JP2005288239A - Discharge type gas purification apparatus and gas purification method - Google Patents

Discharge type gas purification apparatus and gas purification method Download PDF

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JP2005288239A
JP2005288239A JP2004104380A JP2004104380A JP2005288239A JP 2005288239 A JP2005288239 A JP 2005288239A JP 2004104380 A JP2004104380 A JP 2004104380A JP 2004104380 A JP2004104380 A JP 2004104380A JP 2005288239 A JP2005288239 A JP 2005288239A
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discharge
electrodes
gas purification
purification apparatus
electrode
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Kazuo Hayashi
林  和夫
Etsuo Noda
悦夫 野田
Sukeyuki Yasui
祐之 安井
Yasuhiro Takahashi
泰弘 高橋
Kuniyuki Araki
邦行 荒木
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Toshiba Corp
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Toshiba Corp
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<P>PROBLEM TO BE SOLVED: To provide a discharge type gas purification apparatus and a purification method for removing fine solid or liquid particles contained in gas as impurities from gas for purifying. <P>SOLUTION: This discharge type gas purification apparatus comprises in a facing state arranged electrodes 2a, 2b with different effective areas, a high frequency power source 1 generating high frequency discharge between the electrodes by applying voltage to the electrodes, and a gas circulating means for circulating gas containing fine particles between the electrodes. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、有害物質等を含むガスを放電によって浄化する放電型ガス浄化装置およびガスの浄化方法に関する。   The present invention relates to a discharge-type gas purification device and a gas purification method for purifying a gas containing harmful substances and the like by discharge.

水処理施設、家畜飼育施設、工場などから排出される悪臭や有害物質の除去は、現代の重要な技術開発課題である。この排気ガス処理法には、吸着材や触媒を使う方法、薬剤の水溶液に溶解吸収させる方法、放電プラズマを用いる方法など、さまざまな方法が開発されてきている(特許文献1)。この中で、放電プラズマを用いる方法は、被処理物質を含む廃材の量が少なくてすむという特長を持つ。   Removal of odors and harmful substances discharged from water treatment facilities, livestock breeding facilities, factories, etc. is an important modern technological development issue. Various methods have been developed for this exhaust gas treatment method, such as a method using an adsorbent or a catalyst, a method of dissolving and absorbing in an aqueous solution of a drug, and a method using discharge plasma (Patent Document 1). Among these, the method using the discharge plasma has a feature that the amount of the waste material containing the material to be treated can be reduced.

従来の放電プラズマを適用した排ガス浄化装置の例として、プラズマ脱臭装置について図面を参照して説明する。図10はプラズマ脱臭装置の概略ブロック図であり、21は放電処理部、22は吸着分解処理部、23は排気ファン、24は排気ダクトである。排気ファン23によって排気ダクト24に吸引された臭気成分を大量に含む空気は、放電処理部22においてまず放電プラズマによって分解される。放電プラズマによって処理されない成分は、吸着分解処理部22に備えられた活性炭に吸着され、あるいは触媒によって分解される。また、放電処理部21で発生するオゾンは寿命が長いので、例えば吸着分解処理部22内に長時間滞在して、臭気成分の分解等に寄与する。   As an example of a conventional exhaust gas purifying apparatus to which discharge plasma is applied, a plasma deodorizing apparatus will be described with reference to the drawings. FIG. 10 is a schematic block diagram of the plasma deodorization apparatus, in which 21 is a discharge processing unit, 22 is an adsorption decomposition processing unit, 23 is an exhaust fan, and 24 is an exhaust duct. Air containing a large amount of odor components sucked into the exhaust duct 24 by the exhaust fan 23 is first decomposed by the discharge plasma in the discharge processing section 22. Components that are not treated by the discharge plasma are adsorbed by activated carbon provided in the adsorption / decomposition processing unit 22 or decomposed by a catalyst. Further, since ozone generated in the discharge processing unit 21 has a long life, it stays in the adsorption decomposition processing unit 22 for a long time, for example, and contributes to decomposition of odor components.

ところで、従来の放電型ガス浄化装置が扱ってきた不純物は、気体状物質であるが、工場からの燃焼煙や船舶、自動車のディーゼルエンジンやガソリンエンジンから排出されるすすなどの微粒子を含む排ガス処理への適用の期待も大きい。
しかし従来の放電型ガス浄化装置は、排ガスに微粒子が含まれる場合にも微粒子の処理を考慮していなかった。
By the way, the impurities that the conventional discharge gas purification devices have dealt with are gaseous substances, but the exhaust gas treatment contains fine particles such as combustion smoke from factories and soot discharged from ships, automobile diesel engines and gasoline engines. The expectation of application to is also great.
However, the conventional discharge gas purification apparatus does not consider the treatment of fine particles even when the exhaust gas contains fine particles.

そこで本発明は、不純物として固体状あるいは液体状の微小物体(以下、微粒子という)を含むガスから微粒子を除去して浄化することのできる放電型ガス浄化装置およびガスの浄化方法を提供することを目的とする。   Therefore, the present invention provides a discharge gas purification device and a gas purification method capable of removing and purifying fine particles from a gas containing solid or liquid minute objects (hereinafter referred to as fine particles) as impurities. Objective.

請求項1の発明は、対向配置された実効面積の異なる電極と、前記電極に電圧を印加して前記電極間に高周波放電を発生させる高周波電源と、前記電極間に微粒子を含むガスを通流させるガス通流手段とを備えている構成とする。
請求項2の発明は、前記電極の少なくとも一方の対向面が誘電体で覆われている構成とする。
According to the first aspect of the present invention, there are provided electrodes having different effective areas disposed opposite to each other, a high-frequency power source for applying a voltage to the electrodes to generate a high-frequency discharge between the electrodes, and a gas flow containing fine particles between the electrodes. And a gas flow means.
According to a second aspect of the present invention, at least one opposing surface of the electrode is covered with a dielectric.

請求項3の発明は、前記電極の実効面積の小さい方は複数の電気的に接続された短冊状の金属板からなり、他方は1枚の平板からなる構成とする。
請求項4の発明は、前記複数の短冊状の金属板は格子状に結合されている構成とする。
According to a third aspect of the present invention, the electrode having a smaller effective area is composed of a plurality of electrically connected strip-shaped metal plates, and the other is composed of a single flat plate.
According to a fourth aspect of the present invention, the plurality of strip-shaped metal plates are combined in a lattice shape.

請求項5の発明は、前記電極の実効面積の小さい方は複数の孔を有する金属平板からなり、他方は1枚の平板からなる構成とする。
請求項6の発明は、対向配置された電極と、前記電極に電圧を印加して前記電極間に高周波放電を発生させる高周波電源と、前記高周波電源に直列に接続された直流電源と、前記電極間に微粒子を含むガスを通流させるガス通流手段とを備えている構成とする。
According to a fifth aspect of the present invention, the electrode having a smaller effective area is composed of a metal flat plate having a plurality of holes, and the other is composed of a single flat plate.
The invention of claim 6 comprises electrodes arranged opposite to each other, a high frequency power source for applying a voltage to the electrodes to generate a high frequency discharge between the electrodes, a direct current power source connected in series to the high frequency power source, and the electrodes A gas flow means for allowing a gas containing fine particles to flow there between is provided.

請求項7の発明は、前記直流電源と並列にコンデンサが接続されている構成とする。
請求項8の発明は、前記電極は複数組のものが積層して設けられている構成とする。
請求項9の発明は、前記電極を備えてなる放電処理部の前段にガス中の微粒子を帯電させるイオン化装置を備えている構成とする。
According to a seventh aspect of the present invention, a capacitor is connected in parallel with the DC power supply.
According to an eighth aspect of the present invention, a plurality of sets of electrodes are provided in a stacked manner.
According to a ninth aspect of the present invention, an ionization device for charging fine particles in the gas is provided in a stage preceding the discharge processing unit including the electrode.

請求項10の発明は、対向配置され電位バイアスを有する電極間に高周波放電を発生させ、前記電極間に微粒子を含むガスを通流させ、前記微粒子を前記電極に捕捉し分解する方法とする。   According to a tenth aspect of the present invention, there is provided a method in which a high frequency discharge is generated between electrodes arranged opposite to each other and having a potential bias, a gas containing fine particles is passed between the electrodes, and the fine particles are captured and decomposed by the electrodes.

本発明は、不純物として固体状あるいは液体状の微小物体(以下、微粒子という)を含むガスから微粒子を除去して浄化することのできる放電型ガス浄化装置およびガスの浄化方法を提供することができる。   INDUSTRIAL APPLICABILITY The present invention can provide a discharge-type gas purification device and a gas purification method that can remove and purify fine particles from a gas that contains solid or liquid minute objects (hereinafter referred to as fine particles) as impurities. .

以下、本発明の第1〜第9の実施の形態を図面を参照して説明する。
まず、第1の実施の形態を図1により説明する。図1(a)は本実施の形態の放電型ガス浄化装置の放電処理部の構成を示す図、図1(b)は電極間の電圧波形を示す図である。
Hereinafter, first to ninth embodiments of the present invention will be described with reference to the drawings.
First, a first embodiment will be described with reference to FIG. FIG. 1A is a diagram illustrating a configuration of a discharge processing unit of the discharge gas purification apparatus according to the present embodiment, and FIG. 1B is a diagram illustrating a voltage waveform between electrodes.

図1(a)において、1は高周波電源、2aと2bは平行に設置された電極である。3は電極2a,2b間に生成された放電プラズマであり、4はコンデンサである。微粒子を含むガスは図中の矢印の方向に流れ、放電空間で酸化分解される。   In FIG. 1A, 1 is a high-frequency power source, and 2a and 2b are electrodes arranged in parallel. 3 is discharge plasma generated between the electrodes 2a and 2b, and 4 is a capacitor. The gas containing fine particles flows in the direction of the arrow in the figure and is oxidatively decomposed in the discharge space.

本実施の形態の放電型ガス浄化装置では、対向する平行な電極2a,2bの大きさが異なり、且つ、電極2aがコンデンサ4を介して接地点5と接続されている。こうすることによって、電極間の電圧が、図1(b)に示すように、0Vラインに対して非対称になり、電極2bの平均電位がプラスになる。これを、自己バイアスという。この結果、放電プラズマ3中で帯電した微粒子は、電界によって一方の電極に引き寄せられ、電極面に捕集される。微粒子の反応の時定数はガスより長い。従って、この様に電極に付着させることで、プラズマに曝される時間を長くし、処理量を増やすことができる。   In the discharge type gas purification apparatus of the present embodiment, the parallel electrodes 2 a and 2 b facing each other are different in size, and the electrode 2 a is connected to the ground point 5 through the capacitor 4. By doing so, as shown in FIG. 1B, the voltage between the electrodes becomes asymmetric with respect to the 0V line, and the average potential of the electrode 2b becomes positive. This is called self-bias. As a result, the fine particles charged in the discharge plasma 3 are attracted to one electrode by the electric field and collected on the electrode surface. The time constant of reaction of fine particles is longer than that of gas. Therefore, by attaching to the electrode in this way, the time of exposure to plasma can be lengthened and the amount of processing can be increased.

本実施の形態の放電型ガス浄化装置は、平行平板を対向させた放電電極2a,2bの一方の面積を他方より小さくし、高周波放電を生成した時に電極2a,2b間に定常的な電位差を生じさせている。この放電型ガス浄化装置においては、ガス中の微粒子は電極間で帯電すると同時に、電極間に発生している静電界の作用でどちらかの電極に引き寄せられ、そこに付着する。これを、放電プラズマの作用で処理することによって、ガス状不純物と同時に、ガスに含まれる微粒子も除去することができる。   The discharge type gas purification apparatus according to the present embodiment reduces the area of one of the discharge electrodes 2a and 2b with the parallel plates facing each other smaller than the other, and generates a steady potential difference between the electrodes 2a and 2b when generating a high frequency discharge. It is generated. In this discharge-type gas purification apparatus, the fine particles in the gas are charged between the electrodes, and at the same time, attracted to one of the electrodes by the action of the electrostatic field generated between the electrodes and attached thereto. By treating this with the action of discharge plasma, fine particles contained in the gas can be removed simultaneously with the gaseous impurities.

図2は、本発明の第2の実施の形態の放電型ガス浄化装置の放電処理部の要部の構成を示す図である。すなわち、一方の電極2aの表面を絶縁材6で覆ってある。こうすることによって、絶縁材6によって電極2a,2b間のアーク放電が抑制され、放電プラズマに安定に高エネルギーを投入することができ、ガス浄化の処理能力が向上する。   FIG. 2 is a diagram illustrating a configuration of a main part of a discharge processing unit of the discharge gas purification apparatus according to the second embodiment of the present invention. That is, the surface of one electrode 2a is covered with the insulating material 6. By doing so, the arc discharge between the electrodes 2a and 2b is suppressed by the insulating material 6, and high energy can be input stably to the discharge plasma, and the gas purification treatment capacity is improved.

図3は、本発明の第3の実施の形態を説明する概略図である。この実施の形態においては、図3(a)に示すように、放電処理部を構成する電極2aと2cの外形形状と寸法はほぼ同じである。そして全面1枚の金属平板製の電極2aに対して、電極2cは、図3(b)に示すように、電気的に接続された複数枚の短冊状の金属板2c1と2c2で構成されており、電極2cの実効面積は電極2aより小さくなっている。この結果、図1(a)に示した電極2a,2bと同様に、自己バイアスが生じ、電極2a,2c間に定常電界が発生する。   FIG. 3 is a schematic diagram for explaining a third embodiment of the present invention. In this embodiment, as shown in FIG. 3A, the outer shapes and dimensions of the electrodes 2a and 2c constituting the discharge processing section are substantially the same. The electrode 2c is composed of a plurality of strip-like metal plates 2c1 and 2c2 that are electrically connected to one electrode 2a made of a metal flat plate as shown in FIG. 3B. The effective area of the electrode 2c is smaller than that of the electrode 2a. As a result, like the electrodes 2a and 2b shown in FIG. 1A, a self-bias is generated, and a steady electric field is generated between the electrodes 2a and 2c.

図4は、本発明の第4の実施の形態を説明する概略図である。この実施の形態は、図3(a)に示した電極構成における一方の電極2cが、短冊状の金属板2c1と2c3が格子状に結合されて構成されている。この実施の形態においても図3(b)と同様に、電極2cの実効面積が対向する電極2aより小さくなっている。この結果、図1(a)に示した電極2a,2bと同様に、自己バイアスが生じ、電極2a,2c間に定常電界が発生する。   FIG. 4 is a schematic diagram for explaining a fourth embodiment of the present invention. In this embodiment, one electrode 2c in the electrode configuration shown in FIG. 3 (a) is configured by combining strip-shaped metal plates 2c1 and 2c3 in a lattice pattern. Also in this embodiment, as in FIG. 3B, the effective area of the electrode 2c is smaller than that of the opposing electrode 2a. As a result, like the electrodes 2a and 2b shown in FIG. 1A, a self-bias is generated, and a steady electric field is generated between the electrodes 2a and 2c.

図5は、本発明の第5の実施の形態を説明する概略図である。この実施の形態は、図3(a)のように平板電極2aに対向する電極2cを多数の孔を有する金属平板によって構成して、実効面積を電極2aより小さくしたものである。この結果、図1(a)に示した電極2a,2bと同様に、自己バイアスが生じ、電極2a,2c間に定常電界が発生する。   FIG. 5 is a schematic diagram for explaining a fifth embodiment of the present invention. In this embodiment, as shown in FIG. 3A, the electrode 2c facing the flat plate electrode 2a is constituted by a metal flat plate having a large number of holes, and the effective area is made smaller than that of the electrode 2a. As a result, like the electrodes 2a and 2b shown in FIG. 1A, a self-bias is generated, and a steady electric field is generated between the electrodes 2a and 2c.

図6は、本発明の第6の実施の形態を説明する概略図である。この実施の形態は、放電電極部2と直列に直流電源7を接続した構成である。この直流電源7によって、図1(b)でに示した自己バイアス電位がさらに大きくなり、微粒子の捕集効率が向上する。なお、直流電源7の接続の極性は図示のものと逆でもよい。また、直流電源7によって電位バイアスを与えるので、対向する電極の面積は同じでもよい。   FIG. 6 is a schematic diagram for explaining a sixth embodiment of the present invention. In this embodiment, a DC power supply 7 is connected in series with the discharge electrode portion 2. The direct-current power source 7 further increases the self-bias potential shown in FIG. 1B, thereby improving the particulate collection efficiency. Note that the polarity of the connection of the DC power supply 7 may be opposite to that shown in the figure. Further, since the potential bias is applied by the DC power source 7, the areas of the opposing electrodes may be the same.

図7は、本発明の第7の実施の形態を説明する概略図である。この実施の形態は、放電電極部2と直列に接続した直流電源7に並列にコンデンサ4を接続した構成である。直流電源7は、高周波に対して十分に低いインピーダンスを持たなければならないが、それが十分でないとき、コンデンサ4によって高周波のインピーダンスを低く抑えることができる。なお、直流電源7の接続の極性は図示のものと逆でもよい。また、対向する電極の面積は同じでもよい。   FIG. 7 is a schematic diagram for explaining a seventh embodiment of the present invention. In this embodiment, a capacitor 4 is connected in parallel to a DC power source 7 connected in series with the discharge electrode portion 2. The DC power source 7 must have a sufficiently low impedance with respect to a high frequency, but when this is not sufficient, the high frequency impedance can be kept low by the capacitor 4. Note that the polarity of the connection of the DC power supply 7 may be opposite to that shown in the figure. Further, the areas of the opposing electrodes may be the same.

図8は、本発明の第8の実施の形態を説明する放電処理部の概略図である。この実施の形態は、同電位の一組の電極2a1,2a2,2a3と、他の同電位の一組の電極2b1,2b2を交互に配置して、各電極間にに放電プラズマ3が形成されるようにしたものである。この実施の形態によれば、矢印で示した方向からのガスの流れに対して、処理断面積が増大し、大流量のガスに対しても十分な処理能力が得られる。なお、電極2a2,2b1,2b2は電極2a1の電位と電極2a3の電位の間の浮いた電位としてもよい。   FIG. 8 is a schematic view of a discharge processing unit for explaining an eighth embodiment of the present invention. In this embodiment, a pair of electrodes 2a1, 2a2, 2a3 having the same potential and another pair of electrodes 2b1, 2b2 having the same potential are alternately arranged, and a discharge plasma 3 is formed between the electrodes. It was made to do. According to this embodiment, the processing cross-sectional area increases with respect to the gas flow from the direction indicated by the arrow, and sufficient processing capacity can be obtained even for a large flow rate of gas. The electrodes 2a2, 2b1, and 2b2 may have a floating potential between the potential of the electrode 2a1 and the potential of the electrode 2a3.

図9は、本発明の第9の実施の形態の放電型ガス浄化装置の全体概略図である。この実施の形態は、放電処理部21の前段に、排ガス中の微粒子を帯電させるためのイオン化装置9を設置した構成である。この実施の形態によれば、放電処理部21の作用だけでなく、イオン化装置9によって、さらにガス中の微粒子の帯電量が増加し、放電空間での微粒子の捕集効率が向上する。   FIG. 9 is an overall schematic view of a discharge gas purification apparatus according to the ninth embodiment of the present invention. In this embodiment, an ionization device 9 for charging fine particles in the exhaust gas is installed in the preceding stage of the discharge processing unit 21. According to this embodiment, not only the action of the discharge processing unit 21 but also the ionization device 9 further increases the charge amount of the fine particles in the gas and improves the collection efficiency of the fine particles in the discharge space.

本発明の第1の実施の形態の放電型ガス浄化装置を示し、(a)は放電処理部の構成を示す図、(b)は電極間の電圧波形を示す図。The discharge type gas purification apparatus of the 1st Embodiment of this invention is shown, (a) is a figure which shows the structure of a discharge process part, (b) is a figure which shows the voltage waveform between electrodes. 本発明の第2の実施の形態の放電型ガス浄化装置に備えられる放電処理部の要部の構成を示す図。The figure which shows the structure of the principal part of the discharge processing part with which the discharge type gas purification apparatus of the 2nd Embodiment of this invention is equipped. 本発明の第3の実施の形態の放電型ガス浄化装置を示し、(a)は放電処理部の要部構成を示す図、(b)は一方の電極の構成を示す図。The discharge type gas purification apparatus of the 3rd Embodiment of this invention is shown, (a) is a figure which shows the principal part structure of a discharge process part, (b) is a figure which shows the structure of one electrode. 本発明の第4の実施の形態の放電型ガス浄化装置における放電処理部に備えられる一方の電極の構成を示す図。The figure which shows the structure of one electrode with which the discharge process part in the discharge type gas purification apparatus of the 4th Embodiment of this invention is equipped. 本発明の第5の実施の形態の放電型ガス浄化装置における放電処理部に備えられる一方の電極の構成を示す図。The figure which shows the structure of one electrode with which the discharge process part in the discharge type gas purification apparatus of the 5th Embodiment of this invention is equipped. 本発明の第6の実施の形態の放電型ガス浄化装置に備えられる放電処理部の構成を示す図。The figure which shows the structure of the discharge process part with which the discharge type gas purification apparatus of the 6th Embodiment of this invention is equipped. 本発明の第7の実施の形態の放電型ガス浄化装置に備えられる放電処理部の構成を示す図。The figure which shows the structure of the discharge process part with which the discharge type gas purification apparatus of the 7th Embodiment of this invention is equipped. 本発明の第8の実施の形態の放電型ガス浄化装置に備えられる放電処理部の電極の構成を示す図。The figure which shows the structure of the electrode of the discharge process part with which the discharge type gas purification apparatus of the 8th Embodiment of this invention is equipped. 本発明の第9の実施の形態の放電型ガス浄化装置の構成を示す図。The figure which shows the structure of the discharge type gas purification apparatus of the 9th Embodiment of this invention. 従来の放電型ガス浄化装置を示す図。The figure which shows the conventional discharge-type gas purification apparatus.

符号の説明Explanation of symbols

1…高周波電源、2…放電電極部、2a,2a1,2a2,2a3,2b,2b1,2b2,2c…電極、2c1,2c2,2c3…短冊状の金属板、3…放電プラズマ、4…コンデンサ、5…接地、6…絶縁材、7…直流電源、9…イオン化装置、21…放電処理部、22…吸着分解処理部、23…排気ファン、24…排気ダクト。

DESCRIPTION OF SYMBOLS 1 ... High frequency power supply, 2 ... Discharge electrode part, 2a, 2a1, 2a2, 2a3, 2b, 2b1, 2b2, 2c ... Electrode, 2c1, 2c2, 2c3 ... Strip-shaped metal plate, 3 ... Discharge plasma, 4 ... Capacitor, DESCRIPTION OF SYMBOLS 5 ... Grounding, 6 ... Insulating material, 7 ... DC power supply, 9 ... Ionizer, 21 ... Discharge process part, 22 ... Adsorption decomposition process part, 23 ... Exhaust fan, 24 ... Exhaust duct.

Claims (10)

対向配置された実効面積の異なる電極と、前記電極に電圧を印加して前記電極間に高周波放電を発生させる高周波電源と、前記電極間に微粒子を含むガスを通流させるガス通流手段とを備えていることを特徴とする放電型ガス浄化装置。   Electrodes with different effective areas arranged opposite to each other, a high-frequency power source for applying a voltage to the electrodes to generate a high-frequency discharge between the electrodes, and a gas flow means for flowing a gas containing fine particles between the electrodes A discharge-type gas purification apparatus comprising: 前記電極の少なくとも一方の対向面が誘電体で覆われていることを特徴とする請求項1記載の放電型ガス浄化装置。   The discharge-type gas purification apparatus according to claim 1, wherein at least one facing surface of the electrode is covered with a dielectric. 前記電極の実効面積の小さい方は複数の電気的に接続された短冊状の金属板からなり、他方は1枚の平板からなることを特徴とする請求項1記載の放電型ガス浄化装置。   2. The discharge type gas purification apparatus according to claim 1, wherein the smaller effective area of the electrode is composed of a plurality of electrically connected strip-shaped metal plates, and the other is composed of one flat plate. 前記複数の短冊状の金属板は格子状に結合されていることを特徴とする請求項3記載の放電型ガス浄化装置。   4. The discharge type gas purification apparatus according to claim 3, wherein the plurality of strip-shaped metal plates are coupled in a lattice shape. 前記電極の実効面積の小さい方は複数の孔を有する金属平板からなり、他方は1枚の平板からなることを特徴とする請求項1記載の放電型ガス浄化装置。   2. The discharge type gas purification apparatus according to claim 1, wherein the electrode having a smaller effective area is made of a metal flat plate having a plurality of holes, and the other is made of a single flat plate. 対向配置された電極と、前記電極に電圧を印加して前記電極間に高周波放電を発生させる高周波電源と、前記高周波電源に直列に接続された直流電源と、前記電極間に微粒子を含むガスを通流させるガス通流手段とを備えていることを特徴とする放電型ガス浄化装置。   An electrode disposed oppositely, a high-frequency power source that applies a voltage to the electrode to generate a high-frequency discharge between the electrodes, a DC power source connected in series to the high-frequency power source, and a gas containing fine particles between the electrodes Discharge-type gas purification apparatus comprising gas flow means for allowing flow. 前記直流電源と並列にコンデンサが接続されていることを特徴とする請求項6記載の放電型ガス浄化装置。   The discharge type gas purification apparatus according to claim 6, wherein a capacitor is connected in parallel with the DC power source. 前記電極は複数組のものが積層して設けられていることを特徴とする請求項1または6に記載の放電型ガス浄化装置。   The discharge type gas purification apparatus according to claim 1 or 6, wherein a plurality of sets of the electrodes are provided in a stacked manner. 前記電極を備えてなる放電処理部の前段にガス中の微粒子を帯電させるイオン化装置を備えていることを特徴とする請求項1または6に記載の放電型ガス浄化装置。   The discharge type gas purification apparatus according to claim 1 or 6, further comprising an ionization device that charges fine particles in the gas before the discharge processing unit including the electrode. 対向配置され電位バイアスを有する電極間に高周波放電を発生させ、前記電極間に微粒子を含むガスを通流させ、前記微粒子を前記電極に捕捉し分解することを特徴とするガスの浄化方法。

A gas purification method comprising: generating a high-frequency discharge between electrodes arranged opposite to each other and having a potential bias; causing a gas containing fine particles to flow between the electrodes; and capturing and decomposing the fine particles on the electrodes.

JP2004104380A 2004-03-31 2004-03-31 Discharge type gas purification apparatus and gas purification method Pending JP2005288239A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007220488A (en) * 2006-02-16 2007-08-30 Tokyo Gas Co Ltd Plasma discharge device and exhaust gas treatment device
JP2010033867A (en) * 2008-07-29 2010-02-12 Kyocera Corp Dielectric structure, discharge device using dielectric structure, fluid reformer, and reaction system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007220488A (en) * 2006-02-16 2007-08-30 Tokyo Gas Co Ltd Plasma discharge device and exhaust gas treatment device
JP2010033867A (en) * 2008-07-29 2010-02-12 Kyocera Corp Dielectric structure, discharge device using dielectric structure, fluid reformer, and reaction system

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