JP2005292450A5 - - Google Patents

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Publication number
JP2005292450A5
JP2005292450A5 JP2004107232A JP2004107232A JP2005292450A5 JP 2005292450 A5 JP2005292450 A5 JP 2005292450A5 JP 2004107232 A JP2004107232 A JP 2004107232A JP 2004107232 A JP2004107232 A JP 2004107232A JP 2005292450 A5 JP2005292450 A5 JP 2005292450A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2004107232A
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JP4195674B2 (ja
JP2005292450A (ja
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Priority to JP2004107232A priority Critical patent/JP4195674B2/ja
Priority claimed from JP2004107232A external-priority patent/JP4195674B2/ja
Publication of JP2005292450A publication Critical patent/JP2005292450A/ja
Publication of JP2005292450A5 publication Critical patent/JP2005292450A5/ja
Application granted granted Critical
Publication of JP4195674B2 publication Critical patent/JP4195674B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2004107232A 2004-03-31 2004-03-31 投影光学系および投影露光装置 Expired - Lifetime JP4195674B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004107232A JP4195674B2 (ja) 2004-03-31 2004-03-31 投影光学系および投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004107232A JP4195674B2 (ja) 2004-03-31 2004-03-31 投影光学系および投影露光装置

Publications (3)

Publication Number Publication Date
JP2005292450A JP2005292450A (ja) 2005-10-20
JP2005292450A5 true JP2005292450A5 (ja) 2006-02-09
JP4195674B2 JP4195674B2 (ja) 2008-12-10

Family

ID=35325439

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004107232A Expired - Lifetime JP4195674B2 (ja) 2004-03-31 2004-03-31 投影光学系および投影露光装置

Country Status (1)

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JP (1) JP4195674B2 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1036108A1 (nl) * 2007-11-09 2009-05-12 Asml Netherlands Bv Device Manufacturing Method and Lithographic Apparatus, and Computer Program Product.
JP5595001B2 (ja) * 2009-10-06 2014-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
US8922750B2 (en) 2009-11-20 2014-12-30 Corning Incorporated Magnification control for lithographic imaging system
JPWO2012043130A1 (ja) * 2010-09-30 2014-02-06 株式会社ニコン 投影光学系、投影光学系の調整方法、露光装置、露光方法、およびデバイス製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59144127A (ja) * 1983-02-07 1984-08-18 Canon Inc 像調整された光学装置
JPH0883744A (ja) * 1994-09-09 1996-03-26 Nikon Corp 走査型露光装置
US5557469A (en) * 1994-10-28 1996-09-17 Ultratech Stepper, Inc. Beamsplitter in single fold optical system and optical variable magnification method and system
US5739964A (en) * 1995-03-22 1998-04-14 Etec Systems, Inc. Magnification correction for small field scanning
US5757469A (en) * 1995-03-22 1998-05-26 Etec Systems, Inc. Scanning lithography system haing double pass Wynne-Dyson optics
US5815245A (en) * 1995-03-22 1998-09-29 Etec Systems, Inc. Scanning lithography system with opposing motion

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