tetrafluoroborate. Organic solvent-soluble diazo resin inorganic salts which are reaction products of In particular, a high molecular weight diazo compound containing 20 mol% or more of a hexamer described in JP-A-59-78340 is preferable.
Examples of the binder include a copolymer containing acrylic acid, methacrylic acid, crotonic acid, or maleic acid as an essential component. Specifically, multi-component copolymers of monomers such as 2-hydroxyethyl (meth) acrylate, (meth) acrylonitrile, and (meth) acrylic acid as described in JP-A-50-118802, Examples thereof include multi-component copolymers composed of alkyl acrylate, (meth) acrylonitrile and unsaturated carboxylic acid as described in JP-A-56-4144.

  The conventional negative type photosensitive composition has, as additives, the bake-out agent, dye, and flexibility and abrasion resistance described in JP-A-7-281425, [0014] to [0015]. It is preferable to contain a plasticizer for imparting, a compound such as a development accelerator, and a surfactant for improving coating properties.

  Under the conventional negative type photosensitive layer, an intermediate layer containing a polymer compound having a component having an acid group and a component having an onium group as described in JP-A-2000-105462 is provided. Is preferred.

<Conventional positive type>
The conventional positive type photosensitive composition contains a quinonediazide compound. Among these, a photosensitive composition containing an o-quinonediazide compound and an alkali-soluble polymer compound is preferable.
Examples of the o-quinonediazide compound include esters of 1,2-naphthoquinone-2-diazide-5-sulfonyl chloride and phenol-formaldehyde resin or cresol-formaldehyde resin, described in US Pat. No. 3,635,709. And esters of 1,2-naphthoquinone-2-diazide-5-sulfonyl chloride and pyrogallol-acetone resin.
Examples of the alkali-soluble polymer compound include phenol-formaldehyde resin, cresol-formaldehyde resin, phenol-cresol-formaldehyde co-condensation resin, polyhydroxystyrene, N- (4-hydroxyphenyl) methacrylamide copolymer, A carboxy group-containing polymer described in JP-A-7-36184, an acrylic resin containing a phenolic hydroxy group as described in JP-A-51-34711, and described in JP-A-2-866 Examples thereof include acrylic resins having a sulfonamide group and urethane resins.

  Conventional positive type photosensitive compositions include compounds such as sensitivity modifiers, printing agents, dyes and the like described in JP-A-7-92660, [0024] to [0027] as additives. It is preferable to contain a surfactant for improving the coating property as described in [0031] of Kaihei 7-92660.

  Under the conventional positive type photosensitive layer, it is preferable to provide an intermediate layer similar to the intermediate layer suitably used for the above-described conventional negative type.

<Non-treatment type>
Examples of the non-processing type photosensitive composition include a thermoplastic fine particle polymer type, a microcapsule type, and a sulfonic acid-generating polymer-containing type. These are all heat-sensitive types containing a photothermal conversion substance. The photothermal conversion substance is preferably the same dye as that used in the above-described thermal positive type.

The thermoplastic fine particle polymer type photosensitive composition is obtained by dispersing a hydrophobic and heat-meltable fine particle polymer in a hydrophilic polymer matrix. In the image recording layer of the thermoplastic fine particle polymer type, the hydrophobic fine particle polymer is melted by heat generated by exposure and is fused to form a hydrophobic region, that is, an image portion.
As the fine particle polymer, those in which fine particles melt and coalesce with heat are preferable, and those having a hydrophilic surface and capable of being dispersed in a hydrophilic component such as dampening water are more preferable. Specifically, ResearchDisclosureNo. 33303 (January 1992), JP-A-9-123387, JP-A-9-131850, JP-A-9-171249, and JP-A-9-171250, and European Patent Application Publication No. 931,647. Preferred examples thereof include thermoplastic fine particle polymers. Of these, polystyrene and polymethyl methacrylate are preferred. Examples of the fine particle polymer having a hydrophilic surface include those in which the polymer itself is hydrophilic; those in which a hydrophilic compound such as polyvinyl alcohol and polyethylene glycol is adsorbed on the surface of the fine particle polymer to make the surface hydrophilic.
The fine particle polymer preferably has a reactive functional group.

  As a microcapsule type photosensitive composition, a compound having a heat-reactive functional group as described in JP-A No. 2000-118160 or JP-A No. 2001-277740 is included. A microcapsule type is preferable.

  Examples of the sulfonic acid generating polymer used in the sulfonic acid generating polymer-containing photosensitive composition include sulfonic acid ester groups, disulfone groups, and sec- or tert-sulfonamides described in JP-A No. 10-282672. Examples thereof include polymers having a group in the side chain.

  By incorporating a hydrophilic resin into the unprocessed photosensitive composition, not only on-press developability is improved, but also the film strength of the photosensitive layer itself is improved. Examples of the hydrophilic resin include those having a hydrophilic group such as hydroxy group, carboxy group, hydroxyethyl group, hydroxypropyl group, amino group, aminoethyl group, aminopropyl group, carboxymethyl group, and hydrophilic sol-gel conversion system. A binder resin is preferred.

  The unprocessed type image recording layer does not require a special development step and can be developed on a printing press. As a method for producing an unprocessed image recording layer and a plate-making printing method, methods described in detail in JP-A No. 2002-178655 can be used.

The lithographic printing plate precursor using the lithographic printing plate support obtained by the present invention is converted into a lithographic printing plate by various treatment methods according to the image recording layer.
Examples of the actinic ray light source used for image exposure include a mercury lamp, a metal halide lamp, a xenon lamp, and a chemical lamp. Examples of the laser beam include a helium-neon laser (He-Ne laser), an argon laser, a krypton laser, a helium-cadmium laser, a KrF excimer laser, a semiconductor laser, a YAG laser, and a YAG-SHG laser.

After the above exposure, if the image recording layer is any of thermal positive type, thermal negative type, conventional negative type, conventional positive type, and photopolymer type, after exposure, it is developed using a developer to obtain a lithographic printing plate. It is preferable to obtain.
The developer is preferably an alkaline developer, and more preferably an alkaline aqueous solution substantially free of an organic solvent.
Moreover, the developing solution which does not contain alkali metal silicate substantially is also preferable. As a method of developing using a developer substantially not containing an alkali metal silicate, a method described in detail in JP-A No. 11-109637 can be used.
A developer containing an alkali metal silicate can also be used.

  The present invention will be specifically described below with reference to examples. However, the present invention is not limited to these. In the sealing treatment, the concentration of fluorine, phosphoric acid, aluminum and sulfuric acid in the treatment solution is measured in advance by ion chromatography in a test operation. Based on the measured concentration, pure water (ion exchange water), Supply either sodium fluoride zirconate aqueous solution or sodium dihydrogen phosphate aqueous solution to the sealing treatment solution, discard a part of the sealing treatment solution, and keep the concentration of fluorine compound and phosphate compound within a certain range The data was collected. Based on the collected data, the operating conditions were predicted to predict concentration fluctuations, and sealing was performed.

1. Production of lithographic printing plate support (Example 1)
Si: 0.073 mass%, Fe: 0.27 mass%, Cu: 0.025 mass%, Mn: 0.000 mass%, Mg: 0.000 mass%, Cr: 0.001 mass%, Zn: A web-like aluminum plate containing 0.003 mass%, Ti: 0.002 mass%, the balance being aluminum and inevitable impurities, was subjected to the following surface treatment to obtain a lithographic printing plate support.

<Surface treatment>
In the surface treatment, the following various treatments (a) to (k) were continuously performed.

(A) Mechanical roughening treatment Using an apparatus as shown in FIG. 4, an abrasive (abrasive that is classified so that the average particle diameter of particles contained therein is 20 μm using pumiston) and While supplying a suspension with water (specific gravity 1.12) as a polishing slurry liquid to the surface of the aluminum plate, a mechanical surface roughening treatment was performed with a rotating roller nylon brush. In FIG. 4, 1 is an aluminum plate, 2 and 4 are roller brushes, 3 is a polishing slurry, and 5, 6, 7 and 8 are support rollers. The material of the nylon brush was 6 · 10 nylon, the hair length was 50 mm, and the hair diameter was 0.3 mm. The nylon brush was planted so as to be dense by making a hole in a stainless steel tube having a diameter of 300 mm. Three rotating brushes were used. The distance between the two support rollers (φ200 mm) at the bottom of the brush was 300 mm. The brush roller manages the load of the drive motor that rotates the brush with respect to the load before pressing the brush roller against the aluminum plate so that the average surface roughness after the roughening treatment is 0.45 to 0.55 μm. Pressed down. The rotating direction of the brush was the same as the moving direction of the aluminum plate.

(B) Alkali etching treatment An aqueous solution containing 370 g / L of sodium hydroxide and 100 g / L of aluminum ions (liquid temperature 60 ° C.) was sprayed from an aluminum tube onto the aluminum plate to perform alkali etching treatment. The amount of aluminum dissolved on the surface subjected to the electrochemical surface roughening treatment in a later step was 10 g / m ² .
Thereafter, the liquid was drained with a nip roller, then washed with water, and further drained with a nip roller. The water washing treatment was performed by washing with water using an apparatus for washing with a free-falling curtain-like liquid film, and then washing with water sprayed in a fan shape from a spray tip attached to the spray tube for 5 seconds.

(C) Desmut processing Next, desmut processing was performed. For the desmutting treatment, the waste solution of the nitric acid aqueous solution (liquid temperature 35 ° C.) used for the electrochemical surface roughening treatment in the next step was used. The desmut treatment was performed by spraying a desmut solution on the aluminum plate with a spray for 5 seconds.
Thereafter, the liquid was not drained, and the aluminum plate was handled with the nitric acid aqueous solution attached until the next step. After passing through the desmut treatment tank, the handling time in a state where nitric acid was adhered was 25 seconds.

(D) Electrochemical roughening treatment (nitric acid electrolysis)
Immediately before the electrochemical surface roughening treatment, an electrolytic solution having the same composition and temperature as the nitric acid electrolytic solution used for the electrochemical surface roughening treatment was sprayed onto the aluminum plate.
Next, an electrochemical surface roughening treatment was continuously performed using an alternating voltage of 60 Hz. The electrolytic solution at this time was an electrolytic solution (liquid temperature 35 ° C.) in which aluminum nitrate was added to an aqueous solution having a nitric acid concentration of 10.4 g / L to adjust the aluminum ion concentration to 4.5 g / L. The AC power supply waveform is the waveform shown in FIG. 3. The time TP until the current value reaches a peak from zero is 1.2 msec, the duty ratio is 1: 1, a trapezoidal rectangular wave AC is used, and the carbon electrode is the counter electrode. An electrochemical roughening treatment was performed. Ferrite was used for the auxiliary anode. Two electrolytic cells shown in FIG. 4 were used.
The current density was 60 A / dm ² during the anode reaction of the aluminum plate at the peak of alternating current. The ratio of the total amount of electricity during the anode reaction and the total amount of electricity during the cathode reaction of the aluminum plate was 0.95. The amount of electricity applied to the aluminum plate was 195 C / dm ^{2 as} the total amount of electricity during the anode reaction of the aluminum plate.
The relative speed of the aluminum plate and the electrolytic solution was 1.5 m / sec (1-2 m / sec) on average in the electrolytic cell.
Thereafter, the liquid was drained with a nip roller, then washed with water, and further washed with water ejected in a fan shape from a spray tip attached to the spray tube for 5 seconds. Further, the liquid was removed with a nip roller.

(E) Alkali etching treatment An aqueous solution containing 370 g / L of sodium hydroxide and 100 g / L of aluminum ions (liquid temperature of 64 ° C.) was sprayed onto the aluminum plate for 7 seconds from a spray tube to perform alkali etching treatment. The amount of aluminum dissolved on the surface subjected to the electrochemical roughening treatment was 3 g / m ² .
Thereafter, the liquid was drained with a nip roller, then washed with water, and further drained with a nip roller. The water washing treatment was performed by washing with water using an apparatus for washing with a free-falling curtain-like liquid film, and then washing with water sprayed in a fan shape from a spray tip attached to the spray tube for 5 seconds.

(F) Desmut processing Next, desmut processing was performed. In the desmutting treatment, a solution (liquid temperature 35 ° C.) in which 2 g / L of aluminum ions were dissolved in a 300 g / L sulfuric acid aqueous solution was used. The desmut treatment was performed by spraying a desmut solution on the aluminum plate by spraying for 10 seconds.
Thereafter, the liquid was drained with a nip roller, and then washed with water sprayed in a fan shape from a spray tip attached to the spray tube for 5 seconds. Further, the liquid was removed with a nip roller.

(G) Electrochemical roughening treatment (hydrochloric acid electrolysis)
An electrochemical surface roughening treatment was continuously performed using an alternating voltage of 60 Hz. The electrolytic solution at this time was an electrolytic solution (liquid temperature 35 ° C.) in which aluminum chloride was adjusted to 5 g / L by adding aluminum chloride to an aqueous solution having a hydrochloric acid concentration of 5 g / L. The AC power supply waveform is the waveform shown in FIG. 3, the time TP until the current value reaches the peak from zero is 0.8 msec, the duty ratio is 1: 1, a trapezoidal rectangular wave AC is used, with the carbon electrode as the counter electrode An electrochemical roughening treatment was performed. Ferrite was used for the auxiliary anode. One electrolytic cell shown in FIG. 4 was used.
The current density was 50 A / dm ² during the anode reaction of the aluminum plate at the peak of alternating current. The ratio of the total amount of electricity during the anode reaction and the total amount of electricity during the cathode reaction of the aluminum plate was 0.95. The amount of electricity applied to the aluminum plate was 65 C / dm ^{2 as} the total amount of electricity during the anode reaction of the aluminum plate.
The relative speed of the aluminum plate and the electrolytic solution was 1.5 m / sec (1-2 m / sec) on average in the electrolytic cell.
Thereafter, the liquid was drained with a nip roller, then washed with water, and further drained with a nip roller.

(H) Alkali Etching Treatment An aqueous solution containing sodium hydroxide 50 g / L and aluminum ions 5 g / L (liquid temperature 35 ° C.) was sprayed onto the aluminum plate from a spray tube to perform alkali etching treatment. The amount of aluminum dissolved on the surface subjected to the electrochemical surface roughening treatment was 0.2 g / m ² .
Thereafter, the liquid was drained with a nip roller, then washed with water, and further drained with a nip roller. The water washing treatment was performed by washing with water using an apparatus for washing with a free-falling curtain-like liquid film, and then washing with water sprayed in a fan shape from a spray tip attached to the spray tube for 5 seconds.

(I) Desmut processing Next, desmut processing was performed. In the desmutting treatment, waste liquid generated in the next anodizing treatment step (a solution obtained by dissolving 5 g / L of aluminum ions in a 170 g / L sulfuric acid aqueous solution, a solution temperature of 35 ° C.) was used. The desmut treatment was performed by spraying a desmut solution on the aluminum plate with a spray for 5 seconds.
Thereafter, the liquid was removed with a nip roller. No water washing treatment was performed between the draining and the anodic oxidation treatment.

(J) Anodizing treatment Next, the aluminum plate was subjected to anodizing treatment. The anodizing treatment is performed on an aluminum plate in an electrolytic treatment tank using an electrolytic solution (liquid temperature 33 ° C.) in which aluminum sulfate is added to a 170 g / L sulfuric acid aqueous solution to have an aluminum ion concentration of 5 g / L and a DC power source. The applied current density was such that the average current density during the anodic reaction of the aluminum plate was 15 A / dm ^2, and an anodized film of 2.4 g / m ² was provided.

(K) Sealing treatment Next, sealing treatment was performed for the purpose of closing the micropores of the anodized film. Sealing treatment was performed using an aqueous solution (liquid) containing 1 g / L of sodium zirconate fluoride (Na ₂ ZrF ₆ ) and 3 g / L of sodium dihydrogen phosphate dihydrate (NaH ₂ PO ₄ .2H ₂ O). The temperature was 75 ± 1 ° C.) as a sealing treatment liquid, and this sealing treatment liquid was sprayed on an aluminum plate for 10 seconds by spraying. The sealing treatment liquid was prepared using pure water (ion exchange water). The aluminum ion concentration in the sealing treatment solution was controlled to be about 150 mg / L, and the sulfate ion concentration was controlled to be about 100 mg / L.

Concentrations of sodium zirconate fluoride and sodium dihydrogen phosphate in the sealing treatment liquid during continuous sealing treatment on the web-like aluminum plate correspond to the treatment area m or the treatment time t. Fluorine concentration change f ₁ (m), phosphoric acid concentration change f ₂ (m), sulfuric acid concentration change f ₃ (m), aluminum concentration change f ₄ (m), liquid volume change (liquid evaporation, aluminum Fluorine compounds and phosphate compounds corresponding to the number of treatments m are obtained by determining the relationship between f ₅ (t) treatment amount due to water adhering to the sheet and taking out the sealing treatment liquid adhering to the aluminum sheet. , And water were added in a predetermined amount, and feed-forward control was performed in which a predetermined amount was added at intervals of 3 minutes.

In addition, the concentration of fluorine, phosphoric acid and sulfuric acid in the sealing treatment solution is measured at intervals of 15 minutes by ion chromatography using a suppressor, and based on these measurement results, the fluorine compound, phosphate compound and water are measured. In addition, feedback control for correcting the interval of addition of was used.
As a column for the ion chromatographic method, SHODEX SI-90 4E manufactured by Showa Denko was used, and as a eluent, a mixed solution of 1.8 mM Na ₂ CO ₃ and 1.7 mM NaHCO ₃ was used. The dilution rate of the measurement solution was 1500 times.
As a result, the concentration of the sealing treatment liquid could be kept constant for a long time.

relationship of the variation with respect to _{f 1 (m) ~f 4 (} m) ~f throughput of ₅ (t) is obtained as follows.
The concentration measurement device prepared in advance a standard solution in which the concentrations of sodium zirconate fluoride and sodium dihydrogen phosphate were changed stepwise over a wide range. The acid concentration was measured. And the data table of each measured value was created for each compound concentration.
Fluorine ion concentration and phosphate ion concentration were measured by an ion chromatograph, and converted into sodium zirconate fluoride concentration and sodium dihydrogen phosphate concentration by collating with a previously created data table. When the measured output value was located in the middle of the data table, the concentration was calculated by complementing the space between the data tables.

  Further, the pH was constantly controlled, and it was constantly monitored whether the pH was between 3.2 and 3.8. When the pH was out of the control range, the measuring device was set to issue an alarm, and at the same time, 10% sodium hydroxide aqueous solution or phosphoric acid aqueous solution was added to adjust the pH. The average pH during operation was 3.5.

In the method of measuring the concentration by ion chromatography, three measurement columns are prepared, and each sample is automatically sampled and diluted at regular intervals under the control of a personal computer. It was measured.
The temperature of the liquid used for automatic sampling and automatic dilution was controlled to be 40 ° C. ± 2 ° C.
Concentration measurement values have a lag time depending on the length of piping in the measuring device, dilution time, and time required for measurement. Therefore, the concentration change trend is set every 10 minutes, and the concentration change for three times including the present time. From this, the replenishment amount of water, sodium zirconate fluoride, or sodium dihydrogen phosphate was determined. The current actual concentration was estimated from the past three trends including the current measurement data through numerical processing using a personal computer, and control instability due to the effect of delay time was eliminated.

Sodium fluoride zirconate (Na ₂ ZrF ₆ ) was replenished with 4 g / L dissolved in pure water (ion-exchanged water) at 40 ° C. objects _{(NaH 2 PO 4 · 2H 2} O) is dissolved 20 g / L of pure water (deionized water) was used which was 40 ° C.. The pH of the sealing solution was monitored and adjusted under the above conditions. As a result, the concentration of sodium zirconate fluoride (Na ₂ ZrF ₆ ) was set to 1 g / L, and the concentration of sodium dihydrogen phosphate dihydrate (NaH ₂ PO ₄ .2H ₂ O) was set to 3 g / L. Concentration fluctuation was managed within ± 0.2 g / L as sodium zirconate fluoride concentration fluctuation, and within ± 0.2 g / L as sodium dihydrogen phosphate dihydrate concentration fluctuation. Under the conditions, the average value of each change amount is f ₁ (m) = 50 mg / m ² , f ₂ (m) = 65 mg / m ² , f ₃ (m) = 0.03 mg / m ² , f ₄ ( Since m) = 0.03 mg / m ² and f ₅ (t) = 100 l / hr, this value was used as a variation value for the processing amount of the concentration that can be predicted in advance by the feedforward method. Since it is difficult to determine the aluminum ion concentration by ion chromatography, it was separately determined by ICP emission analysis.

During operation, since the liquid became cloudy, the liquid in the circulation tank was always filtered with a filter while removing the suspended matter by filter filtration or a sedimentation tank.
Since the filter is likely to be clogged, it was operated by switching the filter while having three lines of filters and controlling the pressure while removing the residue by backwashing the clogged filter.

In order to prevent the liquid from becoming clouded, the sealing treatment was carried out while constantly filtering the sealing treatment liquid in the circulation tank through a filter while performing filtration with a filter and removal of suspended matter with a sedimentation tank. Thereby, sodium fluoroaluminate and aluminum phosphate in the sealing treatment liquid were removed.
Since the filter is likely to be clogged, three filters were provided and the pressure of the filter was controlled, and the clogged filter was subjected to sealing while switching the filter while removing the residue by backwashing.

  The waste liquid of the sealing treatment liquid is temporarily stored in the waste liquid tank, and then subjected to waste liquid treatment using calcium chloride, calcium hydroxide, sulfuric acid band, polymer flocculant, sodium hydroxide, sulfuric acid, etc., and fluorine in the waste liquid. The phosphoric acid was discharged after the concentration of phosphoric acid was 8 ppm or less.

  After the sealing treatment, the liquid was drained with a nip roll, then washed with water, and further drained with a nip roll.

(L) Hydrophilization treatment Next, the hydrophilic treatment was performed. The hydrophilization treatment was performed by immersing the aluminum plate in a 1% by mass aqueous sodium silicate solution (liquid temperature 50 ° C.) for 10 seconds.
The amount of Si on the aluminum surface measured with a fluorescent X-ray analyzer was 1.4 mg / m ² .
Thereafter, the liquid was drained with a nip roller, then washed with water, and further drained with a nip roller.
Furthermore, 90 degreeC wind was sprayed for 10 seconds, it was made to dry, and the support body for lithographic printing plates was obtained.

(Example 2)
In the surface roughening treatment step (k), in the sealing treatment, multi-component concentration measurement by capillary electrophoresis is performed instead of multi-component concentration measurement by the suppressor ion chromatography method of Example 1, and the fluorine ion concentration, phosphorus The acid ion concentration and sulfate ion concentration were controlled. The capillary size was 75 μm in inner diameter, the total length was 800 mm, the voltage was −15 kV, the detection wavelength was 270 nm, the capillary temperature was 25 ° C., and the sample injection was a step operation method (Δh = 25 mm). In order to prevent adsorption of cations, 0.5N NaOH was injected every 5 measurements, and the inner wall of the capillary was washed for 3 minutes. As a result, as in Example 1, the concentration of sodium fluorinated zirconate and the concentration of sodium dihydrogen phosphate in the sealing treatment liquid could be controlled to be constant.

When the surface of the lithographic printing plate support of Examples 1 and 2 was observed at a magnification of 50000 times using a scanning electron microscope (JSM-5500, manufactured by JEOL Ltd., the same shall apply hereinafter), the diameter was 0.1 μm. The fine unevenness of the degree was generated uniformly and densely.
In addition, when observed with a scanning electron microscope at a magnification of 2000 times, irregularities with a diameter of 1 to 5 μm were uniformly generated.
In addition, the fine unevenness | corrugation about 0.1 micrometer in diameter overlapped and produced | generated the unevenness | corrugation of diameter 1-5 micrometers.

(Comparative Example 1)
In the surface roughening treatment step, (k) sealing treatment, without using the feedforward control of Example 1, so that the concentrations of sodium zirconate fluoride and sodium dihydrogen phosphate become initial values every hour. In addition, the sealing treatment solution was controlled in the same manner as in Example 1 except that the respective aqueous solutions of sodium fluorinated zirconate and sodium dihydrogen phosphate were added. Other roughening treatment steps were carried out in the same manner as in Example 1 to produce a lithographic printing plate support. The concentration variation of the sealing treatment liquid was large, and a certain sealing treatment was not performed.

(Comparative Example 2)
In the roughening treatment step of Example 1, (k) the concentration measurement method of the sealing treatment solution during the sealing treatment was performed by measuring the phosphate ion concentration by the fluorine ion electrode method and the colorimetric method. The measurement results are affected by the precipitation of aluminum ions in the sealing solution, and the fluctuation of the indicated value of the fluorine ion electrode is large.Therefore, the fluorine ion electrode must be frequently cleaned and calibrated. The suitability for continuous production was inferior to that of Example 1.

2. Preparation of lithographic printing plate precursor and printing test The lithographic printing plate support of each Example obtained above was bar-coated with an image recording layer coating solution having the following composition, and then an oven was used at 70 ° C for 60 seconds. And dried to form an image recording layer having a dry coating amount of 0.8 g / m ² to obtain a lithographic printing plate precursor.

<Coating solution composition for image recording layer>
・ 55g of water
・ Propylene glycol monomethyl ether 30g
・ Methanol 5g
-5 g of microcapsule solution described below (in terms of solid content)
・ Ethoxylated trimethylolpropane triacrylate (manufactured by Nippon Kayaku Co., Ltd., SR9035, ethylene oxide addition mole number 15, molecular weight 1000) 0.2 g
・ Polymerization initiator (OS-7 above) 0.5g
-Infrared absorber (1) represented by the following formula: 0.15 g
・ Ethylene glycol 0.1g
-Fluorosurfactant (Dainippon Ink & Chemicals, Megafac F-171) 0.1g

<Microcapsule solution>
As oil phase components, trimethylolpropane and xylene diisocyanate adduct (Mitsui Takeda Chemical Co., Ltd., Takenate D-110N) 10 g, pentaerythritol triacrylate (Nippon Kayaku Co., Ltd., SR444) 3.15 g, 0.35 g of infrared absorber (2) represented by the following formula, 1 g of 3- (N, N-diethylamino) -6-methyl-7-anilinofluorane (ODB manufactured by Yamamoto Kasei) and a surfactant (Takemoto 0.1 g (Pionin A-41C) manufactured by Yushi Co., Ltd. was dissolved in 17 g of ethyl acetate. As an aqueous phase component, 40 g of a 4 mass% aqueous solution of polyvinyl alcohol (manufactured by Kuraray Co., Ltd., PVA-205) was prepared. The oil phase component and the aqueous phase component were mixed and emulsified at 12000 rpm for 10 minutes using a homogenizer. The obtained emulsion was added to 25 g of distilled water, stirred at room temperature for 30 minutes, and then stirred at 40 ° C. for 3 hours. Then, it diluted using distilled water and obtained the microcapsule liquid with a solid content concentration of 20 mass%. The average particle size of the microcapsules was 0.3 μm.

The resulting lithographic printing plate precursor was subjected to image exposure using a Trend setter 3244VX manufactured by Creo equipped with a water-cooled 40 W infrared semiconductor laser under the conditions of an output of 9 W, an outer drum rotating speed of 210 rpm, and a resolution of 2400 dpi.
After that, it was attached to a cylinder of a printing machine SOR-M manufactured by Heidelberg without developing. Next, dampening water (IF102 (Fuji Photo Film Co., Ltd. etch solution) / water = 4/96 (volume ratio)) and TRANS-G (N) black ink (Dainippon Ink Chemical Co., Ltd.) are supplied. After that, printing was performed on a printing paper at a printing speed of 6000 sheets per hour.
As a result, the lithographic printing plate precursors of any of the examples were excellent in developability, printing durability and stain resistance on the printing press.

It is a schematic diagram which shows the structural example of a suppressor type | mold ion chromatograph apparatus. It is a graph which shows an example of the alternating waveform current waveform figure used for the electrochemical roughening process in the manufacturing method of the support body for lithographic printing plates of this invention. It is a side view which shows an example of the radial type cell in the electrochemical roughening process using alternating current in the manufacturing method of the support body for lithographic printing plates of this invention. It is a side view which shows the concept of the process of the brush graining in the manufacturing method of the support body for lithographic printing plates of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Aluminum plate 2, 4 Roller-shaped brush 3 Polishing slurry liquid 5, 6, 7, 8 Support roller 11 Aluminum plate 12 Radial drum roller 13a, 13b Main electrode 14 Acidic aqueous solution 15 Solution supply port 16 Slit 17 Solution path 18 Auxiliary anode 19a 19b Thyristor 20 AC power source 21 Main electrolytic cell 22 Auxiliary anode cell 30 Eluent 32 Eluent 32, 52 Pump 35 Column thermostatic chamber 36 Sample injector 38 Separation column 40 Detector 42 Data processor 46, 56 Waste liquid 50 Removed liquid 54 Suppressor

Claims (4)

In a method of sealing a micropore of an anodized film formed by anodizing a metal substrate surface with an aqueous solution containing fluorine and phosphoric acid,
Measure at least one concentration selected from the group consisting of fluorine, phosphoric acid, base metal and inorganic acid in the sealing treatment solution by a multi-component concentration measurement method, and the measurement result and a preset concentration range A method for controlling the concentration of a sealing treatment liquid, comprising: adding a fluorine compound, a phosphoric acid compound, or water by calculating an addition amount of a component to be replenished to the sealing treatment liquid from the difference. In a method of sealing a micropore of an anodized film formed by anodizing a metal substrate surface with an aqueous solution containing fluorine and phosphoric acid,
Measure at least one concentration selected from the group consisting of fluorine, phosphoric acid, base metal and inorganic acid in the sealing treatment solution by a multi-component concentration measurement method, and the measurement result and a preset concentration range The amount of the component to be replenished to the sealing treatment liquid is calculated from the difference, and the concentration control method of the sealing treatment liquid to which a fluorine compound, a phosphate compound, or water is added,
A fluctuation in the treatment amount of at least one concentration selected from the group consisting of fluorine, phosphoric acid, base metal and inorganic acid in the sealing treatment liquid is predicted in advance, and a fluorine compound, phosphoric acid is selected according to the treatment amount. A concentration control method of a sealing treatment liquid to which a compound or water is added,
A method for controlling the concentration of a sealing treatment liquid, characterized by being combined.   The sealing treatment according to claim 1 or 2, wherein the multi-component concentration measurement method is at least one selected from the group consisting of capillary electrophoresis, isotacophoresis, and ion chromatography. Liquid concentration control method. On the aluminum plate, at least an anodizing treatment, and a sealing treatment using an aqueous solution containing a fluorine compound and a phosphoric acid compound for sealing micropores present in the anodized film formed by the anodizing treatment; A method for producing a lithographic printing plate support comprising:
The said sealing process controls at least 1 density | concentration selected from the group which consists of a fluorine, phosphoric acid, aluminum, and a sulfuric acid in the said process liquid by the density | concentration control method in any one of Claims 1-3. A method for producing a support for a lithographic printing plate, which is performed.

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