JP2005320417A - Diamine monomer having phenylethynyl group - Google Patents

Diamine monomer having phenylethynyl group Download PDF

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JP2005320417A
JP2005320417A JP2004138907A JP2004138907A JP2005320417A JP 2005320417 A JP2005320417 A JP 2005320417A JP 2004138907 A JP2004138907 A JP 2004138907A JP 2004138907 A JP2004138907 A JP 2004138907A JP 2005320417 A JP2005320417 A JP 2005320417A
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diamine monomer
polyimide resin
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JP3867983B2 (en
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Rikio Yokota
力男 横田
Takeshi Sasaki
健 佐々木
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Japan Aerospace Exploration Agency JAXA
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a diamine monomer from which a film-forming flexible polyimide resin with a high Tg after curing is obtained. <P>SOLUTION: The diamine monomer is expressed by general formula (I). Wherein, X is a halogen atom; Y is a divalent group selected from the group consisting of oxygen, sulfur, methylene and thiophene; n is an integer of 1 or 2; and m is an integer of 1-5. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、フェニルエチニル基を有するジアミンモノマーに関する。特に、本発明は、ポリイミド樹脂の溶媒溶解性及び耐熱性を向上させるのに有用な、フェニルエチニル基を有するジアミンモノマーに関する。   The present invention relates to a diamine monomer having a phenylethynyl group. In particular, the present invention relates to a diamine monomer having a phenylethynyl group that is useful for improving the solvent solubility and heat resistance of a polyimide resin.

ポリイミド樹脂は優れた耐熱性を有する材料として、宇宙、航空分野、電気・電子機械分野、通信用機器分野、OA機器分野など、様々な技術分野で利用されている。例えば、特開2000-219741号公報には、硬化物の耐熱性及び機械的特性が良好な末端変性イミドオリゴマーが開示されている。
しかしながら、用途によっては、成形後の樹脂の耐熱性及び機械的特性が優れているだけでは足りず、樹脂の成形加工が容易であることが望まれる場合がある。この点、耐熱性ポリイミドは主鎖が剛直であるために、一旦成形すると不溶、不融となり、二次成形加工が困難であるという問題を有する。
そこで、優れた耐熱性を有する一方で一旦成形するとは不溶不融となってしまうポリイミドに成形性を付与しようとする試みが、宇宙航空分野を中心に試みられてきた(例えば、米国特許第5,567,800号及び第5,644,022号明細書参照)。
近年、フィルム形成可能なイミドオリゴマーの開発(High Performance Polymers, Vol. 12, 213-223 (2000)参照)や、新しいタイプの熱硬化性ポリイミド(Tri-A PI)の開発が進められており、特にTri-A PI樹脂は、耐熱、高靱性、溶融流動性、易成形性を有する樹脂であることが知られている(High Performance Polymers, Vol. 13, S61-72 (2001)参照)。このTri-A PI樹脂は、次式のような反応により作製される:
Polyimide resin is used as a material having excellent heat resistance in various technical fields such as space, aeronautics, electric / electronic machinery, communication equipment, and OA equipment. For example, Japanese Patent Application Laid-Open No. 2000-219741 discloses a terminal-modified imide oligomer in which a cured product has good heat resistance and mechanical properties.
However, depending on the application, it is not sufficient that the resin has excellent heat resistance and mechanical properties after molding, and it may be desired that the resin can be easily molded. In this respect, since the main chain of heat-resistant polyimide is rigid, once it is molded, it becomes insoluble and infusible, and there is a problem that secondary molding processing is difficult.
Thus, attempts have been made mainly in the aerospace field to give moldability to polyimide that has excellent heat resistance while becoming insoluble and infusible once molded (for example, US Pat. No. 5,567,800). No. and 5,644,022).
In recent years, development of film-forming imide oligomers (see High Performance Polymers, Vol. 12, 213-223 (2000)) and development of a new type of thermosetting polyimide (Tri-A PI) are underway. In particular, Tri-A PI resin is known to be a resin having heat resistance, high toughness, melt flowability, and easy moldability (see High Performance Polymers, Vol. 13, S61-72 (2001)). This Tri-A PI resin is made by a reaction such as:

Figure 2005320417
Figure 2005320417

特開2000-219741号公報JP 2000-219741 米国特許第5,567,800号明細書U.S. Pat.No. 5,567,800 米国特許第5,644,022号明細書U.S. Pat.No. 5,644,022 High Performance Polymers, Vol. 12, 213-223 (2000)High Performance Polymers, Vol. 12, 213-223 (2000) High Performance Polymers, Vol. 13, S61-72 (2001)High Performance Polymers, Vol. 13, S61-72 (2001)

Tri-A PI樹脂の用途の一つに、フィルム状接着剤への応用がある。このような場合、分子末端に熱硬化基を有するイミドオリゴマーは、ガラス転移温度(Tg)が高い点で優れてはいるものの、分子量が低いためフィルム状に成形を行うことはできないという問題を有する。一方、ポリイミド前駆体であるポリアミド酸の状態で使用すると、フィルム成形は容易となるものの、その後の加熱によって軟化・熱可塑性を示す直鎖状ポリイミドのTgが低くなるという問題がある。
したがって、フィルム成形が可能であって熱可塑性を示し、かつ高いTgを有するポリイミド樹脂は得られていないのが現状である。
さらに、耐熱性に優れるポリイミド樹脂に難燃性等の機能を付与することにより、材料の高機能化並びに安全性の強化を図ることについての要請もある。
One of the uses of Tri-A PI resin is in application to film adhesives. In such a case, although the imide oligomer having a thermosetting group at the molecular terminal is excellent in terms of a high glass transition temperature (Tg), it has a problem that it cannot be formed into a film because of its low molecular weight. . On the other hand, when it is used in the state of polyamic acid which is a polyimide precursor, film forming becomes easy, but there is a problem that Tg of linear polyimide showing softening and thermoplasticity is lowered by subsequent heating.
Therefore, the present condition is that the polyimide resin which can be film-formed, shows thermoplasticity, and has high Tg is not obtained.
Furthermore, there is a demand for enhancing the functionality of materials and enhancing safety by imparting functions such as flame retardancy to polyimide resins having excellent heat resistance.

本発明は、フィルム成形が可能であってかつ可塑性を示し、硬化後は高いTgを有するポリイミド樹脂を得ることを可能にするジアミンモノマー、及びそのようなジアミンモノマーを含むポリイミド樹脂の溶解性あるいは耐熱性向上剤を提供することを目的とする。   The present invention relates to a diamine monomer that can be formed into a film and exhibits plasticity, and can obtain a polyimide resin having a high Tg after curing, and the solubility or heat resistance of a polyimide resin containing such a diamine monomer. It aims at providing a property improvement agent.

本発明者は、上記課題を解決すべく鋭意研究した結果、ポリイミド樹脂の側鎖に官能基を導入してポリイミド分子の形を乱すことにより、ポリイミド樹脂の有機溶媒に対する溶解性の改善をすることが効果的であり、さらにその際、官能基として熱硬化性基を導入することにより、ポリイミド樹脂の加工後に側鎖の硬化基を反応硬化させることにより、高い耐熱性を有する熱可塑・熱硬化型ポリイミドを得ることができるとの知見に基づき、本発明を完成するに至ったものである。
さらに、本発明者は、側鎖に導入する官能基にハロゲン原子を導入することにより、フィルム成形が可能であってかつ高いTgを有するポリイミド樹脂に難燃性を付与することが可能であることを見出した。
As a result of diligent research to solve the above problems, the present inventors have improved the solubility of polyimide resin in organic solvents by introducing functional groups into the side chain of the polyimide resin and disturbing the shape of the polyimide molecule. In that case, by introducing a thermosetting group as a functional group, by reacting and curing the side chain curing group after processing of the polyimide resin, thermoplastic / thermosetting having high heat resistance Based on the knowledge that a type polyimide can be obtained, the present invention has been completed.
Furthermore, the present inventor can impart flame retardancy to a polyimide resin having a high Tg that can be formed into a film by introducing a halogen atom into a functional group introduced into the side chain. I found.

すなわち、本発明は、次の一般式(I):   That is, the present invention provides the following general formula (I):

Figure 2005320417
Figure 2005320417

(式中、Xはハロゲン原子であり、Yは酸素、イオウ、メチレン及びチオフェンからなる群から選ばれる2価の基であり、nは1または2の整数であり、mは1〜5の整数である。)
で表される、ジアミンモノマーを提供する。
上記一般式(I)で表されるジアミンモノマーにおいて、好ましくはXがフッ素であり、Yが酸素またはイオウである。
更に好ましくは、上記一般式(I)で表されるジアミンモノマーは、次の化学式(i):


Wherein X is a halogen atom, Y is a divalent group selected from the group consisting of oxygen, sulfur, methylene and thiophene, n is an integer of 1 or 2, and m is an integer of 1 to 5. .)
The diamine monomer represented by these is provided.
In the diamine monomer represented by the above general formula (I), X is preferably fluorine and Y is oxygen or sulfur.
More preferably, the diamine monomer represented by the general formula (I) is represented by the following chemical formula (i):


Figure 2005320417
Figure 2005320417

で表される化合物である。
本発明はまた、次の一般式(I):
It is a compound represented by these.
The present invention also provides the following general formula (I):

Figure 2005320417
Figure 2005320417

(式中、Xはハロゲン原子であり、Yは酸素、イオウ、メチレン及びチオフェンからなる群から選ばれる2価の基であり、nは1または2の整数であり、mは1〜5の整数である。)
で表されるジアミンモノマーを含む、ポリイミド樹脂の溶解性向上剤を提供する。
本発明はさらに、次の一般式(I):
Wherein X is a halogen atom, Y is a divalent group selected from the group consisting of oxygen, sulfur, methylene and thiophene, n is an integer of 1 or 2, and m is an integer of 1 to 5. .)
The solubility improvement agent of a polyimide resin containing the diamine monomer represented by these is provided.
The present invention further includes the following general formula (I):

Figure 2005320417
Figure 2005320417

(式中、Xはハロゲン原子であり、Yは酸素、イオウ、メチレン及びチオフェンからなる群から選ばれる2価の基であり、nは1または2の整数であり、mは1〜5の整数である。)
で表されるジアミンモノマーを含む、ポリイミド樹脂の耐熱性向上剤を提供する。
Wherein X is a halogen atom, Y is a divalent group selected from the group consisting of oxygen, sulfur, methylene and thiophene, n is an integer of 1 or 2, and m is an integer of 1 to 5. .)
The heat resistance improver of a polyimide resin containing the diamine monomer represented by these is provided.

本発明によれば、フィルム成形等の成形が容易であって、かつ高い耐熱性を有する熱可塑・熱硬化型ポリイミドが得られる。また、難燃性等の所望の機能を備えた熱可塑・熱硬化型ポリイミドを得ることも可能になる。   According to the present invention, it is possible to obtain a thermoplastic / thermosetting polyimide that can be easily molded such as film molding and has high heat resistance. It is also possible to obtain a thermoplastic / thermosetting polyimide having a desired function such as flame retardancy.

本発明によるジアミンモノマーは、次の一般式(I):   The diamine monomer according to the present invention has the following general formula (I):

Figure 2005320417
Figure 2005320417

(式中、Xはハロゲン原子であり、Yは酸素、イオウ、メチレン及びチオフェンからなる群から選ばれる2価の基であり、nは1または2の整数であり、mは1〜5の整数である。)
で表される。
上記一般式(I)において、Xはフッ素、塩素、臭素等のハロゲン原子であり、本発明のジアミンモノマーを使用することにより得られるポリイミド樹脂に難燃性等の機能を付与することが期待される部分である。
なお、mは1〜5の整数であるが、mが2以上の場合、複数個存在するXは、相互に同じであっても異なっていてもよい。
上記一般式(I)に示されている通り、本発明のジアミンモノマーはフェニルエチニル基を有しており、いかなる理論にも拘束されるものではないが、側鎖に導入されたこのフェニルエチニル基が熱硬化性基として作用して反応硬化することにより、本発明のジアミンモノマーを使用して高い耐熱性を有するポリイミド樹脂が得られるものと考えられる。
Yは酸素、イオウ、メチレン及びチオフェンからなる群から選ばれる2価の基であるが、得られるポリイミド樹脂の耐熱性の観点から、酸素またはイオウが好ましい。また、nは1または2の整数であるが、得られるポリイミド樹脂の耐熱性の観点から、nは1であるのが好ましい。
好ましい態様において、上記一般式(I)で表されるジアミンモノマーは、Xがフッ素であり、Yが酸素またはイオウであるものである。
特に好ましい本発明によるジアミンモノマーは、次の化学式(i):
Wherein X is a halogen atom, Y is a divalent group selected from the group consisting of oxygen, sulfur, methylene and thiophene, n is an integer of 1 or 2, and m is an integer of 1 to 5. .)
It is represented by
In the above general formula (I), X is a halogen atom such as fluorine, chlorine, bromine and the like, and it is expected to impart functions such as flame retardancy to the polyimide resin obtained by using the diamine monomer of the present invention. This is the part.
In addition, although m is an integer of 1-5, when m is 2 or more, the plurality of Xs may be the same or different from each other.
As shown in the above general formula (I), the diamine monomer of the present invention has a phenylethynyl group, and is not bound by any theory, but this phenylethynyl group introduced into the side chain. It is considered that a polyimide resin having high heat resistance can be obtained by using the diamine monomer of the present invention by acting as a thermosetting group.
Y is a divalent group selected from the group consisting of oxygen, sulfur, methylene and thiophene, and oxygen or sulfur is preferred from the viewpoint of the heat resistance of the resulting polyimide resin. N is an integer of 1 or 2, but n is preferably 1 from the viewpoint of heat resistance of the resulting polyimide resin.
In a preferred embodiment, the diamine monomer represented by the general formula (I) is one in which X is fluorine and Y is oxygen or sulfur.
Particularly preferred diamine monomers according to the invention have the following chemical formula (i):

Figure 2005320417
Figure 2005320417

で表される化合物(2,4−ジアミノ−1−(1−フルオロ−4−フェニルエチニルフェノキシ)ベンゼン)である。 (2,4-diamino-1- (1-fluoro-4-phenylethynylphenoxy) benzene).

モノマーの合成
2,4−ジアミノ−1−(1−フルオロ−4−フェニルエチニルフェノキシ)ベンゼンの場合を例にあげて、本発明のモノマーの合成方法について、以下に説明する。
次の反応機構にしたがって、本発明のモノマーを合成することができる:
Monomer Synthesis The method for synthesizing the monomer of the present invention will be described below by taking the case of 2,4-diamino-1- (1-fluoro-4-phenylethynylphenoxy) benzene as an example.
The monomers of the present invention can be synthesized according to the following reaction mechanism:

Figure 2005320417
Figure 2005320417

すなわち、2,4−アミノ−1−(1−フルオロ−4−フェニルエチニルフェノキシ)ベンゼンの前駆体である、2,4−ニトロ−1−(1−フルオロ−4−フェニルエチニルフェノキシ)ベンゼンの合成は、1−クロロ−2,4−ジニトロベンゼンと4−(4’―フルオロフェニルエチニル)フェノールを出発原料とし、フッ化カリウムを用いたウィリアムソンエーテル合成法により合成することができる。次に、2,4−ニトロ−1−(1−フルオロ−4−フェニルエチニルフェノキシ)ベンゼンを、塩化錫を用いて還元して、2,4−アミノ−1−(1−フルオロ−4−フェニルエチニルフェノキシ)ベンゼンを合成することができる。
なお、上記一般式(I)においてYがイオウである場合、1−クロロ−2,4−ジニトロベンゼンと4−(4’―フルオロフェニルエチニル)ヒドロスルフィドベンゼンとを出発原料として、本発明のモノマーを合成することができる。
また、上記一般式(I)においてYがメチレンの場合には、1−ブロモ−2,4−ジニトロベンゼンと4−(4’―フルオロフェニルエチニル)ブロモメチルベンゼンとを出発原料とし、グリニャール反応により、本発明のモノマーを合成することができる。
さらに、上記一般式(I)においてYがチオフェンの場合、1−ブロモ−2,4−ジニトロベンゼンと4−(4’―フルオロフェニルエチニル)フェニル−2−ブロモチオフェンとを出発原料とし、グリニャール反応により、本発明のモノマーを合成することができる。
That is, synthesis of 2,4-nitro-1- (1-fluoro-4-phenylethynylphenoxy) benzene, which is a precursor of 2,4-amino-1- (1-fluoro-4-phenylethynylphenoxy) benzene Can be synthesized by a Williamson ether synthesis method using 1-chloro-2,4-dinitrobenzene and 4- (4′-fluorophenylethynyl) phenol as starting materials and using potassium fluoride. Next, 2,4-nitro-1- (1-fluoro-4-phenylethynylphenoxy) benzene is reduced with tin chloride to give 2,4-amino-1- (1-fluoro-4-phenyl). Ethynylphenoxy) benzene can be synthesized.
In the above general formula (I), when Y is sulfur, the monomer of the present invention using 1-chloro-2,4-dinitrobenzene and 4- (4′-fluorophenylethynyl) hydrosulfidebenzene as starting materials Can be synthesized.
In the general formula (I), when Y is methylene, 1-bromo-2,4-dinitrobenzene and 4- (4′-fluorophenylethynyl) bromomethylbenzene are used as starting materials, and Grignard reaction is performed. The monomer of the present invention can be synthesized.
Further, when Y is thiophene in the above general formula (I), Grignard reaction using 1-bromo-2,4-dinitrobenzene and 4- (4′-fluorophenylethynyl) phenyl-2-bromothiophene as starting materials Thus, the monomer of the present invention can be synthesized.

ポリイミド樹脂(イミドオリゴマー)の製造
本発明のジアミンモノマーを使用してポリイミド樹脂(イミドオリゴマー)を製造する場合には、次のような手法によることができる。
まず、1−メチル−2−ピロリドン、DMAc等の非プロトン性極性溶媒を重合溶媒とし、これに本発明のジアミンモノマーを加えて溶解させる。次いで、酸二無水物を加えて室温付近の温度で撹拌し、その後無水フタル酸誘導体を加えてさらに撹拌してアミド酸溶液を合成する。次に、得られたアミド酸溶液から溶媒を除去するため、エアーオーブン等を使用して所定の温度で所定の時間だけ加熱し、さらに、好ましくは減圧下で、また望ましくは重合溶媒の沸点を超える温度で加熱して、溶媒の除去とイミド化を行うことにより、イミドオリゴマー粉末を得る。さらに高温で加熱することにより、硬化樹脂が得られる。
Manufacture of a polyimide resin (imide oligomer) When manufacturing a polyimide resin (imide oligomer) using the diamine monomer of this invention, it can be based on the following methods.
First, an aprotic polar solvent such as 1-methyl-2-pyrrolidone or DMAc is used as a polymerization solvent, and the diamine monomer of the present invention is added and dissolved therein. Next, acid dianhydride is added and stirred at a temperature around room temperature, and then a phthalic anhydride derivative is added and further stirred to synthesize an amic acid solution. Next, in order to remove the solvent from the obtained amic acid solution, it is heated for a predetermined time at a predetermined temperature using an air oven or the like, and further preferably under reduced pressure, and desirably the boiling point of the polymerization solvent. An imide oligomer powder is obtained by heating at a temperature higher than that to remove the solvent and imidize. Further, the cured resin is obtained by heating at a high temperature.

ポリイミド樹脂(イミドオリゴマー)の溶解性評価
本発明のジアミンモノマーを使用して得られたポリイミド樹脂(イミドオリゴマー)の溶解性は、ポリイミド樹脂(イミドオリゴマー)が利用される技術分野において通常使用される有機溶媒に対する溶解性を調べることにより、評価することができる。
Evaluation of solubility of polyimide resin (imide oligomer) The solubility of polyimide resin (imide oligomer) obtained by using the diamine monomer of the present invention is usually used in the technical field in which polyimide resin (imide oligomer) is used. It can evaluate by investigating the solubility with respect to an organic solvent.

ポリイミド樹脂(イミドオリゴマー)の耐熱性評価
本発明のジアミンモノマーを使用して得られたポリイミド樹脂(イミドオリゴマー)の耐熱性は、示差走査熱量測定(DSC)を使用して、ポリイミド樹脂(イミドオリゴマー)のガラス転移温度(Tg)を測定することにより評価することができる。耐熱性に優れたポリイミド樹脂としては、アメリカ航空宇宙局(NASA)により開発された熱硬化性ポリイミド樹脂であるPETI−5(ガラス転移温度270℃)あるいはPMR−15(ガラス転移温度340℃)などが知られており、これらよりも高いガラス転移温度を有するポリイミド樹脂が得られるのが望ましい。
Evaluation of heat resistance of polyimide resin (imide oligomer) The heat resistance of polyimide resin (imide oligomer) obtained by using the diamine monomer of the present invention is determined by using differential scanning calorimetry (DSC) and polyimide resin (imide oligomer). ) By measuring the glass transition temperature (Tg). Examples of polyimide resins with excellent heat resistance include PETI-5 (glass transition temperature 270 ° C.) or PMR-15 (glass transition temperature 340 ° C.), which are thermosetting polyimide resins developed by the National Aeronautics and Space Administration (NASA). It is desirable to obtain a polyimide resin having a glass transition temperature higher than these.

ポリイミド樹脂(イミドオリゴマー)の難燃性評価
本発明のジアミンモノマーを使用して得られたポリイミド樹脂(イミドオリゴマー)の難燃性は、次のような手法により評価することができる。
すなわち、樹脂にバーナー炎を近づけて、30秒間接触させた後、炎を取り去り消炎する場合、燃焼距離が25mm以下の場合を不燃性、25〜100mm以下の場合を自己消火性として評価する。また、酸素指数(酸素と窒素の混合ガス中で試料が継続燃焼するのに必要な限界酸素濃度)を用いて、難燃性の評価を行うこともできる。通常、樹脂の酸素指数は15〜50程度であるので、酸素指数50以上のポリイミド樹脂(イミドオリゴマー)が得られるのが望ましい。
以下に、本発明について、実施例によりさらに詳細に説明する。
Flame Retardancy Evaluation of Polyimide Resin (Imide Oligomer) The flame retardancy of a polyimide resin (imide oligomer) obtained using the diamine monomer of the present invention can be evaluated by the following method.
That is, when a burner flame is brought close to the resin and brought into contact for 30 seconds, the flame is removed and extinguished. In addition, flame retardancy can be evaluated using an oxygen index (a critical oxygen concentration necessary for the sample to continuously burn in a mixed gas of oxygen and nitrogen). Usually, since the oxygen index of the resin is about 15 to 50, it is desirable to obtain a polyimide resin (imide oligomer) having an oxygen index of 50 or more.
Hereinafter, the present invention will be described in more detail with reference to examples.

モノマーの合成
次の手順にしたがって、2,4−ジアミノ−1−(1−フルオロ−4−フェニルエチニルフェノキシ)ベンゼンを合成した。
まず、2,4−ジニトロ−1−(1−フルオロ−4−フェニルエチニルフェノキシ)ベンゼンを、次のようにして合成した。すなわち、1−クロロ−2,4−ジニトロベンゼン(2.0グラム、10ミリモル)、4−(4’―フルオロフェニルエチニル)フェノール(商品名PFT−10)(2.1グラム、10ミリモル)とフッ化カリウム(0.9グラム、16ミリモル)を、反応溶媒であるスルホラン(7.3ミリリットル)に溶解させ、120℃で30時間加熱しながら撹拌した。反応混合物を水に投入し、得られた粉末についてエタノールを用いて再結晶化を行い、白色の結晶を得た。再結晶により得られた結晶について薄層クロマトグラフィー(展開溶媒;n―ヘキサン:酢酸エチル=1:1)を行なったところ、1スポットであることが確認された。
次に、2,4−アミノ−1−(1−フルオロ−4−フェニルエチニルフェノキシ)ベンゼンを、次のようにして合成した。すなわち、2,4−ジニトロ−1−(1−フルオロ−4−フェニルエチニルフェノキシ)ベンゼン(0.49グラム、1.3ミリモル)のジオキサン(5.1ミリリットル)溶液に、塩化錫二水和物(2.44グラム、10.8ミリモル)の塩酸(7.3ミリリットル)溶液を15℃で滴下し、滴下後、室温で一晩撹拌した。反応中析出した混合物をろ過し、アンモニア水で中和して、得られた粉末を乾燥させた。これを2−プロパノールを用いて再結晶化し、針状結晶を得た。再結晶により得られた結晶について薄層クロマトグラフィー(展開溶媒;n―ヘキサン:酢酸エチル=1:1)を行なったところ、1スポットであることが確認された。
Synthesis of monomer According to the following procedure, 2,4-diamino-1- (1-fluoro-4-phenylethynylphenoxy) benzene was synthesized.
First, 2,4-dinitro-1- (1-fluoro-4-phenylethynylphenoxy) benzene was synthesized as follows. That is, 1-chloro-2,4-dinitrobenzene (2.0 grams, 10 mmol), 4- (4′-fluorophenylethynyl) phenol (trade name PFT-10) (2.1 grams, 10 mmol) and Potassium fluoride (0.9 gram, 16 mmol) was dissolved in sulfolane (7.3 ml) as a reaction solvent and stirred while heating at 120 ° C. for 30 hours. The reaction mixture was poured into water, and the obtained powder was recrystallized using ethanol to obtain white crystals. The crystals obtained by recrystallization were subjected to thin layer chromatography (developing solvent; n-hexane: ethyl acetate = 1: 1), and it was confirmed that there was one spot.
Next, 2,4-amino-1- (1-fluoro-4-phenylethynylphenoxy) benzene was synthesized as follows. That is, tin chloride dihydrate was added to a solution of 2,4-dinitro-1- (1-fluoro-4-phenylethynylphenoxy) benzene (0.49 grams, 1.3 mmol) in dioxane (5.1 ml). A solution of (2.44 grams, 10.8 mmol) in hydrochloric acid (7.3 ml) was added dropwise at 15 ° C., and the mixture was stirred overnight at room temperature. The mixture precipitated during the reaction was filtered, neutralized with aqueous ammonia, and the resulting powder was dried. This was recrystallized using 2-propanol to obtain needle crystals. The crystals obtained by recrystallization were subjected to thin layer chromatography (developing solvent; n-hexane: ethyl acetate = 1: 1), and it was confirmed that there was one spot.

モノマーの構造特定
次のような分析手法により、上記手法によって得られたモノマーが2,4−ジアミノ−1−(1−フルオロ−4−フェニルエチニルフェノキシ)ベンゼンであることを確認した。
まず、赤外吸収スペクトル(IR)測定を、(株)日本分光製FT/IR−230を用いて、KBr法により行った。その結果、3423cm-1と3333cm-1にアミンのピークが観察され、また、1899cm-1にはエチニル基、1232cm-1にはエーテル基に起因するピークが観察された。
次いで、炭素、水素、窒素原子の元素分析を、LECO社製CHNS−932、さらに、フッ素原子の元素分析を、Yanaco社製YS―10SX−Elements Micro Analyzerを用いて行なった。
結果は次の通りであった。
20152OF
理論値:C、75.46;H,4.75;N,8.80;F,5.97
実測値:C、75.02;H,4.83;N,8.70;F,5.81
Monomer structure identification The following analytical method confirmed that the monomer obtained by the above method was 2,4-diamino-1- (1-fluoro-4-phenylethynylphenoxy) benzene.
First, infrared absorption spectrum (IR) measurement was performed by KBr method using FT / IR-230 manufactured by JASCO Corporation. As a result, the peak of the amine 3423Cm -1 and 3333cm -1 are observed, also, the 1899Cm -1 ethynyl group, a peak attributed to the ether group in 1232Cm -1 was observed.
Subsequently, elemental analysis of carbon, hydrogen, and nitrogen atoms was performed using CHNS-932 manufactured by LECO, and further, elemental analysis of fluorine atoms was performed using YS-10SX-Elements Micro Analyzer manufactured by Yanaco.
The results were as follows.
C 20 H 15 N 2 OF
Theoretical: C, 75.46; H, 4.75; N, 8.80; F, 5.97
Found: C, 75.02; H, 4.83; N, 8.70; F, 5.81

ポリイミド樹脂(イミドオリゴマー)の製造
以下の手順にしたがって、2,4−ジアミノ−1−(1−フルオロ−4−フェニルエチニルフェノキシ)ベンゼンを使用してポリイミド樹脂を製造した。
重合溶媒である1−メチル−2−ピロリドン17ミリリットル(30重量%)に、2,4−ジアミノ−1−(1−フルオロ−4−フェニルエチニルフェノキシ)ベンゼンを3.98グラム(12.5ミリモル)加え、溶解した後、ピロメリット酸二無水物を2.18グラム(10ミリモル)加えて、室温にて5時間撹拌した。その後、4−フェニルエチニル無水フタル酸を1.24グラム(5ミリモル)加え、室温にて12時間撹拌して、アミド酸溶液を合成した。
次に、得られたアミド酸溶液をエアーオーブンにて60℃で1時間、150℃で1時間加熱した。さらに、減圧下で、200℃で1時間、250℃で1時間加熱して、溶媒の除去とイミド化を行って、イミドオリゴマーの粉末を得た。このイミドオリゴマーの理論分子量は2500である。
さらに、イミドオリゴマー粉末を5MPaにおいて370度で加熱することにより、硬化樹脂を作成した。
The following steps preparation of the polyimide resin (imide oligomer) was prepared polyimide resin using 2,4-diamino-1- (1-fluoro-4-phenylethynyl-phenoxy) benzene.
In 17 ml (30% by weight) of 1-methyl-2-pyrrolidone which is a polymerization solvent, 3.98 g (12.5 mmol) of 2,4-diamino-1- (1-fluoro-4-phenylethynylphenoxy) benzene After adding and dissolving, 2.18 g (10 mmol) of pyromellitic dianhydride was added and stirred at room temperature for 5 hours. Thereafter, 1.24 g (5 mmol) of 4-phenylethynylphthalic anhydride was added and stirred at room temperature for 12 hours to synthesize an amic acid solution.
Next, the obtained amic acid solution was heated in an air oven at 60 ° C. for 1 hour and 150 ° C. for 1 hour. Furthermore, under reduced pressure, it was heated at 200 ° C. for 1 hour and at 250 ° C. for 1 hour to remove the solvent and imidize to obtain an imide oligomer powder. The theoretical molecular weight of this imide oligomer is 2500.
Further, a cured resin was prepared by heating the imide oligomer powder at 370 degrees at 5 MPa.

ポリイミド樹脂(イミドオリゴマー)の溶解性評価
得られたポリイミド樹脂(イミドオリゴマー)の溶解性について評価したところ、次の通りであった。
イミドオリゴマー粉末サンプルに、1−メチル−2−ピロリドンを徐々に加え、濃度を薄くしながら目視による状況観察を行い、完全に溶解した時点での濃度により溶解性を判定した。得られた溶解度は40%であった。
Evaluation of solubility of polyimide resin (imide oligomer) When the solubility of the obtained polyimide resin (imide oligomer) was evaluated, it was as follows.
1-Methyl-2-pyrrolidone was gradually added to the imide oligomer powder sample, the situation was visually observed while reducing the concentration, and the solubility was determined based on the concentration at the time of complete dissolution. The solubility obtained was 40%.

ポリイミド樹脂(イミドオリゴマー)の耐熱性評価
得られたポリイミド樹脂(イミドオリゴマー)の耐熱性について評価したところ、次の通りであった。
示差走査熱量測定(DSC、TA Instruments社製 DSC2010 Differential Scanning Calorimeter)を用い、昇温速度を毎分20℃として、窒素中において耐熱性を評価した。その結果、硬化後の樹脂のガラス転移温度(Tg)は392℃であった。
Evaluation of heat resistance of polyimide resin (imide oligomer) When the heat resistance of the obtained polyimide resin (imide oligomer) was evaluated, it was as follows.
Using differential scanning calorimetry (DSC, DSC2010 Differential Scanning Calorimeter manufactured by TA Instruments), the temperature rise rate was set to 20 ° C. per minute, and the heat resistance was evaluated in nitrogen. As a result, the glass transition temperature (Tg) of the cured resin was 392 ° C.

[比較例]
2,4−ジアミノ−1−(1−フルオロ−4−フェニルエチニルフェノキシ)ベンゼンに代えてm−フェニレンジアミンをモノマーとして使用したことを除き、上記実施例の方法と同様の方法によりポリイミド樹脂(イミドオリゴマー)を製造し、その特性を評価したところ、溶解性は20%であり、ガラス転移温度(Tg)は353℃であった。
[Comparative example]
A polyimide resin (imide) was obtained in the same manner as in the above examples except that m-phenylenediamine was used as a monomer instead of 2,4-diamino-1- (1-fluoro-4-phenylethynylphenoxy) benzene. Oligomer) was produced and its properties were evaluated. As a result, the solubility was 20% and the glass transition temperature (Tg) was 353 ° C.

本発明のジアミンモノマーの活用例としては、耐熱性フィルム、難燃性材料、医薬品、農薬及び電子材料等の材料用の原料としての使用が考えられる。   As an application example of the diamine monomer of the present invention, use as a raw material for materials such as heat-resistant films, flame retardant materials, pharmaceuticals, agricultural chemicals and electronic materials can be considered.

Claims (5)

次の一般式(I):
Figure 2005320417
(式中、Xはハロゲン原子であり、Yは酸素、イオウ、メチレン及びチオフェンからなる群から選ばれる2価の基であり、nは1または2の整数であり、mは1〜5の整数である。)
で表される、ジアミンモノマー。
The following general formula (I):
Figure 2005320417
(Wherein X is a halogen atom, Y is a divalent group selected from the group consisting of oxygen, sulfur, methylene and thiophene, n is an integer of 1 or 2, and m is an integer of 1 to 5) .)
A diamine monomer represented by:
一般式(I)において、Xがフッ素であり、Yが酸素またはイオウである、請求項1に記載のジアミンモノマー。   The diamine monomer according to claim 1, wherein in the general formula (I), X is fluorine and Y is oxygen or sulfur. 次の化学式(i):
Figure 2005320417
で表される、請求項1または2に記載のジアミンモノマー。
The following chemical formula (i):
Figure 2005320417
The diamine monomer of Claim 1 or 2 represented by these.
次の一般式(I):
Figure 2005320417
(式中、Xはハロゲン原子であり、Yは酸素、イオウ、メチレン及びチオフェンからなる群から選ばれる2価の基であり、nは1または2の整数であり、mは1〜5の整数である。)
で表されるジアミンモノマーを含む、ポリイミド樹脂の溶解性向上剤。
The following general formula (I):
Figure 2005320417
Wherein X is a halogen atom, Y is a divalent group selected from the group consisting of oxygen, sulfur, methylene and thiophene, n is an integer of 1 or 2, and m is an integer of 1 to 5. .)
The solubility improvement agent of a polyimide resin containing the diamine monomer represented by these.
次の一般式(I):
Figure 2005320417
(式中、Xはハロゲン原子であり、Yは酸素、イオウ、メチレン及びチオフェンからなる群から選ばれる2価の基であり、nは1または2の整数であり、mは1〜5の整数である。)
で表されるジアミンモノマーを含む、ポリイミド樹脂の耐熱性向上剤。
The following general formula (I):
Figure 2005320417
Wherein X is a halogen atom, Y is a divalent group selected from the group consisting of oxygen, sulfur, methylene and thiophene, n is an integer of 1 or 2, and m is an integer of 1 to 5. .)
The heat resistance improver of a polyimide resin containing the diamine monomer represented by these.
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009038038A1 (en) 2007-09-19 2009-03-26 Fujifilm Corporation Acetylene compound, salt thereof, condensate thereof, and composition thereof
JP2009091347A (en) * 2007-09-19 2009-04-30 Fujifilm Corp Novel acetylene compound and salt thereof, method for producing the novel acetylene compound and salt thereof, and amide, imide and benzimidazole compounds and oligomer or polymer having the acetylene compound residue on its partial moiety
CN111499820A (en) * 2019-12-16 2020-08-07 北京理工大学 Phosphorus-nitrogen synergistic flame-retardant polyol resin containing phenylethynyl and preparation method and application thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009038038A1 (en) 2007-09-19 2009-03-26 Fujifilm Corporation Acetylene compound, salt thereof, condensate thereof, and composition thereof
JP2009091347A (en) * 2007-09-19 2009-04-30 Fujifilm Corp Novel acetylene compound and salt thereof, method for producing the novel acetylene compound and salt thereof, and amide, imide and benzimidazole compounds and oligomer or polymer having the acetylene compound residue on its partial moiety
CN101868444A (en) * 2007-09-19 2010-10-20 富士胶片株式会社 Acetylene compound, salt thereof, condensate thereof, and composition thereof
CN111499820A (en) * 2019-12-16 2020-08-07 北京理工大学 Phosphorus-nitrogen synergistic flame-retardant polyol resin containing phenylethynyl and preparation method and application thereof

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